Microwave plasma chemical vapor deposition method with self-adaptive tuning function

Abstract

The invention discloses a microwave plasma chemical vapor deposition method with a self-adaptive tuning function, which comprises a reaction cavity, and an adjusting mechanism, a gas collecting mechanism and an inflating mechanism which are arranged, and the adjusting mechanism drives a first sleeve and a second sleeve to drive a sample table to lift through a motor, a worm, a worm gear and a bidirectional screw; when the two-way screw reaches the limit position and the temperature difference between the center and the edge of the sample table still exceeds the standard, positive pressure gas of the first sleeve is pre-stored in a gas bag in the gas collection mechanism; the inflation mechanism extrudes an air bag through a pressing plate on a second sleeve, sealing of an exhaust pipe by a clamping block is relieved through a slope rod, gas is instantaneously injected into a cylindrical shell, a piston rod is pushed to finish fine adjustment of a sample table, the temperature difference detected by a first temperature sensor and a second temperature sensor in real time serves as a feedback signal in the whole process, and closed-loop control is formed. The plasma ball is always kept in a flat disc shape, the radial temperature gradient is obviously reduced, and the film thickness uniformity and the crystal quality are improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of microwave plasma chemical vapor deposition, in particular to a microwave plasma chemical vapor deposition method with self-adaptive tuning function. BACKGROUND

[0002] Microwave plasma chemical vapor deposition (MPCVD) is one of the key technologies for preparing high-quality single crystal diamond, gallium nitride and diamond-like films. The basic principle is to use 2.45GHz microwave to excite process gas to form a high-density plasma ball in a vacuum reaction chamber, so that the surface of the substrate undergoes cracking and deposition reaction. The deposition quality is strongly dependent on the geometry of the plasma ball. When the plasma ball is in the shape of a flat disc covering the entire substrate, the radial electric field distribution is uniform, and the temperature gradient is small, so that the film with excellent thickness, doping and stress consistency can be obtained. On the contrary, when the plasma ball is in the shape of an ellipsoid, the central electric field is concentrated, the temperature rises sharply, and the temperature at the edge decreases significantly, resulting in uneven film thickness, crystal cracking and even process failure.

[0003] The existing Chinese patent with publication number CN118854265A includes a combined chamber, a top flange mounting surface and a bottom sealing flange mounting surface. The combined chamber includes an antenna chamber, a reaction chamber, a transmission chamber and a pumping chamber. The top flange mounting surface is provided above the combined chamber, and the bottom sealing flange mounting surface is provided below the combined chamber. The top flange mounting surface is an integral structure with the antenna chamber. The upper end of the reaction chamber is welded to the antenna chamber as an integral structure. The lower end of the reaction chamber is connected and fastened to the pumping chamber using a flange. The side surface of the pumping chamber is welded to the transmission chamber as an integral structure.

[0004] The above-mentioned device, when in use, solves the problem of uneven gas and temperature in the cavity of the existing MPCVD equipment by reasonably designing the gas passage and cooling structure, and ensures the uniformity of the plasma in the cavity structure. However, in actual use, when the plasma is in the shape of an ellipsoid, the central electric field of the sample table is easily concentrated, the temperature rises sharply, and the film thickness is uneven, which causes the crystal to crack. Therefore, it is difficult to automatically adjust the height of the sample table.

[0005] Therefore, we propose a microwave plasma chemical vapor deposition method with self-adaptive tuning function. SUMMARY

[0006] The purpose of the present application is to provide a microwave plasma chemical vapor deposition method with self-adaptive tuning function, which has the advantage of automatically adjusting the height of the sample table and solves the problems in the background art.

[0007] To achieve the above-mentioned purpose, the present application provides the following technical solution: a microwave plasma chemical vapor deposition method with self-adaptive tuning function, comprising the following steps:

[0008] S1, temperature detection: the temperature of the center and edge positions of the sample table is detected in real time by the first and second temperature sensors, and the first and second temperature sensors are connected to the external controller by signals, so that the first and second temperature sensors can convert the detected temperature values into electrical signals and remotely transmit them to the external controller;

[0009] S2, height adjustment: the motor is started by the external controller and drives the worm to rotate, so that the worm can drive the bidirectional screw to rotate on the fixed frame, so that the inner thread sleeve can drive the sample table to be lifted upward.

