Magnetic control assembly with magnetizing and demagnetizing functions and magnetizing and demagnetizing method
By designing magnetron components with magnetic demagnetization function, using magnetic demagnetization modules and magnetic demagnetization heads that cooperate with cylinders and tracks, the problem of difficulty in determining the position and number of magnets in magnetron sputtering is solved, and the flexible configuration of magnets is realized, production costs and time are reduced, and the adaptability and reliability of magnetron components are improved.
Patent Information
- Application Number
- CN202510757642.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-09
- Publication Date
- 2025-07-11
- Estimated Expiration
- 2045-06-09
AI Technical Summary
During magnetron sputtering, the magnet position and number of magnets of the magnets need to be determined through multiple tests, resulting in increased production time and cost.
Design magnet control components with magnetic demagnetization function. Through the magnetic demagnetization module and the magnetic demagnetization head that cooperates with cylinders and rails, the magnet can be flexible in magnetization and demagnetization, adapt to a variety of test scenarios and avoid repeated modeling.
The flexible configuration of magnets is realized, which reduces production time and cost, improves the adaptability and reliability of magnetron components, and reduces energy loss.
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Figure CN120299856A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of semiconductor manufacturing, and particularly relates to a magnetron component with magnetization and demagnetization functions and a magnetization and demagnetization method. Background Art
[0002] Physical vapor deposition (PVD) technology refers to a technology that, under vacuum conditions, uses physical methods to vaporize the material source (solid or liquid) on the surface into gaseous atoms / molecules, or partially ionize them into ions, and deposit a thin film with a certain special function on the substrate surface through a low-pressure gas (or plasma) process. Physical vapor deposition is one of the main surface treatment technologies.
[0003] Magnetron sputtering is a type of physical vapor deposition technology (PVD). The working principle of magnetron sputtering is that electrons, under the action of the electric field E, collide with argon atoms during the flight towards the substrate, causing them to ionize and produce Ar positive ions and new electrons. The new electrons fly towards the substrate, and the Ar ions are accelerated towards the cathode target under the action of the electric field and bombard the target surface with high energy, causing the target material to sputter. Among the sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film, and the generated secondary electrons will be affected by the electric field and magnetic field and drift in the direction indicated by E (electric field) × B (magnetic field), simply referred to as E×B drift. Their movement trajectory is approximately a cycloid. If it is a toroidal magnetic field, the electrons will move in a circular motion on the target surface in an approximate cycloid form. Their movement paths are not only very long, but also confined to the plasma region near the target surface, and a large amount of Ar is ionized in this region to bombard the target material, thus achieving a high deposition rate. As the number of collisions increases, the energy of the secondary electrons is exhausted, and they gradually move away from the target surface and are finally deposited on the substrate under the action of the electric field E. Since the energy of this electron is very low, the energy transferred to the substrate is very small, resulting in a relatively low temperature rise of the substrate.
[0004] Magnetron sputtering is a collision process between incident particles and the target. The incident particles experience a complex scattering process in the target, collide with target atoms, transfer part of their momentum to the target atoms, and these target atoms collide with other target atoms, forming a cascade process. In this cascade process, some target atoms near the surface obtain sufficient momentum to move outward and are sputtered out of the target.
[0005] During the magnetron sputtering process, the magnetron component is an important part of the equipment. The position and number of the magnets need to be determined through multiple experiments, which requires designing multiple magnetron components for repeated experiments, thus increasing the production time and cost. Summary of the Invention
[0006] To solve the above problems, the present invention proposes a magnetron component with magnetization and demagnetization functions and a magnetization and demagnetization method. Through the design of the magnetization and demagnetization module, the magnets can be magnetized or demagnetized flexibly.
