Waste liquid recovery device for preparation of gallium arsenide rough polishing liquid

Abstract

The invention relates to the field of material processing waste liquid treatment, in particular to a gallium arsenide rough polishing liquid preparation waste liquid recovery device which comprises a first box body, a dispersing mechanism for dispersing waste liquid is arranged on the inner side wall of the first box body, first notches are formed in the two side walls of the first box body, and filter plates are slidably connected to the inner side walls of the first notches; according to the waste liquid recovery device for gallium arsenide rough polishing liquid preparation, the cleaning mechanism integrates the composite cleaning function of high-pressure washing and pore channel rotary wiping, full-automatic cleaning is achieved, a cooperative mode of one-use and one-standby is adopted, and the waste liquid recovery device for gallium arsenide rough polishing liquid preparation has the advantages that the waste liquid recovery device is simple in structure, convenient to operate and high in practicability. When the filter plate on the left side is in a working state, the cleaning box on the right side can complete cleaning and standby of the other filter plate, and the waste liquid treatment requirement of large-scale semiconductor production is met.

Description

Technical Field

[0001] This invention relates to the field of waste liquid treatment in material processing, and in particular to a device for recycling waste liquid from gallium arsenide crude polishing solution preparation. Background Technology

[0002] Gallium arsenide (GaAs), as a third-generation semiconductor material, is widely used in high-end fields such as integrated circuits, optoelectronic devices, and microwave communications. In the preparation of GaAs wafers, rough polishing is one of the key steps. It requires the use of a rough polishing solution containing abrasive particles (such as alumina and silicon carbide) and chemical additives (such as surfactants and pH adjusters) to grind and polish the wafer surface to remove cutting marks and obtain a smooth surface. However, after a certain number of uses, the rough polishing solution will become ineffective due to the wear of abrasive particles and the accumulation of impurities (such as GaAs debris and metal ions), forming a large amount of GaAs rough polishing solution waste liquid. This waste liquid is characterized by complex composition, high concentration of pollutants, and the presence of toxic arsenic. If discharged directly, it will not only waste recyclable resources such as GaAs and abrasive particles, but also seriously pollute the ecological environment such as soil and water, threatening human health.

[0003] In existing technologies, the industry mostly adopts a "filtration-purification-regeneration" process for the recycling and treatment of gallium arsenide crude polishing solution waste liquid. Among them, the filtration stage is the core prerequisite. However, existing filtration devices have many shortcomings in practical applications. First, when the waste liquid is introduced, there is a problem of local concentrated impact on the filter medium, which leads to local blockage and accelerated wear of the filter medium, shortening its service life. Second, there is a lack of a real-time detection mechanism for the patency of the filter medium (such as filter plate). Often, the machine is only stopped for inspection after the filtration efficiency drops significantly, which makes it impossible to detect local blockage in time and affects the overall processing efficiency. Furthermore, after the filter plate is blocked, it is mostly done by manual disassembly and cleaning or direct replacement. Manual cleaning is not only labor-intensive and incomplete, but also poses a risk of arsenic exposure. Replacing the filter plate increases the cost of consumables, resulting in a low reuse rate of the filter plate. In order to solve the above problems, we propose a gallium arsenide crude polishing solution preparation waste liquid recycling device. Summary of the Invention

[0004] The main objective of this invention is to provide a waste liquid recovery device for gallium arsenide crude polishing solution preparation, which can effectively solve the problems in the background art.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0006] A waste liquid recovery device for gallium arsenide crude polishing solution preparation includes a first tank, a dispersion mechanism for dispersing the waste liquid is provided on the inner side wall of the first tank, a first slot is provided on each of the two side walls of the first tank, a filter plate is slidably connected to the inner side wall of the first slot, a cleaning mechanism for cleaning the filter plate is provided on the side wall of the first tank, and a detection mechanism for detecting the filter holes of the filter plate is provided on the inner side wall of the first tank.

[0007] Preferably, a cover plate is detachably connected to the top of the first box, and a water inlet pipe is provided on the top side wall of the cover plate. C-shaped slots are provided at both ends of the inner side walls of the two first slots. Two first electric slide rails are provided on the inner side wall of the first box, and a first electric slider is slidably connected to the inner side wall of the two first electric slide rails. A first C-shaped plate is provided at one end of the first electric slider, and a first electric telescopic rod is provided at the top of the inner side wall of the first C-shaped plate. A first clamping plate is provided at the telescopic end of the first electric telescopic rod, and a second box is provided on the bottom side wall of the first box.

