A vaporization device for preparing electronic grade thionyl fluoride

Abstract

The invention discloses a vaporization device for preparing electronic-grade thionyl fluoride, comprising: a vaporization tank, a thionyl fluoride liquid inlet, a thionyl fluoride gas outlet, and a plurality of steam pipes; the device also comprises: an isolation and distribution structure, comprising a middle mounting plate, wherein the lower end of the middle mounting plate is connected to the plurality of distribution pipes, a lower distribution assembly is provided on the outer side of the middle of the distribution pipe, the bottom of the distribution pipe is connected to a lower extraction pipe, and the lower extraction pipe extends into the thionyl fluoride liquid at the bottom of the vaporization tank; a segmented vaporization structure, comprising a plurality of accommodating chambers arranged on the middle mounting plate, an inlet hole at the bottom of the accommodating chamber communicates with the distribution pipe, a steam pipe is plugged above the accommodating chamber, an inner inclined hole is provided in the middle of the steam pipe, the inner inclined hole is inclined outward to have an outer guide plate, an inner guide assembly is provided at a position on the inner side of the outer guide plate corresponding to the inner inclined hole, and an outer guide assembly is provided on the outer side of the outer guide plate. The device can prevent liquid generated during vaporization from flowing into the thionyl fluoride, thereby preventing the purity of the thionyl fluoride from being affected.

Description

Technical Field

[0001] The present invention relates to a thionyl fluoride preparation technology, in particular to a vaporization device for preparing electronic-grade thionyl fluoride. Background Art

[0002] With the continuous development of the semiconductor industry, high-end chip technology has made continuous breakthroughs, among which dry etching technology has been widely used. As the key etching electronic gas and cleaning electronic gas, higher demands have been put forward. Fluorine-based electronic gases have ushered in rapid development. Typical fluorine-based electronic gases currently include sulfur hexafluoride (SF6), carbon tetrafluoride (CF4) and fluorocarbon gases (such as CH3F, CH2F2, CHF3, C2F6, C3F8, etc.). Their GWP values ​​are relatively high and have a greater potential impact on the environment. The development of low-GWP etching and cleaning gases has become the key to the development of the semiconductor industry. While ensuring the etching and cleaning effects, thionyl fluoride (SOF2) is easier to dispose of and more environmentally friendly. Existing technologies usually use anhydrous hydrogen fluoride (AHF) and thionyl chloride (SOCl2) to synthesize thionyl fluoride.

[0003] Traditionally, anhydrous hydrogen fluoride (AHF) and thionyl chloride (SOCl2) are synthesized to produce a crude gas. To improve the purity of the crude gas, the crude gas is purified. To improve the purification effect, multiple distillation towers are set up to ensure the purification effect. Although this method improves the distillation effect, the removal effect of solid impurities is poor, and some impurities with high temperature requirements are difficult to precipitate. Therefore, the existing technology uses a vaporizer to vaporize the liquid into gas, thereby improving the precipitation effect of solid impurities. However, the existing vaporizer vaporizes the liquid in the entire chamber, and its vaporization effect is poor, the gas precipitation rate is slow, and the liquid formed inside and outside the heat medium during vaporization will be mixed into the thionyl fluoride, thereby affecting the purity of the thionyl fluoride.

[0004] Therefore, this case aims to provide a vaporization device for the preparation of electronic-grade thionyl fluoride, which can not only transport the thionyl fluoride liquid to the position of the vaporization structure in sections to achieve a better vaporization effect, but also prevent the liquid generated during vaporization from merging into the thionyl fluoride, thereby avoiding affecting the purity of the thionyl fluoride. Summary of the Invention

[0005] The present invention provides a vaporization device for preparing electronic-grade thionyl fluoride, which can effectively solve the above problems.

[0006] The present invention is achieved in that:

[0007] A vaporization device for preparing electronic-grade thionyl fluoride comprises: a vaporizer, a thionyl fluoride liquid inlet is provided at the bottom of the vaporizer, a thionyl fluoride gas outlet is provided at the top of the vaporizer, a plurality of steam pipes are provided in the vaporizer, the steam pipes are connected to an external air inlet and an air outlet, and further comprises:

