Mask supporting structure and mask assembly

Abstract

The invention provides a mask supporting structure and a mask assembly, relates to the technical field of display, and is used for improving the net stretching precision of a mask. The mask supporting structure comprises a supporting plate, the supporting plate comprises a plurality of supporting parts, a plurality of mask areas are defined by the supporting parts, and two first supporting parts are arranged on the two opposite sides of each mask area in the first direction; the supporting plate further comprises at least two magnetic control units, at least part of the mask area is provided with the magnetic control units on the two sides in the first direction, the magnetic control units are located on the side, facing the mask plate to be supported, of the first supporting part, and the magnetic control units can move under the control of corresponding magnetic fields. And the to-be-supported mask plate part in contact with the supporting device is driven to move.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a mask support structure and a mask assembly. BACKGROUND

[0002] In display products, the organic layer is usually made by vacuum evaporation. Vacuum evaporation refers to a process in which a material to be formed is heated and evaporated or sublimated in a vacuum environment, and then condensed or deposited on a low-temperature substrate surface through a fine metal mask (FMM) to form a film layer. However, when using a mask to form a film, a stretching process needs to be performed on the mask first, and the stretching precision will affect the film forming precision. Therefore, how to improve the stretching precision of the mask has become a technical problem to be solved. SUMMARY

[0003] The present application relates to the technical field of display, in particular to a mask support structure and a mask assembly.

[0004] To achieve the above-mentioned purpose, the present application provides the following technical solutions:

[0005] The first aspect of the present application provides a mask support structure, comprising a support plate; the support plate comprises a plurality of support portions, and the plurality of support portions define a plurality of mask areas, each mask area having two first support portions on opposite sides along a first direction;

[0006] The support plate further comprises at least two magnetic control units, and each magnetic control unit is located on the side of the first support portion facing the mask to be supported, and the magnetic control unit can move under the control of the corresponding magnetic field and drive the part of the mask to be supported in contact with it to move.

[0007] Optionally, the first support portion comprises a support main portion and a support protruding portion, the support protruding portion is located on the side of the support main portion facing the mask to be supported, the support protruding portion is used to contact the mask to be supported, and a magnetic force influencing area is formed on the side of the support main portion facing the mask to be supported; the magnetic control unit is located in the magnetic force influencing area.

[0008] Optionally, the distance between the support protruding portion and the first boundary of the support main portion is greater than the distance between the support protruding portion and the second boundary of the support main portion, the first boundary and the second boundary are opposite along the first direction, the first boundary is close to the edge of the mask to be supported, and the second boundary is away from the edge of the mask to be supported; the magnetic control unit is located on the side of the support protruding portion close to the first boundary.

[0009] Optionally, the magnetic control unit comprises a magnetic material layer and a support layer, at least part of the support layer is located between the magnetic material layer and the support body part.

[0010] Optionally, the magnetic control unit further comprises a first protective layer and / or a second protective layer; the second protective layer, the support layer, the magnetic material layer and the first protective layer are sequentially stacked in the direction away from the support body part.

[0011] Optionally, the magnetic material layer comprises a nickel-iron alloy layer; the support layer comprises a titanium alloy layer; the first protective layer comprises a nickel metal layer; and / or, the second protective layer comprises a nickel metal layer.

[0012] Optionally, the magnetic control unit is divided into a first magnetic control part and a second magnetic control part, the first magnetic control part is located between the second magnetic control part and the support protruding part;

[0013] In the first direction and in the direction away from the support protruding part, the width of the first magnetic control part along the second direction is unchanged, the width of the second magnetic control part along the second direction gradually decreases, and the second direction intersects the first direction.

[0014] Optionally, the mask support structure further comprises a frame, and the support plate is arranged on the frame.

[0015] Based on the technical scheme of the above-mentioned mask support structure, the second aspect of the present application provides a mask assembly, comprising the above-mentioned mask support structure, and further comprising at least one mask; the mask is arranged on the frame, and at least part of the mask is located on the side of the support plate away from the frame.

[0016] Optionally, the mask has a first length in the first direction, and has a second length in the second direction, the first length is smaller than the second length, and the second direction intersects the first direction.

