Method for polishing scratch-resistant super-hard glass

Abstract

This invention discloses a polishing method for scratch-resistant ultra-hard glass, belonging to the field of polishing technology. The method involves loading the ground scratch-resistant ultra-hard glass into a polishing machine, fixing a polyurethane polishing skin and a Teflon toothed ring; using isohexadecane, methyl oleate, sodium gluconate, and isodecyl alcohol polyoxyethylene ether as a matrix, incorporating composite abrasives to form a highly dispersed and highly active polishing slurry; employing a three-stage decreasing pressure process, with continuous water rinsing during the process, and supplementing with aqueous ultrasonic cleaning after polishing. Compared with existing technologies, this invention is simple, environmentally friendly, and low in toxicity. It can be directly integrated into existing polishing machines, achieving efficient and large-scale production of scratch-free, high-gloss ultra-hard glass surfaces. It is suitable for high-end, batch, scratch-free polishing of wearable and consumer electronics (mobile phones, watches, medical devices, automotive electronic device control panels, etc.).

Description

Technical Field

[0001] This invention relates to the field of polishing technology, and in particular to a method for polishing scratch-resistant, ultra-hard glass. Background Technology

[0002] With the rapid development of consumer electronics products (such as mobile phones, tablets, smartwatches, and automotive electronic devices) and high-end medical devices, the performance requirements for protective glass are becoming increasingly stringent. The protective glass for these devices not only needs high hardness to resist scratches from daily use, but also requires high gloss to ensure optical performance and aesthetics. However, traditional polishing techniques present numerous challenges when processing such ultra-hard glass.

[0003] Chinese patent application CN114806501A discloses a modified diamond powder, its preparation method, its uses, and a polishing fluid containing the same. While modifying diamond powder using steric hindrance can improve its suspension properties, diamond's extremely high hardness makes it prone to generating microcracks on ultra-hard glass surfaces. Furthermore, its oily system has limited applicability to cerium oxide abrasives, requiring additional dispersants to maintain long-term stability.

[0004] Another Chinese patent application, CN119144237A, discloses a modified epoxy-cerium oxide polishing slurry and its preparation method. The slurry uses epoxy carboxylic acid to coat cerium oxide, which extends the slurry life. However, the epoxy shell reduces the exposure of the chemical active centers of cerium oxide, resulting in a limited improvement in the removal rate. Furthermore, the slurry does not show significant effect on scratch inhibition of high-hardness glass.

[0005] In existing technologies, chemical mechanical polishing (CMP) is a commonly used glass polishing method. However, when processing high-hardness glass, it often struggles to simultaneously meet the requirements of high removal rate and low scratches. For example, while traditional cerium oxide abrasives offer some polishing effect, they easily generate microcracks and scratches on high-hardness glass surfaces, affecting the product's appearance and performance. Furthermore, although some modified abrasives improve polishing effects to a certain extent, they often require complex preparation processes and additional equipment modifications, increasing production costs and process complexity.

[0006] Furthermore, existing polishing processes typically require high temperatures or specific chemical environments, which not only increases energy consumption but may also pollute the environment. At the same time, these processes have narrow parameter windows, making seamless integration with existing large-scale production lines difficult and limiting their application in actual production.

[0007] Therefore, developing an efficient, environmentally friendly, and low-scratch ultra-hard glass polishing process has become an urgent problem to be solved in the current technological field. Summary of the Invention

[0008] To address the shortcomings of existing technologies, this invention aims to provide a method for polishing scratch-resistant, ultra-hard glass.

[0009] To achieve the above-mentioned objectives, the present invention adopts the following technical solution:

[0010] A method for polishing scratch-resistant, ultra-hard glass is as follows:

[0011] Step 1: Place the ground, scratch-resistant, ultra-hard glass into the polishing machine and fix the polishing pad and Teflon toothed ring;

[0012] Step 2: Using isohexadecane, methyl oleate, sodium gluconate and isodecyl alcohol polyoxyethylene ether as the matrix, a composite abrasive is added to prepare a polishing slurry;

[0013] Step 3: Inject polishing liquid into the polishing machine and polish, continuously rinsing with water during polishing;

[0014] Step 4: After polishing, ultrasonic treatment with water is performed to obtain scratch-resistant ultra-hard glass.

