Gas introducing device for preparing focusing ring

Abstract

The invention provides a gas introduction device for preparing a focusing ring. The gas introduction device comprises a gas introduction pipe, a gas inlet pipe and a gas outlet pipe, the regulation and control pipe is mounted in an inner cavity of the vent pipe in a sliding manner; the rack plate is installed on the side wall of the ventilation pipe in a sliding mode, and the bottom end of the rack plate is connected with the regulation and control pipe through a fixing rod; the locking regulation and control unit is mounted on the side surface of the ventilation pipe; the extension amount auxiliary mechanism is installed on the side surface of the top end of the rack plate, the sealing compensation unit is installed on the top side of a dragging seat, the dragging seat is installed at the tail end of the fixing rod, a sealing seat is installed at the top of the sealing compensation unit, and a sealing ring connected to the surface of the bottom end of the regulation and control pipe in a sleeving mode is installed on the top side of the sealing seat. The sealing effect between the sealing ring and the ventilation pipe is improved, it is guaranteed that the ventilation pipe is clean, it is guaranteed that gas introduced next time is not affected by waste gas, the accuracy of subsequent focusing ring preparation reaction is guaranteed, and the preparation quality of the focusing ring is guaranteed.

Description

Technical Field

[0001] The present invention relates to the technical field of focusing ring preparation, in particular to a gas introduction device for focusing ring preparation. Background Art

[0002] In the preparation of focusing rings, commonly used reaction gases mainly include methyltrichlorosilane (MTS) and hydrogen (H2). These two gases react during the chemical vapor deposition (CVD) process to generate solid silicon carbide focusing rings. During the preparation of the focusing rings, the gas introduction device introduces the reaction gas into the deposition area to promote the formation of the focusing ring. The gas introduction device is widely used in the field of semiconductor device manufacturing.

[0003] Currently, most of the pipelines for the reaction gases required for focusing ring preparation are directly connected to the high-temperature chemical vapor deposition equipment. After the reaction is completed, the exhaust gas generated by the reaction in the high-temperature chemical vapor deposition equipment is easily reversed and flows into the pipeline, causing some impurities in the exhaust gas to adhere to the pipeline. The impurities will enter with the reaction gas in the pipeline next time, affecting the reaction results. At the same time, the depth of the gas supply cannot be adjusted according to demand, and uneven gas supply is likely to occur. Summary of the Invention

[0004] In order to solve the technical problems that the waste gas generated by the reaction in the high-temperature chemical vapor deposition equipment is easily reversed and flows into the pipeline, causing some impurities in the waste gas to adhere to the pipeline. The impurities will enter the pipeline with the reaction gas next time, affecting the reaction results. At the same time, the depth of the gas supply cannot be adjusted according to demand, and uneven gas supply is likely to occur, the present invention provides a gas introduction device for focusing ring preparation.

[0005] The present invention solves the above technical problems through the following technical solutions: The present invention provides a gas introduction device for preparing a focusing ring, the gas introduction device for preparing a focusing ring comprising: snorkel; A regulating tube, the regulating tube being slidably mounted in the inner cavity of the ventilation tube; A rack plate, the rack plate being slidably mounted on the side wall of the vent pipe, the bottom end of the rack plate being connected to the regulating pipe via a fixing rod; A locking and regulating unit, the locking and regulating unit being mounted on a side surface of the vent pipe and used for regulating the elongation and movement of the pipe and locking the pipe after regulation; An extension auxiliary mechanism, the extension auxiliary mechanism being mounted on the top side surface of the rack plate and being used for regulating and guiding the moving depth of the rack plate; A sealing compensation unit is installed on the top side of the drag seat, and the drag seat is installed at the end of the fixed rod. A sealing seat is installed on the top of the sealing compensation unit, and a sealing ring is installed on the top side of the sealing seat and is sleeved on the bottom end surface of the control pipe; Among them, the locking and regulating unit drives the regulating tube to telescope and move, and the sealing ring is used to seal the bottom end of the ventilation tube after the regulating tube is retracted into the ventilation tube, and the sealing performance between the ventilation tube and the bottom end of the regulating tube is regulated by the sealing compensation unit.

