Compound, composition, surface treatment agent, article and method for manufacturing article

Abstract

Provided are a novel compound and composition useful as a surface treatment agent capable of forming a surface treatment layer having excellent wear resistance on a substrate. A compound represented by formula (1-1) or formula (1-2). T-O-(Si (R2) 2-O) m-Si (R2) 2-A-(Si (R) nL3-n) q (1-1), (L3-n (R) nSi) q-A-(Si (R2) 2-O) m-Si (R2) 2-A-(Si (R) nL3-n) q (1-2).

Description

TECHNICAL FIELD

[0001] The present application relates to a compound, a composition, a surface treatment agent, an article, and a method for manufacturing an article. BACKGROUND

[0002] In recent years, in order to improve the appearance, visibility, and the like, a technique for making the surface of an article less likely to attach fingerprints, and a technique for easily removing stains are required. As a specific method, a method of performing surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Literature 1 describes a silane compound having a specific siloxane group for the above-described surface treatment agent.

[0004] PRIOR ART DOCUMENTS

[0005] PATENT LITERATURE

[0006] Patent Literature 1: International Publication No. 2023 / 017830 SUMMARY

[0007] PROBLEMS TO BE SOLVED BY THE INVENTION

[0008] On the other hand, when a surface treatment layer is formed using the silane compound described in Patent Literature 1, it is found that the abrasion resistance of the formed surface treatment layer still needs to be further improved.

[0009] The present application was completed in view of this situation, and an object of one embodiment of the present application is to provide a novel compound and a composition useful as a surface treatment agent capable of forming a surface treatment layer excellent in abrasion resistance on a substrate.

[0010] An object of one embodiment of the present application is to provide a surface treatment agent capable of forming a surface treatment layer excellent in abrasion resistance on a substrate.

[0011] An object of one embodiment of the present application is to provide an article having a surface treatment layer excellent in abrasion resistance and a method for manufacturing an article.

[0012] MEANS FOR SOLVING PROBLEMS

[0013] The present application includes the following modes. [1]

[0015] a compound represented by the formula (1-1) described later or the formula (1-2) described later. [2]

[0017] The compound according to [1], in which the compound represented by the formula (1-1) is a compound represented by the formula (2) described later. [3]

[0019] The compound according to [2], wherein, in the formula (2), -L 3 - (Si (R) n L 3-n ) q is a group represented by the formula (3-1A) described later. [4]

[0021] The compound according to [2] or [3], wherein L 2 is -SO2NH-. [5]

[0023] The compound according to any one of [1] to [4], wherein m is an integer of 2 to 600. [6]

[0025] The compound according to any one of [1] to [5], wherein each q is independently an integer of 1 to 4. [7]

[0027] A composition comprising the compound according to any one of [1] to [6], and comprising a liquid medium. [8]

[0029] A surface treatment agent comprising the compound according to any one of [1] to [6]. [9]

[0031] A surface treatment agent comprising the compound according to any one of [1] to [6], and comprising a liquid medium.

[10]

[0033] A method for manufacturing an article, wherein a substrate is surface-treated using the surface treatment agent according to [8], to manufacture an article having a surface treatment layer formed on the substrate.

[11]

[0035] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to [8].

[12]

[0037] The article according to

[11] , which is an optical member.

[13]

[0039] The article according to

[11] , which is a display or a touch panel.

[14]

[0041] A method for manufacturing an article, wherein a surface treatment agent described in [9] is used to perform surface treatment on a substrate, and an article having a surface treatment layer formed on the substrate is manufactured.

[15]

[0043] An article comprising a substrate and a surface treatment layer, the surface treatment layer being disposed on the substrate and having been surface-treated with the surface treatment agent described in [9].

[16]

[0045] The article according to

[15] , which is an optical member.

[17]

[0047] The article according to

[15] , which is a display or a touch panel.

[0048] Effects of the Invention

[0049] According to one embodiment of the present invention, there is provided a novel compound and a composition useful as a surface treatment agent capable of forming a surface treatment layer having excellent wear resistance on a substrate.

[0050] According to one embodiment of the present invention, there is provided a surface treatment agent capable of forming a surface treatment layer having excellent wear resistance on a substrate.

[0051] According to one embodiment of the present invention, there is provided an article having a surface treatment layer having excellent wear resistance and a method for manufacturing an article. DETAILED DESCRIPTION

[0052] In the present specification, the numerical range represented by "~" includes the numerical values recited before and after "~" as the minimum value and the maximum value, respectively.

[0053] In the numerical range recited in stages in the present specification, the upper limit value or the lower limit value recited in one numerical range can be replaced with the upper limit value or the lower limit value of another recited numerical range. In addition, in the numerical range recited in the present specification, the upper limit value or the lower limit value of the numerical range can be replaced with the value shown in the examples.

[0054] In the present specification, the "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment.

[0055] In the present specification, when a compound or a group is represented by a specific formula (X), the compound or the group represented by the formula (X) is sometimes referred to as compound (X) or compound X, and group (X) or group X, respectively.

[0056] The bonding direction of the divalent group described in the present specification is not limited unless otherwise specified. For example, when Y is -COO- in a compound represented by the formula "X-Y-Z", Y can be -CO-O- or -O-CO-. In addition, the above compound can be "X-CO-O-Z" or "X-O-CO-Z".

[0057] [Compound]

[0058] The compound of the present application is a compound represented by the formula (1-1) described later or a compound represented by the formula (1-2) described later. In the present specification, the compound of the present application means at least one of the compound represented by the formula (1-1) and the compound represented by the formula (1-2).

[0059] When the compound of the present application is used, a surface treatment layer having excellent wear resistance can be formed. The reason is not clear, but it is presumed as follows.

[0060] In the compound of the present application, by having the group represented by A including a specific linking group at a specific site, when evaluation of wear resistance is performed, since the bonding energy of the group represented by A is high, the breakage of the bond and the like is less likely to occur, and thus it is considered that a surface treatment layer having excellent wear resistance can be formed.

[0061] Hereinafter, the compound of the present application will be described in detail.

[0062] <Compound represented by the formula (1-1)>

[0063] T-O-(Si(R 2 )2-O) m -Si(R 2 )2-A-(Si(R) n L 3-n ) q (1-1)

[0064] In the formula (1-1),

[0065] T is (R 1 )3Si-, a monovalent cyclic polysiloxane residue, or a monovalent cage polysiloxane residue,

[0066] R 1 each independently is a hydrocarbon group, or a trialkylsilyloxy group,

[0067] R 2 each independently is a hydrocarbon group,

[0068] A is a group including a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5) = N-, -S(O)(R 6 ) = N-, -S(O)(N-R 7 ) -, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH- consisting of a group of linking groups of (q+1) valence,

[0069] R 5 , R 6 , and R 7 are each independently a hydrocarbon group,

[0070] R are each independently a hydrocarbon group,

[0071] L are each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group,

[0072] m is a number of 1 or more,

[0073] n is an integer of 0 to 2,

[0074] q is an integer of 1 or more.

[0075] In formula (1-1), T is (R 1 )3Si-, a 1-valent cyclic polysiloxane residue, or a 1-valent cage polysiloxane residue.

[0076] As the hydrocarbon group represented by R 1 , for example, aliphatic hydrocarbon groups and aromatic hydrocarbon groups can be mentioned. Among them, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group can be any one of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, and is preferably a linear alkyl group. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4. As the hydrocarbon group represented by R 1 , more preferably a methyl group, an ethyl group, a n-propyl group, or a n-butyl group, and further preferably a methyl group.

[0077] R 1 The alkyl group contained in the trialkylsilyloxy group represented by R 1 The number of carbon atoms of the alkyl group contained in the trialkylsilyloxy group represented by R 1 The alkyl group contained in the trialkylsilyloxy group represented by R

[0078] The plurality of R 1 may be the same or different from each other, and from the viewpoint of easiness of production, it is preferable that they are the same.

[0079] As the (R 1) 3Si- represented groups, for example, methyl diethylsilyl group, methyl ethylpropylsilyl group, methyl ethylbutylsilyl group, methyl dipropylsilyl group, methyl propylbutylsilyl group, methyl dibutylsilyl group, dimethyl ethylsilyl group, dimethyl propylsilyl group, dimethyl butylsilyl group, trimethylsilyl group, triethylsilyl group, tri-n-propylsilyl group, triisopropylsilyl group, and trialkylsilyloxy groups having these groups.

[0080] wherein, from the viewpoint of improving water repellency of the surface treatment layer, R 1 A straight-chain alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is further preferred.

[0081] The monovalent cyclic polysiloxane residue is preferably a group represented by formula (T1).

[0082] [Chemical Formula 1]

[0083]

[0084] In formula (T1),

[0085] R 3 Each independently is a hydrocarbon group, a hydrocarbon group having a substituent, or -O-SiR 51 a group represented by formula 3,

[0086] s is an integer of 1 to 4,

[0087] R 51 Each independently is a hydrocarbon group or a trialkylsilyloxy group,

[0088] is a bonding site.

[0089] As the hydrocarbon group represented by R 3 For example, aliphatic hydrocarbon groups and aromatic hydrocarbon groups can be mentioned as the hydrocarbon group represented by R

[0090] As the hydrocarbon group represented by R 3 The alkyl group of one mode of the hydrocarbon group represented by R 3 The alkyl group represented by R is preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an iso-butyl group, or a heptyl group, and more preferably a methyl group.

[0091] As the hydrocarbon group represented by R 3As the hydrocarbon group contained in the hydrocarbon group having a substituent shown by the formula (R1)2Si-R2, for example, an aliphatic hydrocarbon group and an aromatic hydrocarbon group can be mentioned. Among them, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group can be any one of a linear alkyl group, a branched alkyl group and a cyclic alkyl group, and is preferably a linear alkyl group. The number of carbon atoms of the alkyl group contained in the substituted alkyl group is preferably from 1 to 10, more preferably from 1 to 8, and further preferably from 2 to 4.

[0092] As R 3 As the substituent of the hydrocarbon group having a substituent shown by the formula (R1)2Si-R2, for example, a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, a trifluoromethyl group and a -SiR 52 As the group represented by the formula (R1)2Si-R2, for example, a group represented by the formula (R1)2Si-R2 shown below can be mentioned. 52 Each independently is a hydrocarbon group or a trialkylsilyloxy group.

[0093] As R 52 As the hydrocarbon group shown by the formula (R1)2Si-R2, the same group as the hydrocarbon group shown by the formula (R1)2Si-R2 can be mentioned. 3 As the hydrocarbon group shown by the formula (R1)2Si-R2, the same group as the hydrocarbon group shown by the formula (R1)2Si-R2 can be mentioned.

[0094] As R 52 As the alkyl group contained in the trialkylsilyloxy group shown by the formula (R1)2Si-R2, any one of a linear alkyl group, a branched alkyl group and a cyclic alkyl group can be mentioned, and a linear alkyl group is preferred. The number of carbon atoms of the alkyl group is preferably from 1 to 10, more preferably from 1 to 8, further preferably from 1 to 4, and particularly preferably 1. The three alkyl groups contained in the trialkylsilyloxy group are optionally the same or different from each other.

[0095] 3 R 52 The three R

[0096] R 3 As the group represented by the formula (R1)2Si-R2, for example, a group represented by the formula (R1)2Si-R2 shown below can be mentioned. 51 As the group represented by the formula (R1)2Si-R2, for example, a group represented by the formula (R1)2Si-R2 shown below can be mentioned. 51 Each independently is a hydrocarbon group or a trialkylsilyloxy group. As the hydrocarbon group shown by the formula (R1)2Si-R2, the same group as the hydrocarbon group shown by the formula (R1)2Si-R2 can be mentioned. 51 As the hydrocarbon group shown by the formula (R1)2Si-R2, the same group as the hydrocarbon group shown by the formula (R1)2Si-R2 can be mentioned. 3 As the hydrocarbon group shown by the formula (R1)2Si-R2, the same group as the hydrocarbon group shown by the formula (R1)2Si-R2 can be mentioned. 51 As the trialkylsilyloxy group shown by the formula (R1)2Si-R2, the same group as the trialkylsilyloxy group shown by the formula (R1)2Si-R2 can be mentioned. 52 As the trialkylsilyloxy group shown by the formula (R1)2Si-R2, the same group as the trialkylsilyloxy group shown by the formula (R1)2Si-R2 can be mentioned.

[0097] A plurality of R 3 The three R

[0098] As the monovalent cyclic polysiloxane residue, for example, a group represented by the formula (R1)2Si-R2 shown below can be mentioned. is a bonding position.

[0099] [Chem. 2]

[0100]

[0101] [Chem. 3]

[0102]

[0103] The monovalent cage polysiloxane residue is preferably a group represented by formula (T2).

[0104] [Chem. 4]

[0105]

[0106] In formula (T2),

[0107] R 4 Each independently is a hydrocarbon group or a trialkylsilyloxy group,

[0108] is a bonding site.

[0109] As the hydrocarbon group represented by R 4 for example, aliphatic hydrocarbon groups and aromatic hydrocarbon groups can be mentioned. Among them, the hydrocarbon group is preferably an aliphatic hydrocarbon group, more preferably an alkyl group. The alkyl group can be any one of a linear alkyl group, a branched alkyl group and a cyclic alkyl group, and is preferably a linear alkyl group or a branched alkyl group. The number of carbon atoms of the alkyl group is preferably from 1 to 10, more preferably from 1 to 6, and further preferably from 1 to 4. As the hydrocarbon group represented by R 4 more preferably a methyl group, an ethyl group, a n-propyl group, a n-butyl group or an isobutyl group, and further preferably an isobutyl group.

[0110] R 4 The alkyl group contained in the trialkylsilyloxy group represented by R 4 The number of carbon atoms of the alkyl group contained in the trialkylsilyloxy group represented by R 1 more preferably a methyl group, an ethyl group, a n-propyl group or a n-butyl group, and further preferably a methyl group.

[0111] A plurality of R 4 may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0112] As the monovalent cage polysiloxane residue, for example, the following groups can be mentioned. is a bonding site.

[0113] [Chem. 5]

[0114]

[0115] In formula (1-1), R 2 Each independently is a hydrocarbon group.

[0116] As R 2 , a hydrocarbon group represented by R 1 may be exemplified. Among them, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group can be any one of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, and is preferably a linear alkyl group. The number of carbon atoms of the alkyl group is preferably from 1 to 10, more preferably from 1 to 6, and further preferably from 1 to 4. As R 2 , a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferable, and a methyl group is further preferable.

[0117] R 2 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group can be any one of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, and is preferably a linear alkyl group. The number of carbon atoms of the alkyl group is preferably from 1 to 10, more preferably from 1 to 6, and further preferably from 1 to 4.

[0118] In formula (1-1), R

[0119] As the hydrocarbon group represented by R 1 , a hydrocarbon group represented by R

[0120] In formula (1-1), L

[0121] The hydrolyzable group is a group that becomes a hydroxyl group by a hydrolysis reaction. That is, a silyl group having hydrolyzability represented by Si-L becomes a silanol group represented by Si-OH by a hydrolysis reaction. The silanol group further reacts between silanol groups to form a Si-O-Si bond. In addition, the silanol group can perform a dehydration condensation reaction with a silanol group from an oxide present on the surface of the substrate to form a Si-O-Si bond.

[0122] As the hydrolyzable group, for example, an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, and an isocyanate group (-NCO) can be exemplified. The alkoxy group is preferably an alkoxy group having from 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having from 3 to 10 carbon atoms. Among them, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having from 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having from 1 to 6 carbon atoms.

[0123] As the group having a hydrolyzable group, for example, the above exemplified group having a hydrolyzable group can be exemplified. The group having a hydrolyzable group is preferably a group represented by -O-L A -L B . L A is an alkylene group that can have an etheric oxygen atom, and L B is a hydrolyzable group.

[0124] The number of carbon atoms of the alkylene group is preferably from 1 to 10.