[0008] An isolation and distribution structure includes a middle mounting plate disposed in the middle section of the vaporizer, the middle mounting plate dividing the vaporizer into a vaporization zone and a distribution zone, a plurality of distribution pipes connected to the lower end of the middle mounting plate, a lower distribution assembly disposed on the outer side of the middle portion of the distribution pipes, the lower distribution assembly controlling the opening and closing of all distribution pipes, the bottoms of the distribution pipes connected to a lower pumping pipe extending into the thionyl fluoride liquid at the bottom of the vaporizer, and the lower distribution assembly periodically pumping the thionyl fluoride liquid at the bottom of the vaporizer into the distribution pipes via the lower pumping pipe;

[0009] The segmented vaporization structure includes several accommodating chambers arranged on the central mounting plate. The inlet hole at the bottom of the accommodating chamber is connected to the distribution pipe. The steam pipe is inserted above the accommodating chamber. An inner inclined hole is provided in the middle of the steam pipe. The inner inclined hole is inclined outward to have an outer guide plate. An inner guide component is provided on the inner side of the outer guide plate at a position corresponding to the inner inclined hole. An outer guide component is provided on the outer side of the outer guide plate. Both the inner guide component and the outer guide component are connected to the external exhaust structure.

[0010] As a further improvement, the material distribution pipe includes an upper separation section connected to the accommodating chamber, the upper separation section is connected to a bent tube inclined toward the center line of the vaporizer, the lower end of the bent tube is connected to the lower separation section, and the lower separation section is connected to the lower suction tube.

[0011] As a further improvement, the lower material distribution assembly includes a back pressure piece arranged in the middle of the inner part of the bending tube, and a main material lifter is provided at the lower end of the middle mounting plate, and the main material lifter is connected to the upper half of the bending tube.

[0012] As a further improvement, the back-pressure member includes a circumferential axis passing through the bending tube, one end of the circumferential axis is sleeved with a torsion spring, the part of the circumferential axis located in the bending tube is provided with a folding plate, and sealing arc pads are fixed at both ends of the bending tube.

[0013] As a further improvement, the total material starter includes a hanging bracket locked at the lower end of the middle mounting plate, and a lower punch is locked below the hanging bracket. The lower punch is connected to the inert gas inlet, and the lower punch is connected to the upper half of the bent tube through a pair of pipes.

[0014] As a further improvement, the inner guide assembly includes an adsorption pad arranged on the inner inclined hole, the lower end of the adsorption pad is connected to a lower inclined tube, and all the lower inclined tubes are connected through an inner ring.

[0015] As a further improvement, the lower inclined tube is filled with a barrier mass.

[0016] As a further improvement, the outer guide assembly includes a receiving sleeve arranged below the outer guide plate, the receiving sleeve is connected to a lower bend pipe, and all the lower bend pipes are connected to an outer ring.

[0017] As a further improvement, the inner ring and the outer ring are connected via a linkage pipe, and the linkage pipe is communicated with an external air extraction structure.

[0018] The beneficial effects of the present invention are:

[0019] In the prior art, in the process of vaporizing some corrosive gases, a steam pipe is inserted into the liquid, and the liquid is vaporized through the contact between the liquid and the steam pipe. However, this vaporization method is for the liquid in the entire chamber when vaporizing the liquid, and its vaporization effect is poor, and the rate of gas precipitation is slow. Therefore, the present invention sets up an isolation and distribution structure, so that the purified liquid will accumulate at the bottom of the vaporization tank, and the liquid will be gradually pumped to the position of the vaporization zone through the lower distribution component through the lower suction pipe. Moreover, the extraction adopts periodic extraction, that is, new liquid is extracted after the extracted liquid is vaporized, so as to achieve a continuous, small-volume, and stable vaporization effect. Compared with the traditional vaporization furnace, the vaporization effect is good and the vaporization rate is also higher.

[0020] When extracting the liquid at the bottom of the vaporizer through the distribution pipe, if a single-strand, linear extraction is adopted, it is difficult to control the feeding intermittently. Therefore, the present invention divides the distribution pipe into sections and provides a bending pipe on each section of the distribution pipe, so that a lower distribution component can be provided at the position of the bending pipe, thereby better controlling the feeding state of the distribution pipe.

[0021] A separate liquid extraction control structure needs to be set at the position of each distribution pipe so that the liquid state of each accommodating cavity can be controlled accordingly. Therefore, the present invention provides a back-pressure piece inside each distribution pipe. The back-pressure piece will only open and close according to the opening and closing of the total feeder, and will close the inner side of the distribution pipe under normal conditions, thereby avoiding passive feeding of the distribution pipe, thereby being able to control the feeding amount of the distribution pipe.