[0006] Furthermore, the bottom end of the fixing rod passes through the surface of the ventilation pipe, the top end of the fixing rod is fixedly connected to the bottom side of the rack plate, and the fixing rod is slidably connected to the side wall of the ventilation pipe.

[0007] Furthermore, the vent pipe is installed on the surface of the shell of the high-temperature chemical vapor deposition equipment through a pipe seat, and the top end of the vent pipe is connected to the air pump through a flange.

[0008] Furthermore, the locking and regulating unit is a locking and regulating mechanism, which includes a mounting frame and a first driving gear. The mounting frame is fixedly mounted on the outer surface of the middle part of the ventilation pipe, and a first driving shaft is mounted on the surface of the mounting frame. A turntable is mounted on the end of the first driving shaft close to the mounting frame, and a first driving gear is mounted on the end of the first driving shaft away from the mounting frame. A rack plate is arranged on one side of the first driving gear in meshing connection, and the turntable is used to manually drive the operating end of the first driving gear.

[0009] Furthermore, a hand crank is fixedly installed at the edge of the turntable surface, and a locking bolt passes through the turntable surface. The locking bolt passes through the turntable and is connected to the mounting frame. The locking bolt is used to fix the turntable after rotation.

[0010] Furthermore, the elongation auxiliary mechanism includes a scale rod, a mounting head is provided at the top of the scale rod, the mounting head is detachably mounted on the surface of the mounting platform, the mounting platform is fixedly mounted on the top side surface of the rack plate, a guide frame is fixedly mounted on the other side surface of the top of the rack plate, a guide column is passed through the inner cavity of the guide frame, the guide column is installed in a slot opened on the side surface of the ventilation pipe, and the guide column is used to assist the rack plate in guiding movement.

[0011] Furthermore, the sealing compensation unit includes a chassis, which is installed on the top of the drag seat, a buffer cylinder is installed on the surface of the chassis, a buffer column is slidably connected to the inner cavity of the buffer cylinder, the top of the buffer column is fixedly connected to the top plate, a sliding rod is installed on the bottom side of the top plate, the bottom end of the sliding rod passes through the sliding frame, and a limiting seat is fixedly installed at the end of the sliding rod, and an elastic spring is sleeved on the surface of the sliding rod.

[0012] Furthermore, the sliding frame is symmetrically mounted on both sides of the top of the buffer cylinder, a sliding rod passes through the inner cavity of the sliding frame, and the top side of the sliding frame is elastically connected to the bottom side of the top plate through an elastic spring.

[0013] Furthermore, the sealing ring is coaxially arranged with the regulating tube, and the sealing ring is arranged at the bottom end of the vent tube, and a plurality of ventilation holes are evenly distributed on the side surface of the regulating tube 7.

[0014] Furthermore, the sealing compensation units are provided in a number, and the sealing compensation units are distributed in a ring shape on the top edge of the drag seat, and the sealing compensation units are provided between the drag seat and the sealing seat.

[0015] Furthermore, the locking and controlling unit can also be a locking and controlling device, which includes a second driving gear, a second driving shaft passing through the inner cavity of the second driving gear, the second driving shaft is installed on the surface of the fixed block, the fixed block is fixedly connected to the vent pipe, the second driving gear is meshed with the rack plate, a limiting ring is sleeved on the surface of the second driving shaft, the limiting ring is fixedly connected to the fixed block through a connecting frame, a limiting claw is provided on one side of the limiting ring and is sleeved on the surface of the second driving shaft, the inner cavity of the limiting claw is elastically connected to the limiting ring through a torsion spring, and the torsion spring is sleeved on the surface of the second driving shaft.

[0016] On the basis of conforming to the common sense in this field, the above-mentioned preferred conditions can be arbitrarily combined to obtain the preferred embodiments of the present invention.