[0017] In the technical solution provided by this invention, at least a portion of the mask area has magnetic control units on both sides along a first direction. The magnetic control units are located on the side of the first support portion facing the mask to be supported. The magnetic control units can move under the control of a corresponding magnetic field, causing the portion of the mask to be supported that they contact to move. When combining the mask support structure provided by this invention with each mask, the tension of the mask is first adjusted along its long side; then, an external magnetic adjustment device is activated to activate the magnetic control units. By precisely controlling the magnetic field strength, the deformation of the mask along its short side is controlled, thereby effectively optimizing the PPA (Power Product Area) in the short side direction; finally, laser welding is used to fix the mask between the mask and the mask support structure in both the long and short sides. Therefore, when the mask support structure provided by this invention is combined with the mask, good PPA can be ensured in both the long and short sides of the mask. This ensures that when the mask assembly formed by the combined mask and mask support structure is used for evaporation, the evaporation material falls into the corresponding evaporation area, avoiding defects such as color mixing. Attached Figure Description

[0018] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this invention, illustrate exemplary embodiments of the invention and are used to explain the invention, but do not constitute an undue limitation of the invention. In the drawings:

[0019] Figure 1 This is a planar schematic diagram of the mask support structure provided in an embodiment of the present invention;

[0020] Figure 2 A planar schematic diagram of the mask support structure provided in an embodiment of the present invention, showing the mask support structure.

[0021] Figure 3 A planar schematic diagram of the mask provided in an embodiment of the present invention;

[0022] Figure 4 A partial photomask support structure and a planar schematic diagram of a photomask and a substrate to be vapor-deposited, provided for an embodiment of the present invention;

[0023] Figure 5 for Figure 4 A schematic diagram of the cross-section along the A1A2 direction;

[0024] Figure 6 A cross-sectional schematic diagram of the magnetic control unit provided in an embodiment of the present invention;

[0025] Figure 7 This is a plan view of the magnetic control unit provided in an embodiment of the present invention. Detailed Implementation

[0026] In order to further illustrate the mask support structure and mask assembly provided by the embodiments of the present application, the following will be described in detail in combination with the accompanying drawings.

[0027] The mask frame assembly (MFA) generally includes a plurality of FMMs. One FMM corresponds to one or more display substrate areas on the mother board of the to-be-plated substrate. The key step of the mask frame assembly is to stretch and weld the FMMs on the frame, which is generally called net stretching. In the related art, the FMM is usually clamped by a jaw in the short edge direction to be stretched and tightened, but the long edge direction will be correspondingly shortened. To solve this problem, the prior art usually compensates the shrinkage rate of the long edge direction and the short edge direction of the FMM to ensure that the internal pixels do not deform. This scheme can achieve good results in conventional resolution display products.

[0028] However, with the rapid development of virtual reality (VR) and augmented reality (AR) technologies, the market demand for high-resolution products is increasing. For high-resolution FMM net stretching, the long edge direction pixel position accuracy (PPA) of the FMM net stretching can be effectively adjusted, the short edge direction PPA is usually difficult to control, and the pixel opening size is extremely small, making it difficult to accurately compensate for the shrinkage rate. If the PPA deviation is large, the material cannot fall in the designed area during evaporation, resulting in the occurrence of color mixing defects. Therefore, how to improve the net stretching accuracy of the mask has become a technical problem to be solved.

[0029] Please refer to Figures 1 to 5 The embodiments of the present application provide a mask support structure, which comprises a support plate 20; the support plate comprises a plurality of support portions (such as a first support portion 21 and a second support portion 22), and the plurality of support portions define a plurality of mask areas 201, each mask area 201 has two first support portions 21 on the opposite sides in the first direction;

[0030] The support plate 20 further comprises at least two magnetic control units 23, and at least part of the mask areas 201 has the magnetic control units 23 on both sides in the first direction. The magnetic control units 23 are located on the side of the first support portion 21 facing the to-be-supported mask 30, and the magnetic control units 23 can move under the control of the corresponding magnetic field and drive the part of the to-be-supported mask in contact with them to move.

[0031] Exemplarily, the support plate comprises a plurality of support portions, which define a plurality of mask areas 201, and the shapes of the mask areas 201 comprise a plurality of types, for example, the shape of the mask area 201 comprises a rectangle, the two sides of the rectangular mask area 201 along a first direction have two first support portions 21, and the two sides of the rectangular mask area 201 along a second direction have two second support portions 22, and the first direction intersects the second direction.

[0032] Exemplarily, the plurality of mask areas 201 defined by the plurality of support portions are arranged in an array, the first support portions 21 between adjacent mask areas 201 can be formed in an integral structure or independent of each other, and / or the second support portions 22 between adjacent mask areas 201 can be formed in an integral structure or independent of each other, but not limited thereto.

