Rapid constant-temperature liquid supply device of chemical mechanical polishing machine

Abstract

The invention discloses a rapid constant-temperature liquid supply device of a chemical mechanical polishing machine, and relates to the field of chemical polishing solutions, the rapid constant-temperature liquid supply device comprises a main liquid supply barrel and a recycling barrel, a communicating pipe is arranged between the main liquid supply barrel and the recycling barrel, the main liquid supply barrel and the recycling barrel are both double-layer barrel walls, and a spiral layer plate is arranged in the middle of each double-layer barrel wall; the double-layer barrel wall and the spiral layer plate form a labyrinth type cooling water channel, the upper end and the lower end of the labyrinth type cooling water channel are connected with a cooling water outlet and a cooling water inlet respectively, temperature sensors are arranged in the main liquid supply barrel and the recycling barrel respectively, and a heating table is arranged at the bottom of the main liquid supply barrel. By means of the labyrinth type cooling water way, cooling water can make contact with the whole barrel wall, the heat conduction path is shortened, the upper portion and the lower portion of the barrel wall participate in cooling, the heating function of the heating table and the temperature detection function of the temperature sensor are matched, the effect of constant-temperature polishing liquid is rapidly achieved, no excessive structure exists in the main liquid supply barrel, cleaning is more convenient, and use is more convenient. And the residue of pollution particles can be reduced.

Description

Technical Field

[0001] The present application relates to the technical field of chemical polishing liquid, and in particular to a rapid constant temperature liquid supply device for a chemical mechanical polishing machine. Background Art

[0002] Chemical mechanical polishing (CMP) is a global planarization technology that combines chemical etching and mechanical grinding. In high-precision fields like semiconductor manufacturing, as chip integration continues to increase and the number of device layers grows, traditional mechanical grinding alone is prone to surface damage, scratches, and other defects. While chemical etching can remove material, it struggles to guarantee surface flatness. CMP technology, on the other hand, involves a chemical reaction between chemical reagents and materials, combined with mechanical grinding to remove the reaction products. This allows for the effective processing of large-scale, high-flatness surfaces, meeting the surface quality requirements of advanced processes.

[0003] A search revealed a Chinese patent document that discloses a polishing liquid constant temperature device for plasma liquid nanopolishing [Application Number: CN202222086731.5; Publication Number: CN217836906U]. This polishing liquid constant temperature device includes an insulation box, an input pipe, an output pipe, and a liquid storage tank for storing the polishing liquid. The liquid storage tank is disposed within the insulation box, and both the input pipe and the output pipe are fixedly connected to the insulation box. The input pipe is connected to a drive member, and both the input pipe and the output pipe are in communication with the interior of the insulation box. When the processing equipment is temporarily idle, the polishing liquid is placed in the liquid storage tank, which is then placed within the insulation box. The drive member is activated to input the insulation liquid into the insulation box via the input pipe, and the insulation liquid is used to keep the polishing liquid in the liquid storage tank warm. By providing a constant temperature device to keep the polishing liquid warm, the temperature of the polishing liquid is kept ready for polishing processing at any time, thereby achieving the purpose of improving the production efficiency of the polishing process.

[0004] However, the barrel wall of the above-mentioned device is an integral cavity, resulting in uncontrolled flow of cooling water inside it, and the polishing liquid in the barrel cannot maintain consistent temperature, resulting in the polishing liquid temperature being high and low at times, resulting in inaccurate wafer precision. This method seriously affects polishing accuracy and output. In addition, the liquid supply device used in the traditional chemical mechanical polishing solution has a cooling tube placed in a rotating manner inside. During use, it cannot quickly and effectively cool down to the appropriate temperature, which also affects daily cleaning and is prone to contamination particles. Summary of the Invention

[0005] In order to improve the temperature control efficiency of the chemical polishing liquid and keep the interior of the liquid supply device easy to clean, the present application provides a rapid constant temperature liquid supply device for a chemical mechanical polishing machine.

[0006] The present application provides a rapid constant temperature liquid supply device for a chemical mechanical polisher using the following technical solutions:

[0007] A rapid constant temperature liquid supply device for a chemical mechanical polishing machine comprises a main liquid supply barrel and a recovery barrel, a connecting pipe is provided between the main liquid supply barrel and the recovery barrel, and a liquid pump is installed on the connecting pipe, a recovery pipe is provided on the recovery barrel, and a liquid supply pipe is provided on the main liquid supply barrel. Both the main liquid supply barrel and the recovery barrel have double-layer cylinder walls, and a spiral layer plate is provided in the middle of the double-layer cylinder wall. The inner and outer sides of the spiral layer plate are fixed to the double-layer cylinder wall, and the double-layer cylinder wall and the spiral layer plate form a labyrinth cooling water path. The upper and lower ends of the labyrinth cooling water path are respectively connected to a cooling water outlet and a cooling water inlet. Temperature sensors are provided in both the main liquid supply barrel and the recovery barrel, and a heating platform is provided at the bottom of the main liquid supply barrel.

