Efficient silicon wafer cleaning equipment for manufacturing solar photovoltaic cell panel

Abstract

The invention relates to the technical field of silicon wafer cleaning equipment, in particular to efficient silicon wafer cleaning equipment for manufacturing a solar photovoltaic cell panel, which comprises a cleaning box and an electric push rod, and further comprises a connecting frame, a silicon wafer cleaning device and a silicon wafer cleaning device, the cleaning unit is arranged on the connecting frame; the cleaning unit comprises a clamping type rotating part arranged on the connecting frame, and is used for clamping and positioning silicon wafers with different sizes and cleaning the clamping positions in an alternate clamping cancelling manner; according to the efficient silicon wafer cleaning equipment for manufacturing the solar photovoltaic cell panel, when a worker cleans a silicon wafer, effective cleaning of the clamping position of the silicon wafer is achieved through the cleaning unit, the cleaning efficiency is improved, and the working efficiency is improved. And the clamping area is ensured to be fully cleaned in the rotating process in an alternate clamping cancelling mode, and the problem that the clamping position becomes a cleaning blind area in a traditional cleaning mode is solved.

Description

Technical Field

[0001] The present invention relates to the technical field of silicon wafer cleaning equipment, in particular to high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic panels. Background Art

[0002] In the production process of solar photovoltaic panels, silicon wafers are key raw materials, and the cleanliness of their surfaces has a crucial impact on the conversion efficiency and service life of the panels. The traditional silicon wafer cleaning process usually relies on manual labor or simple mechanized equipment. These cleaning methods have certain limitations in processing efficiency and cleaning quality. In particular, when clamping and positioning silicon wafers for subsequent processing or inspection, the clamping position often becomes a blind spot for cleaning because these positions are difficult to be effectively reached by traditional cleaning methods.

[0003] Most existing silicon wafer cleaning equipment uses methods such as immersion, spraying or brushing, such as an efficient silicon wafer cleaning equipment for solar photovoltaic panel manufacturing with announcement number CN106531843B. Although these methods can remove most stains and particles on the surface of silicon wafers to a certain extent, the clamping or overlapping positions are often not fully cleaned due to limitations of structural design and operating principles. The stains and particles remaining at the clamping position will not only affect the overall cleanliness of the silicon wafer, but may also cause surface contamination of the silicon wafer during subsequent processing, thereby affecting the performance and reliability of the panel. For this reason, we propose an efficient silicon wafer cleaning equipment for solar photovoltaic panel manufacturing. Summary of the Invention

[0004] A technical problem to be solved by this application is: how to design an efficient cleaning device for silicon wafers used in the production of solar photovoltaic panels that can clean the clamping position.

[0005] To solve the above technical problems, the present invention provides an efficient cleaning device for silicon wafers used in the production of solar photovoltaic panels, including a cleaning box and an electric push rod, and also includes:

[0006] A connecting frame, the connecting frame being arranged at the end of the electric push rod;

[0007] A cleaning unit, wherein the cleaning unit is arranged on the connecting frame;

[0008] The cleaning unit includes a clamping rotating component provided on a connecting frame, which is used to clamp and position silicon wafers of different sizes and clean the clamping positions by alternately canceling the clamping.

[0009] The clamping rotating parts are provided in plurality and are used for cleaning a plurality of silicon wafers;

[0010] The connecting frame is provided with a connecting member 1 and a connecting member 2 for controlling the synchronous adjustment of the plurality of clamping rotating components.

[0011] In some embodiments, the clamping rotating component includes two positioning frames slidably arranged on a connecting frame, and the connecting frame is provided with a shifting member for driving the two positioning frames to shift synchronously. The positioning frames are each provided with a rotating assembly for controlling the rotation of the silicon wafer in the cleaning box and cleaning the clamping position during rotation.

[0012] In some embodiments, the displacement member includes a bidirectional screw rod rotatably arranged on a connecting frame, and the two positioning frames are respectively threadedly connected to both sides of the bidirectional screw rod.

[0013] In some embodiments, the rotating assembly includes a rotating disk and a rotating shaft rotatably arranged on a positioning frame, the rotating disk and the rotating shaft are coaxially arranged and fixedly connected, two groups of clamping blocks are arranged on the rotating disk, and a rotating member connected to the two groups of the clamping blocks is provided on the rotating disk, which is used to control the rotation of the two groups of the clamping blocks, a switching member is provided on the rotating shaft, which is used to control the alternating switching of the two groups of clamping blocks, and a synchronization member is provided on the positioning frame, which is used to control the clamping blocks on both sides to work synchronously.

