Chamber apparatus, gas laser apparatus, and method for manufacturing electronic device

Abstract

A chamber apparatus, a gas laser apparatus, and a method of manufacturing an electronic device are provided. A chamber device is provided with: a pair of discharge electrodes which are arranged so that the longitudinal direction thereof is along a prescribed direction and which face each other with a gap therebetween; a chamber in which the pair of discharge electrodes is disposed in an internal space and the laser gas is sealed in the internal space; a plurality of capacitors arranged side by side in a predetermined direction; at least one power supply terminal that electrically connects one discharge electrode and one terminal of each capacitor to a high-voltage power supply; and a conductive plate-shaped connection member that extends in a predetermined direction along the plurality of capacitors, is electrically connected to the other terminal of each capacitor, and is grounded at a location that is farther from a location of the connection member that is electrically connected to the other terminal in a direction perpendicular to the predetermined direction. The connection member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and one terminal of each capacitor approximately uniform.

Description

Technical Field

[0001] The present disclosure relates to a chamber device, a gas laser device, and a method for manufacturing an electronic device. Background Art

[0002] In recent years, semiconductor exposure equipment has been required to improve resolution as semiconductor integrated circuits become increasingly miniaturized and highly integrated. Consequently, there has been a trend toward shortening the wavelength of light emitted by exposure light sources. For example, gas laser devices used for exposure include KrF excimer lasers, which output laser light with a wavelength of approximately 248 nm, and ArF excimer lasers, which output laser light with a wavelength of approximately 193 nm.

[0003] The spectral line width of the natural oscillation light of KrF excimer laser devices and ArF excimer laser devices is as wide as 350pm to 400pm. Therefore, if the projection lens is made of a material that allows ultraviolet rays such as KrF and ArF lasers to pass through, chromatic aberration may sometimes occur. As a result, the resolution may be reduced. Therefore, it is necessary to narrow the spectral line width of the laser output from the gas laser device to a level where chromatic aberration can be ignored. Therefore, in order to narrow the spectral line width, a narrowing module (Line Narrowing Module: LNM) containing narrowing elements (etalon, grating, etc.) is sometimes provided in the laser resonator of the gas laser device. Hereinafter, a gas laser device with a narrowed spectral line width is referred to as a narrowed gas laser device.

[0004] Prior art literature

[0005] Patent Literature

[0006] [Patent Document 1] Japanese Patent Application Laid-Open No. 11-163447

[0007] [Patent Document 2] Japanese Patent Application Laid-Open No. 2006-24600 Summary of the Invention

[0008] A chamber device according to one embodiment of the present disclosure comprises: a pair of discharge electrodes arranged with their lengths along a prescribed direction and opposed to each other with a gap therebetween; a chamber, wherein the pair of discharge electrodes are arranged in an internal space of the chamber and laser gas is sealed in the internal space; a plurality of capacitors arranged in parallel along a prescribed direction; at least one power supply terminal electrically connecting one discharge electrode and one terminal of each capacitor to a high voltage power supply; and a conductive plate-shaped connecting member extending in a prescribed direction along the plurality of capacitors and electrically connected to the other terminal of each capacitor, wherein the following portion of the connecting member is grounded: the portion is away from a portion of the connecting member electrically connected to the other terminal in a direction perpendicular to the prescribed direction, and the connecting member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and one terminal of each capacitor nearly uniform.

[0009] A gas laser device according to one embodiment of the present disclosure amplifies and emits laser light using a chamber device, the chamber device comprising: a pair of discharge electrodes arranged with their lengths along a predetermined direction and opposed to each other with a gap therebetween; a chamber, the pair of discharge electrodes being arranged in an interior space of the chamber, laser gas being enclosed in the interior space; a plurality of capacitors arranged in parallel along a predetermined direction; at least one power supply terminal electrically connecting one of the discharge electrodes and one terminal of each capacitor to a high-voltage power supply; and a conductive plate-shaped connecting member extending in a predetermined direction along the plurality of capacitors, electrically connected to the other terminal of each capacitor, and electrically connected to the chamber at a location perpendicular to the predetermined direction and away from a location of the connecting member connected to the other terminal, the connecting member including an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and one terminal of each capacitor nearly uniform.

[0010] A method for manufacturing an electronic device according to one embodiment of the present disclosure includes the following steps: generating laser light using a gas laser device; outputting the laser light to an exposure device; and exposing the laser light to a photosensitive substrate in the exposure device to manufacture the electronic device. The gas laser device amplifies and emits the laser light using a chamber device, the chamber device comprising: a pair of discharge electrodes arranged with their longitudinal directions along a predetermined direction and facing each other with a gap therebetween; a chamber, the pair of discharge electrodes being arranged within an interior space of the chamber and containing laser gas; a plurality of capacitors arranged in parallel along a predetermined direction; at least one power supply terminal electrically connecting one of the discharge electrodes and one terminal of each capacitor to a high-voltage power supply; and a conductive plate-shaped connecting member extending in a predetermined direction along the plurality of capacitors, electrically connected to the other terminal of each capacitor, and electrically connected to the chamber at a location perpendicular to the predetermined direction and away from a location of the connecting member connected to the other terminal. The connecting member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and one terminal of each capacitor approximately uniform. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Hereinafter, several embodiments of the present disclosure will be described with reference to the accompanying drawings, merely as examples.

[0012] Figure 1 This is a schematic diagram showing an example of the overall schematic configuration of an electronic device manufacturing apparatus.

[0013] Figure 2 It is a schematic diagram showing an overall schematic configuration example of a gas laser device according to a comparative example.

[0014] Figure 3 This is a cross-sectional view of a chamber device according to a comparative example, taken perpendicularly to the direction in which the laser beam travels.

[0015] Figure 4 This is a circuit diagram of a gas laser device according to a comparative example.

[0016] Figure 5 This is a diagram showing a circuit in a comparative example connected to a pulse power module as viewed from above.

[0017] Figure 6 This diagram shows the relationship between the distance between the capacitor and the power supply terminal, the capacitance of the capacitor, the charging cycle of the capacitor, and the inductance of the circuit.

[0018] Figure 7 is with Figure 5 Similarly, a diagram of the circuit of the first embodiment connected to the pulse power module is shown.

[0019] Figure 8 is with Figure 5Similarly, a circuit diagram of Modification 1 of Embodiment 1 connected to a pulse power module is shown.

[0020] Figure 9 is with Figure 5 Similarly, a circuit diagram of a second modification of the first embodiment connected to a pulse power module is shown.

[0021] Figure 10 is with Figure 5 Similarly, a circuit diagram of Modification 3 of Embodiment 1 connected to a pulse power module is shown.

[0022] Figure 11 is with Figure 5 Similarly, a circuit diagram of a fourth modification of the first embodiment connected to a pulse power module is shown.

[0023] Figure 12 is with Figure 5 Similarly, a circuit diagram of a fifth modification of the first embodiment connected to a pulse power module is shown.

[0024] Figure 13 is with Figure 5 Similarly, a circuit diagram of a sixth modification of the first embodiment connected to a pulse power module is shown.

[0025] Figure 14 is with Figure 5 Similarly, a diagram of a circuit according to a second embodiment connected to a pulse power module is shown.

[0026] Figure 15 is with Figure 5 Similarly, a circuit diagram of Modification 1 of Embodiment 2 connected to a pulse power module is shown.

[0027] Figure 16 is with Figure 5 Similarly, a circuit diagram of Modification 2 of Embodiment 2 connected to a pulse power module is shown.

[0028] Figure 17 is with Figure 5 Similarly, a circuit diagram of a third modification of the second embodiment connected to a pulse power module is shown.

[0029] Figure 18 is with Figure 5 Similarly, a circuit diagram of a fourth modification of the second embodiment connected to a pulse power module is shown.

[0030] Figure 19 is with Figure 5 Similarly, a diagram of a circuit according to a third embodiment connected to a pulse power module is shown.

[0031] Figure 20 is with Figure 5 Similarly, a diagram of a circuit according to a fourth embodiment connected to a pulse power module is shown.

[0032] Figure 21 is with Figure 5 Similarly, a diagram of a circuit according to a fifth embodiment connected to a pulse power module is shown. DETAILED DESCRIPTION

[0033] 1. Description of the electronic device manufacturing apparatus used in the exposure process of the electronic device

[0034] 2. Description of the Gas Laser Device of the Comparative Example

[0035] 2.1 Structure

[0036] 2.2 Action

[0037] 2.3 Topics

[0038] 3. Description of the Gas Laser Device of Embodiment 1

[0039] 3.1 Structure

[0040] 3.2 Function and effect

[0041] 3.3 Modification 1

[0042] 3.4 Modification 2

[0043] 3.5 Modification 3

[0044] 3.6 Variation 4

[0045] 3.7 Modification 5

[0046] 3.8 Modification 6

[0047] 4. Description of the Gas Laser Device of Embodiment 2

[0048] 4.1 Structure

[0049] 4.2 Function and effect

[0050] 4.3 Modification 1

[0051] 4.4 Modification 2

[0052] 4.5 Variation 3

[0053] 4.6 Variation 4

[0054] 5. Description of the Gas Laser Device of Embodiment 3

[0055] 5.1 Structure

[0056] 5.2 Function and effect

[0057] 6. Description of the Gas Laser Device of Embodiment 4

[0058] 6.1 Structure

[0059] 6.2 Action and Effect

[0060] 7. Description of the Gas Laser Device of Embodiment 5

[0061] 7.1 Structure

[0062] 7.2 Action and Effect

[0063] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. The embodiments described below represent several examples of the present disclosure and do not limit the content of the present disclosure. In addition, not all of the structures and actions described in each embodiment are required to be the structures and actions of the present disclosure. In addition, the same reference numerals are attached to the same components, and repeated descriptions are omitted.