[0015] The preparation method of the composite abrasive is as follows:

[0016] S1. 3-Aminopropyltrimethoxysilane, anhydride compound and cerium oxide powder are reacted in a mixed solvent containing N,N-dimethylformamide and water. After centrifugation, washing and drying, the carboxylated product is obtained.

[0017] S2. The carboxylation product from step S1 is dispersed in an aqueous solution of zinc chloride. After ultrasonication and water bath stirring, an aqueous solution of imidazole compound is added to continue the reaction. After centrifugation, washing and drying, the composite abrasive is obtained.

[0018] Preferably, the polishing method for the scratch-resistant ultra-hard glass is as follows, in parts by weight:

[0019] Step 1: Select polished, scratch-resistant, ultra-hard glass and attach the polishing skin to the rigid cast iron support plate; select a Teflon gear ring to ensure zero backlash meshing with the inner and outer gear rings of the machine tool;

[0020] Step 2: Mix 60-80 parts of isohexadecane, 5-15 parts of methyl oleate, 0.5-1.5 parts of sodium gluconate, and 1-1.5 parts of isodecyl alcohol polyoxyethylene ether. Stir at 600-1000 rpm for 5-10 minutes at 20-40℃ to obtain the polishing base solution. Add 0.2-0.6 parts of composite abrasive to the polishing base solution and stir at 600-1000 rpm for 20-40 minutes at 20-40℃ to obtain the polishing liquid.

[0021] Step 3: Add the polishing slurry prepared in Step 2. The initial amount of polishing slurry added in the polishing machine covers the surface of the polishing skin to form a uniform liquid film. Replenish 3-5% of the total weight of polishing slurry every 20-40 minutes and polish. Continuously rinse with water during polishing.

[0022] Step 4: After polishing, ultrasonic treatment with water is performed to obtain the scratch-resistant ultra-hard glass.

[0023] The polishing skin in step 1 is at least one of damping cloth and polyurethane.

[0024] The polishing parameters in step 3 are: polishing at 200-300 kg pressure for 1-2 hours, with the upper plate at 5-15 rpm, the lower plate at 15-25 rpm, and the sun gear at 5-15 rpm.

[0025] In step 3, the rinsing rate of the continuous water rinsing during polishing is 50-200 mL / min.

[0026] In step 4, the ultrasonic treatment uses an ultrasonic frequency of 20-60kHz, an ultrasonic power of 200-400W, a water temperature of 40-60℃, and a time of 90-150s.

[0027] The composite abrasive is prepared as follows, in parts by weight:

[0028] S1. Take 8-12 parts of 3-aminopropyltrimethoxysilane and add it to 180-220 parts of N,N-dimethylformamide, add 4-8 parts of acid anhydride compound, stir at room temperature for 1-3 hours to obtain an adduct solution; add 50-90 parts of cerium oxide powder to 160-220 parts of mixed solvent, mix evenly to obtain a suspension; the mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 2-4:1; add the suspension to the adduct solution, stir continuously for 1-5 hours, centrifuge at 3000-6000 rpm for 5-10 min, wash with water and anhydrous ethanol 1-3 times respectively, and dry at 60-80℃ for 2-8 hours to obtain the carboxylated product;

[0029] S2. Take 15-25 parts of the carboxylated product prepared in step S1 and add it to 200-400 parts of 0.1-0.2 mol / L zinc chloride aqueous solution. Sonicate for 10-30 min at an ultrasonic power of 100-300 W and an ultrasonic frequency of 20-60 kHz. Stir in a water bath at 70-80℃ for 10-30 min to disperse the particles evenly. Add 400-800 parts of 0.3-0.4 mol / L imidazole compound aqueous solution and continue stirring for 10-40 min. After stopping, cool to room temperature and centrifuge at 3000-6000 rpm for 5-15 min. Wash with water and anhydrous ethanol 1-3 times respectively. Dry at 60-80℃ for 5-15 hours to obtain the composite abrasive.

[0030] The acid anhydride compound is at least one of succinic anhydride, maleic anhydride, and succinic acid.

[0031] The imidazole compound is at least one of imidazole, 2-ethylimidazole, and 2-aminoimidazole.

[0032] The composite abrasive can also be composed of cerium oxide and praseodymium oxide in a mass ratio of 8-9:1.

