Baffle mechanism and vacuum processing chamber

Abstract

The invention relates to the technical field of vacuum treatment, and particularly discloses a baffle mechanism and a vacuum treatment chamber. The baffle mechanism comprises a supporting part, a driving part and a shielding part, the vacuum processing source and the substrate are arranged in a spaced mode in the third direction, and the baffle mechanism is arranged between the vacuum processing source and the substrate; when the shielding part is in the shielding state, the distance between the shielding part and the substrate is smaller than half of the distance between the vacuum processing source and the substrate in the third direction; in the plane perpendicular to the third direction, the shielding area of the baffle mechanism is larger than 60% of the sectional area of a channel between the vacuum processing source and the substrate. When the shielding part is in the storage state, substances emitted by the vacuum processing source can reach the substrate. The distance between the shielding part and the substrate is smaller than one half of the distance between the vacuum treatment source and the substrate, so that impurity gas is effectively removed during pretreatment, and the residual impurity gas is prevented from influencing the vacuum treatment effect.

Description

Technical Field

[0001] The present invention relates to the field of vacuum processing technology, and in particular to a baffle mechanism and a vacuum processing chamber. Background Art

[0002] During vacuum treatment processes such as vacuum evaporation coating, the vacuum treatment chamber is usually evacuated to a specific vacuum degree first to remove as much excess gas as possible from the vacuum treatment chamber to ensure that a specific vacuum treatment effect is achieved. Taking vacuum evaporation coating as an example, during vacuum evaporation coating, the coating chamber is usually evacuated to a specific vacuum degree first to remove excess gas from the coating chamber, thereby allowing the gaseous film material molecules to reach the substrate surface smoothly and ensuring that the coated film meets specific requirements in terms of chemical composition and physical and chemical properties. At the same time, before the formal evaporation coating, it is sometimes necessary to pre-evaporate the coating raw materials so that the chemical composition and evaporation rate of the gaseous film material molecules reaching the substrate reach the expected values.

[0003] In the prior art, a selectively openable and closable baffle mechanism is usually installed above the evaporation source. During pre-evaporation, the baffle mechanism is located directly above the evaporation source, blocking the gaseous film material molecules emitted from the evaporation source from moving toward the substrate to be coated. During the formal evaporation coating, the baffle mechanism moves away from directly above the evaporation source, allowing the gaseous film material molecules emitted from the evaporation source to reach the substrate to be coated. However, in application scenarios such as coating a surface to be coated with steps, if the aforementioned pre-evaporation and formal evaporation coating processes are used to coat the film, the film formed by vacuum treatment cannot meet the application requirements in terms of chemical composition or morphology. Summary of the Invention

[0004] The purpose of the present invention is to provide a baffle mechanism and a vacuum processing chamber to solve the problem in the prior art that during vacuum processing such as coating on a substrate with steps, the formed film cannot meet the process requirements in terms of chemical composition or morphology due to the influence of residual impurity gases in the vacuum processing chamber.

[0005] To achieve the above object, the present invention adopts the following technical solutions:

[0006] In one aspect, the present invention provides a baffle mechanism for preventing substances emitted from a vacuum processing source from reaching a substrate, the baffle mechanism comprising:

[0007] The baffle mechanism includes a supporting portion, a driving portion, and a shielding portion, wherein the supporting portion is used to support the driving portion, and the driving portion is used to drive the shielding portion to change into a shielding state or a storage state; the vacuum processing source and the substrate are spaced apart along the third direction, and the baffle mechanism is disposed between the vacuum processing source and the substrate;

[0008] When the shielding portion is in the shielding state, in the third direction, the distance between the shielding portion and the substrate is less than half the distance between the vacuum processing source and the substrate; and in a plane perpendicular to the third direction, the shielding area of the baffle mechanism is greater than 60% of the cross-sectional area of the passage between the vacuum processing source and the substrate.

[0009] When the shielding portion is in the accommodated state, substances emitted from the vacuum processing source can reach the substrate.

