A control method, device and equipment of a vacuum valve and a storage medium

By acquiring the vacuum chamber pressure and pressure change rate, the vacuum stages are divided, and a graded predictive control strategy and pump group linkage mechanism are adopted to solve the problem of insufficient accuracy of vacuum valve control, thereby realizing a highly efficient and stable vacuum coating process and improving the production efficiency and safety of the equipment.

CN121496347BActive Publication Date: 2026-04-10CHENGLIAN KAIDA TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2026-01-09
Publication Date
2026-04-10

AI Technical Summary

Technical Problem

Existing vacuum valves have low control accuracy and lack the ability to adapt to dynamic changes in the vacuum system, resulting in simple control logic that cannot meet the requirements of high-precision and high-stability vacuum coating processes.

Method used

By acquiring the vacuum chamber pressure and pressure change rate, the vacuum stages are divided. A graded predictive control strategy and a pump group linkage mechanism are adopted to achieve precise adjustment of valve opening and coordinated start-up of the vacuum pump group. An overshoot correction mechanism is added to ensure the stability and safety of the vacuum system.

Benefits of technology

It improves the control accuracy of vacuum coating equipment, enhances the uniformity and consistency of the coating process, shortens the pumping time, reduces energy consumption, and ensures the safety and production efficiency of the system.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The application discloses a control method, device and equipment of a vacuum valve and a storage medium, relates to the field of vacuum valves, and comprises the following steps: acquiring the air pressure of a vacuum chamber and the air pressure change rate; determining the action to be performed according to the air pressure change rate; if the action to be performed is a vacuumizing process, determining the vacuum stage to which the vacuumizing process belongs according to the air pressure of the vacuum chamber; generating a corresponding first valve opening control instruction according to the vacuum stage; driving an execution mechanism to adjust the opening of the vacuum valve according to the first valve opening control instruction; if the action to be performed is a gas releasing process, generating a second valve opening control instruction by adopting a hierarchical predictive control strategy based on the air pressure recovery rate represented by the air pressure change rate; and driving the execution mechanism to adjust the opening of the vacuum valve according to the second valve opening control instruction. The method can improve the control accuracy of an intelligent vacuum valve of a vacuum coating device.
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Description

TECHNICAL FIELD

[0001] The present application relates to the field of vacuum valves, and in particular to a control method, device and equipment of a vacuum valve and a storage medium. BACKGROUND

[0002] Vacuum coating technology is a key process in the field of precision manufacturing, and is widely used in the fields of optical thin film, semiconductor, decorative coating and functional coating. Vacuum coating equipment is the core equipment to realize this process, and its performance directly determines the quality, uniformity and production efficiency of the thin film. In the entire vacuum system, the vacuum valve is a key executive element for controlling the on-off of the gas flow path and adjusting, and the control performance directly affects the pumping efficiency, process stability and safety and reliability of the system.

[0003] At present, the vacuum valves commonly used in the industry are mostly traditional pneumatic valves or basic electric valves, and their control methods are relatively simple and direct. These existing solutions realize the automatic adjustment of the valve to some extent, but the design focus is still limited to the basic drive and single-loop control of the valve body, and usually only has binary action of opening or closing, or simple proportional adjustment based on a single pressure sensor.

[0004] However, the above prior art solution has low control accuracy for the intelligent vacuum valve of the vacuum coating equipment. SUMMARY

[0005] The present application provides a control method, device and equipment of a vacuum valve and a storage medium, which can improve the control accuracy of the intelligent vacuum valve of the vacuum coating equipment.

[0006] To achieve the above-mentioned purpose, the present application adopts the following technical solutions:

[0007] In a first aspect, the present application provides a control method of a vacuum valve, comprising:

[0008] obtaining the vacuum chamber pressure and the pressure change rate;

[0009] determining the action to be executed according to the pressure change rate;

[0010] if the action to be executed is a vacuum pumping process, determining the vacuum phase to which the vacuum pumping process belongs according to the vacuum chamber pressure, generating a corresponding first valve opening control instruction according to the vacuum phase, and driving the actuator to adjust the vacuum valve opening degree according to the first valve opening control instruction;

[0011] if the action to be executed is a gas releasing process, generating a second valve opening control instruction by using a hierarchical predictive control strategy based on the pressure recovery rate represented by the pressure change rate, and driving the actuator to adjust the vacuum valve opening degree according to the second valve opening control instruction;

[0012] The second valve opening control instruction is generated by using a hierarchical predictive control strategy, and the hierarchical predictive control strategy comprises:

[0013] According to the air pressure recovery rate, a preset control level is matched;

[0014] According to a deviation between a target opening curve corresponding to the matched control level and a current opening of the vacuum valve, the second valve opening control instruction is generated.

[0015] Optionally, the vacuum stage comprises a first vacuum stage, a second vacuum stage and a third vacuum stage, a minimum value of an air pressure range corresponding to the first vacuum stage is greater than a maximum value of an air pressure range corresponding to the second vacuum stage, and a minimum value of an air pressure range corresponding to the second vacuum stage is greater than a maximum value of an air pressure range corresponding to the third vacuum stage, and the first valve opening control instruction corresponding to the vacuum stage is generated according to the vacuum stage, and the method comprises:

[0016] When the vacuum stage is the first vacuum stage, the first valve opening control instruction is generated based on an air pressure error and a change rate of the air pressure error;

[0017] When the vacuum stage is the second vacuum stage, the first valve opening control instruction is generated based on the air pressure error, an integral value of the air pressure error and the change rate of the air pressure error;

[0018] When the vacuum stage is the third vacuum stage, the first valve opening control instruction is generated based on the air pressure error, the integral value of the air pressure error, the change rate of the air pressure error and a feedforward compensation amount.

[0019] Optionally, the method further comprises:

[0020] The air pressure drop acceleration in the vacuumizing process is monitored in real time;

[0021] If the air pressure drop acceleration exceeds an anti-windup threshold value, the first valve opening control instruction is dynamically corrected according to an anti-windup mechanism.

[0022] Optionally, the method further comprises:

[0023] According to the determined vacuum stage, a corresponding vacuum pump group is started hierarchically; wherein

[0024] When the first vacuum stage is entered, a rotary vane vacuum pump is started;

[0025] When the second vacuum stage is entered, a Roots pump is started on the basis of the operation of the rotary vane vacuum pump;

[0026] When the third vacuum stage is entered, a turbomolecular pump is started on the basis of the operation of the rotary vane vacuum pump and the Roots pump.

[0027] Optionally, during the air release process, the method further comprises:

[0028] continuously monitoring the vacuum chamber air pressure;

[0029] if the vacuum chamber air pressure is less than the air pressure threshold, then generating the second valve opening control instruction again based on the current air pressure recovery rate;

[0030] if the vacuum chamber air pressure is greater than or equal to the air pressure threshold, then controlling the vacuum pump group to be closed in a preset order.

