A vacuum deposition method for a contact terminal gradient composite plating layer

Abstract

This application relates to the field of contact terminal coating, and more specifically, to a vacuum deposition method for a gradient composite coating on contact terminals. The coating is prepared by the following steps: S1, cleaning and activation: The contact terminal blank is cleaned and activated with an activating cleaning agent to obtain blank A; S2, spray coating and pre-curing: A silane-oxygen-containing conductive liquid is sprayed onto the surface of the activated blank and pre-cured to obtain blank B; S3, PVD chromium plating: A chromium target is used to vacuum deposit a coating on the surface of blank B to form blank C; S4, shaping: Blank C is sintered to obtain a contact terminal containing a composite coating. By sequentially performing cleaning and activation, spray coating and pre-curing, PVD chromium plating, and shaping, a gradient composite layer is formed, giving the contact terminal excellent corrosion resistance and anti-detachment properties.

Description

Technical Field

[0001] This application relates to the field of contact terminal coating, and more specifically, it relates to a vacuum deposition method for a gradient composite coating on contact terminals. Background Technology

[0002] In today's era of rapid advancements in electronic technology, contact terminals, as indispensable basic components in electronic devices, are crucial for the stable operation of these devices. With the widespread application of electronic devices in various fields, such as communications, computers, and automotive electronics, the demand for contact terminals is increasing daily. The performance of contact terminals directly affects the transmission quality of electronic signals and the reliability of equipment; therefore, continuously improving the performance of contact terminals has become an important research direction in the electronics field. Good contact terminal performance ensures stable connections between electronic devices, reduces interference and loss in signal transmission, thereby improving the overall system's operating efficiency and stability.

[0003] In existing technologies, various methods are commonly used to address the problem of surface wear caused by friction during insertion, removal, mating, or long-term use of contact terminals. One common method is chrome plating. The smooth surface of the chrome plating reduces the coefficient of friction during insertion and removal, preventing substrate wear caused by jamming during mating. For example, chrome-plated connectors in electronic devices can withstand a certain number of insertions and removals while maintaining surface integrity. In addition, protective coatings are used to protect the contact terminal surface, but different protective coatings vary in performance and applicability. These protective measures can, to some extent, improve the wear resistance and wear resistance of the contact terminals, ensuring their normal use.

[0004] However, with technological advancements, electronic products are trending towards lighter designs, and the substrates used for contact terminals are increasingly shifting towards lighter materials such as plastics and composite plastics, aluminum and aluminum alloys, and magnesium and magnesium alloys. However, these materials have poor adhesion to chromium, and after plating using conventional methods like chromium plating, the plating is prone to peeling, failing to meet the requirements for long-term stable use of contact terminals. Summary of the Invention

[0005] The purpose of this application is to overcome the above-mentioned technical problems and provide a vacuum deposition method for gradient composite coatings on contact terminals.

[0006] In a first aspect, a vacuum deposition method for a gradient composite coating on contact terminals is provided, which is prepared by the following method:

[0007] S1. Cleaning and Activation: The contact terminal blank is cleaned and activated with an activating cleaning agent to obtain blank A;

[0008] S2. Spraying and pre-curing: Spraying a silane-containing conductive liquid onto the surface of the activated blank and pre-curing it to obtain blank B;

[0009] S3, PVD chromium plating: Vacuum plating is performed on the surface of blank B using a chromium target to form blank C;

[0010] S4. Shaping: The blank C is sintered to obtain a contact terminal containing a composite coating.

[0011] By adopting the above technical solution, a gradient composite layer is formed through sequential cleaning and activation, spray pre-curing, PVD chromium plating, and shaping, giving the contact terminals better corrosion resistance and anti-detachment properties. A silane-oxygen-containing conductive liquid is first sprayed onto the surface of the contact terminals, and after pre-curing, a semi-cured conductive film layer is formed. During subsequent PVD chromium plating, a relatively stable chromium plating layer is formed on the surface of the conductive film layer. After sintering, the organic components in the silane-oxygen-containing conductive liquid volatilize, forming a dense conductive film layer, which also acts as a bridge, further enhancing the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminals, thus ensuring that the chromium plating layer is stably adhered to the contact terminals.