[0033] The roles of each substance in the composite abrasive preparation method are as follows:

[0034] 3-Aminopropyltrimethoxysilane, used as a silane coupling agent, undergoes a ring-opening reaction between its amino group (-NH2) and maleic anhydride, anchoring the carboxyl group (-COOH) to the cerium oxide surface, thus facilitating subsequent Zn production. 2+ Coordination provides the site.

[0035] Maleic anhydride reacts with the amino group of silane to open the ring and generate a carboxyl group, increasing the carboxyl group density on the cerium oxide surface and enhancing its affinity for Zn. 2+ The ability to combine.

[0036] Cerium oxide powder, used as the abrasive core, provides hardness and chemical activity; its surface contains Ce. 3+ / Ce 4+ Redox activity promotes the breaking of Si-O bonds in glass.

[0037] N,N-Dimethylformamide, as a polar solvent, dissolves silane and maleic anhydride to form a homogeneous reaction system, ensuring uniform dispersion of cerium oxide.

[0038] Zinc chloride provides Zn 2+ Ions coordinate with carboxyl groups on the surface of cerium oxide to form initial complexes, promoting self-assembly to form composite abrasives.

[0039] 2-Ethylimidazole, as an organic ligand, has an imidazole ring that interacts with Zn. 2+ Coordination constructs a porous shell; the steric hindrance of the ethyl chain enhances coordination stability, and hydrophobicity optimizes the dispersion of the abrasive in oily base fluids.

[0040] Compared with existing technologies, it has the following advantages:

[0041] 1) This invention accelerates the polishing speed by optimizing the composite abrasive structure, achieving synergistic optimization of high removal rate and ultra-low roughness, and completely eliminating microcracks and scratches caused by traditional processes.

[0042] 2) The polishing method of the present invention is simple and easy to implement, highly compatible with existing production lines, and does not require large-scale modification of existing equipment, thereby reducing production costs and improving production efficiency. It is suitable for mass polishing of wearable and consumer electronics (mobile phones, watches, medical devices, vehicle electronic control panels, etc.).

[0043] 3) The raw materials and processes used in this invention are more environmentally friendly, reducing the impact on the environment and also benefiting the health and safety of operators. Detailed Implementation

[0044] Main source of materials:

[0045] Scratch-resistant ultra-hard glass, silicon 40-50%, aluminum 25-35%, zinc 7-13%, crystal phase: zinc spinel, Mohs 7-8.5, crystallinity: 30%.

[0046] Isomeric deca-ol polyoxyethylene ether, model: E-1006, Jiangsu Haian Petrochemical Plant.

[0047] Polished leather, surface material: polyurethane, Dongguan Xinaozhong Abrasive Technology Co., Ltd.

[0048] Cerium oxide powder, average particle size 40nm, model: HC-12, Guangdong Hongcai Nanomaterials Technology Co., Ltd.

[0049] Praseodymium oxide, average particle size 40nm, catalog number: NO-R-007-1, Shanghai Naio Nanotechnology Co., Ltd.

[0050] All other raw materials used in the embodiments and comparative examples of this invention are commercially available products.

[0051] Example 1

[0052] A method for polishing scratch-resistant, ultra-hard glass is as follows, in parts by weight:

[0053] Step 1: Select scratch-resistant ultra-hard glass that has been ground with 3000# abrasive, with a diameter of 44.2mm and a thickness of 2.02mm, and no chipping or cracks on the surface; attach the polishing sheet to the rigid cast iron support plate; select a φ44.6mm×1.5mm Teflon gear ring, 46 holes / sheet; tooth pitch 4.00mm±0.02mm, tooth profile angle 60°, to ensure zero backlash meshing with the inner and outer gear rings of the machine;

[0054] Step 2: Mix 70 parts of isohexadecane, 10 parts of methyl oleate, 1 part of sodium gluconate, and 1.2 parts of isodecyl alcohol polyoxyethylene ether, and stir at 800 rpm for 8 minutes at 30°C to obtain the polishing base liquid; add 0.4 parts of composite abrasive to the polishing base liquid, and stir at 800 rpm for 30 minutes at 30°C to obtain the polishing liquid.

