Horizontal furnace for brake disc siliconizing process and brake disc siliconizing process

Abstract

The invention relates to the technical field of brake disc machining, in particular to a horizontal furnace for a brake disc siliconizing process and the brake disc siliconizing process, the horizontal furnace comprises a furnace body, a heating device, a vacuum assembly and a tail gas treatment assembly, a square box for containing a crucible is connected in the furnace body, the heating device is used for heating the square box, and the vacuum assembly comprises a vacuum pipeline and a power part; one end of the vacuum pipeline sequentially penetrates through the furnace body and the square box and then is communicated with the interior of the square box; the tail gas treatment assembly comprises a condensation part, a filtering tank and a filtering part, the end, away from the furnace body, of the vacuum pipeline is connected with the condensation part, the outlet end of the condensation part communicates with the side wall of the filtering tank, the filtering part comprises a filtering plate, a plurality of bag cages and a plurality of filtering bags, the filtering plate is connected into the filtering tank, a plurality of filtering holes are formed in the filtering plate, and the bag cages correspond to the filtering holes one to one. The bag cage is connected to one side, close to the bottom of the filtering tank, of the filtering plate; the method has the effect that the problem that silicon steam generated in the siliconizing process cannot be treated in time is solved.

Description

Technical Field

[0001] This application relates to the field of brake disc processing technology, and in particular to a horizontal furnace for brake disc silicon diffusion process and the brake disc silicon diffusion process. Background Technology

[0002] Carbon / ceramic brake discs are increasingly widely used in high-speed rail, aircraft, and new energy vehicles. With the acceleration of high-speed rail, the improvement of aircraft performance, and the rapid expansion of the new energy vehicle market, the requirements for brake disc performance are becoming increasingly stringent. The performance of brake discs directly affects the safety and reliability of vehicles. High-quality brake discs can effectively ensure braking performance during operation and reduce the possibility of accidents. Carbon-ceramic brake discs are increasingly favored by automakers due to their advantages such as high temperature resistance, corrosion resistance, and lightweight design.

[0003] In existing technologies, silicon infiltration is one of the key steps in the fabrication of carbon / ceramic brake discs. Currently, the industry typically employs several methods to achieve silicon infiltration in brake discs. Some companies use ordinary heating equipment, placing the brake disc and silicon raw material together, hoping that silicon will naturally infiltrate the brake disc through simple heating. Other companies use simple vacuum furnaces, heating after vacuuming to promote contact and reaction between silicon vapor and the brake disc. Still others rely solely on manual experience to roughly control the heating time and temperature during silicon infiltration, lacking precise parameter settings. While these methods can achieve silicon infiltration to some extent, they are all based on traditional process ideas and lack refined control over the silicon infiltration process.

[0004] Regarding the aforementioned technologies, existing silicon infiltration methods have significant shortcomings. The lack of precise control over process parameters often results in substandard carbon ceramic disc density; the failure to promptly treat silicon vapor generated during the silicon infiltration process leads to environmental pollution, waste of silicon resources, and increased production and maintenance costs. Summary of the Invention

[0005] To address the issue of silicon vapor generated during the silicon diffusion process not being treated in a timely manner, this application provides a horizontal furnace and a silicon diffusion process for brake discs.

[0006] This application provides a horizontal furnace for the silicon infiltration process of brake discs, and the silicon infiltration process of brake discs adopts the following technical solution: A horizontal furnace for silicon infiltration process of brake discs includes a furnace body, a heating device, a vacuum assembly, and an exhaust gas treatment assembly. A feed inlet is provided on one side of the furnace body, and a first sealing door is installed at the feed inlet. A square box for accommodating a crucible is connected inside the furnace body. The heating device is connected to the outside of the square box for heating the box. The vacuum assembly includes a vacuum pipe and a power component. One end of the vacuum pipe passes sequentially through the top of the furnace body and the top of the square box, and then communicates with the inside of the square box. The vacuum pipe is sequentially connected to the furnace body and the square box, and the power component is connected to the vacuum pipe. The exhaust gas treatment assembly includes a condenser, a filter tank, and a filter element. The end of the vacuum pipe away from the furnace body is connected to the condenser. The condenser cools the silicon waste gas. The outlet end of the condenser is connected to the side wall of the filter tank near the bottom of the filter tank. The axis of the filter tank is perpendicular to the axis of the feed inlet. The filter element includes a filter plate, multiple bag cages, and multiple filter bags. The filter plate is connected inside the filter tank and is perpendicular to the axis of the filter tank. The filter plate has multiple filter holes. Each bag cage corresponds to one of the filter holes and is connected to the side of the filter plate near the bottom of the filter tank. Each filter bag corresponds to one of the bag cages and is fitted over the outside of the bag cage. The top of the filter bag is connected to the bag cage.

[0007] By adopting the above technical solution, a feed inlet is opened on one side of the furnace body and a first sealing door is installed, facilitating the placement of the crucible containing the brake disc into the square box inside the furnace body, providing a stable space for the silicon diffusion reaction. A heating device is connected to the outside of the square box, allowing it to heat the box and enabling the brake disc and mixed powder inside to undergo the silicon diffusion reaction at a suitable temperature. The vacuum pipes of the vacuum assembly connect the square box to the exhaust gas treatment assembly, and the power unit can perform a vacuum operation on the furnace body and the square box, removing impurity gases from the furnace and creating a favorable environment for the silicon diffusion reaction. The condenser in the exhaust gas treatment assembly cools the silicon waste gas, causing most of the silicon vapor to condense. The outlet end of the condenser is connected to the side wall of the filter tank near the bottom, facilitating the entry of the silicon waste gas into the filter tank. The filter element consists of a filter plate, a cage, and a filter bag that work together. The filter holes on the filter plate allow silicon waste gas to pass through, the cage provides support for the filter bag, and the filter bag is fitted over the cage to further filter residual silicon waste gas. This effectively improves the collection efficiency of silicon waste gas, reduces environmental pollution, and provides a stable reaction environment for the brake disc silicon infiltration process, ensuring the smooth progress of the silicon infiltration process and helping to improve the problem of silicon vapor generated during silicon infiltration not being treated in a timely manner.

[0008] In one specific implementation, the top of the filter tank is open, and a second sealing door is connected to the opening of the filter tank; The exhaust gas treatment assembly also includes a cleaning component, which includes an air blowing pipe, an air pump, an air plate, and multiple nozzles. One end of the air blowing pipe is connected to the air pump, and the other end passes through the middle of the top wall of the second sealing door and extends into the filter tank. The air blowing pipe is connected to the second sealing door. The air plate is located inside the filter tank. One end of the air blowing pipe inside the filter tank is connected to the air plate. The multiple nozzles are all connected to the side of the air plate near the filter plate. Each nozzle corresponds to a filter hole. Gas is sprayed from the nozzle to sweep away the solids on the surface of the filter bag.

