Single crystal furnace process parameter management and control method, system and equipment and storage medium

Abstract

The embodiment of the invention provides a single crystal furnace process parameter management and control method, system and equipment and a storage medium, and relates to the technical field of single crystal production. The method comprises the following steps: acquiring a first process parameter suitable for a target single crystal furnace; generating an auditing task aiming at the first process parameter; obtaining an auditing result corresponding to the auditing task; and under the condition of determining that the first process parameters pass the auditing based on the auditing result, sending target process parameters to a single crystal furnace control system related to the target single crystal furnace, the target process parameters being at least part of the first process parameters. Therefore, full-process automatic management from parameter generation to final issuing is realized, and the risk of technology leakage is reduced.

Description

Technical Field

[0001] The embodiments of the present application relate to the field of single crystal production technology, and in particular to a method, system, equipment and storage medium for controlling process parameters of a single crystal furnace. Background Art

[0002] The current control and management of single crystal furnace process parameters still primarily relies on offline manual configuration and circulation. Typically, process engineers manually create single crystal furnace process parameter recipes based on production requirements. These recipes are then circulated and reviewed electronically among relevant personnel. Once approved, dedicated operators manually enter the recipes into the single crystal furnace control system. During this process, the recipes are easily accessed by unauthorized personnel, posing a high risk of core technology leakage. Summary of the Invention

[0003] The embodiments of the present application provide a method, system, equipment and storage medium for controlling the process parameters of a single crystal furnace to reduce the risk of leakage of core technologies.

[0004] In a first aspect, an embodiment of the present application provides a method for controlling process parameters of a single crystal furnace, the method comprising:

[0005] Acquiring first process parameters applicable to a target single crystal furnace;

[0006] generating an audit task for the first process parameter;

[0007] Get the audit results corresponding to the audit task;

[0008] When it is determined based on the audit result that the first process parameters pass the audit, target process parameters are sent to a single crystal furnace control system related to the target single crystal furnace, where the target process parameters are at least part of the first process parameters.

[0009] In one embodiment, after sending the target process parameters to the single crystal furnace control system related to the target single crystal furnace, the method further includes:

[0010] Acquiring a second process parameter from the single crystal furnace control system, where the second process parameter is a parameter actually received by the single crystal furnace control system and corresponds to the target process parameter;

[0011] In the case that the target process parameters are inconsistent with the second process parameters, the process parameters in the target process parameters that are inconsistent with the second process parameters are resent to the single crystal furnace control system.

[0012] In one embodiment, after resending the process parameters in the target process parameters that are inconsistent with the second process parameters to the single crystal furnace control system, the method further includes:

[0013] Acquiring a third process parameter from the single crystal furnace control system, where the third process parameter is a parameter actually received by the single crystal furnace control system and corresponds to the target process parameter;

[0014] When the target process parameter and the third process parameter are inconsistent, an alarm message is generated and output, and the alarm message is used to indicate that the process parameter is abnormal.

[0015] In one embodiment, the above method is applied to a parameter control system;

[0016] Before generating the audit task for the first process parameter, it also includes:

[0017] generating a first version number for the first process parameter;

[0018] The first process parameter and the first version number are associated and stored in a parameter management and control system.

[0019] In one embodiment, the above method further comprises:

[0020] Verifying the first process parameter using a preset verification mechanism;

[0021] Generating a first version number for the first process parameter includes:

[0022] When the first process parameter passes the verification, a first version number is generated for the first process parameter.

[0023] In one embodiment, a fourth process parameter is stored in the parameter control system, and the fourth process parameter is a previous version parameter of the first process parameter;

[0024] The target process parameter is determined based on the difference between the first process parameter and the fourth process parameter.

[0025] In one embodiment, the above method is applied to a parameter control system, in which user authority information is configured;

[0026] The above method further includes:

[0027] Determining a target user for reviewing the first process parameter based on the user authority information;

[0028] Output the audit task to the target user.

[0029] In one embodiment, the target user includes multiple users at different levels;

[0030] Output audit tasks to target users, including:

[0031] Output the audit tasks to the above multiple users simultaneously.

[0032] In one embodiment, sending target process parameters to a single crystal furnace control system associated with a target single crystal furnace includes:

[0033] Encrypt the target process parameters to obtain ciphertext parameters;

[0034] Send encrypted parameters to the single crystal furnace control system.

[0035] In one embodiment, after sending the target process parameters to the single crystal furnace control system related to the target single crystal furnace, the method further includes:

[0036] Obtaining production data of a target single crystal furnace under target process parameters;

[0037] The first prediction model is used to predict the parameter values ​​of the control parameters of the target single crystal furnace at a set time point in the future based on the production data.

[0038] In one embodiment, the above method further comprises:

[0039] Utilizing the second prediction model, optimizing the parameter value of the first process parameter to generate a parameter optimization result;

[0040] Based on the parameter optimization results, parameter adjustment suggestions are generated and output.

[0041] In a second aspect, an embodiment of the present application provides a parameter control system, including:

[0042] a parameter configuration module, configured to obtain a first process parameter applicable to a target single crystal furnace;

[0043] an audit management module, configured to generate an audit task for the first process parameter and obtain an audit result corresponding to the audit task;

[0044] The parameter sending module is configured to send target process parameters to the single crystal furnace control system related to the target single crystal furnace when it is determined based on the audit result that the first process parameters have passed the audit. The target process parameters are at least part of the first process parameters.

[0045] In a third aspect, an embodiment of the present application provides a computer device comprising a memory and a processor, wherein a computer program is stored in the memory, and when the processor executes the computer program, a method for controlling the process parameters of a single crystal furnace as described in any implementation method in the first aspect is implemented.

