Mesh cloth electrolytic etching equipment

Abstract

The invention relates to the technical field of screen printing, in particular to screen cloth electrolytic etching equipment. The equipment comprises an etching box, the etching box comprises a first box body and a second box body which are sequentially arranged from top to bottom and communicate with each other, a screen printing plate is installed on the top face of the second box body, and metal screen cloth is placed on the screen printing plate; the number of the negative plates is two, and the two negative plates are arranged at the top of the interior of the first box body and the bottom of the interior of the second box body respectively; the number of the anode plates is two, and the two anode plates are arranged at the bottom of the interior of the first box body and the top of the interior of the second box body respectively and used for making contact with metal mesh cloth during etching; the anode of the power supply is connected with the anode plate, and the cathode of the power supply is connected with the cathode plate; and the liquid storage box is communicated with the second box body. By means of the arrangement, the technical problems that in the prior art, chemical etching is sensitive to the environment, the etching rate is not easy to control, materials are prone to being damaged, and environment pollution is caused are effectively solved.

Description

Technical Field

[0001] The invention relates to the technical field of screen printing, in particular to a device for electrolytic etching of mesh cloth. Background Art

[0002] The photovoltaic industry refers to those industries that utilize solar energy for power generation, primarily encompassing the manufacture of solar cells, the assembly of photovoltaic modules, and the application of photovoltaic systems. Screen printing is currently the most common process for producing contact electrodes for solar cells. Metal mesh is typically used as the printing plate substrate in screen printing. However, existing metal meshes are difficult to displace at the mesh knots, making them difficult to stretch during the printing process and unable to meet the requirements of screen printing.

[0003] In this regard, the patent application document with application publication number CN116330813A discloses a screen production process, which first uses a mixed weaving of warp and weft threads of different materials to prepare a metal mesh with a square grid; then the metal mesh is cut into squares, and a pair of opposite sides of the square are parallel to the warp threads, and the other pair of opposite sides are parallel to the weft threads; then an etching solution is used to corrode the warp and weft threads of the metal mesh, so that gaps are generated between the warp and weft threads at the mesh knots; after the corrosion is completed, the metal mesh is cleaned and dried; after drying, a mesh stretching mechanism is used to stretch the grid of the metal mesh from a square to a diamond, and the angle of a pair of acute angles in the diamond grid reaches a predetermined angle; after the stretching is completed, a water-based material is coated on the diamond-shaped metal mesh; finally, the subsequent plate making steps are completed according to the conventional process.

[0004] It can be seen that the above-mentioned screen making process uses etching solution to corrode the warp and weft of the metal mesh. Although this chemical etching method can achieve the purpose of corroding the warp and weft of the metal mesh, it has the following problems during the corrosion process: 1. The etching solution will cause microcracks or stress concentration on the surface of the metal mesh, causing damage such as cracking and leakage of slurry in the plate making process; 2. Chemical etching is sensitive to environmental conditions (such as temperature), which will affect the consistency and repeatability of etching; 3. The etching rate of chemical etching is different on different structures, resulting in anisotropy in the etching process; 4. Chemical etching seriously pollutes the environment and will produce highly volatile substances such as nitric acid, causing environmental pollution; 5. The etching process of chemical etching is difficult to control, and poor etching is prone to occur, resulting in poor straightness of the mesh after plate making, difficulty in film typesetting, and easy cracking at the interface, resulting in leakage during printing and use, which in turn leads to a short printing life. Summary of the Invention

[0005] The invention provides a mesh electrolytic etching device to solve the technical problems in the prior art that chemical etching is sensitive to the environment, the etching rate is difficult to control, and the material is easily damaged, causing environmental pollution.

[0006] In order to solve the above problems, the equipment for electrolytic etching of mesh provided by the present invention adopts the following technical solutions: A device for electrolytic etching of mesh cloth, comprising: The etching box comprises a first box body and a second box body which are sequentially arranged from top to bottom and are connected to each other. A screen is installed on the top surface of the second box body, and a metal mesh is placed on the screen; There are two cathode plates, which are respectively arranged at the top of the first box and the bottom of the second box; Two anode plates are provided, respectively, at the bottom of the first box and at the top of the second box, for contacting the metal mesh during etching; a power supply, the positive electrode of which is connected to the anode plate, and the negative electrode of which is connected to the cathode plate; A liquid storage tank is communicated with the second box body and is used for transporting etching liquid into the second box body and the first box body.

