Coating material capable of selectively transmitting different infrared bands and preparation method of coating material

Abstract

The invention provides a coating material selectively transmitting different infrared bands and a preparation method thereof.The coating material comprises a transparent base material and a functional film layer coating at least part of the surface of the transparent base material, and the functional film layer comprises at least one of an indium layer, a tantalum layer, a germanium layer or a titanium layer which are sequentially stacked; the visible light transmittance of the coating material is not lower than 9%, and the ultraviolet rejection rate is not lower than 99%; the infrared rejection rate of the infrared light-shielding film is not lower than 98% at the wave band of 1500-1300 nm, an infrared window wave band exists in the wave band range of 820-1200 nm, and the infrared light transmittance of the infrared window wave band is not lower than 30%; the infrared band is precisely regulated and controlled, and the infrared band is suitable for the fields of intelligent glasses, optical devices and the like.

Description

Technical Field

[0001] The present invention belongs to the field of material science and technology, and particularly relates to a material that selectively transmits infrared light in different bands and a preparation method thereof. Background Art

[0002] With the widespread application of infrared technology, demand for infrared-blocking coatings is growing in areas such as communications and outdoor equipment. However, while existing infrared-blocking coatings block infrared rays, they often also block their ability to recognize or communicate infrared signals, limiting their application in scenarios requiring two-way infrared management. For example, in outdoor sunglasses, they need to block harmful infrared and ultraviolet rays while maintaining sufficient visible light transmittance. Therefore, developing a new coating material that can effectively block commonly used infrared bands, enable recognition or communication functions in specific infrared bands, and possess a certain degree of transmittance has become an urgent need for current technological development.

[0003] At present, the research and development of anti-infrared coating materials mainly focuses on single-function infrared blocking or transmission, and there is a lack of new materials that can selectively transmit multi-band infrared. Summary of the Invention

[0004] The present invention provides a coating material with selective transmission in different infrared bands and a preparation method thereof, which are used to solve the problems of poor infrared spectrum selectivity of coating materials in the prior art.

[0005] In a first aspect, the present invention provides a coating material that selectively transmits infrared light in different bands, comprising a transparent substrate and a functional film layer coated on at least a portion of the surface of the transparent substrate, wherein the functional film layer comprises at least one of an indium layer, a tantalum layer, a germanium layer, or a titanium layer stacked in sequence;

[0006] The coating material has a visible light transmittance of not less than 9%, and an ultraviolet blocking rate of not less than 99%; an infrared blocking rate in the 1500-1300nm band is not less than 98%, and there is an infrared window band in the 820-1200nm band, and the infrared transmittance of the infrared window band is not less than 30%.

[0007] Compared with existing technologies, the present invention is beneficial in that: through the multi-layer structure design of a transparent substrate and functional film layers (including indium, tantalum, germanium, or titanium layers), precise control of the infrared band is achieved. The coating material has an infrared blocking rate of not less than 98% in the 1500-1300nm band, which can effectively prevent infrared detection. At the same time, it forms an "infrared window band" in the 820-1200nm band with a transmittance of not less than 30%, supporting infrared communication or identification functions. In addition, the coating material has a visible light transmittance of not less than 9%, ensuring optical clarity and is suitable for fields such as smart glasses and optical devices.

[0008] Furthermore, the functional film layer includes an indium layer, a tantalum layer and a germanium layer stacked in sequence; or,

[0009] The functional film layer includes an indium layer, a tantalum layer and a titanium layer stacked in sequence; or,

[0010] The functional film layer includes an indium layer, a tantalum layer, a germanium layer and a titanium layer stacked in sequence.

[0011] Furthermore, the thicknesses of the indium layer, the tantalum layer and the germanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or,

[0012] The thicknesses of the indium layer, tantalum layer and titanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or

[0013] The thicknesses of the indium layer, the tantalum layer, the germanium layer and the titanium layer are 90-110 nm, 50-60 nm, 120-130 nm and 120-130 nm respectively.

[0014] Furthermore, the infrared window band includes at least one of 940 nm, 820 nm, or 1200 nm.

[0015] Furthermore, the transparent substrate includes PMMA or PC, and the thickness of the transparent substrate is 2 to 20 mm.

[0016] In a second aspect, the present invention provides a method for preparing the coating material having selective transmission in different infrared bands as described in the first aspect, comprising the following steps:

[0017] Placing a transparent substrate in a vacuum chamber for magnetron sputtering treatment, allowing sputtering gas to bombard target materials in sequence, and sequentially forming functional film layers on at least a portion of the surface of the transparent substrate to obtain the coating material;

[0018] The sputtering gas includes argon and helium, and the functional film layer includes at least one of an indium layer, a tantalum layer, a germanium layer or a titanium layer.

