Cleaning device

Abstract

The invention discloses a cleaning device. The cleaning equipment comprises a base station and a cleaning robot, the base station is in communication connection with the cleaning robot, and the cleaning equipment is configured as follows: after the cleaning robot enters the base station, the cleaning equipment executes a first cleaning stage and a second cleaning stage; the first cleaning stage comprises the steps that the base station introduces a first amount of clear water into the cleaning tank, the cleaning piece and the scraping strip generate relative motion to clean the cleaning piece, and the base station discharges sewage in the cleaning tank; the second cleaning stage comprises the steps that the base station introduces a second amount of clean water into the cleaning tank, the cleaning piece and the scraping strip generate relative motion to clean the cleaning piece, the base station discharges sewage in the cleaning tank, and after the cleaning piece is cleaned, the cleaning piece rotates to throw water to the cleaning piece. According to the cleaning equipment, the cleaning piece can be effectively cleaned in the two cleaning stages.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of cleaning, in particular to a cleaning device. BACKGROUND

[0002] In the related art, a sweeping robot can use a mop to clean the ground. In order to reduce the burden of the user, at present, the sweeping robot can be used in combination with a base station. When the mop is dirty, the sweeping robot can enter the base station to clean the mop. Therefore, it is necessary to provide a technical solution capable of effectively cleaning the mop. SUMMARY

[0003] The present application provides a cleaning device to solve at least one of the above technical problems.

[0004] The cleaning device of the present application comprises a base station and a cleaning robot, the base station is in communication connection with the cleaning robot, the base station comprises a washing tank structure, the washing tank structure comprises a scraping strip and a washing tank, the scraping strip is arranged in the washing tank, the cleaning robot comprises a cleaning piece, after the cleaning robot enters the base station, the cleaning piece is located in the washing tank and placed on the scraping strip.

[0005] The cleaning device is configured to:

[0006] After the cleaning robot enters the base station, the cleaning device performs a first cleaning stage and a second cleaning stage.

[0007] The first cleaning stage comprises:

[0008] The base station supplies a first water volume of clean water to the washing tank, the cleaning piece moves relative to the scraping strip to clean the cleaning piece, and the base station discharges sewage in the washing tank.

[0009] The second cleaning stage comprises:

[0010] The base station supplies a second water volume of clean water to the washing tank, the cleaning piece moves relative to the scraping strip to clean the cleaning piece, and the base station discharges sewage in the washing tank. After cleaning the cleaning piece, the cleaning piece rotates to spin the cleaning piece.

[0011] In the above cleaning device, the cleaning piece can be cleaned in two cleaning stages, and the second cleaning stage includes spinning the cleaning piece, thereby effectively cleaning the cleaning piece and to some extent ensuring the cleaning effect of the cleaning piece.

[0012] In some embodiments, in the first cleaning stage and the second cleaning stage, the base station stops supplying the clean water after a first preset time duration since the base station starts supplying the clean water, and the base station continuously drains the dirty water in the washing tank.

[0013] In the second cleaning stage, the base station stops supplying the clean water after a second preset time duration since the base station starts supplying the clean water, and the base station continuously drains the dirty water in the washing tank.

[0014] In some embodiments, the cleaning device is configured to:

[0015] In the first cleaning stage, the second cleaning stage is performed after a third preset time duration since the supplying of the clean water is stopped.

[0016] In some embodiments, the cleaning device is configured to perform a soak washing stage, the soak washing stage comprising: the base station supplying the clean water to the washing tank to soak at least a portion of the cleaning piece, and then stopping the supplying of the clean water, the cleaning piece and the scraping strip generating relative motion to clean the cleaning piece, and the base station draining the dirty water in the washing tank after the cleaning piece and the scraping strip stop generating relative motion.

[0017] In some embodiments, the soak washing stage is performed before the first cleaning stage, and the first cleaning stage is performed before the second cleaning stage.

[0018] In some embodiments, in at least one of the soak washing stage, the first cleaning stage, and the second cleaning stage, the cleaning piece rotates to clean the bottom surface of the washing tank.

[0019] In some embodiments, the scraping strip is fixed in the washing tank, and the cleaning device is configured to: the cleaning piece rotates to generate relative motion between the scraping strip and the cleaning piece.

[0020] In some embodiments, the scraping strip is rotatably arranged in the washing tank, and the cleaning device is configured to:

[0021] The cleaning piece does not rotate and the scraping strip rotates to generate relative motion between the scraping strip and the cleaning piece.

[0022] In some embodiments, the cleaning device is configured to: the cleaning piece and the scraping strip rotate, the rotation direction of the scraping strip is the same as the rotation direction of the cleaning piece, and the rotation speed of the scraping strip is different from the rotation speed of the cleaning piece, so as to generate relative motion between the scraping strip and the cleaning piece.

[0023] In some embodiments, the cleaning device is configured to rotate the cleaning member and the squeegee, the rotation direction of the squeegee being opposite to the rotation direction of the cleaning member, to generate relative motion between the squeegee and the cleaning member.

[0024] In some embodiments, the cleaning device is configured to rotate the cleaning member and not rotate the squeegee, to generate relative motion between the squeegee and the cleaning member.

[0025] In some embodiments, the bottom surface of the cleaning tank comprises a contact region, the contact region being capable of directly contacting the cleaning member when the cleaning robot enters the base station in the rotating state and the non-rotating state.

[0026] In some embodiments, the bottom surface of the cleaning tank comprises a non-contact region, the cleaning tank structure being configured to:

[0027] When the cleaning member is placed on the squeegee, the vertical distance between the non-contact region and the bottom surface of the cleaning member ranges from (0, 3] mm.

[0028] In some embodiments, the cleaning device is configured to compress the cleaning member and the contact region by an amount ranging from [0, T) mm, T being the thickness of the cleaning member.

[0029] In some embodiments, the cleaning tank structure is configured to compress the cleaning member and the side wall of the cleaning tank by an amount ranging from (0, 8] mm when the cleaning member is placed in the cleaning tank.

[0030] In some embodiments, the cleaning tank structure is configured to compress the cleaning member and the side wall of the cleaning tank by an amount ranging from (0, 10] mm when the cleaning member is placed in the cleaning tank.

[0031] In some embodiments, the cleaning tank structure comprises a water inlet hole and a water outlet hole, the bottom surface of the cleaning tank connecting the water inlet hole and the water outlet hole, the bottom surface of the cleaning tank being inclined from the water inlet hole to the water outlet hole, the bottom surface of the cleaning tank being conical, the non-contact region comprising at least a part of a circular region formed with a center at the center of the bottom surface of the cleaning tank and a preset radius;

[0032] In some embodiments, the squeegee divides the bottom surface of the cleaning tank into a first bottom surface region and a second bottom surface region.

[0033] The non-contact area comprises one or a combination of both of a first non-contact area and a second non-contact area, the first non-contact area is a part of a first circular area, the first circular area is a circular area with a center at the center of the first bottom surface area and with a first preset radius;

[0034] The second non-contact area is a part of a second circular area, the second circular area is a circular area with a center at the center of the second bottom surface area and with a second preset radius.

[0035] In some embodiments, the cleaning tank structure comprises a water inlet hole and a water outlet hole, a water delivery channel is formed in the cleaning tank, the water delivery channel communicates the water inlet hole and the water outlet hole, the water delivery channel comprises a first section channel and a second section channel, the first section channel and the second section channel are connected in sequence along the direction from the water inlet hole to the water outlet hole, the depth of the second section channel is greater than or equal to the depth of the first section channel compared to the water inlet hole;

[0036] In some embodiments, the depth of the first section channel gradually increases along the direction from the water inlet hole to the water outlet hole, and the depth of the second section channel gradually increases;

[0037] In some embodiments, the first section channel comprises a first end and a second end, the second section channel comprises a third end and a fourth end, the first end communicates the water inlet hole, the second end communicates the third end, the fourth end communicates the water outlet hole, the depth H1 of the first end ranges from [1, 5] mm, the depth H2 of the second end and the third end ranges from [2, 8] mm, the depth H3 of the fourth end ranges from [5, 15] mm, and H1 <= H2 <= H3.

[0038] In some embodiments, the cleaning tank structure comprises a bottom plate, a first barrier and a second barrier, the first barrier, the second barrier and the bottom plate jointly enclose the cleaning tank, the cleaning tank structure is provided with a water inlet hole, the water inlet hole communicates the cleaning tank, the first barrier and the second barrier are respectively connected to the edges of the water inlet hole opposite to each other, and the second barrier is farther away from the inlet and outlet of the base station compared to the first barrier;

[0039] The connection between the second barrier and the edge of the water inlet hole is closer to the center of the cleaning tank compared to the connection between the first barrier and the edge of the water inlet hole, and the connection between the second barrier and the edge of the water inlet hole is located behind the connection between the first barrier and the edge of the water inlet hole along the rotation direction of the cleaning piece in the cleaning tank;

[0040] In some embodiments, the diameter of the circle on which the first barrier strip is located is greater than the diameter of the circle on which the second barrier strip is located, and the width of the first barrier strip along the horizontal direction is greater than the width of the second barrier strip along the horizontal direction.

[0041] In some embodiments, the height of the second barrier strip is greater than the height of the first barrier strip relative to the bottom surface of the cleaning tank.

[0042] In some embodiments, the cleaning tank structure comprises a base, and the top surface of the base is provided with a first recess, and the first recess constitutes the cleaning tank.

[0043] In some embodiments, a single scraping strip or multiple scraping strips are arranged in the cleaning tank.

[0044] In some embodiments, the second water amount is less than the first water amount, or the second water amount is equal to the first water amount, or the second water amount is greater than the first water amount.

[0045] Additional aspects and advantages of the present application will be partially given in the following description, partially will become obvious from the following description, or will be understood by the practice of the present application. BRIEF DESCRIPTION OF DRAWINGS

[0046] The above and / or additional aspects and advantages of the present application will become apparent and be readily understood from the following description, taken in conjunction with the accompanying drawings, in which:

[0047] Figure 1 is a perspective view of a base station of an embodiment of the present application;

[0048] Figure 2 is a structural view of a base station of an embodiment of the present application on which a cleaning member is arranged;

[0049] Figure 3 is a partial structural view of a base station of an embodiment of the present application;

[0050] Figure 4 is a perspective view of a cleaning tank structure of an embodiment of the present application;

[0051] Figure 5 is a top view of a cleaning tank structure of an embodiment of the present application;

[0052] Figures 6 to 8 is a structural view of a cleaning tank structure of an embodiment of the present application;

[0053] Figure 9 is a top view of a cleaning tank structure of an embodiment of the present application on which a cleaning member is arranged;

[0054] Figure 10is a top view of the cleaning tank structure of the embodiment of the present application;

[0055] Figure 11 is Figure 9 is a sectional view along line A-A in

[0056] Figure 12 is a structure diagram of the cleaning member of the embodiment of the present application;

[0057] Figures 13 to 15 is a graph of the relationship between the extrusion amount and the cleaning effect of the embodiment of the present application;

[0058] Figure 16 is a structure diagram of the bottom surface of the cleaning tank of the embodiment of the present application;

[0059] Figure 17 is a top view of the cleaning tank structure of the embodiment of the present application;

[0060] Figure 18 is a sectional view of the cleaning tank structure of the embodiment of the present application;

[0061] Figure 19 is Figure 18 is an enlarged view of part J in

[0062] Figures 20 to 21 is a structure diagram of the cleaning tank structure of the embodiment of the present application;

[0063] Figure 22 is a top view of the cleaning tank structure of the embodiment of the present application;

[0064] Figure 23 is a sectional view of the cleaning tank structure of the embodiment of the present application;

[0065] Figure 24 is a structure diagram of the cleaning tank structure of the embodiment of the present application;

[0066] Figure 25 is a partial sectional exploded view of the cleaning tank structure of the embodiment of the present application;

[0067] Figure 26 is a partial sectional view of the cleaning tank structure of the embodiment of the present application;

[0068] Figure 27 is a structure diagram of the cleaning tank structure of the embodiment of the present application;

[0069] Figures 28 to 29 is a structure diagram of the filter member of the embodiment of the present application.