[0009] By adopting the above technical solution, a second sealing door is set at the top opening of the filter tank to facilitate operation inside the filter tank; the air pump of the cleaning component sends gas to the air plate through the air blowing pipe, and then sprays it out from the nozzle to blow away the solids on the surface of the filter bag, ensuring the filtration effect and the service life of the equipment.

[0010] In one specific implementation scheme, the condensing component includes a condensing tank, a condensing pipe, and a pump body. The axis of the condensing tank is parallel to the axis of the filter tank. The end of the vacuum pipe away from the furnace body is connected to the top of the condensing tank. One end of the condensing pipe passes through the condensing pipe and then out of the condensing pipe, connecting to a tank containing condensate. The condensing pipe is arranged in an S-shape at one end inside the furnace body. The pump body is connected to one end of the condensing pipe. The exhaust gas treatment assembly also includes a collection component. The bottoms of the condenser and the filter are open. The collection component includes two collection boxes, which correspond to the condenser and the filter, respectively. The tops of the collection boxes are open, and the top openings of the two collection boxes fit into the bottom openings of the condenser and the filter, respectively. The two collection boxes are detachably connected to the condenser and the filter, respectively.

[0011] By adopting the above technical solution, the condenser and S-shaped condenser tubes, in conjunction with the pump body, can effectively cool the silicon waste gas, causing most of the silicon vapor to condense, facilitating subsequent treatment and reducing silicon resource waste. The collection box fits snugly with the openings of the condenser and filter tank and is detachably connected, allowing for convenient collection of the solids after the silicon waste gas condenses, facilitating cleaning, reducing manual operation, and improving production efficiency.

[0012] In one specific implementation, the collection component further includes a collection rack, two collection cylinders, and two tilting motors. The collection rack is located at the bottom of the filter tank and the bottom of the condenser tank. The collection rack is slidably connected to the filter tank on the side closer to or farther from the filter tank. Both collection boxes are connected to the collection rack. The two collection cylinders are located on opposite sides of the collection rack. The collection cylinders are arranged along the axis of the filter tank, and the cylinder body of the collection cylinder is connected to the filter tank or the condenser tank. The flipping motor corresponds to the collecting cylinder in a one-to-one manner. The piston rod of the collecting cylinder is fixed to the housing of the flipping motor. The output shafts of the flipping motors face each other to the same side and are fixed to the collecting frame.

[0013] By adopting the above technical solution, the collection rack, collection cylinder and tilting component can be set up to drive the collection rack to move away from the filter tank and tilt it, so as to conveniently collect and clean the solids after the silicon waste gas is condensed, reduce manual operation and improve production efficiency.

[0014] In one specific implementation, the second sealing door is slidably connected to the filter tank along the axial direction of the filter tank towards or away from the filter tank. The exhaust gas treatment assembly further includes a lifting component, which is connected to the filter tank and connected to the second sealing door to drive the second sealing door to move; The filter element further includes a fixing ring and a filter ring. The fixing ring is coaxially connected to the filter tank. The top of the fixing ring has a ring groove. The filter ring is coaxially located at the top of the fixing ring. The bottom of the filter ring is coaxially connected to an insert ring. The insert ring can be inserted into the ring groove. The insert ring and the ring groove are interference-fitted.

[0015] By adopting the above technical solution, the second sealing door is slidably connected along the axis of the filter tank and driven to move in conjunction with the lifting component, which facilitates opening and closing the filter tank opening and makes it convenient to clean and replace the components inside the filter tank; the fixing ring and filter ring of the filter element are interference-fitted with the ring groove through the insertion ring, which can realize the stable connection and separation of the filter ring and the fixing ring, which facilitates the installation and disassembly of the filter ring, while ensuring the sealing of the filter tank and preventing the leakage of unfiltered silicon waste gas.

[0016] In one specific implementation, the exhaust gas treatment assembly further includes multiple connectors, each corresponding to a bag cage. Each connector includes a sleeve, an insert, multiple locking blocks, and a push rod. The sleeve is coaxially aligned with the filter holes, and its top is connected to the bottom of the filter plate. The insert is coaxially fixed with the filter bag opening and the bag cage opening. A slot is provided at the bottom of the sleeve for the insert to be inserted. Multiple locking blocks are evenly fixed to the outer wall of the insert along its circumference. Multiple locking slots are provided inside the sleeve for the locking blocks to be inserted. A fixing hole is provided on the side wall of the sleeve, and a through hole corresponding to the fixing hole is provided on the side wall of the insert. The push rod is perpendicular to the axis of the sleeve and passes through the fixing hole and the through hole sequentially. The push rod is threadedly connected to the sleeve and the insert in sequence.

[0017] By adopting the above technical solution, the sleeve, insert, clamp, and push rod of the connector further fix the filter bag to the bag cage at the bottom of the filter plate, making the filter bag connection more stable, facilitating the installation and disassembly of the filter bag, making it easier to replace and clean the filter bag, and further improving the filtration effect of the exhaust gas treatment component and the ease of use of the equipment.

[0018] In one specific implementation, the filter element further includes a connecting frame located inside the filter tank. One side of the connecting frame is connected to the top of the filter ring, and the other side is rotatably connected to the bottom of the second sealing door. The rotation axis of the connecting frame coincides with the axis of the filter tank.

[0019] By adopting the above technical solution, when the lifting component drives the second sealing door to move, it can drive the filter ring to move, realize the connection and separation of the filter ring and the fixed ring, facilitate the installation and disassembly of the filter element, make it convenient to clean and replace the filter element, and improve the filtration efficiency and service life of the equipment.

[0020] In one specific implementation, the vacuum assembly further includes two gas injection components, both located at the bottom of the furnace body. The two gas injection components are symmetrically arranged about the feed inlet axis. Each gas injection component includes a gas injection pipe and a gas injection pump. One end of the gas injection pipe passes through the bottom of the furnace body and the bottom of the square box in sequence and then communicates with the inside of the square box. The gas injection pipe is connected to the furnace body and the square box in sequence, and the other end is connected to a gas source. The gas injection pump is fixed to the gas injection pipe.

[0021] By adopting the above technical solution, gas injection components are symmetrically arranged at the bottom of the furnace body. The gas injection pump can inject the gas source gas into the square box through the gas injection pipe, providing an inert gas such as argon for the brake disc silicon diffusion process, forming a partial pressure environment, suppressing silicon vapor volatilization, and promoting the silicon diffusion reaction.

[0022] In one specific implementation, the square box is connected to two slide rails for the crucible to slide on. The slide rails are located at the bottom of the crucible, and the distribution direction of the two slide rails is perpendicular to the sliding direction of the crucible. The slide rails are arranged from the feed port to the furnace body. The square box is provided with multiple movable support wheels at the top of each slide rail, and the support wheels are rotatably connected to the square box.