[0007] The beneficial effects of the mesh electrolytic etching equipment provided by the present invention are: First, cathode plates are provided at the top of the first box and the bottom of the second box, and an anode plate is provided at the bottom of the first box and the top of the second box, and a screen is provided between the two anode plates to place the metal mesh and control the contact area between the electrolyte and the etched material. The cathode plate and the anode plate are connected to the negative and positive poles of the power supply respectively. The anode plate is in close contact with the metal mesh during the electrochemical etching process. The anode plate serves as the source of electron outflow, which can ensure that the current is more evenly distributed on the surface of the etched workpiece, thereby improving the uniformity and efficiency of etching and improving the straightness of the screen. Secondly, adding an anode plate in contact with the metal mesh in the etching box can not only promote the circulation and renewal of the etching solution during the etching process, help reduce local overheating and uneven concentration of the etching solution, and further improve the etching effect, but also serve as a sacrificial anode to absorb hydrogen ions or other harmful substances generated during the electrolysis process, protecting the etched workpiece from damage. The anode plate can also cover the screen to prevent the interface on the screen from contacting the etching solution, thereby improving the problem of easy cracking at the interface and increasing the service life of the screen. Thirdly, a cathode plate and an anode plate are arranged in the etching box and connected to a power supply to form a complete electrolytic cell to electrochemically etch the metal mesh. Electrochemical etching is an etching method that relies on the electrochemical reaction generated when current passes through an electrolyte solution. It is mainly controlled by the electric field and current density, and has low sensitivity to environmental factors. By adjusting the output current of the power supply, the current density in the electrochemical etching process can be changed, thereby flexibly changing the etching rate. Finally, the etching liquid is introduced into the etching box through the liquid storage tank. During the electrochemical etching process, the etching liquid is in a sealed state and will not release harmful substances into the environment, thereby greatly reducing pollution to the environment and ensuring the stability of the etching liquid during the etching process.

[0008] Through the above arrangement, the present invention effectively solves the technical problems in the prior art that chemical etching is sensitive to the environment, the etching rate is difficult to control, and it is easy to damage the material and cause environmental pollution.

[0009] Furthermore, the first box body and the second box body are rotatably connected.

[0010] Beneficial effect: The etching box is divided into a first box body and a second box body which are arranged in sequence and connected to each other, and a screen is installed on the top surface of the second box body. The screen is used as a supporting platform for supporting the metal mesh cloth. The first box body and the second box body are rotatably connected. When the mesh cloth needs to be placed, the first box body can be rotated and opened to move it away from the top of the second box body to reveal the mesh cloth. After the mesh cloth is placed, the first box body is rotated to return it to its original position. It is simple and convenient.

[0011] Furthermore, a handle is provided on the first box body to facilitate rotation of the first box body.

[0012] Beneficial effect: The handle provides an operating personnel with a force application point, so that the operating personnel can rotate the first box body with less force, thereby increasing the convenience of rotating the first box body.

[0013] Furthermore, a sealing device is provided on the anode plate to clamp the mesh to prevent the etching solution from leaking.

[0014] Furthermore, the anode plate is a lead plate or a stainless steel plate.

[0015] Furthermore, the cathode plate is a titanium plate.

[0016] Furthermore, a pressure head is provided on the top of the first box body and the bottom of the second box body for pressing the box body so that the metal mesh is closely fitted to the anode plate.

[0017] Beneficial effect: By pressing the first box and the second box tightly with the pressure head, the metal mesh is closely fitted to the anode plate, which enables the current to pass through the entire contact surface more evenly, avoiding the problem of uneven current distribution due to poor contact and ensuring the consistency of etching.

