Substrate processing apparatus and substrate processing method

Abstract

This substrate processing apparatus is provided with: a chemical liquid nozzle (31) that ejects a chemical liquid downward toward the upper surface of a horizontal substrate; at least one actuator that moves the chemical nozzle (31) between a processing position at which the chemical nozzle (31) overlaps the substrate in plan view and a standby position at which the chemical nozzle (31) does not overlap the substrate in plan view; a standby tank (56) in which the liquid medicine ejected downward from the liquid medicine nozzle (31) located at the standby position is received by a recess (57); and at least one washing water nozzle (64-65) that sprays washing water from outside the standby tank (56) toward the standby tank (56) in a mist or spray form.

Description

[0001] Related Application

[0002] This application claims priority based on Japanese Patent Application No. 2022-207275 filed on December 23, 2022, the entire content of which is incorporated herein by reference. Technical Field

[0003] The present invention relates to a substrate processing apparatus and a substrate processing method for processing a substrate. The substrate includes, for example: semiconductor wafers, substrates for FPD (Flat Panel Display) such as liquid crystal display devices or organic EL (electroluminescence) display devices, substrates for optical discs, substrates for magnetic disks, substrates for magneto-optical discs, substrates for photomasks, ceramic substrates, substrates for solar cells, etc. Background Art

[0004] Patent Document 1 discloses that in the processing of substrates such as semiconductor wafers, chemicals with easily variable concentrations such as BHF (Buffered Hydrogen Fluoride) or TMAH (tetramethylammonium hydroxide) are sometimes used, and sometimes crystals mainly composed of HF precipitate in the liquid due to an increase in the concentration of HF (hydrofluoric acid) in BHF. Patent Document 1 also discloses that in order to rinse the chemicals such as BHF remaining in the chemical nozzle, pure water is supplied to the chemical nozzle and the chemical nozzle is made to eject toward the opening of the standby tank.

[0005] Prior Art Documents

[0006] Patent Document: Japanese Patent Laid-Open No. 2018-121088 Summary of the Invention

[0007] Technical Problem to be Solved by the Invention

[0008] Sometimes, before supplying the chemical from the chemical nozzle to the substrate, pre-distribution is performed in which the chemical nozzle ejects the chemical toward a container called a standby tank or a standby box. Such ejection of the chemical is also called virtual distribution or the like. When pre-distribution is performed, chemical droplets are generated, and the droplets leak from the standby tank. Although the generated droplets can be reduced, or the droplets leaking from the standby tank can be reduced, it is difficult to make the droplets leaking from the standby tank zero. When the chemical droplets adhere to the outer surface of the standby tank, crystals may precipitate from the droplets. If such crystals are suspended, they may come into contact with the substrate.

[0009] An embodiment of the present invention provides a substrate processing apparatus and a substrate processing method capable of preventing a large amount of crystallization from occurring in or near a standby tank.

[0010] Technical means for solving the problem

[0011] An embodiment of the present invention provides a substrate processing apparatus having: a liquid medicine nozzle that sprays liquid medicine downward onto the upper surface of a horizontal substrate; at least one actuator that moves the liquid medicine nozzle between a processing position and a standby position, the processing position being a position where the liquid medicine nozzle overlaps the substrate in a top view, and the standby position being a position where the liquid medicine nozzle does not overlap the substrate in a top view; a standby tank that includes a downwardly recessed portion and catches the liquid medicine sprayed downward from the liquid medicine nozzle located at the standby position; and at least one cleaning water nozzle that sprays cleaning water in a mist or spray form from outside the standby tank toward the standby tank.

[0012] According to this configuration, the liquid medicine is sprayed downward from the liquid medicine nozzle and supplied to the upper surface of the horizontal substrate. At least one actuator moves the liquid medicine nozzle from the processing position where the liquid medicine nozzle overlaps the substrate in a top view to the standby position where the liquid medicine nozzle does not overlap the substrate in a top view. The liquid medicine sprayed downward from the liquid medicine nozzle located at the standby position is caught by the recessed portion of the standby tank. The mist or spray form of cleaning water sprayed from the cleaning water nozzle is supplied to the standby tank and the components around the standby tank.

[0013] When the liquid medicine sprayed downward from the liquid medicine nozzle is caught by the standby tank, droplets of the liquid medicine are generated. When the liquid medicine evaporates, crystals may precipitate from the droplets of the liquid medicine. By spraying cleaning water from the cleaning water nozzle toward the standby tank, water can be provided to the droplets of the liquid medicine, thereby preventing or delaying the precipitation of crystals from the droplets. In the case where the droplets of the liquid medicine crystallize, the crystals can be restored to a liquid state by dissolving the crystals in the cleaning water. Even if the crystals are not completely restored to a liquid state, the crystals can be made less likely to suspend in the air by attaching the cleaning water to the crystals.

[0014] It is difficult to determine the range in which the droplets of the liquid medicine leaking from the standby tank spread. The droplets of the liquid medicine sometimes spread over an extremely wide range. Considering automatically supplying cleaning water to all the ranges that the droplets of the liquid medicine can spread to and flushing the leaked liquid medicine with the cleaning water. However, this method requires a large amount of cleaning water, and a large amount of cleaning water will be supplied to unnecessary ranges. When spraying cleaning water in a mist or spray form, compared with the case of supplying cleaning water from the nozzle by forming a liquid column (cleaning water column) having the same diameter as the nozzle, a small amount of cleaning water can be supplied to a larger range.

[0015] When the cleaning water is sprayed toward the standby tank in a mist or spray form, the liquid medicine leaking from the standby tank may remain in the standby tank or its vicinity. For example, when the substrate processing apparatus is cleaned regularly automatically or manually, if such liquid medicine is rinsed, the source of crystal formation can be removed. If the cleaning water is sprayed toward the standby tank in a mist or spray form, crystal precipitation can be prevented or postponed. Therefore, there is no need to increase the frequency of regular cleaning. Thus, new problems associated with the supply of cleaning water, such as a large amount of cleaning water being supplied to an unnecessary range, can be prevented, and a large amount of crystals can be prevented from being generated in the standby tank or its vicinity.

[0016] In the above-described embodiment, at least one of the following features may be added to the substrate processing apparatus.

[0017] The at least one cleaning water nozzle includes an inner ejection port, the inner ejection port is disposed above an opening formed in the outer surface of the standby tank by the recess of the standby tank, and the at least one cleaning water nozzle sprays the cleaning water from the inner ejection port toward the opening of the standby tank in a mist or spray form.

[0018] In this case, the cleaning water is sprayed from the inner ejection port of the cleaning water nozzle disposed above the opening of the standby tank toward the opening of the standby tank in a mist or spray form. The mist or spray-shaped cleaning water enters the standby tank through the opening of the standby tank. A part of the cleaning water is supplied to the outer surface of the standby tank or members around the standby tank. Droplets of the liquid medicine are likely to remain at or near the opening of the standby tank. Therefore, the cleaning water can be efficiently supplied to the droplets of the liquid medicine.

[0019] The substrate processing apparatus further has an exhaust pipe for discharging gas from the recess of the standby tank.

[0020] In this case, gas containing fine particles of liquid or solid suspended in the air, or gas not containing such fine particles is discharged from the recess of the standby tank to the exhaust pipe. The mist or spray-shaped cleaning water sprayed from the cleaning water nozzle enters the standby tank through the opening of the standby tank. The cleaning water spray in the recess is discharged to the exhaust pipe. Thus, the cleaning water remaining in the recess can be reduced.

[0021] When the liquid medicine nozzle is in the processing position, the at least one cleaning water nozzle sprays the cleaning water from the inner ejection port toward the opening of the standby tank in a mist or spray form.

[0022] In this case, when the liquid chemical nozzle is disposed at a processing position that overlaps the substrate in a plan view, cleaning water is sprayed in a mist or spray form from the inside of the cleaning water nozzle disposed above the opening of the standby tank, with the ejection port facing the opening of the standby tank. When the liquid chemical nozzle is disposed at the standby position, if the cleaning water nozzle ejects cleaning water, the mist or spray-form cleaning water will adhere to the liquid chemical nozzle. Therefore, if the cleaning water nozzle ejects cleaning water when the liquid chemical nozzle is disposed at the processing position, the cleaning water adhering to the liquid chemical nozzle can be reduced.

[0023] The substrate processing apparatus further includes a droplet blocking member that directly faces horizontally the liquid chemical nozzle located at the standby position, and catches droplets of the liquid chemical generated when the liquid chemical nozzle located at the standby position ejects the liquid chemical downward toward the standby tank. The at least one cleaning water nozzle ejects the cleaning water in a mist or spray form from the inside, with the ejection port facing the droplet blocking member and the opening of the standby tank.

[0024] In this case, the liquid chemical nozzle directly faces horizontally the droplet blocking member. A part of the droplets of the liquid chemical generated when the liquid chemical nozzle located at the standby position ejects the liquid chemical downward toward the standby tank is caught by the droplet blocking member. The ejection port on the inside of the cleaning water nozzle supplies the mist or spray-form cleaning water not only to the opening of the standby tank but also to the droplet blocking member. Thereby, the droplet blocking member can be used to narrow the range of diffusion of the droplets of the liquid chemical, and thus crystallization from the droplets of the liquid chemical adhering to the droplet blocking member can be prevented or delayed.

[0025] When the standby tank and the droplet blocking member are observed from above, the opening of the standby tank can be visually confirmed.

[0026] In this case, the opening of the standby tank can be observed from above the standby tank and the droplet blocking member. If the cleaning water is sprayed in a mist or spray form from above the standby tank and the droplet blocking member, the cleaning water is supplied to the droplet blocking member and enters the standby tank through the opening of the standby tank. If a sealing plate disposed above the opening of the standby tank is provided on the droplet blocking member, the range of upward diffusion of the droplets of the liquid chemical can be narrowed, but there is a case where droplets of the liquid chemical remain in the space below the sealing plate. In this case, due to the presence of the sealing plate, it is difficult to clean the space below the sealing plate. In a configuration where the opening of the standby tank can be observed from above the standby tank and the droplet blocking member, such a problem can be prevented from occurring.

[0027] The droplet blocking member may also have at least one of a first side plate, a second side plate, a third side plate, and a sealing plate. The first side plate is disposed on the side opposite to the at least one actuator in a plan view with respect to the discharge port of the liquid medicine nozzle in the standby position. The second side plate is disposed on the side opposite to the processing position in a plan view with respect to the discharge port of the liquid medicine nozzle in the standby position. The third side plate is disposed on the side of the at least one actuator in a plan view with respect to the discharge port of the liquid medicine nozzle in the standby position. The sealing plate is disposed above the liquid medicine nozzle and the standby tank so as to overlap the opening of the liquid medicine nozzle and the standby tank in the standby position in a plan view.

[0028] The substrate processing apparatus further includes an air curtain nozzle that forms an air flow overlapping the standby tank in a plan view above the standby tank by ejecting gas from a discharge port disposed above the inner discharge port of the at least one cleaning water nozzle.

[0029] In this case, gas is ejected from the discharge port of the air curtain nozzle disposed above the inner discharge port of the cleaning water nozzle. The gas ejected from the discharge port of the air curtain nozzle forms an air flow above the spray of the cleaning water suspended in the space above the standby tank. The spray of the cleaning water flowing upward is blocked by the air flow flowing from the air curtain nozzle. Thereby, the spray of the cleaning water diffusing to an unnecessary range can be reduced.

[0030] The at least one cleaning water nozzle includes an outer discharge port disposed below the opening formed in the outer surface of the standby tank by the concave portion of the standby tank, and the at least one cleaning water nozzle ejects the cleaning water from the outer discharge port toward the outer surface of the standby tank in a mist or spray form.

