Target sputtering angle control device for PET copper foil manufacturing

Abstract

The invention provides a target material sputtering angle control device for PET copper foil manufacturing. The target material sputtering angle control device is used for solving the problems that in the prior art, the target material utilization rate is low, the film coating uniformity is poor, the target material service life is short, replacement is tedious, the process adaptability is limited, and the production efficiency is limited. Therefore, the target material sputtering angle control device for manufacturing the PET copper foil comprises a sealed working cabin, an unwinding end, a vacuum sputtering cavity, an argon plasma cleaning cavity, an inert gas transition cavity, a horizontal electroplating section and a winding end, and all the cavities are sequentially connected end to end and communicated with one another. A magnetic pole mechanism and a target material supporting and adjusting mechanism are arranged in the vacuum sputtering cavity, the target material supporting and adjusting mechanism is used for adjusting the position and sputtering angle of a target material, and the target material supporting and adjusting mechanism is cooperatively matched with the magnetic pole mechanism, so that the position of the target material can be dynamically adjusted, magnetic field distribution is optimized, an effective etching area is expanded, plasma density distribution is optimized, and edge material waste is reduced; the target material utilization rate is improved, and the coating uniformity is ensured.

Description

Technical Field

[0001] This invention relates to the field of magnetron sputtering composite copper foil production technology, and in particular to a target sputtering angle control device for PET copper foil manufacturing. Background Technology

[0002] Magnetron sputtering, an important physical vapor deposition method, works by bombarding a target surface with high-energy particles, causing target atoms to detach and deposit onto the substrate to form a thin film. This technology is widely used in semiconductors, display devices, optical coatings, and new energy materials. In the production of composite copper foil, the combination of magnetron sputtering and electroplating has become the mainstream technology. However, existing technologies have significant limitations, resulting in low overall yields.

[0003] Existing magnetron sputtering equipment mainly includes the vertical magnetron sputtering equipment described in invention patent publication CN118516643A. This equipment discloses a high-pressure magnetron sputtering device for silicon dioxide thin films. Its technical solution involves adjusting the distance and angle between the substrate and the target material through a right-angled track groove design and an electric telescopic rod drive transmission structure to improve the uniformity and purity of the coating and prevent excessively thick film sputtering. However, this equipment is designed for traditional vertical single magnetron sputtering processes, which can only process a single workpiece or substrate at a time. Each processing cycle requires manual intervention for substrate loading / unloading and target replacement, resulting in low production efficiency. Its technical solution and processing method cannot meet the continuous processing requirements of roll-to-roll materials, and it also has inherent defects in target utilization and process adaptability, specifically manifested in the following ways: 1. Fixed sputtering angle of traditional planar targets: Existing technologies mostly use planar target designs with fixed angles, resulting in copper atoms being deposited in non-base film areas, leading to serious material waste. This fixed geometric configuration cannot adapt to the changing needs of different substrate shapes and sizes, resulting in low resource utilization.

[0004] 2. Short lifespan of target materials and cumbersome replacement operation affect production progress: The average lifespan of existing target materials is only about 200 hours. Target material replacement is cumbersome, and each time the target material is replaced, the process balance needs to be re-established, which increases the production interruption time.

[0005] 3. Poor uniformity in edge areas: The fixed-angle sputtering method and magnetic field distribution result in large errors in the thickness uniformity of the film edge areas, severely affecting the consistency of product performance. This non-uniformity will be further amplified in subsequent electroplating processes, ultimately affecting the overall quality of the composite copper foil.

[0006] 4. Limited process adaptability: Traditional target designs are difficult to adapt to the coating requirements of irregularly shaped substrates, which limits the application scope and development space of the technology.

[0007] 5. Gas cross-contamination problem: The lack of effective isolation measures at the junctions of different processing sections leads to the mixing of process gases, affecting the purity and quality of the membrane.

[0008] 6. Limited production efficiency: Most existing integrated magnetron sputtering and electroplating equipment cannot achieve simultaneous double-sided coating, which limits the production pace and cannot meet the needs of large-scale industrialization. Summary of the Invention

[0009] In view of the shortcomings of the prior art described above, the purpose of this invention is to provide a sputtering angle control device for PET copper foil production, which solves the problems of low target utilization, poor coating uniformity, short target life and cumbersome replacement, limited process adaptability and limited production efficiency in the existing magnetron sputtering composite copper foil production line.

[0010] To achieve the above and other related objectives, the present invention provides a sputtering angle control device for PET copper foil manufacturing, comprising: a sealed working chamber, an unwinding end, a vacuum sputtering chamber, an argon plasma cleaning chamber, an inert gas transition chamber, a horizontal electroplating section, and a winding end. The unwinding end, the vacuum sputtering chamber, the argon plasma cleaning chamber, the inert gas transition chamber, the horizontal electroplating section, and the winding end are arranged sequentially from left to right and connected end to end in sequence. The unwinding end and the vacuum sputtering chamber are covered by a sealed working chamber. The sealed working chamber is used to isolate the external environment and provide a dust-proof and oxidation-proof environment for the input and reversing conveying of PET film; The unwinding end is used to output uncoated PET film and to reverse the orientation of PET film that has only been coated on one side, and output it to the vacuum sputtering chamber. The vacuum sputtering cavity is used to deposit metal on the surface of the PET film through magnetron sputtering to form a conductive layer; The argon plasma cleaning chamber is used to remove impurities from the PET film surface by bombarding the deposited layer with high-energy ions, thereby increasing the surface roughness of the film. The active free radicals generated by argon ionization activate the surface molecular structure. The inert gas transition chamber is used to maintain an inert environment within the chamber and balance the pressure difference between the front and rear chambers by passing inert gas. The horizontal electroplating section is used to thicken and homogenize the metal layer on the surface of the PET film through water electroplating. The winding end is used to wind up the PET film that has been double-sided coated, and to reverse the direction of the PET film that has only been coated on one side, and output it to the unwinding end. The vacuum sputtering cavity includes a vacuum chamber, a membrane transfer groove, a rotary sealing cover, and an isolation plate. The right end of the unwinding end is fixedly connected to the vacuum chamber. Two membrane transfer grooves are opened on the left and right walls of the vacuum chamber, and the positions of the membrane transfer grooves on the left and right walls are horizontally corresponding. A rotary sealing cover is installed on the top of the vacuum chamber, and an isolation plate is installed in the middle of the vacuum chamber. Gas transition boxes are installed on both the inner and outer sides of the membrane transfer groove of the vacuum sputtering cavity. Gas transition boxes are also installed on both the inner and outer sides of the connecting groove of the argon plasma cleaning chamber, the inert gas transition chamber, and the horizontal electroplating section. A set of magnetic pole mechanisms is installed at the bottom and top of the vacuum chamber. Four sets of target support adjustment mechanisms are set in the vacuum chamber. Two sets of target support adjustment mechanisms are located between the upper part of the isolation plate and the lower part of the set of magnetic pole mechanisms. The other two sets of target support adjustment mechanisms are located between the lower part of the isolation plate and the upper part of the set of magnetic pole mechanisms. The gas transition box is used to restrict gas flow between tanks when the membrane is continuously conveyed in each processing section, to prevent direct mixing of gases between tanks, and to achieve a gradual transition of gas pressure. The magnetic pole mechanism is used to adjust the spacing between magnets and dynamically optimize the magnetic field distribution. The target support adjustment mechanism is used to adjust the position and sputtering angle of the target. In coordination with the magnetic pole mechanism, it can dynamically adjust the position of the target, expand the effective etching area, optimize the density distribution of plasma, and control the sputtering structure that affects the PET film.