[0008] By adopting the above technical solution, the refluxed polishing liquid enters the recovery barrel through the recovery pipe, and after preliminary cooling in the recovery barrel, it flows to the main liquid supply barrel through the liquid pump and the connecting pipe. After the rapid constant temperature of the main liquid supply barrel, the polishing liquid can quickly reach the use temperature. The cooling principle of the recovery barrel and the main liquid supply barrel is the same. Cooling water is injected into the labyrinth cooling water channel through the cooling water inlet. The cooling water flows through the entire labyrinth cooling water channel and is discharged from the cooling water outlet. During this period, the cooling water contacts the cylinder wall and exchanges temperature with the polishing liquid inside through the cylinder wall. Moreover, the upper and lower parts of the cylinder wall participate in cooling, thereby achieving a rapid cooling effect. In addition, a heating platform is provided at the bottom of the main liquid supply barrel, and a temperature sensor is provided inside. When the temperature is higher than the set temperature, the heating platform is turned on to heat the polishing liquid inside, thereby achieving a constant temperature effect.

[0009] Preferably, a plurality of heat-conducting metal columns are fixed to the bottom of the main liquid supply barrel, a lower fixing ring is fixed to the outer side of the bottom of the heat-conducting metal columns, the upper end cover of the main liquid supply barrel is connected to a plurality of air pipes passing through the cover, the air pipes are located directly above the heat-conducting metal columns at corresponding positions, an expansion pipe is fixed below the air pipe, an upper fixing ring is fixed to the bottom edge of the expansion pipe, a tubular elastic film is sleeved on the outer side of the heat-conducting metal columns, and the upper and lower ends of the tubular elastic film are sealed and fixed to the upper fixing ring and the lower fixing ring respectively.

[0010] By adopting the above technical solution, when in use, the air pipeline is connected to the air pressure equipment. When the temperature of the polishing liquid in the main liquid supply barrel is lower than the set value, the air pipeline inhales air and generates negative pressure, so that the tubular elastic film is tightly attached to the outer surface of the heat-conducting metal column, so that the heat-conducting metal column can transfer the heat from the heating table to the inside of the polishing liquid, thereby improving the heating effect. Moreover, after the tubular elastic film shrinks, the occupied space is reduced. At this time, the liquid level of the polishing liquid will drop, and the distance between the upper polishing liquid and the heating table will be reduced, further improving the heating efficiency. When the temperature of the polishing liquid in the main liquid supply barrel is higher than the set value, the air pipeline is inflated, the tubular elastic film is expanded, the occupied space is expanded, the liquid surface of the polishing liquid is lifted upward, the contact area between the polishing liquid and the cylinder wall is increased, and the heat exchange efficiency between it and the cylinder wall is improved, thereby improving the cooling efficiency.

[0011] Preferably, the outer surface of the heat-conducting metal column is uneven, and the thickness of the tubular elastic film gradually increases from top to bottom.

[0012] By using the above technical scheme, the uneven surface can increase the surface area of the heat-conducting metal column, so that the heat exchange efficiency with the polishing liquid is improved. The bottom of the tubular elastic film is relatively thin, and when inflated, the bottom expands first, fully occupies the space of the polishing liquid. Compared with synchronous expansion from top to bottom, the same effect can be achieved with less gas, which can reduce energy consumption on the one hand and improve the liquid level rising speed of the polishing liquid when the liquid level is low on the other hand, thereby improving the heat exchange efficiency.

[0013] Preferably, a stirring rod is rotatably arranged at the middle position of the main liquid supply barrel, and the bottom of the stirring rod is provided with a spiral stirring blade. A drive motor for driving the stirring rod to rotate is installed at the upper end of the main liquid supply barrel. One end of the communication pipe inside the main liquid supply barrel is connected with the umbrella-shaped spray head.

[0014] By using the above technical scheme, the stirring rod stirs the polishing liquid under the drive of the drive motor, improves the heat exchange efficiency of the bottom and edge of the polishing liquid, and makes the internal temperature of the polishing liquid more uniform. The umbrella-shaped spray head can disperse the polishing liquid in the recovery barrel in the main liquid supply barrel, and also make the internal temperature of the polishing liquid more uniform.