[0064] 1. Description of the electronic device manufacturing apparatus used in the exposure process of the electronic device

[0065] Figure 1 Schematic diagram showing an overall schematic configuration example of an electronic device manufacturing apparatus used in an exposure process of an electronic device. Figure 1 As shown, the manufacturing apparatus used in the exposure process includes a gas laser device 100 and an exposure device 200. The exposure device 200 includes an illumination optical system 210 and a projection optical system 220, wherein the illumination optical system 210 has a plurality of mirrors 211, 212, and 213. The illumination optical system 210 illuminates the mask pattern on the mask carrier RT using the laser light incident from the gas laser device 100. The projection optical system 220 performs a reduced projection of the laser light transmitted through the mask so as to form an image on a workpiece (not shown) arranged on the workpiece stage WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with a photoresist. The exposure device 200 exposes the workpiece with the laser light reflecting the mask pattern by moving the mask carrier RT and the workpiece stage WT in parallel in synchronization. By transferring the device pattern to the semiconductor wafer using the above-mentioned exposure process, a semiconductor device as an electronic device can be manufactured.

[0066] 2. Description of the Gas Laser Device of the Comparative Example

[0067] 2.1 Structure

[0068] A gas laser device of a comparative example will be described. Note that the comparative examples disclosed herein are methods that the applicant has recognized as being known only to the applicant, and are not examples that the applicant considers to be publicly known.

[0069] Figure 2: is a schematic diagram showing an overall schematic structural example of a gas laser device 100 of a comparative example. The gas laser device 100 is, for example, an ArF excimer laser device using a mixed gas containing argon (Ar), fluorine (F2), and neon (Ne). The gas laser device 100 emits laser light having a central wavelength of approximately 193 nm. In addition, the gas laser device 100 may be a gas laser device other than the ArF excimer laser device, for example, a KrF excimer laser device using a mixed gas containing krypton (Kr), F2, and Ne. In this case, the gas laser device 100 emits laser light having a central wavelength of approximately 248 nm. A mixed gas containing Ar, F2, and Ne as a laser medium, or a mixed gas containing Kr, F2, and Ne as a laser medium is sometimes referred to as a laser gas. In Figure 2 The internal structure of the chamber device CH in the cross-sectional view along the direction of laser travel is shown in FIG. Figure 2 The left side of the paper is called the front side, the right side of the paper is called the back side, the upper side of the paper is called the top, and the lower side of the paper is called the bottom.

[0070] The gas laser device 100 includes a housing 110 , a laser oscillator 130 disposed in an internal space of the housing 110 , a monitoring module 160 , an aperture 170 , and a laser device processor 190 as main components.

[0071] The laser oscillator 130 includes a chamber device CH, a charger 141 , a band-narrowing module 145 , an output coupling mirror 147 , and a pulse compression circuit 300 .

[0072] The chamber device CH includes a chamber 131. The upper portion of the chamber 131 is open and blocked by an electrically insulating plate 135. The chamber 131 is made of a conductive material, and examples of such a material include nickel-plated aluminum or nickel-plated stainless steel. The chamber 131 is grounded. The chamber 131 includes an internal space in which light is generated by the excitation of the laser medium in the laser gas. The laser gas is supplied from a laser gas supply source (not shown) to the internal space of the chamber 131 through a pipe (not shown). In addition, the laser gas in the chamber 131 is subjected to a treatment such as removing F2 gas by a halogen filter, and is exhausted to the housing 110 by an exhaust pump (not shown) through a pipe (not shown).

[0073] The electrical insulating plate 135 is made of an insulator. Examples of materials for the electrical insulating plate 135 include alumina ceramics, which have low reactivity with F₂ gas. Furthermore, the electrical insulating plate 135 only needs to have electrical insulating properties. Examples of materials for the electrical insulating plate 135 include resins such as phenolic resin and fluororesin, as well as quartz and glass.

[0074] Within chamber 131, electrode 133a, serving as the first main electrode, and electrode 133b, serving as the second main electrode, are positioned opposite each other with a gap between them. Their lengths are aligned with the predetermined direction of laser light propagation. In this example, electrode 133b is located directly above electrode 133a. Electrodes 133a and 133b serve as discharge electrodes for exciting the laser medium through glow discharge. In this example, electrode 133a serves as the anode, and electrode 133b serves as the cathode.

[0075] Figure 3 FIG is a cross-sectional view of the chamber device CH of the comparative example perpendicular to the direction of travel of the laser. Figure 2 、 Figure 3 As shown, the electrode 133a is supported by the electrode holder 137 and is electrically connected to the electrode holder 137. The electrode holder 137 is electrically connected to the chamber 131 via the wiring 137a. Therefore, the electrode 133a supported by the electrode holder 137 is grounded via the electrode holder 137, the wiring 137a, and the chamber 131. In addition, the chamber 131 is electrically connected to the holder 350, and the holder 350 is grounded.

[0076] Electrode 133b is secured to the surface of electrical insulating plate 135 located on the interior side of chamber 131 via a feedthrough 157, a current introduction terminal formed, for example, by a bolt. Feedthrough 157 electrically connects pulse compression circuit 300 and other circuit components, ensuring electrical continuity between pulse compression circuit 300 and electrode 133b.

[0077] The charger 141 is a DC high-voltage power source that supplies power to the pulse compression circuit 300. The pulse compression circuit 300 is disposed on the holding unit 350 and generates a pulsed high voltage using the power held in the charger 141, and applies the pulsed high voltage between the electrodes 133a and 133b.

[0078] When a high voltage is applied between electrodes 133a and 133b, glow discharge occurs between electrodes 133a and 133b. The energy of this discharge excites the laser medium in chamber 131, and the excited laser medium emits light when it transitions to a ground state.

[0079] A pre-ionization electrode 180 is provided on the side of the electrode 133a on the electrode holding portion 137. The pre-ionization electrode 180 includes a dielectric tube 181, a pre-ionization inner electrode 183, and a pre-ionization outer electrode 185.

[0080] The dielectric tube 181 is arranged so that its length extends along a predetermined direction, and is, for example, a cylindrical tube. The dielectric tube 181 is made of, for example, alumina ceramic or sapphire. The preionization inner electrode 183 is rod-shaped and arranged inside the dielectric tube 181, extending along the length of the dielectric tube 181. The preionization inner electrode 183 is made of, for example, copper or brass. The preionization outer electrode 185 is arranged between the dielectric tube 181 and the electrode 133a, extending along the length of the dielectric tube 181. The end of the preionization outer electrode 185 contacts the outer circumference of the dielectric tube 181. Furthermore, the end of the preionization outer electrode 185 need not contact the outer circumference of the dielectric tube 181, as long as it generates the corona discharge described below. The preionization outer electrode 185 is fixed to a spacer 187 fixed to the electrode 133a.

[0081] The preionization inner electrode 183 is electrically connected to the pulse compression circuit 300 via a preionization capacitor (described later). The preionization outer electrode 185 is electrically connected to the electrode 133a via the electrode holder 137, and is also electrically connected to the chamber 131 via the electrode holder 137 and the wiring 137a. Therefore, the preionization outer electrode 185 is grounded. By applying a high voltage to the preionization inner electrode 183 and the preionization outer electrode 185 from the pulse compression circuit 300, a corona discharge is generated near the end of the preionization outer electrode 185. This corona discharge assists in the stable generation of the glow discharge generated between the electrodes 133a and 133b.

[0082] A pair of windows 139a and 139b are provided on the wall of chamber 131. Window 139a is located at one end of the chamber 131 in the direction of laser light travel, while window 139b is located at the other end in the same direction of laser light travel. Windows 139a and 139b sandwich the space between electrodes 133a and 133b. Windows 139a and 139b may also be tilted to form a Brewster angle with respect to the direction of laser light travel to suppress laser light reflection. As described later, oscillating laser light is emitted from windows 139a and 139b to the outside of chamber 131. As described above, a pulsed high voltage is applied between electrodes 133a and 133b by pulse compression circuit 300, so this laser light is pulsed.

[0083] A cross-flow fan 149 and a heat exchanger 151 are also arranged in the internal space of the chamber 131. The cross-flow fan 149 and the heat exchanger 151 are arranged on the side opposite to the electrode 133a side with the electrode holding portion 137 as a reference. The space in the chamber 131 where the cross-flow fan 149 and the heat exchanger 151 are arranged is connected to the space between the electrode 133a and the electrode 133b. The heat exchanger 151 is arranged next to the cross-flow fan 149 and is a radiator connected to a pipe (not shown) for the flow of a cooling medium. Figure 2As shown, the cross flow fan 149 is connected to a motor 149a disposed outside the chamber 131 and rotates by the rotation of the motor 149a. As the cross flow fan 149 rotates, the laser gas sealed in the inner space of the chamber 131 is rotated as shown in FIG. Figure 3 At least a portion of the circulating laser gas passes through heat exchanger 151 to adjust the temperature of the laser gas.

