Pulse radio frequency plasma generator with high dynamic range

Abstract

A power generator has a first plurality of power amplifiers each configured to receive a first common supply voltage and output a plurality of discrete DC voltages. At least one of the plurality of discrete DC voltages may be varied by varying the first common supply voltage. The radio frequency power generator may also include a second plurality of power amplifiers that receive a second common supply voltage different from the first supply voltage or a different supply voltage. At least one discrete DC voltage of the plurality of discrete DC voltages may be varied by varying the second common supply voltage or a different supply voltage. The outputs of each power amplifier are superimposed in series to generate an output voltage for the power generator. One of the plurality of power amplifiers is activated or deactivated at a first time, while another of the plurality of power amplifiers is activated or deactivated at a second time.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority to U.S. Patent Application No. 18 / 661,049, filed May 10, 2024, and claims the benefit of U.S. Provisional Application No. 63 / 469,653, filed May 30, 2023, and U.S. Provisional Application No. 63 / 538,556, filed September 15, 2023. The entire disclosure of each of the above applications is incorporated herein by reference. TECHNICAL FIELD

[0002] The present disclosure relates to RF generator systems and control of RF generators. BACKGROUND

[0003] Plasma processing is often used in semiconductor manufacturing. In plasma processing, ions are accelerated by an electric field to etch material from the surface of a substrate or to deposit material onto the surface of a substrate. In one basic implementation, the electric field is generated based on an RF or DC power signal generated by a corresponding RF or DC generator of a power delivery system. The power signal generated by the generator must be precisely controlled to effectively perform plasma etching.

[0004] The background description provided here is for the purpose of generally presenting the context of the disclosure. The work of the presently named inventors, to the extent the work is described in this background section, and the descriptions of various solutions to the problems in the art and the conditions of the prior art as described in this background section are not necessarily acknowledged or implied to be prior art. SUMMARY

[0005] A system of one or more computers can be configured to perform particular operations or actions by virtue of having software, firmware, hardware, or a combination of them installed on the system that in operation causes or cause the system to perform the actions. One or more computer programs can be configured to perform particular operations or actions by virtue of including instructions that, when executed by data processing apparatus, cause the apparatus to perform the actions. A general architecture includes a power generator. The power generator also includes a first plurality of power amplifiers including a first power amplifier configured to receive a first supply voltage and output a plurality of direct current voltages and a second power amplifier configured to receive the first supply voltage and output the plurality of direct current voltages. The first power amplifier and the second power amplifier are connected in series, and the power generator generates an output voltage that varies as a function of one of the plurality of direct current voltages output by the first power amplifier and one of the plurality of direct current voltages output by the second power amplifier. Other embodiments of this architecture include corresponding computer systems, apparatus, and computer programs recorded on one or more computer storage devices, each configured to perform the actions of the methods.

[0006] Implementations can include one or more of the following features. In the power generator, the first supply voltage varies, and the plurality of direct current voltages varies according to the first supply voltage. A voltage output command determines which one of the plurality of direct current voltages is output by a selected one of the first plurality of power amplifiers. A first control module is configured to generate a voltage output command for another one of the first plurality of power amplifiers, where the voltage output command determines which one of the plurality of direct current voltages is output by the other one of the first plurality of power amplifiers. The first control module receives a clock signal to synchronize operation of the first plurality of power amplifiers. A voltage output command determines which one of the plurality of direct current voltages is output by the other one of the first plurality of power amplifiers. The first control module and the second control module are configured to receive a clock signal to synchronize operation of the first plurality of power amplifiers. In the power generator, the first plurality of power amplifiers can comprise a fixed step generation portion of the power generator, and the power generator can further comprise a variable step generation portion comprising a first variable power amplifier configured to receive a second supply voltage and output a second plurality of direct current voltages different from the plurality of direct current voltages. The variable step generation portion can comprise a second plurality of power amplifiers comprising the first variable power amplifier and a second variable power amplifier configured to receive a third supply voltage and output a third plurality of direct current voltages, where the first variable power amplifier and the second variable power amplifier are connected in series and in series with the fixed step generation portion. The power generator generates an output voltage that varies according to one of the second plurality of direct current voltages output by the first variable power amplifier, one of the third plurality of direct current voltages output by the second variable power amplifier, and an output of the fixed step generation portion. The first variable power amplifier is configured to receive a second supply voltage and output a piecewise linear output voltage, where the first variable power amplifier is connected in series with the fixed step generation portion, and the power generator generates an output voltage that varies according to the piecewise linear output voltage and an output voltage of the fixed step generation portion. The first variable power amplifier is a piecewise linear power amplifier. The first plurality of power amplifiers outputs a bipolar voltage signal, and the power generator can further comprise a direct current charge pump that receives an output voltage of the first plurality of power amplifiers, and the direct current charge pump is configured to convert the bipolar voltage signal to a unipolar voltage signal. The unipolar voltage signal is positive or 0v, or the unipolar voltage signal is negative or 0v.The components of the power generator are disposed in either a remote module or a proximity module, the proximity module being positioned near the load and the remote module being positioned away from the load. The proximity module includes switching components for the first plurality of power amplifiers, and the remote module includes components for generating the first supply voltage. The power generator may include a DC / DC converter configured to receive a rectified voltage and generate the first supply voltage. The power generator may include a converter configured to receive an AC input voltage, convert the AC input voltage to a rectified DC voltage, and control the rectified DC voltage to the first supply voltage. The converter includes a buck converter that receives the rectified DC voltage and steps it down to the first supply voltage in steps. The power generator may include a power driver that receives the first supply voltage and generates an AC / DC signal applied to each of the first plurality of power amplifiers. Each of the first plurality of power amplifiers receives the AC / DC signal and converts it into a trunk voltage applied to the switches of each of the first plurality of power amplifiers. The plurality of DC voltages includes +V. PA -V PA At least two of 0 volts, where +V PA and -V PA It will vary depending on the supply voltage. Implementations of the above technology may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0007] A system of one or more computers can be configured to perform specific operations or actions by installing software, firmware, hardware, or combinations thereof on the system, which in operation cause the system to perform actions. One or more computer programs can be configured to perform specific operations or actions by including instructions that, when executed by a data processing device, cause the device to perform actions. A general configuration includes a power generator. The power generator further includes a first plurality of power amplifiers, comprising a first power amplifier configured to receive a first supply voltage and output a plurality of DC voltages, and a second power amplifier configured to receive the first supply voltage and output the plurality of DC voltages. The first power amplifier and the second power amplifier are connected in series, and the power generator generates an output voltage that varies according to one of the plurality of DC voltages output by the first power amplifier and one of the plurality of DC voltages output by the second power amplifier. One of the power amplifiers is actuated or deactivated at a first time, while another of the power amplifiers is actuated or deactivated at a second time, wherein a time delay between the first and second times controls one of the following: ringing, overshoot, or power distribution of the output voltage. Other embodiments of this configuration include corresponding computer systems, apparatuses, and computer programs recorded on one or more computer storage devices, each computer system, apparatus, and computer program being configured to perform the actions of the method.

[0008] The implementation may include one or more of the following features. The power generator includes an iterative learning control module for determining the time delay based on a cost function that varies with selected parameters.

[0009] Other applications of this disclosure will become apparent from the detailed description, claims, and drawings. The detailed description and specific examples are intended for illustrative purposes only and are not intended to limit the scope of this disclosure. Attached Figure Description

[0010] This disclosure will become more fully understood in light of the specific implementation and accompanying drawings.

[0011] Figure 1 A schematic diagram of an inductively coupled plasma processing system is shown.

[0012] Figure 2 A schematic diagram of a capacitively coupled plasma processing system is shown.

[0013] Figure 3 A schematic diagram showing a plasma system arranged according to various configurations of this disclosure;

[0014] Figure 4This is a schematic block diagram of a power transmission system with multiple power supplies arranged according to various configurations of this disclosure;

[0015] Figure 5 Displays the radio frequency signal and the waveform of pulse modulation of the radio frequency signal to describe the pulse operation mode;

[0016] Figure 6 Showing a partial schematic block diagram of a power generation system for applying power to a load, arranged according to various configurations of this disclosure;

[0017] Figure 7 A partial schematic block diagram showing a power generation system for applying power to a load, arranged according to various configurations of this disclosure;

[0018] Figure 8 A partial schematic block diagram showing the power amplifier modules of a power generation system arranged in various configurations according to this disclosure;

[0019] Figure 9 The display shows waveforms depicting the operation of power generation systems arranged in various configurations according to this disclosure;

[0020] Figure 10 The display shows waveforms depicting the operation of power generation systems arranged in various configurations according to this disclosure;

[0021] Figure 11 A partial schematic block diagram of a power amplifier module of a power generation system arranged in various configurations according to this disclosure is shown, including a power amplifier module that receives a varying supply voltage to generate a varying output voltage.

[0022] Figure 12 A partial schematic block diagram of a power amplifier module of a power generation system arranged in various configurations according to this disclosure, including a weighted power supply to generate a varying output voltage;

[0023] Figure 13 A partial schematic block diagram of a power amplifier module of a power generation system arranged in various configurations according to this disclosure, including a piecewise linear power amplifier to generate a varying output voltage;

[0024] Figure 14 A partial schematic block diagram of a power amplifier module for generating a unipolar output voltage in a power generation system arranged according to various configurations of this disclosure;

[0025] Figure 15A partial schematic block diagram of a control system for applying power to a load, arranged according to various configurations of this disclosure, including proximity modules and remote modules;

[0026] Figure 16 The diagram shows waveforms depicting the operation of a power amplifier module of a power generation system arranged in various configurations according to this disclosure during shutdown.

[0027] Figure 17 Shows a functional block diagram of example control modules arranged according to various configurations;

[0028] Figure 18 A flowchart showing the operation of a control system arranged according to the principles of this disclosure;

[0029] Figure 19 The waveforms of the power amplifier modules of the power generation system arranged according to various configurations of this disclosure are shown during the shutdown period.

[0030] Figure 20 Show along Figure 19 The line 20-20 intercepted Figure 19 An expanded diagram of a portion of the waveform;

[0031] Figure 21 The display shows the relative actuation and deactivation waveforms of the selected power amplifier module in the power generation system, as well as the final output voltage of the power generation system.

[0032] Figure 22 The display depicts the actuation and deactivation times of the power amplifier module compared to... Figure 16 When the corresponding power amplifier modules are closer, the relative actuation and deactivation waveforms of the selected power amplifier modules in the power generation system, and the final output voltage of the power generation system;

[0033] Figure 23 The display shows multiple waveforms of a single pulse when the power amplifier module is actuated and deactivated at different intervals;

[0034] Figure 24 A flowchart showing the operation of a control system arranged according to the principles of this disclosure.

[0035] In the accompanying drawings, reference numerals may be reused to identify similar and / or identical elements. Detailed Implementation

[0036] A power system may include a DC or RF power generator, a matching network, and a load (e.g., a processing room, a plasma room, or a reactor with fixed or variable impedance). The power generator produces a DC or RF power signal that is received by the matching network or impedance optimization controller or circuitry. The matching network or impedance optimization controller or circuitry converts the load impedance to the characteristic impedance of the transmission line between the power generator and the matching network. Impedance matching helps to maximize the amount of power sent to the load (“forward power”) and minimize the amount of power reflected back to the power generator from the load (“reverse power” or “reflected power”). When the input impedance of the matching network is matched to the characteristic impedance of the transmission line and the generator, the power delivered to the load can be maximized by minimizing reflected power.

[0037] In the field of power supply, there are generally two methods for applying power signals to a load. The first, more traditional method is to apply a continuous power signal to the load. In continuous mode or continuous wave mode, the continuous power signal is typically a constant DC power signal continuously output from the power supply to the load, or a sinusoidal power signal that can be RF or other power signals. In the continuous mode method, the power signal is a constant DC or sinusoidal output, and the amplitude and / or (for RF power signals) frequency of the power signal can be varied to change the output power applied to the load.

[0038] A second method of applying a power signal to a load involves applying a voltage, current, or power signal in pulses, rather than applying a continuous voltage, current, or power signal to the load. In pulsed operation mode or pulsed operation mode, the voltage, current, or power signal is modulated by a modulation signal to define the envelope of the modulated power signal. The voltage, current, or power signal can be, for example, a sinusoidal RF signal or other time-varying signal. Typically, the power delivered to the load is changed by altering the modulation signal.

[0039] In a typical power supply configuration, the output power applied to the load is determined using sensors that measure the forward and reflected power, or the voltage and current signals of the voltage, current, or power applied to the load. Any set of these signals is analyzed in the control loop. The analysis typically determines the voltage, current, or power values ​​used to adjust the output of the power supply to change the voltage, current, or power applied to the load. In power delivery systems where the load is a processing room or other nonlinear or time-varying load, since the applied voltage, current, or power is partly a function of the load's impedance, changing load impedance causes a corresponding change in the voltage, current, or power applied to the load.

[0040] In systems where the manufacture of various devices relies on introducing voltage, current, or power into a load to control the manufacturing process, voltage, current, or power is typically delivered in one of two configurations. In the first configuration, the voltage, current, or power is capacitively coupled to the load. This system is called a capacitively coupled plasma (CCP) system. In the second configuration, the voltage, current, or power is inductively coupled to the load. This system is typically called an inductively coupled plasma (ICP) system. Power coupling to plasma can also be achieved via wave coupling at microwave frequencies. This method typically uses an electron cyclotron resonance (ECR) or microwave source. A helicon source is another form of wave coupling source and typically operates at frequencies similar to those of conventional ICP and CCP systems. In various configurations, the helicon source can operate at RF frequencies. The power delivery system may include at least one bias power and / or source power applied to one or more electrodes of the load. The source power typically generates the plasma and controls the plasma density, while the bias power modulates the ions in the sheath formulation. Depending on various design considerations, the bias and source may share the same electrode or may use separate electrodes.

[0041] When a power delivery system drives a time-varying or nonlinear load, such as a processing chamber or plasma chamber, the power absorbed by the bulk plasma and plasma sheath results in an ion density with a certain range of ion energies. A characteristic measure of ion energy is the ion energy distribution function (IEDF). The ion energy distribution function (IEDF) can be controlled using bias power. One way to control the IEDF of a system in which multiple voltage, current, or power signals are applied to a load is by changing the multiple voltage, current, or power signals associated with at least one of amplitude, frequency, and phase. At least one of the associated amplitude, frequency, and phase of the multiple voltage, current, or power signals can also be correlated using a Fourier series and associated coefficients. The frequencies among the multiple voltage, current, or power signals can be locked, and the relative phases among the multiple voltage, current, or power signals can also be locked. Examples of such systems can be found with reference to U.S. Patent Nos. 7,602,127, 8,110,991, and 8,395,322, all of which have been assigned to the assignee of this application and are incorporated herein by reference.