[0010] S3, collect gas: as the first sleeve drives the sample table to be lifted upward, and the internal air pressure of the first sleeve is in a positive pressure state, the air in the first sleeve is transported to the inner wall of the air bag through the air inlet pipe, and the air bag collects air and expands on the inner wall of the rectangular shell;

[0011] S4, inflation operation: as the sample table is lifted to the limit position by the first sleeve, the second sleeve drives the pressing plate to press the air bag through the fixed rod, and the air in the fixed rod is transported to the inside of the cylindrical shell through the exhaust pipe, so that the piston rod can slowly lift the sample table in the upward direction, realizing that the sample table position can still be corrected by the air bag when the sample table is lifted to the limit position by the first sleeve.

[0012] Preferably, it comprises a reaction cavity, the outer contour of the bottom end of the reaction cavity is connected with a first sleeve which moves up and down, the inner wall of the first sleeve is fixedly connected with a cylindrical shell, and the bottom end of the reaction cavity is penetrated by the cylindrical shell and is connected with the cylindrical shell which moves up and down, the inner wall of the end of the cylindrical shell is axially movably connected with a piston rod, and the end of the piston rod is fixedly connected with a sample table on which a substrate is placed, and a cavity is formed on the sample table, a first temperature sensor for detecting the temperature of the center of the sample table is fixedly connected to the center of the cavity, and a plurality of second temperature sensors for detecting the temperature of the edge of the sample table are arranged in an annular array near the inner wall of the cavity, an observation window for observing the morphology of the plasma group inside the reaction cavity is penetrated and fixedly connected to the outer contour of the reaction cavity, and an adjusting mechanism for self-adaptively adjusting the height of the sample table is arranged on the reaction cavity.

[0013] Preferably, the adjusting mechanism comprises a fixed frame fixedly connected to the outer contour of the reaction cavity, a bidirectional screw penetrating and fixedly connected to the fixed frame and rotating on the fixed frame, an inner thread sleeve fixedly connected to the outer contour of one end of the first sleeve and the second sleeve, and the inner thread sleeve is connected to the outer contour of the other end of the first sleeve and the second sleeve and is screwed to the outer contour of the other end of the first sleeve and the second sleeve.

[0014] Preferably, the two sides of the fixed frame are penetrated and fixedly connected with a worm driven to rotate by a power mechanism, the outer contour of the corresponding position of the bidirectional screw rod and the worm is fixedly connected with a worm gear for driving the bidirectional screw rod to rotate reciprocatingly, and the tooth groove of the worm and the worm gear outer contour is engaged with each other.

[0015] Preferably, the reaction cavity is provided with a gas collecting mechanism for collecting the gas inside the first sleeve, the outer contour of the side of the reaction cavity away from the fixed frame is fixedly connected with a rectangular shell, and the inner wall of the rectangular shell is fixedly connected with a gas bag for collecting the gas inside the first sleeve.

[0016] Preferably, one side of the gas bag is penetrated and fixedly connected with an air inlet pipe, and the bottom end of the air inlet pipe penetrates to the inner wall of the first sleeve and is fixedly connected, the gas bag is provided with an inflation mechanism for inflating the inside of the cylindrical shell.

[0017] Preferably, the inflation mechanism comprises that the bottom of the gas bag is penetrated and fixedly connected with an exhaust pipe for communicating the gas bag and the inner wall of the cylindrical shell, the two symmetrical positions of the two sides of the rectangular shell are fixedly connected with connecting seats, the two sides of the connecting seats are fixedly connected with rotating rods, the opposite ends of the two sides of the rotating rods are fixedly connected with clamping blocks for clamping and sealing the exhaust pipe, and the opposite faces of the two sides of the rotating rods and the connecting seats are fixedly connected with torsion springs for guiding the rotating rods to rotate back.