[0084] The narrowband module 145 includes a housing 145a, a prism 145b, a grating 145c, and a rotating stage (not shown) disposed in the interior of the housing 145a. The housing 145a has an opening, and the housing 145a is connected to the rear side of the chamber 131 through the opening.

[0085] The prism 145b expands the beam width of the light emitted from the window 139a, causing the light to enter the grating 145c. In addition, the prism 145b reduces the beam width of the reflected light from the grating 145c and returns the light to the internal space of the chamber 131 through the window 139a. The prism 145b is supported by a rotating stage and rotated by the rotating stage. The rotation of the prism 145b changes the incident angle of the light entering the grating 145c, and the wavelength of the light returned from the grating 145c through the prism 145b to the chamber 131 can be selected. Figure 2 , an example in which one prism 145 b is arranged is shown, but at least one prism only needs to be arranged.

[0086] The surface of grating 145c is made of a high-reflectivity material and has multiple grooves spaced at regular intervals. The cross-sectional shape of each groove is, for example, a right triangle. Light incident on grating 145c from prism 145b, when reflected by these grooves, is diffracted in a direction corresponding to its wavelength. Littrow configured grating 145c so that the angle of incidence of light incident on grating 145c from prism 145b coincides with the diffraction angle of diffracted light of the desired wavelength. As a result, light near the desired wavelength is returned to chamber 131 via prism 145b.

[0087] Output coupling mirror 147 is located within the interior of optical tube 147a, connected to the front of chamber 131, and faces window 139b. Output coupling mirror 147 transmits a portion of the laser light emitted from window 139b toward monitoring module 160, while reflecting the remaining portion, which returns through window 139b to the interior of chamber 131. Thus, grating 145c and output coupling mirror 147 form a Fabry-Perot laser resonator.

[0088] Monitoring module 160 is disposed on the optical path of the laser light emitted from output coupling mirror 147. Monitoring module 160 includes a housing 161, a beam splitter 163 disposed within the interior of housing 161, and a light sensor 165. Housing 161 has an opening formed therein, and the interior of housing 161 communicates with the interior of optical tube 147a through the opening.

[0089] Beam splitter 163 transmits a portion of the laser light emitted from output coupling mirror 147 toward aperture 170 and reflects the other portion toward the light receiving surface of optical sensor 165. Optical sensor 165 outputs a signal indicating energy E of the laser light incident on the light receiving surface to laser device processor 190.

[0090] The laser device processor 190 of the present disclosure is a processing device comprising a storage device 190a storing a control program and a CPU (Central Processing Unit) 190b executing the control program. The laser device processor 190 is specifically configured or programmed to perform the various processes included in the present disclosure. Furthermore, the laser device processor 190 controls the entire gas laser device 100.

[0091] The laser processor 190 transmits and receives various signals to and from the exposure processor 230 of the exposure device 200. For example, the laser processor 190 receives signals indicating the emission trigger Tr (described later) and the target energy Et from the exposure processor 230. The target energy Et is the target value for the energy of the laser light used in the exposure process. The laser processor 190 controls the charge voltage of the charger 141 based on the energy E and the target energy Et received from the optical sensor 165 and the exposure processor 230. By controlling the charge voltage, the energy of the laser light is controlled. Furthermore, the laser processor 190 is electrically connected to the aperture 170 and controls the opening and closing of the aperture 170.

[0092] The laser device processor 190 closes the aperture 170 until the difference ΔE between the energy E received from the monitoring module 160 and the target energy Et received from the exposure device processor 230 falls within an allowable range. Furthermore, if the difference ΔE falls within the allowable range, the laser device processor 190 transmits a reception preparation completion signal to the exposure device processor 230, notifying the exposure device processor 230 that the reception preparation for the light trigger Tr is complete. Upon receiving the reception preparation completion signal, the exposure device processor 230 transmits a signal indicating the light trigger Tr to the laser device processor 190, which then opens the aperture 170 upon receiving the signal indicating the light trigger Tr. The light trigger Tr is a timing signal for the exposure device processor 230 to cause the laser oscillator 130 to oscillate laser light and is an external trigger. The light trigger Tr can also be specified by a predetermined repetition frequency f and a predetermined number of pulses P of the laser light. The repetition frequency f of the laser light is, for example, greater than or equal to 100 Hz and less than or equal to 10 kHz.

[0093] The light shield 170 is arranged on the optical path in the internal space of the optical tube 171, which is connected to an opening formed in the housing 161 of the monitoring module 160 on the side opposite to the side connected to the optical tube 147a. The internal spaces of the optical tubes 171 and 147a and the internal spaces of the housings 161 and 145a are supplied and filled with a purge gas. The purge gas contains an inert gas such as nitrogen (N2). The purge gas is supplied from a purge gas supply source (not shown) through a pipe (not shown). In addition, the optical tube 171 is connected to the exposure device 200 through an opening in the housing 110 and the optical tube 500 connecting the housing 110 and the exposure device 200. The laser light passing through the aperture 170 is incident on the exposure device 200.

[0094] The exposure device processor 230 of the present disclosure is a processing device comprising a storage device 230a storing a control program and a CPU 230b executing the control program. The exposure device processor 230 is specifically configured or programmed to perform the various processes included in the present disclosure. Furthermore, the exposure device processor 230 controls the entire exposure device 200.

[0095] Next, the configuration of the pulse compression circuit 300 will be described.

[0096] Figure 4 FIG. 1 is a circuit diagram of the gas laser device 100 of this embodiment. Figure 4 As shown, the pulse compression circuit 300 of the gas laser device 100 includes a pulse power module 310 connected to the charger 141 and a plurality of capacitors 340 for accumulating energy from the pulse power module 310. The capacitors 340 are sometimes referred to as peak capacitors. Figure 4 In FIG. 3 , a plurality of capacitors 340 are collectively described using one symbol.

[0097] Figure 5 This is a diagram of the circuit connected to the pulse power module 310 as viewed from above. Figures 2 to 5 As shown, the circuit between the pulse power module 310 and the electrodes 133a and 133b includes a power supply terminal 320 led out from the pulse power module 310, a connection plate 330, a plurality of capacitors 340, the feedthrough 157, a holding portion 350, and a connection member 360 as main components.

[0098] The pulse power module 310 includes a switch 301. The switch 301 is electrically connected to the charger 141 and is controlled by the laser device processor 190. When the switch 301 is turned on, current flows from the pulse power module 310 to the power supply terminal 320.

[0099] In this example, there is only one power supply terminal 320. The connecting plate 330 is connected to the power supply terminal 320, and the power supply terminal 320 and the connecting plate 330 are electrically connected. The connecting plate 330 is a conductive plate arranged in a manner such that its length direction is along the length direction of the electrode 133b, that is, along a predetermined direction. In this example, the power supply terminal 320 is connected to the connecting plate 330 at approximately the center of the length direction of the connecting plate 330. Figure 3 As shown, the cross section of the connection plate 330 perpendicular to the longitudinal direction is substantially U-shaped. In this cross section, both ends of the connection plate 330 are bent toward the pulse power module 310 .

[0100] A feedthrough 157 is connected to the side of the connecting plate 330 opposite the side connected to the power supply terminal 320, and the connecting plate 330 and the feedthrough 157 are electrically connected. In this example, one feedthrough 157 is provided directly below the power supply terminal 320, and two feedthroughs 157 are provided along the length of the connecting plate 330, sandwiching the feedthrough 157. Therefore, in this example, a total of five feedthroughs 157 are provided. As described above, each feedthrough 157 is electrically connected to the electrode 133b.

[0101] One terminal 341 of each capacitor 340 is electrically connected to the connection plate 330. Therefore, one terminal 341 of each capacitor 340 is electrically connected to the electrode 133b. The capacitor 340 is a ceramic capacitor whose dielectric material is, for example, strontium titanate, barium titanate, or the like.

[0102] In this example, when viewing each capacitor 340 from the pulse power module 310, half of the capacitors 340 are arranged on one side of the electrode 133b, and the other half are arranged on the other side of the electrode 133b, perpendicular to the predetermined direction. Furthermore, half of the capacitors 340 and the other half of the capacitors 340 are arranged side by side at equal intervals along the predetermined direction. Therefore, the power supply terminal 320 is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end, in the predetermined direction.

[0103] The other terminal 342 of each capacitor 340 is electrically connected to the holder 350. Thus, each capacitor 340 is electrically connected in parallel. The holder 350 is a conductive frame and, as described above, is electrically connected to the chamber 131. Thus, the other terminal 342 of each capacitor 340 is electrically connected to the electrode 133a via the holder 350, the chamber 131, and the like.