[0023] By adopting the above technical solution, a slide rail perpendicular to the sliding direction of the crucible is set inside the square box, and a rotatable support wheel is set on the top of the slide rail, which facilitates the movement of the crucible in and out along the direction from the feed port to the furnace body, thus improving the convenience of operation.

[0024] A brake disc silicon infiltration process includes: S1: Crucible treatment: Boron nitride is sprayed onto the inner surface of the crucible. After spraying, graphite paper is laid on the bottom and inner wall of the crucible. S2: Loading: The mixed powder containing silicon powder and silicon carbide powder is loaded into the crucible. The carbon / ceramic brake disc to be infiltrated with silicon is placed on top of the mixed powder. Then the crucible is sealed with a crucible lid to prevent silicon vapor from being discharged before it has a chance to react. The crucible is moved into the square box of the furnace body, the square box is sealed, and then the first sealing door is closed. S3: Heating and Silicon Infiltration: The heating and silicon infiltration step involves evacuating the silicon infiltration furnace to a predetermined vacuum level, then heating it to a predetermined temperature. Inert argon gas is introduced into the furnace to create a partial pressure environment and is kept at the temperature to allow the brake disc and the mixed powder to undergo a silicon infiltration reaction. The power unit is activated, and the furnace body is evacuated to <1 Pa. Heating begins at a rate of 5℃ / min. When the temperature reaches 900℃, argon gas is introduced at a flow rate of 30L / min, maintaining the partial pressure. The temperature is raised to approximately 1600℃ and held for 2 hours. S4: Cooling and removing the part: The cooling and removing part procedure is to stop the introduction of inert argon gas, and then evacuate the vacuum again to below 1 Pa, let it cool naturally to below 50°C, and then remove the brake disc. S5: Clean the residual silicon adhering to the surface of the brake disc to obtain a qualified silicon-infiltrated brake disc.

[0025] By adopting the above technical solutions, boron nitride spraying can prevent silicon from reacting with the crucible and avoid impurities from entering the brake disc; the graphite paper laying can provide a stable reaction environment for the brake disc; sealing the crucible can prevent silicon vapor leakage; evacuating to a predetermined vacuum level can remove impurity gases from the furnace; introducing argon gas to create a partial pressure environment can suppress silicon vapor volatilization and promote the silicon infiltration reaction; evacuating again can remove residual silicon vapor; natural cooling makes the brake disc's microstructure more stable; cleaning residual silicon can obtain a qualified silicon-infiltrated brake disc. The furnace body, heating device, vacuum components, and exhaust gas treatment components can work together to provide a stable reaction environment. The exhaust gas treatment components can effectively treat silicon waste gas, improve filtration efficiency and equipment lifespan, and increase production efficiency.

[0026] In summary, this application includes at least one of the following beneficial technical effects: 1. A horizontal furnace and process for the silicon infiltration of brake discs are designed. The condenser in the exhaust gas treatment assembly cools the silicon waste gas, causing most of the silicon vapor to condense. The outlet of the condenser is connected to the side wall of the filter tank near the bottom, facilitating the entry of the silicon waste gas into the filter tank. The filter elements, including the filter plate, cage, and filter bag, work together. The filter holes on the filter plate allow the silicon waste gas to pass through, the cage provides support for the filter bag, and the filter bag is fitted over the cage to further filter residual silicon waste gas. This effectively improves the collection efficiency of the silicon waste gas, reduces environmental pollution, and provides a stable reaction environment for the silicon infiltration process, ensuring its smooth operation and addressing the problem of untreated silicon vapor generated during the silicon infiltration process.

[0027] 2. The horizontal furnace and brake disc silicon infiltration process designed for brake discs have a second sealed door at the top opening of the filter tank to facilitate operation inside the filter tank; the air pump of the cleaning component sends gas through the air pipe to the air plate, and then sprays it out from the nozzle to sweep the solids on the surface of the filter bag, ensuring the filtration effect and the service life of the equipment.

[0028] 3. The horizontal furnace and brake disc silicon infiltration process designed for brake discs have a slide rail inside the square box that is perpendicular to the sliding direction of the crucible, and a rotatable support wheel on the top of the slide rail, which facilitates the movement of the crucible in and out along the direction from the feed port to the furnace body, thus improving the convenience of operation. Attached Figure Description

[0029] Figure 1 This is a schematic diagram of the structure in an embodiment of this application.

[0030] Figure 2 This is a schematic diagram of the furnace body in this embodiment.

[0031] Figure 3 yes Figure 2 A magnified view of A in the middle.

[0032] Figure 4 This is a cross-sectional view of the condenser and filter tank in this embodiment.

[0033] Figure 5 This is a cross-sectional view of the filter tank in this embodiment.

[0034] Figure 6 This is a schematic diagram of the connector in this embodiment.

[0035] Explanation of reference numerals in the attached drawings: 1. Furnace body; 11. Support frame; 12. Feed inlet; 13. First sealing door; 14. Square box; 141. Slide rail; 142. Support wheel; 2. Heating device; 21. Heating plate; 22. Control cabinet; 3. Vacuum assembly; 31. Vacuum pipeline; 32. Power component; 33. Gas injection component; 331. Gas injection pipe; 332. Gas injection pump; 34. Measuring component; 4. Exhaust gas treatment assembly; 41. Condensing component; 411. Condensing tank; 412. Condensing pipe; 413. Pump body; 42. Filter tank; 421. Connecting pipe; 422. Second sealing door; 423. Observation port; 424. Visual window; 43. Lifting component; 431. 44. Lifting cylinder; 44. Filter element; 441. Fixing ring; 4411. Ring groove; 442. Filter ring; 4421. Insert ring; 443. Connecting frame; 444. Filter plate; 4441. Filter hole; 445. Bag cage; 446. Filter bag; 45. Connecting piece; 451. Sleeve; 4511. Slot; 4512. Card slot; 452. Insert cylinder; 453. Card block; 454. Push rod; 46. Cleaning component; 461. Air blowing pipe; 462. Air pump; 463. Air plate; 464. Nozzle; 47. Collection component; 471. Collection rack; 472. Collection box; 4721. First magnet; 473. Collection cylinder; 474. Tilting motor. Detailed Implementation

[0036] The following is in conjunction with the appendix Figure 1-6 This application will be described in further detail.

[0037] This application discloses a horizontal furnace and a silicon infiltration process for brake discs.

[0038] In one aspect, embodiments of this application disclose a horizontal furnace for the silicon infiltration process of brake discs.

[0039] Reference Figure 1 A horizontal furnace for the silicon infiltration process of brake discs includes a furnace body 1, a heating device 2, a vacuum assembly 3, and an exhaust gas treatment assembly 4. The heating device 2 is located inside the furnace body 1, and the vacuum assembly 3 and the exhaust gas treatment assembly 4 are both connected to the furnace body 1.