[0011] Optionally, the unwinding end includes an unwinding roller, an unwinding lifting and stabilizing roller, and an unwinding guide roller. The unwinding roller is rotatably mounted on the left side of the unwinding end, and six unwinding lifting and stabilizing rollers are vertically slidably mounted on the right side of the unwinding end. Four unwinding guide rollers are rotatably mounted on the left side of the unwinding end. An input transition frame is provided at the connection between the unwinding end and the vacuum sputtering cavity, and an unwinding guide roller is also provided in the input transition frame.

[0012] Optionally, the winding end includes a winding roller, a winding lifting and stabilizing roller, and a winding guide roller. A winding roller is rotatably mounted on the right side of the winding end's housing, and three winding lifting and stabilizing rollers are vertically slidably mounted on the left side of the winding end's frame. Three winding guide rollers are rotatably mounted on the right side of the winding end's housing. An output transition frame is provided at the connection between the horizontal electroplating section and the winding end, and a winding guide roller is also provided inside the output transition frame. The PET film is unwound from the unwinding roller, passes through the outer walls of the unwinding lifting and stabilizing roller, the unwinding guide roller, the winding lifting and stabilizing roller, and the winding guide roller, and is then wound up by the winding roller.

[0013] Optionally, the gas transition box includes a transition box body, a transition conveying port, a fixed partition, a mounting slide, and a sealing rubber roller. The left and right walls of the transition box body are provided with transition conveying ports. A fixed partition is installed between the front and rear parts of the transition box body. Mounting slides are slidably arranged in the left and right parts of the two fixed partitions, and the positions of the front mounting slide and the rear mounting slide are vertically corresponding. The two vertically corresponding mounting slides form a pair. Sealing rubber rollers are rotatably installed on the upper and lower parts of each pair of mounting slides, and the two adjacent sealing rubber rollers are tangent to each other. The tangent lines of the two pairs of sealing rubber rollers are on the same horizontal plane as the horizontal center line of the transition conveying port. The left pair of sealing rubber rollers is tangent to the inner side of the left wall of the transition box body, and the right pair of sealing rubber rollers is tangent to the inner side of the right wall of the transition box body.

[0014] Optionally, the gas transition box further includes a first hexagonal drive shaft, a sealed drive pulley, a rotating bushing, a first driving bevel gear, a first driven bevel gear, and a linkage spur gear. Rotating bushings are rotatably mounted on the front left and right walls of the transition box and on the front left and right walls of the vacuum chamber, respectively, located inside and outside the vacuum chamber. A first hexagonal drive shaft is fixedly sleeved between the inner walls of two adjacent rotating bushings of the transition box on the same horizontal line. A sealed drive pulley is fixedly sleeved at the outer end of each of the first hexagonal drive shafts. Four first driving bevel gears are slidably sleeved on the outer wall of the first hexagonal drive shaft. A first driven bevel gear is fixedly sleeved on the outer wall of the front end of the lower sealing rubber roller, and the corresponding first driving bevel gears and first driven bevel gears are meshed together. A linkage spur gear is fixedly sleeved on the outer wall of the rear end of each sealing rubber roller, and two adjacent linkage spur gears are meshed together.

[0015] Optionally, the magnetic pole mechanism includes a magnetic shielding plate, a magnetic yoke, and permanent magnets. The bottom and top of the vacuum chamber are fixed with magnetic shielding plates, the front end and rear end of the lower wall of the magnetic shielding plate are fixed with magnetic yokes, and a plurality of permanent magnets are arranged on the inner side of the magnetic shielding plate.

[0016] Optionally, the permanent magnets are arranged parallel to the outside of the rotating target, and four permanent magnets are arranged on the outside of each rotating target. The diameter of the permanent magnets is one-tenth of the diameter of the rotating target. The magnetic poles of adjacent permanent magnets are arranged alternately in the N-S direction. Several sliders matching the number of permanent magnets are slidably installed on the inner side of the magnetic shielding plate, and the permanent magnets are fixed on the sliders.

[0017] Optionally, the target material support adjustment mechanism includes a fixed base plate, slots, universal mounting brackets, lifting guide rails, lifting guide rail blocks, a front lifting base plate, a support seat, a second hexagonal transmission shaft, a reducer, front and rear stabilizing guide rails, limit guide rail blocks, a rotating power pulley, and a power transmission belt. A fixed base plate is installed on the inner side of the rear wall of the vacuum chamber. Sixteen slots are equidistantly spaced on the front wall of the fixed base plate. Universal mounting brackets are slidably installed in the slots. Two lifting guide rails are installed on the inner side of the front wall of the vacuum chamber, with their positions corresponding to the left and right ends of the fixed base plate, respectively. Lifting guides are slidably installed within the lifting guide rails. The system includes a rail block, a front lifting base plate fixed between two lifting guide rail blocks, sixteen support seats equally spaced on the front lifting base plate, and a second hexagonal transmission shaft rotatably mounted between the upper parts of the sixteen support seats. A reducer is installed in the vacuum chamber. Two front and rear tensioning guide rails are mounted on the inner side of the front wall of the vacuum chamber via brackets. Limiting guide rail blocks are slidably installed in both front and rear tensioning guide rails. Rotary power pulleys are installed between the two limiting guide rail blocks, on the outer wall of the output end of the reducer, and on the right end of the second hexagonal transmission shaft. Power transmission belts are rotatably sleeved on the outer walls of the three rotary power pulleys located on the same vertical plane.

[0018] Optionally, the sealed transmission pulley is synchronized with the rotation of the rotating power pulley via a belt drive mechanism.

[0019] Optionally, the target support adjustment mechanism further includes a second driving bevel gear, a second driven bevel gear, a front threaded mounting cylinder, a sliding rotary seat, a rotating target, a rear threaded mounting cylinder, and a universal ball. Sixteen second driving bevel gears are equidistantly slidably sleeved on the outer wall of the second hexagonal transmission shaft. Sixteen sliding rotary seats are equidistantly slidably installed inside the front lifting base plate, and the sliding rotary seats are C-shaped flat keys. A front threaded mounting cylinder is rotatably installed inside the bottom of the sixteen sliding rotary seats. A second driven bevel gear is fixedly sleeved on the outer wall of the front end of the front threaded mounting cylinder, and the second driven bevel gear is correspondingly meshed with the second driving bevel gear that matches the position. A rotating target is threadedly installed on the inner wall of the rear end of the front threaded mounting cylinder. A rear threaded mounting cylinder is threadedly installed on the inner wall of the rear end of the rotating target. A universal ball is fixed at the rear end of the rear threaded mounting cylinder, and the universal ball is rotatably installed in a universal bracket with multiple degrees of freedom.