[0031] In a second aspect, the present application provides a control device of a vacuum valve, comprising:

[0032] an acquisition module configured to acquire the vacuum chamber air pressure and the air pressure change rate;

[0033] a judgment module configured to determine an action to be performed according to the air pressure change rate;

[0034] a control module configured to, if the action to be performed is a vacuumizing process, determine a vacuum stage in the vacuumizing process according to the vacuum chamber air pressure, generate a corresponding first valve opening control instruction according to the vacuum stage, and drive an execution mechanism to adjust the vacuum valve opening according to the first valve opening control instruction; and the second valve opening control instruction is generated by using a hierarchical predictive control strategy, which comprises matching a preset control level according to the air pressure recovery rate, and generating the second valve opening control instruction according to a deviation between a target opening curve corresponding to the matched control level and a current opening of the vacuum valve.

[0035] In a third aspect, the present application provides a computing device comprising a memory and a processor;

[0036] wherein one or more computer programs are stored in the memory, the one or more computer programs comprising instructions; when the instructions are executed by the processor, the computing device performs the method of any one of the first aspect.

[0037] In a fourth aspect, the present application provides a computer readable storage medium for storing a computer program, the computer program being used to perform the method of any one of the first aspect.

[0038] From the above technical solutions, the present application has at least the following beneficial effects:

[0039] In the present application, the vacuum chamber pressure and pressure change rate are synchronously acquired, combined with the accurate division of the first to third vacuum stages, and the progressive algorithm is used for targeted response, from the fast response of high pressure range to the steady error elimination of medium pressure range, and then to the anti-overshoot control of low pressure range, so that the valve opening adjustment is highly matched with the state of the vacuum system, effectively avoiding the influence of airflow impact and pressure fluctuation on the film quality, and greatly improving the uniformity and consistency of the coating process.

[0040] Further, based on the cooperative strategy of the vacuum stage grading start of the sliding vane vacuum pump, the Roots pump and the turbo molecular pump, the single vacuum pump is avoided from long-term full load operation or low efficiency work, so that the pump set operation and the vacuum valve adjustment form a linkage adaptation, the rough pumping is fast and the fine pumping is accurate, the efficient switching is realized, and the pumping time is shortened; in the air release stage, the hierarchical prediction strategy of matching the air pressure recovery rate is used to speed up the normal pressure recovery speed under the premise of ensuring stability, overall improve the production efficiency of the equipment, and reduce the invalid energy consumption.

[0041] Further, the air pressure drop acceleration monitoring and anti-overshoot correction mechanism is added during the vacuum pumping process, so as to avoid the equipment impact or process abnormality caused by air pressure drop; the air pressure is continuously monitored and the valve opening instruction is dynamically adjusted in the air release stage, so as to avoid the risk of element damage or coating layer falling off caused by rapid air pressure recovery, and at the same time, the vacuum pump set is designed to be closed in a preset order to prevent safety hazards such as backflow of the front stage pump, and the stability and safety of the vacuum coating system operation are comprehensively improved.

[0042] It should be understood that the description of technical features, technical solutions, beneficial effects or similar language in the present application does not imply that all features and advantages can be achieved in any single embodiment. On the contrary, it can be understood that the description of a feature or a beneficial effect means that the specific technical feature, technical solution or beneficial effect is included in at least one embodiment. Therefore, the description of technical features, technical solutions or beneficial effects in the specification does not necessarily refer to the same embodiment. Further, the technical features, technical solutions and beneficial effects described in the embodiments can be combined in any appropriate manner. Those skilled in the art will understand that the embodiments can be implemented without one or more specific technical features, technical solutions or beneficial effects of a specific embodiment. In other embodiments, additional technical features and beneficial effects can be identified in specific embodiments that do not embody all embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0043] Figure 1 A schematic diagram of an application scenario provided by the embodiments of the present application;

[0044] Figure 2 A flowchart of a control method of a vacuum valve provided by the embodiments of the present application;

[0045] Figure 3 FIG. 1 is a schematic diagram of a control device of a vacuum valve according to an embodiment of the present application;

[0046] Figure 4 FIG. 2 is a schematic diagram of a computing device according to an embodiment of the present application. DETAILED DESCRIPTION

[0047] The terms “first”, “second”, and “third” and the like in the description and the drawings of the present application are used to distinguish different objects, rather than to define a particular order.

[0048] In the embodiments of the present application, the words “exemplary” or “for example” are used to mean serving as an example, instance, or illustration. Any embodiment or design presented as “exemplary” or “for example” in the embodiments of the present application should not be construed as preferred or advantageous over other embodiments or design solutions. Rather, the use of “exemplary” or “for example” is intended to present concepts in a particular manner.

[0049] For the sake of clear and concise description of the following embodiments, first, a brief introduction of related technologies is given:

[0050] The vacuum valve is an execution element for controlling the on-off and flow regulation of the gas flow path in the vacuum system, responsible for coordinating the working state of the vacuum chamber and the vacuum pump set, and its control performance directly affects the pumping efficiency, process stability, and system safety and reliability.

[0051] In the actual application of the vacuum coating process, the control scheme of the traditional vacuum valve (such as pneumatic valve, basic electric valve) has been difficult to meet the production needs of high precision and high stability, and the main technical problems are mainly manifested as insufficient control accuracy, and the specific reasons are as follows:

[0052] On the one hand, the control logic of the traditional vacuum valve is limited to binary action or simple proportional regulation, and lacks the ability to adapt to the dynamic changes of the vacuum system. Such valves can only achieve basic operations such as opening or closing, or rely on a single pressure sensor for simple regulation, and cannot adjust the control strategy according to the gradient change of the vacuum chamber pressure (from normal pressure to high vacuum), resulting in a mismatch between the valve opening and the vacuum system state, a slow response in the low vacuum stage, an extended pumping time, a steady-state error in the medium vacuum stage, which affects the process consistency, and an over-regulation in the high vacuum stage, which may cause overshoot, and ultimately affect the film quality.

[0053] On the other hand, the traditional scheme lacks a systematic design of pump-valve coordination and does not optimize the control logic for different operation processes. In the vacuum pumping stage, a single vacuum pump is prone to inefficient operation or full-load overload for a long time, and the traditional valve cannot form a linkage and staged starting mechanism with the vacuum pump group, resulting in energy waste and low pumping efficiency. In the gas release stage, there is a lack of dynamic prediction and staged regulation of the gas pressure recovery rate, which is prone to cause damage to the elements or peeling of the coating layer in the chamber due to the rapid rise of the gas pressure, or to affect the production efficiency due to the slow recovery. In addition, the traditional control scheme does not set a specific anti-overshoot and dynamic correction mechanism, and lacks the ability to respond quickly to abnormal situations such as sudden changes in gas pressure, further exacerbating the problem of insufficient control accuracy, and restricting the upgrading of vacuum coating equipment to high precision and intelligentization.

[0054] Therefore, the embodiments of the present application provide a control method of a vacuum valve, which can be executed by a processing device. The processing device can be a terminal or a server. The terminal includes, but is not limited to, a smartphone, a tablet computer, a notebook computer, a personal digital assistant, or a smart wearable device, etc. The server can be a cloud server, for example, a central server in a central cloud computing cluster, or an edge server in an edge cloud computing cluster. Of course, the server can also be a server in a local data center. The local data center refers to a data center directly controlled by the user.