[0010] As an optional solution to the above baffle mechanism,

[0011] The support portion includes a support frame, which is disposed between the vacuum processing source and the substrate and is close to the substrate; the support frame has a frame channel along the third direction;

[0012] The driving part includes a connecting rod assembly, and the connecting rod assembly is movably arranged on the supporting frame;

[0013] The above-mentioned shielding portion includes a baffle, and at least one baffle is provided. The above-mentioned connecting rod assembly can drive the above-mentioned baffle to fold to open the above-mentioned frame channel, or the above-mentioned connecting rod assembly can drive the above-mentioned baffle to extend to shield the above-mentioned frame channel; when the number of the above-mentioned baffles is greater than one, multiple baffles are spaced apart from the above-mentioned connecting rod assembly.

[0014] As an optional scheme for the above-mentioned baffle mechanism, the above-mentioned connecting rod assembly includes a cross rod group, the above-mentioned cross rod group includes a first connecting rod and a second connecting rod that cross each other and are rotatably connected, and there is at least one above-mentioned cross rod group. When the number of the above-mentioned cross rod groups is greater than one, the multiple first connecting rods of the multiple cross rod groups are rotatably connected in sequence, and the multiple second connecting rods of the multiple cross rod groups are rotatably connected in sequence; the multiple baffles are arranged one by one on the above-mentioned first connecting rods or the above-mentioned second connecting rods of the multiple cross rod groups, so that the multiple baffles can be arranged parallel to each other.

[0015] As an optional solution for the above-mentioned baffle mechanism, the above-mentioned support frame includes a bearing plate and a guide rail plate arranged on the above-mentioned bearing plate. There are two above-mentioned guide rail plates, and the two above-mentioned guide rail plates are arranged opposite to each other along a first direction. The above-mentioned frame channel is opened on the above-mentioned bearing plate, and the above-mentioned frame channel is located between the two above-mentioned guide rail plates; the above-mentioned cross rod group can be folded and arranged on the above-mentioned guide rail plate along the second direction.

[0016] As an optional scheme for the above-mentioned baffle mechanism, the above-mentioned guide rail plate is provided with a first guide rail groove extending along the above-mentioned third direction and a second guide rail groove extending along the above-mentioned second direction, and the above-mentioned first guide rail groove is close to the edge position of the above-mentioned guide rail plate along the above-mentioned second direction; a moving part is provided at the intersection position of the above-mentioned first connecting rod and the above-mentioned second connecting rod, and the above-mentioned moving part can be movably provided in the above-mentioned second guide rail groove; the above-mentioned first connecting rod and the above-mentioned second connecting rod located at the starting position in the above-mentioned connecting rod assembly are provided with a follower, and the above-mentioned follower can be movably provided in the above-mentioned first guide rail groove.

[0017] As an optional scheme for the above-mentioned baffle mechanism, the above-mentioned guide rail plate is provided with a second guide rail groove extending along the above-mentioned second direction, and the above-mentioned first connecting rod and the above-mentioned second connecting rod are provided with a follower at the edge position on the same side of the above-mentioned third direction, and the above-mentioned follower is movably arranged in the above-mentioned second guide rail groove; the above-mentioned follower located at the starting position in the above-mentioned connecting rod assembly is rotatably arranged on the above-mentioned guide rail plate.

[0018] As an optional solution of the baffle mechanism, the carrying plate has a storage area, and when the baffle is folded to open the frame channel, the baffle can be located above the storage area.

[0019] As an optional solution of the above-mentioned baffle mechanism, the above-mentioned baffle mechanism also includes a driving assembly, the above-mentioned driving assembly includes a driving cylinder and a driving rod arranged at the driving end of the above-mentioned driving cylinder, and the above-mentioned driving rod is connected to the above-mentioned connecting rod assembly; the above-mentioned driving cylinder can drive the above-mentioned driving rod to move along the second direction.

[0020] As an optional scheme for the above-mentioned baffle mechanism, the above-mentioned connecting rod assembly is divided into a first connecting rod assembly and a second connecting rod assembly, and the above-mentioned first connecting rod assembly and the above-mentioned second connecting rod assembly are respectively located at both ends of the above-mentioned support frame along the second direction, and the above-mentioned baffle on the above-mentioned first connecting rod assembly and the above-mentioned baffle on the above-mentioned second connecting rod assembly can approach each other when extended to block the above-mentioned frame channel.