[0019] Furthermore, during the magnetron sputtering process, the pressure of the vacuum chamber is 4 to 6×10 -4 Pa; and / or,

[0020] The flow rate of the argon gas is 50 to 100 Sccm, and the flow rate of the helium gas is 15 to 30 Sccm.

[0021] Furthermore, the sample stage of the transparent substrate rotates at a speed of 15 to 20 r / min.

[0022] Furthermore, the target material of the indium layer is indium tin oxide; and / or,

[0023] The target material of the tantalum layer is tantalum; and / or,

[0024] The target material of the germanium layer is germanium; and / or,

[0025] The target material of the titanium layer is titanium.

[0026] Furthermore, the sputtering time of the indium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and / or,

[0027] The sputtering time of the tantalum layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 KW; and / or,

[0028] The sputtering time of the germanium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and / or,

[0029] The sputtering time of the titanium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 KW. DETAILED DESCRIPTION

[0030] To make the objectives, technical solutions, and advantages of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0031] In a first aspect, the present invention provides a coating material that selectively transmits infrared light in different bands, comprising a transparent substrate and a functional film layer coated on at least a portion of the surface of the transparent substrate, wherein the functional film layer comprises at least one of an indium layer, a tantalum layer, a germanium layer, or a titanium layer stacked in sequence;

[0032] The visible light transmittance of the coating material shall not be less than 9%, and the ultraviolet blocking rate shall not be less than 99%; the infrared blocking rate in the 1500-1300nm band shall not be less than 98%, and there shall be an infrared window band in the 820-1200nm band, and the infrared transmittance of the infrared window band shall not be less than 30%.

[0033] The present invention provides a coating material that selectively transmits infrared light in different bands. Through a multilayer structure design consisting of a transparent substrate and functional film layers (including indium, tantalum, germanium, or titanium layers), precise control of the infrared band is achieved. The coating material achieves an infrared rejection rate of no less than 98% in the 1500-1300nm band, effectively preventing infrared detection. Simultaneously, an "infrared window band" is formed in the 820-1200nm band, with a transmittance of no less than 30%, supporting infrared communication or identification functions. Furthermore, the coating material has a visible light transmittance of no less than 9%, ensuring optical clarity and suitable for applications such as smart glasses and optical devices.

[0034] The coating material provided by this invention, which selectively transmits infrared light across different wavelengths, overcomes the single-function issue of traditional infrared shielding coatings by combining infrared blocking with communication capabilities. For example, in the consumer electronics field, it can be used in smart glasses, protecting the eyes from infrared radiation while supporting infrared data transmission. Through multilayer film design and process optimization, this invention achieves a high-performance, multifunctional optical coating material.

[0035] In a specific embodiment, the functional film layer includes an indium layer, a tantalum layer and a germanium layer stacked in sequence; or, the functional film layer includes an indium layer, a tantalum layer and a titanium layer stacked in sequence; or, the functional film layer includes an indium layer, a tantalum layer, a germanium layer and a titanium layer stacked in sequence.

[0036] By defining the specific structure of the functional film layers, the coating's infrared selective transmission performance is further optimized. Specifically, the indium layer, as the bottom layer, improves visible light transmittance; the tantalum layer, as the middle layer, further increases transmittance in the infrared window band and enhances the coating's mechanical strength and infrared blocking performance; the germanium or titanium layer, as the top layer, further regulates infrared transmittance in specific bands. This multilayer film structure, through the synergistic effect of the materials, further enhances the overall performance of the coating material.

[0037] Furthermore, the thicknesses of the indium layer, tantalum layer and germanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or the thicknesses of the indium layer, tantalum layer and titanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or the thicknesses of the indium layer, tantalum layer, germanium layer and titanium layer are 90-110 nm, 50-60 nm, 120-130 nm and 120-130 nm respectively.

[0038] By limiting the thickness range of the indium, tantalum, germanium, or titanium layer, the optical performance and mechanical stability of the coating are ensured. Furthermore, the above-defined film thickness can achieve selective infrared transmission in specific wavelength bands.

[0039] Specifically, the infrared window band includes at least one of 940 nm, 820 nm, or 1200 nm.

[0040] It's understandable that specific wavelengths in different infrared window bands may have different application scenarios. For example, the 940nm band is a commonly used wavelength for infrared communications, meeting the data transmission needs of identification or communication within a specific infrared band. The 820nm and 1200nm bands are suitable for other infrared identification or sensing applications. This further flexibly adapts to different infrared communication or identification needs, expanding its application range.

[0041] Optionally, the transparent substrate includes PMMA or PC, and the thickness of the transparent substrate is 2 to 20 mm.

