Photocatalytic member, purification treatment device, and method for manufacturing photocatalytic member

Abstract

The present application provides a kind of photocatalytic component, purification treatment device and the manufacturing method of photocatalytic component, photocatalytic component has at least one photocatalytic component, each photocatalytic component has metal core, the layer structure body of oxide of same metal, also has the photocatalytic material of covering layer structure body or the photocatalytic activity of layer structure body itself can be photocatalytic material, layer structure body is distributed with multiple regular fine holes, when metal oxide itself has photocatalytic activity, the surface area of metal oxide can be increased by fine hole;When photocatalyst is formed by coating photocatalyst to form photocatalytic material, since photocatalyst is also arranged in multiple regular fine holes, not only the amount and surface area of photocatalyst can be increased, but also the distribution of photocatalyst can be more uniform, so as to improve the photocatalytic effect, obtain better purification treatment performance, and the photocatalyst formed in fine hole is difficult to peel off due to anchoring effect etc., can increase the adhesion of photocatalyst.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of photocatalysis, and particularly relates to a photocatalytic component, a purification treatment device and a manufacturing method of the photocatalytic component. BACKGROUND

[0002] In recent years, the application range of photocatalysis technology is continuously expanding. Since photocatalysis has multiple properties such as antibacterial, antiviral, antifouling, antifogging, deodorization, air purification and water purification, it has attracted more and more attention, and photocatalytic products have been increasingly applied in daily life.

[0003] At present, photocatalysis technology is applied to various products, especially photocatalytic filter screens for treating air and water are made by using the technology. The photocatalytic filter screen has holes for flowing air or water, and is easy to be processed into a required shape, and can have the multiple purification treatment properties. At present, the demand for the photocatalytic filter screen is very strong.

[0004] In the prior art, there are methods for preparing such photocatalytic filter screens. For example, Japanese Patent Application Publication No. 2010-58004 discloses a photocatalytic filter screen which is easy to be processed into a required size and shape. In the scheme, a photocatalyst coating is compounded on a metal fine wire braid to form a photocatalytic filter screen. However, since the photocatalyst is only attached to the surface of the metal fine wire braid or the like, the attachment of a sufficient amount of photocatalyst is limited by the surface area of the braid, and thus the finished filter screen cannot fully exert the photocatalytic function. In addition, it is necessary for the photocatalyst to be difficult to peel off or fall off, otherwise problems such as photocatalytic performance degradation and uneven purification treatment effect will occur with the peeling of the photocatalyst, and thus the actual use requirements cannot be met. In the scheme, since the photocatalyst is only attached to the surface of the metal fine wire braid, the peeling prevention performance is also insufficient. SUMMARY

[0005] The present application is made to solve the above problems, and aims to provide a photocatalytic component capable of increasing the surface area of a photocatalyst and making the photocatalyst difficult to peel off, a corresponding manufacturing method and applications thereof. The present application adopts the following technical scheme:

[0006] The present application provides a photocatalytic component, which has the following technical features. The photocatalytic component comprises at least one photocatalytic member, wherein each photocatalytic member comprises a core body composed of a metal, a layer structure body formed of an oxide of the metal and covering the core body, and a photocatalyst covering the layer structure body, and the layer structure body is distributed with a plurality of regular fine pores.

[0007] The photocatalytic component provided by the application can further have the technical features that the fine holes include a main hole part in the shape of a strip, and a plurality of auxiliary hole parts distributed on the side wall surface and the bottom surface of the main hole part and respectively communicating with the main hole part, and the hole diameter and hole depth of the auxiliary hole part are respectively smaller than the hole diameter and hole depth of the main hole part.

[0008] The photocatalytic component provided by the application can further have the technical features that the photocatalytic component further includes a passivation layer composed of an oxide of the metal insoluble in an acidic solution and covering the surface of the core body.

[0009] The photocatalytic component provided by the application can further have the technical features that the photocatalytic component is in the shape of a fine line or a thin plate, and a plurality of the photocatalytic components are interlaced to form a woven fabric or a non-woven fabric.

[0010] The photocatalytic component provided by the application can further have the technical features that when the photocatalytic component is in the shape of a fine line, the line diameter is 1 μm to 5 mm.

[0011] The photocatalytic component provided by the application can further have the technical features that the metal is aluminum, titanium, tungsten, copper, vanadium, niobium or an alloy thereof or stainless steel.

[0012] The photocatalytic component provided by the application can further have the technical features that the surface of the layer structure body includes the inner wall surface of a plurality of the fine holes, and the photocatalytic material is in the shape of a layer and covers the surface of the layer structure body.

[0013] The photocatalytic component provided by the application can further have the technical features that the photocatalytic material covers the surface of the layer structure body and is filled in the fine holes.

[0014] The photocatalytic component provided by the application can further have the technical features that the metal is titanium, the layer structure body and the photocatalytic material are integrally formed, and are titanium dioxide.

[0015] The photocatalytic component provided by the application can further have the technical features that the average hole diameter of the fine holes is 5 nm to 1000 nm.

[0016] The photocatalytic component provided by the application can further have the technical features that the average hole diameter of the fine holes is 20 nm to 500 nm.

[0017] The photocatalytic component provided by the application can further have the technical features that the relative standard deviation of the hole diameter distribution of the fine holes is less than or equal to 40%.

[0018] The photocatalytic component provided by the application can also have the technical feature that the relative standard deviation of the pore size distribution of the fine pores is less than or equal to 20%.

[0019] The photocatalytic component provided by the application can also have the technical feature that the porosity of the fine pores is 10% to 90%.

[0020] The photocatalytic component provided by the application can also have the technical feature that the light absorption rate of the photocatalytic component is 5% to 100%.

[0021] The photocatalytic component provided by the application can also have the technical feature that the thickness of the layer structure is 40 nm to 1000 nm.

[0022] The application provides a purification treatment device, which has the technical feature that the purification treatment device comprises any of the photocatalytic components described above.

[0023] The purification treatment device provided by the application can also have the technical feature that the device further comprises a light source for irradiating the photocatalytic component to cause a photocatalytic reaction.

[0024] The purification treatment device provided by the application can also have the technical feature that the photocatalytic component is multiple, and the light source is arranged between the multiple photocatalytic components.

[0025] The application provides a manufacturing method of a photocatalytic component comprising at least one photocatalytic member, which has the technical feature that the manufacturing method comprises: a base member preparation step of preparing a metal base member; and a photocatalytic imparting step of forming, by anodizing the base member, an anodized layer of the metal having multiple regular fine pores as a layer structure, and forming a photocatalytic substance covering the layer structure.

[0026] The manufacturing method provided by the application can also have the technical feature that the photocatalytic imparting step comprises: a layer structure forming step of forming, by anodizing a metal base member, an anodized layer of the metal having multiple regular fine pores as a layer structure, and forming a core covered by the layer structure; and a photocatalytic substance forming step of disposing a photocatalyst on the layer structure to form a photocatalytic substance covering the layer structure and filled in the fine pores.

[0027] The manufacturing method provided by the application can also have the technical feature that, in the base member preparation step, one or more metal fine wires or metal thin plates are prepared as the base member, wherein the metal is aluminum, titanium, tungsten, copper, vanadium, niobium, or an alloy or stainless steel thereof.

[0028] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0029] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0030] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0031] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0032] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0033] The manufacturing method according to the present application can further include the step of forming the photocatalyst on the layer structure by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method, or an atomic layer deposition method.

[0034] The manufacturing method according to the present applicationapplicationfurther include the technical feature that the surface preparation sub-processapplicationinclude: forming an anodized film having a plurality of holes as an intermediate structure by anodizing the base member one or more times, and forming an intermediate core covered by the intermediate structure, the surface of the intermediate core contacting the intermediate structure having a plurality of recesses; and removing the intermediate structure by an acidic solution to obtain the intermediate core having a plurality of recesses as the base member having a plurality of recesses.

[0035] The manufacturing method according to the present applicationapplicationfurther include the technical feature that the acidic solution contains chromic acid, and in the surface preparation sub-process, a passivation layer is formed on the surface of the base member having a plurality of recesses after the intermediate structure is removed by the acidic solution.

[0036] The manufacturing method according to the present applicationapplicationfurther include the technical feature that the anodizing conditionsapplicationinclude: the formation solution contains oxalic acid, the formation voltage is 30 V to 80 V, and the formation time is 5 minutes to 60 minutes.

[0037] The manufacturing method according to the present applicationapplicationfurther include the technical feature that the plurality of base members are a woven fabric or a non-woven fabric composed of a plurality of metal fine wires, the anodizingapplicationbe performed by a partial conduction method when the base member is the woven fabric, and the anodizingapplicationbe performed under a condition in which the base member is compressed by applying pressure to the base member when the base member is the non-woven fabric.

[0038] The manufacturing method according to the present applicationapplicationfurther include the technical feature that in the base member preparation process, one or more metal fine wires are prepared as the base member by a drawing method, a melt spinning method, a coil cutting method, or a vibration cutting method.

[0039] According to the photocatalytic component, the purification treatment device and the manufacturing method of the photocatalytic component provided by the present application, the photocatalytic component has at least one photocatalytic member, each photocatalytic member has a metal core, a layer structure of the same metal oxide and a photocatalytic substance covering the layer structure, so that the photocatalytic function can be realized. In addition, the layer structure is provided with a plurality of regular pores, so that when the metal oxide itself has photocatalytic activity, the surface area of the metal oxide can be increased through the pores, so as to expand the area of the photocatalytic function, and thus the purification treatment performance can be improved. When the photocatalytic substance is formed by coating the photocatalytic agent on the layer structure, the photocatalytic agent is also arranged in the plurality of regular pores, so that the amount and the surface area of the photocatalytic agent can be increased, and the photocatalytic agent can be more uniformly distributed, so as to improve the photocatalytic effect and the purification treatment performance. In addition, the photocatalytic agent formed in the pores is difficult to peel off due to the anchoring effect, so as to increase the adhesion of the photocatalytic agent and make it more difficult to peel off, so that the decrease of the photocatalytic ability can be inhibited in the long-term use. BRIEF DESCRIPTION OF DRAWINGS

[0040] Figure 1 is a structural schematic diagram of the photocatalytic member in the first embodiment of the present application.

[0041] Figure 2 is Figure 1 is an enlarged structural schematic diagram of the inner part of the frame A.

[0042] Figure 3 is a structural schematic diagram of the air purification treatment device in the first embodiment of the present application.

[0043] Figure 4 is a structural schematic diagram of the liquid purification treatment device in the first embodiment of the present application.

[0044] Figure 5 is a configuration schematic diagram of the light source in the purification treatment device in the first embodiment of the present application.

[0045] Figure 6 is a flow chart of the manufacturing method of the photocatalytic component in the first embodiment of the present application.

[0046] Figure 7 is a structural schematic diagram in the manufacturing process of the photocatalytic component in the first embodiment of the present application.

[0047] Figure 8 is a flow chart of the layer structure forming process in the first embodiment of the present application.

[0048] Figure 9 is a schematic diagram when the base member is anodized in the first embodiment of the present application.

[0049] Figure 10is a scanning electron microscope image of the aluminum braid before and after anodization in Example 1 of the present invention.

[0050] Figure 11 is a scanning electron microscope image of the aluminum braid before and after aperture expansion in Example 1 of the present invention.

[0051] Figure 12 is a schematic diagram of the deposition of a photocatalyst by electrodeposition in Example 1 of the present invention.

[0052] Figure 13 is a performance comparison chart of the photocatalytic filter mesh of Example 1 of the present invention and other company products.

[0053] Figure 14 is a concentration change schematic diagram of the photocatalytic decomposition treatment of bisphenol A in Example 1 of the present invention.

[0054] Figure 15 is a scanning electron microscope image of the stainless steel braid after anodization in Example 5 of the present invention.

[0055] Figure 16 is a schematic diagram of the structure in the purification treatment device in Example 7 of the present invention.

[0056] Figure 17 is a schematic diagram of the configuration of the light source in the purification treatment device in Example 7 of the present invention.

[0057] Figure 18 is a flowchart of the layer structure forming step in Example 11 of the present invention.

[0058] Figure 19 is a schematic diagram of the structure in the layer structure forming step in Example 11 of the present invention.

[0059] Figure 20 is a scanning electron microscope image in the photocatalytic member manufacturing process in Example 11 of the present invention.

[0060] Figure 21 is a scanning electron microscope image in the photocatalytic member manufacturing process in Example 12 of the present invention.

[0061] Figure 22 is a flowchart of the layer structure forming step in Example 13 of the present invention.

[0062] Figure 23 is a schematic diagram of the structure in the layer structure forming step in Example 13 of the present invention.

[0063] Figure 24 is a cross-sectional view of the photocatalytic member in Example 14 of the present invention.

[0064] Figure 25is a structural schematic diagram in the layer structure forming process in Embodiment 14 of the present application.