[0021] As an optional solution for the baffle mechanism, the baffles at the junction of the first connecting rod assembly and the second connecting rod assembly are both provided with convex edges, and the convex edges of the two baffles can overlap with each other along the third direction.

[0022] As an optional solution of the baffle mechanism, when the plurality of baffles are sequentially extended to block the frame channel, partial areas of two adjacent baffles can overlap with each other.

[0023] On the other hand, the present invention provides a vacuum processing chamber, including the above-mentioned baffle mechanism, wherein the vacuum processing chamber has a vacuum processing cavity; a substrate and a vacuum processing source are arranged in the vacuum processing cavity, and the baffle mechanism is located between the substrate and the vacuum processing source.

[0024] The beneficial effects of the present invention are:

[0025] The baffle mechanism includes a support portion, a drive portion, and a shielding portion. The support portion is configured to support the drive portion, and the drive portion is configured to drive the shielding portion to transition between a shielding state and a storage state. The vacuum processing source and the substrate are spaced apart along a third direction, and the baffle mechanism is disposed between the vacuum processing source and the substrate. When the shielding portion is in the shielding state, the distance between the shielding portion and the substrate in the third direction is less than half the distance between the vacuum processing source and the substrate. In a plane perpendicular to the third direction, the shielding area of the baffle mechanism is greater than 60% of the cross-sectional area of the passage between the vacuum processing source and the substrate. When the shielding portion is in the storage state, substances emitted from the vacuum processing source can reach the substrate. The provision of this baffle mechanism effectively reduces the adverse effects of residual impurity gases in the vacuum processing chamber on vacuum processing. Taking the application of evaporation coating as an example, during pre-evaporation, the baffle mechanism can play a shielding role to prevent gaseous film material molecules from flying onto the substrate, and the distance between the shielding part and the substrate is less than half of the distance between the vacuum processing source and the substrate, so that the gaseous film material molecules can react with the residual impurity gas in the vacuum processing chamber to prevent the residual impurity gas from affecting the chemical composition or morphology of the thin film formed on the substrate during the formal evaporation coating. At the same time, the substance formed by the gaseous film material molecules and the residual impurity gas can be blocked by the shielding part, thereby avoiding contamination of the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 Schematic diagram of the structure of the baffle mechanism provided in an embodiment of the present invention Figure 1 ;

[0027] Figure 2 Schematic diagram of the structure of the baffle mechanism provided in an embodiment of the present invention Figure 2 ;

[0028] Figure 3 Schematic diagram of the structure of the connecting rod assembly and the baffle provided in the embodiment of the present invention Figure 1 ;

[0029] Figure 4 Schematic diagram of the structure of the connecting rod assembly and the baffle provided in the embodiment of the present invention Figure 2 ;

[0030] Figure 5 A schematic structural diagram of a guide rail plate provided in an embodiment of the present invention;

[0031] Figure 6 A partial cross-sectional view of a baffle mechanism provided by an embodiment of the present invention;

[0032] Figure 7 This is a structural schematic diagram of a vacuum processing chamber provided by an embodiment of the present invention.

[0033] In the picture:

[0034] 1. Support frame; 11. Loading plate; 111. Frame channel; 112. Storage area; 12. Guide rail plate; 121. First guide rail groove; 122. Second guide rail groove; 2. Connecting rod assembly; 21. Cross rod group; 211. First connecting rod; 212. Second connecting rod; 213. Moving part; 214. Follower; 3. Baffle; 31. Lug; 4. Drive assembly; 41. Drive cylinder; 42. Drive rod; 43. Guide rail frame; 5. Vacuum processing chamber; 6. Substrate; 7. Vacuum processing source; 8. Shielding plate. DETAILED DESCRIPTION

[0035] The technical solution of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described are only some embodiments of the present invention, not all embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0036] In the description of the present invention, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and are not intended to indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance. Among them, the terms "first position" and "second position" are two different positions, and the first feature being "above", "above" and "above" the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature includes the first feature being directly below and obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0037] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on the specific circumstances.

