Novel QDR tank for wet process preparation

Abstract

The invention discloses a novel QDR groove for wet process, and relates to the technical field of wafer body cleaning, the novel QDR groove comprises an outer groove body, a block-up block is fixed at the bottom in the outer groove body, and an inner groove body is fixed at the top of the block-up block; spraying pipes are fixed to the two sides of a groove opening of the outer groove body, and a plurality of spraying heads communicated with the spraying pipes are fixed to the outer sides of the spraying pipes. A water inlet hole is formed in the bottom of one end of the inner tank body. According to the invention, spraying and bubbling cleaning modes are combined together, all corners of a wafer can be cleaned more comprehensively in the bubbling cleaning mode in the prior art, meanwhile, the bubbling cleaning process is short in time and more uniform in cleaning, and under the synergistic effect of spraying, liquid in the groove forms turbulent flow, so that the cleaning efficiency is improved. The coverage rate of bubbles generated by bubbling on the wafer is improved, so that the cleaning efficiency is improved; according to the method, the nitrogen is introduced into the liquid to form the bubbles, namely, the inert characteristic of the nitrogen is utilized, so that the surface of the wafer cannot be oxidized.

Description

Technical Field

[0001] The present invention relates to the technical field of wafer cleaning, in particular to a novel QDR tank for wet process. Background Art

[0002] During the semiconductor manufacturing process, wafers need to go through multiple wet process steps, such as etching, desizing, cleaning, etc. These steps will leave chemical substances and particulate contaminants on the wafer surface. If they are not completely removed, they will affect device performance and yield.

[0003] After searching, the Chinese patent document with the authorization announcement number CN219017600U discloses a QDR slot spray plate, including a QDR slot body, a fixture, a wafer, a spray pipe, a liquid inlet pipe, a QDR spray plate body, a conical nozzle, a QDR spray joint plate, a first sealing ring and a second sealing ring. The QDR spray joint plate is installed on the QDR spray plate body. Several conical nozzles are evenly arranged on the QDR spray plate body. The QDR spray plate body is welded to the left side plate of the QDR slot body. The wafer is located directly opposite the conical nozzle and the distance between the wafer and the conical nozzle is 50-60mm. The patent directly welds the spray plate directly opposite the wafer, and cooperates with multiple conical nozzles to completely cover the entire wafer, which greatly improves the spray cleaning effect. At the same time, the flow rate is also greatly improved, thereby improving the cleaning efficiency.

[0004] Based on searches and existing technologies, it was found that there are currently two common ways to clean wafers: soaking and rinsing. However, soaking or rinsing has low cleaning efficiency and is difficult to meet high production capacity requirements. This is because soaking and rinsing cannot quickly remove stains on the wafer surface. In order to ensure cleanliness, the cleaning time can only be extended. Summary of the Invention

[0005] The object of the present invention is to provide a novel QDR tank for wet process to solve the problems raised in the above background technology.

[0006] The technical solution of the present invention is: a new QDR tank for wet process, comprising an outer tank body, a spacer block is fixed on the bottom of the tank, and an inner tank body is fixed on the top of the spacer block;

[0007] Spray pipes are provided on both sides of the notch of the outer tank body, and multiple spray heads connected to the spray pipes are fixed on the outside of the spray pipes;

[0008] A water inlet hole is provided at the bottom of one end of the inner tank;

[0009] The outer side of the outer tank is provided with a water guide component for guiding external water into the two spray pipes and the water inlet hole respectively;

[0010] A transversely arranged PVC bubbling tube is fixed to the bottom of the inner tank body, a PFA hose connected to the PVC bubbling tube is fixed at one end of the PVC bubbling tube, and one end of the PFA hose is led out of the inner tank body.

[0011] Preferably, a vertically arranged drain pipe is inserted and fixed at the bottom of the outer tank body, one end of the drain pipe is fixed to the bottom of the inner tank body and communicates with the interior of the inner tank body, and a discharge valve is fixed at the bottom end of the drain pipe.

