Cleanable antioxidant depolarization film and preparation process thereof

Abstract

The invention relates to the technical field of optical thin films, and discloses a cleanable anti-oxidation depolarization film and a preparation process thereof, and the preparation process of the cleanable anti-oxidation depolarization film product has unique technical key points. In the film coating process, the film coating temperature is strictly controlled to be 80 DEG C, the temperature condition can guarantee the activity of film material molecules, the film material molecules are evenly attached and arranged on the surface of the substrate, and deformation of the substrate material or instability of the film layer structure caused by too high temperature is avoided. The film coating rate is set to be 30A / S, so that the film layer can keep good density and uniformity in the growth process, and the problems that the film layer is too thick or too thin, the internal structure is loose and the like are avoided.

Description

Technical Field

[0001] The present invention relates to the technical field of optical films, in particular to a cleanable and anti-oxidation depolarizing film and a preparation process thereof. Background Art

[0002] In the field of optics, depolarization films are widely used in various optical instruments and equipment, such as camera lenses, telescopes, microscopes, etc., to eliminate the polarization phenomenon of light and improve the imaging quality of optical systems. However, existing depolarization film products generally have some problems. On the one hand, during daily use, the surface of the film layer is easily contaminated with pollutants such as dust and oil. When cleaning it, the existing depolarization film is easily damaged by the cleaning operation, resulting in a decrease in the optical performance of the film layer and even the loss of the depolarization function. On the other hand, when the depolarization film is exposed to air for a long time, it is easy to chemically react with oxygen and oxidize. This will not only change the chemical composition and microstructure of the film layer, but also gradually deteriorate the optical performance of the film layer, shortening the service life of the product.

[0003] At the same time, existing depolarization films also need to be improved in terms of their spectroscopic performance. Their spectroscopic curves cannot effectively meet the needs of some applications with strict requirements on light polarization and spectral distribution. As a result, in actual use, the optical system's ability to process light of different wavelengths is insufficient, affecting image clarity and color reproduction. Given these issues, the development of a cleanable, oxidation-resistant depolarization film with improved spectroscopic performance is of great practical significance and meets market demand. Summary of the Invention

[0004] (1) Technical problems solved

[0005] In view of the deficiencies of the prior art, the present invention provides a cleanable and anti-oxidation depolarizing film and a preparation process thereof, which has good anti-oxidation and self-cleaning effects and prolongs its service life.

[0006] (2) Technical solution

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solution: a cleanable and anti-oxidation depolarizing film, comprising, from bottom to top, a base layer, a first AL2O3 protective film layer, a depolarizing positive film layer coating, an AG film layer coating, a second AL2O3 protective film layer coating, and an anti-oxidation film layer coating.

[0008] Furthermore, the preparation method of the washable and anti-oxidation depolarizing film is:

[0009] Substrate preparation: Prepare the quartz substrate material, then clean and pre-treat the substrate. Use acetone and alcohol organic solvents to clean it in an ultrasonic cleaner to remove oil and dust on the surface of the substrate. Rinse the substrate in deionized water and dry it in an oven at 100-120°C for 30-60 minutes before use.

[0010] The first layer of AL2O3 protective film coating: Place the pre-treated substrate into the vacuum coating equipment and evacuate to a pressure of 0.8×10 -3 Pa to 1×10 -3 Pa, turn on the ion source, adjust the ion beam energy to 500-800eV, the beam current to 50-100mA, install the 99.99% purity Al2O3 target on the sputtering source, introduce an appropriate amount of argon as the sputtering gas, start sputtering coating at a temperature of 80°C and a coating rate of 30A / S, and control the coating time to be 15-20 minutes;

[0011] Depolarization positive film coating: Keep the vacuum environment and ion source turned on, and coat at a temperature of 80°C at a rate of 30A / S for 30-60 minutes;