[0055] Step 3: Add the polishing slurry prepared in Step 2. The initial amount of polishing slurry added in the polishing machine covers the surface of the polishing pad and forms a uniform liquid film. Replenish 4% of the total weight of polishing slurry every 30 minutes, and then polish. The polishing parameters are: polishing at 250 kg pressure for 1.5 hours, upper plate 10 rpm / lower plate 20 rpm / sun wheel 10 rpm; continuous water rinsing at 100 mL / min during polishing.

[0056] Step 4: After polishing, use water for ultrasonic treatment at a frequency of 40kHz, a power of 300W, a water temperature of 50℃, and a time of 120s to obtain the scratch-resistant ultra-hard glass.

[0057] The composite abrasive is composed of cerium oxide and praseodymium oxide in a mass ratio of 8.5:1.

[0058] Example 2

[0059] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0060] The composite abrasive is prepared by the following method, in parts by weight:

[0061] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of maleic anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0062] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13 mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200 W and an ultrasonic frequency of 40 kHz. Stir in a water bath at 75 ℃ for 20 min to disperse the particles evenly. Add 600 parts of 0.35 mol / L 2-ethylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000 rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70 ℃ for 10 hours to obtain composite abrasive.

[0063] Example 3

[0064] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0065] The preparation method of the composite abrasive is as follows:

[0066] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of succinic acid and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0067] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13 mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200 W and an ultrasonic frequency of 40 kHz. Stir in a water bath at 75 ℃ for 20 min to disperse the particles evenly. Add 600 parts of 0.35 mol / L 2-ethylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000 rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70 ℃ for 10 hours to obtain composite abrasive.

[0068] Example 4

[0069] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0070] The preparation method of the composite abrasive is as follows:

[0071] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide, add 6 parts of succinic anhydride, stir at room temperature for 2 hours to obtain an adduct solution; add 70 parts of cerium oxide powder to 180 parts of mixed solvent, mix evenly to obtain a suspension; the mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1; add the suspension to the adduct solution, stir continuously for 4 hours, centrifuge at 4000 rpm for 8 minutes, wash once with water and once with anhydrous ethanol, and dry at 70°C for 5 hours to obtain the carboxylated product;

[0072] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13 mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200 W and an ultrasonic frequency of 40 kHz. Stir in a water bath at 75 ℃ for 20 min to disperse the particles evenly. Add 600 parts of 0.35 mol / L 2-ethylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000 rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70 ℃ for 10 hours to obtain composite abrasive.

[0073] Example 5

[0074] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0075] The preparation method of the composite abrasive is as follows:

[0076] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of maleic anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0077] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200W and an ultrasonic frequency of 40kHz. Stir in a water bath at 75℃ for 20 min to make the particles uniformly dispersed. Add 600 parts of 0.35mol / L 2-aminoimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70℃ for 10 hours to obtain composite abrasive.

[0078] Example 6

[0079] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0080] The preparation method of the composite abrasive is as follows:

[0081] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of maleic anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0082] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200W and an ultrasonic frequency of 40kHz. Stir in a 75℃ water bath for 20 min to disperse the particles evenly. Add 600 parts of 0.35mol / L imidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70℃ for 10 hours to obtain the composite abrasive.

[0083] Comparative Example 1

[0084] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0085] The preparation method of the composite abrasive is as follows:

[0086] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of glutaric anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0087] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13 mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200 W and an ultrasonic frequency of 40 kHz. Stir in a water bath at 75 ℃ for 20 min to disperse the particles evenly. Add 600 parts of 0.35 mol / L 2-ethylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000 rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70 ℃ for 10 hours to obtain composite abrasive.

[0088] Comparative Example 2

[0089] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0090] The preparation method of the composite abrasive is as follows:

[0091] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of maleic anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0092] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200W and an ultrasonic frequency of 40kHz. Stir in a water bath at 75℃ for 20 min to make the particles uniformly dispersed. Add 600 parts of 0.35mol / L 2-methylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70℃ for 10 hours to obtain composite abrasive.

[0093] Comparative Example 3

[0094] A method for polishing scratch-resistant ultra-hard glass is basically the same as that in Example 1, except that the preparation method of the composite abrasive is different.