[0125] L A The above alkylene group shown can have an etheric oxygen atom between carbon atoms-carbon atoms. The number of the above etheric oxygen atom can be 1 or more than 2. L A When the alkylene group has an etheric oxygen atom, the atom bonded to the -O- in -O-L A -L B The atom bonded to the -O- in -O-L

[0126] L B The hydrolyzable group shown is the same as the meaning of the hydrolyzable group shown above for L, and the preferable modes are also the same.

[0127] Among them, from the viewpoint of ease of manufacture of the compound, L is preferably an alkoxy group having from 1 to 4 carbon atoms or a halogen atom. From the viewpoint of less outgassing at the time of coating and more excellent storage stability of the compound, L is preferably an alkoxy group having from 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group.

[0128] In formula (1-1), m is a number of 0 or more. It can also be a number of 1 or more.

[0129] m is preferably a number of from 0 to 600, more preferably a number of from 1 to 600, further preferably a number of from 2 to 600, particularly preferably a number of from 3 to 500, particularly preferably a number of from 9 to 50, extremely preferably a number of from 11 to 30, most preferably a number of from 11 to 25.

[0130] In formula (1-1), n is each independently an integer of from 0 to 2.

[0131] n is preferably 0 or 1, more preferably 0. By the presence of a plurality of L, the adhesion of the surface treatment layer to the substrate becomes more firm.

[0132] When n is 1 or less, the plurality of L present in 1 molecule are optionally the same or different from each other. From the viewpoint of ease of availability of the raw material and ease of manufacture of the compound, it is preferable that the plurality of L be the same. When n is 2, the plurality of R present in 1 molecule are optionally the same or different from each other. From the viewpoint of ease of availability of the raw material and ease of manufacture of the compound, it is preferable that the plurality of R be the same.

[0133] In formula (1-1), q is an integer of 1 or more.

[0134] From the aspect of more excellent wear resistance of the surface treatment layer, q is preferably an integer of from 1 to 15, more preferably an integer of from 1 to 6, further preferably an integer of from 1 to 4, particularly preferably 2 or 3. q can be 1.

[0135] when q is an integer of 2 or more, the plurality of [Si(R) n L 3-n ] can be the same or different from each other.

[0136] In formula (1-1), A is a (q+1)-valent linking group including a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 ) = N-, -S(O)(R 6 ) = N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-.

[0137] A is preferably a (q+1)-valent linking group including a linking group selected from the group consisting of -NHCONH-, -SO2NH-, and -OC(O)NH-, and more preferably a (q+1)-valent linking group including -SO2NH- from the viewpoint that a surface treatment layer having more excellent wear resistance can be formed.

[0138] Note that A can include one or two or more linking groups selected from the above group, and is preferably a linking group including one linking group selected from the above group from the viewpoint of easy production of the compound. A includes at least one linking group selected from the above group, and is preferably a linking group including one or two or more linking groups selected from the above group, and more preferably a linking group including one or two linking groups selected from the above group.

[0139] R 5 , R 6 , and R 7 are hydrocarbon groups, and examples include the hydrocarbon groups represented by R 1 .

[0140] As A, a group represented by formula (A1) is preferable.

[0141] -L 1 -L 2 -L 3 - (A1)

[0142] In formula (A1),

[0143] L 1 is a single bond or an alkylene group,

[0144] L 2 is a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 ) = N-, -S(O)(R 6) = N-, -S(O)(N-R 7 ) -, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH- consisting of a group,

[0145] R 5 , R 6 , and R 7 each independently is a hydrocarbon group,

[0146] L 3 is a (q+1)-valent linking group.

[0147] It is to be noted that L 3 is bonded to the side of -Si(R n )2-. 3-n q L 1 is bonded to the side of -Si(R 2 )2-.

[0148] L 1 The alkylene group represented by the above formula can be linear, branched, or cyclic. The number of carbon atoms of the above alkylene group is preferably from 1 to 30, more preferably from 1 to 20, further preferably from 4 to 20, and particularly preferably from 5 to 15.

[0149] As L 2 , -NHCONH-, -SO2NH-, or -OC(O)NH- is preferred, and -SO2NH- is more preferred from the viewpoint that a surface treatment layer having more excellent wear resistance can be formed.

[0150] In formula (Al), L 3 is a (q+1)-valent linking group.

[0151] As L 3 , a group other than one that impairs the effects of the present application, such as an alkylene group that can have an etheric oxygen atom or a 2-valent organopolysiloxane residue, a carbon atom, a nitrogen atom, a silicon atom, a 2- to 8-valent organopolysiloxane residue, and a group in which Si(R n L 3-n is removed from formula (3-1A), formula (3-1B), and formula (3-1A-1) to formula (3-1A-7) described later.

[0152] In addition, L 3 may be a group (g2-1) to group (g2-14) described later.

[0153] In formula (1-1), -L 3 - (Si(R n L 3-n ) q ​The group shown is preferably group (3-1A) or group (3-1B), more preferably group (3-1A).

[0154] -Q a -X 31 (-Q b -Si(R) n L 3-n ) h (-R 31 ) i (3-1A)

[0155] -Q c -[CH2C(R 32 )(-Q d -Si(R) n L 3-n ) y -R 33 (3-1B)

[0156] Note that in formula (3-1A) and formula (3-1B), R, L, and n are as defined above.

[0157] In formula (3-1A), Q a is a single bond or a divalent linking group.

[0158] As the divalent linking group, for example, a divalent hydrocarbon group, a divalent heterocyclic group, -0-, -S-, -SO2-, -N(R d )-, -C(O)-, -Si(R a )2-, and a group in which two or more of these are combined can be given.

[0159] As the divalent hydrocarbon group, a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, or an alkynylene group can be given. The divalent saturated hydrocarbon group can be linear, branched, or cyclic, and for example, an alkylene group can be given. The number of carbon atoms of the alkylene group is preferably from 1 to 30, more preferably from 1 to 20, further preferably from 4 to 20, and particularly preferably from 5 to 15. In addition, as the divalent aromatic hydrocarbon group, a group having from 5 to 20 carbon atoms is preferred, and for example, a phenylene group can be given. In addition to these, an alkenylene group having from 2 to 20 carbon atoms or an alkynylene group having from 2 to 20 carbon atoms can also be given.

[0160] The above R a is an alkyl group (preferably having from 1 to 10 carbon atoms) or a phenyl group. The above R d is a hydrogen atom or an alkyl group (preferably having from 1 to 10 carbon atoms).

[0161] Note that as the group in which two or more of these are combined, for example, -C(O)O-, -C(O)S-, -C(O)N(R d) -N(R d ) -C(O)N(R d ) -N(R d ) -C(O)O-, -SO2N(R d ) -N(R d ) -C(O)N(R d ) -N(R d ) -C(O)N(R d ) -N(R d ) -C(O)O-, -SO2N(R d ) -N(R a ) -C(O)N(R a ) -N(R

[0162] wherein Q a is preferably a divalent hydrocarbon group (preferably alkylene), a divalent heterocyclic group, -O-, -S-, -SO2-, -N(R d )-, -C(O)-, -Si(R a )2-, -C(O)O-, -C(O)S-, -C(O)N(R d )-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -SO2N(R d )-, an alkylene group having -C(O)N(R d )-, an alkylene group having -OC(O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R d )-, an alkylene group having -N(R d )C(O)N(R d )-, or an alkylene group having -SO2N(R d )-, more preferably -C(O)O-, an alkylene group having -C(O)N(R d )-, an alkylene group having -OC(O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R d )-, or an alkylene group having -N(R d) -C(O)N(R d ) -C(O)O- and further preferably an alkylene group having -C(O)O- or an alkylene group having -C(O)N(R d ) -C(O)O- and further preferably an alkylene group having -C(O)O- or an alkylene group having -C(O)N(R

[0163] wherein Q a is preferably a single bond or a divalent hydrocarbon group, and more preferably a single bond or an alkylene group.

[0164] In formula (3-1A), X 31 is a single bond, an alkylene group, a nitrogen atom, a carbon atom, a silicon atom, a 2- to 8-valent organopolysiloxane residue, or a (h+i+1)-valent cyclic group.

[0165] Note that the above alkylene group can have -O-, a silphenylene skeleton group, a 2-valent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group can have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a 2-valent organopolysiloxane residue, and a dialkylsilylene group.

[0166] X 31 The number of carbon atoms of the alkylene group represented by the above formula is preferably 1 to 20, and more preferably 1 to 10.

[0167] As the 2- to 8-valent organopolysiloxane residue, for example, a 2-valent organopolysiloxane residue and a (w+1)-valent organopolysiloxane residue described later can be given.

[0168] In formula (3-1A), X 31 is a (h+i+1)-valent cyclic group, Q a , (-Q b -Si(R) n L 3-n ) and R 31 are directly bonded to the atoms constituting the ring. The ring is a ring other than an organopolysiloxane ring.

[0169] X 31 The ring in X

[0170] As a monocyclic ring, a 4- to 8-membered ring is preferred, and a 5-membered ring and a 6-membered ring are more preferred. As a fused polycyclic ring, a fused polycyclic ring in which 2 or more 4- to 8-membered rings are fused is preferred, and a fused polycyclic ring in which 2 or 3 rings selected from a 5-membered ring and a 6-membered ring are bonded, a fused polycyclic ring in which 1 or 2 rings selected from a 5-membered ring and a 6-membered ring are bonded with 1 4-membered ring, are more preferred. As a bridged ring, a bridged ring in which a 5-membered ring or a 6-membered ring is the largest ring is preferred, and as a spiro ring, a spiro ring composed of 2 4- to 6-membered rings is preferred. As a condensed polycyclic ring, a condensed polycyclic ring in which 2 or 3 rings selected from a 5-membered ring and a 6-membered ring are bonded via a single bond, 1 to 3 carbon atoms, or 1 heteroatom having a valence of 2 or 3 is preferred. Note that in the condensed polycyclic ring, Q a , (-Q b -Si(R) n L 3-n ) and R 31 (i = 1 or more) can be bonded to each ring.

[0171] As the heteroatom constituting the above-mentioned ring, a nitrogen atom, an oxygen atom, and a sulfur atom are preferred, and a nitrogen atom and an oxygen atom are more preferred. The number of the heteroatoms constituting the ring is preferably 3 or less. In the case where the number of the heteroatoms constituting the ring is 2 or more, the heteroatoms can be different.

[0172] As the ring in X 31 , from the viewpoint of easy production of the compound and more excellent wear resistance of the surface treatment layer, 1 kind selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocyclic ring, a fused ring in which 2 or 3 of these rings are fused, a bridged ring in which a 5-membered ring or a 6-membered ring is the largest ring, and a condensed polycyclic ring having 2 or more of these rings and a linking group being a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom is preferred.

[0173] The preferred ring is a benzene ring, a 5-membered or 6-membered aliphatic ring, a 5-membered or 6-membered heterocyclic ring having a nitrogen atom or an oxygen atom, and a fused ring of a 5-membered or 6-membered carbocyclic ring and a 4- to 6-membered heterocyclic ring.

[0174] As the ring in X 31 , for example, the following rings and 1,3-cyclohexadiene ring, 1,4-cyclohexadiene ring, anthracene ring, cyclopropane ring, decalin ring, norbornene ring, norbornadiene ring, furan ring, pyrrole ring, thiophene ring, pyrazine ring, morpholine ring, aziridine ring, isoquinoline ring, oxazole ring, isoxazole ring, thiazole ring, imidazole ring, pyrazole ring, pyran ring, pyridazine ring, pyrimidine ring, and indene ring can be listed. Note that rings having an oxo group (=0) are also shown below.

[0175] [Chemical Formula 6]

[0176]

[0177] atoms of the ring in X 31 is a bond to Q a , (-Q b -Si(R) n L 3-n ) or R 31 . In the case where a remaining bond exists, the remaining bond is bonded to a hydrogen atom or a substituent. As the substituent, for example, a halogen atom, an alkyl group optionally containing an etheric oxygen atom between carbon atoms, a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group and an oxo group (=0) can be exemplified.

[0178] Further, in the case where 1 carbon atom constituting the ring has 2 bonds to Q a , (-Q b -Si(R) n L 3-n ) or R 31 , Q a and (-Q b -Si(R) n L 3-n ) can be bonded to the 1 carbon atom, or 2 (-Q b -Si(R) n L 3-n ) can be bonded thereto. Preferably, Q a , (-Q b -Si(R) n L 3-n ) or R 31 is bonded to different ring-forming atoms. h (-Q b -Si(R) n L 3-n ) can be bonded to different ring-forming atoms, respectively, 2 of which can be bonded to 1 ring-forming carbon atom, and further, 2 ring-forming carbon atoms formed by the bonding of 2 (-Q b -Si(R) n L 3-n ) can exist. i R 31 can be bonded to different ring-forming atoms, respectively, 2 of which can be bonded to 1 ring-forming carbon atom, and further, 2 ring-forming carbon atoms formed by the bonding of 2 R 31 can exist.

[0179] wherein, from the viewpoint of improving the wear resistance of the surface treatment layer, X 31 is preferably a nitrogen atom, a carbon atom, a silicon atom, a 4- to 8-valent organopolysiloxane residue or a (h+i+1)-valent cyclic group, and more preferably a carbon atom.

[0180] In formula (3-1A), Q b is a single bond or a divalent linking group.

[0181] The divalent linking group is the same as defined above for Q a .

[0182] In formula (3-1A), Q b is preferably an alkylene group optionally having an etheric oxygen atom. The number of carbon atoms of the alkylene group is preferably from 1 to 30, more preferably from 1 to 20, and further preferably from 2 to 20, can be from 2 to 10, can be from 2 to 6, and can be from 2 to 5. For example, 2, 3, 8, 9, and 11 can be listed. In addition, the number of carbon atoms can be from 1 to 10.

[0183] In formula (3-1A), R 31 is a hydrogen atom, a hydroxyl group, or an alkyl group.

[0184] The alkyl group can be any of a linear shape, a branched shape, and a cyclic shape, and is preferably a linear shape.

[0185] The number of carbon atoms of the alkyl group is preferably from 1 to 5, more preferably from 1 to 3, and further preferably 1.

[0186] X 31 is a single bond or an alkylene group, h is 1, and i is 0,

[0187] X 31 is a nitrogen atom, h is an integer from 1 to 2, i is an integer from 0 to 1, and h + i = 2 is satisfied,

[0188] X 31 is a carbon atom or a silicon atom, h is an integer from 1 to 3, i is an integer from 0 to 2, and h + i = 3 is satisfied,

[0189] X 31 is an organic polysiloxane residue having a valence of 2 to 8, h is an integer from 1 to 7, i is an integer from 0 to 6, and h + i = 1 to 7 is satisfied.

[0190] X 31 is a ring-containing group having a valence of (h + i + 1), h is an integer from 1 to 7, i is an integer from 0 to 6, and h + i = 1 to 7 is satisfied.

[0191] (-Q b -Si(R) n L 3-n ) is two or more, the two or more (-Q b -Si(R) n L 3-n ) can be the same or different. R 31 is two or more, the two or more (-R 31 ) can be the same or different.

[0192] wherein i is preferably 0 from the viewpoint of improving the wear resistance of the surface treatment layer.

[0193] In formula (3-1A), Q a , X 31 , and Q b are a single bond. n L 3-n is directly bonded to L 2 .

[0194] In formula (3-1B), Q c is a single bond or a divalent linking group.

[0195] The divalent linking group is the same as defined in Q a above.

[0196] In formula (3-1B), R 32 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom from the viewpoint of easy production of the compound.

[0197] As the alkyl group, a methyl group is preferred.

[0198] In formula (3-1B), Q d is a single bond or an alkylene group. The number of carbon atoms of the alkylene group is preferably 1 to 10, and more preferably 1 to 6. Q d is preferably a single bond or CH2- from the viewpoint of easy production of the compound.

[0199] In formula (3-1B), R 33 is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom from the viewpoint of easy production of the compound.

[0200] y is an integer of 1 to 10, and is preferably an integer of 1 to 6.