[0018] Furthermore, an etching liquid inlet is provided on the second box body, and the etching liquid inlet is connected to the liquid outlet of the liquid storage tank via a connecting pipe, and a valve is provided on the connecting pipe.

[0019] Furthermore, the etching liquid inlet is opened at the bottom of the second box.

[0020] Beneficial effect: The etching liquid inlet can be used as an inlet for the etching liquid to enter the second box from the liquid storage tank, and can also be used as an inlet for the etching liquid to flow back from the second box to the liquid storage tank. It is arranged at the bottom of the second box, which facilitates the etching liquid in the second box to flow completely back to the liquid storage tank.

[0021] Furthermore, the anode plate and the positive electrode of the power supply are connected via a wire, the cathode plate and the negative electrode of the power supply are connected via a wire, and the two anode plates are also connected via a wire.

[0022] The beneficial effects of the mesh electrolytic etching device provided by the present invention are as follows: by configuring the etching box to include a structure comprising a first box body and a second box body that are sequentially arranged and connected from top to bottom, a cathode plate is provided at the top of the first box body and the bottom of the second box body, an anode plate is provided at the bottom of the first box body and the top of the second box body, and a mesh is provided at the top of the second box body, a metal mesh is placed on the mesh, and during etching, the anode plate is brought into close contact with the metal mesh, thereby ensuring that the current is more evenly distributed on the surface of the etched workpiece, thereby improving the uniformity and efficiency of etching, the anode plate can also serve as a sacrificial anode, absorbing hydrogen ions or other harmful substances generated during the electrolysis process, and protecting the etched workpiece from damage, and introducing etching liquid into the etching box through the liquid storage tank. During the electrochemical etching process, the etching liquid is in a sealed state and will not release harmful substances into the environment, thereby greatly reducing pollution to the environment and ensuring the stability of the etching liquid during the etching process.

[0023] Through the above arrangement, the present invention effectively solves the technical problems in the prior art that chemical etching is sensitive to the environment, the etching rate is difficult to control, and it is easy to damage the material and cause environmental pollution. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The above and other objects, features and advantages of the exemplary embodiments of the present invention will become readily understood by reading the following detailed description with reference to the accompanying drawings. In the accompanying drawings, several embodiments of the present invention are shown in an illustrative and non-limiting manner, and the same or corresponding reference numerals represent the same or corresponding parts, wherein: Figure 1 This is a front view of the equipment for electrolytic etching of mesh provided by the present invention; Figure 2 A top view of the mesh electrolytic etching device provided by the present invention; Figure 3 This is a schematic diagram of the internal structure of the etching box provided by the present invention.

[0025] Description of reference numerals: 1. First box body; 2. Second box body; 3. Screen; 4. Cathode plate; 5. Anode plate; 6. Power supply; 7. Liquid storage tank; 8. Handle; 9. Pressure head; 10. Connecting pipe; 11. Valve; 12. Wire; 13. Support plate; 14. Handle body; 15. Extension rod. DETAILED DESCRIPTION

[0026] The following will be combined with the accompanying drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Those skilled in the art should know that the embodiments described below are part of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts shall fall within the scope of protection of the present invention.

[0027] It should be noted that the main concept of the mesh electrolytic etching equipment provided by the present invention is: the etching box is set to include two interconnected parts, namely a first box body 1 at the top and a second box body 2 at the bottom, the first box body 1 and the second box body 2 are arranged vertically and connected to each other, cathode plates 4 are installed above the inside of the first box body 1 and below the inside of the second box body 2 to form an electric field, anode plates 5 are set at the bottom of the first box body 1 and the top of the second box body 2, and a screen 3 is set at the top of the second box body 2 so that the screen 3 is located between the two anode plates 5, and the metal mesh is placed on the screen 3; when etching is in progress, the anode plates 5 are installed at the top of the second box body 2. The electrode plate 5 is in close contact with the metal mesh to ensure that the current is more evenly distributed on the surface of the etched metal mesh, thereby significantly improving the uniformity and work efficiency of etching. In addition, the anode plate 5 can also serve as a sacrificial anode to effectively absorb hydrogen ions or other potentially harmful substances generated during the electrolysis process, thereby protecting the surface of the etched metal mesh from damage; the entire electrochemical etching process is carried out in a completely sealed environment, so that the etching solution will not leak into the external environment during the etching process, thereby greatly reducing pollution to the environment, and also ensuring the stability of the etching solution throughout the etching process.

