Volume calibration method of front-end tubing, controller and gas mass flow verification system

Abstract

Embodiments of the present application relate to the technical field of semiconductor manufacturing, and particularly relate to a front-end pipeline volume calibration method, a controller and a gas mass flow verification system. Embodiments of the present application utilize the diffusion of a target molar gas in a calibration tank to a first pipeline space, and obtain an accurate second volume calibration parameter of the calibration tank when the first pipeline space is in a stable state of the gas. In this way, in combination with the first volume calibration parameter and the first volume of the calibration tank when the fourth valve is in a closed state, an accurate and high-precision target volume of the first pipeline space is calculated, which meets the requirements of semiconductor processes on volume accuracy. In combination with the second volume of the second pipeline space and the third volume of the third pipeline space, an accurate and high-precision fourth volume of the fourth pipeline space is calculated, which meets the requirements of semiconductor processes on volume accuracy.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a volume calibration method, controller, and gas mass flow verification system for a front-end pipeline. Background Technology

[0002] In semiconductor manufacturing processes, precise gas supply to the process chamber is a key prerequisite for achieving high-precision control of each step. Therefore, the accuracy of gas flow control to the process chamber is crucial—flow control errors will directly affect the quality of the finished wafer.

[0003] Semiconductor manufacturing environments are complex scenarios with multiple machines, chambers, and gas input paths. Each gas source is equipped with a corresponding mass flow controller (MFC) to regulate the gas flow rate entering the process chamber. However, the individual differences between the MFCs equipped with different gas sources make it difficult to guarantee the consistency of mass flow output across multiple machines, chambers, and gas paths.

[0004] Meanwhile, factors such as changes in chamber ambient temperature, volume differences, pressure measurement accuracy, as well as large gas consumption or long measurement time during the measurement process, will further affect the measurement accuracy of MFC; this directly leads to the difficulty in ensuring the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0005] In related technologies, although the performance of MFC is improved by optimizing its structure or control logic, it is still difficult to achieve accurate measurement of its output gas, which cannot meet the stringent requirements of semiconductor processes for gas flow measurement accuracy. Summary of the Invention

[0006] One objective of this application is to provide a volume calibration method, controller, and gas mass flow rate verification system for front-end pipelines, applied to gas mass flow rate verification systems, to solve the technical problems in related technologies where individual differences and interference from multiple factors such as chamber environment and other factors lead to differences in flow output and the lack of further measurement verification in MFCs with multiple machines, multiple chambers, and multiple gas paths.

[0007] In a first aspect, embodiments of this application provide a volume calibration method for a front-end pipeline, applied to a gas mass flow verification system. The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The volume calibration method includes:

[0008] In response to the calibration vessel being filled with the target molar of gas, the first volume verification parameter of the calibration vessel is obtained with the fourth valve closed, and the volume of the calibration vessel is the known first volume;

[0009] In response to the first pipeline space entering a vacuum state, the gas in the control calibration tank diffuses only into the first pipeline space. The first pipeline space is composed of the second pipeline space, the third pipeline space, and the fourth pipeline space. The second pipeline space is the pipeline space formed between the second valve, the third valve, and the fourth valve. The third pipeline space is the pipeline space formed between the first valve and the second valve. The fourth pipeline space is the pipeline space formed between the output end of the gas output module and the first valve.

[0010] In response to the first pipeline space entering a stable gas state, the second volume verification parameter of the calibration tank is obtained;

[0011] Based on the first volume verification parameter, the second volume verification parameter and the first volume, calculate the target volume of the first pipeline space;

[0012] Determine the second volume of the second piping space and the third volume of the third piping space;

[0013] The fourth volume of the fourth pipeline space is determined based on the target volume, the second volume, and the third volume.

[0014] In a second aspect, embodiments of this application provide a controller, including a memory and a processor, wherein the memory is connected to the processor, and the processor is configured to execute one or more computer programs stored in the memory, wherein when the processor executes the one or more computer programs, the controller enables the front-end pipeline volume calibration method as described in the first aspect.

[0015] Thirdly, embodiments of this application provide a gas mass flow verification system, including a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller as described in the second aspect. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The controller is communicatively connected to the first valve, the second valve, the third valve, the fourth valve, and the gas output module.

[0016] In this embodiment, the target molar gas in the calibration vessel diffuses into the first pipeline space. When the gas in the first pipeline space is in a stable state, the accurate second volume verification parameter of the calibration vessel is obtained. Thus, combined with the first volume verification parameter and the first volume of the calibration vessel when the fourth valve is closed, the accurate and highly precise target volume of the first pipeline space is calculated. Combined with the second volume of the second pipeline space and the third volume of the third pipeline space, the accurate and highly precise fourth volume of the fourth pipeline space is calculated, thus meeting the volume accuracy requirements of semiconductor processes. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the structure of a gas mass flow rate verification system provided in some embodiments of this application;

[0019] Figure 2a Another schematic diagram of the gas mass flow verification system provided in some embodiments of this application;

[0020] Figure 2b A schematic diagram of the piping space and component connections in a gas mass flow verification system provided in some embodiments of this application;

[0021] Figure 2c A schematic diagram illustrating the gas flow detection process performed by the gas mass flow verification system provided in some embodiments of this application;

[0022] Figure 3 A schematic diagram showing the connection between the calibration system and the gas output module in a gas mass flow verification system provided in some embodiments of this application;

[0023] Figure 4 A schematic diagram illustrating the interaction during the calibration volume process in a gas mass flow verification system provided in some embodiments of this application;

[0024] Figure 5 This is a schematic diagram of the controller structure in a calibration system provided in some embodiments of this application;

[0025] Figure 6 A schematic flowchart illustrating a method for calibrating the volume of a front-end pipeline as provided in some embodiments of this application;

[0026] Figure 7 for Figure 6A schematic diagram of a sub-process of step S61 in the volume calibration method for the front-end pipeline shown in the embodiment;

[0027] Figure 8 for Figure 6 A schematic diagram of a sub-process of step S62 in the volume calibration method for the front-end pipeline shown in the embodiment;

[0028] Figure 9 for Figure 6 A schematic diagram of a sub-process of step S64 in the volume calibration method for the front-end pipeline shown in the embodiment;

[0029] Figure 10 for Figure 6 A schematic diagram of a sub-process of step S66 in the volume calibration method for the front-end pipeline shown in the embodiment;

[0030] Figure 11 This is a schematic diagram of the structure of a volume calibration device for a front-end pipeline provided in some embodiments of this application. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of this application. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0032] It should be noted that, unless there is a conflict, the various features in the embodiments of this application can be combined with each other, all of which are within the protection scope of this application. Furthermore, although functional modules are divided in the device schematic diagram and a logical order is shown in the flowchart, in some cases, the steps shown or described can be executed in a different order than the module division in the device or the order in the flowchart. Moreover, the terms "first," "second," and "third" used in this application do not limit the data or execution order, but only distinguish identical or similar items with essentially the same function and effect.

[0033] In semiconductor manufacturing processes, precise gas supply to the process chamber is a key prerequisite for achieving high-precision control of each step. Therefore, the accuracy of gas flow control to the process chamber is crucial—flow control errors will directly affect the quality of the finished wafer.

[0034] Semiconductor manufacturing environments are complex scenarios with multiple machines, chambers, and gas input paths. Each gas source is equipped with a corresponding mass flow controller (MFC) to regulate the gas flow rate entering the process chamber. However, the individual differences between the MFCs equipped with different gas sources make it difficult to guarantee the consistency of mass flow output across multiple machines, chambers, and gas paths.