[0201] Two or more [CH2C(R 32 )(-Q d -Si(R) n L 3-n ] can be the same or different.

[0202] As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred.

[0203] (X 32 ) s1 -Q b1 -Si(R) n L 3-n (3-1A-1)

[0204] (X33 ) s2 -Q a2 -N[-Q b2 -Si(R) n L 3-n ]2 (3-1A-2)

[0205] -Q a3 -Si(R g ) [-Q b3 -Si(R) n L 3-n ]2 (3-1A-3)

[0206] -[Q e ] s4 -Q a4 - (O) t4 -C[- (O) u4 -Q b4 -Si(R) n L 3-n ] 3-w1 (-R 31 ) w1 (3-1A-4)

[0207] -Q a5 -Si[-Q b5 -Si(R) n L 3-n ]3 (3-1A-5)

[0208] -[Q e ] v -Q a6 -Z a [-Q b6 -Si(R) n L 3-n ] w2 (3-1A-6)

[0209] -[Q e ] s4 -Q a4 - (O) t4 -Z c [- (O-Q b4 ) u4 -Si(R) n L 3-n ] w3 (-OH) w4 (3-1A-7)

[0210] It is to be noted that in formulae (3-1A-1) to (3-1A-7), R, L and n are as defined above.

[0211] In the group (3-1A), the group (3-1A-4) is preferred.

[0212] In the group (3-1A-1), X 32 is -0-, -S-, -N(R d )-, -C(O)-, -C(0)0-, -C(0)S-, -S02N(R d )-, -N(R d )C(0)N(R d )-, -OC(0)N(R d )- or -C(0)N(R d )- (in which N in the formula is bonded to Q b1 ).

[0213] R d is as defined above.

[0214] s1 is 0 or 1.

[0215] In the group (3-1A-1), X 32 is preferably -0-, -S-, -N(R d )-, -C(O)-, -C(0)0-, -C(0)S-, -S02N(R d )-, -N(R d )C(0)N(R d )-, -OC(0)N(R d )- or -C(0)N(R d )-, more preferably -0-, -S-, -N(R d )-, -C(0)0-, -C(0)S-, -N(R d )C(0)N(R d )-, -OC(0)N(R d )- or -C(0)N(R d )-, further preferably -C(0)0- or -C(0)N(R d )-.

[0216] Q b1 is a single bond or an alkylene group. In addition, the alkylene group can have an -0-, a silphenylene skeleton group or a dialkylsilylene group. The alkylene group can have a plurality of groups selected from the group consisting of an -0-, a silphenylene skeleton group, a 2-valent organopolysiloxane residue and a dialkylsilylene group.

[0217] Note that, in the case where the alkylene group has an -0-, a silphenylene skeleton group, a 2-valent organopolysiloxane residue or a dialkylsilylene group, it is preferred that these groups be present between carbon atoms-carbon atoms.

[0218] Qb1 The alkylene group shown preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 2 to 20, and particularly preferably 2 to 6. Alternatively, the number of carbon atoms can be 1 to 10.

[0219] As a functional group (3-1A-1), the following functional groups can be listed as examples. In the following formula, To be with L 2 The bonding position. (CH2) β In this context, β represents the number of methylene groups, which is an integer from 1 to 20, more preferably an integer from 2 to 20, and can be an integer from 2 to 10 or an integer from 2 to 6. Examples include 1, 2, 3, 10, and 18. Additionally, the number of carbon atoms can be an integer from 1 to 10. Multiple β groups in the same compound can be the same or different, but are preferably the same. For example, all multiple β groups in the same compound may be any one of 1, 2, 3, 10, or 18. The same applies below.

[0220] [Chemistry 7]

[0221]

[0222] In group (3-1A-2), X 33 -O-, -S-, -N(R) d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-、-N(R d C(O)-, -N(R) d C(O)N(R) d -, -OC(O)N(R) d - or -C(O)N(R) d )-.

[0223] R d The definition is as described above.

[0224] s2 is either 0 or 1. From the perspective of ease of compound production, s2 is preferably 0.

[0225] Among them, X 33 Preferably -O-, -S-, -N(R) d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-、-N(R d C(O)N(R) d -, -OC(O)N(R) d - or -C(O)N(R) d )-.

[0226] Qa2 is a single bond, an alkylene group, -C(O)-, or a group having an etheric oxygen atom, -C(O)-, -C(O)O-, -C(O)N(R d )-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -SO2N(R d )-, -C(O)N(R d )- or -NH- between carbon atoms of an alkylene group having 2 or more carbon atoms.

[0227] R d is as defined above.

[0228] Q a2 is an alkylene group having preferably 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, further preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms.

[0229] Q a2 is a group having an etheric oxygen atom, -C(O)-, -C(O)O-, -C(O)N(R d )-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -SO2N(R d )-, -N(R d )SO2-, -C(O)N(R d )- or -NH- between carbon atoms of an alkylene group having 2 or more carbon atoms, preferably 2 to 10 carbon atoms, and more preferably 2 to 6 carbon atoms.

[0230] From the viewpoint of easy production of the compound, Q a2 is preferably a single bond.

[0231] Q b2 is an alkylene group, or a group having a divalent organopolysiloxane residue, an etheric oxygen atom or -NH- between carbon atoms of an alkylene group having 2 or more carbon atoms.

[0232] Q b2 is an alkylene group having preferably 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, further preferably 2 to 20 carbon atoms, which can be 2 to 10 carbon atoms or 2 to 6 carbon atoms. Examples include 2, 3, 8, 9, 11. In addition, the number of carbon atoms can be 1 to 10.

[0233] Q b2The number of carbon atoms of the group having an organic polysiloxane residue, an etheric oxygen atom, or -NH- having a valence of 2 between carbon atoms with a number of 2 or more is preferably 2 to 10, more preferably 2 to 6.

[0234] As Q b2 From the viewpoint of easy production of the compound, -CH2CH2CH2-, -CH2CH2OCH2CH2CH2- (in which the right side is bonded to Si) are preferred.

[0235] 2 [-Q b2 -Si(R) n L 3-n may be the same or different.

[0236] As the group (3-1A-2), for example, the following groups can be listed. In the following formulae, is a bonding position to L 2 .

[0237] Further, in the formula, (CH2) α in which α is an integer indicating the number of methylene groups, is preferably an integer of 1 to 30, more preferably an integer of 1 to 20, further preferably an integer of 2 to 20, can be an integer of 2 to 10, or an integer of 2 to 6. For example, 2, 3, 8, 9, and 11 can be listed. Further, the number of carbon atoms described above can be 1 to 10. The plurality of α contained in the same compound can be the same or different, and is preferably the same. For example, the plurality of α contained in the same compound are all any one of 2, 3, 8, 9, and 11. The same applies hereinafter.

[0238] β is defined as described above.

[0239] [Chemical Formula 8]

[0240]

[0241] In the group (3-1A-3), Q a3 is a single bond, or an alkylene group optionally having an etheric oxygen atom. From the viewpoint of easy production of the compound, Q a3 is preferably a single bond.

[0242] The number of carbon atoms of the alkylene group optionally having an etheric oxygen atom is preferably 1 to 10, more preferably 2 to 6.

[0243] R g is a hydrogen atom, a hydroxyl group, or an alkyl group.

[0244] As R gFrom the viewpoint of easy production of the compound, a hydrogen atom or an alkyl group is preferred. The number of carbon atoms of the alkyl group is preferably from 1 to 10, more preferably from 1 to 4, and still more preferably a methyl group.

[0245] Q b3 is an alkylene group, or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms.

[0246] Q b3 The number of carbon atoms of the alkylene group represented by Q is preferably from 1 to 30, more preferably from 1 to 20, and still more preferably from 2 to 20, and can be from 2 to 10 or from 2 to 6. For example, 2, 3, 8, 9, and 11 can be mentioned. In addition, the number of carbon atoms can be from 1 to 10.

[0247] Q b3 The number of carbon atoms of the group represented by Q having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms is preferably from 2 to 20, more preferably from 2 to 10, and still more preferably from 2 to 6.

[0248] From the viewpoint of easy production of the compound, Q b3 is preferably -CH2CH2-, -CH2CH2CH2-, or -CH2CH2CH2CH2CH2CH2CH2CH2-.

[0249] 2 groups [-Q b3 -Si(R) n L 3-n may be the same or different.

[0250] As the group (3-1A-3), for example, the following groups can be mentioned. In the following formulae, is a bonding position to L 2 . The definitions of α and β are as described above.

[0251] [Chemical Formula 9]

[0252]

[0253] In the group (3-1A-4), Q e is -C(O)O-, -SO2N(R d )-, or -N(R d )C(O)-.

[0254] The definition of R 31 is as described above. In the case where w1 is 1 or 2, R 31 is preferably a hydrogen atom.

[0255] s4 is 0 or 1, and is preferably 0.

[0256] Q a4 is a single bond, or an alkylene group optionally having an etheric oxygen atom.

[0257] The number of carbon atoms of the alkylene group optionally having an etheric oxygen atom is preferably from 1 to 20, more preferably from 1 to 10, further preferably from 1 to 6, and particularly preferably from 1 to 3.

[0258] t4 is 0 or 1 (wherein, Q a4 is 0 when it is a single bond).

[0259] as -Q a4 - (O) t4 -, from the viewpoint of easy manufacture of the compound, in the case where s4 is 0, it is preferably a single bond, -CH2O-, -CH2OCH2-, -CH2OCH2CH2O-, -CH2OCH2CH2OCH2- or -CH2OCH2CH2CH2CH2OCH2- (wherein, the left side is bonded to (XO) m -). In the case where s4 is 1, it is preferably a single bond, -CH2- or -CH2CH2-.

[0260] Q b4 is an alkylene group, the above-mentioned alkylene group optionally has -O-, -C(O)N(R d ) - (R d is defined as above), a silylphenylene skeleton group, a divalent organopolysiloxane residue or a dialkylsilylene group.

[0261] Note that, in the case where the alkylene group has -O- or a silylphenylene skeleton group, it is preferable that -O- or the silylphenylene skeleton group is present between carbon atoms-carbon atoms. In addition, in the case where the alkylene group has -C(O)N(R d )-, a dialkylsilylene group or a divalent organopolysiloxane residue, it is preferable that these groups are present at the terminal of the side bonded to (O) u4 -).

[0262] Q b4 The number of carbon atoms of the alkylene group represented by the formula: -CQ u4 - is preferably from 1 to 30, more preferably from 1 to 20, and further preferably from 2 to 20, and can be from 2 to 11 or from 2 to 6. For example, 2, 3, 8, 9, 11 can be mentioned. In addition, the number of carbon atoms can be from 1 to 11.

[0263] u4 is 0 or 1.

[0264] as - (O) b4 - Q b -, from the viewpoint of easy manufacture of the compound, it is preferably -CH2CH2-, -CH2CH2CH2-, - (CH2)-CH2OCH2CH2CH2-, -CH2OCH2CH2CH2CH2CH2-, -OCH2CH2CH2-, -OSi(CH3)2CH2CH2CH2-, -OSi(CH3)2OSi(CH3)2CH2CH2CH2-, or -CH2CH2CH2Si(CH3)2PhSi(CH3)2CH2CH2- (in which the right side is bonded to Si). b is an integer of 4 to 11.

[0265] w1 is an integer of 0 to 2, preferably 0 or 1, more preferably 0.

[0266] In the case where two or more [- (O) u4 -Q b4 -Si(R) n L 3-n ] are present, the two or more [- (O) u4 -Q b4 -Si(R) n L 3-n ] can be the same or different.

[0267] R 31 When two or more are present, the two or more (-R 31 ) can be the same or different.

[0268] As the group (3-1A-4), for example, the following groups can be mentioned. In the following formulae, is the bonding position to L 2 . The definitions of α and β are as described above.

[0269] [Chem. 10]

[0270]

[0271] In the group (3-1A-5), Q a5 is an alkylene group optionally having an etheric oxygen atom.

[0272] The number of carbon atoms of the alkylene group optionally having an etheric oxygen atom is preferably 1 to 10, more preferably 2 to 6.

[0273] As Q a5 , from the aspect of easy production of the compound, -OCH2CH2CH2-, -OCH2CH2OCH2CH2CH2-, -CH2CH2-, or -CH2CH2CH2- (in which the right side is bonded to Si) is preferred.

[0274] Q b5 is an alkylene group, or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms having a number of carbon atoms of 2 or more.

[0275] Q b5 The number of carbon atoms of the alkylene group represented by Q is preferably from 1 to 30, more preferably from 1 to 20, and further preferably from 2 to 20, and can be from 2 to 10 or from 2 to 6. For example, 2, 3, 8, 9, and 11 can be mentioned. In addition, the number of carbon atoms can be from 1 to 10.

[0276] Q b5 The number of carbon atoms of the group represented by Q, which has an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms having a number of from 2, is preferably from 2 to 20, more preferably from 2 to 10, and further preferably from 2 to 6.

[0277] As Q b5 From the viewpoint of easy manufacture of the compound, -CH2CH2CH2-, -CH2CH2OCH2CH2CH2- (in which the right side is bonded to Si(R) n L 3-n ).

[0278] 3 [-Q b5 -Si(R) n L 3-n ] can be the same or different.

[0279] As the group (3-1A-5), for example, the following groups can be mentioned. In the following formulae, is a bonding position to L 2 . The definitions of α and β are as described above.

[0280] [Chem. 11]

[0281]

[0282] The definition of Q e in the group (3-1A-6) is as defined in the group (3-1A-4) described above.

[0283] v is 0 or 1, and is preferably 0.

[0284] Q a6 is an alkylene group optionally having an etheric oxygen atom.

[0285] The number of carbon atoms of the alkylene group optionally having an etheric oxygen atom is preferably from 1 to 10, and further preferably from 2 to 6.

[0286] As Q a6 From the viewpoint of easy manufacture of the compound, -CH2OCH2CH2CH2-, -CH2OCH2CH2OCH2CH2CH2-, -CH2CH2-, or -CH2CH2CH2- (in which the right side is bonded to Z a ).

[0287] Z a (w2+1)-valent organic polysiloxane residue, or a (w2+1)-valent group having an alkylene group between the organic polysiloxane residue and the organic polysiloxane residue.

[0288] w2 is an integer of 2 to 7.

[0289] As the (w2+1)-valent organic polysiloxane residue and the (w2+1)-valent group having an alkylene group between the organic polysiloxane residue and the organic polysiloxane residue, the following groups can be exemplified. Among them, R a As described above. is a bonding position.

[0290] [Chemical Formula 12]

[0291]

[0292] Q b6 is an alkylene group, or a group having an etheric oxygen atom or a 2-valent organic polysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms.

[0293] Q b6 The number of carbon atoms of the alkylene group represented by the above formula is preferably 1 to 30, more preferably 1 to 20, and further preferably 2 to 20, and can be 2 to 10 or 2 to 6. For example, 2, 3, 8, 9, and 11 can be exemplified. In addition, the number of carbon atoms can be 1 to 10.

[0294] Q b6 The number of carbon atoms of the group represented by the above formula, which has an etheric oxygen atom or a 2-valent organic polysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms, is preferably 2 to 20, more preferably 2 to 10, and further preferably 2 to 6.

[0295] As Q b6 From the aspect of easy manufacture of the compound, -CH2CH2-, and -CH2CH2CH2- are preferred.

[0296] w2 [-Q b6 -Si(R) n L 3-n may be the same or different.

[0297] As the group (3-1A-6), for example, the following groups can be exemplified. In the following formula, is a bonding position to L 2 The definition of β is as described above.

[0298] [Chemical Formula 13]

[0299]

[0300] In the group (3-1A-7), Z c is a hydrocarbon group having a valence of (w3 + w4 + 1).

[0301] w3 is an integer of 4 or more.

[0302] w4 is an integer of 0 or more.

[0303] Q e , s4, Q a4 , t4, Q b4 and u4 are the same as the definitions of the respective symbols in the group (3-1A-4).