[0020] As described above, the target sputtering angle control device for PET copper foil manufacturing of the present invention has at least the following beneficial effects: 1. By rotating the target through the target support adjustment mechanism, the sputtering angle of the target can be dynamically adjusted, thereby increasing the effective utilization area of ​​the target, reducing local over-etching, extending the service life of the target, reducing material waste caused by copper atom deposition in non-base film areas, significantly improving the utilization rate of the target, and reducing material costs.

[0021] 2. By controlling the magnetic field of the magnetic pole mechanism, the density distribution of plasma is optimized, effectively solving the problem of poor thickness uniformity in the thin film edge area caused by traditional fixed-angle sputtering methods, and improving the consistency of product performance.

[0022] 3. By adjusting the target head tilt angle through the target support adjustment mechanism, the utilization rate of the target material can be further improved. At the same time, the energy and angle of the incident particles can be controlled, thereby affecting the distribution density of plasma on the target surface and controlling the film density to meet the coating requirements of irregularly shaped substrates. This is conducive to expanding the application range and development space of magnetron sputtering technology.

[0023] 4. The target material threaded connection and transmission mechanism sliding installation through the target material support adjustment mechanism simplify the target material replacement operation, reduce target replacement time, improve the overall efficiency of the equipment, and facilitate efficient production.

[0024] 5. By designing a gas transition box, gas flow between processing sections is restricted, achieving a gradual transition in gas pressure. This effectively prevents the mixing and cross-contamination of process gases, ensuring the purity and quality of the membrane, while also avoiding membrane deformation caused by sudden pressure changes.

[0025] 6. Through the continuous film conveying path design at the unwinding and rewinding ends, a double-sided continuous film coating production conveying system is formed, which runs from the unwinding end, through the vacuum sputtering chamber, the argon plasma cleaning chamber, the inert gas transition chamber, the horizontal electroplating section, the rewinding end, and back to the unwinding end. This system enables continuous double-sided film coating of PET film, greatly improves production efficiency, and helps meet the needs of large-scale production. Attached Figure Description

[0026] Figure 1 The diagram shown is a front view of the overall structure of the present invention.

[0027] Figure 2 The diagram shown is a front view of the overall structure of the present invention in the unsealed working chamber state.

[0028] Figure 3 The diagram shows the front view of the PET film fabric of the present invention between the winding end, the unwinding end, and the vacuum sputtering cavity.

[0029] Figure 4 The image shown is a three-dimensional schematic diagram of the overall structure of the vacuum sputtering cavity of this invention from a southeast perspective.

[0030] Figure 5 The diagram shows a three-dimensional view of the vacuum sputtering cavity without the rotating sealing cover of the present invention.

[0031] Figure 6 Shown is a southeast-view perspective view of the installation position of the gas transfer box and target support adjustment mechanism of the present invention in the vacuum chamber.

[0032] Figure 7 The image shown is a front sectional view of the vacuum chamber of this invention.

[0033] Figure 8 This invention is shown as Figure 7 A magnified schematic diagram of the structure of region A in the image.

[0034] Figure 9 The diagram shown is a top-view perspective view of the gas transfer box of the present invention without a top cover.

[0035] Figure 10 The image shown is a southeast-view perspective view of the transmission structure within the gas transfer box of this invention.

[0036] Figure 11 The diagram shown is a left-side view of the magnetic pole mechanism of the present invention.

[0037] Figure 12 Shown is a perspective view from the southeast of the target material support adjustment mechanism of the present invention.

[0038] Figure 13 This invention is shown as Figure 12 A magnified schematic diagram of the structure of region B in the image.

[0039] Figure 14 The image shown is a southwest perspective view of the single rotating target transmission structure of the present invention.

[0040] Component designation explanation 1. Sealed working chamber; 2. Unwinding end; 201. Unwinding roll; 202. Unwinding lifting and stabilizing roll; 203. Unwinding guide roll; 3. Vacuum sputtering chamber; 301. Vacuum chamber; 302. Membrane cloth transfer groove; 303. Rotary sealing cover; 304. Isolation plate; 4. Argon plasma cleaning chamber; 5. Inert gas transition chamber; 6. Horizontal electroplating section; 7. Rewinding end; 8. Gas transfer box; 801. Transfer box body; 802. Transfer port; 803. Fixed partition; 804. Mounting slide; 805. Sealing rubber roller; 806. First hexagonal drive shaft; 807. Sealing drive pulley; 808. Rotating bushing; 809. First driving bevel gear; 810. First driven bevel gear; 811. Linkage spur gear; 9. Magnetic pole mechanism; 901. Magnetic shielding plate; 902. Magnetic yoke; 903. Permanent magnet; 904. Slider; 10. Target material support and adjustment mechanism; 101. Fixed base plate; 102. Slot; 103. Universal mounting seat; 104. Lifting guide rail; 105. Lifting guide rail block; 106. Front lifting base plate; 107. Support seat; 108. Second hexagonal drive shaft; 109. Reducer; 110. Front and rear tensioning guide rails; 111. Limiting guide rail block; 112. Rotating power pulley; 113. Power transmission belt; 114. Second driving bevel gear; 115. Second driven bevel gear; 116. Front threaded mounting cylinder; 117. Sliding rotary seat; 118. Rotating target material; 119. Rear threaded mounting cylinder; 120. Universal ball. Detailed Implementation

[0041] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0042] As described in the background section, the combined production technology of magnetron sputtering and electroplating processes in the field of composite copper foil production has significant limitations, resulting in low overall yield. For example, the invention patent with publication number CN118516643A discloses a high-pressure magnetron sputtering device for silicon dioxide thin films. The technical solution of this device is to adjust the distance and angle between the substrate and the target material through a right-angled track groove design and an electric telescopic rod driven transmission structure to improve the uniformity and purity of the coating and prevent the film from being sputtered too thick. However, this device is designed for the traditional vertical single magnetron sputtering process, which can only process a single workpiece or substrate at a time. Each processing cycle requires manual intervention for substrate loading and unloading and target material replacement, resulting in low production efficiency. Its technical solution and processing method cannot meet the needs of continuous roll processing. It also has inherent defects in terms of target material utilization and process adaptability, specifically: 1. Fixed sputtering angle of traditional planar targets: Existing technologies mostly adopt a planar target design with a fixed angle, resulting in copper atoms being deposited in non-base film areas, leading to serious material waste. 1. The fixed geometric configuration cannot adapt to the changing needs of different substrate shapes and sizes, resulting in low resource utilization; 2. Short target life and cumbersome replacement operation, affecting production progress: The average lifespan of existing targets is only about 200 hours. Target replacement is cumbersome, and each target replacement requires re-establishing process balance, increasing production downtime; 3. Poor uniformity in the edge area: The fixed sputtering angle and magnetic field distribution result in large errors in the thickness uniformity of the film edge area, seriously affecting the performance consistency of the product. This non-uniformity will be further amplified in the subsequent electroplating process, ultimately affecting the overall quality of the composite copper foil; 4. Limited process adaptability: Traditional target design is difficult to adapt to the coating requirements of irregularly shaped substrates, limiting the application scope and development space of the technology; 5. Gas cross-contamination problem: The lack of effective isolation measures at the junction of each processing section leads to the mixing of process gases, affecting the purity and quality of the film; 6. Limited production efficiency: Most existing integrated magnetron sputtering and electroplating equipment cannot achieve double-sided synchronous coating, which limits the production rhythm and cannot meet the needs of large-scale industrialization. Example 1