[0065] Figure 26 is a cross-sectional view of the photocatalytic member in Embodiment 15 of the present application.

[0066] Figure 27 is a cross-sectional view of the photocatalytic member in Embodiment 16 of the present application.

[0067] Figure 28 is a flowchart of the manufacturing method of the photocatalytic member in Embodiment 16 of the present application.

[0068] Figure 29 is a scanning electron microscope image of the titanium braid after anodization in Embodiment 16 of the present application.

[0069] Figure 30 is a scanning electron microscope image of the titanium braid after anodization in Embodiment 17 of the present application.

[0070] Reference Signs:

[0071] Purification treatment device 1000; photocatalytic member 100; photocatalytic member 10; core 11; layer structure 12; barrier layer 121; protruding portion 122; fine hole 123; main hole portion 1231; sub-hole portion 1232; photocatalytic substance 13; fine hole 131; passivation layer 14; light source 200; fan 300; passage 400; base member 21; intermediate structure 22; first oxide layer 22a; second oxide layer 22b; third oxide layer 22c; hole portion 221; intermediate core 23; first intermediate core 23a; second intermediate core 23b; third intermediate core 23c; recess 231; counter electrode 30; formation tank 40; electrolyte 50. DETAILED DESCRIPTION

[0072] In order to make the technical means, creative features, purposes and effects of the present application easy to understand, the photocatalytic member, purification treatment device and manufacturing method of the photocatalytic member of the present application are specifically described below in combination with embodiments and drawings.

[0073] Embodiment 1

[0074] <Configuration of photocatalytic member>

[0075] The present embodiment provides a photocatalytic member, which comprises one or more photocatalytic members.

[0076] Figure 1 is a cross-sectional schematic diagram of the photocatalytic member in the present embodiment, which is mainly used to illustrate the overall hierarchical structure in the photocatalytic member, and the specific structure of the layer structure and the photocatalytic substance are not shown.

[0077] AsFigure 1 As shown, the photocatalytic component 100 may include a single thin-line or elongated thin plate photocatalytic component 10, or multiple thin-line or elongated thin plate photocatalytic components 10.

[0078] When multiple photocatalytic components 10 are included, these photocatalytic components 10 can be arranged regularly or irregularly. Preferably, the multiple fine-wire photocatalytic components 10 interweave to form a woven fabric or non-woven fabric. The woven fabric refers to the multiple photocatalytic components 10 being woven together, also known as a mesh; the non-woven fabric refers to the multiple photocatalytic components 10 not being woven into a structure. More preferably, the multiple fine-wire photocatalytic components 10 form a woven fabric. Preferably, the multiple long, thin, plate-like photocatalytic components 10 interweave to form a mesh.

[0079] Figure 2 yes Figure 1 Enlarged structural diagram of the inner part of the middle frame A.

[0080] like Figure 2 As shown, each photocatalytic component 10 includes a core 11, a layered structure 12, and a photocatalyst 13.

[0081] The core 11 is in the form of a thin wire and is made of metal. The metal material can be selected as needed, such as aluminum, titanium, tungsten, iron, niobium, tantalum, vanadium, magnesium, copper, alloys of the above metals, and stainless steel. Aluminum, titanium, tungsten, copper, vanadium, niobium, or their alloys or stainless steel are particularly preferred, and aluminum, titanium, and tungsten are even more preferred. These materials have advantages in terms of manufacturing, acquisition, and cost of photocatalytic components. The wire diameter of the core 11 can be selected as needed, preferably 1 μm to 5 mm.

[0082] A layered structure 12 covers the core 11 and is composed of an oxide of the same metal as the core 11. The layered structure 12 includes a barrier layer 121 and a protrusion 122 protruding outward from one surface of the barrier layer 121, wherein the protrusion 122 is a thin layer with a porous structure. A plurality of fine pores 123 are distributed in the protrusion 122.

[0083] The barrier layer 121 is layered and covers the outer surface of the core 11. The barrier layer 121 has an uneven shape, and multiple recesses are formed on the surface of the core 11 that contacts the barrier layer 121.

[0084] Each micro-hole 123 is a long, straight hole, such as a roughly long, cylindrical hole, with one end being the bottom and the other end being an opening. The bottom of the hole can be arc-shaped or concave arc-shaped. In addition, the shape of the micro-hole 123 can also be crater-shaped, etc. In this embodiment, the bottom of the micro-hole 123 is concave arc-shaped.

[0085] In this embodiment, the layer structure 12 has a plurality of regular fine holes 123, "regular" specifically means that the pore size distribution of the plurality of fine holes 123 is relatively uniform, specifically, the relative standard deviation of the pore size distribution of the plurality of fine holes 123 is less than 40%, more preferably less than 20%, and further more preferably less than 10%, in this case, the fine holes are more uniform, and therefore the photocatalyst can be formed more uniformly.

[0086] The thickness of the layer structure 12 is not particularly limited, but is preferably 40 nm to 1000 nm, in this case, the pore depth of the fine holes 123 can be increased, and the pore depth of the fine holes 123 can be selected as needed, for example, 300 nm, 700 nm, etc. The opening rate of the layer structure 12 is not particularly limited, but is preferably 20% to 80%.

[0087] The average pore size (also referred to as average fine pore size) of the plurality of fine holes 123 is preferably 5 nm to 2000 nm, more preferably 5 nm to 1000 nm, and further more preferably 20 nm to 500 nm. The center-to-center distance (period) of the plurality of fine holes 123 in the circumferential direction of the photocatalytic member 10 is about 100 nm. The porosity of the fine holes 123 is not particularly limited, but is preferably 10% to 90%.

[0088] Among the above dimensions, the porosity of the photocatalytic member 100 can be determined by obtaining an image (SEM image) using an electron microscope. In addition, it can also be calculated by the wire diameter and filling rate of a metal fine wire, or by the true density and apparent density. The opening rate of the layer structure 12 can also be measured by obtaining an SEM image and using image analysis software, it should be noted that the opening rate of the layer structure 12 should be measured before the photocatalytic material 13 is formed. Although the opening rate of the fine holes of the metal oxide layer can not change or change little after the photocatalytic material is formed, from the perspective of convenience of measurement, it is recommended to measure before the photocatalytic material is formed. In addition, the thickness of the layer structure 12 (metal oxide layer), the relative standard deviation of the pore size distribution of the fine holes can also be measured in the same way.

[0089] The photocatalytic material 13 is covered on the layer structure 12, and has photocatalytic activity, and can realize functions such as antibacterial, antiviral, antifouling, antifogging, deodorization, air purification, and water purification under irradiation of a corresponding light source.

[0090] The specific formation position of the photocatalytic substance 13 can be selected as desired. For example, the photocatalytic substance 13 can be in a layer shape, formed along the surface of the layer structure 12 having a plurality of fine holes 123, that is, covering the inner wall surface of the plurality of fine holes 123, and can fill part or all of the space inside the fine holes 123; or, the photocatalytic substance 13 can be in a block shape, located at the bottom of the plurality of fine holes 123; or, the photocatalytic substance 13 can be in a combination of a layer shape and a block shape, that is, covering the surface of the layer structure 12 and filled in each of the plurality of fine holes 123.

[0091] In the present embodiment, the photocatalytic substance 13 is in a combination of a layer shape and a block shape as described above, the photocatalytic substance 13 covers the outer surface of the layer structure 12 and is filled in the plurality of fine holes 123, and substantially fills each of the plurality of fine holes 123.

[0092] The type of the photocatalytic substance 13 is not particularly limited, and for example, can be titanium dioxide, tungsten trioxide, zinc oxide, iron oxide, vanadium oxide, or the like. Among them, titanium dioxide is more preferable. In order to obtain a larger specific surface area and good reactivity, the particle diameter of the photocatalytic substance should be small. For example, for titanium dioxide, the particle diameter is in the range of 1 nm to 1000 nm, and more preferably in the range of 2 nm to 100 nm.

[0093] The thickness of the photocatalytic substance 13 is not particularly limited, but is preferably in the range of 1 nm to 500 nm, and from the viewpoint of improving the function of the photocatalyst, a thickness of 10 nm or more is more desirable; and from the viewpoint of maintaining a similar fine hole structure after the photocatalyst is formed, a thickness of 200 nm or less is more desirable, and therefore, the thickness of the photocatalytic substance 13 is more preferably in the range of 10 nm to 200 nm.

[0094] The light absorption rate of the photocatalytic member 100 is not particularly limited, but is preferably in the range of 5% to 100%. The light absorption rate of the photocatalytic member is an index for measuring the absorption of light by the photocatalyst and the exertion of its function, and can be measured by a transmission spectrum. When the light absorption rate is 5% or more, it can be considered that the photocatalyst has absorbed a part of the light and exerted its function; and when the light absorption rate is 100%, it can be considered that the photocatalyst has absorbed all of the light and exerted its function. The closer the light absorption rate is to 100%, the higher the function of the photocatalyst.

[0095] The use of the photocatalytic member 100 is not particularly limited, and can be selected as desired. For example, it can be used for the purification treatment of a gas or a liquid. The gas can be, for example, air, and the liquid can be, for example, water, that is, the photocatalytic member 100 can be used as a photocatalytic member for air or water purification treatment, and for example, can be used as a filter net for air treatment or a filter net for water treatment.

[0096] In addition, it can also be used as a filter, and can be used for the decomposition of organic matter or the like.

[0097] In addition, it can also be used to act on bacteria and viruses.

[0098] In addition, it can also be used to extend the shelf life of fruits. For example, by placing fruits and the photocatalytic member 100 in a container, the decomposition of ethylene gas into the photocatalyst member 100 can achieve such an effect.

[0099] The photocatalytic member 100 of the present embodiment is very suitable for use in a device for purifying a gas or a liquid, such as an air purifier, a water purifier, or a window provided with the above-described photocatalytic member 100, and the like.

[0100] <Configuration of the purification treatment device>

[0101] Figure 3 is a structural schematic diagram of an air purification treatment device in the present embodiment.

[0102] As shown in Figure 3 , the purification treatment device is exemplarily an air purification treatment device, which includes the photocatalytic member 100, the light source 200, and the fan 300 disposed in a housing, and a passage 400 for air flow is also formed in the housing.

[0103] In this example, the photocatalytic member 100 is a filter screen, which has a generally rectangular plate shape and is vertically disposed in the device. A plurality of light sources 200 are disposed on one side of the photocatalytic member 100 for irradiating the photocatalytic member 100. The fan 300 is an example of a flow path generating means for generating a flow path of a gas or a liquid, and is used to blow the gas to the photocatalytic member 100. As shown by the arrows in the figure, under the action of the fan 300, the contaminated air 91 before treatment flows to the photocatalytic member 100, and after being treated by the photocatalytic member 100, the treated purified air 92 is formed and flows out through the passage 400. In this way, the air and other gases can be treated and purified.

[0104] The above example is a purification treatment device 1000 for air purification, but the application of the photocatalytic member 100 is not limited thereto, and it can also be used in a liquid purification treatment device. For example, the above fan 300 can be replaced by a spiral mechanism for generating the flow of a liquid (such as water), so that the liquid flows in the passage 400. In addition, the configuration, number, and type of the light source 200 can be selected as needed, and the light source 200 can be configured on the downstream side, the upstream side (in the flow direction of the fluid) of the photocatalytic member 100, or on both the downstream side and the upstream side of the photocatalytic member 100.

[0105] Figure 4 is a structural schematic diagram of a liquid purification treatment device in the present embodiment.

[0106] As shown in Figure 4 Fig. 1, the purification treatment device can also be a liquid purification treatment device, which also includes the photocatalytic component 100, the light source 200 arranged in the housing, and the channel 400 formed in the housing. The photocatalytic component 100 is a mesh formed by the plurality of photocatalytic members 10 intersecting with each other, and a plurality of through holes are formed between the photocatalytic members 10, and the channel 400 is also formed through the through holes.

[0107] In this example, the photocatalytic component 100 is a filter screen, and the overall shape of the photocatalytic component 100 matches the shape of the channel 400. The photocatalytic component 100 is arranged horizontally in the device, and the plurality of light sources 200 are arranged below the photocatalytic component 100 and irradiate the photocatalytic component 100. The sewage 93 before treatment flows from directly above the photocatalytic component 100, and after being treated by the photocatalytic component 100, the purified water 94 flows from directly below the photocatalytic component 100. In this way, the liquid such as water can be treated and purified.

[0108] Similarly, in this example, the configuration, number, and type of the light sources 200 can be selected as needed. The light sources 200 can be arranged on the downstream side or the upstream side (in the flow direction of the fluid) of the photocatalytic component 100, or on both the downstream side and the upstream side of the photocatalytic component 100.

[0109] Figure 5 Fig. 1 is a schematic view of the arrangement of the photocatalytic component and the light source in the purification treatment device in this embodiment.

