A substrate magnetron sputtering coating production equipment

Abstract

The application relates to a substrate magnetron sputtering film production device, which comprises a rack, a pre-vacuum unit and a magnetron sputtering process unit; the pre-vacuum unit and the magnetron sputtering process unit are integrally installed on the rack; the pre-vacuum unit comprises a pre-vacuum cavity, a substrate bearing unit and a substrate transmission mechanism; a substrate inlet and outlet are arranged on one side of the pre-vacuum cavity close to the magnetron sputtering process unit; the magnetron sputtering process unit comprises a sputtering vacuum cavity, a cathode device and an anode device; the cathode device is eccentrically installed on the upper cover of the sputtering vacuum cavity in an up-down adjustable mode; a substrate inlet and outlet are arranged on one side of the sputtering vacuum cavity close to the pre-vacuum cavity; and a gate valve assembly is sealingly connected between the substrate inlet and outlet of the sputtering vacuum cavity and the substrate inlet and outlet of the pre-vacuum cavity. Through the cooperation of the functional units, the substrate can be pretreated and magnetron sputtering coated in the same vacuum environment, the production efficiency of sputtering coating can be greatly improved, and the coating quality is improved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of thin film deposition, and particularly relates to a substrate magnetron sputtering film production equipment. BACKGROUND

[0002] Substrate film coating refers to a processing technology of coating a thin film material on a substrate surface, which is widely applied in the fields of semiconductors, optics, electronics and biology.

[0003] The traditional magnetron sputtering system gradually exposes problems in film coating, such as substrate singularity and low target material utilization rate. For example, the conventional parallel target limits the distance between the target material and the substrate, fixes the sputtering area, and is only limited to the sputtering of single-size substrates.

[0004] In order to achieve a certain film thickness uniformity, the traditional magnetron sputtering film coating method generally uses a large-diameter target material to sputter a small-diameter substrate, which causes most of the sputtered material to be sputtered to other areas such as a protective cover, resulting in serious waste of target material and low target material utilization rate. SUMMARY

[0005] The present application proposes a substrate magnetron sputtering film production equipment that can improve the utilization rate of target material, realize the diversity of film coating process, and be suitable for film coating production of substrates of various sizes, aiming at the deficiencies of the prior art.

[0006] The above object of the present application is achieved by the following technical scheme:

[0007] A substrate magnetron sputtering film production equipment, comprising a rack, a pre-vacuum unit and a magnetron sputtering process unit; the pre-vacuum unit and the magnetron sputtering process unit are integrally installed on the rack;

[0008] The pre-vacuum unit comprises a pre-vacuum cavity, a substrate carrying unit and a substrate transmission mechanism; a substrate inlet and outlet are arranged on one side of the pre-vacuum cavity close to the magnetron sputtering process unit; the substrate carrying unit is connected to the bottom of the pre-vacuum cavity, and comprises a first temperature-controlled anode head capable of rotating control, used for carrying a substrate tray; the substrate transmission mechanism is a linear reciprocating mechanism, and the substrate transmission mechanism clamps the substrate tray through mechanical clamps to realize the transfer of the substrate carried on the substrate tray between the pre-vacuum unit and the magnetron sputtering process unit;

[0009] The magnetron sputtering process unit comprises a sputtering vacuum cavity, a cathode device and an anode device; a substrate inlet and outlet are arranged on one side of the sputtering vacuum cavity close to the pre-vacuum cavity, and a gate valve assembly is sealingly connected between the substrate inlet and outlet of the sputtering vacuum cavity and the substrate inlet and outlet of the pre-vacuum cavity; at least one set of cathode devices is mounted on the upper cover of the sputtering vacuum cavity in an eccentric manner and can be adjusted up and down, the sputtering direction of each set of cathode devices is arranged in an inward inclination from top to bottom, and the inclination angle can be adjusted; the anode device is connected to the bottom of the sputtering vacuum cavity, and the anode device comprises a second temperature-controlled anode head which can be rotated and lifted, and is used for carrying a substrate tray.

[0010] Moreover, the substrate carrying unit further comprises a first cylindrical flange seat, a first shielding cover, a first shielding cover support seat, a first ceramic circuit breaker, a magnetic fluid seal, a first hollow rotating shaft and a first rotating mechanism; the upper part of the first cylindrical flange seat is fixedly connected to the bottom surface of the pre-vacuum cavity through screws; the lower end flange of the first shielding cover is fixedly connected to the upper end flange of the first shielding cover support seat through screws; the first ceramic circuit breaker is built-in the inner hole of the first shielding cover support seat, and the lower end of the first ceramic circuit breaker is fixedly connected to the upper end of the first hollow rotating shaft; the lower end of the first temperature-controlled anode head is fixedly connected to the upper end of the first ceramic circuit breaker; the first rotating mechanism is located directly below the first cylindrical flange seat and comprises a first transition connecting frame, a first rotating drive motor, a first driving pulley, a first driven pulley and a first synchronous belt; the first transition connecting frame is connected to the lower part of the first cylindrical flange seat through support columns, the first rotating drive motor is installed on the first transition connecting frame, the output end of the first rotating drive motor is connected to the first driving pulley, and the first driving pulley and the first driven pulley fixedly arranged on the first hollow rotating shaft are connected through the first synchronous belt; the magnetic fluid seal is fixedly arranged at the center position below the first cylindrical flange seat, and the first hollow rotating shaft is sealingly penetrated through the magnetic fluid seal.

[0011] Moreover, the first temperature-controlled anode head comprises a first bearing disc, a first cylindrical shell, a first upper anode head flange, a first lower anode head flange, a first heating disc, a first cooling disc, and a first high-temperature insulating block; the first cylindrical shell is welded to the first bearing disc at the upper portion and welded to the first upper anode head flange at the lower portion, and forms an installation cavity inside; the first heating disc, the first cooling disc, and the first high-temperature insulating block are sequentially arranged in the installation cavity; the first lower anode head flange is arranged below the first upper anode head flange and fixedly connected to the first upper anode head flange by screws; the first lower anode head flange is fixedly connected to the upper end of the first ceramic breaker by screws; the first heating disc is uniformly provided with resistance wires inside, and the first cooling disc is provided with a cooling water channel inside; a first insulating sleeve is arranged in the inner hole of the first ceramic breaker and the first hollow rotating shaft; the positive and negative electrode leads of the heating wires connected to the first heating disc are led out from the lower end through the inner cavity of the first insulating sleeve; a thermocouple is further arranged in the first insulating sleeve, and the upper end of the thermocouple extends into the insertion hole arranged at the lower end of the first bearing disc; the first cooling water input pipe and the first cooling water output pipe are arranged in the first insulating sleeve, and the upper ends of the first cooling water input pipe and the first cooling water output pipe are respectively connected to the input interface and the output interface of the first cooling disc; a first anode protection box is fixed below the first transition connecting frame, the lower portions of the first cooling water input pipe and the first cooling water output pipe extend into the first anode protection box, and a first conductive slip ring is arranged in the first anode protection box; the upper end of the first conductive slip ring is fixed to the first hollow rotating shaft through a first locking sleeve, the lower end of the first conductive slip ring is connected to a first water rotary joint, the rotating part inside the first water rotary joint is connected to the lower ends of the first cooling water output pipe and the first cooling water input pipe to form a water channel, the fixed part outside the first water rotary joint is fixed by a first anti-rotation assembly fixed in the first anode protection box, and the fixed part outside the first water rotary joint is connected to an external water pipe; the first radio frequency unit comprises a first radio frequency matcher, and the first radio frequency matcher is installed outside the first anode protection box; the output line of the first radio frequency matcher is electrically connected to the first cooling water input pipe and the first cooling water output pipe through a first power transmission clamp.

[0012] Furthermore, the substrate transport mechanism further comprises a moving assembly, a moving driving mechanism, and a mechanical gripper opening and closing control mechanism; the moving assembly comprises a moving plate, rollers, a front roller support, a rear roller support, and guide light axes; the guide light axes are two, and are fixed on left and right side walls in the pre-vacuum cavity in parallel from front to back; the moving plate is arranged between the two guide light axes; the front and back sides of the moving plate close to the left end are fixedly connected with the front roller support and the rear roller support, respectively; the rollers located at the upper part and the rollers located at the lower part are arranged on the front roller support and the rear roller support, respectively, and are in rolling contact with the upper part and the lower part of the corresponding side guide light axes, so as to achieve slidable connection of the moving plate on the two guide light axes in the left-right direction; the mechanical gripper is composed of two gripper pieces; the mechanical gripper upper support plate and the mechanical gripper lower support plate are fixed on the front and rear parts of the right end of the moving plate; the mounting holes are oppositely arranged on the mechanical gripper upper support plate and the mechanical gripper lower support plate; the two gripper pieces are symmetrically arranged at the right end of the moving plate; the left end parts of the two gripper pieces are inserted into the space between the corresponding mechanical gripper upper support plate and the mechanical gripper lower support plate, respectively; the hinge pins are arranged in the mounting holes on the mechanical gripper upper support plate, the mechanical gripper lower support plate, and the gripper pieces, so as to achieve rotatable installation of the gripper pieces on the moving plate; the moving driving mechanism adopts a linear driving mechanism, and is used for driving the moving plate to move left and right along the guide light axes; the mechanical gripper opening and closing control mechanism is connected with the two grippers, and is used for realizing opening and closing control of the mechanical gripper.

[0013] Furthermore, the moving driving mechanism comprises a moving driving motor and a ball screw set; the moving driving motor is installed at the left rear part outside the pre-vacuum cavity on the top of the rack; the moving driving motor drives a driving synchronous pulley; the driving synchronous pulley drives a driven synchronous pulley through a synchronous belt; one end of the rotating shaft of a first rotary sealing assembly is connected with the driven synchronous pulley; the other end of the rotating shaft of the first rotary sealing assembly is connected with a screw rod of a ball screw assembly; the screw rod is supported in the pre-vacuum cavity in the left-right direction; a nut part connected with the screw rod is fixed on a flange connecting piece; the flange connecting piece is fixedly connected with the rear roller support; an encoder is further installed on the rotor of the moving driving motor.

[0014] Moreover, the mechanical gripper opening and closing control mechanism comprises a mechanical gripper control shaft, a mechanical gripper drive shaft, a thrust nut, a gripper opening and closing drive cylinder; the gripper opening and closing drive cylinder is installed at the left front position on the top of the rack outside the pre-vacuum cavity, the gripper opening and closing drive cylinder is drivingly connected with the second rotary sealing assembly through a set of transmission gears, the second rotary sealing assembly is drivingly connected with the left end of the mechanical gripper control shaft, the right end of the mechanical gripper control shaft is drivingly connected with the mechanical gripper drive shaft through a connecting head, the mechanical gripper drive shaft is rotatably installed below the middle position of the moving plate through a front end bearing and a rear end bearing seat, the right end of the mechanical gripper control shaft adopts an external thread structure and is connected with the thrust nut, the front and rear parts of the thrust nut are provided with connecting ears, the front and rear connecting ears are hingedly connected with the left end inner side parts of the two gripper pieces through a pin shaft, wherein the hole for the pin shaft arranged on the mechanical gripper adopts an oblong hole.