[0055] In view of the main problems of insufficient control accuracy, lack of system adaptability and coordination of the traditional vacuum valve, the present application first constructs a comprehensive perception system of the system running state by synchronously collecting the vacuum chamber gas pressure and the gas pressure change rate, breaking through the limitation of traditional single parameter detection; secondly, different vacuum stages are divided according to the gas pressure gradient, combined with the two operation processes of vacuum pumping and gas release, and a differentiated control strategy is designed to realize the accurate matching of the control algorithm and the system state; thirdly, a linkage mechanism of the vacuum valve and the vacuum pump group is established, and the pump group is started and the valve opening is adjusted dynamically to achieve the coordinated optimization of the pump and the valve; finally, an anti-overshoot correction and real-time feedback mechanism is added to cope with abnormal situations such as sudden changes in gas pressure, to ensure the control stability and safety, and finally realize the upgrading of the vacuum valve from single execution to intelligent adaptation, and comprehensively improve the control accuracy, operation efficiency and process reliability of the vacuum coating system.

[0056] In order to make the technical solutions of the present application clearer and easier to understand, the application scenarios of the technical solutions of the present application are introduced below in conjunction with the drawings. As shown in Figure 1 the figure is a schematic diagram of an application scenario provided by an embodiment of the present application.

[0057] In this application scenario, 1 is a pressure sensor, 2 is a displacement sensor, 3 is a temperature sensor, 4 is a vacuum degree sensor, 5 is a flow sensor, 6 is a pump group state detection device, 7 is a microprocessor, 8 is a storage unit, 9 is an FPGA chip, 10 is a communication interface, 11 is a servo motor, 12 is a precision screw, 13 is a speed reduction mechanism, 14 is a position feedback encoder, 15 is a safety relay, 16 is a safety PLC, 17 is an overload protector, 18 is an emergency stop switch, 19 is an industrial touch screen, 20 is a multifunctional indicator light, 21 is an audible and visual alarm, 22 is a communication interface, and 23 is an operation button.

[0058] The data detection module is the perception center of the system. The data detection module realizes comprehensive collection of the running state of the vacuum system through multi-dimensional sensors and detection devices. The pressure sensor 1 is responsible for capturing the real-time pressure value of the gas path and the vacuum chamber, and is the data source for calculating the gas pressure change rate and dividing the vacuum stage. The displacement sensor 2 monitors the moving distance of the valve core of the vacuum valve, and provides feedback basis for closed-loop control of the valve opening. The temperature sensor 3 collects the working temperature of components such as valves and pump groups in real time, and warns of overheating risks in advance. The vacuum degree sensor 4 measures the degree of thinness of the gas in the vacuum chamber, and is an index for judging the vacuumization / gas release process and triggering the staged start of the pump group. The flow sensor 5 detects the gas flow rate in the gas path, and assists in optimizing the valve opening to avoid gas flow impact. The pump group state detection device 6 continuously collects the speed and load data of devices such as rotary vane pumps and Roots pumps, ensuring that the pump group running state can be monitored in real time.

[0059] The control module is the decision-making core of the system, and is responsible for data operation and instruction generation. The microprocessor 7, as the operation unit, receives all the information from the data detection module, runs the staged control algorithm, and finally outputs instructions such as valve opening and pump group start / stop. The storage unit 8 is responsible for storing preset control parameters, process data and operation logs, supporting parameter calling of the control algorithm and realizing historical data backtracking analysis. The FPGA chip 9 works cooperatively with the microprocessor, and improves the response speed of the system to dynamic working conditions with high-speed data processing capability, ensuring control accuracy. The communication interface 10 builds a connection channel between the control module and external devices, supporting remote monitoring and instruction transmission of the upper computer and factory MES system.

[0060] The execution module is the carrier of control instructions, and accurate adjustment of the vacuum valve is realized through cooperative action of mechanical components. The servo motor 11 serves as a power source, and outputs adaptive rotating speed and torque according to the instruction of the control module, to drive the valve core to move. The precision lead screw 12 bears the function of motion conversion, converts the rotating motion of the servo motor into the linear motion of the valve core, and ensures the stability and precision of the valve opening adjustment. The speed reduction mechanism 13 reduces the rotating speed and increases the torque, so that the moving speed of the valve core is highly matched with the working condition demand of the vacuum system. The position feedback encoder 14 collects the position information of the motor and the lead screw in real time, feeds back the actual opening of the valve to the control module, forms a closed loop control to correct the action error, and ensures the accuracy of the adjustment effect.

[0061] The safety protection module is a protective barrier of the system, and realizes rapid response and risk avoidance of abnormal states through multiple mechanisms. The safety relay 15 can receive the fault signal of the control module or the safety PLC, rapidly cuts off the power supply of the vacuum valve, the pump group and other components, and avoids equipment damage. The safety PLC 16 serves as an independent safety control unit, continuously monitors abnormal states such as overpressure, overtemperature and overload of the system, and timely triggers protection actions such as emergency stop and power-off. The overload protector 17 focuses on equipment load monitoring, and automatically cuts off the circuit when the current of the motor and the pump group exceeds the threshold, to prevent equipment from being burned out due to overload. The emergency stop switch 18 is a key device for manual emergency operation, and directly cuts off the system power after being pressed, to quickly terminate the equipment operation to deal with sudden dangers.

[0062] The display module is the core window of human-computer interaction, and realizes state display and supports manual intervention. The industrial touch screen 19 serves as an interactive interface, can display system parameters such as vacuum degree, pressure and temperature in real time, synchronously present fault information, and supports manual input of control instructions and adjustment of process parameters. The multifunctional indicator light 20 directly displays the current running state of the system through the color and flicker frequency of the light. The sound and light alarm 21 synchronously triggers sound and light alarm when the system is abnormal, to efficiently remind the operator to intervene in time. The communication interface 22 adopts redundant design, to ensure the stability of data interaction between the display module and the control module, and avoid communication interruption caused by single interface failure. The operation button 23 serves as a physical auxiliary control, realizes basic operations such as equipment start, stop and mode switching, and is an effective supplement to the touch screen interaction.

[0063] In order to make the technical solutions of the present application more clear and easy to understand, the following application scenarios are introduced. As shown in Figure 2 The figure is a flowchart of a control method of a vacuum valve provided by an embodiment of the present application. The method comprises the following steps.

[0064] S201, a microprocessor acquires the air pressure of a vacuum chamber and the air pressure change rate.

[0065] The vacuum chamber air pressure is the gas pressure value inside the vacuum chamber, which is collected by the pressure sensor 1 in real time and is one of the parameters reflecting the state of the vacuum system.

[0066] The air pressure change rate is the change speed of the vacuum chamber air pressure with time, for example, the air pressure drops by 0.5 kPa per second, which is calculated by the continuous air pressure data collected by the pressure sensor 1 and is used to determine whether the system is currently in the vacuum pumping (air pressure drop) or air release (air pressure rise) process.