[0008] Preferably, the cleaning mechanism includes two cleaning boxes disposed on the two side walls of the first housing. Each cleaning box has a second slot at both ends of its inner side wall. Each of the two second slots has a second electric telescopic rod on its side wall. The telescopic end of the second electric telescopic rod is provided with a baffle. Each of the two ends of the inner side wall of the cleaning box has two first fixing plates. The bottom side wall of the first fixing plate is provided with a third electric telescopic rod. The telescopic end of the third electric telescopic rod is provided with a second clamping plate.

[0009] Preferably, two second fixing plates are provided at both ends of the inner sidewall of the cleaning tank. A fourth electric telescopic rod is provided on the top sidewall of the second fixing plate. A third clamping plate is provided at the telescopic end of the fourth electric telescopic rod. Two fourth electric slide rails are provided on the inner sidewall of the cleaning tank. A fourth electric slider is slidably connected to the inner sidewall of each of the two fourth electric slide rails. A second C-shaped plate is provided at one end of the fourth electric slider. A seventh electric telescopic rod is provided at the top of the inner sidewall of the second C-shaped plate. A fourth clamping plate is provided at the telescopic end of the seventh electric telescopic rod.

[0010] Preferably, the top of the inner wall of the cleaning tank has two fifth electric slide rails, and the inner walls of the two fifth electric slide rails are slidably connected to fifth electric sliders. The bottom side walls of the two fifth electric sliders are provided with fifth electric telescopic rods. The telescopic ends of the two fifth electric telescopic rods are fixedly connected to the same cleaning plate. The bottom side wall of the cleaning plate has multiple fifth slots, and the top of the inner side wall of each of the multiple fifth slots is provided with a motor. The output end of the motor is provided with a sixth electric telescopic rod. The telescopic end of the sixth electric telescopic rod is provided with a cleaning rod. The outer side wall of the cleaning rod is provided with multiple cleaning strips. The side wall of the second electric telescopic rod is provided with a cleaning chamber, and the side wall of the cleaning chamber is provided with multiple one-way valves.

[0011] Preferably, a water tank is provided on the side wall of the first box, and water supply pipes are provided on both side walls of the water tank. A water pump is provided on the top side wall of each of the two cleaning boxes. The input end of the water pump is fixedly connected to the other end of the water supply pipe, and a second telescopic water pipe is provided on the output end of the water pump. The other end of the second telescopic water pipe passes through the top of the cleaning box and is fixedly connected to the side wall of the cleaning chamber.

[0012] Preferably, each of the two cleaning tanks has two fourth slots on its inner sidewalls. A signal sensor is provided at one end of the inner sidewall of each fourth slot, and a spring is provided at one end of the inner sidewall of each fourth slot. A protrusion is provided at the other end of the spring, and a second sensor is provided on the sidewall of the protrusion. Each of the two cleaning tanks has a third slot on its inner sidewalls, and a slag discharge trough is provided on the bottom sidewall of each of the two cleaning tanks. A slag collection box is detachably connected to the bottom sidewall of each cleaning tank.

[0013] Preferably, the dispersion mechanism includes a liquid guide plate fixedly connected to the inner wall of the first box, a solenoid valve provided at the bottom inner end of the liquid guide plate, a connecting pipe provided at the bottom end of the liquid guide plate, a first telescopic water pipe provided at the bottom end of the connecting pipe, and the dispersion mechanism also includes two second electric slide rails opened on the inner wall of the first box. A second electric slider is slidably connected to the inner wall of each of the two second electric slide rails. Two dispersion plates are fixedly connected to one opposite end of the two second electric sliders. The top end of the dispersion plate is fixedly connected to the other end of the first telescopic water pipe, and multiple dispersion tubes are provided at the bottom end of the dispersion plate.

[0014] Preferably, the detection mechanism includes two third electric slide rails opened on the inner side wall of the first box, and a third electric slider is slidably connected to the inner side wall of each of the two third electric slide rails. The same detection plate is fixedly connected to the opposite end of the two third electric sliders. The detection plate has multiple detection ports opened on the top side wall, and each of the multiple detection ports has a cover plate on its top side wall.

[0015] Preferably, the inner walls of the plurality of detection ports are rotatably connected to a rotating shaft, the outer walls of the plurality of rotating shafts are provided with a plurality of blades, the inner wall of the detection port is provided with a first speed sensor, the outer wall of the rotating shaft is provided with a second speed sensor, and the outer wall of the second speed sensor is slidably connected to the inner wall of the first speed sensor.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] 1. This is a waste liquid recovery device for gallium arsenide crude polishing solution preparation. The device is equipped with a dispersion mechanism that optimizes waste liquid distribution through a dual design of "horizontal movement + multi-point spraying". The waste liquid collected by the guide plate is transported to the dispersion plate through the first telescopic water pipe. The second electric slide rail drives the dispersion plate to move at a constant speed along the side wall of the box. At the same time, the waste liquid is evenly sprayed onto the surface of the filter plate through multiple dispersion pipes at the bottom. This design completely avoids the problem of impurity accumulation caused by local impact of waste liquid in traditional equipment, making the filter plate uniformly stressed and the impurity distribution smooth. The detection mechanism adopts a detection mode of "blade impact + dual sensor calibration" to realize real-time monitoring of the patency of the filter holes. After the detection plate moves to directly below the filter plate, the filtered waste liquid drips into the detection port, impacting the blades and driving the rotating shaft to rotate. The first speed sensor collects the rotation speed data in real time, and the second speed sensor helps to eliminate mechanical errors. When the rotation speed is lower than the preset threshold, the corresponding filter hole is immediately determined to be blocked, and the position information is fed back to the control system to avoid the decrease in filtration efficiency due to blockage.