[0015] Moreover, the pre-vacuum unit further comprises an ion milling unit, which is installed inside the top of the pre-vacuum cavity through a first angle adjuster.

[0016] Moreover, the anode device further comprises a second cylindrical flange seat, a second shielding cover, a second shielding cover support seat, a second ceramic circuit breaker, a vacuum sealing device, a second hollow rotating shaft, a second insulating sleeve, a second conductive slip ring, a lifting mechanism and a second rotating mechanism; the second cylindrical flange seat is arranged at the lower end of the sputtering vacuum cavity, the upper part of the second cylindrical flange seat is fixedly connected with the bottom surface of the sputtering vacuum cavity through screws; the lower end flange of the second shielding cover is fixedly connected with the upper end flange of the second shielding cover support seat through screws; the second ceramic circuit breaker is built-in in the inner hole of the second shielding cover support seat, the lower end of the second ceramic circuit breaker is fixedly connected with the upper end of the second hollow rotating shaft; the lower end of the second temperature control anode head is fixedly connected with the upper end of the second ceramic circuit breaker; a plurality of vertical guide rods are connected at the lower end of the second cylindrical flange seat, the lower ends of the plurality of vertical guide rods are connected with a guide rod fixing plate, a guide plate is connected on the plurality of vertical guide rods through a linear bearing; a through hole for the second hollow rotating shaft to freely pass through is arranged at the center of the guide plate;

[0017] The lifting mechanism comprises a lifting drive motor, a worm gear transmission mechanism and an outer threaded sleeve; the outer threaded sleeve is sleeved on the outside of the second hollow rotating shaft, the upper end of the outer threaded sleeve is fixedly connected with the lower end of the guide plate through an outer flange, the lower part of the outer threaded sleeve penetrates through a through hole arranged in the center of the guide rod fixed plate; a bearing mounting hole is arranged in the inside of the upper end of the outer threaded sleeve, and a second bearing is mounted in the bearing mounting hole; the second hollow rotating shaft is rotationally supported and matched with the outer threaded sleeve through the second bearing; the lifting drive motor is mounted on an upper motor mounting table below the guide rod fixed plate, and the upper motor mounting table is fixedly connected with the guide rod fixed plate; the output end of the lifting drive motor is drivingly connected with the worm through a shaft coupling, the worm is engaged with the worm gear, the worm gear is fixedly connected with an inner threaded sleeve, and the inner threaded sleeve is engaged with the outer threaded sleeve; a bearing seat and a double-row bearing are arranged above the worm gear, the bearing seat is fixed below the guide rod fixed plate, and the inner threaded sleeve is rotationally supported and matched with the bearing seat through the double-row bearing.

[0018] Moreover, the second rotating mechanism is located directly below the outer threaded sleeve and comprises a second transition connecting frame, a second rotating drive motor, a second driving pulley, a second driven pulley and a second synchronous belt; the upper end of the second transition connecting frame is fixedly connected with the lower end of the outer threaded sleeve; the second rotating drive motor is mounted on the second transition connecting frame, and the output end of the second rotating drive motor is connected with the second driving pulley; the second driving pulley is connected with the second driven pulley fixed on the second hollow rotating shaft through the second synchronous belt; a second anode protection box is fixedly arranged on the lower end of the second transition connecting frame, bearing mounting holes are arranged on the bottom surface of the second transition connecting frame and the top surface of the second anode protection box, and a third bearing is mounted in the bearing mounting holes; the inner ring of the third bearing is interference-fitted with the lower part of the second hollow rotating shaft, so that the second hollow rotating shaft is supported.

[0019] Moreover, the cathode device comprises a magnetron cathode, a cathode support flange pipe and a second angle adjuster, a target material is installed at the lower end of each group of magnetron cathodes by means of clamping or bonding, and each group of magnetron cathodes is electrically connected with a sputtering power supply; the second angle adjuster comprises a bellows, an upper flange connected with the bellows, a lower flange connected with the bellows, two upper hinged plates, two lower hinged plates, an upper adjusting screw rod, a lower adjusting screw rod and an adjusting screw sleeve; the upper and lower ends of the bellows are respectively inserted and fixed with the center holes of the upper flange connected with the bellows and the lower flange connected with the bellows; the upper flange connected with the bellows is fixedly connected with the lower end of the cathode support flange pipe through screws, and the lower flange connected with the bellows is fixedly connected with the upper end of the magnetron cathode; the upper ends of the two upper hinged plates are fixedly connected with the two sides of the upper flange connected with the bellows respectively, the lower ends of the two upper hinged plates are fixedly connected with the two sides of the lower flange connected with the bellows respectively, the lower end of the upper hinged plate and the upper end of the lower hinged plate on the same side are hingedly connected through a hinged shaft, and the hinged shafts on the two sides are coaxially arranged; the adjusting screw sleeve is provided with reverse threads at the two ends, and the threads at the two ends of the adjusting screw sleeve are respectively threadedly connected with the lower end of the upper adjusting screw rod and the upper end of the lower adjusting screw rod; the upper end of the upper adjusting screw rod is hingedly connected with an upper joint fixed at the lower end of the upper flange connected with the bellows, the lower end of the lower adjusting screw rod is hingedly connected with a lower joint fixed at the upper end of the lower flange connected with the bellows, and the upper adjusting screw rod, the lower adjusting screw rod and the adjusting screw sleeve form an adjusting assembly, and the adjusting assembly is arranged at one side of the hinged shaft; the cathode support flange pipe is sealingly inserted and fitted with the hole arranged on the upper cover, and a limiting nut is fixed above the upper cover on the cathode support flange pipe, so that the cathode support flange pipe is limited.

[0020] The application has the advantages and positive effects that:

[0021] 1. The moving assembly of the substrate transmission mechanism of the substrate magnetron sputtering film production equipment is connected with the mechanical clamping jaw to form a telescopic clamping transmission device. The transmission device is driven by a moving drive motor to perform extension / retraction action; the clamping jaw opening / closing drive cylinder performs clamping jaw opening / closing action; and the transmission device can better meet the functions of taking the substrate tray from the pre-vacuum cavity, moving to a certain distance and conveying to the sputtering process cavity.

[0022] 2. Compared with the existing transmission device, the substrate transmission mechanism of the substrate magnetron sputtering film production equipment realizes the simplification of transmission and structure, has high integration degree, fast reaction speed, stable and firm structure, and reduces the cost.

[0023] 3、The substrate conveying mechanism has two pre-processing modes in the pre-vacuum cavity. In the first mode, after vacuumizing the pre-vacuum cavity, the heating function is realized by opening the substrate bearing unit, the substrate placed on the upper end of the first temperature-controlled anode head is subjected to degassing treatment, after the degassing is completed, argon is input through the process gas input interface to reach stability, and the radio frequency matching device is opened to realize the etching treatment on the surface of the substrate, so that better pre-processing effect is achieved. The anode head is a temperature-controlled anode head, which can realize the cooling or heating treatment of the anode head, so as to realize the cooling or heating treatment of the substrate during the etching process, ensure that the substrate is etched at a better temperature, improve the etching efficiency, and on the other hand, the pre-processing of substrates of different specifications and sizes of various materials can be realized, and better applicability is achieved. The second mode can realize the ion milling etching function: after vacuumizing the vacuum cavity, the resistance wire heating device of the lower substrate bearing unit is opened, the substrate placed on the upper end of the first temperature-controlled anode head is subjected to degassing treatment, after the degassing is completed, the ion milling power supply is opened, and the output voltage and current of the ion milling power supply are controlled, so that the etching treatment on the surface of the substrate of difficult etching metal / alloy and multi-element compound can be realized, and better pre-processing effect can be achieved. The two pre-processing modes improve the diversity of the device process and improve the applicability of the device.

[0024] 4、The magnetic control sputtering process module can change the sputtering area relative to the center of the anode by adjusting the included angle between the magnetic control cathode and the vertical direction and the relative distance between the magnetic control cathode and the anode device, so as to meet the sputtering needs of substrates of different sizes, such as changing from a 4-inch substrate to an 8-inch substrate, reducing the included angle between the magnetic control cathode and the vertical direction, and increasing the relative distance between the magnetic control cathode and the anode device, so as to meet the sputtering needs of an 8-inch substrate, and vice versa.

[0025] 5、The magnetic control sputtering process module can realize that the substrate tray is below the cathode, and the position of the substrate tray deviates from the central axis of the cathode in the form of the cathode device being confocal. In the process of sputtering and coating, by rotating the second temperature-controlled anode head at a constant speed, different parts of the large-diameter substrate supported on the substrate tray can successively be below the operation area of the target material sputtering, so that sputtering and coating of the large-diameter substrate by the small target material is realized. This kind of coating method can reduce the waste of target material overflow, reduce the volume that cannot be utilized before target replacement, thereby greatly improving the utilization rate of target material, and on the other hand, better coating uniformity can be obtained. For general metals, the film thickness uniformity can reach ≤±2%; for magnetic materials, the film thickness uniformity can reach ≤±3%; and for reaction sputtering materials, the film thickness uniformity can also reach ≤±3%.

[0026] 6、The magnetron sputtering process module can realize single substrate sputtering film coating on the substrate tray, and in the case that the upper cover is provided with a plurality of magnetron cathodes, different material targets can be arranged at the lower end of the plurality of magnetron cathodes, so that multi-material multi-layer sputtering film coating can be realized on the surface of the substrate in the same vacuum environment at different time stages of sputtering, thereby realizing the diversity of the magnetron sputtering process and improving the applicability of the equipment.