[0043] Please see Figures 1-3To address the problems of low production efficiency caused by the inability of traditional vertical single magnetron sputtering equipment to achieve continuous production and double-sided synchronous coating, this invention provides a sputtering angle control device for PET copper foil production. The device includes: a sealed working chamber 1, an unwinding end 2, a vacuum sputtering chamber 3, an argon plasma cleaning chamber 4, an inert gas transition chamber 5, a horizontal electroplating section 6, and a winding end 7. These components are arranged sequentially from left to right, end-to-end, and interconnected. The unwinding end 2 and the vacuum sputtering chamber 3 are externally covered by the sealed working chamber 1, which isolates the external environment and provides a dust-proof and oxidation-proof environment for PET film input and reversing transport. The unwinding end 2 outputs uncoated PET film and handles PET film with only one side coated. The PET film is reversed and output to the vacuum sputtering chamber 3. The vacuum sputtering chamber 3 is used to deposit metal on the surface of the PET film through magnetron sputtering to form a conductive layer. The argon plasma cleaning chamber 4 is used to remove impurities on the surface of the PET film by bombarding the deposited layer with high-energy ions, while increasing the surface roughness of the film and improving the adhesion of subsequent coatings. The active free radicals generated by argon ionization activate the surface molecular structure and enhance the bonding strength of the film layer. The inert gas transition chamber 5 is used to maintain the inert environment in the chamber through inert gas to prevent oxidation of the PET film and balance the pressure difference between the front and rear chambers to avoid deformation or contamination of the film material caused by sudden vacuum changes. The horizontal electroplating section 6 is used to thicken and homogenize the metal layer on the surface of the PET film through water electroplating. The winding end 7 is used to wind up the PET film that has been coated on both sides and reverse the direction of the PET film that has been coated on only one side, outputting it to the unwinding end 2.

[0044] More comprehensively, such as Figures 3-7 As shown, the vacuum sputtering chamber 3 includes a vacuum chamber 301, a membrane fabric transfer groove 302, a rotary sealing cover plate 303, and an isolation plate 304. The right end of the unwinding end 2 is fixedly connected to the vacuum chamber 301. Two membrane fabric transfer grooves 302 are provided on the left and right walls of the vacuum chamber 301. The two upper membrane fabric transfer grooves 302 and the two lower membrane fabric transfer grooves 302 provide a transfer path for the synchronous processing of two membrane fabrics. The positions of the membrane fabric transfer grooves 302 on the left wall and the membrane fabric transfer grooves 302 on the right wall are horizontally corresponding. A rotary sealing cover plate 303 is installed on the top of the vacuum chamber 301, and an isolation plate 304 is installed in the middle of the vacuum chamber 301. The isolation plate 304 can divide the vacuum sputtering chamber 3 into two magnetron processing spaces, upper and lower.

[0045] More comprehensively, such as Figure 3As shown, the unwinding end 2 includes an unwinding roller 201, an unwinding lifting and stabilizing roller 202, and an unwinding guide roller 203. The unwinding roller 201 is rotatably mounted on the left side of the unwinding end 2, and six unwinding lifting and stabilizing rollers 202 are vertically slidably mounted on the right side of the unwinding end 2. The unwinding lifting and stabilizing rollers 202 can adjust the tension of the film by vertical sliding, so that the tension of the film is stable during unwinding and reversing. Four unwinding guide rollers 203 are rotatably mounted on the left side of the unwinding end 2, which can help the film to be reversed and output. An input transition frame is provided at the connection between the unwinding end 2 and the vacuum sputtering chamber 3, and the input transition frame is also provided with unwinding guide rollers 203.

[0046] More comprehensively, such as Figure 3 As shown, the winding end 7 includes a winding roller 701, a winding lifting and stabilizing roller 702, and a winding guide roller 703. A winding roller 701 is rotatably mounted on the right side of the winding end 7, and three winding lifting and stabilizing rollers 702 are vertically slidably mounted on the left side of the winding end 7. The winding lifting and stabilizing rollers 702 can be adjusted vertically to maintain stable film tension. Three winding guide rollers 703 are rotatably mounted on the right side of the winding end 7. An output transition frame is provided at the connection between the horizontal electroplating section 6 and the winding end 7. A winding guide roller 703 is also provided in the output transition frame. The PET film is unwound and output from the unwinding roller 201. The film is reversed at the winding end 7 by the guide roller 703 and the lifting and stabilizing roller 702. After passing through the outer wall of the unwinding lifting and stabilizing roller 202, the unwinding guide roller 203, the winding lifting and stabilizing roller 702, and the winding guide roller 703, it is wound up by the winding roller 701.

[0047] Specifically, in use, the unwinding roller 201 rotates to the right to output the uncoated PET film. The PET film first passes between the two unwinding lifting and stabilizing rollers 202 in the middle of the right frame of the unwinding end 2, and then enters each stage of the coating process. First, it passes through the film conveying groove 302 below the vacuum sputtering chamber 3 to complete the first-side metal deposition. Then, it undergoes surface cleaning and roughening through the argon plasma cleaning chamber 4. After pressure balancing through the inert gas transition chamber 5, it enters the horizontal electroplating section 6 for metal layer thickening. After single-sided coating is completed, it continues to be output to the right to the winding end 7. The film is reversed by the two winding guide rollers 703 in the middle of the right frame of the winding end 7 and output to the left. It passes through the winding lifting and stabilizing rollers 702 below the left frame of the winding end 7 from right to left, passing under each stage of the coating process, and returns to the unwinding end 2. It then passes through the unwinding section below the right frame of the unwinding end 2. The lifting and stabilizing roller 202 and the four unwinding guide rollers 203 on the left side of the machine box are reversed, and the film cloth continues to be output from left to right. After passing through the three unwinding lifting and stabilizing rollers 202 on the upper part of the right side of the unwinding end 2, it enters the film cloth conveying groove 302 on the upper part of the vacuum sputtering chamber 3 for the other side of the film coating process. Finally, it reaches the winding end 7, passes through the two winding lifting and stabilizing rollers 702 on the upper part of the left side of the winding end 7 and the winding guide rollers 703 on the right side of the machine box, and is wound up by the winding roller 701. In this way, a double-sided continuous film coating production conveying system is formed from the unwinding end 2, the vacuum sputtering chamber 3, the argon plasma cleaning chamber 4, the inert gas transition chamber 5, the horizontal electroplating section 6, the winding end 7 and back to the unwinding end 2. With a unique film cloth conveying path, double-sided continuous film coating of PET film cloth is realized, which greatly improves production efficiency and is conducive to meeting the needs of large-scale production. Example 2

