A physical vapor deposition target replacement device

Abstract

The present invention relates to the field of welding technology, and specifically to a physical vapor deposition target replacement device, comprising an equipment base, a target loading unit, a target migration unit and an output track. The equipment base is provided with a loading cavity, and the carrier body of the loading unit is installed at the bottom of the base in a lifting manner, passing through the cavity to be exposed, and the output track is set on the side edge of the cavity. The migration unit contains double migration tracks, and the positioning frames on both sides slide synchronously, and each carrier and clamping mechanism is arranged relatively; the second positioning frame is equipped with an inert gas supplementer by extending the top frame. The device realizes automatic migration through a servo motor and a synchronous belt, and the lifting and positioning accuracy work together to ensure the target installation error, shortening the replacement cycle and process debugging time. The entire process is completed in the base, reducing the risk of personnel contact, and combined with inert gas protection technology to improve production efficiency and process stability.

Description

Technical Field

[0001] The present invention relates to the technical field of welding, in particular to a physical vapor deposition target replacement device. Background Art

[0002] Physical vapor deposition (PVD) technology is a key process in surface engineering, widely used in the preparation of semiconductors, optical thin films, decorative coatings, and functional coatings. Its core principle is to bombard a target surface with high-energy particles, causing target atoms or molecules to deposit onto the substrate in the vapor phase, forming a thin film. In this process, the target material is a key consumable, and its performance directly determines the coating quality and process stability.

[0003] Traditionally, target replacement relies on manual operation, requiring the operator to enter a cleanroom or vacuum chamber. Even with strict dust-free measures, this can introduce particulate contamination, grease residue, or oxide layers, leading to increased coating defect rates. Furthermore, manual intervention can lead to target installation deviation due to operational errors, affecting plasma distribution uniformity. Summary of the Invention

[0004] The object of the present invention is to provide a physical vapor deposition target replacement device to solve the problems raised in the above background technology.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] A physical vapor deposition target replacement device comprises an equipment base, a target loading unit, a target migration unit and a target output track. The table top of the equipment base is provided with a loading cavity opening. The target loading unit comprises a carrying base and a carrying platform body arranged on the top of the carrying base; the carrying platform body is installed above the carrying base in a liftable manner through a lifting drive mechanism, and its table top passes through the equipment base table top through the loading cavity opening to form an exposed working position. The target output track is mounted on the edge of the table top of the loading cavity opening, and its conveying end face is kept coplanar with the table top of the carrying platform body; the target migration unit comprises a migration track arranged in parallel on both sides of the loading cavity opening, a first positioning frame and a second positioning frame are symmetrically installed on the migration tracks on both sides through a sliding mechanism and form a synchronous displacement cooperation, and each positioning frame is equipped with a clamping mechanism arranged toward the axis direction of the loading cavity opening; an extension top frame is extended from the top of the second positioning frame, and the cantilever end of the extension top frame is equipped with an inert gas supplementer, and its jet port is arranged toward the working area of ​​the target loading unit.

[0007] As a further solution of the present invention: the bearing base includes a base substrate and a lifting base substrate arranged above the base substrate, four groups of supporting slide bars are arranged between the base substrate and the lifting base substrate, and each supporting slide bar is arranged in a parallel axis state at the four corner areas of the base, and its lower end is fixedly connected to the base substrate plate body, and its upper end is fixedly connected to the bottom plane of the equipment base; sliding sleeves are respectively provided in the four corner areas of the lifting base substrate corresponding to the position of each supporting slide bar, and the lifting base substrate forms a sliding fit with the supporting slide bar through the sliding sleeve, and realizes vertical displacement adjustment through the lifting drive mechanism.

[0008] As a further solution of the present invention: the supporting platform includes an upper support frame and a target material substrate, and the bottom plane of the upper support frame is fixedly installed on the top surface of the lifting substrate; the target material substrate is supported and installed on the top supporting surface of the upper support frame, and is used to carry the target material assembly; the conveying end surface of the target material substrate is coplanarly connected with the end of the conveying roller of the target material output track, forming a horizontal transmission channel for the target material assembly.