[0017] The effects of the present invention are: The above-proposed gas introduction device for preparing the focusing ring is convenient for adjusting the depth of the control tube under the action of the driving locking control unit, and is convenient for adjusting the depth position of the control tube in the shell of the high-temperature chemical vapor deposition equipment to meet the demand of the gas supply position. The gas is discharged through the air vents opened on the surface of the removed control tube. Based on the demand of the gas supply depth, the locking control unit adjusts the extension of the control tube to effectively ensure the demand of the gas supply depth. At the same time, when the demand of the gas supply depth is not required, the locking control unit can adjust the extension of the control tube. With the cooperation of the extension auxiliary mechanism, the gas supply volume can be effectively regulated, and then the gas supply volume can be accurately controlled, which can avoid energy waste caused by excessive supply, ensure that the focusing ring is processed under the best working conditions, and thus ensure the preparation quality of the focusing ring; During the process of stopping ventilation, the locking control unit can move the control tube into the ventilation pipe, and through the cooperation of the provided sealing ring and the sealing seat, the exhaust gas from preparing the focusing ring in the phase deposition equipment shell is prevented from entering and remaining in the ventilation pipe. In order to ensure the sealing effect, a sealing compensation mechanism is provided for auxiliary sealing, which solves the problem of loose sealing caused by long-term sealing in the existing technology, improves the sealing effect between the sealing ring and the ventilation pipe, ensures the cleanliness of the ventilation pipe, ensures that the gas introduced next time is not affected by the exhaust gas, and ensures that the ventilation pipe is not polluted secondary, ensures better treatment of harmful substances in the subsequent preparation of the focusing ring, reduces the negative impact on the environment in the ventilation pipe, ensures the accuracy of the subsequent focusing ring preparation reaction, and ensures the preparation quality of the focusing ring. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application.

[0019] Figure 1 It is a schematic diagram of the three-dimensional structure of the gas introduction device of the present invention.

[0020] Figure 2 The gas introduction device of the present invention is an integral part Figure 1 A partial enlarged schematic diagram of point A in the middle.

[0021] Figure 3 The gas introduction device of the present invention is an integral part Figure 1 A partial enlarged schematic diagram of point B in the middle.

[0022] Figure 4 It is a bottom bottom view of the gas introduction device of the present invention.

[0023] Figure 5 The gas introduction device of the present invention Figure 4 Schematic diagram of the BB cross-sectional structure.

[0024] Figure 6 This is a schematic structural diagram of the sealing compensation unit of the gas introduction device of the present invention.

[0025] Figure 7 This is a schematic front view of a cross-sectional sealing compensation unit of the gas introduction device of the present invention.

[0026] Figure 8 This is a schematic diagram of the surface connection structure of the rack plate of the gas introduction device of the present invention.

[0027] Figure 9 This is a schematic structural diagram of the rack plate and elongation auxiliary mechanism of the gas introduction device of the present invention.

[0028] Figure 10 This is a schematic diagram of the three-dimensional structure of the vent pipe of the gas introduction device and the shell of the high-temperature chemical vapor deposition equipment of the present invention.

[0029] Figure 11 This is a schematic diagram of the connection structure between the locking and regulating device and the rack plate of the gas introduction device of the present invention.

[0030] Description of Reference Numerals Figure: 1, vent pipe; 2, pipe seat; 3, locking control mechanism; 31, mounting frame; 32, turntable; 33, locking bolt; 34, hand crank; 35, first drive shaft; 36, first drive gear; 4, rack plate; 5, extension auxiliary mechanism; 51, guide column; 52, guide frame; 53, mounting table; 54, mounting head; 55, scale rod; 6, fixing rod; 7, control pipe; 71, vent hole; 8, sealing compensation unit; 81, bottom Disc; 82. Buffer cylinder; 83. Buffer column; 84. Top plate; 85. Sliding rod; 86. Elastic spring; 87. Sliding frame; 88. Limit seat; 9. Drag seat; 10. Sealing seat; 11. Sealing ring; 12. High-temperature chemical vapor deposition equipment housing; 13. Air pump; 14. Locking and regulating device; 141. Second gear; 142. Second drive shaft; 143. Fixed block; 144. Connecting frame; 145. Limit claw; 146. Limit ring. DETAILED DESCRIPTION

[0031] In order to enable those skilled in the art to better understand the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of this application.