[0038] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.

[0039] This embodiment provides a baffle mechanism for preventing substances emitted by the vacuum processing source 7 from reaching the substrate 6. Optionally, the baffle mechanism can be used in an evaporation coating device to prevent gaseous film material molecules emitted by the vacuum processing source 7 from reaching the substrate 6.

[0040] like Figures 1 to 7 As shown, the baffle mechanism includes a support portion, a drive portion, and a shielding portion. The support portion is used to support the drive portion, and the drive portion is used to drive the shielding portion to transition between a shielding state and a storage state. The vacuum processing source 7 and substrate 6 are spaced apart along a third direction (i.e., the Z direction in the figure), and the baffle mechanism is disposed between the vacuum processing source 7 and substrate 6. When the shielding portion is in the shielding state, the distance between the shielding portion and substrate 6 in the third direction is less than half the distance between the vacuum processing source 7 and substrate 6. In a plane perpendicular to the third direction, the shielding area of the baffle mechanism is greater than 60% of the cross-sectional area of the channel between the vacuum processing source 7 and substrate 6. When the shielding portion is in the storage state, substances emitted by the vacuum processing source 7 can reach the substrate 6. By providing this baffle mechanism, the adverse effects of residual impurities in the vacuum processing chamber on the vacuum processing can be effectively reduced. Taking the application of evaporation coating as an example, during pre-evaporation, the baffle mechanism can play a shielding role to prevent gaseous film material molecules from flying onto the substrate 6, and the distance between the shielding part and the substrate 6 is less than half of the distance between the vacuum processing source 7 and the substrate 6, so that the gaseous film material molecules can react with the residual impurity gas in the vacuum processing chamber to prevent the residual impurity gas from affecting the chemical composition or morphology of the thin film formed on the substrate 6 during the formal evaporation coating. At the same time, the substance formed by the gaseous film material molecules and the residual impurity gas can be blocked by the shielding part, thereby avoiding contamination of the substrate 6.

[0041] Furthermore, the support portion includes a support frame 1, the drive portion includes a connecting rod assembly 2, and the shielding portion includes a baffle 3. The support frame 1 is disposed between the vacuum processing source 7 and the substrate 6, and the support frame 1 is disposed close to the substrate 6. The support frame 1 has a frame channel 111 along the third direction, and the gaseous film material molecules emitted by the vacuum processing source 7 can pass through the frame channel 111 to reach the substrate 6.

[0042] Among them, there is at least one baffle 3, and the connecting rod assembly 2 is movably arranged on the support frame 1. The connecting rod assembly 2 can drive the baffle 3 to fold to open the frame channel 111, or the connecting rod assembly 2 can drive the baffle 3 to extend to block the frame channel 111, so that during pre-evaporation, the baffle 3 can block the substrate 6 to prevent the gaseous film material molecules from flying onto the substrate 6, and the baffle mechanism is arranged on the side close to the substrate 6, so that the gaseous film material molecules between the baffle 3 and the vacuum processing source 7 can react with the residual impurity gas in the vacuum processing chamber 5 to prevent the residual impurity gas from affecting the chemical composition or morphology of the thin film formed on the substrate 6 during formal evaporation coating. At the same time, when the number of baffles 3 is greater than one, multiple baffles 3 are spaced apart in the connecting rod assembly 2, so as to avoid contact between the baffles 3 and the baffle 3, which may cause slag to fall off and contaminate the substrate 6.

[0043] like Figure 3 and Figure 4 As shown, the connecting rod assembly 2 includes a cross rod group 21, and the cross rod group 21 includes a first connecting rod 211 and a second connecting rod 212 that cross each other and are rotatably connected. There is at least one cross rod group 21, but when the number of cross rod groups 21 is greater than one, the multiple first connecting rods 211 of the multiple cross rod groups 21 are rotatably connected in sequence, and the multiple second connecting rods 212 of the multiple cross rod groups 21 are rotatably connected in sequence, and the multiple baffles 3 are correspondingly arranged on the first connecting rod 211 or the second connecting rod 212 of the multiple cross rod groups 21, so that the multiple baffles 3 can be arranged parallel to each other, so that when the first connecting rod 211 rotates relative to the second connecting rod 212, the baffle 3 can follow the rotation, so that the baffle 3 can approach vertical extension or horizontal extension, thereby realizing that the multiple baffles 3 are folded with each other to open the frame channel 111, or the multiple baffles 3 are extended in sequence to block the frame channel 111.