[0009] As a further solution of the present invention: a clamping notch is opened in the side area of ​​the target substrate, and the clamping notch adopts a U-shaped notch structure, and its opening direction corresponds to the operating direction of the target migration unit, and is used to form a mechanical limit fit with the interlocking part of the clamping mechanism.

[0010] As a further solution of the present invention: a center branch groove is opened along the center line position of the bottom plane of the base substrate, a center support plate is embedded and fixed in the center branch groove, the bottom plane of the center support plate is fixed with a hydraulic press by a bolt group, and the piston rod end of the hydraulic press is coaxially connected with a hydraulic push rod; a center bearing is provided through the center line position of the base substrate, the hydraulic push rod is passed through the inner ring of the center bearing and forms an axial sliding fit, and the end of the rod body is rigidly connected to the bottom plane of the lifting base through a flange; the axis of the hydraulic push rod is kept coincident with the axis of the center bearing, forming a vertical drive shaft system of the lifting base.

[0011] As a further solution of the present invention: the first positioning frame and the second positioning frame are both composed of a migration sliding seat and a clamping bracket, the migration sliding seat is slidably embedded in the track groove body of the corresponding migration track through a linear bearing assembly, and a driving wheel system engaged with the track rack is provided at its bottom; the clamping bracket is vertically fixed to the top plane of the migration sliding seat, and its vertical surface is equipped with a micrometer driver and a fine-tuning machine frame; the frame of the fine-tuning machine frame is provided with a lifting wire groove running through the axial center line, and a fine-tuning screw is embedded in the wire groove, and the upper end of the fine-tuning screw is connected to the micrometer screw of the micrometer driver through a rigid coupling to form a transmission connection, and the lower end of the fine-tuning screw is connected to the mounting base of the clamping mechanism through a thrust ball bearing group to form a load-bearing connection.

[0012] As a further solution of the present invention: the clamping mechanism includes a clamper frame and an inner pusher, the clamper frame is slidably embedded in the guide groove body of the lifting line groove through a linear guide rail assembly, and a transmission nut is provided on the back thereof to form a threaded sleeve with the fine-tuning screw; the inner pusher adopts a hydraulically driven structure, the cylinder part is vertically fixed to the middle of the vertical surface of the clamper frame, and a pressure sensor is provided at the end of the piston rod; the fine-tuning screw adopts a trapezoidal thread transmission structure, and its axial displacement is closed-loop controlled with .mm level accuracy through the micrometer screw of the micrometer driver, forming a vertical fine-tuning mechanism of the clamper frame; the hydraulic pipeline of the inner pusher is integrated with a pressure regulating valve and a displacement sensor, and its control signal is connected to the main control system of the device to form a servo control system of the clamping force.

[0013] As a further solution of the present invention: the piston rod end of the inner pusher is connected to the inner push rod through a thread, the axial extension end of the inner push rod is fixedly connected to the resistance sensing plate, and the bottom edge area of ​​the resistance sensing plate is welded with a support plate, the support plate adopts a wedge-shaped guide surface structure, the slope angle of which is 15°±0.5°, and the surface is coated with a diamond-like carbon film wear-resistant coating; the wedge surface of the support plate and the V-shaped positioning groove of the clamper frame constitute a composite clamping interface of the target material assembly, when the inner pusher implements the clamping action, the wedge surface of the support plate first forms a pre-contact with the side wall of the target material through line contact, and then the plane of the resistance sensing plate forms a surface contact with the end face of the target material, forming a staged progressive clamping force application mechanism; a strain gauge force sensor is embedded in the interior of the resistance sensing plate, and its signal output end is electrically connected to the PID control module of the device master control system, forming a closed-loop feedback control system of the clamping force.

[0014] As a further solution of the present invention: the inert gas replenisher includes a supplier mounting seat, a gas supplier and an output head, the supplier mounting seat is rigidly connected to the bottom plane of the extended top frame in an array arrangement, and the mounting seats are structurally reinforced by reinforcing ribs, and the joint surface is provided with an O-ring sealing assembly; the gas supplier is vertically fixed to the mounting hole of the supplier mounting seat through a threaded connector, and an electromagnetic valve group and a gas flow meter are integrated inside. The external air flow duct adopts a metal hose structure with a nominal diameter of DN8 and is equipped with a quick connector; the input end of the output head is coaxially connected with the output end of the gas supplier through a conical sealing structure, and the output end is provided with a diffusion head; the gas supply medium of the gas supplier is a high-purity argon / nitrogen mixed gas, and its control signal is connected to the PID control module of the device master control system to form a closed-loop control system of gas flow-pressure; the axis of the diffusion head is spatially aligned with the center point of the working area of ​​the target loading unit.