[0033] Exemplarily, the support plate further comprises a plurality of magnetic control units 23, and each mask area 201 corresponds to two magnetic control units 23, and the magnetic control unit 23 is located on the side of the corresponding first support portion 21 facing the mask plate 30 to be supported, and when the mask plate support structure is combined with the mask plate to be supported, the magnetic control unit 23 is in contact with the mask plate 30 to be supported, and the magnetic control unit 23 can move under the control of a corresponding magnetic field and drive the part of the mask plate to be supported in contact with it to move.

[0034] Exemplarily, as shown in Figure 3 , the mask plate 30 comprises an evaporation effective area 11, a cutting line 12, a stress compensation area 13, and a stretching area 14. It needs to be particularly pointed out that the evaporation effective area 11 contains a plurality of hollow opening patterns for evaporation, but these patterns are not shown in Figure 3 . Exemplarily, the thickness of the mask plate is generally between 25 microns and 30 microns, and at the cutting line 12 of the mask plate, the thickness of the mask plate is thinned and set to be between 15 microns and 20 microns, and the structure optimization is realized by a partial etching process.

[0035] Exemplarily, the mask plate support structure further comprises a frame 40, and the support plate 20 is arranged on the frame 40.

[0036] When the mask plate is subjected to the screen stretching operation, the clamping jaws will simultaneously exert a pulling force on the long side direction of the mask plate, such as F1 and F2 in Figure 3 , so that the long side direction is deformed and stretched outward; correspondingly, the short side direction will appear the inward contraction phenomenon. Due to the action of the stress compensation area 13, the pixels in the long side direction can remain stable during the stretching process and will not be deformed. However, for high-resolution display products, pixel deformation often mainly concentrates in the short side direction, and the short side direction is difficult to control because it is not subjected to active stretching PPA.

[0037] According to the specific structure of the mask support structure, in the mask support structure provided by the embodiment of the application, at least part of the mask area 201 is provided with the magnetic control unit 23 on both sides in the first direction, the magnetic control unit 23 is located on the side of the first support part 21 facing the mask to be supported 30, the magnetic control unit 23 can be moved under the control of the corresponding magnetic field and drive the part of the mask to be supported to move. When the mask support structure provided by the embodiment of the application is combined with each mask, first, the tensile force of the mask is adjusted in the long direction; then the external magnetic force adjusting device is started to activate the magnetic control unit 23, and the deformation of the mask in the short direction is realized by precisely controlling the magnetic field strength, so as to effectively optimize the PPA in the short direction; finally, the laser welding process is adopted to complete the fixation between the mask in the long direction and the short direction and the mask support structure. Therefore, when the mask support structure provided by the embodiment of the application is combined with the mask, good PPA can be ensured in the long direction and the short direction of the mask, so as to ensure that the evaporation material falls in the corresponding evaporation area when the mask assembly formed by the combined mask and the mask support structure is used for evaporation, and avoid the occurrence of color mixing and other adverse effects.

[0038] As shown in Figures 3 to 5 In some embodiments, the first support part 21 includes a support body part 210 and a support protruding part 211, the support protruding part 211 is located on the side of the support body part 210 facing the mask to be supported, the support protruding part 211 is used to contact the mask to be supported 30, and a magnetic force influencing area is formed on the side of the support body part 210 facing the mask to be supported 30; the magnetic control unit 23 is located in the magnetic force influencing area.

[0039] For example, the support body part 210 and the support protruding part 211 are formed as an integral structure.

[0040] For example, the support body parts 210 included in the first support parts 21 between adjacent mask areas 201 can be formed as an integral structure or independent of each other.

[0041] For example, the support protruding part 211 is used to contact the mask to be supported, so as to realize the support function of the mask to be supported.

[0042] For example, the height of the magnetic control unit 23 is the same as that of the support protruding part 211, and the magnetic control unit 23 and the support protruding part 211 can both contact the mask to be supported.

[0043] As shown in Figure 5As shown, for example, when fabricating the first support portion 21, a support material layer with a thickness of h1 can be fabricated on the entire surface of the frame 40 first, and then a full-surface half-etching process can be performed on the support material layer to thin the support material layer in a certain area from a thickness of h1 (for example, between 100 micrometers and 150 micrometers) to a thickness of h2 (for example, between 50 micrometers and 75 micrometers), thereby forming the first support portion 21 and the second support portion 22.

