Ion and neutral particle source with adjustable outlet angle

Abstract

A plasma source with an adjustable exit aperture is disclosed. The plasma source has a cylindrical body and two ends, with a housing bore formed along the cylindrical body. The adjustable output plate is disposed on the cylindrical body and covers the housing hole. The adjustable output plate has an exit aperture smaller than the housing aperture. The adjustable output plate is rotatable in a circumferential direction to move out of the perforation position relative to the workpiece holder. The plasma source is configured to vary an exit angle without disrupting a vacuum state. In some embodiments, a definition aperture is located outside the exit aperture to define a path for radicals and neutral particles. In other embodiments, a bias electrode may be disposed outside the exit aperture.

Description

[0001] This application claims priority to U.S. Patent Application Serial No. 18 / 370,158, filed September 19, 2023, the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0002] The embodiments disclosed herein relate to a plasma source capable of adjusting the emission angle of neutral particles and ions emitted from the plasma source. Background Technology

[0003] The manufacture of semiconductor devices involves multiple discrete and complex processes. Recently, the semiconductor industry has shifted towards creating three-dimensional devices. As the name suggests, these semiconductor devices have length, width, and height. To process these three-dimensional devices, angled ion implantation can be used.

[0004] Angled ion implantation refers to ion beams that strike a substrate at a non-zero angle. For consistency, an angle perpendicular to the substrate surface is defined as a 0° angle. Angled ion beams have numerous applications. For example, they can be used for implantation in the sidewalls of fin structures or trenches. Furthermore, other angled beams, such as those containing free radicals or neutral particles, can be used in etching processes, deposition processes, and other applications.

[0005] One way to perform these angled processes is to rotate or tilt the stage on which the substrate is placed. In other words, the beam is generated in the conventional way, but the tilted stage causes the beam to strike the substrate at a non-zero angle. This method allows for the generation of beams that strike the substrate at angles of 20° or greater.

[0006] One drawback of this method is that different regions of the substrate are at different distances from the beam source. For example, by tilting the substrate, some regions will be closer to the beam source than others. This can lead to process variations across the entire substrate.

[0007] Another approach is to control and alter the shape of the plasma sheath to change the angle at which ions are extracted from the plasma processing chamber. However, this method may have limitations in terms of the amount of current that can be extracted and may only be applicable to ions.

[0008] Furthermore, different processes may require different emission angles. Therefore, it would be advantageous to have a system with an emission port that allows for adjustable emission angles. Moreover, it would be beneficial if the plasma source were effective for both charged ions and neutral particles. Summary of the Invention

[0009] A plasma source with an adjustable exit orifice is disclosed. The plasma source has a cylindrical body and two ends, wherein an outer shell orifice is formed along the cylindrical body. An adjustable output plate is disposed on the cylindrical body and covers the outer shell orifice. The adjustable output plate has an exit orifice smaller than the outer shell orifice. The adjustable output plate is rotatable in a circumferential direction, thereby moving the position of the exit orifice relative to a workpiece holder. The plasma source is configured to change the exit angle without disrupting the vacuum. In some embodiments, the defined orifice is located outside the exit orifice to define the paths of free radicals and neutral particles. In other embodiments, a bias electrode may be disposed outside the exit orifice.

[0010] According to one embodiment, a plasma source for generating ions and neutral particles is disclosed. The plasma source includes: a cylindrical body having a defined plasma chamber and a chamber housing at both ends, wherein a housing aperture is disposed in the cylindrical body along a circumferential direction; a plasma generator for generating plasma within the plasma chamber; and an adjustable output plate disposed outside the cylindrical body and covering the housing aperture, the adjustable output plate having an arcuate shape and a circumferential length greater than the housing aperture, wherein the adjustable output plate has an exit aperture and is rotatable relative to the housing aperture. In some embodiments, the housing aperture occupies a distance corresponding to at least 30° of the circumference of the cylindrical body. In some embodiments, the plasma source includes an outer plate fixed to the adjustable output plate, the outer plate having a defined aperture aligned with the exit aperture. In some embodiments, the outer plate is electrically connected to the adjustable output plate. In some embodiments, the outer plate is electrically isolated from the adjustable output plate and biased at a different voltage than the adjustable output plate. In some embodiments, the plasma source includes at least one additional electrode, biased at a different voltage than the outer plate, disposed outside and aligned with the exit aperture. In some embodiments, the housing aperture defines the range of motion of the adjustable output plate, and the range of motion is at least 30°. In some embodiments, the plasma source includes a motor communicating with the adjustable output plate, wherein the motor is driven to rotate the adjustable output plate relative to the housing aperture to change the angle of the ejection port relative to the workpiece holder.