[0015] As a further solution of the present invention: an adjustment track and a supplier adjustment push rod are provided on the supplier mounting seat, the gas supplier is slidably mounted on the adjustment track and is driven to rise and fall by the supplier adjustment push rod.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] 1. Automated and efficient replacement reduces production downtime. Target migration is fully automated through servo motors and synchronous belt drives, significantly shortening replacement cycles. The coordinated movement of the lift base and migration unit ensures rapid positioning of the target at the clamping station, enabling a clamping-unloading-loading cycle within seconds, minimizing the impact of equipment downtime on the production line.

[0018] 2. The dual guarantee of platform lifting accuracy and transfer unit positioning accuracy reduces operational errors. The contact sensor plate clamps the target's side edge, cooperating with the support plate to form a support constraint. The clamping position and force are adjusted in real time to prevent target installation deviation and reduce process debugging time.

[0019] 3. An integrated inert gas shielding system is designed to move synchronously with the migration unit, forming a uniform gas curtain through a microporous diffuser, covering the target migration path and maintaining a local positive pressure environment. This effectively isolates impurities such as oxygen and moisture from the air, preventing oxidation during target replacement and improving the stability of the physical vapor deposition process.

[0020] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The accompanying drawings are incorporated into and constitute a part of the specification to illustrate embodiments consistent with the present application and, together with the specification, serve to explain the principles of the present application. These drawings and the accompanying description are not intended to limit the scope of the present application in any way, but rather to illustrate the concepts of the present application to those skilled in the art by reference to specific embodiments.

[0022] Figure 1 A schematic diagram of the overall structure of a physical vapor deposition target replacement device provided in an embodiment of the present invention.

[0023] Figure 2 This is a schematic diagram of the installation of the target loading unit, target migration unit and equipment base provided in an embodiment of the present invention.

[0024] Figure 3 Schematic diagram of the structure of the target loading unit provided in the embodiment of the present invention Figure 1 .

[0025] Figure 4 Schematic diagram of the structure of the target loading unit provided in the embodiment of the present invention Figure 2 .

[0026] Figure 5 This is a structural schematic diagram of a second positioning frame provided in an embodiment of the present invention.

[0027] Figure 6 A schematic structural diagram of a clamping mechanism provided in an embodiment of the present invention.

[0028] Figure 7 A schematic structural diagram of an inert gas replenisher provided in an embodiment of the present invention.

[0029] In the figure: 1. Equipment base; 11. Loading cavity; 2. Target loading unit; 21. Carrying base; 211. Base substrate; 212. Lifting substrate; 213. Support slide; 214. Sliding sleeve; 215. Middle support groove; 216. Middle support plate; 217. Middle bearing; 218. Hydraulic push rod; 219. Hydraulic actuator; 22. Carrying platform; 221. Upper support frame; 222. Target substrate; 223. Clamping notch; 3. Target transfer unit; 31. Transfer track; 32. First positioning frame; 33. Second positioning frame; 331. Transfer slide seat; 332. Clamping bracket; 333. Micrometer drive; 334. Fine-tuning frame; 335. Lifting groove; 336. Fine-tuning screw; 34. Clamping mechanism; 341. Clamping frame; 342. Internal pusher; 343. Internal push rod; 344. Resistance sensing plate; 345. Support plate; 35. Extended top frame; 36. Inert gas replenisher; 361. Feeder mounting seat; 362. Gas feeder; 363. Air flow duct; 364. Output head; 365. Diffuser head; 366. Feeder adjustment push rod; 367. Adjustment track; 4. Target output track. DETAILED DESCRIPTION

[0030] The following will be combined with the accompanying drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention, and examples thereof are shown in the accompanying drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements.

[0031] Obviously, the embodiments described are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0032] The specific implementation of the present invention is described in detail below with reference to specific embodiments.

