Preparation device and purification process of manganese nitrate for high-purity electronic capacitor

Abstract

The invention discloses a preparation device of manganese nitrate for a high-purity electronic capacitor, and relates to the technical field of manganese nitrate production. A tank body; the base is fixed on the fixing frame; the heating device is arranged at the upper part of the tank body; the adjusting device is fixed at the bottom of the heating device; the cooling device is fixed to the bottom of the heating device and located below the adjusting device. The washing pipe penetrates through the top of the tank body and is connected with the cooling device; the drying device is arranged in the middle of the tank body; a reaction kettle; and the filtering device is connected with the heating device. According to the invention, uniform distribution of impurities in the solution can be promoted, local deposition or aggregation is reduced, uniform distribution of solutes in the solution is promoted, heat transfer is accelerated, the crystallization rate is accelerated, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of manganese nitrate production, and more particularly to a preparation device and a purification process of high-purity manganese nitrate for electronic capacitors. Background Art

[0002] Manganese nitrate, as an inorganic compound, plays an important role in the preparation of electronic components, and especially high-purity manganese nitrate is a high-quality raw material for manufacturing high-end electronic components such as electronic capacitors. Existing manganese nitrate preparation methods still have deficiencies in purity, energy consumption, cost and environmental protection. Particularly, for the preparation of high-purity electronic capacitors with manganese nitrate, the prior art is often difficult to meet its strict purity requirements. Simultaneously, energy consumption and cost issues in the preparation process are also key factors restricting its large-scale application. When the manganese nitrate solution prepared is purified by the method of pH regulation and crystallization, under static conditions, manganese nitrate is cooled to separate out crystals. However, due to the slow crystallization process, it may take longer to reach the required degree of crystallization, and standing for a long time causes the impurities in the solution to be deposited or gathered, affecting product quality. Therefore, it is necessary to provide a preparation device and purification process for high-purity electronic capacitors with manganese nitrate, to solve the problems raised in the above-mentioned background technology. Summary of the Invention

[0003] To achieve the above object, the present invention provides the following technical solution: a preparation device and purification process for high-purity manganese nitrate for electronic capacitors, comprising:

[0004] Fixed frame;

[0005] Tank body; fixed on a fixing frame;

[0006] A heating device is arranged on the upper part of the tank body;

[0007] An adjusting device is fixed to the bottom of the heating device;

[0008] The cooling device is fixed to the bottom of the heating device and is located below the regulating device;

[0009] The washing pipe passes through the top of the tank and is connected to the cooling device;

[0010] A drying device is arranged in the middle of the tank;

[0011] The invention also comprises a reaction kettle and a filtering device connected with the heating device.

[0012] Furthermore, preferably, the heating device comprises:

[0013] The telescopic shaft is fixed at the top center of the tank;

[0014] The heating chamber is arranged in the tank body and fixedly connected to the bottom of the telescopic shaft body;

[0015] The liquid injection pipe passes through the tank body and is connected to the heating chamber;

[0016] The discharge channel is conical, fixed to the bottom of the heating chamber through a one-way valve, and fixedly connected to the cooling device.

[0017] Further, preferably, the adjusting device includes:

[0018] The telescopic shaft mechanism is symmetrically distributed about the center of the heating device, and two are provided, and the fixed ends are fixed to the bottom of the heating device;

[0019] The moving adjustment ring is fixed to the extended end of the telescopic shaft mechanism;

[0020] A plurality of connecting blocks are annularly distributed and fixed to the bottom of the moving adjustment ring;

[0021] The notch is arranged on the moving adjustment ring and corresponds to the discharge channel.

[0022] Further, preferably, the cooling device includes:

[0023] The fixed top plate is slidably arranged below the adjusting device;

[0024] The connecting shaft section connects the fixed top plate and the center of the heating device;

[0025] The connecting vertical plate is fixed to the bottom of the fixed top plate and is located on the side of the connection between the heating device and the cooling device;

[0026] The fixed bottom plate is fixed to the bottom of the connecting vertical plate, and a discharge port is provided at the bottom of the fixed bottom plate;

[0027] A plurality of spacer components are annularly distributed and fixed between the fixed top plate and the fixed bottom plate;

[0028] The spiral flow channel starts from the top of the connecting vertical plate and passes through a plurality of spacer components to the bottom of the connecting vertical plate.