[0012] Preferably, an overflow pipe connected to the bottom of the outer tank body is fixedly connected, and the overflow pipe does not contact the inner tank body.

[0013] Preferably, a detection cavity is fixed on the outer side of the inner tank body, a liquid level sensor is fixed on the top of the detection cavity, and a communication hole communicating with the detection cavity is opened on the outer bottom of the inner tank body.

[0014] Preferably, the water guide assembly includes a water inlet pipe, one end of the water inlet pipe is connected to a first three-way pipe, both ends of the first three-way pipe are fixed with a first pneumatic valve and a second pneumatic valve respectively, one end of the first pneumatic valve and the water inlet hole are jointly fixed with a water diversion pipe, one end of the second pneumatic valve is fixed with a second three-way pipe, and both ends of the second three-way pipe are connected to two spray pipes respectively.

[0015] Preferably, a non-contact flow sensor is fixedly mounted on the outer side of the water inlet pipe.

[0016] Preferably, a pressure sensor is fixed to the outside of the water inlet pipe, and a detection end of the pressure sensor is located inside the water inlet pipe.

[0017] Preferably, grooves are provided on both sides of the inner trough body, and adjustment plates are slidably embedded in the interior of the two grooves, and the top of the adjustment plate is lower than the top of the groove. A reciprocating mechanism is provided on the outer side of the outer trough body to enable the two adjustment plates to move back and forth in a straight line in the grooves.

[0018] Preferably, the reciprocating mechanism includes two transverse plates and two crankshafts, a group of connecting columns are fixed on the outer sides of the two transverse plates, the two groups of connecting columns are slidably inserted in both sides of the inner tank body, the two groups of connecting columns are fixed to the two adjusting plates respectively, an oblique through-hole is provided on the top of the adjusting plate, an oblique plate is slidably inserted in the inside of the oblique through-hole, a recessed frame is fixed on the top of the inclined plate, the recess of the recessed frame is inverted, a moving plate is fixed on the other end of the recessed frame, a group of guide rails are fixed on both sides of the outer tank body, each group of guide rails is slidably provided with a slider adapted thereto, each group of sliders is fixed to the two moving plates respectively, and each Two extension plates are fixed to the outer side of each movable plate, and a rotating shaft is installed between the two extension plates for common rotation, a connecting rod is fixed to the outer side of the rotating shaft, a circular hole is opened at one end of the connecting rod, and the intermediate shafts of the two crankshafts are rotatably installed in the circular hole, and a transmission rod coaxially arranged therewith is fixed at both ends of the crankshaft, and a plurality of support seats are rotatably installed on the outer side of the transmission rod, and the support seat is fixed to the outer trough body, and a servo motor is fixed to the outside of the outer trough body, and the output shaft of the servo motor is coaxially fixed to one of the transmission rods, and the two transmission rods located on the same end are provided with a synchronization structure that enables the two to rotate synchronously.

[0019] Preferably, the synchronization structure includes two synchronization wheels, a synchronization belt and a tensioner. The two synchronization wheels are coaxially fixed to two transmission rods on the same end. The tensioner is fixed to the outer groove body. The synchronization belt is sleeved on the tensioning ends of the two synchronization wheels and the tensioner.

[0020] The present invention provides a novel QDR tank for wet process by improvement, which has the following improvements and advantages compared with the prior art:

[0021] First, the present invention combines spraying and bubbling cleaning methods. In the prior art, the bubbling cleaning method can more comprehensively clean every corner of the wafer. At the same time, the bubbling cleaning process is short and the cleaning is more uniform. Under the synergistic effect of spraying, the liquid in the tank forms turbulence, which increases the coverage of the bubbles on the wafer, thereby improving the cleaning efficiency. The present invention forms bubbles by introducing nitrogen into the liquid. That is, the present invention utilizes the inert characteristics of nitrogen to prevent oxidation from occurring on the wafer surface.