[0027] In summary, the functional units can realize the pretreatment and magnetron sputtering film coating of the substrate in the same vacuum environment, greatly improve the production efficiency of the sputtering film coating, and improve the film coating quality. BRIEF DESCRIPTION OF DRAWINGS

[0028] Figure 1 is the overall appearance perspective view of the substrate magnetron sputtering film coating production equipment of the application (without setting the ion milling unit);

[0029] Figure 2 is the overall appearance perspective view of the substrate magnetron sputtering film coating production equipment of the application (provided with the ion milling unit);

[0030] Figure 3 is the overall top view of the substrate magnetron sputtering film coating production equipment of the application (without setting the ion milling unit);

[0031] Figure 4 is the overall top view of the substrate magnetron sputtering film coating production equipment of the application (provided with the ion milling unit);

[0032] Figure 5 is the overall internal structure schematic view of the substrate magnetron sputtering film coating production equipment of the application (without setting the ion milling unit);

[0033] Figure 6 is the overall internal structure schematic view of the substrate magnetron sputtering film coating production equipment of the application (provided with the ion milling unit);

[0034] Figure 7 is the overall sectional view of the substrate bearing unit;

[0035] Figure 8 is the overall appearance view of the substrate bearing unit;

[0036] Figure 9 is the sectional view of the first temperature control anode head (the second temperature control anode head refers to the structure of the first temperature control anode head);

[0037] Figure 10 is the appearance view of the first temperature control anode head;

[0038] Figure 11 is the appearance plan view of the ion milling unit;

[0039] Figure 12 is the internal structure diagram of the ion milling unit of the present application;

[0040] Figure 13 is the first state diagram of the substrate transport mechanism of the present application;

[0041] Figure 14 is Figure 13 is the structural diagram of the partial pre-vacuum cavity;

[0042] Figure 15 is the second state diagram of the substrate transport mechanism of the present application;

[0043] Figure 16 is the sectional view of the two-rotation sealing group of the present application;

[0044] Figure 17 is the structural diagram of the gate valve assembly of the present application when the valve plate is in the closed state;

[0045] Figure 18 is the structural diagram of the gate valve assembly of the present application when the valve plate is in the open state;

[0046] Figure 19 is the external appearance diagram of the magnetron sputtering process unit of the present application;

[0047] Figure 20 is the installation schematic diagram of the cathode device on the upper cover of the present application;

[0048] Figure 21 is the structural diagram of the single-group cathode device of the present application when the target material is in the shielding state;

[0049] Figure 22 is the structural diagram of the single-group cathode device of the present application when the target material is in the unshielding state;

[0050] Figure 23 is the sectional view of the single-group cathode device of the present application;

[0051] Figure 24 is the structural schematic diagram of the second angle adjuster of the present application;

[0052] Figure 25 is the overall external appearance diagram of the anode device of the present application;

[0053] Figure 26 is the overall sectional view of the anode device of the present application;

[0054] Figure 27 is the connection schematic diagram of the second conductive slip ring, the carbon brush and the second water rotary joint in the magnetron sputtering process unit of the present application;

[0055] Figure 28is a use state reference drawing of sputtering 8-inch substrate by the magnetron sputtering process unit of the application;

[0056] Figure 29 is a use state reference drawing of sputtering 4-inch substrate by the magnetron sputtering process unit of the application;

[0057] In the figure: 1, rack; 2, pre-vacuum unit; 21, pre-vacuum cavity; 211, cavity door; 22, substrate transport mechanism; 221, mechanical gripper; 222, moving assembly; 2221, moving plate; 2222, roller; 2223, front roller support; 2224, rear roller support; 2225, guide optical axis; 223, moving drive mechanism; 2231, moving drive motor; 2232, first rotary sealing assembly; 2233, flange connector; 2234, nut part; 2235, lead screw; 2236, encoder; 224, mechanical gripper opening and closing control mechanism; 2241, thrust nut; 2242, mechanical gripper drive shaft; 2243, connector; 2244, mechanical gripper control shaft; 2245, second rotary sealing assembly; 2246, gripper opening and closing drive cylinder; 23, substrate support unit; 231, first temperature control anode head; 23101, first support disc; 23102, first heating disc; 23103, first cooling disc; 23104, first high-temperature insulating block; 23105, first cylindrical shell; 23106, first anode head upper flange; 23107, first anode head lower flange; 23108, thermocouple; 23109, first cooling water input pipe; 231010, first cooling water output pipe; 231011, fixing block; 231012, positive electrode lead of heating wire; 231013, negative electrode lead of heating wire; 232, first shielding cover; 233, first shielding cover support seat; 234, first cylindrical flange seat; 235, first ceramic circuit breaker; 236, first hollow rotary shaft; 237, first insulating sleeve; 238, magnetic fluid seal; 239, support column; 2310, first transition connecting frame; 2311, first synchronous belt; 2312, first driving pulley; 2313, first rotary drive motor; 2314, first driven pulley; 2315, first bearing; 2316, first locking sleeve; 2317, first conductive slip ring; 2318, first water rotary joint; 2319, first anode protection box; 2320, first anti-rotation assembly; 2321, first radio frequency matcher; 24, ion milling unit; 241, including filament cathode; 242, cathode support; 243, anode connecting wire; 244, cathode connecting wire; 25, first angle adjuster; 3, magnetron sputtering process unit; 31, sputtering vacuum cavity; 311, upper cover; 32, cathode device; 321, swing cylinder; 322, cathode support flange pipe; 323, limit nut; 324, second angle adjuster; 3241, upper connecting flange of bellows; 3242, upper hinged plate; 3243, bellows; 3244, hinged shaft; 3245, lower hinged plate; 3246, lower connecting flange of bellows; 3247, upper connector; 3248, upper adjusting screw; 3249, adjusting screw sleeve; 32410, lower adjusting screw; 32411, lower connector; 325, magnetron cathode; 326, connecting shaft; 327, cathode baffle; 328, target material;33, anode device; 331, second temperature-controlled anode head; 332, second shield cover; 333, second shield cover support seat; 334, second ceramic circuit breaker; 335, second hollow rotating shaft; 336, second cylindrical flange seat; 337, vacuum sealing device; 338, vertical guide rod; 339, guide plate; 3310, second bearing; 3311, outer threaded sleeve; 3312, guide rod fixing plate; 3313, bearing seat; 3314, double-row bearing; 3315, inner threaded sleeve; 3316, worm; 3317, worm wheel; 3318, lifting drive motor; 3319, second rotary drive motor; 3320, second driving pulley; 3321, second driven pulley; 3322, third bearing; 3323, second conductive slip ring; 3324, second water rotary joint; 3325, carbon brush; 34, vacuum system; 4, gate valve assembly; 41, valve body; 42, valve plate; 43, valve plate drive shaft; 44, valve rotary drive cylinder; 45, shaft coupling; 46, sealing ring. DETAILED DESCRIPTION

[0058] The structure of the present application will be further described below in conjunction with the drawings and by examples. It should be noted that the examples are descriptive rather than limiting.

[0059] A substrate magnetron sputtering coating production equipment, please see Figures 1-29 The application point is: comprising a rack 1, a pre-vacuum unit 2, and a magnetron sputtering process unit 3; the pre-vacuum unit 2 and the magnetron sputtering process unit 3 are integrally installed on the rack 1; the pre-vacuum unit 2 and the magnetron sputtering process unit 3 are arranged in adjacent positions, and a gate valve assembly 4 is arranged at the connection between the pre-vacuum processing unit and the magnetron sputtering process unit 3.

[0060] I. Pre-vacuum unit:

[0061] The pre-vacuum unit 2 mainly comprises: a pre-vacuum cavity 21: forming a pre-vacuum inside; a substrate carrying unit 23: having a pre-cleaning function, a heating function, a cooling function and a rotating function on the basis of carrying a substrate at the upper end; a first radio frequency unit for bombarding and activating the substrate, instantaneously removing the surface contamination and the oxidation layer, and significantly improving the adhesion and the density of the subsequent thin film; a pre-vacuum system for ensuring the vacuum performance in the vacuum cavity; a substrate conveying mechanism 22 for transporting a substrate tray between the vacuum cavity and the sputtering process cavity. In addition, an ion milling unit 24 can be additionally arranged in the pre-vacuum cavity for realizing the pre-cleaning function.

[0062] Pre-vacuum cavity:

[0063] A lockable sealing cavity door 221 is connected to the front or top surface of the pre-vacuum cavity, and a transparent observation port is arranged in the middle of the cavity door. After the cavity door is opened, the substrate can be placed into the cavity for film deposition and taken out after the film deposition is completed. The pre-vacuum cavity is composed of a pre-vacuum cavity body, an upper cover plate, and a side cover plate. A substrate inlet and outlet is arranged on the side of the pre-vacuum cavity close to the magnetron sputtering process unit 3, and is connected to the substrate inlet and outlet of the magnetron sputtering process unit 3 through a gate valve assembly. In the case that no ion milling unit is arranged in the pre-vacuum cavity, the cavity door is preferably arranged on the top surface of the pre-vacuum cavity, which can effectively reduce the height of the pre-vacuum cavity; in the case that an ion milling unit is arranged in the pre-vacuum cavity, the cavity door is preferably arranged on the front surface of the pre-vacuum cavity, which facilitates the arrangement of the structure.

[0064] The substrate carrying unit 23 is integrally sealed and fixed in the bottom of the pre-vacuum cavity. It mainly includes a first cylindrical flange seat 234, a first shielding cover 232, a first shielding cover support seat 233, a first temperature-controlled anode head 231, a first ceramic circuit breaker 235, a magnetic fluid seal 238, a first hollow rotating shaft 236, a first insulating sleeve 237, a first rotating mechanism, and a first conductive slip ring, etc. The first cylindrical flange seat 234 is arranged at the lower end of the pre-vacuum cavity, and the upper part of the first cylindrical flange seat 234 is fixedly connected to the bottom surface of the pre-vacuum cavity by screws. The first shielding cover 232 is a cylindrical shielding cover with a flange arranged at the lower end, and the lower end flange of the first shielding cover 232 is fixedly connected to the upper end flange of the first shielding cover support seat 233 by screws. The first ceramic circuit breaker 235 is built into the inner hole of the first shielding cover support seat 233, and the lower end of the first ceramic circuit breaker 235 is fixedly connected to the upper end of the first hollow rotating shaft 236. The lower end of the first temperature-controlled anode head 231 is fixedly connected to the upper end of the first ceramic circuit breaker 235, and the upper end of the first temperature-controlled anode head 231 extends out of the upper end of the first shielding cover 232, forming a support surface for the substrate tray or the substrate.