[0042] Time-varying or nonlinear loads can be present in a variety of applications. In one application, the plasma processing system may also include components for plasma generation and control. One such component is a nonlinear load implemented as a processing chamber, such as a plasma chamber or reactor. A typical plasma chamber or reactor used in a plasma processing system, for example, for thin film fabrication, may use a dual-power system. One voltage, current, or power generator (source) controls plasma generation, while another voltage, current, or power generator (bias) controls ion energy. Examples of dual-power systems include those described in U.S. Patent Nos. 7,602,127, 8,110,991, and 8,395,322 cited above. The dual-power systems described in the cited patents employ a closed-loop control system adapted to power supply operation for the purpose of controlling ion density and its corresponding ion energy distribution function (IEDF).

[0043] There are various methods for controlling processing chambers, such as those used to generate plasma. For example, in voltage, current, or power delivery systems, the phase and frequency of multiple drive signals operating at the same or nearly identical frequencies can be used to control plasma generation. For plasma sources driven in this manner, the periodic waveforms affecting the plasma sheath dynamics and the corresponding ion energies are generally known and controlled by the interaction of the frequency and associated phase of the periodic waveforms. Another method in voltage, current, or power delivery systems involves dual-frequency control. That is, two frequency sources operating at different frequencies are used to power the plasma chamber to provide substantially independent control over ion and electron densities. In various configurations, the frequency can be an RF frequency.

[0044] Another approach utilizes a broadband RF power source to drive the plasma chamber. The broadband approach presents several challenges. One challenge is coupling the power to the electrodes. A second challenge is that a transfer function must be established for the generated waveform to the actual sheath voltage of the desired IEDF over a wide process space to support material surface interactions. In one response approach within an inductively coupled plasma system, plasma density is controlled by controlling the power applied to the source electrode to modulate the ions to control the IEDF, thereby providing control over the etch rate and etch feature profile. By controlling both the source and bias electrodes, the etch rate and various other etch characteristics are controlled via ion density and energy.

[0045] As integrated circuit and device manufacturing continues to advance, the power requirements for controlling manufacturing processes are also constantly evolving. For example, with the manufacture of memory devices, the requirements for bias voltage, current, or power are continuously increasing. Increased voltage, current, or power generate higher-energy ions to improve the directionality or anisotropy of etched feature profiles and faster surface interactions, thereby increasing etch rates and allowing for the etching of features with higher aspect ratios. In a non-limiting example, in some voltage, current, or power delivery systems, increased ion energy is sometimes accompanied by lower bias frequency requirements and an increase in the power and number of bias power sources coupled to the plasma sheath generated in the plasma chamber. Increased power at lower bias frequencies and an increased number of bias power sources lead to intermodulation distortion (IMD) emissions from sheath modulation. IMD emissions can significantly reduce the power delivered by sources that generate plasma. U.S. Patent No. 10,821,542, published November 3, 2020, entitled "Pulse Synchronization by Monitoring Power in Another Frequency Band," assigned to the assignee of this application and incorporated herein by reference, describes a method for pulse synchronization by monitoring power in another frequency band. In the referenced U.S. patent application, pulses of a second RF generator are controlled by detecting pulses of a first RF generator at a second RF generator, thereby synchronizing pulses between the two RF generators.

[0046] The fabrication of modern high-performance memory devices, such as 3D NAND (non-volatile) flash memory and dynamic random access memory (DRAM), requires precise etching of extremely high aspect ratio (HAR) features, typically with a height-to-width ratio greater than 50:1. The bias generator is a critical component of the semiconductor processing system used for HAR etching. Ideally, the bias generator is configured to provide a pulsed carrier waveform and modulate the carrier waveform at a lower frequency. The pulsed bias waveform is used to create a monoenergetic ion energy distribution function (IEDF), and the modulation of the waveform is used to alternate between high-energy ion-assisted etching and low-energy polymer formation of the memory structure to protect the sidewalls of the HAR features. Furthermore, wafer fabrication is expensive and therefore very valuable. Typically, increasing bias power requirements lead to an increase in fabrication footprint requirements. Therefore, there is a need for a bias generator that provides a pulsed carrier waveform and modulates the carrier waveform at a lower frequency. It is also necessary for the bias generator to occupy a limited footprint within the wafer fabrication environment.

[0047] Figure 1A schematic diagram of an inductively coupled plasma (ICP) system 110 is depicted. The ICP system 110 includes a nonlinear load, such as a reactor, plasma reactor, or plasma chamber 112 (which are used interchangeably herein), for generating plasma 114. Power in the form of voltage or current is applied to the plasma chamber 112 via a pair of coils comprising a coil assembly, which in various configurations includes one or more coils arranged in various configurations. Figure 1 In the non-limiting configuration shown, the plasma chamber 112 includes one or both of a first coil 116 and a second coil 118. In various configurations, the coils may be arranged concentrically, wound, or spirally. The first coil 116 is powered by a power supply or RF power generator 120, and the second coil 118 is powered by a power supply or RF power generator 122. Coils 116 and 118 are configured to power the plasma chamber 112. A dielectric window 124 allows power to be coupled to the plasma while providing a vacuum seal. A substrate 126 is placed within the plasma chamber 112 and typically forms the workpiece for plasma operation. A power supply, power source, or RF power generator 128 (these terms are used interchangeably herein to refer to a suitably configured power supply, source, or generator) powers the plasma chamber 112 through the substrate 126.

[0048] In various configurations, power supplies 120 and 122 provide source voltage or current to ignite or generate plasma 114 or control plasma density. Similarly, in various configurations, power supply 128 provides bias voltage or current that modulates ions to control the ion potential or ion energy of plasma 114. In various configurations, power supplies 120 and 122 are locked to operate at the same frequency, voltage, and current, and have a fixed or varying relative phase. In various other configurations, power supplies 120 and 122 may operate at different frequencies, voltages, currents, and relative phases.

[0049] Figure 2A schematic diagram of a capacitively coupled plasma (CCP) system 210 is depicted. The CCP system 210 includes a plasma chamber 212 for generating plasma 214. A pair of electrodes 216, 226 disposed within the plasma chamber 212 are respectively connected to a DC (ω=0) power supply or an RF power generator 220, 228, which can generate DC signals or other voltage, current, or power signals having one or more different amplitudes, frequencies, or duty cycles, including but not limited to RF signals. In various configurations, the power supply 220 provides a source voltage or current to ignite or generate plasma 214 or control plasma density, but a bias power supply can also be used to ignite the plasma. In various configurations, the power supply 228 provides a bias voltage or current for modulating ions in the plasma, thereby controlling the ion potential, ion energy, or ion density of plasma 214. In various CCP configurations, bias power and source power can be applied to the upper electrode (e.g., electrode 216) and the lower electrode (e.g., electrode 226) in various combinations. In another non-limiting example, bias power and source power may be applied to the lower electrode (e.g., electrode 226), while the upper electrode (e.g., electrode 216) is grounded or floating. In various configurations, power supplies 220 and 228 operate in relative phase when harmonics are relevant. In other various configurations, power supplies 220 and 228 operate at different frequencies, voltages, and currents, and have a fixed or varying relative phase. Furthermore, in various configurations, power supplies 220 and 228 may be connected to the same electrode, while the corresponding electrode is connected to ground or a third DC current (ω=0), or other voltage, current, or power supply having one or more varying amplitude, frequency, or duty cycle generators (not shown), including but not limited to RF signals.

[0050] In addition to sinusoidal bias waveforms, non-sinusoidal bias waveforms can also control ion energy in various configurations. As a non-limiting example, the bias waveform can be an RF waveform, a pulsed rectangular waveform, or a piecewise linear waveform, such as that described in U.S. Patent No. 10,396,601, issued August 27, 2019, entitled “Piecewise RF Power Systems and Methods for Supplying Pre-Distorted RFBias Voltage Signals to an Electrode in a Processing Chamber,” which has been assigned to the assignee of this application and is incorporated herein by reference. In various configurations, the bias waveform can be any of a voltage, current, or power waveform having one or more variations in amplitude, frequency, or duty cycle. In various configurations, the radio frequency (RF) signal can be considered to have a frequency in the range of approximately 2 kHz to 300 GHz.

[0051] Figure 3 A schematic cross-sectional view of a dual-power-input plasma system 310 is depicted. The plasma system 310 includes a first electrode 312 connected to a ground 314 and a second electrode 316 spaced apart from the first electrode 312. A first power supply 318 generates a first voltage, current, or power signal as described above, which is applied to the second electrode 316 at a first frequency f=ω1. A second power supply 320 generates a second DC (ω=0) or RF power, which is applied to the second electrode 316. In various configurations, the second power supply 320 operates at a second frequency f=ω2, where ω2=nω, which is the nth harmonic frequency of the first power supply 318. In other various configurations, the operating frequency of the second power supply 320 is not a multiple of the frequency of the first power supply 318.

[0052] The coordinated operation of power supplies 318 and 320 can generate and control plasma 322. For example... Figure 3 As shown in the schematic diagram, plasma 322 is formed within an asymmetric sheath 330 of the plasma chamber 324. The sheath 330 includes a grounded sheath 332 and an energized sheath 334. The sheath is generally described as the surface region surrounding the plasma 322. Figure 3 As shown in the schematic diagram, the grounding sheath layer 332 has a relatively large surface area 326. The energized sheath layer 334 has a smaller surface area 328. Since each sheath layer 332, 334 acts as a dielectric between the conductive plasma 322 and the corresponding electrodes 312, 316, each sheath layer 332, 334 forms a capacitance between the plasma 322 and the corresponding electrodes 312, 316.

[0053] Figure 4An RF generator or power supply system 410 is depicted. The power supply system 410 includes a pair of voltage / current / power generators or power supplies 412a and 412b, matching networks 418a and 418b, and a load 432 (e.g., a nonlinear load, which may be a plasma chamber, plasma reactor, processing chamber, etc.). In various configurations, generator 412a is referred to as a source generator or power supply, and matching network 418a is referred to as a source matching network. Furthermore, in various configurations, one or both of the voltage / current / power generators or power supplies 412a and 412b can output continuous or pulsed RF voltage signals. Similarly, in various configurations, generator 412b is referred to as a bias generator or power supply, and matching network 418b is referred to as a bias matching network. It should be understood that components may be referenced individually or collectively, using component symbols with or without letter subscripts or apostrophes. In various configurations, one or both of the matching networks 418a and 418b can be implemented as RF blocking filters instead of impedance matching; for example, they can be matching networks that receive pulsed DC or non-sinusoidal signals. In other various configurations, one or both of the matching networks 418a and 418b can be omitted.

[0054] In various configurations, source generator 412a receives control signal 430 from matching network 418b, generator 412b, or control signal 430' from bias generator 412b. Control signal 430 or 430' represents an input signal provided to source generator 412a that indicates one or more operating characteristics or parameters of bias generator 412b. In various configurations, synchronization bias detector 434 senses the signal output from matching network 418b to load 432 and outputs synchronization or trigger signal 430 to source RF generator 412a. In various configurations, synchronization or trigger signal 430', instead of trigger signal 430, can be output from bias generator 412b to source generator 412a. The difference between trigger or synchronization signals 430, 430' can result from the effect of matching network 418b, which can adjust the phase between the input signal to the matching network and the output signal from the matching network. Signals 430, 430' are included in various configurations to provide information about the operation of bias generator 412b, enabling predictive responsiveness to address periodic fluctuations in the impedance of the plasma chamber or load 432 caused by bias generator 412b. When control signals 430 or 430' are absent, generators 412a, 412b operate autonomously.

[0055] Generators 412a and 412b include respective power supplies or amplifiers 414a and 414b, sensors 416a and 416b, and processors, controllers, or control modules 420a and 420b. Power supplies 414a and 414b generate voltage, current, or power signals 422a and 422b (various configurations as described above) and output them to the corresponding sensors 416a and 416b. Signals 422a and 422b are provided to matching networks 418a and 418b as power signals f1 and f2, respectively, through sensors 416a and 416b. The signals output by sensors 416a and 416b vary depending on various parameters sensed from load 432. Although sensors 416a and 416b are shown as being located inside generators 412a and 412b, they can also be located outside generators 412a and 412b. Such external sensing can occur at the output of the generator, at the input of the impedance matching device located between the generator and the load, or between the output of the impedance matching device (including those located inside the impedance matching device) and the load.

[0056] Sensors 416a and 416b detect various operating parameters and output signals X and Y. Sensors 416a and 416b may include voltage, current, and / or directional coupler sensors. Sensors 416a and 416b can detect (i) voltage V and current I, and / or (ii) positive power P, respectively, output from power amplifiers 414a and 414b and / or generators 412a and 412b. FWD And the reverse or reflected power P received respectively from the corresponding matching networks 418a, 418b or the load 432 connected to the respective sensors 416a, 416b. REV Voltage V, current I, forward power P FWD and reverse power P REV The sensors 416a and 416b may be scaled, filtered, or scaled and filtered versions of the actual voltage, current, forward power, and reverse power associated with the corresponding power supplies 414a and 414b. Sensors 416a and 416b may be analog sensors, digital sensors, or a combination of both. In digital implementation, sensors 416a and 416b may include an analog-to-digital (A / D) converter and a signal sampling component with a corresponding sampling rate. Signals X and Y may represent either voltage V or current I, or forward (or power supply) power P. FWD Reverse (or reflected) power P REV .

[0057] Sensors 416a and 416b generate sensor signals X and Y, which are received by corresponding controllers or control modules 420a and 420b, respectively. Control modules 420a and 420b process the corresponding X and Y signals 424a and 426a and signals 424b and 426b, and generate one or more feedforward or feedback control signals 428a and 428b, which are then sent to corresponding power supplies 414a and 414b. Power supplies 414a and 414b adjust voltage, current, or power signals 422a and 422b based on the received one or more feedback or feedforward control signals. In various configurations, control modules 420a and 420b can control matching networks 418a and 418b via corresponding control signals 429a and 429b based, for example, the X and Y signals 424a and 426a and signals 424b and 426b. Control modules 420a and 420b may include one or more proportional-integral (PI), proportional-integral-derivative (PID), linear quadratic regulator (LQR) controllers or subsets thereof and / or direct digital synthesis (DDS) elements and / or any of the various elements described below in conjunction with the modules.