[0022] Secondly, the inner tank body of the present invention is used for the cleaning area to be in a state of reciprocating change, that is, the volume of the cleaning area can be in a state of sometimes wide and sometimes narrow. When the volume of the cleaning area changes from large to small, the cleaning area becomes narrower, the liquid flow rate is accelerated, the liquid flow rate becomes larger, thereby enhancing the turbulence intensity, washing the surface of the object, destroying the attachment of stains, the turbulence becomes stronger, the shear force in the turbulence becomes larger, the bubbles are broken into smaller bubbles, so that the specific surface area of ​​the bubbles is increased, thereby enhancing the chemical reaction and improving the cleaning efficiency. At the same time, the small bubbles are easier to penetrate into the micropores or gaps. In the process of narrowing, the bubble flow The smaller the kinetic range, the more bubbles can contact the wafer, which improves the bubble coverage rate. When the volume of the cleaning area is increased from small to large, that is, the cleaning area is widened, the liquid flow rate slows down, the shear force in the turbulent flow decreases, and the time the bubbles stay on the wafer surface is increased. The small bubbles on the wafer surface will merge into large bubbles. According to the law of conservation of energy, the kinetic energy of the liquid is reduced, which will increase the bubble rupture energy, strengthen the local impact force, increase the stain stripping rate, and further improve the cleaning efficiency. At the same time, the high flow rate flushing in the narrowing area and the bubble impact in the widening area complement each other, reducing energy waste.

[0023] Third: Since the inner tank body is in a reciprocating state for cleaning the area, the liquid in the inner tank body changes periodically. This periodic change will cause the liquid to generate vortexes. This vortex can improve the liquid penetration efficiency, making it easier to enter the fine gaps of the wafer body, thereby improving the cleaning efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0025] Figure 1 This is a schematic diagram of the overall first-view three-dimensional structure of the first embodiment of the present invention;

[0026] Figure 2 This is a schematic diagram of the overall second-viewing perspective three-dimensional structure of the first embodiment of the present invention;

[0027] Figure 3 This is a schematic diagram of the overall third-view stereoscopic structure of the first embodiment of the present invention;

[0028] Figure 4 This is a schematic diagram of the internal structure of the first embodiment of the present invention;

[0029] Figure 5 This is a schematic diagram of the outer tank structure of Example 1 of the present invention;

[0030] Figure 6 This is a schematic diagram of the three-dimensional structure of the outer tank body and the inner tank body of the first embodiment of the present invention;

[0031] Figure 7 This is a schematic diagram of the internal structure of the outer tank body according to the first embodiment of the present invention;

[0032] Figure 8 This is a schematic diagram of a wafer mounting rack in the prior art;

[0033] Figure 9 This is a schematic diagram of the three-dimensional structure of the outer tank body from a first perspective according to the second embodiment of the present invention;

[0034] Figure 10 for Figure 9 A schematic diagram of the enlarged structure at point A;

[0035] Figure 11 This is a schematic diagram of the three-dimensional structure of the outer tank body from a second viewing angle according to the second embodiment of the present invention;

[0036] Figure 12 This is a schematic diagram of the internal structure of the outer tank body according to the second embodiment of the present invention;

[0037] Figure 13 for Figure 12 A schematic diagram of the enlarged structure at point B;

[0038] Figure 14 is a cross-sectional view of a second embodiment of the present invention;

[0039] Figure 15 for Figure 14 Schematic diagram of the enlarged structure at C;

[0040] Figure 16 This is a cross-sectional view of a horizontal plate according to a second embodiment of the present invention;

[0041] Figure 17 This is an exploded view of one side of the inner tank body of the second embodiment of the present invention.