[0035] Meanwhile, factors such as changes in chamber ambient temperature, volume differences, pressure measurement accuracy, as well as large gas consumption or long measurement time during the measurement process, will further affect the measurement accuracy of MFC; this directly leads to the difficulty in ensuring the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0036] In related technologies, although the performance of MFC is improved by optimizing its structure or control logic, it is still difficult to achieve accurate measurement of its output gas, which cannot meet the stringent requirements of semiconductor processes for gas flow measurement accuracy.

[0037] In view of this, this application provides a gas mass flow rate verification system, which aims to perform the same standard measurement verification on different MFCs in a new way without going through the main chamber, so that a relatively consistent processing result can still be achieved in the complex use of different MFCs and different chambers in the semiconductor manufacturing process.

[0038] In view of this, this application provides a method for calibrating the volume of a front-end pipeline, applied to a gas mass flow verification system. The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller. The calibration tank system includes a calibration tank and a fourth valve. By utilizing the known volume of the calibration tank and the target molar amount of gas already filled into the calibration tank, the target molar amount of gas is diffused into the first pipeline space. The first and second volume calibration parameters of the calibration tank are accurately measured. Combined with the second volume of the second pipeline space and the third volume of the third pipeline space, the volume of the fourth pipeline space is accurately calculated. This achieves accurate measurement of the front-end pipeline volume, improves the accuracy of pipeline volume measurement, and meets the requirements of semiconductor processes for pipeline volume accuracy.

[0039] Please see Figure 1 and Figure 2a , Figure 1 and Figure 2a The schematic diagram illustrates the structure of a gas mass flow verification system provided in some embodiments of this application.

[0040] like Figure 1 and Figure 2aAs shown, the gas mass flow verification system 100 includes a calibration system 110, a calibration tank system 120, and a dry pump 130. The calibration system 110 includes a first valve VAL1, a second valve VAL2, a third valve VAL3, and a controller 111. The calibration tank system 120 includes a calibration tank 121 and a fourth valve VAL4. It should be understood that the first valve VAL1, second valve VAL2, third valve VAL3, and fourth valve VAL4 can all be any suitable type of valve, such as a solenoid valve or a pneumatic diaphragm valve. Engineers can set the first valve VAL1, second valve VAL2, third valve VAL3, and fourth valve VAL4 in any suitable position according to actual needs; this embodiment does not impose any limitations on this.

[0041] The input terminal of the first valve VAL1 is used to connect to the gas output module 103. The output terminal of the first valve VAL1 is connected to the input terminal of the second valve VAL2. The output terminal of the second valve VAL2 is connected to the input terminals of the third valve VAL3 and the fourth valve VAL4 respectively. The output terminal of the third valve VAL3 is used to connect to the dry pump 130. The output terminal of the fourth valve VAL4 is used to connect to the calibration tank 121. The controller 111 is communicatively connected to the first valve VAL1, the second valve VAL2, the third valve VAL3, the fourth valve VAL4, and the gas output module 103. The gas output module 103 includes a gas source ( Figure 1 and Figure 2a (Not shown in the image), Mass Flow Controller (MFC) 1031 and Gas Control Valve VALSec, the gas source is used to provide various types of gas, the Mass Flow Controller 1031 is used to control the flow rate of the gas output from the gas source, and the Gas Control Valve VALSec is used to control the opening or closing of the gas output channel (i.e., the channel from the Mass Flow Controller 1031 to the chamber or the gas mass flow verification system 100).

[0042] Please see Figure 2a and Figure 2b The first pipeline space is composed of the second, third, and fourth pipeline spaces. The target pipeline space is composed of the third and second pipeline spaces. The second pipeline space is the pipeline space formed between the second valve VAL2, the third valve VAL3, and the fourth valve VAL4. The second volume of the second pipeline space is as follows: Figure 2a and Figure 2b The pipeline space volume V2 is shown. The third pipeline space is the pipeline space formed between the first valve VAL1 and the second valve VAL2. The third volume of the third pipeline space is as follows: Figure 2a and Figure 2bThe pipeline space volume V3 is shown. The fourth pipeline space is the pipeline space formed between the output end of the gas output module 103 and the first valve VAL1, and the fourth volume of the fourth pipeline space is shown below. Figure 2a and Figure 2b The pipeline space shown is volume V4. The reference pipeline space is the pipeline space formed between the fourth valve and the calibration vessel 121. The standard pipeline space is composed of the first pipeline space and the reference pipeline space. The fifth pipeline space is composed of the third pipeline space and the fourth pipeline space. The sixth pipeline space is composed of the target pipeline space and the reference pipeline space. The volume of the calibration vessel 121 is the known first volume V1, which can be any suitable volume, such as 326 ml, 286 ml, etc.

[0043] Please see Figure 2c The process of using a gas mass flow verification system to perform gas flow detection on different MFC output gases in this embodiment is as follows:

[0044] First, the airtightness of the pipelines between the gas output module and the gas mass flow verification system, and between the calibration tank and the gas mass flow verification system, is tested, specifically the airtightness of the first pipeline space. The fourth valve VAL4 is closed, while the first valve VAL1, second valve VAL2, and third valve VAL3 are opened, causing the dry pump 130 to perform a vacuum operation, extracting gas from the first pipeline space. It is then determined whether the first pipeline space has entered a stable gas state. After this, the pressure of the first pipeline space is acquired, and after a time interval, it is determined again whether the first pipeline space has entered a stable gas state. Once the first pipeline space has again entered a stable gas state, the pressure is acquired again. The difference between the two pressure acquisitions is calculated, along with the time difference between the two pressure acquisitions. The gas leakage rate of the first pipeline space is obtained by dividing the pressure difference by the time difference. The gas leakage rate is compared with a preset leakage rate threshold. If the gas leakage rate is less than the preset leakage rate threshold, the airtightness of the first pipeline space is determined to be good. If the gas leakage rate is greater than or equal to the preset leakage rate threshold, the airtightness of the first pipeline space is determined to be faulty. The first valve VAL1, the second valve VAL2, and the third valve VAL3 are controlled to enter the closed state, ending the airtightness test.

[0045] In this embodiment, a stable gas state refers to a situation where the pressure fluctuation value of the gas in the pipeline space is less than or equal to the actual judgment pressure threshold after a continuous preset number of samplings. For example, if the pressure fluctuation value of the gas is less than or equal to the actual judgment pressure threshold after 300 consecutive samplings, it indicates that the pipeline space has entered a stable gas state. The actual judgment pressure threshold is calculated as: base threshold × threshold multiplier K. For example, if the base threshold is set to 1 mTorr, and K = 1, then the actual judgment pressure threshold is 1 × 1 = 1 mTorr; if K = 0.8, then the actual judgment pressure threshold is 1 × 0.8 = 0.8 mTorr.

[0046] Then, the gas output module and dry pump are used to purge and evacuate the first pipeline space. Specifically, the gas control valve VALSec of the gas output module is opened, and the first valve VAL1 and the second valve VAL2 are opened, while the third valve VAL3 and the fourth valve VAL4 are closed, isolating the dry pump, calibration tank, and first pipeline space. The gas output module outputs gas to purge the first pipeline space. After the purging time reaches a preset reference duration or the pressure in the first pipeline space reaches a preset reference pressure, it indicates that one purging operation has been completed. The gas control valve VALSec of the gas output module is then closed, and the third valve VAL3 is opened, causing the dry pump to perform a vacuum operation, removing impurities and gases remaining in the first pipeline space after purging. This completes one purging and evacuation operation. It should be understood that the first pipeline space can be purged and emptied using the gas output module and dry pump before and after each gas flow rate detection. Obviously, engineers can purge and empty the first pipeline space once or multiple times as needed, and this application embodiment does not limit this in any way.