[0007] To achieve the above object, the technical solution of the present invention is as follows: A magnetron component with magnetization and demagnetization functions, assembled on the mounting plate inside the cavity of the magnetron sputtering equipment, includes a magnetization and demagnetization module, a fixing plate, and a plurality of magnets arranged inside the fixing plate. The top of the magnet is higher than the upper surface of the fixing plate, and the bottom forms an electrical connection with the power connection plate; the magnetization and demagnetization module includes a first cylinder, a first track, a second cylinder, a second track, and a magnetization and demagnetization head. The first track is longitudinally installed inside the cavity, the first cylinder is arranged on the first track and can move longitudinally along the first track, and the telescopic end of the first cylinder is horizontally connected to the magnetization and demagnetization head; the second cylinder is fixed on the mounting plate, and the telescopic end is connected to the second track. The second track is horizontally arranged, and the magnetization and demagnetization head is assembled inside the second track and can move horizontally along the second track; the magnetization and demagnetization head has a magnetization and demagnetization groove for accommodating the top of the magnet, and an electrical connection part and a heating element are arranged inside the magnetization and demagnetization groove.
[0008] Further, the magnet is connected to the power connection plate through an antenna, the antenna is an elastic copper sheet, and the contact surface between the antenna and the bottom of the magnet is gold-plated, and the contact resistance ≤ 0.1 ohm.
[0009] Further, the fixing plate is made of a heat-insulating material, and the thermal conductivity ≤ 2W / (m·K).
[0010] Further, the magnetron component is connected to a motor.
[0011] The present invention also provides a method for magnetizing and demagnetizing the magnets in the magnetron component, including the following steps: Step 1, install the magnet on the fixing plate, the top of the magnet is exposed above the upper surface of the fixing plate, and the bottom of the magnet forms an electrical connection with the power connection plate; Step 2, when it is necessary to magnetize or demagnetize the magnet, the motor drives the magnetron component to rotate, so that the magnet to be magnetized or demagnetized moves to a suitable position; control the telescopic movement of the first cylinder to drive the magnetization and demagnetization head to move horizontally above the magnet to be magnetized or demagnetized; control the telescopic end of the second cylinder to extend, driving the magnetization and demagnetization head to descend, so that the magnetization and demagnetization groove sleeves on the top of the magnet to be magnetized or demagnetized; Step 3, when magnetizing, apply pulsed direct current to the electrical connection part and the power connection plate, the voltage range is 50 - 1000W, the pulse width is 10 - 500µs, and the magnet is magnetized; when demagnetizing, start the heating element to heat the magnet to 200 - 450 °C, maintain it for 5 - 30 seconds and then cool it naturally, and the magnet is demagnetized; after magnetization or demagnetization is completed, reset the magnetization and demagnetization head to the initial position, detect the magnetic field intensity, and if the magnetic field intensity does not reach the preset magnetic field target value, adjust it.
[0012] Further, in the step 1, the telescopic end of the second cylinder is in the retracted state, and the magnetizing and demagnetizing head is lifted above the upper end face of the magnet.
[0013] Further, the appropriate position in the step 2 is: the magnet to be magnetized or demagnetized, the magnetizing and demagnetizing head, and the center of the magnet control assembly are in the same plane.
[0014] Further, in the step 2, the rotation speed of the motor driving the magnet control assembly is 50 - 100 rpm, and the positioning error ≤ 0.5°.
[0015] Further, during the demagnetization process in the step 3, the heating rate is 5 - 20 °C / s, and the cooling rate ≤ 10 °C / min.
[0016] Further, in the step 3, any one of the following methods can be adopted for the adjustment method: Gradient compensation method: The voltage is increased by 10 - 30%, and the target magnet is magnetized for the second time; Local enhancement method: Several magnets are magnetized in the weak magnetic field area where the magnetic field strength does not reach the target value.
[0017] The beneficial effects of the present invention are as follows: Through the ingenious setting of two groups of cylinders, tracks and the magnetizing and demagnetizing head, each magnet in the magnet control assembly can be independently magnetized and demagnetized, and the number and distribution of the magnets in the magnet control assembly as a whole can be flexibly changed, so as to adapt to various test scenarios, avoid repeated modeling and manufacturing of the magnet control assembly, and save a large amount of manufacturing costs. Description of the Drawings
[0018] Figure 1 It is a partial sectional view of a magnetron sputtering device equipped with a magnet control assembly with magnetizing and demagnetizing functions, including a partial enlarged view of the magnetizing and demagnetizing head.