[0011] According to another embodiment, a plasma source for generating ions and neutral particles is disclosed. The plasma source includes: a cylindrical body having a plasma chamber and a chamber shell at both ends, wherein a shell aperture is disposed circumferentially within the cylindrical body; a plasma generator for generating plasma within the plasma chamber; and an adjustable output plate disposed outside the cylindrical body, wherein the adjustable output plate includes an upper adjustable output plate portion and a lower adjustable output plate portion rotatable relative to the chamber shell, and the space between the upper and lower adjustable output plate portions defines an exit aperture through which ions and neutral particles exit the plasma chamber. In some embodiments, the range of motion of the exit aperture is at least 30°. In some embodiments, the size of the exit aperture is adjustable in the circumferential direction. In some embodiments, the plasma source includes an outer plate comprising an upper outer plate portion fixed to the upper adjustable output plate portion and a lower outer plate portion fixed to the lower adjustable output plate portion, wherein the space between the upper and lower outer plate portions defines a defining aperture aligned with the exit aperture. In some embodiments, the upper outer plate portion is electrically connected to the upper adjustable output plate portion, and the lower outer plate portion is electrically connected to the lower adjustable output plate portion. In some embodiments, the upper and lower outer plate portions are electrically isolated from the adjustable output plate and biased at a different voltage than the adjustable output plate. In some embodiments, the plasma source includes at least one additional electrode, biased at a different voltage than the upper and lower outer plate portions, configured outside and aligned with the exit aperture. In some embodiments, the plasma source includes at least one motor communicating with the upper and lower adjustable output plate portions, wherein driving the at least one motor is used to rotate the upper and lower adjustable output plate portions relative to the housing aperture to change the angle and / or size of the exit aperture relative to the workpiece holder. In some embodiments, the upper and lower adjustable output plate portions are rotatable independently.

[0012] According to another embodiment, a processing system is disclosed. This processing system includes any of the plasma sources described above and a workpiece holder movable in the scanning direction. Attached Figure Description

[0013] Refer to the accompanying drawings for a better understanding of this disclosure, which are incorporated herein by reference:

[0014] Figure 1 This is a block diagram of a plasma source having an adjustable ejection orifice according to one embodiment.

[0015] Figure 2A-2C The adjustable output board is displayed in three different positions. Figure 1 The plasma source.

[0016] Figures 3A-3B This shows the interface between the chamber housing and the adjustable output board according to two different embodiments.

[0017] Figure 4 A block diagram showing a plasma source with an adjustable exit orifice, the size of which can also be adjusted.

[0018] Figures 5A-5B Displays two different sizes of exit holes. Figure 4 The plasma source.

[0019] Figure 6 The plasma source is shown to have electrodes installed outside the exit port. Detailed Implementation

[0020] As mentioned above, angled semiconductor processes, such as angled implantation, deposition, and etching processes, are becoming increasingly common in the semiconductor industry. Therefore, systems that allow for a wide range of exit angles, and thus a wide range of incident angles, will be highly beneficial.

[0021] Figure 1 A cross-sectional view of a plasma source 10 with an adjustable exit orifice is shown, allowing for the extraction of angled ions and neutral particles. The plasma source 10 includes a chamber housing 100 having a cylindrical body and two closed ends defining a plasma chamber 101. The two ends are not shown for clarity. The cylindrical body of the chamber housing 100 has an inner surface with an inner diameter and an outer surface with an outer diameter. Furthermore, the chamber housing 100 includes a housing aperture 110 located around the periphery of the cylindrical body. The housing aperture 110 is an opening in the chamber housing 100 having a width in the direction between the two ends. The housing aperture 110 also has a height in the circumferential direction along the cylindrical body. In some embodiments, the housing aperture 110 extends across the entire width of the chamber housing 100. In other embodiments, the housing aperture 110 may not extend to the two ends. Furthermore, the housing aperture 110 may be as large as half the circumference of the cylindrical body of the chamber housing 100, also defined as 180°. In other embodiments, the housing aperture 110 may be a smaller portion of the total circumference of the cylindrical body of the chamber housing 100, such as one-quarter (90°), one-sixth (60°), or one-twelfth (30°). In some embodiments, a recessed portion 105 is present on both sides of the housing aperture 110 in the circumferential direction along the outer surface of the cylindrical body. The outer diameter of this recessed portion 105 may be smaller than the outer diameter of the rest of the cylindrical body of the chamber housing 100. The recessed portion 105 may serve as a guide groove for the adjustable output plate 200. A recessed portion 106 may also be present on both sides of the housing aperture 110 along the inner surface of the chamber housing 100.