[0042] Reference numerals:

[0043] 1. Outer tank; 2. Discharge valve; 3. Non-contact flow sensor; 4. Pressure sensor; 5. Water inlet pipe; 6. First tee pipe; 7. First pneumatic valve; 8. Second pneumatic valve; 9. Second tee pipe; 10. Spray pipe; 11. Spray nozzle; 12. Liquid level sensor; 13. PFA hose; 14. PVC bubble tube; 15. Inner tank; 16. Water diversion pipe; 17. Drain pipe; 18. Heightening block; 19. Overflow pipe 20. Water inlet hole; 21. Detection chamber; 22. Connecting hole; 23. Servo motor; 24. Transmission rod; 25. Support seat; 26. Crankshaft; 27. Connecting rod; 28. Rotating shaft; 29. ​​Extension plate; 30. Moving plate; 31. Guide rail; 32. Slider; 33. Recessed rack; 34. Synchronous wheel; 35. Synchronous belt; 36. Tensioner; 37. Cross plate; 38. Inclined plate; 39. Adjustment plate; 40. Groove; 41. Connecting column. DETAILED DESCRIPTION

[0044] The present invention is described in detail below, clearly and completely describing the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only some embodiments of the present invention, not all embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0045] The present invention provides a novel QDR tank for wet process by improvement. The technical solution of the present invention is:

[0046] Example 1

[0047] like Figures 1 to 8 As shown, the embodiment of the present invention provides a new QDR tank for wet process, including an outer tank body 1, a padding block 18 is fixed to the bottom of the tank of the outer tank body 1, and an inner tank body 15 is fixed to the top of the padding block 18. It is necessary to supplement here that the outer wall of the inner tank body 15 does not contact the inner wall of the outer tank body 1, and the padding block 18 is used to pad the inner tank body 15, so that the inner tank body 15 is suspended in the outer tank body 1, and the top of the inner tank body 15 is lower than the top of the outer tank body 1, so that the liquid overflowing from the inner tank body 15 can only flow between the outer tank body 1 and the inner tank body 15; two rows of aligned rollers are rotatably installed on the inner walls of both ends of the inner tank body 15, Figure 8 The hanger enters the inner tank 15 along the space between the two rows of aligned rollers, which act as guides.

[0048] There are spray pipes 10 on both sides of the notch of the outer tank body 1, and multiple spray heads 11 connected to the outer side of the spray pipe 10 are fixed;

[0049] A water inlet hole 20 is provided at the bottom of one end of the inner tank 15;

[0050] The outer side of the outer tank body 1 is provided with a water guide component for respectively introducing external water into the two spray pipes 10 and the water inlet hole 20. It is necessary to supplement here that a water pump is independently provided outside the entire device, and the water pump infusion end is connected to the water guide component. The liquid (cleaning liquid) enters the water guide component through the water pump;

[0051] A horizontally arranged PVC bubbling tube 14 is fixed to the bottom of the inner tank body 15, and a PFA hose 13 connected to it is fixed to one end of the PVC bubbling tube 14, and one end of the PFA hose 13 is led out of the inner tank body 15. It is necessary to supplement here that an air pump is independently provided outside the entire device, and the output end of the air pump is connected to the PFA hose 13, and the input end of the air pump is connected to a storage tank containing nitrogen. The nitrogen enters the PFA hose 13 through the air pump, and the PFA hose 13 then introduces the nitrogen into the PVC bubbling tube 14.

[0052] Specifically, in conjunction with Figure 4 As shown, a vertically arranged drain pipe 17 is inserted and fixed at the bottom of the outer tank body 1, one end of the drain pipe 17 is fixed to the bottom of the inner tank body 15 and is connected to the interior of the inner tank body 15, and a drain valve 2 is fixed at the bottom end of the drain pipe 17. After cleaning is completed, the drain valve 2 is opened and the cleaning liquid in the inner tank body 15 flows out from the drain pipe 17.