[0058] In various configurations, control modules 420a and 420b may include functions, processes, processors, or submodules. Control signals 428a and 428b may be control or actuator drive signals and may transmit DC offset or rail voltage, voltage amplitude or current amplitude, frequency, and phase components, etc. In various configurations, feedback control signals 428a and 428b may be used as inputs to one or more control loops. In various configurations, multiple control loops may include proportional-integral (PI), proportional-integral-derivative (PID), linear quadratic regulator (LQR) control loops, or subsets thereof, for RF drive and power rail voltage. In various configurations, control signals 428a and 428b may be used in one or both of single-input single-output (SISO) or multiple-input multiple-output (MIMO) control schemes. Examples of MIMO control schemes can be found in U.S. Patent No. 10,546,724, issued January 28, 2020, entitled "Pulsed Bidirectional Radio Frequency Source / Load," assigned to the assignee of this application and incorporated herein by reference. In other configurations, signals 428a and 428b may provide feedforward control, as described in U.S. Patent No. 10,049,857, issued August 14, 2018, entitled "Adaptive Periodic Waveform Controller," assigned to the assignee of this application and incorporated herein by reference.

[0059] In various configurations, the power supply system 410 may include a controller 420'. The controller 420' may be located external to one or both of the generators 412a, 412b, and may be referred to as an external or common controller 420'. In various configurations, the controller 420' may implement one or more functions, processes, or algorithms described herein with respect to one or both of the controllers 420a, 420b. Therefore, the controller 420' communicates with the respective generators 412a, 412b via a pair of corresponding links 436, 438, which allow the exchange of data and control signals between the controller 420' and the generators 412a, 412b as needed. For various configurations, the controllers 420a, 420b, 420' may analyze and control the generators 412a, 412b in a distributed and cooperative manner. In various other configurations, the controller 420' may provide control over the generators 412a, 412b without requiring a corresponding local controller 420a, 420b.

[0060] In various configurations, power supply 414a, sensor 416a, controller 420a, and matching network 418a may be referred to as source power supply 414a, source sensor 416a, source controller 420a, and source matching network 418a, respectively. Similarly, in various configurations, power supply 414b, sensor 416b, controller 420b, and matching network 418b may be referred to as bias power supply 414b, bias sensor 416b, bias controller 420b, and bias matching network 418b, respectively. In various configurations, as described above, the term "source" refers to a generator or voltage, current, or power supply that generates plasma, while the term "bias" refers to a generator or voltage, current, or power supply that tunes the ion potential and ion energy distribution function (IEDF) of the plasma. In various configurations, the source power supply and the bias power supply operate at different frequencies or duty cycles. In various configurations, the operating frequency or duty cycle of the source power supply is higher than that of the bias power supply. In various other configurations, the operating frequencies or duty cycles of the source and bias power supplies are the same or substantially the same.

[0061] Depending on the configuration, source generator 412a and bias generator 412b include multiple terminals for external communication. Source generator 412a includes a pulse synchronization output terminal 440, a digital communication terminal 442, an output terminal 444, and a control signal terminal 460. Bias generator 412b includes an input terminal 448, a digital communication terminal 450, and a pulse synchronization input terminal 452. Pulse synchronization output terminal 440 outputs a pulse synchronization signal 456 to pulse synchronization input terminal 452 of bias generator 412b. Digital communication terminal 442 of source generator 412a and digital communication terminal 450 of bias generator 412b communicate via digital communication link 457. Control signal terminal 460 of source generator 412a receives one or both of control signals 430 and 430'. Output terminal 444 generates a control signal 458 input to input terminal 448. In various configurations, control signal 458 is substantially the same as the control signal controlling source generator 412a. In various other configurations, the control signal 458 is the same as the control signal for the source generator 412a, but a phase shift is performed within the source generator 412a according to the desired phase shift generated by the bias generator 412b. Therefore, in various configurations, the source generator 412a and the bias generator 412b are driven by substantially the same control signal, or by substantially the same control signal that has been phase-shifted by a predetermined amount.

[0062] In various configurations, the power supply system 410 may include multiple source generators 412a and multiple bias generators 412b. As a non-limiting example, the multiple source generators 412a, 412a', 412a'', ..., 412a' ... n It can be arranged to provide multiple output power signals to one or more source electrodes of load 432. Similarly, multiple bias generators 412b, 412b', 412b"..., 412b... n Multiple output power signals can be provided to multiple bias electrodes of load 432. When source generator 412a and bias generator 412b are configured to include multiple corresponding source generators or bias generators, each generator outputs a separate signal to a corresponding plurality of matching networks 418a, 418b (which are configured to operate as described above) in a one-to-one correspondence. In various other configurations, there may not be a one-to-one correspondence between each generator and matching network. In various configurations, multiple source electrodes may refer to multiple electrodes that cooperate to define a composite source electrode. Similarly, multiple bias electrodes may refer to multiple connections of multiple electrodes that cooperate to define a composite bias electrode.

[0063] Figure 5 Depicting the representation of load (e.g.) Figure 4 The voltage versus time graph for the pulse operation mode of the load 432 (in which voltage, current, or power is supplied). More specifically, Figure 5Two polymorphic pulses P1 and P2 of pulse signal 512, each with individual states S1-S4 and S1-S3, are depicted. Figure 5 In this diagram, signal 510 is modulated by pulses P1 and P2, and is depicted as an RF sinusoidal signal or waveform as a non-limiting example. As shown, during states S1-S3 of P1 and S1-S2 of P2, when the pulses are on, the RF generator 412 outputs signal 510 with an amplitude defined by the pulse amplitude in each state. Conversely, during states S4 of P1 and S3 of P2, the pulses are off, and the generator 412 does not output signal 510. Pulses P1 and P2 can be repeated with a constant or variable duty cycle, and each state S1-S4 and S1-S3 of pulses P1 and P2 can have the same or variable amplitude and width.

[0064] In various configurations, the signal strength of the 510 is not necessarily as good as... Figure 5 The displayed implementation is an RF sine wave. (See reference above.) Figure 2 In addition to a sinusoidal waveform, signal 510 can also be a non-sinusoidal waveform in various configurations. As a non-limiting example, RF signal 510 can be a rectangular waveform pulsed in a repetitive or intermittent manner, or a piecewise linear waveform, as described in US 10,396,601. In various configurations, pulse signal 512 can be, in addition to... Figure 5 Other waveforms besides the square wave shown. Furthermore, as a non-limiting example, the envelope or pulse signal 512 can be rectangular, trapezoidal, triangular, sawtooth, Gaussian, or other shapes used to define the envelope or modulation envelope of the underlying modulated pulse signal 510. In various configurations, the pulse signal 512 can appear or repeat within a fixed or variable period or time period. In various other configurations, the shape of the pulse signal 510 can change between each appearance. In various other configurations, the pulse signal 510 can appear or repeat within a fixed or variable time period, and its shape changes between each appearance. Furthermore, pulses P1, P2 can have multiple states S1, ..., Sn, whose amplitude, duration, and shape will differ. States S1, ..., Sn can repeat within a fixed or variable period and can contain all or part of the aforementioned shapes. Furthermore, as... Figure 5 As shown, signal 510 can operate at frequencies that vary between different states or within the same state.

[0065] Figure 6This illustrates an exemplary power generation system 610. While the power generation system 610 has various applications, one is implementing a high aspect ratio (HAR) etching system. The power generation system 610 uses a pulsed DC bias generator with a series power amplifier module. The power generation system 610 includes a source generator 612a and a bias generator 612b. The bias generator 612b contains multiple (in...) Figure 6 In the non-restrictive example, there are n power amplifier modules 614b1, ..., 614b (n-1) 614b n Source generator 612a outputs the source signal to matching and filtering network 618. The bias generator 614b includes power amplifier modules 614b1, ..., 614b. (n-1) 614b n The series configuration causes the series summation of the corresponding outputs to define the bias signal input to sensor 616b.

[0066] Figure 6 The source generator 612a shown represents Figure 4 Part or all of the generator 412a. Similarly, Figure 6 The bias generator 612b shown represents Figure 4 Source generator 612a and bias generator 612b may include part or all of the source generator 412b. Source generator 612a and bias generator 612b may include power supply 414, sensor 416, and controller 420; not all of these components are shown. Figure 6 In its subsequent accompanying figures, but Figure 4 The display shows that the various control states implemented by controller 420 can be achieved through independent controllers or through a common controller (e.g., Figure 4 The controller 420' is implemented in the controller. The sensor 616b can be configured as a voltage / current sensor or a directional coupler as described above, depending on the required parameters to be measured. Figure 6 Sensor 616b in the middle represents Figure 4 The sensor 616b is a portion or all of the sensor 416b. The sensor 616b transmits the bias signal to the matching and filtering network 618. In various configurations, the matching and filtering network 618 provides matching functionality as described above. In various configurations, the matching and filtering network 618 provides isolation between the source generator 612a and the bias generator 612b. In various configurations, the matching and filtering network 618 can be implemented as a separate matching network, for example... Figure 4 Matching networks 418a and 418b are included. The output of the matching and filtering network 618 is input to a load 632, which can be configured as described above.

[0067] Power amplifier modules 614b1, ..., 614b (n-1) 614bn The series configuration allows each power amplifier module 614b1, ..., 614b to be connected in series. (n-1) 614b n The outputs are added together to produce a combined output applied to sensor 616b. In various configurations, power amplifier modules 614b1, ..., 614b (n-1) 614b n Through a public or separate controller ( Figure 6 (Not shown in the image) is controlled. In a common controller configuration, control can be provided by any controller or a combination thereof, for example... Figure 4 The controllers are 420a, 420b, or 420'. In various configurations, each power amplifier module 614b1, ..., 614b... (n-1) 614b n Including the corresponding power amplifiers PA1, ..., PA (n-1) PA n And each corresponding power amplifier PA1, ..., PA (n-1) PA n Output three output voltages (+V) PA -V PA One of (0 volts).

[0068] In various configurations, the power amplifier modules 614b1, ..., 614b (n-1) 614b n Receive individual positive supply voltage signals V in + and negative supply voltage signal V in These two signals define the orbital voltage, where V in - This can be either chassis grounding or floating grounding. In V in + and V in The amplitude difference between the voltage signals determines +V. PA and V PA The amplitude of the output voltage. In various configurations, the power amplifier modules 614b1, ..., 614b... (n-1) 614b n The actuation is synchronized using a clock signal, such as Figure 6 As shown. In various configurations, the individual power amplifier modules 614b1, ..., 614b (n-1) 614b n The power amplifiers are either activated or deactivated, and the output voltage of each power amplifier is determined by the enable signal. The enable signal determines the power amplifier PA. x Whether it is actuated, and determines the power amplifier PA x The output voltage, i.e., +V PA -V PAOr 0 volts. In various configurations, although the enable signal is... Figure 6 The diagram shows each amplifier module 614b1, ..., 614b (n-1) 614b n It has a single input, but can actually represent multiple signals used to control individual power amplifiers (PAs). x Different components. In various configurations, the enable signal can be considered as the power amplifier PA. x The enable signals for each component will be described in more detail below.

[0069] In various configurations, for n power amplifier modules, the clock signal synchronizes the individual power amplifier modules 614b1, ..., 614b. (n-1) 614b n The operation of the power amplifier module 614b1, ..., 614b is determined by the enable signal, which in turn actuates the n power amplifier modules 614b1, ..., 614b. (n-1) 614b n Which modules are included and how are each power amplifier module 614b1, ..., 614b determined? (n-1) 614b n The output voltage. Synchronization provided by the clock signal allows the voltage signal to transition uniformly, thus providing an output voltage Vo with pulse state changes and typically vertical transitions. If a predetermined number of power amplifier modules are activated (e.g., m power amplifier modules, where m is less than n), the output of the bias generator 612b can be the maximum voltage (m + V). PA )) and minimum voltage (m(V) PA To achieve the maximum or minimum output voltage of the bias generator 612b, all n power amplifier modules can be actuated to output the maximum voltage (n(+V)). PA )) or minimum voltage (n(V) PA )).

[0070] Figure 7 A block diagram showing a portion of the bias generator 712, which represents Figure 6An extended block diagram of the bias generator 612b. An AC voltage signal Vac output from an AC power supply 770 is input to a converter 772. In various configurations, the AC voltage input to the converter 772 is a three-phase AC voltage signal Vac, ranging from 396V to 528V, but any range of AC voltage can be input to the converter 772. The converter 772 can be configured to include a filter network, an AC / DC converter (e.g., a rectifier), and a buck converter, and is therefore referred to as a filter, rectifier, and buck converter. In one configuration, the input AC voltage Vac is filtered against electromagnetic interference to smooth the input AC voltage signal. The filtered AC voltage is input to a rectifier, which converts the AC voltage to a DC voltage. The converted DC voltage is input to a buck converter, which converts the DC voltage to a lower DC voltage while selectively increasing the current to output a supply voltage Vdc. In various configurations, the filter elements of the converter 772 can be omitted depending on the input AC voltage signal from the AC power supply 770. Similarly, in various configurations, the buck converter in converter 772 can be omitted based on the AC voltage signal input to converter 772 and the required supply voltage Vdc output by converter 772.

[0071] Converter 772 outputs the DC supply voltage Vdc to PS driver module 774. PS driver module 774 converts the DC supply voltage Vdc into voltage Vs, which can be a square wave voltage with equal positive and negative amplitudes. In various configurations, voltage Vs can be symmetrical about 0 volts. Voltage Vs is input to each power amplifier PA1, ..., PA2. (n-1) PA n And each power amplifier PA1, ..., PA (n-1) PA n Controlled independently by the enable signal, outputting +V PA -V PA Or one of 0 volts. Power amplifier modules 614b1, ..., 614b (n-1) 614b n Each voltage output is synchronized by a clock signal and combined in series to output as follows: Figure 7 The bipolar output voltage Vo is shown. Therefore, the total value of the output voltage Vo depends on the actuated power amplifiers PA1, ..., PA2. (n-1) PA n The number of each power amplifier PA1, ..., PA (n-1) PA n Output (+V) PA -V PA (or 0 volts), and the supply voltage Vdc, which determines the amplitude of voltage Vs, and thus the +VPA -V PA Or an amplitude of 0 volts.

