Gas mixing system, method and semiconductor process equipment

Abstract

The present invention relates to a gas mixing system, method, and semiconductor process equipment, comprising a first gas input unit, a second gas input unit, a first mixing unit, a second mixing unit, a first pressure relief unit, a second pressure relief unit, a mixing control unit, and a first output unit. Advantages of the system include: by inputting gases of different pressures into the first mixing unit and the second mixing unit through the first gas input unit and the second gas input unit, respectively, the pressure difference between the two gases can be utilized to achieve rapid mixing of the first gas and the second gas, thereby making the gas mixture concentration more stable; by connecting the first pressure relief unit and the second pressure relief unit to the first mixing unit and the second mixing unit, respectively, the pressure inside the first mixing unit and the second mixing unit can be ensured to be stable; in addition, the gas mixing method of the present invention can achieve high-pressure gas mixing without being restricted by pressure, and can be used to mix H2 gas at a pressure of 40 psi and the corresponding N2 gas at a pressure of 960 psi.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor process gas processing technology, and in particular to a gas mixing system, method and semiconductor process equipment. Background Art

[0002] In semiconductor manufacturing, precise gas mixing is crucial to ensuring high-quality production of semiconductor devices. Semiconductor processing involves numerous complex steps, such as etching, deposition, and doping, all of which rely heavily on gas mixtures with specific compositions and ratios.

[0003] Chinese invention patent CN109316987A discloses a gas mixing method and system. The system includes an air intake device, a gas mixing device, and a gas conditioning box. The gas mixing device includes a gas mixing tank and a vacuum pump. The gas mixing tank is connected to the end of the gas pipeline away from the gas supply cylinder. The inlet of the vacuum pump is connected to the gas mixing tank and the gas conditioning box, respectively, and the outlet of the gas mixing tank is connected to the inlet of the gas conditioning box. The gas mixing tank is provided with a pressure controller for detecting the gas pressure within the gas mixing tank. The method uses Dalton's law of partial pressures to convert the difficult-to-measure volume variable into a more easily measurable pressure variable. Based on the partial pressures of the gases in the gas mixing tank, the volume ratio of the gas components in the resulting mixed gas is determined. This method overcomes the errors introduced by traditional flow meters or dual-link proportional control valves due to the influence of gas density, turbulence, etc., and improves the stability of the entire gas mixing system.

[0004] However, the prior art has the following defects:

[0005] 1. The existing gas mixing method is limited to first distributing and then pumping into a container for mixing, which cannot achieve real-time gas mixing and use;

[0006] 2. Existing gas mixing equipment has no temperature control. Since the mole fraction of gas varies under different temperature environments, even with pressure, it is impossible to ensure that the mixing effect is consistent each time when it is disturbed by external factors.

[0007] 3. Existing gas mixing equipment only charges different gases into the same tank for mixed gases, and further mixes them in the tank. It cannot achieve immediate supply. The gases need to be mixed and stabilized before use, which takes a long time.

[0008] Currently, no effective solutions have been proposed for the problems existing in related technologies, such as the inability to quickly mix mixed gases, the inability to supply mixed gases in real time, and the susceptibility of mixed gases to external interference. Summary of the Invention

[0009] The purpose of the present invention is to address the deficiencies in the prior art and provide a gas mixing system, method and semiconductor process equipment to solve the problems existing in the related art, such as the inability to quickly mix mixed gases, the inability to supply mixed gases in real time, and the susceptibility of mixed gases to external interference.

[0010] To achieve the above object, the technical solution adopted by the present invention is:

[0011] In a first aspect, the present invention provides a gas mixing system comprising:

[0012] a first gas input unit, the first gas input unit being in communication with a first gas source and configured to deliver a first gas;

[0013] a second gas input unit, the second gas input unit being in communication with a second gas source and configured to deliver a second gas;

[0014] a first mixing unit, the first mixing unit being in communication with the first gas input unit and being configured to store the first gas and mix the first gas with the second gas;

[0015] a second mixing unit, the second mixing unit being in communication with the second gas input unit and being configured to store the second gas and mix the second gas with the first gas;

[0016] a first pressure relief unit, the first pressure relief unit being in communication with the first mixing unit, and configured to control the pressure of the first mixing unit by pressure relief so that the pressure of the first gas meets a mixing requirement;

[0017] a second pressure relief unit, the second pressure relief unit being in communication with the second mixing unit, and configured to control the pressure of the second mixing unit by pressure relief so that the pressure of the second gas meets a mixing requirement;

[0018] a mixing control unit, the mixing control unit being in communication with the first mixing unit and the second mixing unit, respectively, and being configured to connect the first mixing unit with the second mixing unit in an open state so as to mix the first gas with the second gas;

[0019] The first output unit is connected to the first mixing unit and the second mixing unit respectively, and is used to output the mixed gas formed by mixing the first gas and the second gas to the outside.

[0020] In some embodiments, further comprising:

[0021] A temperature control unit is connected to the first mixing unit and the second mixing unit respectively, and is used to control the temperature of the first mixing unit and the second mixing unit.

[0022] In some embodiments, further comprising:

[0023] a buffer unit, the buffer unit being in communication with the first output unit and being configured to buffer the mixed gas;

[0024] The second output unit is connected to the buffer unit, the first output unit, and the process machine respectively, and is used to output the mixed gas.

[0025] In some embodiments, further comprising:

[0026] a first analyzing unit, the first analyzing unit being in communication with the first mixing unit and the second mixing unit, respectively, and being configured to analyze the concentration of the mixed gas;

[0027] The second analyzing unit is connected to the second output unit and is used to analyze the concentration of the mixed gas.

[0028] In a second aspect, the present invention further provides a semiconductor process equipment, comprising:

[0029] A gas mixing system as described in the first aspect.

[0030] In a third aspect, the present invention further provides a gas mixing method, which is applied to the gas mixing system as described in the first aspect or the semiconductor process equipment as described in the second aspect, comprising:

[0031] The first gas input unit obtains and delivers the first gas to the first mixing unit;

[0032] The second gas input unit obtains and delivers the second gas to the second mixing unit;

[0033] Determine whether the pressure of the first mixing unit reaches a first preset pressure threshold and whether the pressure of the second mixing unit reaches a second preset pressure threshold;

[0034] When the pressure of the first mixing unit does not reach the first preset pressure threshold and / or the pressure of the second mixing unit does not reach the second preset pressure threshold, opening the first pressure relief unit and / or the second pressure relief unit to adjust the pressure of the first mixing unit and / or the pressure of the second mixing unit until the pressure of the first mixing unit reaches the first preset pressure threshold and / or the pressure of the second mixing unit reaches the second preset pressure threshold;

[0035] When the pressure of the first mixing unit reaches a first preset pressure threshold and the pressure of the second mixing unit reaches a second preset pressure threshold, the mixing control unit is turned on to connect the first mixing unit with the second mixing unit and mix the first gas and the second gas to obtain a mixed gas;

[0036] When the mixing is completed, the first output unit obtains and outputs the mixed gas to the outside.

[0037] In some embodiments, before determining whether the pressure of the first mixing unit reaches a first preset pressure threshold and whether the pressure of the second mixing unit reaches a second preset pressure threshold, the method further includes:

[0038] The temperature control unit is turned on to adjust the temperature of the first mixing unit and the temperature of the second mixing unit until the temperature of the first mixing unit reaches a temperature threshold and the temperature of the second mixing unit reaches a temperature threshold.

[0039] In some embodiments, after starting the hybrid control unit, the method further includes:

[0040] The temperature control unit is turned on to perform temperature increase and / or temperature decrease control on the first mixing unit and the second mixing unit to achieve gas heat convection.

[0041] In some embodiments, after the first output unit obtains and outputs the mixed gas, the method further includes:

[0042] The buffer unit obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed;

[0043] The second output unit obtains the mixed gas and delivers the mixed gas to the process machine.

[0044] In some embodiments, further comprising:

[0045] The first concentration analysis unit obtains the mixed gas delivered by the first output unit and detects the concentration of the mixed gas.

[0046] In some embodiments, further comprising:

[0047] The second concentration analysis unit obtains the mixed gas delivered by the second output unit and detects the concentration of the mixed gas.

[0048] The present invention adopts the above technical solution, which has the following technical effects compared with the prior art:

[0049] The present invention provides a gas mixing system, method and semiconductor process equipment, in which gases of different pressures are input into the first mixing unit and the second mixing unit respectively through the first gas input unit and the second gas input unit, and the pressure difference between the two gases is utilized to achieve rapid mixing of the first gas and the second gas, and the concentration of the mixed gas is made more stable; by connecting the first pressure relief unit and the second pressure relief unit to the first mixing unit and the second mixing unit respectively, the pressure inside the first mixing unit and the second mixing unit can be ensured to be stable; in addition, the present application utilizes Dalton's law of partial pressures for gas mixing, and since the pressure release is instantaneous, the mixed gas can be prepared quickly and in large quantities, and the supply of ultra-large flow systems can still be used, and the adaptability is high; furthermore, the gas mixing method of the present invention can achieve high-pressure gas mixing, is not limited by pressure, and can introduce H2 gas with a pressure of 40psi and the corresponding N2 gas with a pressure of 960psi for mixing, further improving applicability. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] Figure 1 1 is a schematic diagram of a simplified framework of a gas mixing system according to Example 1 of the present invention;

[0051] Figure 2 is a detailed schematic diagram of the gas mixing system according to Example 1 of the present invention;

[0052] Figure 3 is a schematic diagram of a simplified framework of a gas mixing system according to Example 2 of the present invention;

[0053] Figure 4 is a detailed schematic diagram of the gas mixing system according to Example 2 of the present invention;

[0054] Figure 5 is a schematic diagram of a simplified framework of a gas mixing system according to Example 3 of the present invention;

[0055] Figure 6 is a detailed schematic diagram of the gas mixing system according to Example 3 of the present invention;

[0056] Figure 7 is a schematic diagram of a simplified framework of a gas mixing system according to Example 4 of the present invention;

[0057] Figure 8 is a detailed schematic diagram of the gas mixing system according to Example 4 of the present invention;

[0058] Figure 9 is a schematic diagram of a simplified framework of a gas mixing system according to Example 5 of the present invention;

[0059] Figure 10 is a detailed schematic diagram of the gas mixing system according to Example 5 of the present invention (I);

[0060] Figure 11 is a detailed schematic diagram of the gas mixing system according to Example 5 of the present invention (II);

[0061] Figure 12 is a schematic diagram of a simplified framework of a gas mixing system according to Example 6 of the present invention;

[0062] Figure 13 is a detailed schematic diagram of the gas mixing system according to Example 6 of the present invention;

[0063] Figure 14 is a schematic diagram of a simplified framework of a gas mixing system according to Example 7 of the present invention;

[0064] Figure 15 is a detailed schematic diagram of the gas mixing system according to Example 7 of the present invention;

[0065] Figure 16 This is a specific embodiment of the gas mixing system according to embodiment 10 of the present invention.

[0066] The figures are marked as follows: 100, first gas input unit; 101, first control valve element; 102, first pressure regulating element; 103, first pressure monitoring element; 104, second pressure monitoring element; 105, twenty-third control valve element; 106, tenth one-way valve element; 107, twenty-fourth control valve element; 108, twenty-fifth control valve element; 200, second gas input unit; 201, second control valve element; 202, second pressure regulating element; 203, third pressure monitoring element; 204, fourth pressure monitoring element; 300, first mixing unit; 301, first mixing element; 302, third control valve element; 303, fifth pressure monitoring element; 304, first temperature monitoring element Component; 400, second mixing unit; 401, second mixing element; 402, fourth control valve element; 403, sixth pressure monitoring element; 404, second temperature monitoring element; 500, first pressure relief unit; 501, first one-way valve element; 600, second pressure relief unit; 601, second one-way valve element; 700, mixing control unit; 701, fifth control valve element; 800, first output unit; 801, first vacuum element; 802, sixth control valve element; 803, seventh control valve element; 900, temperature control unit; 901, eighth control valve element; 902, ninth control valve element; 1000, buffer unit; 1001, buffer element; 1002, tenth control valve element; 1 100, second output unit; 1101, eleventh control valve element; 1102, twelfth control valve element; 1103, thirteenth control valve element; 1104, third pressure regulating element; 1105, seventh pressure monitoring element; 1200, first analysis unit; 1201, first analysis element; 1202, fourteenth control valve element; 1203, third one-way valve element; 1204, fourth pressure regulating element; 1205, eighth pressure monitoring element; 1300, second analysis unit; 1301, second analysis element; 1302, fifteenth control valve element; 1303, fourth one-way valve element; 1304, fifth pressure regulating element; 1305, ninth pressure monitoring element; 1400, exhaust emission unit; 1 401, the sixteenth control valve element; 1402, the fifth one-way valve element; 1403, the seventeenth control valve element; 1404, the eighteenth control valve element; 1405, the sixth one-way valve element; 1406, the seventh one-way valve element; 1407, the eighth one-way valve element; 1500, the purge unit; 1501, the second vacuum element; 1502, the nineteenth control valve element; 1503, the ninth one-way valve element; 1504, the twentieth control valve element; 1505, the twenty-first control valve element; 1506, the twenty-second control valve element; 1600, the third gas input unit; 1601, the twenty-sixth control valve element; 1700, the backup mixed gas supply unit; 1701, the twenty-seventh control valve element. DETAILED DESCRIPTION

[0067] In order to make the purpose, technical solutions and advantages of this application more clearly understood, the present application is described and illustrated below in conjunction with the accompanying drawings and examples. It should be understood that the specific embodiments described herein are merely used to explain this application and are not intended to limit this application. Based on the embodiments provided in this application, all other embodiments obtained by those of ordinary skill in the art without making any creative efforts are within the scope of protection of this application.