[0029] Further, preferably, the cooling device further includes an outer closed ring and an inner closed ring. The outer closed ring is arranged outside the spacer components, the inner closed ring is arranged inside the spacer components, and the upper and lower ends of the outer closed ring and the inner closed ring are respectively fixedly connected to the fixed top plate and the fixed bottom plate, and are divided into upper and lower parts by the spiral flow channel.

[0030] Further, preferably, a crystallization cavity separated by the spacer components is provided between the outer closed ring and the inner closed ring, and the temperature of the crystallization cavity decreases sequentially from top to bottom.

[0031] Further, as a preference, the spacer assembly includes:

[0032] A fixed plate, fixed to the top of the fixed bottom plate and located below the spiral flow channel;

[0033] A closed panel, slidably connected to the fixed top plate, corresponding to the bottom of the adjusting device and located above the spiral flow channel;

[0034] Two filter plates, symmetrically distributed with respect to the closed panel and fixed to the bottom of the fixed top plate.

[0035] Further, as a preference, the drying device includes:

[0036] A fixed ring, fixed to the bottom of the cooling device and fixedly connected to the inner wall of the tank body;

[0037] A moving ring, fixed to the top of the cooling device and slidably connected to the inner wall of the tank body;

[0038] A circulation chamber, arranged between the fixed ring and the moving ring and connected to an external gas circulation mechanism.

[0039] A purification process for preparing manganese nitrate for high-purity electronic capacitors includes the following steps:

[0040] Step 1: Crush, screen and wash the manganese-containing raw materials to remove impurities and surface contaminants. Feed the treated raw materials into a reaction kettle, add an appropriate amount of nitric acid and necessary reducing agents, and under the stirring action, make the raw materials fully react with nitric acid to generate a manganese nitrate solution;

[0041] Step 2: Adjust the pH value of the manganese nitrate solution to precipitate some impurities. Use a filtering device to separate the precipitate from the solution to obtain a highly pure manganese nitrate solution, and transport it to a heating device through a liquid injection pipe;

[0042] Step 3: In the heating device, heat the pure manganese nitrate solution to a saturated state, and then transport it to the cooling device. Control the flow rate and residence time of the manganese nitrate solution through the adjusting device to precipitate manganese nitrate crystals;

[0043] Step 4: After the manganese nitrate crystals are precipitated, inject deionized water into the cooling device through a washing pipe to wash the manganese nitrate crystals. Then, the telescopic shaft body drives the upper parts of the heating device and the cooling device to move upward, so that the manganese nitrate crystals are exposed in the drying device for drying treatment to obtain high-purity manganese nitrate.

[0044] Compared with the prior art, the beneficial effects of the present invention are:

[0045] In the present invention, through the setting of a heating device, a pure manganese nitrate solution is heated to a saturated state and then transported to a cooling device; through the setting of the cooling device, the saturated manganese nitrate solution is gradually cooled to precipitate manganese nitrate crystals. Moreover, during the gradual flow of the manganese nitrate solution, the uniform distribution of impurities in the solution is promoted, local deposition or aggregation is reduced, the uniform distribution of solutes in the solution is promoted, and the heat transfer is accelerated, thus accelerating the crystallization rate; through the setting of an adjustment device, the residence time of the manganese nitrate solution in each temperature region is controlled, the flow rate of the solution is controlled, the crystallization rate of the manganese nitrate solution is accelerated, and the production efficiency is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 is a schematic diagram of the overall structure of a preparation device for high-purity manganese nitrate for electronic capacitors;

[0047] Figure 2 is a schematic diagram of the structure of the heating device;

[0048] Figure 3 is a schematic diagram of the structure of the adjustment device;

[0049] Figure 4 is a schematic diagram of the structure of the cooling device;

[0050] Figure 5 is a schematic diagram of the structure of the spacer assembly;

[0051] Figure 6 is a schematic diagram of the structure of the drying device;