[0067] First, the real-time air pressure data of the vacuum chamber is continuously collected by the pressure sensor 1 and transmitted to the microprocessor 7; then the microprocessor calculates the air pressure change rate by operating the continuous air pressure data, and determines whether the air pressure is rising or falling and how fast the change is. This step is the basis for subsequent control decision, and the microprocessor can only determine whether the current process is vacuum pumping or air release, and then divide the vacuum stage and match the corresponding control algorithm.

[0068] S202, the microprocessor determines the action according to the air pressure change rate.

[0069] The action refers to the current running process of the vacuum system, which mainly includes two types of working conditions: one is vacuum pumping, that is, the system is in the transition from normal pressure to high vacuum, and the air pressure in the vacuum chamber will continue to drop during this process; the other is air release, that is, the system is in the process of recovering from high vacuum to normal pressure, and the air pressure in the vacuum chamber will continue to rise during this process.

[0070] The microprocessor 7 first obtains the value and direction (positive / negative) of the air pressure change rate, and then determines the current running process through the preset logic, if the air pressure change rate is negative (the air pressure continues to drop), it is determined that the action is vacuum pumping; if the air pressure change rate is positive (the air pressure continues to rise), it is determined that the action is air release. This step is the premise of subsequent hierarchical control, and the microprocessor can only match the corresponding control strategy by determining the current working condition.

[0071] The air pressure change rate is calculated by the ratio of the air pressure difference between two adjacent time points and the time interval, and the expression of the air pressure change rate is:

[0072]

[0073] Among them, represents the air pressure change rate, represents the air pressure at the time, represents the air pressure at the time, represents the time interval.

[0074] The microprocessor determines the action by the positive and negative attributes of the air pressure change rate, and the expression is as follows:

[0075]

[0076] When , it indicates that the air pressure is in a stable state, usually corresponding to the completion of vacuumizing (the target high vacuum has been reached) or the completion of air release (the normal pressure has been restored), the microprocessor will determine that the working condition is over, triggering the corresponding stop or standby instruction.

[0077] S203, if the judgment execution is a vacuumizing process, the microprocessor determines the vacuum phase to which the vacuum chamber belongs according to the air pressure in the vacuum chamber.

[0078] The vacuum phase includes a first vacuum phase, a second vacuum phase and a third vacuum phase, the minimum value of the air pressure range corresponding to the first vacuum phase is greater than the maximum value of the air pressure range corresponding to the second vacuum phase, and the minimum value of the air pressure range corresponding to the second vacuum phase is greater than the maximum value of the air pressure range corresponding to the third vacuum phase.

[0079] The first vacuum phase, i.e. the low vacuum phase, is the phase with the highest air pressure range in the vacuumizing process; the second vacuum phase, i.e. the medium vacuum phase, has an air pressure range between the first and third phases; the third vacuum phase, i.e. the medium-high vacuum phase, is the phase with the lowest air pressure range in the vacuumizing process.

[0080] The calculation expression of the microprocessor to determine the corresponding vacuum phase through the air pressure in the vacuum chamber is:

[0081]

[0082] wherein, represents the air pressure value, represents the target high vacuum air pressure of the vacuumizing process, i.e. the final vacuum degree required by the vacuum coating process (the target air pressure value to be reached in the vacuumizing process).

[0083] S204, the microprocessor generates a corresponding first valve opening degree control instruction according to the vacuum phase.

[0084] The first valve opening degree control instruction is a basic valve adjustment instruction generated by the microprocessor according to the algorithm of different vacuum phases, which is used to control the opening degree of the vacuum valve and further adjust the air path air flow.

[0085] Specifically, when the vacuum phase is the first vacuum phase, the first valve opening degree control instruction is generated based on the air pressure error and the change rate of the air pressure error.

[0086] The first vacuum phase corresponds to the initial stage of vacuumizing, at which the air pressure in the vacuum chamber is at a relatively high level, and the demand is to rapidly reduce the air pressure. Therefore, the system synchronously activates the fast response mode and adopts the first algorithm (i.e., the proportional-differential PD control algorithm), which only takes the air pressure error and the change rate of the air pressure error as the basis for calculation to generate the corresponding valve opening control instruction.

[0087] Here, the air pressure error directly determines the basic amplitude of the valve opening, and the greater the error value, the greater the opening degree of the valve, so as to maximize the pumping efficiency and rapidly promote the air pressure drop. The change rate of the air pressure error undertakes the role of dynamic adjustment, which suppresses the mutation of the valve opening by monitoring the change speed of the error, avoids the air pressure fluctuation caused by excessive adjustment, and ultimately maintains the stability of the system operation while ensuring the pumping speed, thereby achieving the fast response effect of efficient pumping and smooth operation. The calculation expression corresponding to the first valve opening control instruction generated by the first algorithm is:

[0088]

[0089] Here, the air pressure error directly determines the basic amplitude of the valve opening, and the greater the error value, the greater the opening degree of the valve, so as to maximize the pumping efficiency and rapidly promote the air pressure drop. The change rate of the air pressure error undertakes the role of dynamic adjustment, which suppresses the mutation of the valve opening by monitoring the change speed of the error, avoids the air pressure fluctuation caused by excessive adjustment, and ultimately maintains the stability of the system operation while ensuring the pumping speed, thereby achieving the fast response effect of efficient pumping and smooth operation. The calculation expression corresponding to the first valve opening control instruction generated by the first algorithm is: The first valve opening control instruction of the first vacuum phase at the t-th moment is represented as The proportional coefficient of the first vacuum phase is represented as The air pressure error is represented as The change rate of the air pressure error is represented as The differential coefficient of the first vacuum phase is represented as

[0090] When the vacuum phase is the second vacuum phase, the first valve opening control instruction is generated based on the air pressure error, the integral value of the air pressure error, and the change rate of the air pressure error.

[0091] The second vacuum phase corresponds to the middle stage of vacuumizing, at which the air pressure in the vacuum chamber has decreased significantly, and the demand of the system changes from rapid pumping to eliminating steady-state error, i.e., allowing the air pressure to stably and accurately approach the target air pressure value of the stage. Therefore, the system synchronously switches to the steady-state error elimination mode and adopts the second algorithm (i.e., the proportional-integral-differential PID control algorithm), which adds the integral value of the air pressure error as a new calculation dimension based on the first-stage PD control.

[0092] Here, the integral value is the continuous accumulation of the air pressure error over a period of time. If a certain error exists for a long time (e.g., the air pressure always deviates slightly from the target value of the stage), the integral value will gradually increase over time, thereby prompting the valve opening to make a small degree of continuous fine adjustment. Through this accumulation-adjustment logic, the system can gradually eliminate the long-term existing steady-state error, allowing the air pressure in the vacuum chamber to more accurately approach the target value of the stage, and ultimately achieving the control effect of stable approach and error convergence. The calculation expression corresponding to the first valve opening control instruction generated by the second algorithm is:

[0093]

[0094] wherein, represents the first valve opening degree control instruction of the second vacuum phase at the t time, represents a proportional coefficient of the second vacuum phase, represents an integral coefficient of the second vacuum phase, represents a differential coefficient of the second vacuum phase.