[0068] Obviously, the drawings described below are merely examples or embodiments of the present application. Those skilled in the art can, without inventive effort, apply the present application to other similar scenarios based on these drawings. Furthermore, it is also understood that, although the effort involved in such a development process may be complex and lengthy, for those skilled in the art related to the content disclosed in this application, changes in design, manufacturing, or production based on the technical content disclosed in this application are merely conventional technical means and should not be construed as an insufficiency of the content disclosed in this application.

[0069] References to "embodiments" in this application mean that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it refer to independent or alternative embodiments that are mutually exclusive of other embodiments. It is understood, both explicitly and implicitly, by those skilled in the art that the embodiments described in this application may be combined with other embodiments unless there is a conflict.

[0070] Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by persons of ordinary skill in the art to which this application belongs. The terms "a," "an," "an," "the," and similar expressions used herein do not denote quantitative limitations and may refer to either the singular or the plural. The terms "comprise," "include," "have," and any variations thereof, used herein, are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or apparatus comprising a series of steps or modules (units) is not limited to the listed steps or units but may also include steps or units not listed, or may include other steps or units inherent to the process, method, product, or apparatus. The terms "connected," "connected," "coupled," and similar expressions used herein are not limited to physical or mechanical connections but may include electrical connections, whether direct or indirect. As used herein, "plurality" means two or more. "And / or" describes an association between associated objects, indicating that three possible relationships exist. For example, "A and / or B" may mean: A exists alone; A and B exist simultaneously; or B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific order for the objects.

[0071] Example 1

[0072] An exemplary embodiment of the present invention is as follows Figure 1As shown, a gas mixing system includes a first gas input unit 100, a second gas input unit 200, a first mixing unit 300, a second mixing unit 400, a first pressure relief unit 500, a second pressure relief unit 600, a mixing control unit 700 and a first output unit 800. The first gas input unit 100 is connected to the first gas source for delivering the first gas; the second gas input unit 200 is connected to the second gas source for delivering the second gas; the first mixing unit 300 is connected to the first gas input unit 100 for storing the first gas and mixing the first gas with the second gas; the second mixing unit 400 is connected to the second gas input unit 200 for storing the second gas and mixing the second gas with the first gas; the first pressure relief unit 500 is connected to the first mixing unit 300 for controlling the pressure of the first mixing unit 300 by pressure relief so that the first gas The pressure of the second gas meets the mixing requirements; the second pressure relief unit 600 is communicated with the second mixing unit 400, and is used to control the pressure of the second mixing unit 400 by pressure relief so that the pressure of the second gas meets the mixing requirements; the mixing control unit 700 is communicated with the first mixing unit 300 and the second mixing unit 400 respectively, and is used to communicate the first mixing unit 300 with the second mixing unit 400 in the open state so that the first gas and the second gas are mixed; the first output unit 800 is communicated with the first mixing unit 300 and the second mixing unit 400 respectively, and is used to output the mixed gas of the first gas and the second gas to the outside.

[0073] It should be noted that the first end and the second end in the present invention are respectively two ends in the length direction.

[0074] It should be noted that the first gas source includes but is not limited to a nitrogen source; the second gas source includes but is not limited to a hydrogen source.

[0075] like Figure 2 As shown, the first gas input unit 100 includes a first gas input element, a first control valve element 101, a first pressure regulating element 102, a first pressure monitoring element 103, and a second pressure monitoring element 104. The first gas input element is connected to the first gas source and the first mixing unit 300, respectively, for delivering the first gas; the first control valve element 101 is provided on the first gas input element for controlling the flow of the first gas into the first gas input element; the first pressure regulating element 102 is provided on the first gas input element for regulating the pressure of the first gas input element; the first pressure monitoring element 103 is connected to the first gas input element for monitoring the pressure upstream and downstream of the first pressure regulating element 102; and the second pressure monitoring element 104 is connected to the first gas input element for monitoring the pressure of the first gas flowing into the first mixing unit 300.

[0076] Specifically, a first end of the first gas input element is communicated with the first gas source, and a second end of the first gas input element is communicated with the first mixing unit 300 .

[0077] In some embodiments, the first gas input element includes but is not limited to a stainless steel tube.

[0078] Specifically, the first control valve element 101 includes a first manual diaphragm valve and a second manual diaphragm valve. The first manual diaphragm valve is disposed on the first gas input element and is used to manually control the flow between the first gas input element and the first gas source. The second manual diaphragm valve is disposed downstream of the first manual diaphragm valve and is used to manually control the flow between the first gas input element and the first mixing unit 300.

[0079] In some embodiments, the first control valve element 101 includes, but is not limited to, a diaphragm valve.

[0080] Specifically, the first pressure regulating element 102 is located downstream of the first manual diaphragm valve and upstream of the second manual diaphragm valve.

[0081] In some embodiments, the first pressure regulating element 102 includes but is not limited to a pressure regulating valve.

[0082] Specifically, the first pressure monitoring element 103 includes a first pressure gauge and a second pressure gauge. The first pressure gauge is connected to the first gas input element, and the connection point between the first pressure gauge and the first gas input element is located downstream of the first manual diaphragm valve and upstream of the first pressure regulating element 102. The second pressure gauge is connected to the first gas input element, and the connection point between the second pressure gauge and the first gas input element is located downstream of the first pressure regulating element 102 and upstream of the second manual diaphragm valve.

[0083] In some embodiments, the first pressure monitoring element 103 includes but is not limited to a pressure gauge.

[0084] Specifically, the second pressure monitoring element 104 includes a first pressure sensor, wherein the first pressure sensor is connected to the first gas input element, and the connection point between the first pressure sensor and the first gas input element is located downstream of the second manual diaphragm valve.

[0085] In some embodiments, the second pressure monitoring element 104 includes but is not limited to a pressure sensor.

[0086] like Figure 2As shown, the second gas input unit 200 includes a second gas input element, a second control valve element 201, a second pressure regulating element 202, a third pressure monitoring element 203, and a fourth pressure monitoring element 204. The second gas input element is connected to the second gas source and the second mixing unit 400, respectively, for delivering the second gas. The second control valve element 201 is provided on the second gas input element for controlling the flow of the second gas into the second gas input element. The second pressure regulating element 202 is provided on the second gas input element for regulating the pressure of the second gas input element. The third pressure monitoring element 203 is connected to the second gas input element for monitoring the pressure upstream and downstream of the second pressure regulating element 202. The fourth pressure monitoring element 204 is connected to the second gas input element for monitoring the pressure of the second gas flowing into the second mixing unit 400.

[0087] Specifically, a first end of the second gas input element is communicated with the second gas source, and a second end of the second gas input element is communicated with the second mixing unit 400 .

[0088] In some of the embodiments, the second gas input element includes but is not limited to a stainless steel tube.

[0089] Specifically, the second control valve element 201 includes a third manual diaphragm valve and a fourth manual diaphragm valve. The third manual diaphragm valve is disposed on the second gas input element and is used to manually control the flow between the second gas input element and the second gas source. The fourth manual diaphragm valve is disposed on the second gas input element and downstream of the third manual diaphragm valve and is used to manually control the flow between the second gas input element and the second mixing unit 400.

[0090] In some embodiments, the second control valve element 201 includes, but is not limited to, a diaphragm valve.

[0091] Specifically, the second pressure regulating element 202 is located downstream of the third manual diaphragm valve and upstream of the fourth manual diaphragm valve.

[0092] In some embodiments, the second pressure regulating element 202 includes but is not limited to a pressure regulating valve.

[0093] Specifically, the third pressure monitoring element 203 includes a third pressure gauge and a fourth pressure gauge. The third pressure gauge is connected to the second gas input element, and the connection point between the third pressure gauge and the second gas input element is located downstream of the third manual diaphragm valve and upstream of the second pressure regulating element 202. The fourth pressure gauge is connected to the second gas input element, and the connection point between the fourth pressure gauge and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve.

[0094] In some embodiments, the third pressure monitoring element 203 includes but is not limited to a pressure gauge.

[0095] Specifically, the fourth pressure monitoring element 204 includes a second pressure sensor, wherein the second pressure sensor is connected to the second gas input element, and the connection point between the second pressure sensor and the second gas input element is located downstream of the fourth manual diaphragm valve.

[0096] In some embodiments, the fourth pressure monitoring element 204 includes but is not limited to a pressure sensor.

[0097] like Figure 2 As shown, the first mixing unit 300 includes a first mixing element 301, a third control valve element 302, and a fifth pressure monitoring element 303. The first mixing element 301 is connected to the first gas input unit 100, the first pressure relief unit 500, the mixing control unit 700, and the first output unit 800, respectively, and is used to store the first gas and mix the first gas with the second gas. The third control valve element 302 is provided at the gas inlet and gas outlet of the first mixing element 301, and is used to control the flow of gas through the first mixing element 301. The fifth pressure monitoring element 303 is connected to the first mixing element 301, and is used to monitor the pressure inside the first mixing element 301.

[0098] Specifically, the first mixing element 301 includes a first gas storage chamber, a first gas inlet, a first gas outlet, a first pressure relief port, and a first gas mixing port. The first gas inlet is located at the top of the first gas storage chamber and communicates with the second end of the first gas input element; the first gas outlet is located at the bottom of the first gas storage chamber and communicates with the first output unit 800; the first pressure relief port is located at the side of the first gas storage chamber and communicates with the first pressure relief unit 500; and the first gas mixing port is located at the side of the first gas storage chamber and communicates with the mixing control unit 700.

[0099] In some embodiments, the first mixing element 301 includes, but is not limited to, a container.

[0100] It should be noted that the volume of the first mixing element 301 is 3 L to 15 L. Preferably, the volume of the first mixing element 301 is 5 L.

[0101] Specifically, the third control valve element 302 includes a first pneumatic diaphragm valve, a second pneumatic diaphragm valve, and a third pneumatic diaphragm valve. The first pneumatic diaphragm valve is located at the first air inlet and automatically controls the flow between the first mixing element 301 and the first gas input element. The second pneumatic diaphragm valve is located at the first air outlet and automatically controls the flow between the first mixing element 301 and the first output unit 800. The third pneumatic diaphragm valve is located at the first pressure relief port and automatically controls the flow between the first mixing element 301 and the first pressure relief unit 500.

[0102] In some embodiments, the third control valve element 302 includes, but is not limited to, a diaphragm valve.

[0103] Specifically, the fifth pressure monitoring element 303 includes a third pressure sensor, wherein the third pressure sensor is in communication with the first gas storage cavity of the first mixing element 301 .

[0104] In some embodiments, the fifth pressure monitoring element 303 includes but is not limited to a pressure sensor.

[0105] like Figure 2 As shown, the second mixing unit 400 includes a second mixing element 401, a fourth control valve element 402, and a sixth pressure monitoring element 403. The second mixing element 401 is connected to the second gas input unit 200, the second pressure relief unit 600, the mixing control unit 700, and the first output unit 800, respectively, and is used to store the second gas and mix the second gas with the first gas. The fourth control valve element 402 is provided at the gas inlet and gas outlet of the second mixing element 401, and is used to control the flow of gas through the second mixing element 401. The sixth pressure monitoring element 403 is connected to the second mixing element 401, and is used to monitor the pressure inside the second mixing element 401.

[0106] Specifically, the second mixing element 401 includes a second gas storage chamber, a second gas inlet, a second gas outlet, a second pressure relief port, and a second gas mixing port. The second gas inlet is located at the top of the second gas storage chamber and communicates with the second end of the second gas input element; the second gas outlet is located at the bottom of the second gas storage chamber and communicates with the first output unit 800; the second pressure relief port is located at the side of the second gas storage chamber and communicates with the second pressure relief unit 600; and the second gas mixing port is located at the side of the second gas storage chamber and communicates with the mixing control unit 700.

[0107] In some embodiments, the second mixing element 401 includes, but is not limited to, a container.

[0108] It should be noted that the volume of the second mixing element 401 is 3 L to 15 L. Preferably, the volume of the second mixing element 401 is 5 L.

[0109] Specifically, the fourth control valve element 402 includes a fourth pneumatic diaphragm valve, a fifth pneumatic diaphragm valve, and a sixth pneumatic diaphragm valve. The fourth pneumatic diaphragm valve is located at the second air inlet and automatically controls the flow between the second mixing element 401 and the second gas input element. The fifth pneumatic diaphragm valve is located at the second air outlet and automatically controls the flow between the second mixing element 401 and the first output unit 800. The sixth pneumatic diaphragm valve is located at the second pressure relief port and automatically controls the flow between the second pressure relief port and the second pressure relief unit 600.

[0110] In some embodiments, the fourth control valve element 402 includes, but is not limited to, a diaphragm valve.

[0111] Specifically, the sixth pressure monitoring element 403 includes a fourth pressure sensor, wherein the fourth pressure sensor is in communication with the second gas storage cavity of the second mixing element 401 .

[0112] In some embodiments, the sixth pressure monitoring element 403 includes but is not limited to a pressure sensor.