[0070] Reference Signs:

[0071] Washing tank structure 100, first baffle 12, bottom plate 14, washing tank 16, first part 20, second part 22, water inlet hole 24, second baffle 26, scraping strip 28, motor 29, water outlet hole 30, drive shaft 31, water feeding channel 32, support strip 27, first section channel 33, second section channel 35, first end 39, second end 41, third end 43, fourth end 45, third baffle 34, second connection 57, first connection 58, filter piece 60, filter cavity 62, filter hole 64, handle 66, recess 67, drain pipe 68, communication hole 69, convex 70, containing cavity 72, water pipe interface 74, air inlet 76, base 78, contact area 82, non-contact area 84, front tank 86, rear tank 88, through hole 90, first non-contact area 92, second non-contact area 94, first bottom area 96, second bottom area 98, bottom surface of washing tank 101, first recess 25, second recess 23;

[0072] Cleaning piece 200, fluff 202, bottom disc 204;

[0073] Base station 300, shell 302, containing cavity 304, climbing plate 306. DETAILED DESCRIPTION

[0074] Embodiments of the present application are described in detail below with reference to the attached drawings, which show by way of example, embodiments in which like numerals indicate like elements or elements having the same or similar function. The embodiments described below are examples only, and are not to be construed as limiting the present application.

[0075] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly and specifically limited.

[0076] In the description of the application, it is necessary to point out that, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integrally connected. It can be mechanical connection, or electrical connection. It can be directly connected, or indirectly connected through an intermediate medium, or the internal communication of two elements or the interaction relationship of two elements. For those skilled in the art, the specific meaning of the above terms in the application can be understood according to the specific circumstances.

[0077] In the present application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "upper", "above" and "on" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "below", "under" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0078] The disclosure herein provides many different embodiments or examples for implementing different structures of the application. In order to simplify the disclosure of the application, the components and arrangements of specific examples are described herein. Of course, they are only examples, and the purpose is not to limit the application. In addition, the application can repeatedly refer to numbers and / or letters in different examples, and such repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments and / or arrangements discussed. In addition, the application provides examples of various specific processes and materials, but those skilled in the art can realize the application of other processes and / or the use of other materials.

[0079] Please refer to Figures 1 to 11 A cleaning device in an embodiment of the application includes a base station 300 and a cleaning robot, the base station 300 is in communication connection with the cleaning robot, the base station 300 includes a cleaning tank structure 100, the cleaning tank structure 100 includes a scraping strip 28 and a cleaning tank 16, the scraping strip 28 is arranged in the cleaning tank 16, the cleaning robot includes a cleaning piece 200, after the cleaning robot returns to the base station 300, the cleaning piece 200 is located in the cleaning tank 16 and placed on the scraping strip 28;

[0080] The cleaning device is configured to:

[0081] After the cleaning robot returns to the base station 300, the cleaning device performs a first cleaning stage and a second cleaning stage;

[0082] The first cleaning stage includes:

[0083] The base station 300 introduces a first water amount of clean water into the cleaning tank 16, the cleaning member 200 and the scraping strip 28 are relatively moved to clean the cleaning member 200, the base station 300 discharges the sewage in the cleaning tank 16;

[0084] The second cleaning stage includes:

[0085] The base station 300 introduces a second water amount of clean water into the cleaning tank 16, the cleaning member 200 and the scraping strip 28 are relatively moved to clean the cleaning member 200, the base station 300 discharges the sewage in the cleaning tank 16; after the cleaning member 200 is cleaned, the cleaning member 200 is rotated to spin the cleaning member 200.

[0086] The communication connection can include but is not limited to wireless communication connection and wired communication connection, and the wireless communication connection includes but is not limited to Bluetooth connection, infrared connection, WIFI (Wireless Fidelity) connection, mobile communication connection, ZigBee connection and the like. The mobile communication connection includes but is not limited to 2G, 3G, 4G, 5G and 6G network connection, and the WIFI connection includes but is not limited to 2.4 GHz frequency band and 5 GHz frequency band. The wired communication connection includes but is not limited to USB line connection, TYPE-C line connection, coaxial line connection and the like.

[0087] In the above cleaning device, the cleaning member 200 can be cleaned in two cleaning stages, and the second cleaning stage includes spinning the cleaning member 200, thereby effectively cleaning the cleaning member 200 and ensuring the cleaning effect of the cleaning member 200 to a certain extent.

[0088] Optionally, the second water amount can be less than the first water amount, or the second water amount can be equal to the first water amount, or the second water amount can be greater than the first water amount.

[0089] Optionally, the first cleaning stage can be performed before the second cleaning stage, or the first cleaning stage can be performed after the second cleaning stage, and the present application does not make specific limitation thereon.

[0090] In a specific embodiment, the second water amount is less than the first water amount, and the first cleaning stage is performed before the second cleaning stage, that is, in the first cleaning stage, a larger amount of clean water is introduced into the cleaning tank, and in the second cleaning stage, a smaller amount of clean water is introduced into the cleaning tank. On the one hand, since the first cleaning stage is performed first, the cleaning member 200 has more dirt before cleaning, and a larger amount of clean water is required. On the other hand, the second cleaning stage is performed later, and the cleaning member 200 has been cleaned to a certain extent, so the second cleaning stage requires a smaller amount of clean water. Therefore, on the basis of ensuring the cleaning effect of the cleaning member 200, the water source can also be saved, and the cost can be reduced.

[0091] Optionally, the base station 300 comprises a housing 302, and the cleaning tank structure 100 can be installed in the housing 302 of the base station 300. Specifically, the housing 302 can be provided with a receiving cavity 304 near the bottom. The cleaning tank structure 100 can be installed in the receiving cavity 304, and the opening of the receiving cavity 304 can be communicated with the external environment. The base station 300 further comprises a climbing plate 306 connected to the edge of the receiving cavity 304 near the bottom of the base station 300. The cleaning robot can enter and exit the base station 300 through the climbing plate 306. The opening of the receiving cavity 304 can serve as the entrance and exit of the base station 300.

[0092] Optionally, the base station 300 can comprise a clean water tank, a clean water pump, a sewage tank and a sewage pump arranged in the housing 302. The clean water pump is connected to the clean water tank, and the sewage pump is connected to the sewage tank. The cleaning tank structure 100 comprises a water inlet hole and a water outlet hole, and both the water inlet hole and the water outlet hole are communicated with the cleaning tank 16. The clean water pump can be communicated with the water inlet hole through a pipeline, and the sewage pump can be communicated with the water outlet hole through a pipeline.

[0093] When the base station 300 is supplied with clean water, the clean water pump can be controlled to be turned on, and the clean water in the clean water tank is sent to the cleaning tank 16 through the water inlet hole. When the base station 300 discharges the sewage in the cleaning tank 16, the sewage pump can be controlled to be turned on, and the sewage in the cleaning tank 16 is pumped to the sewage tank for storage through the water outlet hole. The amount of clean water supplied into the cleaning tank 16 is positively correlated with the time length during which the clean water pump is turned on and the rotation speed of the clean water pump. The amount of sewage discharged from the cleaning tank 16 is positively correlated with the time length during which the sewage pump is turned on and the rotation speed of the sewage pump.

[0094] Optionally, the base station 300 can comprise a drain valve communicated with the water outlet hole. When the drain valve is opened, the sewage in the cleaning tank can be directly discharged to the sewer. When the drain valve is closed, the sewage in the cleaning tank 16 cannot be discharged. When the sewage in the cleaning tank 16 is discharged, the base station 300 can control the drain valve to be opened. The amount of sewage discharged from the cleaning tank 16 is positively correlated with the time length during which the drain valve is opened.

[0095] Optionally, the base station 300 can comprise a water inlet valve communicated with a water source (such as a faucet) and the water inlet hole. When the water inlet valve is opened, clean water can be supplied into the cleaning tank. When the water inlet valve is closed, clean water cannot be supplied into the cleaning tank 16. The amount of clean water supplied into the cleaning tank 16 is positively correlated with the time length during which the water inlet valve is opened.

[0096] The cleaning robot can perform a cleaning task outside the base station 300. When the cleaning task is completed, or the cleaning time reaches a preset time length, or the cleaning area reaches a preset area, or the power of the cleaning robot is less than a set power, the cleaning robot can enter the base station 300 to clean the cleaning tool 200.

[0097] After the cleaning robot enters the base station 300, the cleaning device performs the first cleaning stage and the second cleaning stage to clean the cleaning piece 200.

[0098] In the first cleaning stage and the second cleaning stage, the relative motion between the scraping strip 28 and the cleaning piece 200 causes the scraping strip 28 to scrape and wash the cleaning piece 200, thereby cleaning the cleaning piece 200.

[0099] In the first cleaning stage, the base station 300 supplies the first amount of clean water to the washing tank 16, the relative motion between the cleaning piece 200 and the scraping strip 28 causes the cleaning piece 200 to be cleaned, and the base station 300 discharges the sewage in the washing tank 16. In this way, the cleaning piece 200 can be washed once.

[0100] More specifically, the present application does not specifically limit the order between the base station 300 supplying the first amount of clean water to the washing tank 16 (hereinafter referred to as first water supply), the relative motion between the cleaning piece 200 and the scraping strip 28 causing the cleaning piece 200 to be cleaned (hereinafter referred to as first scraping and washing), and the base station 300 discharging the sewage in the washing tank 16 (hereinafter referred to as first water discharge) in the first cleaning stage. That is, the first water supply, the first scraping and washing, and the first water discharge can be performed simultaneously, or the first water supply and the first scraping and washing can be performed simultaneously first, and then the first scraping and washing and the first water discharge can be performed simultaneously, or the first water supply, the first scraping and washing, and the first water discharge can be performed sequentially. It can be understood that if the first cleaning stage includes multiple first water discharges, the last first water discharge will not be performed at least before the first water supply and the first scraping and washing; if the first cleaning stage includes a single first water discharge, the first water discharge will not be performed at least before the first water supply and the first scraping and washing.

[0101] In one embodiment, while the base station 300 supplies the first amount of clean water to the washing tank 16, the relative motion between the cleaning piece 200 and the scraping strip 28 causes the cleaning piece 200 to be cleaned. After a period of time, while the relative motion between the cleaning piece 200 and the scraping strip 28 causes the cleaning piece 200 to be cleaned, the base station 300 discharges the sewage in the washing tank 16 after stopping the supply of clean water.

[0102] In the second cleaning stage, the base station 300 supplies the second amount of clean water to the washing tank 16, the relative motion between the cleaning piece 200 and the scraping strip 28 causes the cleaning piece 200 to be cleaned, and the base station 300 discharges the sewage in the washing tank 16; after cleaning the cleaning piece 200, the cleaning piece 200 rotates to spin the cleaning piece 200. In this way, the cleaning piece 200 can be cleaned twice and spun dry, to some extent avoiding the situation of water droplets on the ground after the cleaning robot leaves the base station 300.

[0103] More specifically, the present application does not limit the sequence of the following steps in the second cleaning stage: the base station 300 supplies the second amount of clean water to the cleaning tank 16 (hereinafter referred to as the second water supply), the cleaning member 200 and the squeegee 28 generate relative motion to clean the cleaning member 200 (hereinafter referred to as the second squeegeeing), and the base station 300 discharges the dirty water in the cleaning tank 16 (hereinafter referred to as the second water discharge). That is, the second water supply, the second squeegeeing, and the second water discharge can be performed simultaneously, or the second water supply and the second squeegeeing can be performed simultaneously first, and then the second squeegeeing and the second water discharge can be performed simultaneously, or the second water supply, the second squeegeeing, and the second water discharge can be performed sequentially, etc. It can be understood that if the second cleaning stage includes multiple second water discharges, the last second water discharge is at least not performed before the second water supply and the second squeegeeing; if the second cleaning stage includes a single second water discharge, the second water discharge is at least not performed before the second water supply and the second squeegeeing.

[0104] In one embodiment, while the base station 300 supplies the second amount of clean water to the cleaning tank 16, the cleaning member 200 and the squeegee 28 generate relative motion to clean the cleaning member 200, and the base station 300 discharges the dirty water in the cleaning tank 16. After a period of time, the supply of clean water is stopped, and while or after the cleaning member rotates to spin the cleaning member, the base station 300 discharges the dirty water in the cleaning tank 16.

[0105] Optionally, please refer to Figure 12 The cleaning member 200 can include a mop. The mop includes the pile 202 and the base plate 204, and the pile 202 is arranged at the bottom of the base plate 204.