[0015] Preferably, a hollow pipe is arranged at the middle position of the recovery barrel, and an annular flow channel is formed between the hollow pipe and the inner wall of the recovery barrel. A plurality of equally spaced partition plates are fixed in the annular flow channel. The partition plates divide the annular flow channel into a plurality of intervals, including a liquid inlet area, a liquid outlet area, and a plurality of flow areas uniformly distributed between the two. The communication pipe is located in the liquid outlet area, and the recovery pipe is located in the liquid inlet area. A vertical flow guide plate is arranged in the middle of the flow area, and a liquid flow channel is arranged between the bottom of the vertical flow guide plate and the bottom of the recovery barrel. An overflow port is formed in the partition plate, and the height of the overflow port gradually increases along the flow direction from the liquid inlet area to the liquid outlet area.

[0016] By using the above technical scheme, the returned polishing liquid enters the bottom of the liquid inlet area through the recovery pipe. When the liquid level of the liquid inlet area is higher than the bottom height of the overflow port formed in the partition plate on both sides, the polishing liquid will flow to the flow area. When the liquid level of the flow area is higher than the bottom height of the overflow port on the other side, the polishing liquid will flow to the next flow area. Moreover, when the polishing liquid flows in the flow area, it flows in from one side of the vertical flow guide plate and then pushes out the polishing liquid on the other side of the vertical flow guide plate, forming a U-shaped communication structure. This increases the flow path of the polishing liquid, improves the contact time and uniformity between the polishing liquid and the cylinder wall, and thus improves the cooling effect.

[0017] Preferably, a socket is provided on the inner side of the overflow port, and a filter plate is slidably inserted into the socket, and the filter aperture of the filter plate gradually decreases along the liquid flow direction of the annular flow channel, and a plurality of plate changing holes are provided on the upper end cover of the recovery barrel, and the plate changing holes are located above the partition plate at the corresponding position, and the upper end of the filter plate passes through the plate changing holes.

[0018] By adopting the above technical solution, when the overflow port of the polishing liquid passes through, it will be filtered by the filter plate. After filtering through multiple layers of different particle sizes, the polishing liquid can enter the main liquid supply barrel, preventing contaminated particles from entering the main liquid supply barrel. Moreover, when the filter plate is blocked, the operator can directly pull out the filter plate upwards and replace it with a new one, which is simple to operate.

[0019] Preferably, a lifting mechanism for lifting the filter plate is provided at the upper end of the hollow tube, and the lifting mechanism includes a bent rod hinged to the inner side of the hollow tube, and a gear is rotatably provided at the upper end of the bent rod, and a rack meshing with the gear is provided at the side end of the filter plate, and a lifting motor for driving the gear to rotate is installed at the upper end of the bent rod, and an elastic tension component is provided between the middle section of the bent rod and the inner wall of the hollow tube, and a liquid level sensor is installed in the interval of the partition plate near the upstream of the annular flow channel.

[0020] By adopting the above technical solution, when the liquid level sensor detects that the liquid level is higher than the set value, it indicates that the filter plate is blocked. At this time, the lifting motor starts, driving the gear to rotate and lift the filter plate upward by a certain distance, exposing the unblocked part below the filter plate, so that filtration can continue, reducing the frequency of operator replacement of the filter plate. When the filter plate rises to a certain height, the operator can move the gear away from the rack to overcome the tension of the elastic tension component, and then replace the filter plate and lower the filter plate to the bottom, repeating the process of automatic lifting of the filter plate.

[0021] Preferably, a first groove is provided at the lower corner of the filter plate near the rack, a first roller is rotatably arranged in the first groove, and the first roller is in contact with the inner wall of the socket, and a second groove is provided at the upper end of the partition plate, a second roller is rotatably arranged in the second groove, and the second roller is in contact with the side of the filter plate away from the rack.

[0022] By adopting the above technical solution, the filter plate is squeezed by the gear and is prone to tilting. When the filter plate is slightly tilted, one side of it is against the second roller, and the other side is against the inner wall of the socket through the first roller, which can reduce the resistance to the filter plate rising, making the filter plate rise more smoothly and preventing the device from getting stuck.

[0023] In summary, this application includes at least one of the following beneficial technical effects:

[0024] 1. The labyrinth cooling water path is used to make the cooling water contact the whole cylinder wall, shorten the heat conduction path, and the upper and lower cylinder walls participate in the cooling. The heating function of the heating table and the temperature detection function of the temperature sensor are combined to quickly achieve the effect of constant temperature polishing liquid. Moreover, the inside of the main liquid supply barrel has no excessive structure, which is more convenient to clean and can reduce the residue of pollution particles.