[0033] In one embodiment, see Figure 1 and Figure 2, provides a physical vapor deposition target replacement device, including an equipment base 1, a target loading unit 2, a target migration unit 3 and a target output track 4; a loading cavity 11 is provided on the plate surface of the equipment base 1, the target loading unit 2 includes a carrying base 21 and a carrying platform 22 mounted on the top of the carrying base 21, the carrying platform 22 is fixedly installed on the bottom plane of the plate body of the equipment base 1, the carrying platform 22 is installed on the carrying platform 22 in a lifting manner and is exposed through the slot of the loading cavity 11, the target output track 4 is mounted on the side edge of the plate surface of the loading cavity 11, and the table surface of the carrying platform 22 is connected to the end of the loading cavity 11.

[0034] The target material migration unit 3 includes a migration track 31, a first positioning frame 32 and a second positioning frame 33. The migration track 31 is provided with two tracks and is respectively located on both sides of the loading cavity port 11. The first positioning frame 32 and the second positioning frame 33 are respectively slidably installed on the corresponding migration track 31 and move synchronously. The first positioning frame 32 and the second positioning frame 33 are both installed with clamping mechanisms 34, and the clamping mechanisms 34 on both sides are arranged relative to each other; the top of the second positioning frame 33 is also provided with an extension top frame 35, and the extension top frame 35 is installed with an inert gas supplement 36.

[0035] In this embodiment, the equipment base 1 is a rigid platform processed with high precision, which is loaded in an equipment chassis with a vacuum function. A rectangular loading cavity 11 is opened in the center of the equipment base 1, the size of which matches the outer diameter of the target material, and the edge of the cavity is chamfered to avoid scratching the target material. The supporting base 21 is composed of an electric lifting platform driven by a servo motor, which is used to realize the lifting and lowering of the supporting platform 22. The top of the supporting platform 22 is provided with a groove structure, and an electromagnetic suction cup is embedded in it. The adsorption force is ≥500N to ensure that the target material is fixed and reliable. When lifting, it passes through the loading cavity 11, and the height of the exposed part is adjustable to adapt to the replacement needs of targets of different heights. The target output track 4 is made of 304 stainless steel, and the inner wall is coated with Teflon to reduce the friction coefficient. The track can be built with a micro electric conveyor belt to realize the automatic output of the target material to the storage cabinet.

[0036] For the target material migration unit 3, its migration track 31 is a double linear guide rail and is arranged in parallel on both sides of the loading cavity 11. When the old target material is unloaded, the carrier body 22 descends and separates from the old target material. The clamping mechanism 34 of the target material migration unit 3 clamps the edge of the target material and moves to the entrance of the target material output track 4. The clamping mechanism 34 is released, and the target material slides into the track for output. When the new target material is loaded, the target material output track 4 runs in the opposite direction to transport the new target material to the edge of the loading cavity 11. The clamping mechanism 34 of the target material migration unit 3 clamps the new target material and moves to the top of the carrier body 22. The carrier body 22 rises to receive the target material. After the electromagnetic chuck fixes the target material, the target material migration unit 3 is released and returns to its initial position. During the target material replacement process, the inert gas supplementer 36 continuously sprays high-purity argon gas into the loading cavity 11 area to form a local positive pressure environment to prevent oxygen and moisture in the air from entering the vacuum chamber and avoid oxidation of the target material surface.

[0037] This embodiment utilizes automated transfer technology driven by a servo motor and synchronous belt, shortening the target replacement cycle. The lifting and lowering precision of the carrier platform 22, combined with the positioning accuracy of the target transfer unit 3, ensures target installation tolerances and reduces process commissioning time. Target replacement can be completed entirely within the equipment chassis, minimizing the risk of personnel coming into contact with high-value targets.

[0038] This embodiment achieves automated and non-destructive replacement of PVD targets through a highly integrated mechanical structure, precise control system, and inert gas protection technology, significantly improving production efficiency and process stability. It is suitable for high-precision manufacturing fields such as semiconductors, optical coatings, and tool coatings.