[0040] Reference Figure 1The furnace body 1 has a support frame 11 at its bottom, which is fixed to the furnace body 1 with screws. The support frame 11 supports the furnace body 1. The furnace body 1 is hollow. A feed inlet 12 is opened on one side of the furnace body 1, which communicates with the interior of the furnace body 1. A first sealing door 13 is provided at the feed inlet 12. One side of the first sealing door 13 is hinged to the furnace body 1, and the side of the first sealing door 13 away from the hinge end is detachably connected to the furnace body 1 by a snap-fit, making it easy for people to open or close the first sealing door 13. The furnace body 1 has a square box 14 for holding crucibles, which is fixed to the furnace body 1 with screws. The crucible is fixedly connected to the furnace body 1 and slidably connected to the square box 14. The crucible slides back and forth from the feed port 12 into the furnace body 1. When it is necessary to put the crucible with the brake disc into the furnace body 1, the personnel open the first sealing door 13, put the crucible with the brake disc into the square box 14, and then push the crucible into a suitable position in the square box 14 and close the first sealing door 13. The square box 14 has a discharge port on the side near the discharge port, which is connected to the inside of the square box 14. The square box 14 has a closing plate at the discharge port. One side of the closing plate is hinged to the square box 14, and the side of the closing plate away from the hinge end is detachably connected.

[0041] Reference Figure 1 , Figure 2 and Figure 3 The square box 14 is equipped with two slide rails 141 for the crucible to slide. The slide rails 141 are located at the bottom of the crucible and are welded to the square box 14. The distribution direction of the two slide rails 141 is perpendicular to the sliding direction of the crucible. The slide rails 141 are set along the sliding direction of the crucible. The square box 14 is equipped with multiple movable support wheels 142 at the top of each slide rail 141. The support wheels 142 are rotatably connected to the square box 14. The graphite square box 14 is made of isostatic graphite, which has good high temperature resistance and chemical stability, and can provide a stable reaction environment for the crucible and brake disc. The support wheels 142 at the bottom of the graphite square box 14 facilitate the movement of the crucible in and out, improving the convenience of operation. The support wheels 142 can be made of graphite or high temperature resistant ceramic material.

[0042] Reference Figure 1 and Figure 2The heating device 2 includes four heating plates 21 and a control cabinet 22. The four heating plates 21 are evenly distributed around the square box 14 to ensure the temperature uniformity inside the square box 14. The square box 14 can prevent silicon vapor from directly escaping onto the heating plates 21 and causing damage to them. The heating plates 21 are fixedly connected to the square box 14 with screws and can heat the square box 14. The control cabinet 22 is fixedly connected to the support frame 11 with screws and is electrically connected to the heating plates 21 and the control cabinet 22. The heating plates 21 can be made of isostatic graphite heating elements, which have good heating performance and uniformity, and can make the temperature inside the graphite square box 14 more uniform. The heating plates 21 are controlled by the control cabinet 22, and the heating temperature and time can be precisely adjusted according to the process requirements.

[0043] Reference Figure 1 and Figure 2 The vacuum assembly 3 includes a vacuum pipe 31, a power unit 32, two gas injection components 33, and a measuring component 34. One end of the vacuum pipe 31 passes through the top of the furnace body 1 and the top of the square box 14 and then connects to the inside of the square box 14. The vacuum pipe 31 is fixedly connected to the furnace body 1 and the square box 14 by screws. The other end of the vacuum pipe 31 is connected to the exhaust gas treatment assembly 4. The power unit 32 is a vacuum pump set, which is fixedly connected to the vacuum pipe 31 by a flange. The vacuum pump set can perform vacuuming operations inside the furnace body 1. The two gas injection components 33 are located at the bottom of the furnace body 1 and are symmetrically arranged about the axis of the feed inlet 12. The gas injection component 33 includes a gas injection pipe 331 and a gas injection pump 332. One end of the gas injection pipe 331 is connected to the furnace body 1 and the other end of the measuring component 34. After passing through the bottom of the furnace body 1 and the bottom of the square box 14, the gas injection pipe 331 is connected to the inside of the square box 14 by screws. The other end is connected to the gas source. The gas injection pump 332 is fixedly connected to the gas injection pipe 331 through a flange. The gas injection pump 332 can inject gas into the furnace body 1 through the gas injection pipe 331. In this embodiment, argon gas is selected. The program is written into the controller. The controller is electrically connected to the gas injection pump 332. The gas injection pump 332 controls the amount and partial pressure of inert gas to ensure that the silicon diffusion reaction is carried out in a suitable environment. The measuring element 34 is a pressure gauge. The pressure gauge is fixedly connected to the end of the vacuum pipe 31 near the furnace body 1 through a flange. The pressure gauge can measure the vacuum degree and partial pressure inside the furnace.

[0044] Reference Figure 1 and Figure 4The exhaust gas treatment assembly 4 includes a condenser 41, a filter tank 42, a lifting component 43, a filter 44, multiple connectors 45, a cleaning component 46, and a collection component 47. The condenser 41 includes a condenser tank 411, a condenser pipe 412, and a pump body 413. The condenser tank 411 is fixedly connected to the support frame 11 by screws. The axis of the condenser tank 411 is perpendicular to the axis of the feed inlet 12. The end of the vacuum pipe 31 away from the furnace body 1 is connected to the top of the condenser tank 411. One end of the condenser pipe 412 passes through the condenser pipe 412 and then exits the condenser pipe 412, connecting to the tank containing condensate. The condenser pipe 412 is arranged in an S-shape at one end inside the furnace body 1 to facilitate the cooling of silicon waste gas. The pump body 413 is fixedly connected to one end of the condenser pipe 412 by a flange. The pump body 413 can pump the condensate to the condenser pipe 412. The vapor then flows back into the tank. The condenser 411 and the filter 42 are both located between the vacuum pump unit and the vacuum pipe 31. The filter 42 is located on one side of the condenser 411 and is fixedly connected to the support frame 11 by screws. The axis of the filter 42 is parallel to the axis of the condenser 411. The side wall of the filter 42 is provided with a connecting pipe 421. One end of the connecting pipe 421 is connected to the side wall of the filter 42 and the other end is connected to the condenser 411. The cooled silicon vapor flows into the filter 42 through the connecting pipe 421. The connection between the connecting pipe 421 and the condenser 411 is close to the bottom of the condenser 411. The connection between the connecting pipe 421 and the filter 42 is close to the bottom of the filter 42. The vacuum pipe 31 is connected to the side wall of the filter 42, and the connection between the vacuum pipe 31 and the filter 42 is close to the top of the filter 42.