[0053] Specifically, in conjunction with Figure 4 As shown, an overflow pipe 19 connected to the bottom of the outer tank body 1 is fixed and inserted therein. The overflow pipe 19 does not contact the inner tank body 15. The liquid overflowing from the inner tank body 15 flows between the outer tank body 1 and the inner tank body 15, and then flows out from the overflow pipe 19.

[0054] Specifically, in conjunction with Figure 4 and attached Figure 7 As shown, a detection cavity 21 is fixed on the outside of the inner tank body 15, a liquid level sensor 12 is fixed on the top of the detection cavity 21, and a connecting hole 22 connected to the detection cavity 21 is opened at the bottom of the outer side of the inner tank body 15. The liquid in the inner tank body 15 flows into the detection cavity 21 through the connecting hole 22. The liquid level sensor 12 is used to monitor the water level.

[0055] Specifically, the water guide assembly includes a water inlet pipe 5, one end of which is connected to a first three-way pipe 6, and both ends of the first three-way pipe 6 are fixed with a first pneumatic valve 7 and a second pneumatic valve 8, respectively. One end of the first pneumatic valve 7 and the water inlet hole 20 are jointly fixed with a water diversion pipe 16, and one end of the second pneumatic valve 8 is fixed with a second three-way pipe 9, and both ends of the second three-way pipe 9 are connected to two spray pipes 10, respectively; open the first pneumatic valve 7 and the second pneumatic valve 8, the output end of the external water pump is connected to the water inlet pipe 5, the external water pump introduces cleaning liquid into the water inlet pipe 5, the liquid in the water inlet pipe 5 enters the first three-way pipe 6 for diversion, and the liquid flows into the second three-way pipe 9 and the water diversion pipe 16 respectively, the second three-way pipe 9 diverts the liquid into the two spray pipes 10, the nozzle 11 on the spray pipe 10 is sprayed, and the liquid in the water diversion pipe 16 flows in from the bottom of the inner tank 15, so that the liquid flows from bottom to top.

[0056] Specifically, in conjunction with Figure 2 As shown, a non-contact flow sensor 3 for monitoring flow is fixed on the outside of the water inlet pipe 5 , and a pressure sensor 4 for monitoring water pressure is fixed on the outside of the water inlet pipe 5 , and the detection end of the pressure sensor 4 is located inside the water inlet pipe 5 .

[0057] Working principle:

[0058] The first step is to place the rack with the wafer mounted on it into the inner tank 15;

[0059] In the second step, the first pneumatic valve 7 and the second pneumatic valve 8 are opened. The output end of the external water pump is connected to the water inlet pipe 5. The external water pump introduces the cleaning liquid into the water inlet pipe 5. The liquid in the water inlet pipe 5 enters the first tee pipe 6 for diversion. The liquid flows into the second tee pipe 9 and the water diversion pipe 16 respectively. The second tee pipe 9 diverts the liquid into the two spray pipes 10. The nozzles 11 on the spray pipes 10 spray and wash. The liquid in the water diversion pipe 16 flows into the bottom of the inner tank 15, so that the liquid flows from bottom to top.

[0060] In the third step, while the second step is being implemented, nitrogen enters the PFA hose 13 through the air pump, and the PFA hose 13 then introduces the nitrogen into the PVC bubbling tube 14 for bubbling cleaning;

[0061] In summary, by combining the spraying and bubbling cleaning methods, the bubbling cleaning method in the prior art can clean every corner of the wafer more comprehensively. At the same time, the bubbling cleaning process is short in time and the cleaning is more uniform. Under the synergistic effect of spraying, the liquid in the tank forms turbulence, and the coverage rate of bubbles generated by bubbling on the wafer is increased, thereby improving the cleaning efficiency. The invention forms bubbles by introducing nitrogen into the liquid, that is, the invention utilizes the inert characteristics of nitrogen to prevent oxidation from occurring on the wafer surface.