[0018] 2. This gallium arsenide crude polishing solution preparation waste liquid recovery device integrates a composite cleaning function of "high-pressure rinsing + channel rotation wiping" in its cleaning mechanism to achieve fully automated cleaning. The water pump delivers high-pressure clean water to the cleaning chamber, and the filter plate surface is rinsed in all directions through a one-way valve to remove surface impurities. It adopts a "one-in-use, one-out-of-use" collaborative mode. When the left filter plate is in working condition, the right cleaning tank can clean the other filter plate and keep it in standby. When the working filter plate needs cleaning, it can be immediately switched to the standby filter plate to continue operation, and the original filter plate is transferred to the idle cleaning tank for cleaning. This solves the pain point of "must stop the machine for cleaning" in traditional equipment and meets the waste liquid treatment needs of large-scale semiconductor production. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0020] Figure 2 This is a schematic cross-sectional view of the overall structure of the present invention;

[0021] Figure 3 This is a cross-sectional schematic diagram of the overall structure of the dispersing mechanism of the present invention;

[0022] Figure 4 This is one of the partial structural cross-sectional schematic diagrams of the detection mechanism of the present invention;

[0023] Figure 5 This is a second partial cross-sectional view of the detection mechanism of the present invention;

[0024] Figure 6 This is a partial cross-sectional view of the cleaning mechanism of the present invention;

[0025] Figure 7For the present invention Figure 7 Enlarged view of point A in the middle;

[0026] Figure 8 This is a second partial cross-sectional view of the cleaning mechanism of the present invention;

[0027] Figure 9 This is a third partial cross-sectional view of the cleaning mechanism of the present invention.

[0028] In the diagram: 1. First housing; 12. Cover plate; 13. Water inlet pipe; 14. First slot; 15. C-shaped slot; 16. First electric slide rail; 17. First C-shaped plate; 18. First electric telescopic rod; 19. First clamping plate; 191. Filter plate; 192. First electric slider; 193. Second housing; 2. Dispersion mechanism; 21. Liquid guide plate; 22. Solenoid valve; 23. Connecting pipe; 24. First telescopic water pipe; 25. Second electric slide rail; 26. 27. Electric slider; 28. Dispersion plate; 3. Dispersion tube; 3. Detection mechanism; 31. Third electric slide rail; 32. Third electric slider; 33. Detection plate; 34. Detection port; 35. Rotating shaft; 36. Blade; 37. First speed sensor; 38. Second speed sensor; 39. Cover plate; 4. Cleaning mechanism; 41. Cleaning box; 42. Second slot; 43. Second electric telescopic rod; 44. Baffle; 45. First fixing plate; 46. Third electric telescopic rod 47. Rod; 48. Second clamping plate; 49. Second fixing plate; 40. Fourth electric telescopic rod; 41. Third clamping plate; 492. Fourth electric slide rail; 493. Fourth electric slider; 494. Second C-shaped plate; 495. Seventh electric telescopic rod; 496. Fourth clamping plate; 497. Third slot; 498. Fourth slot; 499. Signal sensor; 4990. Slag collection box; 4991. Spring; 4992. Second sensor; 4993. Protrusion; 4994. Slag discharge trough; 4995. Fifth electric slide rail; 4996. Fifth electric slider; 4997. Fifth electric telescopic rod; 4998. Cleaning plate; 4999. Fifth trough opening; 4910. Water tank; 4911. Motor; 4912. Sixth electric telescopic rod; 4913. Cleaning rod; 4914. Cleaning strip; 4915. Cleaning chamber; 4916. One-way valve; 4917. Second telescopic water pipe; 4918. Water pump; 4919. Water supply pipe. Detailed Implementation

[0029] To make the technical means, creative features, objectives and effects of this invention easier to understand, the invention will be further described below in conjunction with specific embodiments.