[0110] As shown in Figure 5 (a) of Fig. 1, the plurality of light sources 200 can be arranged on the same side of the photocatalytic component 100 and irradiate one side of the photocatalytic component 100. As shown in Figure 5 (b) of Fig. 1, the plurality of light sources 200 can also be arranged on both sides of the photocatalytic component 100 and irradiate both sides of the photocatalytic component 100.

[0111] In addition, in the purification treatment device, a support component for supporting the photocatalytic component 100 can also be used in combination with the photocatalytic component 100. The support component can be, for example, a stirring component for stirring a gas or a liquid, and the photocatalytic component 100 is mounted on the stirring component to stir the gas or the liquid for purification treatment.

[0112] <Method for manufacturing photocatalytic component>

[0113] Figure 6 Fig. 1 is a flowchart of the method for manufacturing the photocatalytic component in this embodiment. Figure 7 Fig. 1 is a schematic view of the structure during the manufacturing of the photocatalytic component in this embodiment.

[0114] As shown in Figure 6 andFigure 7 As shown in the figure, in this embodiment, the manufacturing method of the photocatalytic component includes the following steps:

[0115] In the base member preparation step S1, one or more metal thin wires are prepared as the base member.

[0116] The photocatalytic imparting step (including the layer structure forming step S2 and the photocatalytic material forming step S3) imparts the base member with photocatalytic properties.

[0117] In the layer structure forming step S2, a layer structure with a plurality of regular pores of a metal oxide is formed on the base member by anodizing the base member, and the core is covered by the layer structure.

[0118] In the photocatalytic material forming step S3, a photocatalyst is arranged on the layer structure to form a photocatalytic material covering the layer structure and filling in each pore.

[0119] The above steps will be described in detail below.

[0120] In the base member preparation step S1, one or more metal thin wires are prepared as the base member.

[0121] The base member can be a single metal thin wire, or a two-dimensional or three-dimensional structure composed of a plurality of metal thin wires. For example, the cross-section of the base member as a single metal thin wire is shown in (a) of the figure. Figure 7

[0122] The manufacturing method of the metal thin wire is not particularly limited and can be selected as needed, for example, drawing processing using a drawing die, melt spinning method, coil cutting method, vibration cutting method, etc. In these processes, by properly adjusting the process conditions, the cross-sectional shape, length, etc. of the metal thin wire can be controlled. Preferably, the wire diameter of the metal thin wire is controlled to be 5 μm ~ 5 mm in the manufacturing of the metal thin wire. Then, a single metal thin wire can be used as the base member; or a plurality of metal thin wires can be woven to form a woven fabric or a non-woven fabric form as the base member. Alternatively, the base member can be subjected to a degreasing treatment.

[0123] In addition, the metal thin wire can also be a commercially available product, that is, the manufacturing method can also not have the step S1, or only include combining the purchased metal thin wire in the step S1.

[0124] In this embodiment, in the base member preparation step S1, the aluminum metal thin wire is woven into an aluminum woven fabric (mesh), and part of the aluminum woven fabric is cut out as the base member, the mesh number of the base member is 100, the wire diameter is 0.1 mm, and the wire spacing is 0.15 mm.

[0125] Figure 8 ​is a flow chart of the layer structure forming step in the present embodiment.

[0126] As shown in Figure 8 , the layer structure forming step S2 in the present embodiment specifically includes the following sub-steps:

[0127] The surface pretreatment sub-step S2-1 is to pretreat the surface of the base member.

[0128] The structure forming sub-step S2-3 is to anodize the base member to form a layer of metal anodized oxide on the surface of the base member, thereby obtaining a layer structure with multiple pores and a core body coated by the layer structure.

[0129] The pore size control sub-step S2-4 is to etch the layer structure to control the pore size of the pores.

[0130] In the present embodiment, in the surface pretreatment sub-step S2-1, the base member is immersed in ethanol (produced by Sinopharm, concentration 100%, room temperature) for degreasing treatment.

[0131] Figure 9 is a schematic diagram of anodizing the base member in the present embodiment.

[0132] As shown in Figure 9 , in the structure forming sub-step S2-3, the base member 21 composed of metal thin wires and the counter electrode 30 are put into the electrolyte in the formation tank 40, and a formation voltage is applied to the base member 21 and the counter electrode 30 for anodization. In general, anodization is mostly applied to metal plates; when anodizing metal thin wires, factors such as the conduction mode and manufacturing conditions of the metal thin wires need to be considered. Unlike anodizing metal plates, it is necessary to ensure that all parts of the base member (two-dimensional or three-dimensional structure) of the metal thin wires can be fully electrically connected.

[0133] In anodization, if the base member 21 is a woven fabric (such as a mesh), anodization can be performed in the electrolyte by partial conduction. If the base member 21 is a non-woven fabric, anodization can be performed under the condition that the metal thin wires are pressed and compressed, but it is not limited to this. In addition, a single metal thin wire can be anodized, or multiple metal thin wires can be combined into a two-dimensional or three-dimensional structure and then anodized, or according to the application of the photocatalytic component, a base member with a shape corresponding to the actual use state of the photocatalytic component is anodized.

[0134] Further, the base member (two-dimensional or three-dimensional structure) can be put into a basket-like member, and then the basket-like member containing the base member is put into the anodizing tank as a whole to perform anodizing. In this case, even if the structure of the base member makes it difficult to maintain a fixed position in the anodizing tank, anodizing can be performed.

[0135] The metal oxide layer can be formed on the surface of the base member by anodizing, thereby forming the core body 11 and the layer structure 12 having a plurality of fine pores 123, as shown in (b) of FIG. 1. Figure 7

[0136] Figure 10 FIG. 2 is a scanning electron microscope (SEM) image of the aluminum braid before and after anodizing in this embodiment, Figure 10 (a) of FIG. 2 is a low magnification image, Figure 10 (b) of FIG. 2 is a high magnification image.

[0137] As shown in (a) of FIG. 2, the aluminum braid (base member) before anodizing can be seen in the electron microscope image as a plurality of intersecting metal fine lines, and the surface of the metal fine lines has a flat structure. As shown in (b) of FIG. 2, after anodizing, the surface of the metal fine lines forms an anodized layer, and the surface of the anodized layer has flat portions and irregular concave-convex portions, and forms a pore structure. Figure 10 Figure 10

[0138] The pore diameter, pore spacing, and pore depth of the fine pores 123 can be controlled by the conditions during anodizing, and the conditions during anodizing can include the type of electrolyte, the applied anodizing voltage, the anodizing time, etc. The layer structure 12 formed by anodizing is composed of a cylindrical oxide body having a central hole, and the bottom thereof is a barrier layer 121 composed of a metal oxide layer. The thickness of the barrier layer 121 is proportional to the anodizing voltage, and the pore diameter of the fine pores 123 is also almost proportional to the anodizing voltage, and the pore depth of the fine pores 123 increases with an increase in the anodizing time. Therefore, by changing the anodizing voltage and the anodizing time during anodizing, a metal oxide layer having different pore spacing, pore diameter, and pore depth can be prepared.

[0139] In the structure forming sub-process S2-2, the anodizing conditions include the type of anodizing liquid, the temperature of the anodizing liquid, the anodizing voltage, and the anodizing time.

[0140] In the structure forming sub-process S2-3 of this embodiment, anodizing is performed using 0.3 M oxalic acid (produced by Sinopharm) as an anodizing liquid (electrolyte), the temperature of the anodizing liquid is maintained at 10°C by a temperature controller, the anodizing voltage is 40 V, and the anodizing time is 30 minutes.

[0141] ​​​Furthermore, after anodizing, the pore size can be controlled by etching the formed anodic oxide with a suitable acid. During etching, the oxide dissolves uniformly radially around the pore. The etching rate depends on the type, concentration, temperature, and time of the acid used; by appropriately adjusting these conditions, the desired pore size can be obtained.

[0142] In the aperture control sub-process S2-4, the aperture of the fine holes 123 is controlled by etching the layer structure (anodic oxide) with acid. The acid used for etching can be phosphoric acid, sulfuric acid, etc. The concentration of the acid can be selected between 1 wt% and 10 wt%.

[0143] Figure 11 These are scanning electron microscope (SEM) images of the aluminum braided fabric before and after the aperture enlargement treatment in this embodiment. Figure 11 (a) to Figure 11 In the diagram, (d) corresponds to pore size enlargement processing times of 0 minutes (i.e., no enlargement processing), 10 minutes, 30 minutes, and 50 minutes, respectively. By comparing these SEM images, the effect of pore size enlargement processing time on pore size change can be observed. (The diagram shows the effect of pore size enlargement processing time on pore size change without pore size enlargement processing.) Figure 11 In (a) of the image, the hole is almost invisible. From... Figure 11 (b) and Figure 11 As can be seen from (c), the pore size of the metal oxide layer is enlarged after the pore size enlargement treatment.

[0144] Furthermore, through comparison Figure 11 (a) to Figure 11 The value of (d) in the figure can be used to determine the optimal time for aperture enlargement treatment. For example... Figure 11 As shown in (b) of the figure, the aperture enlargement process is insufficient when the processing time is 10 minutes. Figure 11 As shown in (d), at a processing time of 50 minutes, excessive dissolution of the metal oxide layer led to its collapse. Figure 11 As shown in (c), the pore size is good when the processing time is 30 minutes. Therefore, setting the pore size enlargement processing time to 30 minutes is preferable.

[0145] Therefore, in this embodiment, in the aperture control sub-process S2-4, phosphoric acid (produced by Sinopharm) at 3% by weight and 30°C is used as the etching solution for aperture enlargement treatment. The aperture enlargement treatment time is 30 minutes. After this process, the SEM observation results of the aluminum braided fabric after aperture enlargement treatment will be as follows: Figure 11 As shown in (c), the average pore size of the enlarged pore 123 is approximately 70 nm.

[0146] In the photocatalyst formation step S3, the method of forming the photocatalyst 13 can be selected as needed. For example, the photocatalyst can be coated on the layer structure 12 by a coating method, an electrodeposition method, a sol-gel method, a chemical vapor deposition method (CVD), an atomic layer deposition method (ALD), or the like, thereby forming the photocatalyst 13.

[0147] In the coating method, a solution containing photocatalyst fine particles is coated on the layer structure 12, and is fixed by drying and firing. At this time, the photocatalyst particles contained in the coating liquid need to be able to enter the fine pores 123 of the anodic oxide, and the particle diameter is preferably between 2 nm and 100 nm.

[0148] The electrodeposition method can employ direct current electrodeposition or alternating current electrodeposition. For example, in the alternating current electrodeposition, titanium oxalate ammonium (e.g., 1.0 x 10⁻² mol / L) can be used as an electrolyte, and electrodeposition can be performed at a bath temperature of 1°C, a frequency of 50 Hz, and a voltage of 50 V for 20 seconds, thereby forming the photocatalyst 13 (titanium dioxide in this example case). In the direct current electrodeposition, for example, TiCl4(e.g., 0.05 M) can be used as an electrolyte, and a Pt wire can be used as a counter electrode, and a constant potential of +1000 mV can be applied with respect to a reference electrode at a pH of 2.7 in the electrolyte at room temperature.

[0149] Figure 12 is a schematic view of the electrodeposition of the photocatalyst in this embodiment.

[0150] As shown in Figure 12 , for example, the base member 21 having the layer structure 12 and the counter electrode 30 are placed in an electrolyte 50, and a power source is connected for electrodeposition. In the figure, R.E. indicates a reference electrode.

[0151] In the atomic layer deposition (ALD) method, TiO2is obtained by introducing a raw material gas into a heated carrier (the base member 21 having the layer structure 12), and then introducing water to react. As the raw material gas, TMDA (tetra(dimethylamino) titanium (IV)) or TiCl4, or the like can be used. In the ALD method, TiO2is deposited in atomic layers, and thus a photocatalyst layer having good coverage with respect to two-dimensional and three-dimensional structures can be obtained. Further, as a method of more effectively filling the raw material gas into the inside of the fine pores, the supply of the carrier gas can be stopped after the raw material gas is introduced.

[0152] Note that, when the photocatalyst is formed in the inside of the fine pores, the photocatalyst does not need to be formed in all of the fine pores. The proportion of the fine pores in which the photocatalyst is formed can be appropriately selected according to the specific method of the photocatalyst formation step and the intended effect.

[0153] In this embodiment, a coating method is used. The photocatalyst coating solution is an aqueous titanium dioxide sol dispersion with an average particle size of 6 nm. The aluminum woven fabric is immersed in the photocatalyst coating solution for 5 minutes, and a photocatalyst layer is coated on the layered structure 12. Subsequently, the catalyst layer is dried with warm air for about 5 minutes. The coating and drying of the photocatalyst layer are repeated 4 times. After drying, the aluminum woven fabric coated with the photocatalyst layer is heated in air using an electric furnace to fix the photocatalyst layer. The heating temperature is 150°C, the heating rate is 13°C per minute, and the heating time is 120 minutes.