[0012] Preferably, the sputtering pressure of the vacuum coating is 0.5-0.8 Pa, the sputtering power is 12-19 kW, the target-substrate distance is 20-50 mm, the sputtering temperature is 75-85 °C, and the gas flow rate is 380-600 ml / min.

[0013] By adopting the above technical solution, the contact terminal blank is sequentially cleaned and activated, pre-cured by spraying, chrome-plated by PVD, and sintered to form a gradient composite layer with better corrosion resistance and anti-peeling properties. By setting the sputtering gas pressure of vacuum coating to 0.5-0.8Pa, the sputtering power to 12-19Kw, the target-substrate distance to 20-50mm, the sputtering temperature to 75-85℃, and the gas flow rate to 380-600ml / min, a better chrome-plated layer can be formed on the surface of the contact terminal after the pre-curing by spraying under appropriate process parameters, further improving the performance of the composite coating of the contact terminal.

[0014] Preferably, the composite coating includes a conductive film layer and a chromium plating layer, wherein the thickness of the graphene conductive layer is 20-100 micrometers and the thickness of the chromium plating layer is 10-500 micrometers.

[0015] By adopting the above technical solution, the contact terminal blank is first cleaned and activated using an activating cleaning agent, then a silane-oxygen-containing conductive liquid is sprayed and pre-cured, followed by PVD chromium plating using a chromium target, and finally sintered to form a gradient composite coating. The composite coating includes a graphene conductive layer and a chromium plating layer of specific thickness, giving the contact terminal better corrosion resistance and anti-detachment properties. The conductive film layer is a graphene-containing conductive film layer.

[0016] Preferably, the amount of the glycidyl etheroxypropyl silicone oligomer is 0.1-3.3 wt% of the activating cleaning agent.

[0017] By adopting the above technical solution, when cleaning and activating the contact terminal blank, the activating cleaning agent can play a triple role of "cleaning-activation-interface modification", laying a stable base for subsequent siloxane conductive liquid spraying, PVD chromium plating and sintering processes; glycidyl etheroxypropyl organosilicon oligomer can chemically react or physically adsorb with the contact terminal surface, change the chemical properties and physical state of the contact terminal surface, improve the surface activity and roughness, enhance the adhesion between the surface and subsequent coatings, and ultimately ensure the overall stability of the composite plating contact terminal.

[0018] The brand and model of glycidyl etheroxypropyl organosilicon oligomer are: EP904. Contains activating groups such as epoxy and alkoxy groups.

[0019] Preferably, the silane-containing conductive liquid is composed of graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and a diluent / dispersant; the heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion is obtained by dissolving heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane in n-hexane.

[0020] The molecular structure of heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane is as follows:

[0021]

[0022] The brand name and model of the methyl hydrogen-containing polysilazane is Mingyi MY9N2501, with a hydrogen content of 1.2-1.7%.

[0023] Graphene powder has a particle size of 0.1-5 micrometers.

[0024] The silane-containing conductive liquid is composed of graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and diluent in a weight ratio of (1-5):(0.1-2):(0.5-3):15.

[0025] The technical solution of this application involves first cleaning and activating the contact terminal blank, then spraying a silaneoxy-containing conductive liquid composed of graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and a diluent onto its surface and pre-curing it. Following this, vacuum deposition is performed using a chromium target, and finally, sintering is carried out. The heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion and the methyl hydrogen-containing polysilazane synergistically promote the dispersion of graphene powder, preventing graphene powder agglomeration and ensuring its uniform distribution in the film-forming liquid, laying the foundation for the subsequent formation of a thin film with stable conductivity. During sintering... During the process, the two react and act as a bridge, tightly connecting the graphene powder, the chromium plating layer, and the contact terminal surface. After pre-curing, a semi-cured conductive film layer is formed. During PVD chromium plating, a relatively stable chromium plating layer can be formed on its surface. Sintering causes the organic components in the silane-oxygen-containing conductive liquid to volatilize, forming a dense conductive film layer. This enhances the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminal. This allows the chromium plating layer to adhere stably to the contact terminal, improving the corrosion resistance and durability of the contact terminal. When the contact terminal is repeatedly plugged and unplugged, the chromium plating layer on its surface is not easily detached.