[0042] By limiting the transparent substrate to PMMA or PC and specifying a specific thickness range, the coating's lightweight, durable, and optically superior properties are ensured. PMMA and PC, with their high light transmittance and excellent mechanical properties, are suitable for consumer electronics such as sunglasses and smart glasses, further reducing material costs, improving processing performance, and meeting end-use application requirements.

[0043] In a second aspect, the present invention provides a method for preparing a coating material that is selectively transparent in different infrared bands according to the first aspect, comprising the following steps: placing a transparent substrate in a vacuum chamber for magnetron sputtering treatment, allowing the sputtering gas to bombard the target material in sequence, and forming functional film layers in sequence on at least part of the surface of the transparent substrate to obtain a coating material; the sputtering gas includes argon and helium, and the functional film layer includes at least one of an indium layer, a tantalum layer, a germanium layer or a titanium layer.

[0044] In the magnetron sputtering process, argon is used as the primary sputtering gas. It is ionized in an electric field to form high-energy argon ions (Ar+), which bombard the target surface, sputtering target atoms or molecules and depositing them on the substrate. Helium, with its smaller atomic mass, is used as an auxiliary sputtering gas, which increases the speed of gas molecules and improves the energy distribution and density of the plasma. The introduction of helium significantly improves the uniformity and optical properties of the film, especially the transmittance in the visible light band. It also optimizes the film's microstructure and reduces light scattering and absorption. This preparation method is not only simple and highly controllable, but also capable of large-scale production, making it suitable for applications such as smart glasses, optical devices, and infrared sensors.

[0045] Optionally, the magnetron sputtering process uses a magnetron sputtering vacuum coating machine, model GS4 D1300 / 4.

[0046] Furthermore, during the magnetron sputtering process, the pressure of the vacuum chamber is 4 to 6×10 -4 Pa; the flow rate of argon gas is 50-100 Sccm, and the flow rate of helium gas is 15-30 Sccm.

[0047] By defining the specific parameters of the magnetron sputtering process, the quality and uniformity of the film layer are further ensured. The high vacuum environment reduces the interference of impurity gases, and the synergistic effect of argon and helium improves the density and optical properties of the film layer, providing a guarantee for the high performance of the coating.

[0048] Furthermore, the sample stage of the transparent substrate rotates at a speed of 15 to 20 r / min.

[0049] By limiting the sample stage rotation speed to 15-20 rpm, the uniformity and density of the film layer are further improved. The rotating sample stage ensures that the sputtered material is evenly deposited on the substrate surface, avoiding uneven film thickness or defects.

[0050] Optionally, the target material of the indium layer is indium tin oxide (ITO), the target material of the tantalum layer is tantalum; the target material of the germanium layer is germanium; and the target material of the titanium layer is titanium. By limiting the target material type, the composition purity and functionality of the film layer are further ensured.

[0051] Specifically, the sputtering time for the indium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; the sputtering time for the tantalum layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; the sputtering time for the germanium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and the sputtering time for the titanium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW. By limiting the sputtering time and power, the thickness and performance of the film layer are further optimized.

[0052] Hereinafter, the coating material with selective transmission in different infrared bands and the preparation method thereof provided by the present invention are described in detail through specific embodiments.

[0053] Example 1

[0054] (1) Place the PMMA substrate on the sample stage in the vacuum chamber, install the ITO target (ITO), start the condensation device, start the molecular pump, and when the pressure of the vacuum chamber is 6×10 -4 Pa, open the argon valve and helium valve, adjust the argon flow rate to 50 Sccm, the helium flow rate to 15 Sccm, set the rotation speed of the sample stage to 20 r / min, and perform magnetron sputtering treatment on the surface of the PMMA substrate at a power of 150 W for 1 hour to form an indium layer.

[0055] (2) Install the Ta target (metal Ta), start the condensation water device, start the molecular pump, and when the pressure of the vacuum chamber is 6×10 -4 Pa, open the argon valve and helium valve, adjust the argon flow rate to 50 Sccm, the helium flow rate to 15 Sccm, set the rotation speed of the sample stage to 20 r / min, and perform magnetron sputtering treatment on the surface of the indium layer at a power of 150 W for 1 hour to form a tantalum layer.

[0056] (3) Install the Ge target (metal Ge), start the condensation water device, start the molecular pump, and when the pressure of the vacuum chamber is 6×10 -4 Pa, open the argon valve and helium valve, adjust the argon flow rate to 50 Sccm, the helium flow rate to 15 Sccm, set the rotation speed of the sample stage to 20 r / min, and perform magnetron sputtering treatment on the surface of the tantalum layer at a power of 150 W for 1 hour to form a germanium layer.