[0045] Reference Figure 4 and Figure 5 The filter tank 42 has an opening at the top, and a second sealing door 422 is provided at the opening. The second sealing door 422 can open or close the opening. The second sealing door 422 is slidably connected to the filter tank 42 and moves towards or away from the filter tank 42 along the axis of the filter tank 42. The lifting component 43 includes two lifting cylinders 431. The filter tank 42 has two receiving slots at the opening for the lifting cylinders 431 to be accommodated. The two receiving slots are symmetrically arranged along the axis of the filter tank 42. The cylinder body of the lifting cylinder 431 is fixedly connected to the filter tank 42 by screws. The piston rod of the lifting cylinder 431 is welded to the second sealing door 422, and the lifting cylinder 431 pushes the second sealing door 422 to move.

[0046] Reference Figure 4 and Figure 5The filter element 44 includes a fixing ring 441, a filter ring 442, a connecting frame 443, a filter plate 444, multiple bag cages 445, and multiple filter bags 446. The fixing ring 441 is coaxially located inside the filter tank 42 and is welded to the filter tank 42. A ring groove 4411 is provided at the top of the fixing ring 441. The filter ring 442 is located at the top of the fixing ring 441 and is coaxially arranged with the fixing ring 441. The filter ring 442 and the fixing ring 441 are detachably connected. A insertion ring 4421 is coaxially provided at the bottom of the filter ring 442 and is welded to the filter ring 442. The insertion ring 4421 can be inserted into the ring groove 4411 and is interference-fitted with the ring groove 4411. A sealing gasket is provided on the side wall of the insertion ring 4421 of the filter ring 442. The sealing gasket is fixedly bonded to the insertion ring 4421. When the insertion ring 4421 is inserted into the ring groove 4411, the filter ring 442 is sealed. After groove 4411, the sealing gasket can seal the connection between filter ring 442 and fixed ring 441 to prevent unfiltered silicon waste gas from leaking. Connecting frame 443 is located inside filter tank 42. One side of connecting frame 443 is welded to the top of filter ring 442, and the other side is rotatably connected to the bottom of second sealing door 422. The rotation axis of connecting frame 443 coincides with the axis of filter tank 42. When the second sealing door 422 closes, during this process, the connecting frame 443 pushes the filter ring 442 to move, so that the insertion ring 4421 is inserted into the ring groove 4411, which can fix the filter ring 442 and fixed ring 441. When it is necessary to open the second sealing door 422, the lifting cylinder 431 pushes the second sealing door 422. At this time, the connecting frame 443 drives the filter ring 442 to move, which can separate the filter ring 442 from the fixed ring 441.

[0047] Reference Figure 4 , Figure 5 and Figure 6 The filter plate 444 is integrally connected to the filter ring 442. Multiple filter holes 4441 are formed on the filter plate 444, extending through the filter plate 444 along its thickness. A bag cage 445 corresponds to each filter hole 4441 and is located on the side of the filter plate 444 near the bottom of the filter tank 42. The bag cage 445 is connected to the filter plate 444 via a connector 45. A filter bag 446 corresponds to each bag cage 445 and is fitted onto the bag. Outside the cage 445, the top of the filter bag 446 is detachably connected to the cage 445 via a connector 45. The filter bag 446 can further filter residual silicon waste gas. After the silicon vapor is drawn away from the vacuum pipe 31, it first passes through the condenser 411 for condensation. Most of the silicon vapor will condense into liquid or solid state, and then pass through the filter tank 42. When the filter bag 446 is covered with silicon vapor condensate, it can be observed through the transparent observation window. At this time, the dust collector bag can be replaced in time to ensure the normal operation of the system.

[0048] Reference Figure 4 , Figure 5 and Figure 6 Each connector 45 corresponds to a bag cage 445. Each connector 45 includes a sleeve 451, an insert 452, multiple locking blocks 453, and a push rod 454. The sleeve 451 is coaxially aligned with the filter holes 4441, and its top is welded to the bottom of the filter plate 444. The insert 452 is coaxially aligned with the filter bag 446 and is fixedly connected to the opening of the filter bag 446 by screws. The opening of the bag cage 445 is also fixedly connected to the insert 452 by screws. A slot 4511 is provided at the bottom of the sleeve 451 for the insert 452 to be inserted into, and the insert 452 fits into the slot 4511. A sealing gasket is provided on the outer side of the insert 452 to seal the connection between the insert 452 and the sleeve 451. Multiple locking blocks 453 are evenly distributed around the circumference of the insert 452 on its outer wall and are welded to it. The sleeve 451 has multiple slots 4512 for inserting the locking blocks 453, with each slot corresponding to one of the locking blocks 453. When the insert 452 is inserted into the slot 4511, the locking blocks 453 slide within the slots 4512, guiding the insert 452. A fixing hole is provided on the side wall of the sleeve 451, and a corresponding fixing hole is provided on the side wall of the insert 452. The push rod 454 is perpendicular to the axis of the sleeve 451 and passes through the fixing hole and the through hole in sequence. The push rod 454 is threaded to the sleeve 451 and the insert 452 in sequence, and the push rod 454 can further fix the insert 452 and the sleeve 451. An observation port 423 is opened on the side wall of the filter tank 42. A viewing window 424 is fixedly bonded to the observation port 423 of the filter tank 42. Personnel can observe the situation inside the filter tank 42 through the viewing window 424. When the filter bag 446 needs to be replaced, two lifting cylinders 431 are activated at the same time. 1. Pushing the second sealing door 422 moves the filter ring 442 and filter plate 444 through the connecting frame 443. At this time, the filter bag 446 moves with the filter plate 444. When the filter bag 446 moves outside the filter tank 42, the operator turns the push rod 454 to separate the insert 452 from the sleeve 451, so that the filter bag 446 can be replaced. The operator only needs to turn the connecting frame 443 to replace the remaining filter bags 446 without the need for multiple movements. After the filter bag 446 is replaced by reversing the above steps, the opening is closed through the second sealing door 422.

[0049] Reference Figure 5The cleaning component 46 includes an air pipe 461, an air pump 462, an air disc 463, and multiple nozzles 464. One end of the air pipe 461 is fixedly connected to the air pump 462 via a flange, and the other end passes through the middle of the top wall of the second sealing door 422 and extends into the filter tank 42. The air pipe 461 is fixedly connected to the second sealing door 422 by screws. In this embodiment, the air pipe 461 is a flexible hose, and the air disc 463 is located inside the filter tank 42. One end of the air pipe 461 inside the filter tank 42 is connected to... The air plate 463 is connected, and the distance between the air plate 463 and the filter plate 444 is set according to the design position. Multiple nozzles 464 are located on the side of the air plate 463 near the filter plate 444. The nozzles 464 are connected to the air plate 463, and the nozzles 464 correspond one-to-one with the filter holes 4441. The air pump 462 can send gas through the air blowing pipe 461 to the nozzles 464, so that the gas is sprayed out from the nozzles 464 to purge the solids on the surface of the filter bag 446. In this embodiment, nitrogen is used as the purging gas.