[0047] Next, the volume of the external pipeline space is calibrated. This is done by diffusing gas from the calibration tank into the corresponding pipeline space and detecting the volume verification parameters (i.e., pressure and temperature) of the corresponding pipeline space. Based on the volume verification parameters of the corresponding pipeline space and the known first volume of the calibration tank, the volume of the external pipeline space is calculated. Thus, the volume of the external pipeline space is calibrated. The external pipeline space includes a second pipeline space and a third pipeline space.

[0048] Furthermore, the volume of the front-end pipeline space is calibrated. Specifically, gas from the calibration tank is diffused into the first pipeline space to detect its volume verification parameters (i.e., pressure and temperature). Based on these parameters, the known volumes of the first, second, and third pipeline spaces, and the calibration tank itself, the volume of the front-end pipeline space is calculated. This process calibrates the volume of the front-end pipeline space. The front-end pipeline space is the fourth pipeline space.

[0049] Finally, the flow rate of the gas output by the gas output module is detected. That is, the gas flow rate is calculated based on the volume of the external pipeline space and the volume of the front-end pipeline space, combined with the volume verification parameters of the external pipeline space and the front-end pipeline space. In this way, the gas flow rate of the gas output module is detected.

[0050] It is worth noting that after the gas flow rate is measured by the gas mass flow rate verification system 100, the data measured by the gas mass flow rate verification system 100 is fed back to the MFC through an additional flow feedback monitoring system. This allows the MFC to further calibrate the output gas flow rate based on the data measured by the gas mass flow rate verification system 100, thereby achieving precise control of the gas source output gas flow rate. The gas mass flow rate verification system 100 does not directly control the gas flow rate; instead, it feeds back the detected gas flow rate to the MFC, causing the MFC to adjust the valve opening according to the detected gas flow rate, thus controlling the output gas flow rate.

[0051] The first sensing device is installed in the third pipeline space. The first sensing device is configured to detect the pressure and temperature of the third pipeline space. Obviously, the engineers can use any suitable method to install the first sensing device in the third pipeline space according to actual needs, such as by attaching or suspending.

[0052] A second sensing device is installed in the reference pipeline space. The second sensing device is configured to detect the pressure and temperature of the calibration tank 121. Obviously, engineers can use any suitable method to install the second sensing device in the reference pipeline space according to actual needs, such as by attaching or suspending.

[0053] It is worth noting that the third pipeline space is equipped with a first sensing device with a high range and a low range, and the reference pipeline space is equipped with a second sensing device with a high range and a low range. The first and second sensing devices with high range (e.g., 100 Torr) and low range (e.g., 20 Torr) are two independent sets of sensors, signal amplification circuits and ADC circuits, each with a clearly defined effective range.

[0054] The measurement range is categorized as follows: High Range (100 Torr): Effective measurement range 0-100 Torr (sensor, amplifier, and ADC circuit all operate linearly). Low Range (20 Torr): Effective measurement range 0-20 Torr (beyond 20 Torr, the sensor / amplifier becomes non-linear or even saturates, causing ADC data distortion). For example, at 40 Torr, the first and second sensors in the high range will correctly measure 40 Torr, while the first and second sensors in the low range will measure close to 20 Torr. In this case, the pressure and temperature values ​​used for calculation are those detected by the first and second sensors in the high range. Engineers can use the appropriate first and second sensors based on the effective measurement range to detect pressure and temperature, thereby calculating pipeline volume, gas flow rate, etc.

[0055] It is understood that engineers can use appropriate components or devices to connect and fix the various systems, modules, or components in the gas mass flow verification system 100 according to actual needs, or strengthen the airtightness of the corresponding systems, modules, or components, etc. This application embodiment does not impose any limitations in this regard; for example, refer to... Figure 2b Engineers use two connectors at both ends (i.e., input and output ends) of the first valve VAL1, the second valve VAL2, the third valve VAL3, and the fourth valve VAL4. The two connectors are used to connect and fix the valves to the pipeline. Alternatively, ball valves or stop valves can be used to enhance the airtightness of the calibration tank 121.

[0056] In practical applications, the gas mass flow verification system 100 can interface with multiple different gas output modules 103. The controller 111 of the calibration system 110 controls the opening and closing of the gas control valves (VALSec) in these modules, thereby transmitting different types of gas. Alternatively, the gas mass flow verification system 100 can interface with a single gas output module 103 equipped with various gas sources. The controller 111 of the calibration system 110 controls the opening and closing of the gas control valves (VALSec) corresponding to different gas sources within the gas output module 103, thus transmitting different types of gas.

[0057] For example, see Figure 3 As shown, the gas mass flow verification system 100 ( Figure 3 Only the calibration system 110 and the dry pump 130 are shown in the diagram. They are connected to a gas output module 103, which is equipped with oxygen ( ),hydrogen( ) and helium ( There are three gas sources in total. The MFC corresponding to each gas source controls the flow rate of its output gas. The output gas is transported to chamber 400 or gas mass flow verification system 100 through pipeline.

[0058] In practical industrial applications, the gas output module 103 delivers one or more types of gas into the chamber 400 via an MFC (Mechanical Control Controller), where the MFC controls the gas flow rate. For example, if the gas flow rate entering the chamber 400 needs to be controlled to 200 Sccm, originally... If the gas flow rate is 210 Sccm, then the MFC (Mass Flow Controller) will adjust the valve opening to control the gas flow rate at 210 Sccm (but there will be actual deviations; the MFC might actually measure 204 Sccm). This is because different commercial mass flow controllers (MFCs) have usage variations, such as different flow ranges (the measured values ​​will differ between 500 Sccm and 2000 Sccm ranges), and different types of gas also affect gas flow control. The corresponding MFC output gas flow rate is 203 Sccm. The corresponding gas flow rate output by the MFC is 202 Sccm.

[0059] In this embodiment, by measuring the gas flow rate using the gas mass flow rate verification system 100, the gas flow rate measured by the gas mass flow rate verification system 100 can maintain a basically consistent error with the gas flow rate output by the MFC. For example... End gas source, End gas source and The gas flow rates of the end gas source are 203.5 Sccm, 202.5 Sccm, and 201.5 Sccm (each differing by only 0.5 Sccm, or a very small error of 0.1%). The gas flow rate error measured in different chambers 400 also remains within 0.5 Sccm, rather than some gas flow rates deviating by 1 Sccm and others by 3 Sccm. That is, the gas mass flow rate verification system 100 ensures the "consistency" of the gas flow rate measurement error, with a small deviation range and high accuracy.

[0060] Please see Figure 4In some embodiments, the gas mass flow verification system 100 receives sensor values ​​from a first sensor 101 and a second sensor 102 in real time. The sensor values ​​from the first sensor 101 include the temperature and pressure values ​​of the third pipeline space, and the sensor values ​​from the second sensor 102 include the pressure and temperature of the calibration tank 121. After receiving instructions from a host computer 200 (e.g., a computer, server, or other device) via the network, the system responds to each instruction and executes corresponding calculations and actions. For example, it generates and sends a VALSec control command to the gas control valve VALSec of the gas output module 103 to control the opening or closing of the gas control valve VALSec. It is understood that, in addition to the internal calculations of the gas mass flow verification system 100, some instructions will also call data (e.g., temperature and its coefficient, pressure and its coefficient) from an external calibration device 300 via the network according to actual application needs, and execute corresponding calculations and actions. The gas mass flow verification system 100 completes various process instructions by driving internal valves (i.e., its own first valve VAL1, second valve VAL2, third valve VAL3 and fourth valve VAL4) through internal calculations and internal valve control signals, and by driving the gas control valve VALSec of the gas output module 103 through VALSec control commands. Finally, the gas flow calculation results are fed back to the host computer 200 through the network, thereby completing the gas flow detection.