[0052] In the figure: 1, fixing frame; 2, tank body; 3, heating device; 4, adjustment device; 5, cooling device; 6, washing pipe; 7, drying device; 31, telescopic shaft body; 32, heating cavity; 33, liquid injection pipe; 34, discharge channel; 41, telescopic shaft mechanism; 42, moving adjustment ring; 43, connecting block; 44, notch; 51, fixed top plate; 52, connecting shaft section; 53, connecting vertical plate; 54, fixed bottom plate; 55, spacer assembly; 56, spiral flow channel; 57, outer closed ring; 58, inner closed ring; 59, crystallization cavity; 7, fixed ring; 72, moving ring; 73, circulation cavity; 541, discharge port; 551, fixing plate; 552, closed panel; 553, filter plate. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0053] Please refer to Figures 1 to 6 , in the embodiment of the present invention, a preparation device and purification process for high-purity manganese nitrate for electronic capacitors include:

[0054] Fixing frame 1;

[0055] Tank body 2; fixed on the fixing frame 1;

[0056] The heating device 3 is arranged at the upper part of the tank body 2;

[0057] The adjusting device 4 is fixed at the bottom of the heating device 3;

[0058] The cooling device 5 is fixed at the bottom of the heating device 3 and is located below the adjusting device 4;

[0059] The washing pipe 6 passes through the top of the tank body 2 and is connected to the cooling device 5;

[0060] The drying device 7 is arranged in the middle of the tank body 2;

[0061] It further includes a reaction kettle and a filtering device connected to the heating device 3.

[0062] In this embodiment, the heating device 3 includes:

[0063] The telescopic shaft body 31 is fixed at the center of the top of the tank body 2;

[0064] The heating cavity 32 is arranged in the tank body 2 and is fixedly connected to the bottom of the telescopic shaft body 31;

[0065] The liquid injection pipe 33 passes through the tank body 2 and is connected to the heating cavity 32;

[0066] The discharge channel 34 is conical, is fixed at the bottom of the heating cavity 32 through a one-way valve, and is fixedly connected to the cooling device 5.

[0067] That is to say, after the manganese nitrate solution is adjusted in terms of pH, the precipitate and the solution are separated through the filtering device to obtain a manganese nitrate solution with high purity, and then it is transported to the heating cavity 32 through the liquid injection pipe 33, heated to a saturated state in the heating cavity 32, and then the one-way valve is opened. The manganese nitrate solution in the saturated state flows into the cooling device 5 through the discharge channel 34 for cooling crystallization.

[0068] In this embodiment, the adjusting device 4 includes:

[0069] Two telescopic shaft mechanisms 41 are symmetrically distributed about the center of the heating device 3, and the fixed ends are fixed at the bottom of the heating device 3;

[0070] [[ID=4V2]]The moving adjusting ring 42 is fixed at the extending end of the telescopic shaft mechanism 41;

[0071] A plurality of connecting blocks 43 are annularly distributed and are fixed at the bottom of the moving adjusting ring 42;

[0072] The notch 44 is arranged on the moving adjusting ring 42 and corresponds to the discharge channel 34.

[0073] That is to say, when the telescopic shaft mechanism 41 contracts, it drives the movable adjusting ring 42 to move upward, and at the same time drives the connecting clamping block 43 to move upward in the cooling device 5, adjusts the cooling device 5, controls the residence time and flow velocity of the manganese nitrate solution in each area of the cooling device 5, helps to accelerate the crystallization rate of the manganese nitrate solution, and improves the production efficiency; when the telescopic shaft mechanism 41 extends, it drives the movable adjusting ring 42 to move downward, and at the same time drives the connecting clamping block 43 to move downward in the cooling device 5, so that each area of the cooling device 5 is in a separated state, so as to connect the areas of the cooling device 5 in sequence when the telescopic shaft mechanism 41 contracts, and control the residence time and flow velocity of the manganese nitrate solution in each area.

[0074] In this embodiment, the cooling device 5 includes:

[0075] A fixed top plate 51, which is slidably arranged below the adjusting device 4;

[0076] A connecting shaft section 52, which connects the center of the fixed top plate 51 and the heating device 3;

[0077] A connecting vertical plate 53, which is fixed to the bottom of the fixed top plate 51 and is located at the side of the connection between the heating device 3 and the cooling device 5;

[0078] A fixed bottom plate 54, which is fixed to the bottom of the connecting vertical plate 53, and a discharge port 541 is provided at the bottom of the fixed bottom plate 54;

[0079] A plurality of spaced components 55 are annularly distributed and fixed between the fixed top plate 51 and the fixed bottom plate 54;

[0080] A spiral flow channel 56 starts from the top of the connecting vertical plate 53 and passes through a plurality of spaced components 55 to the bottom of the connecting vertical plate 53.