[0048] Please see Figure 3 and Figures 6-10 To address the issues of cross-contamination of gases and membrane deformation caused by sudden pressure changes in various process stages, this invention provides a sputtering angle control device for PET copper foil manufacturing. The device further includes a gas transition box 8. Gas transition boxes 8 are installed on both the inner and outer sides of the membrane fabric transfer groove 302 in the vacuum sputtering chamber 3. Gas transition boxes 8 are also installed on both the inner and outer sides of the connecting grooves of the argon plasma cleaning chamber 4, the inert gas transition chamber 5, and the horizontal electroplating section 6. The gas transition boxes 8 are used to restrict gas flow between grooves during continuous transfer of the membrane fabric in each processing stage, preventing direct mixing of gases between grooves and achieving a gradual transition in gas pressure to prevent membrane deformation caused by sudden pressure changes. More comprehensively, such as Figures 6-10As shown, the gas transfer box 8 includes a transfer box body 801, a transfer port 802, a fixed partition 803, a mounting slide 804, and a sealing rubber roller 805. The transfer box body 801 has transfer ports 802 on both its left and right walls. A fixed partition 803 is installed between the front and rear parts of the transfer box body 801. Mounting slides 804 are slidably disposed within the left and right parts of the two fixed partitions 803, with the front mounting slide 804 and the rear mounting slide 804 positioned perpendicularly to each other. Two vertically corresponding mounting slides 804 form a pair, and the upper and lower parts of each pair of mounting slides 804 are rotatably mounted. The device is equipped with sealing rubber rollers 805, and two adjacent sealing rubber rollers 805 rotate tangent to each other. The tangent lines of the two pairs of sealing rubber rollers 805 are on the same horizontal plane as the horizontal center line of the transition conveyor 802. The left pair of sealing rubber rollers 805 rotate tangent to the inner side of the left wall of the transition box 801, and the right pair of sealing rubber rollers 805 rotate tangent to the inner side of the right wall of the transition box 801. This makes the adjacent sealing rubber rollers 805 rotate tangent to each other and rotate and squeeze the side wall of the transition box 801, forming a dynamic sealing barrier, which restricts the gas within the angle formed by the upper and lower sealing rubber rollers 805 and the side wall of the transition box 801.

[0049] More comprehensively, such as Figures 6-10 As shown, the gas transition box 8 also includes a first hexagonal drive shaft 806, a sealed drive pulley 807, a rotating bushing 808, a first driving bevel gear 809, a first driven bevel gear 810, and a linkage spur gear 811. Rotating bushings 808 are rotatably mounted on the front left and right walls of the transition box 801 and the front left and right walls of the vacuum chamber 301, respectively, located inside and outside the vacuum chamber 301. The first hexagonal drive shaft 806 is fixedly sleeved between the inner walls of the rotating bushings 808 of two adjacent transition box bodies 801 on the same horizontal line. A sealed drive pulley 807 is fixedly sleeved at the outer end of each of the first hexagonal drive shafts 806. Four first driving bevel gears 809 are slidably sleeved on the outer wall of the driving shaft 806. A first driven bevel gear 810 is fixedly sleeved on the front outer wall of the lower sealing rubber roller 805, and the first driving bevel gears 809 and the first driven bevel gears 810 are meshed and connected in corresponding positions. A linkage spur gear 811 is fixedly sleeved on the rear outer wall of the sealing rubber roller 805, and two adjacent linkage spur gears 811 are meshed and connected, which can ensure that each pair of sealing rubber rollers 805 rotates synchronously in opposite directions with the same speed to convey the membrane cloth. The first hexagonal drive shaft 806 is synchronized with the rotating power pulley 112 through the sealing drive pulley 807, so that the gas isolation and membrane cloth conveying speed are matched.

[0050] Specifically, during use, when the PET film is transitioning between the two processing chambers, the PET film enters the transition box 801 through the transition conveyor 802. Two pairs of sealing rubber rollers 805 form a sealing contact on the upper and lower surfaces of the film. Adjacent sealing rubber rollers 805 rotate tangentially to each other and rotate and compress against the side wall of the transition box 801, forming a dynamic sealing barrier that confines the gas within the angle formed by the upper and lower sealing rubber rollers 805 and the side wall of the transition box 801. Simultaneously, through the meshing transmission of the first driving bevel gear 809 and the first driven bevel gear 810, and the synchronized action of the linkage spur gear 811, it is ensured that each... The sealing rubber roller 805 rotates synchronously in opposite directions at the same speed to convey the membrane cloth. The first hexagonal drive shaft 806 is synchronized with the rotating power pulley 112 through the sealed drive pulley 807, so that the gas isolation matches the membrane cloth conveying speed. This reduces gas cross-contamination during the conveying of the membrane cloth in each processing section, ensures the sputtering coating effect of the vacuum sputtering chamber 3, and prevents the mixing and consumption of a large amount of gas in the argon plasma cleaning chamber 4 and the inert gas transition chamber 5. This ensures the coating treatment effect and quality, and realizes the gradual transition of gas pressure, preventing membrane cloth deformation caused by excessive pressure difference between the vacuum chamber 301 and other chambers. Example 3

[0051] Please see Figure 3 , Figures 5-7 and Figures 11-14 To address the "racetrack effect" and uneven sputtering caused by traditional fixed magnetic fields, as well as the waste and cumbersome disassembly / reassembly of traditional planar targets due to fixed sputtering angles, this invention provides a target sputtering angle control device for PET copper foil manufacturing. The device further includes a magnetic pole mechanism 9 and a target support adjustment mechanism 10. A set of magnetic pole mechanisms 9 is installed at both the bottom and top of the vacuum chamber 301. Four sets of target support adjustment mechanisms 10 are arranged within the vacuum chamber 301. Two sets of target support adjustment mechanisms 10 are positioned above the isolation plate 304 and below the upper set of magnetic pole mechanisms 9, while the other two sets are positioned on the isolation plate. Between the lower part of the 304 and the upper part of the set of magnetic pole mechanisms 9, the magnetic pole mechanism 9 is used to adjust the spacing of the magnets, dynamically optimize the magnetic field distribution, avoid local over-etching caused by the "racetrack effect", and improve the uniformity of target sputtering. The target support adjustment mechanism 10 is used to adjust the position and sputtering angle of the target. It works in conjunction with the magnetic pole mechanism 9 to dynamically adjust the position of the target, expand the effective etching area, reduce edge material waste, and improve the target utilization rate. Through the linkage of angle and magnetic field, the density distribution of plasma can be optimized, the sputtering structure affecting the PET film can be controlled, the deposition rate and film density can be improved, and the differentiated coating needs of different fields can be met.