[0106] The base station 300 is in communication connection with the cleaning robot, and the base station 300 and the cleaning robot can cooperatively complete the cleaning of the cleaning member 200 and the cleaning of the bottom surface 101 of the cleaning tank 16. Optionally, the cleaning device can include a controller, which can control the base station 300 and the cleaning robot to complete the cleaning of the cleaning member 200 and the cleaning of the bottom surface 101 of the cleaning tank 16. Optionally, the control / computing element of the cleaning device controls the base station 300 and the cleaning robot, which can be the base station 300, the cleaning robot, or an independent control / computing device (for example, a mobile phone, a tablet computer, a personal computer, a server, which can also be a cloud server, etc.).

[0107] In some embodiments, in the first cleaning stage and the second cleaning stage, the base station 300 stops supplying clean water after a first preset time period from the start of the supply of clean water, and the base station 300 continuously discharges the dirty water in the cleaning tank 16;

[0108] In the second cleaning stage, the base station 300 stops supplying clean water after a second preset time period from the start of the supply of clean water, and the base station 300 continuously discharges the dirty water in the cleaning tank 16.

[0109] Thus, the sewage in the cleaning tank 16 can be reduced or drained to some extent.

[0110] Specifically, in the first cleaning stage, the base station 300 controls the clean water pump to start to introduce clean water into the cleaning tank 16, and controls the sewage pump to start to pump out sewage. In the first cleaning stage, the relative motion between the scraper 28 and the cleaning member 200 is generated, so that the scraper 28 scrapes and cleans the cleaning member 200, thereby cleaning the cleaning member 200.

[0111] The relative motion between the scraper 28 and the cleaning member 200 can be generated at the same time when the introduction of clean water starts. After the cleaning member 200 is cleaned for a first preset time length, the base station 300 can control the clean water pump to stop, so as to stop the introduction of clean water into the cleaning tank. The sewage pump continues to be started to continuously pump out the sewage in the cleaning tank 16.

[0112] In the second cleaning stage, the base station 300 controls the clean water pump to start to introduce clean water into the cleaning tank 16, and controls the sewage pump to start to pump out sewage. In the second cleaning stage, the relative motion between the scraper 28 and the cleaning member 200 is generated, so that the scraper 28 scrapes and cleans the cleaning member 200, thereby cleaning the cleaning member 200.

[0113] The relative motion between the scraper 28 and the cleaning member 200 can be generated at the same time when the introduction of clean water starts. After the cleaning member 200 is cleaned for a second preset time length, the base station 300 can control the clean water pump to stop, so as to stop the introduction of clean water into the cleaning tank. The sewage pump continues to be started to continuously pump out the sewage in the cleaning tank 16.

[0114] The first preset time length and the second preset time length are not specifically limited in the present application. Optionally, the first preset time length can be equal to the second preset time length. In an example, the first preset time length and the second preset time length are both 15 seconds. That is, in the first cleaning stage and the second cleaning stage, the introduction of clean water into the cleaning tank 16 is stopped after 15 seconds (after the cleaning member 200 is cleaned for 15 seconds).

[0115] In some embodiments, the cleaning device is configured to, in the first cleaning stage, execute the second cleaning stage after a third preset time length of stopping the introduction of clean water.

[0116] Thus, in the first cleaning stage, the sewage in the cleaning tank 16 can be reduced or drained, so as to avoid the secondary pollution of the cleaning member 200 in the second cleaning stage by the sewage in the first cleaning stage.

[0117] Specifically, in the first cleaning stage, the base station 300 always discharges the dirty water in the cleaning tank, in the early stage of the first cleaning stage, the base station 300 supplies clean water into the cleaning tank, while the base station 300 discharges the dirty water in the cleaning tank. After a first preset time length from the beginning of supplying clean water, the base station 300 stops supplying clean water into the cleaning tank, the base station 300 continues to discharge the dirty water in the cleaning tank, and the scraper 28 and the cleaning member 200 also continue to generate relative motion to clean the cleaning member 200.

[0118] In the first cleaning stage, stopping the supply of clean water for a third preset time length can make the dirty water in the cleaning tank be discharged, even be discharged completely, and then after the third preset time length, the second cleaning stage is executed, in which there is basically no or less dirty water remaining from the first cleaning stage, to a certain extent, avoiding the secondary pollution of the dirty water in the first cleaning stage to the cleaning member 200 in the second cleaning stage.

[0119] The size of the third preset time length is not specifically limited in the present application. In one example, the third preset time length is 10 seconds, that is, after stopping the supply of clean water into the cleaning tank 16 for 10 seconds in the first cleaning stage, the second cleaning stage is executed.

[0120] In some embodiments, the cleaning device is configured to execute a soaking washing stage, which includes: the base station 300 supplies clean water into the cleaning tank 16 to soak at least a part of the cleaning member 200, then stops the supply of clean water, the cleaning member 200 and the scraper 28 generate relative motion to clean the cleaning member 200, and after the cleaning member 200 and the scraper 28 stop generating relative motion, the base station 300 discharges the dirty water in the cleaning tank 16.

[0121] Thus, the soaking washing stage can be added to further improve the cleaning effect on the cleaning member 200.

[0122] Specifically, the garbage that can be attached to the cleaning member 200 includes but is not limited to solid garbage (such as particulate matter, linear objects, sticky objects, debris, etc.) and liquid garbage (such as dirty water). Through the soaking washing stage, the garbage on the cleaning member 200 can be more easily dropped from the cleaning member 200, thereby further improving the cleaning effect on the cleaning member 200.

[0123] In one embodiment, when the cleaning element 200 is placed on the squeegee 28, the cleaning element 200 is inclined relative to the horizontal plane towards the direction of the inlet and outlet of the base station 300. The portion of the cleaning element 200 close to the inlet and outlet of the base station 300 is lower in position compared to the portion of the cleaning element 200 away from the inlet and outlet of the base station 300. After the cleaning robot enters the base station 300, the cleaning apparatus performs a soaking washing stage. In the soaking washing stage, the base station 300 supplies clean water to the cleaning tank 16 to soak at least a portion of the cleaning element 200, in particular, the portion of the cleaning element 200 close to the inlet and outlet of the base station 300. Alternatively, in other embodiments, the entire cleaning element 200 can be soaked.

[0124] After the supply of clean water is stopped, the cleaning element 200 and the squeegee 28 are moved relative to each other to clean the cleaning element 200. After the cleaning element 200 and the squeegee 28 stop moving relative to each other, the base station 300 can control the sewage pump to pump out the sewage in the cleaning tank to drain the sewage in the cleaning tank 16.

[0125] Alternatively, in the soaking washing stage, the duration of the supply of clean water to the cleaning tank can be less than the first preset duration and the second preset duration. Alternatively, in the soaking washing stage, the duration of the cleaning of the cleaning element 200 can be less than the duration of the cleaning of the cleaning element 200 in the first cleaning stage and the second cleaning stage.

[0126] In one example, in the soaking washing stage, the supply of clean water to the cleaning tank 16 is stopped 3 seconds after the supply of clean water to the cleaning tank is started, so that the cleaning tank contains clean water. After the supply of clean water to the cleaning tank is stopped, the squeegee 28 and the cleaning element 200 are moved relative to each other to clean the cleaning element 200 for 3 seconds. After 3 seconds, the relative movement between the squeegee 28 and the cleaning element 200 is stopped, and the base station 300 controls the sewage pump to be turned on to pump out the sewage in the cleaning tank.

[0127] The present application does not specifically limit the execution order of the soaking washing stage, the first cleaning stage and the second cleaning stage. Alternatively, in one embodiment, the soaking washing stage is performed before the first cleaning stage, and the first cleaning stage is performed before the second cleaning stage. In one embodiment, the soaking washing stage is performed before the second cleaning stage, and the second cleaning stage is performed before the first cleaning stage.

[0128] In one embodiment, the first cleaning stage is performed before the soaking washing stage, and the soaking washing stage is performed before the second cleaning stage.

[0129] In one embodiment, the first cleaning stage is performed before the second cleaning stage, and the second cleaning stage is performed before the soaking washing stage.

[0130] In one embodiment, the second cleaning stage is performed before the first cleaning stage, and the first cleaning stage is performed before the soaking washing stage.

[0131] In one embodiment, the second cleaning stage is performed before the soak washing stage, and the soak washing stage is performed before the first cleaning stage.

[0132] In some embodiments, the cleaning member 200 rotates to clean the bottom surface 101 of the washing tub 16 during at least one of the soak washing stage, the first cleaning stage, and the second cleaning stage.

[0133] In this way, the bottom surface 101 of the washing tub 16 can be cleaned.

[0134] In particular, please refer to Figure 11 In one embodiment, the bottom surface 101 of the washing tub 16 comprises a contact area 82, which is capable of being directly contacted by the cleaning member 200 when the cleaning member 200 is in rotation or not in rotation. When the cleaning member 200 is in rotation, the cleaning member 200 can at least clean the contact area 82 of the bottom surface 101 of the washing tub 16. Alternatively, the entire bottom surface of the washing tub 16 can be the contact area 82.

[0135] When the bottom surface 101 of the washing tub 16 comprises a non-contact area 84, which is not contacted by the cleaning member 200 when the cleaning member 200 is placed in the washing tub 16, the rotating cleaning member 200 can also clean the non-contact area 84 by driving the water flow to splash to the non-contact area 84 at a certain distance. The said desired cleaning can refer to the cleaning effect reaching a set effect (to be described later).

[0136] Alternatively, the cleaning member 200 can also be cleaned and the bottom surface 101 of the washing tub 16 can also be cleaned by the relative movement between the cleaning member 200 and the scraper 28 when the cleaning member 200 is in rotation.

[0137] Alternatively, the cleaning member 200 rotates to clean the bottom surface 101 of the washing tub 16 during the soak washing stage, the first cleaning stage, or the second cleaning stage. Alternatively, the cleaning member 200 rotates to clean the bottom surface 101 of the washing tub 16 during two of the soak washing stage, the first cleaning stage, and the second cleaning stage, or during all of the soak washing stage, the first cleaning stage, and the second cleaning stage.

[0138] In some embodiments, the washing tub 16 is provided with a single scraper 28, or the washing tub 16 is provided with a plurality of scrapers 28.

[0139] In this way, the number of scrapers 28 can be configured according to requirements.

[0140] In particular, please refer to Figure 21 and Figure 22 The washing tub 16 is provided with a single scraper 28, which is fixed in the washing tub 16 or rotatably arranged in the washing tub 16.

[0141] Please refer to Figures 4 to 6 , the cleaning tank 16 is provided with a plurality of scraping strips 28, and the plurality of scraping strips 28 are fixed in the cleaning tank 16 or rotatably arranged in the cleaning tank 16. Figures 4 to 6 In the embodiment, the number of the scraping strips 28 is two. It can be understood that the number of the scraping strips 28 can also be more than two.

[0142] In some embodiments, the scraping strips 28 are fixed in the cleaning tank 16, and the cleaning device is configured to rotate the cleaning piece 200 to make the scraping strips 28 relatively move with the cleaning piece 200.

[0143] In this way, the scraping strips 28 can relatively move with the cleaning piece 200.

[0144] Specifically, please refer to Figure 21 and Figure 22 , the cleaning tank 16 is provided with a single scraping strip 28, and the single scraping strip 28 is fixed in the cleaning tank 16. Please refer to Figures 4 to 8 , the cleaning tank 16 is provided with a plurality of scraping strips 28, and the plurality of scraping strips 28 are fixed in the cleaning tank 16 (the number of the scraping strips 28 is two as shown in Figures 4 to 8 ).

[0145] When the scraping strips 28 are fixed in the cleaning tank, the cleaning robot can control the cleaning piece 200 to rotate, so as to make the scraping strips 28 relatively move with the cleaning piece 200, and the scraping strips 28 can scrape and clean the cleaning piece 200. When the cleaning piece 200 rotates, the bottom surface of the cleaning tank can also be cleaned.

[0146] In some embodiments, the scraping strips 28 are rotatably arranged in the cleaning tank 16, and the cleaning device is configured to:

[0147] the cleaning piece 200 does not rotate and the scraping strips 28 rotate, so as to make the scraping strips 28 relatively move with the cleaning piece 200.

[0148] In this way, the scraping strips 28 can relatively move with the cleaning piece 200 without rotating the cleaning piece 200, so as to achieve the cleaning effect on the cleaning piece 200.