[0030] like Figure 1 - Figure 9As shown, a waste liquid recovery device for gallium arsenide crude polishing solution preparation includes a first housing 1. A dispersion mechanism 2 for dispersing the waste liquid is provided on the inner side wall of the first housing 1. First slots 14 are provided on both side walls of the first housing 1. A filter plate 191 is slidably connected to the inner side wall of the first slot 14. A cleaning mechanism 4 for cleaning the filter plate 191 is provided on the side wall of the first housing 1. A detection mechanism 3 for detecting the filter holes of the filter plate 191 is provided on the inner side wall of the first housing 1.

[0031] In this embodiment, a cover plate 12 is detachably connected to the top of the first box 1. A water inlet pipe 13 is provided on the top side wall of the cover plate 12. C-shaped slots 15 are provided at both ends of the inner side walls of the two first slots 14. Two first electric slide rails 16 are provided on the inner side wall of the first box 1. A first electric slider 192 is slidably connected to the inner side wall of the two first electric slide rails 16. A first C-shaped plate 17 is provided at one end of the first electric slider 192. A first electric telescopic rod 18 is provided at the top of the inner side wall of the first C-shaped plate 17. A first clamping plate 19 is provided at the telescopic end of the first electric telescopic rod 18. A second box 193 is provided on the bottom side wall of the first box 1.

[0032] Specifically, gallium arsenide coarse polishing waste liquid is injected into the first tank 1 through the water inlet pipe 13. The first clamping plate 19 clamps the filter plate 191, thereby positioning and fixing the filter plate 191. The dispersed waste liquid permeates the filter plate 191 under the action of gravity. Solid impurities such as gallium arsenide fragments and polishing residues are trapped on the surface of the filter plate 191. The filtered waste liquid drips to the bottom of the first tank 1 and finally flows into the second tank 193.

[0033] In this embodiment, the cleaning mechanism 4 includes two cleaning boxes 41 disposed on the two side walls of the first box 1. The inner side walls of the cleaning boxes 41 are provided with second slots 42 at both ends. The side walls of the two second slots 42 are provided with second electric telescopic rods 43. The telescopic ends of the second electric telescopic rods 43 are provided with baffles 44. The inner side walls of the cleaning boxes 41 are provided with two first fixing plates 45 at both ends. The bottom side wall of the first fixing plate 45 is provided with a third electric telescopic rod 46. The telescopic ends of the third electric telescopic rod 46 are provided with second clamping plates 47.

[0034] Specifically, the second electric telescopic rod 43 is activated, the baffle 44 is pushed to close the connection between the cleaning box 41 and the first box 1, and the third electric telescopic rod 46 on the first fixing plate 45 is controlled to extend, so that the second clamping plate 47 abuts against the top of the filter plate 191, thus completing the fixing of the filter plate 191 in the cleaning box 41.

[0035] In this embodiment, two second fixing plates 48 are provided at both ends of the inner sidewall of the cleaning tank 41. A fourth electric telescopic rod 49 is provided on the top sidewall of the second fixing plate 48. A third clamping plate 491 is provided at the telescopic end of the fourth electric telescopic rod 49. Two fourth electric slide rails 492 are provided on the inner sidewall of the cleaning tank 41. A fourth electric slider 493 is slidably connected to the inner sidewall of the two fourth electric slide rails 492. A second C-shaped plate 494 is provided at one end of the fourth electric slider 493. A seventh electric telescopic rod 495 is provided at the top of the inner sidewall of the second C-shaped plate 494. A fourth clamping plate 496 is provided at the telescopic end of the seventh electric telescopic rod 495.

[0036] Specifically, after one end of the filter plate 191 enters the inner side of the second C-shaped plate 494, the fourth clamping plate 496 clamps the filter plate 191 through the seventh electric telescopic rod 495. Then, the fourth electric slide rail 492 is activated to drive the filter plate 191 to continue to move horizontally into the cleaning tank 41.

[0037] In this embodiment, two fifth electric slide rails 4995 are provided at the top of the inner sidewall of the cleaning tank 41. A fifth electric slider 4996 is slidably connected to the inner sidewall of each of the two fifth electric slide rails 4995. A fifth electric telescopic rod 4997 is provided at the bottom sidewall of each of the two fifth electric sliders 4996. The telescopic ends of the two fifth electric telescopic rods 4997 are fixedly connected to the same cleaning plate 4998. Multiple fifth slots 4999 are provided at the bottom sidewall of the cleaning plate 4998. A motor 4911 is provided at the top of the inner sidewall of each of the multiple fifth slots 4999. A sixth electric telescopic rod 4912 is provided at the output end of the motor 4911. A cleaning rod 4913 is provided at the telescopic end of the sixth electric telescopic rod 4912. Multiple cleaning strips 4914 are provided on the outer sidewall of the cleaning rod 4913. A cleaning chamber 4915 is provided on one sidewall of the second electric telescopic rod 43. Multiple one-way valves 4916 are provided on the sidewall of the cleaning chamber 4915.