[0044] like Figures 1 to 6 As shown, the support frame 1 includes a carrier plate 11 and a guide plate 12 arranged on the carrier plate 11. There are two guide plates 12, and the two guide plates 12 are arranged relative to each other along a first direction (i.e., the X direction in the accompanying drawings). A frame channel 111 is opened on the carrier plate 11, and the frame channel 111 is located between the two guide plates 12. At the same time, the cross rod group 21 can be folded along the second direction (i.e., the Y direction in the accompanying drawings) on the guide plate 12, so that the baffle 3 can block the frame channel 111 between the two guide plates 12. The first direction, the second direction, and the third direction are arranged perpendicular to each other in pairs. Optionally, the carrier plate 11 has a storage area 112. When the baffle 3 is folded to open the frame channel 111, the baffle 3 can be located above the storage area 112, so that the storage area 112 can store particles generated by the baffle 3 during movement, thereby preventing the particles from contaminating the substrate 6.

[0045] Specifically, in one embodiment, the guide rail plate 12 is provided with a first guide rail groove 121 extending along the third direction and a second guide rail groove 122 extending along the second direction, the first guide rail groove 121 is close to the edge position of the guide rail plate 12 along the second direction, wherein the intersection position of the first connecting rod 211 and the second connecting rod 212 is provided with a moving member 213, the moving member 213 is movably provided in the second guide rail groove 122, and the first connecting rod 211 and the second connecting rod 212 at the starting position in the connecting rod assembly 2 are provided with a driven member 213. The movable member 213 is provided in the first guide groove 121, and the follower 214 is movably arranged in the first guide groove 121, so that when the two follower members 214 move away from each other in the first guide groove 121, the movable member 213 can move along the second guide groove 122 toward the first guide groove 121, at this time, the baffle 3 is folded; when the two follower members 214 move toward each other in the first guide groove 121, the movable member 213 can move along the second guide groove 122 toward the direction away from the first guide groove 121, at this time, the baffle 3 is extended. Optionally, the movable member 213 and the follower 214 are both bearings.

[0046] In another embodiment, the guide rail plate 12 is provided with a second guide rail groove 122 extending along the second direction, and the first connecting rod 211 and the second connecting rod 212 are provided with a follower 214 at the edge position on the same side along the third direction. The follower 214 is movably arranged in the second guide rail groove 122, and the follower 214 located at the starting position in the connecting rod assembly 2 is rotatably arranged on the guide rail plate 12, so that when the follower 214 in the second guide rail groove 122 moves, the baffle 3 can be folded or extended.

[0047] Furthermore, the baffle mechanism further includes a drive assembly 4, which includes a drive cylinder 41 and a drive rod 42 disposed at a drive end of the drive cylinder 41. The drive rod 42 is connected to the connecting rod assembly 2, and the drive cylinder 41 is capable of driving the drive rod 42 to move in the second direction, thereby folding or extending the connecting rod assembly 2. Optionally, the drive assembly 4 further includes a guide rail frame 43, which is disposed on the guide rail plate 12. A portion of the drive rod 42 is movably disposed on the guide rail frame 43 in the second direction. Thus, the provision of the guide rail frame 43 can improve the stability of the drive rod 42 in the second direction.