[0025] 2. The recycling barrel is used to first preliminarily cool the refluxed polishing liquid. When the polishing liquid enters the main liquid supply barrel, the temperature difference between the polishing liquid in the main liquid supply barrel can be reduced to reduce the influence on the polishing liquid in the main liquid supply barrel and improve the temperature uniformity of the polishing liquid in the main liquid supply barrel. BRIEF DESCRIPTION OF DRAWINGS

[0026] Figure 1 The present application mainly embodies the overall structure of the axonometric view.

[0027] Figure 2 The inside of the main liquid supply barrel in the present application is shown.

[0028] Figure 3 The inside of the tubular elastic film in the present application is shown.

[0029] Figure 4 The split structure of the recycling barrel in the present application is shown.

[0030] Figure 5 The inside structure of the recycling barrel in the present application is shown.

[0031] Figure 6 The structure of the lifting mechanism in the present application is shown.

[0032] Figure 7 The structure of the other side of the lifting mechanism in the present application is shown.

[0033] Figure 8 The local structure of the filter plate in the present application is shown.

[0034] Figure 9 The local structure of the partition plate in the present application is shown.

[0035] Reference numerals: 1, main liquid supply barrel; 2, recovery barrel; 3, connecting pipe; 4, liquid pump; 5, recovery pipe; 6, liquid supply pipe; 7, heating table; 8, spiral plate; 9, cooling water inlet; 10, cooling water outlet; 11, heat-conducting metal column; 12, lower fixing ring; 13, air pipe; 14, flaring pipe; 15, upper fixing ring; 16, tubular elastic film; 17, stirring rod; 18, driving motor; 19, umbrella-shaped nozzle; 20. Hollow tube; 21. Partition plate; 22. Liquid inlet area; 23. Liquid outlet area; 24. Flow area; 25. Vertical guide plate; 26. Overflow port; 27. Socket; 28. Filter plate; 29. ​​Plate changing hole; 30. Rack; 31. Bent rod; 32. Elastic tension component; 33. Gear; 34. Lifting motor; 35. Liquid level sensor; 36. First groove; 37. First roller; 38. Second groove; 39. Second roller. DETAILED DESCRIPTION

[0036] The following is combined with Figure 1-9 This application is described in further detail.

[0037] The embodiment of the present application discloses a rapid constant temperature liquid supply device for a chemical mechanical polishing machine.

[0038] Example 1:

[0039] Reference Figure 1 and Figure 2 The rapid constant temperature liquid supply device of the chemical mechanical polishing machine includes a main liquid supply barrel 1 and a recovery barrel 2. A connecting pipe 3 is arranged between the main liquid supply barrel 1 and the recovery barrel 2. A liquid pump 4 is installed on the connecting pipe 3. The recovery barrel 2 is connected to a recovery pipe 5, and the main liquid supply barrel 1 is provided with a liquid supply pipe 6.

[0040] Both the main liquid supply tank 1 and the recovery tank 2 utilize a double-walled structure. Between the two walls, spiral plates 8 are installed. Both the inner and outer sides of the spiral plates 8 are fixed to the double walls, forming a labyrinthine cooling waterway. The upper and lower ends of this labyrinthine cooling waterway are connected to the cooling water outlet 10 and the cooling water inlet 9, respectively.

[0041] In addition, temperature sensors are installed inside the main liquid supply barrel 1 and the recovery barrel 2 to monitor the temperature of the liquid in the barrel in real time. At the same time, a heating platform 7 is also provided at the bottom of the main liquid supply barrel 1 to heat the polishing liquid in the barrel when needed.

[0042] The refluxed polishing liquid enters the recovery tank 2 through the recovery pipe 5. Inside the recovery tank 2, the polishing liquid undergoes a preliminary cooling process. Then, under the action of the liquid pump 4, it flows through the connecting pipe 3 to the main liquid supply tank 1. The polishing liquid entering the main liquid supply tank 1 quickly reaches a constant temperature and is quickly heated to a temperature suitable for use.

[0043] The cooling principle of the recovery barrel 2 and the main supply barrel 1 is the same, both utilizing a labyrinthine cooling water circuit. Cooling water is injected into the labyrinthine cooling water circuit through the cooling water inlet 9, flows through the entire circuit, and is discharged through the cooling water outlet 10. During this process, the cooling water comes into full contact with the barrel wall, exchanging heat with the polishing liquid within the barrel through the barrel wall. Furthermore, both the upper and lower portions of the barrel wall participate in the cooling process, ensuring rapid cooling of the polishing liquid.