[0022] The plasma source 10 may also include one or more liners 120 disposed within the plasma chamber 101 along the inner wall of the cylindrical body of the chamber housing 100. Note that the liners 120 may extend into the housing aperture 110. This forms a channel 107 between the liners 120 and the recessed portion 106. In some embodiments, one or more magnets 140 may be disposed within the chamber housing 100. The plasma source 10 also includes a gas inlet 150 in communication with a gas source 155.

[0023] In this embodiment, one or more antennas 160 are disposed within the plasma chamber 101. In some embodiments, the antennas 160 are made of a conductive material, such as metal, and are protected by an insulating sleeve 165. In some embodiments, the insulating sleeve 165 may be quartz or alumina. The antennas may be powered by an radio frequency power supply 167. These antennas 160 serve as plasma generators. In some embodiments, one or more antennas 160 are positioned such that the highest plasma density is not at the center of the plasma chamber 101, but closer to the housing aperture 110. Note that this disclosure is not limited to this plasma generator. For example, in other embodiments, the plasma generator may include a coil disposed outside the chamber housing 100, a cathode disposed within the plasma chamber 101, a filament disposed within the plasma chamber 101, or other plasma generators.

[0024] The adjustable output plate 200 is located outside the chamber housing 100 and near the housing aperture 110. The adjustable output plate 200 is electrically contacted with the chamber housing 100 to be biased at the same voltage (or grounded) as the chamber housing 100. Specifically, the adjustable output plate 200 has an arcuate shape, wherein the inner diameter of the adjustable output plate 200 may be slightly larger than the outer diameter of the recessed portion 105. The adjustable output plate 200 is larger than the housing aperture 110 in the circumferential direction. Therefore, if the housing aperture 110 occupies a distance corresponding to 30° of the circumference of the cylindrical body of the chamber housing 100, the circumferential length of the adjustable output plate 200 may correspond to at least 60° of the circumference of the cylindrical body of the chamber housing 100 to allow for 30° rotation. The portion of the adjustable output plate 200 that extends beyond the size of the housing aperture 110 in the circumferential direction is placed within the recessed portion 105 of the chamber housing 100. The adjustable output plate 200 may be the same size as or larger than the housing aperture 110 in the width direction. The adjustable output plate 200 also includes an exit hole 210. The exit hole 210 may be disposed at the center of the adjustable output plate 200 in a circumferential direction. The exit hole 210 is defined by an aperture wall 215 extending from the outer surface of the adjustable output plate 200 toward the interior of the plasma chamber 101. In some embodiments, the aperture wall 215 may extend inward to a point approximately equal to the inner diameter of the chamber housing 100. A plate liner 220 may be attached to the adjustable output plate 200 and extend circumferentially from the aperture wall 215. In some embodiments, the plate liner 220 is disposed in a channel 107 formed between the liner 120 and the recessed portion 106. In other embodiments, the plate liner 220 is disposed further inward than the liner 120, such that the liner 120 is located between the plate liner 220 and the chamber housing 100. In this manner, a liner (which may be liner 120 or plate liner 220) surrounds the interior of the cylindrical body of the chamber housing 100, except for the exit port 210 and the optional gas inlet 150. The port wall 215 defines the range of motion of the adjustable output plate 200. Specifically, at the end of the range of motion in each direction, the port wall 215 contacts the chamber housing 100 as a stop.

[0025] In this embodiment, the circumferential dimension of the exit aperture 210 may be fixed. In some embodiments, the circumferential dimension of the exit aperture 210 may be approximately 10° of the entire diameter of the cylindrical body of the chamber housing 100. Of course, different adjustable output plates 200 may be used with the chamber housing 100, each with a different sized exit aperture 210. Furthermore, the exit aperture 210 may be the same size as or smaller than the housing aperture 110 in the width direction. For example, the housing aperture 110 may span all or almost all the width of the chamber housing 100, while the width of the exit aperture 210 may be smaller. Additionally, if desired, a baffle structure may be incorporated into the exit aperture 210. For example, vertical slats may be installed in the exit aperture 210. These vertical slats are used to reduce the angular spread of the beam in the width direction.