[0149] Specifically, after the cleaning piece 200 is placed on the scraping strips 28, the cleaning piece 200 does not rotate and the scraping strips 28 rotate, so as to make the scraping strips 28 relatively move with the cleaning piece 200. During the rotation of the scraping strips 28, the cleaning piece 200 can be soaked with clean water, and the scraping strips 28 can scrape and clean the soaked cleaning piece 200. The sewage or stains and other impurities after the scraping and cleaning can flow into the water outlet, so that the sewage can be discharged through the water outlet.

[0150] In some embodiments, the cleaning device is configured such that the cleaning member 200 and the scraping strip 28 rotate, the rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, and the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater.

[0151] In this way, the rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, and the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater, so that the cleaning effect of the scraping strip 28 on the cleaning member 200 is better.

[0152] Specifically, the scraping strip 28 can rotate simultaneously with the cleaning member 200, and the rotation of the scraping strip 28 can scrape and clean the surface of the cleaning member 200 and remove the stains on the surface of the cleaning member 200. At the same time, the cleaning member 200 can rotate to clean the bottom surface 101 of the cleaning tank 16. The rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, so that the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater, which is beneficial to improve the cleaning effect of the cleaning member 200.

[0153] In some embodiments, the cleaning device is configured such that the cleaning member 200 and the scraping strip 28 rotate, the rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, and the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater.

[0154] In this way, the rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, and the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater, so that the cleaning effect of the scraping strip 28 on the cleaning member 200 is better.

[0155] Specifically, the scraping strip 28 can rotate simultaneously with the cleaning member 200, and the rotation of the scraping strip 28 can scrape and clean the surface of the cleaning member 200 and remove the stains on the surface of the cleaning member 200. At the same time, the cleaning member 200 can rotate to clean the bottom surface 101 of the cleaning tank 16. The rotation direction of the scraping strip 28 is opposite to the rotation direction of the cleaning member 200, so that the relative rotation speed between the scraping strip 28 and the cleaning member 200 is greater, which is beneficial to improve the cleaning effect of the cleaning member 200.

[0156] In one embodiment, the wiper strip 28 can also be intermittently forward and reverse rotated, and in this case, the cleaning member 200 can be rotated or not. In the case that the cleaning member 200 is not rotated, the wiper strip 28 is intermittently forward and reverse rotated, which can cause the relative motion between the wiper strip 28 and the cleaning member 200. In the case that the cleaning member 200 is rotated, the wiper strip 28 is intermittently forward and reverse rotated, and in the case that the rotating direction of the wiper strip 28 is the same as that of the cleaning member 200, the rotating speed of the wiper strip 28 is different from that of the cleaning member 200. The wiper strip 28 is intermittently forward and reverse rotated, which can make the cleaning of the surface of the cleaning member 200 more thorough and avoid the occurrence of cleaning dead angles.

[0157] In some embodiments, the wiper strip 28 is rotatably arranged in the cleaning tank 16, and the cleaning device is configured to rotate the cleaning member 200 and not rotate the wiper strip 28, so as to cause the relative motion between the wiper strip 28 and the cleaning member 200.

[0158] In this way, the rotation of the cleaning member 200 can simultaneously achieve the cleaning of the cleaning member 200 and the bottom surface 101 of the cleaning tank 16.

[0159] Specifically, the wiper strip 28 is not rotated, and the relative motion between the wiper strip 28 and the cleaning member 200 can be caused by the rotation of the cleaning member 200, so as to clean the surface of the cleaning member 200. At the same time, the cleaning member 200 is in contact with the contact area 82 of the bottom surface 101 of the cleaning tank 16, and the cleaning of the bottom surface 101 of the cleaning tank 16 can also be achieved by the rotation of the cleaning member 200. Therefore, the rotation of the cleaning member 200 can simultaneously achieve the cleaning of the cleaning member 200 and the bottom surface 101 of the cleaning tank 16.

[0160] Please refer to Figure 24 , the cleaning tank 16 is provided with one or more wiper strips 28, and the wiper strip 28 is rotatably arranged in the cleaning tank 16. Specifically, the cleaning tank structure 100 can include a driving member and a transmission member (not shown in the figure). The driving member can include a motor 29, and the driving member is connected to a driving shaft 31 through the transmission member. The motor 29 can be installed on the back of the cleaning tank 10, that is, the side opposite to the contact surface of the cleaning tank 10 and the cleaning member 200, as shown in Figure 25 and Figure 26 . The driving shaft 31 is connected to the motor 29 and the wiper strip 28. The motor 29 provides power for the driving shaft 31, and the driving shaft 31 drives the wiper strip 16 to rotate, so as to cause the relative motion between the wiper strip 16 and the cleaning member 200 in contact with the wiper strip 16, and achieve the purpose of cleaning the cleaning member 200.

[0161] It should be noted that the present application does not specifically limit the rotating speed of the cleaning member in the soaking and washing stage, the first cleaning stage and the second cleaning stage. Optionally, the rotating speed of the cleaning member is as high as possible to prevent the water in the cleaning tank from spilling out of the cleaning tank.

[0162] In certain embodiments, the cleaning tank structure 100 includes a base 78 that houses the cleaning tank 16 .

[0163] Thus, the base 78 can provide an installation structure for the cleaning tank structure 100 , facilitating the installation of the cleaning tank structure 100 .

[0164] Specifically, in Figure 6 In the illustrated embodiment, the base 78 can be shaped like a long disk. The cleaning tank structure 100 can be mounted on the base station 300 via the base 78. Two cleaning tanks 16 are disposed on the base 78. The sidewalls of the two cleaning tanks 16 can be connected, allowing the two cleaning tanks 16 to communicate with each other, thereby allowing the two cleaning tanks 16 to share a common water outlet 30. Each cleaning tank 16 can also be independently provided. Optionally, the base 78 can be integrated with the cleaning tanks 16 and the scraper bar 28.

[0165] In some embodiments, please combine Figure 20 The cleaning tank structure 100 includes a base 78 , and a first recess 25 is formed on the top surface of the bottom plate 14 , and the first recess 25 constitutes the cleaning tank 16 .

[0166] In this way, the cleaning tank 16 can be formed in the base 78 through the first recess 25 , thereby reducing the use of other materials.

[0167] Specifically, the top surface of the base 78 can be recessed downward to form the first recess 2, and the first recess 25 can be circular, so that the cleaning tank 16 can be formed on the base 78 through the first recess 25, reducing the use of other materials. Optionally, the first recess 25 can be manufactured through an integrated molding process.

[0168] Please combine Figure 20 In some embodiments, a second recess 23 is formed on the top surface of the base 78 , and the second recess 23 constitutes a water inlet 24 , which is connected to the cleaning tank 16 .

[0169] In this way, the water inlet 24 can be formed in the base 78 through the second recess 23 , further reducing the use of other materials.

[0170] Specifically, the base 78 can be recessed downward to form a second recess 23, which forms a water inlet 24. The water inlet 24 is connected to the cleaning tank 16. Thus, the water inlet 24 can be formed in the base 78 through the second recess 23, reducing the use of other materials. Alternatively, the water inlet 24 can be in the form of a groove, and the second recess 23 can be manufactured through an integrated molding process.

[0171] After the cleaning robot enters the base station 300, the cleaning element 200 is located in the cleaning tank 16 and placed on the squeegee 28, and the contact area 82 can be in direct contact with the cleaning element 200 in rotation and non-rotation. Thus, in the process of cleaning the cleaning element 200, the rotating cleaning element 200 can directly clean the contact area 82, and the debris remaining on the bottom surface 101 of the cleaning tank 16 can be avoided or reduced, thereby avoiding or reducing the odor of the cleaning tank structure 100.

[0172] In one embodiment, when the cleaning element 200 of the cleaning robot is cleaned, the cleaning robot can enter the base station 300, and the cleaning element 200 can be placed on the squeegee 28, and the contact area 82 can be in direct contact with the cleaning element 200 in non-rotation.

[0173] In the process of cleaning the cleaning element 200, the rotating cleaning element 200 can also directly contact the contact area 82, and the rotating cleaning element 200 can also clean the contact area 82, thereby avoiding or reducing the debris remaining on the bottom surface 101 of the cleaning tank 16, and thereby avoiding or reducing the odor of the cleaning tank structure 100.

[0174] Optionally, in one embodiment, the entire bottom surface 101 of the cleaning tank 16 can be the contact area 82, that is, the entire bottom surface 101 of the cleaning tank 16 is in direct contact with the rotating and non-rotating cleaning element 200. Optionally, in Figure 9 In one embodiment, the cleaning element 200 can be provided with an opening near the center of the cleaning element 200. Optionally, in other embodiments, the cleaning element 200 can also not be provided with an opening near the center of the cleaning element 200.

[0175] The illustrated cleaning tank structure 100 is provided with two cleaning tanks 16, which can be adapted to a cleaning robot with double cleaning elements, and the bottom of the body of the cleaning robot can be provided with two cleaning elements 200, and the rotation axis of each cleaning element 200 is substantially perpendicular to the bottom of the body. When the two cleaning elements 200 perform cleaning work outside the base station 300 and perform cleaning inside the base station 300, the rotation directions of the two cleaning elements 200 can be the same or opposite, and the present application does not make specific limitations thereon. It can be understood that in other embodiments, the cleaning tank structure 100 can also be provided with a single cleaning tank 16, which can be adapted to a cleaning robot with a single cleaning element.

[0176] In some embodiments, please refer to Figure 11 The bottom surface 101 of the cleaning tank 16 includes a non-contact area 84, and the vertical distance between the non-contact area 84 and the bottom surface P of the cleaning element 200 is in the range of (0, 3] mm when the cleaning element 200 is placed on the squeegee 28.

[0177] Thus, in the process of cleaning the cleaning piece 200, when the cleaning piece 200 is placed on the scraping strip 28, the cleaning piece 200 can drive the water flow to the non-contact area 84 when rotating to clean the non-contact area 84, and increase the non-contact area 84, and can also reduce the friction between the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16, reduce energy consumption, and adapt to low-power motors.

[0178] Specifically, in one embodiment, the bottom surface 101 of the cleaning tank 16 further comprises a non-contact area 84 when the cleaning piece 200 is placed on the scraping strip 28. While the scraping strip 28 scrapes the cleaning piece 200, the vertical distance W between the non-contact area 84 of the bottom surface 101 of the cleaning tank 16 and the bottom surface P of the cleaning piece 200 is in the range of (0, 3] mm, and in the process of cleaning the cleaning piece, the cleaning piece can drive the water flow to the non-contact area 84 when rotating to clean the non-contact area 84. Optionally, in the process of cleaning the cleaning piece, the cleaning piece 200 can be placed on the scraping strip 28, and the vertical distance W between the non-contact area 84 of the bottom surface 101 of the cleaning tank 16 and the bottom surface P of the cleaning piece 200 is in the range of (0, 3] mm. Figure 12 In the illustrated embodiment, the cleaning piece 200 comprises a fluff 202 and a bottom disc 204, the fluff 202 is arranged at the bottom of the bottom disc 204, and the vertical distance W between the non-contact area 84 and the bottom surface P of the cleaning piece 200 can be the vertical distance between the non-contact area 84 and the bottom surface of the fluff 202.

[0179] In some examples, the vertical distance W between the non-contact area 84 and the bottom surface P of the cleaning piece 200 can be 3 mm, 2.8 mm, 2.5 mm, 2 mm, 1.5 mm, 1 mm, or other values in the range of (0, 3] mm. The vertical distance W between the non-contact area 84 and the bottom surface P of the cleaning piece 200 can be specifically determined according to actual needs, and the present application does not specifically limit it.

[0180] Optionally, the contact region 82 and the non-contact region 84 are both flat surfaces. In one embodiment, the contact region 82 is a slope, and the non-contact region 84 is also a slope, and the slope of the non-contact region 84 is greater than the slope of the contact region 82. In one embodiment, the slope of the non-contact region 84 can also be less than the slope of the contact region 82. In one embodiment, the contact region 82 is a horizontal surface, and the non-contact region 84 is also a horizontal surface. In one embodiment, the contact region 82 is a horizontal surface, and the non-contact region 84 is a slope. In one embodiment, the contact region 82 is a slope, and the non-contact region 84 is a horizontal surface. In one embodiment, the contact region 82 is a slope, and the non-contact region 84 is also a slope, and the slope of the non-contact region 84 is equal to the slope of the contact region 82. The contact region 82 can be a curved surface or an arc surface, and the non-contact region 84 can also be a curved surface or an arc surface, or the contact region 82 can be a flat surface and the non-contact region 84 can be a curved surface or an arc surface, or the non-contact region 84 can be a flat surface and the contact region 82 can be a curved surface or an arc surface. In summary, when the cleaning member 200 is placed on the squeegee 28, the vertical distance W between the non-contact region 84 and the bottom surface P of the cleaning member 200 is in the range of (0, 3] mm.