[0039] For example 2, please refer to Figure 3 and Figure 4 Based on the contents of the above embodiment, the specific implementation structure of the target loading unit 2 is designed as follows:

[0040] The supporting base 21 includes a base substrate 211 and a lifting substrate 212. Support slides 213 are installed at the four corners between the base substrate 211 and the lifting substrate 212. The bottoms of the support slides 213 are fixedly installed on the plate body of the base substrate 211, and the tops of the support slides 213 are fixedly installed on the bottom plane of the equipment base 1. The four corners of the lifting substrate 212 are slidably installed on the support slides 213 through sliding sleeves 214; the supporting platform body 22 includes an upper support frame 221 and a target substrate 222 mounted on the upper support frame 221. The target substrate 222 is connected to the target output track 4, and the upper support frame 221 is fixed on the lifting substrate 212.

[0041] The bottom of the base substrate 211 is provided with a middle branch groove 215 and a middle support plate 216 installed on the middle branch groove 215. The bottom of the middle support plate 216 is fixed with a hydraulic press 219, and the driving end of the hydraulic press 219 is provided with a hydraulic push rod 218. The center line position of the base substrate 211 is provided with a center bearing 217. The hydraulic push rod 218 is limited in the center bearing 217 and the rod end is fixed to the bottom of the lifting substrate 212.

[0042] The side wings of the target substrate 222 are provided with clamping notches 223 , and the clamping notches 223 match the corresponding clamping components 34 .

[0043] In this embodiment, the base substrate 211 is a rectangular steel plate structure, serving as the foundation for the entire bearing base 21 and providing a stable support base. Its bottom is provided with a center support groove 215 for mounting a center support plate 216. The lifting base 212 is also a rectangular steel plate structure, located above the base substrate 211. It is connected to the support slides 213 via sliding sleeves 214 to achieve lifting motion. There are four support slides 213, located at the four corners between the base substrate 211 and the lifting base 212. The sliding sleeves 214 are mounted at the four corners of the lifting base 212 and cooperate with the support slides 213 to ensure the smooth lifting and lowering of the lifting base 212. The hydraulic actuator 219 drives the hydraulic push rods 218 to extend and retract. The hydraulic push rods 218, limited by the center bearing 217, vertically drive the lifting base 212 up and down along the support slides 213. The cooperation between the sliding sleeves 214 and the support slides 213 ensures the smooth and precise lifting and lowering of the lifting base 212.

[0044] During the target separation phase, the hydraulic actuator 219 drives the hydraulic push rods 218 to retract, pulling the lift base 212 smoothly down along the support slides 213. The target substrate 222, secured to the lift base 212, then moves downward as a whole. When the target substrate 222 reaches the preset transfer height, the hydraulic actuator 219 stops operating. At this point, the clamping notches 223 on the flanks of the target substrate 222 are fully exposed and aligned with the clamping mechanisms 34 of the target transfer unit 3. The clamping tips of the clamping mechanisms 34 on either side engage the clamping notches 223 on the flanks of the target substrate 222. The hydraulic actuator 219 then further drives the hydraulic push rods 218 to slightly lower the target substrate 222, completely separating it from the upper support frame 221. The combined weight of the target and target substrate 222 is transferred to the clamping mechanisms 34. The target transfer unit 3, carrying the clamped target substrate 222, then moves along the transfer track 31 to the entrance of the target output track 4. The clamping mechanism 34 is released, and the target substrate 222 slides out along the target output track 4, completing the unloading of the old target. The loading process of the new target is the opposite of the above steps.

[0045] This embodiment adopts a lifting structure to lower the target substrate 222 and the target material as a whole to the clamping station. Combined with the design of the side clamping notch 223, rapid positioning and clamping of the target material is achieved, which significantly shortens the target material replacement time.

[0046] For example three, please refer to Figure 5 and Figure 6 Based on the contents of the above embodiment, the specific implementation structure of the clamping member 34 is designed as follows:

[0047] The first positioning frame 32 and the second positioning frame 33 both include a migration sliding seat 331 and a clamping bracket 332 installed on the migration sliding seat 331. The migration sliding seat 331 is slidably installed on the track of the corresponding migration track 31. The clamping bracket 332 is provided with a micrometer driver 333 and a fine-tuning machine frame 334. The fine-tuning machine frame 334 is provided with a lifting line slot 335 and a fine-tuning screw 336 installed in the midline area of ​​the lifting line slot 335. The fine-tuning screw 336 is connected to the driving end of the micrometer driver 333.