[0019] Description of the Reference Numerals: 1 - Cavity, 2 - Mounting plate, 3 - Magnet control assembly, 4 - Target, 5 - Motor, 6 - Magnet, 7 - Power connection board, 8 - Antenna, 9 - First cylinder, 10 - First track, 11 - Second cylinder, 12 - Second track, 13 - Magnetizing and demagnetizing head, 14 - Magnetizing and demagnetizing groove, 15 - Power connection part, 16 - Heating element, 17 - Fixed plate. Specific Embodiments
[0020] The technical solutions provided by the present invention will be described in detail below in conjunction with specific embodiments. It should be understood that the following specific embodiments are only used to illustrate the present invention and are not used to limit the scope of the present invention.
[0021] The present invention improves the magnet control assembly 3 in the magnetron sputtering device. As Figure 1As shown in the figure, the magnetron assembly 3 is arranged below the mounting plate 2 in the cavity 1 and above the target 4. Specifically, the magnetron assembly 3 is assembled on the mounting plate 2 through the cooperation of a rotating shaft and a bearing, and is driven to rotate by a motor 5. A plurality of magnets 6 are inserted into the fixing plate 17 of the magnetron assembly 3. In the present invention, the magnets 6 are arranged in a circular array. According to actual needs, other arrangement forms can also be adopted. A power connection plate 7 is arranged above the target 4, and each magnet is electrically connected to the power connection plate. In this example, each magnet 6 has an antenna 8 below. The antenna 8 is a copper sheet with a certain elasticity. The magnet 6 is connected to the power connection plate 7 through the antenna 8. The contact surface between the antenna and the bottom of the magnet is plated with thin gold, and the contact resistance is ≤0.1 ohm, which can effectively improve the conductivity and corrosion resistance, thereby improving the reliability and life of the equipment and reducing the energy loss.
[0022] The present invention designs a magnetization and demagnetization module, including a first cylinder 9, a first track 10, a second cylinder 11, a second track 12 and a magnetization and demagnetization head 13. The first track 10 is longitudinally installed in the cavity 1. The first cylinder 9 is arranged on the first track 10 and can move up and down along the track. The telescopic end of the first cylinder 9 is horizontally connected to the magnetization and demagnetization head 13. The second cylinder 11 is installed on the mounting plate 2, and its telescopic end is connected to the second track 12. The second track 12 is horizontally arranged, and the magnetization and demagnetization head 13 is assembled in the second track 12 and can move horizontally along the track. Under the action of the first cylinder 9, the magnetization and demagnetization head 13 can move horizontally along the second track 12. Under the action of the second cylinder 11, the magnetization and demagnetization head 13 and the first cylinder 9 can realize lifting. The horizontal movement accuracy of the magnetization and demagnetization head is ±0.1 mm, and the lifting stroke is 5 - 30 mm, which can fully adapt to the space in the cavity and meet the need for the magnetization and demagnetization head to accurately move above each magnet and lift flexibly. The magnetization and demagnetization head 13 has a magnetization and demagnetization groove 14 for accommodating the top of the magnet. A power connection part 15 capable of conducting electricity is arranged in the magnetization and demagnetization groove 13. At the same time, a heating element 16 (a heating wire in this example) is arranged in the magnetization and demagnetization groove 14. In order to realize the magnetization and demagnetization of each magnet, the top of the magnet 6 exposes the surface of the fixing plate 17, so that the demagnetization and magnetization head 13 can be sleeved on the top of the magnet. The fixing plate 17 is made of a heat-insulating material, and its thermal conductivity is ≤2 W / (m·K), which can prevent the heat generated in the magnetization and demagnetization groove from being transferred to the adjacent magnets and causing demagnetization to them.
[0023] Based on the above magnetron assembly with magnetization and demagnetization functions, the process of magnetizing and demagnetizing the magnets in the present invention is as follows: Step 1, insert the magnet into the fixing plate, the top of the magnet exposes the upper surface of the fixing plate, and the bottom of the magnet is electrically connected to the power connection plate. The second cylinder is in the initial position, that is, the telescopic end of the second cylinder is in the retracted state, and the magnetization and demagnetization head is lifted above the upper end face of the magnet.