[0046] In a fourth aspect, an embodiment of the present application provides a computer-readable storage medium having a computer program stored thereon. When the computer program is executed by a processor, the method for controlling the process parameters of a single crystal furnace as described in any implementation method in the first aspect is implemented.

[0047] In a fifth aspect, an embodiment of the present application provides a computer program product, including a computer program / instruction, which, when executed by a processor, implements a method for controlling single crystal furnace process parameters as described in any implementation method in the first aspect.

[0048] In a sixth aspect, an embodiment of the present application provides a single crystal product, which is prepared by a crystal pulling process, and the crystal pulling process includes a method for controlling the process parameters of a single crystal furnace as described in any implementation method of the first aspect.

[0049] The solution provided in the embodiment of the present application supports configuring the first process parameters applicable to the target single crystal furnace in the parameter control system. After obtaining the first process parameters, the parameter control system can generate an audit task for the first process parameters, and then obtain the audit results corresponding to the audit tasks. Then, when it is determined based on the audit results that the first process parameters have passed the audit, the target process parameters are sent to the single crystal furnace control system related to the target single crystal furnace. The target process parameters are at least part of the parameters in the first process parameters. This solution realizes the full process automation management from parameter generation to final issuance, reducing the risk of technology leakage. In addition, the automated process significantly shortens the cycle from parameter formulation to actual application, saves parameter circulation time, can significantly improve parameter control efficiency, and ensure system stability, and can also reduce human errors and labor costs, thereby improving the efficiency and stability of the crystal pulling process, promoting quality control of the single crystal product production process, and improving the purity of the final single crystal product and quality control indicators such as consistency with the seed crystal orientation. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] The following detailed description of the specific embodiments of the present application in conjunction with the accompanying drawings will make the technical solutions and other beneficial effects of the present application apparent.

[0051] Figure 1 is a schematic diagram of an application scenario in which the embodiment of the present application can be applied;

[0052] Figure 2 This is a flow chart of a method for controlling process parameters of a single crystal furnace in an embodiment of the present application;

[0053] Figure 3 This is another flow chart of the method for controlling the process parameters of a single crystal furnace in an embodiment of the present application;

[0054] Figure 4 This is another flow chart of the method for controlling the process parameters of a single crystal furnace in an embodiment of the present application;

[0055] Figure 5 This is a structural diagram of the parameter control system in the embodiment of the present application;

[0056] Figure 6 It is another structural diagram of the parameter control system in the embodiment of the present application.

[0057] Figure numerals: 11-parameter control system, 12-single crystal furnace control system, 110-parameter configuration module, 111-audit management module, 112-parameter issuance module, 113-data analysis module, 114-AI optimization engine, 115-authority management module. DETAILED DESCRIPTION

[0058] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the embodiments described are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without making creative efforts are within the scope of protection of this application.

[0059] In the description of this application, it should be noted that, unless otherwise specified or limited, the term "and / or" herein is merely a description of an association relationship between associated objects, indicating that three possible relationships exist. For example, "A and / or B" can represent: A exists alone, A and B exist simultaneously, and B exists alone. Furthermore, the character " / " herein, unless otherwise specified, generally indicates that the associated objects are in an "or" relationship.

[0060] As mentioned above, the current control method for single crystal furnace process parameters still relies primarily on offline manual circulation and configuration. Typically, process engineers manually compile the process parameter formula for the single crystal furnace based on production requirements. The process parameter formula is circulated and reviewed among relevant personnel in the form of an electronic document. Once approved, a dedicated operator manually enters the process parameter formula into the single crystal furnace control system. During the circulation process, the process parameter formula is easily accessed by unauthorized personnel, posing a high risk of core technology leakage.

[0061] The embodiments of the present application provide a method, system, equipment and storage medium for controlling the process parameters of a single crystal furnace to reduce the risk of leakage of core technologies.

[0062] Figure 1 The figure is a schematic diagram of an application scenario in which the embodiments of the present application can be applied. The application scenario includes a parameter control system 11 and a single crystal furnace control system 12 that communicates with the parameter control system 11. The single crystal furnace control system 12 is used to control a target single crystal furnace. The target single crystal furnace can be one or more single crystal furnaces, which is not specifically limited here.

[0063] Parameter control system 11 can be a distributed microservices platform built using the SpringCloud framework. Spring Cloud is an open-source microservices framework based on Spring Boot that is used to quickly build distributed systems. It provides a series of tools and components to help developers address common challenges in microservices architectures, such as service discovery, configuration management, load balancing, circuit breakers, and gateway routing. With Spring Cloud, developers can split monolithic applications into multiple small, autonomous services and simplify communication and coordination between them.

[0064] The parameter management and control system 11 has functions such as parameter configuration, parameter audit management and parameter distribution. In practice, the functions such as parameter configuration, parameter audit management, and parameter distribution can be modularly designed in the parameter management and control system 11 to ensure the high availability and horizontal scalability of the system. In addition, in the parameter management and control system 11, components such as the API (Application Programming Interface) gateway and the service registry can be combined to achieve efficient communication and load balancing between modules. Among them, the API gateway is the unified entrance for all client requests, responsible for routing, filtering and converting requests. The service registry is one of the core components in the microservice architecture, mainly used to manage the registration, discovery and status maintenance of microservice instances, and solve the dynamic communication problem between microservices.

[0065] Figure 2 This is a flow chart of a method for controlling process parameters of a single crystal furnace in an embodiment of the present application. The method is applied to the parameter control system 11 and includes the following steps:

[0066] S201: Acquire first process parameters applicable to a target single crystal furnace;

[0067] S203: generating an audit task for the first process parameter;

[0068] S205: Obtain the audit result corresponding to the audit task;

[0069] S207: When it is determined based on the audit result that the first process parameters have passed the audit, target process parameters are sent to the single crystal furnace control system 12 related to the target single crystal furnace, where the target process parameters are at least part of the first process parameters.