[0018] Preferably, the outer contour of the second sleeve close to the top end of the rectangular shell is fixedly connected with a fixed rod, the bottom end of the fixed rod is fixedly connected with a pressing plate for pressing the gas bag, and the two symmetrical positions of the two sides of the fixed rod are fixedly connected with inclined rods for guiding the two sides of the clamping blocks to move away from each other.

[0019] Compared with the prior art, the application has the following beneficial effects:

[0020] I. The temperature distribution of the center and the edge of the sample table is monitored in real time by the first temperature sensor and the second temperature sensor, and the worm gear and the worm adjusting mechanism are driven by the temperature difference as the feedback signal to make the ellipsoidal plasma quickly restore the flat shape, significantly reduce the radial temperature gradient, improve the uniformity of the film thickness, and effectively avoid the cracking and defect aggregation of the crystal.

[0021] II. When the first sleeve lifts the sample table, the built-in gas bag in the rectangular shell collects the first sleeve positive pressure gas in real time through the air inlet pipe to form an adjustable energy accumulator; when the first sleeve moves to the limit position, the gas bag has pre-stored gas and is inflated, providing a zero-delay gas source for subsequent fine adjustment.

[0022] Third, when the first sleeve raises the sample stage to its limit position, and the temperature gradient between the center and edge of the sample stage still exceeds the set threshold, the pressure plate squeezes the air bladder. The gas inside the air bladder enters the cylindrical shell through the exhaust pipe, pushing the piston rod to finely adjust the displacement of the sample stage. The two-stage adjustment closed loop is connected, requiring no additional power source, which both expands the adjustment stroke and ensures the accuracy of the sample stage.

[0023] The combined use of the above structures solves the problem that, in actual use, when the plasma is ellipsoidal, the electric field at the center of the sample stage is concentrated, the temperature rises sharply, and the film thickness is uneven and the crystal cracks, making it difficult to automatically adjust the height of the sample stage. Attached Figure Description

[0024] Figure 1 This is a schematic flowchart of the microwave plasma chemical vapor deposition method with adaptive tuning function of the present invention.

[0025] Figure 2 This is a three-dimensional structural diagram of the present invention;

[0026] Figure 3 For the present invention Figure 2 Schematic diagram of the structure at point A in the middle;

[0027] Figure 4 This is a three-dimensional structural diagram of the rectangular shell portion of the present invention;

[0028] Figure 5 This is a three-dimensional cross-sectional view of the present invention;

[0029] Figure 6 For the present invention Figure 5 Schematic diagram of the structure at point B;

[0030] Figure 7 This is a cross-sectional schematic diagram of the three-dimensional structure of the first sleeve of the present invention;

[0031] Figure 8 This is a three-dimensional cross-sectional view of the portion of the rectangular shell of the present invention;

[0032] Figure 9 This is a cross-sectional view of the three-dimensional structure of the sample stage of the present invention.

[0033] In the figure: 1, reaction cavity; 2, first sleeve; 3, second sleeve; 4, cylindrical shell; 5, piston rod; 6, sample table; 601, cavity; 7, fixed frame; 8, bidirectional screw; 9, internally threaded sleeve; 10, worm; 11, worm gear; 12, observation window; 13, rectangular shell; 14, air bag; 15, air inlet pipe; 16, exhaust pipe; 17, connecting seat; 18, rotating rod; 19, clamping block; 20, torsional spring; 24, fixed rod; 25, pressing plate; 26, inclined rod; 27, first temperature sensor; 28, second temperature sensor. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0035] Embodiment one:

[0036] Please refer to Figures 1 to 9 The present application provides a technical solution: a microwave plasma chemical vapor deposition method with self-adaptive tuning function, comprising the following steps:

[0037] S1, temperature detection: the temperatures at the center and edge positions of the sample table 6 are detected in real time by the first temperature sensor 27 and the second temperature sensor 28, and the first temperature sensor 27 and the second temperature sensor 28 are connected to the external controller by signals, so that the first temperature sensor 27 and the second temperature sensor 28 can convert the detected temperature values into electrical signals and remotely transmit them to the external controller;