[0065] The first temperature-controlled anode head 231 comprises a first bearing disc 23101, a first cylindrical shell 23105, a first anode head upper flange 23106, a first anode head lower flange 23107, a first heating disc 23102, a first cooling disc 23103, and a first high-temperature insulation block 23104. The first cylindrical shell 23105 is welded to the first bearing disc 23101 at the upper portion and welded to the first anode head upper flange 23106 at the lower portion, and forms an installation cavity inside, in which the first heating disc 23102, the first cooling disc 23103, and the first high-temperature insulation block 23104 are sequentially arranged from top to bottom. The first anode head lower flange 23107 is arranged below the first anode head upper flange 23106 and fixedly connected to the first anode head upper flange 23106 by screws. The first anode head lower flange 23107 is fixedly connected to the upper end of the first ceramic circuit breaker 235 by screws. The first heating disc 23102 is a resistance wire heating disc, and the first cooling disc 23103 is provided with a cooling water channel. A first insulation sleeve 237 is arranged in the inner hole of the lower portion of the first ceramic circuit breaker 235 and in the first hollow rotating shaft 236. The positive electrode lead 231012 and the negative electrode lead 231013 of the electric heating wire connected to the first heating disc 23102 are led out from the lower end through the inner cavity of the first insulation sleeve 237. A thermocouple 23108 is further arranged in the first insulation sleeve 237, and the upper end of the thermocouple extends into the insertion hole arranged at the lower end of the first bearing disc 23101 and is fixed by a fixing block 231011. A first cooling water input pipe 23109 and a first cooling water output pipe 231010 are arranged in the first insulation sleeve 237, and the upper ends of the first cooling water input pipe 23109 and the first cooling water output pipe 231010 are connected to the input interface and the output interface on the first cooling disc 23103, respectively. The lower ends of the first cooling water input pipe 23109 and the first cooling water output pipe 231010 are connected to the first water rotating joint 2318. A magnetic fluid seal 238 is fixed at the lower center of the first cylindrical flange seat 234, through which the first hollow rotating shaft 236 passes, so as to seal the first hollow rotating shaft 236.

[0066] The first rotating mechanism is located directly below the first cylindrical flange seat 234 and mainly comprises a first transition connecting frame 2310, a first rotating drive motor 2313, a first driving pulley 2312, a first driven pulley 2314 and a first synchronous belt 2311. The first transition connecting frame 2310 is connected to the lower side of the first cylindrical flange seat 234 through a support column 239, and the first rotating drive motor 2313 is installed on the first transition connecting frame 2310. The output end of the first rotating drive motor 2313 is connected to the first driving pulley 2312. The first driving pulley 2312 is connected to the first driven pulley 2314 fixed on the first hollow rotating shaft 236 through the first synchronous belt 2311. The first hollow rotating shaft 236 is rotated by driving the first synchronous belt 2311 through the motor, and simultaneously drives the rotation of the first temperature-controlled anode head and the first conductive slip ring 2317. The first anode protection box 2320 is fixed below the rotating mechanism through the shell flange, so that the first cooling water input pipe 23109 and the first cooling water output pipe 231010 are located inside the first anode protection box. The first conductive slip ring 2317 is arranged in the first anode protection box 2320, and the upper end thereof is fixed to the first hollow rotating shaft 236 through the first locking sleeve 2316, and the lower end thereof is connected to the first water rotating joint 2318. The rotating part inside the first water rotating joint 2318 is connected in water way with the lower ends of the first cooling water output pipe 231010 and the first cooling water input pipe 23109. The fixed part outside the first water rotating joint 2318 is fixed through the first anti-rotation assembly 2320 fixed in the first anode protection box 2319. The first anti-rotation assembly is composed of a first anti-rotation plate and a first anti-rotation pin fixed on the first anti-rotation plate.

[0067] The above-mentioned first conductive slip ring can keep the circuit in a continuous on state during the rotation of the first temperature-controlled anode.

[0068] In addition, a bearing mounting hole is arranged at the lower end of the transition connecting frame and the top surface of the first anode protection box 2319, and a first bearing 2315 is mounted in the bearing mounting hole. The inner ring of the first bearing is interference-fitted with the first hollow rotating shaft to realize radial support of the first hollow rotating shaft.

[0069] The first radio frequency unit comprises a first radio frequency matcher 2321. The first radio frequency matcher 2321 is installed outside the first anode protection box 2319. The output line of the first radio frequency matcher is electrically connected to the first cooling water input pipe and the first cooling water output pipe through a first power transmission clamp.

[0070] The ion milling unit 24 is installed on the top inside the pre-vacuum cavity, including a filament cathode 241, a cathode support 242, an anode connecting wire 243, and a cathode connecting wire 244. The cathode filament is a plasma emission source fixed on the cathode support; the cathode support is fixed on the ion milling shell. The anode connecting wire is located at the bottom of the ion milling, one end of which extends to the outside of the cavity of the ion milling shell and is connected with the ion milling power supply to provide the voltage and current for the ion milling to generate plasma; the cathode connecting wire is located at the bottom of the ion milling and is parallel to the anode connecting wire, one end of which extends to the outside of the cavity of the ion milling shell and is connected with the ion milling power supply to provide the voltage and current for the ion milling to generate plasma.

[0071] The ion milling unit is installed on the top inside the pre-vacuum cavity through the first angle adjuster 25. Specifically, the first angle adjuster includes two sheet metal pieces, the first sheet metal piece is fixedly connected with the bottom of the ion milling shell, and the second sheet metal piece is fixed on the top wall of the pre-vacuum cavity. One end of the first sheet metal piece is rotatably connected with the pin shaft holes on one end of the two sides of the second sheet metal piece through a pin shaft. Threaded holes are arranged on the other end of the first sheet metal piece on both sides. A plurality of angle adjustment holes are processed on the other end of the second sheet metal piece on both sides, and the centers of the plurality of angle adjustment holes are arranged on the same circular arc line with the center of the relative rotation of the two sheet metal pieces. The first sheet metal piece and the second sheet metal piece are fixedly connected in a selectable manner through the screws threaded in one of the angle adjustment holes and the threaded holes on the other end. The angle of the ion milling unit based on the cavity top cover can be changed at will, and the appropriate irradiation angle can be adjusted according to the size of the substrate.

[0072] The substrate transmission mechanism mainly includes a moving assembly 222, a mechanical gripper 221, a moving drive mechanism 223, a mechanical gripper opening and closing control mechanism 224, etc. The moving assembly includes a moving plate 2221, rollers 2222, a front roller support 2223, a rear roller support 2224, and guide light axes 2225. The two guide light axes are fixed on the left and right side walls inside the pre-vacuum cavity in parallel from front to back, and the moving plate is arranged between the two guide light axes. The front and back sides of the moving plate close to the left end are fixedly connected with the front roller support and the rear roller support, respectively, and the rollers located on the upper part and the rollers located on the lower part are arranged on the front roller support and the rear roller support, respectively, and are in rolling contact with the upper part and the lower part of the corresponding side guide light axes, respectively, to realize the slidable connection of the moving plate on the two guide light axes in the left and right directions. Further, the roller located on the upper part is one, and the rollers located on the lower part are two arranged in front and back.

[0073] The moving driving mechanism comprises a moving driving motor 2231 and a ball screw set. The moving driving motor is installed at the left rear position on the top of the rack 1 outside the pre-vacuum cavity. The moving driving motor drives a driving synchronous pulley. The driving synchronous pulley drives a driven synchronous pulley through a synchronous belt. The driven synchronous pulley is connected to one end of the rotating shaft of a first rotating sealing assembly 2232. The other end of the rotating shaft of the first rotating sealing assembly is connected to a screw rod 2235 of a ball screw assembly through a rigid coupling. The screw rod is supported left and right in the pre-vacuum cavity. A nut part 2234 connected to the screw rod is fixed on a first flange connecting part 2233. The flange connecting part is fixedly connected to the rear roller support. An encoder 2236 is further installed on the rotor of the moving driving motor for checking and feeding back the moving stroke.

[0074] The mechanical gripper is composed of two gripper pieces. A mechanical gripper upper support plate and a mechanical gripper lower support plate are fixed on the front and rear of the right end of the moving plate. Mounting holes are oppositely arranged on the mechanical gripper upper support plate and the mechanical gripper lower support plate. The two gripper pieces are symmetrically arranged at the right end of the moving plate. The left end of the two gripper pieces is respectively inserted into the space between the corresponding side of the mechanical gripper upper support plate and the mechanical gripper lower support plate. The gripper pieces are rotatably installed on the moving plate by inserting a hinge pin into the mounting holes on the mechanical gripper upper support plate, the mechanical gripper lower support plate and the gripper pieces.

[0075] The mechanical gripper opening and closing control mechanism comprises a mechanical gripper control shaft 2244, a mechanical gripper driving shaft 2242, a thrust nut 2241 and a gripper opening and closing driving cylinder 2246. The gripper opening and closing driving cylinder is installed at the left front position on the top of the rack 1 outside the pre-vacuum cavity. The gripper opening and closing driving cylinder is drivingly connected to a second rotating sealing assembly 2245 through a set of transmission gears. The second rotating sealing assembly is drivingly connected to the left end of the mechanical gripper control shaft through a groove type coupling. The right end of the mechanical gripper control shaft is drivingly connected to the mechanical gripper driving shaft through a connecting head 2243. The mechanical gripper driving shaft is rotatably installed below the middle position of the moving plate through a front end bearing and a rear end bearing seat. The right end of the mechanical gripper control shaft adopts an external thread structure and is connected to the thrust nut 2241. The front and rear of the thrust nut are provided with connecting ears. The front and rear connecting ears are hingedly connected to the left end of the two gripper pieces through a pin shaft. The holes of the pin shafts arranged on the mechanical gripper adopt long round holes.

[0076] In addition, a transmitting end and a receiving end of a pair of photoelectric switches are oppositely arranged on the front and rear side walls of the pre-vacuum cavity near the substrate inlet and outlet end for detecting whether there is foreign matter blocking the valve plate of the gate valve assembly in real time.

[0077] The substrate conveying mechanism has the following characteristics:

[0078] Cross-region transfer: The function of this substrate transfer mechanism is to transfer the substrate tray from the pre-vacuum chamber to the sputtering vacuum chamber, achieving cross-region transfer. This cross-region transfer function is achieved by a moving component driving the mechanical grippers and the substrate tray to move linearly left and right.

[0079] Stable Linear Transmission: This substrate transmission mechanism possesses reliable linear transmission capabilities. The precision of linear transmission benefits from the coordinated operation of the guide shaft and rollers, effectively ensuring the stable movement of the moving components along a straight line. The guide shaft is firmly fixed between the rear flange of the pre-vacuum chamber and the valve body, forming a stable linear motion reference. The rollers are respectively mounted on the front and rear roller supports, with three rollers on each side, distributed vertically (two at the bottom and one at the top). This layout enhances the tightness of the fit between the rollers and the guide shaft, thus solving the problem of repeatability accuracy in the substrate transmission mechanism. Currently, the repeatability accuracy of this mechanism has reached ±0.01mm, fully meeting the requirements of current operating conditions.

[0080] Structural Horizontal Adjustability: This substrate transfer mechanism works in conjunction with the substrate holder that supports the substrate tray during substrate tray loading and unloading operations. The substrate holder has extremely high horizontality; if the moving plate in the substrate transfer mechanism is not level, the substrate tray will shift. The horizontality of the moving plate is crucial to ensure precise alignment. The mechanism adjusts the horizontality of the moving component using six set screws on the moving plate, with the lower ends of the set screws abutting the upper surfaces of the front and rear roller supports, respectively. Measurements are taken using a level, and the positions of the six set screws are continuously fine-tuned until the moving component is perfectly horizontal. This precise adjustment process effectively solves the horizontality problem of the substrate transfer mechanism, ensuring the accuracy and stability of substrate tray loading and unloading operations.