[0048] Furthermore, the connecting rod assembly 2 is divided into a first connecting rod assembly and a second connecting rod assembly, which are respectively located at the two ends of the support frame 1 along the second direction. The baffles 3 on the first connecting rod assembly and the baffles 3 on the second connecting rod assembly can approach each other when extended to block the frame channel 111. Thus, by providing the two connecting rod assemblies 2, the stacking thickness of multiple baffles 3 on one side of the support frame 1 can be reduced, preventing the baffles 3 on one side of the support frame 1 from being stacked too thickly and affecting the distribution of gaseous film material molecules on the substrate 6. The baffles 3 at the junction of the first and second connecting rod assemblies are both provided with a convex edge 31, and the convex edges 31 of the two baffles 3 can overlap with each other along the third direction, thereby preventing gaseous film material molecules from flying from the gap between the first and second connecting rod assemblies to the substrate 6.

[0049] Furthermore, when multiple baffles 3 are extended in sequence to block the frame channel 111, parts of two adjacent baffles 3 can overlap with each other, thereby preventing excessive gaseous film material molecules from bypassing the baffles 3 and rising to the substrate 6 when approaching the lower surface of the baffles 3.

[0050] This embodiment also provides a vacuum processing chamber, including the baffle mechanism as described above, such as Figure 7 As shown, the vacuum processing chamber comprises a vacuum processing chamber 5, in which a substrate 6 and a vacuum processing source 7 are disposed. A baffle mechanism is located between the substrate 6 and the vacuum processing source 7, so that the baffle mechanism can shield the gaseous film material molecules emitted by the vacuum processing source 7. Specifically, a baffle plate 8 is further provided in the vacuum processing chamber 5. The substrate 6 and the vacuum processing source 7 are located at the upper and lower ends of the vacuum processing chamber 5, respectively. The baffle mechanism and the baffle plate 8 are both located between the substrate 6 and the vacuum processing source 7, and the baffle mechanism is disposed near the substrate 6, and the baffle plate 8 is disposed near the vacuum processing source 7. Thus, during pre-evaporation, the baffle plate 8 can shield the vacuum processing source 7, so that the chemical composition and evaporation rate of the gaseous film material molecules reaching the substrate 6 reach the desired values. After the baffle plate 8 is opened, the baffle mechanism shields the gaseous film material molecules, so that the residual impurity gases in the vacuum processing chamber 5 are reacted and eliminated, thereby preventing the residual impurity gases from affecting the chemical composition or morphology of the thin film formed on the substrate 6. This vacuum processing chamber is particularly suitable for high-requirement coating of highly active coating materials.

[0051] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Those skilled in the art will appreciate that other variations or modifications can be made based on the above description. It is not necessary and impossible to enumerate all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the claims of the present invention.

Claims

1. A baffle mechanism for preventing substances emitted from a vacuum processing source (7) from reaching a substrate (6), characterized in that: The baffle mechanism comprises a supporting portion, a driving portion, and a shielding portion, wherein the supporting portion is used to support the driving portion, and the driving portion is used to drive the shielding portion to transform into a shielding state or a storage state; the vacuum processing source (7) and the substrate (6) are spaced apart along a third direction, and the baffle mechanism is provided between the vacuum processing source (7) and the substrate (6); When the shielding portion is in the shielding state, in the third direction, the distance between the shielding portion and the substrate (6) is less than half the distance between the vacuum processing source (7) and the substrate (6); in a plane perpendicular to the third direction, the shielding area of the baffle mechanism is greater than 60% of the cross-sectional area of the channel between the vacuum processing source (7) and the substrate (6); When the shielding portion is in the stored state, the substance emitted by the vacuum processing source (7) can reach the substrate (6).

2. The baffle mechanism according to claim 1, wherein: The support portion comprises a support frame (1), the support frame (1) being arranged between the vacuum processing source (7) and the substrate (6), and the support frame (1) being arranged close to the substrate (6); the support frame (1) having a frame channel (111) along a third direction; The driving part comprises a connecting rod assembly (2), and the connecting rod assembly (2) is movably arranged on the supporting frame (1); The shielding portion comprises a baffle (3), at least one of which is provided, and the connecting rod assembly (2) is capable of driving the baffle (3) to fold to open the frame channel (111), or the connecting rod assembly (2) is capable of driving the baffle (3) to extend to shield the frame channel (111); when the number of the baffles (3) is greater than one, a plurality of the baffles (3) are spaced apart on the connecting rod assembly (2).