[0028] After introducing the basic principles of the present invention, various non-limiting embodiments of the present invention are described in detail below. The numbers of any elements in the drawings are for illustration only and not for limitation, and any names are for distinction only and do not have any limiting meaning.

[0029] The principles and spirit of the present invention are explained in detail below with reference to several representative embodiments of the present invention.

[0030] Chemical etching is a technique that uses chemical reactions to remove materials. Its principle is to selectively etch the workpiece surface through the contact of reagents with the material surface. The chemical reactions involved in this process mainly include oxidation and reduction reactions. Typically, chemical etching uses strong acids, strong bases, or other solutions as etchants. These solutions etch the material surface based on their own corrosive properties, as well as lattice defects in metals and alloys, or differences in corrosion resistance between different components.

[0031] The chemical etching process usually includes the following steps: 1. Design and plate making: Design patterns, text, or shapes based on customer needs or product design requirements, and output the design files into a format suitable for plate making. Plate making involves transferring the designed pattern, text, or shape onto a special material, such as photoresist or silk screen.

[0032] 2. Surface treatment: Clean, degrease, remove rust and oxide layer of metal materials to remove oil, rust, oxide layer and other impurities on the surface to ensure the etching effect.

[0033] 3. Coating photosensitive materials: Coat a layer of photosensitive materials, such as photoresist or photosensitive ink, on the surface of the metal material. The function of the photosensitive material is to absorb the energy of ultraviolet rays or other light sources during the exposure process, and produce a chemical reaction, thereby forming a corrosion-resistant protective film on the surface of the metal material.

[0034] 4. Exposure: Align the metal material with the pattern, text or shape prepared on the plate, and then use ultraviolet light or other light sources to expose the metal material so that the photosensitive material absorbs energy and undergoes a chemical reaction to form a protective film.

[0035] 5. Development: Use developer to dissolve the unexposed photosensitive material to expose the metal surface to be etched.

[0036] 6. Etching: Immerse the metal material in the etching solution so that the metal on the surface of the metal material reacts chemically with the etching solution, thereby being corroded to form the desired pattern, text or shape.

[0037] 7. Cleaning and post-processing: Clean the metal material to remove residual etching solution and photosensitive materials, and then perform post-processing such as passivation, anti-rust treatment, spraying, etc. to improve the corrosion resistance and aesthetics of the metal material.

[0038] Chemical etching is widely used in various fields, such as the manufacture of microelectronic devices, micro-nanostructures, and precision instruments. In microelectronics manufacturing, chemical etching is used to form the structures of components such as transistors and capacitors, as well as to define interconnects and metallization. In micro-nanofabrication, chemical etching is used to create micro-nanostructures such as nano-optical devices, micromechanical systems (MEMS), and nanosensors. Furthermore, chemical etching is used in the manufacture of various common household appliances, components for smart cars, and medical devices.

[0039] The advantage of chemical etching is that it can produce high-precision patterns and text, and it can be mass-produced quickly. However, chemical etching also has some disadvantages, such as the environmental pollution of the etching solution and its difficulty in recycling. Therefore, when using chemical etching technology, strict control of process parameters and environmental protection measures are required to ensure etching results and product quality while reducing environmental pollution.

[0040] While chemical etching, with its simplicity, directness, and relatively low cost, has played an important role in many fields, technological advancements and the increasing demand for precision machining have led to the exploration of more efficient, precise, and controllable etching technologies. It is against this backdrop that electrochemical etching emerged and has gradually become an indispensable part of precision manufacturing.

[0041] Electrochemical etching is based on an electrolytic reaction in an electrolyte solution. The action of an electric current causes anodic dissolution on the workpiece surface, thereby removing the workpiece material and processing the shape. Specifically, the electrochemical etching system mainly consists of an electrolytic cell, a power supply, an electrolyte, the workpiece to be etched (as the anode) and an auxiliary cathode. The workpiece is connected to the positive pole of the power supply as the anode, and the auxiliary cathode is connected to the negative pole of the power supply as the cathode. Both are immersed in the electrolyte to form a complete electrolytic cell.