[0048] The clamping mechanism 34 includes a clamping frame 341 and an inner pusher 342 mounted on the clamping frame 341. The clamping frame 341 is slidably mounted on the wire groove of the lifting wire groove 335 and is connected to the fine-tuning screw 336 via a threaded sleeve. The inner pusher 342 is provided with an inner push rod 343, a contact sensing plate 344 mounted on the end of the inner push rod 343, and a support plate 345 provided on the bottom edge of the contact sensing plate 344. The support plate 345 has a sloped sheet structure.

[0049] The migration sliding seat 331 of the first positioning frame 32 and the second positioning frame 33 both use high-precision linear sliding workpieces to cooperate with the migration track 31. The clamping bracket 332 is spliced ​​from aluminum alloy profiles, and a T-slot structure is set on the top for installing the micrometer driver 333 and the fine-tuning machine frame 334. Two V-shaped line grooves are symmetrically opened on the inner wall of the fine-tuning machine frame 334. The fine-tuning screw 336 can adopt a C3 grade precision ball screw with a nominal diameter of 12mm and a lead of 2mm. It is equipped with a pre-tightening nut to eliminate axial clearance. Both ends of the screw are supported by angular contact ball bearings to ensure rotation accuracy. The micrometer driver 333 is connected to the fine-tuning screw 336 through a coupling. It is also equipped with a differential cylinder rotary encoder, which can transmit the rotation angle signal to the control system to realize the electric fine-tuning function.

[0050] The inner push rod 343 of the clamp frame 341 is an 8mm diameter chromium-molybdenum alloy steel rod. The contact sensing plate 344 is made of polyetheretherketone (PEEK) resin, and its inner surface can be embedded with a thin-film pressure sensor. The support plate 345 is stamped from spring steel sheet, 1mm thick, and galvanized. The slope angle is 15°, and the surface roughness is Ra0.4, ensuring linear contact with the target.

[0051] The transfer slide 331 moves along the transfer track 31 to the side of the target substrate 222. The measuring rod of the micrometer driver 333 rotates, driving the fine adjustment screw 336 to rotate, driving the clamp frame 341 to rise and fall along the lifting groove 335, aligning the slope of the support plate 345 with the bottom edge of the clamping notch 223 of the target substrate 222. The cylinder of the inner pusher 342 pushes the inner push rod 343 forward, contacting the sensing plate 344 to clamp the target. The thin pressure sensor provides real-time feedback on the clamping force. When the clamping force reaches the preset value, the cylinder stops advancing, forming a support constraint.

[0052] During operation, the control system can synchronously collect the displacement data of the micrometer driver 333 and the pressure data of the resistance sensing plate 344, and adjust the rotation of the fine-tuning screw 336 through the PID algorithm to achieve closed-loop control of the clamping position and clamping force to ensure positioning accuracy.

[0053] For example 4, please refer to Figure 5 and Figure 7 Based on the contents of the above embodiment, the specific implementation structure of the clamping member 34 is designed as follows:

[0054] The inert gas replenisher 36 includes several supply mounts 361 and gas supplies 362 mounted on the supply mounts 361. The supply mounts 361 are fixedly mounted on the plate of the extended top frame 35. The gas supplies 362 are externally connected to airflow ducts 363. The output end of the gas supply 362 is provided with an output head 364, and the bottom of the output head 364 is provided with a diffusion head 365. The supply mounts 361 are provided with adjustment rails 367 and supply adjustment push rods 366. The gas supply 362 is slidably mounted on the adjustment rails 367 and is driven up and down by the supply adjustment push rods 366.