[0044] In addition, a heating platform 7 is provided at the bottom of the main liquid supply barrel 1, and a temperature sensor is also installed in the barrel. Once the temperature sensor detects that the temperature in the barrel is higher than the set value, the heating platform 7 will start to heat the polishing liquid in the barrel to maintain a constant temperature and ensure that the polishing liquid is always at a suitable working temperature.

[0045] Moreover, the main liquid supply barrel 1 does not have excessive structures inside, making cleaning more convenient and reducing the residual pollution particles.

[0046] The implementation principle of this embodiment is as follows: a labyrinth-type cooling water channel is designed on the outside of the main liquid supply barrel 1 and the recovery barrel 2, so that the polishing liquid will cool down instantly when it touches the wall of the main liquid supply barrel 1 and the recovery barrel 2. The heating function is that the bottom of the main liquid supply barrel 1 is welded to the heating platform 7, and the heat is dispersed into the polishing liquid through the bottom of the barrel, and the relevant functions are automatically turned on according to the set value of the temperature sensor. The equipment is compact, takes up less space, and effectively reduces the use of materials, which can effectively reduce manufacturing costs and reduce investment. The simple operation process effectively improves the polishing efficiency. The separate functions of the labyrinth-type cooling water channel and the barrel bottom heating platform 7 can quickly and effectively maintain a constant temperature, shorten the waiting time for the polishing liquid to heat up and cool down, and greatly improve the stability of the polishing process.

[0047] Example 2:

[0048] refer to Figure 3 This embodiment differs from the first embodiment in that several heat-conducting metal pillars 11 are fixedly mounted on the bottom of the main liquid supply barrel 1. The outer surfaces of these heat-conducting metal pillars 11 are uneven, which helps to increase the contact area and improve the heat conduction effect. A lower fixing ring 12 is fixedly connected to the outer bottom of the heat-conducting metal pillars 11.

[0049] Several gas pipes 13 are connected to the upper cover of the main liquid supply barrel 1. These gas pipes 13 pass through the cover and are located opposite the corresponding heat-conducting metal pillars 11. Below the gas pipes 13, a flared pipe 14 is fixedly installed, and the bottom edge of the flared pipe 14 is fixedly connected to the upper fixing ring 15.

[0050] The outer side of the heat-conducting metal column 11 is sleeved with a tubular elastic film 16, the thickness of which gradually increases from top to bottom. The upper end of the tubular elastic film 16 is sealingly fixed with the upper fixed ring 15, and the lower end is sealingly fixed with the lower fixed ring 12, so as to form a relatively closed and elastic space structure.

[0051] In use, the gas path pipeline 13 is connected with the gas pressure equipment.

[0052] When the temperature of the polishing liquid in the main liquid supply barrel 1 is lower than the set value, the gas path pipeline 13 starts to inhale, and a negative pressure is generated in the pipeline. At this time, the tubular elastic film 16 sleeved on the outer side of the heat-conducting metal column 11 will be tightly attached to the outer surface thereof under the action of the negative pressure. Since the tubular elastic film 16 occupies a smaller space after contraction, the polishing liquid level will drop, so that the distance between the upper layer of polishing liquid and the heating table 7 is reduced, and the heat of the heating table 7 can be more efficiently transmitted to the inside of the polishing liquid through the heat-conducting metal column 11, thereby improving the heating effect. Moreover, the outer side surface of the heat-conducting metal column 11 is in a concave-convex shape, which can effectively increase the surface area and further improve the heat exchange efficiency between the polishing liquid.

[0053] When the temperature of the polishing liquid in the main liquid supply barrel 1 is higher than the set value, the gas path pipeline 13 starts to inflate. With the inflating of the gas, the tubular elastic film 16 is expanded, and the space occupied by it gradually expands, thereby lifting the polishing liquid level upward. After the polishing liquid level rises, the contact area with the cylinder wall increases, thereby improving the heat exchange efficiency between the polishing liquid and the cylinder wall and accelerating the cooling speed. Moreover, since the bottom of the tubular elastic film 16 is relatively thin, the bottom will expand first when the gas is inflated, which can more fully occupy the space of the polishing liquid. Compared with the synchronous expansion of the upper and lower parts, this way can produce the same effect with less gas inflating, which on the one hand reduces the energy consumption, and on the other hand can faster improve the liquid level rising speed when the polishing liquid level is low, thereby improving the heat exchange efficiency.