[0154] <Gas Purification Performance Evaluation>

[0155] The photocatalytic component 100 is prepared according to the above method and processed into a filter with an area of ​​approximately 120 cm². The filter is then installed in an air purification device (air purifier) ​​with a light source and a fan. The structure of the air purifier is as follows: Figure 3 As shown. The light source is an ultraviolet LED lamp with a center wavelength of 365 nm and a light intensity of 20 mW / cm². 2 The fan airflow was set to 100 L / min, and acetaldehyde (General-Reagent) was used as the pollutant. The acetaldehyde concentration and the CO2 generated by the photocatalytic reaction were measured using a photoacoustic gas detector (Gasera-One). The photocatalytic decomposition reaction was carried out according to the above method.

[0156] Test results show that after purification by the photocatalytic component 100, the initial concentration of acetaldehyde (30 ppm) decreased to 0.5 ppm after 17 minutes. This result indicates that, compared to conventional commercially available filters (with photocatalysts loaded on titanium mesh), the filter of the photocatalytic component 100 in this embodiment exhibits approximately twice the reaction rate and demonstrates excellent purification characteristics.

[0157] Figure 13 This is a performance comparison chart of the photocatalytic filter in this embodiment with products from other companies. "Developed product" refers to the photocatalytic filter manufactured using the method of this embodiment, and "other company products" includes filter products from companies A to D. The test conditions are as follows: at 1 m... 3 In a sealed container, acetaldehyde was used as the test sample, with an initial concentration of 5 ppm. It was purified by passing it through the photocatalytic filter of this embodiment and filters from Company A to Company D. Performance comparisons were conducted under the same test conditions, and reference was made to press releases published by a Japanese research organization on April 27, 2022.

[0158] like Figure 13As shown, the photocatalytic filter of this embodiment (labeled "development product" in the figure) reduces the acetaldehyde concentration to 0 ppm within 5 minutes. Among other companies' products, Company B's product has the best performance, while the photocatalytic filter of this embodiment exhibits a higher reaction rate than Company B's product. This result demonstrates that the photocatalytic filter prepared by the method of this embodiment has excellent performance.

[0159] <Liquid Purification Performance Evaluation>

[0160] A photocatalytic component 100 was prepared according to the above method and processed into a filter screen with an area of ​​approximately 120 cm². The filter screen was installed in a liquid purification device, which was a closed container (flow cell) with a light source, a quartz window, and a pump for liquid flow. The photocatalytic filter screen was placed in this closed container. The light source was an ultraviolet LED lamp with a center wavelength of 365 nm and a light intensity of 20 mW / cm². The filter screen was irradiated by this light source to remove contaminants from the solution. Using methylene blue as the contaminant, the reaction rate of the photocatalyst was evaluated under the conditions of 500 mL liquid volume and a flow rate of 100 mL / min. The results showed that for an initial concentration of 20 ppm, the concentration decreased to 0.2 ppm after 10 minutes.

[0161] Therefore, the photocatalytic component 100 in this embodiment also has good purification characteristics for liquids.

[0162] In addition, a photocatalytic component 100 was prepared according to the above method and processed into a filter screen with an area of ​​approximately 120 cm². The filter screen was installed at the bottom of the sealed container and decomposition tests were conducted using bisphenol A (produced by Innochem), a recalcitrant organic compound, as a pollutant.

[0163] Figure 14 This is a schematic diagram showing the concentration change during the photocatalytic decomposition of bisphenol A in this embodiment.

[0164] like Figure 14 As shown, under the conditions of an initial concentration of 10 ppm, a solution volume of 100 mL, and a flow rate of 100 mL / min, 50% of the pollutants were decomposed and removed within 20 minutes.

[0165] Therefore, the photocatalytic component 100 of this embodiment also has good purification characteristics for solutions containing recalcitrant organic matter.

[0166] <Peel Strength Assessment>

[0167] In the manufacturing method of the present embodiment, the anchoring effect is provided for the photocatalyst layer coated on the surface of the layer structure by subjecting the aluminum braid to an anodization treatment and a pore size control (expansion) treatment, and the adhesion of the photocatalyst layer is improved. The peeling strength test of the photocatalyst was performed in the following manner.

[0168] The sample for comparison is an aluminum braid coated with a photocatalyst layer, and the sample is not subjected to an anodization treatment and a pore size control treatment. The aluminum braid of the present embodiment and the sample for comparison were subjected to a tape peeling strength test using an adhesive tape (J. M. Weston J66228), and the results of the peeling strength test are shown in Table 1 below.

[0169] Table 1 Peeling strength test data table of different aluminum braids

[0170]

[0171] As shown in the data in Table 1, for the aluminum braid of the present embodiment, the peeling ratio is 0%, i.e., no photocatalyst peeling is detected. In the sample for comparison, the peeling ratio is 38.0%, indicating that a considerable proportion of the photocatalyst has peeled off. This result shows that the anodization treatment and the pore size control treatment effectively improve the adhesion of the photocatalyst.

[0172] <Effects of Embodiment One>

[0173] According to the photocatalytic component, the purification treatment device, and the manufacturing method of the photocatalytic component provided in the present embodiment, since the photocatalytic component has at least one photocatalytic member, each photocatalytic member has a metal core, a layer structure composed of an oxide of the same metal, and also has a photocatalyst covering the layer structure or the layer structure itself has photocatalytic activity and can serve as a photocatalyst, so the photocatalytic function can be realized. In addition, since the layer structure is distributed with a plurality of regular pores, when the metal oxide itself has photocatalytic activity, the surface area of the metal oxide can be increased through the pores, thereby expanding the area for exerting the photocatalytic function, so better purification treatment performance can be obtained. When the photocatalyst is formed by coating a photocatalyst on the layer structure, since the photocatalyst is also arranged in the plurality of regular pores, not only the amount and surface area of the photocatalyst can be increased, but also the distribution of the photocatalyst can be made more uniform, thereby improving the photocatalytic effect and obtaining better purification treatment performance. In addition, the photocatalyst formed in the pores is difficult to peel off due to the anchoring effect and the like, the adhesion of the photocatalyst can be increased, and the photocatalyst is less likely to peel off, so the decrease in the photocatalytic ability can be inhibited in long-term use.

[0174] In the embodiments, the photocatalyst is filled in multiple pores and substantially fills the pores, thereby increasing the amount of photocatalyst, increasing the surface area of ​​the photocatalyst, and enhancing the anchoring effect, further improving the adhesion stability of the photocatalyst and increasing its anti-peeling strength.

[0175] Furthermore, a layered structure (metal oxide layer) with a fine porous structure can be formed by anodizing the metal wire. In the anodizing process, by appropriately adjusting the type of electrolyte, voltage, and anodizing time, a metal oxide layer with the required pore spacing, pore diameter, and pore depth can be prepared.

[0176] Furthermore, through the pore size control process, the pore size of the micropores is enlarged and becomes more uniform, with a relative standard deviation of less than 40% or even less than 20% in pore size distribution. The straightness of the micropores is better, and the aperture ratio is also higher, ranging from 20% to 80%. Therefore, the photocatalyst can be formed more uniformly, thus preventing photocatalyst shedding and increasing the surface area of ​​the photocatalyst. This enhances the photocatalyst's function without reducing the amount of photocatalyst used. Moreover, in the pore size control process, the desired pore size can be obtained by appropriately adjusting the type, concentration, temperature, and processing time of the acid used.

[0177] Furthermore, the porosity of the micropores is between 10% and 90%. When the porosity is above 10%, it facilitates the passage of water or air, making it easier for the purified object (water or air) to contact the photocatalyst, thereby improving the photocatalytic effect. When the porosity is below 90%, it can suppress the reduction of the photocatalyst unit quantity in the photocatalytic component, thus avoiding a decline in photocatalytic activity. In addition, when the porosity is within the above range, it can also ensure the amount of light irradiating the photocatalyst.

[0178] Furthermore, the thickness of the layered structure (metal oxide layer) is between 40 nm and 1000 nm, which increases the depth of the pores, thereby increasing the amount of photocatalyst formed within the pores and improving the photocatalytic effect. Moreover, the thickness of the metal oxide layer can be easily adjusted by modifying the anodizing conditions (anodizing time) during the layered structure formation process.

[0179] In this embodiment, since multiple fine metal filaments are woven into a fabric as the base component, and then anodized and coated with a photocatalyst to form a photocatalytic component, a photocatalytic filter can be easily formed. This filter is particularly suitable for use in air purifiers and liquid purifiers to purify air or water. Furthermore, such a photocatalytic filter can be easily further processed into the desired shape; for example, it can be shaped to match the channels of the purification device. The positional relationship between the photocatalytic filter and the light source can also be easily adjusted as needed, thus offering high flexibility in installation.

[0180] Example 2

[0181] The present example provides a photocatalytic component, a purification treatment device, and a manufacturing method of a photocatalytic component. In the present example, the same reference numerals are given to the same constituent elements as in Example 1, and the corresponding description is omitted.

[0182] The difference between the present example and Example 1 is that the manufacturing method of the photocatalytic component is different.

[0183] <Manufacturing method of a photocatalytic component>

[0184] In the base member preparation step S1, the mesh number of the base member (cut aluminum braid) is 18, the wire diameter is 0.6 mm, and the wire spacing is 0.8 mm. The other steps are the same as in Example 1. That is, compared with Example 1, a different mesh number of aluminum braid is used as the base member in the present example.

[0185] Through the above-mentioned steps, the photocatalytic component 100 is successfully prepared.

[0186] <Effects of Example 2>

[0187] According to the photocatalytic component, the purification treatment device, and the manufacturing method of a photocatalytic component provided in the present example, by preparing a base member with different parameters, it is confirmed that even if a different mesh number of aluminum braid is used, a photocatalytic component (photocatalytic filter screen) can be successfully prepared.

[0188] Example 3

[0189] The present example provides a photocatalytic component, a purification treatment device, and a manufacturing method of a photocatalytic component. In the present example, the same reference numerals are given to the same constituent elements as in Example 1, and the corresponding description is omitted.

[0190] The difference between the present example and Example 1 is that the manufacturing method of the photocatalytic component is different.

[0191] <Manufacturing method of a photocatalytic component>

[0192] In the base member preparation step S1, the mesh number of the base member (cut aluminum braid) is 150, the wire diameter is 0.07 mm, and the wire spacing is 0.1 mm. The other steps are the same as in Example 1. That is, compared with Example 1, a more fine mesh aluminum braid is used as the base member in the present example.

[0193] Through the above-mentioned steps, the photocatalytic component 100 is successfully prepared.

[0194] <Effects of Example 3>

[0195] According to the photocatalytic component, the purification treatment device and the manufacturing method of the photocatalytic component provided in the embodiment, by preparing the base member with different parameters, it is confirmed that even if the aluminum woven fabric with fine mesh is used, the photocatalytic component (photocatalytic filter net) can be successfully prepared.

[0196] Embodiment Four

[0197] The embodiment provides a photocatalytic component, a purification treatment device and a manufacturing method of the photocatalytic component. In the embodiment, the same reference signs are given to the same constituent elements as in Embodiment One, and the corresponding description is omitted.

[0198] Compared with Embodiment One, the difference lies in that the manufacturing method of the photocatalytic component in the embodiment is different.

[0199] <Manufacturing method of the photocatalytic component>

[0200] In the base member preparation process S1, a plurality of aluminum metal wires are crossed to form a non-woven fabric, and part of the non-woven fabric is cut as a base member, the wire diameter of the base member is 50 μm, the unit area weight is 150 g / m², and it is immersed in ethanol for degreasing treatment. Other processes are the same as in Embodiment One. That is, compared with Embodiment One, a non-woven fabric is used as the base member in the embodiment.

[0201] In the layer structure forming process S2, as described above, a certain pressure is applied to the base member to compress it. Specifically, an aluminum alloy mesh with a mesh number of 18 is used to clamp the base member (non-woven fabric) from both sides to maintain its shape, and anodic oxidation is performed in this state.

[0202] In the photocatalytic material forming process S3, the coating and drying of the photocatalyst layer are repeated 4 times. In the subsequent heating and curing, the heating temperature is 200°C, the temperature rising rate is 15°C per minute, and the heating time is 60 minutes. Other processes are the same as in Embodiment One.

[0203] Through the above process, the photocatalytic component 100 is successfully prepared.

[0204] <Effects of Embodiment Four>

[0205] According to the photocatalytic component, the purification treatment device and the manufacturing method of the photocatalytic component provided in the embodiment, by adopting the base member in the form of non-woven fabric, it is confirmed that even if the base member with different forms is used, the photocatalytic component can be successfully prepared. And through similar tests as in Embodiment One, it is verified that in the photocatalytic component of the embodiment, the catalyst layer has good adhesion, and compared with the traditional commercially available filter net, it shows more excellent photocatalytic properties.

[0206] Example Five

[0207] The present embodiment provides a photocatalytic component, a purification treatment device and a manufacturing method of the photocatalytic component. In the present embodiment, the same reference signs are given to the same constituent elements as those in Example One, and the corresponding descriptions are omitted.