[0304] Z c may be composed of a hydrocarbon chain or may have an etheric oxygen atom between carbon atoms-carbon atoms of the hydrocarbon chain, and is preferably composed of a hydrocarbon chain.

[0305] Z c is preferably 5 to 20 valence, more preferably 5 to 10 valence, further preferably 5 to 8 valence, and particularly preferably 5 to 6 valence.

[0306] Z c is preferably 3 to 50, more preferably 4 to 40, and further preferably 5 to 30.

[0307] w3 is preferably 4 to 20, more preferably 4 to 16, further preferably 4 to 8, and particularly preferably 4 to 5.

[0308] w4 is preferably 0 to 10, more preferably 0 to 8, further preferably 0 to 6, particularly preferably 0 to 3, and most preferably 0 to 1.

[0309] In the case where two or more [- (O-Q b4 ) u4 -Si (R) n L 3-n ] are present, the two or more [- (O-Q b4 ) u4 -Si (R) n L 3-n ] can be the same or different.

[0310] As the group (3-1A-7), for example, the following groups can be mentioned. In the following formulae, is a bonding position to L 2 . The definition of β is as described above.

[0311] [Chem. 14]

[0312]

[0313] L when group A in formula (1-1) is formula (A1) 3 may be group (g2-1) (wherein d1+d3=1, q=d2+d4), group (g2-2) (wherein q=e2), group (g2-3) (wherein q=2), group (g2-4) (wherein q=h2), group (g2-5) (wherein q=i2), group (g2-6) (wherein q=1), or group (g2-7) (wherein q=1+i3).

[0314] -Q 12 -C(R e2 ) 3-e2 (-Q 22 -) e2 … (g2-2)

[0315] -Q 13 -N(-Q 23 -)2 … (g2-3)

[0316] -Q 14 -Z 1 (-Q 24 -) h2 … (g2-4)

[0317] -Q 15 -Si(R e3 ) 3-i2 (-Q 25 -) i2 … (g2-5)

[0318] -Q 26 - … (g2-6)

[0319] -Q 12 -CH(-Q 22 -) -Si(R e3 ) 3-i3 (-Q 25 -) i3 … (g2-7)

[0320] [Chemical Formula 15]

[0321]

[0322] wherein, in formulae (g2-1) to (g2-7), Q 12 , Q 13 , Q 14 , Q 15 , or Q 26 is bonded to L 2 on the side of Q 22 , Q 23 , Q24 , Q 25 , Q 26 on the other side of the nitrogen atom is bonded to [-Si(R) n L 3-n ].

[0323] Q 11 is a single bond, -O-, alkylene, or a group having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O- between carbon atoms of an alkylene having 2 or more carbon atoms.

[0324] Q 12 is a single bond, alkylene, or a group having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O- between carbon atoms of an alkylene having 2 or more carbon atoms, and when A has 2 or more Q 12 , the 2 or more Q 12 may be the same or different.

[0325] Q 13 is a single bond, alkylene, a group having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O- between carbon atoms of an alkylene having 2 or more carbon atoms, or a group having -C(O)- at the end on the N side of the alkylene.

[0326] when the atom in Z 14 to which Q 1 is bonded is a carbon atom, Q 14 is Q 12 , and when the atom in Z 14 to which Q 1 is bonded is a nitrogen atom, Q 14 is Q 13 , and when A 2 has 2 or more Q 14 , the 2 or more Q 14 may be the same or different.

[0327] Q 15 is alkylene, or a group having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O- between carbon atoms of an alkylene having 2 or more carbon atoms, and when A has 2 or more Q 15 , the 2 or more Q 15 may be the same or different.

[0328] Q 22alkylene, alkylene having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, the end of the alkylene not connected to Si has -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, or alkylene having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, and the end of the alkylene not connected to Si has -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, A has 2 or more Q 22 The 2 or more Q 22 may be the same or different.

[0329] Q 23 is alkylene, or alkylene having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, 2 Q 23 may be the same or different.

[0330] In the case where the atom in Z 24 to which Q 1 is bonded is a carbon atom, Q 24 is Q 22 , in the case where the atom in Z 24 to which Q 1 is bonded is a nitrogen atom, Q 24 is Q 23 , in the case where A has 2 or more Q 24 , the 2 or more Q 24 may be the same or different.

[0331] Q 25 is alkylene, or alkylene having -C(O)NR 6 -, -C(O)-, -NR 6 -, or -O-, A has 2 or more Q 25 , the 2 or more Q 25 may be the same or different.

[0332] Q 26 is alkylene, or alkylene having -C(O)NR 6-, -C(O)-, -NR 6 - or -O-.

[0333] Q 22 , Q 23 , Q 24 , Q 25 , Q 26 When R1is an alkylene group, the number of carbon atoms is preferably from 1 to 20, more preferably from 1 to 10, and further preferably from 1 to 6.

[0334] Z 1 is a group having a ring structure having Q 14 directly bonded to a carbon atom or a nitrogen atom, and having Q 24 directly bonded to a carbon atom or a nitrogen atom.

[0335] R e1 is a hydrogen atom or an alkyl group, two or more R e1 may be the same or different.

[0336] R e2 is a hydrogen atom, a hydroxyl group, an alkyl group or an acyloxy group.

[0337] R e3 is an alkyl group. R 6 is a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms or a phenyl group.

[0338] d1is 0 or 1. d3is 0 or 1. In addition, d1+d3is 1.

[0339] d2is an integer from 0 to 3. d4is an integer from 0 to 3. In addition, d2+d4is an integer from 1 to 5.

[0340] d1+d2is an integer from 1 to 3.

[0341] d3+d4is an integer from 1 to 3.

[0342] e2is 2 or 3.

[0343] h2is an integer of 1 or more, and is preferably 2 or 3.

[0344] i2is an integer from 1 to 3, and is preferably 2 or 3.

[0345] i3is 2 or 3.

[0346] From the aspect of easy manufacture of the compound and the aspect of more excellent wear resistance of the surface treatment layer, Q 11 , Q 12 , Q 13 , Q 14 , Q 15 , Q 22 , Q23 , Q 24 , Q 25 , and Q 26 The number of carbon atoms of the alkylene group of Q 26 is preferably 1 to 30, more preferably 1 to 20, and further preferably 2 to 20, and can be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. In addition, the number of carbon atoms can be 1 to 10, 1 to 6, or 1 to 4. In the case where the alkylene group has a specific bond between carbon atoms, the lower limit of the number of carbon atoms is 2.

[0347] As the ring structure in Z 1 , the above-described ring structures can be given, and the preferred modes are the same. Note that, since Q 14 , Q 24 is directly bonded to the ring structure in Z 1 , it is not, for example, a case where an alkylene group is connected to the ring structure and Q 14 , Q 24 is further connected to the alkylene group.

[0348] From the viewpoint of easy production of the compound, the number of carbon atoms of the alkyl group of R e1 , R e2 , or R e3 is preferably 1 to 6, more preferably 1 to 3, and further preferably 1 to 2.

[0349] From the viewpoint of easy production of the compound, the number of carbon atoms of the alkyl moiety of the acyloxy group of R e2 is preferably 1 to 6, more preferably 1 to 3, and further preferably 1 to 2.

[0350] From the viewpoint of easy production of the compound and the viewpoint of more excellent wear resistance of the surface treatment layer, h1 is preferably 1 to 6, more preferably 1 to 4, and further preferably 1 or 2, and particularly preferably 1.

[0351] From the viewpoint of easy production of the compound and the viewpoint of more excellent wear resistance of the surface treatment layer, h2 is preferably 2 to 6, more preferably 2 to 4, and further preferably 2 or 3.

[0352] As other forms of A in formula (1-1), a group (g2-8) (wherein d1+d3=1, q=d2xk3+d4xk3), a group (g2-9) (wherein q=e2xk3), a group (g2-10) (wherein q=2xk3), a group (g2-11) (wherein q=h2xk3), a group (g2-12) (wherein q=i2xk3), a group (g2-13) (wherein q=k3), or a group (g2-14) (wherein q=i3xk3+k3) can be given.

[0353] [Chemical Formula 16]

[0354]

[0355] -Q 12 -C(R e2 ) 3-e2 (-Q 22 -G 1 ) e2 (g2-9)

[0356] -Q 13 -N(-Q 23 -G 1 )2 (g2-10)

[0357] -Q 14 -Z 1 (-Q 24 -G 1 ) h2 (g2-11)

[0358] -Q 15 -Si(R e3 ) 3-i2 (-Q 25 -G 1 ) i2 (g2-12)

[0359] -Q 26 -G 1 (g2-13)

[0360] -Q 12 -CH(-Q 22 -G 1 )-Si(R e3 ) 3-i3 (-Q 25 -G 1 ) i3 (g2-14)

[0361] In the formulae (g2-8) to (g2-14), Q 12 , Q 13 , Q 14 , Q 15 or Q 26 is bonded to L 2 on one side, and G 1 is bonded to [-Si(R n L 3-n ] on the other side.

[0362] G 1 is a group (g3) described below, and 2 or more G 1 s possessed by A can be the same or different. G1 The symbols other than Q in the formulae (g2-1) to (g2-7) are the same as those in the formula (g2).

[0363] -Si(R 8 ) 3-k3 (Q 3 ) k3 … (g3)

[0364] In the group (g3), Q 22 , Q 23 , Q 24 , Q 25 and Q 26 are connected to the Si side, and [-Si(R 3 L n ] is connected to the Q 3-n side. R 8 is an alkyl group. Q 3 is an alkylene group, a group having -C(O)NR 6 -, -C(O)-, -NR 6 - or -O- between carbon atoms in an alkylene group having 2 or more carbon atoms, or (OSi(R 9 )2) p -O-, 2 or more Q 3 may be the same or different. k3 is 2 or 3. R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group. R 9 is an alkyl group, a phenyl group or an alkoxy group, and 2 or more R 9 may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, 2 or more (OSi(R 9 )2) can be the same or different.

[0365] From the viewpoint of easy production of the compound and the viewpoint of more excellent wear resistance of the surface treatment layer, the number of carbon atoms of the alkylene group of Q 3 is preferably 1 to 30, more preferably 1 to 20, and further preferably 2 to 20, and can be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9 and 11. In addition, the number of carbon atoms can be 1 to 10, 1 to 6 or 1 to 4. When the alkylene group has a specific bond between carbon atoms, the lower limit of the number of carbon atoms is 2.

[0366] From the viewpoint of easy production of the compound, the number of carbon atoms of the alkyl group of R 8 is preferably 1 to 6, more preferably 1 to 3, and further preferably 1 to 2.

[0367] From the viewpoint of easy production of the compound, the number of carbon atoms of the alkyl group of R 9The alkyl group preferably has 1 to 6 carbon atoms, more preferably 1 to 3, and even more preferably 1 to 2.

[0368] From the perspective of the excellent storage stability of the compound, R 9 The number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2.

[0369] p is preferably 0 or 1.

[0370] In the compound shown in formula (1-1), when q is 1, it is also preferred that group A is L when it is formula (A1). 1 It is an alkylene group, L 2 The free choice is -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R) 5 =N-、-S(O)(R 6 ) = N-、-S(O)(NR 7 The linking group in the group consisting of -, -OP(O)(O-)(O-), -OC(O)NH- and -OS(O)2NH-, L 3 It is an alkylene group. L 1 and L 3 The alkylene group preferably has 1 to 30 carbon atoms, and can be 1 to 25, 1 to 20, 1 to 10, or 5 to 10. 1 and L 3 The alkylene groups can be linear or branched, but are preferably linear. For example, L 1 and L 3 It is an alkylene group with 1 to 10 or 5 to 10 carbon atoms, L 2 The following can be selected: -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R) 5 =N-、-S(O)(R 6 ) = N-、-S(O)(NR 7 The combination of linking groups in the group consisting of -, -OP(O)(O-)(O-), -OC(O)NH- and -OS(O)2NH-.

[0371] Examples of compounds according to the present invention include compounds with the following formula. From the perspectives of ease of industrial manufacture, ease of processing, and superior water repellency and abrasion resistance of the surface treatment layer, compounds with the following formula are preferred. The R in the compound with the following formula... t A in equation (1-1) is -L 1 -L 2 -L 3 [TO-(Si(R)] 2 )2-O)m -Si(R 2 )2-L 1 -L 2 -] are the same, and the preferred modes are also the same.

[0372] L as the group A in formula (1-1) is of formula (A1) 3 The compound of group (g2-1) can be exemplified by the following compounds.

[0373] [Chemical Formula 17]

[0374]

[0375] L as the group A in formula (1-1) is of formula (A1) 3 The compound of group (g2-2) can be exemplified by the following compounds. In the following formula, Ak means alkyl (e.g., alkyl having 1 to 15 carbon atoms). The definitions of α and β are as described above.

[0376] [Chemical Formula 18]

[0377]

[0378] L as the group A in formula (1-1) is of formula (A1) 3 The compound of group (g2-3) can be exemplified by the following compounds. The definitions of α and β are as described above.

[0379] [Chemical Formula 19]

[0380]

[0381] L as the group A in formula (1-1) is of formula (A1) 3 The compound of group (g2-4) can be exemplified by the following compounds. The definition of β is as described above.

[0382] [Chemical Formula 20]

[0383]

[0384] L as the group A in formula (1-1) is of formula (A1) 3 The compound of group (g2-5) can be exemplified by the following compounds. The definitions of α and β are as described above.

[0385] [Chemical Formula 21]

[0386]

[0387] L as the group A in formula (1-1) is of formula (A1) 3Compounds which are the group (g2-6), for example, the following compounds of the formula can be exemplified. The definition of β is as described above.

[0388] [Chemical Formula 22]

[0389]

[0390] L when the group A in the formula (1-1) is the formula (A1) 3 Compounds which are the group (g2-7), for example, the following compounds of the formula can be exemplified. The definition of β is as described above.

[0391] [Chemical Formula 23]

[0392]

[0393] L when the group A in the formula (1) is the formula (A1) 3 Compounds which are the group (g2-8), for example, the following compounds of the formula can be exemplified.

[0394] [Chemical Formula 24]

[0395]

[0396] L when the group A in the formula (1-1) is the formula (A1) 3 Compounds which are the group (g2-9), for example, the following compounds of the formula can be exemplified. The definition of β is as described above.

[0397] [Chemical Formula 25]

[0398]

[0399] L when the group A in the formula (1-1) is the formula (A1) 3 Compounds which are the group (g2-10), for example, the following compounds of the formula can be exemplified. The definition of β is as described above.

[0400] [Chemical Formula 26]

[0401]

[0402] L when the group A in the formula (1-1) is the formula (A1) 3 Compounds which are the group (g2-11), for example, the following compounds of the formula can be exemplified. The definition of β is as described above.

[0403] [Chemical Formula 27]

[0404]

[0405] L when the group A in the formula (1-1) is the formula (A1) 3As the compound of the group (g2-12), for example, the following compounds can be exemplified. β is as defined above.

[0406] [Chem. 28]

[0407]

[0408] L as the group A of the formula (1-1) is of the formula (A1) 3 As the compound of the group (g2-13), for example, the following compounds can be exemplified. β is as defined above.

[0409] [Chem. 29]

[0410]

[0411] L as the group A of the formula (1-1) is of the formula (A1) 3 As the compound of the group (g2-14), for example, the following compounds can be exemplified. β is as defined above.

[0412] [Chem. 30]

[0413]

[0414] As the compound of the formula (1-1), the compound of the formula (2) is preferred.

[0415] (R 1 )3Si-O- (Si (R 2 )2-O) m -Si (R 2 )2-L 1 -L 2 -L 3 - (Si (R n L 3-n ) q (2)

[0416] R 1 each independently is a hydrocarbon group or a trialkylsilyloxy group,

[0417] R 2 each independently is a hydrocarbon group,

[0418] L 1 is a single bond or an alkylene group,

[0419] L 2 is a group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R7 ), -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH- consisting group,

[0420] R 5 , R 6 , and R 7 each independently is a hydrocarbon group,

[0421] L 3 is a (q+1) -valent linking group,

[0422] R each independently is a hydrocarbon group,

[0423] L each independently is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group,

[0424] m is a number of 0 or more,

[0425] n each independently is an integer of 0 to 2,

[0426] q is an integer of 1 or more.