[0072] Figure 7 The bias generator 712 also includes a control section having a controller 778 and a modulation controller 780. The controller 778 receives signals from a sensor (e.g., Figure 6 The feedback from sensor 616b in the converter 772. Controller 778 uses one or both of feedforward control and feedback control to determine the supply voltage Vdc output by converter 772, the power amplifier modules 614b1, ..., 614b to be actuated. (n-1) 614b n The quantity, and each power amplifier module 614b1, ..., 614b (n-1) 614b n The expected voltage (+V) PA -V PA (Or 0 volts) output. Controller 778 communicates with converter 772 to control the buck converter of converter 772, thereby changing the supply voltage Vdc. Controller 778 also communicates with modulation controller 780 to generate clock and actuation signals for controlling the various power amplifier modules 614b1, ..., 614b (n-1) 614b n Power amplifiers PA1, ..., PA (n-1) PA n In various configurations, communication between controller 778 and converter 772 and modulation controller 780 can be achieved directly via electrical, optical, or wireless connections, or using busbars and various communication protocols. Modulation controller 780 communicates with each power amplifier module 614b1, ..., 614b. (n-1) 614b n Communication is used to control the individual power amplifiers PA1, ..., PA2. (n-1) PA n In various configurations, the modulation controller 780 supplies power to each power amplifier module 614b1, ..., 614b (n-1) 614b n Sending at least one signal, therefore, if there are n power amplifier modules, the modulation controller 780 will communicate with the corresponding power amplifier modules 614b1, ..., 614b through n different signal paths. (n-1) 614b n Communication. In various configurations, these signal paths can be independent bus connections or direct connections, including electrical, optical, or wireless connections. In other configurations, the modulation controller 780 uses n communication paths to transmit enable signals (which can be multiple command signals or each power amplifier PA). x(the individual switch drive signals) and a common clock communication path, wherein one output of the modulation controller 780 is connected to each power amplifier module 614b1, ..., 614b (n-1) 614b n In various configurations, the enable and clock signals use RS-485 buses and drivers with fiber optic isolation.

[0073] Figure 8 This diagram shows a partial schematic block diagram of power amplifier module 814, which can represent any power amplifier module 614b1, ..., 614b described herein. (n-1) 614b n The power amplifier module 814 includes a power amplifier PA. x This power amplifier PA x It has multiple switches Qa, Qb, Qc, Qd arranged in a full-bridge configuration, but it should be understood that the power amplifier PA x Other power amplifier configurations, such as a half-bridge, can also be used. Voltage Vs provides a fixed supply voltage to power amplifier module 814 relative to chassis ground and is applied to transformer 882 via a fusible link 881. Transformer 882 (T1) connects the converter and power driver (e.g., Figure 7 Isolation is provided between the converter 772 and PS driver module 774 and the power amplifier module 814. The output of transformer 882 is input to rectifier 884, which converts voltage Vs to DC voltage Vs. in +. In Figure 8 In the configuration shown, one terminal of rectifier 884 is connected to chassis ground, thereby converting the fixed supply voltage Vs to a floating voltage Vs. in Therefore, V in + and V in - Defines the power amplifier PA x The rail voltages of switches Qa, Qb, Qc, and Qd.

[0074] The power amplifier module 814 also includes a power amplifier control module 886. The power amplifier control module 886 receives a clock signal and an enable signal, and processes these signals to determine the power amplifier PA. xThe operation of switches Qa, Qb, Qc, and Qd is controlled by a power amplifier control module 886. The power amplifier control module 886 receives clock and enable signals and decodes them into drive signals φa, φb, φc, and φd, which are applied to the gates of the corresponding switches Qa, Qb, Qc, and Qd to control the actuation of each switch. In various configurations, the drive signals φa, φb, φc, and φd can be applied directly to the gates of the corresponding switches Qa, Qb, Qc, and Qd. In other configurations, φa, φb, φc, and φd are applied to the corresponding gate drive buffers or gate drive amplifiers 890a, 890b, 890c, and 890d. Gate drive amplifier 890a is powered by DC / DC converter 888a, and gate drive amplifier 890c is powered by DC / DC converter 888c. Gate drive amplifiers 890b and 890d are powered by a single DC / DC converter 888bd. Each DC / DC converter 888a, 888c, and 888bd receives an input voltage Vc. Each DC / DC converter and its corresponding gate drive amplifier are provided with a floating voltage supply to drive the corresponding switches Qa, Qb, Qc, and Qd according to drive signals φa, φb, φc, and φd.

[0075] As mentioned above, power amplifiers 614b1, ..., 614b (n-1) 614b n Output +V PA -V PA One of 0 volts or 1 volt. Power amplifier PA x Output voltage V PA It can be defined by formula (1): (1) Reference power amplifier module 814 power amplifier PA x Formulas (2), (3) and (4) define the output voltage V. PA : (2) (3) (4) In addition, power amplifier modules 614b1, ..., 614b (n-1) 614b n By using the V of a power amplifier module out The + terminal connects to the V terminal of the next power amplifier module. out - Terminals and series configuration. Power amplifier module group 614b1, ..., 614b (n-1) 614b n A V out- The terminal is connected to ground, and the group power amplifier modules 614b1, ..., 614b (n-1) 614b n A V out The + terminal is connected to the output Vo of the bias generator.

[0076] Power amplifier modules 814 are described herein as having a power amplifier control module 886 associated with each power amplifier module 814. In various configurations, each power amplifier module 614b1, ..., 614b... (n-1) 614b n A similar arrangement is possible. However, as mentioned above, the control provided by the power amplifier control module 886 can be distributed between the controller or the power amplifier control module 886 and... Figure 7 The modulation controller 780 or controllers 420a, 420b or 420' are connected. Therefore, in some configurations, the controller or power amplifier control module 886 is connected to... Figure 7 The modulation controller 780 or controllers 420a, 420b or 420' can be configured to directly generate drive signals φa, φb, φc, φd to the corresponding switches Qa, Qb, Qc, Qd according to a common clock. In this configuration, the power amplifier module 814 can be a conventionally configured power amplifier controlled according to the principles of this disclosure.

[0077] Figure 9 The display shows waveform 910, which describes voltage control using a nested sample-and-hold method to control the output voltage Vo and feedback signals input to various controllers for controlling the operation of the power amplifier in the power amplifier module. Waveform 910 includes a first view 912 and a second view 914. The second view 914 is an enlarged view of a slice of the first view 912 taken at time slice 916. Waveform 910 is shown as follows... Figure 7 and Figure 8 The voltage Vs shown is as follows: Figure 7 The Vo shown is from Figure 6 Sensor 616b or Figure 4 The current I measured by sensor 416b, and the sheath voltage V, which will be described further below. SH .

[0078] Figure 9This describes a sampling method including a first hold time and a second hold time for sampling, such that the sampling of the output voltage Vo occurs at an optimal position within the pulse or envelope and at an optimal position of the carrier signal modulated by the pulse or envelope. In various configurations, the modulation envelope or pulse 920 defines the shape of the output voltage or waveform Vo, as shown in the first view 912. The time slice 916 can be selected based on the position where the desired parameter needs to be sampled. For example, the first sampling position or hold time can be determined based on the fact that one or more parameters to be measured in the output voltage or waveform Vo reach a steady state after a sufficient time has elapsed since the rising (or falling) edge of the envelope or pulse 920.

[0079] Second view 914 shows the various periods or pulses 922a, 922b of the output voltage or waveform Vo. Time slice 918 in second view 914 determines the sampling position of the desired parameter within the periods or pulses 922a, 922b of the output voltage or waveform Vo. The second sampling position or second hold time is determined relative to the transition point of the rising or falling edge of the periods or pulses 922a, 922b. For example (but not limited to), the sampling position or second hold time can be determined based on the position where the parameter under test stabilizes after a sufficient time has elapsed since the rising (or falling) edge of the periods or pulses 922a, 922b. It should be noted that for etching of high aspect ratio features, the etching of high aspect ratio features occurs in the negative portion of the periods or pulses 922a, 922b (approximately -6000 kV in second view 914). Furthermore, processes such as low-energy polymer formation occur in the positive portion of the periods or pulses 922a, 922b.

[0080] In various configurations, the controller described herein can employ a combination of feedback, feedforward, or MIMO (Multiple-Input Multiple-Output) control schemes to control the DC voltage Vdc output by the converter 772 and Figure 7 Medium power amplifiers PA1, ..., PA(n-1), PAn (or Figure 6 The number of power amplifier modules 614b1, ..., 614b(n-1), 614bn) in the document is specified. Furthermore, other control schemes can be implemented using the various bias generator configurations described herein. For example, measurements or estimations can be performed. Figure 9The plasma sheath potential VSH is fed back to the controller described herein. Additionally, the apparent ion potential can be estimated as a feedback parameter. Examples of various methods for determining the sheath potential can be found in U.S. Patent Application No. 17 / 884,711, filed August 10, 2022, entitled “Non-Invasive IED Estimation for Pulsed-DC and Low Frequency Applications,” and U.S. Patent Application No. 18 / 158,164, filed January 23, 2023, entitled “Plasma Process Control of Multi-Electrode Systems Equipped with Ion Energy Sensors,” assigned to the assignee of this application and incorporated herein by reference.

[0081] Figure 10 Display and Figure 9 The waveform in the first view 912 is similar to the waveform 1010 used to describe multi-state pulse modulation. Multi-state pulse modulation has been discussed above. Figure 5 A general description has been provided, which also applies to Figure 10 The description. In Figure 10 In the diagram, the output voltage or waveform Vo is displayed as a polymorphic pulse or envelope 1012. The polymorphic pulse or envelope 1012 includes a first state 1014a and a second state 1016a. The polymorphic pulse or envelope 1012 also includes a first state 1014b and a second state 1016b. Each first state 1014a and first state 1014b can have different, variable periods and different, variable amplitudes. Similarly, each second state 1016a and second state 1016b can also have different, variable periods and different, variable amplitudes.

[0082] Current semiconductor etching and deposition processes require bias generators capable of producing complex amplitude modulation envelopes, such as... Figure 10 The polymorphic pulse described in [the text]. Figure 10 In a non-limiting example, the rectangular polymorphic pulse or envelope 1012 has a pulse repetition frequency of 10 kHz and a duty cycle of 25%. The peak-to-peak amplitude of the high-voltage pulse first states 1014a and 1014b is approximately 13 kV. The amplitude of the low-voltage pulse second states 1016a and 1016b is approximately 1 kV. As mentioned above, the low-voltage state is typically used for ion-assisted etching of materials such as silicon dioxide or silicon nitride. The high-voltage state can be used to promote polymer formation, thereby protecting sidewalls and improving control of the etching profile. As described above...Figure 5 The amplitude, frequency, and duty cycle of the pulse state can all be varied.

[0083] To control the amplitude of the polymorphic pulse, a component with the same amplitude as the polymorphic pulse can be inserted into the series connection of the power amplifier. Figure 6 Fixed step power amplifier modules 614b1, ..., 614b (n-1) 614b n (or Figure 7 The power amplifiers PA1, ..., PA in the middle (n-1) PA n Additional power amplifier modules with different supply voltages. These additional power amplifier modules can be configured to generate power between V... PAx The output voltage Vo is between fixed step size multiples. Figure 11 An exemplary power generation system 1110 is shown, which includes a source generator 1112a, a bias generator 1114b, a sensor 1116b, a matching and filtering network 1118, and a load 1132, all of which operate in a manner similar to the generator, bias generator, sensor, matching and filtering network, and load described above and further herein. Figure 11 In the configuration, the bias generator 1114b includes a fixed step generation section 1114. F and variable step generation part 1114 V Fixed step generation section 1114 F Including power amplifier modules 1114b1, ..., 1114b (n-1) 1114b n Among them, power amplifier module 1114b (n-1) Not in Figure 11 As shown, but understood, power amplifier module 1114b (n-1) Included in a series connection. As mentioned above, regarding power amplifier modules 614b1, ..., 614b (n-1) 614b n and (power amplifiers PA1, ..., PA) (n-1) PA n ), power amplifier modules 1114b1, ..., 1114b (n-1) 1114b n It is configured with three outputs. As mentioned above, the voltage +V PA -V PA The voltage Vs varies from 0 volts to 0 volts depending on the supply voltage Vdc, which in turn determines the track voltage Vs. in + / V in - (where V) in - Connect to chassis ground in the various configurations described in this article).

[0084] Variable step generation section 1114 V Includes one or more power amplifier modules 1114b Vx and 1114b Vy Each of them contains a power amplifier PA Vx and PA Vy .Although Figure 11 Only two power amplifier modules 1114b are shown in the image. Vx and 1114b Vy However, it should be understood that the plurality may include two or more power amplifier modules 1114b. Vx and 1114b Vy Power amplifier module 1114b Vx and 1114b Vy Each is determined by the track voltage V x + / V x -and V y + / V y -Driven by these rail voltages, which differ from those applied to power amplifier modules 1114b1, ..., 1114b (n-1) 1114b n orbital voltage V in + / V in Therefore, power amplifier module 1114b Vx Output +V PAx -V PAx The voltage is one of the voltages, or zero, depending on the states of its switches Qa, Qb, Qc, and Qd. Similarly, power amplifier module 1114b Vy Output +V Pay -V Pay Or a voltage in the zero voltage range, depending on the states of its switches Qa, Qb, Qc, and Qd. Rail voltage V x + / V x -and V y + / V y - Can be generated by filters, rectifiers, buck converters, and power driver pairs, for example Figure 7 The intermediate frequency converter 772 includes filters, rectifiers, and buck converters, as well as a PS driver module 774, which are configured to output different supply voltages Vdc and Vs.

[0085] As a non-limiting example, in the first pulse state (state 1), the power amplifier module 1114b Vx and 1114b Vy When disabled, the output voltage is determined by the number of enabled fixed-step modules, specifically the +V output voltage. PA -V PAThe power amplifier module 1114b is enabled in the second pulse state (state 2), determined by either a 0-volt drive signal or the supply voltage Vdc. Vx To add a connector to each power amplifier module 1114b1, ..., 1114b (n-1) 1114b n The first variable voltage has a different output voltage. In the third pulse state (state 3), the power amplifier module 1114b can be disabled. Vx and enable power amplifier module 1114b Vy To add a second variable voltage, the second variable voltage being different from that of each power amplifier module 1114b1, ..., 1114b (n-1) 1114b n The output voltage is also different from that of the power amplifier module 1114b. Vx Output voltage. Power amplifier modules 1114b1, ..., 1114b can also be added as needed. (n-1) 1114b n This is to further control the output voltage of states 2 and 3.