[0070] Figure 2The solution provided by the corresponding embodiment supports configuring the first process parameters applicable to the target single crystal furnace in the parameter control system 11. After obtaining the first process parameters, the parameter control system 11 can generate an audit task for the first process parameters, and then obtain the audit results corresponding to the audit tasks. Then, based on the audit results, when it is determined that the first process parameters have passed the audit, the target process parameters are sent to the single crystal furnace control system 12 related to the target single crystal furnace. The target process parameters are at least part of the parameters in the first process parameters. This solution realizes the full process automation management from parameter generation to final issuance, reducing the risk of technology leakage. In addition, the automated process significantly shortens the cycle from parameter formulation to actual application, saves parameter circulation time, can significantly improve parameter control efficiency, and ensure system stability, and can also reduce human errors and labor costs.

[0071] Next, steps S201 to S207 are described.

[0072] In step S201, a first process parameter suitable for the target single crystal furnace is obtained. For example, the first process parameter may include seeding parameters (such as seed size, welding time and other parameters), shoulder release parameters (such as shoulder angle control, shoulder length and other parameters), isodiameter parameters (diameter tolerance, length control and other parameters), finishing parameters (such as finishing length and other parameters), etc. The first process parameter can be imported into the parameter control system 11 by a process engineer, or manually input in the parameter control system 11, or obtained by modifying the historical process parameters stored in the parameter control system 11. The process engineer can be called a process R&D personnel and is a user of the parameter control system 11. It should be pointed out that the parameter control system 11 can support batch parameter processing, such as supporting the modification of multiple parameters at one time and issuing them in batches, which can greatly improve work efficiency.

[0073] In one embodiment, the parameter control system 11 can provide a user-friendly parameter configuration interface, through which the process engineer can import the first process parameters, or manually input the first process parameters on the interface, or modify the historical process parameters in the interface to obtain the first process parameters.

[0074] After completing the configuration of the first process parameters, the process engineer can submit the first process parameters to the parameter control system 11. The parameter control system 11 can then obtain the first process parameters and proceed to step S203. Furthermore, to ensure the legitimacy of the first process parameters, the parameter control system 11 can employ a preset verification mechanism to verify the first process parameters. If the first process parameters pass the verification, step S203 is executed. The verification mechanism can be one or more verification mechanisms. These multiple verification mechanisms may include multiple items such as value range verification, unit check, and format check.

[0075] In step S203, an audit task for the first process parameter is generated, thereby automatically triggering the parameter audit process.

[0076] In practice, the parameter control system 11 may store the first process parameters, and the audit task may include information such as the storage location of the first process parameters. In one example, the audit task may be an automatic audit task, which may be output to an audit system responsible for automatic audit. The audit system may audit the first process parameters according to preset audit rules and return the audit results. In another example, the audit task may be a manual audit task, which may be output to a target user responsible for manual audit. The target user may manually audit the first process parameters in the parameter control system 11 and provide feedback on the audit results.

[0077] In one embodiment, the parameter control system 11 is configured with user authority information, and the target user for auditing the first process parameter can be determined based on the user authority information, and then the audit task can be output to the target user. Furthermore, the target user can include multiple users of different levels. As an implementation method, the audit tasks can be output to the multiple users in order from high to low levels to conduct a serial audit of the first process parameter. As another implementation method, the audit tasks can be output to the multiple users at the same time to conduct a parallel audit of the first process parameter, thereby providing a parallel audit mechanism, shortening the audit time, and effectively improving the efficiency of parameter auditing. In addition, by configuring user authority information, multi-role authority control can be supported. By sending audit tasks to the multiple users at different levels, multi-level auditing can be achieved to ensure the accuracy and security of the parameters.

[0078] In step S205, the audit result corresponding to the audit task is obtained. Subsequently, whether the first process parameter has passed the audit can be determined based on the audit result. It should be noted that if the audit system is multiple audit systems or the target user is multiple users, the audit result is multiple audit results. If all of the multiple audit results indicate that the audit has passed, the first process parameter is determined to have passed the audit. If any of the multiple audit results indicates that the audit has failed, the first process parameter is determined to have failed the audit.

[0079] If the first process parameters fail the review, they can be returned to the user who submitted them. In one example, if the first process parameters are obtained through batch parameter modification and the review results indicate that the parameters are outside a reasonable range, the first process parameters are returned to the person who modified them, with the parameter being marked as unreasonable. If the first process parameters pass the review, step S207 can be executed. Furthermore, the parameter control system 11 can generate and store review records for the first process parameters, ensuring traceability of the review records.

[0080] In step S207, if the first process parameter is determined to have passed the review based on the review result, target process parameters are sent to the single crystal furnace control system 12. The target process parameters are at least part of the first process parameters. In one example, the target process parameters may be the first process parameters.

[0081] In one embodiment, a WebSocket-based real-time communication protocol can be used to send target process parameters to the single crystal furnace control system 12 to achieve efficient and low-latency information transmission. WebSocket is a real-time communication protocol that implements full-duplex communication over a single TCP (Transmission Control Protocol) connection.