[0181] Please refer to Figure 13 As can be seen from the effect diagram, when the vertical distance W between the non-contact region 84 and the bottom surface P of the cleaning member 200 is in the range of (0, 3] mm, even in the area where the cleaning member 200 does not contact the bottom surface 101 of the cleaning tank 16, the rotating cleaning member 200 can have the desired cleaning effect on the non-contact region 84, reducing the probability of odor emission of the cleaning tank structure 100.

[0182] Specifically, in Figure 13 , y represents the vertical extrusion amount of the cleaning member 200 and the bottom surface 101 of the cleaning tank 16, and the unit is mm. When y < 0, it means that the cleaning member 200 is isolated from the bottom surface 101 of the cleaning tank 16, and the absolute value of y represents the isolation amount (i.e. the vertical distance W). F represents the cleaning effect after one self-cleaning of the cleaning robot. Each test spreads 5g of yellow mud on the ground, and the cleaning robot performs one self-cleaning after returning to the station. The weight z (unit: g) of the dirt added to the cleaning tank 16 is weighed, and F = 1 - z / 5 x 100%. When the self-cleaning is performed once, F >= 90% cleaning effect meets the cleaning requirement.

[0183] From Figure 13It can be seen that when y >= -3 (i.e. the range of the vertical distance W is (0, 3] mm), the cleaning effect F >= 90%, which meets the cleaning requirement. When -3 <= y < 0, the cleaning piece 200 drives the water in the cleaning tank 16 to flow when rotating, and the cleaning tank 16 is washed by the water flow, thereby achieving the effect of cleaning the cleaning tank 16. When y > 0, the cleaning piece 200 is extruded with the bottom surface 101 of the cleaning tank 16, and the friction between the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 makes the cleaning effect meet the requirement. Based on the fact that the cleaning piece 200 is composed of the bottom disc 204 and the fluff 202, the bottom disc 204 is a hard material and is difficult to extrude, so the vertical extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 cannot reach the thickness of the cleaning piece 200. The test data is shown in Table 1 below. The smaller z is, the less yellow mud is left in the cleaning tank 16, and the better the cleaning effect of the cleaning tank 16.

[0184] Table 1

[0185] y z F -4 1.5 70％ -3 0.5 90％ 0 0 100％ 1.1 (1 / 6 of total thickness of cleaning element) 0 100％ 2.2 (1 / 3 of total thickness of cleaning element) 0 100％ 4.3 (2 / 3 of total thickness of cleaning element) 0 100％ 6.0 (100% of thickness of cleaning element) 0 100％

[0186] In some embodiments, the cleaning tank structure 100 is configured such that the extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 is in the range of [0, T) mm, and T is the thickness of the cleaning piece 200.

[0187] In this way, the extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 meets the cleaning effect requirement.

[0188] Specifically, the thickness T of the cleaning piece 200 includes the length V2 of the fluff 202 and the thickness V3 of the bottom disc 204, and the extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 is in the range of [0, T) mm, and T is the thickness of the cleaning piece 200. The greater the extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16, the greater the friction between the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16, and the better the cleaning effect. It should be noted that when the extrusion amount of the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 is close to the thickness T of the cleaning piece 200, the friction between the cleaning piece 200 and the bottom surface 101 of the cleaning tank 16 is large, and at this time, the cleaning piece 200 is still within the range of rotation (i.e. the motor of the cleaning robot can still drive the cleaning piece 200 to rotate), which does not affect the cleaning of the cleaning piece 200.

[0189] In some examples, the extrusion amount of the cleaning piece 200 to the bottom surface 101 of the cleaning tank 16 can be 0 mm, (1 / 6×T) mm, (2 / 6×T) mm, (3 / 6×T) mm, (4 / 6×T) mm, (5 / 6×T) mm, or other values within [0, T), which are not limited in the present application. The extrusion amount of the cleaning piece 200 to the bottom surface 101 of the cleaning tank 16 is 0 mm, which means that the contact area between the fluff 202 and the bottom surface 101 of the cleaning tank 16 is not extruded.

[0190] In some embodiments, the cleaning tank structure 100 is configured such that, when the cleaning piece 200 is placed in the cleaning tank 16, the horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 is within the range of (0, 8] mm.

[0191] In this way, the water carried on the cleaning piece 200 is thrown to the side wall of the cleaning tank 16 under the action of centrifugal force, achieving the cleaning of the side wall of the cleaning tank 16.

[0192] Specifically, when the cleaning piece 200 is placed in the cleaning tank 16 and rotated for cleaning on the scraping strip 28, the edge of the cleaning piece 200 can maintain a certain horizontal distance with part of the side wall of the cleaning tank 16, such as the front side wall of the cleaning tank 16 as shown. Figure 11 The horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 can be 8 mm, 7.8 mm, 7.5 mm, 6 mm, 5.5 mm, 5 mm, or other values within (0, 8] mm. The horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 can be determined according to actual needs, which are not limited in the present application.

[0193] When the horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 is within the range of (0, 8] mm, the water carried on the cleaning piece 200 is thrown to the side wall of the cleaning tank 16 under the action of centrifugal force when the cleaning piece 200 is rotated for cleaning on the scraping strip 28, and the water can clean the side wall of the cleaning tank 16, thereby achieving the cleaning of the side wall of the cleaning tank 16. In addition, when the horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 is within the range of (0, 8] mm, it is also beneficial for the cleaning robot to place the cleaning piece 200 in the cleaning tank 16 and easy to position.

[0194] Please refer to Figure 14 As can be seen from the effect diagram, when the horizontal distance U between the edge of the cleaning piece 200 and the side wall of the cleaning tank 16 is within the range of (0, 8] mm, even if the edge of the cleaning piece 200 does not contact the side wall of the cleaning tank 16, the rotating cleaning piece 200 can also have the desired cleaning effect on the non-contacting area of the side wall of the cleaning tank 16, reducing the probability of odor of the cleaning tank structure 100.

[0195] In particular, in Figure 14 mm, when x<0, it means that the edge of the cleaning member 200 is isolated from the side wall of the cleaning tank 16, and the absolute value of x represents the isolation distance, i.e., the horizontal distance U. F represents the cleaning effect after one self-cleaning of the cleaning robot. In each test, 5g of yellow mud is scattered on the ground, and the cleaning robot is cleaned once after returning to the station. The weight z (unit: g) of the dirt added to the cleaning tank 16 is weighed, and F = 1-z / 5x100%. When the self-cleaning is performed once, F> = 90% cleaning effect meets the cleaning requirement.

[0196] In this test, the value of y is fixed, for example, y = 1mm is set, from Figure 14 It can be seen that when -8< = x< = 10, the cleaning effect F> = 90%, which meets the cleaning requirement. When x<-8, the side wall of the cleaning tank 16 is too far away from the edge of the cleaning member 200, and the cleaning member 200 cannot be cleaned to the side wall of the cleaning tank 16 by relying on the water flow and the fluff 202 when rotating, and there is a blind area, which affects the cleaning effect. When x>10, the cleaning member 200 is excessively extruded with the side wall of the cleaning tank 16, and the cleaning member 200 has a bulging effect, which causes part of the area to be separated from the bottom surface 101 of the cleaning tank 16, and the isolation distance is very large, which affects the cleaning effect. The test data is shown in Table 2 as follows.

[0197] Table 2 (y = 1mm (1 / 6.5 of the thickness of the cleaning member))

[0198] x z F -10 1 80％ -8 0.5 90％ -4 0 100％ 0 0 100％ 4 0 100％ 8 0.2 96％ 10 0.48 90.4％ 12 1.2 76％

[0199] Alternatively, in the embodiment shown in the figure, the cleaning tank 16 is surrounded by the barrier (the first barrier 12 and the second barrier 26), and the distance between the edge of the cleaning member 200 and the side wall of the cleaning tank 16 includes the distance between the edge of the cleaning member 200 and the surface of the first barrier 12 facing the cleaning tank 16, and the distance between the edge of the cleaning member 200 and the surface of the second barrier 26 facing the cleaning tank 16.

[0200] In some embodiments, the cleaning tank structure 100 is configured such that, when the cleaning member 200 is placed in the cleaning tank 16, the extrusion amount of the edge of the cleaning member 200 and the side wall of the cleaning tank 16 is in the range of (0, 10] mm.

[0201] In this way, the extrusion amount of the edge of the cleaning member 200 and the side wall of the cleaning tank 16 can achieve the desired cleaning effect.

[0202] Specifically, in the case that the cleaning piece 200 is placed in the cleaning tank 16 and rotates for cleaning on the scraping strip 28, the edge of the cleaning piece 200 can be pressed against part of the side wall of the cleaning tank 16, such as the rear side wall of the cleaning tank 16 as shown. Figure 11 Optionally, the pressing amount of the edge of the cleaning piece 200 against the side wall of the cleaning tank 16 is in the range of (0, 10] mm, for example, the pressing amount of the edge of the cleaning piece 200 against the side wall of the cleaning tank 16 can be 10 mm, 9.8 mm, 9.5 mm, 9 mm, 8.5 mm, 8 mm, or other values in the range of (0, 10] mm. The pressing amount of the edge of the cleaning piece 200 against the side wall of the cleaning tank 16 can be specifically determined according to actual needs, which is not specifically limited in the present application.

[0203] The pressing amount of the edge of the cleaning piece 200 against the side wall of the cleaning tank 16 is in the range of (0, 10] mm, when the cleaning piece 200 is pressed against the side wall of the cleaning tank 16 to reach the maximum pressing amount, the friction between the cleaning piece 200 and the side wall of the cleaning tank 16 is the largest, which is beneficial to the mutual cleaning of the edge of the cleaning piece 200 and the side wall of the cleaning tank 16. It should be noted that when the pressing amount of the edge of the cleaning piece 200 against the side wall of the cleaning tank 16 reaches the maximum pressing amount of 10 mm, the cleaning piece 200 can still rotate (i.e., the motor of the cleaning robot can still drive the cleaning piece 200 to rotate), and will not cause the motor to run overload, and will not affect the cleaning of the rotation of the cleaning piece 200.

[0204] Optionally, the pressing amount of the cleaning piece 200 in the vertical direction is fixed, and the maximum pressing amount and the maximum isolation amount of the cleaning piece 200 in the horizontal direction against the side wall of the cleaning tank 16 are explored.

[0205] Please refer to Figure 15 Since the pressing amount of the cleaning piece 200 in the vertical direction is more important to the cleaning effect, when the pressing amount of the cleaning piece 200 in the vertical direction is relatively large (close to the critical value, y = 6.0 mm, the pressing amount is equal to the thickness of the cleaning piece 200 6.0 / 6.5), the cleaning piece 200 meets the cleaning requirements in the range of x in the horizontal direction, and whether the y value has an effect on the x range that meets the cleaning requirements is explored.

[0206] From Figure 15 It can be seen that when y = 6.0 mm, the cleaning effect F > = 90% when -8 < = x < = 10, which meets the cleaning requirements. At the same time, compared with Table 1, it is found that the y value has no obvious effect on the x range that meets the cleaning requirements. Since the y value mainly affects the cleaning effect in the vertical direction, when the y value meets the cleaning requirements, it will not have a significant effect on the effective value of x. The test data is shown in Table 3.

[0207] Table 3 (y = 6.0 mm) (cleaning piece thickness 6.0 / 6.5)

[0208] x Z F -10 1 80％ -8 0.4 92％ -4 0 100％ 0 0 100％ 4 0 100％ 8 0.1 98％ 10 0.45 91％ 12 1.3 74％

[0209] Optionally, when the edge of the cleaning piece 200 reaches the maximum extrusion amount with the side wall of the cleaning tank 16, and the cleaning piece 200 reaches a larger extrusion amount with the bottom surface 101 of the cleaning tank 16, the cleaning piece 200 can still rotate (i.e., the motor of the cleaning robot can still drive the cleaning piece 200 to rotate), and will not cause the motor to run overload, and will not affect the cleaning of the rotation of the cleaning piece 200.

[0210] It should be noted that the test data is the thickness of the cleaning piece 200 in the above test, which is 6.5mm, and the data is obtained by averaging multiple test values.