[0014] In some embodiments, the number of clamping blocks in each group of the clamping blocks is the same and greater than 2, the rotating member includes a plurality of shift rods respectively slidably arranged on the rotating disk, and the clamping blocks are respectively arranged on adjacent shift rods.

[0015] In some embodiments, the switching member includes a fixed rod arranged on a positioning frame, a top column is provided at the end of the fixed rod, and a guide block cooperating with the top column is provided on any clamping block in each group of the clamping blocks. A spring is provided on the outer side of the shift rod, and the two ends of the spring are respectively connected to the rotating disk and the clamping block. A plurality of damping layers are provided on the rotating disk, and the shift rod moves through the damping layer. A guide column is provided on the rotating shaft, and two support frames respectively connected to the two groups of clamping blocks are slidably provided on the guide column.

[0016] In some embodiments, the synchronizer includes two rotating shafts respectively rotatably arranged on two positioning frames, and a polygonal rod and a polygonal seat are respectively arranged on opposite sides of the two rotating shafts for matching use, and pulleys are arranged on the two rotating shafts and the rotating shaft, and a synchronous belt is arranged between the two pulleys located on the same positioning frame.

[0017] In some embodiments, the connecting member 1 includes a plurality of couplings respectively arranged between two adjacent bidirectional screw rods, the bidirectional screw rods at the ends extend to the outside of the connecting frame, and a knob is provided at the ends.

[0018] In some embodiments, the second connecting member includes a drive motor arranged on a positioning frame located at the end, the drive motor is connected to the adjacent rotating shaft, and a polygonal rod 2 and a polygonal seat 2 are provided on opposite sides of the two rotating shafts close to the coupling for use in conjunction with each other.

[0019] In some embodiments, a clamping layer is provided on a side of the clamping block close to the silicon wafer, and the clamping layer is made of plastic material.

[0020] The present invention has at least the following beneficial effects:

[0021] 1. Thorough cleaning of the clamping position: The design of the clamping rotating component achieves effective cleaning of the wafer clamping position. The alternating unclamping method ensures that the clamping area is fully cleaned during the rotation process, avoiding the problem of the clamping position becoming a cleaning blind spot in traditional cleaning methods.

[0022] 2. Strong adaptability: The equipment can clamp and clean silicon wafers of different sizes and shapes without frequent replacement or adjustment of clamping parts, which improves the versatility and flexibility of the equipment;

[0023] 3. High cleaning efficiency: The setting of multiple clamping rotating parts allows multiple silicon wafers to be cleaned at the same time, which significantly improves the cleaning efficiency and meets the needs of large-scale production. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0025] Figure 2 This is a schematic structural diagram of the present invention from another perspective;

[0026] Figure 3 This is a schematic structural diagram of the cleaning unit of the present invention;

[0027] Figure 4 For the present invention Figure 3 Schematic diagram of the enlarged structure of area A;

[0028] Figure 5 This is a schematic diagram of the planar structure of the cleaning unit of the present invention;

[0029] Figure 6 This is a schematic structural diagram of the clamping type rotating component of the present invention;

[0030] Figure 7 This is a schematic diagram of the partial cross-sectional structure of the clamping type rotating component of the present invention;

[0031] Figure 8 This is a schematic structural diagram of a clamping type rotating component according to the present invention from another perspective;

[0032] Figure 9This is an exploded schematic diagram of a partial structure of a clamping type rotating component of the present invention;

[0033] Figure 10 This is a schematic diagram of the partial cross-sectional structure of the rotating assembly of the present invention;

[0034] Figure 11 This is a structural diagram of Example 2 of the present invention.

[0035] In the figure: 1. Cleaning box; 2. Electric push rod; 3. Connecting frame; 4. Cleaning unit; 5. Clamping rotating component; 51. Positioning frame; 6. Shifting member; 61. Bidirectional screw rod; 7. Rotating assembly; 71. Rotating disk; 72. Rotating shaft; 73. Clamping block; 8. Rotating member; 81. Shifting rod; 9. Switching member; 91. Fixed rod; 92. Top column; 93. Guide block; 94. Spring; 95. Damping layer; 96. Guide column; 97. Support frame; 10. Synchronizing member; 101. Rotating shaft; 102. Polygonal rod one; 103. Polygonal seat one; 104. Pulley; 105. Synchronous belt; 11. Connecting member one; 111. Coupling; 12. Connecting member two; 121. Driving motor; 122. Polygonal rod two; 123. Polygonal seat two; 13. Clamping layer. DETAILED DESCRIPTION