[0082] Due to the characteristics of single crystal furnace equipment, process parameters are usually issued before the process steps to take effect. At the same time, the parameters cannot be modified arbitrarily in the equal diameter process step, otherwise it will cause bud breakage and other situations. Therefore, the parameters must be issued during the window period that meets the parameter modification. Based on this, in one embodiment, the parameter modification conditions can be preset. After determining that the first process parameter has passed the review, the process step currently executed by the target single crystal furnace can be obtained, and based on the process step, it is determined whether the parameter modification conditions are currently met. If it is determined that the process step currently meets the parameter modification conditions, the target process parameters are sent to the single crystal furnace control system 12.

[0083] In practice, the process parameters of the single crystal furnace are sensitive information. In order to ensure the security of the parameters during transmission, in one embodiment, the target process parameters can be encrypted to obtain ciphertext parameters, and then the ciphertext parameters are sent to the single crystal furnace control system 12. For example, an encryption protocol can be agreed upon between the parameter management and control system 11 and the single crystal furnace control system 12, and the encryption protocol includes but is not limited to the TLS / SSL encryption protocol. In the case where the encryption protocol is the TLS / SSL encryption protocol, the AES-256 standard can be used to encrypt the transmitted target process parameters. Among them, TLS / SSL is a security protocol framework for network communication, and TLS (Transport Layer Security) and its predecessor SSL (Secure Sockets Layer) are security protocol stacks for network communication, which are used to establish an encrypted channel between the client and the server to ensure the confidentiality, integrity and authentication of data transmission. AES-256 is a commonly used algorithm in the data encryption stage of the TLS / SSL protocol, which is responsible for encrypting the transmitted plaintext data.

[0084] In one embodiment, after sending the target process parameters to the single crystal furnace control system 12, the following steps may be performed: obtaining production data of the target single crystal furnace under the target process parameters; and using a first prediction model, based on the production data, predicting the values ​​of the control parameters of the target single crystal furnace at a set future time point. These control parameters may include, for example, power, pulling speed, and furnace pressure. The prediction results can be used to optimize the production process.

[0085] The first prediction model can be implemented based on LSTM (Long Short-Term Memory Network) or Random Forest. LSTM is a special recurrent neural network (RNN) specifically designed to solve the long-term dependency problem of traditional RNN (such as the difficulty in capturing long-distance dependencies in a sequence). Random Forest is a powerful ensemble learning algorithm that can be used for classification and regression tasks. It builds a model by combining multiple decision trees to improve prediction accuracy and robustness while reducing the risk of overfitting. In addition, the first prediction model can be trained based on the historical production data of the single crystal furnace. The historical production data may include relevant factors affecting single crystal pulling, such as process name, crystal length, process steps, pulling speed, power, furnace pressure, rotation speed, thermal field, etc.

[0086] In one embodiment, a first process parameter can be compared with other process parameters. Based on the comparison results, a visual report can be generated and output. The visual report can include parameter differences, difference locations, and improvement measures. The other process parameters can include, but are not limited to, the previous version of the first process parameter. This can provide excellent support for process optimization.

[0087] In one embodiment, a second prediction model can be used to optimize the parameter values ​​of the first process parameters to generate parameter optimization results, and then based on the parameter optimization results, parameter adjustment suggestions are generated and output. In this way, a better parameter combination can be predicted, and executable parameter adjustment suggestions for specific process steps can be generated to achieve real-time process optimization driven by AI (Artificial Intelligence). Among them, the second prediction model can be based on historical process parameters, analyze the data results of multiple single crystal furnaces such as bud breaking and expansion, and thus infer the optimization suggestions for the first process parameters.

[0088] In one embodiment, if the audit result corresponding to the audit task indicates that it is impossible to determine whether the parameter settings are reasonable, the first process parameters can be published as a test version in the form of experimental parameters and sent to the single crystal furnace control system 12. The first process parameters can be reversely optimized based on actual pulling conditions until production conditions are met. The first process parameters that meet the production conditions are then converted into a release version (approved), and the release version of the first process parameters can then be sent to the single crystal furnace control system 12. In this way, the accuracy of the parameters can be ensured.

[0089] In a real-time manner, an operation log may be generated for all operation behaviors of the parameter control system 11 related to the first process parameter, and the operation log may be stored to facilitate security auditing and problem tracing.

[0090] Figure 3 This is another flow chart of the method for controlling the process parameters of a single crystal furnace in an embodiment of the present application. The method is applied to the parameter control system 11 and includes the following steps:

[0091] S301: Acquire first process parameters applicable to a target single crystal furnace;

[0092] S305: Generate a first version number for the first process parameter;

[0093] S307: Associate the first process parameter and the first version number and store them in the parameter management and control system 11;

[0094] S309: generating an audit task for the first process parameter;

[0095] S311: Obtain the audit result corresponding to the audit task;

[0096] S313: If it is determined based on the audit result that the first process parameter passes the audit, a target process parameter is determined based on a difference between the first process parameter and a fourth process parameter stored in the parameter control system 11; wherein the fourth process parameter is a parameter of a previous version of the first process parameter;

[0097] S315: Sending target process parameters to the single crystal furnace control system 12 related to the target single crystal furnace.

[0098] Figure 3 The solution provided by the corresponding embodiment can realize parameter version control by generating a first version number for the first process parameter and associating the first process parameter with the first version number and storing it in the parameter control system 11. In addition, by determining the target process parameter based on the difference between the first process parameter and the fourth process parameter stored in the parameter control system 11, and sending the target process parameter to the single crystal furnace control system 12, the parameters can be dynamically issued, and the incremental update strategy is adopted to only transmit the changed parameter content, which can effectively save network bandwidth and communication time. In addition, the solution realizes the full process automation management from parameter generation to final issuance, reducing the risk of technology leakage. The automated process significantly shortens the cycle from parameter formulation to actual application, saves parameter circulation time, can significantly improve parameter control efficiency, and ensure system stability, and can also reduce human errors and labor costs.