[0095] When the vacuum phase is the third vacuum phase, the first valve opening degree control instruction is generated based on the air pressure error, the integral value of the air pressure error, the rate of change of the air pressure error, and the feedforward compensation amount.

[0096] The third vacuum phase corresponds to the final stage of the vacuuming, at which time the vacuum chamber air pressure is very close to the target high vacuum, and the system has the highest standard for control accuracy, so the system switches to the precise stable control mode, and the third algorithm (i.e., the PID and feedforward compensation control algorithm) is used. The algorithm adds a new regulation and control dimension, the feedforward compensation amount, to the PID control in the second phase.

[0097] The feedforward compensation amount here is a compensation parameter calculated by predicting potential system disturbances (such as the influence of pump set load changes on pumping efficiency, air path resistance fluctuations, etc.): Before the disturbance has an impact on the air pressure, the feedforward compensation amount will drive the valve opening degree to make a forward-looking fine adjustment, and the disturbance will be offset in advance. Through this proactive control logic of prediction and compensation, the system can effectively avoid small air pressure deviations in the vacuum final stage, ensure that the vacuuming process is smooth and accurate, and approach the target high vacuum air pressure C, and ultimately achieve accurate and stable control effect. The calculation expression of the first valve opening degree control instruction generated by the third algorithm is:

[0098]

[0099] wherein, represents the first valve opening degree control instruction of the third vacuum phase at the t time, represents a proportional coefficient of the third vacuum phase, represents an integral coefficient of the third vacuum phase, represents a differential coefficient of the third vacuum phase, represents a feedforward compensation amount.

[0100] The method further comprises:

[0101] The microprocessor starts corresponding vacuum pump groups in stages according to the determined vacuum phase; when in the first vacuum phase, the rotary vane vacuum pump is started; when in the second vacuum phase, the rotary vane vacuum pump is started on the basis of the rotary vane vacuum pump running; and when in the third vacuum phase, the turbomolecular pump is started on the basis of the rotary vane vacuum pump and the rotary lobe pump running.

[0102] The vacuum pump group is an air exhaust system composed of vacuum pumps with different functions and different vacuum degree adaptation ranges. Different vacuum pumps work together to cover the full range of air exhaust requirements from normal pressure to high vacuum, and is a device for realizing a vacuum environment.

[0103] The rotary vane vacuum pump is a rough vacuum pump suitable for the low vacuum phase in the initial stage of vacuum pumping, can quickly exhaust a large amount of gas in the vacuum chamber, and can reduce the air pressure from normal pressure to a low vacuum level, and is a basic starting unit of the vacuum pump group.

[0104] The rotary lobe pump is a booster vacuum pump that cannot be started alone from normal pressure and needs to rely on the rotary vane vacuum pump to provide a pre-vacuum environment. It is started in the medium vacuum phase and can significantly improve the air exhaust rate and push the air pressure to decrease to the medium-high vacuum range.

[0105] The turbomolecular pump is a high vacuum vacuum pump that needs to be started in a medium vacuum environment and is suitable for the high vacuum phase in the final stage of vacuum pumping. It can reduce the air pressure to a very low level and meet the target high vacuum requirement of the process.

[0106] After determining the current vacuum phase to which the microprocessor belongs, the corresponding vacuum pump group starting instruction is triggered. When the system is in the first vacuum phase (low vacuum, highest air pressure), the microprocessor only starts the rotary vane vacuum pump to quickly reduce the air pressure in the vacuum chamber by using its rough pumping capacity. When the air pressure drops to the second vacuum phase (medium vacuum), the microprocessor starts the rotary lobe pump on the basis of maintaining the continuous running of the rotary vane vacuum pump, and improves the air exhaust efficiency through the cooperative work of the two pumps to further reduce the air pressure. When the air pressure enters the third vacuum phase (medium-high vacuum, close to the target value), the microprocessor starts the turbomolecular pump on the premise of the normal running of the rotary vane pump and the rotary lobe pump, and accurately reduces the air pressure to the target high vacuum air pressure by using its high vacuum air exhaust capacity. This staged starting method avoids the energy waste of running high-power vacuum pumps all the time, while ensuring the air exhaust efficiency and control accuracy in different vacuum phases.

[0107] S205, the microprocessor drives the actuator to adjust the opening degree of the vacuum valve according to the first valve opening degree control instruction.

[0108] After the microprocessor outputs the first valve opening control instruction, the actuator receives the instruction and moves the valve core of the vacuum valve according to the instruction, so as to adjust the opening degree of the valve. Through this process, the algorithm decision of the microprocessor is converted into actual gas flow control, and finally the dynamic adjustment of the air pressure in the vacuum chamber is realized, so as to ensure that the vacuum process advances according to the preset stage target.

[0109] The method further comprises correcting the first valve opening control instruction, specifically as follows:

[0110] The microprocessor monitors the air pressure drop acceleration in the vacuum process in real time; if the air pressure drop acceleration exceeds the anti-overshoot threshold, the first valve opening control instruction is dynamically corrected according to the anti-overshoot mechanism.

[0111] The air pressure drop acceleration is the change rate of the air pressure change rate in the vacuum process, reflects the change trend of the speed of air pressure drop, and is a warning index for judging whether the air pressure will be overshoot. The calculation expression is:

[0112]

[0113] Among them, represents the air pressure drop acceleration, represents the air pressure change rate at the first time, represents the air pressure change rate at the second time, represents the air pressure change rate at the first time, represents the air pressure change rate at the second time, represents the time interval.

[0114] The anti-overshoot threshold is a pre-set critical value of the air pressure drop acceleration, which is calibrated by the system according to the target vacuum degree, pump group performance and other parameters, and is a judgment basis for triggering the anti-overshoot mechanism.

[0115] The anti-overshoot mechanism is a designed active correction strategy for the problem that the air pressure may rapidly drop and break through the target value at the end of the vacuum process, which is to suppress the too rapid drop of the air pressure by fine-tuning the valve opening.

[0116] In the whole vacuum process, the microprocessor not only determines the vacuum stage according to the air pressure and generates the valve opening basic instruction, but also synchronously calculates the air pressure drop acceleration in real time. This index can predict the trend of air pressure drop. If the acceleration value exceeds the pre-set anti-overshoot threshold, it means that the current air pressure drop speed is rapidly accelerating, and there is a risk of breaking through the target vacuum degree and overshoot. At this time, the microprocessor will immediately start the anti-overshoot mechanism to dynamically correct the originally generated first valve opening control instruction, appropriately reduce the valve opening, reduce the air flow, suppress the too rapid drop of the air pressure, and finally ensure that the air pressure in the vacuum chamber stably and accurately approaches the target high vacuum air pressure, avoiding the abnormal process parameters caused by overshoot.