[0104] A pair of conductive connecting members 360 are connected to the retaining portion 350, creating electrical conduction between the retaining portion 350 and the connecting members 360. Therefore, the connecting members 360 are electrically connected to the other terminal 342 of the capacitor 340 via the retaining portion 350. One connecting member 360 is located on the other terminal 342 side of one half of the capacitors 340, while the other connecting member 360 is located on the other terminal 342 side of the other half of the capacitors 340. Connecting members 360 are plate-shaped members that extend in a predetermined direction along the parallel arrangement of the plurality of capacitors 340. In this example, the longitudinal direction of connecting members 360 extends in the predetermined direction, and the in-plane direction of connecting members 360 is perpendicular to the predetermined direction and the direction in which electrodes 133a and 133b oppose each other. A portion of connecting member 360, which is perpendicular to the predetermined direction and away from the side of connecting member 360 connected to the retaining portion 350, that is, the side electrically connected to the other terminal 342 of the capacitor 340, is connected to the ground terminal 390.

[0105] The ground terminal 390 is a terminal connected to the ground of the pulse power module 310. In this example, three ground terminals 390 are connected to each connection component 360. Figure 2 The ground terminal 390 is omitted.

[0106] like Figure 4 As shown, the pre-ionization inner electrode 183 is electrically connected to the connection plate 330 via the pre-ionization capacitor 188, and the pre-ionization outer electrode 185 is grounded.

[0107] 2.2 Action

[0108] Next, the operation of the gas laser device 100 according to the comparative example will be described.

[0109] Before the gas laser device 100 emits laser light, purge gas is filled from a purge gas supply source (not shown) into the interior spaces of optical tubes 147a, 171, and 500, and into the interior spaces of housings 145a and 161. Furthermore, laser gas is supplied from a laser gas supply source (not shown) into the interior space of chamber 131. When laser gas is supplied, the laser device processor 190 controls motor 149a to rotate crossflow fan 149. The rotation of crossflow fan 149 circulates the laser gas within chamber 131.

[0110] When the gas laser device 100 emits laser light, the laser device processor 190 receives a signal indicating the target energy Et and a signal indicating the emission trigger Tr from the exposure device processor 230. Upon receiving the signal indicating the target energy Et, the laser device processor 190 closes the aperture 170 and activates the charger 141. Furthermore, the laser device processor 190 turns on the switch 301 of the pulse power module 310. This causes current from the charger 141 to charge the capacitor 340 via the power supply terminal 320 and the connection plate 330. At this time, current flows from a capacitor (not shown) within the pulse power module 310 to the capacitor 340, quickly charging the capacitor 340 to a high potential. Furthermore, a pulsed high voltage is applied from the capacitor 340 to the electrode 133b via the feedthrough 157 for a short period of time. Furthermore, the timing of applying the high voltage between the preionization inner electrode 183 and the preionization outer electrode 185 is slightly earlier than the timing of applying the high voltage between the electrodes 133a and 133b. When a high voltage is applied between preionization inner electrode 183 and preionization outer electrode 185, a corona discharge occurs near the ends of dielectric tube 181 and preionization outer electrode 185, emitting ultraviolet light. When ultraviolet light irradiates the laser gas between electrodes 133a and 133b, the laser gas between electrodes 133a and 133b is preionized. After preionization, when a high voltage is applied between electrodes 133a and 133b as described above, a main discharge occurs between electrodes 133a and 133b. This main discharge is a glow discharge.

[0111] The main discharge causes the laser medium contained in the laser gas between electrodes 133a and 133b to enter an excited state. When the laser medium returns to its ground state, it emits light. This light resonates between grating 145c and output coupling mirror 147. Each time the light passes through the discharge space within chamber 131, it is amplified, causing laser oscillation. A portion of the resonant laser light passes through output coupling mirror 147 as pulsed laser light and travels toward beam splitter 163.

[0112] A portion of the laser light that has reached the beam splitter 163 is reflected by the beam splitter 163 and received by the optical sensor 165. The optical sensor 165 measures the energy E of the received laser light and outputs a signal indicating the energy E to the laser device processor 190. The laser device processor 190 controls the charging voltage so that the difference ΔE between the energy E and the target energy Et falls within an allowable range. Once the difference ΔE falls within the allowable range, the laser device processor 190 transmits a reception preparation completion signal indicating that reception preparation of the light emission trigger Tr has been completed to the exposure device processor 230.

[0113] Upon receiving the reception preparation completion signal, the exposure device processor 230 transmits a light emission trigger Tr to the laser device processor 190. When the laser device processor 190 opens the aperture 170 in synchronization with the reception of the light emission trigger Tr, the laser light that has passed through the aperture 170 enters the exposure device 200. This laser light is, for example, a pulsed laser light having a central wavelength of approximately 193 nm.

[0114] 2.3 Topics

[0115] Figure 6 3 is a diagram showing the relationship between the distance of the capacitor 340 from the power supply terminal 320, the capacitance of the capacitor 340, the charging cycle of the capacitor 340, and the inductance of the circuit. In this example, all the capacitors 340 have the same capacitance. In addition, since multiple capacitors 340 are arranged in parallel along a specified direction, the distance of the capacitor 340 from the power supply terminal 320 is not fixed. Therefore, the longer the circuit passes through the capacitor 340 at a greater distance from the power supply terminal 320, the greater the inductance. Therefore, the longer the distance from the power supply terminal 320 to the capacitor 340 is, the longer the charging cycle. In addition, the inductance can be the inductance of the loop circuit including the capacitor 340, or the inductance in the ground path of the loop circuit including the capacitor 340. Alternatively, it can be the inductance in the charging loop from the capacitor (not shown) configured in the pulse power module 310 to the capacitor 340.

[0116] However, it is known that the ends of the cathode electrode 133b in the longitudinal direction tend to wear more than those near the center. Thus, when the wear of the cathode is not constant along the longitudinal direction, stable laser emission may sometimes be impossible. This wear is believed to be caused by arc discharges between the electrodes 133a and 133b occurring more frequently at the ends of the electrodes 133a and 133b than near the center. This is thought to be because the breakdown voltage at the ends of the electrodes 133a and 133b is higher than near the center, and this breakdown voltage is related to the charging cycle of each capacitor 340. Therefore, it is believed that if the charging cycle of the capacitor 340 can be made uniform regardless of the distance from the power supply terminal 320, arc discharges at the ends of the electrodes 133a and 133b will be reduced, and the uneven wear of the cathode in the longitudinal direction will be suppressed. In order to improve the uniformity of the charging cycle of the capacitor 340, technology is required to make the inductance of the circuit containing the capacitor 340 uniform regardless of the distance from the power supply terminal 320.

[0117] Therefore, in the following embodiment, a gas laser device 100 that can suppress uneven wear of the cathode in the longitudinal direction is exemplified.

[0118] 3. Description of the Gas Laser Device of Embodiment 1

[0119] Next, the gas laser device 100 according to the embodiment will be described. Components identical to those described above are denoted by the same reference numerals, and duplicate descriptions will be omitted unless otherwise specified. In some drawings, for ease of illustration, some components may be omitted or simplified.

[0120] 3.1 Structure

[0121] Figure 7 is with Figure 5 Similarly, a diagram showing a circuit in this embodiment connected to the pulse power module 310 is shown. Figure 7 As shown, the difference between the gas laser device 100 of this embodiment and the gas laser device 100 of the comparative example is that a plurality of openings 360H are formed in the connecting member 360. In the following figures, for openings 360H of the same shape and size, some openings 360H may be denoted by reference numerals, while other openings 360H may not be denoted by reference numerals. Figure 7 , an example is shown in which three openings 360H are formed in each of the pair of connecting members 360 .

[0122] In this embodiment, each opening 360H is of the same size and shape, and is circular in shape. Multiple openings 360H are arranged along a predetermined direction and formed at equal intervals. Furthermore, opening 360H is formed near the center of the connecting member 360 in the longitudinal direction. Specifically, opening 360H is formed in an area where the distance from the power supply terminal 320 in the predetermined direction is less than a predetermined distance, and is not formed in an area where the distance from the power supply terminal 320 is greater than the predetermined distance. Therefore, the porosity of opening 360H in the area of ​​the connecting member 360 that is less than the predetermined distance and closest to the power supply terminal 320 in the predetermined direction is greater than the porosity of opening 360H in the area of ​​the connecting member 360 that is greater than the predetermined distance from the power supply terminal 320 in the predetermined direction. In this embodiment, as in the comparative example, there is only one power supply terminal 320, located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the predetermined direction. Therefore, in the region of the connection member 360 where the distance from the midpoint in the predetermined direction is less than the predetermined distance, the porosity is greater than that in the region where the distance from the midpoint is greater than or equal to the predetermined distance.

[0123] By forming the openings 360H as described above, the inductance caused by the connecting member 360 in the region where the distance from the power supply terminal 320 in the specified direction is less than the specified distance can be increased. By forming multiple openings 360H in the connecting member 360, the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made more uniform compared to a case where the connecting member 360 does not have multiple openings 360H. Therefore, the connecting member 360 of this embodiment includes an inductance compensation structure that makes the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform. This inductance compensation structure is configured to make the inductance of the connecting member 360 closer to the power supply terminal 320 greater than that of the region farther away from the power supply terminal 320. In this embodiment, the specified distance can be set to a distance that achieves a substantial effect from the inductance compensation structure, or it can be set appropriately based on the structure and performance of each laser oscillator.