[0054] Reference Figure 2 A stirring rod 17 is rotationally arranged at the middle position of the main liquid supply barrel 1, is driven by a driving motor 18 installed at the upper end of the main liquid supply barrel 1, and the bottom of the stirring rod 17 is provided with a spiral stirring blade. The end of the communication pipe 3 located inside the main liquid supply barrel 1 is connected with an umbrella-shaped spray head 19.

[0055] The stirring rod 17 stirs the polishing liquid, improves the heat exchange efficiency of the bottom and edge of the polishing liquid, and makes the internal temperature of the polishing liquid more uniform. The umbrella-shaped spray head 19 can disperse the polishing liquid in the recovery barrel 2 inside the main liquid supply barrel 1, prevent the entering polishing liquid from affecting the temperature uniformity of the original polishing liquid, make the internal temperature of the polishing liquid more uniform, and facilitate subsequent use.

[0056] The implementation principle of this embodiment is: by stirring and dispersing the incoming polishing liquid, the temperature uniformity of the polishing liquid is improved, and the polishing liquid at each location is brought into contact with the synchronous and bottom circulation, thereby improving the heat exchange efficiency.

[0057] Moreover, inflation and suction control the expansion and contraction of the tubular elastic film 16, thereby realizing control of the liquid level. When heating, the liquid level is lowered, so that the heating effect of the heating table 7 is better, and then combined with the heat-conducting metal column 11 to realize rapid multi-directional heating. When cooling, the liquid level is raised, the contact area between the polishing liquid and the cylinder wall is increased, and the heat exchange efficiency between it and the cylinder wall is improved, thereby improving the cooling efficiency.

[0058] Example 3:

[0059] Reference Figure 4 and Figure 5 This embodiment differs from the first embodiment in that a hollow tube 20 is provided in the middle of the recovery barrel 2, forming an annular flow channel between the hollow tube 20 and the inner wall of the recovery barrel 2. A plurality of equally spaced partition plates 21 are fixed in the annular flow channel, dividing the annular flow channel into a plurality of sections, specifically a liquid inlet area 22, a liquid outlet area 23, and a plurality of flow areas 24 evenly distributed therebetween.

[0060] In terms of equipment connection, the connecting pipe 3 is set in the liquid outlet area 23, and the recovery pipe 5 is located in the liquid inlet area 22. As for the flow area 24, a vertical guide plate 25 is set in the middle position inside it, and a liquid flow channel is left between the bottom of the vertical guide plate 25 and the bottom of the recovery barrel 2 to ensure normal liquid flow.

[0061] The separator 21 is provided with an overflow port 26, which gradually increases in height as the liquid flows from the inlet area 22 to the outlet area 23. This design helps control the flow rate and liquid level in different sections. A socket 27 is also provided inside the overflow port 26, into which a filter plate 28 is slidably inserted. Furthermore, the filtration aperture of the filter plate 28 gradually decreases as the liquid flows within the annular flow channel. This graded filtration method more effectively removes impurities from the liquid, improving filtration efficiency.

[0062] In addition, the upper cover of the recovery barrel 2 is provided with a plurality of plate-changing holes 29. These plate-changing holes 29 are located above the corresponding partition plates 21, and the upper ends of the filter plates 28 pass through the plate-changing holes 29. This design facilitates the replacement of the filter plates 28 when necessary, ensuring that the filtration effect is always maintained in good condition.

[0063] The refluxed polishing liquid enters the bottom of the liquid inlet area 22 of the recovery barrel 2 through the recovery pipe 5. In the liquid inlet area 22, the polishing liquid gradually accumulates. When the liquid level exceeds the bottom height of the overflow port 26 on the partition plates 21 on both sides, the polishing liquid will flow to the adjacent flow area 24.

[0064] After entering flow zone 24, the polishing liquid flows out of one side of vertical guide plate 25, squeezing out the polishing liquid on the other side of vertical guide plate 25, forming a structure similar to a U-shaped connecting vessel. This structure increases the flow path of the polishing liquid, ensuring longer and more uniform contact between the polishing liquid and the wall of recovery barrel 2, thereby improving the cooling effect.

[0065] As the polishing liquid flows between the flow areas 24, when the liquid level again exceeds the bottom height of the overflow port 26 on the next partition plate 21, the polishing liquid will continue to flow to the next flow area 24 until it reaches the liquid outlet area 23 and is pumped out by the liquid pump 4.