[0055] As the target transfer unit 3 moves along the transfer track 31, the second positioning frame 33, carrying the inert gas replenisher 36, moves synchronously. The airflow duct 363, protected by a drag chain, extends and retracts with the positioning frame, ensuring uninterrupted gas supply. The gas supply 362 is externally connected to a mass flow controller, gas filter, and other related gas supply and regulation systems to provide localized inert gas protection in the target replacement area. Clean inert gas is delivered to the output head 364 through the airflow duct 363. The gas is ejected from the diffuser head 365 at the bottom of the output head 364. The micropores on the surface of the diffuser head 365 disperse the gas into fine streams, forming a uniform air curtain. This air curtain covers the target replacement area, creating a localized positive pressure environment, effectively isolating impurities such as oxygen and moisture from the air and preventing oxidation during the target replacement process. The gas supply adjustment push rod 366 drives the gas supply 362 up and down along the adjustment track 367 according to signals from the control system. By adjusting the height of the gas supply 362, the coverage of the air curtain can be optimized to accommodate the replacement needs of targets of different sizes and shapes.

[0056] The gas supply 362 moves synchronously with the target transfer unit 3, creating a gas curtain that consistently covers the target transfer path, effectively isolating impurities such as oxygen and moisture from the air. This prevents oxidation during the target replacement process and extends the target's service life. This uniform gas curtain ensures a consistent inert gas atmosphere in the target replacement area, reducing process fluctuations caused by uneven gas distribution and improving the stability of the physical vapor deposition process.

[0057] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the invention can be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations that come within the meaning and range of equivalents of the claims be embraced therein.

[0058] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.

Claims

1. A physical vapor deposition target replacement device, comprising an equipment base (1), a target loading unit (2), a target migration unit (3) and a target output track (4), characterized in that: The table top of the equipment base (1) is provided with a loading cavity (11), and the target material loading unit (2) comprises a carrying base (21) and a carrying platform (22) arranged on the top of the carrying base (21); wherein, The carrier body (22) is installed on the carrier base (21) in a liftable manner through a lifting drive mechanism, and its table surface passes through the loading cavity (11) to form an exposed working position, and the target material output track (4) is set on the edge of the table surface of the loading cavity (11), and its conveying end surface is kept in coplanar connection with the table surface of the carrier body (22); The target material migration unit (3) comprises a migration track (31) arranged in parallel on both sides of the loading cavity opening (11); a first positioning frame (32) and a second positioning frame (33) are symmetrically mounted on the migration tracks (31) on both sides through a sliding mechanism and form a synchronous displacement match; each positioning frame is equipped with a clamping mechanism (34) arranged in the direction of the axis of the loading cavity opening (11); An extension top frame (35) is extended from the top of the second positioning frame (33), and an inert gas supplement (36) is installed at the cantilever end of the extension top frame (35), and its gas injection port is arranged toward the working area of ​​the target material loading unit (2).

2. The physical vapor deposition target replacement device according to claim 1, characterized in that: The supporting base (21) comprises a base substrate (211) and a lifting substrate (212) arranged above the base substrate (211), wherein: Four groups of supporting slide bars (213) are provided between the base substrate (211) and the lifting substrate (212), and each supporting slide bar (213) is arranged in the four corner areas of the base in a parallel axis state, with its lower end fixedly connected to the base substrate (211) plate body, and its upper end fixedly connected to the bottom plane of the equipment base (1); Sliding sleeves (214) are respectively provided at the four corner areas of the lifting base plate (212) corresponding to the positions of the supporting slide bars (213); the lifting base plate (212) forms a sliding fit with the supporting slide bars (213) through the sliding sleeves (214), and vertical displacement adjustment is achieved via a lifting drive mechanism.

3. The physical vapor deposition target replacement device according to claim 2, characterized in that: The supporting platform (22) comprises: An upper support frame (221), the bottom plane of which is fixedly mounted on the top surface of the lifting base plate (212); A target material substrate (222) is supported and mounted on the top bearing surface of the upper support frame (221) and is used to bear the target material assembly; The conveying end surface of the target substrate (222) and the end of the conveying roller of the target output track (4) are coplanarly connected to form a horizontal transmission channel for the target assembly.

4. The physical vapor deposition target replacement device according to claim 3, characterized in that: A clamping notch (223) is provided in the flank area of ​​the target substrate (222). The clamping notch (223) adopts a U-shaped notch structure, the opening direction of which corresponds to the operating direction of the target migration unit (3), and is used to form a mechanical limit fit with the engaging portion of the clamping mechanism (34).