[0050] Reference Figure 4 and Figure 5Both the condenser tank 411 and the filter tank 42 have open bottoms. The collection component 47 includes a collection rack 471, two collection boxes 472, two collection cylinders 473, and two tilting motors 474. The collection rack 471 is located at the bottom of the support frame 11 and is slidably connected to the support frame 11. The collection rack 471 moves towards or away from the support frame 11. The two collection boxes 472 correspond to the condenser tank 411 and the filter tank 42 respectively. The collection boxes 472 are fixedly connected to the collection rack 471 by screws. The top of the collection boxes 472 is open. The openings of the two collection boxes 472 are respectively matched with the bottom openings of the condenser tank 411 and the filter tank 42. The collection box 472 can collect the solids after the silicon waste gas is condensed. Multiple first magnets 4721 are embedded at the opening on the top of the collection box 472, and these first magnets 4721 are evenly distributed around the circumference of the collection box 472. Second magnets corresponding to the first magnets 4721 are embedded at the bottom of both the condenser tank 411 and the filter tank 42. The two collection boxes 472 are magnetically fixed to the condenser tank 411 and the filter tank 42 respectively by the first magnets 4721 and the second magnets. Each collection box 472 opening is fixedly bonded with a sealing ring, which seals the connection between the collection box 472 and the condenser tank 411, and between the collection box 472 and the filter tank 42. Two collection cylinders 473 are located on opposite sides of the collection rack 471. The collection cylinders 473 are mounted on one side of the collection rack 471 from the support frame 11. The cylinder body of the collection cylinder 473 is fixedly connected to the support frame 11 with screws. The piston rod of the collection cylinder 473 is connected to the collection rack 471. A rotating motor 474 corresponds one-to-one with each collection cylinder 473. The piston rod of the collection cylinder 473 is connected to the rotating motor 474. The housing is fixedly connected by screws. The output shafts of the flip motors 474 face each other to the side. The output shafts of the flip motors 474 are welded to the collection rack 471. The flip motors 474 drive the collection rack 471 to flip. When it is necessary to clean the collection box 472, the two collection cylinders 473 are driven at the same time, which can drive the collection rack 471 to move away from the support frame 11. When it moves to the appropriate position, the two flip motors 474 are started. The flip motors 474 drive the collection rack 471 to flip, which can drive the collection box 472 to flip, making it easier for personnel to clean the collection box 472.

[0051] The implementation principle of a horizontal furnace for the silicon infiltration process of brake discs in this application embodiment is as follows: The horizontal furnace, through the coordinated operation of the furnace body 1, heating device 2, vacuum assembly 3, and exhaust gas treatment assembly 4, provides a stable reaction environment for the silicon infiltration process of brake discs. The condenser 41 in the exhaust gas treatment assembly 4 effectively cools the silicon waste gas, causing most of the silicon vapor to condense. The filter 44 further filters residual silicon waste gas, and the filter 44 is removable for easy cleaning and replacement, improving filtration efficiency and equipment lifespan. The cleaning component 46 blows away solids from the surface of the filter bag 446, ensuring filtration effectiveness. The collection component 47 conveniently collects and cleans the solids after the silicon waste gas condenses, reducing manual operation and improving production efficiency.

[0052] Secondly, this application discloses a silicon infiltration process for brake discs.

[0053] Example 1 Reference Figure 1 A brake disc silicon infiltration process includes: S1: Crucible processing S11: Boron nitride spraying: Boron nitride is sprayed onto the inner surface of the crucible. Boron nitride spraying is to prevent silicon from reacting with the crucible, protecting the crucible and preventing impurities from entering the brake disc. The boron nitride coating has good high temperature resistance and chemical stability. It can be uniformly coated onto the inner surface of the crucible using spraying equipment, or boron nitride powder can be applied instead of spraying, as long as the boron nitride is uniformly covered on the inner surface of the crucible. S12: Lay graphite paper on the bottom and inner wall of the crucible: Graphite paper has good thermal conductivity and chemical stability, which can provide a stable reaction environment for the brake disc. At the same time, graphite paper can prevent residual silicon from sticking to the crucible after the reaction, effectively protecting the crucible. The graphite paper needs to be cut to the same height as the crucible wall and laid flat on the bottom and inner wall of the crucible.

[0054] S2: Loading S21: Crucible Loading: The mixed powder containing silicon powder and silicon carbide powder is loaded into the crucible. Silicon powder is the main raw material for silicon diffusion, while silicon carbide powder plays a role in regulating the reaction rate and improving the silicon diffusion effect. The silicon powder and silicon carbide powder need to be thoroughly and evenly mixed. A stirring device can be used for stirring. The weight ratio of the mixed powder to the brake disc is (1-2):1. In this embodiment, the weight ratio of the mixed powder to the brake disc is 1.5:1. The mass ratio of silicon powder to silicon carbide powder is (1-5):1. In this embodiment, the mass ratio of silicon powder to silicon carbide powder is 3:1. This ratio can ensure the smooth progress of the silicon diffusion reaction. S22: Brake Disc Loading: Place the carbon / ceramic brake disc to be siliconized on top of the mixed powder, one crucible per brake disc. Ventilation holes are left along the upper edge of the crucible. After sealing the crucible, move it into a horizontal furnace. The brake disc is a needle-punched preform after chemical vapor infiltration densification and high-temperature graphitization treatment, with an outer diameter of 350-550mm and a density of 1.2-1.4g / cm³ before siliconization. 3 This preform has a good porous structure, which is conducive to the penetration of silicon. The brake disc is placed steadily on top of the mixed powder, and then the crucible is sealed with a crucible lid to prevent silicon vapor from being discharged before it has a chance to react. The crucible is then moved into the graphite box 14 of the horizontal furnace, the box 14 is sealed, and then the furnace door is closed. S3: Heating and Silicon Infiltration: The heating and silicon infiltration step involves evacuating the silicon infiltration furnace to a predetermined vacuum level and then heating it to a predetermined temperature. Inert gas is introduced into the furnace to create a partial pressure environment and maintain the temperature, so that the brake disc and the mixed powder undergo a silicon infiltration reaction. The predetermined vacuum level is below 1 Pa. This low vacuum level can remove impurity gases from the furnace, creating a favorable environment for the silicon diffusion reaction. A vacuum pump can be used to evacuate the silicon diffusion furnace, and a vacuum measuring device can be used to monitor the vacuum level in real time. The heating process is carried out at a certain rate, for example, 5℃ / min. When the temperature reaches the predetermined temperature of 900℃, inert argon gas is introduced into the furnace. The argon gas flow rate can be controlled according to the actual situation to create a partial pressure environment. The partial pressure environment can suppress the volatilization of silicon vapor and promote the silicon diffusion reaction. The argon gas flow rate is 30L / min, the partial pressure is maintained at 3kPa, and the temperature is raised to 1600℃ and held for 2 hours to allow the brake disc and the mixed powder to fully undergo the silicon diffusion reaction. S4: Cooling and removing the part: The cooling and removing part procedure is to stop the introduction of inert argon gas, and then evacuate the vacuum again to below 1 Pa, let it cool naturally to below 50°C, and then remove the brake disc. After stopping the argon gas supply, vacuuming again can remove the residual silicon vapor in the furnace, preventing the silicon vapor from condensing on the surface of the brake disc during the cooling process. Natural cooling can make the internal structure of the brake disc more stable. After cooling to below 50°C, open the furnace door and take out the silicon-infiltrated brake disc. S5: Clean the residual silicon adhering to the surface of the brake disc to obtain a qualified silicon-infiltrated brake disc.