[0124] 3.2 Function and effect

[0125] In the chamber device CH of this embodiment, as described above, the connection member 360 includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 close to uniform. Therefore, the inductance of the circuit passing through each capacitor 340 is close to uniform. In other words, it is possible to reduce Figure 6Therefore, compared with the case where the connecting member 360 does not include an inductance compensation structure, the cycle of charging each capacitor 340 can be made close to uniform. That is, it is possible to reduce Figure 6 The trough of the charging cycle shown in FIG. As a result, the breakdown voltage of electrodes 133a and 133b can be made nearly uniform along the longitudinal direction, and the arc discharge generated between electrodes 133a and 133b can be made nearly uniform. Therefore, in the chamber apparatus CH of this embodiment, cathode wear can be made nearly uniform along the longitudinal direction. Consequently, the chamber apparatus CH of this embodiment can achieve a longer service life.

[0126] Furthermore, the inductance compensation structure preferably achieves a nearly uniform distribution of inductance, such that the inductance from the pulse power module 310 to the capacitor 340 at each location within the capacitor 340 falls within ±15% of the average value of these inductances. By making the inductance uniform within this range, the loss along the length of the electrode 133b can be further uniformed.

[0127] In this embodiment, three openings 360H are formed in the connecting member 360 along a predetermined direction. However, as long as the formation of the openings 360H makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform than in the absence of the openings 360H, the arrangement direction, number, and formation position of the openings 360H are not limited to those described above. Therefore, the number of openings 360H may be one or four or more.

[0128] The following describes variations of this embodiment. In the following variations, identical components to those in Embodiment 1 are denoted by the same reference numerals, and duplicate descriptions are omitted unless otherwise specified. In some drawings, for ease of viewing, portions of components may be omitted or simplified.

[0129] 3.3 Modification 1

[0130] Figure 8 is with Figure 5 The circuit diagram of this modification is similarly shown, connected to the pulse power module 310. The chamber apparatus CH of this modification differs from the chamber apparatus CH of the first embodiment mainly in that the openings 360H are smaller than the openings 360H of the first embodiment and are not formed at equal intervals.

[0131] In this variation, the openings 360H are configured to be of equal size and shape. The distance between adjacent openings 360H increases as the distance from the power supply terminal 320 in the specified direction increases. Therefore, the density of openings 360H is greater in areas of the connecting member 360 that are less than a specified distance from the power supply terminal 320 in the specified direction than in areas of the connecting member 360 that are at least a specified distance from the power supply terminal 320 in the specified direction. As described above, there is only one power supply terminal 320, which is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the specified direction. Therefore, the density of openings 360H in areas closer to this midpoint is greater than the density of openings 360H in areas farther from this midpoint. Consequently, the porosity of the openings 360H increases as the porosity in the specified direction increases as the openings 360H are closer to the midpoint. With this structure, the connection member 360 makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform, compared to a case where the connection member 360 does not have a plurality of openings 360H. Therefore, the inductance compensation structure of this modified example includes a plurality of openings 360H of equal size formed at the above density.

[0132] According to this modification, the distribution of inductance can be adjusted by adjusting the position and number of the openings 360H.

[0133] Furthermore, in this variation, as long as the inductance distribution caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is nearly uniform compared to a case where no opening 360H is formed, the size of the opening 360H does not need to be fixed. Furthermore, as long as the distance from the power supply terminal 320 in a predetermined direction increases, the distance between adjacent openings 360H increases; it is not necessary for all openings 360H to have the same distance.

[0134] 3.4 Modification 2

[0135] Figure 9 is with Figure 5 Similarly, a diagram shows a circuit in this modification example connected to the pulse power module 310. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the first embodiment in that the sizes of the plurality of openings 360H are unequal.

[0136] In this variation, the openings 360H are arranged along a predetermined direction and formed at equal intervals. Therefore, the openings 360H are formed at different locations along the predetermined direction of the connecting member 360. In this variation, the larger the distance from the power supply terminal 320 in the predetermined direction, the smaller the openings 360H. Therefore, in this variation, the openings 360H formed in areas of the connecting member 360 where the distance from the power supply terminal 320 in the predetermined direction is less than the predetermined distance are larger than the openings 360H formed in areas of the connecting member 360 where the distance from the power supply terminal 320 in the predetermined direction is greater than the predetermined distance. As described above, there is only one power supply terminal 320, which is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the predetermined direction. Therefore, the openings 360H in areas closer to this midpoint are larger than those in areas further away from this midpoint. Consequently, the porosity of the openings 360H increases as the porosity increases towards the midpoint in the predetermined direction. With this structure, the connection member 360 makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform, compared to a case where the connection member 360 does not have multiple openings 360H. Therefore, the inductance compensation structure of this modified example includes multiple openings 360H of different sizes formed at different positions in a predetermined direction of the connection member 360 as described above.

[0137] According to this modification, the distribution of inductance can be adjusted by adjusting the position and size of the opening 360H.

[0138] In this modification, the openings 360H do not need to be formed at equal intervals as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made nearly uniform compared to a case where the openings 360H are not formed.

[0139] 3.5 Modification 3

[0140] Figure 10 is with Figure 5 Similarly, a diagram shows a circuit in this modification example connected to the pulse power module 310. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the first embodiment in that the shape of the plurality of openings 360H is not circular.

[0141] In this variation, the openings 360H are generally elliptical, with their major axes extending along a predetermined direction. In this variation, as in variation 1, the density of the openings 360H is greater in areas of the connecting member 360 that are closer than a predetermined distance to the power supply terminal 320 in the predetermined direction than in areas of the connecting member 360 that are farther than the predetermined distance from the power supply terminal 320 in the predetermined direction. Therefore, the inductance compensation structure of this variation includes a plurality of elliptical openings 360H formed at this density.

[0142] According to this modification, it is possible to Figure 7 、 Figure 8 The same effects as those of the embodiment and its modified examples described in .

[0143] Furthermore, in this variation, as long as the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 is made nearly uniform compared to a case where openings 360H are not formed, the long axis of openings 360H does not need to be aligned with the predetermined direction; for example, it may be aligned in a direction perpendicular to the predetermined direction. Furthermore, as long as the distribution of inductance is nearly uniform as described above, the shape of each opening 360H is not limited to an ellipse and may be another equal shape. Examples of such shapes include triangles, quadrilaterals, and racetracks.

[0144] 3.6 Variation 4

[0145] Figure 11 is with Figure 5 The diagram also shows a circuit in this modification connected to the pulse power module 310. The chamber apparatus CH in this modification differs from the chamber apparatus CH in the first embodiment mainly in that there are two power supply terminals 320 and the sizes of the plurality of openings 360H are unequal.

[0146] The power supply terminal 320 of this variation is connected to both ends of the connecting plate 330 in the longitudinal direction. In this variation, similar to variation 2, the openings 360H are arranged along a predetermined direction and formed at equal intervals. The greater the distance from the power supply terminal 320 in the predetermined direction, the smaller the opening 360H. Therefore, in this variation, the closer the opening 360H is to the approximate midpoint between the capacitor 340 arranged closest to one end and the capacitor 340 arranged closest to the other end in the predetermined direction, the smaller the opening 360H. With this structure, compared to a case where the connecting member 360 does not have multiple openings 360H formed, the connecting member 360 makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 nearly uniform. Therefore, the inductance compensation structure of this variation includes multiple openings 360H of different sizes and formed at different positions in the predetermined direction of the connecting member 360 as described above.

[0147] According to this modification, even when there are a plurality of power supply terminals 320 , the distribution of inductance can be adjusted by adjusting the position and size of the opening 360H.

[0148] In this modification, the openings 360H do not need to be formed at equal intervals as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made nearly uniform compared to a case where the openings 360H are not formed.

[0149] The number of power supply terminals 320 may be three or more, but is preferably less than the number of capacitors 340 arranged in parallel in the predetermined direction. Even in this case, the opening 360H becomes smaller as the distance from the power supply terminal 320 in the predetermined direction increases.

[0150] Furthermore, if two power supply terminals 320 are provided as in this variation, as in variation 1, the density of openings 360H decreases as the distance from the capacitor 340 closest to one end and the capacitor 340 closest to the other end in a predetermined direction approaches the midpoint. This structure allows the connecting member 360 to achieve a more uniform distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340, compared to a case where the connecting member 360 does not have multiple openings 360H. Furthermore, even when there are three or more power supply terminals 320, the density of openings 360H decreases as the distance from the power supply terminal 320 in the predetermined direction increases.

[0151] 3.7 Modification 5

[0152] Figure 12 is with Figure 5 Similarly, a diagram shows a circuit in this modification example connected to the pulse power module 310. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the first embodiment in that the shapes of the plurality of openings 360H are not fixed.

[0153] In this variation, the inductance compensation structure includes openings 360H of varying shapes. In this variation, the openings 360H are polygonal, such as circular, triangular, and quadrilateral, as well as a racetrack shape. These various openings 360H make the inductance distribution caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform than when no openings 360H are formed.

[0154] According to this modification, the inductance distribution can be adjusted by adjusting the shape of the opening 360H.

[0155] The shape of the opening 360H is not limited to the above-described shape as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 can be made nearly uniform compared to a case where the opening 360H is not formed.