[0117]

[0118] wherein, represents the first valve opening control instruction after correction, represents the first valve opening control instruction before correction, represents a basic correction coefficient, taking a value of 0.8-0.9, which is the initial correction coefficient when the air pressure drop acceleration just reaches the anti-overshoot threshold, represents a deviation correction coefficient, taking a value of 0.1-0.2, which is used to further adjust the correction range according to the deviation of the actual acceleration from the threshold, represents the anti-overshoot threshold, represents the air pressure drop acceleration limit value.

[0119] If the acceleration slightly exceeds the threshold (close to ), the correction coefficient is close to , and the valve opening is slightly reduced; if the acceleration greatly exceeds the threshold (close to ), the correction coefficient is close to , and the valve opening is further reduced.

[0120] If the judgment action is the gas release process, the microprocessor generates a second valve opening control instruction based on the air pressure recovery rate represented by the air pressure change rate using a hierarchical predictive control strategy.

[0121] Specifically, the microprocessor matches a preset control level according to the air pressure recovery rate; and generates the second valve opening control instruction according to the deviation between the target opening curve corresponding to the matched control level and the current opening of the vacuum valve.

[0122] The air pressure recovery rate is a physical quantity represented by the air pressure change rate, reflecting the speed of the air pressure in the vacuum chamber from high vacuum to normal pressure, and the unit is Pa / s.

[0123] The hierarchical predictive control strategy is an active control method that predicts the gas release trend based on the air pressure recovery rate, divides the control process into different levels, and matches the control parameters in advance.

[0124] The second valve opening control instruction is a special instruction generated by the microprocessor during the gas release process for adjusting the opening of the vacuum valve, which is different from the first valve opening control instruction in the vacuum pumping process, and directly determines the flow rate of the external gas flowing into the vacuum chamber.

[0125] The control level is a control interval preset according to the range of the air pressure recovery rate, and different levels correspond to different target opening curves to adapt to different gas release speed requirements.

[0126] The target opening curve is a preset trajectory of the opening of the vacuum valve changing with time under each control level, which is a reference benchmark for valve adjustment, ensuring that the air pressure is recovered to normal pressure smoothly.

[0127] When the microprocessor determines that the current operation is a venting process, it first calculates the air pressure recovery rate represented by the air pressure change rate; then compares the air pressure recovery rate with the preset interval threshold to match the corresponding control level, such as high-speed venting level, medium-speed venting level, and low-speed venting level; each control level has a corresponding target opening curve pre-stored, which specifies the ideal opening degree that the valve should reach at different time points; the microprocessor calculates the deviation of the current opening degree of the vacuum valve from the target opening curve in real time, and generates a second valve opening control instruction according to the deviation size and direction. The calculation expression of the second valve opening control instruction is:

[0128]

[0129] wherein, represents the second valve opening control instruction at the t time point, represents the current opening degree of the vacuum valve at the t time point, represents the opening correction coefficient corresponding to the k-level control level, which is calibrated by the system according to the control accuracy requirements of different venting levels (the opening correction coefficient of the high-speed venting level is usually larger, and the opening correction coefficient of the low-speed venting level is smaller); represents the opening deviation at the k-level control level at the t time point.

[0130]

[0131] wherein, represents the target opening curve corresponding to the k-level control level at the t time point.

[0132] Through this process, the system can adjust the valve opening in advance according to the change of the venting rate, realize the pre-judgment and graded control of the venting process, and ensure that the air pressure in the vacuum chamber is smoothly and non-impactly restored to the normal pressure state.

[0133] Finally, the microprocessor drives the actuator to adjust the opening degree of the vacuum valve according to the second valve opening control instruction.

[0134] When the microprocessor outputs the second valve opening control instruction, the actuator will receive the instruction in real time and accurately act according to the instruction requirements, drive the valve core of the vacuum valve to move, and thus adjust the opening degree of the valve. The size of the valve opening directly determines the flow rate of the external gas flowing into the vacuum chamber: the larger the opening degree, the faster the gas inflow rate, and the higher the air pressure recovery rate to the normal pressure; the smaller the opening degree, the slower the gas inflow rate, and the more stable the air pressure recovery.

[0135] Through this process, the graded prediction control strategy of the microprocessor for the venting process is converted into actual air path flow regulation, and finally the air pressure in the vacuum chamber is smoothly and non-impactly restored to the normal pressure state. ​​

[0136] The method further comprises:

[0137] The microprocessor continuously monitors the air pressure in the vacuum chamber; if the air pressure in the vacuum chamber is less than the air pressure threshold, a second valve opening control instruction is generated again based on the current air pressure recovery rate; and if the air pressure in the vacuum chamber is greater than or equal to the air pressure threshold, the vacuum pump set is controlled to be turned off in a preset order.

[0138] During the air release process, the microprocessor continuously collects and monitors the real-time air pressure in the vacuum chamber, and the entire control logic is developed around the preset air pressure threshold, which is set to an air pressure value close to normal pressure and is used as a basis for determining whether the air release process is completed.

[0139] If the monitored air pressure in the vacuum chamber is less than the air pressure threshold, it indicates that the current air pressure has not yet reached the standard for completing the air release, and the air pressure still needs to continue to rise. At this time, the microprocessor will re-collect the current air pressure recovery rate, and again calculate and generate a new second valve opening control instruction through the hierarchical predictive control strategy to drive the actuator to adjust the vacuum valve opening, continue to smoothly promote the air pressure rise, and until the air pressure reaches the threshold.

[0140] If the monitored air pressure in the vacuum chamber is greater than or equal to the air pressure threshold, it indicates that the air release process has been completed, and the air pressure in the vacuum chamber has been restored to the target state. At this time, the microprocessor will trigger a shutdown program to turn off the vacuum pump set in a preset order, and the shutdown order needs to follow the operation specifications of the vacuum pump, i.e., first turning off the high-vacuum-level pump (such as a turbo molecular pump), and then sequentially turning off the Roots pump and the rotary vane vacuum pump, to avoid damage to the equipment or air pressure rebound caused by improper start-stop sequence of the pump set.

[0141] The entire process forms a closed-loop regulation at the end of the air release, which not only ensures the accuracy of air pressure recovery, but also guarantees the safe operation of the vacuum pump set.

[0142] Based on the above content description, the present application has the following beneficial effects:

[0143] In the present application, the air pressure in the vacuum chamber and the air pressure change rate are synchronously acquired, combined with the accurate division of the first to third vacuum stages, and a progressive algorithm is used in a targeted manner, from fast response in a high air pressure range to steady-state error elimination in a medium air pressure range, and then to anti-overshoot control in a low air pressure range, so that the valve opening adjustment is highly matched with the state of the vacuum system, effectively avoiding the influence of air flow impact and air pressure fluctuation on the quality of the thin film, and greatly improving the uniformity and consistency of the coating process.