[0026] Preferably, the diluent is composed of anhydrous ethanol, organosilicon polyether copolymer, and ethyl acetate. The diluent is composed of anhydrous ethanol, organosilicon polyether copolymer, and ethyl acetate in a weight ratio of (8-15):1:(15-25).

[0027] The brand and model of the silicone polyether copolymer is Dow Corning DC-29.

[0028] By adopting the above technical solution, anhydrous ethanol, organosilicon polyether copolymer, and ethyl acetate are added as diluents and dispersants to a siloxane-containing conductive liquid. Combined with cleaning and activation, spray pre-curing, PVD chromium plating, and shaping steps, a gradient composite coating is formed, giving the coating excellent corrosion resistance and anti-peeling properties. The triple effect of the activating cleaning agent lays a stable foundation for subsequent processes, ensuring the overall stability of the composite coating contact terminals. The synergistic effect of the components in the siloxane-containing conductive liquid prevents graphene powder agglomeration, ensuring its uniform distribution in the film-forming solution, forming a stable conductive film layer, and enhancing the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminals. This allows the chromium plating layer to adhere stably to the contact terminals, improving the corrosion resistance and durability of the contact terminals.

[0029] Preferably, the curing temperature of the pre-cured material is 60-80℃, and the curing temperature is 30-50% for the surface.

[0030] By adopting the above technical solution, the contact terminal blank is first cleaned and activated by an activating cleaning agent. Then, a silane-oxygen-containing conductive liquid is sprayed onto the surface of the activated blank and pre-cured at 60-80℃ until the surface humidity is 30-50%. After that, a chromium target is used to perform vacuum coating on its surface. Finally, sintering is carried out to form a gradient composite layer, which makes the contact terminal have better corrosion resistance and anti-detachment properties. The silane-oxygen-containing conductive liquid forms a semi-cured conductive film layer after pre-curing, which can make the chromium plating layer relatively stable during subsequent PVD chromium plating. After sintering, the organic components volatilize to form a dense conductive film layer. Moreover, the pre-curing conditions help to enhance the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminal, further ensuring that the chromium plating layer is stably attached to the contact terminal.

[0031] Preferably, the sintering temperature is 300-500℃ and the time is 40-120min.

[0032] By adopting the above technical solution, the contact terminal blank is first cleaned and activated using an activating cleaning agent to lay a stable base for subsequent processes; then, a silane-oxygen-containing conductive liquid is sprayed onto the surface of the activated blank and pre-cured to form a semi-cured conductive film layer; next, a chromium target is used for vacuum plating; finally, it is sintered at a temperature of 300-500℃ for 40-120 minutes to volatilize the organic components in the silane-oxygen-containing conductive liquid, forming a dense conductive film layer, which plays a bridging role and enhances the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminal, so that the chromium plating layer is stably attached to the contact terminal, and a gradient composite layer is formed in sequence, giving the contact terminal better corrosion resistance and anti-detachment properties.

[0033] If the substrate of the contact terminal is plastic, its sintering temperature needs to be lowered to below the melting point of the plastic.

[0034] Preferably, the chromium target is an alloy chromium target, and the chemical composition of the alloy chromium target includes chromium, graphene, and silicon.

[0035] By adopting the above technical solutions, chromium and silicon are added to form hard carbide and silicide particles, which are dispersed in the coating to play a "pinning" role and effectively resist wear; the layered structure of graphene further disperses stress and reduces material peeling during the wear process; the alloy chromium target material significantly improves its fatigue wear resistance by introducing the tough phase graphene.

[0036] The alloy chromium target is obtained by sintering a uniform mixture of chromium, graphene, and silicon. The final composition is 90% chromium, 2% graphene, 7% silicon, and the remainder is impurities.

[0037] Preferably, the graphene content is less than 3 wt%.