[0066] As the polishing liquid flows, it is filtered by the filter plates 28 whenever it passes through the overflow port 26. The pore sizes of the filter plates 28 gradually decrease along the direction of liquid flow, forming multiple layers of filtration with different particle sizes, ensuring that the polishing liquid is fully purified before entering the main liquid supply barrel 1, effectively preventing the entry of contaminants.

[0067] In addition, the upper end of the filter plate 28 is exposed outside the recovery barrel 2. If the filter plate 28 is blocked, the operator can directly pull out the plate replacement hole 29 and replace it with a new one. The operation is simple and quick.

[0068] refer to Figure 6-Figure 9 The upper end of the hollow tube 20 is provided with a lifting mechanism for lifting the filter plate 28. The specific structure of the lifting mechanism is as follows:

[0069] A curved rod 31 is hingedly connected to the inside of hollow tube 20. An elastic tension member 32 (e.g., a tension spring or elastic cord, etc., is connected between the middle section of curved rod 31 and the inner wall of hollow tube 20) to provide a certain tension for curved rod 31. A gear 33 is mounted on the upper end of curved rod 31 for rotation, and a lifting motor 34 is installed to drive gear 33. A rack 30 is mounted on the side of filter plate 28, meshing with gear 33. When gear 33 rotates, rack 30 drives filter plate 28 upward.

[0070] A liquid level sensor 35 is installed in the section of the partition plate 21 close to the upstream of the annular flow channel for real-time monitoring of the liquid level so as to control the action of the lifting mechanism when necessary.

[0071] In the recovery barrel 2, when the liquid level sensor 35 detects that the liquid level in the annular flow channel exceeds a set value, it can be determined that the filter plate 28 is clogged.

[0072] At this point, the lifting motor 34 is immediately activated, driving the gear 33 to begin rotating. Because the gear 33 meshes with the rack 30 on the side of the filter plate 28, the rotation of the gear 33 causes the filter plate 28 to rise a certain distance. This exposes the unobstructed portion below the filter plate 28, allowing it to continue filtering the polishing fluid, effectively reducing the frequency of filter plate 28 replacement by the operator.

[0073] Once the filter plate 28 has risen to a certain height, the operator simply moves the gear 33 away from the rack 30, overcoming the tension of the elastic tension member 32. The filter plate 28 can then be easily removed and replaced. Once replaced, the filter plate 28 is lowered to the bottom, at which point the system will repeat the automatic raising process, ensuring continued filtration.

[0074] To facilitate smooth sliding of the filter plate 28 within the socket 27, a first groove 36 is defined at the lower corner of the filter plate 28 near the rack 30. A first roller 37 is rotatably mounted within the first groove 36 and engages the inner wall of the socket 27. Furthermore, a second groove 38 is defined at the upper end of the partition plate 21. A second roller 39 is rotatably mounted within the second groove 38 and engages the side of the filter plate 28 away from the rack 30.

[0075] The filter plate 28 is squeezed by the gear 33 and is prone to tilting. When the filter plate 28 is slightly tilted, one side of the filter plate 28 abuts against the second roller 39 in the second groove 38 at the upper end of the partition plate 21, and the other side abuts against the inner wall of the socket 27 through the first roller 37.

[0076] By utilizing the rolling characteristics of the roller, when the filter plate 28 rises, the rolling of the roller can effectively reduce the resistance it encounters, making the rising process of the filter plate 28 smoother, thereby effectively preventing the device from getting stuck due to excessive resistance.

[0077] The working principle of this embodiment is as follows: the liquid level is detected by the liquid level sensor 35 to determine whether the filter plate 28 is blocked. When the filter plate 28 is blocked, the lifting motor 34 drives the filter plate 28 to rise through the gear 33 and the rack 30, and the filtering part is replaced to continue filtering, thereby reducing the frequency of replacing the filter plate 28. In addition, during the rising process of the filter plate 28, the first roller 37 and the second roller 39 on both sides thereof reduce the moving friction generated, thereby improving the smoothness and preventing the device from getting stuck.

[0078] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A rapid constant temperature liquid supply device for a chemical mechanical polisher, characterized by: The invention comprises a main liquid supply barrel (1) and a recovery barrel (2), wherein a connecting pipe (3) is provided between the main liquid supply barrel (1) and the recovery barrel (2), and a liquid pump (4) is installed on the connecting pipe (3), a recovery pipe (5) is provided on the recovery barrel (2), and a liquid supply pipe (6) is provided on the main liquid supply barrel (1). Both the main liquid supply barrel (1) and the recovery barrel (2) have double-layered cylinder walls, and a spiral layer plate (8) is provided in the middle of the double-layered cylinder wall. The inner side and the outer side of the spiral layer plate (8) are fixed to the double-layered cylinder wall, and the double-layered cylinder wall and the spiral layer plate (8) form a labyrinth cooling water path. The upper end and the lower end of the labyrinth cooling water path are respectively connected to a cooling water outlet (10) and a cooling water inlet (9). Temperature sensors are provided in the main liquid supply barrel (1) and the recovery barrel (2), and a heating platform (7) is provided at the bottom of the main liquid supply barrel (1).

2. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 1, characterized in that: A plurality of heat-conducting metal columns (11) are fixed to the bottom of the main liquid supply barrel (1), a lower fixing ring (12) is fixed to the outer side of the bottom of the heat-conducting metal columns (11), the upper end cover of the main liquid supply barrel (1) is connected to a plurality of gas pipes (13) penetrating the cover, the gas pipes (13) are located directly above the heat-conducting metal columns (11) at corresponding positions, an expansion pipe (14) is fixed below the gas pipe (13), an upper fixing ring (15) is fixed to the bottom edge of the expansion pipe (14), a tubular elastic film (16) is sleeved on the outer side of the heat-conducting metal columns (11), and the upper end and lower end of the tubular elastic film (16) are sealed and fixed to the upper fixing ring (15) and the lower fixing ring (12) respectively.

3. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 2, characterized in that: The outer surface of the heat-conducting metal column (11) is uneven, and the thickness of the tubular elastic film (16) gradually increases from top to bottom.

4. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 1, characterized in that: A stirring rod (17) is rotatably provided in the middle of the main liquid supply barrel (1), and a spiral stirring blade is provided at the bottom of the stirring rod (17). A driving motor (18) for driving the stirring rod (17) to rotate is installed at the upper end of the main liquid supply barrel (1), and an umbrella-shaped spray head (19) is connected to one end of the connecting pipe (3) located inside the main liquid supply barrel (1).

5. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 1, characterized in that: A hollow tube (20) is provided in the middle of the recovery barrel (2), and an annular flow channel is formed between the hollow tube (20) and the inner wall of the recovery barrel (2). A plurality of equally spaced partition plates (21) are fixed in the annular flow channel. The partition plates (21) divide the annular flow channel into a plurality of sections, including a liquid inlet area (22), a liquid outlet area (23), and a plurality of flow areas (24) evenly distributed therebetween. The connecting pipe (3) is located in the liquid outlet area (23), and the recovery pipe (5) is located in the liquid inlet area (22). A vertical guide plate (25) is provided in the middle of the flow area (24), and a liquid flow channel is provided between the bottom of the vertical guide plate (25) and the bottom of the recovery barrel (2). An overflow port (26) is provided on the partition plate (21), and the height of the overflow port (26) gradually increases along the flow direction from the liquid inlet area (22) to the liquid outlet area (23).

6. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 5, characterized in that: A socket (27) is provided on the inner side of the overflow port (26), and a filter plate (28) is slidably inserted into the socket (27), and the filter aperture of the filter plate (28) gradually decreases along the liquid flow direction of the annular flow channel. The upper end cover of the recovery barrel (2) is provided with a plurality of plate exchange holes (29), and the plate exchange holes (29) are located above the partition plate (21) at the corresponding position, and the upper end of the filter plate (28) passes through the plate exchange hole (29).

7. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 6, characterized in that: The upper end of the hollow tube (20) is provided with a lifting mechanism for lifting the filter plate (28), the lifting mechanism comprising a bent rod (31) hinged on the inner side of the hollow tube (20), and a gear (33) is rotatably provided on the upper end of the bent rod (31), a rack (30) meshing with the gear (33) is provided on the side end of the filter plate (28), a lifting motor (34) for driving the gear (33) to rotate is installed on the upper end of the bent rod (31), and an elastic tension component (32) is provided between the middle section of the bent rod (31) and the inner wall of the hollow tube (20), and a liquid level sensor (35) is installed in the interval of the partition plate (21) close to the upstream of the annular flow channel.

8. The rapid constant temperature liquid supply device for a chemical mechanical polisher according to claim 7, characterized in that: The filter plate (28) is provided with a first groove (36) at a lower corner near the rack (30), a first roller (37) is rotatably arranged in the first groove (36), and the first roller (37) is in contact with the inner wall of the socket (27); the upper end of the partition plate (21) is provided with a second groove (38), a second roller (39) is rotatably arranged in the second groove (38), and the second roller (39) is in contact with a side of the filter plate (28) away from the rack (30).

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