[0081] Efficient pick-and-place function: the substrate transport mechanism has the ability to efficiently pick and place the substrate tray. Its pick-and-place function is mainly realized by the clamping and unclamping action of the mechanical gripper. The clamping and unclamping action of the mechanical gripper is powered by the gripper opening and closing drive cylinder. The gripper opening and closing drive cylinder drives the driving gear and the driven gear to rotate. The driven gear is connected to one end of the rotating shaft of the second rotary sealing assembly, and the other end of the rotating shaft of the second rotary sealing assembly is connected to the mechanical gripper control shaft through the groove type coupling. The mechanical gripper control shaft is hexagonal and is connected to the hexagonal guide block (connecting head 2243) through profile connection to realize precise fitting. Since the hexagonal guide block is fixed to the mechanical gripper drive shaft by screws, the mechanical gripper control shaft can indirectly drive the mechanical gripper drive shaft to rotate. The mechanical gripper drive shaft and the thrust nut are connected by threads. The thrust nut is made of bronze and has excellent self-lubricating properties. Whenever the mechanical gripper drive shaft rotates one revolution, the thrust nut moves forward by one pitch distance. The mechanical gripper and the thrust nut are connected by a cylindrical pin, so when the thrust nut pushes forward, the mechanical gripper opens; conversely, when the thrust nut retreats, the mechanical gripper closes and clamps the substrate tray. Through this design of transmission mechanism, the substrate transport mechanism successfully realizes the efficient pick-and-place function of the substrate tray, ensuring the automation and high-precision operation of the entire production process.

[0082] Sealing: the substrate transport mechanism is connected to the pre-vacuum cavity through the rotary sealing assembly. The rotary sealing assembly is composed of a rotary sealing mounting seat, a ball bearing, a rotating shaft, an O-ring seal, and a lip seal. Since there are two shaft systems in the substrate transport mechanism, two rotary sealing assemblies are required to achieve sealing efficiency, namely the first rotary sealing assembly and the second rotary sealing assembly.

[0083] The first rotary sealing assembly is sealed by pressing the block, and the second rotary sealing assembly is sealed by locking the clamp. In addition, the flange vacuum pipe and the pre-vacuum cavity rear flange are also sealed by pressing the block. In this way, the sealing problem of the connection between the substrate transport mechanism and the pre-vacuum cavity is solved, ensuring the sealing and stability of the key part during equipment operation.

[0084] Good load capacity: the substrate transport mechanism has good load capacity. The substrate tray is made of oxygen-free copper, which has good heat conduction and electrical conductivity. The mass of the substrate transport mechanism used is about 2 kg. Through mechanical simulation analysis and actual operation of the equipment, it is proved that the substrate transport mechanism can fully meet the requirements of substrate tray transportation in the magnetron sputtering equipment.

[0085] Stable control of speed: the substrate conveying mechanism can accurately and stably control the speed. The speed control function mainly relies on the encoder to achieve. The encoder monitors the running state of the moving drive motor in real time and feeds back the data to the PCPLC system in time, so as to realize accurate regulation and control of the moving drive motor and ensure the stability of the speed of the substrate conveying mechanism in the straight line transmission process. As for the opening and closing drive cylinder of the clamping jaw, the speed control is responsible by the pressure regulating valve in the gas circuit. The pressure regulating valve controls the action of the opening and closing drive cylinder of the clamping jaw by adjusting the speed of air intake and exhaust, so as to accurately control the opening and closing speed of the mechanical clamping jaw. Through the above design, the substrate conveying mechanism realizes stable control of the overall speed, ensuring the smooth and efficient operation of the equipment

[0086] Pre-vacuum system: a plurality of interfaces are arranged on the side wall of the pre-vacuum cavity, and a vacuum pump, a vacuum gauge, a process gas input interface and an exhaust valve are connected at the interfaces. The vacuum pump includes a mechanical pump and a molecular pump, which realizes low vacuum pumping through the mechanical pump and high vacuum pumping through the molecular pump. A gate valve is arranged between the molecular pump and the pre-vacuum cavity, which plays a key role in isolation, protection, easy maintenance and realizing staged pumping, and is an important guarantee for safe and efficient operation of the vacuum system, and is also used to control the concentration of process gas in the cavity. The vacuum gauge can include a Pirani vacuum gauge for detecting the primary vacuum degree of the cavity, a capacitance vacuum gauge for monitoring the vacuum degree of the cavity in the sputtering process, and a full-range vacuum gauge for detecting the limit vacuum degree of the cavity. The process gas input interface is used to input argon gas for etching treatment of the base disc.

[0087] II. Magnetron sputtering process unit

[0088] The magnetron sputtering process unit 3 mainly includes: a sputtering vacuum cavity 31: forming a sputtering process cavity inside; a cathode device 32: having a confocal function, target sputtering, single-layer or multi-layer alloy deposition, and adjustable target-substrate distance; an anode device 33: having a pre-cleaning function, a rotating function, a lifting function, a heating function and a cooling function on the basis of bearing the substrate at the upper end; a power source device: which can adopt DC, RF and pulse DC; a vacuum system 34: ensuring the vacuum performance in the sputtering process cavity.

[0089] Sputtering vacuum cavity: the sputtering vacuum cavity is a cylindrical cavity structure, which is composed of a lower cavity and an upper cover 311. The lower cavity is installed on the rack 1. A substrate inlet and outlet is arranged on the side of the lower cavity, which is sealingly connected with the corresponding substrate inlet and outlet on the pre-vacuum cavity through a gate valve assembly. In addition, a transparent observation port is also arranged on the side wall of the lower cavity, which is convenient for observing the situation in the cavity during sputtering. The upper cover is sealingly buckled on the upper end of the lower cavity, and a closed sputtering process cavity is formed inside. A group of cathode devices are eccentrically installed on the upper cover, or a plurality of groups of cathode devices are arranged along the circumferential direction with the center of the upper cover as the center.

[0090] The cathode device comprises a magnetron cathode 325, a target material 328, a cathode support flange tube 322, and a second angle adjuster 324. The target material is installed at the lower end of each group of magnetron cathodes by clamping or bonding. Each group of magnetron cathodes is electrically connected to a sputtering power source, which can be a direct current or a radio frequency. The magnetron device of the magnetron cathode can use a permanent magnet system. The second angle adjuster comprises a bellows 3243, a bellows upper connecting flange 3241, a bellows lower connecting flange 3246, two upper hinge plates 3242, two lower hinge plates 3245, an upper adjusting screw 3248, a lower adjusting screw 32410, and an adjusting screw sleeve 3249. The upper and lower ends of the bellows are respectively inserted and fixed with the center holes of the bellows upper connecting flange and the bellows lower connecting flange. The bellows upper connecting flange is fixedly connected to the lower end of the cathode support flange tube by screws, and the bellows lower connecting flange is fixedly connected to the upper end of the magnetron cathode. The upper ends of the two upper hinge plates are fixedly connected to the two sides of the bellows upper connecting flange, and the lower ends of the two upper hinge plates are fixedly connected to the two sides of the bellows lower connecting flange. The lower end of the upper hinge plate and the upper end of the lower hinge plate on the same side are hingedly connected by a hinge shaft 3244, and the hinge shafts on the two sides are coaxially arranged. The adjusting screw sleeve is provided with reverse threads at both ends. The threads at both ends of the adjusting screw sleeve are respectively threadedly connected to the lower end of the upper adjusting screw and the upper end of the lower adjusting screw. The upper end of the upper adjusting screw is hingedly connected to an upper joint 3247 fixed at the lower end of the bellows upper connecting flange, and the lower end of the lower adjusting screw is hingedly connected to a lower joint 32411 fixed at the upper end of the bellows lower connecting flange. The upper adjusting screw, the lower adjusting screw, and the adjusting screw sleeve constitute an adjusting assembly. The adjusting assembly is arranged at one side of the hinge shaft. By rotating the adjusting screw sleeve, the relative distance between the upper adjusting screw and the lower adjusting screw can be adjusted, so that the inclination angle of the magnetron cathode can be adjusted.

[0091] The cathode support flange tube is sealingly inserted and fitted with the hole arranged on the upper cover, and a limiting nut 323 is fixed above the upper cover on the cathode support flange tube, so as to limit the cathode support flange tube (limiting in the up-down direction), and the position of the limiting nut on the cathode support flange tube can be adjusted to adjust the position of the cathode device, so as to adjust the relative distance between the cathode device and the anode device.

[0092] The adjustment angle range of the second angle adjuster is 0° to 25°. After adjusting the angle of the magnetron, the center position between the target material and the substrate changes, the sputtering area changes, and the size of the substrate that can be irradiated also changes accordingly. In addition, in an atmospheric environment, the height of the magnetron can be adjusted upward or downward by adjusting the limiting nut. By adjusting the height of the magnetron (while the angle remains unchanged), the distance between the target material and the substrate can be changed, the irradiation range of the sputtering area to the substrate can be changed, and the size of the substrate that can be irradiated also changes accordingly. When the height and angle of the magnetron are adjusted at the same time, the distance between the target material and the substrate changes, the overall irradiation range of the sputtering area changes, and the size of the substrate that can be irradiated also changes accordingly, thereby meeting the sputtering needs of substrates of various sizes.

[0093] Each magnetron is equipped with a cathode baffle 327, which is driven by a swing cylinder 321 arranged above the upper cover through a connecting shaft 326. The baffle is driven to rotate to shield and open, which is to prevent the target material from being contaminated. The DC conversion switch functions as a DC power supply that can supply power to multiple magnetrons at the same time, and the power supply is switched through the DC conversion switch. One of the cathodes is configured with an RF power supply, which is to enable reactive sputtering to form an oxide film or a nitride film.

[0094] Anode device: The anode device 33 is integrally sealed and fixed at the bottom of the sputtering process cavity, which can realize temperature control of the substrate, driving the substrate to rotate, and lifting the substrate based on supporting the substrate.

[0095] It mainly includes a second cylindrical flange seat 336, a second shielding cover 332, a second shielding cover support seat 333, a second temperature-controlled anode head 331, a second ceramic circuit breaker 334, a vacuum sealing device 337, a second hollow rotating shaft 335, a second insulating sleeve, a second rotating mechanism, a second conductive slip ring 3323, and a lifting mechanism. The second cylindrical flange seat is arranged at the lower end of the sputtering vacuum cavity, and the upper part of the second cylindrical flange seat is fixedly connected with the bottom surface of the sputtering vacuum cavity by screws. The second shielding cover is a cylindrical shielding cover with a flange arranged at the lower end, and the lower end flange of the second shielding cover is fixedly connected with the upper end flange of the second shielding cover support seat by screws. The second ceramic circuit breaker is built-in in the inner hole of the second shielding cover support seat, and the lower end of the second ceramic circuit breaker is fixedly connected with the upper end of the second hollow rotating shaft. The lower end of the second temperature-controlled anode head is fixedly connected with the upper end of the second ceramic circuit breaker, and the upper end of the second temperature-controlled anode head extends out of the upper end of the second shielding cover, forming a support surface of the substrate tray or the substrate.