[0032] It should be noted that the terms "first", "second", etc. in the specification and the above-mentioned drawings of the present application are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described herein. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0033] In this application, terms such as "upper," "lower," "left," "right," "front," "back," "top," "bottom," "inner," "outer," "center," "vertical," "horizontal," "transverse," and "longitudinal" indicate positions or locations based on the positions or locations shown in the accompanying drawings. These terms are primarily intended to better describe this application and its embodiments and are not intended to limit the devices, elements, or components indicated to having a specific orientation, or to being constructed or operated in a specific orientation.

[0034] Furthermore, some of the above terms may be used to express other meanings besides indicating a position or location. For example, the term "on" may also be used to indicate a dependency or connection in certain circumstances. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.

[0035] Furthermore, the terms "installed," "disposed," "provided with," "connected," "connected," and "socketed" should be interpreted broadly. For example, they can refer to fixed connections, removable connections, or integral structures; mechanical connections or electrical connections; direct connections, indirect connections through an intermediary, or internal communication between two devices, elements, or components. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.

[0036] It should be noted that, unless there is any conflict, the embodiments and features in the embodiments of this application can be combined with each other.

[0037] Example 1 like Figures 1-10 As shown, the gas introduction device for preparing the focusing ring includes: vent pipe 1; A regulating tube 7, wherein the regulating tube 7 is slidably mounted in the inner cavity of the vent tube 1; The rack plate 4 is slidably mounted on the side wall of the vent pipe 1, and the bottom end of the rack plate 4 is connected to the regulating pipe 7 through a fixing rod 6; The locking and regulating unit is installed on the side surface of the vent pipe 1. Under the action of the driving locking and regulating unit, the depth of the regulating pipe 7 can be adjusted, so that the depth position of the regulating pipe 7 in the housing 12 of the high-temperature chemical vapor deposition equipment can be adjusted to meet the requirements of the gas supply position. An extension auxiliary mechanism 5, which is mounted on the top side surface of the rack plate 4 and is used to control and guide the movement depth of the rack plate 4; The sealing compensation unit 8 is installed on the top side of the drag seat 9, and the drag seat 9 is installed at the end of the fixed rod 6. A sealing seat 10 is installed on the top of the sealing compensation unit 8, and a sealing ring 11 is installed on the top side of the sealing seat 10, which is sleeved on the bottom surface of the regulating tube 7. The provided sealing compensation mechanism performs auxiliary sealing to solve the problem of loosening of the seal due to long-term sealing in the prior art, improves the sealing effect between the sealing ring 11 and the vent pipe 1, ensures that the vent pipe 1 is clean, ensures that the gas introduced next time is not affected by exhaust gas, and ensures that the vent pipe 1 is not polluted by secondary pollution, ensures better treatment of harmful substances in the subsequent preparation of the focusing ring, reduces the negative impact on the environment in the vent pipe 1, ensures the accuracy of the subsequent focusing ring preparation reaction, and ensures the preparation quality of the focusing ring; Among them, the locking and controlling unit drives the controlling tube 7 to telescope and move, and the sealing ring 11 is used to seal the bottom end of the ventilation tube 1 after the controlling tube 7 is retracted into the ventilation tube 1, and the sealing performance of the ventilation tube 1 and the bottom end of the controlling tube 7 is adjusted by the sealing compensation unit 8.