[0031] In this case, the cleaning water is ejected from the outer discharge port of the cleaning water nozzle disposed below the opening of the standby tank toward the outer surface of the standby tank in a mist or spray form. Since the outer discharge port of the cleaning water nozzle is disposed below the opening of the standby tank, the spray of the cleaning water is not easily introduced into the standby tank through the opening of the standby tank. Thereby, the cleaning water remaining in the concave portion can be reduced, and the cleaning water can be efficiently supplied to the outer surface of the standby tank where the droplets of the liquid medicine are likely to adhere.

[0032] Another embodiment of the present invention provides a substrate processing method, including: when a liquid medicine nozzle for spraying liquid medicine onto the upper surface of a substrate facing downward horizontally is disposed at a standby position where it does not overlap with the substrate in a top view, a step of catching the liquid medicine sprayed downward from the liquid medicine nozzle by a recess of a downwardly recessed standby tank; and after the liquid medicine nozzle located at the standby position starts spraying the liquid medicine downward toward the standby tank, causing at least one cleaning water nozzle to spray cleaning water in a mist or spray form from outside the standby tank toward the standby tank. According to this method, the same effects as those of the above-described substrate processing apparatus can be achieved. At least one of the above-described features related to the substrate processing apparatus may also be added to the above-described substrate processing method. As long as it is after the liquid medicine nozzle located at the standby position starts spraying the liquid medicine downward toward the standby tank, the at least one cleaning water nozzle may also spray cleaning water when the liquid medicine nozzle is disposed at a position other than the standby position.

[0033] The above or other objects, features, and effects in the present invention will become clear from the description of the following embodiments with reference to the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1A It is a schematic top view showing the layout of a substrate processing apparatus according to an embodiment of the present invention.

[0035] Figure 1B It is a schematic side view of the substrate processing apparatus.

[0036] Figure 2A It is a schematic view of horizontally observing the inside of the processing unit.

[0037] Figure 2B It is a schematic top view showing the inside of the processing unit.

[0038] Figure 3 It is a block diagram showing the electrical structure of the substrate processing apparatus.

[0039] Figure 4 It is a process chart for explaining an example of the processing of a substrate using the substrate processing apparatus.

[0040] Figure 5 It is a schematic view of horizontally observing the liquid medicine nozzle and the standby tank.

[0041] Figure 6 It is a schematic view for explaining the path of the movement of the liquid medicine nozzle.

[0042] Figure 7 It is a schematic view of horizontally observing the liquid medicine nozzle and the standby tank from the substrate side.

[0043] Figure 8It is a schematic view of the liquid medicine nozzle and the standby tank observed from above.

[0044] Figure 9 It is from Figure 7 a schematic view of the liquid medicine nozzle and the standby tank observed horizontally from the left side of the paper surface in

[0045] Figure 10 It is a timing chart for explaining the ejection of the spray performed during the period when the liquid medicine nozzle is pre-allocated to the standby position and the liquid medicine is supplied to the substrate until it returns to the standby position at the processing position. Detailed implementation mode

[0046] Figure 1A It is a schematic top view showing the layout of the substrate processing apparatus 1 according to an embodiment of the present invention. Figure 1B It is a schematic side view of the substrate processing apparatus 1.

[0047] The substrate processing apparatus 1 is a single-chamber type apparatus that processes circular substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes: a load port LP that holds a carrier CA accommodating the substrate W; a plurality of processing units 2 that process the substrate W conveyed from the carrier CA on the load port LP using a processing fluid such as a processing liquid or a processing gas; a transfer system 5 that transfers the substrate W between the carrier CA on the load port LP and the plurality of processing units 2; and a control device 3 that controls the substrate processing apparatus 1.

[0048] The plurality of processing units 2 form a plurality of towers TW. Figure 1A An example in which 4 towers TW are formed is shown. As Figure 1B shown, the plurality of processing units 2 included in one tower TW are stacked vertically. As Figure 1A shown, the plurality of towers TW form two rows arranged in the depth direction of the substrate processing apparatus 1 when viewed from above. When viewed from above, the two rows face each other across the transfer path 4.

[0049] The transfer system 5 includes: an indexer robot IR that transfers the substrate W between the carrier CA on the load port LP and the plurality of processing units 2; and a central robot CR that transfers the substrate W between the indexer robot IR and the plurality of processing units 2. The indexer robot IR is arranged between the load port LP and the central robot CR when viewed from above. The central robot CR is arranged on the transfer path 4.

[0050] The indexer robot IR includes one or more hands Hi that support the substrate W horizontally. The hand Hi can move parallel to either the horizontal direction or the vertical direction. The hand Hi can rotate around a vertical straight line. The hand Hi can carry the substrate W into and out of the carrier CA on any load port LP, and can exchange the substrate W with the central robot CR.

[0051] The central robot CR includes one or more hand parts Hc that support the substrate W horizontally. The hand part Hc can move parallel to either the horizontal direction or the vertical direction. The hand part Hc can rotate around a vertical straight line. The hand part Hc can transfer the substrate W to and from the index robot IR and can carry the substrate W into and out of any of the processing units 2.

[0052] Next, the processing unit 2 will be described.

[0053] Figure 2A It is a schematic view of observing the inside of the processing unit 2 horizontally. Figure 2B It is a schematic top view showing the inside of the processing unit 2. Figure 2A DIW (Deionized Water) in it represents pure water. This is the same in other figures.

[0054] As Figure 2A shown, the processing unit 2 includes: a box-shaped chamber 12 having an internal space; a rotary chuck 21 that holds one substrate W horizontally in the chamber 12 and rotates it around a vertical rotation axis A1 passing through the central portion of the substrate W; and a plurality of nozzles that supply a processing fluid such as a processing liquid or a processing gas to the substrate W held by the rotary chuck 21.

[0055] As Figure 2B shown, the chamber 12 includes: a box-shaped partition wall 13 provided with a carry-in / carry-out opening 13b through which the substrate W carried by the central robot CR (refer to Figure 1A ) passes; and a shutter 17 that opens and closes the carry-in / carry-out opening 13b. As Figure 2A shown, the chamber 12 further includes a rectifying plate 18 disposed below an air supply port 13a that opens on the top surface of the partition wall 13. An FFU 11 (Fan Filter Unit 11) that conveys clean air (air filtered by a filter) is disposed above the air supply port 13a. The air supply port 13a is provided at the upper end portion of the chamber 12, and an exhaust pipe 49 is disposed at the lower end portion of the chamber 12. The upstream end 49u of the exhaust pipe 49 is disposed in the chamber 12, and the downstream end of the exhaust pipe 49 is disposed outside the chamber 12.

[0056] The rectifying plate 18 divides the internal space of the chamber 12 into an upper space Su above the rectifying plate 18 and a lower space SL below the rectifying plate 18. The upper space Su between the top surface of the partition wall 13 and the upper surface of the rectifying plate 18 is a diffusion space for diffusing clean air. The lower space SL between the lower surface of the rectifying plate 18 and the bottom surface of the partition wall 13 is a processing space for processing the substrate W. The rotary chuck 21 is disposed in the lower space SL. The vertical distance from the bottom surface of the partition wall 13 to the lower surface of the rectifying plate 18 is longer than the vertical distance from the upper surface of the rectifying plate 18 to the top surface of the partition wall 13.

[0057] The FFU 11 transports clean air to the upper space Su through the air supply port 13a. The clean air supplied to the upper space Su collides with the rectifying plate 18 and diffuses in the upper space Su. The clean air in the upper space Su flows downward from the entire area of the rectifying plate 18 through a plurality of through holes penetrating the rectifying plate 18 vertically. The clean air supplied to the lower space SL is sucked into the exhaust pipe 49 and discharged from the chamber 12. Thus, a downward flow (downward current) of uniform clean air flowing downward from the rectifying plate 18 is formed in the lower space SL. The processing of the substrate W is performed in a state where a downward flow of clean air is formed.

[0058] The rotary chuck 21 includes a plurality of chuck pins 22 that horizontally hold the substrate W, and a disk-shaped rotary base 23 that supports the plurality of chuck pins 22. The rotary chuck 21 further includes: a rotary shaft 24 that extends downward from the central portion of the rotary base 23; an electric motor 25 that rotates the plurality of chuck pins 22 and the rotary base 23 by rotating the rotary shaft 24; and a chuck housing 26 that surrounds the electric motor 25.

[0059] The rotary base 23 includes a circular upper surface disposed below the substrate W, and a cylindrical outer peripheral surface that extends downward from the outer periphery of the upper surface of the rotary base 23. The upper surface of the rotary base 23 is parallel to the lower surface of the substrate W. The upper surface of the rotary base 23 is separated from the lower surface of the substrate W. The upper surface of the rotary base 23 is concentric with the substrate W. The outer diameter of the upper surface of the rotary base 23 is larger than the outer diameter of the substrate W. The chuck pins 22 protrude upward from the outer peripheral portion of the upper surface of the rotary base 23.

[0060] As Figure 2A shown, the plurality of nozzles include a chemical liquid nozzle 31 that sprays a chemical liquid onto the upper surface of the substrate W, a rinsing liquid nozzle 34 that sprays a rinsing liquid onto the upper surface of the substrate W, and a solvent nozzle 37 that sprays a liquid of an organic solvent onto the upper surface of the substrate W. Figure 2A An example is shown where BHF is sprayed from the chemical liquid nozzle 31, pure water (deionized water: DIW) is sprayed from the rinsing liquid nozzle 34, and IPA (isopropyl alcohol) is sprayed from the solvent nozzle 37.

[0061] BHF is a liquid containing hydrofluoric acid and ammonium fluoride. BHF is used for removing oxide films such as silicon oxide films. If water or ammonia evaporates from BHF, crystals containing ammonium fluoride and ammonium bifluoride (alias: ammonium hydrogendifluoride) will precipitate. BHF is an example of a liquid medicine in which crystals are likely to precipitate. The BHF ejected from the liquid medicine nozzle 31 can be at room temperature (for example, 20 to 30 °C), or higher or lower than room temperature.

[0062] The liquid medicine can also be an aqueous solution other than BHF. Specifically, the liquid medicine can be a liquid containing at least one of sulfuric acid, nitric acid, hydrochloric acid, hydrofluoric acid, phosphoric acid, acetic acid, ammonia water, hydrogen peroxide water, organic acids (such as citric acid, oxalic acid, etc.), organic bases (such as, TMAH: tetramethylammonium hydroxide, etc.), surfactants, and corrosion inhibitors, or it can be a liquid other than these. The liquid medicine can also be an aqueous solution containing carboxylic acid or an aqueous solution containing citric acid and a chelating agent.

[0063] The rinsing liquid can also be a liquid other than pure water. The liquid of the organic solvent can also be a liquid other than IPA. Specifically, the rinsing liquid can be a liquid containing at least one of pure water, carbonated water, electrolyzed ion water, hydrogen water, ozone water, hydrochloric acid water with a dilution concentration (for example, about 10 to 100 ppm), and ammonia water with a dilution concentration (for example, about 10 to 100 ppm), or it can be a liquid other than these. The liquid of the organic solvent can be a liquid containing at least one of IPA, HFE (hydrofluoroether), methanol, ethanol, acetone, and trans-1,2-dichloroethylene, or it can be a liquid other than these.

[0064] The liquid medicine nozzle 31 can be a scanning nozzle that moves the collision position of the processing liquid on the substrate W within the upper surface of the substrate W, or it can be a fixed nozzle that cannot move the collision position of the processing liquid on the substrate W. The same applies to other nozzles. Figure 2A An example is shown in which the liquid medicine nozzle 31, the rinsing liquid nozzle 34, and the solvent nozzle 37 are scanning nozzles.