[0038] By adopting the above technical solution, the contact terminal blank is first cleaned and activated by an activating cleaning agent, then a silane-oxygen-containing conductive liquid is sprayed and pre-cured, and then PVD chromium plating is performed using an alloy chromium target containing chromium, less than 3wt% graphene and silicon. Finally, the contact terminal with a composite coating is obtained by sintering. The hard carbide and silicide particles formed by chromium and silicon play a "pinning" role in the coating to resist wear. The layered structure of graphene disperses stress and reduces material peeling. Moreover, because the graphene content is less than 3wt%, the adverse effects caused by excessive graphene content can be avoided, effectively improving the fatigue wear resistance and enhancing the wear resistance of the composite coating of the contact terminal.

[0039] In summary, this application includes at least one of the following beneficial technical effects:

[0040] 1. After sequential cleaning and activation, spray pre-curing, and PVD chrome plating, a gradient composite layer is formed, which has better corrosion resistance and anti-peeling properties;

[0041] 2. The silane-containing conductive liquid can prevent graphene powder from agglomerating, ensuring its uniform distribution in the film-forming liquid. It also plays a bridging role during sintering, enhancing the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminal. This allows the chromium plating layer to adhere stably to the contact terminal, improving the corrosion resistance and durability of the contact terminal.

[0042] 3. In the alloy chromium target, chromium and silicon form hard carbide and silicide particles, which are dispersed in the coating and play a "pinning" role, effectively resisting wear. The layered structure of graphene further disperses stress, reduces material peeling during the wear process, and improves fatigue wear resistance. Detailed Implementation

[0043] The present application will be further described in detail below with reference to the embodiments.

[0044] Example

[0045] Example 1

[0046] A vacuum deposition method for a gradient composite coating on contact terminals, comprising the following steps:

[0047] The activating cleaning agent is obtained by uniformly mixing a 75% ethanol solution, glycidyl etheroxypropyl silicone oligomer, and dispersant (OP-10, pH 7, HLB 14.5) in a weight ratio of 50:1:1.

[0048] The silane-containing conductive liquid is prepared by uniformly mixing graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and a diluent / dispersant in a weight ratio of 3:1:1:15. The diluent / dispersant is composed of anhydrous ethanol, organosilicon polyether copolymer, and ethyl acetate in a weight ratio of 10:1:19. The chromium content of the chromium target is 99%.

[0049] S1. Cleaning and Activation: The contact terminal blank (aluminum material) is conveyed to a cleaning tank containing an activating cleaning agent through a conveying device, so that the activating cleaning agent completely immerses the contact terminal blank for 1 minute. Then it enters the drying device and is dried for 10 minutes at a temperature of 60°C and a wind speed of 1.2 m / s to obtain blank A.

[0050] S2. Spraying and pre-curing: The activated blank is conveyed to the spraying device and sprayed onto the surface of the activated blank containing silaneoxy conductive liquid with a spraying pressure of 0.5MPa, a spray width of 200mm, a paint flow rate of 1.7L / min, a nozzle diameter of 1.3mm, and a spray gun distance of 15cm. Pre-curing is carried out at a temperature of 80min until the surface humidity reaches 50%, thus obtaining blank B.

[0051] S3, PVD Chromium Plating: Vacuum plating is performed on the surface of blank B using a chromium target. The sputtering pressure is 0.6 Pa, the sputtering power is 15 kW, the target-substrate distance is 38 mm, the sputtering temperature is 82 ℃, and the gas flow rate is 500 ml / min to form blank C.

[0052] S4. Shaping: Place the blank C into a sintering chamber at 580°C for 1 hour to obtain the contact terminal with the composite coating.

[0053] The composite coating consists of a conductive film layer and a chromium plating layer. The thickness of the graphene conductive layer is 20 micrometers, and the thickness of the chromium plating layer is 30 micrometers.