[0095] The preparation method of the composite abrasive is as follows:

[0096] S1. Take 10 parts of 3-aminopropyltrimethoxysilane and add it to 200 parts of N,N-dimethylformamide. Add 6 parts of glutaric anhydride and stir at room temperature for 2 hours to obtain an adduct solution. Add 70 parts of cerium oxide powder to 180 parts of a mixed solvent and mix evenly to obtain a suspension. The mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 3:1. Add the suspension to the adduct solution and stir continuously for 4 hours. Centrifuge at 4000 rpm for 8 minutes. Wash once with water and once with anhydrous ethanol. Dry at 70°C for 5 hours to obtain the carboxylated product.

[0097] S2. Take 20 parts of the carboxylated product prepared in step S1 and add it to 300 parts of 0.13mol / L zinc chloride aqueous solution. Sonicate for 20 min at an ultrasonic power of 200W and an ultrasonic frequency of 40kHz. Stir in a water bath at 75℃ for 20 min to make the particles uniformly dispersed. Add 600 parts of 0.35mol / L 2-methylimidazole aqueous solution and continue stirring for 30 min. After stopping, cool to room temperature and centrifuge at 4000rpm for 10 min. Wash once with water and once with anhydrous ethanol. Dry at 70℃ for 10 hours to obtain composite abrasive.

[0098] Comparative Example 4

[0099] A method for polishing scratch-resistant, ultra-hard glass is basically the same as in Example 1, except that the composite abrasive is replaced with an equal amount of cerium oxide powder.

[0100] Test Example 1

[0101] Roughness measurement:

[0102] The roughness of the scratch-resistant ultrahard glass prepared in the embodiments and comparative examples of this invention was measured using the ICON atomic force microscope from Bruker Corporation, USA. Five-point testing was conducted, with each test area having an area of ​​0.1 μm × 0.1 μm.

[0103] The test results are shown in Table 1.

[0104] Table 1

[0105] Experimental protocol Roughness Ra (nm) Example 1 0.51 Example 2 0.24 Example 3 0.41 Example 4 0.29 Example 5 0.33 Example 6 0.37 Comparative Example 1 0.35 Comparative Example 2 0.31 Comparative Example 3 0.38 Comparative Example 4 0.58

[0106] Test Example 2

[0107] The polishing rate was calculated by measuring the thickness difference of the scratch-resistant ultra-hard glass prepared in the embodiments and comparative examples of the present invention using a thickness gauge. The polishing rate was obtained by dividing the thickness difference measured before and after polishing by the polishing time. Each group was tested three times, and the average value was calculated to obtain the average polishing rate.

[0108] The test results are shown in Table 2.

[0109] Table 2

[0110]

[0111]

[0112] Using the same 2-ethylimidazole, Example 2 selected maleic anhydride as the carboxylating agent. Maleic anhydride contains a rigid double bond, and the amino group of 3-aminopropyltrimethoxysilane acts as a nucleophile, attacking the five-membered anhydride group of maleic anhydride. Through amide bond condensation, a high-density cross-linked network is formed. Maleic anhydride can rapidly form a five-membered cyclic intermediate with 3-aminopropyltrimethoxysilane, thereby generating a higher density of carboxyl anchors on the cerium oxide surface. These high-density carboxyl groups not only provide more Zn... 2+ The coordination sites make the nucleation of composite abrasives more uniform and thinner, and effectively prevent the agglomeration of cerium oxide powder, improve dispersibility and exposure, thereby achieving higher removal rate and lower surface roughness under the synergistic effect of mechanochemical reaction. However, due to differences in chain length or ring tension, succinic anhydride, glutaric anhydride, or succinic anhydride result in lower carboxyl density, relatively thicker and more uneven composite abrasive layers, leading to a decrease in polishing performance.

[0113] The ethyl chain of 2-ethylimidazole provides a moderate hydrophobic-hydrophilic balance in oily base fluids, resulting in high abrasive dispersion and inhibiting agglomeration. This not only reduces the risk of scratches caused by agglomeration but also enhances the wettability of the polishing slurry on the glass substrate by reducing the contact angle, thereby expanding the effective contact area. The steric hindrance effect of the ethyl chain allows Zn... 2+ The coordination bond with the imidazole ring is more stable, thereby achieving the effects of improved removal rate and optimized surface quality. However, insufficient steric hindrance of 2-methylimidazolium, excessive basicity of 2-aminoimidazolium, or loose coordination of unsubstituted imidazolium makes it difficult to achieve this effect.