[0024] Step 2: When magnetization or demagnetization of the magnet is required, control the rotation of the magnetic control component to move the magnet to be magnetized or demagnetized to a suitable position, so that the magnet, the magnetization / demagnetization head, and the center of the magnetic control component are in the same plane. The rotation speed of the magnetic control component driven by the motor is 50 - 100 rpm, and the positioning error is ≤0.5°. Control the first cylinder to extend and retract to drive the magnetization / demagnetization head to move horizontally along the second track above the magnet to be magnetized or demagnetized; control the telescopic end of the second cylinder to extend to drive the magnetization / demagnetization head to descend along the first track, so that the magnetization / demagnetization groove is sleeved on the top of the magnet.
[0025] Step 3: When magnetization is required, apply pulsed direct current to the power connection part and the power connection plate, with a voltage range of 50 - 1000 W and a pulse width of 10 - 500 µs. This voltage design can solve the problem of magnetic domain disorder caused by traditional constant current magnetization; since the magnetization / demagnetization groove is pressed on the top of the magnet, magnetization of the magnet can be achieved by connecting direct current to both ends of the magnet. When demagnetization is required, start the heating element to heat the magnet to 200 - 450 °C, maintain it for 5 - 30 seconds and then cool it naturally to demagnetize the magnet. During the demagnetization process, the heating rate is controlled at 5 - 20 °C / s, and the cooling rate is ≤10 °C / min. Controlling at this heating / cooling rate can avoid microcracks in the magnet caused by thermal shock. As an improvement, the present invention verifies the working effect of the magnetization / demagnetization head: after magnetization or demagnetization is completed, reset the magnetization / demagnetization head to the initial position, detect the magnetic field strength with a gaussmeter. If the magnetic field strength does not reach the preset magnetic field target value and exceeds the allowable error range, for example, the deviation > 5%, then adjust the magnetization intensity. The adjustment method can be any one of the following: Gradient compensation method: Perform secondary magnetization on the target magnet when the voltage is increased by 10 - 30%. Local enhancement method: Activate 1 - 2 magnets in the weak magnetic field area where the magnetic field strength does not reach the target value and magnetize these magnets to enhance the magnetic field strength in this area. Since magnetization / demagnetization operations are affected by many factors such as material properties, temperature fluctuations, and mechanical positioning errors, there may be deviations in the magnetic field distribution after a single operation. The present invention quantifies the deviation and takes targeted adjustment measures to improve the magnetic field accuracy and the reliability of the system, making the magnetic field of the magnetic control component meet the expectations.
[0026] Based on the above method, the number and position of the magnets in the magnetic control component can be changed through demagnetization and magnetization.
[0027] As an improvement, we can also adopt an automated degaussing and magnetizing method, display the model of the magnet control component and the magnets on it in the control interface, and each magnet is an interactive control. Select the corresponding magnet on the interface and click the magnetizing or degaussing function, then the functions of Step 2 and Step 3 can be realized through the background software to magnetize or demagnetize the selected magnet. When it is necessary to magnetize or demagnetize multiple magnets, the working sequence of the motor and cylinder can be optimized according to the positions of the multiple magnets. For example, the magnets close to the magnetizing and demagnetizing head are operated first to save resources. When some of the multiple magnets need to be magnetized while some need to be demagnetized, the magnets that need the same type of operation should be given priority. For example, magnetize multiple magnets first and then demagnetize multiple magnets.
[0028] It should be noted that the above content only illustrates the technical idea of the present invention and cannot be used to limit the protection scope of the present invention. For those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and refinements can be made, and these improvements and refinements all fall within the protection scope of the claims of the present invention.