[0156] 3.8 Modification 6

[0157] Figure 13 is with Figure 5 The diagram also shows a circuit in this variation connected to the pulse power module 310. The chamber apparatus CH in this variation differs from the chamber apparatus CH in the first embodiment primarily in that the connection member 360 includes a plurality of punched metal plates 360P1 and 360P2 having openings 360H of varying densities and arranged in a predetermined direction.

[0158] In this variation, connecting member 360 is comprised of a punched metal plate 360P1, a punched metal plate 360P2, and a conductive plate 360F having no openings. Punched metal plate 360P1, punched metal plate 360P2, and conductive plate 360F are connected to retaining portion 350 and ground terminal 390, respectively. Punched metal plate 360P1 is positioned closest to power supply terminal 320, punched metal plate 360P2 is positioned farther from power supply terminal 320 than punched metal plate 360P1, and conductive plate 360F is positioned farther from power supply terminal 320 than punched metal plate 360P2. Furthermore, in this variation, punched metal plate 360P1 is connected to punched metal plate 360P2, and punched metal plate 360P2 is connected to conductive plate 360F.

[0159] The openings 360H formed in the perforated metal plate 360P1 are larger than the openings 360H formed in the perforated metal plate 360P2. Furthermore, the density of the plurality of openings 360H formed in the perforated metal plate 360P1 is greater than the density of the plurality of openings 360H formed in the perforated metal plate 360P2. Therefore, in this variation, the openings 360H formed in a region of the connecting member 360 that is less than a predetermined distance from the power supply terminal 320 in a predetermined direction are larger than the openings 360H formed in a region of the connecting member 360 that is more than a predetermined distance from the power supply terminal 320 in a predetermined direction. Furthermore, in this variation, the density of the openings 360H is greater in the region of the connecting member 360 that is less than a predetermined distance from the power supply terminal 320 in a predetermined direction than in the region of the connecting member 360 that is more than a predetermined distance from the power supply terminal 320 in the predetermined direction. With this structure, the connection member 360 makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 nearly uniform, compared to a case where the plurality of openings 360H are not formed in the connection member 360 .

[0160] According to this modification, the size and density of the openings 360H can be varied in a predetermined direction using the punched metal plates 360P1 and 360P2 that are readily available on the market.

[0161] In addition, as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is nearly uniform compared to the case where the opening 360H is not formed, the density and size of the openings 360H in the punched metal plates 360P1 and 360P2 can be the same.

[0162] 4. Description of the Gas Laser Device of Embodiment 2

[0163] Next, a description will be given of a gas laser device according to Embodiment 2. The same components as those described above are denoted by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified.

[0164] 4.1 Structure

[0165] Figure 14 is with Figure 5 Similarly, a diagram shows a circuit in this embodiment connected to the pulse power module 310. The chamber apparatus CH of this embodiment differs primarily from the chamber apparatus CH of the comparative example in that the connecting member 360 has multiple notches 360N instead of openings 360H. In the following figures, among notches 360N of the same shape and size, some notches 360N may be assigned reference numerals, while others may not be assigned reference numerals.

[0166] In this embodiment, each notch 360N is of the same size and shape, forming a roughly V-shaped shape. Multiple notches 360N are arranged along a predetermined direction and formed at equal intervals. Furthermore, the notches 360N are formed near the center of each of the pair of connecting components 360 in the longitudinal direction, on the retaining portion 350 side and the ground terminal 390 side. Specifically, the notches 360N are formed in an area where the distance from the power supply terminal 320 in the predetermined direction is less than the predetermined distance, and are not formed in an area where the distance from the power supply terminal 320 is greater than the predetermined distance. Therefore, the void ratio of the notches 360N in the area of ​​the connecting component 360 that is less than the predetermined distance and closest to the power supply terminal 320 in the predetermined direction is greater than the void ratio of the notches 360N in the area of ​​the connecting component 360 that is greater than the predetermined distance from the power supply terminal 320 in the predetermined direction. Furthermore, the area of ​​the void in this embodiment refers to the area of ​​the notches 360N. In this embodiment, as in the comparative example, there is only one power supply terminal 320, which is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the predetermined direction. Therefore, in an area closer than a predetermined distance from this midpoint in the predetermined direction, the porosity is greater than in an area farther than the predetermined distance from this midpoint.

[0167] By forming the notches 360N as described above, the inductance caused by the connecting member 360 in the area where the distance from the power supply terminal 320 in the specified direction is less than the specified distance can be reduced. By forming multiple notches 360N in the connecting member 360, the distribution of the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made more uniform compared to a case where the connecting member 360 does not have multiple notches 360N. Therefore, the connecting member 360 of this embodiment includes an inductance compensation structure that makes the distribution of the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform. This inductance compensation structure is configured to make the inductance of the connecting member 360 closer to the power supply terminal 320 greater than that of the area farther away from the power supply terminal 320. In this embodiment, the inductance compensation structure includes multiple notches 360N.

[0168] 4.2 Function and effect

[0169] The chamber apparatus CH of this embodiment includes the aforementioned inductance compensation structure. Therefore, similar to Embodiment 1, cathode wear can be made nearly uniform along the longitudinal direction, extending the life of the chamber apparatus CH. Furthermore, the inductance compensation structure can be formed by the notch 360N, making it easy to achieve nearly uniform distribution of inductance due to the distance from one terminal 341 of the capacitor 340.

[0170] Furthermore, in this embodiment, four notches 360N are formed in the connecting member 360 along a predetermined direction. However, as long as the notches 360N provide a more uniform distribution of inductance due to the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340, compared to a case without notches 360N, the number and positions of notches 360N are not limited to those described above. Therefore, the number of notches 360N may be one or five or more.

[0171] In this embodiment, the notches 360N are formed on both the holding portion 350 side and the ground terminal 390 side of the connecting member 360. However, the notches 360N may be formed on only one of the holding portion 350 side and the ground terminal 390 side of the connecting member 360.

[0172] The following describes variations of this embodiment. In the following variations, identical components to those in Embodiment 2 are denoted by the same reference numerals, and duplicate descriptions are omitted unless otherwise specified. In some drawings, for ease of viewing, portions of components may be omitted or simplified.

[0173] 4.3 Modification 1

[0174] Figure 15 is with Figure 5 Similarly, a diagram of a circuit in this modification example connected to the pulse power module 310 is shown. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the second embodiment in that the notches 360N are not formed at equal intervals.

[0175] In this variation, the size and shape of each notch 360N are equal. The distance between adjacent notches 360N increases as the distance from the power supply terminal 320 in the specified direction increases. Therefore, the density of notches 360N is greater in areas of the connecting member 360 where the distance from the power supply terminal 320 in the specified direction is less than a specified distance, than in areas of the connecting member 360 where the distance from the power supply terminal 320 in the specified direction is greater than the density. As described above, there is only one power supply terminal 320, which is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the specified direction. Therefore, the density of notches 360N in areas closer to this midpoint is greater than the density of notches 360N in areas further away from this midpoint. Consequently, the porosity resulting from the notches 360N increases as the distance from the midpoint in the specified direction increases. With this structure, the connecting member 360 makes the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform, compared to a case where the connecting member 360 does not have the plurality of notches 360N. Therefore, the inductance compensation structure of this modified example includes the plurality of notches 360N of equal size formed at the above density.

[0176] According to this modification, the distribution of inductance can be adjusted by adjusting the position and number of the notches 360N.

[0177] In this modification, the size of the notch 360N may not be fixed as long as the distribution of the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made nearly uniform compared to the case where the notch 360N is not formed.

[0178] 4.4 Modification 2

[0179] Figure 16 is with Figure 5 Similarly, a diagram of a circuit in this modification example connected to the pulse power module 310 is shown. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the second embodiment in that the sizes of the plurality of notches 360N are unequal.

[0180] In this variation, the notches 360N are arranged along a predetermined direction and formed at equal intervals. Thus, the notches 360N are formed at different locations along the predetermined direction of the connecting member 360. In this variation, the greater the distance from the power supply terminal 320 in the predetermined direction, the smaller the notches 360N. Therefore, in this variation, the notches 360N formed in areas of the connecting member 360 where the distance from the power supply terminal 320 in the predetermined direction is less than the predetermined distance are larger than the notches 360N formed in areas of the connecting member 360 where the distance from the power supply terminal 320 in the predetermined direction is greater than the predetermined distance. As described above, there is only one power supply terminal 320, which is located approximately midway between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the predetermined direction. Therefore, the notches 360N in areas closer to this midpoint are larger than those in areas further away from this midpoint. Consequently, the porosity resulting from the notches 360N increases as the distance from the midpoint in the predetermined direction increases. With this structure, connecting member 360 makes the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform, compared to a case where connecting member 360 does not have multiple notches 360N. Therefore, the inductance compensation structure of this modified example includes multiple notches 360N of different sizes formed at different positions in a predetermined direction of connecting member 360 as described above.

[0181] According to this modification, the distribution of inductance can be adjusted by adjusting the position and size of the notch 360N.

[0182] In this modification, as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is nearly uniform compared to the case where the notches 360N are not formed, the notches 360N may not be formed at equal intervals.

[0183] 4.5 Variation 3

[0184] Figure 17 is with Figure 5 The diagram also shows a circuit in this modification connected to the pulse power module 310. The chamber apparatus CH in this modification differs from the chamber apparatus CH in the second embodiment mainly in that there are two power supply terminals 320 and the sizes of the plurality of notches 360N are unequal.

