End effector, robot, transfer apparatus, and semiconductor system
By using memory alloy adsorbents and flexible seals that expand when heated and contract when cooled, the problem of wafer deformation under high temperature conditions is solved, and efficient and safe wafer handling and adaptive handling of wafers in high-density wafer boats are achieved.
Patent Information
- Application Number
- CN202511323904.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-17
- Publication Date
- 2025-10-17
- Estimated Expiration
- 2045-09-17
AI Technical Summary
Under high temperature conditions, wafers are prone to deformation during the handling process of the robot, resulting in adsorption failure and possible damage. The existing technology solves this problem by increasing the height of the suction cup, which leads to a reduction in the number of wafers in the wafer boat.
The adsorbent is made of a memory alloy material that expands when heated and contracts when cooled, combined with a flexible material seal with a melting point greater than or equal to 200°C. The adsorbent expands at high temperatures to avoid contact with the wafer, and contracts at low temperatures to increase sealing, adapting to wafer handling in different temperature environments.
It effectively avoids deformation and contact of wafers during transportation, improves the success rate of adsorption, allows high-density wafer transportation in wafer boats, enhances the sealing between the adsorption parts and the wafers, and prevents the appearance of gaps.
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Figure CN120809659A_ABST
Abstract
Citation Information
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