[0012] AG film coating: After the depolarization positive film coating is completed, keep the equipment in vacuum state unchanged, replace the AG film target, adjust the ion source parameters again, the ion beam energy and beam current are 30-80mA, and the AG film coating is carried out at a temperature of 80℃ and a rate of 25-35A / S. The coating time is 10-15 minutes, so that the thickness of the AG film reaches 50-80nm;

[0013] Second layer of AL2O3 protective film coating: After the AG film coating is completed, without changing the vacuum environment and the ion source on state, reinstall the AL2O3 target material, and deposit the second layer of AL2O3 protective film at a temperature of 80°C and a coating rate of 30A / S. The coating time is 10-15 minutes, so that the thickness of the second layer of AL2O3 protective film reaches 80-120nm;

[0014] Anti-oxidation film coating: Finally, install the anti-oxidation film target on the sputtering source, keep the vacuum degree and ion source parameters stable, and coat the anti-oxidation film at a rate of 20-30A / S at a temperature of 80°C for 15-20 minutes, so that the thickness of the anti-oxidation film reaches 100-150nm; after the coating is completed, turn off the ion source and sputtering source, and after the temperature in the vacuum chamber drops to room temperature, take out the prepared washable oxidation-resistant depolarization film product.

[0015] Furthermore, the cleaning time in the substrate preparation is 15-20 minutes.

[0016] Furthermore, the thickness of the first Al2O3 protective film coating is 100-150nm.

[0017] Furthermore, the thickness of the depolarization positive film coating is 200-400 nm;

[0018] Furthermore, the AG film coating ion beam energy is 300-500eV.

[0019] Furthermore, the coating time of the second Al2O3 protective film layer is 10-15 minutes.

[0020] Furthermore, the coating time of the anti-oxidation film layer is 15-20 minutes.

[0021] (3) Beneficial technical effects

[0022] The washable, oxidation-resistant, depolarization-resistant positive film of this invention maintains a coating temperature of 80°C. This temperature ensures the activity of the film molecules, allowing them to adhere and align evenly on the substrate surface, while preventing deformation of the substrate or instability of the film structure caused by excessive temperatures. The coating rate is set at 30 A / S, which ensures good film density and uniformity during growth, avoiding problems such as excessively thick or thin films and loose internal structures.

[0023] AL2O3 is used as a protective film before and after AG (anti-glare) coating. Applying AL2O3 before AG coating provides a smooth, stable, and chemically inert base surface for the subsequent positive depolarization film, enhancing adhesion between the film and the substrate. AL2O3 itself possesses a certain degree of hardness and wear resistance, providing preliminary protection for subsequent layers from minor physical damage. Applying AL2O3 again after AG coating primarily protects the positive depolarization and AG films from damage caused by environmental factors (such as humidity and corrosive gases) during subsequent processing and use, further enhancing the product's weather resistance.

[0024] The outermost layer utilizes a special antioxidant film material, carefully selected and developed to exhibit extremely low oxygen permeability and excellent chemical stability. Its molecular structure effectively blocks the intrusion of oxygen molecules, preventing oxidation reactions within the film layer, thereby extending the product's service life. Furthermore, this antioxidant film material exhibits certain self-cleaning properties. Its surface microstructure prevents contaminants such as dust and oil from adhering, and even if they do adhere, they can be easily removed with running water or gentle wiping, significantly enhancing the product's cleanability.

[0025] Ion source assisted technology: The present invention adopts ion source assisted technology in the film coating process. The high-energy ion beam generated by the ion source bombards and sputters the film layer being deposited during the film coating process. On the one hand, the bombardment of high-energy ions can enable the atoms on the surface of the film layer to obtain sufficient energy, thereby rearranging and filling the defects and gaps in the film layer, making the film layer structure denser and improving the hardness and wear resistance of the film layer. On the other hand, ion source assistance can enhance the chemical bonding between the film layer and the substrate and between each film layer, significantly improving the adhesion of the film layer and effectively reducing the phenomenon of the film layer falling off during use. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 This is a spectral curve chart of a cleanable, oxidation-resistant depolarization film product. The horizontal axis is wavelength (nm), and the vertical axis is light transmittance (%) and polarization degree (%).