[0211] In some embodiments, in combination with Figure 16 and Figure 17 , the cleaning tank structure 100 includes a water inlet hole 24 and a water outlet hole 30, the bottom surface 101 of the cleaning tank 16 is connected to the water inlet hole 24 and the water outlet hole 30, the bottom surface 101 of the cleaning tank 16 is inclined along the water inlet hole 24 to the water outlet hole 30, the bottom surface 101 of the cleaning tank 16 is conical, and the non-contact area 84 includes at least a part of a circular area T0, which is a circular area with the center of the bottom surface 101 of the cleaning tank 16 as the center and with a preset radius.

[0212] Therefore, the conical shape can be used to form the bottom surface 101 of the cleaning tank 16, and the cleaning effect requirement of the non-contact area 84 can be met.

[0213] Specifically, the bottom surface 101 of the cleaning tank 16 is conical and inclined along the water inlet hole 24 to the water outlet hole 30, and the lowest point of the bottom surface 101 of the cleaning tank 16 is the position connected to the water outlet hole 30. When the cleaning piece 200 is placed in the cleaning tank 16, the cleaning piece 200 is spaced apart from at least a part of the circular area.

[0214] In Figure 17 , the left cleaning tank 16 is taken as an example for description. Since the circular area T0 is a circular area with the center O of the bottom surface 101 of the cleaning tank 16 as the center and with a preset radius, and the bottom surface 101 of the cleaning tank 16 is conical, the circular area T0 in the middle of the bottom surface 101 of the cleaning tank 16 is lower than the position of the edge of the bottom surface 101 of the cleaning tank 16, and compared with the edge of the bottom surface 101 of the cleaning tank 16, the circular area T0 forms a recess, which can accumulate a certain water flow, and thus can clean the non-contact area 84, and meet the cleaning effect requirement. It can be understood that the preset radius of the circular area T0 is smaller than the radius of the cleaning tank 16.

[0215] Optionally, in Figure 17In the embodiment, the cleaning piece 200 has an opening in the middle, and the bottom surface 101 of the cleaning tank 16 exposed by the opening can also be cleaned by the water flow splashed by the cleaning piece 200 or the fluff 202 of the cleaning piece 200 when rotating, so as to meet the cleaning effect requirement. Alternatively, in other embodiments, the cleaning piece 200 can also not have an opening in the middle.

[0216] The preset radius can be specifically defined according to requirements, and the present application does not make a specific limitation thereon.

[0217] In some embodiments, the scraping strip 28 divides the bottom surface 101 of the cleaning tank 16 into a first bottom surface area 96 and a second bottom surface area 98.

[0218] The non-contact area 84 includes one or a combination of both of a first non-contact area 92 and a second non-contact area 94, the first non-contact area 92 being a part of a first circular area C1, and the first circular area C1 being a circular area formed with the center of the first bottom surface area 96 as the center and with a first preset radius.

[0219] The second non-contact area 94 is a part of a second circular area C2, and the second circular area C2 is a circular area formed with the center of the second bottom surface area 98 as the center and with a second preset radius.

[0220] In this way, the scraping strip 28 can divide the bottom surface 101 of the cleaning tank 16 into areas, and the first bottom surface area 96 and the second bottom surface area 98 can be configured respectively, so as to meet the cleaning effect requirement of the non-contact area 84.

[0221] Alternatively, the scraping strip 28 can be fixed in the cleaning tank 16, or can be detachably connected to the bottom surface 101 of the cleaning tank 16.

[0222] Alternatively, in the embodiment, the cleaning tank 16 is provided with two scraping strips 28, and the two scraping strips 28 divide the bottom surface 101 of the cleaning tank 16 into a first bottom surface area 96 and a second bottom surface area 98. Figure 17 In the embodiment, the first bottom surface area 96 is a front bottom surface area, and the second bottom surface area 98 is a rear bottom surface area. Figure 17

[0223] Alternatively, the non-contact area 84 includes a combination of both of the first non-contact area 92 and the second non-contact area 94. Alternatively, the non-contact area 84 includes the first non-contact area 92 or the second non-contact area 94.

[0224] The first bottom surface area 96 is a part of a first conical bottom surface, and the second bottom surface area 98 is a part of a second conical bottom surface. Alternatively, in the embodiment, the first bottom surface area 96 is a part of a first circular bottom surface, and the second bottom surface area 98 is a part of a second circular bottom surface. Figure 17 ​, the radius of the circle where the first bottom surface area 96 is located is greater than the radius of the circle where the second bottom surface area 98 is located. Optionally, the radius of the circle where the first bottom surface area 96 is located is less than or equal to the radius of the circle where the second bottom surface area 98 is located.

[0225] The first non-contact area 92 is a portion of the first circular area C1. Since the first circular area C1 is a circular area formed with the center O of the first bottom area 96 and a first predetermined radius, and since the first bottom area 96 is a portion of a conical bottom surface, the first circular area C1 in the middle of the first bottom area 96 is positioned lower than the edge of the first bottom area 96. Compared to the edge of the first bottom area 96, the first circular area C1 forms a depression, which can accumulate a certain amount of water flow, thereby cleaning the first non-contact area 92 and meeting the cleaning effect requirements. It can be understood that the first predetermined radius is smaller than the radius of the first bottom area 96.

[0226] The second non-contact area 94 is a portion of the second circular area C2. Since the second circular area C2 is a circular area formed with the center O of the second bottom area 98 and a second predetermined radius, and since the second bottom area 98 is a portion of a conical bottom surface, the second circular area C2 in the middle of the second bottom area 98 is positioned lower than the edge of the second bottom area 98. Compared to the edge of the second bottom area 98, the second circular area C2 forms a depression, which can accumulate a certain amount of water flow, thereby cleaning the second non-contact area 94 and meeting the cleaning effect requirements. It can be understood that the second predetermined radius is smaller than the radius of the second bottom area 98.

[0227] Optionally, in Figure 17 In the example, the first preset radius is equal to the second preset radius, and the center of the first circular area C1 coincides with the center of the second circular area C2 ( Figure 4 It is understood that in other embodiments, the first preset radius and the second preset radius may not be equal, and the center of the first circular area C1 and the center of the second circular area C2 may not coincide.

[0228] Optionally, the number of scraping bars 28 in the cleaning tank 16 is not limited to two, and may be a single one or more than two.

[0229] Please combine Figure 24 and Figure 4 In some embodiments, the cleaning tank structure 100 includes a water inlet 24 and a water outlet 30 , and a water supply channel 32 is formed in the cleaning tank 16 , which connects the water inlet 24 and the water outlet 30 .

[0230] In this way, the water inlet 24 can deliver clean water through the water supply channel 32 , and at the same time, the sewage after cleaning can be discharged from the water outlet 30 through the water supply channel 32 .

[0231] Specifically, in one embodiment, please refer to Figure 24 , a plurality of scraping strips 28 are fixed in the cleaning tank 16, and the plurality of scraping strips 28 and the bottom surface 101 of the cleaning tank 16 form a water delivery channel 32. In one embodiment, please refer to Figure 4 , a plurality of rotatable scraping strips are arranged in the cleaning tank 16, and a plurality of support strips 27 are fixed on the bottom surface 101 of the cleaning tank 16. Each scraping strip 28 is rotatably arranged on a corresponding support strip 27. The plurality of support strips 27 and the bottom surface 101 of the cleaning tank 16 form the water delivery channel 32. The rotating scraping strips 28 can clean the cleaning element 200, but cannot effectively clean the bottom surface 101 of the cleaning tank 16. The rotating cleaning element 200 can clean the bottom surface 101 of the cleaning tank 16.

[0232] In Figure 4 , the water inlet hole 24 can be arranged at the left rear side of the cleaning tank structure 100. The water outlet hole 30 can be arranged at the right front side of the cleaning tank structure 100. Compared with the water delivery channel 32, the water inlet hole 24 is located at a higher position, and the water outlet hole 30 is located at a lower position. The clean water entering from the water inlet hole 24 can clean the cleaning element and form sewage that can flow to the water outlet hole 30 under the action of gravity through the water delivery channel 32.

[0233] In Figure 6 , two scraping strips 28 and the bottom surface 101 of the cleaning tank 16 form a water delivery channel 32. In one embodiment, the cleaning element 200 can rotate on the scraping strip 28. In the rotating process, the cleaning element 200 can be soaked by the clean water in the water delivery channel 32, and the scraping strip 28 can scrape and wash the soaked cleaning element 200. The scraped and washed sewage or dirt and other impurities can flow into the water outlet hole 30 through the water delivery channel 32, so that the sewage can be discharged through the water outlet hole 30. It can be understood that in other embodiments, not only two scraping strips 28 and the bottom surface 101 of the cleaning tank 16 can form a water delivery channel 32, but also three, four or other number of scraping strips 28 and the bottom surface 101 of the cleaning tank 16 can form a water delivery channel 32, which is not specifically limited here.

[0234] Further, in Figure 19In some embodiments, the water delivery channel 32 can be divided into a front tank 86 and a rear tank 88 along the front-rear direction. The front tank 86 is located at the front side of the base 78, and the rear tank 88 is located at the rear side of the base 78. The front tank 86 can be connected to the top of the water outlet hole 30. The wiper strip 28 near the front tank 86 can wipe the cleaning element 200, and the waste water and other impurities after wiping can fall into the front tank 86 and then flow into the water outlet hole 30 through the opening 90. The bottom of the rear tank 88 can be connected to the top of the water outlet hole 30. The wiper strip 28 near the rear tank 88 can wipe the cleaning element 200, and the waste water and other impurities after wiping can fall into the rear tank 88 and then flow into the water outlet hole 30.

[0235] In some embodiments, the water delivery channel 32 can include a first section 33 and a second section 35. The first section 33 and the second section 35 are connected in sequence along the direction from the water inlet hole 24 to the water outlet hole 30. The depth of the second section 35 is greater than or equal to the depth of the first section 33.

[0236] In this way, the second section 35 has a greater depth, so that the cleaning element 200 cannot cause secondary pollution in the second section 35.

[0237] Specifically, the water delivery channel 32 can include a connecting section (not shown). The connecting section is inclinedly arranged between the first section 33 and the second section 35. The first section 33, the connecting section, and the second section 35 are connected in sequence along the direction from the water inlet hole 24 to the water outlet hole 30. The depth of the connecting section is greater than or equal to the depth of the first section 33, and the depth of the second section 35 is greater than or equal to the depth of the connecting section.

[0238] Optionally, in some embodiments, the connecting section can be omitted, and the first section 33 can be directly connected to the second section 35, as shown in FIG. 6. Figures 18 to 19

[0239] In some embodiments, when the cleaning element 200 rotates and the wiper strip 28 wipes the cleaning element 200, the bristles 202 of the cleaning element 200 can be located in the first section 33. The clean water in the first section 33 can clean the bristles 202 of the cleaning element 200, and the waste water formed after cleaning can flow into the second section 35. The second section 35 has a greater depth, so that the cleaning element 200 or the bristles 202 of the cleaning element 200 cannot contact the waste water in the second section 35, thereby avoiding secondary pollution of the cleaning element 200 in the second section 35.

[0240] ​Further, the scrapers 28 can scrape the garbage (solid garbage such as particulate matter, linear matter, sticky matter, and debris; liquid garbage such as sewage) attached to the cleaning member 200 into the water delivery channel 32, and the garbage can be quickly discharged into the water outlet hole 30 (the water outlet hole 30 is provided with a filter member 54 for filtering garbage) through the water flow in the water delivery channel 32, thereby achieving the effect of effectively and rapidly scraping garbage, and avoiding the garbage being scraped to the bottom surface 101 area of the other cleaning tank 16, because the water flow speed of the bottom surface 101 area of the other cleaning tank 16 is relatively slow, which can cause the garbage to stay and repeatedly rub against the bottom surface of the cleaning member 200, causing damage to the cleaning member 200, and reducing the cleaning speed and effect. By limiting the depth of the second section channel 35 to be greater than or equal to the depth of the first section channel 33, when the cleaning member 200 is located on the second section channel 35, the scrapers 28 are in contact with the cleaning member 200, but the water flow does not contact the cleaning member 200, thereby avoiding secondary pollution of the cleaning member 200.

[0241] The depth of the first section channel 33 refers to the vertical distance from a certain point on the top of the scraper 28 to the bottom surface of the first section channel 33. The depth of the second section channel 35 refers to the vertical distance from a certain point on the top of the scraper 28 to the bottom surface of the second section channel 35.