[0052] More comprehensively, such as Figure 11As shown, the magnetic pole mechanism 9 includes a magnetic shielding plate 901, a magnetic yoke 902, and a permanent magnet 903. The bottom and top of the vacuum chamber 301 are fixed with magnetic shielding plates 901 to prevent magnetic field leakage. The front and rear ends of the lower wall of the magnetic shielding plate 901 are fixed with magnetic yokes 902 to enhance the magnetic field strength. Several permanent magnets 903 are arranged inside the magnetic shielding plate 901 to generate a magnetic field to constrain the movement of electrons.

[0053] More comprehensively, such as Figure 5 , Figure 7 and Figure 11 As shown, permanent magnets 903 are arranged parallel to the outside of rotating target 118. Four permanent magnets 903 are arranged outside each rotating target 118. The diameter of the permanent magnets 903 is one-tenth of that of the rotating target 118, so that the permanent magnets 903 can form a sufficiently strong magnetic field to effectively confine electrons without excessively restricting their movement. The magnetic poles of adjacent permanent magnets 903 are arranged in alternating N-S directions. This alternating N-S arrangement can effectively confine the electron movement path and prolong the residence time of electrons on the target surface. Several sliders 904 matching the number of permanent magnets 903 are slidably installed on the inner side of the magnetic shielding plate 901, and the permanent magnets 903 are fixed on the sliders 904. By controlling the movement of the sliders 904, the spacing of the permanent magnets 903 can be dynamically adjusted to change the relative distance between the permanent magnets 903 and the rotating target 118, thereby dynamically optimizing the magnetic field distribution.

[0054] More comprehensively, such as Figures 6-7 and Figures 12-14As shown, the target material support and adjustment mechanism 10 includes a fixed base plate 101, a slot 102, a universal mounting base 103, a lifting guide rail 104, a lifting guide rail block 105, a front lifting base plate 106, a support base 107, a second hexagonal transmission shaft 108, a reducer 109, front and rear tensioning guide rails 110, a limiting guide rail block 111, a rotating power pulley 112, and a power transmission belt 113. The fixed base plate 101 is installed on the inner side of the rear wall of the vacuum chamber 301, and sixteen equidistant openings are provided on the front wall of the fixed base plate 101. A slot 102 is provided, within which a universal mounting bracket 103 is slidably installed. Two lifting guide rails 104 are installed on the inner side of the front wall of the vacuum chamber 301, with their positions corresponding to the left and right ends of the fixed base plate 101, respectively. Lifting guide rail blocks 105 are slidably installed within the lifting guide rails 104, and a front lifting base plate 106 is fixed between the two lifting guide rail blocks 105. By controlling the sliding of the lifting guide rail blocks 105 within the lifting guide rails 104, the overall height of the front lifting base plate 106 can be adjusted. Sixteen support seats 107 are equidistantly mounted on the front lifting base plate 106. A second hexagonal drive shaft 108 is rotatably mounted between the upper parts of the sixteen support seats 107. A reducer 109 is installed inside the vacuum chamber 301. Two front and rear tensioning guide rails 110 are mounted on the inner side of the front wall of the vacuum chamber 301 via brackets. Limiting guide blocks 111 are slidably installed in both front and rear tensioning guide rails 110. The two limiting guide blocks 111 are located between the outer wall of the output end of the reducer 109 and the right end of the second hexagonal drive shaft 108. Each of the three rotating power pulleys 112 is equipped with a power transmission belt 113 rotatably sleeved on the outer wall of the three rotating power pulleys 112 located on the same vertical plane. The control limit guide block 111 slides back and forth within the front and rear tension guide rails 110, and the position of the middle rotating power pulley 112 can be adjusted to adapt to the tension change of the power transmission belt 113 and prevent belt drive failure. The sealing transmission pulley 807 keeps synchronized with the rotation of the rotating power pulley 112 through the belt drive mechanism, so that the gas isolation and membrane conveying speed are matched.

[0055] More comprehensively, such as Figure 6 and Figures 12-14As shown, the target material support adjustment mechanism 10 also includes a second driving bevel gear 114, a second driven bevel gear 115, a front threaded mounting cylinder 116, a sliding rotary seat 117, a rotating target material 118, a rear threaded mounting cylinder 119, and a universal ball 120. Sixteen second driving bevel gears 114 are equidistantly slidably sleeved on the outer wall of the second hexagonal transmission shaft 108. Sixteen sliding rotary seats 117 are equidistantly slidably installed inside the front lifting base plate 106, and each sliding rotary seat 117 is C-shaped. A front threaded mounting cylinder 116 is rotatably mounted inside the bottom of each of the sixteen sliding rotary seats 117. A second driven bevel gear 115 is fixedly sleeved on the outer wall of the front end of the front threaded mounting cylinder 116, and the second driven bevel gear 115 meshes with the corresponding second driving bevel gear 114. The rear end of the front threaded mounting cylinder 116... A rotating target 118 is threadedly mounted on the wall. The second driving bevel gear 114 on the second hexagonal drive shaft 108 meshes with the second driven bevel gear 115 on the front threaded mounting cylinder 116, which can drive the front threaded mounting cylinder 116 to rotate. Since the rotating target 118 is threadedly mounted inside the front threaded mounting cylinder 116, its rotation will drive the rotating target 118 to rotate in linkage, so that the target surface is evenly exposed to the plasma bombardment area, improving the utilization rate of the target. A rear threaded mounting cylinder 119 is threadedly mounted on the inner wall of the rear end of the rotating target 118. The threaded mounting facilitates the disassembly and replacement of the rotating target 118. A universal ball 120 is fixed at the rear end of the rear threaded mounting cylinder 119, and the universal ball 120 is rotatably mounted in the universal bracket 103 with multiple degrees of freedom, so that the universal ball 120 can cooperate with the movement of the rotating target 118.