[0081] That is to say, the manganese nitrate solution entering the cooling device 5 through the discharge channel 34 flows along the starting end of the spiral flow channel 56 on the side of the connecting vertical plate 53, flows along the spiral flow channel 56 to the end of the spiral flow channel 56 on the other side of the connecting vertical plate 53, and then is discharged through the discharge port 541. Of course, during the flow of the manganese nitrate solution in the spiral flow channel 56, it is intercepted by the spaced components 55. Then, by continuously contracting the telescopic shaft mechanism 41, the movable adjusting ring 42 is driven to move upward, and at the same time the connecting clamping block 43 is driven to continuously move upward in the corresponding spaced component 55, the spaced component 55 is opened, so that the manganese nitrate solution flows on the spiral flow channel 56 and manganese nitrate crystals are precipitated.

[0082] In this embodiment, the cooling device 5 further includes an outer closed ring 57 and an inner closed ring 58. The outer closed ring 57 is arranged outside the spacer assembly 55, and the inner closed ring 58 is arranged inside the spacer assembly 55. The upper and lower ends of the outer closed ring 57 and the inner closed ring 58 are respectively fixedly connected to the fixed top plate 51 and the fixed bottom plate 54, and are divided into upper and lower parts by the spiral flow channel 56.

[0083] That is to say, when the telescopic shaft body 31 contracts and drives the heating device 3 to move upward, at the same time, driven by the connecting shaft section 52, the adjusting device 4 and the fixed top plate 51 follow the heating device 3 to move upward, thereby driving the upper outer closed ring 57, the inner closed ring 58 and the upper part of the spacer assembly 55 to move upward, away from the top of the spiral flow channel 56, exposing the manganese nitrate crystals at the top of the spiral flow channel 56 to the drying device 7, and the drying device 7 dries the manganese nitrate crystals.

[0084] In this embodiment, a crystallization cavity 59 separated by the spacer assembly 55 is arranged between the outer closed ring 57 and the inner closed ring 58, and the temperature of the crystallization cavity 59 decreases sequentially from top to bottom.

[0085] That is to say, under the interception of the spacer assembly 55, the manganese nitrate solution stays in each crystallization cavity 59 in turn. As the temperature of the crystallization cavity 59 decreases, manganese nitrate crystals are gradually precipitated. When flowing and transferring between the crystallization cavities 59, it effectively promotes the uniform distribution of impurities in the solution, reduces local deposition or aggregation, promotes the uniform distribution of solutes in the solution, accelerates the heat transfer, speeds up the crystallization rate, and when staying in the crystallization cavity 59, the manganese nitrate solution is continuously cooled, and the crystals have sufficient time to arrange and grow orderly.

[0086] In this embodiment, the spacer assembly 55 includes:

[0087] A fixed plate 551, fixed on the top of the fixed bottom plate 54, below the spiral flow channel 56;

[0088] A closed panel 552, slidably connected to the fixed top plate 51, corresponding to the bottom of the adjusting device 4, above the spiral flow channel 56;

[0089] Two filter plates 553, symmetrically distributed with respect to the closed panel 552, fixed to the bottom of the fixed top plate 51.

[0090] That is to say, when the telescopic shaft mechanism 41 contracts, it drives the moving adjustment ring 42 to move upward, and at the same time drives the connecting clamping block 43 to move upward in the filter plate 553. During the movement, it is mutually clamped with the closed panel 552, driving the closed panel 552 to move upward, opening the filter plate 553, enabling the manganese nitrate solution to flow through the filter plate 553 on the spiral flow channel 56 to the next crystallization cavity 59, and the connection points between the closed panel 552 and the connecting clamping block 43 in each spacer assembly 55 distributed along the flowing direction of the manganese nitrate solution on the spiral flow channel 56 move upward in sequence. Therefore, during the process of the moving adjustment ring 42 driving each connecting clamping block 43 to move upward synchronously, the closed panel 552 in each spacer assembly 55 is opened in sequence, enabling the manganese nitrate solution to flow step by step on the spiral flow channel 56, and the telescopic shaft mechanism 41 can be controlled to pause, enabling the manganese nitrate solution to stay temporarily in the crystallization cavity 59 and wait for crystal precipitation.