[0113] like Figure 2 As shown, the first pressure relief unit 500 includes a first pressure relief piping element and a first one-way valve element 501. The first pressure relief piping element is connected to the first mixing unit 300 and the exhaust gas treatment device respectively, and is used to transport the first gas. The first one-way valve element 501 is provided in the first pressure relief piping element to ensure one-way flow of the gas.

[0114] Specifically, the first end of the first pressure relief piping element is in communication with the first pressure relief port of the first mixing element 301 , and the second end of the first pressure relief piping element is in communication with the exhaust gas treatment device.

[0115] In some of these embodiments, the first pressure relief line component includes, but is not limited to, a stainless steel pipe.

[0116] In some embodiments, the first one-way valve element 501 includes but is not limited to a one-way valve.

[0117] like Figure 2 As shown, the second pressure relief unit 600 includes a second pressure relief piping element and a second one-way valve element 601. The second pressure relief piping element is connected to the second mixing unit 400 and the exhaust gas treatment device respectively for conveying the second gas; the second one-way valve element 601 is provided in the second pressure relief piping element for ensuring one-way flow of the gas.

[0118] Specifically, the first end of the second pressure relief piping element is in communication with the second pressure relief port of the second mixing element 401 , and the second end of the second pressure relief piping element is in communication with the exhaust gas treatment device.

[0119] In some of these embodiments, the second pressure relief line component includes, but is not limited to, a stainless steel tube.

[0120] In some embodiments, the second one-way valve element 601 includes but is not limited to a one-way valve.

[0121] like Figure 2As shown, the mixing control unit 700 includes a connecting pipe element and a fifth control valve element 701. The connecting pipe element is connected to the first mixing unit 300 and the second mixing unit 400 respectively, and is used to mix the first gas and the second gas. The fifth control valve element 701 is provided in the connecting pipe element and is used to control the flow of the connecting pipe element.

[0122] Specifically, the first end of the communicating pipe element is communicated with the first gas mixing port of the first mixing element 301 , and the second end of the communicating pipe element is communicated with the second gas mixing port of the second mixing element 401 .

[0123] In some embodiments, the connecting pipe element includes but is not limited to a stainless steel pipe.

[0124] Specifically, the fifth control valve element 701 includes a seventh pneumatic diaphragm valve, wherein the seventh pneumatic diaphragm valve is provided in the communication pipeline element for automatically controlling the flow between the first mixing element 301 and the second mixing element 401 .

[0125] In some embodiments, the fifth control valve element 701 includes, but is not limited to, a diaphragm valve.

[0126] like Figure 2 As shown, the first output unit 800 includes a first output element, a second output element, a third output element, a first vacuum element 801, a sixth control valve element 802, a bypass pipeline element, and a seventh control valve element 803. The first output element is connected to the first mixing unit 300 for delivering mixed gas; the second output element is connected to the second mixing unit 400 for delivering mixed gas; the third output element is connected to the first and second output elements, respectively, for delivering mixed gas; the first vacuum element 801 is provided at the third output element for vacuuming the first and second mixing units 300 and 400; the sixth control valve element 802 is provided at the third output element, downstream of the first vacuum element 801, for controlling the flow of gas through the third output element; the bypass pipeline element is connected to the third output element, with both ends of the bypass pipeline element connecting to the third output element located upstream and downstream of the first vacuum element 801, respectively, for delivering the mixed gas outward; and the seventh control valve element 803 is provided at the bypass pipeline element for controlling the flow of gas through the bypass pipeline element.

[0127] Specifically, the first end of the first output element is communicated with the first air outlet of the first mixing element 301 , and the second end of the first output element is communicated with the first end of the third output element.

[0128] In some embodiments, the first output element includes but is not limited to a stainless steel tube.

[0129] Specifically, the first end of the second output element is communicated with the second air outlet of the second mixing element 401 , and the second end of the second output element is communicated with the first end of the third output element.

[0130] In some embodiments, the first output element includes but is not limited to a stainless steel tube.

[0131] Specifically, the second end of the third output element is communicated with subsequent gas processing equipment or a process machine.

[0132] In some embodiments, the third output element includes but is not limited to a stainless steel tube.

[0133] Specifically, the first vacuum element 801 is disposed at the third output element, and can perform vacuum processing on the first mixing element 301 and the second mixing element 401 .

[0134] In some embodiments, the first vacuum element 801 includes but is not limited to a vacuum pump.

[0135] Specifically, the sixth control valve element 802 includes a fifth manual diaphragm valve, which is disposed on the third output element and downstream of the first vacuum element 801 , and is used to manually control the flow between the third output element and subsequent gas processing equipment or process machines.

[0136] In some embodiments, the sixth control valve element 802 includes, but is not limited to, a diaphragm valve.

[0137] Specifically, the connection between the first end of the bypass line element and the third output element is located upstream of the first vacuum element 801 , and the connection between the second end of the bypass line element and the third output element is located between the first vacuum element 801 and the sixth control valve element 802 .

[0138] In some of these embodiments, the bypass line element includes, but is not limited to, a stainless steel tube.

[0139] Specifically, the seventh control valve element 803 includes a sixth manual diaphragm valve, wherein the sixth manual diaphragm valve is provided in the bypass pipeline element and is used to manually control the flow of the bypass pipeline element.

[0140] The method of use of this embodiment (taking a 4% H2 / N2 mixture as an example) is as follows:

[0141] Manually open the first manual diaphragm valve and the third manual diaphragm valve so that the first gas input element is connected to the first gas source and the second gas input element is connected to the second gas source;

[0142] The system turns on the first pressure regulating element 102 and the second pressure regulating element 202. The first pressure regulating element 102 adjusts the pressure of the first gas in the first gas input element to 96.2 psi, and the second pressure regulating element 202 adjusts the pressure of the second gas in the second gas input element to 4.2 psi.

[0143] By observing the second pressure gauge and the fourth pressure gauge, when the gas pressure in the first gas input element and the second gas input element meets the standard, manually open the second manual diaphragm valve and the fourth manual diaphragm valve, and the system automatically opens the first pneumatic diaphragm valve and the second pneumatic diaphragm valve, so that N2 and H2 enter the first mixing element 301 and the second mixing element 401 respectively;

[0144] After the delivery of N2 and H2 is completed, the system closes the first pneumatic diaphragm valve and the second pneumatic diaphragm valve, and uses the third pressure sensor and the fourth pressure sensor to monitor the pressure inside the first mixing element 301 and the second mixing element 401 in real time. If the pressure inside the first mixing element 301 and the second mixing element 401 does not meet the standard, the system opens the fifth pneumatic diaphragm valve and the sixth pneumatic diaphragm valve, thereby maintaining the air pressure inside the first mixing element 301 at 96 psi and the air pressure inside the second mixing element 401 at 4 psi.

[0145] When the adjustment is completed, the system closes the fifth pneumatic diaphragm valve and the sixth pneumatic diaphragm valve and opens the seventh pneumatic diaphragm valve, and uses Dalton's law of partial pressure to achieve mixing of the first gas and the second gas;

[0146] After the gases inside the first mixing element 301 and the second mixing element 401 are fully mixed, the system opens the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve and the first vacuum element 801, forming a vacuum negative pressure at the first end of the third output element, thereby discharging the mixed gas in the first mixing element 301 and the second mixing element 401 through the first output element and the second output element, so that the mixed gas can be transported to subsequent gas processing equipment or process machines.

[0147] The advantage of this embodiment is that gases of different pressures are respectively input into the first mixing unit and the second mixing unit through the first gas input unit and the second gas input unit, and the pressure difference between the two gases can be used to achieve rapid mixing of the first gas and the second gas, and the concentration of the mixed gas is made more stable; by connecting the first pressure relief unit and the second pressure relief unit to the first mixing unit and the second mixing unit respectively, the pressure inside the first mixing unit and the second mixing unit can be guaranteed to be stable; in addition, the application uses Dalton's law of partial pressure for gas mixing. Since the pressure release is instantaneous, the mixed gas can be prepared quickly and in large quantities, and the supply of ultra-large flow systems can still be used, and the adaptability is high; furthermore, the gas mixing method of the present invention can achieve high-pressure gas mixing, is not limited by pressure, and can be mixed with H2 gas at a pressure of 40psi and the corresponding N2 gas at a pressure of 960psi, thereby further improving applicability.

[0148] Example 2

[0149] This embodiment is a variation of embodiment 1.

[0150] like Figure 3 As shown, the gas mixing system further includes a temperature control unit 900. The temperature control unit 900 is communicated with the first mixing unit 300 and the second mixing unit 400 respectively, and is used to control the temperature of the first mixing unit 300 and the second mixing unit 400.

[0151] It should be noted that the first mixing element 301 further includes a first heat exchange cavity, a first liquid inlet, and a first liquid outlet. The first heat exchange cavity is formed outside the first gas storage cavity and is disposed circumferentially around the first gas storage cavity. The first liquid inlet is formed at the bottom of the first heat exchange cavity and communicates with the temperature control unit 900. The first liquid outlet is formed at the top of the first heat exchange cavity and communicates with the temperature control unit 900.

[0152] It should be noted that the second mixing element 401 further includes a second heat exchange cavity, a second liquid inlet, and a second liquid outlet. The second heat exchange cavity is formed outside the second gas storage cavity and is disposed circumferentially around the second gas storage cavity. The second liquid inlet is formed at the bottom of the second heat exchange cavity and is connected to the temperature control unit 900. The second liquid outlet is formed at the top of the second heat exchange cavity and is connected to the temperature control unit 900.

[0153] like Figure 4As shown, the temperature control unit 900 includes a first temperature control pipeline element, a second temperature control pipeline element, an eighth control valve element 901, and a ninth control valve element 902. The first temperature control pipeline element is respectively connected to the first mixing unit 300, the second mixing unit 400, and the heat exchange device, and is used to transport liquid at a first temperature from the heat exchange device to the first mixing unit 300 and the second mixing unit 400; the second temperature control pipeline element is respectively connected to the first mixing unit 300, the second mixing unit 400, and the heat exchange device, and is used to transport liquid at a second temperature from the first mixing unit 300 and the second mixing unit 400 to the heat exchange device; the eighth control valve element 901 is provided in the first mixing unit 300 and is used to control the flow of the first temperature control pipeline element, the second temperature control pipeline element, and the first mixing unit 300; and the ninth control valve element 902 is provided in the second mixing unit 400 and is used to control the flow of the first temperature control pipeline element, the second temperature control pipeline element, and the second mixing unit 400.

[0154] Specifically, the first end of the first temperature control pipeline element is communicated with the heat exchange device, and the second end of the first temperature control pipeline element is communicated with the first liquid inlet of the first mixing element 301 and the second liquid inlet of the second mixing element 401 respectively.

[0155] In some embodiments, the first temperature-control piping element includes but is not limited to a stainless steel pipe.

[0156] Specifically, the first end of the second temperature control pipeline element is communicated with the first liquid outlet of the first mixing element 301 and the second liquid outlet of the second mixing element 401 respectively, and the second end of the second temperature control pipeline element is communicated with the heat exchange device.

[0157] In some embodiments, the second temperature-control piping element includes but is not limited to a stainless steel pipe.

[0158] Specifically, the eighth control valve element 901 includes an eighth pneumatic diaphragm valve and a ninth pneumatic diaphragm valve. The eighth pneumatic diaphragm valve is disposed at the first liquid inlet of the first mixing element 301 and is used to automatically control the flow between the first temperature-controlled piping element and the first mixing element 301. The ninth pneumatic diaphragm valve is disposed at the first liquid outlet of the first mixing element 301 and is used to automatically control the flow between the second temperature-controlled piping element and the first mixing element 301.

[0159] In some embodiments, the eighth control valve element 901 includes, but is not limited to, a diaphragm valve.

[0160] Specifically, the ninth control valve element 902 includes a tenth pneumatic diaphragm valve and an eleventh pneumatic diaphragm valve. The tenth pneumatic diaphragm valve is disposed at the second liquid inlet of the second mixing element 401 and is used to automatically control the flow between the first temperature-controlled pipeline element and the second mixing element 401. The eleventh pneumatic diaphragm valve is disposed at the second liquid outlet of the second mixing element 401 and is used to automatically control the flow between the second temperature-controlled pipeline element and the second mixing element 401.

[0161] In some embodiments, the ninth control valve element 902 includes, but is not limited to, a diaphragm valve.

[0162] Furthermore, the first mixing unit 300 further includes a first temperature monitoring element 304 , wherein the first temperature monitoring element 304 is in communication with the first mixing unit 300 and is configured to monitor the temperature of the first mixing unit 300 .

[0163] Specifically, the first temperature monitoring element 304 is in communication with the first gas storage cavity of the first mixing element 301 and is used to monitor the temperature of the first mixing element 301 in real time.

[0164] In some embodiments, the first temperature monitoring element 304 includes but is not limited to a temperature sensor.

[0165] Furthermore, the second mixing unit 400 further includes a second temperature monitoring element 404 , wherein the second temperature monitoring element 404 is in communication with the second mixing unit 400 and is configured to monitor the temperature of the second mixing unit 400 .

[0166] Specifically, the second temperature monitoring element 404 is in communication with the second gas storage cavity of the second mixing element 401 and is used to monitor the temperature of the second mixing element 401 in real time.

[0167] In some embodiments, the second temperature monitoring element 404 includes but is not limited to a temperature sensor.