[0042] When the power is turned on, current flows through the electrolyte, causing the metal atoms on the anode surface to lose electrons, undergoing an oxidation reaction and converting them into ions that enter the electrolyte, thereby dissolving the metal material. At the same time, other components in the electrolyte gain electrons on the cathode surface, undergoing a reduction reaction, completing the electrochemical cycle.

[0043] During the etching process, metal atoms on the anode lose electrons and are oxidized into ions, which are then dissolved in the electrolyte. This process is the main step in electrochemical etching and determines the material removal rate and shape change. At the cathode, certain components in the electrolyte (such as hydrogen ions or oxygen molecules) gain electrons and are reduced. This process usually has no direct effect on the etching process itself, but it helps maintain the chemical balance of the electrolyte and the stability of the current. The electrolyte not only provides a channel for ion conduction, but also affects the etching rate and selectivity through its composition and concentration parameters. By adjusting the composition, concentration and other parameters of the electrolyte, the accuracy and efficiency of the etching process can be controlled.

[0044] For electrochemical etching, the greater the current density, the faster the anode dissolution rate, but excessive current density may also cause problems such as edge effect and over-etching; the voltage determines the magnitude and direction of the current, thereby affecting the etching rate and selectivity. Appropriate voltage can ensure that the current flows stably between the anode and cathode and promote the etching process; the composition of the electrolyte also has an important influence on the etching rate and selectivity. Different electrolyte compositions can be used to etch different metal materials and achieve different etching effects.

[0045] Among them, edge effect refers to the phenomenon of excessive etching or uneven etching at the edge of the material due to the increase in local current density.

[0046] Electrochemical etching has the characteristics of high precision, wide material applicability, environmental friendliness and efficient processing. It is used in microelectronics, MEMS (microelectromechanical systems), integrated circuits, sensors and art production to meet the needs of precision manufacturing.

[0047] However, for this etching method that directly uses the etched workpiece as the anode for electrochemical corrosion, the following problems exist in the actual etching process: 1. Factors such as the shape, thickness, conductivity and surface state of the etched workpiece may affect the flow of current, causing the current to be unevenly distributed on its surface, resulting in inconsistent etching depth, thereby affecting the quality and accuracy of etching; 2. Directly using the etched workpiece as the anode will also increase the risk of over-etching, causing the etching depth to exceed expectations, thereby damaging the structure or performance of the etched workpiece, especially at the edge or tip of the etched workpiece, where over-etching is more likely to occur due to the high current density; 3. During the electrochemical etching process, an oxidation reaction will occur on the anode, causing the anode material to dissolve. However, some materials will not react with the anode under certain conditions. Passivation will also occur, that is, a dense oxide film will be formed on the surface of the anode, which will hinder the further passage of current and the dissolution of the material, which will cause the etching rate to decrease or even stop, seriously affecting the etching efficiency and quality; 4. The etching rate is easily affected by multiple factors such as current density, electrolyte composition, temperature, etc. The workpiece directly used as the anode may be more sensitive to these factors, resulting in fluctuations in the etching rate and affecting the precise control of the etching rate; 5. During the electrochemical etching process, due to the dissolution of the anode and the chemical reaction of the electrolyte, some impurities or sediments may be generated. These impurities or sediments adhere to the surface of the etched workpiece, which will affect the etching quality and subsequent processing, especially when the etched material is an alloy or a metal containing other impurities. This situation is more serious.

[0048] Therefore, it is urgent to provide a new electrochemical etching equipment to ensure the quality and accuracy of etching, thereby ensuring the quality of the workpiece obtained after etching.

[0049] Embodiment 1 of the device for electrolytic etching of mesh provided by the present invention: like Figures 1 to 3 As shown, the equipment for mesh electrolytic etching includes an etching box, a cathode plate 4, an anode plate 5, a power supply 6 and a liquid storage tank 7, wherein the cathode plate 4 and the anode plate 5 are both arranged in the etching box, and the liquid storage tank 7 is connected to the etching box for conveying etching liquid into the etching box.