[0022] Providing a separate control structure on each distribution pipe is not only difficult to implement, but also very costly. Therefore, the main feeder of the present invention needs to control all the distribution pipes at the same time, so that a down-punch with a positive pressure function is used to punch the material into the bending pipe through different auxiliary pipes, thereby controlling the open and closed states of different bending pipes, thereby realizing the state of multiple pipes being opened or closed at the same time.

[0023] During segmented vaporization, the steam pipe is inserted into the accommodating chamber, and the hot steam in the steam pipe vaporizes the liquid in the accommodating chamber. However, condensation is likely to occur both inside and outside the steam pipe during the vaporization process. The condensed water on the outside is likely to affect the purity of thionyl fluoride, while the condensed water on the inside will affect the temperature of the steam. Therefore, the present invention provides a segmented vaporization structure, and respectively provides an inner guide component and an outer guide component on the inner and outer sides of the segmented vaporization structure. The inner guide component and the outer guide component can respectively guide the condensed water inside and outside to the outside, thereby making the vaporization process smoother and the purity of the vaporized thionyl fluoride higher.

[0024] On the inner side of the steam pipe, the condensed liquid generated inside the steam pipe needs to be discharged to avoid lowering the temperature inside the steam pipe. Therefore, the inner guide component of the present invention is provided with an adsorption pad. The pore size of the adsorption pad is extremely small. Although some gas will be exposed, the condensed liquid droplets flowing down will infiltrate the position of the adsorption pad and will not flow to the lower end, thereby avoiding affecting the temperature of the steam inside the steam pipe.

[0025] On the outside of the steam pipe, in order to prevent the condensed water on the outside from flowing down and coming into contact with the liquid at the bottom, thereby reducing the purity of the liquid at the bottom, the outer guide assembly of the present invention guides the water into the receiving sleeve through the outer guide plate, and collects and concentrates the water at the position of the outer ring through the receiving sleeve, so that the condensed water on the outside can also be concentrated and guided away, thereby avoiding the negative effects such as temperature reduction and purity reduction after the steam pipe is set, and ensuring the smoothness of the entire vaporization process. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0027] Figure 1 It is a structural schematic diagram of the present invention.

[0028] Figure 2 It is a schematic diagram of the top structure of the present invention.

[0029] Figure 3 This invention Figure 2 Cross-section of CC.

[0030] Figure 4 This invention Figure 3 Magnified view of area C in the middle.

[0031] Figure 5It is a structural schematic diagram of the isolation and distribution structure of the present invention.

[0032] Figure 6 This invention Figure 5 Magnified view of area D in the middle.

[0033] In the picture:

[0034] Vaporizer 80, thionyl fluoride liquid inlet 81, thionyl fluoride gas outlet 82, steam pipe 83, isolation and distribution structure 84, middle mounting plate 841, distribution pipe 842, upper separation section 8421, bending pipe 8422, lower separation section 8423, lower distribution assembly 843, back pressure piece 8431, circumferential shaft 84311, torsion spring 84312, folding plate 84313, sealing arc pad 84314, main feeder 8432, hanging bracket 84321, lower punch 84322, auxiliary pipe 84323, lower extraction pipe 844, segmented vaporization structure 85, accommodating chamber 851, inner inclined hole 831, outer guide plate 853, inner guide assembly 854, adsorption pad 8541, lower inclined pipe 8542, inner ring 8543, outer guide assembly 855, receiving sleeve 8551, lower bent pipe 8552, outer ring 8553, linkage pipe 856. DETAILED DESCRIPTION

[0035] All embodiments of the present invention are within the scope of protection of the present invention. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0036] In the description of the present invention, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as referring to the purpose, technical solutions and advantages of the methods. To be clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work indicate or imply relative importance or implicitly indicate the number of indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined.