[0038] When the air is introduced into the airtight container 1, the locking and regulating unit is driven to work according to the demand, and the rack plate 4 is driven to move by the locking and regulating unit, and the rack plate 4 is moved through the fixed rod 6 installed at the bottom end, and the fixed rod 6 drives the drag seat 9 installed at the bottom end to move, and the drag seat 9 adjusts the sealing compensation unit 8 to disengage from the airtight container 1. At the same time, the drag seat 9 drives the regulating pipe 7 to move out along the airtight container 1, and the air is discharged through the air vents 71 opened on the surface of the moved regulating pipe 7. Based on the demand of the air supply depth, the locking and regulating unit is started to adjust the extension of the regulating pipe 7, which effectively guarantees the demand of the air supply depth. At the same time, when the air supply control depth is not required, the locking and regulating unit can adjust the extension of the regulating pipe 7, which can effectively regulate the size of the air supply, thereby accurately controlling the gas supply amount, and avoiding over-pressure. Energy waste caused by excessive supply is avoided, and the focusing ring is processed under the best working conditions, so as to ensure the preparation quality of the focusing ring. At the same time, when the ventilation is stopped, the locking control unit can move the control tube 7 into the ventilation tube 1, and the cooperation of the provided sealing ring 11 and the sealing seat 10 can prevent the exhaust gas prepared in the phase deposition equipment shell from entering the ventilation tube 1 and being retained. In order to ensure the sealing effect, a sealing compensation mechanism is provided for auxiliary sealing, which solves the problem of loose sealing caused by long-term sealing in the existing technology, improves the sealing effect between the sealing ring 11 and the ventilation tube 1, ensures that the ventilation tube 1 is clean, ensures that the gas introduced next time is not affected by the exhaust gas, ensures that the ventilation tube 1 is not polluted twice, ensures better treatment of harmful substances in the subsequent preparation of the focusing ring, reduces the negative impact on the environment in the ventilation tube 1, ensures the accuracy of the subsequent focusing ring preparation reaction, and ensures the preparation quality of the focusing ring.

[0039] The bottom end of the fixing rod 6 passes through the surface of the ventilation pipe 1 , the top end of the fixing rod 6 is fixedly connected to the bottom side of the rack plate 4 , and the fixing rod 6 is slidably connected to the side wall of the ventilation pipe 1 .

[0040] The vent pipe 1 is installed on the surface of the high-temperature chemical vapor deposition equipment shell 12 through the pipe seat 2, and the top end of the vent pipe 1 is connected to the air pump 13 through a flange.

[0041] like Figure 1-Figure 2 and Figure 5 As shown, in order to facilitate the movement of the control tube 7, a locking and controlling unit is provided for adjustment, and the locking and controlling unit is a locking and controlling mechanism 3, which includes a mounting frame 31 and a first driving gear 36. The mounting frame 31 is fixedly mounted on the outer surface of the middle part of the ventilation pipe 1, and a first driving shaft 35 is mounted on the surface of the mounting frame 31. A turntable 32 is mounted on the end of the first driving shaft 35 close to the mounting frame 31, and a first driving gear 36 is mounted on the end of the first driving shaft 35 away from the mounting frame 31. The rack plate 4 provided on one side of the first driving gear 36 is meshed and connected, and the turntable 32 is used to manually drive the operating end of the first driving gear 36.

[0042] In this technical solution, the locking bolt 33 is rotated, the locking bolt 33 is disengaged from the mounting bracket 31, and the hand crank 34 is manually driven to rotate. The hand crank 34 drives the turntable 32 to rotate, and the turntable 32 drives the first driving wheel fixedly connected to the side surface to rotate. The rotating first driving wheel drives the rack plate 4 to move, and the rack plate 4 moves synchronously with the elongation auxiliary mechanism 5 set on one side to ensure the movement stability of the rack plate 4 and facilitate precise control of the depth of the rack plate 4.

[0043] A hand crank 34 is fixedly installed at the edge of the turntable 32 surface. A locking bolt 33 passes through the surface of the turntable 32. The locking bolt 33 passes through the turntable 32 and is connected to the mounting frame 31. The locking bolt 33 is used to fix the turntable 32 after rotation.