[0061] In some embodiments, please refer to Figure 4 When the gas mass flow verification system 100 is connected to multiple gas output modules 103, the gas mass flow verification system 100 also generates and sends the pressure difference signal of each gas output module 103 to each gas output module 103, so that each gas output module 103 can monitor in real time that the pressure difference of each gas output module 103 is less than the set value, thereby ensuring stable and safe operation, ensuring pressure balance between each gas output module 103 during the production process, and avoiding equipment damage and production accidents caused by pressure fluctuations.

[0062] After the gas flow rate is measured by the gas mass flow rate verification system 100, an additional flow feedback monitoring system further calibrates the output gas flow rate based on the data measured by the gas mass flow rate verification system 100, thereby achieving precise control of the gas source output gas flow rate. Specifically, the gas after reaction in chamber 400 or measurement by the gas mass flow rate verification system 100 can be extracted using a dry pump 130 and stored in a suitable container or used directly; this application embodiment does not impose any limitations on this.

[0063] It is understood that during the gas flow rate measurement process of the gas mass flow verification system 100, the pipeline volume of the calibration system 110 itself needs to be calibrated first. In this embodiment, the volume of the front-end pipeline (i.e., the fourth pipeline space) in the calibration system 110 is calibrated.

[0064] In view of this, this application provides a front-end pipeline volume calibration method, applied to the aforementioned gas mass flow verification system. By utilizing the known first volume of the calibration tank and the target molar amount of gas already filled into the calibration tank, the target molar amount of gas is diffused into the first pipeline space. The first and second volume calibration parameters of the calibration tank are accurately measured. Combined with the second volume of the second pipeline space and the third volume of the third pipeline space, the volume of the fourth pipeline space is accurately calculated. This achieves accurate measurement of the front-end pipeline volume, improves the accuracy of pipeline volume measurement, meets the requirements of semiconductor processes for pipeline volume accuracy, and enhances the stability of semiconductor processes.

[0065] Please see Figure 5 , Figure 5 A schematic diagram of the controller structure in a calibration system provided in some embodiments of this application is shown.

[0066] like Figure 5 As shown, the controller 111 includes at least one processor 1111 and a memory 1112 connected in communication. Figure 5 Taking a bus system 1113 and a processor 1111 as an example, the various components in the controller 111 are coupled together through the bus system 1113, which is used to realize the connection and communication between the various components. It is easy to understand that the bus system 1113, in addition to the data bus, may also include a power bus, a control bus, and a status signal bus, etc. However, for the sake of clarity and brevity, in... Figure 5 The general designates all buses as Bus System 1113. Understandably, Figure 5 The structures shown in the embodiments are merely illustrative and do not limit the structure of the controller described above. For example, the controller may also include components that are more... Figure 5 The structure shown has more or fewer components, or has the same Figure 5 The diagram shows different configurations of the structure.

[0067] Specifically, the processor 1111 provides computational and control capabilities to support the controller 111 in executing corresponding business logic and functions. For example, it supports the controller 111 in executing the volume calibration method for the front-end pipeline provided in the embodiments of this application, or in executing the steps in any possible implementation of the volume calibration method for the front-end pipeline provided in the embodiments of this application. Those skilled in the art will understand that the processor 1111 can be a general-purpose processor, including a central processing unit (CPU), a network processor (NP), etc.; it can also be a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, or discrete hardware components.

[0068] The memory 1112, as a non-transitory computer-readable storage medium, can be used to store non-transitory software programs, non-transitory computer-executable programs, instructions, and modules, such as the program and instructions / modules corresponding to the front-end pipeline volume calibration method in the embodiments of this application. In some embodiments, the memory 1112 may include a program storage area and a data storage area. The program storage area may store the operating system and applications required for at least one function, and the data storage area may store data created according to the use of the processor 1111. The processor 1111 executes various functional applications and data processing of the controller 111 by running the non-transitory software programs, instructions, and modules stored in the memory 1112, thereby implementing the front-end pipeline volume calibration method provided in the embodiments of this application, or executing the steps in any possible implementation of the front-end pipeline volume calibration method provided in the embodiments of this application. In some embodiments, the memory 1112 may include high-speed random access memory and may also include non-transitory memory. For example, at least one disk storage device, flash memory device, or other non-transitory solid-state storage device. In some embodiments, the memory 1112 may also include memory remotely located relative to the processor 1111, and these remotely located memories may be connected to the processor 1111 via a communication network. It is understood that examples of the aforementioned communication networks include, but are not limited to, the Internet, corporate intranets, local area networks, mobile communication networks, and combinations thereof.

[0069] As can be understood from the above, the implementing entity of any of the front-end pipeline volume calibration methods provided in the embodiments of this application can be any suitable type of controller with certain computing and control capabilities, such as the controller 111 described above. In some feasible implementations, the front-end pipeline volume calibration method provided in the embodiments of this application can be implemented by a processor executing computer program instructions stored in memory.

[0070] The volume calibration method for the front-end pipeline provided in this application embodiment will be described in detail below with reference to the exemplary application and implementation of the gas mass flow verification system provided in the embodiments of this application.

[0071] It is understood that the specific process of the volume calibration method for the front-end pipeline provided in this application embodiment is as follows:

[0072] First, a fixed amount of gas is introduced into the calibration tank using the gas output module. After the calibration tank is filled with a fixed amount of gas, the gas control valve VALSec of the gas output module is closed. At this time, the fourth pipeline space, the third pipeline space, the second pipeline space, and the reference pipeline space constitute a closed system.

[0073] Then, the fourth valve VAL4 is closed, isolating the reference pipeline space from the second pipeline space. At this time, the second, third, and fourth pipeline spaces are connected to form the first pipeline space. The third valve VAL3 is opened, causing the dry pump to perform a vacuum operation, extracting the gas from the first pipeline space. After detecting that the first pipeline space has entered a stable gas state, the first volume calibration parameters of the calibration tank (i.e., the first pressure and first temperature of the calibration tank) are obtained.

[0074] Next, the third valve VAL3 is closed, isolating the dry pump from the second pipeline space. At this time, the gas with a fixed amount of substance in the calibration tank diffuses only into the first pipeline space. When the first pipeline space is detected to have entered a stable gas state, the second volume calibration parameters of the calibration tank (i.e., the second pressure and the second temperature of the calibration tank) are obtained.

[0075] Furthermore, based on the first volume calibration parameters, the second volume calibration parameters, and the known first volume of the calibration vessel, the target volume of the first pipeline space is calculated. According to the ideal gas law PV=nRT (P represents pressure, V represents volume (i.e., the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), Q=nR is constant in a closed system. Therefore, when calculating the target volume of the first pipeline space based on the first volume calibration parameters, the second volume calibration parameters, and the known first volume of the calibration vessel, we can obtain (P51*V1) / T51=[P52*(V1+V2+V3+V4)] / T52, where P51 and T51 are the first pressure and the second volume calibration parameters, respectively. The first pressure and the first temperature are P52 and T52, respectively. The second pressure and the second temperature are V1, V2, V3, and V4 are the first volume, the second volume of the second pipeline space, the third volume of the third pipeline space, and the fourth volume of the fourth pipeline space, respectively. Thus, according to the above formula, the target volume of the first pipeline space V2+V3+V4=T52*(P51*V1) / (T51*P52)-V1 can be calculated. After deformation, we can get V2+V3+V4=[(T52*P51 / T51*P52)-1]*V1.

