Valve control device and semiconductor process equipment
By using a pure hardware circuit to control valves in semiconductor process equipment, and utilizing relays and electric valve braking circuits independent of the software system, the problem of abnormal chemical source flow caused by hardware failure or software jamming is solved, achieving fast and accurate valve control and avoiding abnormal thin film deposition and safety accidents.
Patent Information
- Application Number
- CN202511750983.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-25
- Publication Date
- 2026-02-17
AI Technical Summary
In existing semiconductor process equipment, when the software system controls the valve to close, hardware failure or software jamming can lead to abnormal chemical source flow, resulting in abnormal thin film deposition or safety accidents, and there is also a delayed response problem.
The valve is controlled by a pure hardware circuit. It directly controls the valve to close based on the flow meter signal through a relay and electric valve braking circuit. It is independent of the software system and adjusts the valve status in real time in conjunction with a pressure monitoring device and controller.
It enables rapid and accurate cutoff of chemical source supply in the event of hardware failure or software freeze, avoiding abnormal film deposition and safety accidents, and improving the stability and response speed of valve control.
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Figure CN121539751A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the field of semiconductor device processing, in particular to a valve control device and a semiconductor process equipment. BACKGROUND
[0002] In a semiconductor process equipment such as a CVD equipment, a liquid source such as TEOS, TMAH, etc. is monitored and controlled by a liquid flow meter (LFM) for its flow rate, and then enters a process chamber to participate in a vapor deposition reaction after being vaporized by a vaporizer through a delivery pipeline, a valve and a carrier gas. At present, when the software system of an upper computer detects an abnormal LFM flow rate, the valve of the chemical source is closed to cut off the chemical source supply.
[0003] A common problem of controlling the valve by a software system is that when the software is stuck, an error occurs or the hardware fails, the actual flow rate of the LFM has already been abnormal, but the software fails to capture it, which will cause too much chemical source to flow into the process chamber through the LFM and pipeline device, resulting in abnormal film deposition and even causing a safety accident. SUMMARY
[0004] Therefore, the present application provides a valve control device and a semiconductor process equipment, which can close the valve and cut off the chemical source supply by a pure hardware circuit.
[0005] In a first aspect, the present application provides a valve control device, which is connected with a chemical source and a flow meter for controlling and monitoring the flow rate of the chemical source. The control device comprises a relay, an electric valve braking circuit and an electric valve execution module which are electrically connected, the electric valve braking circuit comprises a first braking circuit and a second braking circuit, one end of the second braking circuit is electrically connected with a software system controlled switch circuit, and wherein:
[0006] The relay is used to control the closure of the first contact according to the signal output by the flow meter, so that the first braking circuit is turned on and the second braking circuit is turned off.
[0007] The first braking circuit is used to transmit a first control signal to the electric valve execution module when turned on.
[0008] The electric valve execution module is used to control the closure of the valve according to the first control signal.
[0009] In some embodiments, the electric valve braking circuit includes a coil, an armature and a plurality of contacts, the first braking circuit is a circuit formed by a first target contact among the plurality of contacts, and the second braking circuit is a circuit formed by a second target contact among the plurality of contacts; when the first contact of the relay is closed, the coil is powered to drive the armature to move, the first target contact is connected to turn on the first braking circuit, and the second target contact is disconnected to turn off the second braking circuit.
[0010] In some embodiments, when the first contact of the relay is disconnected, the coil is powered to drive the armature to move, the first target contact is disconnected to turn off the first braking circuit, and the second target contact is connected to turn on the second braking circuit.
[0011] In some embodiments, the control device further includes a comparator electrically connected between the flowmeter and the relay, the comparator is configured to receive a signal output by the flowmeter, and output a high level to the relay when it is determined that the signal matches a voltage threshold; wherein the control of the first contact to be closed according to the signal output by the flowmeter includes:
[0012] controlling the first contact to be closed according to the high level output by the comparator.