[0038] S2, height adjustment: the motor is started by the external controller and drives the worm 10 to rotate around the axis, so that the worm gear 11 can drive the bidirectional screw 8 to rotate around the axis on the fixed frame 7 under the action of the worm 10, so that the internally threaded sleeve 9 can drive the sample table 6 to be lifted upward for adjustment through the first sleeve 2;

[0039] S3, gas collection: as the sample table 6 is lifted upward for adjustment by the first sleeve 2, and the internal air pressure of the first sleeve 2 is in a positive pressure state, the air in the first sleeve 2 is transported to the inner wall of the air bag 14 through the air inlet pipe 15, and the air bag 14 collects the air and expands on the inner wall of the rectangular shell 13;

[0040] S4, inflation operation: with the first sleeve 2 driven sample table 6 to lift to the limit position, at this time the second sleeve 3 through the fixed rod 24 driven by the press plate 25 on the air bag 14 extrusion, and the exhaust pipe 16 can be transported to the inside of the fixed rod 24 air to the inside of the cylindrical shell 4, so that the piston rod 5 can push the sample table 6 to the upward direction slowly, realize the first sleeve 2 on the sample table 6 to lift to the limit position when still can use air bag 14 on the sample table 6 position correction.

[0041] Example two:

[0042] On the basis of example one, further is:

[0043] Including reaction cavity 1, the outer contour of the bottom of the reaction cavity 1 is connected with the first sleeve 2, the inner wall of the first sleeve 2 is fixedly connected with the cylindrical shell 4, and the bottom of the reaction cavity 1 is connected with the cylindrical shell 4 and is connected with the cylindrical shell 4, the inner wall of the end of the cylindrical shell 4 is connected with the piston rod 5, and the end of the piston rod 5 is fixedly connected with the sample table 6, and the sample table 6 is provided with a cavity 601, the center of the cavity 601 is fixedly connected with the first temperature sensor 27 for detecting the center temperature of the sample table 6, and the inner wall of the cavity 601 is connected with a plurality of second temperature sensors 28 for detecting the edge temperature of the sample table 6, the outer contour of the reaction cavity 1 is connected with the observation window 12 for observing the morphology of the plasma group inside the reaction cavity 1, and the reaction cavity 1 is provided with the adjusting mechanism for adjusting the height of the sample table 6.

[0044] In use, by setting the reaction cavity 1, and the first sleeve 2 on the reaction cavity 1, the first sleeve 2 can be connected with the first sleeve 2 on the outer contour of the reaction cavity 1, by setting the cylindrical shell 4 on the first sleeve 2, the cylindrical shell 4 is fixedly supported on the first sleeve 2, and the cylindrical shell 4 is connected with the inner wall of the reaction cavity 1 for lifting and moving, avoiding the movement of the first sleeve 2 on the reaction cavity 1, by setting the piston rod 5 on the cylindrical shell 4, and the sample table 6 on the piston rod 5, the sample table 6 is fixedly supported on the piston rod 5, so that the piston rod 5 can drive the sample table 6 to move axially on the inner wall of the cylindrical shell 4.

[0045] The first temperature sensor 27 and the second temperature sensor 28 are distributed at the center and the edge of the sample table 6 through the cavity 601 formed on the sample table 6 and the first temperature sensor 27 and the second temperature sensor 28 arranged on the cavity 601, so that the first temperature sensor 27 and the second temperature sensor 28 can detect the temperature at the center and the edge of the sample table 6 in real time, and the first temperature sensor 27 and the second temperature sensor 28 are connected with the external controller through signals, so that the first temperature sensor 27 and the second temperature sensor 28 can convert the detected temperature value into an electrical signal and remotely transmit it to the external controller. The above-mentioned conversion of the detected temperature value into an electrical signal and remote transmission to the external controller by the first temperature sensor 27 and the second temperature sensor 28 is a prior art known to those skilled in the art, and therefore will not be described here.

[0046] The adjusting mechanism arranged on the reaction cavity 1 can self-adaptively adjust the height of the sample table 6 according to the temperature information on the sample table 6, which avoids the problems of concentrated center electric field, sudden temperature rise, significantly reduced edge temperature, resulting in uneven film thickness and crystal cracking when the plasma is in an ellipsoidal shape. The observation window 12 arranged on the reaction cavity 1 facilitates observation of the plasma shape inside the reaction cavity 1 and the height of the sample table 6 through the observation window 12. The observation window 12 is connected through a flange, and the window cover can be completely removed by loosening the flange fastener, so that the substrate on the sample table 6 can be taken out and placed through the observation window 12.

[0047] Embodiment three:

[0048] Based on embodiment two, further improvements are made:

[0049] The adjusting mechanism includes a fixed frame 7 fixedly connected to the outer contour of the reaction cavity 1, a bidirectional screw 8 penetrating through and fixedly connected to the fixed frame 7, an inner threaded sleeve 9 fixedly connected to the outer contour of one end of each of the first sleeve 2 and the second sleeve 3 for driving the first sleeve 2 and the second sleeve 3 to move reciprocally towards or away from each other, and two inner threaded sleeves 9 respectively sleeved on the outer contours of both ends of the bidirectional screw 8 and screwed.

[0050] The fixed frame 7 is penetrated through and fixedly connected to both sides of the fixed frame 7, and the worm 10 is driven to rotate by the power mechanism. The outer contour of the corresponding position of the bidirectional screw 8 and the worm 10 is fixedly connected with the worm gear 11 for driving the bidirectional screw 8 to rotate reciprocally around the axis by the worm 10, and the tooth grooves of the outer contours of the worm 10 and the worm gear 11 are meshed with each other.

[0051] In use, through the fixed frame 7 provided on the reaction cavity 1, the fixed frame 7 is fixed and supported on the outer contour of the reaction cavity 1, and the bidirectional screw rod 8 provided on the fixed frame 7 is connected with the fixed frame 7 in the shaft rotating mode, through the inner threaded sleeve 9 provided on the first sleeve 2 and the second sleeve 3, the two inner threaded sleeves 9 are respectively fixed and supported on the symmetric positions of the first sleeve 2 and the second sleeve 3, and the inner threaded sleeve 9 can be sleeved on the outer contour of the bidirectional screw rod 8 and screwed.

[0052] Through the worm 10 provided on the fixed frame 7, the worm 10 is connected in the shaft rotating mode on the fixed frame 7, the above-mentioned power mechanism is the motor after being electrified, and the output shaft of the motor is coaxially and fixedly connected with the worm 10, so that the motor can drive the worm 10 to rotate reciprocatingly in the shaft mode, and through the worm wheel 11 provided on the bidirectional screw rod 8, the worm 10 can be meshed and driven with the worm wheel 11.

[0053] In actual use, first, the microwave source generates 2.45GHz microwave which is transmitted from the top end of the second sleeve 3 to the inside of the reaction cavity 1, the microwave forms a specific electric field distribution in the reaction cavity, which is usually ellipsoidal, excites the low-pressure carbon-containing gas such as the mixed gas of H2 and CH4 to form plasma, the above-mentioned motor is electrically connected with the external controller, when the first temperature sensor 27 detects that the temperature at the center of the sample table 6 is too high, and the temperature gradient of the sample table 6 edge detected by the second temperature sensor 28 exceeds the set threshold value, at this time, the external controller starts the motor and drives the worm 10 to rotate in the shaft mode, and the worm wheel 11 can be synchronously driven by the worm 10 to drive the bidirectional screw rod 8 to rotate in the shaft mode on the fixed frame 7, so that the inner threaded sleeve 9 can drive the first sleeve 2 and the second sleeve 3 to move axially towards each other on the outer contour of the reaction cavity 1, so that the first sleeve 2 can drive the sample table 6 to be lifted upward through the cylindrical shell 4, so as to make the ellipsoidal plasma ball more flat, and the more flat plasma ball makes the radial electric field distribution uniform, the temperature gradient small, and the uniformity of the film thickness improved.

[0054] Example four:

[0055] On the basis of example three, further more:

[0056] The reaction cavity 1 is provided with a gas collecting mechanism for collecting the gas in the first sleeve 2, the gas collecting mechanism comprises a rectangular shell 13 which is fixedly connected to the outer contour of the side of the reaction cavity 1 away from the fixed frame 7, and the inner wall of the rectangular shell 13 is fixedly connected with a gas bag 14 for collecting the gas in the first sleeve 2.

[0057] One side of the air bag 14 is penetrated and fixedly connected with the air inlet pipe 15, and the bottom end of the air inlet pipe 15 is penetrated to the inner wall of the first sleeve 2 and fixedly connected, the air bag 14 is provided with an inflation mechanism for inflating the inside of the cylindrical shell 4.

[0058] In use, through the rectangular shell 13 provided on the reaction cavity 1, and the air bag 14 provided on the rectangular shell 13, the rectangular shell 13 can fix and support the air bag 14 on the reaction cavity 1, and the air inlet pipe 15 provided on the air bag 14 can communicate the air bag 14 with the inner wall of the first sleeve 2, accompanied by the bidirectional screw rod 8 driving the first sleeve 2 and the second sleeve 3 to move towards each other, and the internal air pressure of the first sleeve 2 is in a positive pressure state, so that the air in the first sleeve 2 is transported to the inner wall of the air bag 14 through the air inlet pipe 15, and the air bag 14 collects the air and expands on the inner wall of the rectangular shell 13, forming an adjustable energy accumulator, providing a zero delay gas source for subsequent fine adjustment.

[0059] Through the inflation mechanism provided on the air bag 14, accompanied by the bidirectional screw rod 8 driving the first sleeve 2 and the second sleeve 3 to move to the limit position, and the temperature gradient between the center and the edge of the sample table 6 still exceeds the set threshold, so that the inflation mechanism can fill the air in the air bag 14 to the inner wall of the cylindrical shell 4 and push the sample table 6 upward for fine adjustment through the piston rod 5.

[0060] Example five:

[0061] Based on example four, further more:

[0062] The inflation mechanism includes that the bottom of the air bag 14 is penetrated and fixedly connected with the exhaust pipe 16 for communicating the air bag 14 with the inner wall of the cylindrical shell 4, both sides of the rectangular shell 13 are fixedly connected with the connecting seat 17, both sides of the connecting seat 17 are fixedly connected with the rotating rod 18, both ends of the rotating rod 18 are fixedly connected with the clamping block 19 for clamping and sealing the exhaust pipe 16, and both sides of the rotating rod 18 are fixedly connected with the torsional spring 20 for guiding the rotating rod 18 to rotate back.

[0063] The second sleeve 3 is fixedly connected with the fixed rod 24 on the outer contour close to the top end of the rectangular shell 13, and the bottom end of the fixed rod 24 is fixedly connected with the pressing plate 25 for extruding the air bag 14, and the fixed rod 24 is fixedly connected with the inclined rod 26 for guiding the two clamping blocks 19 to move away from each other on both sides.

[0064] In use, through the exhaust pipe 16 provided on the air bag 14, the exhaust pipe 16 can communicate the air bag 14 and the inner wall of the cylindrical shell 4, through the connecting seat 17 provided on the rectangular shell 13, the connecting seat 17 is fixed and supported on the rectangular shell 13, through the rotating rod 18 provided on the connecting seat 17, and the clamping block 19 provided on the rotating rod 18, so that the rotating rod 18 can drive the rotating rod 18 to be supported on the connecting seat 17, and the torsional spring 20 provided on the rotating rod 18 can support the position of the rotating rod 18, as shown in Figure 8 the state, the rotating rod 18 can drive the clamping block 19 to move towards the exhaust pipe 16 under the action of the torsional spring 20, at this time the exhaust pipe 16 is in a sealed state, avoiding the leakage of gas inside the air bag 14.

[0065] Through the fixed rod 24 provided on the second sleeve 3, and the pressing plate 25 provided on the fixed rod 24, so that the fixed rod 24 can fix and support the pressing plate 25 on the second sleeve 3, and the pressing plate 25 is on the same vertical line with the rectangular shell 13, through the inclined rod 26 provided on the fixed rod 24, the inclined rod 26 is fixed and supported on both sides of the fixed rod 24, when the bidirectional screw rod 8 drives the first sleeve 2 and the second sleeve 3 to move towards the limit position, at this time the fixed rod 24 drives the pressing plate 25 to extrude the air bag 14 inside the rectangular shell 13, at the same time the inclined rod 26 moves and contacts the rotating rod 18, and the rotating rod 18 drives the clamping block 19 to move away under the action of the inclined surface of the inclined rod 26, then the clamping block 19 and the exhaust pipe 16 are released from the clamping state, and the pressing plate 25 extrudes the air bag 14, so that the air inside the air bag 14 can be transported to the inside of the cylindrical shell 4 through the exhaust pipe 16, and the inside of the cylindrical shell 4 is in a positive pressure state, so that the piston rod 5 can push the sample table 6 to slowly lift in the upward direction, realizing that the air bag 14 can still be used to correct the position of the sample table 6 when the first sleeve 2 lifts the sample table 6 to the limit position, further improving the accuracy of the sample table 6 adjustment, two-stage regulation closed loop connection, without additional power source, which expands the adjustment stroke and ensures the accuracy of the sample table, ensures the uniform distribution of the radial electric field and the uniformity of the film thickness.

[0066] Further, the existing device can automatically adjust the height of the sample table during actual use, which is convenient to use and better than traditional products.

[0067] The standard parts used in this embodiment can be directly purchased from the market, and the non-standard structural parts according to the description and drawings can also be directly processed without doubt according to the existing technical knowledge, and the connection mode of each part adopts the mature conventional means in the existing technology, and the machinery, parts and equipment adopt the conventional models in the existing technology, so the specific description is not given here.

[0068] While embodiments of the application have been shown and described, it is to be understood that the application is not limited to the details of the embodiments described, since numerous changes, modifications, substitutions and variations can be made thereto without departing from the spirit and scope of the application as defined by the appended claims and their equivalents.

Claims

1. A microwave plasma chemical vapor deposition method with adaptive tuning function, characterized in that: Includes the following steps: S1. Temperature detection: The temperature at the center and edge of the sample stage (6) is monitored in real time by the first temperature sensor (27) and the second temperature sensor (28). The first temperature sensor (27) and the second temperature sensor (28) are connected to the external controller via signal. The first temperature sensor (27) and the second temperature sensor (28) can convert the detected temperature value into an electrical signal and transmit it remotely to the external controller. S2. Adjusting the height: Start the motor through the external controller and drive the worm (10) to rotate on the fixed axis. Then, under the action of the worm (10), the worm wheel (11) can synchronously drive the bidirectional screw (8) to rotate on the fixed axis on the fixed frame (7), so that the inner thread sleeve (9) can drive the sample stage (6) to be lifted and adjusted upward through the first sleeve (2). S3. Gas collection: As the first sleeve (2) drives the sample stage (6) to be raised and adjusted, and the internal air pressure of the first sleeve (2) is positive, the air inside the first sleeve (2) is transported to the inner wall of the air bag (14) through the air inlet pipe (15), and the air bag (14) collects the air and expands on the inner wall of the rectangular shell (13). S4. Inflation Operation: As the first sleeve (2) lifts the sample stage (6) to its limit position, the second sleeve (3) uses the fixing rod (24) to drive the pressure plate (25) to squeeze the airbag (14). The exhaust pipe (16) can transport the air inside the fixing rod (24) to the inside of the cylindrical shell (4), so that the piston rod (5) can push the sample stage (6) to slowly rise in the upward direction. This allows the airbag (14) to be used to correct the position of the sample stage (6) even when the first sleeve (2) lifts the sample stage (6) to its limit position.

2. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 1, characterized in that: The reaction chamber (1) includes a first sleeve (2) that is vertically and movably connected to the outer contour of the bottom end of the reaction chamber (1). A cylindrical shell (4) is fixedly connected to the inner wall of the first sleeve (2), and the bottom end of the reaction chamber (1) is penetrated by the cylindrical shell (4) and vertically and movably connected. A piston rod (5) is axially and movably connected to the inner wall of the end of the cylindrical shell (4), and a sample stage (6) for placing a substrate is fixedly connected to the end of the piston rod (5). A cavity (601) is provided on the sample stage (6). A first temperature sensor (27) for detecting the center temperature of the sample stage (6) is fixedly connected at the center position of the cavity (601), and a number of second temperature sensors (28) for detecting the edge temperature of the sample stage (6) are arranged in a ring array near the edge position of the inner wall of the cavity (601). An observation window (12) for observing the plasma cluster morphology inside the reaction cavity (1) is fixedly connected through the outer contour of the reaction cavity (1). An adjustment mechanism for adaptively adjusting the height of the sample stage (6) is provided on the reaction cavity (1).

3. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 2, characterized in that: The adjustment mechanism includes a fixed frame (7) fixedly connected to the outer contour of the reaction chamber (1), a bidirectional screw (8) being rotatably connected through the fixed frame (7), and an internal threaded sleeve (9) fixedly connected to the outer contour of the first sleeve (2) and the second sleeve (3) at adjacent ends, for the bidirectional screw (8) to drive the first sleeve (2) and the second sleeve (3) to move back and forth in opposite directions. The two internal threaded sleeves (9) are respectively sleeved on the outer contours of the two ends of the bidirectional screw (8) and screwed together.

4. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 3, characterized in that: The two sides of the fixed frame (7) are connected to a worm (10) driven by a power mechanism. The outer contour of the bidirectional screw (8) corresponding to the worm (10) is fixedly connected to a worm wheel (11) for the worm (10) to drive the bidirectional screw (8) to reciprocate on a fixed axis. The tooth grooves of the outer contours of the worm (10) and the worm wheel (11) mesh with each other.

5. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 2, characterized in that: The reaction chamber (1) is provided with a gas collection mechanism for collecting the gas inside the first sleeve (2). The gas collection mechanism includes a rectangular shell (13) fixedly connected to the outer contour of the reaction chamber (1) away from the fixed frame (7), and an air bag (14) for collecting the gas inside the first sleeve (2) is fixedly connected to the inner wall of the rectangular shell (13).

6. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 5, characterized in that: One side of the airbag (14) is connected to an air inlet pipe (15), and the bottom end of the air inlet pipe (15) is connected to the inner wall of the first sleeve (2). The airbag (14) is provided with an inflation mechanism for inflating the interior of the cylindrical shell (4).

7. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 6, characterized in that: The inflation mechanism includes an airbag (14) with a bottom through which an exhaust pipe (16) is fixedly connected, connecting the airbag (14) and the inner wall of the cylindrical shell (4). A connecting seat (17) is fixedly connected to both sides of the rectangular shell (13) at symmetrical positions. A rotating rod (18) is rotatably connected to both connecting seats (17) on both sides. A clamping block (19) for clamping and sealing the exhaust pipe (16) is fixedly connected to the opposite ends of the rotating rods (18) on both sides. A torsion spring (20) for guiding the rotating rod (18) to reset and rotate is fixedly connected to both sides of the rotating rod (18) on the opposite surface of the connecting seat (17).

8. The microwave plasma chemical vapor deposition method with adaptive tuning function according to claim 7, characterized in that: The second sleeve (3) is fixedly connected to a fixing rod (24) on the outer contour near the top of the rectangular shell (13), and the bottom end of the fixing rod (24) is fixedly connected to a pressure plate (25) for squeezing the airbag (14). The fixing rod (24) is fixedly connected to inclined rods (26) at symmetrical positions on both sides to guide the two clamping blocks (19) to move in opposite directions.

Images