[0076] Finally, the second volume V2 of the second pipeline space and the third volume V3 of the third pipeline space are obtained. Based on the target volume of the first pipeline space, the second volume V2, and the third volume V3, the fourth volume V4 of the fourth pipeline space is calculated, that is, the fourth volume V4 = [(T52*P51 / T51*P52)-1]*V1-V2-V3.

[0077] The specific process for obtaining the second volume V2 of the second pipeline space and the third volume V3 of the third pipeline space is as follows:

[0078] First, a fixed amount of gas is introduced into the calibration tank using the gas output module. After the calibration tank is filled with a fixed amount of gas, the gas control valve VALSec of the gas output module is closed. At this time, the fourth pipeline space, the third pipeline space, the second pipeline space, and the reference pipeline space constitute a closed system.

[0079] Then, the first valve VAL1 and the fourth valve VAL4 are closed, isolating the fourth pipeline space from the third pipeline space and the reference pipeline space from the second pipeline space. At this time, the second and third pipeline spaces are connected to form the target pipeline space. The third valve VAL3 is then opened, causing the dry pump to perform a vacuum operation to extract the gas from the target pipeline space. After detecting that the target pipeline space has entered a stable gas state, the first volume test parameters of the calibration tank (i.e., the first test pressure and the first test temperature of the calibration tank) are obtained.

[0080] Next, the first valve VAL1 and the third valve VAL3 are closed, isolating the dry pump and the third pipeline space from the second pipeline space. At this time, the gas with a fixed amount of substance in the calibration tank diffuses only into the second pipeline space. After the second pipeline space is detected to have entered a stable gas state, the second volume test parameters of the calibration tank (i.e., the second test pressure and the second test temperature of the calibration tank) are obtained.

[0081] Furthermore, the first valve VAL1 is opened, connecting the second and third pipeline spaces to re-form the target pipeline space. At this time, the amount of gas in the calibration vessel is controlled to diffuse only into the target pipeline space, and after the second pipeline space is detected to have entered a stable gas state, the third volume test parameters of the calibration vessel (i.e., the third test pressure and the third test temperature of the calibration vessel) are obtained.

[0082] Finally, based on the first volume test parameters, the second volume test parameters, and the known first volume of the calibration vessel, the second volume of the second pipeline space is calculated. Similarly, based on the first volume test parameters, the third volume test parameters, and the known first volume of the calibration vessel, the third volume of the third pipeline space is calculated. According to the ideal gas law PV=nRT (where P represents pressure, V represents volume (i.e., the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), in a closed system, Q=nR is constant. Therefore, when calculating the second volume of the second pipeline space based on the first volume test parameters, the second volume test parameters, and the known first volume of the calibration vessel, we can obtain (P41*V1) / T41=[P42*(V1+V2)] / T42, where P41... Let T41 and T42 be the first test pressure and the first test temperature, respectively; let P42 and T42 be the second test pressure and the second test temperature, respectively; and let V1 and V2 be the first volume and the second volume, respectively. Thus, according to the above formula, the second volume V2 can be calculated as V2 = T42 * (P41 * V1) / (T41 * P42) - V1. After deformation, we can get V2 = (T42 * P41 / T41 * P42) * V1 - V1 = [(T42 * P41 / T41 * P42) - 1] * V1.

[0083] Similarly, based on the first volume test parameters, the third volume test parameters, and the known first volume of the calibration tank, when calculating the third volume of the third pipeline space, we can obtain (P41*V1) / T41=[P43*(V1+V2+V3)] / T43, where P41 and T41 are the first test pressure and the first test temperature, respectively; P43 and T43 are the third test pressure and the third test temperature, respectively; and V1, V2, and V3 are the first volume, the second volume, and the third volume, respectively. Thus, according to the above formula, we can calculate the third volume V3=T43*(P41*V1) / (T41*P43)-V1-V2, which, after deformation, gives V3=[(T43*P41) / (T41*P43)-1]*V1-V2.

[0084] Please see Figure 6 , Figure 6 The schematic diagram illustrates a flow chart of a front-end pipeline volume calibration method provided in some embodiments of this application.

[0085] It is readily understood that the volume calibration method for the front-end pipeline provided in this application embodiment can be applied to the aforementioned controller (e.g., the controller 111 of the calibration system 110 in the gas mass flow verification system 100). Specifically, the execution entity of the volume calibration method for the front-end pipeline is one or at least two processors of the controller.

[0086] like Figure 6 As shown, the volume calibration method for the front-end piping includes, but is not limited to, the following steps S61-S66:

[0087] S61: In response to the calibration vessel being filled with the target molar of gas, acquire the first volume verification parameter of the calibration vessel with the fourth valve closed.

[0088] In this embodiment, the volume of the calibration vessel is a known first volume. In this embodiment, gas is introduced into the calibration vessel, and the amount of gas introduced is monitored in real time. When the amount of gas introduced into the calibration vessel is detected to be the target molar amount, i.e., the calibration vessel has been introduced with the target molar amount of gas, the fourth valve is controlled to close, and the first volume verification parameter of the calibration vessel in the closed state is obtained. It can be understood that the target molar amount can be any suitable value.

[0089] Please see Figure 7 , Figure 7 The illustration shows a sub-process diagram of step S61 in the volume calibration method for front-end pipelines provided in some embodiments of this application.

[0090] For example, such as Figure 7As shown, in some embodiments, in response to the calibration vessel being filled with the target molar amount of gas, the first volume verification parameter of the calibration vessel is obtained with the fourth valve in the closed state, specifically including but not limited to the following steps S611-S613:

[0091] S611: Controls the first valve, the second valve, and the fourth valve to enter the open state, and the third valve to enter the closed state.

[0092] In this step, the third valve is controlled to enter the closed state, isolating the dry pump from the second pipeline space, and the first, second, and fourth valves are controlled to enter the open state, connecting the pipeline space formed between the second, third, and fourth pipeline spaces and the calibration tank.

[0093] S612: Controls the gas output module to output gas so that the gas passes through the first valve, the second valve and the fourth valve to fill the calibration tank, so that the amount of gas filling the calibration tank is the target molar.

[0094] S613: Obtain the first volume calibration parameter of the calibration vessel with the fourth valve closed.

[0095] In this embodiment, the gas control valve of the gas output module is opened, and the gas output by the gas output module is filled into the calibration tank through the first valve, the second valve and the fourth valve. When the amount of substance of the gas filled into the calibration tank is detected to be the target molar, the fourth valve is closed, so that the fourth valve is in the closed state, and the first volume verification parameter of the calibration tank is obtained when the fourth valve is in the closed state.

[0096] S62: In response to the first pipeline space entering a vacuum state, control the gas in the calibration vessel to diffuse only into the first pipeline space.

[0097] In this embodiment, the dry pump is started to perform a vacuuming operation, thereby evacuating the first pipeline space and placing it in a vacuum state. When the vacuum state is detected in the first pipeline space, the gas from the calibration container is controlled to diffuse only into the first pipeline space.

[0098] Please see Figure 8 , Figure 8 The illustration shows a sub-process diagram of step S62 in the volume calibration method for front-end pipelines provided in some embodiments of this application.

[0099] like Figure 8 As shown, in some embodiments, in response to the first pipeline space entering a vacuum state, the gas in the calibration vessel is controlled to diffuse only into the first pipeline space, specifically including but not limited to the following steps S621-S623:

[0100] S621: Control the gas output module to stop outputting gas and control the fourth valve to enter the closed state.