[0038] Specifically, the fifth electric slide rail 4995 is activated, and the fifth electric slider 4996 moves the cleaning plate 4998 directly above the clogged area of ​​the filter plate 191. The fifth electric telescopic rod 4997 is extended so that the fifth slot 4999 at the bottom of the cleaning plate 4998 is aligned with the clogged filter hole. Multiple motors 4911 are activated to drive the sixth electric telescopic rod 4912 and the cleaning rod 4913 to rotate. At the same time, the sixth electric telescopic rod 4912 extends and inserts the cleaning rod 4913 into the clogged filter hole. The cleaning strip 4914 on the outside of the cleaning rod 4913 rotates and wipes the inner wall of the channel to remove stubborn blockages.

[0039] In this embodiment, a water tank 4910 is provided on the side wall of the first box 1, and water supply pipes 4919 are provided on both side walls of the water tank 4910. A water pump 4918 is provided on the top side wall of each of the two cleaning boxes 41. The input end of the water pump 4918 is fixedly connected to the other end of the water supply pipe 4919. A second telescopic water pipe 4917 is provided on the output end of the water pump 4918. The other end of the second telescopic water pipe 4917 passes through the top of the cleaning box 41 and is fixedly connected to the side wall of the cleaning chamber 4915.

[0040] Specifically, the water pump 4918 is started, and the cleaning water in the water tank 4910 is transported to the cleaning chamber 4915 through the water supply pipe 4919 and the second telescopic water pipe 4917 until the water pressure in the cleaning chamber 4915 reaches the preset value. Then, multiple one-way valves 4916 on the side wall of the cleaning chamber 4915 are opened, and the high-pressure cleaning water is evenly sprayed onto the surface of the filter plate 191.

[0041] In this embodiment, two fourth slots 498 are provided on the inner sidewalls of both cleaning tanks 41. A signal sensor 499 is provided at one end of the inner sidewall of the fourth slot 498, a spring 4991 is provided at one end of the inner sidewall of the fourth slot 498, a protrusion 4993 is provided at the other end of the spring 4991, and a second sensor 4992 is provided on the sidewall of the protrusion 4993. A third slot 497 is provided on the inner sidewall of both cleaning tanks 41, and a slag discharge trough 4994 is provided on the bottom sidewall of both cleaning tanks 41. A slag collection box 4990 is detachably connected to the bottom sidewall of the cleaning tank 41.

[0042] Specifically, when the filter plate 191 pushes the protrusion 4993 to compress the spring 4991, when the second sensor 4992 on the side wall of the protrusion 4993 contacts the signal sensor 499, a positioning signal is triggered, the fourth electric slider 493 stops moving, and most of the attached solid residue is washed away. The residue is discharged with the sewage through the slag discharge trough 4994 at the bottom of the cleaning tank 41 and the filter hole, and is temporarily stored in the removable slag collection box 4990.

[0043] In this embodiment, the dispersion mechanism 2 includes a liquid guide plate 21 fixedly connected to the inner side wall of the first housing 1. A solenoid valve 22 is provided at the bottom inner side of the liquid guide plate 21. A connecting pipe 23 is provided at the bottom inner side of the liquid guide plate 21. A first telescopic water pipe 24 is provided at the bottom inner side of the connecting pipe 23. The dispersion mechanism 2 also includes two second electric slide rails 25 opened on the inner side wall of the first housing 1. A second electric slider 26 is slidably connected to the inner side wall of each of the two second electric slide rails 25. Two dispersion plates 27 are fixedly connected to one opposite end of the two second electric sliders 26. The top end of the dispersion plate 27 is fixedly connected to the other end of the first telescopic water pipe 24. A plurality of dispersion pipes 28 are provided at the bottom end of the dispersion plate 27.

[0044] Specifically, the waste liquid first flows into the guide plate 21, the solenoid valve 22 is opened, the waste liquid enters the first telescopic water pipe 24 through the connecting pipe 23, and is finally transported to the dispersion plate 27. At the same time, the second electric slide rail 25 is activated, and the second electric slider 26 drives the dispersion plate 27 to move horizontally along the inner side wall of the first box 1. Meanwhile, the waste liquid is evenly sprayed onto the surface of the filter plate 191 below through multiple dispersion pipes 28 at the bottom of the dispersion plate 27.

[0045] In this embodiment, the detection mechanism 3 includes two third electric slide rails 31 opened on the inner side wall of the first housing 1. The inner side walls of the two third electric slide rails 31 are slidably connected to third electric sliders 32. The two third electric sliders 32 are fixedly connected to the same detection plate 33 at opposite ends. The detection plate 33 has multiple detection ports 34 opened on the top side wall. The top side walls of the multiple detection ports 34 are all provided with cover plates 39.