[0096] The structure of the second temperature-controlled anode head is the same as that of the first temperature-controlled anode head, mainly including a second bearing disc, a second cylindrical shell, a second anode head upper flange, a second anode head lower flange, a second heating disc, a second cooling disc and a second high-temperature insulation block. The second cylindrical shell is welded to the second bearing disc at the upper part and welded to the second anode head upper flange at the lower part, and an installation cavity is formed in the inside, and the second heating disc, the second cooling disc and the second high-temperature insulation block are sequentially arranged in the installation cavity. The second anode head lower flange is arranged below the second anode head upper flange, and the two are fixedly connected through screws. The second anode head lower flange is fixedly connected to the upper end of the second ceramic circuit breaker through screws. The second heating disc adopts a resistance wire second heating disc, and the second cooling disc is provided with a cooling water channel. A second insulation sleeve is arranged in the inner hole of the lower part of the second ceramic circuit breaker and the second hollow rotating shaft. The positive electrode lead and the negative electrode lead of the heating wire connected with the second heating disc are led out from the lower end through the inner cavity of the second insulation sleeve; a thermocouple is also arranged in the second insulation sleeve, and the upper end of the thermocouple extends into the insertion hole arranged at the lower end of the second bearing disc and is fixed through a fixing block. The second cooling water input pipe and the second cooling water output pipe are arranged in the second insulation sleeve, and the upper ends of the second cooling water input pipe and the second cooling water output pipe are connected with the input interface and the input interface on the second cooling disc respectively. A vacuum sealing device is fixed at the lower center of the second cylindrical flange seat, and the second hollow rotating shaft passes through the vacuum sealing device to realize sealing with the second hollow rotating shaft, so that the upper part of the second cylindrical flange seat is vacuum isolated from the bottom part of the second magnetic fluid sealing or vacuum sealing device. The second vacuum sealing device is composed of a vacuum spacer and a rubber sealing ring.

[0097] A plurality of vertical guide rods 338 are connected to the lower end of the second cylindrical flange seat, the lower ends of the plurality of vertical guide rods are connected to a guide rod fixing plate 3312, and a guide plate 339 is connected to the plurality of vertical guide rods through a linear bearing.

[0098] The lifting mechanism includes a lifting drive motor 3318, a worm gear transmission mechanism and an outer threaded sleeve 3311. The outer threaded sleeve is sleeved on the outside of the second hollow rotating shaft, the upper end of the outer threaded sleeve is fixedly connected to the lower end of the guide plate through an outer flange, and the lower part of the outer threaded sleeve passes through a through hole arranged in the center of the guide rod fixing plate.

[0099] The upper end of the outer threaded sleeve is internally provided with a bearing mounting hole, a second bearing 3310 is mounted in the bearing mounting hole, and the second hollow rotating shaft is rotationally supported by the outer threaded sleeve through the second bearing. The lifting drive motor is mounted on the upper motor mounting table below the guide rod fixing plate, and the upper motor mounting table is fixedly connected with the guide rod fixing plate. The output end of the lifting drive motor is drivingly connected with a worm 3316 through a shaft coupling, and the worm is engaged with a worm gear 3317. The worm gear is fixedly connected with an inner threaded sleeve 3315 through a screw, and the inner threaded sleeve is engaged with the outer threaded sleeve. A bearing seat 3313 and a double-row bearing 3314 are arranged above the worm gear, the bearing seat is fixed below the guide rod fixing plate through bolts, and the inner threaded sleeve is rotationally supported by the bearing seat through the double-row bearing.

[0100] The second rotating mechanism is located directly below the outer threaded sleeve and mainly includes a second transition connecting frame, a second rotating drive motor 3319, a second driving pulley 3320, a second driven pulley 3321 and a second synchronous belt. The upper end of the second transition connecting frame is fixedly connected with the lower end of the outer threaded sleeve. The second rotating drive motor is mounted on the second transition connecting frame, and the output end thereof is connected with the second driving pulley. The second driving pulley is connected with the second driven pulley fixed on the second hollow rotating shaft through the second synchronous belt. The second synchronous belt is driven by the motor to rotate the second hollow rotating shaft, and simultaneously rotates the second temperature control anode head and the second conductive slip ring. The second anode protection box is fixed below the second transition connecting frame, so that the second cooling water input pipe and the second cooling water output pipe are located inside the second anode protection box. The second conductive slip ring is arranged in the second anode protection box, the upper end thereof is fixed with the second hollow rotating shaft through a second locking sleeve, and the lower end thereof is connected with a second water rotating joint 3324. The inner rotating part of the second water rotating joint is connected with the lower ends of the second cooling water output pipe and the second cooling water input pipe in a water channel. The fixed part of the second water rotating joint outside is fixed through a second anti-rotation assembly fixed in the second anode protection box. The second anti-rotation assembly is composed of a second anti-rotation plate and a second anti-rotation pin fixed on the second anti-rotation plate. The fixed part of the second water rotating joint outside is connected with an external water pipe, so that stable circulation of the water can be maintained even in a high-speed rotating or continuous motion scene.

[0101] In addition, bearing mounting holes are arranged at the lower end of the second transition connecting frame and the top surface of the second anode protection box, and a third bearing 3322 is mounted in the bearing mounting hole. The inner ring of the third bearing is interference-fitted with the lower part of the second hollow rotating shaft to support the second hollow rotating shaft.

[0102] The second radio frequency unit includes a second radio frequency matcher, the second radio frequency matcher is mounted outside the second anode protection box, and the output line of the second radio frequency matcher is electrically connected with the second cooling water input pipe and the second cooling water output pipe through a second power transmission clamp.

[0103] Carbon brushes 3325 are installed on both sides of the second anode protection box, and the two carbon brushes are connected with the output lines of the second power supply control box; the second conductive slip ring and the carbon brush are mainly used for transmitting power and signals between rotating parts and stationary parts (a carbon brush is also provided outside the first conductive slip ring), which can realize uninterrupted power supply and signal transmission, and can maintain stable connection even in high-speed rotation or continuous motion scenarios. The two carbon brushes are connected with the second thermocouple, the second heating disc and the second radio frequency matching device respectively. At the same time, an automatic switching switch is arranged in the power supply control box to ensure that the power supply and signal transmission of the heater and the thermocouple are disconnected at the same time when the radio frequency matching device is working.

[0104] Power source device: the power source device can be divided into direct current power supply, radio frequency power supply and direct current pulse power supply. Different processes can be realized by matching different types of power supply with the cathode device. The direct current power supply is applied to the sputtering of metal target material, but it cannot effectively sputter the insulator target material; the radio frequency power supply can be used for sputtering of metal target material and insulator target material; the pulse direct current can be used for sputtering of metal target material and insulator target material, and the sputtering efficiency is high.

[0105] Vacuum system: a plurality of interfaces are arranged on the side wall of the sputtering vacuum chamber, and a vacuum pump, a vacuum gauge, a process gas input interface and an exhaust switch valve are connected at the interfaces. The vacuum pump includes a mechanical pump and a cryogenic pump, which realizes low vacuum pumping through the mechanical pump and high vacuum pumping through the cryogenic pump. A gate valve is arranged between the cryogenic pump and the sputtering vacuum chamber, which plays a key role in isolation, protection, easy maintenance and realization of staged pumping, and is an important guarantee for safe and efficient operation of the vacuum system, and is also used to control the concentration of process gas in the chamber. The vacuum gauge can include a Pirani vacuum gauge for detecting the primary vacuum degree of the chamber, a capacitance vacuum gauge for monitoring the vacuum degree of the chamber in the sputtering process, and a full-range vacuum gauge for detecting the limit vacuum degree of the chamber. The process gas input interface is used to input argon for etching the substrate and argon required for sputtering of the target material by the magnetron sputtering.

[0106] In addition, the magnetron sputtering process unit 3 further comprises an upper cover automatic lifting mechanism, which can adopt a cylinder driving mechanism or a lead screw nut transmission mechanism driven by a motor.

[0107] In the above structure, positioning grooves are arranged at the upper ends of the first temperature control anode head and the second temperature control anode head, the shapes of the positioning grooves match the outer shape of the substrate tray, and the circumferential direction of the substrate tray is limited.

[0108] III. Gate valve assembly

[0109] The gate valve assembly is used to realize isolation between the pre-vacuum cavity and the sputtering process cavity. One side of the gate valve assembly is in unit sealing cooperation with the pre-vacuum cavity, and the other side is in unit sealing cooperation with the sputtering vacuum cavity, and the function is to connect the two cavities and isolate the vacuum. When the gate valve assembly needs to pass through the substrate tray, it is opened by rotating 90°; after the linear transmission mechanism completes the placement of the substrate tray, the gate valve assembly is closed.

[0110] The gate valve assembly is composed of a valve body 41, a valve plate 42, a valve plate driving shaft 43, and a valve rotation driving cylinder 44. The valve body is provided with a substrate inlet and outlet, and a valve plate driving shaft is rotatably installed at the lower part of the substrate inlet and outlet. The valve plate driving shaft is connected with the valve rotation driving cylinder arranged at one end outside the valve body through a shaft coupling 45. The valve plate is fixedly connected with the valve plate driving shaft through two groups of rotary connecting pieces. When the valve plate is rotated to the vertical position, the substrate inlet and outlet are sealed by the sealing ring 46 embedded on the side surface of the valve plate. When the valve plate is rotated to the horizontal position, the substrate inlet and outlet can be completely opened. One side surface of the valve body is bolted with the side wall of the pre-vacuum cavity at the periphery of the substrate inlet and outlet of the pre-vacuum cavity, and the other side surface of the valve body is provided with a sealing ring mounting groove at the periphery of the substrate inlet and outlet on the valve body. The sealing ring is installed in the sealing ring mounting groove and in sealing contact with the periphery of the substrate inlet and outlet on the sputtering vacuum cavity, and is fixedly connected through screws.