[0168] The method of using this embodiment is as follows:

[0169] Before the connecting pipeline element is opened, the system starts the heat exchange device and opens the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve or the tenth pneumatic diaphragm valve, the eleventh pneumatic diaphragm valve, so that the liquid in the heat exchange device flows into the first heat exchange cavity of the first mixing element 301 or the second heat exchange cavity of the second mixing element 401 through the first temperature control pipeline element, thereby heating the first mixing element 301 or the first mixing element 301;

[0170] When the heating of the first mixing element 301 or the second mixing element 401 is completed, the system opens the seventh pneumatic diaphragm valve to open the connecting pipeline element, thereby realizing the initial heat convection between the first gas and the second gas;

[0171] When the initial heat convection is completed, the seventh pneumatic diaphragm valve is closed and the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, or the tenth pneumatic diaphragm valve, the eleventh pneumatic diaphragm valve is opened, so that the liquid in the heat exchange device flows into the first heat exchange cavity of the first mixing element 301 or the second heat exchange cavity of the second mixing element 401 through the first temperature control pipeline element, thereby cooling the first mixing element 301 or the second mixing element 401;

[0172] When the first mixing element 301 or the second mixing element 401 is cooled, the system opens the seventh pneumatic diaphragm valve to open the connecting pipeline element, thereby achieving thermal convection between the first gas and the second gas.

[0173] Repeat the above steps until the first gas and the second gas are fully mixed.

[0174] The advantage of this embodiment is that the first mixing unit or the second mixing unit can be heated or cooled by the temperature control unit, thereby achieving heat convection between the first gas and the second gas, thereby improving the mixing efficiency of the first gas and the second gas.

[0175] Example 3

[0176] This embodiment is a variation of Embodiments 1 and 2.

[0177] like Figure 5 As shown, the gas mixing system further includes a buffer unit 1000 and a second output unit 1100. The buffer unit 1000 is connected to the first output unit 800 for buffering the mixed gas; the second output unit 1100 is connected to the buffer unit 1000, the first output unit 800, and the process machine for outputting the mixed gas.

[0178] like Figure 6 As shown, the buffer unit 1000 includes a buffer element 1001 and a tenth control valve element 1002. The buffer element 1001 is connected to the first output unit 800 and the second output unit 1100 respectively, and is used to buffer the mixed gas; the tenth control valve element 1002 is provided on the buffer element 1001, and is used to control the flow of the buffer element 1001.

[0179] Specifically, the buffer element 1001 includes a buffer tank, a buffer air inlet, and a buffer air outlet. The buffer air inlet is provided at the bottom of the buffer tank and communicates with the second end of the third output element; the buffer air outlet is provided at the bottom of the buffer tank and communicates with the second output unit 1100.

[0180] In some of these embodiments, cushioning element 1001 includes, but is not limited to, a container can.

[0181] It should be noted that the volume of the buffer element 1001 is 10 L to 100 L. Preferably, the volume of the buffer element 1001 is 30 L.

[0182] Specifically, the tenth control valve element 1002 includes a seventh manual diaphragm valve and an eighth manual diaphragm valve. The seventh manual diaphragm valve is disposed at the buffer air inlet of the buffer element 1001 and is used to manually control the flow between the third output element and the buffer element 1001. The eighth manual diaphragm valve is disposed at the buffer air outlet of the buffer element 1001 and is used to manually control the flow between the buffer element 1001 and the second output unit 1100.

[0183] In some embodiments, the tenth control valve element 1002 includes, but is not limited to, a diaphragm valve.

[0184] like Figure 6 As shown, the second output unit 1100 includes a fourth output element, an eleventh control valve element 1101, a fifth output element, a twelfth control valve element 1102, at least one sixth output element, at least one thirteenth control valve element 1103, a third pressure regulating element 1104 and a seventh pressure monitoring element 1105. Among them, the fourth output element is connected to the first output unit 800 for conveying mixed gas; the eleventh control valve element 1101 is arranged on the fourth output element for controlling the circulation of the fourth output element; the fifth output element is respectively connected to the fourth output element and the buffer unit 1000 for conveying mixed gas; the twelfth control valve element 1102 is arranged on the fifth output element for controlling the circulation of the fifth output element; the sixth output element is respectively connected to the fifth output element and the process machine for conveying mixed gas; the thirteenth control valve element 1103 is respectively arranged on the corresponding sixth output element for controlling the circulation of the sixth output element; the third pressure regulating element 1104 is arranged on the fifth output element for adjusting the pressure of the fifth output element; the seventh pressure monitoring element 1105 and the fifth output element are used to monitor the upstream pressure and downstream pressure of the third pressure regulating element 1104.

[0185] Specifically, the first end of the fourth output element is in communication with the second end of the third output element, and the second end of the fourth output element is in communication with the fifth output element.

[0186] In some embodiments, the fourth output element includes but is not limited to a stainless steel tube.

[0187] Specifically, the eleventh control valve element 1101 includes a ninth manual diaphragm valve, wherein the ninth manual diaphragm valve is provided at the fourth output element and is used to manually control the flow of the fourth output element.

[0188] In some embodiments, the eleventh control valve element 1101 includes, but is not limited to, a diaphragm valve.

[0189] Specifically, the first end of the fifth output element is communicated with the second end of the fourth output element and the buffer outlet of the buffer element 1001 respectively, and the second end of the fifth output element is communicated with the sixth output element.

[0190] In some embodiments, the fifth output element includes but is not limited to a stainless steel tube.

[0191] Specifically, the twelfth control valve element 1102 includes a tenth manual diaphragm valve and a twelfth pneumatic diaphragm valve. The tenth manual diaphragm valve is provided on the fifth output element for manually controlling the flow of fluid therethrough. The twelfth pneumatic diaphragm valve is provided on the fifth output element, downstream of the tenth manual diaphragm valve, for automatically controlling the flow of fluid therethrough.

[0192] In some embodiments, the twelfth control valve element 1102 includes, but is not limited to, a diaphragm valve.

[0193] Specifically, there are several sixth output elements, the first ends of several sixth output elements are connected in parallel with the second end of the fifth output element, and the second ends of several sixth output elements are respectively connected to corresponding process machines.

[0194] In some embodiments, the sixth output element includes but is not limited to a stainless steel tube.

[0195] It should be noted that the number of the sixth output elements matches the number of process equipment or the number of air inlets of the process equipment.

[0196] Specifically, the thirteenth control valve element 1103 includes an eleventh manual diaphragm valve, wherein the eleventh manual diaphragm valve is provided at the sixth output element and is used to manually control the flow of the sixth output element.

[0197] In some embodiments, the thirteenth control valve element 1103 includes, but is not limited to, a diaphragm valve.

[0198] It should be noted that the number of the thirteenth control valve elements 1103 matches the number of the sixth gas delivery elements. It should be understood that the number of the thirteenth control valve elements 1103 is the same as the number of the sixth gas delivery elements, that is, the thirteenth control valve elements 1103 correspond to the sixth gas delivery elements one to one.

[0199] Specifically, the third pressure regulating element 1104 is located downstream of the tenth manual diaphragm valve and upstream of the twelfth pneumatic diaphragm valve on the fifth output element.

[0200] In some embodiments, the third pressure regulating element 1104 includes but is not limited to a pressure regulating valve.

[0201] Specifically, the seventh pressure monitoring element 1105 includes a fifth pressure sensor and a sixth pressure sensor. The fifth pressure sensor is connected to the fifth output element and is located upstream of the third pressure regulating element 1104, and is used to monitor the pressure upstream of the third pressure regulating element 1104 in real time. The sixth pressure sensor is connected to the fifth output element and is located downstream of the third pressure regulating element 1104, and is used to monitor the pressure downstream of the third pressure regulating element 1104 in real time.

[0202] In some embodiments, the seventh pressure monitoring element 1105 includes but is not limited to a pressure sensor.

[0203] The method of using this embodiment is as follows:

[0204] After the first mixing element 301 and the second mixing element 401 have finished mixing the first gas and the second gas, the fifth manual diaphragm valve and the seventh manual diaphragm valve are manually opened to allow the third output element to flow into the buffer element 1001. This allows the mixed gas to enter the buffer element 1001 for buffering, converting the high-pressure mixed gas into a low-pressure mixed gas. Furthermore, the mixed gas inside the buffer element 1001 can be further mixed evenly.

[0205] Manually open the eighth manual diaphragm valve and the tenth manual diaphragm valve to allow the mixed gas in the buffer element 1001 to enter the fifth output element;

[0206] The system turns on the third pressure regulating element 1104 to adjust the gas pressure inside the fifth output element so that the pressure of the mixed gas can meet the requirements of the subsequent process equipment.

[0207] When the air pressure detected by the sixth pressure sensor meets the requirement, the system opens the twelfth pneumatic diaphragm valve to connect the fifth output element with the sixth output element;

[0208] The eleventh manual diaphragm valve is manually opened, thereby connecting the sixth gas output element to the process machine, thereby allowing the mixed gas to enter the process machine.

[0209] The advantage of this embodiment is that by setting a buffer unit to buffer the mixed gas, the high-pressure mixed gas is converted into a low-pressure mixed gas, and the mixed gas can be further mixed evenly, thereby improving the mixing efficiency; by setting a second output unit, the output pressure of the mixed gas can be adjusted to adapt to subsequent process equipment and improve applicability.

[0210] Example 4

[0211] This embodiment is a variation of Embodiments 1 to 3.

[0212] like Figure 7As shown, the gas mixing unit further includes a first analyzing unit 1200 and a second analyzing unit 1300. The first analyzing unit 1200 is connected to the first mixing unit 300 and the second mixing unit 400, respectively, for analyzing the concentration of the mixed gas; the second analyzing unit 1300 is connected to the second output unit 1100, for analyzing the concentration of the mixed gas.

[0213] like Figure 8 As shown, the first analysis unit 1200 includes a first analysis pipeline element, a first analysis element 1201, a fourteenth control valve element 1202, a third one-way valve element 1203, a fourth pressure regulating element 1204, and an eighth pressure monitoring element 1205. The first analysis pipeline element is connected to the first output unit 800 for delivering the mixed gas; the first analysis element 1201 is connected to the first analysis pipeline element for monitoring the concentration of the mixed gas; the fourteenth control valve element 1202 is disposed in the first analysis pipeline element for controlling the flow of gas in the first analysis pipeline element; the third one-way valve element 1203 is disposed in the first analysis pipeline element, downstream of the fourteenth control valve element 1202, for ensuring unidirectional gas flow; the fourth pressure regulating element 1204 is disposed in the first analysis pipeline element for regulating the pressure in the first analysis pipeline element; and the eighth pressure monitoring element 1205 is connected to the first analysis pipeline element for detecting the pressure in the first analysis pipeline element.

[0214] Specifically, the first end of the first analysis circuit element is connected to the third output element, and the connection point between the first end of the first analysis circuit element and the third output element is located downstream of the fifth manual diaphragm valve, and the second end of the first analysis circuit element is connected to the first analysis element 1201.

[0215] In some of these embodiments, the first analytical line element includes, but is not limited to, a stainless steel tube.

[0216] Specifically, the first analysis element 1201 includes a first delivery pipeline, a first flowmeter, a first analyzer, a second delivery pipeline, a second flowmeter, and a third delivery pipeline. The first end of the first delivery pipeline is connected to the second end of the first analysis pipeline element; the first flowmeter is disposed in the first delivery pipeline and is used to adjust the flow rate of the mixed gas to adapt to the first analyzer; the first analyzer is connected to the second end of the first delivery pipeline; the first end of the second delivery pipeline is connected to the second end of the first analysis pipeline element, and the second end of the second delivery pipeline is connected to the exhaust gas treatment equipment; the second flowmeter is disposed in the second delivery pipeline and is used to discharge excess mixed gas directly to the exhaust gas treatment equipment; the first end of the third delivery pipeline is connected to the first analyzer, and the second end of the third delivery pipeline is connected to the second delivery pipeline, and the connection point between the third delivery pipeline and the second delivery pipeline is located downstream of the second flowmeter.

[0217] In some embodiments, the first delivery pipeline includes but is not limited to a stainless steel pipe.

[0218] In some embodiments, the first flow meter includes but is not limited to a float flow meter.

[0219] In some of these embodiments, the first analyzer includes, but is not limited to, a concentration analyzer.

[0220] In some embodiments, the second delivery line includes but is not limited to a stainless steel tube.

[0221] In some embodiments, the second flow meter includes but is not limited to a float flow meter.

[0222] In some embodiments, the third delivery line includes but is not limited to a stainless steel pipe.

[0223] Specifically, the fourteenth control valve component 1202 includes a thirteenth pneumatic diaphragm valve, wherein the thirteenth pneumatic diaphragm valve is provided in the first analysis pipeline component for automatically controlling the flow of the first analysis pipeline component.

[0224] In some embodiments, the fourteenth control valve element 1202 includes, but is not limited to, a diaphragm valve.

[0225] In some embodiments, the third one-way valve element 1203 includes but is not limited to a one-way valve.

[0226] Specifically, the fourth pressure regulating element 1204 is located downstream of the third one-way valve element 1203 .

[0227] In some embodiments, the fourth pressure regulating element 1204 includes but is not limited to a pressure regulating valve.