[0099] Next, the above steps S301 to S315 are described.

[0100] In step S301, a first process parameter suitable for a target single crystal furnace is obtained. Detailed implementation of step S301 can be found in the above description and will not be repeated here.

[0101] After executing step S301, step S305 may be executed. Alternatively, Figure 3 The corresponding embodiment may further include step S303. In order to ensure the legality of the first process parameters, after executing step S301, step S303 may be executed first to use a preset verification mechanism to verify the first process parameters, and if the first process parameters pass the verification, step S305 may be executed.

[0102] In step S305, a first version number is generated for the first process parameter. The parameter control system 11 may be configured with a version number generation algorithm. The parameter control system 11 may use the version number generation algorithm to generate a new version number unique within the parameter control system 11 and assign the new version number as the first version number to the first process parameter. In one example, the parameter control system 11 stores a fourth process parameter, which is the previous version of the first process parameter. The first version number may be generated by incrementing the second version number of the fourth process parameter.

[0103] In step S307, the first process parameter and the first version number are associated and stored in the parameter control system 11. Furthermore, the parameter control system 11 may include a distributed database, and the first process parameter and the first version number may be associated and stored in the distributed database. The distributed database can be implemented based on at least one database among MySQL, StarRocks and Redis. Among them, MySQL is a relational database that supports structured data storage. StarRocks is a new generation of extremely fast analytical database, based on the MPP (massive parallel processing) architecture, designed for real-time analysis of massive data. Redis is an in-memory key-value storage database, based on the key-value pair (Key-Value) model, and data is stored in memory by default (can be persisted to disk). In addition, a metadata management system can be established in the parameter control system 11 to facilitate rapid retrieval and association.

[0104] In one embodiment, a historical version library can be established in the parameter control system 11. After storing the first process parameter, for example, the fourth process parameter as described above can be stored in the historical version library. By establishing a historical version library, parameter tracing and recovery can be facilitated. In addition, the change history can be recorded through the Git-style version management mechanism to ensure traceability. The Git-style version management mechanism is a distributed version control system (DVCS) that distributes the power of version control to each developer's local repository, and realizes fast branching, merging and local operations through efficient object storage and reference mechanisms.

[0105] In step S309, an audit task for the first process parameter is generated. Thereafter, step S311 may be executed to obtain the audit result corresponding to the audit task. For explanations of steps S309 and S311, please refer to the relevant descriptions above and will not be repeated here.

[0106] In step S313, if the first process parameter is determined to have passed the review based on the audit results, a target process parameter is determined based on the difference between the first process parameter and a fourth process parameter stored in the parameter control system 11; the fourth process parameter is the previous version of the first process parameter. Subsequently, step S315 is executed to send the target process parameter to the single crystal furnace control system 12. The specific execution timing of step S315 can be found in the previous description and will not be repeated here.

[0107] Furthermore, based on the difference between the first process parameter and the fourth process parameter, a differentiated update package including the target process parameter may be generated, and the differentiated update package may be sent to the single crystal furnace control system 12 .

[0108] Figure 4 This is another flow chart of the method for controlling the process parameters of a single crystal furnace in an embodiment of the present application. The method is executed by the parameter control system 11 and includes the following steps:

[0109] S401: Acquire first process parameters applicable to a target single crystal furnace;

[0110] S403: Generate an audit task for the first process parameter;

[0111] S405: Obtain the audit result corresponding to the audit task;

[0112] S407: If it is determined based on the audit result that the first process parameters have passed the audit, sending target process parameters to a single crystal furnace control system related to the target single crystal furnace, where the target process parameters are at least part of the first process parameters;

[0113] S409: Acquire a second process parameter from the single crystal furnace control system 12 , where the second process parameter is a parameter actually received by the single crystal furnace control system 12 and corresponds to the target process parameter;

[0114] S411: Determine whether the target process parameter and the second process parameter are consistent;

[0115] S413: When the target process parameters and the second process parameters are inconsistent, resending the target process parameters that are inconsistent with the second process parameters to the single crystal furnace control system 12;

[0116] S415: Acquire a third process parameter from the single crystal furnace control system 12 , where the third process parameter is a parameter actually received by the single crystal furnace control system 12 and corresponds to the target process parameter;

[0117] S417: Determine whether the target process parameter is consistent with the third process parameter;

[0118] S419: When the target process parameter and the third process parameter are inconsistent, an alarm message is generated and output, where the alarm message is used to indicate that the process parameter is abnormal.

[0119] The target process parameters that are inconsistent with the second process parameters are process parameters not included in the second process parameters. In step S413 , each target process parameter that is not included in the second process parameter may be resent to the single crystal furnace control system 12 .

[0120] It should be noted that, when it is determined that the target process parameters and the second process parameters are consistent by executing step S411, it can be known that all parameters in the target process parameters are successfully issued, and the process can be terminated. Figure 4 In addition, when the target process parameters are determined to be consistent with the third process parameters by executing step S417, it can be known that all parameters in the target process parameters are successfully issued, so the control process can be ended. Figure 4 The execution of the control process shown does not require the execution of step S419.

[0121] In step S419, for example, an alarm message can be output to the single crystal furnace control system 12 and the operators of the target single crystal furnace. This allows the remote centralized control operator to manually press a button via the DE (Digital Engineering) platform to confirm the anomaly and simultaneously check for any anomalies in the furnace hardware. In practice, the DE platform is primarily responsible for single crystal data collection and analysis, intelligent control of single crystal furnace equipment, and control and maintenance of the crystal pulling model.