[0057] Example 2

[0058] The difference between this embodiment and embodiment 1 is that in step (2), the rotation speed of the sample stage during sputtering of the tantalum layer is 15 r / min.

[0059] Example 3

[0060] The difference between this embodiment and embodiment 1 is that in step (3), the rotation speed of the sample stage during sputtering of the germanium layer is 15 r / min.

[0061] Test Example 1

[0062] The coating materials in the above embodiments were tested for transmittance and rejection in different wavelength bands using a Linshang Ls182 full-band infrared transmittance tester. The results are shown in Table 1.

[0063] Table 1

[0064]

[0065] The performance test results in Table 1 show that the backdoor infrared band of Example 2 is 940nm, the backdoor infrared band of Example 3 is 1200nm, and the backdoor infrared band of Example 4 is 820nm. The visible light transmittance at 550nm is greater than 9%, meeting the requirements of the three types of sunshade glasses.

[0066] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. If these modifications and variations fall within the scope of the claims of the present invention and their equivalent technologies, they should be considered to be within the scope of protection of the present invention.

Claims

1. A coating material that selectively transmits infrared light in different bands, characterized in that: The invention comprises a transparent substrate and a functional film layer coated on at least a portion of the surface of the transparent substrate, wherein the functional film layer comprises at least one of an indium layer, a tantalum layer, a germanium layer or a titanium layer stacked in sequence; The visible light transmittance of the coating material shall not be less than 9%, and the ultraviolet blocking rate shall not be less than 99%; the infrared blocking rate in the 1500~1300nm band shall not be less than 98%, and there shall be an infrared window band in the 820~1200nm band, and the infrared transmittance of the infrared window band shall not be less than 30%.

2. The coating material with selective transmission in different infrared bands according to claim 1, characterized in that: The functional film layer includes an indium layer, a tantalum layer and a germanium layer stacked in sequence; or, The functional film layer includes an indium layer, a tantalum layer and a titanium layer stacked in sequence; or, The functional film layer includes an indium layer, a tantalum layer, a germanium layer and a titanium layer stacked in sequence.

3. The coating material with selective transmission in different infrared bands according to claim 2, characterized in that: The thicknesses of the indium layer, tantalum layer and germanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or, The thicknesses of the indium layer, tantalum layer and titanium layer are 90-110 nm, 50-60 nm and 120-130 nm respectively; or, The thicknesses of the indium layer, the tantalum layer, the germanium layer and the titanium layer are 90-110 nm, 50-60 nm, 120-130 nm and 120-130 nm respectively.

4. The coating material with selective transmission in different infrared bands according to claim 3, characterized in that: The infrared window band includes at least one of 940 nm, 820 nm and 1200 nm.

5. The coating material with selective transmission in different infrared bands according to any one of claims 1 to 4, characterized in that: The transparent substrate includes PMMA or PC, and the thickness of the transparent substrate is 2-20 mm.

6. A method for preparing a coating material having selective transmission in different infrared bands according to any one of claims 1 to 5, characterized in that: The following steps are involved: Placing a transparent substrate in a vacuum chamber for magnetron sputtering treatment, allowing sputtering gas to bombard target materials in sequence, and sequentially forming functional film layers on at least a portion of the surface of the transparent substrate to obtain the coating material; The sputtering gas includes argon and helium, and the functional film layer includes at least one of an indium layer, a tantalum layer, a germanium layer or a titanium layer.

7. The method for preparing a coating material having selective transmission in different infrared bands according to claim 6, characterized in that: During the magnetron sputtering process, the pressure of the vacuum chamber is 4~6×10 -4 Pa; and / or, The flow rate of the argon gas is 50-100 Sccm, and the flow rate of the helium gas is 15-30 Sccm.

8. The method for preparing a coating material having selective transmission in different infrared bands according to claim 7, wherein the rotation speed of the sample stage of the transparent substrate is 15-20 r / min.

9. The method for preparing a coating material selectively transmitting different infrared bands according to claim 8, characterized in that: The target material of the indium layer is indium tin oxide; and / or, The target material of the tantalum layer is tantalum; and / or, The target material of the germanium layer is germanium; and / or, The target material of the titanium layer is titanium.

10. The method for preparing a coating material having selective transmission in different infrared bands according to claim 9, characterized in that: The sputtering time of the indium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and / or, The sputtering time of the tantalum layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and / or, The sputtering time of the germanium layer is 1 to 1.5 hours, and the sputtering power is 1.5 to 3 kW; and / or, The sputtering time of the titanium layer is 1-1.5 hours, and the sputtering power is 1.5-3 KW.

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