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0037] Example 1

[0038] See also Figures 1-10 , the present invention provides a technical solution:

[0039] The highly efficient cleaning equipment for silicon wafers used in the production of solar photovoltaic panels includes a cleaning box 1 and an electric push rod 2. The cleaning box 1 can store cleaning liquid or clean water. The electric push rod 2 is used to lift and lower the connecting frame 3. The cleaning box 1 and the electric push rod 2 are common existing structures and will not be described in detail here. The equipment also includes:

[0040] A connecting frame 3 is provided at the end of the electric push rod 2;

[0041] A cleaning unit 4 is provided on the connecting frame 3;

[0042] The cleaning unit 4 includes a clamping rotating component 5 provided on the connecting frame 3, which is used to clamp and position silicon wafers of different sizes and clean the clamping positions by alternately canceling the clamping.

[0043] The clamping rotating parts 5 are provided in plurality and are used for cleaning a plurality of silicon wafers;

[0044] The clamping rotating component 5 includes two positioning frames 51 slidably mounted on the connecting frame 3. The connecting frame 3 is provided with a shifting member 6 for driving the two positioning frames 51 to shift synchronously. Each of the positioning frames 51 is provided with a rotating assembly 7 for controlling the rotation of the silicon wafer in the cleaning box 1 and cleaning the clamping position during the rotation.

[0045] The shifting member 6 includes a bidirectional screw rod 61 rotatably arranged on the connecting frame 3, and the two positioning frames 51 are respectively threadedly connected to both sides of the bidirectional screw rod 61;

[0046] The rotating assembly 7 includes a rotating disk 71 and a rotating shaft 72 rotatably arranged on the positioning frame 51. The rotating disk 71 and the rotating shaft 72 are coaxially arranged and fixedly connected. Two groups of clamping blocks 73 are provided on the rotating disk 71. A rotating member 8 connected to the two groups of clamping blocks 73 is provided on the rotating disk 71 for controlling the rotation of the two groups of clamping blocks 73. A switching member 9 is provided on the rotating shaft 72 for controlling the alternating switching of the two groups of clamping blocks 73. A synchronizing member 10 is provided on the positioning frame 51 for controlling the synchronous operation of the clamping blocks 73 on both sides.

[0047] The number of clamping blocks 73 in each group of the clamping blocks 73 is the same and greater than 2. The rotating member 8 includes a plurality of shift rods 81 respectively slidably disposed on the rotating disk 71. The clamping blocks 73 are respectively disposed on adjacent shift rods 81. In this embodiment, the number of clamping blocks 73 in each group is 3, but this is not limited thereto.

[0048] The switching member 9 includes a fixed rod 91 arranged on the positioning frame 51, and a top column 92 is provided at the end of the fixed rod 91. Any clamping block 73 in each group of the clamping blocks 73 is provided with a guide block 93 that cooperates with the top column 92. The outer side of the shift rod 81 is provided with a spring 94, and the two ends of the spring 94 are respectively connected to the rotating disk 71 and the clamping block 73. The rotating disk 71 is provided with a plurality of damping layers 95. The shift rod 81 movably passes through the damping layer 95, and the rotating shaft 72 is provided with a guide column 96. The guide column 96 is slidably provided with two support frames 97 respectively connected to the two groups of clamping blocks 73. The setting of the guide column 96 enables the support frame 97 to slide and shift in the guide column 96, thereby cleaning the clamping position. The setting of the damping layer 95 ensures that after the guide block 93 is ejected by the top column 92, it will not be directly reset by the spring 94, but will be slowly reset, which is conducive to avoiding the impact of the clamping block 73 on the silicon wafer.

[0049] The synchronizer 10 includes two rotating shafts 101 rotatably mounted on two positioning frames 51, and a polygonal rod 102 and a polygonal seat 103 are provided on opposite sides of the two rotating shafts 101 for use in conjunction with each other. Pulleys 104 are provided on the two rotating shafts 101 and the rotating shaft 72, and a synchronous belt 105 is provided between the two pulleys 104 located on the same positioning frame 51.