[0086] As needed, part 1114 can be generated by actuating an appropriate number of fixed steps. F The power amplifier modules 1114b1, ..., 1114b(n-1), 1114bn and the variable stepping generation section 1114 V The power amplifier module is used to add more states. Although the fixed-step generation section 1114... F Only two power amplifier modules 1114b are shown in the image. Vx and 1114b Vy However, the fixed step generation part 1114 F It may include one or more power amplifier modules. Additionally, a fixed-step generation section 1114... F The first group of multiple power amplifier modules can be configured to produce the same output voltage, and the fixed step generation section 1114 F The second group of multiple power amplifier modules can be configured to produce the same output voltage, wherein the output voltage of the first group of multiple power amplifier modules is different from the output voltage of the second group of multiple power amplifier modules.

[0087] Figure 12 An exemplary power generation system 1210 is shown, which includes a source generator 1212a, a bias generator 1214b, a sensor 1216b, a matching and filtering network 1218, and a load 1232, all of which operate in a manner similar to the generator, bias generator, sensor, matching and filtering network, and load described above and further herein.Figure 12 In the configuration, the bias generator 1214b includes a fixed step generation section 1214. F and variable step generation part 1214 V Fixed step generation section 1214 F Includes power amplifier module 1214 b1 ... 1214 b(n-1) 1214 bn Among them, power amplifier module 1214 b(n-1) exist Figure 12 Not shown in the image, but it should be understood that the power amplifier module 1214 b(n-1) Included in a series connection. See above regarding power amplifier module 614. b1 ... 614b (n 1) 614 bn (or Figure 7 The power amplifiers PA1, ..., PA in the middle (n-1) PA n The description of power amplifier module 1214 is as follows. b1 ... 1214 b(n-1) 1214 bn Configured to output three voltages +V PA -V PA One of 0 volts, 1, and 0 volts. As mentioned above, voltage +V PA -V PA The voltage at 0 volts will vary depending on the supply voltage Vdc, which determines the voltage Vs, and the voltage Vs determines the track voltage V. in + / V in - (where V) in - Connected to chassis ground in the various configurations described herein).

[0088] Variable step generation section 1214 V Includes one or more power amplifier modules 1214b Vin / 2 1214b Vin / 4 ... 1214b Vin / 2 n Each of them contains a power amplifier PA W1 PA W2 PA W(m-1) (not shown in the diagram), ..., PA W(m) .exist Figure 12 In the configuration, power amplifier module 214b Vin / 2 1214b Vin / 4 and 1214b Vin / 2 nConfigured to operate at the corresponding track voltages +Vin / 2, -Vin / 2; +Vin / 4, -Vin / 4; ...; +Vin / 2 n -Vin / 2 n The following operations are applied to power amplifier module 1214. b1 ... 1214 b(n-1) 1214 bn orbital voltage V in + / V in - binary fractions to generate by power amplifier module 1214 b1 ... 1214 b(n-1) 1214 bn Output binary step +V PA and -V PA Voltage. Therefore, power amplifier module 1214b Vin / 2 Output voltage +V PAx / 2、-V PAx The value is either 2 or 0, depending on the actuation of its switches Qa, Qb, Qc, and Qd. Similarly, power amplifier module 1214b Vin / 2 Output voltage +V PAx / 4、-V PAx One of / 4 or more depends on the actuation of its switches Qa, Qb, Qc, and Qd. Similarly, power amplifier module 1214b Vin / 2 n Output voltage +V PAx / 2 n -V PAx / 2 n One of 0 or 0, depending on the actuation of its switches Qa, Qb, Qc, Qd. Rail voltage +Vin / 2, -Vin / 2; +Vin / 4, -Vin / 4; ...; +Vin / 2 n -Vin / 2 n It can be generated by separate filters, rectifiers, buck converters, and power drivers, for example, Figure 7 The converter 772, including its filter, rectifier, buck converter, and PS driver module 774, is configured to output different supply voltages Vdc and AC voltages Vs. Variable step generation section 1214 V The binary implementation of which is described in U.S. Patent Application No. 63 / 441,616, filed January 27, 2023, entitled “Pulsed RF Plasma Generator With High Dynamic Range,” has been assigned to the assignee of this application and is incorporated herein by reference.

[0089] Figure 12 The operation of the power generation system 1210 shown is similar to that of the power generation system described above, which has a fixed-step generation section and a variable-step generation section. The bias generator 1214b of the power generation system 1210 can be configured according to… Figure 11 The method described above controls the voltage, wherein the variable step size is voltage +V. PA and -V PA The binary variable step size.

[0090] refer to Figure 8 and Figures 11 to 13 Transformer 882 can be configured to provide a voltage drop between the primary winding that receives Vs and the secondary winding that generates the output voltage to rectifier 884. Therefore, in addition to providing isolation between the circuitry that generates Vs (e.g., converter 772 and PS driver module 774), transformer 882 can also provide voltage control over the input voltage applied to transformer 882. In various configurations, transformer 882 can be configured to provide a voltage boost between the primary winding that receives Vs and the secondary winding that generates the output voltage to rectifier 884.

[0091] As a non-restrictive example, see reference. Figure 11 It can be based on the voltage Vs output by the PS driver module 774 and the input to each power amplifier PA1, ..., PA2. (n 1) PA Vx PA Vy The voltage Vs generates one or more rail voltages or voltages V. in + / V in -、V x + / V x -、V y + / V y - By changing the turns ratio of the primary and secondary coils of the 882, the input to each power amplifier PA1, ..., PA2 can be changed accordingly. (n 1) PA Vx PA Vy The voltage Vs. As mentioned above, refer to Figure 11 Rail voltage or voltage V in + / V in -、V x + / V x -、V y + / V y - It can be generated by filters, rectifiers, buck converters, and power driver pairs, for example Figure 11The filter, rectifier, and buck converter of the intermediate frequency converter 772, as well as the PS driver module 774, are configured to output different respective supply voltages Vdc and generated voltages Vs. Furthermore, in various configurations, the first method described above for generating voltage Vs can be used to generate voltage Vs input to the first power amplifier module, while another method described above for generating voltage Vs can be used to generate voltage Vs input to the second power amplifier module.

[0092] Similarly, and as a non-restrictive example, see [reference]. Figure 12 It can output from and input to various power amplifiers PA1, ..., PA based on the PS driver module 774. (n-1) P AW1 P AW2 P AW(m1) P AW(m) The voltage Vs generates one or more rail voltages or voltages V. in +、V in -;+Vin / 2,-Vin / 2;+Vin / 4,-Vin / 4;…;+Vin / 2 n -Vin / 2 n By changing the turns ratio of the primary and secondary coils of the 882, the input to each power amplifier PA1, ..., PA2 can be changed accordingly. (n 1) PA W1 PA W2 PA W(m-1) PA W(m) The voltage Vs. As mentioned above, refer to Figure 12 Voltage +Vin / 2, -Vin / 2; +Vin / 4, -Vin / 4; ...; +Vin / 2 n -Vin / 2 n It can be generated by separate filters, rectifiers, and buck converters, as well as power driver pairs, for example... Figure 7 The filter, buck converter, and power driver pair of the intermediate frequency converter 772 are configured to output different supply voltages Vdc and current voltages Vs. Furthermore, in various configurations, the first method described above for generating voltage Vs can be used to generate voltage Vs input to the first power amplifier module, while another method described above for generating voltage Vs can be used to generate voltage Vs input to the second power amplifier module.

[0093] Figure 13An exemplary power generation system 1310 is shown, comprising a source generator 1312a, a bias generator 1314b, a sensor 1316b, a matching and filtering network 1318, and a load 1332, all of which operate in a manner similar to the source generator, bias generator, sensor, matching and filtering network, and load described above and further herein. Figure 13 In the configuration shown, the bias generator 1314b includes a fixed step generation section 1314. F and variable step generation part 1314 V As described above, for power amplifier modules 614b1, ..., 614b (n-1) 614b n (as well as Figure 7 The power amplifiers PA1, ..., PA in the middle (n-1) PA n ), power amplifier modules 1314b1, ..., 1314b (n-1) 1314b n Configured to output three voltages +V PA -V PA One of 0 volts or 0 volts. Fixed step generation part 1314 F Including power amplifier modules 1314b1, ..., 1314b (n-1) 1314b n Among them, the power amplifier module 1314b (n-1) exist Figure 13 Not shown in the image. However, it should be understood that the power amplifier module 1314b... (n-1) Included in series connection. Power amplifier modules 1314b1, ..., 1314b (n-1) 1314b n Configured to output three voltages +V PA -V PA One of 0 volts or 1 volt. As mentioned above, voltage +V PA -V PA The voltage, or 0 volts, will vary depending on the driving voltage Vdc. The driving voltage Vdc determines the voltage Vs, and the voltage Vs determines the track voltage V. in + / V in - (where V) in - Connected to chassis ground in the various configurations described herein).

[0094] Variable step generation section 1314 V Includes power amplifier module 1314b PWL This power amplifier module has a power amplifier PA PWL .exist Figure 13 In the configuration shown, power amplifier module 1314bPWL It is configured to output a piecewise linear voltage waveform. This piecewise linear voltage waveform can be rapidly adjusted to form a portion 1314 generated by a fixed step. F The output bias waveform. Figure 13 The operation of the power generation system 1310 shown is similar to that of the power generation system described above, which has a fixed-step generation section and a variable-step generation section. The bias generator 1314b of the power generation system 1310 can be controlled as described above, and its variable step size is determined in a piecewise linear manner. It should be noted that the power amplifier module 1314b... PWL The output allows the generation of a ramp signal using a DC amplifier, and in this disclosure, its output should be considered a DC signal. (Reference: Piecewise linear power amplifier module 1314b) PWL For instructions on operation, please refer to US Patent No. 10,396,601 (non-limiting example) cited in this article.

[0095] Figure 14 An exemplary power generation system 1410 is shown, comprising a source generator 1412a, a bias generator 1414b, a sensor 1416b, a matching and filtering network 1418, and a load 1432, all of which operate in a manner similar to the source generator, bias generator, sensor, matching and filtering network, and load described above and further herein. Figure 14 In the configuration shown, the bias generator 1414b may include fixed step generation sections 1414b1, ..., 1414b (n-1) 1414b n And the variable step generation part (not shown). Figure 14 The configuration makes the output voltage Vo a unipolar voltage, while the output of the power generation system described above is a bipolar voltage. Figure 14 The device includes a DC charge pump 1492 that converts a bipolar voltage Vo output from a bias generator into a unipolar voltage input to a sensor 1416b. The DC charge pump 1492 includes a capacitor 1494 connected in series between the power generation module 1414b1 and the sensor 1416b, and a diode 1496 with its cathode connected between the capacitor 1494 and the sensor 1416b and its anode grounded. The diode 1496 can be referred to as a "power-stealing diode." This connection of the diode 1496 provides a positive unipolar output voltage Vo. If the connection of the diode 1496 is reversed, with its anode connected between the capacitor 1494 and the sensor 1416b and its cathode grounded, the unipolar output voltage becomes negative.

[0096] In the power generation system described herein, the DC square wave output voltage Vo transitions between a first voltage and a second voltage, and it is generally desirable that this transition occur relatively quickly. When a DC square wave is supplied to a mismatched load, reflections from the load can cause ringing. Therefore, the fast edges required for the pulse biasing application described herein can lead to significant waveform distortion and ringing. One way to mitigate ringing is to significantly shorten the length of the output cable between the bias generator and the electrostatic chuck / wafer in the load. This can be achieved through a dual-box design that places the AC front end, power supply, and controller in a rack-mounted housing away from the power amplifier module, while placing the power delivery switching elements closer to the load. A high-speed communication link can be used to collect feedback and control the power amplifier actuator.

[0097] Figure 15 An exemplary power generation system 1510 is shown, which reduces waveform distortion and ringing by placing the power amplifier module close to the load and placing the AC front end, power supply and controller away from the load. Figure 15 The configuration shown also has another advantage: it reduces the space required for the power generation system 1510 during manufacturing. In various configurations, the power amplifier module located closer to the load requires less space than the AC front end, power supply, and controller located further away from the load.

[0098] Figure 15 The system includes a remote module 1512 and a near-end module 1514 in the power generation system 1510. The remote module 1512 is placed away from the load, typically located away from the semiconductor manufacturing space, as semiconductor manufacturing space is generally considered a costly area. On the other hand, the near-end module 1514 is placed close to the load, thus within the power amplifier modules (labeled PA1, ..., PA1 in the figure). (n-1) PA nThe cable length between the components can be significantly shorter than in conventional power generation configurations. The remote module 1512 includes a filter, rectifier, and buck converter 1572, an internal management module 1520, a power link 1522, and a controller 1524. The filter, rectifier, and buck converter 1572 operate as described above to generate a voltage signal Vdc. The internal management module 1520 manages the internal management functions of the power generation system 1510. These internal management functions can generally be described as control functions not directly related to power transmission. The controller 1524 manages the operation of the remote module 1512, including providing control signals directly or indirectly to the filter, rectifier, and buck converter 1572. The power link 1522 receives the DC voltage Vdc from the filter, rectifier, and buck converter 1572. The power link 1522 also receives control signals from the controller 1524. The power link 1522 communicates with the power link 1528 of the near-end module 1514. Link 1526 transmits power, data and sensor signals between power link 1522 and power link 1528.

[0099] Control and data signals are transmitted to the near-end module 1514 via power link 1528. The near-end module 1514 includes a PS driver 1574, which operates in a manner similar to... Figure 7 The PS driver module 774 is similar to that in the previous module. The near-end module 1514 also includes a serial interface controller 1530, which operates similarly to the modulation controller 780. The modulation controller 780 receives data and control signals through the power link 1528 and generates clock and enable signals, which are sent to the power amplifier modules PA1, ..., PA2 respectively. (n-1) PA n .from Figure 15 As can be seen from the configuration of the power generation system 1510 shown, the switching elements need to be placed close to the load, while other elements can be placed far away from the load.

[0100] Figure 16 A pair of waveforms, 1610a and 1610b, are displayed to illustrate multiple cycles of the output voltage Vo, used to describe two methods of shutting down or substantially reducing the output of a power generator (such as bias generator 612b). Waveform 1610a shows the output voltage Vo over multiple cycles 1612a. (As mentioned above...) Figure 6 As described, each power amplifier module 614b1, ..., 614b (n-1) 614b n Produces approximately equal output voltages +V PA -V PAOr 0 volts. For bias generator 612b, when off or substantially reduced output, the output voltage Vo drops from slightly above 0.0 kV to approximately 4.5 kV. As shown in region 1614b, the output voltage Vo exhibits a sawtooth oscillation between -4.5 kV and -4.25 kV. Each power amplifier module 614b1, ..., 614b (n-1) 614b n Produces approximately equal output voltages +V PA -V PA Or 0 volts. When the power amplifier modules 614b1, ..., 614b (n-1) 614b n When closed or substantially reduced simultaneously, the pattern of region 1614a will appear.