[0065] The processing unit 2 includes a nozzle moving unit that horizontally moves one or more scanning nozzles. One nozzle moving unit can be provided and connected to two or more scanning nozzles, or one nozzle moving unit can be provided for each scanning nozzle. Figure 2B An example is shown in which the liquid medicine nozzle 31 is connected to the first nozzle moving unit 33, the rinsing liquid nozzle 34 is connected to the second nozzle moving unit 36, and the solvent nozzle 37 is connected to the third nozzle moving unit 39.

[0066] Figure 2BAn example is shown below: The first nozzle moving unit 33, the second nozzle moving unit 36, and the third nozzle moving unit 39 are respectively rotating units that horizontally move one or more scanning nozzles along an arc-shaped path in a plan view. Since the radius of the arc-shaped path is large, the rotating unit horizontally moves one or more scanning nozzles along a path that can be regarded as a straight line in a plan view. At least one of the first nozzle moving unit 33, the second nozzle moving unit 36, and the third nozzle moving unit 39 may also be a sliding unit that horizontally moves one or more scanning nozzles along a linear path in a plan view.

[0067] The liquid medicine nozzle 31 is connected to a liquid medicine pipe 32p that guides the liquid medicine toward the liquid medicine nozzle 31. When the liquid medicine valve 32v installed in the liquid medicine pipe 32p is opened, the liquid medicine is supplied from the liquid medicine pipe 32p to the liquid medicine nozzle 31 and continuously ejected downward from the liquid medicine nozzle 31. The first nozzle moving unit 33 horizontally moves the liquid medicine nozzle 31 between a processing position, where the liquid medicine nozzle 31 overlaps the substrate W in a plan view, and a standby position, where the liquid medicine nozzle 31 does not overlap the substrate W in a plan view.

[0068] The liquid medicine valve 32v includes: a valve body provided with an annular valve seat through which the processing liquid passes; a valve body that can move relative to the valve seat; and an actuator that moves the valve body between a closed position, where the valve body contacts the valve seat, and an open position, where the valve body is separated from the valve seat, which is not shown in the figure. The same applies to other valves. The actuator can be a pneumatic actuator or an electric actuator, or an actuator other than these. The control device 3 controls the actuator to open and close the liquid medicine valve 32v.

[0069] The rinsing liquid nozzle 34 is connected to a rinsing liquid pipe 35p that guides the rinsing liquid toward the rinsing liquid nozzle 34. When the rinsing liquid valve 35v installed in the rinsing liquid pipe 35p is opened, the rinsing liquid is supplied from the rinsing liquid pipe 35p to the rinsing liquid nozzle 34 and continuously ejected downward from the rinsing liquid nozzle 34. The second nozzle moving unit 36 horizontally moves the rinsing liquid nozzle 34 between a processing position, where the rinsing liquid nozzle 34 overlaps the substrate W in a plan view, and a standby position, where the rinsing liquid nozzle 34 does not overlap the substrate W in a plan view.

[0070] The solvent nozzle 37 is connected to a solvent pipe 38p that guides a liquid of an organic solvent toward the solvent nozzle 37. When a solvent valve 38v installed in the solvent pipe 38p is opened, the liquid of the organic solvent is supplied from the solvent pipe 38p to the solvent nozzle 37 and continuously ejected downward from the solvent nozzle 37. A third nozzle moving unit 39 horizontally moves the solvent nozzle 37 between a processing position where the processing liquid ejected from the solvent nozzle 37 is supplied to the upper surface of the substrate W and a standby position where the solvent nozzle 37 is located around the rotary chuck 21 in a plan view.

[0071] The processing unit 2 includes a cylindrical processing cup 41 that catches the processing liquid scattered outward from the rotary chuck 21 and the substrate W. The processing cup 41 surrounds the rotary chuck 21 around the rotation axis A1 of the substrate W in the chamber 12. The processing cup 41 includes a plurality of guard plates 44 that catch the processing liquid scattered outward from the rotary chuck 21 and the substrate W, and a plurality of cups 43 that catch the processing liquid guided downward by the plurality of guard plates 44. Figure 2A An example is shown in which two guard plates 44 and two cups 43 are provided, and the outermost cup 43 is integrated with the second guard plate 44 from above.

[0072] The guard plate 44 includes a cylindrical portion 45 that surrounds the rotary chuck 21 and an annular top portion 46 that extends obliquely upward from the upper end portion of the cylindrical portion 45 toward the rotation axis A1. The plurality of top portions 46 overlap vertically, and the plurality of cylindrical portions 45 are arranged concentrically. The annular upper end of the top portion 46 corresponds to the upper end 44u of the guard plate 44 that surrounds the substrate W and the rotary base 23 in a plan view. The plurality of cups 43 are respectively arranged below the plurality of cylindrical portions 45. The cup 43 forms an annular groove that catches the processing liquid guided downward by the guard plate 44.

[0073] In addition to including the plurality of guard plates 44 and the plurality of cups 43, the processing cup 41 further includes a cylindrical tubular outer wall 42 that surrounds the plurality of guard plates 44 and the plurality of cups 43. The tubular outer wall 42 surrounds the outermost guard plate 44 among all the guard plates 44 with a space therebetween in the radial direction. The tubular outer wall 42 extends upward from the bottom surface of the chamber 12. As described below, the guard plate 44 can be lifted and lowered between an upper position and a lower position. The upper end of the tubular outer wall 42 is arranged below the upper end 44u of the guard plate 44 located in the upper position.

[0074] The processing unit 2 includes a guard plate lifting unit 47 that individually lifts and lowers the plurality of guard plates 44. The guard plate lifting unit 47 positions the guard plate 44 at any position within a range from the upper position to the lower position. Figure 2AShows a state where two protective plates 44 are arranged in the lower position. The upper position is a position where the upper end 44u of the protective plate 44 is arranged above the holding position where the substrate W held by the rotary chuck 21 is arranged. The lower position is a position where the upper end 44u of the protective plate 44 is arranged below the holding position.

[0075] When supplying the processing liquid to the rotating substrate W, at least one protective plate 44 is arranged in the upper position. If the processing liquid is supplied to the substrate W in this state, the processing liquid is thrown outward from the substrate W. The thrown processing liquid collides with the inner surface of the protective plate 44 facing the substrate W horizontally and is guided into the cup 43 corresponding to the protective plate 44. Thus, the processing liquid discharged from the substrate W is collected in the cup 43.

[0076] The processing unit 2 includes a partition plate 48 arranged along the horizontal plane in the space around a plurality of protective plates 44 in the upper position. The partition plate 48 surrounds the plurality of protective plates 44. The inner edge of the partition plate 48 is horizontally separated from the plurality of protective plates 44. The outer edge of the partition plate 48 is horizontally separated from the inner peripheral surface of the chamber 12 (the inner peripheral surface of the partition wall 13 surrounding the substrate W). The partition plate 48 is arranged above the cylindrical outer wall 42. The partition plate 48 is placed above the cylindrical outer wall 42. The partition plate 48 is arranged below the upper end 44u of the protective plate 44 in the upper position.

[0077] As Figure 2B shown, the processing unit 2 includes a standby tank 56 that catches the liquid medicine sprayed downward from the liquid medicine nozzle 31 in the standby position. The standby tank 56 is arranged below the liquid medicine nozzle 31 in the standby position. The standby position is a position where the liquid medicine nozzle 31 and the standby tank 56 overlap in a top view. The standby tank 56 is arranged outside the processing cup 41. The standby tank 56 is arranged inside the chamber 12. The opening 56o of the standby tank 56 is arranged above the partition plate 48. The lower end of the standby tank 56 can be arranged above or below the partition plate 48, or can be arranged on the partition plate 48 as long as the opening 56o of the standby tank 56 is arranged above the partition plate 48.

[0078] Next, the electrical structure of the substrate processing apparatus 1 will be described.

[0079] Figure 3FIG. 0 is a block diagram showing the electrical configuration of the substrate processing apparatus 1. The control device 3 is a computer including a computer main body 3a and a peripheral device 3d connected to the computer main body 3a. The computer main body 3a includes a CPU 3b (central processing unit) that executes various commands and a memory 3c that stores information. The peripheral device 3d includes a storage device 3e that stores information such as a program P to be transmitted and received between the memory 3c, a reader 3f that reads information from a removable medium RM, and a communication device 3g that communicates with other devices such as a host computer.

[0080] The control device 3 is connected to an input device and a display device. The input device is operated when an operator such as a user or a maintenance person inputs information to the substrate processing apparatus 1. Information is displayed on the screen of the display device. The input device can be any one of a keyboard, a pointing device, and a touch panel, or can be a device other than these. A touch panel display that also serves as an input device and a display device can be provided in the substrate processing apparatus 1.

[0081] The CPU 3b executes the program P stored in the storage device 3e. The program P in the storage device 3e can be pre-installed in the control device 3, can be transmitted from the removable medium RM to the storage device 3e through the reader 3f, or can be transmitted from an external device such as a host computer to the storage device 3e through the communication device 3g.

[0082] The memory 3c is a volatile memory that retains storage only when power is supplied. The storage device 3e and the removable medium RM are non-volatile memories that retain storage even when power is not supplied. The storage device 3e is, for example, a magnetic storage device such as a hard disk. The removable medium RM is, for example, an optical disk such as a compact disk or a semiconductor memory such as a memory card. The removable medium RM is an example of a computer-readable recording medium on which the program P is recorded. The removable medium RM is a non-transitory tangible medium.

[0083] The storage device 3e stores a plurality of recipes. A recipe is information that defines the processing content, processing conditions, and processing procedure of the substrate W. The plurality of recipes are different from each other in at least one of the processing content, processing conditions, and processing procedure of the substrate W. The control device 3 controls the substrate processing apparatus 1 to process the substrate W according to a recipe specified by the host computer. The control device 3 is programmed to execute the following respective processes.

[0084] Next, an example of the processing of the substrate W will be described.

[0085] Figure 4This is a process diagram for explaining an example of the processing of the substrate W by the substrate processing apparatus 1. Hereinafter, with reference to Figure 2A , Figure 2B , and Figure 4 .

[0086] When the substrate W is processed by the substrate processing apparatus 1, a loading process of loading the substrate W into the chamber 12 ( Figure 4 step S1) is performed.

[0087] Specifically, in a state where all the shields 44 are in the lower position and all the scanning nozzles are in the standby position, the central robot CR (refer to Figure 1A ) holds the substrate W horizontally by the hand Hc, and at the same time, makes the hand Hc enter the chamber 12. Then, the central robot CR places the substrate W on the hand Hc on the plurality of chuck pins 22 with the surface of the substrate W facing upward. Then, the central robot CR retracts the hand Hc from the inside of the chamber 12.

[0088] After the substrate W is placed on the plurality of chuck pins 22, the plurality of chuck pins 22 are pressed against the outer peripheral surface of the substrate W to hold the substrate W. Then, the electric motor 25 is driven to start rotating the substrate W. Thus, the substrate W rotates at the chemical solution supply speed. Before or after the substrate W starts to rotate, the shield lifting unit 47 raises at least one shield 44 from the lower position to the upper position.

[0089] Next, a chemical solution supply process ( Figure 4 step S2) is performed, and in this chemical solution supply process, BHF, which is an example of the chemical solution, is supplied to the upper surface of the substrate W to form a liquid film of BHF covering the entire area of the upper surface of the substrate W.