[0062] Example 2

[0063] Combined with attachment Figure 9 and Figure 17 As shown, based on the novel wet process QDR tank provided in the first embodiment of the present application, the second embodiment of the present application proposes another novel wet process QDR tank. The second embodiment is merely a further embodiment of the first embodiment, and the implementation of the second embodiment will not affect the independent implementation of the first embodiment:

[0064] Specifically, grooves 40 are provided on both sides of the inner groove 15, and an adjustment plate 39 is slidably embedded in the interior of the two grooves 40. The top of the adjustment plate 39 is lower than the top of the groove 40. A reciprocating mechanism is provided on the outer side of the outer groove 1 to enable the two adjustment plates 39 to move back and forth in the grooves 40. The reciprocating mechanism includes two transverse plates 37 and two crankshafts 26. A set of connecting columns 41 are fixed on the outer sides of the two transverse plates 37. The two sets of connecting columns 41 are respectively slidably inserted into the inner groove On both sides of the outer tank 1, two groups of connecting columns 41 are respectively fixed to the two adjusting plates 39. The top of the adjusting plate 39 is provided with an oblique through hole. The inside of the oblique through hole is slidably inserted with an oblique plate 38. The top of the oblique plate 38 is fixed with a recessed frame 33. The recess of the recessed frame 33 is inverted. The other end of the recessed frame 33 is fixed with a movable plate 30. A group of guide rails 31 are fixed on both sides of the outer tank 1. Each group of guide rails 31 is slidably provided with a slider 32 adapted thereto. Each group of sliders 32 is respectively connected to the two movable plates 30. The two extension plates 29 are fixed to the outside of each movable plate 30, and a rotating shaft 28 is installed between the two extension plates 29 for common rotation. A connecting rod 27 is fixed to the outside of the rotating shaft. A circular hole is opened at one end of the connecting rod 27, and the intermediate shafts of the two crankshafts 26 are rotatably installed in the circular hole. Both ends of the crankshaft 26 are fixed with a transmission rod 24 arranged coaxially therewith. A plurality of support seats 25 are rotatably installed on the outside of the transmission rod 24. The support seat 25 is fixed to the outer side of the outer tank body 1. A servo motor 23 is fixed to the outside of the outer tank body 1. The output shaft of the servo motor 23 is coaxially fixed with one of the transmission rods 24. The two transmission rods 24 located on the same end are provided with a synchronization structure that makes the two rotate synchronously. The synchronization structure includes two synchronous wheels 34, a synchronous belt 35 and a tensioner 36. The two synchronous wheels 34 are respectively coaxially fixed with the two transmission rods 24 on the same end. The tensioner 36 is fixed to the outer tank body 1, and the synchronous belt 35 is sleeved on the tensioning ends of the two synchronous wheels 34 and the tensioner 36.

[0065] Working principle:

[0066] While the first embodiment is being carried out, the servo motor 23 is started;

[0067] The servo motor 23 rotates the transmission rod 24 fixed thereto through the output shaft, and the transmission rod 24 drives the crankshaft 26 to rotate. The transmission rod 24 on the crankshaft 26 rotates, and the two transmission rods 24 of the synchronous structure rotate synchronously and in the same direction (the two synchronous wheels 34 and the synchronous belt 35 rotate synchronously and in the same direction, and the tensioner 36 is used to keep the synchronous belt 35 tight). As a result, the two crankshafts 26 rotate synchronously and in the same direction. The crankshaft 26 drives the moving plate 30 through the connecting rod 27, so that the moving plate 30 moves back and forth in a straight line along the guide rail 31 in the up and down direction. The moving plate 30 drives the recessed frame 33 to reciprocate up and down, and the inclined plate 38 on the recessed frame 33 slides in the inclined groove on the cross plate 37. Figure 12 -Attached Figure 17 As can be seen, when the recessed frame 33 moves downward, the inclined plate 38 is inserted into the inclined groove, and the inclined plate 38 pushes the transverse plate 37 toward the inner groove body 15. The transverse plate 37 drives the adjustment plate 39 to move through the connecting column 41. The two adjustment plates 39 are both close to the hanger, and the space between the adjustment plates 39 is set as a cleaning area. At this time, the cleaning area becomes narrower, and the liquid flowing into the cleaning area is squeezed. When the recessed frame 33 is reset, the adjustment plates 39 return to the groove 40.