[0013] In some embodiments, the voltage threshold includes an upper voltage threshold and a lower voltage threshold, and it is determined that the signal matches the voltage threshold when a voltage value corresponding to the signal is greater than the upper voltage threshold or the voltage value corresponding to the signal is less than the lower voltage threshold.
[0014] In some embodiments, the comparator includes an operational amplifier, the operational amplifier receives the signal output by the flowmeter through an input terminal, and compares a voltage value corresponding to the signal with a voltage threshold, and outputs a high level to the relay through an output terminal when the voltage value is greater than the voltage threshold.
[0015] In some embodiments, the switching circuit includes a switch for controlling the on-off of the switching circuit, and the switch is controlled by the software system.
[0016] In a second aspect, the application provides a semiconductor process equipment, including a process chamber, a first gas inlet pipeline connected to the process chamber, the first gas inlet pipeline including a chemical source, a valve and a flowmeter, and the control device of the valve provided in the first aspect, the control device of the valve being connected to the valve for controlling the on-off of the valve.
[0017] In some embodiments, the semiconductor process equipment further includes:
[0018] A pressure monitoring device is configured to monitor pressure in the process chamber and transmit monitoring data to a controller.
[0019] The controller is configured to compare the monitoring data with a preset response model, and if it is detected that the monitoring data does not match the preset response model, control the switch circuit to be turned on by the software system and send a second control signal to the electric valve execution module.
[0020] The electric valve execution module controls the valve to be closed according to the second control signal.
[0021] In some embodiments, the semiconductor process equipment further comprises a vaporizer connected between the flow meter and the process chamber. BRIEF DESCRIPTION OF DRAWINGS
[0022] The accompanying drawings are included to provide a further understanding of the present application, and are incorporated in and constitute a part of this application, illustrate embodiments of the present application and together with the description serve to explain the principle of the present application. In the drawings:
[0023] Figure 1 is a structural schematic diagram of a semiconductor process equipment provided by an embodiment of the present application;
[0024] Figure 2 is a structural schematic diagram of a valve control device provided by an embodiment of the present application.
[0025] The reference signs in the drawings are as follows:
[0026] 10, semiconductor process equipment;
[0027] 100, process chamber;
[0028] 101, first gas inlet pipeline;
[0029] 1010, chemical source;
[0030] 1011, valve;
[0031] 1012, flow meter;
[0032] 102, valve control device;
[0033] 103, vaporizer;
[0034] 1020, relay;
[0035] 1021, electric valve braking circuit;
[0036] 1022, electric valve execution module;
[0037] 1023, switch circuit;
[0038] 10210, coil;
[0039] 10211, armature;
[0040] 10230, switch;
[0041] 10240, first operational amplifier;
[0042] 10241, second operational amplifier. DETAILED DESCRIPTION
[0043] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some examples or embodiments of the present application, and for those skilled in the art, the present application can be applied to other similar scenarios without creative labor on the basis of these drawings. Unless it is clear from the language context or otherwise indicated, the same reference numbers in the drawings represent the same structures or operations.
[0044] As shown in the present application, unless the context clearly indicates otherwise, the words "one", "an", "a", and / or "the" do not specify a singular number, but also include a plural number. Generally speaking, the terms "comprise" and "include" only indicate that the steps and elements explicitly identified are included, and these steps and elements do not constitute an exclusive list, and the method or device can also include other steps or elements.
[0045] Unless otherwise specifically indicated, the relative arrangement of the components and steps, numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present application. At the same time, it should be understood that the sizes of the various parts shown in the drawings are not drawn in accordance with the actual proportional relationship. The technology, methods and devices known to those skilled in the relevant art can not be discussed in detail, but under appropriate circumstances, the technology, methods and devices should be considered as part of the specification. In all examples shown and discussed here, any specific value should be interpreted as merely exemplary, and not as a limitation. Therefore, other examples of exemplary embodiments can have different values. It should be noted that similar reference numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.
[0046] In addition, although the terms used in the present application are selected from well-known and commonly used terms, some terms mentioned in the specification of the present application can be selected by the applicant according to his or her judgment, and the detailed meaning of each term is described in the relevant part of the description. In addition, the present application is not only required to be understood by the actual terms used, but also by the meaning implied by each term.