[0427] each group in formula (2) is the same as each group in formula (1-1) in meaning, and the preferable mode is also the same.

[0428] In the compound represented by formula (2), when q is 1, it is also preferable that L 1 is an alkylene group, L 2 is a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-, L 3 is an alkylene group. L 1 and L 3 the number of carbon atoms of the alkylene group of L 1 and L 3 the alkylene group of L 1 and L 3 is an alkylene group having a number of carbon atoms of 1 to 10 or 5 to 10, L 2 may be a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6-NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 7 ) =N-, -S(O)(N-R 2 )2-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH- consisting of the group.

[0429] As the compound represented by formula (1-1), for example, the following compounds can be exemplified. The definition of m is as described above.

[0430] [Chemical Formula 31]

[0431]

[0432] [Chemical Formula 32]

[0433]

[0434] [Chemical Formula 33]

[0435]

[0436] <Compound represented by formula (1-2)>

[0437] (L 3-n (R) n Si) q -A-(Si(R 2 )2-O) m -Si(R 2 )2-A-(Si(R) n L 3-n ) q (1-2)

[0438] In formula (1-2),

[0439] R 2 each independently is a hydrocarbon group,

[0440] A each independently is a (q+1)-valent linking group comprising a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 ) =N-, -S(O)(N-R 6 ) =N-, -S(O)(N-R 7 ) -, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-,

[0441] R 5 , R 6 , and R 7 each independently is a hydrocarbon group,

[0442] R each independently is a hydrocarbon group,

[0443] L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group,

[0444] m is a number of 1 or more,

[0445] n is each independently an integer of 0 to 2,

[0446] q is each independently an integer of 1 or more.

[0447] Each group in formula (1-2) is the same as each group in formula (1-1) in meaning, and the preferable modes are also the same.

[0448] In the compound represented by formula (1-2), when q is 1, it is also preferable that L 1 is an alkylene group, L 2 is a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-, L 3 is an alkylene group. L 1 and the number of carbon atoms of the alkylene group of L 3 is preferably 1 to 30, and can be 1 to 25, 1 to 20, 1 to 10, or 5 to 10. L 1 The alkylene group of L 3 may be linear or branched, and is preferably linear. For example, L 1 and L 3 is an alkylene group having 1 to 10 or 5 to 10 carbon atoms, L 2 may be a combination of linking groups selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-.

[0449] The number average molecular weight (Mn) of the compound of the present application is preferably 500 to 20,000, more preferably 600 to 18,000, and further preferably 700 to 15,000.

[0450] If Mn is 500 or more, the surface treatment layer is more excellent in wear resistance. If Mn is 20,000 or less, it is easy to adjust the tackiness to an appropriate range, and the solubility is improved, so the workability at the time of film formation is excellent.

[0451] [Composition]

[0452] The composition of the present application can contain any component other than the compound of the present application without particular limitation.

[0453] That is, the composition of the present application can contain at least one of the compound represented by formula (1-1) and the compound represented by formula (1-2). In addition, the composition of the present application can contain both the compound represented by formula (1-1) and the compound represented by formula (1-2).

[0454] The composition of the present application preferably contains the compound of the present application and a liquid medium. In the case of containing a liquid medium, the composition of the present application can be in a liquid state, and can be a solution or a dispersion.

[0455] The composition of the present application can contain impurities such as by-products generated in the manufacturing process of the compound of the present application, in addition to the compound of the present application.

[0456] The content of the compound of the present application with respect to the total amount of the composition of the present application is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and further preferably 0.1 to 10 mass%. In the case of the composition of the present application used in a wet coating method, the content of the compound of the present application with respect to the total amount of the composition of the present application is preferably 0.01 to 10 mass%, more preferably 0.02 to 5 mass%, further preferably 0.03 to 3 mass%, and particularly preferably 0.05 to 2 mass%.

[0457] The liquid medium contained in the composition of the present application can be only one kind, or two or more kinds.

[0458] As the liquid medium, an organic solvent is preferred.

[0459] As the organic solvent, compounds composed of only hydrogen atoms and carbon atoms, and compounds composed of only hydrogen atoms, carbon atoms, and oxygen atoms can be exemplified, and specifically, hydrocarbon-based organic solvents, ketone-based organic solvents, ether-based organic solvents, ester-based organic solvents, glycol-based organic solvents, and alcohol-based organic solvents can be exemplified. Among them, the organic solvent is preferably a hydrocarbon-based organic solvent or an ester-based organic solvent.

[0460] As specific examples of the hydrocarbon-based organic solvent, pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexane, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene can be given.

[0461] As specific examples of the ketone-based organic solvent, acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-l-one, 3,3,5-trimethylcyclohexanone, and isophorone can be given.

[0462] As specific examples of the ether-based organic solvent, diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane can be given.

[0463] As specific examples of the ester-based organic solvent, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, pentyl acetate, isopentyl acetate, 3-ethoxypropyl acetate, ethyl lactate ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol diacetate, dipropylene glycol methyl ether acetate, 1,3-butanediol diacetate, 1,4-butanediol diacetate, 1,3-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, glyceryl triacetate, and 2,2,4-trimethyl-l,3-pentanediol monoisobutyrate can be given.

[0464] As specific examples of the glycol-based organic solvent, there can be mentioned ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-t-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butanediol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.

[0465] As specific examples of the alcohol-based organic solvent, there can be mentioned methanol, ethanol, 1-propanol, isopropanol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, t-butanol, amyl alcohol, 3-methyl-1,3-butanediol, 1,3-butanediol (1,3-Butanediol), 1,3-butanediol (1,3-Butylene Glycol), octanediol, 2,4-diethylpentanediol, butyl ethyl propylene glycol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecyl alcohol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0466] In addition, as the organic solvent, there can be mentioned halogen-based organic solvents, fluorine-containing organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds other than the compound of the present application.

[0467] As specific examples of the halogen-based organic solvent, there can be mentioned dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0468] As the fluorine-containing organic solvent, there can be mentioned, for example, polyfluorinated aromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluorinated aliphatic hydrocarbons (e.g., C6F 13CH2CH3 (for example, ASAHIKLIN (registered trademark) AC-6000 manufactured by AGC Inc.), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, ZEORORA (registered trademark) H manufactured by Zeon Corporation); hydrofluoroether (HFE) (for example, perfluoropropyl methyl ether (C3F7OCH3) (for example, Novec (trademark) 7000 manufactured by Sumitomo 3M Company), perfluorobutyl methyl ether (C4F9OCH3) (for example, Novec (trademark) 7100 manufactured by Sumitomo 3M Company), perfluorobutyl ethyl ether (C4F9OC2H5) (for example, Novec (trademark) 7200 manufactured by Sumitomo 3M Company), perfluorohexyl methyl ether (C2F5CF(OCH3)C3F7) (for example, Novec (trademark) 7300 manufactured by Sumitomo 3M Company), and the like alkyl perfluoroalkyl ether (perfluoroalkyl group and alkyl group can be linear or branched), and CF3CH2OCF2CHF2 (for example, ASAHIKLIN (registered trademark) AE-3000 manufactured by AGC Inc.)); hydrofluoroolefin (HFO) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, AMOLEA (Japanese: アモレア) (registered trademark) AS-300 manufactured by AGC Inc.).

[0469] As the nitrogen-containing compound, nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone can be exemplified.

[0470] As the sulfur-containing compound, carbon disulfide and dimethyl sulfoxide can be exemplified.

[0471] As the siloxane compound other than the compound of the present application, for example, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethytrisiloxane, hexamethylcyclotrisiloxane, hexaethyicyclotrisiloxane, octamethylcyclotetrasiloxane, octaethyicyclotetrasiloxane, and decamethyltetrasiloxane can be exemplified.

[0472] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and further preferably 90 to 99.9 mass%, with respect to the total amount of the composition of the present application. In the case of the composition of the present application used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99 mass%, more preferably 95 to 99.98 mass%, further preferably 97 to 99.97 mass%, and particularly preferably 98 to 99.95 mass%, with respect to the total amount of the composition of the present application.

[0473] The composition of the present application can contain other components within a range not impairing the effects of the present application, in addition to the compound and the liquid medium of the present application.

[0474] As the other components, additives can be exemplified, specifically, catalysts such as acid catalysts, base catalysts, and the like which promote the hydrolysis and condensation reactions of the reactive silyl groups.

[0475] As the catalyst, for example, any appropriate acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B), sulfur-containing compounds having a lone pair of electrons within the molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric amide compounds, amide compounds, urea compounds), and the like can be used.

[0476] As the acid catalyst, acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid can be exemplified.

[0477] In addition, as the base catalyst, for example, ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine, diethylamine can be exemplified.

[0478] In addition, as the other components, metal compounds having a hydrolyzable group (hereinafter, also referred to as "specific metal compounds") can also be exemplified. If the composition of the present application contains the specific metal compounds, the sliding properties and the stain resistance of the surface treatment layer can be further improved. As the specific metal compounds, metal compounds represented by any one of Formula (M1) to Formula (M3) can be exemplified.

[0479] M (X b1 ) m1 (X b2 ) m2 (X b3 ) m3 ... (M1)

[0480] Si (X b4 ) (X b5 )3... (M2)

[0481] (X b6 )3Si- (Y b1 )-Si (X b7 )3... (M3)

[0482] In Formula (M1),

[0483] M is a metal atom having a valence of 3 or 4,

[0484] X b1 each independently is a hydrolyzable group,

[0485] Xb2 Each is an independent group containing a siloxane backbone.

[0486] X b3 Each is an independent group containing a hydrocarbon chain.

[0487] m1 is an integer between 2 and 4.

[0488] m2 and m3 are each independent integers from 0 to 2.

[0489] When M is a trivalent metal atom, m1+m2+m3 is 3; when M is a tetravalent metal atom, m1+m2+m3 is 4.

[0490] In formula (M2),

[0491] X b4 It consists of hydrolyzable silane oligomer residues.

[0492] X b5 Each is independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0493] In formula (M3),

[0494] X b6 and X b7 Each is independently a hydrolyzable group or a hydroxyl group.

[0495] Y b1 It is a divalent organic group.

[0496] In formula (M1), the metal represented by M also includes half-metals such as Si and Ge. As M, trivalent metals and tetravalent metals are preferred, Al, Fe, In, Hf, Si, Ti, Sn or Zr are more preferred, Al, Si, Ti or Zr are even more preferred, and Si is particularly preferred.

[0497] In equation (M1), X is... b1 The hydrolytic group shown has the same meaning as the hydrolytic group represented by L in the above formula (1-1), and the preferred method is also the same.

[0498] X b2 The shown group containing a siloxane skeleton has a siloxane unit (-Si-O-), which can be either linear or branched. As the siloxane unit, dialkylsiloxy is preferred, and examples include dimethylsiloxy and diethylsiloxy. The number of repetitions of the siloxane unit in the group containing the siloxane skeleton is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3.

[0499] The group containing a siloxane skeleton can include a divalent hydrocarbon group at a part of the siloxane skeleton. Specifically, a part of the oxygen atom of the siloxane skeleton can be substituted with a divalent hydrocarbon group. As the aforementioned divalent hydrocarbon group, an alkylene group such as methylene, ethylene, propylene, butylene, and the like can be exemplified.

[0500] A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like can be bonded to the silicon atom at the end of the group containing a siloxane skeleton.

[0501] The number of elements of the group containing a siloxane skeleton is preferably 100 or less, more preferably 50 or less, and further preferably 30 or less. The upper limit of the number of elements is preferably 10 or more.

[0502] As the group containing a siloxane skeleton, a group represented by - (O-Si (CH3)2) n CH3represents a group, where n is an integer of 1 to 5, represents a bonding site to an adjacent atom.

[0503] X b3 The group containing a hydrocarbon chain represented by

[0504] m1is preferably 3 or 4.

[0505] As the compound represented by formula (M1), a compound represented by any one of formula (M1-1) to formula (M1-5) with M being Si is preferable, and a compound represented by formula (M1-1) is more preferable. As the compound represented by formula (M1-1), tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane is preferable.

[0506] Si (X b1 )4… (M1-1)

[0507] CH3-Si (X b1 )3… (M1-2)

[0508] C2H5-Si (X b1 )3… (M1-3)

[0509] n-C3H7-Si (X b1 )3… (M1-4)

[0510] (CH3)2CH-Si (Xb1 )3 (M1-5)

[0511] In formula (M2), X b4 The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (M1-5) is preferably 3 or more, more preferably 5 or more, and further preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and further preferably 10 or less.

[0512] The hydrolyzable silane oligomer residue can have an alkoxy group bonded to a silicon atom. As the alkoxy group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and the like can be exemplified, and a methoxy group or an ethoxy group is preferred. The hydrolyzable silane oligomer residue can have one or two or more of these alkoxy groups, and preferably has one.

[0513] As the hydrolyzable silane oligomer residue, (C2H5O)3Si-(OSi(OC2H5)2)4O- and the like can be exemplified. Here, represents a bonding site to an adjacent atom.

[0514] In formula (M2), as X b5 represented by the formula (1-1) in the above description, a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanate group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred.

[0515] As X b5 , a hydrolyzable group is preferred.

[0516] As the compound represented by the formula (M2), (H5C2O)3-Si-(OSi(OC2H5)2)4OC2H5 and the like can be exemplified.

[0517] The compound represented by the formula (M3) is a compound having a reactive silyl group at both terminals of a divalent organic group, that is, a bis-silane.

[0518] In formula (M3), as X b6 and X b7 represented by the formula (1-1) in the above description, an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminyloxy group, an amido group, an isocyanate group, and a halogen atom can be exemplified, and an alkoxy group or an isocyanate group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group or an ethoxy group is more preferred.

[0519] In formula (M3), X b6 and X b7 may be the same group or different groups. From the viewpoint of easy availability, X b6 and X b7Preferably, the groups are the same as each other.

[0520] In formula (M3), Y b1 is a divalent organic group linking the two reactive silyl groups. The divalent organic group Y b1 The number of carbon atoms of Y

[0521] As Y b1 may be exemplified an alkylene group, a phenylene group, an alkylene group having an etheric oxygen atom between carbon atoms. For example, -CH2CH2-, -CH2CH2CH2-, -CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2CH2-, -CH2C(CH3)2CH2-, -C(CH3)2CH2CH2C(CH3)2-, -CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH(CH3)CH2OCH2CH(CH3)-, and -C6H4- can be exemplified.

[0522] As the compound represented by formula (M3), (CH3O)3Si(CH2)2Si(OCH3)3, (C2H5O)3Si(CH2)2Si(OC2H5)3, (OCN)3Si(CH2)2Si(NCO)3, Cl3Si(CH2)2SiCl3, (CH3O)3Si(CH2)6Si(OCH3)3, and (C2H5O)3Si(CH2)6Si(OC2H5)3 can be exemplified.

[0523] The content of the other component that can be contained in the composition of the present application is preferably 10 mass% or less, more preferably 1 mass% or less, relative to the total amount of the composition of the present application. When the composition of the present application contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30 mass%, more preferably 0.01 to 10 mass%, further preferably 0.05 to 5 mass%, relative to the total amount of the composition of the present application.

[0524] The total content of the compound of the present application and the other component (hereinafter, also referred to as "solid component concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, further preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present application. The solid component concentration of the composition of the present application is a value calculated from the mass of the composition before heating and the mass after heating for 4 hours using a convection type dryer at 120°C.

[0525] The composition of the present application contains a liquid medium, and is therefore useful as a coating use, and can be used as a coating liquid.