[0111] The working process of the substrate magnetron sputtering coating production equipment is as follows:

[0112] 1. Establish the pre-coating working condition: make the pre-vacuum cavity and the sputtering vacuum cavity in a high vacuum state through an external vacuum pumping device;

[0113] 2. Load the substrate: open the exhaust valve at the lower end of the pre-vacuum cavity, so that the pre-vacuum cavity performs automatic vacuum breaking operation first, and returns to the atmospheric environment; then open the cavity door on the pre-vacuum cavity, place multiple or single substrates on the substrate loading unit 23 at the upper end through the substrate tray, and then close the cavity door; start the automatic vacuum pumping system to restore the pre-vacuum cavity to a high vacuum state;

[0114] 3. The substrate is degassed and etched: the heating unit of the substrate support unit is turned on in the pre-vacuum chamber, the substrate is degassed by the heating disc, and the heating power is turned off after the degassing is completed at the set time; then argon gas is input into the pre-vacuum chamber, and when the pressure in the pre-vacuum chamber reaches the set stable state, the radio frequency unit or the ion milling unit is started, under the action of the radio frequency electric field, the argon gas is ionized to produce argon ions and electrons, the argon ions obtain energy after being accelerated by the electric field, and the surface of the substrate is bombarded to remove the material on the surface of the substrate by physical sputtering, thereby realizing the effect of etching. During etching, the substrate can be temperature-regulated by the cooling disc according to specific process requirements.

[0115] 4. The pre-processed substrate is transmitted to the magnetron sputtering process unit: first, the substrate transmission mechanism of the pre-vacuum chamber makes the mechanical clamps of the substrate transmission mechanism close by the clamping opening and closing driving cylinder, so that the substrate tray is separated from the substrate support unit; the valve plate of the gate valve assembly is opened by rotating the valve plate 90° by the valve rotating driving cylinder, the substrate transmission mechanism is driven to move into the sputtering vacuum chamber by the moving driving motor, the mechanical clamps of the substrate transmission mechanism are opened by the clamping opening and closing driving cylinder, and the substrate tray is placed on the top of the anode device in the sputtering vacuum chamber; the substrate transmission mechanism is driven to move into the pre-vacuum chamber by the moving driving motor, and the valve plate of the gate valve assembly is closed by rotating the valve plate 90° by the valve rotating driving cylinder.

[0116] 5. Magnetron sputtering coating is performed on the surface of the substrate: the gas supply system of the sputtering vacuum chamber is turned on, and the sputtering gas medium is input, the magnetron cathode is powered on, and the anode device rotating motor is turned on, so that the substrate completes the coating in a rotating state;

[0117] 6. The coated substrate is returned to the pre-vacuum unit: after the substrate coating is completed, the valve plate of the gate valve assembly of the pre-vacuum chamber is opened by rotating the valve plate 90° by the valve rotating driving cylinder, the substrate transmission mechanism in the pre-vacuum chamber is driven to move into the sputtering vacuum chamber by the moving driving motor, the mechanical clamps of the substrate transmission mechanism are closed by the clamping opening and closing driving cylinder, so that the substrate tray is fixed on the substrate transmission mechanism, the substrate transmission mechanism is driven to move into the pre-vacuum chamber by the moving driving motor, the valve plate of the gate valve assembly is closed by rotating the valve plate 90° by the valve rotating driving cylinder, and the mechanical clamps of the substrate transmission mechanism are opened, so that the substrate tray is placed on the substrate support unit.

[0118] 7. Unloading the substrate: when the substrate is placed in the substrate supporting unit, the pre-vacuum chamber performs an automatic vacuum breaking operation to restore it to the atmospheric environment; the chamber door on the pre-vacuum chamber is opened, the substrate tray placed on the substrate supporting unit is taken out, and then the chamber door is closed. The automatic vacuum pumping system is started to restore the pre-vacuum chamber to a high vacuum state, thus completing the entire substrate coating process.

[0119] Although the embodiments of the present application and the drawings are disclosed for illustrative purposes, those skilled in the art can understand that various substitutions, changes and modifications are possible without departing from the spirit of the present application and the appended claims, and therefore the scope of the present application is not limited to the disclosed embodiments and drawings.

Claims

1. A substrate magnetron sputtering coating production equipment, characterized in that: The utility model relates to a kind of magnetron sputtering system, including rack (1), pre-vacuum unit (2) and magnetron sputtering process unit (3);Pre-vacuum unit (2) and magnetron sputtering process unit (3) are integrated on rack (1) installation; The pre-vacuum unit (2) includes pre-vacuum cavity (21), substrate bearing unit (23) and substrate transport mechanism (22);Substrate inlet and outlet are provided on the side of pre-vacuum cavity (21) close to magnetron sputtering process unit (3);Substrate bearing unit (23) is connected to the bottom of pre-vacuum cavity (21), and the substrate bearing unit (23) includes rotatable control first temperature control anode head (231), for bearing substrate tray;The substrate transport mechanism (22) is a linear reciprocating mechanism, and the substrate transport mechanism (22) clamps substrate tray through mechanical gripper (221), to realize the transfer of substrate on substrate tray between pre-vacuum unit (2) and magnetron sputtering process unit (3); The magnetron sputtering process unit (3) includes sputtering vacuum cavity (31), cathode device (32), anode device (33);Substrate inlet and outlet are provided on the side of sputtering vacuum cavity (31) close to pre-vacuum cavity (21), and gate valve assembly is sealingly connected between the substrate inlet and outlet of sputtering vacuum cavity (31) and the substrate inlet and outlet of pre-vacuum cavity (21);At least one set of eccentrically arranged and up-down adjustable cathode device (32) is installed on the upper cover (311) of sputtering vacuum cavity (31), the sputtering direction of each set of cathode device (32) is inwardly inclined from top to bottom, and the inclination angle is adjustable;The anode device (33) is connected to the bottom of sputtering vacuum cavity (31), and the anode device (33) includes rotatable and lift control second temperature control anode head (331), for bearing substrate tray; The anode device (33) further comprises a second cylindrical flange seat (336), a second shielding cover (332), a second shielding cover support seat (333), a second ceramic circuit breaker (334), a vacuum sealing device (337), a second hollow rotating shaft (335), a second insulating sleeve, a second conductive slip ring (3323), a lifting mechanism and a second rotating mechanism; the second cylindrical flange seat (336) is arranged at the lower end of the sputtering vacuum cavity (31), and the upper portion of the second cylindrical flange seat (336) is fixedly connected with the bottom surface of the sputtering vacuum cavity (31) through screws; the lower end flange of the second shielding cover (332) is fixedly connected with the upper end flange of the second shielding cover support seat (333) through screws; the second ceramic circuit breaker (334) is built in the inner hole of the second shielding cover support seat (333), and the lower end of the second ceramic circuit breaker (334) is fixedly connected with the upper end of the second hollow rotating shaft (335); the lower end of the second temperature control anode head (331) is fixedly connected with the upper end of the second ceramic circuit breaker (334); a plurality of vertical guide rods (338) are connected at the lower end of the second cylindrical flange seat (336), the lower ends of the plurality of vertical guide rods (338) are connected with a guide rod fixing plate (3312), and a guide plate (339) is connected on the plurality of vertical guide rods (338) through linear bearings; the center of the guide plate (339) is provided with a through hole for the second hollow rotating shaft (335) to freely pass through; The cathode device (32) comprises a magnetron cathode (325), a cathode support flange pipe (322) and a second angle adjuster (324), a target material (328) is coaxially installed at the lower end of each group of magnetron cathodes (325), and each group of magnetron cathodes (325) is electrically connected with a sputtering power supply; the second angle adjuster (324) comprises a bellows (3243), a bellows upper connecting flange (3241), a bellows lower connecting flange (3246), two upper hinged plates (3242), two lower hinged plates (3245), an upper adjusting screw rod (3248), a lower adjusting screw rod (32410) and an adjusting screw sleeve (3249); the upper and lower ends of the bellows (3243) are respectively inserted and fixed with the center holes of the bellows upper connecting flange (3241) and the bellows lower connecting flange (3246); the bellows upper connecting flange (3241) is fixedly connected with the lower end of the cathode support flange pipe (322) through screws, and the bellows lower connecting flange (3246) is fixedly connected with the upper end of the magnetron cathode (325); the upper ends of the two upper hinged plates (3242) are fixedly connected with the two sides of the bellows upper connecting flange (3241) respectively, the lower ends of the two upper hinged plates (3242) are fixedly connected with the two sides of the bellows lower connecting flange (3246) respectively, the lower end of the upper hinged plate (3242) on the same side and the upper end of the lower hinged plate are hingedly connected through a hinged shaft (3244), and the hinged shafts (3244) on the two sides are coaxially arranged; the adjusting screw sleeve (3249) is provided with reverse threads at the two ends, the threads at the two ends of the adjusting screw sleeve (3249) are respectively screwed with the lower end of the upper adjusting screw rod (3248) and the upper end of the lower adjusting screw rod (32410); the upper end of the upper adjusting screw rod (3248) is hingedly connected with an upper joint (3247) fixed at the lower end of the bellows upper connecting flange (3241), the lower end of the lower adjusting screw rod (32410) is hingedly connected with a lower joint (32411) fixed at the upper end of the bellows lower connecting flange (3246), and the upper adjusting screw rod (3248), the lower adjusting screw rod (32410) and the adjusting screw sleeve (3249) constitute an adjusting assembly, and the adjusting assembly is arranged at one side of the hinged shaft (3244); the cathode support flange pipe (322) is sealingly inserted and assembled with a hole arranged on the upper cover (311), and a limiting nut (323) is fixed above the upper cover (311) on the cathode support flange pipe (322), so that the cathode support flange pipe (322) is limited.

2. The substrate magnetron sputtering coating production equipment according to claim 1, characterized in that: The substrate carrying unit (23) further comprises a first cylindrical flange seat (234), a first shielding cover (232), a first shielding cover support seat (233), a first ceramic circuit breaker (235), a magnetic fluid seal (238), a first hollow rotating shaft (236) and a first rotating mechanism; the upper part of the first cylindrical flange seat (234) is fixedly connected with the bottom surface of the pre-vacuum cavity (21) through screws; the lower end flange of the first shielding cover (232) is fixedly connected with the upper end flange of the first shielding cover support seat (233) through screws; the first ceramic circuit breaker (235) is built in the inner hole of the first shielding cover support seat (233), and the lower end of the first ceramic circuit breaker (235) is fixedly connected with the upper end of the first hollow rotating shaft (236); the lower end of the first temperature control anode head (231) is fixedly connected with the upper end of the first ceramic circuit breaker (235); the first rotating mechanism is located directly below the first cylindrical flange seat (234) and comprises a first transition connecting frame (2310), a first rotating drive motor (2313), a first driving pulley (2312), a first driven pulley (2314) and a first synchronous belt (2311); the first transition connecting frame (2310) is connected below the first cylindrical flange seat (234) through a support column (239), the first rotating drive motor (2313) is installed on the first transition connecting frame (2310), the output end of the first rotating drive motor (2313) is connected with the first driving pulley (2312), and the first driving pulley (2312) is connected with the first driven pulley (2314) fixed on the first hollow rotating shaft (236) through the first synchronous belt (2311); the magnetic fluid seal (238) is fixed at the center position below the first cylindrical flange seat (234), and the first hollow rotating shaft (236) is sealed through the magnetic fluid seal (238).