[0122] Figure 4 The solution provided by the corresponding embodiment obtains the second process parameter from the single crystal furnace control system 12, and when the target process parameter and the second process parameter are inconsistent, the process parameter in the target process parameter that is inconsistent with the second process parameter is resent to the single crystal furnace control system 12, so that the reverse verification method can be used to perform parameter verification, ensuring that the parameter is consistent with the target single crystal furnace after successful issuance, and can reduce human operational errors and significantly reduce the abnormal rate of parameter issuance. In addition, by obtaining the third process parameter from the single crystal furnace control system 12, and generating and outputting an alarm message when the target process parameter and the third process parameter are inconsistent, an abnormal alarm push mechanism can be provided to ensure production safety. In addition, the solution realizes full-process automated management from parameter generation to final issuance, reducing the risk of technology leakage. The automated process significantly shortens the cycle from parameter formulation to actual application, saves parameter circulation time, can significantly improve parameter management efficiency, ensure system stability, and reduce human errors and labor costs.

[0123] Next, combine Figure 5 、 Figure 6 , introduces the system structure of the parameter control system 11 in the embodiment of the present application. Among them, Figure 5 and Figure 6 Both are structural diagrams of the parameter control system 11.

[0124] like Figure 5 、 Figure 6 As shown, the parameter control system 11 includes:

[0125] The parameter configuration module 110 is configured to obtain a first process parameter applicable to a target single crystal furnace;

[0126] The audit management module 111 is configured to generate an audit task for the first process parameter and obtain an audit result corresponding to the audit task;

[0127] The parameter sending module 112 is configured to send target process parameters to the single crystal furnace control system 12 related to the target single crystal furnace when it is determined based on the audit result that the first process parameters have passed the audit. The target process parameters are at least part of the first process parameters.

[0128] In one embodiment, the parameter delivery module 112 is further configured to:

[0129] After sending the target process parameter to the single crystal furnace control system 12, obtaining the second process parameter from the single crystal furnace control system 12, where the second process parameter is a parameter corresponding to the target process parameter actually received by the single crystal furnace control system 12;

[0130] In the case that the target process parameters are inconsistent with the second process parameters, the process parameters in the target process parameters that are inconsistent with the second process parameters are resent to the single crystal furnace control system 12 .

[0131] In one embodiment, the parameter delivery module 112 is further configured to:

[0132] After the process parameters that are inconsistent with the second process parameters among the target process parameters are resent to the single crystal furnace control system 12, a third process parameter is obtained from the single crystal furnace control system 12, where the third process parameter is a parameter that is actually received by the single crystal furnace control system 12 and corresponds to the target process parameter;

[0133] When the target process parameter and the third process parameter are inconsistent, an alarm message is generated and output, and the alarm message is used to indicate that the process parameter is abnormal.

[0134] In one embodiment, the parameter configuration module 110 is further configured to:

[0135] generating a first version number for the first process parameter;

[0136] The first process parameter and the first version number are associated and stored in a parameter management and control system.

[0137] In one embodiment, the parameter configuration module 110 is further configured to:

[0138] Verifying the first process parameter using a preset verification mechanism;

[0139] When the first process parameter passes the verification, a first version number is generated for the first process parameter.

[0140] In one embodiment, the parameter control system 11 stores a fourth process parameter, which is a previous version parameter of the first process parameter;

[0141] The target process parameter is determined based on the difference between the first process parameter and the fourth process parameter.

[0142] In one embodiment, the parameter control system 11 is configured with user authority information;

[0143] The audit management module 111 is further configured to:

[0144] Determining a target user for reviewing the first process parameter based on the user authority information;

[0145] Output the audit task to the target user.

[0146] It should be noted that the parameter control system 11 may include: Figure 6 As shown in the authority management module 115 , user authority information can be stored in the authority management module 115 , and the audit management module 111 can determine a target user for auditing the first process parameter based on the user authority information through the authority management module 115 .

[0147] In one embodiment, the target user includes multiple users at different levels;

[0148] The audit management module 111 may be further configured to:

[0149] Output the audit tasks to the above multiple users simultaneously.

[0150] In one embodiment, the parameter delivery module 112 may be further configured to:

[0151] Encrypt the target process parameters to obtain ciphertext parameters;

[0152] Send the encrypted parameters to the single crystal furnace control system 12.

[0153] In one embodiment, the parameter control system 11 may further include: Figure 6The data analysis module 113 shown may be configured to:

[0154] Obtaining production data of a target single crystal furnace under target process parameters;

[0155] The first prediction model is used to predict the parameter values ​​of the control parameters of the target single crystal furnace at a set time point in the future based on the production data.

[0156] Furthermore, the first prediction model can be trained by the data analysis module 113 based on historical single crystal furnace production data. Furthermore, the data analysis module 113 can compare the first process parameter with other process parameters and, based on the comparison results, generate and output a visual report. This visual report can include parameter differences, their locations, and improvement measures. The other process parameters can include, but are not limited to, the previous version of the first process parameters. This provides excellent support for process optimization.

[0157] In one embodiment, the parameter control system 11 may further include: Figure 6 The AI ​​optimization engine 114 shown may be configured to:

[0158] Utilizing the second prediction model, optimizing the parameter value of the first process parameter to generate a parameter optimization result;

[0159] Based on the parameter optimization results, parameter adjustment suggestions are generated and output.

[0160] Among them, other aspects and implementation details of the components in the parameter control system 11 introduced above are the same as or similar to the control method of the single crystal furnace process parameters described above, and will not be repeated here.

[0161] In one embodiment, the parameter control system 11 can be as follows Figure 6 As shown in , it is divided into multiple parts, including infrastructure layer, data resource layer, service layer, business application layer and users.