[0044] For example, the magnetic control unit 23 has a thickness h3, for example, between 50 micrometers and 100 micrometers; the width of the magnetic control unit along the first direction is between 1.5 mm and 2 mm, but is not limited thereto.

[0045] The above arrangement enables the support body to support the support protrusion 211 and the magnetic control unit 23. The support protrusion 211 contacts the mask to be supported to provide support, and the magnetic control unit 23 contacts the mask to be supported to control its movement. This arrangement allows for both supporting the mask and using the magnetic control unit 23.

[0046] like Figure 5 As shown, in some embodiments, the distance between the support protrusion 211 and the first boundary L1 of the support body portion 210 is greater than the distance between the support protrusion 211 and the second boundary L2 of the support body portion 210. The first boundary L1 and the second boundary L2 are opposite to each other along the first direction. The first boundary L1 is close to the edge of the mask 30 to be supported, and the second boundary L2 is far from the edge of the mask 30 to be supported. The magnetic control unit 23 is located on the side of the support protrusion 211 close to the first boundary L1.

[0047] The above configuration can reserve enough layout space for the magnetic control unit 23, reducing the layout difficulty of the magnetic control unit 23.

[0048] like Figure 6 As shown, in some embodiments, the magnetic control unit 23 includes a magnetic material layer 233 and a support layer 232, with at least a portion of the support layer 232 located between the magnetic material layer 233 and the support body portion 210.

[0049] For example, the magnetic control unit 23 further includes a first protective layer 234 and / or a second protective layer 231; the second protective layer 231, the support layer 232, the magnetic material layer 233 and the first protective layer 234 are stacked sequentially in a direction away from the support body portion 210.

[0050] Exemplarily, the magnetic material layer 233 comprises a layer of iron-nickel alloy; the support layer 232 comprises a layer of titanium alloy; the first protective layer 234 comprises a layer of nickel metal; and / or, the second protective layer 231 comprises a layer of nickel metal.

[0051] More specifically, the magnetic material layer 233 adopts a 1J50 iron-nickel alloy (Ni content 50%) soft magnetic alloy, which has the characteristics of high magnetic permeability and low coercivity, and the magnetic field strength can be dynamically adjusted by an external electromagnetic coil to achieve precise control of the magnetic force. Exemplarily, the mask plate adopts Invar material, and under the action of the external electromagnetic device, the magnetic material layer 233 can exert a controllable tensile force on the mask plate made of Invar material.

[0052] A surface electroplating process is used to plate a 2-5 micron thick nickel on the surface of the magnetic material layer 233 to form the first protective layer 234, which not only can significantly improve the flatness of the surface of the magnetic control unit 23 in contact with the mask plate, and the bonding force of the magnetic material layer 233 and the mask plate, but also can improve the corrosion resistance of the magnetic control unit 23.

[0053] The support layer 232 is made of Ti-6Al-4V titanium alloy material, which has extremely low magnetic permeability characteristics, and will not interfere with the magnetic force stretching effect of the magnetic material layer 233, and can provide reliable mechanical support for the magnetic material layer 233 and the mask plate. At the same time, its excellent corrosion resistance and high strength characteristics can ensure stable adhesion with the first support part 21, effectively avoiding possible damage to the to-be-evaporated substrate 50 and the mask plate caused by the external electromagnetic device.

[0054] The specific manufacturing process of the magnetic control unit 23 is described in detail as follows;

[0055] After the fabrication of the plurality of support portions (i.e. after the etching process of the F-Mask Sheet is completed), an ultrasonic cleaning is performed using an acetone / ethanol mixed solution (for a duration of 10-15 minutes), and then the magnetic control unit 23 is prepared according to a specific process sequence; a 5-micron-thick nickel material is first deposited by an electroplating process to form the second protective layer 231, which can form a Ni-Ti intermetallic compound with the subsequently deposited titanium alloy, thus effectively preventing the generation of a brittle phase in a high-temperature environment and avoiding the resulting material shedding problem; then, a PVD magnetron sputtering process is used to sputter deposit a titanium alloy material onto the surface of the second protective layer 231 under low-temperature conditions (≤200°C), with the deposition thickness being controlled to be between 20 microns and 50 microns; subsequently, an Ar plasma (power 30W, processing time 3 minutes) is used to clean the deposition surface to remove surface oxides; then, a 1J50 iron-nickel alloy is used as a sputtering target to perform magnetron sputtering under process conditions of a power of 80-150W, with the deposition thickness being controlled to be between 25 microns and 75 microns to form the magnetic material layer 233; since the thickness of the magnetic material layer 233 is relatively thin, the deposition rate needs to be strictly controlled to be between 3-5μm / h to ensure the film quality; finally, a 2-micron- to 5-micron-thick nickel material is deposited by an electroplating process on the upper surface to form the first protective layer 234.