[0055] Example 2 The difference between this embodiment and Embodiment 1 is that the partial pressure of argon gas in S3 is 6 kPa.

[0056] Example 3 The difference between this embodiment and embodiment 1 is that the partial pressure in S3 is changed to a vacuum of 0.1 Pa.

[0057] Example 4 The difference between this embodiment and embodiment 1 is that the partial pressure in S3 is changed to a vacuum of 2 Pa.

[0058] Example 5 The difference between this embodiment and Embodiment 1 is that the silicon infiltration temperature in S3 is 1650°C.

[0059] Example 6 The difference between this embodiment and Embodiment 1 is that the silicon infiltration temperature in S3 is 1550°C.

[0060] Performance testing The silicon-doped brake discs were weighed and their density was calculated according to the process provided in Examples 1-6. The results are shown in Table 1 below.

[0061] Table 1. Analysis of the results of the silicon-doped brake discs obtained in Examples 1-6 As shown in Table 1, the silicon infiltration process provided in this application can effectively improve the brake disc. Density, and reduce silicon vapor volatilization, thereby obtaining a brake material that meets the requirements.

[0062] The results of Examples 1 and 2 show that a higher partial pressure does not increase the final density, nor does it reduce the amount of silicon volatilization. The results of Examples 3 and 4 show that a higher vacuum level results in a greater weight gain and greatly helps to improve the final density. A comprehensive comparison of Examples 1-4 shows that although partial pressure can suppress the volatilization of silicon vapor, vacuum conditions are more conducive to the reaction of silicon and carbon to produce more silicon carbide than partial pressure. This is because the system pressure is lower in vacuum than in partial pressure. When gaseous substances are produced by the reaction, these gases will be removed in time, reducing the concentration of gaseous products in the reaction system. The reaction will shift towards the production of more silicon carbide. Therefore, a vacuum level of 0.1 Pa is one of the most suitable reaction conditions for silicon infiltration.

[0063] Based on the results of Examples 1, 5 and 6, it can be seen that the silicon diffusion temperature is neither too high nor too low. When the temperature is too low, the molecular diffusion rate is slow, making it difficult to diffuse into the interior of the blank, and the reaction rate for generating silicon carbide is reduced. When the temperature is too high, more silicon volatilizes and escapes, and is removed by the vacuum system, leaving less in the blank. Therefore, a silicon diffusion temperature of 1600℃ is one of the most suitable reaction conditions for silicon diffusion.

[0064] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A horizontal furnace for silicon infiltration process of brake discs, characterized in that: The furnace includes a furnace body (1), a heating device (2), a vacuum assembly (3), and a tail gas treatment assembly (4). The furnace body (1) has a feed inlet (12) on one side. The furnace body (1) has a first sealing door (13) installed at the feed inlet (12). The furnace body (1) is connected to a square box (14) for holding crucibles. The heating device (2) is connected to the outside of the square box (14) for heating the square box (14). The vacuum assembly (3) includes a vacuum pipe (31) and a power component (32). One end of the vacuum pipe (31) passes through the top of the furnace body (1) and the top of the square box (14) and then communicates with the inside of the square box (14). The vacuum pipe (31) is connected to the furnace body (1) and the square box (14) in sequence. The power component (32) is connected to the vacuum pipe (31). The exhaust gas treatment assembly (4) includes a condenser (41), a filter tank (42), and a filter element (44). The vacuum pipe (31) is connected to the condenser (41) at one end away from the furnace body (1). The condenser (41) cools the silicon waste gas. The outlet end of the condenser (41) is connected to the side wall of the filter tank (42) near the bottom of the filter tank (42). The axis of the filter tank (42) is perpendicular to the axis of the feed inlet (12). The filter element (44) includes a filter plate (444), multiple bag cages (445), and multiple filter bags (446). 444) is connected inside the filter tank (42). The filter plate (444) is perpendicular to the axis of the filter tank (42). The filter plate (444) has multiple filter holes (4441). The bag cage (445) corresponds to the filter hole (4441) one by one. The bag cage (445) is connected to the side of the filter plate (444) near the bottom of the filter tank (42). The filter bag (446) corresponds to the bag cage (445) one by one. The filter bag (446) is sleeved on the outside of the bag cage (445). The top of the filter bag (446) is connected to the bag cage (445).

2. The horizontal furnace for the silicon infiltration process of brake discs according to claim 1, characterized in that: The filter tank (42) has an opening at the top, and a second sealing door (422) is connected to the opening of the filter tank (42); The exhaust gas treatment assembly (4) further includes a cleaning component (46), which includes an air blowing pipe (461), an air pump (462), an air disc (463), and multiple nozzles (464). One end of the air blowing pipe (461) is connected to the air pump (462), and the other end passes through the middle of the top wall of the second sealing door (422) and extends into the filter tank (42). The air blowing pipe (461) is connected to the second sealing door (422). The air plate (463) is located inside the filter tank (42). The air blowing pipe (461) is located inside the filter tank (42) and one end is connected to the air plate (463). Multiple nozzles (464) are connected to the side of the air plate (463) near the filter plate (444). Each nozzle (464) corresponds to a filter hole (4441). Gas is sprayed out from the nozzle (464) to blow away the solids on the surface of the filter bag (446).

3. A horizontal furnace for silicon infiltration process of brake discs according to claim 2, characterized in that: The condenser (41) includes a condenser tank (411), a condenser tube (412), and a pump body (413). The axis of the condenser tank (411) is parallel to the axis of the filter tank (42). The vacuum pipe (31) is connected to the top of the condenser tank (411) at one end away from the furnace body (1). One end of the condenser tube (412) passes through the condenser tube (412) and then passes out of the condenser tube (412) to connect to the tank containing condensate. The condenser tube (412) is arranged in an S-shape at one end inside the furnace body (1). The pump body (413) is connected to one end of the condenser tube (412). The exhaust gas treatment assembly (4) further includes a collection component (47). The bottom of both the condenser (411) and the filter (42) is open. The collection component (47) includes two collection boxes (472). The two collection boxes (472) correspond to the condenser (411) and the filter (42) respectively. The top of the collection box (472) is open. The top openings of the two collection boxes (472) fit into the bottom openings of the condenser (411) and the filter (42) respectively. The two collection boxes (472) are detachably connected to the condenser (411) and the filter (42) respectively.