[0185] The power supply terminal 320 of this variation has the same structure as Variation 4 of Embodiment 1. In this variation, as in Variation 2 of Embodiment 2, notches 360N are arranged along a predetermined direction and formed at equal intervals. The larger the distance from the power supply terminal 320 in the predetermined direction, the smaller the notches 360N become. Therefore, in this variation, notches 360N decrease as they approach the approximate midpoint between the capacitor 340 positioned closest to one end and the capacitor 340 positioned closest to the other end in the predetermined direction. This structure allows the connecting member 360 to achieve a more uniform distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340, compared to a case where the connecting member 360 does not have multiple notches 360N. Therefore, the inductance compensation structure of this variation includes multiple notches 360N of varying sizes formed at different positions along the predetermined direction of the connecting member 360, as described above.

[0186] According to this modification, even when there are multiple power supply terminals 320 , the distribution of inductance can be adjusted by adjusting the position and size of the notch 360N.

[0187] In this modification, as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is nearly uniform compared to the case where the notches 360N are not formed, the notches 360N may not be formed at equal intervals.

[0188] In addition, the number of power supply terminals 320 may be three or more. Even in this case, in this modification, the larger the distance from the power supply terminal 320 in the predetermined direction, the smaller the notch 360N.

[0189] Furthermore, if two power supply terminals 320 are provided, as in this variation, and variation 1 of embodiment 2 is applied, the density of notches 360N decreases as the distance from the capacitor 340 closest to one end and the capacitor 340 closest to the other end in a predetermined direction approaches the midpoint. This structure allows the connecting member 360 to achieve a more uniform distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340, compared to a case where the connecting member 360 does not have multiple notches 360N. Furthermore, even when there are three or more power supply terminals 320, the density of notches 360N decreases as the distance from the power supply terminal 320 in the predetermined direction increases.

[0190] 4.6 Variation 4

[0191] Figure 18 is with Figure 5Similarly, a diagram shows a circuit in this modification example connected to the pulse power module 310. The chamber apparatus CH in this modification example mainly differs from the chamber apparatus CH in the first embodiment in that the shapes of the plurality of notches 360N are not fixed.

[0192] In this variation, the inductance compensation structure includes notches 360N of varying shapes. In this variation, notches 360N are polygonal, such as V-shaped, U-shaped, and quadrilateral. These various notches 360N make the inductance distribution caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform than in a case without notches 360N.

[0193] According to this modification, the inductance distribution can be adjusted by adjusting the shape of the notch 360N.

[0194] The shape of the notch 360N is not limited to the above-described shape as long as the distribution of inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 can be made nearly uniform compared to a case where the opening 360H is not formed.

[0195] 5. Description of the Gas Laser Device of Embodiment 3

[0196] Next, a description will be given of a gas laser device according to Embodiment 3. The same components as those described above are denoted by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified.

[0197] 5.1 Structure

[0198] Figure 19 is with Figure 5 Similarly, a diagram of the circuit in this embodiment connected to the pulse power module 310 is shown. The chamber apparatus CH in this embodiment differs primarily from the chamber apparatus CH in Embodiments 1 and 2 in that one connecting member 360 is composed of a plurality of conductive plate portions 360F1 and 360F2, while the other connecting member 360 is composed of a plurality of conductive plate portions 360F3 and 360F4.

[0199] Plate portions 360F1 and 360F2 are arranged on one side of power supply terminal 320 in a direction perpendicular to the predetermined direction, while plate portions 360F3 and 360F4 are arranged on the other side of power supply terminal 320. Plate portions 360F1 and 360F3 are arranged closest to power supply terminal 320. A pair of plate portions 360F2 are arranged farther from power supply terminal 320 than plate portion 360F1, sandwiching plate portion 360F1. A pair of plate portions 360F4 are arranged farther from power supply terminal 320 than plate portion 360F3, sandwiching plate portion 360F3. Plate portion 360F1 is separated from each plate portion 360F2, and plate portion 360F3 is separated from each plate portion 360F4.

[0200] The plate portions 360F1 to 360F4 are independently connected to the retaining portion 350 and the grounding terminal 390, respectively. In addition, the plate portion 360F1 is roughly U-shaped and is connected to the retaining portion 350 at two locations. Therefore, in the plate portion 360F1, the total width of the two locations along the prescribed direction extending in the direction perpendicular to the prescribed direction becomes the minimum value of the conductive width of the plate portion 360F1 along the prescribed direction. The conductive width is the width of the location through which current can flow. The pair of plate portions 360F2 are shaped to be line-symmetrical to each other in the prescribed direction, and the pair of plate portions 360F4 are shaped to be line-symmetrical to each other in the prescribed direction. Among the plate portions 360F2 to 360F4, the width of the location connected to the retaining portion 350 is the minimum value of the conductive width along the prescribed direction. The minimum conductive width of plate portion 360F1 along a predetermined direction is smaller than the conductive width of each plate portion 360F2 along the predetermined direction, and the minimum conductive width of plate portion 360F3 along the predetermined direction is smaller than the conductive width of each plate portion 360F4 along the predetermined direction. Therefore, the inductance from the retaining portion 350 to the ground terminal 390 of plate portion 360F1 is greater than the inductance from the retaining portion 350 to the ground terminal 390 of plate portion 360F2, and the inductance from the retaining portion 350 to the ground terminal 390 of plate portion 360F3 is greater than the inductance from the retaining portion 350 to the ground terminal 390 of plate portion 360F4. With this structure, connecting member 360 makes the inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 more uniform, compared to a case where connecting member 360 is connected from one end to the other.

[0201] That is, in this embodiment, the connecting component 360 is composed of a plurality of conductive plate portions 360F1, 360F2 or plate portions 360F3, 360F4 arranged separately from each other along a prescribed direction, and the inductance compensation structure includes each plate portion 360F1, 360F2 or plate portions 360F3, 360F4, and the minimum value of the conductive width of the plate portions 360F1, 360F3 that are less than the prescribed distance from the power supply terminal 320 in the prescribed direction and the nearest plate portions 360F1, 360F3 is less than the minimum value of the conductive width of the plate portions 360F2, 360F4 that are more than the prescribed distance away from the power supply terminal 320 in the prescribed direction.

[0202] 5.2 Function and effect

[0203] The chamber apparatus CH of this embodiment includes the aforementioned inductance compensation structure. Therefore, similar to Embodiment 1, cathode wear can be made nearly uniform along the longitudinal direction, extending the life of the chamber apparatus CH. Furthermore, according to this embodiment, by varying the minimum conductive width of each plate portion 360F1 to 360F4, the distribution of inductance due to the distance from one terminal 341 of the capacitor 340 can be easily made nearly uniform.

[0204] 6. Description of the Gas Laser Device of Embodiment 4

[0205] Next, a description will be given of a gas laser device according to Embodiment 4. The same components as those described above are denoted by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified.

[0206] 6.1 Structure

[0207] Figure 20 is with Figure 5 Similarly, a diagram shows a circuit in this embodiment connected to the pulse power module 310. The chamber apparatus CH in this embodiment differs primarily from the chamber apparatus CH in Embodiment 1 in that the capacitance of the capacitor 340S located at the extreme end in a predetermined direction is smaller than that of the other capacitors 340. Therefore, when the same voltage is applied from the power supply terminal 320, the charging cycle of the capacitor 340S is shorter than that of the other capacitors 340.

[0208] 6.2 Action and Effect

[0209] In this embodiment, the structure of connecting member 360 is the same as that of connecting member 360 in Embodiment 1. Therefore, the inductance compensation structure includes a plurality of openings 360H. However, if connecting member 360 cannot completely uniformize the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340, the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 can be made more uniform by varying the capacitance of capacitor 340S.

[0210] In addition, Figure 20 In the example, an example is shown in which the capacitance of the capacitor 340S located at the extreme end in the prescribed direction is smaller than the capacitance of the other capacitors 340. However, the present embodiment is not limited to this, and the capacitance of the capacitor 340S configured from the extreme end in the prescribed direction to the prescribed position may be smaller than the capacitance of the other capacitors 340. For example, the capacitance of 2 to 3 capacitors 340 may be reduced from the extreme end in the prescribed direction and used as the capacitor 340S without changing the capacitance of the other capacitors 340. That is, in the present embodiment, as long as the distribution of the inductance caused by the distance between the power supply terminal 320 and one terminal 341 of each capacitor 340 is made close to uniform, the capacitance of the capacitor 340S configured at a distance greater than the prescribed distance from the power supply terminal 320 in the prescribed direction is smaller than the capacitance of the capacitor 340 configured at the closest position at a distance less than the prescribed distance from the power supply terminal 320 in the prescribed direction.

[0211] In addition, the structure in which the capacitor 340S is provided as in this embodiment can also be applied to the modification of the first embodiment, the second embodiment and its modification, and the third embodiment.

[0212] 7. Description of the Gas Laser Device of Embodiment 5

[0213] Next, a description will be given of a gas laser device according to Embodiment 5. The same components as those described above are denoted by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified.