[0026] The adjustable output plate 200 can be held in place within the chamber housing 100. In one embodiment, the adjustable output plate 200 can be secured to the chamber housing 100 using a fastener 230. For example, the fastener 230 can be attached to opposite ends of the adjustable output plate 200 in a circumferential direction and surrounds the outer surface of the chamber housing 100. The fastener 230 is tightened to press the adjustable output plate 200 against the chamber housing 100.

[0027] In another embodiment, fastener 230 may communicate with motor 235, which is adapted to rotate fastener 230 relative to chamber housing 100 to move the position of adjustable output plate 200. For example, the outer surface of fastener 230 may have teeth and contact a gear connected to motor 235. Rotation of the gear is used to rotate adjustable output plate 200. Fastener 230 may move within a recessed channel located on the outer surface of the cylindrical body.

[0028] In another embodiment, toothed fasteners may not be used. Instead, motor 235 may include a rotatable shaft pivotally connected to one or more lever arms. The distal ends of the lever arms are pivotally connected to the adjustable output plate 200. Rotation of the rotatable shaft moves the lever arms toward or away from the adjustable output plate 200, causing it to rotate. The lever arms may also be used to hold the adjustable output plate 200 to the chamber housing 100. Of course, other types of motors and connection mechanisms may be used to allow rotation of the adjustable output plate 200, and this disclosure is not limited to these embodiments.

[0029] In some embodiments, the outer plate 240 is fixed to the adjustable output plate 200. This outer plate 240 may also include an aperture, referred to as a definition aperture 245. The definition aperture 245 is aligned with the exit aperture 210. The definition aperture 245 provides additional collimation for particles exiting from the exit aperture 210. In operation, the pressure within the plasma chamber 101 can be significantly higher than the pressure in the rest of the chamber. In some embodiments, the definition aperture 245 may be located approximately 50 mm from the exit aperture 210. This distance results in lower pressure near the definition aperture 245, which in turn results in a longer free average path length for any ions or particles passing through the definition aperture 245.

[0030] In some embodiments, the outer plate 240 is electrically connected to the adjustable output plate 200. In these embodiments, the outer plate 240 does not attract charged ions from the plasma chamber 101. Instead, the orifice 245 is defined to limit the path of neutral particles and free radicals extracted from the plasma chamber 101.

[0031] In other embodiments, such as Figure 6As shown, the outer plate 240 can be electrically isolated from the adjustable output plate 200, for example, by using an insulator 242. In these embodiments, a voltage different from the voltage applied to the chamber housing 100 can be applied to the outer plate 240. In some embodiments, the outer plate 240 can be negatively biased relative to the chamber housing 100 using an electrode power supply 218. This negative bias is applied to attract positive ions from the plasma chamber 101. Therefore, in this embodiment, the outer plate 240 serves as an extraction electrode. Furthermore, additional electrodes, such as a ground electrode 241, can be disposed outside the exit port 210. Each of these electrodes includes holes that are generally aligned with the exit port 210, such that ions extracted through the exit port 210 pass through the aligned holes in each electrode. Note that, although not shown, this embodiment may also include... Figure 1 Other components described herein include motor 235, RF power supply 167, liner 120, plate liner 220, gas inlet 150, and gas source 155.

[0032] Therefore, in operation, one or more process gases are supplied from gas source 155 to plasma chamber 101 through gas inlet 150. Radio frequency power from radio frequency power supply 167 is provided to antenna 160. Antenna 160 generates radio frequency energy to ionize the process gases in plasma chamber 101 and form plasma. Magnet 140 is used to guide the plasma to the center of plasma chamber 101 and away from chamber housing 100.

[0033] exist Figure 1 In one embodiment, the outer plate 240 is electrically connected to the adjustable output plate 200, and particles (which may be neutral particles or free radicals) drift out of the plasma chamber 101 through the exit hole 210. Some of these particles then pass through the defining hole 245 and move toward the workpiece.

[0034] exist Figure 6 In this embodiment, the outer plate 240 is electrically biased away from the adjustable output plate 200, and ions are attracted by the voltage applied to the outer plate 240 through the emission port 210. These ions then pass through the alignment holes of the electrodes and advance toward the workpiece.