Claims
1. A magnetron component with magnetization and demagnetization functions, which is assembled on the mounting plate inside the cavity of a magnetron sputtering device, and is characterized in that It includes a magnetization and demagnetization module, a fixing plate, and a plurality of magnets arranged in the fixing plate. The top of the magnet is higher than the upper surface of the fixing plate, and the bottom forms an electrical connection with the power connection plate. The magnetization and demagnetization module includes a first cylinder, a first track, a second cylinder, a second track, and a magnetization and demagnetization head. The first track is longitudinally installed in the cavity, the first cylinder is arranged on the first track and can move longitudinally along the first track. The telescopic end of the first cylinder is transversely connected to the magnetization and demagnetization head. The second cylinder is fixed on the mounting plate, and its telescopic end is connected to the second track. The second track is transversely arranged, and the magnetization and demagnetization head is assembled in the second track and can move transversely along the second track. The magnetization and demagnetization head has a magnetization and demagnetization groove for accommodating the top of the magnet, and an electrical connection part and a heating element are arranged in the magnetization and demagnetization groove.
2. The magnetron component with magnetization and demagnetization functions according to claim 1, characterized in that, The magnet is connected to the power connection plate through an antenna. The antenna is an elastic copper sheet, and the contact surface between the antenna and the bottom of the magnet is gold-plated, and the contact resistance ≤ 0.1 ohm.
3. The magnetically controlled component with magnetization and demagnetization functions according to claim 1, wherein The fixing plate is made of a heat-insulating material, and the thermal conductivity ≤ 2W / (m·K).
4. The magnetron component with magnetization and demagnetization functions according to claim 1, characterized in that, The magnetron assembly is connected to the motor.
5. Method for magnetizing and demagnetizing magnets in a magnetron component, characterized in that, Based on the magnetron assembly with magnetization and demagnetization functions described in any one of claims 1-4, the following steps are included: Step 1: Install the magnet on the fixing plate. The top of the magnet protrudes from the upper surface of the fixing plate, and the bottom of the magnet forms an electrical connection with the power connection plate. Step 2: When magnetization or demagnetization of the magnet is required, the motor drives the magnetron assembly to rotate, so that the magnet to be magnetized or demagnetized moves to a suitable position. Control the first cylinder to expand and contract, and drive the magnetization and demagnetization head to move transversely above the magnet to be magnetized or demagnetized. Control the telescopic end of the second cylinder to extend, and drive the magnetization and demagnetization head to descend, so that the magnetization and demagnetization groove sleeves on the top of the magnet to be magnetized or demagnetized. Step 3: When magnetization is required, apply pulsed direct current to the electrical connection part and the power connection plate, with a voltage range of 50-1000W and a pulse width of 10-500µs, and the magnet is magnetized. When demagnetization is required, start the heating element to heat the magnet to 200-450 °C, maintain it for 5-30 seconds and then cool it naturally, and the magnet is demagnetized. After magnetization or demagnetization is completed, reset the magnetization and demagnetization head to the initial position, detect the magnetic field intensity, and if the magnetic field intensity does not reach the preset magnetic field target value, adjust it.
6. The magnet charging and demagnetizing method of the magnet in the magnetron component according to claim 5, characterized in that, In step 1, the telescopic end of the second cylinder is in the retracted state, and the magnetization and demagnetization head is lifted above the upper end face of the magnet.
7. The magnet charging and demagnetizing method of the magnet in the magnetron component according to claim 5, characterized in that, The suitable position in step 2 is that the magnet to be magnetized or demagnetized, the magnetization and demagnetization head, and the center of the magnetron assembly are in the same plane.
8. The magnet charging and demagnetizing method of the magnet in the magnetron component according to claim 5, characterized in that, In step 2, the rotation speed of the motor driving the magnetron assembly to rotate is 50-100rpm, and the positioning error ≤ 0.5°.
9. The magnetization and demagnetization method of the magnet in the magnetron component according to claim 5, characterized in that During the demagnetization process in step 3, the heating rate is 5-20°C / s, and the cooling rate ≤ 10°C / min.
10. The magnet charging and demagnetizing method of the magnet in the magnetron component according to claim 5, characterized in that, In step 3, the adjustment method adopts any one of the following methods: Gradient compensation method: The voltage is increased by 10-30%, and the target magnet is magnetized twice. Local enhancement method: Magnetize several magnets in the weak magnetic field area where the magnetic field intensity does not reach the target value.
Citation Information
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