[0214] 7.1 Structure

[0215] Figure 21 is with Figure 5Similarly, a diagram of the circuit in this embodiment connected to the pulse power module 310 is shown. In the chamber apparatus CH of this embodiment, the capacitors 340 arranged near the power supply terminal 320 are arranged at equal intervals along a predetermined direction, similar to the first embodiment. However, the intervals between capacitors 340 arranged farther from the power supply terminal 320 are greater than the intervals between capacitors 340 arranged near the power supply terminal 320. In other words, in this embodiment, the density of capacitors 340 arranged at a distance greater than a predetermined distance from the power supply terminal 320 in the predetermined direction is lower than the density of capacitors 340 arranged closest to the power supply terminal 320 in the predetermined direction.

[0216] 7.2 Action and Effect

[0217] In this embodiment, the structure of connecting member 360 is the same as that of connecting member 360 in Embodiment 1. Therefore, the inductance compensation structure includes a plurality of openings 360H. However, if connecting member 360 cannot completely uniformize the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340, the distribution of inductance caused by the distance between power supply terminal 320 and one terminal 341 of each capacitor 340 can be made more uniform by reducing the density of capacitors 340 arranged at a distance greater than a specified distance from power supply terminal 320 in a specified direction.

[0218] Furthermore, the structure in which the capacitor 340 is provided as in this embodiment can also be applied to the modification of the first embodiment, the second embodiment and its modification, the third embodiment, and the fourth embodiment.

[0219] The above description is not limiting but merely illustrative. Therefore, it is obvious to those skilled in the art that changes can be made to the embodiments of the present disclosure without departing from the scope of the claims. In addition, it is obvious to those skilled in the art that the embodiments of the present disclosure can be used in combination. Unless otherwise specified, the terms used in this specification and claims should be interpreted as "non-restrictive" terms. For example, terms such as "including", "having", "having", and "having" should be interpreted as "not excluding the presence of constituent elements other than the recorded constituent elements". In addition, the modifier "1" should be interpreted as "at least 1" or "1 or more". In addition, terms such as "at least one of A, B and C" should be interpreted as "A", "B", "C", "A+B", "A+C", "B+C" or "A+B+C", and should also be interpreted as including combinations of them with contents other than "A", "B" and "C".

Claims

1. A chamber device, wherein: The chamber device comprises: a pair of discharge electrodes arranged with their longitudinal directions along a predetermined direction and facing each other with a gap therebetween; a chamber, wherein the pair of discharge electrodes are disposed in an inner space of the chamber, and laser gas is sealed in the inner space; a plurality of capacitors arranged in parallel along the prescribed direction; at least one power supply terminal electrically connecting one of the discharge electrodes and one terminal of each of the capacitors to a high voltage power source; as well as a conductive plate-shaped connecting member extending along the plurality of capacitors in the prescribed direction and electrically connected to the other terminal of each of the capacitors, wherein a portion of the connecting member that is away from a portion of the connecting member electrically connected to the other terminal in a direction perpendicular to the prescribed direction is grounded; The connecting member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and the one terminal of each of the capacitors nearly uniform.

2. The chamber device according to claim 1, wherein The inductance compensation structure is a structure configured such that the inductance of a region of the connecting member close to the power supply terminal is larger than that of a region far from the power supply terminal.

3. The chamber device according to claim 1, wherein: The inductance compensation structure includes at least one opening formed in the connecting component, The porosity of the opening in the area of ​​the connecting component that is less than a specified distance from the power supply terminal in the specified direction and is closest to the power supply terminal is greater than the porosity of the opening in the area of ​​the connecting component that is greater than the specified distance from the power supply terminal in the specified direction.

4. The chamber device according to claim 3, wherein: There is one power supply terminal, which is located approximately midway between the capacitor disposed closest to one end and the capacitor disposed closest to the other end in the predetermined direction. The closer to the midpoint in the predetermined direction, the larger the porosity.

5. The chamber device according to claim 3, wherein: The inductance compensation structure includes a plurality of openings. The density of the openings formed in a region of the connecting component where the distance from the power supply terminal in the prescribed direction is less than a prescribed distance is greater than the density of the openings formed in a region of the connecting component where the distance from the power supply terminal in the prescribed direction is greater than the prescribed distance.

6. The chamber device according to claim 5, wherein: The connecting member includes a plurality of punched metal plates having openings of different densities and arranged in the predetermined direction.

7. The chamber device according to claim 3, wherein: The inductance compensation structure includes a plurality of openings formed at mutually different positions in the predetermined direction of the connecting member. The opening formed in a region of the connecting member where the distance from the power supply terminal in the prescribed direction is less than a prescribed distance is larger than the opening formed in a region of the connecting member where the distance from the power supply terminal in the prescribed direction is greater than the prescribed distance.

8. The chamber device according to claim 7, wherein: The connecting member includes a plurality of punched metal plates whose openings have different sizes and are arranged along the predetermined direction.

9. The chamber device according to claim 3, wherein: The opening is circular in shape.

10. The chamber device according to claim 1, wherein The inductance compensation structure includes at least one notch formed in the connecting component, Based on the fact that the porosity of the notch in the area of ​​the connecting component that is less than a specified distance from the power supply terminal in the specified direction and is closest to the notch is greater than the porosity of the notch in the area of ​​the connecting component that is greater than the specified distance from the power supply terminal in the specified direction.

11. The chamber device according to claim 10, wherein: There is one power supply terminal, which is located approximately midway between the capacitor disposed closest to one end and the capacitor disposed closest to the other end in the predetermined direction. The closer to the midpoint in the predetermined direction, the larger the porosity.

12. The chamber device according to claim 10, wherein: The inductance compensation structure includes a plurality of gaps. The density of the notches formed in the region of the connecting component where the distance from the power supply terminal in the specified direction is smaller than the specified distance is greater than the density of the notches formed in the region of the connecting component where the distance from the power supply terminal in the specified direction is greater than the specified distance.

13. The chamber device according to claim 10, wherein: The inductance compensation structure includes a plurality of notches formed along the prescribed direction, The area of ​​the notch formed in a region of the connecting component where the distance from the power supply terminal in the prescribed direction is smaller than a prescribed distance is larger than the area of ​​the notch formed in a region of the connecting component where the distance from the power supply terminal in the prescribed direction is greater than the prescribed distance.

14. The chamber device according to claim 1, wherein The inductance compensation structure is composed of a plurality of conductive plate portions arranged in a manner spaced apart from each other along the predetermined direction. The minimum value of the conductive width of the plate portion that is closest to the power supply terminal and is less than the prescribed distance in the prescribed direction is smaller than the minimum value of the conductive width of the plate portion that is greater than the prescribed distance in the prescribed direction.

15. The chamber device according to claim 1, wherein The capacitance of the capacitor located at a position at a distance greater than a predetermined distance from the power supply terminal in the predetermined direction is smaller than the capacitance of the capacitor located closest to the power supply terminal and at a distance less than the predetermined distance in the predetermined direction.

16. The chamber device according to claim 1, wherein The density of the capacitors arranged at a position at a distance from the power supply terminal in the prescribed direction that is greater than a prescribed distance is smaller than the density of the capacitors arranged at a position closest to the power supply terminal in the prescribed direction that is less than the prescribed distance.

17. A gas laser device that uses a chamber device to amplify and emit laser light, wherein: The chamber device comprises: a pair of discharge electrodes arranged with their longitudinal directions along a predetermined direction and facing each other with a gap therebetween; a chamber, wherein the pair of discharge electrodes are disposed in an inner space of the chamber, and laser gas is sealed in the inner space; a plurality of capacitors arranged in parallel along the prescribed direction; at least one power supply terminal electrically connecting one of the discharge electrodes and one terminal of each of the capacitors to a high voltage power source; as well as a conductive plate-shaped connecting member extending along the plurality of capacitors in the prescribed direction, electrically connected to the other terminal of each of the capacitors, and electrically connected to the cavity at a location that is away from a location of the connecting member connected to the other terminal in a direction perpendicular to the prescribed direction; The connecting member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and the one terminal of each of the capacitors nearly uniform.

18. A method for manufacturing a pair of electronic devices, wherein: The manufacturing method of the electronic device comprises the following steps: generating laser light by a gas laser device; outputting the laser light to an exposure device; and exposing the laser light on a photosensitive substrate in the exposure device to manufacture an electronic device, The gas laser device utilizes a chamber device to amplify and emit laser light. The chamber device comprises: a pair of discharge electrodes arranged with their longitudinal directions along a predetermined direction and facing each other with a gap therebetween; a chamber, wherein the pair of discharge electrodes are disposed in an inner space of the chamber, and laser gas is sealed in the inner space; a plurality of capacitors arranged in parallel along the prescribed direction; at least one power supply terminal electrically connecting one of the discharge electrodes and one terminal of each of the capacitors to a high voltage power source; as well as a conductive plate-shaped connecting member extending along the plurality of capacitors in the prescribed direction, electrically connected to the other terminal of each of the capacitors, and electrically connected to the cavity at a location that is away from a location of the connecting member connected to the other terminal in a direction perpendicular to the prescribed direction; The connecting member includes an inductance compensation structure that makes the distribution of inductance caused by the distance between the power supply terminal and the one terminal of each of the capacitors nearly uniform.

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