[0162] The infrastructure layer may include data storage servers, model execution servers, data operation servers, etc. Each component of the infrastructure layer undertakes different core functions and jointly supports the stable operation and data interaction of the parameter control system 11.

[0163] The data storage server may include a distributed database, which may be based on Figure 6The data resource layer is implemented using at least one of the following databases: MySQL, StarRocks, and Redis. The data storage server can provide data sharing services based on this distributed database. Furthermore, a metadata management system can be established within the data storage server to facilitate rapid retrieval and association. This supports efficient storage and access of parameters, logs, analysis results, and more.

[0164] The model running server may run, for example, the first prediction model and the second prediction model described above, etc. The data operation server may be responsible for data processing and calculation in the parameter control system 11 .

[0165] As the upper module of the infrastructure layer, the service layer is mainly responsible for implementing the core business logic and functional services of the system, and providing standardized interfaces and business support for the upper-layer business. Among them, the service layer may include the rights management module 115 and the system log service as mentioned above. Among them, the rights management module 115 can be used for rights control, such as controlling different roles (such as Figure 6 The system log service can, for example, record various logs generated during the operation of the parameter control system 11, including but not limited to operation logs related to parameter configuration, parameter review management, parameter version control, and parameter issuance.

[0166] The business application layer is an upper-level module of the service layer, directly targeting specific business scenarios and end users. By integrating the basic capabilities provided by the service layer, it realizes the digital operation of core businesses such as production, process, and analysis. The business application layer includes the process end, production end, and analysis end.

[0167] The process side can focus on process design, parameter configuration and optimization to ensure the compliance, safety and efficiency of the production process. Among them, the process side can include a security authentication module, such as the parameter configuration module 110, the audit management module 111 and the AI ​​optimization engine 114 mentioned above, as well as an operation log query service. Among them, the security authentication module can provide a security mechanism to ensure the security of the system. In the security authentication module, a complete access control list (ACL) can be established to strictly limit the interaction permissions between modules. Among them, the call between each module needs to undergo two-way identity authentication to ensure that the modules interact only within the authorized scope. The operation log query service can be used to process the user's operation log query request.

[0168] The production side can be used to focus on parameter distribution, raw material management, and process implementation during the production execution process to ensure the stability and efficiency of the production process. Among them, the production side includes the parameter distribution module 112, raw material configuration module, distribution log query service, and process optimization model configuration module as described above.

[0169] According to the above description, the parameter sending module 112 can adopt an incremental update strategy to transmit only the changed parameter content to achieve differential update and reduce the amount of data transmission. In addition, an encrypted channel is used to ensure the security of the parameters during transmission.

[0170] The raw material configuration module, for example, can be used to manage raw material parameters, maintain basic raw material information (such as principle type), and define the relationship between raw materials and process parameters. In practice, when the system automatically issues tasks, it automatically matches backup system parameters based on the type of raw material currently in use, with different parameters corresponding to different raw material types. The issuance log query service can be used to trace the parameter issuance process. The process optimization model configuration module, for example, can be used to configure the second prediction model described above and save the second prediction model to the model execution server.

[0171] The analysis end can be used to focus on real-time monitoring, tracing, and analysis of production data. The analysis end may include a furnace operation status monitoring module, a log tracking module, and the data analysis module 113 described above. The furnace operation status monitoring module can monitor the operating status of the target single crystal furnace and visualize the relevant data of the target single crystal furnace. For example, the visualization report mentioned above can be displayed by the furnace operation status monitoring module. The log tracking module can be used, for example, for full-link log association.

[0172] The data analysis module 113 can combine AI algorithms to perform real-time monitoring and historical analysis of furnace production data. In terms of real-time monitoring, the operating status of the target single crystal furnace can be tracked in real time, and abnormal conditions (such as abnormal furnace pressure, abnormal power, abnormal pulling speed, abnormal number of revolutions, etc.) can be detected in a timely manner. In terms of historical analysis, a first prediction model can be established based on the historical production data of the single crystal furnace to provide support for process optimization. In addition, when an abnormality is found, an alarm mechanism can be triggered and detailed information can be recorded to facilitate subsequent investigation.

[0173] In summary, the parameter control system 11 provided in the embodiment of the present application can have the following functions:

[0174] Realize online parameter management: Complete parameter creation, review, issuance and modification through the online platform to avoid manual circulation errors;

[0175] Quantitative parameter processing: supports modifying multiple parameters at one time and issuing them in batches, greatly improving work efficiency;

[0176] Save parameter circulation time: The automated process significantly shortens the cycle from parameter formulation to actual application;

[0177] Parameter confidentiality management: Strict permission control and encryption technology are used to ensure that only authorized personnel can access and modify sensitive parameters;

[0178] Intelligent delivery function: Automatically checks and completes parameter values, reduces human operation errors, and significantly reduces the abnormal rate of parameter delivery;

[0179] Process closed-loop system: Through data collection and analysis, process parameters are continuously optimized and iterated, ultimately achieving product quality traceability and quality improvement.

[0180] By implementing the solutions provided in the embodiments of this application, based on the combination of a distributed architecture and intelligent algorithms, the traditional parameter management process can be transformed into an efficient, secure, and easily scalable automated system. This significantly improves the overall efficiency and product quality of single-crystal manufacturing, effectively prevents technology leaks, and saves labor costs. Furthermore, this intelligent management model provides innovative ideas and a practical foundation for the development of modern manufacturing.

[0181] The embodiment of the present application further provides a computer device, which includes a memory and a processor, wherein a computer program is stored in the memory, and when the processor executes the computer program, the following is achieved: Figures 2 to 4 Any of the control methods described in .

[0182] In one embodiment, the present application provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the following Figures 2 to 4 Any of the control methods described in .