[0037] Reference Figures 1 to 6As shown, a vaporization device for preparing electronic-grade thionyl fluoride comprises: a vaporizer 80, a thionyl fluoride liquid inlet 81 is provided at the bottom of the vaporizer 80, a thionyl fluoride gas outlet 82 is provided at the top of the vaporizer 80, a plurality of steam pipes 83 are provided in the vaporizer 80, and the steam pipes 83 are connected to the external air inlet and air outlet. It also comprises: an isolation and distribution structure 84, comprising a middle mounting plate 841 provided in the middle section of the vaporizer 80, the middle mounting plate 841 divides the vaporizer 80 into a vaporization area and a distribution area, a plurality of distribution pipes 842 are connected to the lower end of the middle mounting plate 841, a lower distribution assembly 843 is provided on the outer side of the middle of the distribution pipe 842, the lower distribution assembly 843 controls the opening and closing of all the distribution pipes 842, and the bottom of the distribution pipe 842 is connected to the lower suction pipe 844. The lower suction pipe 844 extends into the thionyl fluoride liquid at the bottom of the vaporizer 80, and the lower distribution component 843 periodically draws the thionyl fluoride liquid at the bottom of the vaporizer 80 into the distribution pipe 842 through the lower suction pipe 844; the segmented vaporization structure 85 includes a plurality of accommodating chambers 851 arranged on the middle mounting plate 841, and the inlet hole at the bottom of the inner bottom of the accommodating chamber 851 is connected to the distribution pipe 842, and the steam pipe 83 is inserted above the accommodating chamber 851, and an inner inclined hole 831 is provided in the middle of the steam pipe 83, and the inner inclined hole 831 is inclined outward to have an outer guide plate 853, and an inner guide component 854 is provided on the inner side of the outer guide plate 853 at a position corresponding to the inner inclined hole 831, and an outer guide component 855 is provided on the outer side of the outer guide plate 853, and the inner guide component 854 and the outer guide component 855 are both communicated with the external exhaust structure.

[0038] During vaporization, thionyl fluoride liquid is fed into the vaporizer 80 through the thionyl fluoride liquid inlet 81 and gradually divided by the isolation and distribution structure 84. The distribution speed is connected to the feed speed, thereby achieving the purpose of continuous production. The divided thionyl fluoride liquid is transported to the segmented vaporization structure 85 to be vaporized into thionyl fluoride gas and output from the thionyl fluoride gas outlet 82.

[0039] In the prior art, in the process of vaporizing some corrosive gases, a steam pipe is inserted into the liquid, and the liquid is vaporized through the contact between the liquid and the steam pipe. However, this vaporization method is used for the liquid in the entire chamber when vaporizing the liquid, and its vaporization effect is poor, and the rate of gas precipitation is slow. Therefore, the present invention sets an isolation and distribution structure 84, and the purified liquid will accumulate at the bottom of the vaporization tank 80. The liquid is gradually pumped to the position of the vaporization zone through the lower distribution component 843 through the lower suction pipe 844. Moreover, the extraction adopts periodic extraction, that is, new liquid is extracted after the extracted liquid is vaporized, so as to achieve a continuous, small-volume, and stable vaporization effect. Compared with the traditional vaporization furnace, the vaporization effect is good and the vaporization rate is also higher.

[0040] When extracting the liquid at the bottom of the vaporizer 80 through the distribution pipe 842, if a single-strand, linear extraction is adopted, it is difficult to control the feeding intermittently. Therefore, the distribution pipe 842 of this embodiment includes an upper separation section 8421 connected to the accommodating chamber 851, and the upper separation section 8421 is connected to a bent tube 8422 inclined toward the center line of the vaporizer 80, and the lower end of the bent tube 8422 is connected to a lower separation section 8423, and the lower separation section 8423 is connected to the lower suction pipe 844. By dividing the distribution pipe 842 into sections, a bent tube 8422 is provided on each section of the distribution pipe 842, so that the lower distribution assembly 843 can be provided at the position of the bent tube 8422, thereby better controlling the feeding state of the distribution pipe 842.

[0041] A separate liquid extraction control structure needs to be set at the position of each distribution pipe 842 so as to control the liquid state of each accommodating chamber 851 accordingly. Therefore, the lower distribution component 843 of this embodiment includes a back-pressure piece 8431 arranged in the middle of the inner part of the bending tube 8422, and the lower end of the middle mounting plate 841 is provided with a total feeder 8432, and the total feeder 8432 is connected to the upper half of the bending tube 8422. By providing a back-pressure piece 8431 inside each distribution pipe 842, the back-pressure piece 8431 will only open and close according to the total feeder 8432, and will close the inner side of the distribution pipe 842 under normal conditions, thereby avoiding passive feeding of the distribution pipe 842, thereby being able to control the feeding amount of the distribution pipe 842.