[0056] As shown in FIG. 1A, in some embodiments, the magnetic control unit 23 is divided into a first magnetic control portion X1 and a second magnetic control portion X2, the first magnetic control portion X1 is located between the second magnetic control portion X2 and the support protruding portion 211. Figure 7 In the first direction and in the direction away from the support protruding portion 211, the width of the first magnetic control portion X1 along the second direction is unchanged, in the first direction and in the direction away from the support protruding portion 211, the width of the second magnetic control portion X2 along the second direction gradually decreases, and the second direction intersects the first direction.

[0057] Exemplarily, the first magnetic control portion X1 and the second magnetic control portion X2 each include a partial second protective layer 231, a partial support layer 232, a partial magnetic material layer 233, and a partial first protective layer 234.

[0058] Exemplarily, the width h4 of the first magnetic control portion X1 in the first direction is between 1mm and 2mm, but is not limited thereto.

[0059] Exemplarily, the total length h5 of the first magnetic control portion X1 and the second magnetic control portion X2 in the first direction is between 4mm and 5mm, but is not limited thereto.

[0060] Exemplarily, the total length h5 of the first magnetic control portion X1 and the second magnetic control portion X2 in the first direction is between 4mm and 5mm, but is not limited thereto.

[0061] The above setting mode makes the planar form of the magnetic control unit 23 present a transition form between a rectangle and an ellipse in the direction away from the mask area 201, which can ensure that the magnetic force is directly and accurately applied to the short side direction of the mask plate under the action of the external magnetic force; at the same time, by gradually transitioning to an elliptical distribution, the magnetic force can be effectively dispersed and uniformly transmitted to the surface of the mask plate, avoiding damage to the mask plate caused by local stress concentration, and at the same time ensuring that the magnetic force acting area extends to the outside of the mask plate to achieve the best regulation effect.

[0062] The embodiment of the present application also provides a mask plate assembly, which comprises the mask plate support structure provided by the above embodiment, and further comprises at least one mask plate; the mask plate is arranged on the frame 40, and at least part of the mask plate is located on the side of the support plate away from the frame 40.

[0063] Illustratively, the mask plate comprises a plurality of evaporation effective areas 11 arranged in the second direction in sequence, and the evaporation effective areas 11 correspond one by one to the mask areas 201.

[0064] Illustratively, the mask plate has a first length in the first direction, the mask plate has a second length in the second direction, the first length is less than the second length, and the second direction intersects the first direction. The above mask plate has a first length in the first direction, that is, the short side of the mask plate has a first length, and the above mask plate has a second length in the second direction, that is, the long side of the mask plate has a second length.

[0065] In the mask plate support structure provided by the above embodiment, at least part of the mask area 201 has the magnetic control unit 23 on both sides in the first direction, the magnetic control unit 23 is located on the side of the first support part 21 facing the mask plate to be supported, and the magnetic control unit 23 can move under the control of the corresponding magnetic field and drive the part of the mask plate to be supported in contact with it to move. When the mask plate support structure provided by the above embodiment is combined with each mask plate to form a mask plate assembly, first, the tensile force of the mask plate in the long side direction is adjusted; then the external magnetic force adjusting device is started to activate the magnetic control unit 23, and the deformation regulation and control of the mask plate in the short side direction are realized by accurately controlling the magnetic field strength, so as to effectively optimize the short side direction PPA; finally, the laser welding process is adopted to complete the fixation between the mask plate in the long side direction and the short side direction and the mask plate support structure. Therefore, when the mask plate support structure provided by the above embodiment is combined with the mask plate to form the mask plate assembly, good PPA can be ensured in the long side direction and the short side direction of the mask plate, so as to ensure that the evaporation material falls on the corresponding evaporation area when the mask plate assembly formed by the combined mask plate and mask plate support structure is used to evaporate the substrate to be evaporated, and avoid the occurrence of color mixing and other adverse effects.