[0144] Further, based on the cooperative strategy of starting the rotary vane vacuum pump, the Roots pump and the turbo molecular pump in different vacuum stages, the long-term full-load operation or inefficient work of a single vacuum pump is avoided, the pump group operation is linked and adapted with the vacuum valve adjustment, the efficient switching of rough pumping quickly and fine pumping accurately is realized in the vacuum pumping stage, the pumping time is shortened, the air pressure recovery rate matching control is used in the grade prediction strategy in the air release stage, the normal pressure recovery speed is accelerated under the premise of ensuring stability, the equipment production efficiency is improved as a whole, and the invalid energy consumption is reduced.

[0145] Further, the air pressure drop acceleration monitoring and anti-overshoot correction mechanism is added in the vacuum pumping process, the equipment impact or process abnormality caused by air pressure drop is avoided in time, the air pressure is continuously monitored and the valve opening degree instruction is dynamically adjusted in the air release stage, the element damage or coating layer falling risk in the cavity caused by the air pressure rising too fast is avoided, the vacuum pump group is designed to be closed in a preset order, the safety hidden danger such as the backflow of the front-stage pump is prevented, and the stability and safety of the vacuum coating system operation are improved comprehensively.

[0146] The above is combined with Figures 1 to 2 The control method of the vacuum valve provided by the embodiments of the application is described in detail, and the device and equipment provided by the embodiments of the application will be described below with reference to the drawings.

[0147] As Figure 3 shown, the figure is a schematic diagram of a control device of a vacuum valve provided by an embodiment of the application, the device comprises:

[0148] The acquisition module 301 is configured to acquire the air pressure of the vacuum chamber and the air pressure change rate.

[0149] The judgment module 302 is configured to judge the action to be performed according to the air pressure change rate.

[0150] The control module 303 is configured to, if the action to be performed is the vacuum pumping process, determine the vacuum stage in the vacuum pumping process according to the air pressure of the vacuum chamber, generate a corresponding first valve opening degree control instruction according to the vacuum stage, drive the actuating mechanism to adjust the opening degree of the vacuum valve according to the first valve opening degree control instruction, if the action to be performed is the air release process, generate a second valve opening degree control instruction by using a hierarchical prediction control strategy based on the air pressure recovery rate represented by the air pressure change rate, and drive the actuating mechanism to adjust the opening degree of the vacuum valve according to the second valve opening degree control instruction. The second valve opening degree control instruction is generated by using the hierarchical prediction control strategy, which comprises matching a preset control level according to the air pressure recovery rate, and generating the second valve opening degree control instruction according to the deviation between the target opening degree curve corresponding to the matched control level and the current opening degree of the vacuum valve.

[0151] Optionally, the control module 303 is specifically configured to generate the first valve opening degree control instruction based on the air pressure error and a change rate of the air pressure error when the vacuum stage is a first vacuum stage.

[0152] generate the first valve opening degree control instruction based on the air pressure error, an integral value of the air pressure error and the change rate of the air pressure error when the vacuum stage is a second vacuum stage.

[0153] generate the first valve opening degree control instruction based on the air pressure error, an integral value of the air pressure error, the change rate of the air pressure error and a feedforward compensation amount when the vacuum stage is a third vacuum stage.

[0154] Optionally, the control module 303 is further configured to monitor a gas pressure drop acceleration in the vacuumizing process in real time.

[0155] If the gas pressure drop acceleration exceeds an anti-windup threshold value, the first valve opening degree control instruction is dynamically corrected according to an anti-windup mechanism.

[0156] Optionally, the control module 303 is further configured to start corresponding vacuum pump groups in stages according to the determined vacuum stage, wherein

[0157] when in the first vacuum stage, a rotary vane vacuum pump is started;

[0158] when in the second vacuum stage, a Roots pump is started on the basis of the rotary vane vacuum pump running;

[0159] when in the third vacuum stage, a turbomolecular pump is started on the basis of the rotary vane vacuum pump and the Roots pump running.

[0160] Optionally, the control module 303 is further configured to continuously monitor the vacuum chamber air pressure.

[0161] If the vacuum chamber air pressure is less than an air pressure threshold value, the second valve opening degree control instruction is regenerated based on a current air pressure recovery rate;

[0162] If the vacuum chamber air pressure is greater than or equal to the air pressure threshold value, the vacuum pump groups are controlled to be closed in a preset order.

[0163] The control device of the vacuum valve according to the embodiments of the present application can correspond to the method described in the embodiments of the present application, and the above-mentioned other operations and / or functions of each module / unit of the control device of the vacuum valve are respectively implemented to realize Figure 2 the corresponding flow of each method in the illustrated embodiments. For brevity, they will not be described here.

[0164] The embodiments of the present application also provide a computing device. As Figure 4As shown, the figure is a schematic diagram of a computing device provided by an embodiment of the present application, which computing device 700 comprises a bus 701, a processor 702, a communication interface 703 and a memory 704. The processor 702, the memory 704 and the communication interface 703 communicate with each other through the bus 701.

[0165] The bus 701 can be a peripheral component interconnect (PCI) bus or an extended industry standard architecture (EISA) bus, etc. The bus can be divided into an address bus, a data bus, a control bus, etc. For ease of representation, Figure 4 In the figure, only one thick line is used to represent the bus, but it does not mean that there is only one bus or only one type of bus.

[0166] The processor 702 can be any one or more of a central processing unit (CPU), a graphics processing unit (GPU), a microprocessor (MP), or a digital signal processor (DSP), etc.

[0167] The communication interface 703 is configured to communicate with the outside.

[0168] The memory 704 can include a volatile memory (volatile memory), such as a random access memory (RAM). The memory 704 can also include a non-volatile memory (non-volatile memory), such as a read-only memory (ROM), a flash memory, a hard disk drive (HDD) or a solid state drive (SSD).

[0169] The memory 704 stores executable code, and the processor 702 executes the executable code to perform the control method of the vacuum valve.

[0170] Specifically, in the case of implementing Figure 3 In the case of implementing the embodiments shown, and Figure 3 In the case of implementing the control device of the vacuum valve described in the embodiments by software, the executable code of the control device of the vacuum valve is executed by the processor 702 to perform the control method of the vacuum valve. Figure 3The software or program code required for the functions of the modules / units in the foregoing embodiments can be stored partially or entirely in the memory 704. The processor 702 executes the program code corresponding to each unit stored in the memory 704 to perform the foregoing control method of the vacuum valve.

[0171] The computer readable storage medium can be any available medium or a data center containing one or more available media that a computing device can store. The available medium can be a magnetic medium (for example, a floppy disk, a hard disk, a magnetic tape), an optical medium (for example, a DVD), or a semiconductor medium (for example, a solid state disk), etc. The computer readable storage medium includes instructions indicating the computing device to perform the foregoing control method of the vacuum valve.

[0172] The computer program product includes one or more computer instructions. When the computer instructions are loaded and executed on the computing device, the processes or functions described in the embodiments of the present application are generated in whole or in part.

[0173] The computer instructions can be stored in a computer readable storage medium or transmitted from one computer readable storage medium to another computer readable storage medium, for example, the computer instructions can be transmitted from one website, computer or data center to another website, computer or data center through wired (for example, coaxial cable, optical fiber, digital subscriber line) or wireless (for example, infrared, wireless, microwave, etc.) mode.