[0101] Waveform 1610b displays the output voltage Vo over multiple cycles of 1612b. (As mentioned above...) Figure 11 , 12 As described in 13, each bias generator 1114b, 1214b and 1314b includes its own fixed step generation section 1114. F 1214 F and 1314 F and the variable step generation section 1114 V 1214 F and 1314 V As mentioned above... Figure 11 , 12 As described in 13, the fixed step generation part 1114 F 1214 F and 1314 F Each power amplifier PA1, ..., PA in the power amplifier module (n-1) PA n Produces approximately equal output voltages +V PA -V PA Or 0 volts. Each variable step generation section 1114 V 1214 F and 1314 V Power amplifier PA Vx With PA Vy PA W1 PA W2 PA W(m-1) ..., PA W(m) PA PWL The generated output voltage and each fixed step generation section 1114 F 1214 F and 1314 FThe output voltage produced by the power amplifier modules differs. Furthermore, the variable step power generation section 1114... V 1214 F The output voltage generated by each power amplifier module in the variable step power generation section may also be different from the output voltage generated by other power amplifier modules in the variable step power generation section.

[0102] Once turned off, as shown in region 1614b, the output voltage Vo exhibits a stepped decay. Region 1614b of waveform 1610b shows stepped steps 1616b', 1616b", and 1616b'". The number of stepped steps varies, as described below. Once turned off, the fixed step generation section 1114... F 1214 F and 1314 F The power amplifier module is disabled or substantially reduced. Simultaneously, once shut down, the variable stepper generator section 1114... V 1214 V and 1314 V The power amplifier module is actuated to provide the stepped waveform shown in region 1614b. In different configurations, the fixed step generation section 1114 F 1214 F and 1314 F Each can contain a predetermined number of power amplifier modules. The output voltages of each activated power amplifier module are summed in series to produce their respective fixed output voltage. In different configurations, the variable step generation section 1114 V 1214 V and 1314 V It includes a predetermined number of second power amplifier modules. Furthermore, in different configurations, there is a variable stepping generation section 1114. V 1214 V and 1314 V The power amplifier module is actuated to provide a stepped voltage over a predetermined time period. In different configurations, this predetermined time period can be generated from a fixed-step generation section 1114. F 1214 F and 1314 F Calculations begin when the power module stops operating. In this way, the variable stepping generator section 1114 is selectively actuated. V 1214 V and 1314 V The power amplifier module can generate a quantization ramp, thereby enabling or disabling the fixed step generation section 1114. F 1214 F and 1314 FWhen using the power module, the voltage is gradually reduced. In the various configurations described above, the output voltage Vo can be adjusted based on multiple inputs. As mentioned above, in various configurations, the fixed step generation section 1114... F 1214 F and 1314 F The resulting output voltage varies depending on one or both of the voltage Vs and the turns ratio of transformer 882. For example, voltage Vs can serve as an input, determining the output voltage of each power amplifier module. Furthermore, the turns ratio of transformer 882 also determines the output voltage of each power amplifier module. Moreover, the choice of voltage Vs, combined with the turns ratio of transformer 882, can further determine the output voltage of each power amplifier module.

[0103] As described above, in various configurations, the variable step generation section 1114 V 1214 V and 1314 V It can accept different voltages Vs, which are generated based on different combinations of converter 772 and PS driver module 774, thus producing different output voltages. Furthermore, the turns ratio of transformer 882 also determines the output voltage of each power amplifier module. Further, the selection of voltage Vs, combined with the turns ratio of transformer 882, further determines the variable step generation section 1114. V 1214 V and 1314 V The output voltage of each power amplifier module. Furthermore, it should be understood that, although... Figure 16 The stepping mode of waveform 1610b has been described in conjunction with the descending stepping mode, but the ascending stepping mode can also be implemented in a similar manner.

[0104] Figure 17 Includes Figures 1 to 15 Various components. The control module 1710 may include a power generation module 1712, which includes an amplitude control module section 1714, a duty cycle or frequency control module section 1716, and an impedance matching module 1718. The amplitude control module section 1714 includes a DC voltage generator module 1720, V... PAxOutput selection module 1722 and clock module 1724. Frequency control module section 1716 includes frequency adjustment module 1726 and frequency update module 1728. In various configurations, control module 1710 includes one or more processors that execute program code related to module sections or modules 1710, 1712, 1714, 1716, 1718, 1720, 1722, 1724, 1726, and 1728. The operation of module sections or modules 1710, 1712, 1714, 1716, 1718, 1720, 1722, 1724, 1726, and 1728 is described below with reference to... Figure 18 and Figure 24 The method is described.

[0105] Regarding controllers 120a, 120b, and 120' and Figures 1 to 15 For further definition structures of other controllers described herein, please refer to the following description. Figure 18 and Figure 24 The flowchart and the definition of the term "module" provided below are also included. The system disclosed herein can be operated using various methods, paradigms, and control system approaches, which have already been demonstrated. Figure 1 This is explained in the text. Although the following operations are mainly for... Figure 1 The implementations are described herein, but these operations can be easily modified to suit other implementations of this disclosure. These operations can be performed iteratively. Although the following operations are shown and primarily described as being performed sequentially, one or more of the following operations can be performed simultaneously with one or more other operations.

[0106] Figure 18 The display (in a non-restrictive example) is used for... Figures 1 to 15 The flowchart illustrates a control system 1810 for voltage control in a power delivery system. Control begins at startup / initialization block 1812. Control proceeds to block 1814, where a command output voltage is received. Control proceeds to block 1816, where the supply voltage Vdc and the number and specific power amplifiers required to generate the command output voltage are determined. Control proceeds to block 1818, where enable and clock signals are determined to control the power amplifiers determined at 1816, thereby generating the command output voltage. Control proceeds to block 1820, where an output voltage is generated based on clock and enable signals for each power amplifier. Control proceeds to block 1822, where it is determined whether the command output voltage has been reached. If the set output voltage has not been reached, control proceeds to block 1816 and repeats this procedure to update the power amplifier control signals, causing the output voltage to approach the set value. If the set output voltage has been reached, control proceeds to block 1824, ending the current process, but continues to monitor the output voltage.

[0107] Plasma loads are highly nonlinear and prone to rapid load transients during plasma ignition, arc discharge, and pulses. The bias generator described in this disclosure protects the generator, plasma chamber, and wafer from load mismatch by detecting rapid changes in one or more of the load impedance, output voltage, and / or output current. Furthermore, the generator described in this disclosure can also be configured to protect the circuitry from load mismatch by alternating between the power amplifiers of the fixed and variable power generation sections, thereby preventing overheating. The alternation occurs at the zero-crossing point of the power amplifier module output waveform and does not interfere with the overall output of the bias generator. In the above generator, the fixed step generation section 1114... F (For example, not a limiting example) described as power amplifier modules 1114b1, ..., 1114b (n-1) 1114b n Similarly, part 1114 is generated with variable steps. V For example (but not limited to), this generator includes a pair of power amplifier modules 1114b Vx and 1114b Vy However, the number of modules can be more or less. The rotation method for power amplifier modules also applies to the variable stepper generator 1114. V The power amplifier module.

[0108] In various configurations, the total output voltage can be limited to a value less than the total output voltage that the power amplifiers can output. For example, if n = N + A, then the fixed step generation section 1114... F It can contain (N+A) power amplifiers, but the fixed-step generation section 1114 F The power amplifiers in this configuration can only be activated at a maximum of N at a time. In this configuration, the operating time of (N+A) power amplifiers can be rotated, ensuring that all (N+A) power amplifiers have on-time and off-time to prevent overheating. In this configuration, the rotation occurs at the zero-crossing point of the power amplifier output module waveform to avoid interfering with the overall output of the power generation system 1110. Similarly, the variable step generation section 1114... V For example, it includes a pair of power amplifier modules 1114b Vx and 1114b Vy However, the actual number of modules included may be more or fewer. A similar method of rotating power amplifier modules can be applied to the variable step generation section.1114 V The power amplifier module.

[0109] In conventional phase-shifted Class D power amplifiers (such as the power amplifiers described herein), a typical failure is a short circuit to ground in the main power amplifier unit, leading to runaway and power loss. When such an event occurs during wafer fabrication, the wafer may need to be scrapped. In the RF plasma generator of this disclosure, increasing the number of independent and identical amplifiers improves the fineness of redundancy. For example, the aforementioned (N+A) power amplifiers constitute an additional Class A power amplifier, allowing it to be removed from rotation if one power amplifier fails. Therefore, if one power amplifier fails, the remaining amplifiers will not be affected. In various configurations, each power amplifier can be equipped with a fault sensor to provide fault indication when the corresponding power amplifier fails. Furthermore, in various configurations, each power amplifier is individually equipped with a fuse to isolate it from the main power supply in the event of a short circuit. This ensures that the voltage supply to other RF power amplifiers is not interrupted. In addition, at the next zero-crossing point, the faulty power amplifier is identified and replaced with a backup power amplifier to minimize output interference.

[0110] The RF power generator described herein offers one or more of the following advantages. The generator addresses several challenges faced by bias generators used in high aspect ratio (HAR) etching. Due to its rectangular envelope and arbitrary bias waveform shaping capabilities, the generator improves the extension of IEDF. The generator further reduces the size and weight of the bias generator assembly mounted in the chamber. Furthermore, the generator improves power conversion efficiency, thereby reducing the cost of ownership (COO).

[0111] The power generator described in this paper has higher power density because it can use a non-isolated fixed-voltage buck regulator to generate a DC voltage Vdc. This voltage regulator is smaller than an isolated agile rail voltage supply. The RF power generator described in this paper has superior pulse performance because it can generate narrower pulses, a higher peak-to-average power ratio, and a more complex envelope, thanks to a faster actuation rate. The RF power generator described in this paper has higher power efficiency during multi-stage pulses because the power amplifier modules are either on or off, and no power is wasted in the low-power portion of the pulse envelope because unnecessary power amplifiers are disabled. The RF power generator described in this paper enables power changes to be consistent with the pulse state because the power amplifiers themselves actuate amplitude changes consistent with the pulse state changes, thereby improving plasma stability in pulse mode. The RF power generator described in this paper has a fast response time. The fast response time stems from a constant voltage supply powering all or part of the power amplifiers. This eliminates the power control loop and the resulting response time, and eliminates the turn-on delay used in other designs. The series-combined power amplifiers are synchronously turned on / off in each RF clock cycle, generating an output quantization step voltage.

[0112] In the above Figure 16 In the various configurations shown, particularly for the pulse or period 1612b, stepped steps 1616b', 1616b" and 1616b"' are typically used for slope compensation. By providing stepped steps 1616b', 1616b" and 1616b"' to control the slope of the falling (or rising) waveform (e.g., the pulse or period 1612b), the slope of the transition can be controlled according to various customer requirements. Furthermore, in the various configurations, positive or negative transitions of the pulse or period 1612b may cause ringing or overshoot during DC voltage stabilization. In various applications, ringing or overshoot may be undesirable.

[0113] Figure 19 Waveform 1910 is displayed, and its structure is roughly similar to that of waveform 1610b. Waveform 1910 contains multiple pulses or periods 1912, the shapes of which are similar to... Figure 16 The pulses or periods in 1612b are roughly similar. For example... Figure 19 As shown, during the negative transition of the approximately constant negative DC voltage 1914 with a period of 1912, the negative transition of the approximately constant negative DC voltage 1914 occurs within a shorter or more compressed time interval. And... Figure 16 The pulse or period 1612b in the middle exhibits a stepped stepping on region 1614b, indicating that the control, for example, the variable stepping generation part 1114, is in a stepped position. V 1214 V and 1314 VThe power amplifier modules have a longer duration, and these modules are actuated to further negatively increase the voltage, thereby providing the waveform in region 1614b. As described above, if it is necessary to convert the output voltage Vo to a negative value, the fixed-step generation section 1114 is actuated. F 1214 F and 1314 F The power amplifier module outputs a corresponding negative output voltage, such as -V mentioned above. PA This conversion can be achieved by actuating part or all of the power amplifier modules to output a negative output voltage (e.g., -V). PA This is achieved by actuating the corresponding variable step generation part 1114. The stepped stepping mode in region 1614b is achieved by actuating the corresponding variable step generation part 1114. V 1214 V and 1314 V The power amplifier module outputs a negative output voltage (-V) PA This is achieved by further negatively increasing the output voltage Vo. Although the method described above for waveform 1610b can provide ideal slope compensation, it is achieved by timing-actuated bias generator 612b or fixed-step generation section 1114. F 1214 F and 1314 F The negative output voltage (-V) of one or more power amplifier modules PA ) or positive output voltage (+V PA This can further improve ringing and overshoot issues. In various other configurations, the variable stepping generation section 1114 is activated via timing actuation. V 1214 V and 1314 V The negative output voltage (-V) of one or more power amplifier modules PA ) or positive output voltage (+V PA This can further improve ringing and overshoot issues. In various other configurations, the negative output voltage (-V) of one or more power amplifier modules (such as the fixed-step generation section and the variable-step generation section mentioned above) is actuated at a time. PA ) or positive output voltage (+V PA This can further improve ringing and overshoot issues. In various configurations, the negative output voltage (-V) PA The application of ) can be called a negative period or pulse, while the positive output voltage (+V) PA The application of ) can be called a positive period or pulse.

[0114] refer to Figure 20 Waveform section 2010 shows waveform pulse section 2012, which is an enlarged view of a portion of waveform 1910. Waveform pulse section 2012 includes negative transition section 2012.NEG Middle part 2012 INT and roughly constant or DC portion 2012 DC The middle part, 2012 INT Includes different time intervals Δx1, Δx2, ..., Δx (m-1) Δx m The stepped phase. In various configurations, m can be equal to or less than the number of power amplifier modules in the power generation system, the number of fixed power amplifier modules in the fixed-step generation section, the number of variable power amplifier modules in the variable-step generation section, or some combination thereof. Similarly, the intermediate section 2012 INT Including different voltage intervals Δy1, Δy2, ..., Δy (m-1) Δy m The stepped phase. In various configurations, m can be equal to or less than the number of power amplifier modules in the power generation system, the number of fixed power amplifier modules in the fixed step generation section, the number of variable power amplifier modules in the variable step generation section, or some combination thereof.