[0068] Supplementary explanation of the above; when the adjustment plate 39 is reciprocating, the adjustment plate 39 will not be separated from the groove 40, so that the liquid will not be diverted, and both sides of the adjustment plate 39 are in contact with the inner wall of the inner tank 15;

[0069] In summary, it can be seen that the inner tank body 15 is used for the cleaning area in a reciprocating changing state, that is, the volume of the cleaning area can be in a wide and narrow state. When the volume of the cleaning area changes from large to small, the cleaning area becomes narrower, the liquid flow rate is accelerated, the liquid flow rate becomes larger, thereby enhancing the turbulence intensity, flushing the surface of the object, destroying the attachment of stains, the turbulence becomes stronger, the shear force in the turbulence becomes larger, the bubbles are broken into smaller bubbles, so that the specific surface area of ​​the bubbles increases, thereby enhancing the chemical reaction and improving the cleaning efficiency. At the same time, the small bubbles are easier to penetrate into the micropores or gaps. In the process of narrowing, the bubble flow range is smaller, so that more bubbles can contact the wafer, which improves the bubble coverage rate. When the volume of the cleaning area changes from small to large, that is As the cleaning area widens, the liquid flow rate slows down, the shear force in the turbulent flow decreases, and the time that bubbles stay on the surface of the wafer increases. Small bubbles on the wafer surface will merge into large bubbles. According to the law of conservation of energy, the kinetic energy of the liquid decreases, thereby increasing the bubble rupture energy, strengthening the local impact force, improving the stain stripping rate, and further improving the cleaning efficiency; at the same time, the high flow rate flushing in the narrowed area and the bubble impact in the widened area complement each other, reducing energy waste; since the inner tank body 15 is in a reciprocating state for the cleaning area, the liquid in the inner tank body 15 changes periodically, and this periodic change will cause the liquid to generate vortexes. This vortex pattern can improve the liquid penetration efficiency, making it easier to enter the fine gaps in the wafer body, thereby improving the cleaning efficiency.

[0070] The above description is intended to enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein but is intended to conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A novel QDR tank for wet process, comprising an outer tank body (1), characterized in that: A raising block (18) is fixed to the bottom of the outer tank body (1), and an inner tank body (15) is fixed to the top of the raising block (18); Spray pipes (10) are provided on both sides of the notch of the outer tank body (1), and a plurality of spray heads (11) connected thereto are fixed on the outer sides of the spray pipes (10); A water inlet hole (20) is provided at the bottom of one end of the inner tank (15); The outer side of the outer tank (1) is provided with a water guide component for respectively guiding external water into the two spray pipes (10) and the water inlet hole (20); A transversely arranged PVC bubbling tube (14) is fixed to the bottom of the inner tank (15), one end of the PVC bubbling tube (14) is fixed with a PFA hose (13) connected thereto, and one end of the PFA hose (13) is led out of the inner tank (15).

2. The novel wet process QDR tank according to claim 1, characterized in that: A vertically arranged drain pipe (17) is plugged and fixed to the bottom of the outer tank body (1), one end of the drain pipe (17) is fixed to the bottom of the inner tank body (15) and communicates with the interior of the inner tank body (15), and a discharge valve (2) is fixed to the bottom end of the drain pipe (17).

3. The novel wet process QDR tank according to claim 1, characterized in that: An overflow pipe (19) connected to the bottom of the outer tank (1) is fixedly connected, and the overflow pipe (19) does not contact the inner tank (15).