[0066] It should be noted that the "same layer" in the embodiments of the present application can refer to a film layer on the same structure layer. Or for example, the film layers on the same layer can be layer structures formed by using the same film forming process to form a film layer for forming a specific pattern, and then using the same mask plate to pattern the film layer by a one-time patterning process. According to the difference of the specific pattern, the one-time patterning process can include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure can be continuous or discontinuous. These specific patterns can also be at different heights or have different thicknesses.

[0067] In the method embodiments of the present application, the serial numbers of the steps cannot be used to limit the sequence of the steps, and for those skilled in the art, the changes in the sequence of the steps without creative labor are also within the protection scope of the present application.

[0068] It should be noted that each embodiment in the specification is described in a progressive manner, and the same and similar parts between each embodiment can be referred to each other, and each embodiment focuses on the difference from other embodiments. In particular, for the method embodiments, since they are basically similar to the product embodiments, they are described more simply, and the relevant parts can be referred to the part of the description of the product embodiments.

[0069] Unless otherwise defined, technical terms or scientific terms used in the present disclosure should be understood as having the common meaning understood by a person skilled in the art to which the present application belongs. The "first", "second" and similar words used in the present disclosure do not represent any order, number or importance, but are only used to distinguish different components. "Include" or "contain" and similar words mean that the elements or objects before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect", "couple" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to represent relative positional relationships, and when the absolute position of the described object changes, the relative positional relationship can also change accordingly.

[0070] It can be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, it can be "directly" on or under the other element, or there can be an intermediate element.

[0071] In the description of the above embodiments, specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0072] The above merely illustrates the specific embodiments of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can easily think of the changes or replacements within the technical range disclosed by the present application, which should be covered in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A mask support structure, characterized in that, Includes a support plate; the support plate includes multiple support portions, the multiple support portions defining multiple mask areas, each mask area having two first support portions on opposite sides along a first direction; The support plate also includes at least two magnetic control units. At least a portion of the mask area has the magnetic control units on both sides along the first direction. The magnetic control units are located on the side of the first support portion facing the mask to be supported. The magnetic control units can move under the control of a corresponding magnetic field and drive the portion of the mask to be supported that they are in contact with to move.

2. The mask support structure according to claim 1, characterized in that, The first support includes a support body and a support protrusion. The support protrusion is located on the side of the support body facing the mask to be supported. The support protrusion is used to contact the mask to be supported and forms a magnetic influence area on the side of the support body facing the mask to be supported. The magnetic control unit is located in the magnetic influence area.

3. The mask support structure according to claim 2, characterized in that, The distance between the supporting protrusion and the first boundary of the supporting main body is greater than the distance between the supporting protrusion and the second boundary of the supporting main body. The first boundary and the second boundary are opposite to each other along the first direction. The first boundary is close to the edge of the mask to be supported, and the second boundary is far from the edge of the mask to be supported. The magnetic control unit is located on the side of the supporting protrusion close to the first boundary.

4. The mask support structure according to claim 2, characterized in that, The magnetic control unit includes a magnetic material layer and a support layer, with at least a portion of the support layer located between the magnetic material layer and the support body portion.

5. The mask support structure according to claim 4, characterized in that, The magnetic control unit further includes a first protective layer and / or a second protective layer; the second protective layer, the support layer, the magnetic material layer and the first protective layer are stacked sequentially along the direction away from the support body portion.

6. The mask support structure according to claim 5, characterized in that, The magnetic material layer includes an iron-nickel alloy layer; the support layer includes a titanium alloy layer; the first protective layer includes a nickel metal layer; and / or, the second protective layer includes a nickel metal layer.

7. The mask support structure according to any one of claims 2 to 6, characterized in that, The magnetic control unit is divided into a first magnetic control part and a second magnetic control part, with the first magnetic control part located between the second magnetic control part and the support protrusion. Along the first direction and in a direction away from the supporting protrusion, the width of the first magnetic control portion along the second direction remains unchanged, while the width of the second magnetic control portion along the second direction gradually decreases, and the second direction intersects with the first direction.

8. The mask support structure according to any one of claims 2 to 6, characterized in that, The mask support structure also includes a frame, and the support plate is disposed on the frame.

9. A photomask assembly, characterized in that, The mask support structure includes any one of claims 1 to 8, and further includes at least one mask; the mask is disposed on the frame, and at least a portion of the mask is located on the side of the support plate opposite to the frame.

10. The mask assembly according to claim 9, characterized in that, The photomask has a first length along a first direction and a second length along a second direction, the first length being less than the second length, and the second direction intersecting the first direction.

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