[0115] Through with Figure 16 Compared to region 1614b, region 1614b essentially covers the time period between the negative transition or the start of the negative cycle of the first pulse and the positive transition or the start of the positive cycle of the subsequent pulse. On the other hand, waveform pulse portion 2012 only covers a relatively small portion of the time period between the start of the negative transition of the first pulse and the start of the positive transition of the subsequent pulse.

[0116] For example (not a limiting example), the transition to a negative period begins at the initial time t. s Terminated at end time t e .exist Figure 16 In the middle, at the starting time t s and end time t e The time interval between them is approximately equal to most of the negative period of the pulse or period 1612b; in Figure 19 and Figure 20 In the middle, at the starting time t s and end time t e The time interval between them is significantly smaller. In some configurations, Figure 19 In the initial time t s and end time t e The time interval between them may be almost imperceptible. In various configurations, due to the inherent time required for the circuit to respond to changes in voltage and current, the middle part of the pulse or period 1912 2012 INT It appears to be linear. Furthermore, it should be understood that the negative transformation part 2012... NEGThis indicates that one or more power amplifier modules in the power generation system are actuated to output a negative output voltage, such as -V. PA . Figure 20 The time intervals Δx1, Δx2, ..., Δx shown are: (m-1) Δx m Used to indicate a fixed or variable phase, time delay, or time lag between the deactivation and activation of power amplifier modules in a power generation system. In various configurations, one or more power amplifier modules may be turned off within a time interval Δx.

[0117] Figure 21 The display shows a waveform that includes a first waveform 2118 and a second waveform 2120. The first waveform 2118 typically represents the actuation or deactivation of the power amplifier module, which can be controlled by an input to... Figure 8 The clock signal control of the medium power amplifier control module 886. The second waveform 2120 typically represents the output voltage Vo as described above. The first waveform 2118 comprises several individual first waveforms 21181, 21182, ..., 21186, which represent the selected power amplifier module in the power generation system at a negative output voltage (-V). PA ) and positive output voltage (+V PA The instruction conversion between the first waveforms 21181, 21182, ..., 21186 typically overlaps and presents as a single first waveform 2118. During the positive transition of the first waveforms 21181, 21182, ..., 21186, the voltage of the second waveform 2120 becomes negative; during the negative transition of the first waveforms 21181, 21182, ..., 21186, the voltage of the second waveform 2120 becomes positive. It should be understood that other relationships may exist between the first waveform 2118 and the second waveform 2120. Figure 21 The purpose is to demonstrate an exemplary relationship between the actuation of a selected power amplifier module and the output voltage Vo.

[0118] Figure 21 The second waveform 2120 in the diagram shows the overshoot and ringing phenomena of voltage Vo during the positive and negative transitions. For example, during the positive transition of the second waveform 2120, the overshoot and ringing of voltage Vo are shown at 2122. During the negative transition of the second waveform 2120, the overshoot and ringing of voltage Vo are shown at 2124.

[0119] Figure 22 The display shows waveforms including the first waveform 2218 and the second waveform 2220. The parameters indicated by the first waveform 2218 and the second waveform 2220 are the same as those described above. Figure 21The parameters are similar. As shown in the first waveform 2218, waveform 2218 contains multiple individual waveforms 22181, 22182, ..., 22186, which represent the selected power amplifier module in the power generation system at a negative output voltage (-V). PA ) and positive output voltage (+V PA The instruction conversion between waveforms 22181, 22182, ..., 22186. As shown in waveform 2218, during the positive transition of waveforms 22181, 22182, ..., 22186, the voltage of waveform 2220 becomes negative; during the negative transition of waveforms 22181, 22182, ..., 22186, the voltage of waveform 2220 becomes positive. An offset exists between each of the first waveforms 22181, 22182, ..., 22186, thereby providing a phase difference, time delay, or time lag between the first waveforms 22181, 22182, ..., 22186. This phase difference, time delay, or time lag can be used... Figure 20 Δx1, Δx2, ..., Δx (m-1) Δx m express. Figure 22 This aims to demonstrate an exemplary relationship between the actuation of a selected power amplifier module and its output voltage Vo. For example... Figure 20 and Figure 22 As shown, the phase difference, time delay, or time lag between the actuated or deactivated power amplifier modules is substantially less than [the value is missing from the original text]. Figure 16 The value shown.

[0120] Figure 22 The second waveform 2220 shows that the time delay or phase actuation or deactivation of the power modules associated with the respective first waveforms 22181, 22182, ..., 22186 significantly reduces overshoot and ringing of voltage Vo during positive and negative transitions. For example, during the positive transition of the second waveform 2120, overshoot and ringing of voltage Vo are significantly reduced, as shown in region 2222. Similarly, during the negative transition of waveform 2220, overshoot and ringing of voltage Vo are shown in region 2224.

[0121] In various configurations, ringing and overshoot can be sensed, acquired, measured, or detected (collectively referred to as "sensing") at various locations within the power generation system. Figure 6Using the power generation system 610 shown as an example (a non-limiting example), in various applications, it may be necessary to sense ringing and overshoot of voltage Vo at the output of generator 612b, the input of matching and filtering network 618, or the input of load 632. Instead of deploying sensors at every location in the power generation system 610, a virtual sensor is deployed to provide parameters indicating ringing and overshoot, such as power, voltage, or current. This virtual sensor utilizes selected parameters of the power generation system and applies a model of the plasma generation system to determine the parameters of interest at various locations in the power generation system. An example of a virtual sensor can be found in U.S. Patent Application No. 17 / 715672, filed August 10, 2022, entitled “Real-Time Non-Invasive IEDF Plasma Sensor,” assigned to the assignee of this application and incorporated herein by reference.

[0122] Figure 23 Display various waveforms of voltage Vo to describe changes in ringing, overshoot, and slope compensation. Figure 23 Waveform 2310 is shown, which contains waveform Vo 2320. As a non-limiting example, waveform 2220... a 2320 b 2320 c and 2320 d This displays various variations of waveform Vo 2320. Waveform 2220 a Waveform Vo 2320 shows a high slope and maximum ringing and overshoot. Waveform 2220 b The slope is slightly greater than waveform 2320. a However, the waveform has relatively small ringing and overshoot. Waveform 2220 c This displays a waveform with a small slope and no ringing or overshoot. Waveform 2220 d Displays waveforms with minimal slope and no ringing or overshoot.

[0123] In various configurations, waveform 2220 can be obtained by changing the phase, time delay, or time lag between the actuation or deactivation of one or more power amplifier modules in the power generation system. a 2320 b 2320 c and 2320 d .exist Figure 23 In a specific example, based on the desired slope of the rising or falling edge of waveform Vo 2320, from waveform 2320... c Or 2320 d Select minimum ringing or overshoot. In various configurations, this can be achieved by selecting minimum ringing or overshoot in each power amplifier module (e.g., power amplifier modules 612b, 1114).F 1214 F and 1314 F A disturbance signal is introduced into the output of the power amplifier module to determine the phase, time delay, or time lag between actuation and deactivation (this is only a non-limiting example). Iterative learning control methods can be used to adjust the phase, time delay, or time lag to minimize or maximize the parameters or costs that change in response to the disturbance. The aforementioned methods for determining various time delays or phase lags have been described in one or more of the following patents: U.S. Patent No. 10,741,363 (published August 11, 2020, entitled "Extremum Seeking Control Apparatus and Method for Automatic Frequency Tuning for RF Impedance Matching") and U.S. Patent No. 11,527,384 (published December 13, 2022, entitled "Apparatus and Tuning Method for Mitigating RF Load Impedance Variations Due to Periodic Disturbances"), both of which have been assigned to the assignee of this application and are incorporated herein by reference.

[0124] The power amplifier modules described above output voltage and current. The output voltage of these power amplifier modules is fairly accurate relative to their nominal expected output voltage. However, in the power generation system configuration described above, the current output values ​​of each power amplifier module can differ. In different configurations, the output current or current consumption of the power amplifier modules can vary. Variations in current will cause corresponding variations in the output power of a particular power module, since power is defined as voltage multiplied by current (P=VI). In different configurations, the output power of a particular power amplifier module can vary between 50% and 150% of its nominal expected output power, which is based on the nominal expected output voltage V and the nominal expected output current I. Variations in current will lead to uneven power distribution among the power amplifier modules. Uneven power distribution will result in uneven stress on power amplifier modules with output power higher than the nominal expected output power.

[0125] In various configurations, power distribution can be controlled by grouping one or more power amplifier modules into multiple groups and actuating these groups in a predetermined sequence. For example, if there are eight power amplifier modules PA1, PA2, ..., PA7, PA8, one or more of these eight power amplifier modules can be grouped into one or more groups to improve power distribution. For example, the power amplifier modules can be grouped as follows: {PA2, PA3, PA4, PA7}, {PA1, PA8}, and {PA5, PA6}. Of course, other groups can also be formed, and the number of power amplifier modules in each group can vary. The groups of power amplifier modules can be actuated in a predetermined sequence to output a negative output voltage (-V). PA ) or positive output voltage (+V PA For example, these groups can be actuated in the following order: {PA5, PA6}; then {PA2, PA3, PA4, PA7}; followed by {PA1, PA8}. In various configurations, each power amplifier module can be characterized by its power consumption and can be grouped according to relative power consumption. In various configurations, it may be necessary to prioritize actuating the group of power amplifier modules with lower power consumption before actuating the group of power amplifier modules with higher power consumption.

[0126] Figure 24 The flowchart of the display control system 1810 is used to... Figures 1 to 15 The power delivery system shown is voltage controlled (this example is not a limiting example). Figure 24 The overall operation method is the same as that mentioned above. Figure 18 The description is essentially the same, but also includes controls for changing the timing or sequence between the actuation or deactivation of the power amplifier modules to control one or more of ringing, overshoot, and power distribution. Control begins at startup / initialization block 2412. Control continues to block 2414, where the command output voltage is received. Control continues to block 2416, where the supply voltage Vdc and the number and specific power amplifiers required to generate the command output voltage are determined. Control continues to block 2418, where enable and clock signals are determined to control the power amplifiers determined in block 2416 to generate the command output voltage.

[0127] At block 2418, in addition to determining the enable and clock signals based on the required number of amplifiers, the power amplifier module is also determined to operate at a negative output voltage (-V). PA ) and positive output voltage (+V PA The relative timing between the two, and the negative output voltage (-V) of the power amplifier module group. PA ) and positive output voltage (+V PAThe grouping and order between the power amplifier modules. In various configurations, the phase, time delay, or time lag between power amplifier modules is determined in block 2426. In various configurations, the negative output voltage (-V) of the power amplifier modules... PA ) and positive output voltage (+V PA The grouping and order of the power amplifier modules can be determined using the iterative learning control method described above. Similarly, in various configurations, the grouping and actuation / deactivation order of the power amplifier modules is determined by block 2428. In various configurations, the grouping and actuation / deactivation order of the power amplifier modules can be determined using the iterative learning control method described above. In various configurations, blocks 2426 and 2428 operate independently. In other configurations, blocks 2426 and 2428 operate collaboratively to determine the phase, time delay, or time lag between actuations of the power amplifier modules.

[0128] Control proceeds to block 2420, where the output voltage is generated based on the clock and enable signals. Specifically, clock and enable signals are generated for each power amplifier. Control proceeds to block 2422, where it is determined whether the command output voltage has been reached. If the command output voltage has not been reached, control proceeds to block 2416 and repeats this process to update the power amplifier control signals, bringing the output voltage closer to the command output voltage. If the command output voltage has been reached, control proceeds to block 2424, ending the current process, but continuing to monitor the output voltage.

[0129] The foregoing description is illustrative in nature and is by no means intended to limit the scope of this disclosure, its application, or its uses. The broad teachings of this disclosure can be implemented in various forms. Therefore, although this disclosure includes specific examples, its true scope should not be so limited as other modifications will become apparent upon examination of the drawings, specification, and the following claims. In the written description and claims, one or more steps within the method may be performed in a different order (or simultaneously) without altering the principles of this disclosure. Similarly, one or more instructions stored in a non-transitory computer-readable medium may be executed in a different order (or simultaneously) without altering the principles of this disclosure. Unless otherwise stated, the numbering or other designations of instructions or method steps are for ease of reference and do not indicate a fixed order.

[0130] Furthermore, although each embodiment is described above as having certain features, any one or more of those features described with respect to any embodiment of this disclosure may be implemented in and / or combined with features of any other embodiment, even if such combination is not explicitly described. In other words, the described embodiments are not mutually exclusive, and substitutions between one or more embodiments remain within the scope of this disclosure.

[0131] The spatial and functional relationships between elements (e.g., between modules, circuit elements, semiconductor layers, etc.) are described using a variety of terms including “connection,” “joint,” “coupled,” “adjacent,” “close,” “above,” “directly above,” “below,” and “set.” Unless explicitly described as “direct,” when describing the relationship between the first and second elements in the foregoing disclosure, the relationship can be a direct relationship in the absence of any other intervening element between the first and second elements, but it can also be an indirect relationship in which one or more intermediate elements (spatially or functionally) exist between the first and second elements.

[0132] The phrase "at least one of A, B, and C" should be interpreted as meaning the logic of using non-exclusive OR (A or B or C), and should not be interpreted as meaning "at least one of A, at least one of B, and at least one of C". The term "set" does not necessarily exclude the empty set; in other words, in some cases, a "set" can have zero elements. The term "non-empty set" can be used to indicate the exclusion of the empty set; in other words, a non-empty set will always have one or more elements. The term "subset" does not necessarily require an appropriate subset. In other words, a "subset" of the first set can be co-extended (equal to) the first set. Furthermore, the term "subset" does not necessarily exclude the empty set; in some cases, a "subset" can have zero elements.

[0133] In the accompanying drawings, the direction of the arrows typically indicates the flow of information of interest (e.g., data or instructions) in the illustration. For example, when components A and B exchange various types of information, but the information transmitted from component A to component B is relevant to the illustration, the arrow might point from component A to component B. This unidirectional arrow does not imply that no other information is transmitted from component B to component A. Furthermore, for information sent from component A to component B, component B may send a request for the information or an acknowledgment of receipt of the information to component A.