5. The physical vapor deposition target replacement device according to claim 3, characterized in that: A middle branch groove (215) is formed on the bottom plane of the base substrate (211) along its midline position, a middle support plate (216) is embedded and fixed in the middle branch groove (215), a hydraulic press (219) is fixed to the bottom plane of the middle support plate (216) via a bolt assembly, and a hydraulic push rod (218) is coaxially connected to the end of the piston rod of the hydraulic press (219); A center bearing (217) is provided through the centerline of the base substrate (211), the hydraulic push rod (218) is provided through the inner ring of the center bearing (217) and forms an axial sliding fit, and the end of the rod body is rigidly connected to the bottom plane of the lifting substrate (212) through a flange. The axis of the hydraulic push rod (218) and the axis of the center bearing (217) remain coincident, forming a vertical drive axis system of the lifting base plate (212).

6. The physical vapor deposition target replacement device according to claim 4, characterized in that: The first positioning frame (32) and the second positioning frame (33) both include a migration sliding seat (331) and a clamping bracket (332), wherein: The migration sliding seat (331) is slidably embedded in the track groove body of the corresponding migration track (31) through a linear bearing assembly, and a driving wheel system meshing with the track rack is provided at the bottom thereof; The clamping bracket (332) is vertically fixed to the top plane of the migration sliding seat (331), and its vertical surface is equipped with a micrometer driver (333) and a fine-tuning frame (334); The frame of the fine-tuning machine frame (334) is provided with a lifting line groove (335) running through the axial center line, and a fine-tuning screw (336) is embedded in the line groove. The upper end of the fine-tuning screw (336) is connected to the micrometer screw of the micrometer driver (333) through a rigid coupling to form a transmission connection, and the lower end of the fine-tuning screw (336) is connected to the mounting base of the clamping mechanism (34) through a thrust ball bearing group to form a load-bearing connection.

7. The physical vapor deposition target replacement device according to claim 6, characterized in that: The clamping mechanism (34) comprises: A clamper frame (341) is slidably embedded in the guide groove body of the lifting groove (335) through a linear guide rail assembly, and a transmission nut is provided on the back thereof to form a threaded sleeve connection with the fine-tuning screw (336); An inner pusher (342) adopts a hydraulically driven structure, wherein the cylinder portion is vertically fixed to the middle portion of the vertical surface of the clamper frame (341); The fine-tuning screw (336) adopts a trapezoidal thread transmission structure, and its axial displacement is closed-loop controlled by the micrometer screw of the micrometer driver (333), forming a vertical fine-tuning mechanism of the clamp frame (341).

8. The physical vapor deposition target replacement device according to claim 7, characterized in that: The piston rod end of the inner pusher (342) is connected to the inner push rod (343) through a thread, the axial extension end of the inner push rod (343) is fixedly connected to the resistance sensing plate (344), and the bottom edge area of ​​the resistance sensing plate (344) is welded with a support piece (345), and the support piece (345) adopts a wedge-shaped guide surface structure; The wedge-shaped surface of the support piece (345) first forms pre-contact with the target material side wall in a line contact manner, and then the plane of the resistance sensing plate (344) forms surface contact with the target material end face, forming a staged progressive clamping force application mechanism; The signal output end of the resistance sensing plate (344) is electrically connected to the PID control module of the device master control system, forming a closed-loop feedback control system for the clamping force.

9. The physical vapor deposition target replacement device according to claim 8, characterized in that: The inert gas supplement (36) includes: A feeder mounting seat (361) is rigidly connected to the bottom plane of the extension top frame (35) in an array arrangement; A gas supplier (362) vertically fixed to the mounting hole of the supplier mounting seat (361) via a threaded connection; An output head (364), the input end of which is coaxially connected to the output end of the gas supplier (362) via a conical sealing structure, and the output end is provided with a diffusion head (365); The control signal of the gas supplier (362) is connected to the PID control module of the device master control system to form a closed-loop control system of gas flow-pressure; The axis of the diffusion head (365) is spatially aligned with the center point of the working area of ​​the target material loading unit (2).

10. The physical vapor deposition target replacement device according to claim 9, characterized in that: The gas supply mounting seat (361) is provided with an adjustment rail (367) and a gas supply adjustment push rod (366). The gas supply (362) is slidably mounted on the adjustment rail (367) and is driven to rise and fall by the gas supply adjustment push rod (366).

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