[0035] Figure 2A-2C The figure shows a plasma source 10 with an adjustable output plate 200 in three different positions. A workpiece holder 300 is also shown in each figure. The workpiece holder 300 can be scanned in a scanning direction 301, which can be perpendicular to the width of the exit aperture 210. The workpiece holder 300 can be scanned using a scanning motor 302.

[0036] The workpiece holder 300 can be grounded or biased at the extraction voltage. Furthermore, the temperature of the workpiece holder 300 can be controlled according to the type of process performed on the workpiece. The workpiece holder 300 can be an electrostatic chuck, although mechanical clamps or gravity can be used to hold the workpiece to the workpiece holder 300. Alternatively, the workpiece holder 300 can be rotated about an axis perpendicular to the front surface of the workpiece holder 300 using a stage motor.

[0037] The scanning motor 302 allows the workpiece holder 300 to move along the scanning direction 301 from a first position to a second position. In some embodiments, the first and second positions are positioned such that the workpiece is no longer affected by the beam emitted from the plasma source 10 at these positions. The first and second positions may be referred to as the endpoints of the scan, such that the workpiece holder 300 moves from the first position to the second position along the scanning direction 301 and then returns in the opposite direction to the first position. Note that other actions may be performed at the first and second positions. For example, the workpiece holder 300 may be rotated 180° about an axis perpendicular to the surface of the workpiece holder 300, such that the beam from the plasma source 10 treats the workpiece at different angles.

[0038] In each of these figures, the plasma source 10 is oriented such that its centerline 310 forms a 15° angle with respect to a line perpendicular to the workpiece holder 300. In these embodiments, the centerline 310 may be defined as the perpendicular bisector of the line connecting the two antennas 160. In other embodiments, the centerline 310 may be defined as the midpoint of the range of motion of the adjustable output plate 200. Figure 2A In this configuration, the adjustable output plate 200 is oriented at its midpoint, such that the centerline 310 corresponds to the exit hole 210. Therefore, in this position, particles emitted from the exit hole 210 are guided to the workpiece holder 300 at an incident angle of 15°. Figure 2B In this configuration, the adjustable output plate 200 is rotated counterclockwise to a point where its range of motion is terminated by the chamber housing 100. Note that in this embodiment, this represents a 15° rotation. In this way, particles emitted from the exit hole 210 are guided to the workpiece holder 300 at an incident angle of 30°. Figure 2C The adjustable output plate 200 is configured to rotate clockwise to a point where its range of motion is terminated by the chamber housing 100. Note that in this embodiment, this represents a rotation of -15°. In this way, particles emitted from the exit hole 210 are guided to the workpiece holder 300 at an incident angle of 0°.

[0039] Therefore, in this embodiment, the plasma source 10 has a chamber housing 100 comprising a cylindrical body and two ends, wherein the cylindrical body includes a housing aperture 110 having a width and extending in the circumferential direction. A plasma generator, such as an antenna 160, is used to generate plasma within the plasma chamber 101. The housing aperture 110 may occupy a distance corresponding to at least 30° of the circumference of the cylindrical body. An adjustable output plate 200 is disposed outside the chamber housing 100 and is arc-shaped. The circumferential length of the adjustable output plate 200 is greater than that of the housing aperture 110. In this way, the adjustable output plate 200 covers the housing aperture 110. Furthermore, the adjustable output plate 200 includes an exit aperture 210, which is smaller in the circumferential direction than the housing aperture 110. Additionally, the configuration of the adjustable output plate 200 and the chamber housing 100 allows the size and position of the housing aperture 110 to define the range of motion of the adjustable output plate 200. Specifically, in some embodiments, the adjustable output plate 200 has an inwardly extending hole wall 215 that contacts the chamber housing 100 at the furthest point of its range of motion.

[0040] Figure 1 , 2A -2C and 6 show a plasma source 10 including an integrated adjustable output plate 200. In this embodiment, the adjustable output plate 200 can be simply secured as described above by pressing it against the outer surface of the chamber housing 100. Therefore, as Figure 1 and 6 As shown, the adjustable output plate 200 rests solely on the retracted portion 105. The compressive force generated by the fastening of the fastener 230 creates a frictional force that holds the adjustable output plate 200 in place. Figure 3A Showing cross-sections of these components.