[0134] In this disclosure, including the following definitions, the term "module" may be replaced by the term "controller" or the term "circuit". The term "module" may refer to, be a part of, or include: application-specific integrated circuits (ASICs); digital, analog, or mixed-signal discrete circuits; digital, analog, or mixed-signal integrated circuits; combinational logic circuits; field-programmable gate arrays (FPGAs); processor hardware (shared, dedicated, or grouped) that executes code; memory hardware (shared, dedicated, or grouped) that stores code executed by the processor hardware; other suitable hardware components that provide the described functionality; or, for example, a combination of some or all of the above in a system-on-a-chip.

[0135] The module may include one or more interface circuits. In some examples, the interface circuits may implement wired or wireless interfaces for connecting to a local area network (LAN) or a wireless personal area network (WPAN). Examples of LANs are the Institute of Electrical and Electronics Engineers (IEEE) standard 802.11-2020 (also known as the Wi-Fi wireless network standard) and the IEEE standard 802.3-2018 (also known as the Ethernet wired network standard). Examples of WPANs are the IEEE standard 802.15.4 (including the ZIGBEE standard from the ZigBee Alliance) and the Bluetooth wireless network standards from the Bluetooth Special Interest Group (SIG) (including core specification versions 3.0, 4.0, 4.1, 4.2, 5.0, and 5.1 from the Bluetooth SIG).

[0136] Modules can communicate with other modules using interface circuitry. Although modules may be described in this disclosure as communicating logically directly with other modules, in various implementations, modules may actually communicate via a communication system. Communication systems include physical and / or virtual network devices such as hubs, switches, routers, and gateways. In some implementations, the communication system connects to or traverses a wide area network (WAN) such as the Internet. For example, a communication system may include multiple LANs interconnected via the Internet or peer-to-peer leased lines using technologies including Multiprotocol Label Switching (MPLS) and Virtual Private Networks (VPNs).

[0137] In various implementations, the functionality of a module can be distributed across multiple modules connected via a communication system. For example, multiple modules can implement the same function distributed by a load balancing system. In yet another example, the functionality of a module can be partitioned between a server (also known as a remote or cloud) module and a client (or user) module. For example, a client module may include a local or network application that runs on a client device and communicates with the server module over the network.

[0138] Some or all of the hardware features of a module may be defined using a hardware description language such as IEEE Standard 1364-2005 (commonly referred to as "Verilog") and IEEE Standard 1076-2008 (commonly referred to as "VHDL"). Hardware description languages ​​can be used to manufacture and / or program hardware circuits. In some implementations, some or all of the features of a module may be defined by a language such as IEEE 1666-2005 (commonly referred to as "SystemC") that includes both code and hardware description as described below.

[0139] As used above, the term "code" can include software, firmware, and / or microcode, and can also refer to software, constants, functions, classes, data structures, and / or objects. Shared processor hardware includes a single microprocessor that executes some or all of the code from multiple modules. Group processor hardware includes microprocessors that cooperate with additional microprocessors to execute some or all of the code from one or more modules. References to multiple microprocessors include multiple microprocessors on a discrete die, multiple microprocessors on a single die, multiple cores of a single microprocessor, multiple threads of a single microprocessor, or a combination of the above.

[0140] Memory hardware can also store data together with or separately from code. Shared memory hardware includes a single memory device that stores some or all of the code from multiple modules. An example of shared memory hardware could be a Level 1 cache on or near the microprocessor die that can store code from multiple modules. Another example of shared memory hardware could be persistent storage, such as solid-state drives (SSDs), that can store code from multiple modules. Group memory hardware includes memory devices that work with other memory devices to store some or all of the code from one or more modules. An example of group memory hardware is a Storage Area Network (SAN) that can store code for a specific module across multiple physical devices. Another example of group memory hardware is random access memory that federates each of a group of servers to store code for a specific module.

[0141] The term memory hardware is a subset of the term computer-readable media. As used herein, the term computer-readable media does not include transient electrical or electromagnetic signals propagating through a medium (e.g., on a carrier wave); therefore, the term computer-readable media is considered tangible and non-transitory. Non-limiting examples of non-transitory computer-readable media are non-volatile memory devices (such as flash memory devices, erasable programmable read-only memory devices, or masked read-only memory devices), volatile memory devices (such as static random access memory devices or dynamic random access memory devices), magnetic storage media (such as analog or digital magnetic tape or hard disks), and optical storage media (such as CDs, DVDs, or Blu-ray discs).

[0142] The apparatus and methods described in this disclosure can be implemented, in whole or in part, by a special-purpose computer created by configuring a general-purpose computer to execute one or more specific functions embodied in a computer program. Such apparatus and methods can be described as computerized apparatus and computerized methods. The aforementioned function blocks and flowchart elements serve as software specifications that can be translated into computer programs through the routine work of skilled technicians or programmers.

[0143] A computer program includes processor-executable instructions stored on at least one non-transitory computer-readable medium. A computer program may also include stored data or depend on stored data. A computer program may include a basic input / output system (BIOS) for interacting with the hardware of a dedicated computer, device drivers for interacting with specific devices of the dedicated computer, one or more operating systems, user applications, background services, background applications, etc.

[0144] Computer programs may include: (i) descriptive text to be parsed, such as HTML (Hypertext Markup Language), XML (Extensible Markup Language), or JSON (JavaScript Objects Markup); (ii) assembly code; (iii) object code generated by the compiler from the source program code; (iv) source program code for execution by the interpreter; and (v) source program code for compilation and execution by the just-in-time compiler, etc. As an example only, the source program code may be written using syntax from languages ​​including C, C++, C#, Objective C, Swift, Haskell, Go, SQL, R, Lisp, Java®, Fortran, Perl, Pascal, Curl, OCaml, JavaScript®, HTML5 (Hypertext Markup Language version 5), Ada, ASP (Dynamic Server Pages), PHP (PHP: Hypertext Preprocessor), Scala, Eiffel, Smalltalk, Erlang, Ruby, Flash®, Visual Basic®, Lua, MATLAB, SIMULINK, and Python®.

Claims

1. A power generator, comprising: The first plurality of power amplifiers includes: A first power amplifier is configured to receive a first supply voltage and output multiple DC voltages; as well as A second power amplifier is configured to receive the first supply voltage and output the plurality of DC voltages. The first power amplifier and the second power amplifier are connected in series, and the output voltage generated by the power generator varies according to one of the plurality of DC voltages output by the first power amplifier and one of the plurality of DC voltages output by the second power amplifier.

2. The power generator of claim 1, wherein the first power amplifier and the second power amplifier are controlled to output a carrier signal, and wherein the first power amplifier and the second power amplifier are further controlled to construct the carrier signal into a pulse.

3. The power generator according to claim 2, wherein the carrier signal is at least one of a sine wave, a rectangular wave, a non-sine wave, or a piecewise linear wave.

4. The power generator according to claim 3, wherein the pulse is one of a rectangular waveform, a trapezoidal waveform, a triangular waveform, a sawtooth waveform, or a Gaussian pulse waveform.

5. The power generator of claim 4, wherein the pulse comprises a plurality of states.

6. The power generator according to claim 2, wherein the pulse is one of a rectangular waveform, a trapezoidal waveform, a triangular waveform, a sawtooth waveform, or a Gaussian waveform.

7. The power generator of claim 1, wherein one of the plurality of power amplifiers is actuated at a first time, and another of the plurality of power amplifiers is actuated at a second time.

8. The power generator of claim 7, wherein a time delay between the first time and the second time controls one of ringing, overshoot, or power distribution of the output voltage.

9. The power generator of claim 1, wherein each of the plurality of power amplifiers is characterized and grouped into groups, and the groups are actuated in a predetermined order to control power distribution.

10. The power generator of claim 1, further comprising a first control module configured to generate a voltage output command for a selected power amplifier among the plurality of power amplifiers, wherein the voltage output command determines which of the plurality of DC voltages is output by the selected power amplifier among the plurality of power amplifiers.

11. The power generator of claim 10, wherein the first control module is further configured to generate a voltage output command for another power amplifier of the plurality of power amplifiers, wherein the voltage output command determines which of the plurality of DC voltages is output by the other power amplifier of the plurality of power amplifiers.

12. The power generator of claim 10, further comprising a second control module configured to generate a voltage output command for another power amplifier of the plurality of power amplifiers, wherein the voltage output command determines which of the plurality of DC voltages is output by the other power amplifier of the plurality of power amplifiers.

13. The power generator of claim 1, wherein the first plurality of power amplifiers includes a fixed-step generation section, and the power generator further includes a variable-step generation section, the variable-step generation section including a first variable power amplifier configured to receive a second supply voltage and output a second plurality of DC voltages different from the plurality of DC voltages.

14. The power generator of claim 13, wherein the variable step generation section comprises: The second set of power amplifiers includes: The first variable power amplifier; as well as The second variable power amplifier is configured to receive a third supply voltage and output a third plurality of DC voltages. The first variable power amplifier and the second variable power amplifier are connected in series and are also connected in series with the fixed step generation section. The output voltage generated by the power generator varies according to one of the second plurality of DC voltages output by the first variable power amplifier, one of the third plurality of DC voltages output by the second variable power amplifier, and the output of the fixed step generation section.

15. The power generator of claim 13, wherein the first variable power amplifier is configured to receive the second supply voltage and output a piecewise linear output voltage, and wherein the first variable power amplifier is connected in series with the fixed step generation section, and the output voltage generated by the power generator varies according to the piecewise linear output voltage and the output voltage of the fixed step generation section.

16. The power generator of claim 1, wherein the first plurality of power amplifiers outputs a bipolar voltage signal, the power generator further comprising a DC charge pump receiving the output voltage of the first plurality of power amplifiers, and the DC charge pump being configured to convert the bipolar voltage signal into a unipolar voltage signal.

17. The power generator of claim 1, wherein the elements of the power generator are disposed in one of a remote module or a near module, the near module being placed near the load and the remote module being placed away from the load.

18. The power generator of claim 17, wherein the near-end module includes switching elements of the first plurality of power amplifiers, and the far-end module includes elements for generating the first supply voltage.

19. The power generator of claim 1, further comprising a power driver that receives the first supply voltage and generates an AC-DC signal applied to each of the first plurality of power amplifiers.

20. The power generator of claim 1, wherein the plurality of DC voltages includes +V PA -V PA At least two of +V, 0V, or 0V, where +V PA1 and -V PA1 It will vary depending on the supply voltage.

21. A power generation system, comprising: First power source; The second power supply includes a plurality of power amplifiers, wherein the plurality of power amplifiers comprises: The first power amplifier is configured to receive a first supply voltage and output +V. PA1 -V PA1 At least two of +V, 0V, or 0V, where +V PA1 and -V PA1 It will vary depending on the first supply voltage; as well as The second power amplifier is configured to receive the second supply voltage and output +V. PA2 -V PA2 At least two of +V, 0V, or 0V, where +V PA2 and -V PA2 It will vary depending on the second supply voltage. The first power amplifier and the second power amplifier are connected in series, and the output voltage generated by the power generator will be based on the +V output by the first power amplifier. PA1 -V PA1 At least two of 0 volts and +V output from the second power amplifier PA1 -V PA1 The voltage varies depending on at least two of the following: 0 volts, or 0 volts. The first power supply and the second power supply may be a single power supply or different power supplies with equal or different output voltages, and +V PA1 -V PA1 Equals +V PA2 -V PA2 Or with +V PA2 -V PA2 different.

22. The power generation system of claim 21, wherein the first power amplifier and the second power amplifier are controlled to output a carrier signal, and wherein the first power amplifier and the second power amplifier are further controlled to construct the carrier signal as a pulse.

23. The power generation system of claim 22, wherein the carrier signal is at least one of a sine wave, a rectangular wave, a non-sine wave, or a piecewise linear wave, and the pulse is one of a rectangular wave, a trapezoidal wave, a triangular wave, a sawtooth wave, or a Gaussian pulse wave.

24. The power generation system of claim 22, wherein one of the plurality of power amplifiers is actuated at a first time, and another of the plurality of power amplifiers is actuated at a second time.

25. The power generation system of claim 21, wherein the first plurality of power amplifiers includes a fixed-step generation section, and the power generator further includes: A variable step generation section includes at least one variable power amplifier configured to receive at least one third supply voltage and output a voltage equal to +V. PA1 -V PA1 +V PA2 and -V PA2 Different second multiple DC voltages, The variable step generation section is connected in series with the fixed step generation section, and the output voltage generated by the power generator varies according to the second plurality of DC voltages and the output voltage.

26. A non-transitory computer-readable medium storing instructions, the instructions comprising: +V is generated from the first power amplifier that receives the first supply voltage. PA1 -V PA1 At least two of +V, 0V, or 0V, where +V PA1 and -V PA1 It will vary depending on the first supply voltage; as well as Generate +V PA2 -V PA2 At least two of +V, 0V, or 0V, where +V PA2 and -V PA2 The output from the second power amplifier that receives the second supply voltage, where +V PA2 and -V PA2 It will vary depending on the second supply voltage. Generate based on the +V output from the first power amplifier PA1 -V PA1 At least two of 0 volts and +V output from the second power amplifier PA2 -V PA2 The output voltage varies depending on at least two of 0 volts, and 0 volts. Wherein the first supply voltage and the second supply voltage are equal or different, and +V PA1 -V PA1 Equals +V PA2 -V PA2 Or with +V PA2 -V PA2 different.

27. The non-transitory computer-readable medium for storing instructions according to claim 26, the instructions further comprising generating the output voltage comprising a carrier signal and a pulse, wherein the pulse modulates the carrier signal.

28. The non-transitory computer-readable medium for storing instructions according to claim 27, wherein the carrier signal is at least one of a sine wave, a rectangular wave, a non-sine wave, or a piecewise linear wave, and the pulse is one of a rectangular wave, a trapezoidal wave, a triangular wave, a sawtooth wave, or a Gaussian pulse wave.

29. The non-transitory computer-readable medium for storing instructions according to claim 27, the instructions further comprising actuating the first power amplifier at a first time and actuating the second power amplifier at a second time.

30. The non-transitory computer-readable medium for storing instructions according to claim 26, wherein the +V from the first power amplifier PA1 -V PA1 At least one of the following two values: 0 volts or 0 volts and +V output of the second power amplifier. PA2 -V PA2 At least one of 1, 0, or 0 volts is connected in series to include a fixed step voltage, the instruction further comprising: A variable step voltage is generated, wherein the variable voltage is output from a third power amplifier that receives a third supply voltage, and wherein the variable step voltage is different from +V. PA1 -V PA1 +V PA2 and -V PA2 , The variable step voltage is connected in series with the fixed step voltage, and the third supply voltage is equal to or different from the first supply voltage and the second supply voltage.

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