[0042] The counter-pressure member 8431 in this embodiment includes a circumferential shaft 84311 that passes through the bending tube 8422, and one end of the circumferential shaft 84311 is sleeved with a torsion spring 84312, and the part of the circumferential shaft 84311 located in the bending tube 8422 is provided with a folding plate 84313, and sealing arc pads 84314 are fixed at both ends of the bending tube 8422. By using the folding plate 84313 that can only be flipped on one side, it is achieved that only the total feeder 8432 can be opened and closed, and once the total feeder 8432 is closed, it is directly reset.

[0043] It is not only difficult to set up a separate control structure on each distribution pipe 842, but also very costly. Therefore, the total material starter 8432 of this embodiment includes a hanger 84321 locked at the lower end of the middle mounting plate 841, and a lower punch 84322 is locked below the hanger 84321. The lower punch 84322 is connected to the inert gas inlet, and the lower punch 84322 is connected to the upper half of the bending pipe 8422 through a sub-pipe 84323. The total material starter 8432 needs to control all the distribution pipes 842 at the same time, so that it is punched into the bending pipe 8422 through different sub-pipes 84323 through a lower punch 84322 with a positive pressure function, so that the open and closed states of different bending pipes 8422 can be controlled, thereby realizing the state of multiple pipes being opened or closed at the same time.

[0044] During segmented vaporization, the steam pipe 83 is inserted into the accommodating chamber 851, and the hot steam in the steam pipe 83 vaporizes the liquid in the accommodating chamber 851. However, during the vaporization process, condensation is likely to occur both inside and outside the steam pipe 83. The condensed water on the outside is likely to affect the purity of thionyl fluoride, while the condensed water on the inside will affect the temperature of the steam. Therefore, the present invention provides a segmented vaporization structure 85, and respectively provides an inner guide component 854 and an outer guide component 855 on the inner and outer sides of the segmented vaporization structure 85. The inner guide component 854 and the outer guide component 855 can respectively guide the condensed water inside and outside to the outside, thereby making the vaporization process smoother and the purity of the vaporized thionyl fluoride higher.

[0045] On the inner side of the steam pipe 83, the condensed liquid generated inside the steam pipe 83 needs to be discharged to avoid lowering the temperature inside the steam pipe 83. Therefore, the inner guide component 854 of this embodiment includes an adsorption pad 8541 arranged on the inner inclined hole 831, and the lower end of the adsorption pad 8541 is connected to a lower inclined tube 8542. All the lower inclined tubes 8542 are connected through an inner ring 8543. By arranging the adsorption pad 8541 in the inner guide component 854, the aperture of the adsorption pad 8541 is extremely small. Although some gas will be exposed, the condensed liquid droplets flowing down will infiltrate from the position of the adsorption pad 8541, and will not flow to the lower end, thereby avoiding affecting the temperature of the steam inside the steam pipe 83.

[0046] In order to further suppress the diffusion effect of the gas, the downward inclined tube 8542 of this embodiment is filled with a barrier mass, which can limit the flow of gas and ensure that the hot steam does not flow to the outside in large quantities.

[0047] On the outside of the steam pipe 83, in order to prevent the condensed water on the outside from flowing down and coming into contact with the liquid at the bottom, thereby reducing the purity of the liquid at the bottom, the outer guide component 855 of this embodiment includes a receiving sleeve 8551 arranged below the outer guide plate 853, and the receiving sleeve 8551 is connected to a lower bend pipe 8552, and all the lower bend pipes 8552 are connected to an outer ring 8553. The outer guide component 855 is drained into the receiving sleeve 8551 through the outer guide plate 853, and is collected and concentrated at the position of the outer ring 8553 through the receiving sleeve 8551, so that the condensed water on the outside can also be concentrated and guided away, thereby avoiding the negative effects such as temperature reduction and purity reduction after the steam pipe 83 is set, and ensuring the smoothness of the entire vaporization process.

[0048] In order to reduce the flow path with the outside world, the inner ring 8543 and the outer ring 8553 of this embodiment are connected by a linkage pipe 856, and the linkage pipe 856 is connected to the external air extraction structure.

[0049] The foregoing description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention are intended to be within the scope of protection of the present invention.