[0050] The etching box comprises a first box body 1 and a second box body 2 which are arranged in sequence from top to bottom and are connected. A screen 3 is installed on the top surface of the second box body 2.

[0051] Among them, the number of cathode plates 4 is two, and the two cathode plates 4 are respectively arranged at the top inside the first box 1 and the bottom inside the second box 2; the number of anode plates 5 is also two, and the two anode plates 5 are respectively arranged at the bottom of the first box 1 and the top of the second box 2. The two anode plates 5 are connected by wires, and the two anode plates 5 are immersed in the etching solution during operation to make the generated electric field more uniform. Each anode plate 5 is provided with a sealing device to clamp the metal mesh; the liquid storage tank 7 is connected to the second box 2.

[0052] Specifically, the first box body 1 and the second box body 2 are rotatably connected, and two handles 8 arranged at intervals are provided on the first box body 1 to provide force points for the operator, so that the operator can rotate the first box body 1 with less force, thereby increasing the convenience of rotating the first box body 1; an etching liquid inlet is provided at the bottom of the second box body 2, and the etching liquid inlet is connected to the liquid outlet of the liquid storage tank 7 through a connecting pipe 10, and a valve 11 is provided on the connecting pipe 10.

[0053] Specifically, the anode plate 5 is connected to the positive electrode of the power source 6 through the wire 12 , and the cathode plate 4 is connected to the negative electrode of the power source 6 through the wire 12 .

[0054] Specifically, a support plate 13 connected to the bottom of the first box body 1 is provided on the outer periphery thereof, and the two handles 8 are rotatably mounted on the support plate 13 . The handles 8 include a handle body 14 , and a horizontally extending extension rod 15 is provided on the top of the handle body 14 .

[0055] Specifically, the anode plate 5 is a lead plate or a stainless steel plate, the cathode plate 4 is a titanium plate, and the distance between the anode plate 5 and the etching platform is 20 mm.

[0056] Compared with precious metal materials, lead plates have lower costs and higher conductivity, better chemical stability, and stable physical properties. Using lead plates as anode plates 5 can significantly reduce production costs, and can withstand a certain degree of corrosion and erosion, which is beneficial to the transmission of current, thereby improving the efficiency of electrochemical etching.

[0057] Stainless steel plate is a corrosion-resistant material. When used as the anode plate 5, it can maintain good stability in the electrolyte environment and is not easily corroded. A dense oxide film can be formed on its surface. This film has self-healing properties and can protect the internal metal from further corrosion. In addition, stainless steel is a recyclable material. Compared with some anode materials that may produce harmful waste, using stainless steel plate as the anode plate 5 can reduce pollution to the environment and meet the current requirements for environmental protection and sustainable development.

[0058] The titanium plate has good electrical conductivity. Using it as the cathode plate 4 allows the current to flow evenly and effectively through the cathode plate 4 during the electrochemical etching process, thereby improving the efficiency and stability of the electrochemical etching, and the titanium plate can maintain stable performance in various corrosive environments. During the electrochemical etching process, the cathode plate 4 needs to be exposed to the etching solution for a long time. The excellent corrosion resistance of the titanium plate makes it less likely to be corroded during the electrochemical etching process, thereby extending the service life of the cathode plate 4; the titanium plate has high mechanical strength and stability and can withstand various stresses and changes during the electrochemical etching process, so that it can still maintain stable performance during long-term, high-intensity electrochemical etching processes; in addition, titanium is an environmentally friendly material. Using it as the cathode plate 4 in the electrochemical etching process can reduce the negative impact on the environment and meet the requirements of sustainable development.

[0059] Regarding the rotational connection between the first box body 1 and the second box body 2, a side edge at the bottom of the first box body 1 and the corresponding side edge on the second box body 2 are rotatably connected via a rotational connection structure such as a hinge or a hinge. When the metal mesh needs to be placed, the first box body 1 can be rotated open to move it away from the top of the second box body 2 to expose the screen 3. After the metal mesh is placed, the first box body 1 can be rotated to return to its original position. This is simple and convenient.