[0174] The computer program product is executed by a computer, and the computer executes any of the foregoing control methods of the vacuum valve. The computer program product can be a software installation package, and when any of the foregoing control methods of the vacuum valve is needed, the computer program product can be downloaded and executed on the computer.

[0175] The descriptions of the processes or structures corresponding to the foregoing respective figures are each focused on, and the parts not described in detail in a certain process or structure can be referred to the related descriptions of other processes or structures.

[0176] The above is only a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, any change or replacement within the technical scope disclosed in the present application should be covered in the protection scope of the present application.

Claims

1. A control method of a vacuum valve, characterized by, The method comprises: acquiring the vacuum chamber air pressure and the air pressure change rate; judging the action to be performed according to the air pressure change rate; if the action to be performed is a vacuumizing process, determining the vacuum stage in the vacuumizing process according to the vacuum chamber air pressure, generating a corresponding first valve opening degree control instruction according to the vacuum stage, and driving an execution mechanism to adjust the vacuum valve opening degree according to the first valve opening degree control instruction; the vacuum stage comprises a first vacuum stage, a second vacuum stage and a third vacuum stage, the minimum value of the air pressure range corresponding to the first vacuum stage is greater than the maximum value of the air pressure range corresponding to the second vacuum stage, the minimum value of the air pressure range corresponding to the second vacuum stage is greater than the maximum value of the air pressure range corresponding to the third vacuum stage, and the corresponding first valve opening degree control instruction is generated according to the vacuum stage, which comprises: when the vacuum stage is the first vacuum stage, the first valve opening degree control instruction is generated by a first algorithm based on the air pressure error and the change rate of the air pressure error; when the vacuum stage is the second vacuum stage, the first valve opening degree control instruction is generated by a second algorithm based on the air pressure error, the integral value of the air pressure error and the change rate of the air pressure error; when the vacuum stage is the third vacuum stage, the first valve opening degree control instruction is generated by a third algorithm based on the air pressure error, the integral value of the air pressure error, the change rate of the air pressure error and the feedforward compensation amount; if the action to be performed is a gas releasing process, a second valve opening degree control instruction is generated by adopting a hierarchical predictive control strategy based on the air pressure recovery rate represented by the air pressure change rate, and the execution mechanism is driven to adjust the vacuum valve opening degree according to the second valve opening degree control instruction; the second valve opening degree control instruction is generated by adopting the hierarchical predictive control strategy, which comprises: matching a preset control level according to the air pressure recovery rate; generating the second valve opening degree control instruction according to the deviation between the target opening degree curve corresponding to the matched control level and the current opening degree of the vacuum valve.

2. The method of claim 1, wherein, The method further comprises: monitoring the air pressure drop acceleration in the vacuumizing process in real time; if the air pressure drop acceleration exceeds an anti-windup threshold value, dynamically correcting the first valve opening degree control instruction according to an anti-windup mechanism.

3. The method of claim 1, wherein, The method further comprises: starting the corresponding vacuum pump group according to the determined vacuum stage, wherein when in the first vacuum stage, starting a rotary vane vacuum pump; when in the second vacuum stage, starting a Roots pump on the basis of the operation of the rotary vane vacuum pump; when in the third vacuum stage, starting a turbomolecular pump on the basis of the operation of the rotary vane vacuum pump and the Roots pump.

4. The method of claim 1, wherein, In the gas releasing process, the method further comprises: continuously monitoring the vacuum chamber air pressure; if the vacuum chamber air pressure is less than an air pressure threshold value, generating the second valve opening degree control instruction again based on the current air pressure recovery rate; if the vacuum chamber air pressure is greater than or equal to the air pressure threshold value, controlling the vacuum pump group to be closed in a preset order.

5. A control device for a vacuum valve, characterized in that The device comprises: an acquisition module for acquiring the vacuum chamber air pressure and the air pressure change rate; a judgment module for judging the action to be performed according to the air pressure change rate; The control module is configured to: if the executed action is a vacuumizing process, determine a vacuum stage in the vacuumizing process according to the air pressure of the vacuum chamber, generate a corresponding first valve opening degree control instruction according to the vacuum stage, and drive the actuator to adjust the vacuum valve opening degree according to the first valve opening degree control instruction; the vacuum stage includes a first vacuum stage, a second vacuum stage, and a third vacuum stage, the minimum value of the air pressure range corresponding to the first vacuum stage is greater than the maximum value of the air pressure range corresponding to the second vacuum stage, and the minimum value of the air pressure range corresponding to the second vacuum stage is greater than the maximum value of the air pressure range corresponding to the third vacuum stage; the generation of the corresponding first valve opening degree control instruction according to the vacuum stage includes: when the vacuum stage is the first vacuum stage, generating the first valve opening degree control instruction by a first algorithm based on the air pressure error and the change rate of the air pressure error; when the vacuum stage is the second vacuum stage, generating the first valve opening degree control instruction by a second algorithm based on the air pressure error, the integral value of the air pressure error, and the change rate of the air pressure error; and when the vacuum stage is the third vacuum stage, generating the first valve opening degree control instruction by a third algorithm based on the air pressure error, the integral value of the air pressure error, the change rate of the air pressure error, and a feedforward compensation amount. If the executed action is a gas releasing process, a second valve opening degree control instruction is generated by using a hierarchical predictive control strategy based on the air pressure recovery rate represented by the air pressure change rate; and the actuator is driven to adjust the vacuum valve opening degree according to the second valve opening degree control instruction; the generation of the second valve opening degree control instruction by using the hierarchical predictive control strategy includes: matching a preset control level according to the air pressure recovery rate; and generating the second valve opening degree control instruction according to the deviation between the target opening degree curve corresponding to the matched control level and the current opening degree of the vacuum valve.

6. The apparatus of claim 5, wherein, The control module is specifically configured to: when the vacuum stage is the first vacuum stage, generate the first valve opening degree control instruction based on the air pressure error and the change rate of the air pressure error; when the vacuum stage is the second vacuum stage, generate the first valve opening degree control instruction based on the air pressure error, the integral value of the air pressure error, and the change rate of the air pressure error; and when the vacuum stage is the third vacuum stage, generate the first valve opening degree control instruction based on the air pressure error, the integral value of the air pressure error, the change rate of the air pressure error, and a feedforward compensation amount.

7. The apparatus of claim 5, wherein, The control module is further configured to monitor the air pressure drop acceleration in the vacuumizing process in real time, and dynamically correct the first valve opening degree control instruction according to an anti-windup mechanism when the air pressure drop acceleration exceeds an anti-windup threshold.

8. A computing device, comprising: The computing device includes a memory and a processor. The memory stores one or more computer programs including instructions; and the processor executes the instructions to perform the method in any one of claims 1 to 4.

9. A computer-readable storage medium, characterized in that, The computer readable storage medium is configured to store a computer program for performing the method in any one of claims 1 to 4.

Citation Information

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