[0090] Specifically, in a state where at least one shield 44 is in the upper position, the first nozzle moving unit 33 moves the chemical solution nozzle 31 from the standby position to the processing position. Then, the chemical solution valve 32v is opened, and the chemical solution nozzle 31 starts to eject BHF. When a predetermined time has elapsed after the chemical solution valve 32v is opened, the chemical solution valve 32v is closed to stop ejecting BHF. Then, the first nozzle moving unit 33 moves the chemical solution nozzle 31 to the standby position.

[0091] After the BHF ejected from the chemical liquid nozzle 31 collides with the upper surface of the substrate W rotating at the chemical liquid supply speed, it flows outward along the upper surface of the substrate W due to the centrifugal force. Therefore, the BHF is supplied to the entire area of the upper surface of the substrate W, and a liquid film of BHF covering the entire area of the upper surface of the substrate W is formed. When the chemical liquid nozzle 31 ejects the BHF, the first nozzle moving unit 33 can move the collision position of the BHF on the upper surface of the substrate W in such a way that the collision position passes through the central part and the outer peripheral part, or can make the collision position stationary at the central part. Regarding whether to move the collision position, the same applies to the processing liquid supplied to the upper surface of the substrate W after the BHF.

[0092] After stopping the ejection of the BHF from the chemical liquid nozzle 31 onto the substrate W, back suction can be performed to remove the BHF remaining in the chemical liquid nozzle 31 by making the BHF flow backward. The back suction can be performed before moving the chemical liquid nozzle 31 in the direction of the standby position, or can be performed while moving the chemical liquid nozzle 31 in the direction of the standby position. The back suction can be performed by making the BHF flow into the back suction pipe connected to the chemical liquid pipe 32p between the chemical liquid nozzle 31 and the chemical liquid valve 32v, or can be performed by making the BHF flow backward to the back suction valve installed on the chemical liquid pipe 32p. In the latter case, the chemical liquid valve 32v can also be the back suction valve.

[0093] Next, a rinsing liquid supply process ( Figure 4 step S3) is performed, and in this rinsing liquid supply process, pure water, which is an example of the rinsing liquid, is supplied to the upper surface of the substrate W to rinse the BHF on the substrate W.

[0094] Specifically, in a state where at least one shield 44 is in the upper position, the second nozzle moving unit 36 moves the rinsing liquid nozzle 34 from the standby position to the processing position. Then, the rinsing liquid valve 35v is opened, and the rinsing liquid nozzle 34 starts to eject pure water. Before starting to eject the pure water, the shield lifting unit 47 can vertically move at least one shield 44 to switch the shield 44 that catches the liquid discharged from the substrate W.

[0095] After the pure water ejected from the rinsing liquid nozzle 34 collides with the upper surface of the substrate W rotating at the rinsing liquid supply speed, it flows outward along the upper surface of the substrate W due to the centrifugal force. The BHF on the substrate W is replaced by the pure water ejected from the rinsing liquid nozzle 34. Thus, a liquid film of pure water covering the entire area of the upper surface of the substrate W is formed. When a predetermined time has elapsed after the rinsing liquid valve 35v is opened, the rinsing liquid valve 35v is closed, and the ejection of the pure water is stopped. Then, the second nozzle moving unit 36 moves the rinsing liquid nozzle 34 to the standby position.

[0096] Next, an organic solvent supply process ( Figure 4In step S4), in this organic solvent supply process, IPA, which is an example of an organic solvent, is supplied to the upper surface of the substrate W, and the pure water on the substrate W is replaced with IPA.

[0097] Specifically, in a state where at least one of the shields 44 is in the upper position, the third nozzle moving unit 39 moves the solvent nozzle 37 from the standby position to the processing position. Then, the solvent valve 38v is opened, and the solvent nozzle 37 starts to eject IPA. Before starting to eject IPA, the shield lifting unit 47 can vertically move at least one of the shields 44 to switch the shield 44 that catches the liquid discharged from the substrate W.

[0098] After the IPA ejected from the solvent nozzle 37 collides with the upper surface of the substrate W that is rotating at the organic solvent supply speed, it flows outward along the upper surface of the substrate W due to the centrifugal force. The pure water on the substrate W is replaced with the IPA ejected from the solvent nozzle 37. Thus, a liquid film of IPA covering the entire area of the upper surface of the substrate W is formed. When a predetermined time has elapsed after the solvent valve 38v is opened, the solvent valve 38v is closed, and the ejection of IPA is stopped. Then, the third nozzle moving unit 39 moves the solvent nozzle 37 to the standby position.

[0099] Next, a drying process ( Figure 4 step S5) is performed. In this drying process, the IPA is removed from the upper surface of the substrate W to dry the substrate W.

[0100] Specifically, the electric motor 25 accelerates the substrate W in the rotation direction, and rotates the substrate W at a high rotation speed (for example, several thousand rpm) greater than the rotation speed of the substrate W from the chemical solution supply process to the organic solvent supply process. When the electric motor 25 starts to rotate the substrate W at a high speed, the IPA scatters outward from the substrate W and is removed from the upper surface of the substrate W. Thus, the substrate W is dried. When a predetermined time has elapsed after the substrate W starts to rotate at a high speed, the electric motor 25 stops rotating. Thus, the rotation of the substrate W is stopped.

[0101] Next, a carrying-out process ( Figure 4 step S6) of carrying out the substrate W from the chamber 12 is performed.

[0102] Specifically, the shield lifting unit 47 lowers all the shields 44 to the lower position. Then, the central robot CR makes the hand Hc enter the chamber 12. After the central robot CR releases the holding of the substrate W by the plurality of chuck pins 22, the central robot CR supports the substrate W on the rotary chuck 21 using the hand Hc. Then, the central robot CR supports the substrate W horizontally using the hand Hc and at the same time retracts the hand Hc from the inside of the chamber 12. Thus, the processed substrate W is carried out from the chamber 12.

[0103] Next, the standby tank 56 and related structures will be described. First, the liquid medicine nozzle 31 will be described.

[0104] Figure 5 It is a schematic diagram for horizontally observing the liquid medicine nozzle 31 and the standby tank 56. Figure 6 It is a schematic diagram for explaining the path for moving the liquid medicine nozzle 31. Figure 5 It shows the state where the liquid medicine nozzle 31 is disposed at the middle position.

[0105] As Figure 5 shown, the liquid medicine nozzle 31 includes: a nozzle portion 51 provided with a discharge port 31p for discharging a treatment liquid such as liquid medicine; and an arm portion 52 that supports the nozzle portion 51. The nozzle portion 51 is supported by the first nozzle moving unit 33 via the arm portion 52. The arm portion 52 extends from the nozzle portion 51 to the first nozzle moving unit 33. The arm portion 52 and the nozzle portion 51 are integral. Instead of providing the arm portion 52 on the liquid medicine nozzle 31, the nozzle portion 51 may be connected to the first nozzle moving unit 33 via a nozzle arm equivalent to the nozzle portion 51 of the liquid medicine nozzle 31.

[0106] The nozzle portion 51 extends downward from the arm portion 52 along a vertical straight line. The center line of the nozzle portion 51 is vertical. The nozzle portion 51 may also extend obliquely downward from the arm portion 52. The arm portion 52 extends horizontally from the nozzle portion 51. The lower end of the nozzle portion 51 is disposed lower than the lower end of the arm portion 52. The length of the nozzle portion 51 in the direction along the center line of the nozzle portion 51 is shorter than the length of the arm portion 52 in the direction along the center line of the arm portion 52.

[0107] The nozzle portion 51 is a cylindrical shape extending vertically. The nozzle portion 51 includes: a large-diameter portion 51a extending vertically; a tapered portion 51b that tapers as it moves away from the large-diameter portion 51a downward; and a small-diameter portion 51c that extends downward from the tapered portion 51b and is thinner than the large-diameter portion 51a. The large-diameter portion 51a, the tapered portion 51b, and the small-diameter portion 51c are coaxial. The upper end of the large-diameter portion 51a corresponds to the upper end of the liquid medicine nozzle 31. The lower end of the small-diameter portion 51c corresponds to the lower end of the liquid medicine nozzle 31. The discharge port 31p of the liquid medicine nozzle 31 opens at the lower end of the small-diameter portion 51c. The shape of the nozzle portion 51 is not limited to this.

[0108] The first nozzle moving unit 33 includes a horizontal drive actuator 55h that horizontally moves the liquid medicine nozzle 31, and a vertical drive actuator 55v that vertically moves the liquid medicine nozzle 31. An actuator is a device that converts electrical energy, fluid energy, magnetic energy, thermal energy, or chemical energy into mechanical work. Among actuators, there are electric motors, cylinders, and other devices. The horizontal drive actuator 55h may be an electric motor or a cylinder, or may be a device other than these. The same applies to the vertical drive actuator 55v.

[0109] The power of the horizontal drive actuator 55h and the vertical drive actuator 55v is transmitted to the liquid medicine nozzle 31 via the movable body 54 of the first nozzle moving unit 33. The liquid medicine nozzle 31 is supported by the movable body 54. The movable body 54 is disposed outside the processing cup 41 (refer to Figure 2B ). The movable body 54 extends vertically along the vertical rotation axis A2. The horizontal drive actuator 55h rotates the movable body 54 around the rotation axis A2 to horizontally move the liquid medicine nozzle 31. The vertical drive actuator 55v vertically moves the movable body 54 to vertically move the liquid medicine nozzle 31.

[0110] Figure 5 An example is shown in which the arm holder 53 of the holding arm 52 is provided on the first nozzle moving unit 33 in a state of being in contact with the arm 52. The arm holder 53 is supported by the movable body 54 in a state of protruding horizontally from the movable body 54. The power of the horizontal drive actuator 55h and the vertical drive actuator 55v is transmitted to the liquid medicine nozzle 31 via the movable body 54 and the arm holder 53. The number of nozzles held by the arm holder 53 may also be two or more. For example, a plurality of arms 52 may be mounted on the arm holder 53 in a horizontal posture in such a manner that the plurality of arms 52 are parallel to each other.

[0111] As Figure 6 shown, the first nozzle moving unit 33 horizontally moves the liquid medicine nozzle 31 between the processing position and the intermediate position, and vertically moves the liquid medicine nozzle 31 between the intermediate position and the standby position. In Figure 6 , the position of the liquid medicine nozzle 31 disposed above the substrate W represents the processing position, the position of the liquid medicine nozzle 31 inserted into the standby tank 56 represents the standby position, and the positions of the liquid medicine nozzle 31 other than these represent the intermediate position. In Figure 6 , only the upper end portion of the liquid medicine nozzle 31 disposed at the intermediate position is shown.

[0112] The intermediate position is a position where the liquid medicine nozzle 31 does not overlap the substrate W in a top view. The intermediate position is a position directly above the standby position. Therefore, the intermediate position and the standby position are positions where the positions in the vertical direction are different from each other and the positions in the horizontal direction are the same as each other. The intermediate position and the processing position are positions where the positions in the vertical direction are the same as each other and the positions in the horizontal direction are different from each other. If the liquid medicine nozzle 31 located at the intermediate position and the standby position ejects the liquid medicine, the liquid medicine is supplied to the standby tank 56 instead of the substrate W.