3. The baffle mechanism according to claim 2, characterized in that: The connecting rod assembly (2) includes a cross rod group (21), and the cross rod group (21) includes a first connecting rod (211) and a second connecting rod (212) that cross each other and are rotatably connected. The cross rod group (21) is provided with at least one. When the number of the cross rod groups (21) is greater than one, the plurality of first connecting rods (211) of the plurality of cross rod groups (21) are rotatably connected end to end in sequence, and the plurality of second connecting rods (212) of the plurality of cross rod groups (21) are rotatably connected end to end in sequence; and the plurality of baffles (3) are provided one by one on the first connecting rods (211) or the second connecting rods (212) of the plurality of cross rod groups (21), so that the plurality of baffles (3) can be arranged in parallel with each other.

4. The baffle mechanism according to claim 3, characterized in that: The support frame (1) comprises a carrier plate (11) and a guide rail plate (12) arranged on the carrier plate (11); two guide rail plates (12) are provided, and the two guide rail plates (12) are arranged opposite to each other along a first direction; the carrier plate (11) is provided with the frame channel (111), and the frame channel (111) is located between the two guide rail plates (12); the cross rod group (21) is foldable and arranged on the guide rail plate (12) along a second direction.

5. The baffle mechanism according to claim 4, characterized in that: The guide rail plate (12) is provided with a first guide rail groove (121) extending along the third direction and a second guide rail groove (122) extending along the second direction, wherein the first guide rail groove (121) is close to the edge position of the guide rail plate (12) along the second direction; a moving member (213) is provided at the intersection position of the first connecting rod (211) and the second connecting rod (212), and the moving member (213) is movably provided in the second guide rail groove (122); the first connecting rod (211) and the second connecting rod (212) located at the starting position in the connecting rod assembly (2) are provided with a follower (214), and the follower (214) is movably provided in the first guide rail groove (121).

6. The baffle mechanism according to claim 4, characterized in that: The guide rail plate (12) is provided with a second guide rail groove (122) extending along the second direction; the first connecting rod (211) and the second connecting rod (212) are provided with a follower (214) at an edge position on the same side along the third direction; the follower (214) is movably arranged in the second guide rail groove (122); the follower (214) located at the starting position in the connecting rod assembly (2) is rotatably arranged on the guide rail plate (12).

7. The baffle mechanism according to claim 4, characterized in that: The carrying plate (11) has a storage area (112), and when the baffle (3) is folded to open the frame channel (111), the baffle (3) can be located above the storage area (112).

8. The baffle mechanism according to claim 2, wherein: The baffle mechanism further comprises a driving assembly (4), the driving assembly (4) comprising a driving cylinder (41) and a driving rod (42) provided at a driving end of the driving cylinder (41), the driving rod (42) being connected to the connecting rod assembly (2); the driving cylinder (41) is capable of driving the driving rod (42) to move along a second direction.

9. The baffle mechanism according to claim 2, characterized in that: The connecting rod assembly (2) is divided into a first connecting rod assembly and a second connecting rod assembly, the first connecting rod assembly and the second connecting rod assembly are respectively located at two ends of the supporting frame (1) along the second direction, and the baffle (3) on the first connecting rod assembly and the baffle (3) on the second connecting rod assembly can approach each other when extended to block the frame channel (111).

10. The baffle mechanism according to claim 7, characterized in that: The baffles (3) at the junction of the first connecting rod assembly and the second connecting rod assembly are both provided with convex edges (31), and the convex edges (31) of the two baffles (3) can overlap with each other along the third direction.

11. The baffle mechanism according to any one of claims 2 to 10, characterized in that: When the plurality of baffles (3) are sequentially extended to block the frame channel (111), partial areas of two adjacent baffles (3) can overlap with each other.

12. A vacuum processing chamber, characterized in that: The vacuum processing chamber comprises a baffle mechanism as described in any one of claims 1 to 11, wherein the vacuum processing chamber has a vacuum processing cavity (5); a substrate (6) and a vacuum processing source (7) are arranged in the vacuum processing cavity (5), and the baffle mechanism is located between the substrate (6) and the vacuum processing source (7).

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