[0060] In order to ensure that the metal mesh can fit tightly with the anode plate 5 during the etching process, a pressure head 9 is provided at the top of the first box 1 and the bottom of the second box 2. The pressure head 9 is connected to the driving device to press the first box 1 and the second box 2 under the drive of the driving device, so that the metal mesh can fit tightly with the anode plate 5, and the current can pass through the entire contact surface more evenly, avoiding the problem of uneven current distribution due to poor contact, and ensuring the consistency of etching.

[0061] In addition, the etching liquid stored in the liquid storage tank 7 can be ferric chloride etching liquid, ammonium persulfate etching liquid, sulfuric acid-hydrogen peroxide etching liquid, acidic copper chloride etching liquid, alkaline copper chloride etching liquid, anhydrous ethanol solution containing hexadecyltrimethylammonium bromide, nitric acid-hydrofluoric acid mixed acid, etc., to meet the etching requirements of different workpieces, different etching accuracies, etc.

[0062] Among them, ferric chloride etching solution is suitable for large-area corrosion and anti-corrosion, and is suitable for etching copper, copper alloys, iron, zinc, aluminum and other metals; the etching speed and copper dissolving effect of ammonium persulfate etching solution are relatively low, and it is suitable for micro-etching treatment of copper foil surface before graphic electroplating and other occasions requiring fine etching; the solution composition of sulfuric acid-hydrogen peroxide etching solution is simple, and the only product after etching is copper sulfate, which can be regenerated and recycled, reducing waste liquid discharge and environmental pollution, and is widely used in printed circuit board etching; different oxidants can be added to the acidic copper chloride etching solution to achieve continuous etching production of circuit boards.

[0063] It should be noted that the mesh electrolytic etching equipment provided by the present invention is provided with a cathode plate 4 on the top of the first box 1 and the bottom of the second box 2, and an anode plate 5 is provided on the bottom of the first box 1 and the top of the second box 2, and a screen 3 is installed on the top of the second box 2, and the cathode plate 4 and the anode plate 5 are respectively connected to the negative and positive poles of the power supply 6. The anode plate 5 is in close contact with the metal mesh during the electrochemical etching process and can serve as a source of electron outflow, ensuring that the current is more evenly distributed on the surface of the etched workpiece, thereby improving the uniformity and efficiency of etching and improving the straightness of the mesh; during the etching process, the anode plate 5 is in close contact with the metal mesh, which can not only promote the circulation and renewal of the etching solution, but also help reduce local overheating and uneven concentration of the etching solution, further improving the etching effect, and can also use the anode plate 5 as a sacrificial anode to absorb hydrogen ions or other harmful substances generated during the electrolysis process to protect the etched workpiece from damage. The anode plate 5 can also cover the screen 3 so that the interface on the screen 3 is not in contact with the etching solution, thereby improving the problem of easy cracking at the interface and increasing the service life of the screen 3; In addition, by arranging a cathode plate 4 and an anode plate 5 in the etching box and connecting them to a power supply 6 to form a complete electrolytic cell, the metal mesh is electrochemically etched. Electrochemical etching relies on the electrochemical reaction generated when current passes through the electrolyte solution to etch. It is mainly controlled by the electric field and current density, and its sensitivity to environmental factors is low. By adjusting the output current of the power supply 6, the current density during the electrochemical etching process can be changed, thereby flexibly changing the etching rate; the etching liquid is introduced into the etching box through the liquid storage tank 7. During the electrochemical etching process, the etching liquid is in a sealed state and will not release harmful substances into the environment, thereby greatly reducing pollution to the environment and ensuring the stability of the etching liquid during the etching process.

[0064] In addition, it should be noted that the cathode plate 4 can be a dense plate structure or a mesh plate.