4. A horizontal furnace for silicon infiltration process of brake discs according to claim 3, characterized in that: The collection component (47) also includes a collection rack (471), two collection cylinders (473) and two tilting motors (474). The collection rack (471) is located at the bottom of the filter tank (42) and the bottom of the condenser tank (411). The collection rack (471) is slidably connected to the filter tank (42) towards or away from the filter tank (42). The two collection boxes (472) are both connected to the collection rack (471). The two collection cylinders (473) are located on opposite sides of the collection rack (471). The collection cylinders (473) are arranged along the axis of the filter tank (42). The cylinder body of the collection cylinder (473) is connected to the filter tank (42) or the condenser tank (411). The flip motor (474) corresponds one-to-one with the collection cylinder (473). The piston rod of the collection cylinder (473) is fixed to the housing of the flip motor (474). The output shafts of the flip motor (474) face each other to the same side. The output shafts of the flip motor (474) are fixed to the collection rack (471).

5. A horizontal furnace for silicon infiltration process of brake discs according to claim 2, characterized in that: The second sealing door (422) is slidably connected to the filter tank (42) along the axial direction of the filter tank (42) towards or away from the filter tank (42); The exhaust gas treatment assembly (4) further includes a lifting component (43), which is connected to the filter canister (42) and is connected to the second sealing door (422) to drive the second sealing door (422) to move. The filter element (44) further includes a fixing ring (441) and a filter ring (442). The fixing ring (441) is coaxially connected to the filter tank (42). The top of the fixing ring (441) is provided with an annular groove (4411). The filter ring (442) is coaxially located at the top of the fixing ring (441). The bottom of the filter ring (442) is coaxially connected with an insert ring (4421). The insert ring (4421) can be inserted into the annular groove (4411). The insert ring (4421) and the annular groove (4411) are interference-fitted.

6. A horizontal furnace for silicon infiltration process of brake discs according to claim 5, characterized in that: The exhaust gas treatment assembly (4) further includes multiple connectors (45), each connector (45) corresponding to a bag cage (445). Each connector (45) includes a sleeve (451), an insert (452), multiple locking blocks (453), and a push rod (454). The sleeve (451) is coaxially arranged with the filter hole (4441). The top of the sleeve (451) is connected to the bottom of the filter plate (444). The insert (452) is coaxially fixed with the opening of the filter bag (446) and the opening of the bag cage (445). The bottom of the sleeve (451) is provided for inserting the insert (452). The sleeve (4511) is connected to the slot (4511). Multiple locking blocks (453) are evenly fixed to the outer wall of the insert (452) along the circumference of the insert (452). The sleeve (451) has multiple locking slots (4512) for inserting the locking blocks (453). The side wall of the sleeve (451) has a fixing hole. The side wall of the insert (452) has a through hole corresponding to the fixing hole. The push rod (454) is perpendicular to the axis of the sleeve (451). The push rod (454) passes through the fixing hole and the through hole in sequence. The push rod (454) is threaded to the sleeve (451) and the insert (452) in sequence.

7. A horizontal furnace for silicon infiltration process of brake discs according to claim 6, characterized in that: The filter element (44) further includes a connecting frame (443), which is located inside the filter tank (42). One side of the connecting frame (443) is connected to the top of the filter ring (442), and the other side is rotatably connected to the bottom of the second sealing door (422). The rotation axis of the connecting frame (443) coincides with the axis of the filter tank (42).

8. A horizontal furnace for silicon infiltration process of brake discs according to claim 1, characterized in that: The vacuum assembly (3) also includes two gas injection components (33), both of which are located at the bottom of the furnace body (1). The two gas injection components (33) are symmetrically arranged about the axis of the feed inlet (12). Each gas injection component (33) includes a gas injection pipe (331) and a gas injection pump (332). One end of the gas injection pipe (331) passes through the bottom of the furnace body (1) and the bottom of the square box (14) and then communicates with the inside of the square box (14). The gas injection pipe (331) is connected to the furnace body (1) and the square box (14) in sequence, and the other end is connected to a gas source. The gas injection pump (332) is fixed to the gas injection pipe (331).

9. A horizontal furnace for silicon infiltration process of brake discs according to claim 1, characterized in that: The square box (14) is connected to two slide rails (141) for the crucible to slide. The slide rails (141) are located at the bottom of the crucible. The distribution direction of the two slide rails (141) is perpendicular to the sliding direction of the crucible. The slide rails (141) are set from the feed port (12) to the furnace body (1). The square box (14) is provided with multiple movable support wheels (142) on the top of each slide rail (141). The support wheels (142) are rotatably connected to the square box (14).

10. A silicon infiltration process for brake discs, characterized in that: A horizontal furnace for silicon infiltration process of brake discs according to any one of claims 1-9, comprising: S1: Crucible treatment: Boron nitride is sprayed onto the inner surface of the crucible. After the spraying is completed, graphite paper is laid on the bottom and inner wall of the crucible. S2: Loading: Load the mixed powder containing silicon powder and silicon carbide powder into the crucible, place the carbon / ceramic brake disc to be infiltrated with silicon above the mixed powder, then seal the crucible with the crucible lid to prevent silicon vapor from being discharged before it has a chance to react, move the crucible into the square box (14) of the furnace body (1), seal the square box (14), and then close the first sealing door (13). S3: Heating and silicon infiltration: The heating and silicon infiltration step is to evacuate the silicon infiltration furnace to a predetermined vacuum level and then heat it to a predetermined temperature. Inert gas argon is introduced into the furnace to form a partial pressure environment and keep it warm, so that the brake disc and the mixed powder can undergo silicon infiltration reaction. The power component (32) is turned on and the furnace body (1) is evacuated to <1pa. The temperature is increased at a rate of 5℃ / min. When the temperature rises to 900℃, argon is introduced with a flow rate of 30L / min. The partial pressure is maintained and the temperature is increased to about 1600℃. The temperature is then kept for 2 hours. S4: Cooling and removing the part: The cooling and removing part procedure is to stop the introduction of inert argon gas, and then evacuate the vacuum again to below 1 Pa, let it cool naturally to below 50°C, and then remove the brake disc. S5: Clean the residual silicon adhering to the surface of the brake disc to obtain a qualified silicon-infiltrated brake disc.

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