[0046] Specifically, the third electric slide rail 31 is activated, and the third electric slider 32 drives the detection plate 33 to move directly below the filter plate 191, so that the multiple detection ports 34 at the top of the detection plate 33 correspond one-to-one with the filter holes of the filter plate 191. At this time, the top of the cover plate 39 contacts the bottom of the filter plate 191.

[0047] In this embodiment, a rotating shaft 35 is rotatably connected to the inner wall of a plurality of detection ports 34, and a plurality of blades 36 are provided on the outer wall of a plurality of rotating shafts 35. A first speed sensor 37 is provided on the inner wall of the detection port 34, and a second speed sensor 38 is provided on the outer wall of the rotating shaft 35. The outer wall of the second speed sensor 38 is slidably connected to the inner wall of the first speed sensor 37.

[0048] Specifically, the filtered waste liquid continuously drips into the detection port 34 through the filter holes, impacting the blades 36 on the rotating shaft 35 inside the detection port 34, causing the rotating shaft 35 to rotate. The first speed sensor 37 monitors the rotation speed of the rotating shaft 35 in real time, and the second speed sensor 38 assists in calibrating the rotation speed data. If the rotation speed of the rotating shaft 35 corresponding to a certain detection port 34 is lower than a preset threshold, it is determined that the filter hole at that position is blocked. If the rotation speed is normal, the filter hole is unobstructed. The detection data is transmitted to the device control system in real time and recorded.

[0049] It should be noted that this invention is a waste liquid recovery device for gallium arsenide crude polishing solution preparation. The user injects gallium arsenide crude polishing solution waste liquid into the first tank 1 through the water inlet pipe 13. The waste liquid first flows into the guide plate 21. The solenoid valve 22 is opened, and the waste liquid enters the first telescopic water pipe 24 through the connecting pipe 23, finally being transported to the dispersion plate 27. Simultaneously, the second electric slide rail 25 is activated, and the second electric slider 26 drives the dispersion plate 27 to move horizontally along the inner wall of the first tank 1. At the same time, the waste liquid is evenly sprayed onto the surface of the filter plate 191 below through multiple dispersion pipes 28 at the bottom of the dispersion plate 27. At this time, the side walls at both ends of the filter plate 191 are located inside the two C-shaped slots 15, and two baffles 44 extend and contact the side walls of the filter plate 191. The first clamping plate 19 clamps the filter plate 191, thereby positioning and fixing it. The dispersed waste liquid permeates the filter plate 191 under gravity, and solid impurities such as gallium arsenide fragments and polishing residue are removed. The filtered waste liquid is trapped on the surface of the filter plate 191 and drips to the bottom of the first chamber 1, eventually flowing into the second chamber 193 for further processing. After the filtration process has lasted for a preset time, the third electric slide rail 31 is activated, and the third electric slider 32 moves the detection plate 33 directly below the filter plate 191, so that the multiple detection ports 34 at the top of the detection plate 33 correspond one-to-one with the filter holes of the filter plate 191. At this time, the top of the cover plate 39 contacts the bottom of the filter plate 191. The filtered waste liquid continues to drip into the detection port 34 through the filter holes, impacting the blades 36 on the rotating shaft 35 inside the detection port 34, causing the rotating shaft 35 to rotate. The first speed sensor 37 monitors the rotation speed of the rotating shaft 35 in real time, and the second speed sensor 38 assists in calibrating the speed data. If the speed of the rotating shaft 35 corresponding to a certain detection port 34 is lower than the preset threshold, it is determined that the filter hole at that position is blocked. If the speed is normal, the filter hole is unobstructed. The detection data is transmitted to the device control system in real time and recorded.