[0050] The connecting frame 3 is provided with a connecting piece 11 and a connecting piece 2 12 for controlling the synchronous adjustment of the plurality of clamping rotating parts 5;

[0051] The connecting member 11 includes a plurality of couplings 111 respectively arranged between two adjacent bidirectional screw rods 61. The bidirectional screw rods 61 at the ends extend to the outside of the connecting frame 3 and are provided with knobs at the ends. When the knobs are turned, the plurality of bidirectional screw rods 61 can be driven to rotate synchronously under the action of the couplings 111, thereby driving the synchronous shifting and adjustment of the plurality of positioning frames 51, thereby achieving the clamping and positioning of the plurality of silicon wafers.

[0052] The second connecting member 12 includes a driving motor 121 arranged on a positioning frame 51 located at the end, and the driving motor 121 is connected to the adjacent rotating shaft 101. The opposite sides of the two rotating shafts 101 close to the coupling 111 are provided with a polygonal rod 2 122 and a polygonal seat 2 123 for use in conjunction with each other. The driving motor 121 drives the adjacent rotating shaft 101 to rotate, and drives the next rotating shaft 101 to rotate under the action of the polygonal rod 102 and the polygonal seat 1 103, and drives the other rotating shaft 101 to rotate under the action of the polygonal rod 2 122 and the polygonal seat 2 123. Similarly, all the rotating shafts 101 can be driven to rotate, so that the silicon wafer can continue to rotate during cleaning, and the clamping position can be cleaned during the rotation process.

[0053] At the initial stage of the equipment, the connecting frame 3 is lifted to the top of the cleaning box 1 by the electric push rod 2. The positioning frame 51 in the clamping rotating component 5 is in the initial position under the action of the bidirectional screw 61. The clamping blocks 73 do not clamp the silicon wafer. The silicon wafer is placed between the two sets of clamping blocks 73. The knob is turned to drive the bidirectional screw 61 to rotate, so that the two positioning frames 51 move synchronously toward the center to clamp the silicon wafer. Then, the silicon wafer is lowered into the cleaning box 1 by the electric push rod 2.

[0054] The drive motor 121 is started. Through the cooperation of the polygonal rod 102, the polygonal seat 103, the polygonal rod 2 122 and the polygonal seat 2 123, and the transmission of the synchronous belt 105 and the pulley 104, the rotating shaft 101 and the rotating shaft 72 are driven to rotate synchronously, so that the clamping block 73 and the silicon wafer rotate with the rotating shaft 72, thereby improving the cleaning effect of the silicon wafer;

[0055] During the rotation process, the two guide blocks 93 in the two groups will contact the top column 92 on the fixed rod 91 in a reciprocating manner, and then be pushed back by the top column 92, so that the two groups of clamping blocks 73 are alternately loosened and clamped, cleaning the clamping position. The damping layer 95 on the rotating disk 71 causes the clamping blocks 73 to slowly return to their original position to avoid impact on the silicon wafer.

[0056] After cleaning is completed, the electric push rod 2 lifts the connecting frame 3, rotates the knob in the opposite direction to loosen the silicon wafer, takes out the silicon wafer and puts in a new silicon wafer for the next round of cleaning. The whole process realizes the integrated operation of stable clamping, rotation cleaning and alternating clamping cleaning of the silicon wafer, thereby improving the cleaning efficiency and cleaning quality.

[0057] Example 2

[0058] See also Figure 11 , the present invention provides a technical solution:

[0059] Different from Example 1, the clamping block 73 is provided with a clamping layer 13 on the side close to the silicon wafer. The clamping layer 13 is made of plastic material. In this solution, the clamping layer 13 is made of PFA or PEEK material, but not limited to avoid damaging the surface of the silicon wafer.

[0060] While the embodiments of the present invention have been shown and described, it will be apparent to those skilled in the art that various changes, modifications, substitutions, and alterations can be made to the embodiments without departing from the principles and spirit of the invention.

Claims

1. A highly efficient cleaning device for silicon wafers used in the production of solar photovoltaic panels, comprising a cleaning box (1) and an electric push rod (2), characterized in that: Also included are: A connecting frame (3), the connecting frame (3) being arranged at the end of the electric push rod (2); A cleaning unit (4), wherein the cleaning unit (4) is arranged on the connecting frame (3); The cleaning unit (4) comprises a clamping rotating component (5) arranged on the connecting frame (3), which is used to clamp and position silicon wafers of different sizes and clean the clamping positions by alternately canceling the clamping. The clamping rotating parts (5) are provided in plurality and are used for cleaning a plurality of silicon wafers; The connecting frame (3) is provided with a connecting piece 1 (11) and a connecting piece 2 (12) for controlling the synchronous adjustment of the plurality of clamping rotating parts (5).