[0183] In one embodiment, the present application provides a computer program product, including a computer program / instruction, which, when executed by a processor, implements the following: Figures 2 to 4 Any of the control methods described in .

[0184] The present application also provides a single crystal product, which is prepared by a crystal pulling process. The crystal pulling process includes: Figures 2 to 4The control method described in any one of the above. It should be noted that the crystal pulling process is a method for preparing single crystal products by melt crystallization technology, which can be used to produce and prepare a variety of single crystal products, such as single crystal silicon rods; by applying the control method of the single crystal furnace process parameters provided in the embodiment of the present application to the crystal pulling process, the control process or control results of the single crystal furnace process parameters (such as the target process parameters in the above text, the parameter values ​​of the predicted target single crystal furnace control parameters at the future set time point, the generated parameter adjustment suggestions, etc.) are used for the single crystal furnace, the process parameters and / or control parameters and process of the single crystal furnace can be optimized, thereby improving the efficiency and stability of the crystal pulling process, promoting the quality control of the single crystal product production process, and improving the purity of the final single crystal product and the consistency with the seed crystal orientation and other quality control indicators, for example, the crystal orientation deviation of the produced and prepared single crystal silicon rod and the seed crystal can be made less than 0.5°.

[0185] The above description is only a partial implementation of the embodiments of the present application and does not constitute any form of limitation to the application. The protection scope of the embodiments of the present application is not limited thereto. Any simple modifications, equivalent changes and modifications that can be easily thought of by any technician familiar with this technical field within the technical scope disclosed in the embodiments of the present application should be covered within the protection scope of the embodiments of the present application.

Claims

1. A method for controlling process parameters of a single crystal furnace, characterized in that: The method comprises: Acquiring first process parameters applicable to a target single crystal furnace; generating an audit task for the first process parameter; Obtaining the audit result corresponding to the audit task; When it is determined based on the audit result that the first process parameters pass the audit, target process parameters are sent to a single crystal furnace control system related to the target single crystal furnace, where the target process parameters are at least part of the first process parameters.

2. The method according to claim 1, characterized in that After sending the target process parameters to the single crystal furnace control system related to the target single crystal furnace, the method further includes: Acquiring a second process parameter from the single crystal furnace control system, where the second process parameter is a parameter actually received by the single crystal furnace control system and corresponds to the target process parameter; In the case that the target process parameters are inconsistent with the second process parameters, the process parameters in the target process parameters that are inconsistent with the second process parameters are resent to the single crystal furnace control system.

3. The method according to claim 2, characterized in that After resending the process parameters in the target process parameters that are inconsistent with the second process parameters to the single crystal furnace control system, the method further includes: Acquiring a third process parameter from the single crystal furnace control system, where the third process parameter is a parameter actually received by the single crystal furnace control system and corresponds to the target process parameter; When the target process parameter and the third process parameter are inconsistent, an alarm message is generated and output, where the alarm message is used to indicate that the process parameter is abnormal.

4. The method according to claim 1, wherein The method is applied to a parameter control system; Before generating the audit task for the first process parameter, the method further includes: generating a first version number for the first process parameter; The first process parameter and the first version number are associated and stored in the parameter management and control system.

5. The method according to claim 4, characterized in that Also includes: Verifying the first process parameter using a preset verification mechanism; Generating a first version number for the first process parameter includes: In a case where the first process parameter passes verification, the first version number is generated for the first process parameter.

6. The method according to claim 4, characterized in that The parameter control system stores a fourth process parameter, which is a previous version parameter of the first process parameter; The target process parameter is determined based on a difference between the first process parameter and the fourth process parameter.

7. The method according to claim 1, characterized in that The method is applied to a parameter control system, wherein the parameter control system is configured with user authority information; The method further comprises: Determining a target user for reviewing the first process parameter based on the user authority information; Output the audit task to the target user.

8. The method according to claim 7, characterized in that The target users include multiple users at different levels; Outputting the audit task to the target user includes: The review task is output to the multiple users simultaneously.

9. The method according to claim 1, characterized in that Sending target process parameters to a single crystal furnace control system related to the target single crystal furnace includes: Encrypting the target process parameters to obtain ciphertext parameters; The encrypted parameters are sent to the single crystal furnace control system.

10. The method according to claim 1, characterized in that After sending the target process parameters to the single crystal furnace control system related to the target single crystal furnace, the method further includes: Acquiring production data of the target single crystal furnace under the target process parameters; The first prediction model is used to predict parameter values ​​of the control parameters of the target single crystal furnace at a set time point in the future based on the production data.

11. The method according to claim 1, wherein Also includes: Optimizing the parameter value of the first process parameter using the second prediction model to generate a parameter optimization result; Based on the parameter optimization results, parameter adjustment suggestions are generated and output.

12. A parameter control system, characterized in that: include: a parameter configuration module, configured to obtain a first process parameter applicable to a target single crystal furnace; an audit management module, configured to generate an audit task for the first process parameter and obtain an audit result corresponding to the audit task; The parameter sending module is configured to send target process parameters to the single crystal furnace control system related to the target single crystal furnace when it is determined that the first process parameters have passed the review based on the review result. The target process parameters are at least part of the first process parameters.

13. A computer device, characterized in that: The computer device includes a memory and a processor, the memory stores a computer program, and when the processor executes the computer program, the control method according to any one of claims 1 to 11 is implemented.

14. A computer-readable storage medium, characterized in that The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the control method according to any one of claims 1 to 11 is implemented.

15. A single crystal product, characterized in that: It is prepared by a crystal pulling process, and the crystal pulling process includes the control method according to any one of claims 1-11.

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