[0526] The composition of the present application can contain other components than the compound of the present application and the liquid medium, within a range not impairing the effects of the present application.

[0527] As the other components, additives can be exemplified, specifically, catalysts such as acid catalysts, basic catalysts, and the like, which promote the hydrolysis and condensation reactions of the hydrolyzable silyl groups.

[0528] The content of the other components in the composition of the present application is preferably 10% by mass or less, more preferably 1% by mass or less.

[0529] As the other components, compounds represented by the following formula (3) can also be exemplified.

[0530] [Y 1 3Y 2 -(O) p1 -Y 3 ] p2 Y 4 (Si(Y 5 ) p3 (Y 6 ) 3-p3 ) p4 …(3)

[0531] In formula (3),

[0532] Y 2 is Si, Sn, or Ge,

[0533] Y 1 each independently is a hydrocarbon group or a trialkylsilyloxy group,

[0534] p1 is 0 or 1,

[0535] Y 3 each independently is an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue,

[0536] Y 4 is a single bond or a linking group of p2+p4 valences,

[0537] Y 5 each independently is a hydrocarbon group,

[0538] Y 6 each independently is a hydrolyzable group or a hydroxyl group,

[0539] p3 each independently is an integer of 0 to 2,

[0540] p2 and p4 each independently are an integer of 1 or more.

[0541] As the compound (3), Y 3Compounds that are alkylene chains or polyalkylene oxide chains.

[0542] As specific examples of the compound (3), the following compounds can be given. In the formula, γ is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0543] [Chem. 34]

[0544]

[0545] In the case where the other component in the composition of the present application is the compound (3), the content of the compound (3) is preferably 50% by mass or less, and more preferably 40% by mass or less.

[0546] [Surface treatment agent]

[0547] In one embodiment, the surface treatment agent of the present application contains the compound of the present application. In addition, the surface treatment agent of the present application can contain the compound of the present application and contain a liquid medium. The surface treatment agent of the present application can be the composition of the present application. The preferred modes of the liquid medium contained in the surface treatment agent of the present application are the same as those of the liquid medium contained in the composition of the present application.

[0548] The surface treatment agent of the present application can contain at least one of the compound represented by formula (1-1) and the compound represented by formula (1-2). In addition, the surface treatment agent of the present application can contain both the compound represented by formula (1-1) and the compound represented by formula (1-2).

[0549] [Article]

[0550] In one embodiment, the article of the present application contains a substrate and a surface treatment layer, the surface treatment layer being disposed on the substrate and being surface-treated with the surface treatment agent of the present application.

[0551] The surface treatment layer can be formed on a part of the surface of the substrate, or can be formed on the entire surface of the substrate. The surface treatment layer can be spread in a film shape on the surface of the substrate, or can be scattered in a dot shape.

[0552] In the surface treatment layer, the compound of the present application is contained in a state in which a part or all of the reactive silyl group ((Si(R) n L 3-n ) thereof is hydrolyzed and a dehydration condensation reaction of the silanol group is performed.

[0553] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is easily obtained sufficiently. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be obtained by X-ray reflectance method using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation) and by the interference pattern of the reflected X-rays, and the period of the interference pattern is calculated.

[0554] The kind of the substrate is not particularly limited, and for example, a substrate to which water repellency is required to be imparted can be exemplified. As the substrate, for example, a substrate which is used while being contacted with other articles (for example, stylus) or a finger of a person; a substrate which is held with a finger of a person at the time of operation; and a substrate which is placed on other articles (for example, a stand) can be exemplified.

[0555] As the material of the substrate, a metal, a resin, a glass, a sapphire, a ceramic, a semiconductor, a stone, a fiber, a nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramic ware, and a composite material thereof can be exemplified. The glass can also be chemically strengthened.

[0556] As the substrate, a building material, a decorative building material, an indoor article, a transportation equipment (for example, an automobile), a signboard, a sign, a drinking utensil, a tableware, a sink, an ornamental utensil (for example, a picture frame, a box), an experimental utensil, furniture, a fiber product, a packaging container; a glass or a resin used in art, sports, games, and the like; a glass or a resin used in an outer portion (except for a display portion) of an equipment such as a mobile phone (for example, a smartphone), a portable information terminal, a game machine, a remote controller, and the like can be exemplified. The shape of the substrate can be a plate shape or a film shape.

[0557] As the substrate, a touch panel substrate, a display substrate, a spectacle lens are preferable, and a touch panel substrate is particularly preferable. As the material of the touch panel substrate, a glass or a transparent resin is preferable.

[0558] The substrate can be a substrate on which surface treatment such as corona discharge treatment, plasma treatment, plasma graft polymerization treatment, and the like is performed on one surface or both surfaces. The adhesion of the substrate on which surface treatment is performed to the surface treatment layer is more excellent, and the wear resistance of the surface treatment layer is further improved. Therefore, it is preferable that the surface of the substrate on the side which contacts the surface treatment layer is subjected to surface treatment. In addition, the adhesion of the substrate on which surface treatment is performed to the undercoat layer is more excellent in the case where the undercoat layer is provided, and the wear resistance of the surface treatment layer is further improved. Therefore, in the case where the undercoat layer is provided, it is preferable that the surface of the substrate on the side which contacts the undercoat layer is subjected to surface treatment.

[0559] The surface treatment layer can be provided directly on the surface of the substrate, or a base layer can be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and wear resistance of the surface treatment layer, the article of the present application preferably comprises a substrate, a base layer disposed on the substrate, and a surface treatment layer on which the surface treatment has been performed using the surface treatment agent of the present application.

[0560] The base layer is preferably a layer comprising an oxide containing silicon and at least one specific element selected from the group consisting of the first group element, the second group element, the fourth group element, the fifth group element, the thirteenth group element, and the fifteenth group element of the periodic table.

[0561] The first group element of the periodic table (hereinafter also referred to as "first group element") refers to lithium, sodium, potassium, rubidium, and cesium. As the first group element, from the viewpoint of being able to form the surface treatment layer more uniformly without defects on the base layer, or the viewpoint of further suppressing the deviation in the composition of the base layer between samples, lithium, sodium, potassium are preferred, and sodium, potassium are more preferred. Two or more first group elements can be contained in the base layer.

[0562] The second group element of the periodic table (hereinafter also referred to as "second group element") refers to beryllium, magnesium, calcium, strontium, and barium. As the second group element, from the viewpoint of being able to form the surface treatment layer more uniformly without defects on the base layer, or the viewpoint of further suppressing the deviation in the composition of the base layer between samples, magnesium, calcium, barium are preferred, and magnesium, calcium are more preferred. Two or more second group elements can be contained in the base layer.

[0563] The fourth group element of the periodic table (hereinafter also referred to as "fourth group element") refers to titanium, zirconium, and hafnium. As the fourth group element, from the viewpoint of being able to form the surface treatment layer more uniformly without defects on the base layer, or the viewpoint of further suppressing the deviation in the composition of the base layer between samples, titanium, zirconium are preferred, and titanium is more preferred. Two or more fourth group elements can be contained in the base layer.

[0564] The fifth group element of the periodic table (hereinafter also referred to as "fifth group element") refers to vanadium, niobium, and tantalum. As the fifth group element, from the viewpoint of the surface treatment layer having more excellent wear resistance, vanadium is particularly preferred. Two or more fifth group elements can be contained in the base layer.

[0565] The thirteenth group element of the periodic table (hereinafter also referred to as "thirteenth group element") refers to boron, aluminum, gallium, and indium. As the thirteenth group element, from the viewpoint of being able to form the surface treatment layer more uniformly without defects on the base layer, or the viewpoint of further suppressing the deviation in the composition of the base layer between samples, boron, aluminum, gallium are preferred, and boron, aluminum are more preferred. Two or more thirteenth group elements can be contained in the base layer.

[0566] The Group 15 element of the periodic table (hereinafter, also referred to as "Group 15 element") refers to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 element, from the viewpoint of being able to form a surface treatment layer more uniformly without defects on the base layer, or the viewpoint of further suppressing the deviation of the composition of the base layer between samples, phosphorus, antimony, bismuth are preferable, and phosphorus, bismuth are more preferable. Two or more kinds of Group 15 elements can be contained in the base layer.

[0567] As the specific element contained in the base layer, the Group 1 element, the Group 2 element, the Group 13 element are more preferable because the surface treatment layer is more excellent in wear resistance, and the Group 1 element, the Group 2 element are more preferable, and the Group 1 element is further preferable.

[0568] As the specific element, one kind of element alone or two or more kinds of elements can be contained.

[0569] The oxide contained in the base layer can be a mixture of oxides of the above-described elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), can be a composite oxide containing two or more kinds of the above-described elements, or can be a mixture of oxides of the above-described elements alone and a composite oxide.

[0570] From the viewpoint of the surface treatment layer being more excellent in wear resistance, the ratio of the total molar concentration of the specific element to the molar concentration of silicon in the base layer (specific element / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and further preferably 0.20 to 1.80.

[0571] The molar concentration (mol%) of each element in the base layer can be determined, for example, by depth direction analysis based on X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0572] The base layer can be a single layer or a multilayer. The base layer can also have a concave-convex on the surface.

[0573] The thickness of the base layer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and further preferably 2 to 20 nm. If the thickness of the base layer is equal to or greater than the lower limit of the above range, the adhesion of the base layer to the surface treatment layer is further improved, and the surface treatment layer is more excellent in wear resistance. If the thickness of the base layer is equal to or smaller than the upper limit of the above range, the base layer itself is excellent in wear resistance.

[0574] The thickness of the base layer is determined by cross-sectional observation of the base layer based on transmission electron microscopy (TEM).

[0575] The base layer can be formed, for example, by an evaporation method using an evaporation material or by a wet coating method.

[0576] The evaporation material used in the evaporation method preferably contains an oxide containing silicon and a specific element.

[0577] As a specific example of the form of the evaporation material, powder, melt, sintered body, granulated body, and crushed body can be given, and from the viewpoint of operability, a melt, sintered body, and granulated body are preferred.

[0578] Here, the melt refers to a solid obtained by melting a powder of the evaporation material at a high temperature and then solidifying the melt. The sintered body refers to a solid obtained by firing a powder of the evaporation material, and as needed, a molded body obtained by molding a powder can also be used instead of the powder of the evaporation material. The granulated body refers to a solid obtained by drying granules obtained by kneading a powder of the evaporation material with a liquid medium (e.g., water, an organic solvent).

[0579] The evaporation material can be manufactured, for example, by the following methods.

[0580] • a method of mixing a powder of silicon oxide and a powder of an oxide of a specific element to obtain a powder of the evaporation material.

[0581] • a method of kneading the above-mentioned powder of the evaporation material and water to obtain granules, and then drying the granules to obtain a granulated body of the evaporation material.

[0582] • a method of drying a mixture obtained by mixing a powder containing silicon (e.g., a powder composed of silicon oxide, silica sand, silica gel) and a powder containing a specific element (e.g., a powder of an oxide of a specific element, a carbonate, a sulfate, a nitrate, an oxalate, a hydroxide) with water, and then firing the dried mixture or a molded body obtained by molding the dried mixture to obtain a sintered body.

[0583] • a method of melting a powder containing silicon (e.g., a powder composed of silicon oxide, silica sand, silica gel) and a powder containing a specific element (e.g., a powder of an oxide of a specific element, a carbonate, a sulfate, a nitrate, an oxalate, a hydroxide) at a high temperature, and then solidifying the melt to obtain a melt.

[0584] As a specific example of the evaporation method using the evaporation material, a vacuum evaporation method can be given. The vacuum evaporation method is a method of evaporating the evaporation material in a vacuum chamber and attaching the evaporation material to the surface of a substrate.

[0585] The temperature at the time of evaporation (e.g., the temperature of a boat in which the evaporation material is disposed when a vacuum evaporation device is used) is preferably 100°C to 3,000°C, and more preferably 500°C to 3,000°C.

[0586] As the pressure at the time of evaporation (for example, the pressure in the tank in which the evaporation material is disposed when a vacuum evaporation device is used), 1 Pa or less, more preferably 0.1 Pa or less, is preferable.

[0587] In the case where the base layer is formed using an evaporation material, one evaporation material can be used, or two or more evaporation materials containing different elements can be used.

[0588] As a specific example of the evaporation method of the evaporation material, a resistance heating method in which the evaporation material is melted and evaporated on a boat for resistance heating made of a high-melting-point metal, and an electron gun method in which an electron beam is irradiated to the evaporation material to directly heat the evaporation material to melt and evaporate the surface can be given. As the evaporation method of the evaporation material, the electron gun method is preferable from the viewpoint that a high-melting-point substance can be evaporated because it can be locally heated, and the viewpoint that the portion where the electron beam is not irradiated is at a low temperature and thus there is no concern about reaction with the container or the mixing of impurities.

[0589] As the evaporation method of the evaporation material, a plurality of boats can be used, or all the evaporation materials can be put in a single boat and used. The evaporation method can be co-evaporation, or alternately evaporation, and the like. Specifically, examples in which silicon dioxide and a specific source are mixed and used in the same boat, examples in which silicon dioxide and a source of a specific element are put in different boats and co-evaporated, and examples in which they are similarly put in different boats and alternately evaporated can be given. The conditions, order, and the like of the evaporation are appropriately selected depending on the composition of the base layer.

[0590] In the wet coating method, it is preferable that the base layer be formed on the substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a specific element-containing compound, and a liquid medium.

[0591] As specific examples of the silicon-containing compound, silicon oxide, silicic acid, a partial condensate of silicic acid, an alkoxysilane, and a partial hydrolytic condensate of an alkoxysilane can be given.

[0592] As specific examples of the specific element-containing compound, an oxide of the specific element, an alkoxide of the specific element, a carbonate of the specific element, a sulfate of the specific element, a nitrate of the specific element, an oxalate of the specific element, and a hydroxide of the specific element can be given.

[0593] As the liquid medium, the same medium as that contained in the composition of the present application can be given.

[0594] The content of the liquid medium is preferably 0.01 to 20% by mass, more preferably 0.1 to 10% by mass, with respect to the total amount of the coating liquid used to form the base layer.

[0595] As a specific example of the wet coating method for forming the base layer, spin coating, wiping coating, spray coating, blade coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett method, and gravure coating can be given.

[0596] It is preferable to dry the coating film after wet coating of the coating liquid. As the drying temperature of the coating film, 20 to 200°C is preferable, and 80 to 160°C is more preferable.

[0597] The article of the present application can be an optical material having a surface treatment layer on the outermost layer.

[0598] As the optical material, in addition to the optical material relating to displays and the like, a wide variety of optical materials can be given.

[0599] As the optical material, for example, displays such as cathode ray tubes (CRT; for example, computer displays), liquid crystal displays, plasma displays, organic EL displays, inorganic thin film EL dot matrix displays, back projection displays, fluorescent display tubes (VFD), field emission displays (FED), or protective sheets for these displays, or materials on which an anti-reflection film treatment has been performed on the surface.

[0600] The article of the present application is preferably an optical member. As the optical member, for example, car navigation systems, mobile phones, smartphones, digital cameras, digital camcorders, PDAs, portable audio players, car stereos, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (for example, liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films can be given.

[0601] In addition, as the optical member, front protective sheets for displays such as PDPs and LCDs, anti-reflection sheets, polarizing sheets, anti-glare sheets; disc surfaces of Blu-ray (registered trademark) discs, DVD discs, CD-Rs, MOs, and the like; optical fibers; display surfaces of watches can be given.

[0602] In particular, the article of the present application is preferably a display or a touch panel.

[0603] The article of the present application can be medical equipment or medical materials. In addition, the article of the present application can be car interior and exterior members. As the exterior materials, for example, car windows, lamp covers, and outdoor camera covers can be given. As the interior materials, for example, instrument panel covers, navigation system touch panels, and decorative interior materials can be given.