3. The apparatus of claim 2 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the substrate support is a cylindrical substrate support; and the substrate support is rotatable about an axis of rotation. The first temperature-controlled anode head (231) comprises a first bearing disc (23101), a first cylindrical shell (23105), a first anode head upper flange (23106), a first anode head lower flange (23107), a first heating disc (23102), a first cooling disc (23103), and a first high-temperature insulating block (23104); the first cylindrical shell (23105) is welded to the first bearing disc (23101) at the upper portion and welded to the first anode head upper flange (23106) at the lower portion, and forms an installation cavity inside; the first heating disc (23102), the first cooling disc (23103), and the first high-temperature insulating block (23104) are sequentially arranged in the installation cavity; the first anode head lower flange (23107) is arranged below the first anode head upper flange (23106) and fixedly connected to the first anode head upper flange (23106) through screws; the first anode head lower flange (23107) is fixedly connected to the upper end of the first ceramic circuit breaker (235) through screws; the first heating disc (23102) is uniformly provided with resistance wires, and the first cooling disc (23103) is provided with a cooling water channel; a first insulating sleeve (237) is arranged in the inner hole of the lower portion of the first ceramic circuit breaker (235) and the first hollow rotating shaft (236); the positive electrode lead and the negative electrode lead of the heating wire connected to the first heating disc (23102) are led out from the lower end through the inner cavity of the first insulating sleeve (237); a thermocouple (23108) is further arranged in the first insulating sleeve (237), and the upper end of the thermocouple (23108) extends into the insertion hole arranged at the lower end of the first bearing disc (23101); a first cooling water input pipe (23109) and a first cooling water output pipe (231010) are arranged in the first insulating sleeve (237), and the upper ends of the first cooling water input pipe (23109) and the first cooling water output pipe (231010) are respectively connected to the input interface and the output interface on the first cooling disc (23103); a first anode protection box (2319) is fixed below the first transition connecting frame (2310), the lower portions of the first cooling water input pipe (23109) and the first cooling water output pipe (231010) extend into the first anode protection box (2319), a first conductive slip ring (2317) is arranged in the first anode protection box (2319), the upper end of the first conductive slip ring (2317) is fixed to the first hollow rotating shaft (236) through a first locking sleeve (2316), the lower end of the first conductive slip ring (2317) is connected to a first water rotating joint, the rotating part inside the first water rotating joint is connected to the lower ends of the first cooling water output pipe (231010) and the first cooling water input pipe (23109) to form a water channel, the fixed part outside the first water rotating joint is fixed through a first anti-rotation assembly (2320) fixed in the first anode protection box (2319), and the fixed part outside the first water rotating joint is connected to an external water pipe.The pre-vacuum unit (2) further comprises a first radio frequency unit, the first radio frequency unit comprises a first radio frequency matcher (2321), the first radio frequency matcher (2321) is installed outside the first anode protection box (2319), and an output line of the first radio frequency matcher (2321) is electrically connected with the first cooling water input pipe (23109) and the first cooling water output pipe (231010) through a first power transmission clamp.

4. The apparatus of claim 1 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the substrate support is a cylindrical substrate support; and the substrate support is rotatable about an axis of rotation. The substrate conveying mechanism (22) further comprises a moving assembly (222), a moving drive mechanism (223), and a mechanical gripper opening and closing control mechanism (224); the moving assembly (222) comprises a moving plate (2221), rollers (2222), a front roller support (2223), a rear roller support (2224), and guide light axes (2225); the guide light axes (2225) are two, and the two guide light axes (2225) are fixed on the left and right side walls in the pre-vacuum cavity (21) in parallel from front to back, and the moving plate (2221) is arranged between the two guide light axes (2225); the front and back sides of the moving plate (2221) close to the left end are fixedly connected with the front roller support (2223) and the rear roller support (2224) respectively, and the rollers (2222) are arranged on the front roller support (2223) and the rear roller support (2224) respectively and located at the upper part and the lower part, and are in rolling contact with the upper part and the lower part of the corresponding side guide light axis (2225) respectively, so as to slidably connect the moving plate (2221) to the two guide light axes (2225) in the left and right directions; the mechanical gripper (221) is composed of two gripper pieces, and a mechanical gripper upper support plate and a mechanical gripper lower support plate are fixed on the front and rear parts of the right end of the moving plate (2221), mounting holes are arranged on the mechanical gripper upper support plate and the mechanical gripper lower support plate in a opposite manner, the two gripper pieces are symmetrically arranged at the right end of the moving plate (2221), the left end parts of the two gripper pieces are inserted into the space between the corresponding side mechanical gripper upper support plate and the mechanical gripper lower support plate respectively, a hinge pin is arranged in the mounting hole on the mechanical gripper upper support plate and the mechanical gripper lower support plate and the mounting hole on the gripper piece, and the gripper piece is rotatably mounted on the moving plate (2221); the moving drive mechanism (223) is a linear drive mechanism, and is used for driving the moving plate (2221) to move left and right along the guide light axis (2225); the mechanical gripper opening and closing control mechanism (224) is connected with the two grippers, and is used for realizing the opening and closing control of the mechanical gripper (221).

5. The apparatus of claim 4 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the magnetron is mounted on a rotatable shaft; and the rotatable shaft is mounted on a rotatable shaft support. The moving drive mechanism (223) comprises a moving drive motor (2231) and a ball screw set, the moving drive motor (2231) is installed on the top of the rack (1) and located at the left rear part outside the pre-vacuum cavity (21); the moving drive motor (2231) drives a driving synchronous pulley, and the driving synchronous pulley drives a driven synchronous pulley through a synchronous belt; The rotation axis of the first rotation seal assembly (2232) is connected with one end of the driven synchronous pulley, the other end of the rotation axis of the first rotation seal assembly (2232) is connected with a lead screw (2235) of a ball screw assembly, the lead screw (2235) is supported left and right in the pre-vacuum cavity (21), a nut part (2234) connected with the lead screw (2235) is fixed on a flange connecting part (2233), the flange connecting part (2233) is fixedly connected with the rear roller support (2224), and an encoder (2236) is further installed on the rotor of the movement driving motor (2231).

6. The apparatus of claim 4 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the magnetron is mounted on a rotatable shaft; and the rotatable shaft is mounted on a rotatable shaft support. The mechanical gripper opening and closing control mechanism (224) comprises a mechanical gripper control shaft (2244), a mechanical gripper driving shaft (2242), a thrust nut (2241) and a gripper opening and closing driving cylinder (2246). The gripper opening and closing driving cylinder (2246) is installed on the top of the rack (1) and located at the left front position outside the pre-vacuum cavity (21). The gripper opening and closing driving cylinder (2246) is drivingly connected with the second rotation seal assembly (2245) through a set of transmission gears. The second rotation seal assembly (2245) is drivingly connected with the left end of the mechanical gripper control shaft (2244), and the right end is drivingly connected with the mechanical gripper driving shaft (2242) through a connecting head (2243). The mechanical gripper driving shaft (2242) is rotatably installed below the middle position of the moving plate (2221) through a front end bearing and a rear end bearing seat (3313). The right end of the mechanical gripper control shaft (2244) is provided with an external thread structure and is connected with the thrust nut (2241). The front and rear parts of the thrust nut (2241) are provided with connecting ears. The front and rear connecting ears are hingedly connected with the left end inner side parts of the two gripper pieces through a pin shaft. The hole for the pin shaft arranged on the mechanical gripper (221) is a long circular hole.

7. The apparatus of claim 1 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the substrate support is a cylindrical substrate support; and the substrate support is rotatable about an axis of rotation. The pre-vacuum unit (2) further comprises an ion milling unit (24), which is installed on the top inside the pre-vacuum cavity (21) through a first angle adjuster (25).

8. The apparatus of claim 1 wherein: the substrate is a cylindrical roll of material; the magnetron is a cylindrical magnetron; the substrate support is a cylindrical substrate support; and the substrate support is rotatable about an axis of rotation. The lifting mechanism comprises a lifting drive motor (3318), a worm gear transmission mechanism and an outer threaded sleeve (3311); the outer threaded sleeve (3311) is sleeved on the outside of the second hollow rotating shaft (335), the upper end of the outer threaded sleeve (3311) is fixedly connected with the lower end of the guide plate (339) through an outer flange, and the lower part of the outer threaded sleeve (3311) penetrates through a through hole arranged in the center of the guide rod fixing plate (3312); a bearing mounting hole is arranged in the inner part of the upper end of the outer threaded sleeve (3311), and a second bearing (3310) is mounted in the bearing mounting hole; the second hollow rotating shaft (335) is rotationally supported and matched with the outer threaded sleeve (3311) through the second bearing (3310); the lifting drive motor (3318) is mounted on an upper motor mounting table below the guide rod fixing plate (3312), and the upper motor mounting table is fixedly connected with the guide rod fixing plate (3312); the output end of the lifting drive motor (3318) is drivingly connected with a worm (3316) through a shaft coupling, the worm (3316) is engaged with a worm gear (3317), the worm gear (3317) is fixedly connected with an inner threaded sleeve (3315), the inner threaded sleeve (3315) is engaged with the outer threaded sleeve (3311), a bearing seat (3313) and a double-row bearing (3314) are arranged above the worm gear (3317), the bearing seat (3313) is fixed below the guide rod fixing plate (3312), and the inner threaded sleeve (3315) is rotationally supported and matched with the bearing seat (3313) through the double-row bearing (3314).

9. The apparatus of claim 8 wherein: the substrate is a cylindrical roll of material; the magnetron is mounted on a rotatable arm; and the rotatable arm is mounted on a rotatable shaft. The second rotating mechanism is located directly below the outer threaded sleeve and comprises a second transition connecting frame, a second rotating drive motor (3319), a second driving pulley (3320), a second driven pulley (3321) and a second synchronous belt; the upper end of the second transition connecting frame is fixedly connected with the lower end of the outer threaded sleeve (3311); the second rotating drive motor (3319) is mounted on the second transition connecting frame, and the output end of the second rotating drive motor (3319) is connected with the second driving pulley (3320); the second driving pulley (3320) is connected with the second driven pulley (3321) fixed on the second hollow rotating shaft (335) through the second synchronous belt; a second anode protection box is fixedly arranged at the lower end of the second transition connecting frame, bearing mounting holes are arranged in the bottom surface of the second transition connecting frame and the top surface of the second anode protection box, and a third bearing (3322) is mounted in the bearing mounting holes; the inner ring of the third bearing (3322) is interference-fitted and arranged on the lower part of the second hollow rotating shaft (335), so that the second hollow rotating shaft (335) is supported.

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