[0113] The intermediate position and the standby position are positions where the liquid medicine nozzle 31 and the standby tank 56 overlap when viewed from above. When the liquid medicine nozzle 31 is disposed at the intermediate position, the liquid medicine nozzle 31 overlaps with the opening 56o of the standby tank 56 when viewed from above in a state where the discharge port 31p of the liquid medicine nozzle 31 is separated from the opening 56o of the standby tank 56 above. When the liquid medicine nozzle 31 descends from the intermediate position to the standby position, the liquid medicine nozzle 31 enters the standby tank 56 through the opening 56o of the standby tank 56, and the discharge port 31p of the liquid medicine nozzle 31 is disposed in the standby tank 56. When the liquid medicine nozzle 31 is not in use, the liquid medicine nozzle 31 is disposed at the standby position. When performing preliminary dispensing of spraying the liquid medicine from the liquid medicine nozzle 31 toward the standby tank 56 before supplying the liquid medicine from the liquid medicine nozzle 31 to the substrate W, the liquid medicine nozzle 31 is also disposed at the standby position.

[0114] Next, the standby tank 56 and the droplet blocking member 60 will be described.

[0115] Figure 7 It is a schematic view of the liquid medicine nozzle 31 and the standby tank 56 viewed horizontally from the side of the substrate W. Figure 8 It is a schematic view of the liquid medicine nozzle 31 and the standby tank 56 viewed from above. Figure 9 It is from Figure 7 The left side of the paper surface in is a schematic view of the liquid medicine nozzle 31 and the standby tank 56 viewed horizontally. Figures 7 - 9 It shows a state where the liquid medicine nozzle 31 is disposed at the standby position. Hereinafter, the nozzle portion 51 of the liquid medicine nozzle 31 may sometimes be simply referred to as the liquid medicine nozzle 31.

[0116] As described above, the processing unit 2 includes the standby tank 56 that catches the liquid medicine sprayed downward from the liquid medicine nozzle 31 located at the standby position. As Figure 7 shown, the standby tank 56 includes a recess 57 that is recessed downward. The recess 57 opens on the upper surface of the standby tank 56. The recess 57 is recessed downward from the upper surface of the standby tank 56. The inner surface 58 of the recess 57 forms a space for storing the liquid. The space formed by the inner surface 58 of the recess 57 corresponds to the internal space of the standby tank 56.

[0117] The liquid medicine sprayed downward from the liquid medicine nozzle 31 collides with the inner surface 58 of the recess 57 and is stored in the recess 57. The inner surface 58 of the recess 57 corresponds to the inner surface 58 of the standby tank 56. The inner surface 58 of the recess 57 includes a cylindrical inner peripheral surface extending vertically, and a bottom surface that closes the bottom of the inner peripheral surface of the standby tank 56. The outer surface 59 of the standby tank 56 includes a cylindrical outer peripheral surface surrounding the inner peripheral surface of the standby tank 56, an upper surface extending inward from the upper edge of the outer peripheral surface of the standby tank 56, and a lower surface extending inward from the lower edge of the outer peripheral surface of the standby tank 56.

[0118] The inner surface 58 of the recess 57 forms an opening 56o located within the outer surface 59 of the standby tank 56. The space within the recess 57 extends downward from the opening 56o of the standby tank 56. The opening 56o of the standby tank 56 corresponds to the entrance of the space within the recess 57. The opening 56o of the standby tank 56 can be any of a rectangle, a square, a circle, and an ellipse in a top view, or can be a shape other than these. Figure 8 An example is shown where the opening 56o of the standby tank 56 is rectangular in a top view.

[0119] As Figure 7 Shown, the standby tank 56 includes a liquid discharge port 58L for discharging the liquid within the recess 57, and a gas discharge port 58g for discharging the gas within the recess 57. The liquid discharge port 58L and the gas discharge port 58g are disposed within the recess 57. The gas discharge port 58g is disposed above the liquid discharge port 58L. The liquid discharge port 58L is connected to a liquid discharge pipe 59L that guides the liquid flowing into the liquid discharge port 58L. The gas discharge port 58g is connected to a gas discharge pipe 59g that guides the gas flowing into the gas discharge port 58g. The suction force of a suction device (not shown) is transmitted to the gas discharge port 58g via the gas discharge pipe 59g. The gas discharge pipe 59g can always suck the gas within the recess 57, or can suck the gas within the recess 57 only during a specified period or only when specified conditions are met.

[0120] When pre-distributing, the liquid medicine ejected from the liquid medicine nozzle 31 collides with the inner surface 58 of the standby tank 56 and is stored within the standby tank 56. The liquid medicine within the standby tank 56 is discharged to the liquid discharge pipe 59L through the liquid discharge port 58L. The liquid medicine discharged from the liquid discharge port 58L can be recycled, that is, supplied again to the liquid medicine nozzle 31, or can not be recycled. When pre-distributing, liquid medicine droplets or vapor, etc. are generated. The gas such as the liquid medicine droplets or vapor floating within the standby tank 56 or near the opening 56o of the standby tank 56 is discharged to the gas discharge pipe 59g through the gas discharge port 58g.

[0121] The processing unit 2 includes a droplet blocking member 60 that catches the liquid medicine droplets generated when the liquid medicine nozzle 31 at the standby position ejects the liquid medicine downward outside the standby tank 56. Figure 7 An example is shown where the droplet blocking member 60 includes a first side plate 61, a second side plate 62, and a third side plate 63.

[0122] The upper ends of the first side plate 61, the second side plate 62, and the third side plate 63 are disposed above the opening 56o of the standby tank 56. The first side plate 61, the second side plate 62, and the third side plate 63 directly face the liquid medicine nozzle 31 at the standby position horizontally.

[0123] The first side plate 61, the second side plate 62, and the third side plate 63 are rectangular or square plates held in a vertical posture. The first side plate 61, the second side plate 62, and the third side plate 63 may also be plates of shapes other than rectangular and square. The shape of the first side plate 61 may be the same as or different from that of at least one of the second side plate 62 and the third side plate 63. The same applies to the size and thickness of the first side plate 61.

[0124] The first side plate 61, the second side plate 62, and the third side plate 63 extend upward from the standby tank 56 in a vertical posture. The first side plate 61, the second side plate 62, and the third side plate 63 are arranged along the edge of the opening 56o of the standby tank 56. Figure 8 An example is shown in which the first side plate 61, the second side plate 62, and the third side plate 63 are arranged along three sides of the opening 56o that is rectangular in plan view. The first side plate 61, the second side plate 62, and the third side plate 63 are arranged in a U shape in plan view. When the standby tank 56 and the droplet blocking member 60 are observed from above, the opening 56o of the standby tank 56 can be visually confirmed.

[0125] The upper ends of the first side plate 61, the second side plate 62, and the third side plate 63 are arranged at equal heights from each other. The lower ends of the first side plate 61, the second side plate 62, and the third side plate 63 are arranged at equal heights from each other. The upper end of the first side plate 61 may also be arranged at a height different from that of the upper end of at least one of the second side plate 62 and the third side plate 63. The same applies to the lower end of the first side plate 61.

[0126] The first side plate 61 and the third side plate 63 are in contact with the second side plate 62. At least one of the first side plate 61 and the third side plate 63 may be separated from the second side plate 62. The first side plate 61, the second side plate 62, and the third side plate 63 are in contact with the standby tank 56. At least one of the first side plate 61, the second side plate 62, and the third side plate 63 may be separated from the standby tank 56.

[0127] The first side plate 61 is arranged on the side opposite to the first nozzle moving unit 33 in plan view with respect to the discharge port 31p of the liquid medicine nozzle 31 located in the standby position. The second side plate 62 is arranged on the side opposite to the processing position in plan view with respect to the discharge port 31p of the liquid medicine nozzle 31 located in the standby position. The third side plate 63 is arranged on the side of the first nozzle moving unit 33 in plan view with respect to the discharge port 31p of the liquid medicine nozzle 31 located in the standby position. The liquid medicine nozzle 31 located in the intermediate position and the standby position is arranged between the first side plate 61 and the third side plate 63.

[0128] Regardless of the position where the liquid medicine nozzle 31 is disposed, the first side plate 61, the second side plate 62, and the third side plate 63 are all disposed at positions not in contact with the liquid medicine nozzle 31. The upper ends of the first side plate 61, the second side plate 62, and the third side plate 63 are disposed below the lower end of the arm portion 52 of the liquid medicine nozzle 31 corresponding to the nozzle arm. The upper end of at least one of the first side plate 61 and the second side plate 62 may be disposed above the lower end of the arm portion 52 of the liquid medicine nozzle 31, as long as the first side plate 61, the second side plate 62, and the third side plate 63 are not in contact with the liquid medicine nozzle 31.

[0129] If the liquid medicine nozzle 31 is disposed at the middle position, the liquid medicine nozzle 31 is disposed between the first side plate 61 and the third side plate 63 in a top view. The upper end of at least one of the first side plate 61, the second side plate 62, and the third side plate 63 may be disposed above or below the spray outlet 31p of the liquid medicine nozzle 31 located at the middle position, or may be disposed at the same height as the spray outlet 31p of the liquid medicine nozzle 31 located at the middle position.

[0130] Next, the cleaning water nozzles 64 to 65 and the air curtain nozzle 67 will be described.

[0131] As Figure 7 shown, the processing unit 2 includes one or more cleaning water nozzles that spray cleaning water from outside the standby tank 56 toward the standby tank 56 in a mist or spray form. Figure 7 An example in which two cleaning water nozzles 64 to 65 are provided is shown.

[0132] One of the two cleaning water nozzles 64 to 65 is the inner cleaning water nozzle 64 that sprays cleaning water in a mist or spray form into the standby tank 56. The other of the two cleaning water nozzles 64 to 65 is the outer cleaning water nozzle 65 that sprays cleaning water in a mist or spray form onto the outer surface 59 of the standby tank 56. The spray outlet 64p of the inner cleaning water nozzle 64 is an example of the inner spray outlet. The spray outlet 65p of the outer cleaning water nozzle 65 is an example of the outer spray outlet. Hereinafter, the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 may be referred to as the cleaning water nozzles 64 to 65, respectively.

[0133] The cleaning water nozzles 64 to 65 are atomizing nozzles that spray cleaning water in a mist form. The cleaning water nozzles 64 to 65 may also be spray nozzles that spray cleaning water in a spray form. Figure 9An example is shown in which the cleaning water nozzle 65 for the outer side is a spray nozzle. Either one of the cleaning water nozzle 64 for the inner side and the cleaning water nozzle 65 for the outer side can be an atomizing nozzle, and the other can be a spray nozzle. The atomizing nozzle can be an external mixing type or internal mixing type two-fluid nozzle that generates a spray by colliding a liquid and a gas, or can be a spray nozzle that generates a spray by ejecting a compressed liquid from an orifice or by utilizing the Venturi effect.

[0134] The atomizing nozzle ejects a cleaning water spray from the spray outlet of the atomizing nozzle, and the cleaning water spray diffuses in a space that expands conically from the spray outlet of the atomizing nozzle. The diffusion method of the cleaning water spray is not limited to this. The atomizing nozzle can eject the cleaning water spray from the spray outlet of the atomizing nozzle in such a way that the cleaning water spray is dispersed in a flat space that expands fan-shaped from the spray outlet of the atomizing nozzle, or can eject the cleaning water spray from the spray outlet of the atomizing nozzle in such a way that the cleaning water spray is dispersed in a columnar space that extends linearly from the spray outlet of the atomizing nozzle.