[0041] However, in some embodiments, the outer surface of the cylindrical body may include a protrusion 108 disposed adjacent, in the width direction, to the recessed portion 105 defining the channel 109. In this embodiment, as... Figure 3B In the cross-section shown, the adjustable output plate 200 can be located in the channel 109 and secured by the protrusion 108. In this embodiment, no compressive force is required to hold the adjustable output plate 200 in place, so the adjustable output plate 200 may not press against the chamber housing 100. Furthermore, this configuration also allows the use of a motor with a lever arm as previously described.

[0042] By incorporating channel 109, the adjustable output board 200 may also be divided into two parts. Figure 4 Such an embodiment is shown, wherein Figure 1The adjustable output plate 200 now includes an upper adjustable output plate portion 400 and a lower adjustable output plate portion 410. The space between the upper adjustable output plate portion 400 and the lower adjustable output plate portion 410 defines the emission port 415. Note that since there are now two adjustable output plates, the circumferential dimension of the emission port 415 can also vary.

[0043] Similarly, the outer panel 240 now includes an upper outer panel portion 440 and a lower outer panel portion 450. The space between the upper outer panel portion 440 and the lower outer panel portion 450 defines a corresponding defining hole 455. Note that the circumferential dimension of the defining hole 455 varies with the dimension of the exit hole 415.

[0044] In this embodiment, the fastener 230 may not completely surround the chamber housing 100. Instead, there may be an upper set of fasteners 460 for moving and securing the upper adjustable output plate portion 400, and a lower set of fasteners 470 for moving and securing the lower adjustable output plate portion 410. In some embodiments, each set of fasteners may communicate with a respective motor 480. The manner in which the output plate portion is connected to the motor may be one of those described above, or it may be a different mechanism. The remainder of the plasma source 10 is as described above.

[0045] Therefore, in this embodiment, the emission port 415 can be rotated by moving the two adjustable output plate portions while maintaining a constant size of the emission port, as described above. Furthermore, the size of the emission port 415 can be changed in the circumferential direction by independently controlling the upper adjustable output plate portion 400 and the lower adjustable output plate portion 410. Figure 5A The image shows the emission port 415 and the corresponding defining port 455 when the two adjustable output plates are moved independently to be positioned very close to each other, making the emission port 415 very small. In contrast, Figure 5B The larger exit aperture 415 and definition aperture 455 are shown by moving the two adjustable output plate sections away from each other.

[0046] Furthermore, in this embodiment, each of the upper and lower adjustable output plate portions includes a hole wall 215, which defines a range of motion in one direction. Contact with the other adjustable output plate portion defines a range of motion in the opposite direction.

[0047] Although not shown, the upper and lower adjustable output plate sections can also be used with external bias electrodes, for example... Figure 6 As shown. In this configuration, the size of the hole in the electrode can vary with the size of the exit hole 415.

[0048] The embodiments described above in this application have many advantages. By providing a plasma source with an adjustable emission aperture, the plasma source can be easily used in a variety of different semiconductor processes. Furthermore, by rotating only a portion of the plasma source, most other connections to the plasma source, such as gas inlets, cooling channels, and electrical connections, can remain fixed in place while the emission angle is adjusted.

[0049] Furthermore, multiple processes at different angles can be performed without disrupting the vacuum. For example, the plasma source 10 can be configured such that the exit aperture 210 is at a first angle relative to the workpiece. The workpiece can then be scanned in the scanning direction 301 using the workpiece holder 300, such that all portions of the workpiece are treated by the beam at this first angle. In some embodiments, at the scanning endpoint, the workpiece holder 300 can be rotated 180° and then scanned in the opposite direction, allowing the rotated workpiece to be exposed to the beam at this first angle. The plasma source 10 can then be modified to present the exit aperture 210 at a second angle relative to the workpiece while maintaining the vacuum. This rotation of the adjustable output plate 200 can occur when the workpiece holder 300 is located at the scanning endpoint. The workpiece holder 300 can then be moved along the scanning direction 301, allowing the workpiece to be treated by the beam at this second angle. Similarly, in some embodiments, the workpiece holder 300 can be rotated 180° and then scanned in the opposite direction, allowing the rotated workpiece to be exposed to the beam at this second angle.

[0050] Therefore, workpieces can be treated with beams at different angles without disrupting the vacuum. This is because the plasma source 10 can be adjusted at any time, not just during idle or maintenance periods.