[0228] Specifically, the eighth pressure monitoring component 1205 includes a third pressure gauge, wherein the third pressure gauge is connected to the first analysis pipeline component, and the connection point between the third pressure gauge and the first analysis pipeline component is located downstream of the fourth pressure regulating component 1204 .

[0229] In some embodiments, the eighth pressure monitoring element 1205 includes but is not limited to a pressure gauge.

[0230] like Figure 8As shown, the second analysis unit 1300 includes a second analysis pipeline element, a second analysis element 1301, a fifteenth control valve element 1302, a fourth one-way valve element 1303, a fifth pressure regulating element 1304, and a ninth pressure monitoring element 1305. The second analysis pipeline element is connected to the second output unit 1100 for delivering the mixed gas; the second analysis element 1301 is connected to the second analysis pipeline element for monitoring the concentration of the mixed gas; the fifteenth control valve element 1302 is disposed in the second analysis pipeline element for controlling the flow of gas therein; the fourth one-way valve element 1303 is disposed in the second analysis pipeline element, downstream of the fifteenth control valve element 1302, for ensuring unidirectional gas flow; the fifth pressure regulating element 1304 is disposed in the second analysis pipeline element for regulating the pressure therein; and the ninth pressure monitoring element 1305 is connected to the second analysis pipeline element for detecting the pressure therein.

[0231] Specifically, the first end of the second analysis line element is connected to the fifth output element, and the connection point between the first end of the second analysis line element and the fifth output element is located downstream of the sixth pressure sensor. The second end of the second analysis line element is connected to the second analysis element 1301.

[0232] In some of these embodiments, the second analytical line element includes, but is not limited to, a stainless steel tube.

[0233] Specifically, the second analysis element 1301 includes a fourth delivery pipeline, a third flowmeter, a second analyzer, a fifth delivery pipeline, a fourth flowmeter, and a sixth delivery pipeline. The first end of the fourth delivery pipeline is connected to the second end of the second analysis pipeline element; the third flowmeter is disposed in the fourth delivery pipeline and is used to adjust the flow rate of the mixed gas to accommodate the second analyzer; the second analyzer is connected to the second end of the fourth delivery pipeline; the first end of the fifth delivery pipeline is connected to the second end of the second analysis pipeline element, and the second end of the fifth delivery pipeline is connected to the exhaust gas treatment equipment; the fourth flowmeter is disposed in the fifth delivery pipeline and is used to discharge excess mixed gas directly to the exhaust gas treatment equipment; the first end of the sixth delivery pipeline is connected to the second analyzer, and the second end of the sixth delivery pipeline is connected to the fifth delivery pipeline, with the connection point between the sixth delivery pipeline and the fifth delivery pipeline being located downstream of the fourth flowmeter.

[0234] In some embodiments, the fourth delivery line includes but is not limited to a stainless steel pipe.

[0235] In some embodiments, the third flow meter includes but is not limited to a float flow meter.

[0236] In some of these embodiments, the second analyzer includes, but is not limited to, a concentration analyzer.

[0237] In some embodiments, the fifth delivery line includes but is not limited to a stainless steel tube.

[0238] In some embodiments, the fourth flow meter includes but is not limited to a float flow meter.

[0239] In some embodiments, the sixth delivery line includes but is not limited to a stainless steel tube.

[0240] Specifically, the fifteenth control valve component 1302 includes a fourteenth pneumatic diaphragm valve, wherein the fourteenth pneumatic diaphragm valve is disposed in the second analysis pipeline component and is used to automatically control the flow of the second analysis pipeline component.

[0241] In some embodiments, the fifteenth control valve element 1302 includes, but is not limited to, a diaphragm valve.

[0242] In some embodiments, the fourth one-way valve element 1303 includes but is not limited to a one-way valve.

[0243] Specifically, the fifth pressure regulating element 1304 is located downstream of the fourth one-way valve element 1303 .

[0244] In some embodiments, the fifth pressure regulating element 1304 includes but is not limited to a pressure regulating valve.

[0245] Specifically, the ninth pressure monitoring component 1305 includes a fourth pressure gauge, wherein the fourth pressure gauge is connected to the second analysis pipeline component, and the connection point between the fourth pressure gauge and the second analysis pipeline component is located downstream of the fifth pressure regulating component 1304 .

[0246] In some embodiments, the ninth pressure monitoring component 1305 includes but is not limited to a pressure gauge.

[0247] The method of using this embodiment is as follows:

[0248] After the first gas and the second gas are mixed by the first mixing unit 300 and the second mixing unit 400 to obtain a mixed gas, the system opens the thirteenth pneumatic diaphragm valve to allow the mixed gas to enter the first analysis pipeline component;

[0249] The system activates the fourth pressure regulating element 1204 to ensure that the pressure of the mixed gas supplied to the first flowmeter meets the standard. The pressure-regulated mixed gas can then be adjusted by the first flowmeter so that the flow rate of the mixed gas supplied to the first analyzer meets the standard. The first analyzer can then test the mixed gas until the concentration of the mixed gas meets the standard.

[0250] When the concentration of the mixed gas reaches the preset standard, the system closes the thirteenth pneumatic diaphragm valve and opens the seventh manual diaphragm valve, allowing the mixed gas to enter the buffer element 1001 for buffering and secondary mixing;

[0251] The eighth and tenth manual diaphragm valves are opened to allow the mixed gas to flow into the fifth output element. The system then opens the third pressure regulating element 1104 so that the gas pressure in the fifth input element can meet the requirements of subsequent process machines.

[0252] The system opens the fourteenth pneumatic diaphragm valve to allow the mixed gas to enter the second analysis pipeline component;

[0253] The system turns on the fifth pressure regulating element 1304 so that the pressure of the mixed gas supplied to the third flowmeter meets the standard. The mixed gas after pressure regulation can be adjusted by the third flowmeter so that the flow of the mixed gas supplied to the second analyzer meets the standard, so that the second analyzer can detect the mixed gas until the concentration of the mixed gas meets the standard.

[0254] The advantage of this embodiment is that by providing the first analyzing unit and the second analyzing unit, the concentration of the mixed gas in the third output element and the fifth output element can be detected, thereby effectively controlling the mixing accuracy during the entire gas mixing process.

[0255] Example 5

[0256] This embodiment is a variation of Embodiments 1 to 4.

[0257] like Figure 9 As shown, the gas mixing unit further includes an exhaust gas discharge unit 1400 and a purge unit 1500. The exhaust gas discharge unit 1400 is respectively connected to the first pressure relief unit 500, the second pressure relief unit 600, the first output unit 800, the second output unit 1100, the buffer unit 1000, the first analysis unit 1200, and the second analysis unit 1300 for discharging exhaust gas; the purge unit 1500 is respectively connected to the second gas input unit 200 and the exhaust gas discharge unit 1400 for purging the entire pipeline.

[0258] like Figure 10As shown, the exhaust gas discharge unit 1400 includes a first discharge line element, a second discharge line element, a third discharge line element, a fourth discharge line element, a fifth discharge line element, and a sixth discharge line element. Among them, the first exhaust pipeline element is respectively connected to the first pressure relief unit 500, the second pressure relief unit 600, and the first output unit 800 for conveying gas; the second exhaust pipeline element is connected to the second output unit 1100 for conveying gas; the first end of the third exhaust pipeline element is respectively connected to the second end of the first exhaust pipeline element and the second end of the second exhaust pipeline element, and the second end of the third exhaust pipeline element is connected to the exhaust gas treatment equipment for conveying gas; the first end of the fourth exhaust pipeline element is connected to the buffer unit 1000, and the second end of the fourth exhaust pipeline element is connected to the first exhaust pipeline element for conveying gas; the first end of the fifth exhaust pipeline element is connected to the first analysis unit 1200, and the second end of the fifth exhaust pipeline element is connected to the first exhaust pipeline element for conveying gas; the first end of the sixth exhaust pipeline element is connected to the second analysis unit 1300, and the second end of the sixth exhaust pipeline element is connected to the second exhaust pipeline element for conveying gas.

[0259] Specifically, the first end of the first exhaust pipeline element is connected to the third gas output element, and the connection point between the first end of the first exhaust pipeline element and the third gas output element is located downstream of the fifth manual diaphragm valve and upstream of the first analysis pipeline element.

[0260] In some of these embodiments, the first exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0261] It should be noted that the second ends of the first and second pressure relief piping elements are connected to the first exhaust piping element, so that the decompressed gas inside the first and second mixing elements 301 and 401 can be discharged through the first exhaust piping element.

[0262] Specifically, the first end of the second exhaust line element is communicated with the fifth output element, and the communication point between the first end of the second exhaust line element and the fifth output element is located downstream of the sixth pressure sensor and upstream of the twelfth pneumatic diaphragm valve.

[0263] In some of these embodiments, the second exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0264] In some of these embodiments, the third exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0265] In some of these embodiments, the fourth exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0266] In some of these embodiments, the fifth exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0267] In some of these embodiments, the sixth exhaust piping component includes, but is not limited to, a stainless steel pipe.

[0268] Furthermore, the exhaust gas discharge unit 1400 further includes a sixteenth control valve element 1401 , a fifth one-way valve element 1402 , a seventeenth control valve element 1403 , an eighteenth control valve element 1404 , a sixth one-way valve element 1405 , a seventh one-way valve element 1406 and an eighth one-way valve element 1407 . Among them, the sixteenth control valve element 1401 is arranged on the first discharge pipeline element for controlling the flow of the first discharge pipeline element; the fifth one-way valve element 1402 is arranged on the first discharge pipeline element and is located downstream of the sixteenth control valve element 1401, for allowing the gas inside the first discharge pipeline element to flow in one direction; the seventeenth control valve element 1403 is arranged on the second discharge pipeline element for controlling the flow of the second discharge pipeline element; the eighteenth control valve element 1404 is arranged on the third discharge pipeline element for controlling the flow of the third discharge pipeline element; the sixth one-way valve element 1405 is arranged on the fourth discharge pipeline element for allowing the gas inside the fourth discharge pipeline element to flow in one direction; the seventh one-way valve element 1406 is arranged on the fifth discharge pipeline element for allowing the gas inside the fifth discharge pipeline element to flow in one direction; and the eighth one-way valve element 1407 is arranged on the sixth discharge pipeline element for allowing the gas inside the sixth discharge pipeline element to flow in one direction.

[0269] Specifically, the sixteenth control valve component 1401 includes a fifteenth pneumatic diaphragm valve, wherein the fifteenth pneumatic diaphragm valve is provided in the first discharge pipeline component for automatically controlling the flow of the first discharge pipeline component.

[0270] In some embodiments, the sixteenth control valve element 1401 includes, but is not limited to, a diaphragm valve.

[0271] In some of these embodiments, the fifth one-way valve element 1402 includes, but is not limited to, a one-way valve.

[0272] Specifically, the seventeenth control valve element 1403 includes a twelfth manual diaphragm valve, wherein the twelfth manual diaphragm valve is provided in the second discharge pipeline element for manually controlling the flow of the second discharge pipeline element.

[0273] In some embodiments, the seventeenth control valve element 1403 includes, but is not limited to, a diaphragm valve.

[0274] Specifically, the eighteenth control valve component 1404 includes a thirteenth manual diaphragm valve, wherein the thirteenth manual diaphragm valve is disposed in the third discharge pipeline component and is used to manually control the flow of the third discharge pipeline component.

[0275] In some embodiments, the eighteenth control valve element 1404 includes, but is not limited to, a diaphragm valve.

[0276] In some embodiments, the sixth one-way valve element 1405 includes, but is not limited to, a one-way valve.

[0277] In some of these embodiments, the seventh one-way valve element 1406 includes, but is not limited to, a one-way valve.

[0278] In some of these embodiments, the eighth one-way valve element 1407 includes, but is not limited to, a one-way valve.

[0279] like Figure 11 As shown, the purge unit 1500 includes a purge input element, a first purge output element, a second vacuum element 1501, a second purge output element, and a power gas supply element. The first end of the purge input element is connected to a purge gas source, and the second end of the purge input element is connected to the second gas input unit 200 for delivering purge gas. The first end of the first purge output element is connected to the exhaust gas discharge unit 1400 for delivering exhaust gas. The second vacuum element 1501 is connected to the second end of the first purge output element for creating a vacuum negative pressure at the end of the first purge output element. The first end of the second purge output element is connected to the second vacuum element 1501, and the second end of the second purge output element is connected to the exhaust gas treatment equipment for delivering exhaust gas. The first end of the power gas supply element is connected to a power gas source, and the second end of the power gas supply element is connected to the second vacuum element 1501 for providing power gas to the second vacuum element 1501.

[0280] It should be noted that the purge gas source includes but is not limited to LPN2 gas source.

[0281] It should be noted that the power gas source includes but is not limited to the GN2 gas source.

[0282] Specifically, the second end of the purge input element is in communication with the second gas input element, and the connection point between the second end of the purge input element and the second gas input element is located between the second pressure regulating element 202 and the fourth manual diaphragm valve.

[0283] Specifically, the first end of the first purge output element is in communication with the first end of the third exhaust line element.

[0284] In some of these embodiments, the purge input element includes, but is not limited to, a stainless steel tube.

[0285] In some embodiments, the first purge output element includes, but is not limited to, a stainless steel tube.

[0286] In some embodiments, the second vacuum element 1501 includes, but is not limited to, a Venturi vacuum pump.

[0287] In some embodiments, the second purge output element includes, but is not limited to, a stainless steel tube.