[0208] The difference between the present embodiment and Example One is that the manufacturing method of the photocatalytic component is different.

[0209] <Manufacturing method of the photocatalytic component>

[0210] In the base member preparation process S1, a plurality of metal fine wires of stainless steel are crossed to form a stainless steel braid, and a part of the braid is cut off as a base member. The mesh number of the cut-off stainless steel braid is 100, the wire diameter is 0.1 mm, and the wire spacing is 0.15 mm.

[0211] In the layer structure forming process S2, the conditions for anodic oxidation include using a solution containing 0.1 M ammonium fluoride (produced by Sinopharm) and 0.1 M water in ethylene glycol (produced by Sinopharm) as a formation solution (electrolyte), a formation voltage of 50 V, and a formation time of 10 minutes.

[0212] In the photocatalytic material forming process S3, the photocatalyst is also coated on the layer structure 12 and is heated and cured, the heating temperature is 150°C, and the heating time is 30 minutes. The other processes are the same as in Example One.

[0213] Through the above processes, the photocatalytic component 100 is successfully prepared.

[0214] <Effects of Example Five>

[0215] According to the photocatalytic component, the purification treatment device and the manufacturing method of the photocatalytic component provided by the present embodiment, by using a stainless steel braid as a base member, it is confirmed that even if different forms of base members are used, the photocatalytic component can be successfully prepared. And through similar tests as in Example One, it is verified that the photocatalytic component of the present embodiment has good purification treatment performance.

[0216] Example Six

[0217] The present embodiment provides a photocatalytic component, a purification treatment device and a manufacturing method of the photocatalytic component. In the present embodiment, the same reference signs are given to the same constituent elements as those in Example One, and the corresponding descriptions are omitted.

[0218] The difference between the present embodiment and Example One is that the manufacturing method of the photocatalytic component is different.

[0219] Method for manufacturing photocatalytic component

[0220] In the base member preparation step S1, a plurality of metal thin wires of stainless steel are crossed to form a stainless steel braid, and a part of the braid is cut to obtain a base member. The cut stainless steel braid has a mesh number of 500, a wire diameter of 0.02 mm, and a wire spacing of 0.03 mm.

[0221] In the layer structure forming step S2, the conditions for anodic oxidation include using a solution containing 0.1 M ammonium fluoride (produced by Sinopharm) and ethylene glycol (produced by Sinopharm) as a formation solution (electrolyte), a formation voltage of 40 V, and a formation time of 15 minutes.

[0222] In the photocatalytic material forming step S3, a photocatalyst is also coated on the layer structure 12 and is heated and cured, the heating temperature is 150°C, the heating rate is 13°C per minute, and the heating time is 30 minutes. Other steps are the same as in Example One.

[0223] Through the above steps, the photocatalytic component 100 is successfully prepared.

[0224] Figure 15 is a scanning electron microscope image of the stainless steel braid after anodic oxidation in this embodiment. As shown in Figure 15 , the formation of a porous structure can be observed on the surface of the metal oxide layer.

[0225] <Effects of Example Six>

[0226] According to the photocatalytic component, the purification treatment device, and the method for manufacturing the photocatalytic component provided in this embodiment, by using a stainless steel braid as a base member, it is confirmed that even if different forms of base members are used, and even if a stainless steel braid with a fine mesh is used, a photocatalytic component can be successfully prepared. And through similar tests as in Example One, it is verified that the photocatalytic component of this embodiment has good purification treatment performance.

[0227] Example Seven

[0228] This embodiment provides a photocatalytic component, a purification treatment device, and a method for manufacturing the photocatalytic component. In this embodiment, the same symbols are assigned to the same constituent elements as in Example One, and the corresponding descriptions are omitted.

[0229] Compared with Example One, the difference is that the constitution of the purification treatment device in this embodiment is different.

[0230] Figure 16 is a structural schematic diagram of the purification treatment device in this embodiment.

[0231] AsFigure 16 As shown, the purification device is an air purification device (air purifier), which includes two photocatalytic components 100 (photocatalytic filters), multiple light sources 200, and a fan. Both photocatalytic filters are vertically arranged and stacked along the direction of airflow, with a certain distance between them. The multiple light sources 200 are located on the same side of the two photocatalytic filters and irradiate them.

[0232] The air purification device of this embodiment was tested and evaluated for photocatalytic reaction under the same ultraviolet light irradiation and airflow conditions as in Example 1, and the testing method was the same as in Example 1. After testing, using the air purification device of Example 1 (a single photocatalytic filter), the concentration dropped to 10% after 43 minutes. However, using the air purification device of this embodiment (two stacked photocatalytic filters), the concentration dropped to 10% after 19 minutes. Therefore, compared to using a single photocatalytic filter, the air purification speed is increased by 2.3 times by using two stacked photocatalytic filters in this embodiment.

[0233] Furthermore, the same test evaluation was conducted using three stacked photocatalytic filters. When using three stacked photocatalytic filters, the concentration dropped to 10% after 17 minutes. Therefore, compared to using one photocatalytic filter, using three photocatalytic filters increased the air purification speed by 2.5 times.

[0234] In addition, a liquid purification device using two stacked photocatalytic filters was also tested. Specifically, two photocatalytic filters were stacked along the liquid flow direction within a sealed container containing a light source and a liquid pump, and the same tests as in Example 1 were performed. The tests showed that for an initial concentration of 50 ppm, using the liquid purification device of Example 1 (single photocatalytic filter), the concentration decreased to 27% after 10 minutes and to 4% after 20 minutes. However, using the liquid purification device of this example (two stacked photocatalytic filters), the concentration decreased to 9% after 10 minutes and to 0% after 20 minutes. Therefore, compared to using a single photocatalytic filter, the liquid purification speed was improved by using two stacked photocatalytic filters in this example.

[0235] Figure 17 This is a schematic diagram of the configuration of the light source in the purification device in this embodiment.

[0236] like Figure 17 As shown in (a), when the device is provided with multiple photocatalytic components 100 stacked along the fluid flow direction, multiple light sources 200 can be arranged on the same side of all photocatalytic components 100, irradiating the side facing the photocatalytic component 100. Figure 17As shown in (b) in FIG. 1, when a plurality of photocatalytic members 100 are stacked, preferably, the light source 200 can be arranged between adjacent photocatalytic members 100 so as to reduce the area of the plurality of photocatalytic members 100 that is not irradiated by light, thereby improving the purification treatment capacity.

[0237] <Effects of Embodiment Seven>

[0238] According to the photocatalytic member, the purification treatment device, and the method for manufacturing a photocatalytic member provided in the present embodiment, since the purification treatment device is provided with a plurality of photocatalytic members stacked along the fluid flow direction, the purification treatment capacity can be significantly improved. Further, the light source in the purification treatment device can be arranged between the plurality of photocatalytic members so as to reduce the area of the plurality of photocatalytic members that is not irradiated by light, thereby further improving the purification treatment capacity.

[0239] Embodiment Eight

[0240] The present embodiment provides a photocatalytic member, a purification treatment device, and a method for manufacturing a photocatalytic member. In the present embodiment, the same reference signs are given to the same constituent elements as those in Embodiment One, and the corresponding descriptions are omitted.

[0241] Compared with Embodiment One, the difference lies in that the method for manufacturing a photocatalytic member in the present embodiment is different.

[0242] <Method for Manufacturing a Photocatalytic Member>

[0243] In the photocatalytic material forming process S3, the electrodeposition of titanium dioxide (TiO2) was performed using an electrodeposition method, with a solution of 0.05 M ammonium titanium oxalate and 0.02 M oxalic acid as the electrolyte. The conditions for electrodeposition included: 50 Hz alternating current, an oxidation voltage of 20 V, and a deposition time of 15 minutes. Then, the deposited catalyst layer was subjected to a heat curing treatment, with a heating temperature of 300°C, a heating rate of 15°C per minute, and a heating time of 60 minutes. The other processes were the same as in Embodiment One.

[0244] Through the above processes, the photocatalytic member 100 was successfully prepared.

[0245] <Effects of Embodiment Eight>

[0246] According to the photocatalytic member, the purification treatment device, and the method for manufacturing a photocatalytic member provided in the present embodiment, it is confirmed that the photocatalytic material can be formed by an electrodeposition method.

[0247] Embodiment Nine

[0248] The present embodiment provides a photocatalytic member, a purification treatment device, and a method for manufacturing a photocatalytic member. In the present embodiment, the same reference signs are given to the same constituent elements as those in Embodiment One, and the corresponding descriptions are omitted.

[0249] The difference from Example 1 is that the manufacturing method of the photocatalyst member is different.

[0250] <Manufacturing method of photocatalyst member>

[0251] In the photocatalyst formation step S3, atomic layer deposition was performed using an ALD device (SAL-300 Plus, SAKAGAMI SEISAKUSHO) with TDMA (tetra (dimethylamino) titanium (IV), Japan Advanced Chemicals) as a raw material. The conditions for atomic deposition included a substrate temperature of 190°C for each cycle, 750 seconds of TDMA introduction, 210 seconds of nitrogen purge, 210 seconds of water introduction, 210 seconds of nitrogen purge, 100 cycles of deposition from one surface side of the aluminum woven body, 100 cycles of deposition from the back side (the other surface side), and a TiO2 layer of about 0.2 nm per cycle. After that, heat treatment was performed at 50°C for 2 hours. The other processes were the same as in Example 1.

[0252] Through the above process, the photocatalyst member 100 was successfully manufactured.

[0253] <Effects of Example Nine>

[0254] According to the photocatalyst member, the purification treatment device, and the manufacturing method of the photocatalyst member provided in this example, it is confirmed that the photocatalyst can be formed by atomic layer deposition, and that a photocatalyst with a thin thickness and uniform and accurate thickness can be formed along the surface shape of the layer structure body having fine pores by atomic layer deposition.

[0255] Example Ten

[0256] This example provides a photocatalyst member, a purification treatment device, and a manufacturing method of a photocatalyst member. In this example, the same reference numerals are assigned to the same constituent elements as in Example One, and the corresponding descriptions are omitted.

[0257] The difference from Example One is that the structure of the photocatalyst member and the manufacturing method thereof are different in this example.

[0258] <Structure of photocatalyst member>

[0259] In this example, the plurality of fine pores 123 in the layer structure body 12 are highly regularly arranged fine pores, and the relative standard deviation of the pore size distribution of the fine pores 123 is 20% or less. In this example, the other structures are basically the same as in Example One.

[0260] <Manufacturing method of photocatalyst member>

[0261] In order to form the above-mentioned highly regular arranged fine holes, in the manufacturing method of the present embodiment, the structure forming sub-process S2-3 is different.

[0262] In order to realize the desired regularity of fine hole arrangement and the uniformity of hole diameter, the conditions of anodic oxidation can be adjusted. The regularity of fine hole arrangement is affected by the conditions of anodic oxidation, and when anodic oxidation is performed under appropriate conditions (self-organization conditions), a long-range ordered fine hole arrangement structure can be obtained. This hole regularity phenomenon based on anodic oxidation is widely present in metals such as aluminum and titanium, and is also applicable to various metals such as tungsten, vanadium, niobium, and iron.

[0263] Under self-organization conditions, the regularity of fine hole arrangement gradually improves as anodic oxidation proceeds. In the initial stage of anodic oxidation, the formation of fine holes is random, and the arrangement regularity is low. However, when anodic oxidation is performed under self-organization conditions, as time passes, the holes at the bottom of the film (barrier layer) are rearranged, and a highly regular arrangement structure is obtained. In addition, since the proportion of defects in the hole structure is reduced in the highly regular arrangement structure, the uniformity of the hole diameter is also improved. The uniformity of the hole diameter can be defined by the standard deviation of the hole diameter, and a highly regular arrangement structure generally corresponds to a small standard deviation value.

[0264] In addition, when the metal fine wire is aluminum, oxalic acid can be used as the formation solution, and under such conditions, the regularity of hole arrangement can also be improved and the hole diameter distribution can be made more uniform.

[0265] Therefore, in the base member preparation process S1 of the present embodiment, one or more aluminum metal fine wires are prepared as the base member.

[0266] In the structure forming sub-process S2-3 of the present embodiment, 0.3 M oxalic acid is used as the formation solution, the formation voltage is 40 V, and the formation time is 160 hours. Under such conditions, a highly regular arrangement metal oxide layer with a hole period of 100 nm and a hole diameter of 20 nm to 80 nm can be obtained.

[0267] In the present embodiment, the other processes are basically the same as in Embodiment One.

[0268] <Effects of Embodiment Ten>

[0269] According to the photocatalytic component, the purification treatment device, and the manufacturing method of the photocatalytic component provided in the present embodiment, by performing anodic oxidation under self-organization conditions, a highly regular arrangement of fine holes can be obtained, and in this case, the fine holes will be formed more uniformly, thereby enabling the formation of a more uniformly distributed photocatalyst, which can prevent the photocatalyst from falling off, and at the same time, can improve the photocatalytic function of the photocatalyst without reducing the amount of photocatalyst.