[0091] In this embodiment, the drying device 7 includes:

[0092] A fixed ring 71, fixed at the bottom of the cooling device 5 and fixedly connected to the inner wall of the tank body 2;

[0093] A moving ring 72, fixed at the top of the cooling device 5 and slidably connected to the inner wall of the tank body 2;

[0094] A circulation cavity 73, arranged between the fixed ring 71 and the moving ring 72 and connected to an external gas circulation mechanism.

[0095] That is to say, when the telescopic shaft body 31 contracts and drives the heating device 3 to move upward, at the same time, driven by the connecting shaft section 52, the adjusting device 4 and the fixed top plate 51 follow the heating device 3 to move upward, driving the moving ring 72 to slide upward on the inner wall of the tank body 2, and driving the upper outer closed ring 57, inner closed ring 58 and filter plate 553 to move upward, disengaging from the top of the spiral flow channel 56, exposing the manganese nitrate crystals at the top of the spiral flow channel 56 in the circulation cavity 73, and drying the manganese nitrate crystals through the external gas circulation mechanism.

[0096] In this embodiment, a purification process for preparing manganese nitrate for high-purity electronic capacitors is characterized in that it includes the following steps:

[0097] Step 1: Crush, screen and wash the manganese-containing raw materials to remove impurities and surface contaminants, send the treated raw materials into a reaction kettle, add an appropriate amount of nitric acid and necessary reducing agents, and under the stirring action, make the raw materials fully react with nitric acid to generate a manganese nitrate solution;

[0098] Step 2: Adjust the pH value of the manganese nitrate solution to precipitate some impurities, use a filtering device to separate the precipitate from the solution, obtain a highly pure manganese nitrate solution, and transport it to the heating device 3 through the liquid injection pipe 33;

[0099] Step 3: In the heating device 3, heat the pure manganese nitrate solution to a saturated state, and then transport it to the spiral flow channel 56 in the cooling device 5 through the discharge channel 34. Shrink the telescopic shaft mechanism 41 in the adjusting device 4 to drive the moving adjustment ring 42 to move upward. At the same time, drive the closing panels 552 in each spacer assembly 55 to move upward in sequence through the connecting blocks 43, open the filter plate 553, so that the manganese nitrate solution flows through the filter plate 553 on the spiral flow channel 56 and flows into the next crystallization chamber 59, and control the flow rate of the manganese nitrate solution on the spiral flow channel 56 and the residence time in each crystallization chamber 59 by controlling the telescopic shaft mechanism 41 to precipitate manganese nitrate crystals;

[0100] Step 4: After the manganese nitrate crystals are precipitated, inject deionized water into the cooling device 5 through the washing pipe 6. The deionized water flows on the spiral flow channel 56 to wash the manganese nitrate crystals. Then, the telescopic shaft body 31 drives the outer closing ring 57, the inner closing ring 58 in the upper part of the heating device 3 and the cooling device 5, and the filter plate 553 to move upward, away from the top of the spiral flow channel 56, and expose the manganese nitrate crystals at the top of the spiral flow channel 56 in the circulation chamber 73. Dry the manganese nitrate crystals through the external gas circulation mechanism to obtain high-purity manganese nitrate.

[0101] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, makes equivalent substitutions or changes, and should be covered by the protection scope of the present invention.

Claims

1. A preparation device for manganese nitrate for high-purity electronic capacitors, characterized in that: Comprising: Fixing frame (1); Tank body (2); fixed on the fixing frame (1); Heating device (3), arranged at the upper part of the tank body (2); Adjusting device (4), fixed at the bottom of the heating device (3); Cooling device (5), fixed at the bottom of the heating device (3) and located below the adjusting device (4); Washing pipe (6), passing through the top of the tank body (2) and connected to the cooling device (5); Drying device (7), arranged in the middle of the tank body (2).

2. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 1, characterized in that: It further includes a reaction kettle and a filtering device connected to the heating device (3).

3. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 2, characterized in that: The heating device (3) includes: Telescopic shaft body (31), fixed at the center of the top of the tank body (2); Heating cavity (32), arranged in the tank body (2) and fixedly connected to the bottom of the telescopic shaft body (31); Liquid injection pipe (33), passing through the tank body (2) and connected to the heating cavity (32); Discharge channel (34), in a conical shape, fixed at the bottom of the heating cavity (32) through a one-way valve and fixedly connected to the cooling device (5).

4. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 3, characterized in that: The adjusting device (4) includes: Telescopic shaft mechanism (41), two of which are symmetrically distributed about the center of the heating device (3), and the fixed ends are fixed at the bottom of the heating device (3); Moving adjusting ring (42), fixed at the extending end of the telescopic shaft mechanism (41); Connecting clamping blocks (43), a plurality of which are annularly distributed and fixed at the bottom of the moving adjusting ring (42); Notch (44), arranged on the moving adjusting ring (42) and corresponding to the discharge channel (34).

5. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 4, characterized in that: The cooling device (5) includes: Fixed top plate (51), slidably arranged below the adjusting device (4); Connecting shaft section (52), connecting the center of the fixed top plate (51) and the heating device (3); Connecting vertical plate (53), fixed at the bottom of the fixed top plate (51) and located at the side of the connection part between the heating device (3) and the cooling device (5); Fixed bottom plate (54), fixed at the bottom of the connecting vertical plate (53), and a discharge port (541) is arranged at the bottom of the fixed bottom plate (54); Spacer components (55), a plurality of which are annularly distributed and fixed between the fixed top plate (51) and the fixed bottom plate (54); Spiral flow channel (56), starting from the top of the connecting vertical plate (53) and passing through a plurality of spacer components (55) to the bottom of the connecting vertical plate (53).

6. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 5, characterized in that: The cooling device (5) further includes an outer closed ring (57) and an inner closed ring (58). The outer closed ring (57) is arranged outside the spacer components (55), and the inner closed ring (58) is arranged inside the spacer components (55). The upper and lower ends of the outer closed ring (57) and the inner closed ring (58) are respectively fixedly connected to the fixed top plate (51) and the fixed bottom plate (54), and are divided into upper and lower parts by the spiral flow channel (56).

7. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 6, characterized in that: A crystallization cavity (59) separated by the spacer components (55) is arranged between the outer closed ring (57) and the inner closed ring (58), and the temperature of the crystallization cavity (59) decreases sequentially from top to bottom.

8. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 7, characterized in that: The spacer components (55) include: Fixed plate (551), fixed at the top of the fixed bottom plate (54) and located below the spiral flow channel (56); The closed panel (552) is slidably connected to the fixed top plate (51), corresponding to the bottom of the adjusting device (4), and located above the spiral flow channel (56); There are two filter plates (553) symmetrically distributed with respect to the closed panel (552), and they are fixed to the bottom of the fixed top plate (51).

9. The preparation device of manganese nitrate for high-purity electronic capacitors according to claim 1, characterized in that: The drying device (7) includes: The fixed ring (71) is fixed to the bottom of the cooling device (5) and fixedly connected to the inner wall of the tank body (2); The moving ring (72) is fixed to the top of the cooling device (5) and slidably connected to the inner wall of the tank body (2); The circulation cavity (73) is arranged between the fixed ring (71) and the moving ring (72) and is connected to an external gas circulation mechanism.

10. The purification process for preparing manganese nitrate for high-purity electronic capacitors according to claim 8, characterized in that: It includes the following steps: Step 1: Crush, screen, and wash the manganese-containing raw material to remove impurities and surface contaminants. Feed the treated raw material into the reaction kettle, add an appropriate amount of nitric acid and necessary reducing agent, and under the stirring action, fully react the raw material with nitric acid to generate a manganese nitrate solution; Step 2: Adjust the pH value of the manganese nitrate solution to precipitate some impurities. Use a filtering device to separate the precipitate from the solution to obtain a highly pure manganese nitrate solution, and transport it to the heating device (3) through the liquid injection pipe (33); Step 3: In the heating device (3), heat the pure manganese nitrate solution to a saturated state, and then transport it to the cooling device (5). Control the flow rate and residence time of the manganese nitrate solution through the adjusting device (4) to precipitate manganese nitrate crystals; Step 4: After the manganese nitrate crystals are precipitated, inject deionized water into the cooling device (5) through the washing pipe (6) to wash the manganese nitrate crystals. Then, the telescopic shaft body (31) drives the upper parts of the heating device (3) and the cooling device (5) to move upward, so that the manganese nitrate crystals are exposed in the drying device (7) to perform a drying treatment on the manganese nitrate crystals to obtain high-purity manganese nitrate.

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