[0288] In some of these embodiments, the motive gas supply element includes, but is not limited to, a stainless steel tube.

[0289] Furthermore, the purge unit 1500 further includes a nineteenth control valve element 1502, a ninth one-way valve element 1503, a twentieth control valve element 1504, a twenty-first control valve element 1505, and a twenty-second control valve element 1506. The nineteenth control valve element 1502 is disposed on the purge input element to control the flow of gas therein; the ninth one-way valve element 1503 is disposed on the purge input element to ensure unidirectional flow of gas therein; the twentieth control valve element 1504 is disposed on the first purge output element to control the flow of gas therein; the twenty-first control valve element 1505 is disposed on the second purge output element to control the flow of gas therein; and the twenty-second control valve element 1506 is disposed on the power gas supply element to control the flow of gas therein.

[0290] Specifically, the nineteenth control valve element 1502 includes a fourteenth manual diaphragm valve and a sixteenth pneumatic diaphragm valve. The fourteenth manual diaphragm valve is disposed on the purge input element for manually controlling the flow of air through the purge input element. The sixteenth pneumatic diaphragm valve is disposed on the purge input element, downstream of the fourteenth manual diaphragm valve, for automatically controlling the flow of air through the purge input element.

[0291] In some embodiments, the nineteenth control valve element 1502 includes, but is not limited to, a diaphragm valve.

[0292] Specifically, the ninth one-way valve element 1503 is located downstream of the fourteenth manual diaphragm valve and upstream of the sixteenth pneumatic diaphragm valve on the purge input element.

[0293] In some embodiments, the ninth one-way valve element 1503 includes but is not limited to a one-way valve.

[0294] Specifically, the twentieth control valve element 1504 includes a fifteenth manual diaphragm valve, wherein the fifteenth manual diaphragm valve is provided at the first purge output element and is used to manually control the flow of the first purge output element.

[0295] In some of these embodiments, the twentieth control valve element 1504 includes, but is not limited to, a diaphragm valve.

[0296] Specifically, the twenty-first control valve element 1505 includes a sixteenth manual diaphragm valve, wherein the sixteenth manual diaphragm valve is provided at the second purge output element and is used to manually control the flow of the second purge output element.

[0297] In some of these embodiments, the twenty-first control valve element 1505 includes, but is not limited to, a diaphragm valve.

[0298] Specifically, the twenty-second control valve component 1506 includes a seventeenth manual diaphragm valve, wherein the seventeenth manual diaphragm valve is provided on the power gas supply component for manually controlling the flow of the power gas supply component.

[0299] In some embodiments, the twenty-second control valve element 1506 includes, but is not limited to, a diaphragm valve.

[0300] The method of using this embodiment is as follows:

[0301] When the entire system is in a mixing operation, the thirteenth manual diaphragm valve is in a normally open state, so that when the first mixing element 301 and the second mixing element 401 are pressure-regulated, the first pressure relief pipeline element and the second pressure relief pipeline element can discharge excess gas through the first discharge pipeline element and the third discharge pipeline element in sequence; when the buffer element 1001 needs to be emptied, the mixed gas in the buffer element 1001 can flow to the exhaust gas treatment equipment through the fourth discharge pipeline element, the first discharge pipeline element, and the third discharge pipeline element in sequence; the excess mixed gas in the first analysis element 1201 can flow to the exhaust gas treatment equipment through the fifth discharge pipeline element, the first exhaust pipeline element, and the third exhaust pipeline element in sequence; the excess mixed gas in the second analysis element 1301 can flow to the exhaust gas treatment equipment through the sixth discharge pipeline element, the second exhaust pipeline element, and the third discharge pipeline element in sequence;

[0302] In order to ensure the accuracy of the gas concentration of the gas mixing system, the entire pipeline of the system needs to be purged before the gas mixing system is mixed;

[0303] Manually open the fourteenth manual diaphragm valve, the fourth manual diaphragm valve, the sixth manual diaphragm valve, the fifth manual diaphragm valve, the ninth manual diaphragm valve, the tenth manual diaphragm valve, and the twelfth manual diaphragm valve. The system opens the sixteenth pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the second pneumatic diaphragm valve, and the fifth pneumatic diaphragm valve, allowing the purge gas to flow through the purge input element and the second gas input element to fill the first mixing element 301, the second mixing element 401, the first output element, the second output element, the third output element, the fourth output element, the fifth output element, and the second discharge pipeline element, and maintain pressure for a period of time.

[0304] Manually open the seventeenth manual diaphragm valve to allow the power gas to enter the second vacuum element 1501 through the power gas supply element, thereby providing power for the second vacuum element 1501;

[0305] The system opens the second vacuum element 1501 and manually opens the fifteenth manual diaphragm valve and the sixteenth manual diaphragm valve. The second vacuum element 1501 forms a vacuum negative pressure at the end of the first purge output element, so that the purge gas in the entire pipeline can be discharged through the second purge output element.

[0306] The advantage of this embodiment is that by connecting the purge unit with the second gas input unit and the second output unit, the entire pipeline of the system can be purged before the gas mixing system starts mixing, thereby ensuring the accuracy of the gas mixing concentration of the gas mixing system.

[0307] Example 6

[0308] This embodiment is a variation of Embodiments 1 to 5.

[0309] like Figure 12 As shown, the gas mixing system further includes a third gas input unit 1600. A first end of the third gas input unit 1600 is connected to a third gas source, and a second end of the third gas input unit 1600 is connected to the first analysis unit 1200 and the second analysis unit 1300, respectively, for delivering the third gas.

[0310] Among them, the first analysis unit 1200 is connected to the first gas input unit 100 and the third gas input unit 1600 respectively, and is used to perform zero gas calibration operations and standard gas calibration operations; the second analysis unit 1300 is connected to the first gas input unit 100 and the third gas input unit 1600 respectively, and is used to perform zero gas calibration operations and standard gas calibration operations.

[0311] like Figure 13 As shown, the first gas input unit 100 further includes a third gas input element, a fourth gas input element, and a fifth gas input element. The third gas input element is connected to the first gas input element for delivering the first gas; the fourth gas input element is connected to the third gas input element and the first analysis unit 1200 for delivering the first gas to the first analysis unit 1200 to enable the first analysis unit 1200 to perform a zero gas calibration operation; and the fifth gas input element is connected to the third gas input element and the second analysis unit 1300 for delivering the first gas to the second analysis unit 1300 to enable the second analysis unit 1300 to perform a zero gas calibration operation.

[0312] Specifically, the connection point between the first end of the third gas input element and the first gas input element is located downstream of the first pressure sensor.

[0313] In some of the embodiments, the third gas input element includes but is not limited to a stainless steel tube.

[0314] Specifically, the first end of the fourth gas input element is communicated with the second end of the third gas input element, and the second end of the fourth gas input element is communicated with the first analysis pipeline element.

[0315] In some of the embodiments, the fourth gas input element includes but is not limited to a stainless steel tube.

[0316] Specifically, the first end of the fifth gas input element is communicated with the second end of the third gas input element, and the second end of the fifth gas input element is communicated with the second analysis pipeline element.

[0317] In some of the embodiments, the fifth gas input element includes but is not limited to a stainless steel tube.

[0318] Furthermore, the first gas input unit 100 further includes a twenty-third control valve element 105, a tenth one-way valve element 106, a twenty-fourth control valve element 107, and a twenty-fifth control valve element 108. The twenty-third control valve element 105 is disposed on the third gas input element to control the flow of gas therethrough; the tenth one-way valve element 106 is disposed on the third gas input element and downstream of the twenty-third control valve element 105 to allow gas to flow in one direction; the twenty-fourth control valve element 107 is disposed on the fourth gas input element to control the flow of gas therethrough; and the twenty-fifth control valve element 108 is disposed on the fifth gas input element to control the flow of gas therethrough.

[0319] Specifically, the twenty-third control valve element 105 includes an eighteenth manual diaphragm valve, wherein the eighteenth manual diaphragm valve is provided at the third gas input element and is used to manually control the flow of the third gas input element.

[0320] In some embodiments, the twenty-third control valve element 105 includes, but is not limited to, a diaphragm valve.

[0321] In some embodiments, the tenth one-way valve element 106 includes, but is not limited to, a one-way valve.

[0322] Specifically, the twenty-fourth control valve element 107 includes a nineteenth manual diaphragm valve, wherein the nineteenth manual diaphragm valve is provided at the fourth gas input element and is used to manually control the flow of the fourth gas input element.

[0323] In some embodiments, the twenty-fourth control valve element 107 includes, but is not limited to, a diaphragm valve.

[0324] Specifically, the twenty-fifth control valve component 108 includes a twentieth manual diaphragm valve, wherein the twentieth manual diaphragm valve is provided at the fifth gas input component and is used to manually control the flow of the fifth gas input component.

[0325] In some embodiments, the twenty-fifth control valve element 108 includes, but is not limited to, a diaphragm valve.

[0326] like Figure 13 As shown, the third gas input unit 1600 includes a sixth gas input element. The sixth gas input element is connected to the standard gas source and the third gas input element, respectively, and is used to deliver standard gas to the first analysis unit 1200 and the second analysis unit 1300 to calibrate the first analysis unit 1200 and the second analysis unit 1300.

[0327] Specifically, the first end of the sixth gas input element is connected to the calibration gas source, the second end of the sixth gas input element is connected to the third gas input element, and the connection point between the second end of the sixth gas input element and the third gas input element is located downstream of the tenth one-way valve.

[0328] In some embodiments, the sixth gas input element includes but is not limited to a stainless steel tube.

[0329] Furthermore, the third gas input unit 1600 further includes a twenty-sixth control valve element 1601. The twenty-sixth control valve element 1601 is provided at the sixth gas input element for controlling the flow of gas through the sixth gas input element.

[0330] Specifically, the twenty-sixth control valve component 1601 includes a twenty-first manual diaphragm valve, wherein the twenty-first manual diaphragm valve is provided at the sixth gas input component for manually controlling the flow of the sixth gas input component.

[0331] The method of using this embodiment is as follows:

[0332] Before the system operates on mixed gas, it is necessary to perform zero gas calibration and standard gas calibration on the first analysis unit 1200 and the second analysis unit 1300 to ensure detection accuracy and improve instrument precision.

[0333] (1) Zero gas calibration operation

[0334] Manually opening the eighteenth manual diaphragm valve, the nineteenth manual diaphragm valve, and the twentieth manual diaphragm valve to allow the first gas to enter the first analysis pipeline component and the second analysis pipeline component through the third gas input component, the fourth gas input component, and the fifth gas input component;

[0335] The system turns on the fourth pressure regulating element 1204 and the fifth pressure regulating element 1304 to ensure that the gas inside the first analysis pipeline element and the second analysis pipeline element meets the standard;

[0336] The pressure-regulated gas can be adjusted through the first flow meter and the third flow meter respectively so that the flow rates supplied to the first analyzer and the second analyzer meet the standards, thereby achieving zero gas calibration of the first analyzer and the second analyzer;

[0337] (2) Standard gas calibration operation

[0338] Manually open the twenty-first manual diaphragm valve, the nineteenth manual diaphragm valve, and the twentieth manual diaphragm valve, allowing the standard gas to enter the first analysis pipeline component and the second analysis pipeline component through the sixth gas input component, the third gas input component, the fourth gas input component, and the fifth gas input component;

[0339] The system turns on the fourth pressure regulating element 1204 and the fifth pressure regulating element 1304 to ensure that the gas inside the first analysis pipeline element and the second analysis pipeline element meets the standard;

[0340] The pressure-regulated gas can be adjusted through the first flow meter and the third flow meter respectively so that the flow rates supplied to the first analyzer and the second analyzer meet the standards, thereby achieving zero gas calibration of the first analyzer and the second analyzer.

[0341] The advantage of this embodiment is that by connecting the first gas input unit and the third gas input unit with the first analysis unit and the second analysis unit, zero gas calibration and standard gas calibration operations can be performed on the first analysis unit and the second analysis unit to ensure detection accuracy and improve instrument precision.

[0342] Example 7

[0343] This embodiment is a variation of Embodiments 1 to 6.

[0344] like Figure 14 As shown, the gas mixing system further includes a backup mixed gas supply unit 1700. The backup mixed gas supply unit 1700 is connected to the second output unit 1100 and is used to deliver the mixed gas to the process tool.

[0345] like Figure 15 As shown, the backup mixed gas supply unit 1700 includes a backup gas supply pipeline component, wherein the backup gas supply pipeline component is connected to the backup gas source and the second output unit 1100 respectively, and is used to deliver the mixed gas to the process equipment.

[0346] Specifically, a first end of the backup gas supply pipeline element is in communication with the backup gas source, and a second end of the backup gas supply pipeline element is in communication with the fifth output element.

[0347] In some of these embodiments, the backup gas supply line components include, but are not limited to, stainless steel pipes.

[0348] Furthermore, the backup mixed gas supply unit 1700 further includes a twenty-seventh control valve element 1701. The twenty-seventh control valve element 1701 is provided in the backup gas supply pipeline element, and is used to control the flow of the backup gas supply pipeline element.

[0349] Specifically, the twenty-seventh control valve component 1701 comprises a twenty-second manual diaphragm valve and a seventeenth pneumatic diaphragm valve. The twenty-second manual diaphragm valve is disposed in the backup gas supply pipeline component for manually controlling the flow of gas therein; the seventeenth pneumatic diaphragm valve is disposed in the backup gas supply pipeline component, downstream of the twenty-second manual diaphragm valve, for automatically controlling the flow of gas therein.