Claims

1. A method for polishing scratch-resistant, ultra-hard glass, characterized in that, The method is as follows: Step 1: Place the ground, scratch-resistant, ultra-hard glass into the polishing machine and fix the polishing pad and Teflon toothed ring; Step 2: Using isohexadecane, methyl oleate, sodium gluconate and isodecyl alcohol polyoxyethylene ether as the matrix, a composite abrasive is added to prepare a polishing slurry; Step 3: Inject polishing liquid into the polishing machine and polish, continuously rinsing with water during polishing; Step 4: After polishing, ultrasonic treatment with water is performed to obtain scratch-resistant ultra-hard glass; The composite abrasive is prepared by the following method, in parts by weight: S1. Take 8-12 parts of 3-aminopropyltrimethoxysilane and add it to 180-220 parts of N,N-dimethylformamide, add 4-8 parts of acid anhydride compound, stir at room temperature for 1-3 hours to obtain an adduct solution; add 50-90 parts of cerium oxide powder to 160-220 parts of mixed solvent, mix evenly to obtain a suspension; the mixed solvent is composed of N,N-dimethylformamide and water in a volume ratio of 2-4:1; add the suspension to the adduct solution, stir continuously for 1-5 hours, centrifuge at 3000-6000 rpm for 5-10 min, wash with water and anhydrous ethanol 1-3 times respectively, and dry at 60-80℃ for 2-8 hours to obtain the carboxylated product; S2. Take 15-25 parts of the carboxylated product prepared in step S1 and add it to 200-400 parts of 0.1-0.2 mol / L zinc chloride aqueous solution. Sonicate for 10-30 min at an ultrasonic power of 100-300 W and an ultrasonic frequency of 20-60 kHz. Stir in a water bath at 70-80℃ for 10-30 min to disperse the particles evenly. Add 400-800 parts of 0.3-0.4 mol / L imidazole compound aqueous solution and continue stirring for 10-40 min. After stopping, cool to room temperature and centrifuge at 3000-6000 rpm for 5-15 min. Wash with water and anhydrous ethanol 1-3 times respectively. Dry at 60-80℃ for 5-15 hours to obtain the composite abrasive. The acid anhydride compound is maleic anhydride; The imidazole compound is 2-ethylimidazole.

2. The processing method for polishing scratch-resistant ultra-hard glass as described in claim 1, characterized in that, The method is as follows, by weight: Step 1: Select polished, scratch-resistant, ultra-hard glass and attach the polishing skin to the rigid cast iron support plate; select a Teflon gear ring to ensure zero backlash meshing with the inner and outer gear rings of the machine tool; Step 2: Mix 60-80 parts of isohexadecane, 5-15 parts of methyl oleate, 0.5-1.5 parts of sodium gluconate, and 1-1.5 parts of isodecyl alcohol polyoxyethylene ether. Stir at 600-1000 rpm for 5-10 minutes at 20-40℃ to obtain the polishing base solution. Add 0.2-0.6 parts of composite abrasive to the polishing base solution and stir at 600-1000 rpm for 20-40 minutes at 20-40℃ to obtain the polishing liquid. Step 3: Add the polishing slurry prepared in Step 2. The initial amount of polishing slurry added in the polishing machine covers the surface of the polishing skin to form a uniform liquid film. Replenish 3-5% of the total weight of polishing slurry every 20-40 minutes and polish. Continuously rinse with water during polishing. Step 4: After polishing, ultrasonic treatment with water is performed to obtain the scratch-resistant ultra-hard glass.

3. The processing method for polishing scratch-resistant ultra-hard glass as described in claim 1, characterized in that, The polishing parameters in step 3 are: polishing at 200-300 kg pressure for 1-2 hours, with the upper plate at 5-15 rpm, the lower plate at 15-25 rpm, and the sun gear at 5-15 rpm.

4. The processing method for polishing scratch-resistant ultra-hard glass as described in claim 1, characterized in that, In step 3, the rinsing rate of the continuous water rinsing during polishing is 50-200 mL / min.

5. The processing method for polishing scratch-resistant ultra-hard glass as described in claim 1, characterized in that, In step 4, the ultrasonic treatment uses an ultrasonic frequency of 20-60kHz, an ultrasonic power of 200-400W, a water temperature of 40-60℃, and a time of 90-150s.

6. A scratch-resistant, ultra-hard glass, characterized in that, It is prepared by the processing method described in any one of claims 1-5.

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