[0044] like Figure 1-Figure 2 、 Figure 5 and Figure 8-Figure 9 As shown, in order to solve the problem of inconvenience in accurately regulating the air supply depth, an elongation auxiliary mechanism 5 is used for processing, and the elongation auxiliary mechanism 5 includes a scale rod 55, and a mounting head 54 is provided at the top of the scale rod 55. The mounting head 54 is detachably mounted on the surface of the mounting platform 53, and the mounting platform 53 is fixedly mounted on the top side surface of the rack plate 4. A guide frame 52 is fixedly mounted on the other side surface of the top of the rack plate 4. A guide column 51 passes through the inner cavity of the guide frame 52, and the guide column 51 is installed in a groove opened on the side surface of the ventilation pipe 1. The guide column 51 is used to assist the rack plate 4 in guiding movement.

[0045] In this technical solution, scale lines are provided on the scale rod 55. When the rack plate 4 moves, the rack plate 4 drives the drag seat 9 on the bottom side to move synchronously through the fixed rod 6, and the drag seat 9 drives the fixedly connected control tube 7 to move synchronously. The moving depth of the control tube 7 corresponds to the scale lines provided on the surface of the scale rod 55. By observing the position of the scale lines, the elongation of the control tube 7 can be understood at all times, thereby meeting the control needs.

[0046] like Figure 1 and Figure 3-Figure 8 As shown, in order to solve the problem in the prior art that after the reaction is completed, the waste gas generated by the reaction in the high-temperature chemical vapor deposition equipment is easily reversed and flowed into the pipeline, causing some impurities in the waste gas to adhere to the pipeline, and the impurities will enter with the reaction gas in the pipeline next time, affecting the reaction results, the sealing compensation unit 8 includes a chassis 81, and the chassis 81 is installed on the top of the drag seat 9. A buffer cylinder 82 is installed on the surface of the chassis 81, and a buffer column 83 is slidably connected to the inner cavity of the buffer cylinder 82. The top of the buffer column 83 is fixedly connected to a top plate 84, and a sliding rod 85 is installed on the bottom side of the top plate 84. The bottom end of the sliding rod 85 passes through the sliding frame 87, and the end of the sliding rod 85 is fixedly installed with a limiting seat 88, and the surface of the sliding rod 85 is sleeved with an elastic spring 86.

[0047] The spring 86 is in a compressed state, and the top plate 84 pushes the sealing seat 10 on the top to move the sealing ring 11. The sealing ring 11 is made of elastic material, and the sealing ring 11 will deform under the force, thereby squeezing and sealing the connection between the regulating tube 7 and the vent tube 1, and the rebound force of the elastic spring 86 always compensates the force of the sealing ring 11, ensuring the sealing performance of the sealing ring 11 between the vent tube 1 and the regulating tube 7, improving the sealing effect, ensuring the cleanliness of the vent tube 1, ensuring that the gas introduced next time is not affected by the exhaust gas, ensuring that the vent tube 1 is not polluted by secondary pollution, ensuring better treatment of harmful substances in the subsequent preparation of the focusing ring, reducing the negative impact on the environment inside the vent tube 1, ensuring the accuracy of the subsequent focusing ring preparation reaction, and ensuring the preparation quality of the focusing ring.

[0048] Sliding frames 87 are symmetrically installed on both sides of the top of the buffer tube 82. A sliding rod 85 passes through the inner cavity of the sliding frame 87. The top side of the sliding frame 87 is elastically connected to the bottom side of the top plate 84 through an elastic spring 86.

[0049] The sealing ring 11 is coaxially arranged with the regulating tube 7 , and the sealing ring 11 is arranged at the bottom end of the vent tube 1 , and a plurality of vent holes 71 are evenly distributed on the side surface of the regulating tube 7 .

[0050] The multiple evenly distributed gas pipes ensure the uniformity of gas supply to the housing 12 of the high-temperature chemical vapor deposition equipment.

[0051] The sealing compensation units 8 are provided in a plurality, and the plurality of sealing compensation units 8 are distributed in a ring shape on the top edge of the drag seat 9 . The sealing compensation units 8 are provided between the drag seat 9 and the sealing seat 10 .