[0135] The cleaning water nozzles 64 to 65 are connected to a cleaning water pipe 66p to which a cleaning water valve 66v is attached. When the cleaning water valve 66v is opened, cleaning water is supplied from the cleaning water pipe 66p to the cleaning water nozzles 64 to 65, and the cleaning water nozzles 64 to 65 start ejecting a cleaning water spray. When the cleaning water valve 66v is closed, the supply of cleaning water from the cleaning water pipe 66p to the cleaning water nozzles 64 to 65 is stopped, and the cleaning water nozzles 64 to 65 stop ejecting the cleaning water spray. The cleaning water is pure water. The cleaning water can also be a liquid other than pure water. The cleaning water can also be any one of the specific examples of the rinsing liquid. Hereinafter, the cleaning water valve 66v corresponding to the cleaning water nozzle 64 for the inner side may sometimes be referred to as the inner side cleaning water valve 66v, and the cleaning water valve 66v corresponding to the cleaning water nozzle 65 for the outer side may sometimes be referred to as the outer side cleaning water valve 66v.

[0136] The cleaning water nozzle 64 for the inner side ejects a cleaning water spray downward in a conical shape toward the opening 56o of the standby tank 56. The spray outlet 64p of the cleaning water nozzle 64 for the inner side is arranged above the opening 56o of the standby tank 56. Figure 7 An example is shown in which the cleaning water nozzle 64 for the inner side ejects the cleaning water spray obliquely downward in such a way that the center line of the space that expands conically from the spray outlet 64p of the cleaning water nozzle 64 for the inner side extends obliquely downward. The cleaning water nozzle 64 for the inner side can also eject the cleaning water spray vertically downward in such a way that the center line of the space that expands conically from the spray outlet 64p of the cleaning water nozzle 64 for the inner side extends vertically.

[0137] The cleaning water spray ejected from the inner cleaning water nozzle 64 enters the standby tank 56 through the opening 56o of the standby tank 56 from the inside. Figure 7 An example is shown in which the ejection port 64p of the inner cleaning water nozzle 64 is arranged above the upper end of the droplet blocking member 60. In this example, at least a part of the cleaning water spray ejected from the inner cleaning water nozzle 64 passes downward through the inner space of the droplet blocking member 60 and enters the standby tank 56 through the opening 56o of the standby tank 56. The ejection port 64p of the inner cleaning water nozzle 64 may also be arranged below the upper end of the droplet blocking member 60 as long as the cleaning water spray enters the standby tank 56.

[0138] The outer cleaning water nozzle 65 ejects a cleaning water spray in a conical shape toward the outer surface 59 of the standby tank 56. The ejection port 65p of the outer cleaning water nozzle 65 is arranged below the opening 56o of the standby tank 56. Figure 7 An example is shown in which the outer cleaning water nozzle 65 ejects the cleaning water spray in such a manner that the center line of the space expanding in a conical shape from the ejection port 65p of the outer cleaning water nozzle 65 extends horizontally. The outer cleaning water nozzle 65 may also eject the cleaning water spray in such a manner that the center line of the space expanding in a conical shape from the ejection port 65p of the outer cleaning water nozzle 65 extends obliquely upward or obliquely downward. Figure 7 An example is shown in which the straight line including the center line of the columnar outer cleaning water nozzle 65 passes through the outer surface 59 of the standby tank 56 without passing through the opening 56o of the standby tank 56.

[0139] The cleaning water spray ejected from the outer cleaning water nozzle 65 is blown onto the outer surface 59 of the standby tank 56. The cleaning water spray ejected from the outer cleaning water nozzle 65 may or may not be blown onto the outer surface of the droplet blocking member 60. The position and posture of the outer cleaning water nozzle 65 may also be set in such a manner that all or substantially all of the cleaning water spray ejected from the outer cleaning water nozzle 65 does not enter the standby tank 56 through the opening 56o of the standby tank 56. Even if the cleaning water spray enters the standby tank 56, as long as it is a small amount, it can be discharged from the standby tank 56 through the exhaust port 58g.

[0140] As Figure 7 As shown, the processing unit 2 includes an air curtain nozzle 67 that blocks the airflow approaching or moving away from the standby tank 56. The air curtain nozzle 67 forms a sheet-like airflow by ejecting gas from the ejection port 67p of the air curtain nozzle 67. The ejection port 67p of the air curtain nozzle 67 may be a slit-shaped hole or a plurality of holes arranged in a row, or may include a slit-shaped hole and a plurality of holes arranged in a row.

[0141] The air curtain nozzle 67 is connected to a gas pipe 68p on which a gas valve 68v is installed. When the gas valve 68v is opened, gas is supplied from the gas pipe 68p to the air curtain nozzle 67, and the air curtain nozzle 67 starts to eject gas. When the gas valve 68v is closed, the supply of gas from the gas pipe 68p to the air curtain nozzle 67 is stopped, and the air curtain nozzle 67 stops ejecting gas. The gas ejected from the air curtain nozzle 67 can be any one of an inert gas, clean air, and dry air, or can be a gas other than these. Figure 7 In Figure 7 , CDA represents clean dry air. The same applies to other figures.

[0142] The ejection port 67p of the air curtain nozzle 67 is arranged above the ejection port 64p of the inner side cleaning water nozzle 64. Therefore, the ejection port 67p of the air curtain nozzle 67 is arranged above the opening 56o of the standby tank 56. By ejecting gas from the ejection port 67p of the air curtain nozzle 67 above the standby tank 56, a sheet-like air flow that overlaps the opening 56o of the standby tank 56 in a top view is formed above the standby tank 56. The air curtain nozzle 67 also forms a sheet-like air flow that overlaps the spray in a top view above the spray by ejecting gas from the ejection port 67p of the air curtain nozzle 67 above the cleaning water spray ejected from the inner side cleaning water nozzle 64.

[0143] If the inner side cleaning water nozzle 64 ejects a cleaning water spray, a part of the spray may flow upward. If the air curtain nozzle 67 ejects gas while the inner side cleaning water nozzle 64 ejects a cleaning water spray, the flow of such a spray can be blocked by the layer of the air flow formed by the air curtain nozzle 67, thereby reducing the cleaning water spray diffused to an unnecessary range. Further, if the air curtain nozzle 67 ejects gas, the downward flow of clean air flowing from the FFU 11 (refer to Figure 2A ) is blocked by the layer of the air flow. Thereby, the time for the cleaning water spray to be suspended in the air can be extended, and thus the horizontal diffusion range of the cleaning water spray can be expanded.

[0144] The ejection port 67p of the air curtain nozzle 67 can eject gas horizontally, or can eject gas obliquely upward or obliquely downward. Figure 7 An example in which the ejection port 67p of the air curtain nozzle 67 ejects gas horizontally is shown. The ejection port 67p of the air curtain nozzle 67 can eject gas in the direction toward the substrate W, or can eject gas in the direction toward the inner peripheral surface of the chamber 12 without passing above the substrate W. In the latter case, it is possible to make liquid or solid fine particles such as a cleaning water spray floating in the air flow in the direction of the inner peripheral surface of the chamber 12 by the gas ejected from the ejection port 67p of the air curtain nozzle 67, thereby reducing the fine particles adhering to the substrate W or the members arranged around it.

[0145] The cleaning water spray ejected from the inner cleaning water nozzle 64 not only enters the standby tank 56, but also adheres to the outer surface 59 of the standby tank 56 or the components around the standby tank 56. The cleaning water spray ejected from the outer cleaning water nozzle 65 also adheres to the outer surface 59 of the standby tank 56 or the components around the standby tank 56. Thereby, water can be provided to the droplets of the liquid medicine adhering to the outer surface 59 of the standby tank 56 or the components around the standby tank 56, and thus the crystals precipitated from the droplets can be reduced. In the case where the droplets of the liquid medicine crystallize, by dissolving the crystals in the cleaning water spray, the crystals can be restored to a liquid state. Even if the crystals are not all restored to a liquid state, the crystals can be made less likely to be suspended in the air by attaching the cleaning water spray to the crystals.

[0146] When the liquid medicine nozzle 31 performs pre-distribution in the standby position, if the inner cleaning water nozzle 64 ejects a cleaning water spray, the droplets of the liquid medicine flowing upward from the standby tank 56 come into contact with the cleaning water spray. On the other hand, the cleaning water spray adheres to the liquid medicine nozzle 31. Although most of the cleaning water adhering to the liquid medicine nozzle 31 will evaporate and disappear from the liquid medicine nozzle 31, if such adhesion of the cleaning water is still not good enough, as long as the liquid medicine nozzle 31 at the treatment position or the like is arranged at a position that does not overlap with the standby tank 56 in a top view, the inner cleaning water nozzle 64 can eject a cleaning water spray. Alternatively, a drying nozzle 70 (see Figure 9 ) can be provided, and the drying nozzle 70 ejects a gas toward the liquid medicine nozzle 31 when the liquid medicine nozzle 31 is arranged at a position overlapping with the standby tank 56 in a top view.

[0147] As Figure 9 shown, the drying nozzle 70 is connected to a drying pipe 71p that guides the gas toward the drying nozzle 70. If the drying valve 71v installed in the drying pipe 71p is opened, the gas is supplied from the drying pipe 71p to the drying nozzle 70 and continuously ejected from the drying nozzle 70. The drying nozzle 70 can eject a gas toward the liquid medicine nozzle 31 when the liquid medicine nozzle 31 is stationary at the intermediate position or the standby position, or can also eject a gas toward the liquid medicine nozzle 31 when the liquid medicine nozzle 31 moves from the intermediate position to the standby position or from the standby position to the intermediate position. The gas ejected from the drying nozzle 70 can be any one of an inert gas, clean air, and dry air, or can also be a gas other than these.

[0148] When pre-distribution is performed with the liquid medicine nozzle 31 in the standby position, if the inner cleaning water nozzle 64 sprays a cleaning water mist, the cleaning water mist enters the standby tank 56. Most of the mist will pass through the exhaust port 58g and be discharged from the standby tank 56, but sometimes a small amount of cleaning water may mix into the liquid medicine and be discharged from the standby tank 56 together with the liquid medicine through the drain port 58L. When the liquid medicine discharged from the standby tank 56 is recovered for reuse, the liquid medicine with a changed concentration will be recovered.

[0149] If the mixing of this cleaning water is not good, the inner cleaning water nozzle 64 may spray a cleaning water mist during the period when pre-distribution is not performed. Or, the pre-distribution may be started without spraying a cleaning water mist from the inner cleaning water nozzle 64, and then, while performing the pre-distribution, the inner cleaning water nozzle 64 may spray a cleaning water mist. In this way, at the initial stage of the period when pre-distribution is performed, the liquid medicine that has not been mixed or has hardly been mixed with cleaning water can be discharged to the drain port 58L. Furthermore, if the droplets of the liquid medicine start to spread from the standby tank 56, the inner cleaning water nozzle 64 starts to spray a cleaning water mist, so that the range of spread of the droplets of the liquid medicine can be reduced.

[0150] If at least one of the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 sprays cleaning water, only the humidity near the standby tank 56 is increased, rather than the humidity of the entire interior of the chamber 12, so that the vicinity of the standby tank 56 is maintained at a high humidity. The control device 3 can make the cleaning water nozzles 64 to 65 always spray a cleaning water mist, or can make the cleaning water nozzles 64 to 65 spray a cleaning water mist only during a specified period or only when specified conditions are met. The control device 3 can also make one of the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 always spray a cleaning water mist, and at the same time make the other of the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 spray a cleaning water mist only during a specified period or only when specified conditions are met.

[0151] When at least one of the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 sprays cleaning water only during a specified period or only when specified conditions are met, the control device 3 can make the cleaning water nozzles 64 to 65 spray a cleaning water mist only during the period specified by the formulation, or can make the cleaning water nozzles 64 to 65 spray a cleaning water mist only during the period when the humidity detected by the hygrometer 72 (refer to Figure 7 ) that detects the humidity of the atmosphere in contact with the standby tank 56 is lower than the lower limit value.