[0027] Figure 2 This is a schematic structural diagram of the product of the present invention, which includes, from bottom to top, a substrate, a first AL2O3 protective film layer, a depolarizing positive film layer, an AG film layer, a second AL2O3 protective film layer, and an anti-oxidation film layer. DETAILED DESCRIPTION

[0028] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention are clearly and completely described. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0029] In order to better understand the above technical solution, the above technical solution will be described in detail below with reference to the accompanying drawings and specific embodiments.

[0030] Example 1

[0031] Substrate preparation: Prepare the quartz substrate material, then clean and pre-treat the substrate. Use acetone and alcohol organic solvents to clean it in an ultrasonic cleaner for 15 minutes to remove oil and dust on the surface of the substrate. Rinse the substrate in deionized water and dry it in an oven at 100°C for 30 minutes before use.

[0032] The first layer of AL2O3 protective film coating: Place the pre-treated substrate into the vacuum coating equipment and evacuate to a pressure of 0.8×10 -3Pa, turn on the ion source, adjust the ion beam energy to 500eV, the beam current to 50mA, install the 99.99% pure Al2O3 target on the sputtering source, introduce an appropriate amount of argon as the sputtering gas, start sputtering coating at a temperature of 80°C and a coating rate of 30A / S. The coating time is controlled within 15 minutes, so that the thickness of the first Al2O3 protective film reaches 100nm;

[0033] Depolarization positive film coating: Keep the vacuum environment and ion source turned on, and coat the film at a rate of 30A / S at a temperature of 80°C for 30 minutes until the thickness of the depolarization positive film reaches 200nm;

[0034] AG film coating: After the depolarization positive film coating is completed, the vacuum state of the equipment is maintained unchanged, and the AG film target is replaced. The ion source parameters are adjusted again, and the ion beam energy is adjusted to 300eV and the beam current to 30mA. The AG film is coated at a temperature of 80°C and a rate of 25A / S for 10 minutes, so that the thickness of the AG film reaches 50nm.

[0035] Second layer of AL2O3 protective film coating: After the AG film coating is completed, without changing the vacuum environment and the ion source on state, the AL2O3 target is reinstalled, and the second layer of AL2O3 protective film is deposited at a temperature of 80°C and a coating rate of 30A / S. The coating time is 10 minutes, so that the thickness of the second layer of AL2O3 protective film reaches 80nm;

[0036] Anti-oxidation film coating: Finally, install the anti-oxidation film target on the sputtering source, keep the vacuum degree and ion source parameters stable, and carry out anti-oxidation film coating at a temperature of 80°C and a rate of 20A / S for 15 minutes, so that the thickness of the anti-oxidation film reaches 100nm; after the coating is completed, turn off the ion source and sputtering source, and after the temperature in the vacuum chamber drops to room temperature, take out the prepared washable oxidation-resistant depolarization film product.

[0037] Performance Advantages: The depolarization film product of this invention demonstrates superior spectroscopic performance. By precisely controlling the coating process parameters and the material composition of each film layer, a specific spectroscopic curve can be achieved. Within the visible light range (400nm-760nm), the depolarization effect is remarkable, converting light of varying polarization states into uniform unpolarized light. The RT ratio (RT) can achieve 8:27:36:45:5:4:63:72:8, with a polarization degree of less than 1-5%, meeting the stringent polarization requirements of high-precision optical instruments.

[0038] In terms of reliability testing, this product also demonstrated excellent performance. After 10 standard cleaning tests (using optical cleaning fluid and cleaning equipment to simulate cleaning operations in daily use), the optical properties of the film layer remained basically unchanged, and the depolarization effect remained stable, proving its good cleanability. However, traditional depolarization film products will produce phenomena such as peeling and washing damage when cleaned under the same conditions. In the anti-oxidation test, after the product was placed in a high-temperature, high-humidity and oxygen-rich environment (temperature 80°C, relative humidity 80%, oxygen concentration 20%) for 48 hours, the film layer showed no obvious signs of oxidation, the surface remained smooth, and there was no discoloration or peeling. However, under the same conditions, traditional depolarization film products showed obvious oxidation and performance degradation in just 4 hours. This fully proves that the product of the present invention has a longer service life and better stability.