[0056] Specifically, in use, by controlling the movement of the slider 904, the spacing of the permanent magnets 903 can be dynamically adjusted to change the relative distance between the permanent magnets 903 and the rotating target 118, thereby dynamically optimizing the magnetic field distribution. The permanent magnets 903 with alternating N and N poles generate a gradient magnetic field, which controls the plasma distribution range. For example, when the rotating target 118 rotates at a speed of 5-30 rpm, the changing magnetic field gradient is 50-200 Gauss, thereby indirectly adjusting the effective sputtering angle range, avoiding the "runway effect" caused by excessive plasma concentration, and improving sputtering uniformity. The magnetic yoke 902 can enhance the magnetic field strength, and the magnetic shielding plate 901 prevents magnetic field leakage. Together with the isolation plate 304, the vacuum chamber 301 is divided into two independent magnetron sputtering spaces, preventing the upper and lower magnetic fields from affecting each other and ensuring the sputtering coating effect. Simultaneously, the reducer 109 drives the rotating power pulley 112 to rotate, which in turn drives the power transmission belt 113 to rotate the second hexagonal transmission shaft 108. The second active bevel gear 114 on the second hexagonal transmission shaft 108 meshes with the second driven bevel gear 115 on the front threaded mounting cylinder 116, thereby driving the front threaded mounting cylinder 116 to rotate. Since the rotating target 118 is threaded inside the front threaded mounting cylinder 116, its rotation will drive the rotating target 118 to rotate in conjunction. The rotation of the rotating target 118 can make the target surface uniformly exposed to the plasma bombardment area, improve the utilization rate of the target, and the rotation of the rotating target 118 can compensate for the uneven distribution of the magnetic field during the magnetic field adjustment process, stabilize the sputtering deposition rate, prevent the fixed position of the film cloth from forming deep grooves during the sputtering process, and make the sputtering coating on the PET film cloth surface uniform. Furthermore, by controlling the sliding of the lifting guide block 105 within the lifting guide rail 104, the overall height of the front lifting base plate 106 can be adjusted, thereby adjusting the target head tilt angle of the rotating target material 118. During the adjustment process, regardless of whether the upper rotating power pulley 112 rises or falls, the tension of the power transmission belt 113 will change. At this time, by controlling the sliding of the limiting guide block 111 within the front and rear tensioning guide rails 110, the position of the middle rotating power pulley 112 can be adjusted to adapt to the tension changes of the power transmission belt 113, preventing belt drive failure. The second hexagonal drive shaft 108 stops rotating, allowing the target material 118 to continue rotating during the target head tilt angle adjustment process. The universal ball 120 can cooperate with the movement of the rotating target material 118 and rotate in multiple degrees of freedom within the universal mounting bracket 103, thereby further improving the target material utilization rate. At the same time, adjusting the target tilt angle can control the energy and angle of the incident particles, thereby affecting the plasma distribution density on the target surface and controlling the film density to meet the coating requirements of irregularly shaped substrates. This is beneficial for expanding the application range and development space of magnetron sputtering technology. Finally, the threaded connection between the rotating target 118 and the front threaded mounting cylinder 116 and the rear threaded mounting cylinder 119, as well as the sliding mounting of the sliding rotary seat 117 and the front lifting base plate 106, and the sliding mounting of the universal bracket 103 and the slot 102, all facilitate the disassembly and replacement of the rotating target 118 when it needs to be replaced. This allows workers to either fix the front threaded mounting cylinder 116 or the rear threaded mounting cylinder 119 and rotate the rotating target 118 to disassemble and replace a single target, or slide the sliding rotary seat 117 and the universal bracket 103 together and then disassemble and replace the target. The operation is simple, which can reduce the time of production interruption and avoid affecting the production schedule.

[0057] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A target sputtering angle control device for manufacturing PET copper foil, characterized in that, include: The unwinding end (1), the unwinding end (2), the vacuum sputtering chamber (3), the argon plasma cleaning chamber (4), the inert gas transition chamber (5), the horizontal electroplating section (6), and the winding end (7) are arranged from left to right and connected end to end in sequence. The unwinding end (2) and the vacuum sputtering chamber (3) are covered by the sealed working chamber (1). The sealed working chamber (1) is used to isolate the external environment and provide a dustproof and oxidation-proof environment for the input and reversing transmission of PET film cloth; The unwinding end (2) is used to output uncoated PET film and to reverse the orientation of PET film that has only been coated on one side, and output it to the vacuum sputtering chamber (3). The vacuum sputtering cavity (3) is used to deposit metal on the surface of the PET film by magnetron sputtering to form a conductive layer; The argon plasma cleaning chamber (4) is used to remove impurities from the surface of the PET film by bombarding the deposited layer with high-energy ions, increase the roughness of the surface of the film, and activate the surface molecular structure by the active free radicals generated by argon ionization. The inert gas transition chamber (5) is used to maintain the inert environment inside the chamber and balance the pressure difference between the front and rear chambers by passing inert gas. The horizontal electroplating section (6) is used to thicken and homogenize the metal layer on the surface of the PET film by electroplating with water. The winding end (7) is used to wind up the PET film that has been double-sided coated, and to reverse the direction of the PET film that has only been coated on one side, and output it to the unwinding end (2). The vacuum sputtering cavity (3) includes a vacuum chamber (301), a membrane fabric transfer groove (302), a rotary sealing cover (303), and an isolation plate (304). The right end of the unwinding end (2) is fixedly connected to the vacuum chamber (301). Two membrane fabric transfer grooves (302) are provided on the left and right walls of the vacuum chamber (301), and the positions of the membrane fabric transfer grooves (302) on the left and right walls are horizontally corresponding. A rotary sealing cover (303) is installed on the top of the vacuum chamber (301), and an isolation plate (304) is installed in the middle of the vacuum chamber (301). The membrane fabric transfer grooves (302) of the vacuum sputtering cavity (3) are... Gas transition boxes (8) are installed on both the inner and outer sides, and gas transition boxes (8) are also installed on both the inner and outer sides of the connecting slots of the argon plasma cleaning chamber (4), the inert gas transition chamber (5) and the horizontal electroplating section (6). A set of magnetic pole mechanisms (9) are installed at the bottom and top of the vacuum chamber (301). Four sets of target material support adjustment mechanisms (10) are provided in the vacuum chamber (301). Two sets of target material support adjustment mechanisms (10) are located between the top of the isolation plate (304) and the bottom of the set of magnetic pole mechanisms (9). The other two sets of target material support adjustment mechanisms (10) are located between the bottom of the isolation plate (304) and the top of the set of magnetic pole mechanisms (9). The gas transition box (8) is used to restrict the gas flow between the tanks when the membrane is continuously conveyed in each processing section, so as to avoid direct mixing of gas between the tanks and realize the gradual transition of gas pressure. The magnetic pole mechanism (9) is used to adjust the spacing between magnets and dynamically optimize the magnetic field distribution. The target support adjustment mechanism (10) is used to adjust the position and sputtering angle of the target material. It works in conjunction with the magnetic pole mechanism (9) to dynamically adjust the position of the target material, expand the effective etching area, optimize the density distribution of the plasma, and control the sputtering structure that affects the PET film.

2. The sputtering angle control device for PET copper foil fabrication according to claim 1, characterized in that: The unwinding end (2) includes an unwinding roller (201), an unwinding lifting and stabilizing roller (202), and an unwinding guide roller (203). The unwinding roller (201) is rotatably mounted on the left side of the unwinding end (2). Six unwinding lifting and stabilizing rollers (202) are vertically slidably mounted on the right side of the unwinding end (2). Four unwinding guide rollers (203) are rotatably mounted on the left side of the unwinding end (2). An input transition frame is provided at the connection between the unwinding end (2) and the vacuum sputtering chamber (3). An unwinding guide roller (203) is also provided in the input transition frame.

3. The sputtering angle control device for PET copper foil fabrication according to claim 2, characterized in that: The winding end (7) includes a winding roller (701), a winding lifting and stabilizing roller (702), and a winding guide roller (703). A winding roller (701) is rotatably mounted on the right side of the winding end (7). Three winding lifting and stabilizing rollers (702) are vertically slidably mounted on the left side of the winding end (7). Three winding guide rollers (703) are rotatably mounted on the right side of the winding end (7). An output transition frame is provided at the connection between the horizontal electroplating section (6) and the winding end (7). A winding guide roller (703) is also provided inside the output transition frame. The PET film is unwound and output by the unwinding roller (201), and is wound up by the winding roller (701) after passing through the outer wall of the unwinding lifting and stabilizing roller (202), the unwinding guide roller (203), the winding lifting and stabilizing roller (702), and the winding guide roller (703).