[0242] Optionally, the first section channel 33 can include a plurality of first subsection channels with different depths and connected end to end, and the second section channel 35 can include a plurality of second subsection channels with different depths and connected end to end. The depth of the second section channel 35 can be the average depth of the second subsection channels, and the depth of the first section channel 33 can be the average depth of the first subsection channels.

[0243] In some embodiments, the depth of the first section channel 33 gradually increases in the direction from the water inlet hole 24 to the water outlet hole 30, and the depth of the second section channel 35 gradually increases in the direction from the water inlet hole 24 to the water outlet hole 30.

[0244] In this way, the cleaning member 200 is less likely to contact the sewage in the channel in the direction from the water inlet hole 24 to the water outlet hole 30.

[0245] Specifically, in one embodiment, the depth of the first section channel 33 at the end away from the water inlet hole 24 is greater than the depth of the first section channel 33 at the end close to the water inlet hole 24, and the depth of the first section channel 33 gradually increases from the end close to the water inlet hole 24 to the end away from the water inlet hole 24. In one embodiment, the depth of the second section channel 35 at the end close to the water outlet hole 30 is greater than the depth of the second section channel 35 at the end away from the water outlet hole 30, and the depth of the second section channel 35 gradually increases from the end away from the water outlet hole 30 to the end close to the water outlet hole 30, thereby making the cleaning member 200 less likely to contact the sewage in the channel.

[0246] In some embodiments, the first section of the channel 33 comprises a first end 39 and a second end 41, the second section of the channel 35 comprises a third end 43 and a fourth end 45, the first end 39 is in communication with the water inlet hole 24, the second end 41 is in communication with the third end 43, and the fourth end 45 is in communication with the water outlet hole 30. The depth H1 of the first end 39 is in the range of [1, 5] mm, the depth H2 of the second end 41 and the third end 43 is in the range of [2, 8] mm, and the depth H3 of the fourth end 45 is in the range of [5, 15] mm, and H1 <= H2 <= H3. Figure 19 In this way, by determining the depth range of each end of the first section of the channel 33 and the second section of the channel 35, it is further ensured that the cleaning member 200 is not easily in contact with the sewage in the channel.

[0247] Specifically, in one embodiment, the first end 39 is in communication with the water inlet hole 24, the second end 41 is in communication with the third end 43, and the fourth end 45 is in communication with the water outlet hole 30, so that water can be discharged into the water outlet hole 30. Further, by setting the depth H1 of the first end 39 in the range of [1, 5] mm, the depth H2 of the second end 41 and the third end 43 in the range of [2, 8] mm, and the depth H3 of the fourth end 45 in the range of [5, 15] mm, such that H1 <= H2 <= H3, it is further ensured that the cleaning member 200 is not easily in contact with the sewage in the channel.

[0248] The depth H1 of the first end 39 can be 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, or other values between 1 mm and 5 mm.

[0249] The depth H2 of the second end 41 and the third end 43 can be 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, 7 mm, 8 mm, or other values between 2 mm and 8 mm.

[0250] The depth H3 of the fourth end 45 can be 5 mm, 6 mm, 7 mm, 8 mm, 9 mm, 10 mm, 11 mm, 12 mm, 13 mm, 14 mm, 15 mm, or other values between 5 mm and 15 mm.

[0251] In combination

[0252] The depth H1 of the first end 39 to the depth H2 of the second end 41 of the cleaning member 200 needs to ensure that the cleaning member 200 can be in contact with the water in the water delivery channel 32, and the cleaning member 200 cannot completely block the water delivery channel 32, and the depth H3 of the fourth end 45 of the cleaning member 200 needs to ensure that it is not in contact with the sewage in the water delivery channel 32. The values of H1, H2 and H3 are related to the height L1 of the scraping strip 28, the extrusion amount y of the cleaning member 200 and the bottom surface 101 of the cleaning tank 16 in the vertical direction, and the water flow height M of the water flow in the water delivery channel 32. Figure 5 ​

[0253] The gap L0 between the cleaning element 200 and the top of the water supply channel 32 is H1-L1-y; for H1=L1+y+L0, to satisfy that the cleaning element 200 can be wetted at H1 and not block the water supply channel 32, 0<L0<M should be satisfied, i.e. L1+y<H1<M+L1+y; similarly for H2, L1+y<H2<M+L1+y should be satisfied; for H3, the cleaning element 200 should not be in contact with the sewage in the water supply channel 32, i.e. L0>M, i.e. H3>L1+y+M, and H1<H2<H3 should be satisfied. When L1=1, y=2, M=3 (unit: millimeter), 3<H1<6, 3<H2<6, H3>6. According to different parameters of L1, y, and M, the height of H1, H2, and H3 can be adjusted.

[0254] In some embodiments, the cleaning tank structure 100 includes a bottom plate 14, a first baffle 12, and a second baffle 26, the first baffle 12, the second baffle 26, and the bottom plate 14 together enclose the cleaning tank 16, the cleaning tank structure 100 is provided with a water inlet hole 24, the water inlet hole 24 is communicated with the cleaning tank 16, the first baffle 12 and the second baffle 26 are respectively connected to the opposite edges of the water inlet hole 24, and the second baffle 26 is farther away from the inlet and outlet of the base station 300 than the first baffle 12.

[0255] The connection between the second baffle 26 and the edge of the water inlet hole 24 is closer to the center of the cleaning tank 16 than the connection between the first baffle 12 and the edge of the water inlet hole 24.

[0256] In the rotation direction of the cleaning element 200 of the cleaning robot in the cleaning tank 16, the connection between the second baffle 26 and the edge of the water inlet hole 24 is located behind the connection between the first baffle 12 and the edge of the water inlet hole 24.

[0257] Therefore, the cleaning effect of the cleaning element 200 can be improved.

[0258] Specifically, the connection between the second baffle 26 and the edge of the water inlet hole 24 is referred to as the second connection 57, and the connection between the first baffle 12 and the edge of the water inlet hole 24 is referred to as the first connection 58.

[0259] Please refer to Figure 5 The cleaning element 200 located in the left cleaning tank 16 rotates in the clockwise direction R1 when cleaning. In the clockwise direction R1, the second connection 57 is located behind the first connection 58. When the cleaning element 200 in the left cleaning tank 16 is cleaning, the cleaning element 200 rotates in the clockwise direction R1, so that when the cleaning element 200 rotates from the part of the cleaning tank 16 enclosed by the first baffle 12 to the part of the cleaning tank 16 enclosed by the second baffle 26, the fluff of the cleaning element 200 can hit the second connection 57 which is closer to the center of the cleaning tank 16, and thus the sewage and debris on the cleaning element 200 can be hit and fall into the cleaning tank 16.

[0260] The cleaning member 200 located in the right cleaning tank 16 rotates in the counterclockwise direction R2 during cleaning. In the counterclockwise direction R2, the second connection 57 is located behind the first connection 58. When the right cleaning member 200 rotates in the counterclockwise direction R2 during cleaning, the fluff of the cleaning member 200 can hit the second connection 57 closer to the center of the cleaning tank 16 when the cleaning member 200 turns from the part of the cleaning tank 16 surrounded by the first barrier 12 to the part of the cleaning tank 16 surrounded by the second barrier 26, so that the sewage and dirt on the cleaning member 200 can be hit and fall into the cleaning tank 16.

[0261] In summary, the cleaning effect of the two cleaning members 200 can be improved.

[0262] In Figure 4 , the first barrier 12 is a front barrier, and the second barrier 26 is a rear barrier. Alternatively, the first barrier 12 and the second barrier 26 can both be soft barriers. Alternatively, the first barrier 12 can be a soft barrier, and the second barrier 26 can be a hard barrier. Alternatively, the first barrier 12 and the second barrier 26 can both be hard barriers. The soft barrier can be made of soft glue (TPU, silicone, etc.). Alternatively, the hard barrier can be made of hard glue (ABS, PC), etc. The present application does not specifically limit the material of the barrier.

[0263] Alternatively, the height D2 of the second barrier 26 is greater than the height D1 of the first barrier 12 relative to the bottom surface 101 of the cleaning tank 16. The second barrier 26 is away from the inlet and outlet of the base station 300, and after the cleaning robot returns to the station, the cleaning member 200 can be placed in the cleaning tank 16. The higher second barrier 26 relative to the bottom surface 101 of the cleaning tank 16 can avoid or reduce the sewage in the cleaning tank 16 from spilling out of the cleaning tank 16, thereby avoiding additional cleaning burden on the user.

[0264] The height D2 of the second barrier 26 can refer to the vertical distance between the top of the second barrier 26 and the bottom surface 101 of the cleaning tank 16, and the height D1 of the first barrier 12 can refer to the vertical distance between the top of the first barrier 12 and the bottom surface 101 of the cleaning tank 16.

[0265] In Figure 5 , the first barrier 12 and the second barrier 26 are both in the shape of a circular arc to form a cleaning tank 16 substantially in the shape of a circle, which can be suitable for use with a rotating cleaning member 200. It can be understood that the present application does not specifically limit the shape of the cleaning tank 16 and the cleaning member 200.

[0266] Alternatively, the diameter of the circle on which the first barrier 12 is located is greater than the diameter of the circle on which the second barrier 26 is located, and the width E1 of the first barrier 12 in the horizontal direction is greater than the width E2 of the second barrier 26 in the horizontal direction.

[0267] Thus, the offset error of the cleaning robot when returning to the station can be overcome.

[0268] Specifically, in the first aspect, Figure 4 when the cleaning robot returns to the station, the cleaning robot needs to pass through the first barrier 12 to enter the cleaning tank 16. The first barrier 12 has a larger width E1 in the horizontal direction, which is beneficial to the cleaning tank structure 100 to overcome the offset error of the cleaning robot when returning to the station, so that the cleaning robot is more easily to enter and exit the station.

[0269] Optionally, the first barrier 12 comprises a first portion 20 and a second portion 22 connected to each other, the first portion 20 is connected to the edge of the water inlet hole 24 and the second portion 22, and the second portion 22 is arranged close to the inlet and outlet of the base station. The height T2 of the second portion 22 is smaller than the height T1 of the first portion 20 compared to the bottom surface 101 of the cleaning tank 16.

[0270] In this way, the height T1 of the first portion 22 is higher, which can avoid the cleaning member 200 splashing water out of the edge of the water inlet hole 24, and the height T2 of the second portion 22 is lower, which can reduce the resistance of the cleaning robot entering the base station 300.

[0271] The height T2 of the second portion 22 can refer to the vertical distance between the top of the second portion 22 and the bottom surface 101 of the cleaning tank 16, and the height T1 of the first portion 20 can refer to the vertical distance between the top of the first portion 20 and the bottom surface 101 of the cleaning tank 16.

[0272] Optionally, the cleaning tank structure 100 comprises a third barrier 34 connected to the first barrier 12 and the second barrier 26, and the third barrier 34 surrounds the water inlet hole 24.

[0273] In some embodiments, in combination with Figure 8 , Figures 28 to 29 and Figure 8 , the cleaning tank structure 100 comprises a water outlet hole 30 and a filter member 60, the water outlet hole 30 communicates with the cleaning tank 16, and the filter member 60 is accommodated in the water outlet hole 30.

[0274] Thus, the filter member 60 can filter the sewage to avoid pipe blockage.

[0275] Specifically, in the first aspect, Figure 28 the water outlet hole 30 is arranged on the bottom surface 101 of the cleaning tank 16. Please refer to Figure 4 , the filter member 60 is provided with a filter cavity 62, and the bottom and / or side wall of the filter cavity 62 is provided with a filter hole 64. The sewage can flow out of the cleaning tank 16 after being filtered through the filter hole 64, and the impurities in the sewage can be left in the filter member 60, avoiding pipe blockage, and also facilitating the cleaning of the impurities.

[0276] In one embodiment, the cleaning member 200 can be used to scrape the sewage, and the sewage can flow into the filtering cavity 62. At this time, the sundries in the sewage can be blocked by the filtering holes 64 and remain in the filtering member 60. The filtered sewage can be discharged through the water outlet hole 30, so that the sewage can be filtered, and the pipeline can be prevented from being blocked.