[0052] Example 2 like Figure 11 As shown, in order to ensure the locking and fixing stability of the rack plate 4, the locking and regulating unit can also be a locking and regulating device 14, which includes a second driving gear, and the inner cavity of the second driving gear is penetrated by a second driving shaft 142, and the second driving shaft 142 is installed on the surface of the fixed block 143, and the fixed block 143 is fixedly connected to the ventilation pipe 1, and the second driving gear is meshed with the rack plate 4. A limiting ring 146 is sleeved on the surface of the second driving shaft 142, and the limiting ring 146 is fixedly connected to the fixing block 143 through a connecting frame 144. A limiting claw 145 is provided on one side of the limiting ring 146 and is sleeved on the surface of the second driving shaft 142. The inner cavity of the limiting claw 145 is elastically connected to the limiting ring 146 through a torsion spring, and the torsion spring is sleeved on the surface of the second driving shaft 142.

[0053] The two limiting claws 145 are respectively arranged opposite to each other. One limiting claw 145 is used to limit the rack plate 4 from moving upward, and the other corresponding limiting claw 145 can limit the rack plate 4 from moving downward, in order to ensure the stability of the rack plate 4 during the driving movement.

[0054] In this specific operation, when the rack plate 4 is moved downward, the limiting claw 145 that limits the downward movement of the rack plate 4 can be pulled up, and the second driving gear can be manually driven to move. The second driving gear drives the rack plate 4 to move, and the rack plate 4 moves downward stably with the assistance of the extension auxiliary mechanism 5. At the same time, by observing the movement scale of the extension auxiliary mechanism 5, the depth of the control tube 7 can be understood, which is convenient for adjustment according to the demand of gas supply. When the rack plate 4 moves upward, the limiting claw 145 that limits the upward movement of the rack plate 4 can be pulled up; and when there is no need to consider the demand of the gas supply position, adjusting the extension of the control tube 7 can effectively control the gas supply and ensure the stability of the gas supply.

[0055] The circuits, electronic components and modules involved are all existing technologies and can be fully implemented by those skilled in the art. Needless to say, the content protected by this application does not involve improvements to software and methods.

[0056] The present invention is not limited to the above-described embodiments. Any changes in shape or structure fall within the scope of the present invention. Those skilled in the art may make various changes or modifications to these embodiments without departing from the principles and essence of the present invention. Such changes and modifications fall within the scope of the present invention.

Claims

1. A gas introduction device for preparing a focusing ring, characterized in that: The gas introduction device for preparing the focusing ring includes: Ventilation tube (1); A regulating tube (7), wherein the regulating tube (7) is slidably mounted in the inner cavity of the vent tube (1); A rack plate (4), wherein the rack plate (4) is slidably mounted on the side wall of the ventilation pipe (1), and the bottom end of the rack plate (4) is connected to the regulating pipe (7) via a fixing rod (6); A locking and regulating unit, the locking and regulating unit being mounted on a side surface of the vent pipe (1), the locking and regulating unit being used for regulating the elongation movement of the regulating pipe (7) and locking after regulation; An elongation auxiliary mechanism (5), the elongation auxiliary mechanism (5) being mounted on the top side surface of the rack plate (4), and the elongation auxiliary mechanism (5) being used for regulating and guiding the moving depth of the rack plate (4); A sealing compensation unit (8), wherein the sealing compensation unit (8) is mounted on the top side of a drag seat (9), and the drag seat (9) is mounted on the end of a fixed rod (6), a sealing seat (10) is mounted on the top of the sealing compensation unit (8), and a sealing ring (11) is mounted on the top side of the sealing seat (10) and is sleeved on the bottom surface of the regulating tube (7); The locking and regulating unit drives the regulating tube (7) to move in a telescopic manner, and the sealing ring (11) is used to seal the bottom end of the vent tube (1) after the regulating tube (7) is retracted into the vent tube (1). The sealing performance between the vent tube (1) and the bottom end of the regulating tube (7) is regulated by the sealing compensation unit (8).