4. The sputtering angle control device for PET copper foil fabrication according to claim 3, characterized in that: The gas transfer box (8) includes a transfer box body (801), a transfer port (802), a fixed partition (803), a mounting slide (804), and a sealing rubber roller (805). The transfer box body (801) has transfer ports (802) on both its left and right walls. A fixed partition (803) is installed between the front and rear parts of the transfer box body (801). Mounting slides (804) are slidably arranged in the left and right parts of the two fixed partitions (803), and the front mounting slide (804) and the rear mounting slide (804) are perpendicular to each other. The two mounting slides (804) that are vertically opposite each other are paired. Each pair of mounting slides (804) has a sealing rubber roller (805) rotatably mounted on the upper and lower parts. The two adjacent sealing rubber rollers (805) are tangent to each other. The tangent lines of the two pairs of sealing rubber rollers (805) are on the same horizontal plane as the horizontal center line of the transition conveyor (802). The left pair of sealing rubber rollers (805) is tangent to the inner side of the left wall of the transition box (801), and the right pair of sealing rubber rollers (805) is tangent to the inner side of the right wall of the transition box (801).

5. The sputtering angle control device for PET copper foil fabrication according to claim 4, characterized in that: The gas transition box (8) further includes a first hexagonal drive shaft (806), a sealed drive pulley (807), a rotating bushing (808), a first driving bevel gear (809), a first driven bevel gear (810), and a linkage spur gear (811). Rotating bushings (808) are rotatably provided on the front left wall, the front right wall of the transition box body (801), and the front left and right walls of the vacuum chamber (301). They are located inside and outside the vacuum chamber (301). The first hexagonal drive shaft (808) is fixedly sleeved between the inner walls of the rotating bushings (808) of two adjacent transition box bodies (801) on the same horizontal line. The outer ends of the first hexagonal transmission shaft (806) are fixedly sleeved with sealed transmission pulleys (807). The outer wall of the first hexagonal transmission shaft (806) is slidably sleeved with four first driving bevel gears (809). The front end outer wall of the lower sealing rubber roller (805) is fixedly sleeved with a first driven bevel gear (810), and the first driving bevel gears (809) and the first driven bevel gears (810) with corresponding positions are meshed. The rear end outer wall of the sealing rubber roller (805) is fixedly sleeved with a linkage spur gear (811), and two adjacent linkage spur gears (811) are meshed.

6. The sputtering angle control device for PET copper foil fabrication according to claim 5, characterized in that: The magnetic pole mechanism (9) includes a magnetic shielding plate (901), a magnetic yoke (902), and permanent magnets (903). The bottom and top of the vacuum chamber (301) are fixed with magnetic shielding plates (901). The front end and rear end of the lower wall of the magnetic shielding plate (901) are fixed with magnetic yokes (902). A number of permanent magnets (903) are arranged inside the magnetic shielding plate (901).

7. The sputtering angle control device for PET copper foil fabrication according to claim 6, characterized in that: The permanent magnets (903) are arranged parallel to the outside of the rotating target (118). Four permanent magnets (903) are arranged outside each rotating target (118). The diameter of the permanent magnets (903) is one-tenth of that of the rotating target (118). The magnetic poles of adjacent permanent magnets (903) are arranged alternately in the N-S direction. Several sliders (904) matching the number of permanent magnets (903) are slidably installed on the inner side of the magnetic shielding plate (901), and the permanent magnets (903) are fixed on the sliders (904).

8. The sputtering angle control device for PET copper foil fabrication according to claim 7, characterized in that: The target material support adjustment mechanism (10) includes a fixed base plate (101), a slot (102), a universal mounting bracket (103), a lifting guide rail (104), a lifting guide rail block (105), a front lifting base plate (106), a support base (107), a second hexagonal transmission shaft (108), a reducer (109), front and rear tension guide rails (110), a limiting guide rail block (111), a rotating power pulley (112), and a power transmission belt (113). The fixed base plate (101) is installed on the inner side of the rear wall of the vacuum chamber (301). Sixteen slots (102) are equidistantly opened on the front wall of the fixed base plate (101). A universal mounting bracket (103) is slidably installed in the slots (102). Two lifting guide rails (104) are installed on the inner side of the front wall of the vacuum chamber (301), and the positions of the two lifting guide rails (104) correspond to the left and right ends of the fixed base plate (101), respectively. 104) A lifting guide block (105) is slidably installed inside. A front lifting base plate (106) is fixed between the two lifting guide blocks (105). Sixteen support seats (107) are equidistantly installed on the front lifting base plate (106). A second hexagonal transmission shaft (108) is rotatably installed between the upper parts of the sixteen support seats (107). A reducer (109) is provided inside the vacuum chamber (301). Two front and rear tension guide rails (110) are installed on the inner side of the front wall of the vacuum chamber (301) by a bracket. Limiting guide blocks (111) are slidably installed in both front and rear tension guide rails (110). Rotary power pulleys (112) are installed between the two limiting guide blocks (111), on the outer wall of the output end of the reducer (109), and on the right end of the second hexagonal transmission shaft (108). A power transmission belt (113) is rotatably sleeved on the outer wall of the three rotating power pulleys (112) located on the same vertical plane.

9. The sputtering angle control device for PET copper foil fabrication according to claim 8, characterized in that: The sealed transmission pulley (807) is synchronized with the rotation of the rotating power pulley (112) through the belt drive mechanism.

10. The sputtering angle control device for PET copper foil fabrication according to claim 8, characterized in that: The target material support adjustment mechanism (10) further includes a second driving bevel gear (114), a second driven bevel gear (115), a front threaded mounting cylinder (116), a sliding rotary seat (117), a rotating target material (118), a rear threaded mounting cylinder (119), and a universal ball (120). Sixteen second driving bevel gears (114) are equidistantly slidably sleeved on the outer wall of the second hexagonal transmission shaft (108). Sixteen sliding rotary seats (117) are equidistantly slidably installed inside the front lifting base plate (106), and the sliding rotary seats (117) are C-shaped flat keys. The bottom of the sixteen sliding rotary seats (117) is rotatably mounted with a front... A threaded mounting cylinder (116) is provided. A second driven bevel gear (115) is fixedly sleeved on the outer wall of the front end of the front threaded mounting cylinder (116), and the second driven bevel gear (115) is meshed with a second driving bevel gear (114) that matches the position. A rotating target (118) is threadedly mounted on the inner wall of the rear end of the front threaded mounting cylinder (116). A rear threaded mounting cylinder (119) is threadedly mounted on the inner wall of the rear end of the rotating target (118). A universal ball (120) is fixed at the rear end of the rear threaded mounting cylinder (119), and the universal ball (120) is rotatably mounted in a universal bracket (103) with multiple degrees of freedom.

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