[0051] This disclosure should not be limited to the specific embodiments described herein. In fact, various other embodiments and modifications of this disclosure will become apparent to those skilled in the art from the foregoing description and accompanying drawings, in addition to those described herein. Therefore, such other embodiments and modifications are intended to fall within the scope of this disclosure. Furthermore, while this disclosure has been described herein in the context of a specific implementation environment and for a specific purpose, those skilled in the art will recognize that its use is not limited thereto, and that this disclosure can be beneficially implemented in any number of environments for any number of purposes. Therefore, the claims listed below should be interpreted in accordance with the full breadth and spirit of this disclosure as described herein.

Claims

1. A plasma source for generating ions and neutral particles, comprising: The chamber shell has a cylindrical body defining the plasma chamber and two ends, wherein the shell opening is disposed in the cylindrical body along the circumferential direction; A plasma generator for generating plasma within the plasma chamber; as well as An adjustable output plate is disposed outside the cylindrical body and covers the housing hole. The adjustable output plate has an arc shape and its length in the circumferential direction is greater than that of the housing hole. The adjustable output plate has an emission hole and is rotatable relative to the housing hole.

2. The plasma source according to claim 1, wherein the outer casing aperture occupies a distance corresponding to at least 30° of the circumference of the cylindrical body.

3. The plasma source according to claim 1 further includes an external plate fixed to the adjustable output plate and having a defined hole aligned with the emission port.

4. The plasma source according to claim 3, wherein the external plate is electrically connected to the adjustable output plate.

5. The plasma source according to claim 3, wherein the external plate is electrically isolated from the adjustable output plate and biased with a different voltage than the adjustable output plate.

6. The plasma source of claim 5 further includes at least one additional electrode biased with a different voltage than the outer plate, disposed outside the exit hole and aligned with the exit hole.

7. The plasma source according to claim 1, wherein the housing aperture defines the range of motion of the adjustable output plate, and the range of motion is at least 30°.

8. The plasma source of claim 1 further includes a motor in communication with the adjustable output plate, wherein the motor is driven to rotate the adjustable output plate relative to the housing aperture to change the angle of the ejection aperture relative to the workpiece holder.

9. A processing system, comprising: The plasma source as described in claim 1; as well as The workpiece holder can move in the scanning direction.

10. A plasma source for generating ions and neutral particles, comprising: The chamber shell has a cylindrical body defining the plasma chamber and two ends, wherein the shell opening is disposed in the cylindrical body along the circumferential direction; A plasma generator for generating plasma within the plasma chamber; as well as An adjustable output plate is disposed outside the cylindrical body, wherein the adjustable output plate includes an upper adjustable output plate portion and a lower adjustable output plate portion, the upper adjustable output plate portion and the lower adjustable output plate portion are rotatable relative to the chamber shell, and wherein the space between the upper adjustable output plate portion and the lower adjustable output plate portion defines an exit hole, through which the ions and neutral particles exit the plasma chamber.

11. The plasma source according to claim 10, wherein the range of motion of the exit aperture is at least 30°.

12. The plasma source of claim 10, wherein the size of the emission aperture is adjustable in the circumferential direction.

13. The plasma source of claim 10 further includes an outer plate, the outer plate comprising an upper outer plate portion fixed to the upper adjustable output plate portion and a lower outer plate portion fixed to the lower adjustable output plate portion, wherein the space between the upper outer plate portion and the lower outer plate portion defines a defining hole, wherein the defining hole is aligned with the emission port.

14. The plasma source of claim 13, wherein the upper outer plate portion is electrically connected to the upper adjustable output plate portion, and the lower outer plate portion is electrically connected to the lower adjustable output plate portion.

15. The plasma source of claim 13, wherein the upper outer plate portion and the lower outer plate portion are electrically isolated from the adjustable output plate and biased at a voltage different from that of the adjustable output plate.

16. The plasma source of claim 15 further includes at least one additional electrode biased at a voltage different from that of the upper outer plate portion and the lower outer plate portion, disposed outside the exit hole and aligned with the exit hole.

17. The plasma source of claim 10, further comprising at least one motor in communication with the upper adjustable output plate portion and the lower adjustable output plate portion, wherein the at least one motor is driven to rotate the upper adjustable output plate portion and the lower adjustable output plate portion relative to the housing aperture to change the angle of the ejection aperture relative to the workpiece holder and / or the size of the ejection aperture.

18. The plasma source according to claim 17, wherein the upper adjustable output plate portion and the lower adjustable output plate portion are rotatable independently.

19. A processing system, comprising: The plasma source as described in claim 10; as well as The workpiece holder can move in the scanning direction.

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