[0277] Optionally, the filtering member 60 is detachably arranged in the water outlet hole 30. The sundries accumulated in the filtering member 60 can be periodically cleaned by detaching the filtering member 60. After the cleaning is completed, the filtering member 60 is arranged in the water outlet hole 30 again. The number and shape of the filtering holes 64 are not limited. The number of the filtering holes 64 can be multiple, and the shape of the filtering holes 64 can be not only circular but also other shapes. Optionally, the filtering member 60 is further provided with a lifting handle 66, so that the user can conveniently detach and arrange the filtering member 60.

[0278] In some embodiments, please refer to Figure 8 , Figures 27 to 29 and Figure 27 , the cleaning tank structure 100 comprises a drain pipe 68, the drain pipe 68 is communicated with the cleaning tank 16 through the water outlet hole 30, the bottom of the filtering member 60 is provided with a recess 67, and the recess 67 is correspondingly communicated with a communication hole 69 formed on the wall of the water outlet hole 30.

[0279] Therefore, the recess 67 at the bottom of the filtering member 60 corresponds to the communication hole 69, so that the water flow can more easily flow into the drain pipe 68.

[0280] Specifically, the sewage pump can be communicated with the water outlet hole 30 through the drain pipe 68. Since the recess 67 is correspondingly communicated with the communication hole 69, the communication hole 69 can be communicated with the space surrounded by the recess 67, the filtering member 60 has no or less shielding to the communication hole 69, the sewage flowing out of the filtering member 60 can more easily flow into the communication hole 69 and flow out of the cleaning tank structure 100 through the drain pipe 68, so that the sewage can be timely discharged from the cleaning tank 16. The side wall of the recess 67 is provided with the filtering holes 64. Corresponding to the recess 67, the filtering cavity 62 is formed with a convex 70.

[0281] In some embodiments, please refer to Figure 4 , the bottom of the cleaning tank structure 100 is provided with a containing cavity 72, and the drain pipe 68 is located in the containing cavity 72. Therefore, the drain pipe 68 is located in the containing cavity 72, and the drain pipe 68 is short, so that the cost of the cleaning tank structure 100 can be reduced.

[0282] Specifically, in one embodiment, the cleaning tank structure 100 can be manufactured using a mold. The drain pipe 68 is located within the accommodating cavity 72 and does not extend outside the accommodating cavity 72. The drain pipe 68 is relatively short. On the one hand, the shorter drain pipe 68 can be pushed out of the mold using a shorter push rod, making it easier to open the mold of the cleaning tank structure 100. On the other hand, the shorter drain pipe 68 can also reduce material usage, thereby reducing the cost of the cleaning tank structure 100. In summary, the cost of the cleaning tank structure 100 can be reduced.

[0283] Optionally, the drain pipe 68 has a water pipe interface 74 , which is located in the accommodating cavity 72 . A pipe connected to a sewage pump can be inserted into the drain pipe 68 through the water pipe interface 74 to guide water out of the cleaning tank structure 100 .

[0284] In certain embodiments, see ​ The cleaning tank structure 100 is provided with an air inlet 76 , and the air inlet 76 is connected to the cleaning tank 16 .

[0285] Thus, when the cleaning member 200 of the cleaning robot is located in the washing tank 16 , the cleaning member 200 can be dried or air-dried by the air blown in from the air inlet 76 .

[0286] Specifically, after the cleaning member 200 is cleaned, it can be dried or air-dried. At this time, the cleaning member 200 of the cleaning robot is located in the cleaning tank 16. The base station 300 can blow hot air or room temperature air into the cleaning tank 16 through the air inlet 76 to dry or air-dry the cleaning member 200 in the cleaning tank 16.

[0287] Alternatively, the base station 300 and the cleaning tank structure 100 can be integrated, eliminating the need to remove the cleaning tank structure 100 for cleaning. Only the pre-filter needs to be removed for cleaning, eliminating the need for manual maintenance by the user, significantly improving the customer experience. Alternatively, the cleaning tank structure 100 can be detachably mounted on the base station 300, allowing the cleaning tank structure 100 to be removed and cleaned by the user.

[0288] After the cleaning member 200 of the cleaning robot completes cleaning or the cleaning robot completes charging, the cleaning robot may leave the base station 300 to continue cleaning, or stay at the base station 300 until waiting for the next cleaning instruction.

[0289] In the description of the specification, reference to "one embodiment", "some embodiments", "certain embodiments", "an example", "a specific example", or "some examples" means that a particular feature, structure, material, or characteristic being described is included in at least one embodiment or example of the application. The appearances of the phrases "in one embodiment", "in some embodiments", "in certain embodiments", "in an example", "in a specific example", or "in some examples" in various places in the specification are not necessarily referring to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics can be combined in any suitable manner in one or more embodiments or examples.

[0290] Although embodiments of the present application have been shown and described, it would be appreciated by those skilled in the art that changes, modifications, alternatives and variations to these embodiments could be made without departing from the principles and spirit of the application, the scope of which is defined in the claims and their equivalents.

Claims

1. A cleaning device, characterized in that: The cleaning robot comprises a base station and a cleaning robot, wherein the base station is in communication with the cleaning robot, the base station comprises a cleaning tank structure, the cleaning tank structure comprises a scraping bar and a cleaning tank, the scraping bar is arranged in the cleaning tank, and the cleaning robot comprises a cleaning member, and after the cleaning robot enters the base station, the cleaning member is located in the cleaning tank and placed on the scraping bar; The cleaning equipment is configured as follows: After the cleaning robot enters the base station, the cleaning device performs a first cleaning stage and a second cleaning stage; The first cleaning stage includes: The base station introduces a first amount of clean water into the cleaning tank, the cleaning member and the scraper generate relative motion to clean the cleaning member, and the base station discharges the dirty water in the cleaning tank; The second cleaning stage includes: The base station introduces a second amount of clean water into the cleaning tank, the cleaning member and the scraper generate relative motion to clean the cleaning member, and the base station discharges the dirty water in the cleaning tank; after cleaning the cleaning member, the cleaning member rotates to throw water off the cleaning member.

2. The cleaning device according to claim 1, characterized in that In the first cleaning stage and the second cleaning stage, the base station stops supplying clean water after a first preset time period from the start of supplying clean water, and the base station continuously discharges the sewage in the cleaning tank; In the second cleaning stage, the base station stops introducing the clean water after a second preset time period from the start of introducing the clean water, and the base station continues to discharge the sewage in the cleaning tank.

3. The cleaning device according to claim 2, characterized in that The cleaning equipment is configured as follows: In the first cleaning stage, the second cleaning stage is performed after the supply of clean water is stopped for a third preset time period.

4. The cleaning device according to claim 1, characterized in that The cleaning equipment is configured as follows: the cleaning equipment performs an immersion washing stage, and the immersion washing stage includes: the base station introduces the clean water into the cleaning tank to soak at least a portion of the cleaning element, and then stops introducing the clean water, the cleaning element and the scraper generate relative motion to clean the cleaning element, and after the cleaning element and the scraper stop generating relative motion, the base station drains the sewage in the cleaning tank.

5. The cleaning device according to claim 4, characterized in that The soaking and washing stage is performed before the first cleaning stage, and the first cleaning stage is performed before the second cleaning stage.

6. The cleaning device according to claim 5, characterized in that In at least one of the soaking and washing stage, the first cleaning stage, and the second cleaning stage, the cleaning member rotates to clean the bottom surface of the cleaning tank.

7. The cleaning device according to any one of claims 1 to 6, characterized in that: The scraper bar is fixed in the cleaning tank, and the cleaning device is configured such that: the cleaning member rotates to cause the scraper bar and the cleaning member to move relative to each other, or; The scraper bar is rotatably arranged in the cleaning tank, and the cleaning device is configured as follows: The cleaning member does not rotate and the scraper bar rotates, so that the scraper bar and the cleaning member produce relative motion, or; The cleaning member and the scraping bar rotate, the scraping bar rotates in the same direction as the cleaning member, and the scraping bar rotates at a different speed than the cleaning member, so that the scraping bar and the cleaning member move relative to each other, or; The cleaning member and the scraping strip rotate, with the scraping strip rotating in a direction opposite to that of the cleaning member, so that the scraping strip and the cleaning member move relative to each other, or; The cleaning member rotates and the scraping bar does not rotate, so that the scraping bar and the cleaning member generate relative motion.

8. The cleaning device according to claim 1, characterized in that The bottom surface of the cleaning tank includes a contact area. After the cleaning robot enters the base station, the contact area can directly contact the cleaning member when it is rotating or not rotating.

9. The cleaning device according to claim 8, characterized in that The bottom surface of the cleaning tank includes a non-contact area, and the cleaning tank structure is configured as follows: When the cleaning member is placed on the scraper bar, the vertical distance between the non-contact area and the bottom surface of the cleaning member is in the range of (0, 3] mm, and / or; The range of the amount of compression between the cleaning member and the contact area is [0, T) mm, where T is the thickness of the cleaning member, and / or; The cleaning tank structure is configured such that when the cleaning member is placed in the cleaning tank, the horizontal distance between the edge of the cleaning member and the side wall of the cleaning tank is in the range of (0, 8] mm, and / or; The cleaning tank structure is configured such that when the cleaning member is placed in the cleaning tank, the range of the amount of extrusion between the edge of the cleaning member and the side wall of the cleaning tank is (0, 10] mm.

10. The cleaning device according to claim 9, characterized in that The cleaning tank structure includes a water inlet and a water outlet, the bottom surface of the cleaning tank connects the water inlet and the water outlet, the bottom surface of the cleaning tank is inclined along the water inlet toward the water outlet, the bottom surface of the cleaning tank is conical, the non-contact area includes at least a portion of a circular area, and the circular area is a circular area formed with a center of the bottom surface of the cleaning tank as a circle and a preset radius; Optionally, the scraper strip divides the bottom surface of the cleaning tank into a first bottom surface area and a second bottom surface area; The non-contact area includes one or a combination of a first non-contact area and a second non-contact area, wherein the first non-contact area is a portion of a first circular area, and the first circular area is a circular area formed with a center of the first bottom area as a circle center and a first preset radius; The second non-contact area is a portion of a second circular area, which is a circular area formed with a center of the second bottom area as the center and a second preset radius.

11. The cleaning device according to claim 1, characterized in that The cleaning tank structure includes a water inlet and a water outlet, a water supply channel is formed in the cleaning tank, the water supply channel connects the water inlet and the water outlet, the water supply channel includes a first section channel and a second section channel, the first section channel and the second section channel are sequentially connected along the direction from the water inlet to the water outlet, and the depth of the second section channel is greater than or equal to the depth of the first section channel compared to the water inlet; Optionally, along the direction from the water inlet to the water outlet, the depth of the first section of the channel gradually increases, and the depth of the second section of the channel gradually increases; Optionally, the first section of the channel includes a first end and a second end, the second section of the channel includes a third end and a fourth end, the first end is connected to the water inlet, the second end is connected to the third end, and the fourth end is connected to the water outlet, the depth H1 of the first end is in the range of [1,5] mm, the depth H2 of the second end and the third end is in the range of [2,8] mm, the depth H3 of the fourth end is in the range of [5,15] mm, and H1<=H2<=H3.

12. The cleaning device according to claim 1, characterized in that The cleaning tank structure includes a bottom plate, a first baffle and a second baffle, wherein the first baffle, the second baffle and the bottom plate together form the cleaning tank. The cleaning tank structure is provided with a water inlet hole, wherein the water inlet hole is connected to the cleaning tank. The first baffle and the second baffle are respectively connected to two opposite edges of the water inlet hole. Compared with the first baffle, the second baffle is farther away from the entrance and exit of the base station. The connection between the second baffle and the edge of the water inlet hole is closer to the center of the cleaning tank than the connection between the first baffle and the edge of the water inlet hole. Along the rotation direction of the cleaning element in the cleaning tank, the connection between the second baffle and the edge of the water inlet hole is located behind the connection between the first baffle and the edge of the water inlet hole. Optionally, the diameter of the circle where the first baffle is located is greater than the diameter of the circle where the second baffle is located, and the width of the first baffle in the horizontal direction is greater than the width of the second baffle in the horizontal direction; Optionally, relative to the bottom surface of the cleaning tank, the height of the second baffle is greater than the height of the first baffle.

13. The cleaning device according to claim 1, characterized in that The cleaning tank structure includes a base, a top surface of the base is provided with a first recess, the first recess constitutes the cleaning tank, and / or; A single scraper or a plurality of scrapers are provided in the cleaning tank, and / or; The second water volume is smaller than the first water volume, or the second water volume is equal to the first water volume, or the second water volume is larger than the first water volume.

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