[0101] In this step, the gas control valve VALSec of the control gas output module is closed, thereby stopping the gas output, and the fourth valve is also closed, so that the reference pipeline space is isolated from the first pipeline space, and the second, third and fourth pipeline spaces are connected to form the first pipeline space.

[0102] S622: After a delay of the first preset duration, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation to set the first pipeline space into a vacuum state.

[0103] In this step, the first preset duration can be any suitable duration, such as 2s, 5s or other durations.

[0104] In some embodiments, after a first preset time delay, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation to set the first pipeline space into a vacuum state, specifically including but not limited to the following steps S6221-S6223:

[0105] S6221: After a delay of the first preset duration, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation.

[0106] In this embodiment, a timer is used to delay the time. After a first preset delay, the third valve is controlled to open, so that the dry pump is connected to the first pipeline space, and the dry pump performs a vacuum operation to extract the gas from the first pipeline space.

[0107] S6222: Obtain the target pressure in the third pipeline space.

[0108] In this embodiment of the application, the target pressure of the third pipeline space is continuously acquired during the vacuuming operation of the dry pump.

[0109] For example, in some embodiments, the target pressure of the third pipeline space is obtained, specifically including but not limited to the following steps S62221-S62223:

[0110] S62221: Obtain the pressure to be corrected in the third pipeline space detected by the first sensor.

[0111] In this embodiment, the pressure of the third pipeline space detected by the first sensing device disposed in the third pipeline space is obtained, wherein the detected pressure of the third pipeline space is the pressure to be corrected of the third pipeline space.

[0112] S62222: Obtain the pressure correction coefficient.

[0113] S62223: Based on the pressure correction coefficient, the pressure to be corrected is corrected to obtain the target pressure of the third pipeline space.

[0114] In this embodiment, the pressure correction coefficients for the pipeline space are stored in any suitable storage medium. The pressure correction coefficients are then obtained from the storage medium, and the pressure to be corrected is corrected according to these coefficients to obtain the target pressure of the third pipeline space. For example, in some embodiments, the pressure correction coefficients are added to a preset correction threshold to obtain a pressure correction sum, and the pressure to be corrected is multiplied by this pressure correction sum to obtain the target pressure of the third pipeline space.

[0115] In some embodiments of this application, the pressure correction coefficient includes a deviation ratio and an offset parameter. Based on the pressure correction coefficient, the pressure to be corrected is corrected to obtain the target pressure of the third pipeline space, specifically including but not limited to the following steps S62A-S62B:

[0116] S62A: Multiply the pressure to be corrected by the ratio of the deviation to obtain the total pressure deviation.

[0117] S62B: Add the total pressure deviation to the offset parameter to obtain the target pressure of the third pipeline space.

[0118] S6223: In response to the target pressure in the third pipeline space being less than a preset vacuum threshold, the first pipeline space is determined to have entered a vacuum state.

[0119] In this embodiment, the target pressure of the third pipeline space is compared with a preset vacuum threshold. If the target pressure of the third pipeline space is less than the preset vacuum threshold, it indicates that the third pipeline space has entered and is in a vacuum state. At this time, the second, third, and fourth pipeline spaces are connected to form the first pipeline space. Thus, it can be determined that the first pipeline space has entered a vacuum state. Understandably, the preset vacuum threshold can be any suitable value, for example, 200 mmTorr.

[0120] It is understood that the specific process for obtaining the pressure correction coefficient in the volume calibration method for the front-end pipeline provided in this application embodiment is as follows:

[0121] First, control the first, second, third, and fourth valves to all be in the open state, so that the second, third, and fourth pipeline spaces and the reference pipeline space are connected to form a standard pipeline space. Then, the dry pump performs a vacuuming operation to extract the gas from the standard pipeline space, so that the standard pipeline space enters a vacuum state.

[0122] Then, with the standard pipeline space under vacuum, the first and third valves are closed, isolating the fourth pipeline space from the third pipeline space and the dry pump from the second pipeline space. The third, second, and reference pipeline spaces are then connected to form the sixth pipeline space. After the sixth pipeline space reaches a stable gas state, the third volume calibration parameter (i.e., the third pressure of the calibration tank) detected by the second sensor and the fourth volume calibration parameter (i.e., the fourth pressure of the third pipeline space) detected by the first sensor are obtained.

[0123] Next, the first valve is opened, connecting the fourth, third, second, and reference pipeline spaces to form a standard pipeline space. The gas output module is then controlled to output gas, filling the calibration tank with a specified molar amount of gas through the first, second, third, and fourth valves. After the calibration tank is filled with the specified molar amount of gas, the gas output module stops outputting gas.

[0124] Furthermore, by controlling the first valve to enter the closed state, the fourth pipeline space is isolated from the sixth pipeline space. This allows the target pipeline space (i.e., the second and third pipeline spaces) to connect with the calibration tank, forming a sealed sixth pipeline space. In other words, the target pipeline space is connected with the reference pipeline space to form the sixth pipeline space. Once the sixth pipeline space is detected to have entered a stable gas state, the fifth volume calibration parameter (i.e., the fifth pressure of the calibration tank) detected by the second sensor and the sixth volume calibration parameter (i.e., the sixth pressure of the third pipeline space) detected by the first sensor are obtained.

[0125] Finally, pressure correction coefficients are generated based on the third, fourth, fifth, and sixth volume calibration parameters. These pressure correction coefficients include the deviation ratio k and the bias parameter b. According to the formulas P60 = k * P61 + b and P62 = k * P63 + b, we can obtain k = (P62 - P60) / (P63 - P61) and b = (P60 - k * P61) = (P60 * P63 - P61 * P62) / (P63 - P61), where P60 represents the third pressure of the calibration tank, P61 represents the fourth pressure of the third pipeline space, P62 represents the fifth pressure of the calibration tank, and P63 represents the sixth pressure of the third pipeline space. Thus, the pressure correction coefficients are calculated.

[0126] S623: Control the gas in the calibration vessel to diffuse only into the first pipeline space.

[0127] In some embodiments, the gas from the calibration vessel is controlled to diffuse only into the first pipeline space, specifically including but not limited to the following steps S6231-S6232:

[0128] S6231: Controls the third valve to enter the closed state.

[0129] S6232: After a second preset time delay, the fourth valve is opened, so that the gas in the calibration tank diffuses only into the first pipeline space.

[0130] In this step, the third valve is closed to isolate the dry pump from the second pipeline space. It is understood that the second preset duration can be any suitable duration, such as 2 seconds, 5 seconds, or other durations.

[0131] In this embodiment, a timer is used to delay the time. After a second preset delay, the fourth valve is controlled to open, so that the calibration tank is connected to the first pipeline space, and the gas in the calibration tank diffuses only into the first pipeline space.

[0132] S63: In response to the first pipeline space entering a stable gas state, acquire the second volume verification parameters of the calibration tank.

[0133] In this embodiment, the gas pressure in the first pipeline space is sampled multiple times to obtain multiple pressure values. After determining that the first pipeline space has entered a stable gas state based on multiple pressure values, the second volume verification parameter of the calibration tank is then obtained. In this way, occasional pressure fluctuations (such as electromagnetic interference and airflow transients) are filtered out, and the continuous stable state of the first pipeline space is identified (avoiding misjudging a single small pressure fluctuation as a stable state).

[0134] S64: Calculate the target volume of the first pipeline space based on the first volume verification parameter, the second volume verification parameter, and the first volume.

[0135] In this embodiment, the first volume calibration parameter includes a first pressure and a first temperature of the calibration tank, and the second volume calibration parameter includes a second pressure and a second temperature of the calibration tank.