[0039] It should be noted that, in this document, the terms "comprises," "includes," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or apparatus comprising a series of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or apparatus comprising the element.

[0040] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present invention.

[0041] Those skilled in the art will appreciate that the foregoing descriptions are merely specific embodiments of the present invention, and not exhaustive. It should be noted that numerous variations and modifications are possible for those skilled in the art, and all such variations and modifications that do not exceed the scope of the claims should be considered within the scope of protection of the present invention.

Claims

1. A cleanable and anti-oxidative depolarizing film, characterized in that: It includes, from bottom to top, a base layer, a first AL2O3 protective film layer, a depolarization positive film layer coating, an AG film layer coating, a second AL2O3 protective film layer coating, and an anti-oxidation film layer coating.

2. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 1, wherein: The preparation method of the cleanable and anti-oxidation depolarizing film is as follows: Substrate preparation: Prepare the quartz substrate material, then clean and pre-treat the substrate. Use acetone and alcohol organic solvents to clean it in an ultrasonic cleaner to remove oil and dust on the surface of the substrate. Rinse the substrate in deionized water and dry it in an oven at 100-120°C for 30-60 minutes before use. The first layer of AL2O3 protective film coating: Place the pre-treated substrate into the vacuum coating equipment and evacuate to a pressure of 0.8×10 -3 Pa to 1×10 -3 Pa, turn on the ion source, adjust the ion beam energy to 500-800eV, the beam current to 50-100mA, install the 99.99% purity Al2O3 target on the sputtering source, introduce an appropriate amount of argon as the sputtering gas, start sputtering coating at a temperature of 80°C and a coating rate of 30A / S, and control the coating time to be 15-20 minutes; Depolarization positive film coating: Keep the vacuum environment and ion source turned on, and coat at a temperature of 80°C at a rate of 30A / S for 30-60 minutes; AG film coating: After the depolarization positive film coating is completed, keep the equipment in vacuum state unchanged, replace the AG film target, adjust the ion source parameters again, the ion beam energy and beam current are 30-80mA, and the AG film coating is carried out at a temperature of 80℃ and a rate of 25-35A / S. The coating time is 10-15 minutes, so that the thickness of the AG film reaches 50-80nm; Second layer of AL2O3 protective film coating: After the AG film coating is completed, without changing the vacuum environment and the ion source on state, reinstall the AL2O3 target material, and deposit the second layer of AL2O3 protective film at a temperature of 80°C and a coating rate of 30A / S. The coating time is 10-15 minutes, so that the thickness of the second layer of AL2O3 protective film reaches 80-120nm; Anti-oxidation film coating: Finally, install the anti-oxidation film target on the sputtering source, keep the vacuum degree and ion source parameters stable, and coat the anti-oxidation film at a rate of 20-30A / S at a temperature of 80°C for 15-20 minutes, so that the thickness of the anti-oxidation film reaches 100-150nm; after the coating is completed, turn off the ion source and sputtering source, and after the temperature in the vacuum chamber drops to room temperature, take out the prepared washable oxidation-resistant depolarization film product.

3. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The cleaning time in the substrate preparation is 15-20 minutes.

4. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The thickness of the first Al2O3 protective film coating is 100-150nm.

5. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The thickness of the depolarization positive film coating is 200-400 nm.

6. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The AG film coating ion beam energy is 300-500eV.

7. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The coating time of the second AL2O3 protective film is 10-15 minutes.

8. The method for preparing a cleanable and anti-oxidative depolarizing film according to claim 2, wherein: The coating time of the anti-oxidation film layer is 15-20 minutes.

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