[0350] In some embodiments, the twenty-seventh control valve element 1701 includes, but is not limited to, a diaphragm valve.

[0351] The method of using this embodiment is as follows:

[0352] In the event of a system failure and the mixed gas supply is cut off, the twenty-second manual diaphragm valve is in the normally open state, and the system opens the seventeenth pneumatic diaphragm valve. The gas in the spare gas tank can flow to the spare gas supply pipeline components, thereby ensuring that subsequent process equipment can operate normally when the mixed gas supply is cut off due to a system failure.

[0353] The advantage of this embodiment is that, by connecting the backup mixed gas supply unit with the second output unit, normal operation of subsequent process machines can be ensured when the mixed gas supply is cut off due to a system failure.

[0354] Example 8

[0355] This embodiment relates to the process equipment in the present invention.

[0356] A semiconductor process equipment includes the gas mixing system described in Examples 1 to 7.

[0357] In addition, a semiconductor process equipment further includes a first gas supply device, a second gas supply device, a purge gas supply device, a standard gas supply device, an exhaust gas treatment device, a power gas supply device, and a backup gas supply device. The first gas supply device is connected to the first gas input unit 100; the second gas supply device is connected to the second gas input unit 200; the purge gas supply device is connected to the purge unit 1500; the standard gas supply device is connected to the third gas input unit 1600; the exhaust gas treatment device is connected to the exhaust gas discharge unit 1400; the power gas supply device is connected to the second vacuum element 1501 of the purge unit 1500; and the backup gas supply device is connected to the backup mixed gas supply unit 1700.

[0358] The method of use of this embodiment is basically the same as that of embodiments 1 to 7, and will not be repeated here.

[0359] The technical effects of this embodiment are substantially the same as those of Embodiments 1 to 7, and are not described in detail here.

[0360] Example 9

[0361] This embodiment relates to the gas mixing method of the present invention.

[0362] A gas mixing method, applied to the gas mixing systems described in Examples 1 to 6 or the semiconductor process equipment described in Example 7, comprises:

[0363] The first gas input unit 100 obtains and delivers the first gas to the first mixing unit 300;

[0364] The second gas input unit 200 obtains and delivers the second gas to the first mixing unit 300;

[0365] Determine whether the pressure of the first mixing unit 300 reaches a first preset pressure threshold, and whether the pressure of the second mixing unit 400 reaches a second preset pressure threshold;

[0366] When the pressure of the first mixing unit 300 does not reach the first preset pressure threshold and / or the pressure of the second mixing unit 400 does not reach the second preset pressure threshold, the first pressure relief unit 500 and / or the second pressure relief unit 600 are opened to adjust the pressure of the first mixing unit 300 and / or the pressure of the second mixing unit 400 until the pressure of the first mixing unit 300 reaches the first preset pressure threshold and / or the pressure of the second mixing unit 400 reaches the second preset pressure threshold;

[0367] When the pressure of the first mixing unit 300 reaches a first preset pressure threshold and the pressure of the second mixing unit 400 reaches a second preset pressure threshold, the mixing control unit 700 is turned on to connect the first mixing unit 300 with the second mixing unit 400 and mix the first gas and the second gas to obtain a mixed gas;

[0368] When the mixing is completed, the first output unit 800 obtains and outputs the mixed gas to the outside.

[0369] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 1.

[0370] Furthermore, before determining whether the pressure of the first mixing unit 300 reaches the first preset pressure threshold and whether the pressure of the second mixing unit 400 reaches the second preset pressure threshold, the method further includes:

[0371] The temperature control unit 900 is turned on to adjust the temperature of the first mixing unit 300 and the temperature of the second mixing unit 400 until the temperature of the first mixing unit 300 and the temperature of the second mixing unit 400 reach the temperature threshold.

[0372] After the hybrid control unit 700 is turned on, the following steps are also included:

[0373] The temperature control unit 900 is turned on to perform temperature increase and / or temperature decrease control on the first mixing unit 300 and the second mixing unit 400 to achieve gas heat convection.

[0374] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 2.

[0375] Furthermore, after the first output unit 800 obtains and outputs the mixed gas, the method further includes:

[0376] The buffer unit 1000 obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed;

[0377] The second output unit 1100 obtains the mixed gas and delivers the mixed gas to the process machine.

[0378] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 3.

[0379] Furthermore, the gas mixing method further comprises:

[0380] The first concentration analysis unit obtains the mixed gas delivered by the first output unit 800 and detects the concentration of the mixed gas;

[0381] The second concentration analysis unit obtains the mixed gas delivered by the second output unit 1100 and detects the concentration of the mixed gas.

[0382] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 4.

[0383] Furthermore, the gas mixing method further comprises:

[0384] The purge unit 1500 obtains purge gas and delivers the purge gas to the entire pipeline and equipment to purge the entire pipeline and equipment.

[0385] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 5.

[0386] Furthermore, the gas mixing method further comprises:

[0387] The first gas input unit 100 delivers the first gas to the first analysis unit 1200 and the second analysis unit 1300 to implement zero gas calibration of the first analysis unit 1200 and the second analysis unit 1300;

[0388] The third gas input unit 1600 delivers the standard gas to the first analysis unit 1200 and the second analysis unit 1300 to implement the standard gas calibration operation for the first analysis unit 1200 and the second analysis unit 1300.

[0389] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 6.

[0390] Furthermore, the gas mixing method further comprises:

[0391] In the case that the second output unit 1100 stops supplying the mixed gas, the backup mixed gas supply unit 1700 can deliver the second mixed gas to the process equipment.

[0392] Specifically, the above-mentioned gas mixing method can refer to the method of use in Example 7.

[0393] The technical effects of this embodiment are substantially the same as those of Embodiments 1 to 7, and are not described in detail here.

[0394] Example 10

[0395] This embodiment relates to a specific implementation of the gas mixing system and method of the present invention.

[0396] like Figure 16 As shown, the first gas input unit 100 includes manual diaphragm valves (MV1, MV2, MV18, MV19, MV20), a pressure regulating valve (PRV1), a one-way valve (RV10), pressure gauges (PG1, PG2), and a pressure sensor (PT1).

[0397] The second gas input unit 200 includes manual diaphragm valves (MV3, MV4), a pressure regulating valve (PRV2), pressure gauges (PG3, PG4), and a pressure sensor (PT2).

[0398] The first mixing unit 300 includes a container tank (GT1), pneumatic diaphragm valves (AV1, AV2, AV3), a pressure sensor (PT3), and a temperature sensor (W1).

[0399] The second mixing unit 400 includes a container tank (GT2), pneumatic diaphragm valves (AV4, AV5, AV6), a pressure sensor (PT4), and a temperature sensor (W2).

[0400] The first pressure relief unit 500 includes a pneumatic diaphragm valve (AV3) and a one-way valve (RV1).

[0401] The second pressure relief unit 600 includes a pneumatic diaphragm valve (AV6) and a one-way valve (RV2).

[0402] The mixing control unit 700 includes a pneumatic diaphragm valve (AV10).

[0403] The first output unit 800 includes manual diaphragm valves (MV5, MV6) and a vacuum pump (VG1).

[0404] The temperature control unit 900 includes pneumatic diaphragm valves (AV8, AV9, AV10, AV11) and temperature sensors (W1, W2).

[0405] The buffer unit 1000 includes a buffer tank (Buffer Vessel) and manual diaphragm valves (MV7, MV8).

[0406] The second output unit 1100 includes manual diaphragm valves (MV9, MV10), a pressure regulating valve (PRV3), and a manual diaphragm valve (AV12).

[0407] The first analysis unit 1200 includes a pneumatic diaphragm valve (AV13), a one-way valve (RV3), a pressure regulating valve (PRV4), a pressure gauge (PG3), and an analyzer (LP1).

[0408] The second analysis unit 1300 includes a pneumatic diaphragm valve (AV14), a one-way valve (RV4), a pressure regulating valve (PRV5), a pressure gauge (PG4), and an analyzer (LP2).

[0409] The exhaust gas discharge unit 1400 includes a pneumatic diaphragm valve (AV15), manual diaphragm valves (MV12, MV13), and one-way valves (RV5, RV6, RV7, RV8).

[0410] The purge unit 1500 includes manual diaphragm valves (MV14, MV15, MV16, MV17), a pneumatic diaphragm valve (AV16), a one-way valve (RV9), and a Venturi vacuum pump (VG2).

[0411] The third gas input unit 1600 includes a cylinder and a manual diaphragm valve (MV21).

[0412] The backup mixed gas supply unit 1700 includes a manual diaphragm valve (MV22) and a pneumatic diaphragm valve (AV17).

[0413] Specifically, the high-flow gas mixing method of this embodiment is as follows:

[0414] (1) Purge operation before mixing

[0415] Manually open MV14, MV4, MV5, MV6, MV9, MV10, and MV12, and the system opens AV16, AV4, AV7, AV2, and AV5, so that the purge gas passes through the purge input element and the second gas input element to fill GT1, GT2, the first output element, the second output element, the third output element, the fourth output element, the fifth output element, and the second discharge pipeline element, and maintains pressure for a period of time;

[0416] Manually open MV17 so that the power gas can enter VG2 through the power gas supply component, thereby providing power to VG2;

[0417] The system opens VG2 and manually opens MV15 and MV16. VG2 forms a vacuum negative pressure at the end of the first purge output element, so that the purge gas in the entire pipeline can be discharged through the second purge output element.

[0418] (2) Gas mixture calibration operation

[0419] Before the system operates with mixed gas, it is necessary to perform zero gas calibration and standard gas calibration on LP1 and LP2 to ensure detection accuracy and improve instrument precision.

[0420] Manually open MV18, MV19, and MV20, so that the first gas can enter the first analysis pipeline component and the second analysis pipeline component through the third gas input component, the fourth gas input component, and the fifth gas input component;

[0421] The system opens PRV4 and PRV5, so that the gas inside the first analysis pipeline component and the second analysis pipeline component meets the standard;

[0422] The pressure-regulated gas can be adjusted through the first flow meter and the third flow meter respectively so that the flow rate to LP1 and LP2 meets the standard, thereby achieving zero gas calibration of LP1 and LP2;

[0423] Manually open MV21, MV19, and MV20, so that the calibration gas can enter the first analysis pipeline component and the second analysis pipeline component through the sixth gas input component, the third gas input component, the fourth gas input component, and the fifth gas input component;

[0424] The system opens PRV4 and PRV5, so that the gas inside the first analysis pipeline component and the second analysis pipeline component meets the standard;

[0425] The pressure-regulated gas can be adjusted through the first flowmeter and the third flowmeter respectively so that the flow rate supplied to LP1 and LP2 meets the standard, thereby achieving zero gas calibration of LP1 and LP2.

[0426] (3) Gas mixing operation

[0427] Manually open MV1 and MV3 so that the first gas input element is connected to the first gas source and the second gas input element is connected to the second gas source;

[0428] The system opens PRV1 and PRV2. PRV1 adjusts the pressure of the first gas in the first gas input element to 96.2 psi, and PRV2 adjusts the pressure of the second gas in the second gas input element to 4.2 psi.

[0429] By observing PG2 and PG4, when the gas pressures in the first gas input element and the second gas input element meet the standards, MV2 and MV4 are manually opened and the system automatically opens AV1 and AV2, so that N2 and H2 enter the first mixing element 301 and the second mixing element 401 respectively;

[0430] After the delivery of N2 and H2 is completed, the system closes AV1 and AV2, and monitors the pressure inside the first mixing element 301 and the second mixing element 401 in real time through PT3 and PT4. If the pressure inside the first mixing element 301 and the second mixing element 401 does not meet the standard, the system opens AV5 and AV6, so that the pressure inside the first mixing element 301 is maintained at 96 psi and the pressure inside the second mixing element 401 is maintained at 4 psi.

[0431] When the adjustment is completed, the system closes AV5 and AV6 and opens AV7, using Dalton's law of partial pressure to achieve mixing of the first gas and the second gas;

[0432] When the connecting pipe element is open, the system starts the heat exchange device and opens AV8, AV10 or AV9, AV11, so that the liquid in the heat exchange device flows into the first heat exchange cavity of GT1 or the second heat exchange cavity of GT2 through the first temperature control pipe element, thereby heating GT1 or GT2 and realizing the initial heat convection between the first gas and the second gas;

[0433] When the initial heat convection is completed, AV8, AV10 or AV9, AV11 are opened, so that the liquid in the heat exchange device flows into the first heat exchange cavity of GT1 or the second heat exchange cavity of GT2 through the first temperature control pipeline element, thereby cooling GT1 or GT2 and realizing the second heat convection between the first gas and the second gas;

[0434] Repeat the above steps until the first gas and the second gas are fully mixed;

[0435] After the gases inside GT1 and GT2 are fully mixed, the system opens AV3, AV4 and VG1, forming a vacuum negative pressure at the first end of the third output element, thereby discharging the mixed gas in GT1 and GT2 through the first and second output elements;

[0436] When GT1 and GT2 have finished mixing the first and second gases, MV5 and MV7 are manually opened to allow the third output element to flow into the buffer vessel, allowing the mixed gas to enter the buffer vessel for buffering, converting the high-pressure mixed gas into a low-pressure mixed gas. In addition, the mixed gas inside the buffer vessel can be further mixed evenly.