4. The novel wet process QDR tank according to claim 1, characterized in that: A detection cavity (21) is fixed on the outside of the inner tank body (15), a liquid level sensor (12) is fixed on the top of the detection cavity (21), and a communication hole (22) communicating with the detection cavity (21) is opened on the bottom of the outer side of the inner tank body (15).

5. The novel wet process QDR tank according to claim 1, characterized in that: The water guide assembly comprises a water inlet pipe (5), one end of the water inlet pipe (5) is connected to a first three-way pipe (6), the two ends of the first three-way pipe (6) are respectively fixed with a first pneumatic valve (7) and a second pneumatic valve (8), one end of the first pneumatic valve (7) and the water inlet hole (20) are jointly fixed with a water guide pipe (16), one end of the second pneumatic valve (8) is fixed with a second three-way pipe (9), and the two ends of the second three-way pipe (9) are respectively connected to two spray pipes (10).

6. The novel wet process QDR tank according to claim 5, characterized in that: A non-contact flow sensor (3) is fixedly sleeved on the outer side of the water inlet pipe (5).

7. The novel wet process QDR tank according to claim 6, characterized in that: A pressure sensor (4) is fixed on the outside of the water inlet pipe (5), and a detection end of the pressure sensor (4) is located inside the water inlet pipe (5).

8. The novel wet process QDR tank according to any one of claims 1 to 7, characterized in that: Grooves (40) are provided on both sides of the inner groove (15), and adjustment plates (39) are slidably embedded in the interiors of the two grooves (40), with the tops of the adjustment plates (39) being lower than the tops of the grooves (40). A reciprocating mechanism is provided on the outer side of the outer groove (1) to enable the two adjustment plates (39) to move back and forth linearly in the grooves (40).

9. The novel wet process QDR tank according to claim 8, characterized in that: The reciprocating mechanism comprises two transverse plates (37) and two crankshafts (26). A group of connecting columns (41) are fixed on the outer sides of the two transverse plates (37). The two groups of connecting columns (41) are respectively slidably inserted on both sides of the inner tank body (15). The two groups of connecting columns (41) are respectively fixed to two adjusting plates (39). The top of the adjusting plate (39) is provided with an oblique opening. The inside of the oblique opening is slidably inserted with an inclined plate (38). The top of the inclined plate (38) is fixed with a recessed frame (33). The recess of the recessed frame (33) is inverted. The other end of the recessed frame (33) is fixed with a moving plate (30). A group of guide rails (31) are fixed on both sides of the outer tank body (1). Each group of guide rails (31) is slidably sleeved with a slider (32) adapted thereto. Each group of sliders (32) is respectively fixed to the two moving plates (30). Two extension plates (29) are fixed on the outer side of each movable plate (30), and a rotating shaft (28) is installed between the two extension plates (29) for common rotation. A connecting rod (27) is fixed on the outer side of the rotating shaft (28), and a circular hole is opened at one end of the connecting rod (27). The intermediate shafts of the two crankshafts (26) are rotatably installed in the circular hole. Both ends of the crankshaft (26) are fixed with a transmission rod (24) arranged coaxially therewith. A plurality of support seats (25) are rotatably installed on the outer side of the transmission rod (24), and the support seats (25) are fixed to the outer side of the outer tank body (1). A servo motor (23) is fixed on the outer side of the outer tank body (1). The output shaft of the servo motor (23) is coaxially fixed with one of the transmission rods (24). The two transmission rods (24) located on the same end are provided with a synchronization structure for making the two rotate synchronously.

10. The novel wet process QDR tank according to claim 9, characterized in that: The synchronous structure comprises two synchronous wheels (34), a synchronous belt (35) and a tensioner (36). The two synchronous wheels (34) are coaxially fixed to two transmission rods (24) on the same end, the tensioner (36) is fixed to the outer tank (1), and the synchronous belt (35) is sleeved on the tensioning ends of the two synchronous wheels (34) and the tensioner (36).

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