[0050] If excessive blockage of the filter holes is detected or the filtration operation is completed, the solenoid valve 22 is closed, and after the waste liquid in the dispersion plate 27 has completely flowed out, the two second electric telescopic rods 43 control the baffle 44 to retract, so that the baffle 44 no longer contacts the side wall of the filter plate 191. Then, the first electric slider 192 is activated to move the filter plate 191 along the first slot 14 towards the cleaning tank 41 on the opposite side of the first C-shaped plate 17. When one end of the filter plate 191 enters the inside of the second C-shaped plate 494, the seventh electric telescopic rod 495 drives the fourth clamping plate 496 to clamp the filter plate 191. Then, the fourth electric slide rail 492 is activated to move the filter plate 191 horizontally into the cleaning tank 41. When the first clamping plate 191 reaches its end... The fourth electric telescopic rod 49 starts operating, driving the third clamping plate 491 to move upward, so that the top of the third clamping plate 491 contacts the bottom of the filter plate 191, supporting the filter plate 191. The first clamping plate 19 releases the filter plate 191. When the filter plate 191 pushes the protrusion 4993 to compress the spring 4991, when the second sensor 4992 on the side wall of the protrusion 4993 contacts the signal sensor 499, a positioning signal is triggered, and the fourth electric slider 493 stops moving. Subsequently, the second electric telescopic rod 43 inside the cleaning tank 41 is activated, pushing the baffle 44 to close the connection between the cleaning tank 41 and the first housing 1. At the same time, the third electric telescopic rod 46 on the first fixed plate 45 is controlled to extend, so that the second clamping plate 47 abuts against the top of the filter plate 191, completing the process. The filter plate 191 is fixed inside the cleaning tank 41. Then, the water pump 4918 is started, and the cleaning water in the water tank 4910 is transported to the cleaning chamber 4915 through the water supply pipe 4919 and the second telescopic water pipe 4917 until the water pressure in the cleaning chamber 4915 reaches the preset value. Then, multiple one-way valves 4916 on the side wall of the cleaning chamber 4915 are opened, and the high-pressure cleaning water is evenly sprayed onto the surface of the filter plate 191 to wash away most of the attached solid residue. The residue is discharged with the sewage through the slag discharge trough 4994 at the bottom of the cleaning tank 41 and the filter holes, and is temporarily stored in the detachable slag collection box 4990. At the same time, the fifth electric slide rail 4995 is started, and the fifth electric slider 4996 moves the cleaning plate 4998 to directly above the blockage area of ​​the filter plate 191. The fifth electric telescopic rod is controlled. 4997 extends, aligning the fifth slot 4999 at the bottom of the cleaning plate 4998 with the clogged filter hole. Multiple motors 4911 are activated, driving the sixth electric telescopic rod 4912 and the cleaning rod 4913 to rotate. Simultaneously, the sixth electric telescopic rod 4912 extends, inserting the cleaning rod 4913 into the clogged filter hole. The cleaning strip 4914 on the outside of the cleaning rod 4913 rotates and wipes the inner wall of the channel, removing stubborn blockages. During the cleaning process, the one-way valve 4916 continuously sprays clean water to flush out the cleaned residue. After cleaning, the water pump 4918 and motor 4911 are turned off. By reversing the steps into the cleaning tank 41, the filter plate 191 is returned to the C-shaped slot 15 of the first housing 1 and fixed again by the first clamping plate 19.Finally, the device returns to the filtration state. By using the two cleaning boxes 41, one filter plate 191 is always in use, while the other is cleaned and ready for use, thus improving work efficiency.

[0051] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of this invention is defined by the appended claims and their equivalents.

Claims

1. A device for recycling waste liquid from gallium arsenide crude polishing solution preparation, comprising a first housing (1), characterized in that: The inner wall of the first box (1) is provided with a dispersion mechanism (2) for dispersing waste liquid. The two side walls of the first box (1) are provided with a first slot (14). The inner wall of the first slot (14) is slidably connected with a filter plate (191). The side wall of the first box (1) is provided with a cleaning mechanism (4) for cleaning the filter plate (191). The inner wall of the first box (1) is provided with a detection mechanism (3) for detecting the filter holes of the filter plate (191).

2. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 1, characterized in that: The top of the first box (1) is detachably connected to a cover plate (12). A water inlet pipe (13) is provided on the top side wall of the cover plate (12). Both ends of the inner side walls of the two first slots (14) are provided with C-shaped slots (15). The inner side wall of the first box (1) is provided with two first electric slide rails (16). The inner side walls of the two first electric slide rails (16) are slidably connected with first electric sliders (192). One end of the first electric slider (192) is provided with a first C-shaped plate (17). The top of the inner side wall of the first C-shaped plate (17) is provided with a first electric telescopic rod (18). The telescopic end of the first electric telescopic rod (18) is provided with a first clamping plate (19). The bottom side wall of the first box (1) is provided with a second box (193).

3. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 1, characterized in that: The cleaning mechanism (4) includes two cleaning boxes (41) on both sides of the first box (1). The inner side walls of the cleaning boxes (41) are provided with second slots (42) at both ends. The side walls of the two second slots (42) are provided with second electric telescopic rods (43). The telescopic ends of the second electric telescopic rods (43) are provided with baffles (44). The inner side walls of the cleaning boxes (41) are provided with two first fixing plates (45). The bottom side wall of the first fixing plate (45) is provided with a third electric telescopic rod (46). The telescopic ends of the third electric telescopic rod (46) are provided with a second clamping plate (47).

4. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 3, characterized in that: The cleaning tank (41) has two second fixing plates (48) at both ends of its inner sidewall. The top sidewall of the second fixing plate (48) is provided with a fourth electric telescopic rod (49). The telescopic end of the fourth electric telescopic rod (49) is provided with a third clamping plate (491). The inner sidewall of the cleaning tank (41) has two fourth electric slide rails (492). The inner sidewalls of the two fourth electric slide rails (492) are slidably connected with a fourth electric slider (493). One end of the fourth electric slider (493) is provided with a second C-shaped plate (494). The top of the inner sidewall of the second C-shaped plate (494) is provided with a seventh electric telescopic rod (495). The telescopic end of the seventh electric telescopic rod (495) is provided with a fourth clamping plate (496).

5. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 3, characterized in that: The cleaning tank (41) has two fifth electric slide rails (4995) at the top of its inner wall. Each of the two fifth electric slide rails (4995) has a fifth electric slider (4996) slidably connected to its inner wall. Each of the two fifth electric sliders (4996) has a fifth electric telescopic rod (4997) at its bottom sidewall. The telescopic ends of the two fifth electric telescopic rods (4997) are fixedly connected to the same cleaning plate (4998). The bottom sidewall of the cleaning plate (4998) has multiple fifth slots (4999). Each of the fifth slots (4999) has a motor (4911) installed at the top of its inner sidewall. The output end of the motor (4911) is provided with a sixth electric telescopic rod (4912). The telescopic end of the sixth electric telescopic rod (4912) is provided with a cleaning rod (4913). The outer sidewall of the cleaning rod (4913) is provided with multiple cleaning strips (4914). The sidewall of the second electric telescopic rod (43) is provided with a cleaning chamber (4915). The sidewall of the cleaning chamber (4915) is provided with multiple one-way valves (4916).

6. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 3, characterized in that: The first box (1) is provided with a water tank (4910) on its side wall. Both sides of the water tank (4910) are provided with water pipes (4919). The top side walls of the two cleaning boxes (41) are provided with water pumps (4918). The input end of the water pump (4918) is fixedly connected to the other end of the water pipe (4919). The output end of the water pump (4918) is provided with a second telescopic water pipe (4917). The other end of the second telescopic water pipe (4917) passes through the top of the cleaning box (41) and is fixedly connected to the side wall of the cleaning chamber (4915).

7. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 3, characterized in that: Two fourth slots (498) are opened on the inner sidewalls of the two cleaning tanks (41). A signal sensor (499) is provided at one end of the inner sidewall of the fourth slot (498), a spring (4991) is provided at one end of the inner sidewall of the fourth slot (498), a protrusion (4993) is provided at the other end of the spring (4991), a second sensor (4992) is provided on the sidewall of the protrusion (4993), a third slot (497) is opened on the inner sidewall of the two cleaning tanks (41), a slag discharge trough (4994) is opened on the bottom sidewall of the two cleaning tanks (41), and a slag collection box (4990) is detachably connected to the bottom sidewall of the cleaning tank (41).

8. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 1, characterized in that: The dispersion mechanism (2) includes a liquid guide plate (21) fixedly connected to the inner wall of the first housing (1). A solenoid valve (22) is provided at the bottom inner side of the liquid guide plate (21). A connecting pipe (23) is provided at the bottom of the liquid guide plate (21). A first telescopic water pipe (24) is provided at the bottom of the connecting pipe (23). The dispersion mechanism (2) also includes two second electric slide rails (25) opened on the inner wall of the first housing (1). A second electric slider (26) is slidably connected to the inner wall of each of the two second electric slide rails (25). Two dispersion plates (27) are fixedly connected to one end of each of the two second electric sliders (26). The top end of the dispersion plate (27) is fixedly connected to the other end of the first telescopic water pipe (24). Multiple dispersion pipes (28) are provided at the bottom of the dispersion plate (27).

9. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 1, characterized in that: The detection mechanism (3) includes two third electric slide rails (31) opened on the inner side wall of the first housing (1). The inner side walls of the two third electric slide rails (31) are slidably connected to third electric sliders (32). The two third electric sliders (32) are fixedly connected to the same detection plate (33) at opposite ends. The detection plate (33) has multiple detection ports (34) opened on the top side wall. The top side walls of the multiple detection ports (34) are all provided with cover plates (39).

10. The gallium arsenide crude polishing solution preparation waste liquid recovery device according to claim 9, characterized in that: The inner walls of the multiple detection ports (34) are rotatably connected to a rotating shaft (35), and the outer walls of the multiple rotating shafts (35) are provided with multiple blades (36). The inner wall of the detection port (34) is provided with a first speed sensor (37), and the outer wall of the rotating shaft (35) is provided with a second speed sensor (38). The outer wall of the second speed sensor (38) is slidably connected to the inner wall of the first speed sensor (37).

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