2. The high-efficiency silicon wafer cleaning device for manufacturing solar photovoltaic panels according to claim 1, characterized in that: The clamping rotating component (5) comprises two positioning frames (51) slidably arranged on a connecting frame (3); a shifting member (6) is provided on the connecting frame (3) for driving the two positioning frames (51) to shift synchronously; and a rotating assembly (7) is provided on each of the positioning frames (51) for controlling the rotation of the silicon wafer in the cleaning box (1) and cleaning the clamping position during the rotation.

3. The high-efficiency silicon wafer cleaning equipment for solar photovoltaic panel manufacturing according to claim 2, characterized in that: The shifting member (6) comprises a bidirectional screw rod (61) rotatably arranged on the connecting frame (3), and the two positioning frames (51) are respectively threadedly connected to both sides of the bidirectional screw rod (61).

4. The high-efficiency silicon wafer cleaning equipment for solar photovoltaic panel manufacturing according to claim 3 is characterized by: The rotating assembly (7) comprises a rotating disk (71) and a rotating shaft (72) rotatably arranged on a positioning frame (51); the rotating disk (71) and the rotating shaft (72) are coaxially arranged and fixedly connected; two groups of clamping blocks (73) are arranged on the rotating disk (71); a rotating member (8) connected to the two groups of clamping blocks (73) is arranged on the rotating disk (71) for controlling the two groups of clamping blocks (73) to rotate; a switching member (9) is arranged on the rotating shaft (72) for controlling the alternating switching of the two groups of clamping blocks (73); and a synchronizing member (10) is arranged on the positioning frame (51) for controlling the clamping blocks (73) on both sides to work synchronously.

5. The high-efficiency silicon wafer cleaning equipment for manufacturing solar photovoltaic panels according to claim 4, characterized in that: The number of the clamping blocks (73) in each group of the clamping blocks (73) is the same and greater than 2. The rotating member (8) comprises a plurality of shift rods (81) respectively slidably arranged on the rotating disk (71), and the clamping blocks (73) are respectively arranged on adjacent shift rods (81).

6. The high-efficiency silicon wafer cleaning device for manufacturing solar photovoltaic panels according to claim 5, characterized in that: The switching member (9) includes a fixed rod (91) arranged on a positioning frame (51), a top column (92) is arranged at the end of the fixed rod (91), and a guide block (93) matched with the top column (92) is arranged on any clamping block (73) in each group of the clamping blocks (73). A spring (94) is sleeved on the outer side of the shift rod (81), and the two ends of the spring (94) are respectively connected to the rotating disk (71) and the clamping block (73). A plurality of damping layers (95) are arranged on the rotating disk (71), and the shift rod (81) moves through the damping layer (95). A guide column (96) is arranged on the rotating shaft (72), and two support frames (97) respectively connected to the two groups of clamping blocks (73) are slidably arranged on the guide column (96).

7. The high-efficiency silicon wafer cleaning device for manufacturing solar photovoltaic panels according to claim 6, characterized in that: The synchronizer (10) comprises two rotating shafts (101) respectively rotatably arranged on two positioning frames (51); a polygonal rod (102) and a polygonal seat (103) are respectively arranged on opposite sides of the two rotating shafts (101); pulleys (104) are arranged on the two rotating shafts (101) and the rotating shaft (72); and a synchronous belt (105) is arranged between the two pulleys (104) located on the same positioning frame (51).

8. The high-efficiency cleaning device for silicon wafers used in the production of solar photovoltaic panels according to claim 7, characterized in that: The connecting member (11) includes a plurality of couplings (111) respectively arranged between two adjacent bidirectional screw rods (61). The bidirectional screw rods (61) at the ends extend to the outside of the connecting frame (3) and are provided with knobs at the ends.

9. The high-efficiency silicon wafer cleaning device for manufacturing solar photovoltaic panels according to claim 8, characterized in that: The second connecting member (12) includes a driving motor (121) arranged on a positioning frame (51) located at the end, and the driving motor (121) is connected to the adjacent rotating shafts (101). The opposite sides of the two rotating shafts (101) close to the coupling (111) are both provided with a second polygonal rod (122) and a second polygonal seat (123) for use in conjunction with each other.

10. The high-efficiency silicon wafer cleaning device for manufacturing solar photovoltaic panels according to claim 4, characterized in that: The clamping blocks (73) are each provided with a clamping layer (13) on one side close to the silicon wafer, and the clamping layer (13) is made of plastic material.

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