[0152] It is considered that when the liquid medicine ejected from the liquid medicine nozzle 31 is BHF at room temperature, if the humidity of the atmosphere in contact with the liquid medicine is, for example, 60% or more, crystals do not precipitate or hardly precipitate from the liquid medicine. In this case, the control device 3 can also set the lower limit value of the humidity to 60% and maintain the humidity in the space including the standby tank 56 above the lower limit value. Specifically, when the humidity detected by the hygrometer 72 is lower than the lower limit value, the control device 3 can also cause the cleaning water nozzles 64 to 65 to eject a cleaning water spray until the humidity detected by the hygrometer 72 reaches an intermediate value (for example, 70%) exceeding the lower limit value.

[0153] The control device 3 can cause the air curtain nozzle 67 to always eject gas, or can cause the air curtain nozzle 67 to eject gas only during a specified period or only when specified conditions are met. The control device 3 can cause the air curtain nozzle 67 to eject gas when at least one of the inner cleaning water nozzle 64 and the outer cleaning water nozzle 65 ejects a cleaning water spray, or can also cause the air curtain nozzle 67 to eject gas when neither the inner cleaning water nozzle 64 nor the outer cleaning water nozzle 65 ejects a cleaning water spray.

[0154] Next, an example of the operation when the cleaning water nozzles 64 to 65 eject cleaning water will be described.

[0155] Figure 10 It is a timing chart for explaining the ejection of the spray performed by the liquid medicine nozzle 31 during the period from the pre-distribution at the standby position to the supply of the liquid medicine to the substrate W at the processing position until it returns to the standby position.

[0156] Figure 10 The ON on the right side of "BHF ejection" in indicates that the liquid medicine valve 32v is opened and the liquid medicine nozzle 31 ejects the liquid medicine. Figure 10 The OFF on the right side of "BHF ejection" in indicates that the liquid medicine valve 32v is closed and the liquid medicine nozzle 31 does not eject the liquid medicine. Figure 10 "Nozzle position" in indicates the position of the liquid medicine nozzle 31.

[0157] Figure 10 The ON and OFF on the right side of "spray ejection to the inside" in are the same as BHF ejection except that the liquid medicine, the liquid medicine valve 32v, and the liquid medicine nozzle 31 become a cleaning water spray, the inner cleaning water valve 66v, and the inner cleaning water nozzle 64. Figure 10 The ON and OFF on the right side of "spray ejection to the outside" in are the same as BHF ejection except that the liquid medicine, the liquid medicine valve 32v, and the liquid medicine nozzle 31 become a cleaning water spray, the outer cleaning water valve 66v, and the outer cleaning water nozzle 65. Figure 10The opening and closing on the right side of "CDA ejection" are the same as those of BHF ejection, except that the liquid medicine, the liquid medicine valve 32v, and the liquid medicine nozzle 31 become gas, the gas valve 68v, and the air curtain nozzle 67.

[0158] Figure 10 The following example is shown: During the entire period from the moment before the liquid medicine nozzle 31 is pre-distributed at the standby position to the moment after returning from the processing position to the standby position, "spray ejection to the outside" is open, and the outside cleaning water nozzle 65 continuously ejects a cleaning water spray. The control device 3 causes the liquid medicine nozzle 31 located at the standby position to eject the liquid medicine in a state where the inside cleaning water nozzle 64 does not eject a cleaning water spray and the air curtain nozzle 67 does not eject gas.

[0159] Specifically, the control device 3 causes the liquid medicine nozzle 31 to start ejecting the liquid medicine at time T1 and stops the liquid medicine nozzle 31 from ejecting the liquid medicine at time T2. After that, the control device 3 moves the liquid medicine nozzle 31 from the standby position to the processing position by controlling the first nozzle moving unit 33. When the liquid medicine nozzle 31 reaches the processing position, the control device 3 causes the liquid medicine nozzle 31 to start ejecting the liquid medicine. Thus, the above-mentioned liquid medicine supply process ( Figure 4 step S2). Figure 10 An example is shown where the liquid medicine nozzle 31 reaches the processing position and starts ejecting the liquid medicine at time T3. The ejection of the liquid medicine may not start simultaneously with the liquid medicine nozzle 31 reaching the processing position but may start after reaching.

[0160] After the control device 3 pre-distributes the liquid medicine nozzle 31 and it leaves the standby tank 56, the inside cleaning water nozzle 64 starts ejecting a cleaning water spray. Figure 10 The following example is shown: The liquid medicine nozzle 31 leaves the standby tank 56 at time T2, and the inside cleaning water nozzle 64 starts ejecting cleaning water at time T4. In this example, after the liquid medicine nozzle 31 reaches the processing position and ejects the liquid medicine, the inside cleaning water nozzle 64 starts ejecting cleaning water. Further, in this example, simultaneously with the inside cleaning water nozzle 64 starting to eject cleaning water, the air curtain nozzle 67 starts ejecting gas. The control device 3 may also cause the air curtain nozzle 67 to start ejecting gas before or after causing the inside cleaning water nozzle 64 to start ejecting cleaning water.

[0161] The control device 3 stops the inner cleaning water nozzle 64 from spraying the cleaning water mist and stops the air curtain nozzle 67 from spraying the gas at time T5. The control device 3 may also stop the air curtain nozzle 67 from spraying the gas before or after stopping the inner cleaning water nozzle 64 from spraying the cleaning water. Then, the control device 3 stops the chemical liquid nozzle 31 from spraying the chemical liquid at time T6 and moves the chemical liquid nozzle 31 from the processing position to the standby position. The chemical liquid nozzle 31 returns to the standby position at time T7. The control device 3 may also move the chemical liquid nozzle 31 from the processing position to the standby position after the chemical liquid nozzle 31 stops spraying the chemical liquid instead of simultaneously with the chemical liquid nozzle 31 stopping spraying the chemical liquid.

[0162] In Figure 10 the example shown, the inner cleaning water nozzle 64 does not start spraying the cleaning water mist immediately after the chemical liquid nozzle 31 leaves the standby position, but starts spraying the cleaning water mist at time T4 after a certain period of time has passed since the chemical liquid nozzle 31 left the standby position. Therefore, the inner cleaning water nozzle 64 starts spraying the cleaning water in a state where the airflow formed near the standby tank 56 due to the movement of the chemical liquid nozzle 31 has disappeared or weakened. Thereby, the cleaning water mist diffusing to an unplanned range can be reduced.

[0163] Furthermore, in Figure 10 the example shown, the inner cleaning water nozzle 64 stops spraying the cleaning water mist at time T5 before the chemical liquid nozzle 31 moves toward the standby position. When the chemical liquid nozzle 31 approaches the standby position, an airflow is formed near the standby tank 56 due to the movement of the chemical liquid nozzle 31. The inner cleaning water nozzle 64 stops spraying the cleaning water in a state where there is no such airflow or the airflow is weak. Thereby, the cleaning water mist diffusing to an unplanned range can be reduced.

[0164] Next, the effects of the present embodiment will be described.

[0165] In the present embodiment, the chemical liquid is sprayed downward from the chemical liquid nozzle 31 and supplied to the upper surface of the horizontal substrate W. The horizontal drive actuator 55h and the vertical drive actuator 55v move the chemical liquid nozzle 31 from the processing position where the chemical liquid nozzle 31 overlaps the substrate W in plan view to the standby position where the chemical liquid nozzle 31 does not overlap the substrate W in plan view. The chemical liquid sprayed downward from the chemical liquid nozzle 31 located at the standby position is received by the recess 57 of the standby tank 56. The mist-like or spray-like cleaning water sprayed from the cleaning water nozzles 64 to 65 is supplied to the standby tank 56 and the members around the standby tank 56.

[0166] When the liquid medicine sprayed downward from the liquid medicine nozzle 31 is caught by the standby tank 56, droplets of the liquid medicine are generated. When the liquid medicine evaporates, crystals may precipitate from the droplets of the liquid medicine. By spraying cleaning water from the cleaning water nozzles 64 to 65 toward the standby tank 56, water can be provided to the droplets of the liquid medicine, thereby reducing the crystals precipitating from the droplets. In the case where the droplets of the liquid medicine crystallize, by dissolving the crystals in the cleaning water, the crystals can be restored to a liquid state. Even if the crystals are not completely restored to a liquid state, by attaching the cleaning water to the crystals, the crystals are less likely to be suspended in the air.

[0167] It is difficult to determine the range in which the droplets of the liquid medicine leaking from the standby tank 56 spread. The droplets of the liquid medicine sometimes spread over an extremely wide range. Considering automatically supplying cleaning water to all the ranges to which the droplets of the liquid medicine can spread and flushing the leaked liquid medicine with the cleaning water. However, this method requires a large amount of cleaning water, and a large amount of cleaning water will be supplied to unnecessary ranges. In the case of spraying the cleaning water in a mist or spray form, compared with the case of supplying the cleaning water from the nozzle in the form of a liquid column (cleaning water column) having the same diameter as the nozzle, a small amount of cleaning water can be supplied to a larger range.

[0168] In the case of spraying the cleaning water toward the standby tank 56 in a mist or spray form, the liquid medicine leaking from the standby tank 56 may remain in the standby tank 56 or its vicinity. For example, when the substrate processing apparatus 1 is cleaned automatically or manually at regular intervals, if such liquid medicine is rinsed, the source of crystal generation can be removed. If the cleaning water is sprayed toward the standby tank 56 in a mist or spray form, the precipitation of crystals can be prevented or delayed, so there is no need to increase the frequency of regular cleaning. As a result, new problems associated with the supply of cleaning water, such as a large amount of cleaning water being supplied to unnecessary ranges, can be prevented, and a large amount of crystals can be prevented from being generated in the standby tank 56 or its vicinity.

[0169] In the present embodiment, the cleaning water is sprayed in a mist or spray form from the spray outlet 64p of the inner cleaning water nozzle 64 disposed above the opening 56o of the standby tank 56 toward the opening 56o of the standby tank 56. The mist or spray-shaped cleaning water enters the standby tank 56 through the opening 56o of the standby tank 56. A part of the cleaning water is supplied to the outer surface 59 of the standby tank 56 or the members around the standby tank 56. The droplets of the liquid medicine are likely to remain at the opening 56o of the standby tank 56 or its vicinity. Therefore, the cleaning water can be efficiently supplied to the droplets of the liquid medicine.

[0170] In the present embodiment, a gas containing liquid or solid microparticles suspended in the air, or a gas not containing such microparticles is discharged from the recess 57 of the standby tank 56 to the exhaust pipe 59g. The mist or spray-like cleaning water ejected from the cleaning water nozzles 64 to 65 enters the standby tank 56 through the opening 56o of the standby tank 56. The cleaning water spray in the recess 57 is discharged to the exhaust pipe 59g. Thereby, the cleaning water remaining in the recess 57 can be reduced.

[0171] In the present embodiment, when the liquid medicine nozzle 31 is disposed at a processing position that overlaps the substrate W in a plan view, the cleaning water is ejected in a mist or spray form from the ejection port 64p of the inner cleaning water nozzle 64 disposed above the opening 56o of the standby tank 56 toward the opening 56o of the standby tank 56. When the liquid medicine nozzle 31 is disposed at the standby position, if the cleaning water nozzles 64 to 65 eject the cleaning water, the mist or spray-like cleaning water will adhere to the liquid medicine nozzle 31. Therefore, if the cleaning water nozzles 64 to 65 eject the cleaning water when the liquid medicine nozzle 31 is disposed at the processing position, the cleaning water adhering to the liquid medicine nozzle 31 can be reduced.