[0270] Example 11

[0271] This embodiment provides a kind of photocatalytic component, purification treatment device and the manufacturing method of photocatalytic component, in this embodiment, for the same constituent element with the same symbol in embodiment one and the corresponding description is omitted.

[0272] Compared with embodiment one, the difference is that the structure of the photocatalytic component of this embodiment and its manufacturing method are different.

[0273] <The structure of photocatalytic component>

[0274] In this embodiment, the plurality of fine holes 123 in layer structure body 12 are highly regular arranged fine holes, the relative standard deviation of the aperture distribution of fine hole 123 is below 20%, and the average aperture of fine hole 123 is 20 nm~500 nm.And, fine hole 123 is mostly straight hole, and the opening rate is above 40%.

[0275] In addition, the photocatalytic component 100 of this embodiment also includes a very thin passivation layer 14, which is formed between the core 11 and the layer structure body 12.The passivation layer 14 is a chromate passivation film.

[0276] In this embodiment, other structures are basically the same as in embodiment one.

[0277] <Manufacturing method of photocatalytic component>

[0278] In order to form the above-mentioned highly regular arranged fine holes, the layer structure forming process S2 of the manufacturing method of this embodiment is different.

[0279] The surface structure of the metal oxide layer formed by anodization will reflect the pore structure formed at the beginning of anodization, the straightness of the pores is lower, the opening of the pores will be blocked, and the regularity of the pore arrangement is lower.In order to obtain a metal oxide layer structure suitable for photocatalyst loading, with straight holes and sufficient opening, a multi-step anodization process can be used, such as a two-step anodization process, which is particularly suitable for aluminum or titanium.

[0280] Figure 18 is the flow chart of layer structure forming process in this embodiment, Figure 19 is the structure schematic diagram of layer structure forming process in this embodiment.

[0281] As shown in Figure 18 and Figure 19 , the layer structure forming process S2 of this embodiment specifically includes the following sub-processes:

[0282] Surface pretreatment sub-process S2-1, pretreats (degreases) the surface of the base member.This sub-process is the same as in embodiment one.

[0283] The surface preparation sub-process S2-2 prepares the surface of the pretreated substrate component to form multiple recesses on its surface.

[0284] In the structure forming sub-process S2-3, the base component with multiple recesses is anodized to form a layered structure with multiple regular fine pores and a core covered by the layered structure.

[0285] The aperture control sub-process S2-4 involves etching the layer structure to control the aperture of the fine holes.

[0286] That is, compared with the manufacturing method of Example 1, a surface preparation sub-step is included before the structure formation sub-step.

[0287] Among them, such as Figure 19 As shown in (a), in the surface preparation sub-process S2-2, the substrate component 21 is first anodized (first-stage anodizing) to form a layer of metal anodic oxide as an intermediate structure 22, and an intermediate core 23 is formed by covering the intermediate structure 22. The intermediate structure 22 obtained after the first anodizing has multiple pores 221, which are multiple irregular fine pores. Multiple recesses 231 are formed on the surface of the intermediate core 23 that are in contact with the intermediate structure 22. The recesses 231 have a surface that is close to a concave arc surface, and the arrangement of the recesses 231 corresponds to the bottom of the multiple pores 221 of the intermediate structure 22 (the oxide generated by the first anodizing).

[0288] Then, the intermediate structure 22 is removed by an acidic solution to obtain an intermediate core 23 with multiple recesses 231 on its surface, that is, an intermediate base component with multiple recesses on its surface, such as... Figure 19 As shown in (b) of the diagram.

[0289] Subsequently, in the structure formation sub-process S2-3, the intermediate substrate component with multiple recesses 231 on its surface undergoes a second anodizing (second-stage anodizing) to form a layered structure 12 with multiple regular fine pores 123 and a core 11 covered by the layered structure 12, as shown below. Figure 19 As shown in (c) in the figure.

[0290] In the second anodizing process, the surface recesses 231 become the starting points for the formation of new micropores. For example... Figure 19As shown in (a) of FIG. 6, generally, the arrangement of the pores at the bottom of the anodic oxide layer (i.e., the arrangement of the bottoms of the plurality of pores) is more regular than the arrangement of the pores on the surface of the anodic oxide layer. Thus, by using this method, an oxide film (metal oxide layer) having a higher regularity of pore arrangement than an oxide film (metal oxide layer) formed by a single anodization can be obtained by two anodizations. By increasing the regularity of the pore arrangement of the metal oxide layer, the uniformity and adhesion of the layered photocatalyst, for example, can be improved. Thus, by the second anodization, a plurality of fine pores 123 having a more regular arrangement corresponding to the arrangement of the recesses 231 and a better straightness are formed, and the openings of the fine pores 123 are sufficiently secured.

[0291] In this embodiment, in the base member preparation step S1, an aluminum braid having a mesh number of 100, a wire diameter of 0.1 mm, and a wire spacing of 0.15 mm is prepared as the base member 21, and the aluminum braid is immersed in ethanol for degreasing treatment.

[0292] In the surface preparation sub-step S2-2, the conditions for the first anodization include using 0.3 M oxalic acid as the formation solution, a formation voltage of 40 V, and a formation time of 30 minutes. The acidic solution used to remove the intermediate structure 22 is a mixed solution of 1.8 wt% chromic acid (produced by Macklin) and 6 wt% phosphoric acid, and the temperature of the solution is 30°C. The aluminum braid having the metal oxide layer after the first anodization is immersed in the mixed solution to remove the metal oxide layer.

[0293] In this embodiment, the acidic solution used to remove the intermediate structure includes phosphoric acid and chromic acid. The phosphoric acid helps to dissolve the metal oxide layer, and the chromic acid forms a very thin insoluble oxide layer, i.e., the passivation layer 14, on the surface of the intermediate base member after the metal oxide layer is dissolved, which prevents the metal of the intermediate base member from being further dissolved.

[0294] In the structure formation sub-step S2-3, the conditions for the second anodization include using 0.3 M oxalic acid as the formation solution, a formation voltage of 40 V, and a formation time of 30 minutes.

[0295] In this embodiment, the other steps are basically the same as in Embodiment 1.

[0296] The average pore diameter of the fine pores 123 of the photocatalytic member 100 prepared by the method of this embodiment is about 70 nm, the porosity is 50%, and the light absorption rate of the photocatalytic member 100 is 100%.

[0297] Figure 20 is a scanning electron microscope image of the photocatalytic member during the manufacturing process in this embodiment, wherein, Figure 20Image (a) shows the state of the aluminum braid after the first anodizing and removal of the metal oxide layer. Figure 20 (b) shows the state of the metal oxide layer formed after the second anodizing.

[0298] like Figure 20 As shown in (a), after the first anodizing and the removal of the metal oxide layer, the surface of the aluminum braided fabric forms multiple recesses arranged in a relatively regular pattern. Figure 20 As shown in (b), during the second anodizing process, each recess becomes the starting point for the formation of new micropores, thus achieving the formation of a smooth porous structure. As a result, a porous structure with more uniform pore size and better regularity is obtained.

[0299] contrast Figure 20 (b) and Figure 11 In image (c) (an image of aluminum braided fabric after a single anodizing and pore enlargement process), the differences in surface structure are clearly visible. The pore size obtained after a second anodizing process is more uniform.

[0300] Furthermore, the photocatalytic component 100 (photocatalytic filter) obtained by the method of this embodiment was tested for photocatalytic properties under the same conditions as in Example 1. The results showed that, with an initial concentration of 30 ppm, the concentration decreased to 0.5 ppm after 13 minutes. This result indicates that, compared with Example 1, the photocatalytic component 100 of this embodiment has superior purification characteristics.

[0301] <Function and Effect of Example Eleven>

[0302] According to the photocatalytic component, purification device, and manufacturing method of the photocatalytic component provided in this embodiment, due to the surface preparation process, multiple recesses are first formed on the surface of the substrate component through a first anodizing process. After removing the oxide layer formed by the first anodizing process with an acidic solution, a second anodizing process is performed to form a layered structure with regular fine pores. In the second anodizing process, new fine pores can be formed starting from the surface recesses, thus obtaining a more regular fine pore structure. The straightness of the fine pores is better, and the opening ratio is better guaranteed, thereby further increasing the surface area, improving the uniformity and adhesion of the photocatalyst, and further improving the photocatalytic effect.

[0303] In addition, when the solution used to remove the oxide layer formed by the first anodizing contains chromic acid, a passivation layer will form on the surface after the oxide dissolves, which can prevent the base metal from dissolving further.

[0304] Example 12

[0305] The present embodiment provides a photocatalyst member, a purification treatment device, and a method for manufacturing a photocatalyst member. In the present embodiment, the same reference numerals are given to the same constituent elements as those in Embodiment 11, and the corresponding description is omitted.

[0306] The method for manufacturing a photocatalyst member in the present embodiment is different from that in Embodiment 11.

[0307] <Method for manufacturing a photocatalyst member>

[0308] In the surface preparation sub-process S2-2, the conditions for the first anodization include using 0.3 M oxalic acid as the formation solution, a formation voltage of 40 V, and a formation time of 16 hours. The acidic solution used to remove the intermediate structure 22 is a mixed solution of 1.8 wt% chromic acid (produced by Macklin) and 6 wt% phosphoric acid, and the temperature of the mixed solution is 30°C. The aluminum woven fabric after the first anodization, which forms a metal oxide layer, is immersed in the mixed solution to remove the metal oxide layer. That is, the main difference from Embodiment 11 is that the time for the first anodization is longer.

[0309] In the present embodiment, the other processes are basically the same as those in Embodiment 11.

[0310] The average pore diameter of the fine pores 123 of the photocatalyst member 100 prepared by the method of the present embodiment is about 70 nm, the porosity is 50%, and the light absorption rate of the photocatalyst member 100 is 100%.

[0311] Figure 21 is a scanning electron microscope image of the photocatalyst member during the manufacturing process in the present embodiment. As shown in Figure 21 , the photocatalyst member prepared by the method of the present embodiment has regular fine pores with a high uniform pore diameter, and by extending the time for the first anodization, an aluminum woven fabric with a long-range regular arrangement of pore structure can be obtained.

[0312] <Effects of Embodiment 12>

[0313] According to the photocatalyst member, the purification treatment device, and the method for manufacturing a photocatalyst member provided in the present embodiment, since the time for the first anodization is extended, an aluminum woven fabric with a long-range regular arrangement of pore structure can be obtained.

[0314] Embodiment 13

[0315] The present embodiment provides a photocatalyst member, a purification treatment device, and a method for manufacturing a photocatalyst member. In the present embodiment, the same reference numerals are given to the same constituent elements as those in Embodiment 11, and the corresponding description is omitted.

[0316] The difference from Example 11 is that the manufacturing method of the photocatalyst member of the present embodiment is different.

[0317] <Manufacturing method of photocatalyst member>

[0318] Figure 22 is a flowchart of the layer structure forming step in the present embodiment, Figure 23 is a structural schematic diagram in the layer structure forming step in the present embodiment.

[0319] As Figure 22 and Figure 23 In the manufacturing method of the photocatalyst member of the present embodiment, the surface preparation sub-step S2-2 includes three anodization operations S2-2-1 to S2-2-3 and an oxide removal operation S2-2-4, compared with Example 11. And in the oxide removal operation S2-2-4, only part of the anodization layer is selectively removed.

[0320] Specifically, in the base member preparation step S1, the aluminum braid is also prepared as the base member 21.

[0321] In the first anodization operation S2-2-1, the base member 21 is subjected to the first anodization, and the conditions of the first anodization include: using 0.3 M oxalic acid as the formation solution, the formation voltage is 40 V, and the formation time is 16 hours. Through the first anodization, the first oxide layer 22a with a plurality of hole portions 221 is formed, and the first intermediate core 23a covered thereby, and the whole is taken as the first intermediate base member. Figure 23 As shown in (a) of

[0322] In the second anodization operation S2-2-2, the first intermediate base member is subjected to the second anodization, and the conditions of the second anodization include: using high-concentration sulfuric acid of 12 M or more as the formation solution. Through the second anodization, the high-sulfuric acid formation anodization film is formed as the second oxide layer 22b, and the second intermediate core 23b covered thereby is formed, and the first oxide layer 22a is covered on the outer surface of the second oxide layer 22b, and the whole is taken as the second intermediate base member, and a plurality of holes connected in the two oxide layers are formed.

[0323] In the third anodization operation S2-2-3, the second intermediate base member is subjected to a third anodization, and the conditions of the third anodization are the same as those of the first anodization. A third oxide layer 22c and a coated third intermediate core 23c are formed by the third anodization, and the first oxide layer 22a and the second oxide layer 22b are covered on the third oxide layer 22c, and the three oxide layers together constitute the intermediate structure 22.