[0054] Example 2

[0055] The difference between Example 2 and Example 1 is that the sputtering pressure is 0.5 Pa, the sputtering power is 12 kW, the target-substrate distance is 20 mm, the sputtering temperature is 75 °C, and the gas flow rate is 380 ml / min; the curing temperature of the pre-curing is 80 °C, and the curing is carried out until the surface humidity is 30%; the sintering temperature is 450 °C, and the time is 120 min.

[0056] Example 3

[0057] The difference between Example 3 and Example 1 is that the sputtering pressure is 0.5 Pa, the sputtering power is 19 kW, the target-substrate distance is 50 mm, the sputtering temperature is 85 °C, and the gas flow rate is 600 ml / min; the curing temperature of the pre-cured product is 60 °C, and the curing time is 50%; the sintering temperature is 500 °C, and the time is 40 min.

[0058] Example 4

[0059] The difference between Example 4 and Example 1 is that the glycidyl etheroxypropyl organosilicon oligomer in the activating dispersant is replaced by an equal amount of dispersant.

[0060] Example 5

[0061] The difference between Example 5 and Example 1 is that the heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion is replaced with an equal amount of methyl hydrogen-containing polysilazane.

[0062] Example 6

[0063] The difference between Example 6 and Example 1 is that the heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion and the methyl hydrogen-containing polysilazane are replaced with silane coupling agent KH550 in equal amounts.

[0064] Example 7

[0065] The difference between Example 7 and Example 1 is that glycidyl etheroxypropyl organosilicon oligomer is replaced in equal amounts with silane coupling agent KH550.

[0066] Example 8

[0067] The difference between Example 8 and Example 1 is that the chromium target is an alloy chromium target, and the chemical composition of the alloy chromium target includes chromium, graphene, and silicon.

[0068] Comparative Example

[0069] Comparative Example 1

[0070] The difference between Comparative Example 1 and Example 1 is that step 2 is omitted. The specific process is as follows:

[0071] S1. Cleaning and Activation: The contact terminal blank (aluminum material) is conveyed to a cleaning tank containing an activating cleaning agent through a conveying device, so that the activating cleaning agent completely immerses the contact terminal blank for 1 minute. Then it enters the drying device and is dried for 10 minutes at a temperature of 60°C and a wind speed of 1.2 m / s to obtain blank A.

[0072] S2, PVD Chromium Plating: Vacuum plating is performed on the surface of blank A using a chromium target. The sputtering pressure is 0.6 Pa, the sputtering power is 15 kW, the target-substrate distance is 38 mm, the sputtering temperature is 82 ℃, and the gas flow rate is 50 ml / min, forming blank C.

[0073] S3. Shaping: Place the blank C into a sintering chamber at 580°C for 1 hour to obtain the contact terminal with the composite coating.

[0074] Comparative Example 2

[0075] The difference between Comparative Example 2 and Example 1 is that there is no sintering process. The specific process is as follows:

[0076] S1. Cleaning and Activation: The contact terminal blank (aluminum material) is conveyed to a cleaning tank containing an activating cleaning agent through a conveying device, so that the activating cleaning agent completely immerses the contact terminal blank for 1 minute. Then it enters the drying device and is dried for 10 minutes at a temperature of 60°C and a wind speed of 1.2 m / s to obtain blank A.

[0077] S2. Spraying and pre-curing: The activated blank is conveyed to the spraying device and sprayed onto the surface of the activated blank containing silaneoxy conductive liquid with a spraying pressure of 0.5MPa, a spray width of 200mm, a paint flow rate of 1.7L / min, a nozzle diameter of 1.3mm, and a spray gun distance of 15cm. Pre-curing is carried out at a temperature of 80min until the surface humidity reaches 50%, thus obtaining blank B.

[0078] S3, PVD Chromium Plating: Vacuum plating is performed on the surface of blank B using a chromium target. The sputtering pressure is 0.6 Pa, the sputtering power is 15 kW, the target-substrate distance is 38 mm, the sputtering temperature is 82 ℃, and the gas flow rate is 50 ml / min to obtain a composite coating contact terminal.