[0604] In the case where the article of the present application is an optical member, the material constituting the surface of the substrate is an optical member material such as glass or a transparent plastic. In addition, in the case where the article of the present application is an optical member, a functional layer such as a hard coat layer, an anti-reflection layer, or the like can be formed on the surface (the outermost layer) of the substrate. The anti-reflection layer can be either one of a single-layer anti-reflection layer and a multi-layer anti-reflection layer.

[0605] As examples of inorganic substances that can be used for the anti-reflection layer, SiO2, SiO, ZrO2, TiO2, TiO, Ti2O3, Ti2O5, Al2O3, Ta2O5, Ta3O5, Nb2O5, HfO2, Si3N4, CeO2, MgO, Y2O3, SnO2, MgF2, and WO3 can be listed. These inorganic substances can be used alone or in combination of two or more of them (for example, as a mixture). In the case where a multi-layer anti-reflection layer is formed, the outermost layer thereof is preferably formed using SiO2and / or SiO. In the case where the article of the present application is an optical glass member for a touch panel, a transparent electrode such as a thin film using indium tin oxide (ITO), indium zinc oxide, or the like can be provided on a part of the surface of the substrate (glass). In addition, the substrate can have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), a haze film layer, a hard coat film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like depending on the specific specifications thereof or the like.

[0606] [Method for manufacturing article]

[0607] The method for manufacturing the article of the present application is, for example, a method for manufacturing an article in which a surface treatment layer is formed on a substrate, by subjecting the substrate to surface treatment using the surface treatment agent of the present application. As the surface treatment, a dry coating method and a wet coating method can be listed.

[0608] As the dry coating method, a vacuum evaporation method, a CVD method, a sputtering method, or the like can be listed. From the viewpoint of suppressing the decomposition of the compound and the viewpoint of the simplicity of the apparatus, the vacuum evaporation method is preferred. In the vacuum evaporation, a pellet-like substance in which the compound of the present application is impregnated in a metal porous body such as iron, steel, or the like can be used. A pellet-like substance in which the compound of the present application is impregnated by impregnating a composition containing the compound of the present application and a liquid medium in a metal porous body such as iron, steel, or the like and drying the liquid medium can also be used.

[0609] As the wet coating method, for example, a spin coating method, a wiping coating method, a spray coating method, a blade coating method, a dip coating method, a die coating method, an inkjet method, a flow coating method, a roll coating method, a casting method, a Langmuir-Blodgett method, a gravure coating method can be listed.

[0610] To improve the wear resistance of the surface treatment layer, an operation for promoting the reaction of the compound of the present application with the substrate can be performed as needed. As the operation, heating, humidification, light irradiation, and the like can be exemplified.

[0611] For example, heating the substrate having the surface treatment layer formed therein in an atmosphere having moisture can promote the hydrolysis reaction of the hydrolyzable group, the reaction of the hydroxyl group of the surface of the substrate and the silanol group, the formation of siloxane bonds based on the condensation reaction of the silanol group, and the like.

[0612] After the surface treatment, the compound that is the compound in the surface treatment layer and is not chemically bonded to other compounds or the substrate can be removed as needed. As the removal method, for example, a method of pouring a solvent on the surface treatment layer, a method of wiping with a cloth infiltrated with a solvent, and the like can be exemplified.

[0613] Example

[0614] The present application is explained in more detail below using examples, but the present application is not limited to these examples.

[0615] Synthesis of Compound (C1)

[0616] Under a nitrogen atmosphere, a three-necked flask was charged with trimethylsilanol (0.78 mL), tetrahydrofuran (THF, 40 mL), and stirred to obtain a solution. The obtained solution was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 4.0 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 52 mL) was added dropwise over 25 minutes, and stirred for 18 hours. Dilute hydrochloric acid (1 N) was added to the reaction solution to stop the reaction. The organic phase was separated, and the aqueous phase was extracted with hexane. The combined organic phase was washed with water, saturated brine, dried over magnesium sulfate, washed with methanol, and distilled under reduced pressure to remove the solvent and low-boiling components. The obtained residue was refined by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 8.2 g of compound (C1). In compound (C1), the average value of m was 22. The structure of compound (C1) was confirmed by the following NMR data.

[0617] [Compound 35]

[0618]

[0619] 1 H-NMR (500 MHz, CDC13): δ 2.24 (s, 1H), 0.16-0.03 (m, 147H).

[0620] Synthesis of Compound (C2)

[0621] To 2-(undec-10-en-l-yl)tridec-12-en-l-amine (2.0 g) dissolved in toluene (20 mL) was added trichloromethyl chloroformate (760 mL) at 25°C, and heated under reflux for 19 hours. To the reaction solution was added saturated aqueous sodium bicarbonate solution to stop the reaction, and the organic phase was separated, and the aqueous phase was extracted with hexane. The combined organic phase was washed with water, saturated brine, dried over sodium sulfate, and the solvent and low-boiling components were removed by distillation under reduced pressure to obtain 2.4 g of a crude product containing compound (C2).

[0622] [Chemical Formula 36]

[0623]

[0624] Synthesis of Compound (C3)

[0625] Compound (C1) (690 mg) was dissolved in toluene (5.0 mL), and dibutyltin laurate (23 μL) was added at 25°C, and stirred for 3 minutes. The crude product containing compound (C2) (230 mg) was added at 25°C, and stirred for 48 hours. The solvent was removed by distillation under reduced pressure, the residue was diluted with ethyl acetate, and ion exchange water was added. The organic phase was separated, and the aqueous phase was extracted with ethyl acetate. The organic phase was washed with water, saturated brine, dried over magnesium sulfate, and then washed with methanol, and the solvent and low-boiling components were removed by distillation under reduced pressure. The obtained residue was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 660 mg of compound (C3). In compound (C3), the average value of m was 22. The structure of compound (C3) was confirmed by the following NMR data.

[0626] [Chemical Formula 37]

[0627]

[0628] 1 H-NMR (500 MHz, CDC13): δ 5.87-5.70 (m, 2H), 5.17-4.86 (m, 4H), 3.89-3.79 (m, IH), 3.45-3.32 (m, 2H), 2.09-1.92 (m, 4H), 1.65-1.19 (m, 33H), 0.26-0.01 (m, 147H).

[0629] Synthesis of Compound (C4)

[0630] To a three-necked flask were added dichloromethane (10 mL), compound (C3) (660 mg), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3 mass%, 13 mg), aniline (4.0 mg), and trimethoxysilane (0.16 mL), and the mixture was stirred at 40°C for 2 hours. The solvent was distilled off under reduced pressure, whereby 700 mg of compound (C4) was obtained. In compound (C4), the average value of m was 22. The structure of compound (C4) was confirmed by the following NMR data.

[0631] [Compound 38]

[0632]

[0633] 1 H-NMR (500 MHz, CDC13): δ 3.91-3.76 (m, 1H), 3.58 (s, 18H), 3.46-3.32 (m, 2H), 1.69-1.16 (m, 41H), 0.80-0.53 (m, 4H), 0.29-0.06 (m, 147H).

[0634] Synthesis of Compound (C5)

[0635] To a three-necked flask were added trimethylsilanol (0.39 mL) and THF (20 mL) under a nitrogen atmosphere, and the mixture was stirred to obtain a solution. The obtained solution was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 2.0 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 26 mL) was added dropwise over 15 minutes, and the mixture was stirred for 18 hours. To the reaction solution was added chlorodimethylsilane (0.53 mL), and the mixture was stirred for 6 hours. The reaction solution was diluted with hexane, and ion-exchange water was added. The organic phase was separated, and the aqueous phase was extracted with hexane. The organic phase was washed with water and saturated brine, dried over magnesium sulfate, and then the solvent and low-boiling components were distilled off under reduced pressure. The obtained residue was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 4.5 g of compound (C5). In compound (C5), the average value of m was 22. The structure of compound (C5) was confirmed by the following NMR data.

[0636] [Compound 39]

[0637]

[0638] 1 H-NMR (500 MHz, CDC13): δ 4.65 (p, J = 2.8 Hz, 1H), 0.16-0.03 (m, 147H).

[0639] Synthesis of Compound (C6)

[0640] To 10-undecen-l-amine (230 mg) dissolved in dichloromethane (50 mL) was added platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution in toluene (platinum content 33 mass%, 25 mg), aniline (8.0 mg), and after stirring at 25°C for 5 minutes, compound (C5) (1.5 g) was added, and stirring was performed at 40°C for 2 hours. The solvent was removed by distillation under reduced pressure, and after washing with methanol, the obtained residue was refined by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain compound (C6) 1.1 g. In compound (C6), the average value of m was 22. The structure of compound (C6) was confirmed by the following NMR data.

[0641] [Compound 40]

[0642]

[0643] 1 H-NMR (500 MHz, CDC13): δ 2.77-2.58 (m, 2H), 1.92-1.21 (m, 18H), 0.75-0.61 (m, 2H), 0.14-0.04 (m, 147H).

[0644] Synthesis of Compound (C7)

[0645] In the synthesis step of compound (C2), 2,2-diallyl-pent-4-en-l-amine (0.52 g) was used instead of 2-(undec-10-en-l-yl)tridec-12-en-l-amine, and otherwise, the same procedure was used to obtain a crude product containing compound (C7) 0.41 g.

[0646] [Compound 41]

[0647]

[0648] Synthesis of Compound (C8)

[0649] The compound (C6) (1.1 g) was dissolved in toluene (5 mL), and dibutyltin laurate (25 μL) was added at 25°C, and stirred for 3 minutes. To the reaction solution was added the crude product containing the compound (C7) (160 mg) at 25°C, and stirred for 48 hours. The solvent was removed by distillation under reduced pressure, the residue was diluted with ethyl acetate, and ion-exchange water was added. The organic phase was separated, and the aqueous phase was extracted with ethyl acetate. The organic phase was washed with water, saturated brine, dried over magnesium sulfate, washed with methanol, and the solvent and low-boiling components were removed by distillation under reduced pressure. The obtained residue was refined by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 850 mg of the compound (C8). In the compound (C8), the average value of m was 22. The structure of the compound (C8) was confirmed by the following NMR data.

[0650] [Chemical Formula 42]

[0651]

[0652] 1 H-NMR (500 MHz, CDC13): δ 5.86-5.55 (m, 3H), 5.42-5.22 (m, 2H), 5.20-4.87 (m, 6H), 3.20-2.96 (m, 4H), 2.04-1.86 (m, 6H), 1.55-1.10 (m, 16H), 0.80-0.53 (m, 2H), 0.21-0.09 (m, 147H).

[0653] Synthesis of Compound (C9)

[0654] In the synthesis step of the compound (C4), the compound (C8) was used instead of the compound (C3), and otherwise the same procedure was used to obtain 0.95 g of the compound (C9). In the compound (C9), the average value of m was 22. The structure of the compound (C9) was confirmed by the following NMR data.

[0655] [Chemical Formula 43]

[0656]

[0657] 1 H-NMR (500 MHz, CDC13): δ 5.45-4.98 (m, 2H), 3.58 (s, 27H), 3.20-3.02 (m, 4H), 1.55-1.12 (m, 28H), 0.78-0.53 (m, 8H), 0.17-0.08 (m, 147H).

[0658] Synthesis of Compound (C10)

[0659] A mixture of 4-allyl-4-(bromomethyl)hepta-l,6-diene (440 mg), sodium sulfate (550 mg) and water (5.0 mL) was heated under reflux for 24 hours, and the solvent was distilled off under reduced pressure to obtain 480 mg of a crude product containing compound (C10).

[0660] [Chemical Formula 44]

[0661]

[0662] Synthesis of Compound (C11)

[0663] A mixture of the crude product containing compound (C10) (480 mg) and thionyl chloride (0.22 mL) was heated under reflux for 24 hours, and the solvent was distilled off under reduced pressure. The residue was suspended in hexane, and the insoluble matter was removed. The solvent was distilled off from the filtrate under reduced pressure to obtain 380 mg of a crude product containing compound (C11).

[0664] [Chemical Formula 45]

[0665]

[0666] Synthesis of Compound (C12)

[0667] A mixture of compound (C7) (1.5 g), N,N-dimethylaminopyridine (4.7 mg) and triethylamine (0.54 mL) was dissolved in tetrahydrofuran (10 mL), and the crude product containing compound (C11) (380 mg) was added. The mixture was stirred at 25°C for 24 hours. Ion exchange water was added to the reaction solution, and the organic phase was separated. The aqueous phase was extracted with hexane. The organic phase was washed with dilute hydrochloric acid (IN), water, saturated brine, dried over magnesium sulfate, and then the solvent and low-boiling components were distilled off under reduced pressure. The residue was washed with methanol, and the low-boiling components were distilled off under reduced pressure. The obtained residue was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.1 g of compound (C12). In compound (C12), the average value of m was 22. The structure of compound (C12) was confirmed by the following NMR data.

[0668] [Chemical Formula 46]

[0669]

[0670] 1H-NMR (500 MHz, CDC13): δ 5.83-5.57 (m, 3H), 5.19-4.95 (m, 6H), 4.90-4.76 (m, IH), 3.21 (s, 2H), 2.99-2.73 (m, 2H), 2.04 (d, J=7.5 Hz, 6H), 1.61-1.20 (m, 16H), 0.79-0.53 (m, 2H), 0.21-0.12 (m, 147H).

[0671] <Synthesis of Compound (C13)>

[0672] In the synthesis step of Compound (C4), Compound (C12) was used instead of Compound (C3), and otherwise the same procedure was used to obtain Compound (C13) 1.2 g. In Compound (C13), the average value of m was 22. The structure of Compound (C13) was confirmed by the following NMR data.

[0673] [Compound 47]

[0674]

[0675] 1 H-NMR (500 MHz, CDC13): δ 4.88-4.74 (m, IH), 3.58 (s, 27H), 3.25 (s, 2H), 2.94-2.83 (m, 2H), 1.57-1.18 (m, 28H), 0.77-0.59 (m, 8H), 0.12-0.05 (m, 147H).

[0676] <Synthesis of Compound (C14)>

[0677] To 10-bromo-l-decene (18 mL), di-tert-butyl azodicarboxylate (10 g), potassium carbonate (18 g), dimethylformamide (DMF, 50 mL) was added, and stirred at 60°C for 16 hours. The reaction solution was diluted with hexane, and ion exchange water was added. The organic phase was separated, and the aqueous phase was extracted with hexane. The organic phase was washed with water, saturated brine, dried over magnesium sulfate, and then the solvent and low boiling point components were removed by distillation under reduced pressure. The obtained residue was dissolved in dichloromethane (30 mL), and trifluoroacetic acid (30 mL) was added, and stirred at 25°C for 1 hour. The solvent was removed by distillation under reduced pressure, and a crude product 23 g containing Compound (C14) was obtained. The structure of Compound (C14) was confirmed by the following NMR data.

[0678] [Compound 48]

[0679]

[0680] 1H-NMR (500 MHz, CDC13): δ 5.89-5.68 (m, 2H), 5.14-4.88 (m, 4H), 3.39-3.23 (m, 2H), 2.69-2.56 (m, 4H), 2.12-1.86 (m, 4H), 1.60-1.19 (m, 24H).

[0681] Synthesis of Compound (C15)

[0682] To the crude product of compound (C14) (23 g), toluene (50 mL), pyridine (1.0 mL), copper (I) bromide (310 mg) was added, and stirred at 60°C for 24 hours under an atmosphere of air. The solvent and low-boiling components were removed by distillation under reduced pressure, and the obtained residue was refined by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain compound (C15) 9.0 g. The structure of compound (C15) was confirmed by the following NMR data.

[0683] [Chemical Formula 49]

[0684]

[0685] 1 H-NMR (500 MHz, CDC13): δ 5.93-5.65 m, 2H), 5.14-4.81 (m, 4H), 3.66 (t, J = 7.2 Hz, 4H), 2.15-1.94 (m, 4H), 1.72-1.55 (m, 4H), 1.50-1.15 (m, 20H).