[0065] The working principle of the mesh electrolytic etching equipment provided by the present invention is: before etching, first hold the handle 8 to rotate and open the first box 1, place the metal mesh on the screen 3, then hold the handle 8 to rotate the first box 1 to close it. After the first box 1 is closed, open the valve 11 on the connecting pipe 10 to allow the etching liquid in the liquid storage tank 7 to flow into the second box 2 through the connecting pipe 10 and gradually fill the first box 1. After filling, close the valve 11, then turn on the power supply 6, energize the cathode plate 4 and the anode plate 5, and electrochemically etch the metal mesh. After etching is completed, turn off the power supply 6, open the valve 11, and allow the etching liquid to flow back into the liquid storage tank 7.

[0066] Embodiment 2 of the device for electrolytic etching of mesh provided by the present invention: The main difference between it and Example 1 is: In Example 1, two handles arranged at intervals are provided on the first box body.

[0067] In this embodiment, a handle is provided on the first box body.

[0068] Example 3 of the mesh electrolytic etching device provided by the present invention: The main difference between it and Example 1 is: In Example 1, the distance between the anode plate and the etching platform is 20 mm.

[0069] In this embodiment, the distance between the anode plate and the etching platform is determined according to specific etching conditions.

[0070] According to the above description of this specification, those skilled in the art may also understand that the terms used below, such as "up", "down", "front", "back", "left", "right", "width", "horizontal", "top", "bottom", "inside", "outside" and other terms indicating orientation or positional relationships are based on the orientation or positional relationships shown in the drawings of this specification. They are only for the purpose of facilitating the explanation of the scheme of the present invention and simplifying the description, rather than explicitly or implicitly indicating that the devices or elements involved must have the specific orientation, be constructed and operated in a specific orientation. Therefore, the above-mentioned orientation or positional relationship terms cannot be understood or interpreted as limitations on the scheme of the present invention.

[0071] In addition, in the description of this specification, “a plurality of” means at least two, for example, two, three or more, etc., unless otherwise clearly and specifically defined.

Claims

1. A device for electrolytic etching of mesh, characterized in that: include: The etching box comprises a first box body and a second box body which are sequentially arranged from top to bottom and are connected to each other. A screen is installed on the top surface of the second box body, and a metal mesh is placed on the screen; There are two cathode plates, which are respectively arranged at the top of the first box and the bottom of the second box; Two anode plates are provided, respectively, at the bottom of the first box and at the top of the second box, for contacting the metal mesh during etching; a power supply, the positive electrode of which is connected to the anode plate, and the negative electrode of which is connected to the cathode plate; A liquid storage tank is communicated with the second box body and is used for transporting etching liquid into the second box body and the first box body.

2. The mesh electrolytic etching device according to claim 1, characterized in that: The first box body and the second box body are rotatably connected.

3. The mesh electrolytic etching device according to claim 2, characterized in that: The first box body is provided with a handle for rotating the first box body.

4. The device for electrolytic etching of mesh according to any one of claims 1 to 3, characterized in that: The anode plate is provided with a sealing device to clamp the mesh to prevent the etching solution from leaking.

5. The device for electrolytic etching of mesh according to any one of claims 1 to 3, characterized in that: The anode plate is a lead plate or a stainless steel plate.

6. The mesh electrolytic etching device according to claim 5, characterized in that: The cathode plate is a titanium plate.

7. The device for electrolytic etching of mesh according to any one of claims 1 to 3, characterized in that: The top of the first box body and the bottom of the second box body are both provided with a pressing head for pressing the box body so that the metal mesh is closely fitted to the anode plate.

8. The device for electrolytic etching of mesh according to any one of claims 1 to 3, characterized in that: An etching liquid inlet is provided on the second box body, and the etching liquid inlet is connected to the liquid outlet of the liquid storage tank via a connecting pipe, and a valve is provided on the connecting pipe.

9. The mesh electrolytic etching device according to claim 8, characterized in that: The etching liquid inlet is opened at the bottom of the second box.

10. The mesh electrolytic etching device according to any one of claims 1 to 3, characterized in that: The anode plate and the positive electrode of the power supply are connected via a wire, as are the cathode plate and the negative electrode of the power supply. The two anode plates are also connected via a wire.

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