[0079] Performance testing

[0080] Detection methods / test methods

[0081] Abrasion resistance test:

[0082] The composite coatings on the contact terminals obtained in Examples 1-8 and Comparative Examples 1-2 were subjected to abrasion resistance tests using the drop sand test method. The test standard was based on GB / T 5237-2008, with 80-mesh silicon carbide sand. A circular area with a diameter of approximately 25 mm was marked on each test plate, and the drop speed was 450 g / min. The time required for the composite coating (graphene conductive layer and chromium plating layer) to penetrate was observed.

[0083] Corrosion resistance test:

[0084] The contact terminals with composite coatings obtained in Examples 1-8 and Comparative Examples 1-2 were placed in a salt spray tester containing a 5% sodium chloride solution at a temperature of 37°C and a pH of 7. If corrosion of the composite coating occurred within 500 hours, it was considered unqualified.

[0085] Table 1. Experimental data of Examples 1-8 and Comparative Examples 1-2

[0086]

[0087]

[0088] Based on Example 1 and Comparative Examples 1-2 and Table 1, it can be seen that the penetration time of Comparative Examples 1-2 is shorter than that of Example 1, and the corrosion resistance is unqualified. This indicates that the composite coating formed on the contact terminal through the cleaning and activation, spray pre-curing, PVD chrome plating, and shaping processes of this application has both good wear resistance and corrosion resistance.

[0089] Comparing Examples 1 and 4-6 with Table 1, it can be seen that the bottom penetration time of Example 1 is greater than that of Examples 4-6. This indicates that the activating cleaning agent is composed of ethanol solution, glycidyl etheroxypropyl organosilicon oligomer, and dispersant, and the silaneoxy-containing conductive liquid is composed of graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and diluent. After being processed by the production process of this application, the stability of the connection between the conductive film layer and the chromium plating layer, and between the conductive film layer and the contact terminal is enhanced, so that the chromium plating layer is stably attached to the contact terminal, improving the corrosion resistance and durability of the contact terminal. When the contact terminal is repeatedly plugged and unplugged, the chromium plating layer on its surface is not easy to fall off.

[0090] Comparing Example 1 and Example 7 and referring to Table 1, it can be seen that the bottom penetration time of Example 1 is lower than that of Example 7, indicating that the target material containing chromium, graphene, and silicon, combined with the production process of this application, improves the wear resistance of the composite coating of the contact terminal.

[0091] This specific embodiment is merely an explanation of this application and is not intended to limit it. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but such modifications are protected by patent law as long as they fall within the scope of the claims of this application.

Claims

1. A vacuum deposition method for a gradient composite coating on contact terminals, characterized in that, It is prepared by the following method: S1. Cleaning and Activation: The contact terminal blank is cleaned and activated with an activating cleaning agent to obtain blank A; S2. Spraying and pre-curing: Spraying a silane-containing conductive liquid onto the surface of the activated blank and pre-curing it to obtain blank B; S3, PVD chromium plating: Vacuum plating is performed on the surface of blank B using a chromium target to form blank C; S4. Shaping: Sinter the blank C to obtain a contact terminal containing a composite coating; The silane-containing conductive liquid is composed of graphene powder, heptaisobutyltrisilyl alcohol cage-like polysilsesquioxane dispersion, methyl hydrogen-containing polysilazane, and diluent / dispersant. The sputtering pressure of the vacuum coating is 0.5-0.8 Pa, the sputtering power is 12-19 kW, the target-substrate distance is 20-50 mm, the sputtering temperature is 75-85 °C, and the gas flow rate is 380-600 ml / min. The composite coating includes a conductive film layer and a chromium plating layer. The conductive film layer is a graphene-containing conductive film layer with a thickness of 20-100 micrometers, and the chromium plating layer has a thickness of 10-500 micrometers. The activating cleaning agent is composed of an ethanol solution, glycidyl etheroxypropyl organosilicon oligomer, and a dispersant. The diluent and dispersant is composed of anhydrous ethanol, organosilicon polyether copolymer, and ethyl acetate; The pre-curing temperature is 60-80℃, and the curing time is until the surface humidity is 30-50%. The sintering temperature is 300-500℃, and the time is 40-120min; The chromium target has a chromium content of 99%.

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