[0047] It should be understood that when a component is referred to as "on another component," "connected to another component," "coupled to another component," or "in contact with another component," it can be directly on, connected to, coupled to, or in contact with that other component, or there may be an inserting component. In contrast, when a component is referred to as "directly on another component," "directly connected to," "directly coupled to," or "directly in contact with" another component, there is no inserting component.
[0048] It should be noted that the terms "front," "rear," "up," "down," "left," "right," "longitudinal," and "lateral" used in this application are all based on the installation structure. Figure 1 The perspectives shown are for the purpose of facilitating and simplifying the description of this application, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting this application.
[0049] As mentioned above, the method of monitoring LFM flow anomalies through software systems and controlling the closure of chemical source valves to cut off the chemical supply generally suffers from the following problems: When the software freezes, malfunctions, or the hardware fails, the LFM flow may actually be abnormal, but the software may fail to detect it. This can cause excessive chemical supply to flow into the process chamber through the LFM and piping, leading to abnormal thin film deposition and even safety accidents. Furthermore, monitoring through software systems requires A / D conversion, data reading, and program judgment, which introduces millisecond or second-level delays, potentially resulting in untimely valve closure.
[0050] To overcome at least one of the aforementioned deficiencies in the prior art, this application provides a valve control device and semiconductor process equipment. The valve control device automatically cuts off the chemical source supply by controlling the valve to close via a pure hardware loop. Furthermore, in pure hardware loop control, the software system's control over the valve is cut off, ensuring that the valve closing process controlled by the pure hardware loop is unaffected by the software system, resulting in more accurate valve control.
[0051] Please refer to the reference. Figure 1 . Figure 1 The diagram shows a schematic of the structure of a semiconductor process apparatus 10 according to some embodiments of the present application, including a process chamber 100 and a first air inlet pipe 101 connected to the process chamber 100. The first air inlet pipe 101 includes a chemical source 1010, a valve 1011 and a flow meter 1012. The valve 1011 is used to control the on / off supply of the chemical source 1010. The opening and closing of the valve 1011 is controlled by a valve control device 102.
[0052] The flow meter 1012 is used to control and monitor the inflow rate of the chemical source 1010. The flow meter 1012 can be, for example, a liquid flow meter (LFM), and the chemical source 1010 can be, for example, a liquid source such as TEOS or TMAH. The semiconductor process equipment 10 can be applied to multiple fields such as vacuum bonding in the panel industry, semiconductor chip packaging, microelectronic integrated circuits, precision optical component manufacturing, and solar photovoltaic production.
[0053] In some embodiments, the semiconductor process apparatus 10 may further include a vaporizer 103 connected between the flow meter 1012 and the process chamber 100. Most liquid sources (such as tetraethyl orthosilicate (TEOS) and borosilicate glass (BPSG) precursors) have low volatility and cannot be stably transported directly in gaseous form. The vaporizer 103 can evaporate the liquid source into gaseous molecules (such as TEOS vaporized into gaseous molecules) through heating or carrier gas bubbling. (Gas), so that it can be mixed with the carrier gas and then enter the process chamber 100 to participate in the deposition reaction.
[0054] Please continue to refer to this. Figure 2 . Figure 2 A schematic diagram of a control device 102 for a valve 1011 according to some embodiments of this application is shown, including: an electrically connected relay 1020, an electric valve braking circuit 1021, and an electric valve actuation module 1022. The electric valve braking circuit 1021 includes a first braking circuit and a second braking circuit. One end of the second braking circuit is electrically connected to a switching circuit 1023 controlled by a software system. The first braking circuit can be, for example, a... Figure 2 The circuit formed by the contacts GCHD of the electric valve braking circuit 1021, the first braking circuit can be, for example, a... Figure 2 The electric valve braking circuit 1021 is a circuit formed by contacts AEBF. The switching circuit 1023 includes a switch 10230 that controls the on / off state of the switching circuit, and the opening and closing of the switch 10230 is controlled by a software system.