[0136] Please see Figure 9 , Figure 9 The illustration shows a sub-process diagram of step S64 in the volume calibration method for front-end pipelines provided in some embodiments of this application.

[0137] like Figure 9 As shown, in some embodiments, the target volume of the first pipeline space is calculated based on the first volume verification parameter, the second volume verification parameter, and the first volume, specifically including but not limited to the following steps S641-S642:

[0138] S641: Divide the product of the second temperature and the first pressure by the product of the first temperature and the second pressure to obtain the first coefficient.

[0139] S642: Multiply the result of subtracting the natural number 1 from the first coefficient by the first volume to obtain the target volume of the first pipeline space.

[0140] S65: Determine the second volume of the second piping space and the third volume of the third piping space.

[0141] For example, in some embodiments, determining the second volume of the second conduit space and the third volume of the third conduit space specifically includes, but is not limited to, the following steps S651-S657:

[0142] S651: In response to the calibration vessel being filled with the target molar of gas, obtain the first volume test parameter of the calibration vessel with the fourth valve closed, the volume of the calibration vessel being the known first volume.

[0143] S652: In response to the target pipeline space entering a vacuum state, control the gas in the calibration vessel to diffuse only into the second pipeline space, the target pipeline space being composed of the third pipeline space and the second pipeline space.

[0144] S653: In response to the second pipeline space entering a stable gas state, acquire the second volume test parameters of the calibration vessel.

[0145] S654: Determine the second volume of the second pipeline space based on the first volume inspection parameter, the second volume inspection parameter, and the first volume.

[0146] S655: Control the gas in the calibration vessel to diffuse only into the target piping space.

[0147] S656: In response to the target pipeline space entering a stable gas state, acquire the third volume test parameter of the calibration vessel.

[0148] S657: Based on the first volume inspection parameter, the third volume inspection parameter, and the first volume, determine the third volume of the third pipeline space.

[0149] S66: Determine the fourth volume of the fourth pipeline space based on the target volume, the second volume, and the third volume.

[0150] Please see Figure 10 , Figure 10 The illustration shows a sub-process diagram of step S66 in the volume calibration method for front-end piping provided in some embodiments of this application.

[0151] like Figure 10 As shown, in some embodiments, the fourth volume of the fourth piping space is determined based on the target volume, the second volume, and the third volume, specifically including but not limited to the following steps S661-S662:

[0152] S661: Subtract the sum of the second and third volumes from the target volume to obtain the candidate volume.

[0153] S662: Subtract the preset volume threshold from the candidate volume to obtain the fourth volume of the fourth pipeline space.

[0154] In this embodiment, the preset volume threshold is the volume of the valve. The purpose is to calculate the pipeline volume. Therefore, the calculated candidate volume needs to be subtracted from the preset volume threshold (i.e., the volume of the second and fourth valves in the first pipeline space at this time) to obtain the fourth volume of the fourth pipeline space.

[0155] It should be noted that in the above embodiments, there is no necessarily a certain order between the steps. Those skilled in the art can understand from the description of the embodiments of this application that the above steps may have different execution orders in different embodiments, that is, they may be executed in parallel or in turn, etc.

[0156] In summary, the volume calibration method provided in this application utilizes the diffusion of a target molar amount of gas within the calibration vessel into the first pipeline space. While the first pipeline space is in a stable gas state, accurate second volume verification parameters of the calibration vessel are obtained. Combined with the first volume verification parameters and the first volume of the calibration vessel when the fourth valve is closed, an accurate and highly precise target volume of the first pipeline space is calculated. Furthermore, by combining the second volume of the second pipeline space and the third volume of the third pipeline space, an accurate and highly precise fourth volume of the fourth pipeline space is calculated, meeting the volume accuracy requirements of semiconductor processes. In addition, the volume of the pipeline space is calculated based on precisely acquired temperature and pressure data, improving the accuracy of pipeline space volume measurement in industrial scenarios with dynamic temperature changes. Combined with the gas mass flow verification system provided in this application, multiple cyclic verification calibrations and steady-state criteria are performed to meet the accuracy requirements of semiconductor equipment for pipeline volume.

[0157] As another aspect of the embodiments of this application, this application also provides a volume calibration device for a front-end pipeline. The volume calibration device for the front-end pipeline can be a software module, which includes several instructions stored in a memory. A processor can access the memory, call the instructions, and execute them to complete the volume calibration method for the front-end pipeline described in the above embodiments.

[0158] In some embodiments, the front-end pipeline volume calibration device can also be constructed from hardware components. For example, the front-end pipeline volume calibration device can be constructed from one or more chips, which can work in coordination to complete the front-end pipeline volume calibration method described in the various embodiments above. As another example, the front-end pipeline volume calibration device can also be constructed from various logic devices, such as general-purpose processors, digital signal processors (DSPs), application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), microcontrollers, ARM (Acorn RISC Machine) or other programmable logic devices, discrete gate or transistor logic, discrete hardware components, or any combination of these components.

[0159] Please see Figure 11 , Figure 11 The diagram illustrates the structure of a volume calibration device for a front-end pipeline provided in some embodiments of this application. It is readily understood that the volume calibration device for the front-end pipeline can be configured in a gas mass flow verification system. The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump, and the output end of the fourth valve is used to connect to the calibration tank.

[0160] Specifically, such as Figure 11 As shown, the volume calibration device 1000 for the front-end pipeline includes a first acquisition module 1010, a first control module 1020, a second acquisition module 1030, a calculation module 1040, a first determination module 1050, and a second determination module 1060.

[0161] The first acquisition module 1010 is used to acquire the first volume verification parameter of the calibration tank when the fourth valve is closed, in response to the calibration tank being filled with the target molar of gas. The volume of the calibration tank is a known first volume. The first control module 1020 is used to control the gas in the calibration tank to diffuse only into the first pipeline space in response to the first pipeline space entering a vacuum state. The first pipeline space is composed of the second, third, and fourth pipeline spaces. The second pipeline space is the pipeline space formed between the second, third, and fourth valves. The third pipeline space is the pipeline space formed between the first and second valves. The fourth pipeline space is the pipeline space formed between the output end of the gas output module and the first valve. The second acquisition module 1030 is used to acquire the second volume verification parameter of the calibration tank in response to the first pipeline space entering a stable gas state. The calculation module 1040 is used to calculate the target volume of the first pipeline space based on the first volume verification parameter, the second volume verification parameter, and the first volume. The first determination module 1050 is used to determine the second volume of the second pipeline space and the third volume of the third pipeline space. The second determining module 1060 is used to determine the fourth volume of the fourth pipeline space based on the target volume, the second volume, and the third volume.

[0162] In some embodiments, the first acquisition module 1010 is specifically used to: control the first valve, the second valve, and the fourth valve to enter the open state, and the third valve to enter the closed state; control the gas output module to output gas so that the gas passes through the first valve, the second valve, and the fourth valve to fill the calibration tank, so that the amount of gas filling the calibration tank is the target molar; and acquire the first volume verification parameter of the calibration tank when the fourth valve is in the closed state.

[0163] In some embodiments, the first control module 1020 is specifically used to: control the gas output module to stop outputting gas and control the fourth valve to enter the closed state; after a delay of a first preset time, control the third valve to enter the open state, so that the dry pump performs a vacuuming operation to set the first pipeline space into a vacuum state, and control the gas in the calibration tank to diffuse only into the first pipeline space.

[0164] In some embodiments, the first control module 1020 is further specifically used to: control the third valve to enter the closed state, and after a delay of a second preset time, control the fourth valve to enter the open state, so that the gas in the calibration tank only diffuses into the first pipeline space.