2. The gas introduction device for preparing a focusing ring according to claim 1, wherein: The bottom end of the fixing rod (6) passes through the surface of the ventilation pipe (1), the top end of the fixing rod (6) is fixedly connected to the bottom side of the rack plate (4), and the fixing rod (6) is slidably connected to the side wall of the ventilation pipe (1).

3. The gas introduction device for preparing a focus ring according to claim 1, wherein: The vent pipe (1) is installed on the surface of a high-temperature chemical vapor deposition equipment housing (12) via a pipe seat (2), and the top end of the vent pipe (1) is connected to an air pump (13) via a flange.

4. The gas introduction device for preparing a focus ring according to claim 1, wherein: The locking and regulating unit is a locking and regulating mechanism (3), and the locking and regulating mechanism (3) comprises a mounting frame (31) and a first driving gear (36). The mounting frame (31) is fixedly mounted on the outer surface of the middle part of the ventilating pipe (1). A first driving shaft (35) is mounted on the surface of the mounting frame (31). A turntable (32) is mounted on the end of the first driving shaft (35) close to the mounting frame (31). A first driving gear (36) is mounted on the end of the first driving shaft (35) away from the mounting frame (31). A rack plate (4) provided on one side of the first driving gear (36) is meshed and connected. The turntable (32) is used to manually drive the operating end of the first driving gear (36).

5. The gas introduction device for preparing a focus ring according to claim 4, wherein: A hand crank (34) is fixedly mounted on the edge of the surface of the turntable (32), and a locking bolt (33) is passed through the surface of the turntable (32). The locking bolt (33) passes through the turntable (32) and is connected to the mounting frame (31). The locking bolt (33) is used to fix the turntable (32) after rotation.

6. The gas introduction device for preparing a focus ring according to claim 1, wherein: The elongation auxiliary mechanism (5) includes a scale rod (55), a mounting head (54) is provided at the top end of the scale rod (55), and the mounting head (54) is detachably mounted on the surface of the mounting platform (53). The mounting platform (53) is fixedly mounted on the top side surface of the rack plate (4), and a guide frame (52) is fixedly mounted on the other side surface of the top end of the rack plate (4). A guide column (51) passes through the inner cavity of the guide frame (52), and the guide column (51) is installed in a slot provided on the side surface of the ventilation pipe (1). The guide column (51) is used to assist the rack plate (4) in guiding movement.

7. The gas introduction device for preparing a focus ring according to claim 1, wherein: The sealing compensation unit (8) includes a chassis (81), which is installed on the top of the drag seat (9). A buffer cylinder (82) is installed on the surface of the chassis (81). The inner cavity of the buffer cylinder (82) is slidably connected to a buffer column (83). The top of the buffer column (83) is fixedly connected to a top plate (84). A sliding rod (85) is installed on the bottom side of the top plate (84). The bottom end of the sliding rod (85) passes through the sliding frame (87), and the end of the sliding rod (85) is fixedly installed with a limit seat (88). The surface of the sliding rod (85) is sleeved with an elastic spring (86).

8. The gas introduction device for preparing a focus ring according to claim 7, wherein: The sliding frame (87) is symmetrically mounted on both sides of the top of the buffer cylinder (82), a sliding rod (85) passes through the inner cavity of the sliding frame (87), and the top side of the sliding frame (87) is elastically connected to the bottom side of the top plate (84) via an elastic spring (86).

9. The gas introduction device for preparing a focus ring according to claim 7, wherein: The sealing ring (11) is coaxially arranged with the regulating tube (7), and the sealing ring (11) is arranged at the bottom end of the vent tube (1). A plurality of vent holes (71) are evenly distributed on the side surface of the regulating tube (7).

10. The gas introduction device for preparing a focus ring according to claim 1, wherein: The sealing compensation units (8) are provided in a plurality, and the plurality of sealing compensation units (8) are distributed in a ring shape on the top edge of the drag seat (9). The sealing compensation units (8) are provided between the drag seat (9) and the sealing seat (10).

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