[0172] In the present embodiment, the liquid medicine nozzle 31 is directly opposed horizontally to the droplet barrier 60. A part of the droplets of the liquid medicine generated when the liquid medicine nozzle 31 disposed at the standby position ejects the liquid medicine downward toward the standby tank 56 is caught by the droplet barrier 60. The ejection port 64p of the inner cleaning water nozzle 64 supplies the mist or spray-like cleaning water not only to the opening 56o of the standby tank 56 but also to the droplet barrier 60. Thereby, the range of diffusion of the droplets of the liquid medicine can be reduced by the droplet barrier 60, and thus the precipitation of crystals from the droplets of the liquid medicine adhering to the droplet barrier 60 can be prevented or delayed.

[0173] In the present embodiment, the opening 56o of the standby tank 56 can be observed from above the standby tank 56 and the droplet barrier 60. If the cleaning water is ejected in a mist or spray form from above the standby tank 56 and the droplet barrier 60, the cleaning water is supplied to the droplet barrier 60 and enters the standby tank 56 through the opening 56o of the standby tank 56. If the sealing plate disposed above the opening 56o of the standby tank 56 is provided on the droplet barrier 60, the range of upward diffusion of the droplets of the liquid medicine can be reduced, but there is a case where the droplets of the liquid medicine remain in the space below the sealing plate. In this case, due to the presence of the sealing plate, it is difficult to clean the space below the sealing plate. In the structure where the opening 56o of the standby tank 56 can be observed from above the standby tank 56 and the droplet barrier 60, such a problem can be prevented from occurring.

[0174] In the present embodiment, a gas is ejected from an ejection port 67p of an air curtain nozzle 67 disposed above an ejection port 64p of an inner side cleaning water nozzle 64. The gas ejected from the ejection port 67p of the air curtain nozzle 67 forms an air current above the cleaning water spray suspended in the upper space of the standby tank 56. The upward flowing cleaning water spray is blocked by the air current flowing from the air curtain nozzle 67. Thereby, it is possible to reduce the cleaning water spray that diffuses to an unnecessary range.

[0175] In the present embodiment, cleaning water is ejected in a mist or spray form from an ejection port 65p of an outer side cleaning water nozzle 65 disposed below an opening 56o of the standby tank 56 toward an outer surface 59 of the standby tank 56. Since the ejection port 65p of the outer side cleaning water nozzle 65 is disposed below the opening 56o of the standby tank 56, the cleaning water spray is not easily introduced into the standby tank 56 through the opening 56o of the standby tank 56. Thereby, it is possible to reduce the cleaning water remaining in the recess 57 and efficiently supply the cleaning water to the outer surface 59 of the standby tank 56 where the droplets of the liquid medicine are likely to adhere.

[0176] Next, other embodiments will be described.

[0177] The ejection port 64p of the inner side cleaning water nozzle 64 may be disposed between the first side plate 61 and the third side plate 63 instead of above the first side plate 61, the second side plate 62, and the third side plate 63.

[0178] The ejection port 64p and the ejection port 65p may be provided in one cleaning water nozzle, instead of providing the ejection port 64p disposed above the opening 56o of the standby tank 56 in the inner side cleaning water nozzle 64 and providing the ejection port 65p disposed below the opening 56o of the standby tank 56 in the outer side cleaning water nozzle 65.

[0179] The control device 3 may also cause the cleaning water nozzles 64 to 65 to eject cleaning water after performing multiple pre-distributions instead of one time. The control device 3 may also cause the cleaning water nozzles 64 to 65 to eject cleaning water every time a certain period of time elapses or at an arbitrary time. The control device 3 may also determine whether to cause the cleaning water nozzles 64 to 65 to eject cleaning water based on an image captured by a camera that captures a range including the standby tank 56.

[0180] The control device 3 may also consider at least one of the air temperature and the air pressure near the standby tank 56 in addition to the humidity near the standby tank 56, or consider at least one of the air temperature and the air pressure near the standby tank 56 instead of the humidity near the standby tank 56, and determine whether to cause the cleaning water nozzles 64 to 65 to eject cleaning water. That is, the cleaning water may also be supplied to the standby tank 56 and its vicinity in such a manner that the concentration of the chemical solution adhering to the standby tank 56 and its vicinity is maintained at less than the saturation concentration. When considering the air temperature, it is only necessary to connect a thermometer for measuring the air temperature near the standby tank 56 to the control device 3. When considering the air pressure, it is only necessary to connect a barometer for measuring the air pressure near the standby tank 56 to the control device 3.

[0181] At least one of the droplet blocking member 60, the exhaust pipe 59g, and the air curtain nozzle 67 may also be omitted. One or both of the first side plate 61, the second side plate 62, and the third side plate 63 may be omitted, but not all of the first side plate 61, the second side plate 62, and the third side plate 63.

[0182] The rotary chuck 21 is not limited to a mechanical chuck that presses a plurality of chuck pins 22 against the end face of the substrate W, and may also be a vacuum chuck that holds the substrate W horizontally by adsorbing the lower surface of the substrate W to the upper surface of the rotary base 23. When the rotary chuck 21 is a mechanical chuck, the chuck pins 22 correspond to a substrate holder that holds the substrate W horizontally. When the rotary chuck 21 is a vacuum chuck, the rotary base 23 corresponds to a substrate holder that holds the substrate W horizontally.

[0183] The substrate processing apparatus 1 is not limited to an apparatus that processes a circular substrate W, and may also be an apparatus that processes a polygonal substrate W.

[0184] Two or more of the above-described all structures may also be combined. Two or more of the above-described all processes may also be combined.

[0185] The embodiments of the present invention have been described in detail, but these are only specific examples for clarifying the technical content of the present invention. The present invention should not be construed as being limited to these specific examples, and the spirit and scope of the present invention are only defined by the appended claims.

[0186] Description of Reference Numerals

[0187] 1: Substrate processing apparatus, 2: Processing unit, 3: Control device, 3a: Computer main body, 3b: CPU, 3c: Memory, 3d: Peripheral device, 3e: Storage device, 3f: Reader, 3g: Communication device, 4: Transfer path, 5: Transfer system, 11: FFU, 12: Chamber, 13: Partition wall, 13a: Air outlet, 13b: Loading / unloading port, 17: Baffle, 18: Rectifying plate, 21: Rotating chuck, 22: Chuck pin, 23: Rotating base, 24: Rotating shaft, 25: Electric motor, 26: Chuck housing, 31: Liquid medicine nozzle, 31p: Spray outlet, 32p: Liquid medicine pipe, 32v: Liquid medicine valve, 33: First nozzle moving unit, 34: Flushing liquid nozzle, 35p: Flushing liquid pipe, 35v: Flushing liquid valve, 36: Second nozzle moving unit, 37: Solvent nozzle, 38p: Solvent pipe, 38v: Solvent valve, 39: Third nozzle moving unit, 41: Processing cup, 42: Cylindrical outer wall, 43: Cup, 44: Guard plate, 44u: Upper end of guard plate, 45: Cylindrical part of guard plate, 46: Top of guard plate, 47: Guard plate lifting unit, 48: Spacer, 49: Exhaust pipe, 49u: Upstream end of exhaust pipe, 51: Nozzle part, 51a: Large diameter part, 51b: Tapered part, 51c: Small diameter part, 52: Arm part, 53: Arm holder, 54: Movable body, 55h: Horizontal drive actuator, 55v: Vertical drive actuator, 56: Standby tank, 56o: Opening, 57: Recess, 58: Inner surface, 58L: Drain port, 58g: Exhaust port, 59: Outer surface, 59L: Drain pipe, 59g: Exhaust pipe, 60: Droplet barrier, 61: First side plate, 62: Second side plate, 63: Third side plate, 64: Inner side cleaning water nozzle (cleaning water nozzle), 64p: Spray outlet (inner side spray outlet), 65: Outer side cleaning water nozzle (cleaning water nozzle), 65p: Spray outlet (outer side spray outlet), 66p: Cleaning water pipe, 66v: Cleaning water valve, 67: Air curtain nozzle, 67p: Spray outlet, 68p: Gas pipe, 68v: Gas valve, 70: Drying nozzle, 71p: Drying pipe, 71v: Drying valve, 72: Hygrometer, A1: Axis of rotation, A2: Axis of rotation, CA: Carrier, CR: Central manipulator, Hc: Hand, Hi: Hand, IR: Indexing manipulator, LP: Loading port, P: Program, RM: Removable medium, S1 - S6: Steps, SL: Lower space, Su: Upper space, TW: Tower, W: Substrate.

Claims

1. A substrate processing apparatus, wherein, it has: a chemical liquid nozzle that sprays a chemical liquid downward onto the upper surface of a horizontal substrate; at least one actuator that moves the chemical liquid nozzle between a processing position, where the chemical liquid nozzle overlaps the substrate in a top view, and a standby position, where the chemical liquid nozzle does not overlap the substrate in a top view; a standby tank that includes a recessed portion recessed downward and catches the chemical liquid sprayed downward from the chemical liquid nozzle located at the standby position; and at least one cleaning water nozzle that sprays cleaning water in a mist or spray form from outside the standby tank toward the standby tank.

2. The substrate processing apparatus according to claim 1, wherein, the at least one cleaning water nozzle includes an inner-side ejection port disposed above an opening formed in the outer surface of the standby tank by the recessed portion of the standby tank, and the at least one cleaning water nozzle sprays the cleaning water in a mist or spray form from the inner-side ejection port toward the opening of the standby tank.

3. The substrate processing apparatus according to claim 2, wherein, the substrate processing apparatus further has an exhaust pipe that discharges gas from the recessed portion of the standby tank.

4. The substrate processing apparatus according to claim 2 or 3, wherein, when the chemical liquid nozzle is at the processing position, the at least one cleaning water nozzle sprays the cleaning water in a mist or spray form from the inner-side ejection port toward the opening of the standby tank.

5. The substrate processing apparatus according to claim 2 or 3, wherein, the substrate processing apparatus further has a droplet blocking member that directly faces horizontally the chemical liquid nozzle located at the standby position and catches droplets of the chemical liquid generated when the chemical liquid nozzle located at the standby position sprays the chemical liquid downward toward the standby tank, and the at least one cleaning water nozzle sprays the cleaning water in a mist or spray form from the inner-side ejection port toward the droplet blocking member and the opening of the standby tank.

6. The substrate processing apparatus according to claim 5, wherein, when observing the standby tank and the droplet blocking member from above, the opening of the standby tank can be visually confirmed.

7. The substrate processing apparatus according to claim 2 or 3, wherein, the substrate processing apparatus further has an air curtain nozzle that forms an air flow overlapping the standby tank in a top view above the standby tank by spraying gas from an ejection port disposed above the inner-side ejection port of the at least one cleaning water nozzle.

8. The substrate processing apparatus according to any one of claims 1 to 3, wherein, the at least one cleaning water nozzle includes an outer-side ejection port disposed below an opening formed in the outer surface of the standby tank by the recessed portion of the standby tank, and the at least one cleaning water nozzle sprays the cleaning water in a mist or spray form from the outer-side ejection port toward the outer surface of the standby tank.

9. A substrate processing method, comprising: When a chemical liquid nozzle for spraying a chemical liquid onto the upper surface of a substrate facing downward horizontally is disposed at a standby position where it does not overlap with the substrate in a top view, a step of catching the chemical liquid sprayed downward from the chemical liquid nozzle by a concave portion of a standby tank recessed downward; And After the chemical liquid nozzle located at the standby position starts spraying the chemical liquid downward toward the standby tank, a step of causing at least one cleaning water nozzle to spray cleaning water in a mist or spray form toward the standby tank from outside the standby tank.

Images