[0165] In some embodiments, the first control module 1020 is further configured to: after a delay of a first preset duration, control the third valve to enter the open state, so that the dry pump performs a vacuuming operation, obtain the target pressure of the third pipeline space, and determine that the first pipeline space has entered a vacuum state in response to the target pressure of the third pipeline space being less than a preset vacuum threshold.

[0166] In some embodiments, a first sensing device is provided in the third pipeline space. The first sensing device is configured to detect the pressure and temperature of the third pipeline space. The first control module 1020 is further specifically used to: obtain the pressure to be corrected in the third pipeline space detected by the first sensing device, obtain the pressure correction coefficient, correct the pressure to be corrected based on the pressure correction coefficient, and obtain the target pressure of the third pipeline space.

[0167] In some embodiments, the pressure correction coefficient includes a deviation ratio and an offset parameter. The first control module 1020 is further specifically used to: multiply the pressure to be corrected by the deviation ratio to obtain the total pressure deviation, and add the total pressure deviation to the offset parameter to obtain the target pressure of the third pipeline space.

[0168] In some embodiments, the first volume verification parameter includes a first pressure and a first temperature with respect to the calibration tank, and the second volume verification parameter includes a second pressure and a second temperature with respect to the calibration tank. The calculation module 1040 is specifically used to: divide the product of the second temperature and the first pressure by the product of the first temperature and the second pressure to obtain a first coefficient, and multiply the result of subtracting the natural number 1 from the first coefficient by the first volume to obtain the target volume of the first pipeline space.

[0169] In some embodiments, the second determining module 1060 is specifically used to: subtract the sum of the second volume and the third volume from the target volume to obtain a candidate volume, and subtract a preset volume threshold from the candidate volume to obtain the fourth volume of the fourth pipeline space.

[0170] It should be noted that, for the sake of simplicity and brevity, the aforementioned front-end pipeline volume calibration device can execute the corresponding functional modules and achieve the corresponding beneficial effects of the front-end pipeline volume calibration method provided in the embodiments of this application. Technical details not described in detail in the embodiments of the front-end pipeline volume calibration device can be found in the front-end pipeline volume calibration method provided in the embodiments of this application. The specific working process of the aforementioned front-end pipeline volume calibration device can also be found in the specific execution process corresponding to the aforementioned front-end pipeline volume calibration method provided in the embodiments of this application, and will not be elaborated upon here.

[0171] This application also provides a computer-readable storage medium storing a computer program, the computer program including program instructions, which, when executed by a computer, cause the computer to perform the volume calibration method for the front-end pipeline as described in the foregoing embodiments.

[0172] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The program can be stored in a computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. The storage medium can be a magnetic disk, optical disk, read-only memory (ROM), or random access memory (RAM), etc.

[0173] The above-disclosed embodiments are merely preferred embodiments of this application and should not be construed as limiting the scope of this application. Therefore, any equivalent variations made in accordance with the claims of this application shall still fall within the scope of this application.

Claims

1. A volume calibration method for a front-end pipeline, applied to a gas mass flow rate verification system, characterized in that, The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The volume calibration method includes: In response to the calibration vessel being filled with a target molar amount of gas, a first volume verification parameter of the calibration vessel is obtained when the fourth valve is closed, wherein the volume of the calibration vessel is a known first volume; In response to the first pipeline space entering a vacuum state, the gas in the calibration tank is controlled to diffuse only into the first pipeline space. The first pipeline space is composed of the second pipeline space, the third pipeline space, and the fourth pipeline space. The second pipeline space is the pipeline space formed between the second valve, the third valve, and the fourth valve. The third pipeline space is the pipeline space formed between the first valve and the second valve. The fourth pipeline space is the pipeline space formed between the output end of the gas output module and the first valve. In response to the first pipeline space entering a stable gas state, the second volume verification parameter of the calibration tank is obtained; Based on the first volume verification parameter, the second volume verification parameter and the first volume, calculate the target volume of the first pipeline space; Determine the second volume of the second pipeline space and the third volume of the third pipeline space; The fourth volume of the fourth pipeline space is determined based on the target volume, the second volume, and the third volume.

2. The volume calibration method according to claim 1, characterized in that, The step of obtaining the first volume verification parameter of the calibration vessel in response to the calibration vessel being filled with the target molar amount of gas includes: The first valve, the second valve, and the fourth valve are controlled to be in the open state, and the third valve is controlled to be in the closed state; The gas output module is controlled to output gas so that the gas is filled into the calibration tank through the first valve, the second valve and the fourth valve, such that the amount of gas filling the calibration tank is the target molar amount; Obtain the first volume verification parameter of the calibration tank when the fourth valve is closed.

3. The volume calibration method according to claim 1, characterized in that, The step of controlling the gas in the calibration vessel to diffuse only into the first pipeline space in response to the first pipeline space entering a vacuum state includes: Control the gas output module to stop outputting gas and control the fourth valve to enter the closed state; After a first preset time delay, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation to set the first pipeline space into a vacuum state. The gas in the calibration vessel is controlled to diffuse only into the first pipeline space.

4. The volume calibration method according to claim 3, characterized in that, The control of the gas in the calibration vessel to diffuse only into the first pipeline space includes: Control the third valve to enter the closed state; After a second preset time delay, the fourth valve is opened, so that the gas from the calibration tank diffuses only into the first pipeline space.

5. The volume calibration method according to claim 3, characterized in that, After a first preset time delay, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation to set the first pipeline space into a vacuum state, including: After a first preset time delay, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation; Obtain the target pressure of the third pipeline space; In response to the target pressure in the third pipeline space being less than a preset vacuum threshold, it is determined that the first pipeline space has entered a vacuum state.

6. The volume calibration method according to claim 5, characterized in that, A first sensing device is installed in the third pipeline space. The first sensing device is configured to detect the pressure and temperature of the third pipeline space. Obtaining the target pressure of the third pipeline space includes: The pressure to be corrected in the third pipeline space detected by the first sensing device is obtained. Obtain the pressure correction coefficient; The pressure to be corrected is corrected based on the pressure correction coefficient to obtain the target pressure of the third pipeline space.

7. The volume calibration method according to any one of claims 1 to 6, characterized in that, The first volume calibration parameters include a first pressure and a first temperature regarding the calibration vessel, and the second volume calibration parameters include a second pressure and a second temperature regarding the calibration vessel. The step of calculating the target volume of the first pipeline space based on the first volume calibration parameters, the second volume calibration parameters, and the first volume includes: Divide the product of the second temperature and the first pressure by the product of the first temperature and the second pressure to obtain the first coefficient; Multiply the result of subtracting the natural number 1 from the first coefficient by the first volume to obtain the target volume of the first pipeline space.

8. The volume calibration method according to any one of claims 1 to 6, characterized in that, Determining the fourth volume of the fourth pipeline space based on the target volume, the second volume, and the third volume includes: Subtract the sum of the second volume and the third volume from the target volume to obtain the candidate volume; The fourth volume of the fourth pipeline space is obtained by subtracting the preset volume threshold from the candidate volume.

9. A controller, characterized in that, The device includes a memory and a processor, the memory being connected to the processor, the processor being configured to execute one or more computer programs stored in the memory, the processor causing the controller to implement the volume calibration method for the front-end pipeline as described in any one of claims 1-8 when executing the one or more computer programs.

10. A gas mass flow rate verification system, characterized in that, The system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller as described in claim 9. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The controller is communicatively connected to the first valve, the second valve, the third valve, the fourth valve, and the gas output module.

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