[0055] Relay 1020 is used to control the first contact to close based on the signal output from flowmeter 1012, thereby activating the first braking circuit and deactivating the second braking circuit. Since one end of the second braking circuit is electrically connected to the switching circuit 1023 controlled by the software system, when the second braking circuit is deactivated, it effectively cuts off the software system's control over the control device 102, thus cutting off the software system's control over the valve 1011. The first contact can refer to the normally open (NO) contact of relay 1020, for example... Figure 2 AC contacts of medium relay 1020.
[0056] The first braking circuit is used to transmit a first control signal to the electric valve actuator module 1022 when it is turned on. The electric valve actuator module 1022 is used to control the valve 1011 to close according to the first control signal. Controlling the valve 1011 to close through a pure hardware circuit is beneficial to improving the stability of valve 1011 control compared to a software system control scheme.
[0057] In some embodiments, see continue to see Figure 2 The electric valve braking circuit 1021 includes a coil 10210, an armature 10211, and multiple contacts, such as contacts ABCDEFGH in the electric valve braking circuit 1021. The first braking circuit is a circuit formed by the first target contact GCHD among the multiple contacts. The second braking circuit is a circuit formed by the second target contact AEBF among the multiple contacts. When the first contact of the relay 1020 ( Figure 2 When the AC contact of the intermediate relay 1020 is closed, the coil 10210 is energized, which drives the armature 10211 to move to the right, controlling the first target contact GCHD to connect to conduct the first braking circuit, and controlling the second target contact AEBF to disconnect to disconnect the second braking circuit.
[0058] Subsequently, when the first contact of relay 1020 is disconnected, coil 10210 is de-energized, causing armature 10211 to move to the left, controlling the first target contact GCHD to disconnect to break the first braking circuit, and controlling the second target contact AEBF to connect to conduct the second braking circuit.
[0059] It should be noted that, Figure 2 The AC contact of the intermediate relay 1020 is a normally open contact, therefore it is usually in the open state. Correspondingly, the coil 10210 is usually de-energized, and the second braking circuit formed by the second target contact AEBF is usually in the closed state. Figure 2 As shown.
[0060] In some embodiments, see continue to see Figure 2 Alternatively, the control device 102 also includes a comparator 1024 electrically connected between the flow meter 1012 and the relay 1020. The comparator 1024 receives the signal output by the flow meter 1012 and outputs a high level to the relay 1020 when it determines that the signal matches a voltage threshold. In this case, the relay 1020 controls the first contact to close according to the signal output by the flow meter 1012, including controlling the first contact to close according to the high level output by the comparator 1024. The comparator can achieve a micron-level fast response. Compared with the method of controlling valve closure by a software system, the control device 102 no longer relies on information interaction with the software system, waiting for instructions from the host computer of the software system, etc., and can directly realize valve closure based on pure hardware circuitry, resulting in a faster response speed.
[0061] In some embodiments, the voltage threshold may include an upper voltage threshold and a lower voltage threshold. When the voltage value corresponding to the signal is greater than the upper voltage threshold, or when the voltage value corresponding to the signal is less than the lower voltage threshold, it is determined that the signal matches the voltage threshold. For example, see [link to example]. Figure 2 Comparator 1024 may include a first operational amplifier 10240 and a second operational amplifier 10241. Each operational amplifier 10240 and 10241 is connected to a diode. The non-inverting input of the first operational amplifier 10240 is connected to the lower voltage threshold U-low, and the inverting input is connected to the input voltage U-in, which is the voltage of the output signal of the flowmeter 1012. When U-in < U-low, the first operational amplifier outputs a high level (operational amplifier output saturation in open-loop state), and the diode is forward-biased. The non-inverting input of the second operational amplifier 10241 is connected to the input voltage U-in, and the inverting input is connected to the upper voltage threshold U-high. When U-in > U-high, the second operational amplifier outputs a high level, and the corresponding diode is forward-biased. Whenever either the first or second operational amplifier outputs a high level, the output terminal U-out is high. Only when U-low ