Automatic leveling and discharging device
By designing an automatic leveling and feeding device, the automatic alignment of the mask and substrate is achieved through the collaborative work of multiple mechanisms, which solves the problems of complex structure and insufficient parallelism in the existing technology and improves the lithography effect.
Patent Information
- Application Number
- CN202511312903.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-15
- Publication Date
- 2025-12-12
AI Technical Summary
Existing calibration mechanisms are complex in structure and cumbersome to operate, and the parallelism between the mask and the substrate is insufficient, which affects the lithography effect.
An automatic leveling and feeding device was designed, including a feeding mechanism, a correction mechanism, an adjustment and positioning mechanism, a horizontal adjustment mechanism, and a lifting adjustment mechanism. Through the coordinated work of these mechanisms, automatic correction between the mask and the substrate is achieved to ensure parallelism.
It simplifies the operation process, improves the parallelism between the mask and the substrate, and enhances the exposure effect of photolithography.
Smart Images
Figure CN121115420A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of photolithography production technology, and in particular to an automatic leveling and feeding device. Background Technology
[0002] Photolithography is the most complex and critical process in semiconductor chip manufacturing, characterized by its long processing time and high cost. The difficulty and key to semiconductor chip production lies in creating the target circuit pattern on a silicon wafer, a process achieved through photolithography. The quality of the photolithography process directly determines the chip's manufacturing process and performance. In photolithography, geometric structures are etched onto a photoresist layer using exposure and development, and then the pattern on the photomask is transferred to the substrate using an etching process. The substrate can include not only silicon wafers but also other metal layers and dielectric layers, such as glass or sapphire in SOS.
[0003] The substrate material is placed below the template and the exposure light source. If the substrate material is not properly aligned with the template, it will affect the photolithography effect. The photolithography process requires the substrate material to be placed parallel to the photomask to prevent uneven exposure patterns on the substrate, which would affect the forming effect. Therefore, the parallelism of the photomask needs to be corrected before exposure to ensure better exposure between the photomask and the substrate.
[0004] Existing calibration mechanisms are mostly complex in structure, requiring adjustment of the substrate material's position in three axes to ensure parallelism between the substrate and the mask. This is not only cumbersome to operate, but also results in insufficient parallelism between the mask and the substrate, affecting the overall exposure effect.
[0005] Therefore, it is necessary to provide an automatic leveling and feeding device that is easy to operate and provides better exposure between the mask and the substrate. Summary of the Invention
[0006] The purpose of this invention is to provide an automatic leveling and feeding device that is easy to operate and provides better exposure between the mask and the substrate.
[0007] Another object of the present invention is to provide an automatic calibration method capable of automatically calibrating the substrate and the mask.
[0008] To achieve the above objectives, the present invention provides an automatic leveling and feeding device, comprising: The feeding mechanism is used to place the substrate; The calibration mechanism includes a support frame, an adsorption component, and a calibration component. The adsorption component is slidably disposed on the support frame and can slide above the feeding mechanism. The adsorption component is used to fix the mask. The calibration component is fixed on the support frame and is used to correct the parallelism between the mask and the substrate. An adjustment and positioning mechanism is located below and connected to the feeding mechanism. It can adaptively adjust the feeding mechanism at multiple angles to make the substrate on the feeding mechanism parallel to the mask. A horizontal adjustment mechanism, connected to an adjustment and positioning mechanism, is used to adjust the position of the feeding mechanism in the horizontal direction; The lifting and adjusting mechanism, connected to the horizontal adjusting mechanism and the adjusting and positioning mechanism, is used to adjust the position of the feeding mechanism in the vertical direction.
[0009] Compared with the prior art, the automatic leveling and feeding device of the present invention includes a feeding mechanism, a correction mechanism, an adjustment and positioning mechanism, a horizontal adjustment mechanism, and a lifting adjustment mechanism. The feeding mechanism is connected to the adjustment and positioning mechanism, the adjustment and positioning mechanism is connected to the horizontal adjustment mechanism, and the lifting adjustment mechanism is connected to both the horizontal adjustment mechanism and the adjustment and positioning mechanism. The correction mechanism includes a support frame, an adsorption component, and a correction component. The adsorption component is slidably disposed on the support frame and can slide above the feeding mechanism. The correction component is fixed on the support frame and is used to correct the parallelism between the mask and the substrate. The adsorption component is used to adsorb the mask, and the correction component is used to correct the parallelism between the mask and the substrate. The horizontal adjustment mechanism is connected to the adjustment and positioning mechanism and is used to adjust the position of the feeding mechanism in the horizontal direction so that the substrate is aligned with the mask. The lifting adjustment mechanism is connected to the horizontal adjustment mechanism and the adjustment and positioning mechanism and is used to adjust the position of the feeding mechanism in the vertical direction. Specifically, the calibration mechanism slides the photomask above the feeding mechanism. The feeding mechanism adjusts the substrate to be aligned with the photomask using a horizontal adjustment mechanism. Then, a lifting adjustment mechanism raises the feeding mechanism and the substrate on it until the substrate contacts the calibration mechanism. The feeding mechanism then disengages from the adjustment and positioning mechanism within a certain range to ensure parallel alignment between the substrate and the photomask. Finally, the driving adjustment and positioning mechanism is brought into contact with the feeding mechanism, completing the automatic leveling between the substrate and the photomask. The automatic leveling and feeding device of this invention has a simple structure, is easy to operate, and improves the parallelism between the photomask and the substrate, resulting in better exposure performance.
[0010] Preferably, the calibration mechanism includes multiple sets of calibration components, which are arranged in a triangular pattern around the adsorption component.
[0011] Preferably, the calibration assembly is mounted on the support frame. The calibration assembly includes a calibration cylinder, a connector, and a rolling element. The rolling element is mounted on the connector in a rolling manner. The connector is adjustablely mounted on the output end of the calibration cylinder. The calibration cylinder is activated so that the connector drives the rolling element to extend between the substrate and the mask, and the rolling element makes rolling contact with the mask. The feeding mechanism rises until the substrate makes rolling contact with the rolling element.
[0012] Preferably, the connector has a mounting groove, the rolling element is installed in the mounting groove, and a fixing element is provided on both sides of the rolling element. The fixing element is installed on the connector, and each fixing element has a through arc-shaped groove that mates with the rolling element. The arc-shaped groove has a gradually decreasing inner diameter structure from the end near the mounting groove to the end away from the mounting groove. The mounting groove and the arc-shaped grooves on both sides form a receiving space for accommodating the rolling element. The rolling element is rolled in the receiving space, and both ends of the rolling element protrude from the fixing elements on both sides so as to roll into contact with the mask and the substrate respectively.
[0013] Preferably, the support frame is provided with a sliding component, and the adsorption component is provided with a positioning element. The adsorption component slides along the sliding component to a preset position, and the positioning element actuates to position the adsorption component on the support frame.
[0014] Preferably, the feeding mechanism includes an adsorption feeding component and an arc-shaped adjustment component. The adsorption feeding component is used to adsorb and fix the substrate, and the arc-shaped adjustment component is disposed at the bottom of the adsorption feeding component. The adjustment and positioning mechanism is provided with an arc-shaped cavity that cooperates with the arc-shaped adjustment component. A vacuum adsorption structure and an air blowing structure are disposed in the arc-shaped cavity. The vacuum adsorption structure is closed and the air blowing structure is opened so that the arc-shaped adjustment component can move at multiple angles in the arc-shaped cavity and can detach from the arc-shaped cavity. The vacuum adsorption structure is opened and the air blowing structure is closed so that the arc-shaped adjustment component is positioned in the arc-shaped cavity.
[0015] Preferably, the feeding mechanism also includes a feeding component, which is located inside the arc-shaped adjustment component and connected to the adsorption feeding component. The feeding component can push the substrate away from the adsorption feeding component.
[0016] Preferably, the adjusting positioning mechanism includes a positioning seat and a fixed seat, the positioning seat being elastically connected to the fixed seat, and an arc-shaped cavity being formed inside the positioning seat.
[0017] Preferably, the adjustment and positioning mechanism further includes a first positioning component and a second positioning component. The first positioning component includes a limiting groove and a limiting member. The limiting groove is formed on the side of the arc-shaped adjustment component, and the limiting member is fixed on the fixed seat with one end of the limiting member located in the limiting groove. The cooperation between the limiting member and the limiting groove prevents the arc-shaped adjustment component from disengaging from the positioning seat. The second positioning component includes multiple positioning cylinders. The multiple positioning cylinders actuate to position the positioning seat on the fixed seat.
[0018] To achieve the other objective mentioned above, the present invention provides an automatic calibration method for automatically calibrating a substrate and a photomask using the aforementioned automatic leveling and feeding device, comprising the following steps: S1, The mask is adsorbed and fixed onto the adsorption component by the adsorption component; The substrate is adsorbed and fixed onto the feeding mechanism by the feeding mechanism; S2, by driving the adsorption component, the adsorption component is moved on the support frame to above the feeding mechanism; S3, by driving the correction component, the correction component is moved to the bottom of the mask, and the rolling element on the correction component makes rolling contact with the mask; S4. The position of the feeding mechanism is adjusted using the horizontal adjustment mechanism so that the substrate is aligned with the photomask. S5, using the lifting adjustment mechanism to push the feeding mechanism close to the correction component, and make the substrate roll into contact with the rolling element; S6, the feeding mechanism includes an adsorption feeding component and an arc-shaped adjustment component connected to each other. The adjustment and positioning mechanism is provided with an arc-shaped cavity that cooperates with the arc-shaped adjustment component. The arc-shaped cavity adsorbs the arc-shaped adjustment component so that the arc-shaped adjustment component is positioned in the arc-shaped cavity. The arc-shaped cavity is driven to stop adsorbing the arc-shaped adjustment component, so that the arc-shaped adjustment component is disengaged from the arc-shaped cavity, and the arc-shaped cavity is elastically contracted downward within a certain range; the adsorption and discharge component remains close to the adsorption component, and the substrate and mask remain in rolling contact with the rolling element; Then the arc-shaped cavity moves upward elastically, driving the arc-shaped cavity to re-adsorb the arc-shaped adjustment component, so as to complete the adjustment between the feeding mechanism and the adjustment and positioning mechanism, and realize the automatic leveling between the substrate and the mask.
[0019] Compared with the prior art, the automatic correction method of the present invention is more convenient to operate and can achieve a higher parallelism between the substrate and the mask, thereby resulting in better exposure effect of the substrate. Attached Figure Description
[0020] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the following description of the embodiments will be briefly introduced. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 This is a structural diagram of an automatic leveling and feeding device provided in an embodiment of the present invention.
[0022] Figure 2 yes Figure 1 Structural diagram of the centering correction mechanism.
[0023] Figure 3 yes Figure 2 Another structural diagram from another angle.
[0024] Figure 4 yes Figure 2 The structural diagram with the adsorption component removed.
[0025] Figure 5 yes Figure 4 A structural diagram of the center correction component.
[0026] Figure 6 yes Figure 5 A cross-sectional view at an angle.
[0027] Figure 7 yes Figure 1 The structural diagram with the correction mechanism removed.
[0028] Figure 8 yes Figure 7 A structural diagram showing the coordination between the feeding mechanism and the adjustment and positioning mechanism.
[0029] Figure 9 yes Figure 8 The structure explodes.
[0030] Figure 10 yes Figure 9 A further breakdown diagram.
[0031] Explanation of reference numerals in the attached figures: 100. Automatic leveling and feeding device; 101. Mask; 102. Substrate; 10. Calibration mechanism; 11. Support frame; 111. Sliding assembly; 112. Limiting block; 12. Calibration assembly; 121. Calibration cylinder; 122. Connecting piece; 1221. Mounting groove; 123. Rolling piece; 1230. Accommodating space; 124. Fixing piece; 1241. Arc groove; 13. Adsorption assembly; 131. Positioning piece; 20. Feeding mechanism; 21. Adsorption feeding assembly; 211. First air port; 22. Arc-shaped adjustment assembly; 221. Second air port; 222. Arc-shaped section; 23. Discharge assembly; 30. Adjusting positioning mechanism; 31. Positioning seat; 311. Arc-shaped cavity; 32. Fixed seat; 33. First positioning component; 331. Limiting groove; 332. Limiting element; 34. Second positioning component; 35. Elastic element; 40. Horizontal adjustment mechanism; 50. Lifting and adjusting mechanism. Detailed Implementation
[0032] To illustrate the technical content and structural features of the present invention in detail, the following description is provided in conjunction with the embodiments and accompanying drawings.
[0033] Please see Figure 1 , Figure 2 and Figure 7This invention provides an automatic leveling and feeding device 100, comprising, from top to bottom, a correction mechanism 10, a feeding mechanism 20, an adjustment and positioning mechanism 30, a horizontal adjustment mechanism 40, and a lifting and adjusting mechanism 50. The correction mechanism 10 is used to place a mask 101, and the feeding mechanism 20 is used to place a substrate 102. The correction mechanism 10 is capable of correcting the parallelism between the mask 101 and the substrate 102. The correction mechanism 10 includes a support frame 11, an adsorption component 13, and a correction component 12. The adsorption component 13 is slidably disposed on the support frame 11 and can slide above the feeding mechanism 20, and is used to fix the mask 101. The correction component 12 is fixed to the support frame 11 and is used to correct the parallelism between the mask 101 and the substrate 102. The adjustment and positioning mechanism 30 is disposed below the feeding mechanism 20 and connected to the feeding mechanism 20. The adjustment and positioning mechanism 30 can adaptively adjust the feeding mechanism 20 from multiple angles to ensure that the substrate 102 on the feeding mechanism 20 is parallel to the mask 101. The horizontal adjustment mechanism 40 is connected to the adjustment and positioning mechanism 30 and is used to adjust the position of the feeding mechanism 20 in the horizontal direction to better align the substrate 102 with the mask 101. The lifting adjustment mechanism 50 is connected to the horizontal adjustment mechanism 40 and the adjustment and positioning mechanism 30. The lifting adjustment mechanism 50 is used to adjust the position of the feeding mechanism 20 in the vertical direction to bring the substrate 102 closer to the mask 101, thereby enabling better parallelism adjustment and better exposure operation between the substrate 102 and the mask 101.
[0034] Compared with the prior art, the automatic leveling and feeding device 100 of the present invention includes a correction mechanism 10, a feeding mechanism 20, an adjustment and positioning mechanism 30, a horizontal adjustment mechanism 40, and a lifting adjustment mechanism 50 arranged sequentially from top to bottom. The feeding mechanism 20 is connected to the adjustment and positioning mechanism 30, the adjustment and positioning mechanism 30 is connected to the horizontal adjustment mechanism 40, and the lifting adjustment mechanism 50 is connected to both the horizontal adjustment mechanism 40 and the adjustment and positioning mechanism 30. The correction mechanism 10 includes a support frame 11, an adsorption component 13, and a correction component 12. The adsorption component 13 is slidably disposed on the support frame 11 and can slide above the feeding mechanism 20. The correction component 12 is fixed on the support frame 11 and is used to correct the parallelism between the mask 101 and the substrate 102. The adsorption component 13 is used to adsorb the mask 101, and the correction component 12 is used to correct the parallelism between the mask 101 and the substrate 102. A horizontal adjustment mechanism 40 is connected to an adjustment and positioning mechanism 30 and is used to adjust the position of the feeding mechanism 20 in the horizontal direction so that the substrate 102 is aligned with the mask 101. A lifting adjustment mechanism 50 is connected to the horizontal adjustment mechanism 40 and the adjustment and positioning mechanism 30 and is used to adjust the position of the feeding mechanism 20 in the vertical direction. Specifically, the correction mechanism 10 drives the mask 101 to slide above the feeding mechanism 20. The feeding mechanism 20 is adjusted by the horizontal adjustment mechanism 40 until the substrate 102 is aligned with the mask 101. Then, the lifting adjustment mechanism 50 drives the feeding mechanism 20 and the substrate 102 on it to rise until the substrate 102 contacts the correction mechanism 10. Then, the feeding mechanism 20 disengages from the adjustment and positioning mechanism 30 within a certain range to ensure that the substrate 102 and the mask 101 are parallel. Then, the adjustment and positioning mechanism 30 is driven to adsorb and connect with the feeding mechanism 20, completing the automatic leveling between the substrate 102 and the mask 101. The automatic leveling and feeding device 100 of the present invention has a simple structure and is easy to operate, which can improve the parallelism between the mask 101 and the substrate 102 and improve the exposure effect.
[0035] Please see Figure 3 and Figure 4 In some optional embodiments, the calibration mechanism 10 includes multiple sets of calibration components 12, which are disposed around the periphery of the adsorption component 13 and arranged in a triangular pattern. The triangularly distributed sets of calibration components 12 can better control the parallelism between the mask 101 and the substrate 102 from various angles. For example, three sets of calibration components 12 are provided, arranged in an equilateral triangle. Of course, the number of calibration components 12 can be greater, evenly distributed around the periphery of the adsorption component 13.
[0036] Please see Figures 3 to 6In some optional embodiments, the correction component 12 is disposed on the support frame 11, and the support frame 11 has a through groove above the adsorption and dispensing component 21. The correction component 12 includes a correction cylinder 121, a connector 122, and a rolling element 123. The rolling element 123 is rolled on the connector 122, and the connector 122 and the rolling element 123 are located in the through groove so that the rolling element 123 can roll into contact with the upper mask 101 and the lower substrate 102. On the other hand, the connector 122 is adjustablely mounted on the output end of the correction cylinder 121, and the installation position between the connector 122 and the correction cylinder 121 is adjustable, thereby better adapting to workpieces of various specifications. Specifically, the calibration cylinder 121 is activated so that the connector 122 drives the rolling element 123 to extend between the substrate 102 and the mask 101, and the rolling element 123 rolls and contacts the mask 101. After the lifting adjustment mechanism 50 drives the feeding mechanism 20 to rise, the substrate 102 also rolls and contacts the rolling element 123.
[0037] Please see Figure 5 and Figure 6 In some optional embodiments, the connector 122 has a mounting groove 1221, and the rolling element 123 is mounted in the mounting groove 1221. A fixing element 124 is also provided on each side of the rolling element 123, and the fixing element 124 is mounted on the connector 122. Each fixing element 124 has a through-hole arc-shaped groove 1241 that mates with the rolling element 123. The arc-shaped groove 1241 has a gradually decreasing inner diameter from the end near the mounting groove 1221 to the end away from the mounting groove 1221. The mounting groove 1221 and the arc-shaped grooves 1241 on both sides form a receiving space 1230 for accommodating the rolling element 123, and the rolling element 123 is rolled within the receiving space 1230. Furthermore, both ends of the rolling element 123 protrude from the fixing elements 124 on both sides, so that it can roll into contact with the mask 101 and the substrate 102 respectively. The rolling element 123 rolls within the accommodating space 1230, and always protrudes at both ends to make rolling contact with the mask 101 and the substrate 102, respectively. For example, the rolling element 123 may be a ceramic bead.
[0038] Please see Figures 2 to 4In some optional embodiments, a sliding component 111 is provided on the support frame 11, and the adsorption component 13 is disposed on the sliding component 111 and can slide along the sliding component 111 on the support frame 11. Limiting blocks 112 are provided at both ends of the support frame 11, which limit the sliding stroke of the adsorption component 13 to prevent the adsorption component 13 from sliding off the support frame 11. On the other hand, a positioning member 131 is provided on the adsorption component 13. The adsorption component 13 slides along the sliding component 111 to a preset position, which is the position where the mask 101 is aligned with the substrate 102. The positioning member 131 actuates to position the adsorption component 13 on the support frame 11. For example, the positioning member 131 can be a screw or a knob; rotating the positioning member 131 prevents the adsorption component 13 from continuing to slide along the sliding component 111.
[0039] Please see Figures 7 to 10 In some optional embodiments, the feeding mechanism 20 includes an adsorption feeding component 21 and an arc-shaped adjustment component 22. The adsorption feeding component 21 is used to adsorb and fix the substrate 102, and the arc-shaped adjustment component 22 is disposed at the bottom of the adsorption feeding component 21 for multi-angle adjustment of the position of the adsorption feeding component 21. The adsorption feeding component 21 is provided with a first air port 211, and the arc-shaped adjustment component 22 is provided with a second air port 221. The first air port 211 is used for air intake, and the second air port 221 is used for air exhaust. On the other hand, the adjustment and positioning mechanism 30 is provided with an arc-shaped cavity 311 that cooperates with the arc-shaped adjustment component 22. The bottom of the arc-shaped adjustment component 22 is provided with an arc-shaped portion 222, which is adapted to the arc-shaped cavity 311. The arc-shaped cavity 311 is equipped with a vacuum adsorption structure and an air blowing structure. The vacuum adsorption structure allows the arc-shaped cavity 311 to adsorb the arc-shaped adjustment component 22, while the air blowing structure allows the arc-shaped cavity 311 to better detach from the arc-shaped adjustment component 22. Closing the vacuum adsorption structure and opening the air blowing structure allows the arc-shaped adjustment component 22 to move at multiple angles within the arc-shaped cavity 311 and also allows it to detach from the arc-shaped cavity 311 and move within a certain range. Opening the vacuum adsorption structure and closing the air blowing structure positions the arc-shaped adjustment component 22 within the arc-shaped cavity 311.
[0040] Please see Figure 10 In some optional embodiments, the feeding mechanism 20 further includes a feeding component 23, which is located within the arc-shaped adjustment component 22 and connected to the adsorption feeding component 21. The feeding component 23 is designed to push the substrate 102 away from the adsorption feeding component 21. Understandably, the substrate 102 is adsorbed onto the adsorption feeding component 21. After the substrate 102 and the mask 101 have been exposed, the feeding component 23 can push the substrate 102 away from the adsorption feeding component 21, assisting in feeding. Furthermore, the feeding component 23 is located within the arc-shaped adjustment component 22, which makes full use of space, resulting in a more compact and rational overall structure.
[0041] Please see Figures 7 to 10 In some optional embodiments, the adjustment and positioning mechanism 30 includes a positioning seat 31 and a fixed seat 32. The positioning seat 31 is elastically connected to the fixed seat 32 via an elastic member 35, and an arc-shaped cavity 311 is formed within the positioning seat 31. Understandably, the vacuum adsorption structure within the positioning seat 31 is closed, causing the arc-shaped adjustment component 22 to detach from the positioning seat 31 within a certain range in a very short time. After the positioning seat 31 detaches from the arc-shaped adjustment component 22, it moves freely to adjust to a suitable position and, under the elastic force of the elastic member 35, moves upward and re-adsorbs the arc-shaped adjustment component 22. This allows the entire feeding mechanism 20 and the adjustment and positioning mechanism 30 to better cooperate, enabling the substrate 102 to better align with the mask 101, thereby achieving better exposure.
[0042] Please see Figures 7 to 10 In some optional embodiments, the adjustment and positioning mechanism 30 further includes a first positioning component 33 and a second positioning component 34. The first positioning component 33 includes a limiting groove 331 and a limiting member 332. The limiting groove 331 is formed on the side of the arc-shaped adjustment component 22, and the limiting member 332 is fixed on the fixed base 32, with one end of the limiting member 332 always located within the limiting groove 331 and able to slide along the limiting groove 331. The cooperation between the limiting member 332 and the limiting groove 331 prevents the arc-shaped adjustment component 22 from detaching from the positioning base 31 when it is detached from the adsorption of the arc-shaped cavity, resulting in a compact and reasonable structure. On the other hand, the second positioning component 34 includes multiple positioning cylinders. After the substrate 102 and the mask 101 are aligned and adjusted, the multiple positioning cylinders actuate to position the positioning base 31 on the fixed base 32, preventing the positioning base 31 from elastically moving in the vertical direction under the action of the elastic member 35, thus affecting the position between the substrate 102 and the mask 101.
[0043] To achieve the other objective mentioned above, the present invention provides an automatic calibration method for automatically calibrating the substrate 102 and the mask 101 using the aforementioned automatic leveling and feeding device 100, comprising the following steps: S1, the mask 101 is adsorbed and fixed onto the adsorption assembly 13 by the adsorption assembly 13. The substrate 102 is adsorbed and fixed onto the feeding mechanism 20 by the feeding mechanism 20.
[0044] S2, drive the adsorption component 13 so that the adsorption component 13 slides on the support frame 11 along the sliding component 111 to above the feeding mechanism 20. Then the adsorption component 13 is fixed on the support frame 11 by the positioning component 131.
[0045] S3, drive the correction component 12 so that the correction component 12 moves to below the mask 101 and the roller 123 on the correction component 12 rolls into contact with the mask 101.
[0046] S4, the position of the feeding mechanism 20 is adjusted by the horizontal adjustment mechanism 40 so that the substrate 102 is aligned with the mask 101.
[0047] S5, the lifting adjustment mechanism 50 pushes the feeding mechanism 20 close to the correction component 12, and makes the substrate 102 roll into contact with the rolling element 123.
[0048] S6, the feeding mechanism 20 includes an adsorption feeding assembly 21 and an arc-shaped adjustment assembly 22 connected to each other. The adjustment and positioning mechanism 30 is provided with an arc-shaped cavity 311 that cooperates with the arc-shaped adjustment assembly 22. A vacuum adsorption structure is provided inside the arc-shaped cavity 311. The vacuum adsorption structure adsorbs the arc-shaped adjustment assembly 22 so that the arc-shaped adjustment assembly 22 is positioned inside the arc-shaped cavity 311. The arc-shaped cavity 311 stops adsorbing the arc-shaped adjustment assembly 22 so that the arc-shaped adjustment assembly 22 disengages from the arc-shaped cavity 311 within a certain range for a certain period of time. At the same time, the positioning seat 31 with the arc-shaped cavity 311 elastically contracts downward within a certain range. At this time, the adsorption feeding assembly 21 remains close to the adsorption assembly 13, and the substrate 102 and the mask 101 remain in rolling contact with the rolling element 123. Then, the positioning seat 31 with the arc-shaped cavity 311 moves upward elastically and drives the arc-shaped cavity 311 to adsorb the arc-shaped adjustment component 22 again, so as to complete the adjustment between the feeding mechanism 20 and the adjustment and positioning mechanism 30, and realize the automatic leveling between the substrate 102 and the mask 101.
[0049] Compared with the prior art, the automatic correction method of the present invention is more convenient to operate and can make the parallelism between the substrate 102 and the mask 101 higher, thereby making the exposure effect of the substrate 102 better.
[0050] like Figures 1 to 10As shown, the present invention provides an automatic leveling and feeding device 100 and an automatic calibration method using the above-mentioned automatic leveling and feeding device 100 for automatic calibration. The automatic leveling and feeding device 100 includes a calibration mechanism 10, a feeding mechanism 20, an adjustment and positioning mechanism 30, a horizontal adjustment mechanism 40, and a lifting and adjusting mechanism 50 arranged sequentially from top to bottom. The feeding mechanism 20 is connected to the adjustment and positioning mechanism 30, the adjustment and positioning mechanism 30 is connected to the horizontal adjustment mechanism 40, and the lifting and adjusting mechanism 50 is connected to the horizontal adjustment mechanism 40 and the adjustment and positioning mechanism 30. The calibration mechanism 10 is disposed above the radiotherapy device and includes a support frame 11, an adsorption component 13, and a calibration component 12. The adsorption component 13 is slidably disposed on the support frame 11 and can slide above the feeding mechanism 20. The calibration component 12 is fixed on the support frame 11 for calibrating the parallelism between the mask 101 and the substrate 102. The adsorption component 13 is used to adsorb the mask 101, and the alignment component 12 is used to align the parallelism between the mask 101 and the substrate 102. The horizontal adjustment mechanism 40 is connected to the adjustment and positioning mechanism 30 and is used to adjust the position of the feeding mechanism 20 in the horizontal direction so that the substrate 102 is aligned with the mask 101. The vertical adjustment mechanism 50 is connected to the horizontal adjustment mechanism 40 and the adjustment and positioning mechanism 30 and is used to adjust the position of the feeding mechanism 20 in the vertical direction. Specifically, the calibration mechanism 10 drives the mask 101 to slide above the feeding mechanism 20. The feeding mechanism 20 is adjusted by the horizontal adjustment mechanism 40 until the substrate 102 is aligned with the mask 101. Then, the lifting adjustment mechanism 50 drives the feeding mechanism 20 and the substrate 102 on it to rise until the substrate 102 contacts the rolling element 123 of the calibration mechanism 10. Then, the feeding mechanism 20 disengages from the adjustment and positioning mechanism 30 within a certain range to ensure that the substrate 102 and the mask 101 are parallel. Then, the driving adjustment and positioning mechanism 30 is made to adsorb and connect with the feeding mechanism 20, completing the automatic leveling between the substrate 102 and the mask 101. The automatic leveling and feeding device 100 of the present invention has a simple structure, is easy to operate, and can improve the parallelism between the mask 101 and the substrate 102, resulting in better exposure effect.
[0051] The above-disclosed examples are merely preferred embodiments of the present invention and should not be construed as limiting the scope of the present invention. Therefore, any equivalent variations made in accordance with the claims of the present invention are within the scope of the present invention.
Claims
1. An automatic leveling and feeding device, characterized in that, include: The feeding mechanism is used to place the substrate; The calibration mechanism includes a support frame, an adsorption component, and a calibration component. The adsorption component is slidably disposed on the support frame and can slide along the support frame to above the feeding mechanism. The adsorption component is used to fix the mask. The calibration component is fixed on the support frame and is used to correct the parallelism between the mask and the substrate. An adjustment and positioning mechanism is located below and connected to the feeding mechanism. It can adaptively adjust the feeding mechanism from multiple angles to make the substrate on the feeding mechanism parallel to the mask. A horizontal adjustment mechanism, connected to the adjustment and positioning mechanism, is used to adjust the position of the feeding mechanism in the horizontal direction; A lifting and adjusting mechanism, connected to the horizontal adjusting mechanism and the adjusting and positioning mechanism, is used to adjust the position of the feeding mechanism in the vertical direction.
2. The automatic leveling and feeding device according to claim 1, characterized in that, The correction mechanism includes multiple sets of correction components, which are arranged in a triangular pattern around the periphery of the adsorption component.
3. The automatic leveling and feeding device according to claim 1, characterized in that, The calibration assembly is disposed on the support frame. The calibration assembly includes a calibration cylinder, a connector, and a rolling element. The rolling element is rotatably mounted on the connector. The connector is adjustablely mounted on the output end of the calibration cylinder. The calibration cylinder is activated to cause the connector to drive the rolling element to extend between the substrate and the photomask, and the rolling element makes rotatable contact with the photomask. The feeding mechanism rises until the substrate makes rotatable contact with the rolling element.
4. The automatic leveling and feeding device according to claim 3, characterized in that, The connector has a mounting groove, and the rolling element is installed in the mounting groove. A fixing element is also provided on each side of the rolling element. The fixing element is installed on the connector. Each fixing element has a through arc-shaped groove that mates with the rolling element. The arc-shaped groove has a gradually decreasing inner diameter structure from the end near the mounting groove to the end away from the mounting groove. The mounting groove and the arc-shaped grooves on both sides form a receiving space for accommodating the rolling element. The rolling element is rolled in the receiving space, and both ends of the rolling element protrude from the fixing elements on both sides so as to roll into contact with the mask and the substrate respectively.
5. The automatic leveling and feeding device according to claim 1, characterized in that, The support frame is provided with a sliding component, and the adsorption component is provided with a positioning component. The adsorption component slides along the sliding component to a preset position, and the positioning component actuates to position the adsorption component on the support frame.
6. The automatic leveling and feeding device according to claim 1, characterized in that, The feeding mechanism includes an adsorption feeding component and an arc-shaped adjustment component. The adsorption feeding component is used to adsorb and fix the substrate, and the arc-shaped adjustment component is disposed at the bottom of the adsorption feeding component. The adjustment and positioning mechanism is provided with an arc-shaped cavity that cooperates with the arc-shaped adjustment component. A vacuum adsorption structure and an air blowing structure are disposed in the arc-shaped cavity. The vacuum adsorption structure is closed and the air blowing structure is opened so that the arc-shaped adjustment component can move at multiple angles in the arc-shaped cavity and can detach from the arc-shaped cavity. The vacuum adsorption structure is opened and the air blowing structure is closed so that the arc-shaped adjustment component is positioned in the arc-shaped cavity.
7. The automatic leveling and feeding device according to claim 6, characterized in that, The feeding mechanism further includes a feeding component, which is located inside the arc-shaped adjustment component and connected to the adsorption feeding component. The feeding component is actuated to push the substrate away from the adsorption feeding component.
8. The automatic leveling and feeding device according to claim 6, characterized in that, The adjustment and positioning mechanism includes a positioning seat and a fixed seat. The positioning seat is elastically connected to the fixed seat, and the arc-shaped cavity is formed inside the positioning seat.
9. The automatic leveling and feeding device according to claim 8, characterized in that, The adjustment and positioning mechanism further includes a first positioning component and a second positioning component. The first positioning component includes a limiting groove and a limiting member. The limiting groove is formed on the side of the arc-shaped adjustment component. The limiting member is fixed to the fixed base, and one end of the limiting member is located in the limiting groove. The cooperation between the limiting member and the limiting groove prevents the arc-shaped adjustment component from disengaging from the positioning base. The second positioning component includes a plurality of positioning cylinders. The plurality of positioning cylinders are actuated to position the positioning base on the fixed base.
10. An automatic calibration method for automatically calibrating a substrate and a photomask using the automatic leveling and feeding device according to any one of claims 1-9, characterized in that, Includes the following steps: S1, the mask is adsorbed and fixed onto the adsorption component by the adsorption component; The substrate is adsorbed and fixed onto the feeding mechanism by the feeding mechanism; S2, by driving the adsorption component, the adsorption component is moved on the support frame to above the feeding mechanism; S3, by driving the correction component, the correction component is moved to below the mask, and the rolling element on the correction component makes rolling contact with the mask; S4, the position of the feeding mechanism is adjusted using the horizontal adjustment mechanism so that the substrate is aligned with the photomask; S5, the lifting and adjusting mechanism is used to push the feeding mechanism close to the correction component, and the substrate is made to roll into contact with the rolling element; S6, the feeding mechanism includes an adsorption feeding component and an arc-shaped adjustment component connected to each other, and the adjustment and positioning mechanism is provided with an arc-shaped cavity that cooperates with the arc-shaped adjustment component. The arc-shaped cavity adsorbs the arc-shaped adjustment component so that the arc-shaped adjustment component is positioned in the arc-shaped cavity. The arc-shaped cavity is driven to stop adsorbing the arc-shaped adjustment component, so that the arc-shaped adjustment component disengages from the arc-shaped cavity, and the arc-shaped cavity elastically contracts downward within a certain range; the adsorption and discharge component remains close to the adsorption component, and the substrate and the mask remain in rolling contact with the rolling element; Then the arc-shaped cavity moves upward elastically and drives the arc-shaped cavity to re-adhere the arc-shaped adjustment component, so as to complete the adjustment between the feeding mechanism and the adjustment and positioning mechanism, and realize the automatic leveling between the substrate and the mask.