[0437] Manually open MV8 and MV10 to allow the mixed gas in the Buffer Vessel to enter the fifth output element;

[0438] The system turns on PRV3 and adjusts the gas pressure inside the fifth output element so that the pressure of the mixed gas can meet the requirements of the subsequent process equipment;

[0439] When the air pressure detected by PT6 meets the requirements, the system opens AV12, so that the fifth output element is connected to the sixth output element;

[0440] Manually open MV11 to connect the sixth gas output element to the process tool, thereby allowing the mixed gas to enter the process tool.

[0441] (4) Gas supply

[0442] In the event of a system failure and the mixed gas supply is cut off, the MV22 valve is in the normally open state, the system opens AV17, and the gas in the backup gas tank can flow to the backup gas supply pipeline components, thereby ensuring that subsequent process equipment can operate normally in the event of a system failure and the mixed gas supply is cut off.

[0443] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0444] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that a person skilled in the art could make various modifications and improvements without departing from the spirit of the present application, all of which fall within the scope of protection of the present application. Therefore, the scope of protection of the present patent application shall be determined by the appended claims.

Claims

1. A gas mixing system, characterized in that: include: a first gas input unit, the first gas input unit being in communication with a first gas source and configured to deliver a first gas; a second gas input unit, the second gas input unit being in communication with a second gas source and configured to deliver a second gas; a first mixing unit, the first mixing unit being in communication with the first gas input unit and being configured to store the first gas and mix the first gas with the second gas; a second mixing unit, the second mixing unit being in communication with the second gas input unit and being configured to store the second gas and mix the second gas with the first gas; a first pressure relief unit, the first pressure relief unit being in communication with the first mixing unit, and configured to control the pressure of the first mixing unit by pressure relief so that the pressure of the first gas meets a mixing requirement; a second pressure relief unit, the second pressure relief unit being in communication with the second mixing unit, and configured to control the pressure of the second mixing unit by pressure relief so that the pressure of the second gas meets a mixing requirement; a mixing control unit, the mixing control unit being in communication with the first mixing unit and the second mixing unit, respectively, and being configured to connect the first mixing unit with the second mixing unit in an open state so as to mix the first gas with the second gas; a first output unit, the first output unit being connected to the first mixing unit and the second mixing unit respectively, and being configured to output a mixed gas formed by mixing the first gas and the second gas to the outside; a temperature control unit, the temperature control unit being in communication with the first mixing unit and the second mixing unit, respectively, and being configured to control the temperature of the first mixing unit and the second mixing unit; a buffer unit, the buffer unit being in communication with the first output unit and being configured to buffer the mixed gas; a second output unit, the second output unit being connected to the buffer unit, the first output unit, and the process machine, respectively, and being configured to output the mixed gas; Wherein, the first mixing unit comprises: a first mixing element, the first mixing element being in communication with the first gas input unit, the first pressure relief unit, the mixing control unit, and the first output unit, and being configured to store the first gas and mix the first gas with the second gas; a third control valve element, the third control valve element being disposed on the first mixing element and being used to control the flow of the first mixing element; a fifth pressure monitoring element, the fifth pressure monitoring element being in communication with the first mixing element and configured to monitor the pressure of the first mixing element; a first temperature monitoring element, the first temperature monitoring element being in communication with the first mixing unit and configured to monitor the temperature of the first mixing unit; Wherein, the second mixing unit comprises: The second mixing unit comprises: a second mixing element, the second mixing element being in communication with the second gas input unit, the second pressure relief unit, the mixing control unit, and the first output unit, and being configured to store the second gas and mix the second gas with the first gas; a fourth control valve element, the fourth control valve element being disposed in the second mixing element and being used to control the flow of the second mixing element; a sixth pressure monitoring element, the sixth pressure monitoring element being in communication with the second mixing element and configured to monitor the pressure of the second mixing element; a second temperature monitoring element, the second temperature monitoring element being in communication with the second mixing unit and configured to monitor the temperature of the second mixing unit; Wherein, the hybrid control unit includes: a communicating pipe element, the communicating pipe element being in communication with the first mixing unit and the second mixing unit respectively, and being used for mixing the first gas with the second gas; a fifth control valve element, the fifth control valve element being disposed in the communication pipeline element and being used to control the flow of the communication pipeline element; Wherein, the temperature control unit comprises: a first temperature-controlled piping element, the first temperature-controlled piping element being in communication with the first mixing unit, the second mixing unit, and the heat exchange device, respectively, and being configured to transport the liquid having a first temperature from the heat exchange device to the first mixing unit and the second mixing unit; a second temperature-controlled piping element, the second temperature-controlled piping element being in communication with the first mixing unit, the second mixing unit, and the heat exchange device, respectively, and being configured to transport the liquid having a second temperature from the first mixing unit and the second mixing unit to the heat exchange device; an eighth control valve element, the eighth control valve element being disposed in the first mixing unit and being used to control the flow among the first temperature-control pipeline element, the second temperature-control pipeline element, and the first mixing unit; A ninth control valve element is provided in the second mixing unit and is used to control the flow among the first temperature-control pipeline element, the second temperature-control pipeline element and the second mixing unit.

2. The gas mixing system according to claim 1, characterized in that The first gas input unit comprises: a first gas input element, the first gas input element being in communication with a first gas source and the first mixing unit, respectively, and being configured to deliver the first gas; a first control valve element, the first control valve element being disposed at the first gas input element and being used to control the flow of the first gas input element; a first pressure regulating element, the first pressure regulating element being provided at the first gas input element and being used to regulate the pressure of the first gas input element; a first pressure monitoring element, the first pressure monitoring element being in communication with the first gas input element and being configured to monitor upstream pressure and downstream pressure of the first pressure regulating element; a second pressure monitoring element, the second pressure monitoring element being in communication with the first gas input element and configured to monitor the pressure of the first gas flowing into the first mixing unit; and / or The second gas input unit comprises: a second gas input element, the second gas input element being connected to a second gas source and the second mixing unit, respectively, for delivering a second gas; a second control valve element, the second control valve element being disposed at the second gas input element and being used to control the flow of the second gas input element; a second pressure regulating element, the second pressure regulating element being provided at the second gas input element and being used to regulate the pressure of the second gas input element; a third pressure monitoring element, the third pressure monitoring element being in communication with the second gas input element and being configured to monitor the upstream pressure and the downstream pressure of the second pressure regulating element; a fourth pressure monitoring element, the fourth pressure monitoring element being in communication with the second gas input element and configured to monitor the pressure of the second gas flowing into the second mixing unit; and / or The first pressure relief unit includes: a first pressure relief piping element, the first pressure relief piping element being in communication with the first mixing unit and the exhaust gas treatment device, respectively, and being configured to transport the first gas; a first one-way valve element, the first one-way valve element being arranged in the first pressure relief pipeline element, and being used for allowing gas to flow in one direction; and / or The second pressure relief unit includes: a second pressure relief piping element, the second pressure relief piping element being in communication with the second mixing unit and the exhaust gas treatment device, respectively, for conveying a second gas; A second one-way valve element, which is provided in the second pressure relief pipeline element and is used to allow gas to flow in one direction; and / or The first output unit includes: a first output element, the first output element being in communication with the first mixing unit and configured to deliver the mixed gas; a second output element, the second output element being in communication with the second mixing unit and configured to deliver the mixed gas; a third output element, the third output element being respectively connected to the first output element and the second output element for delivering a mixed gas; a first vacuum element, which is disposed on the third output element and is used to perform vacuum processing on the first mixing unit and the second mixing unit; a sixth control valve element, the sixth control valve element being disposed on the third output element and located downstream of the first vacuum element, for controlling the flow of the third output element; a bypass pipeline element, the bypass pipeline element being in communication with the third output element, and the connection points between the two ends of the bypass pipeline element and the third output element being located upstream and downstream of the first vacuum element, respectively, for transporting the mixed gas outward; A seventh control valve element is provided in the bypass pipeline element and is used to control the flow of the bypass pipeline element.

3. The gas mixing system according to claim 1, wherein: The buffer unit includes: a buffer element, the buffer element being in communication with the first output unit and the second output unit, respectively, and being used to buffer the mixed gas; a tenth control valve element, the tenth control valve element being disposed on the buffer element and configured to control the flow of the buffer element; and / or The second output unit includes: a fourth output element, the fourth output element being in communication with the first output unit and configured to deliver the mixed gas; an eleventh control valve element, the eleventh control valve element being disposed at the fourth output element and being used to control the flow of the fourth output element; a fifth output element, the fifth output element being in communication with the fourth output element and the buffer unit, respectively, and being configured to deliver the mixed gas; a twelfth control valve element, the twelfth control valve element being disposed at the fifth output element and being used to control the flow of the fifth output element; at least one sixth output element, the sixth output element being connected to the fifth output element and the process machine, respectively, for delivering the mixed gas; at least one thirteenth control valve element, the thirteenth control valve element being respectively disposed at the corresponding sixth output element and being used to control the flow of the sixth output element; a third pressure regulating element, the third pressure regulating element being provided at the fifth output element and being used for regulating the pressure of the fifth output element; A seventh pressure monitoring element is connected to the fifth output element and is used to monitor the upstream pressure and the downstream pressure of the third pressure regulating element.

4. The gas mixing system according to any one of claims 1 to 3, characterized in that: Also includes: a first analyzing unit, the first analyzing unit being in communication with the first mixing unit and the second mixing unit, respectively, and being configured to analyze the concentration of the mixed gas; The second analyzing unit is connected to the second output unit and is used to analyze the concentration of the mixed gas.

5. The gas mixing system according to claim 4, characterized in that: The first analyzing unit includes: a first analysis pipeline element, the first analysis pipeline element being in communication with the first output unit and being used for delivering the mixed gas; a first analysis element, the first analysis element being in communication with the first analysis pipeline element and being used to monitor the concentration of the mixed gas; a fourteenth control valve element, the fourteenth control valve element being disposed in the first analysis pipeline element and being used to control the flow of the first analysis pipeline element; a third one-way valve element, the third one-way valve element being disposed in the first analysis pipeline element and located downstream of the fourteenth control valve element, for enabling one-way flow of gas; a fourth pressure regulating element, the fourth pressure regulating element being provided in the first analysis pipeline element and being used for regulating the pressure of the first analysis pipeline element; an eighth pressure monitoring element, the eighth pressure monitoring element being in communication with the first analysis line element and configured to detect the pressure of the first analysis line element; and / or The second analysis unit includes: a second analysis pipeline element, the second analysis pipeline element being in communication with the second output unit and being used for delivering the mixed gas; a second analysis element, the second analysis element being in communication with the second analysis pipeline element and being configured to monitor the concentration of the mixed gas; a fifteenth control valve element, the fifteenth control valve element being disposed in the second analysis pipeline element and being used to control the flow of the second analysis pipeline element; a fourth one-way valve element, the fourth one-way valve element being disposed in the second analysis pipeline element and located downstream of the fifteenth control valve element, for enabling one-way flow of gas; a fifth pressure regulating element, the fifth pressure regulating element being provided in the second analysis pipeline element and being used for regulating the pressure of the second analysis pipeline element; A ninth pressure monitoring element is connected to the second analysis line element and is used to detect the pressure of the second analysis line element.

6. A semiconductor process equipment, characterized in that: include: The gas mixing system according to any one of claims 1 to 5.

7. A gas mixing method, characterized in that: The gas mixing system according to any one of claims 1 to 5 or the semiconductor process equipment according to claim 6 comprises: The first gas input unit obtains and delivers the first gas to the first mixing unit; The second gas input unit obtains and delivers the second gas to the second mixing unit; Turning on the temperature control unit to adjust the temperature of the first mixing unit and the temperature of the second mixing unit until the temperature of the first mixing unit reaches a temperature threshold and the temperature of the second mixing unit reaches a temperature threshold; Determine whether the pressure of the first mixing unit reaches a first preset pressure threshold and whether the pressure of the second mixing unit reaches a second preset pressure threshold; When the pressure of the first mixing unit does not reach the first preset pressure threshold and / or the pressure of the second mixing unit does not reach the second preset pressure threshold, opening the first pressure relief unit and / or the second pressure relief unit to adjust the pressure of the first mixing unit and / or the pressure of the second mixing unit until the pressure of the first mixing unit reaches the first preset pressure threshold and / or the pressure of the second mixing unit reaches the second preset pressure threshold; When the pressure of the first mixing unit reaches a first preset pressure threshold and the pressure of the second mixing unit reaches a second preset pressure threshold, the mixing control unit is turned on to connect the first mixing unit with the second mixing unit and mix the first gas and the second gas to obtain a mixed gas; Turning on the temperature control unit to perform temperature increase and / or temperature decrease control on the first mixing unit and the second mixing unit to achieve gas heat convection; When the mixing is completed, the first output unit obtains and outputs the mixed gas to the outside; The buffer unit obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed; The second output unit obtains the mixed gas and delivers the mixed gas to the process machine.

8. The gas mixing method according to claim 7, characterized in that: Also includes: The first concentration analysis unit obtains the mixed gas delivered by the first output unit and detects the concentration of the mixed gas; and / or The second concentration analysis unit obtains the mixed gas delivered by the second output unit and detects the concentration of the mixed gas.

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