[0324] In the oxide removal operation S2-2-4, part of the intermediate structure 22 is selectively removed. Specifically, the intermediate structure 22 is immersed in an acid solution, and since a large number of sulfate ions are absorbed in the second oxide layer 22b formed by high-concentration sulfuric acid, the solubility thereof is increased, and thus the second oxide layer 22b is more easily dissolved and removed. After the second oxide layer 22b is dissolved and removed, the first oxide layer 22a is separated from the third oxide layer 22c due to the loss of connection, and thus only the third oxide layer 22c is retained. The third oxide layer 22c formed by the third anodization has improved pore arrangement regularity and a function of preventing further dissolution of the aluminum braid.

[0325] In the structure formation sub-process S2-3, the base member having a plurality of recesses is subjected to a fourth anodization, and the conditions of the fourth anodization are the same as those of the first anodization, and thus the layer structure 12 and the core 11 are formed.

[0326] The average pore diameter of the fine pores 123 of the photocatalytic member 100 prepared by the method of the present embodiment is about 70 nm, and the porosity is 50%. The light absorption rate of the photocatalytic member 100 is 100%.

[0327] This four-time anodization process is particularly suitable for the case where the metal fine wire is aluminum, and the effect is particularly remarkable.

[0328] In the present embodiment, the other processes are basically the same as those in Embodiment XI.

[0329] <Effects of Embodiment XIII>

[0330] According to the photocatalytic member, the purification treatment device, and the method for manufacturing the photocatalytic member provided by the present embodiment, since three oxide layers are formed by three-time anodization in the surface preparation process, and the second oxide layer of the intermediate layer has higher solubility due to different anodization conditions, part of the oxide layer can be selectively removed in the subsequent process, and the third oxide layer formed by the third anodization is retained. Since the recesses on the surface of the retained third oxide layer have improved pore arrangement regularity, the fourth anodization can form new fine pores starting from these recesses, and thus a metal oxide layer with excellent pore arrangement regularity and uniformity of pore diameter can be obtained by this method.

[0331] Example Fourteen

[0332] This embodiment provides a kind of photocatalytic component, purification treatment device and the manufacturing method of photocatalytic component, in this embodiment, for the same constituent element in example one is given the same symbol and the corresponding description is omitted.

[0333] Compared with example one, the difference is that the structure of the photocatalytic component of this embodiment and its manufacturing method are different.

[0334] <Structure of photocatalytic component>

[0335] Figure 24 It is the sectional view of photocatalytic component in this embodiment.

[0336] As shown in Figure 24 In this embodiment, fine hole 123 is a composite hole, each fine hole 123 includes main hole part 1231 and a plurality of auxiliary hole parts 1232. Among them, main hole part 1231 is roughly cylindrical hole with round bottom, and its extension direction is the center line direction of fine hole 123. A plurality of auxiliary hole parts 1232 are also roughly cylindrical holes with round bottom, and their hole diameter and depth are much smaller than those of main hole part 1231. Each auxiliary hole part 1232 communicates with main hole part 1231, and the opening of auxiliary hole part 1232 is located on the side wall or bottom surface of main hole part 1231. The extension direction of auxiliary hole part 1232 is roughly perpendicular to the surface direction of the side wall part or bottom surface part of main hole part 1231 at its location. A plurality of auxiliary hole parts 1232 are uniformly distributed along the side wall and bottom surface of main hole part 1231. Through a plurality of auxiliary hole parts 1232, the surface area of fine hole 123 and the binding strength with photocatalytic material 13 can be further increased.

[0337] In this embodiment, other structures are basically the same as in example one.

[0338] <Manufacturing method of photocatalytic component>

[0339] In order to form the above-mentioned composite hole structure, the manufacturing method of this embodiment is different in structure forming sub-process S2-3.

[0340] In anodic oxidation, anodic oxidation can be carried out at a certain formation voltage first, and then the formation voltage is changed to continue the formation treatment. By this method, a hole structure with varying hole spacing and hole diameter in the depth direction can be obtained. In particular, anodic oxidation is carried out at a larger formation voltage first, and then formation treatment is carried out at a smaller formation voltage, so that a porous structure with larger surface area and good photocatalytic fixation ability can be obtained, for example, the above-mentioned fine hole 123 with main hole part 1231 and a plurality of auxiliary hole parts 1232 can be formed.

[0341] In the structure forming sub-process S2-3 of the present embodiment, anodization is first performed under a predetermined first condition, and then anodization is continued under a predetermined second condition, and wherein the formation voltage in the first condition is higher than the formation voltage in the second condition, to form a composite pore structure having the above structure.

[0342] Specifically, anodization is first performed using 0.2 M phosphoric acid as the formation liquid at a formation voltage of 195 V. Thereafter, the formation liquid is changed to 0.3 M oxalic acid, and anodization is performed at a formation voltage of 40 V. In this way, the composite pore structure of the fine pores 123 having a period of 0.5 μm and the sub-pore portions 1232 having a period of 0.1 μm inside thereof can be obtained.

[0343] Figure 25 is a schematic view of the structure in the layer structure forming process in the present embodiment.

[0344] As shown in Figure 25 , the main pore portions 1231 are first formed by anodization under the first condition, and then the sub-pore portions 1232 are further formed on the side wall surfaces and the bottom surfaces of each of the main pore portions 1231 by continued anodization under the second condition.

[0345] In the present embodiment, the other processes are basically the same as in Embodiment 1.

[0346] <Effects of Embodiment Fourteen>

[0347] According to the photocatalytic member, the purification treatment device, and the method for manufacturing a photocatalytic member provided in the present embodiment, by anodization treatment of first increasing the formation voltage and then decreasing the voltage, fine pores having a composite pore structure can be manufactured, thereby obtaining a larger surface area, and the photocatalyst can be better fixed by the composite pore structure, and further preventing the photocatalyst from peeling off.

[0348] Embodiment Fifteen

[0349] The present embodiment provides a photocatalytic member, a purification treatment device, and a method for manufacturing a photocatalytic member, and in the present embodiment, the same reference numerals are given to the same constituent elements as in Embodiment One, and the corresponding description is omitted.

[0350] Compared with Embodiment One, the difference lies in the structure of the photocatalytic member and the method for manufacturing the same.

[0351] <Structure of the Photocatalytic Member>

[0352] Figure 26 is a cross-sectional view of the photocatalytic member in the present embodiment.

[0353] As shown in Figure 26As shown, the photocatalytic member 10 also includes the core 11, the layer structure 12 having a plurality of regular fine holes 123, and the photocatalytic substance 13. However, the photocatalytic substance 13 is in a thin layer shape, covers the outer surface of the layer structure 12 and the inner wall surface of the plurality of fine holes 123, and does not fill the entire fine holes 123. That is, the photocatalytic substance 13 still retains the fine hole structure, and the photocatalytic substance 13 also has a plurality of fine holes 131. In this embodiment, other structures are basically the same as those in Embodiment 1.

[0354] <Method for manufacturing photocatalytic member>

[0355] In the photocatalytic substance forming step S3, a thin photocatalyst is deposited on the layer structure 12 by an atomic layer deposition (ALD) method to form the photocatalytic substance 13 that covers the inner wall surface of the plurality of fine holes 123 while retaining the fine hole structure. The conditions for atomic layer deposition are the same as those in Embodiment 1, and a 20 nm thick titanium dioxide layer is deposited as the photocatalytic substance 13 by 100 cycles.

[0356] In this embodiment, other steps are basically the same as those in Embodiment 1.

[0357] <Effects of Embodiment 15>

[0358] According to the photocatalytic member, the purification treatment device, and the method for manufacturing a photocatalytic member provided in this embodiment, since the photocatalyst layer is formed along the surface of the layer structure and the inner wall surface of each fine hole, the fine hole structure is retained after the photocatalyst is coated, water or air can contact the photocatalyst formed inside the fine hole, and thus the surface area of the photocatalyst can be increased, thereby improving the efficiency of the photocatalyst.

[0359] Embodiment 16

[0360] This embodiment provides a photocatalytic member, a purification treatment device, and a method for manufacturing a photocatalytic member. In this embodiment, the same reference numerals are given to the same constituent elements as those in Embodiment 1, and the corresponding description is omitted.

[0361] Compared with Embodiment 1, the difference is that the structure of the photocatalytic member and the method for manufacturing the photocatalytic member in this embodiment are different.

[0362] <Structure of photocatalytic member>

[0363] Figure 27 is a sectional view of the photocatalytic member in this embodiment.

[0364] As shown in Figure 27 the photocatalytic member 10 includes the core 11 and the layer structure 12 having a plurality of regular fine holes 123, and the shape is basically the same as that in Embodiment 1, that is, compared with Embodiment 1, the photocatalytic member 10 in this embodiment does not have the photocatalytic substance 13.

[0365] wherein the layer structure 12 has photocatalytic activity, for example, the core 11 is titanium and the layer structure 12 is titanium dioxide.

[0366] In this embodiment, other structures are substantially the same as in Embodiment 1.

[0367] <Method for manufacturing a photocatalytic member>

[0368] Figure 28 is a flowchart of the method for manufacturing a photocatalytic member in this embodiment.

[0369] As shown in Figure 28 , the manufacturing method of this embodiment only includes a base member preparation step S1 and a layer structure formation step S2, and since the layer structure 12 itself has photocatalytic activity, there is no need to further perform a photocatalytic substance formation step, i.e., the photocatalytic imparting step only includes the layer structure formation step.

[0370] In the base member preparation step S1, titanium metal filaments are woven into a titanium woven fabric, and a portion of the titanium woven fabric is cut from the titanium woven fabric as a base member, the mesh count of the base member is 100, the wire diameter is 0.1 mm, and the wire spacing is 0.15 mm.

[0371] In the layer structure formation step S2, the titanium base member is anodized, and the anodizing conditions include: using a mixed solution of 3.5% by weight of sulfuric acid (H2SO4) and 2.5% by weight of phosphoric acid (H3PO4) as a formation solution (electrolyte), gradually increasing the formation voltage from a low voltage to 180 V, at which time spark discharge is observed, and then continuing to increase the formation voltage to 260 V over a period of 20 minutes. A titanium dioxide layer having a plurality of fine pores is formed as the layer structure 12 by anodization.

[0372] The average pore diameter of the fine pores 123 of the photocatalytic member 100 prepared by the method of this embodiment is about 1.1 μm, and the light absorption rate of the photocatalytic member 100 is 100%.

[0373] Figure 29 is a scanning electron microscope image of the titanium woven fabric after anodization in this embodiment, Figure 29 (a) in is a low magnification image, Figure 29 (b) in is a high magnification image.

[0374] As shown in Figure 29 , after anodization, a metal oxide layer (titanium dioxide layer) is formed on the surface of the titanium woven fabric, and on the surface of the metal oxide layer, crater-shaped holes formed by spark discharge can be seen.

[0375] <Evaluation of purification performance>

[0376] The photocatalytic member 100 prepared by the method of this example (i.e., a photocatalytic filter screen without further coating of a photocatalyst) was subjected to a test of decomposition of pollutants under the same test conditions as in Example 1. The results showed that 10% of acetaldehyde was decomposed and removed within 1 hour. Thus, the photocatalytic filter screen obtained by the method of this example exhibited photocatalytic activity even without coating of a photocatalyst. In this photocatalytic filter screen, the metal oxide layer having a plurality of fine pores is an anodized film, the metal oxide layer is a titanium oxide layer, and the photocatalytic function is exhibited.

[0377] Further, on the basis of the photocatalytic member 100 prepared by the method of this example, a photocatalyst was further coated on the layer structure 12 by the same method as in Example 1, and heat treatment was performed at 200°C for 30 minutes to cure the photocatalyst, thereby forming a photocatalytic filter screen coated with a photocatalyst, and a test of decomposition of pollutants was performed on the photocatalytic filter screen under the same test conditions as in Example 1. The results showed that 94% of acetaldehyde was decomposed and removed within 1 hour.

[0378] <Effects of Example 16>

[0379] According to the photocatalytic member, the purification treatment device, and the method for manufacturing a photocatalytic member provided in this example, since the base member is formed of a titanium metal fine wire, the titanium oxide layer generated by anodization itself has a photocatalytic activity, and thus the photocatalytic member can be obtained after anodization without a photocatalyst formation step, and the cost and the number of steps can be reduced. Further, since the titanium oxide layer has a plurality of fine pores, the surface area is large, and thus a better photocatalytic effect can be achieved.

[0380] Example 17

[0381] This example provides a photocatalytic member, a purification treatment device, and a method for manufacturing a photocatalytic member. In this example, the same reference numerals are given to the same constituent elements as in Example 16, and the corresponding description is omitted.

[0382] Compared with Example 16, the difference is that the method for manufacturing a photocatalytic member is different in this example.

[0383] <Method for manufacturing a photocatalytic member>

[0384] In the base member preparation step S1, a titanium braid was prepared in the same manner.