Claims

1. A vaporization device for preparing electronic grade thionyl fluoride, characterized in that: include: A vaporizer (80) is provided with a thionyl fluoride liquid inlet (81) at the bottom of the vaporizer (80), a thionyl fluoride gas outlet (82) is provided at the top of the vaporizer (80), a plurality of steam pipes (83) are provided in the vaporizer (80), and the steam pipes (83) are connected to an external air inlet and an air outlet, and further comprising: An isolation and distribution structure (84) includes a middle mounting plate (841) disposed in the middle section of the vaporizer (80), the middle mounting plate (841) dividing the vaporizer (80) into a vaporization zone and a distribution zone, a plurality of distribution pipes (842) are connected to the lower end of the middle mounting plate (841), a lower distribution assembly (843) is disposed on the outer side of the middle portion of the distribution pipes (842), the lower distribution assembly (843) controls the opening and closing of all distribution pipes (842), the bottom of the distribution pipes (842) is connected to a lower pumping pipe (844), the lower pumping pipe (844) extends into the thionyl fluoride liquid at the bottom of the vaporizer (80), and the lower distribution assembly (843) periodically pumps the thionyl fluoride liquid at the bottom of the vaporizer (80) into the distribution pipes (842) through the lower pumping pipes (844); The segmented vaporization structure (85) comprises a plurality of accommodating chambers (851) arranged on a central mounting plate (841), wherein the inlet hole at the bottom of the accommodating chamber (851) is communicated with the distribution pipe (842), the steam pipe (83) is plugged into the upper portion of the accommodating chamber (851), an inner inclined hole (831) is provided in the middle of the steam pipe (83), an outer guide plate (853) is tilted outwardly from the inner inclined hole (831), an inner guide assembly (854) is provided on the inner side of the outer guide plate (853) at a position corresponding to the inner inclined hole (831), an outer guide assembly (855) is provided on the outer side of the outer guide plate (853), and both the inner guide assembly (854) and the outer guide assembly (855) are communicated with an external exhaust structure.

2. A vaporization device for preparing electronic grade thionyl fluoride according to claim 1, characterized in that: The distribution pipe (842) includes an upper separation section (8421) connected to the accommodating chamber (851), and the upper separation section (8421) is connected to a bent tube (8422) at an angle toward the center line of the vaporizer (80), and the lower end of the bent tube (8422) is connected to a lower separation section (8423), and the lower separation section (8423) is connected to the lower extraction tube (844).

3. A vaporization device for preparing electronic grade thionyl fluoride according to claim 2, characterized in that: The lower material distribution component (843) includes a back pressure piece (8431) arranged in the middle of the bending tube (8422), and a main material lifter (8432) is provided at the lower end of the middle mounting plate (841), and the main material lifter (8432) is connected to the upper half of the bending tube (8422).

4. A vaporization device for preparing electronic-grade thionyl fluoride according to claim 3, characterized in that: The counter-pressure member (8431) includes a circumferential shaft (84311) that passes through the bending tube (8422), one end of the circumferential shaft (84311) is sleeved with a torsion spring (84312), the portion of the circumferential shaft (84311) located inside the bending tube (8422) is provided with a folding plate (84313), and sealing arc pads (84314) are fixed to both ends of the bending tube (8422).

5. A vaporization device for preparing electronic-grade thionyl fluoride according to claim 4, characterized in that: The total material lifter (8432) includes a hanging frame (84321) locked at the lower end of the middle mounting plate (841), and a lower punch (84322) is locked below the hanging frame (84321). The lower punch (84322) is connected to the inert gas inlet, and the lower punch (84322) is communicated with the upper half of the bent tube (8422) through a pair of pipes (84323).

6. The vaporization device for preparing electronic-grade thionyl fluoride according to claim 1, characterized in that: The inner guide assembly (854) includes an adsorption pad (8541) disposed on the inner inclined hole (831), the lower end of the adsorption pad (8541) and a lower inclined tube (8542), and all the lower inclined tubes (8542) are connected via an inner ring (8543).

7. A vaporization device for preparing electronic-grade thionyl fluoride according to claim 6, characterized in that: The lower inclined tube (8542) is filled with a barrier mass.

8. A vaporization device for preparing electronic-grade thionyl fluoride according to claim 7, characterized in that: The outer guide assembly (855) includes a receiving sleeve (8551) arranged below the outer guide plate (853), the receiving sleeve (8551) is connected to a lower bend pipe (8552), and all the lower bend pipes (8552) are connected to an outer ring (8553).

9. A vaporization device for preparing electronic-grade thionyl fluoride according to claim 8, characterized in that: The inner ring (8543) and the outer ring (8553) are connected via a linkage pipe (856), and the linkage pipe (856) is in communication with an external air extraction structure.

Images