[0686] Synthesis of Compound (C16)

[0687] In the synthesis step of compound (C6), compound (C15) (2.0 g) was used instead of 10-undecen-1-amine, and otherwise, the same procedure was used to obtain compound (C16) 4.2 g. In compound (C16), the average value of m was 22. The structure of compound (C16) was confirmed by the following NMR data.

[0688] [Chemical Formula 50]

[0689]

[0690] 1H-NMR (500 MHz, CDC13): δ 5.88-5.71 (m, 1H), 5.15-4.89 (m, 2H), 3.72-3.60 (m, 4H), 2.09-1.87 (m, 2H), 1.70-1.55 (m, 4H), 1.48-1.17 (m, 24H), 0.81-0.66 (m, 2H), 0.17-0.05 (m, 147H).

[0691] Synthesis of Compound (C17)

[0692] In the synthesis step of Compound (C4), Compound (C16) (2.0 g) was used instead of Compound (C3), and otherwise the same procedure was used to obtain Compound (C17) 2.1 g. In Compound (C17), the average value of m was 22. The structure of Compound (C17) was confirmed by the following NMR data.

[0693] [Chemical Formula 51]

[0694]

[0695] 1 H-NMR (500 MHz, CDC13): δ 3.71-3.62 (m, 4H), 3.58 (s, 9H), 1.64 (p, J = 7.1 Hz, 4H), 1.51-1.17 (m, 28H), 0.77-0.59 (m, 4H), 0.14-0.05 (m, 147H).

[0696] Synthesis of Compound (C18)

[0697] In the synthesis step of Compound (C8), DMS-A15 (4.0 g, manufactured by Gelest) was used instead of Compound (C6), and otherwise the same procedure was used to obtain Compound (C18) 3.7 g. In Compound (C18), the average value of m was 37. The structure of Compound (C18) was confirmed by the following NMR data.

[0698] [Chemical Formula 52]

[0699]

[0700] 1H-NMR (500 MHz, CDC13): δ 5.81-5.61 (m, 6H), 5.37 (t, J = 4.4 Hz, 2H), 5.30 (t, J = 5.4 Hz, 2H), 5.18-4.87 (m, 12H), 3.12 (d, J = 5.4 Hz, 4H), 3.06-2.96 (m, 4H), 1.95 (d, J = 7.5 Hz, 12H), 1.60-1.39 (m, 4H), 0.81-0.56 (m, 4H), 0.04 (d, J = 16.3 Hz, 234H).

[0701] <Synthesis of Compound (C19)>

[0702] In the synthesis step of compound (C4), compound (C18) (3.7 g) was used instead of compound (C3), and otherwise, the same procedure was used to obtain compound (C19) 5.3 g. In compound (C19), the average value of m was 37. The structure of compound (C19) was confirmed by the following NMR data.

[0703] [Compound (Z)]

[0704]

[0705] 1 H-NMR (500 MHz, CDC13): δ 5.37 (t, J = 4.4 Hz, 2H), 5.06 (t, J = 5.0 Hz, 2H), 3.58 (s, 54H), 3.16 (d, J = 5.1 Hz, 4H), 3.06-2.97 (m, 4H), 1.61-1.31 (m, 28H), 0.81-0.61 (m, 16H), 0.04 (d, J = 16.3 Hz, 234H).

[0706] <Compound (Z)>

[0707] Compound (Z) was synthesized with reference to Example 1 described in International Publication No. 2023 / 017830.

[0708] Note that compound (Z) is a compound that does not belong to either of the compounds represented by formula (1-1) and formula (1-2). The average value of (SiMe2-O-)17 in compound (Z) is 17. 17

[0709] [Compound (Z)]

[0710]

[0711] [Manufacture of article]

[0712] ​A silicon oxide 30 g was disposed as a deposition source in a copper-made hearth in a vacuum deposition apparatus (VTR-350M manufactured by ULVAC KIKO, Inc.). A glass substrate was disposed in the vacuum deposition apparatus, and the vacuum deposition apparatus was evacuated to 5 x 10 -3 A silicon oxide 30 g was disposed as a deposition source in a copper-made hearth in a vacuum deposition apparatus (VTR-350M manufactured by ULVAC KIKO, Inc.). A glass substrate was disposed in the vacuum deposition apparatus, and the vacuum deposition apparatus was evacuated to 5 x 10

[0713] The substrate with a silicon oxide layer was disposed on a sample stage of a spray coater (API-90RS manufactured by Apeiros Co., Ltd.) so that the silicon oxide layer became the surface. Next, 13 g of a heptane solution containing 0.2 mass% of the compound shown in the following table was put into a syringe in the spray coater, and spraying (wet coating method) was performed at an atomizing pressure of 130 kPa, a distance between a nozzle and the sample surface of 50 mm, and a scanning speed of 300 mm / sec. Then, the substrate with a silicon oxide layer on which the surface was coated with the compound was heat-treated at 140°C for 30 minutes, and an evaluation sample (article) in which a substrate, a silicon oxide layer, and a surface treatment layer were sequentially stacked was obtained.

[0714] [Evaluation]

[0715] The article obtained was evaluated in terms of water repellency, oil repellency, weather resistance, and abrasion resistance. The evaluation methods are described below.

[0716] [Water repellency]

[0717] About 2 μL of distilled water was dropped on the surface treatment layer of the article, and an initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average of five water contact angles measured on the surface treatment layer was used as the initial water contact angle used in the following evaluation. Note that the water contact angle was calculated using the 2θ method. The evaluation criteria are described below.

[0718] A: The initial water contact angle was more than 104°

[0719] B: The initial water contact angle was 100 to 104°

[0720] C: The initial water contact angle was less than 100°

[0721] [Oil repellency]

[0722] On the surface treatment layer of the article, about 2 μL of oleic acid was dropped, and the initial oil contact angle (oleic acid contact angle) was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average of the oil contact angles measured at 5 places on the surface treatment layer was used as the initial oil contact angle used in the following evaluation. Note that the oil contact angle was calculated using the 2θ method. The evaluation criteria are as follows.

[0723] A: The initial oil contact angle is more than 54°

[0724] B: The initial oil contact angle is 50 to 54°

[0725] C: The initial oil contact angle is less than 50°

[0726] <Weather resistance>

[0727] On the surface treatment layer of the article, a xenon arc lamp type weatherometer (SUNTEST XLS+: product name, manufactured by ORIENT TECHNICAL INSTRUMENTS CO., LTD.) was used to irradiate light (650 W / m 2 , 300 to 700 nm) at a black panel temperature of 63°C for 500 hours, and the water contact angle after the accelerated light resistance test was measured. The method of measuring the water contact angle after the accelerated light resistance test was the same as the method of measuring the initial water contact angle in the evaluation method of water repellency described above, and the average of the water contact angles measured at 5 places on the surface treatment layer after the accelerated light resistance test was used as the water contact angle after the accelerated light resistance test used in the following evaluation. Based on the degree of decrease in the water contact angle after the accelerated light resistance test, the abrasion resistance was evaluated. The smaller the degree of decrease in the water contact angle after the accelerated light resistance test, the smaller the decrease in performance caused by light, and the more excellent the weather resistance of the surface treatment layer. The evaluation criteria are as follows.

[0728] Degree of decrease in water contact angle after accelerated light resistance test = (initial water contact angle) - (water contact angle after accelerated light resistance test)

[0729] A: The degree of decrease in the water contact angle after the accelerated light resistance test is 3° or less

[0730] B: The degree of decrease in the water contact angle after the accelerated light resistance test is more than 3° and 5° or less

[0731] C: The degree of decrease in the water contact angle after the accelerated light resistance test is more than 5°

[0732] <Abrasion resistance>

[0733] For the surface treatment layer of the article, a 3-roll surface abrasion tester (product name "PA-300A", made by Okura Rikagaku Seiki Co., Ltd.) was used to perform a friction durability test under the following conditions: load 1,000 g, rotation speed 40 rpm, stroke length 40 mm, and a rubber (6 mmφ, made by minoan Co., Ltd.) as the friction partner, in an atmosphere of 24°C and 40% RH.

[0734] After 1,000 reciprocating rubs, the water contact angle after the friction durability test was measured. The method of measuring the water contact angle after the friction durability test was the same as the method of measuring the initial water contact angle in the evaluation of water repellency. The average of the water contact angles measured at 5 points on the surface treatment layer after the friction durability test was used as the water contact angle after the friction durability test in the following evaluation. The abrasion resistance was evaluated based on the degree of reduction in the water contact angle after the friction durability test. The smaller the degree of reduction in the water contact angle, the more excellent the abrasion resistance. The evaluation criteria were as follows.

[0735] Degree of reduction in water contact angle after friction durability test = (initial water contact angle) - (water contact angle after friction durability test)

[0736] A: Degree of reduction in water contact angle after friction durability test is 2° or less

[0737] B: Degree of reduction in water contact angle after friction durability test exceeds 2° and is 5° or less

[0738] C: Degree of reduction in water contact angle after friction durability test exceeds 5° and is 10° or less

[0739] D: Degree of reduction in water contact angle after friction durability test exceeds 10°

[0740] The evaluation results are shown in Table 1.

[0741] In Table 1, the column "Linking group contained in A" indicates the type of the linking group contained in A, which is a group corresponding to L 2 .

[0742] The column "-L 3 - (Si(R) n L 3-n ) q " indicates the group represented by -L 3 - (Si(R) n L 3-n ) q .

[0743] The column "L 3 " indicates a group corresponding to the group represented by L 3 .

[0744] Examples 1 to 5 are examples, and Example 6 is a comparative example.

[0745] [Table 1]

[0746]

[0747] As shown in Table 1, it is known that the compounds of Examples 1 to 5 can form a surface treatment layer having excellent abrasion resistance as compared with the compound of Example 6.

[0748] In addition, it is known from the comparison of Examples 1 to 5 that the weather resistance is more excellent in the case where A is a (q+1)-valent linking group containing -SO2NH- (in Formula (2), L 2 is -SO2NH-).

[0749] Industrial applicability

[0750] The compound of the present application is useful as a surface treatment agent. The surface treatment agent can be used, for example, for a substrate in a display device such as a touch panel display, an optical element, a semiconductor element, a building material, an automobile member, a nanoimprint technique, and the like. In addition, the surface treatment agent can be used for a vehicle body, a window glass (front glass, side glass, rear glass), a mirror, a bumper, and the like in a transportation device such as a train, an automobile, a ship, an aircraft, and the like. Furthermore, the surface treatment agent can be used for an outdoor article such as a building exterior wall, a tent, a solar power generation module, a soundproof board, concrete, and the like; a fishing net, an insect catching net, a sink. In addition, the surface treatment agent can be used for a kitchen, a bathroom, a washstand, a mirror, a toilet surrounding member; a chandelier, a ceramic such as a tile; an artificial marble, an air conditioner, and various indoor devices. In addition, the surface treatment agent can also be used as an antifouling treatment for a jig, an inner wall, a pipe, and the like in a factory. In addition, the surface treatment agent can be used for a goggle, a glasses, a helmet, a marble, a fiber, an umbrella, a toy, a soccer ball. In addition, the surface treatment agent can also be used as an anti-adhesion agent for various packaging materials such as a food packaging material, a cosmetic packaging material, the inside of a kettle, and the like. In addition, the surface treatment agent can be used for a car navigation, a mobile phone, a smartphone, a digital camera, a digital video camera, a PDA, a portable audio player, a car audio, a game device, a glasses lens, a camera lens, a lens filter, a sunglass, a gastroscope, and the like medical instrument, a copier, a PC, a display (for example, a liquid crystal display, an organic EL display, a plasma display, a touch panel display), a touch panel, a protective film, an antireflection film, and the like optical member.

[0751] This application claims priority from Japanese Application No. 2023-110550 filed July 5, 2023, the disclosure of which is incorporated herein in its entirety.

Claims

1. A compound represented by the following formula (1-1) or formula (1-2), ###0001### (1-1) ###0002### (1-2) wherein R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 0 or more, n is each independently an integer of 0 to 2, and q is each independently an integer of 1 or more. T-O-(Si(R 2 )2-O) m -Si(R 2 )2-A-(Si(R n L 3-n ) q (1-1) (L 3-n (R) n Si) q -A-(Si(R 2 )2-O) m -Si(R 2 )2-A-(Si(R) n L 3-n ) q (1-2) T is (R 1 ) 3Si-, a monovalent cyclic polysiloxane residue or a monovalent cage polysiloxane residue, R 1 each independently is hydrocarbyl or trihydrocarbylsilyloxy, R 2 each independently is a hydrocarbyl group, A is a (q+1 )-valent linker comprising a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-, R 5 , R 6 , and R 7 are each independently hydrocarbyl, R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 0 or more, n is each independently an integer of 0 to 2, q is an integer of 1 or more.

2. The compound of claim 1, wherein, R is each independently a hydrocarbon group, (R 1 )3Si-O-(Si(R 2 )2-O) m -Si(R 2 )2-L 1 -L 2 -L 3 -(Si(R) n L 3-n ) q (2) R 1 each independently is hydrocarbyl or trihydrocarbylsilyloxy, R 2 each independently is a hydrocarbyl group, L 1 is a single bond or alkylene, L 2 is a linking group selected from the group consisting of -NHCONH-, -N=N-, -S-, -SO-, -SO2-, -SO2NH-, -S(O)(R 5 )=N-, -S(O)(R 6 )=N-, -S(O)(N-R 7 )-, -OP(O)(O-)(O-), -OC(O)NH-, and -OS(O)2NH-, R 5 , R 6 , and R 7 are each independently hydrocarbyl, L 3 (q+1)-valent linking group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n is each independently an integer of 0 to 2, m is an integer of 2 to 600. q is each independently an integer of 1 to 4.

7. A composition comprising the compound according to any one of claims 1 to 6, and comprising a liquid medium.

3. The compound of claim 2, wherein, In the formula (2), -L 3 - (Si(R) n L 3-n ) q the group represented by the formula (3-1A) -Q a -X 31 (-Q b -Si(R) n L 3-n ) h (-R 31 ) i (3-1A) Q a is a single bond or a divalent linking group, X 31 is a single bond, an alkylene group, a nitrogen atom, a carbon atom, a silicon atom, a 2-8 valent organopolysiloxane residue, or a (h+i+i)-valent cyclic group, Q b is a single bond or a divalent linking group, 8. A surface treatment agent comprising the compound according to any one of claims 1 to 6.

9. A surface treatment agent comprising the compound according to any one of claims 1 to 6, and comprising a liquid medium. R 31 is a hydrogen atom, a hydroxyl group or an alkyl group, An article in which a surface treatment layer is formed on a substrate is produced by subjecting the substrate to surface treatment using the surface treatment agent according to claim 8. X 31 when X is a single bond or alkylene, h is 1 and i is 0, X 31 when Y is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h + i = 2 is satisfied, X 31 h is an integer of 1 to 3, i is an integer of 0 to 2, h + i = 3 is satisfied, X 31 when R is a divalent organic polysiloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h + i = 1 to 7 is satisfied, X 31 when the group having a ring is of (h+i+1) valence, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i = 1 to 7 is satisfied.

4. The compound of claim 2, wherein, L 2 is -SO2NH-.

5. The compound of claim 1, wherein, 11. An article comprising a substrate and a surface treatment layer, the surface treatment layer being disposed on the substrate and being surface-treated with the surface treatment agent according to claim 8.

6. The compound of claim 1, wherein, 12. The article according to claim 11, which is an optical member.

13. The article according to claim 11, which is a display or a touch panel. An article in which a surface treatment layer is formed on a substrate is produced by subjecting the substrate to surface treatment using the surface treatment agent according to claim 9.

15. An article comprising a substrate and a surface treatment layer, the surface treatment layer being disposed on the substrate and being surface-treated with the surface treatment agent according to claim 9.

10. A method of manufacturing an article, wherein, 16. The article according to claim 15, which is an optical member.

17. The article according to claim 15, which is a display or a touch panel. ​ ​ 14. A method of manufacturing an article, wherein, ​ ​ ​ ​

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