[0385] In the layer structure forming step S2, the base member of titanium is anodized, and the anodizing conditions include: using 0.2 M of ammonium fluoride (NH4F, produced by Sinopharm) and ethylene glycol containing 0.3 weight percent of water (H2O) as the formation solution (electrolyte), the formation voltage is 50 V, and the formation time is 10 minutes. Then, the formed anodized layer is heated to crystallize the titanium dioxide, specifically, heated at 450°C for 3 hours in the atmosphere to crystallize the titanium dioxide, thereby forming the layer structure 12.

[0386] In this embodiment, other procedures are the same as in Embodiment Fifteen.

[0387] The average pore diameter of the fine pores 123 of the photocatalytic component 100 prepared by the method of this embodiment is about 0.9 μm, and the light absorption rate of the photocatalytic component 100 is 100%.

[0388] Figure 30 is a scanning electron microscope image of the titanium braid after anodization in this embodiment. As shown in Figure 30 , after anodization, a metal oxide layer with a porous structure is formed on the surface of the titanium braid.

[0389] <Performance evaluation>

[0390] The photocatalytic component 100 prepared by the method of this embodiment (i.e., the photocatalytic filter screen without further coating of the photocatalyst) is tested for pollutant decomposition under the same test conditions as in Embodiment One. The results show that 40% of the acetaldehyde is removed within 1 hour. Therefore, the photocatalytic filter screen obtained by the method of this embodiment exhibits photocatalytic activity even without coating of the photocatalyst. In this photocatalytic filter screen, the metal oxide layer with multiple fine pores is an anodized film, the metal oxide layer is a titanium dioxide layer, and it has photocatalytic function.

[0391] In addition, based on the photocatalytic component 100 prepared by the method of this embodiment, the photocatalyst is further coated on the layer structure 12 using the same method as in Embodiment One, and heat treatment is performed at 200°C for 30 minutes to solidify the photocatalyst, thereby forming a photocatalytic filter screen coated with the photocatalyst, and the photocatalytic filter screen is tested for pollutant decomposition under the same test conditions as in Embodiment One. The results show that 74% of the acetaldehyde is decomposed and removed within 1 hour.

[0392] <Effects of Embodiment Seventeen>

[0393] According to the photocatalytic member, the purification treatment device, and the method for manufacturing the photocatalytic member provided in the present embodiment, since the base member is formed of the titanium metal fine wire, the titanium dioxide layer generated by anodization itself has photocatalytic activity, and thus the photocatalytic member can be obtained after anodization, without the need for a photocatalytic material forming step. Therefore, the present embodiment has the advantages of being able to reduce costs and reduce the number of steps. In addition, since the titanium dioxide layer has a plurality of pores, the surface area is large, and thus the photocatalytic efficiency is improved.

[0394] Embodiment 18

[0395] The present embodiment provides a photocatalytic member, a purification treatment device, and a method for manufacturing the photocatalytic member. In the present embodiment, the same reference numerals are assigned to the same constituent elements as in Embodiment 16, and the corresponding descriptions are omitted.

[0396] Compared with Embodiment 16, the difference is that the method for manufacturing the photocatalytic member of the present embodiment is different.

[0397] <Method for manufacturing a photocatalytic member>

[0398] In the base member preparation step S1, the titanium braid is prepared in the same manner.

[0399] The layer structure formation step S2 is similar to the step S2 of Embodiment 11, and includes a surface pretreatment sub-step S2-1, a surface preparation sub-step S2-2, and a structure formation sub-step S2-3.

[0400] In the surface pretreatment sub-step S2-1, the titanium braid is subjected to a degreasing treatment.

[0401] In the surface preparation sub-step S2-2, the base member of titanium is subjected to a first anodization. The conditions for the first anodization include using a mixed solution of 3.5% by weight of sulfuric acid and 2.5% by weight of phosphoric acid as a formation solution, gradually increasing the formation voltage from a low voltage to 180 V, at which time spark discharge is observed, and then continuing to increase the formation voltage to 260 V over a period of 20 minutes. The titanium dioxide layer having a plurality of pores is formed by the first anodization. Then, the titanium dioxide layer is removed by an acidic solution to obtain an intermediate base member having a plurality of recesses on the surface.

[0402] In the structure formation sub-step S2-3, the intermediate base member having recesses on the surface is subjected to a second anodization. The conditions for the second anodization are the same as those for the first anodization, and a layer structure 12 having a plurality of regular fine pores 123 is obtained. The other steps are the same as in Embodiment 16.

[0403] <Effects of Embodiment 18>

[0404] According to the photocatalytic component, the purification treatment device and the manufacturing method of the photocatalytic component provided by the embodiment, similar to the embodiment eleven, because the intermediate base member with the concave part is formed by the first anodization and the oxide removal first, and then the second anodization is performed, in the second anodization, the new fine hole can be formed with the concave part as the starting point, so that the new fine hole formed has better regularity, and also has better straightness and opening rate, thereby increasing the surface area of the layer structure (i.e. the photocatalytic material) and improving the photocatalytic effect.

[0405] The above embodiments are only used for illustrating the specific embodiments of the present application, and the present application is not limited to the description range of the above embodiments. It should be understood by those skilled in the art that the present application is not limited by the above embodiments, and the above embodiments and the description in the specification are only used for illustrating the principles of the present application. Without departing from the spirit and scope of the present application, various changes and improvements can be made to the present application, and these changes and improvements all fall within the scope of the present application. The scope of protection of the present application is defined by the appended claims and their equivalents.

Claims

1. A photocatalytic component, characterized in that, include: At least one photocatalytic component, Each of the photocatalytic components includes: The core is made of metal; A layered structure, formed from an anodized oxide of the metal and covering the core, is formed by a structure-forming sub-step within the layered structure-forming process; and Photocatalyst, formed by a photocatalyst formation process, covers the layer structure. The layered structure contains numerous regularly spaced fine pores. The regular fine pores are formed through a pore size control sub-process in the layer structure formation process. In this pore size control sub-process, the layer structure is etched with an acidic solution to control the pore size. The fine pores include: The main hole is a strip-shaped hole; and Multiple secondary holes are distributed on the sidewalls and bottom surface of the main hole and are connected to the main hole. The diameter and depth of the secondary holes are smaller than those of the main hole. The surface of the layered structure includes the inner wall surfaces of a plurality of the fine pores. The photocatalyst is layered and covers the surface of the layered structure.

2. The photocatalytic component according to claim 1, characterized in that, Also includes: A passivation layer, consisting of an oxide of the metal that is insoluble in acidic solutions, covers the surface of the core.

3. The photocatalytic component according to claim 1, characterized in that: in, The photocatalytic component is in the form of a thin wire or a thin plate. When the photocatalytic component is in the form of a thin thread, multiple photocatalytic components intersect to form a woven fabric or non-woven fabric.

4. The photocatalytic component according to claim 3, characterized in that: in, When the photocatalytic component is in the form of a thin wire, its diameter is 1 μm to 5 mm.

5. The photocatalytic component according to claim 1, characterized in that: in, The metal is aluminum, titanium, tungsten, copper, vanadium, niobium or an alloy thereof, or stainless steel.

6. The photocatalytic component according to claim 1, characterized in that: in, The photocatalyst covers the surface of the layered structure and fills the pores.

7. The photocatalytic component according to any one of claims 1-6, characterized in that: in, The average pore size of the micropores is 5 nm to 1000 nm.

8. The photocatalytic component according to claim 7, characterized in that: in, The average pore size of the micropores is 20 nm to 500 nm.

9. The photocatalytic component according to any one of claims 1-6, characterized in that: in, The relative standard deviation of the pore size distribution is less than or equal to 40%.

10. The photocatalytic component according to claim 9, characterized in that: in, The relative standard deviation of the pore size distribution is less than or equal to 20%.

11. The photocatalytic component according to any one of claims 1-6, characterized in that: in, The porosity of the fine pores is 10% to 90%.

12. The photocatalytic component according to any one of claims 1-6, characterized in that: in, The light absorption rate of the photocatalytic component is 5%~100%.

13. The photocatalytic component according to any one of claims 1-6, characterized in that: in, The thickness of the layered structure is 40 nm to 1000 nm.

14. A purification treatment apparatus for purifying gases or liquids, characterized in that, include: The photocatalytic component as described in any one of claims 1-13.

15. The purification treatment apparatus according to claim 14, characterized in that, Also includes: A light source is used to irradiate the photocatalytic component to induce a photocatalytic reaction.

16. The purification treatment apparatus according to claim 15, characterized in that: in, The photocatalytic components are multiple. The light source is disposed among the plurality of photocatalytic components.

17. A method for manufacturing a photocatalytic component comprising at least one photocatalytic element, characterized in that, include: The substrate component fabrication process involves fabricating a metal substrate component. as well as Photocatalytic ablation process, The photocatalytic ablation process includes: The layered structure forming process involves anodizing a metal substrate to form a layer of anodic oxide with multiple regularly spaced fine pores, which serves as the layered structure, and then forming a core encapsulated by the layered structure; and In the photocatalyst formation process, a photocatalyst is disposed on the layered structure to form a photocatalyst that covers the layered structure and fills the pores. The layer structure forming process includes: The surface pretreatment sub-process is used to pretreat the surface of the substrate component; The structure forming sub-step involves anodizing the pretreated substrate component to form the layered structure with multiple fine pores and the core; and The pore size control sub-process involves etching the layer structure with an acidic solution to control the pore size, thereby forming the layer structure with multiple regularly spaced pores. The fine pores include: The main hole is a strip-shaped hole; and Multiple secondary holes are distributed on the sidewalls and bottom surfaces of the main hole and are connected to the main hole respectively. The diameter and depth of the secondary holes are smaller than those of the main hole.

18. The manufacturing method according to claim 17, characterized in that: in, In the substrate component fabrication process, one or more metal wires or metal sheets are prepared as the substrate component. The metal is aluminum, titanium, tungsten, copper, vanadium, niobium or their alloys or stainless steel.

19. The manufacturing method according to claim 17, characterized in that: in, In the photocatalyst formation process, the photocatalyst is coated onto the layered structure by means of coating, electrodeposition, sol-gel, chemical vapor deposition or atomic layer deposition.

20. The manufacturing method according to claim 17, characterized in that: in, In the substrate component fabrication process, one or more metal wires or metal sheets are prepared as the substrate component. The metal is titanium, and the anodic oxide of the metal is titanium dioxide.

21. The manufacturing method according to claim 17, characterized in that: in, In the structure formation sub-process, the anodizing is first performed under predetermined first conditions, and then the anodizing is continued under predetermined second conditions. The formation voltage in the first condition is higher than the formation voltage in the second condition.

22. A method for manufacturing a photocatalytic component comprising at least one photocatalytic element, characterized in that, include: The substrate component fabrication process involves fabricating a metal substrate component. as well as Photocatalytic ablation process, The photocatalytic ablation process includes: The layered structure forming process involves anodizing a metal substrate to form a layer of anodic oxide with multiple regularly spaced fine pores, which serves as the layered structure, and then forming a core encapsulated by the layered structure; and In the photocatalyst formation process, a photocatalyst is disposed on the layered structure to form a photocatalyst that covers the layered structure and fills the pores. The layer structure forming process includes: The surface pretreatment sub-process is used to pretreat the surface of the substrate component; A surface preparation sub-step is used to prepare the surface of the pretreated substrate component, forming multiple recesses on the surface; and The structure forming sub-process is used to perform the anodizing on the base component having the plurality of said recesses, thereby forming the layered structure and the core. The surface preparation sub-step includes: By performing one or more anodizing processes on the substrate component, an anolyte with multiple pores is formed as an intermediate structure, and an intermediate core is formed encapsulated by the intermediate structure. Multiple recesses are formed on the surface of the intermediate core that contacts the intermediate structure. The intermediate structure is removed by an acidic solution to obtain an intermediate core having multiple recesses, which serves as the base component having multiple recesses.

23. The manufacturing method according to claim 22, characterized in that: in, The acidic solution contains chromic acid. In the surface preparation sub-step, after the intermediate structure is removed by the acidic solution, a passivation layer is formed on the surface of the substrate component having the plurality of recesses.

24. The manufacturing method according to claim 17, characterized in that: in, The conditions for anodizing include: the forming solution contains oxalic acid, the forming voltage is 30V~80V, and the forming time is 5 minutes~60 minutes.

25. The manufacturing method according to claim 17, characterized in that: in, The multiple base components are woven or nonwoven fabrics composed of multiple metal wires. When the base component is the woven fabric, the anodizing is performed through a partially conductive method. When the substrate component is the nonwoven fabric, the anodizing is performed under conditions in which pressure is applied to the substrate component to compress it.

26. The manufacturing method according to claim 17, characterized in that: in, In the substrate component preparation process, one or more metal wires are prepared as the substrate component by drawing, melt spinning, coil cutting or vibration cutting.

Images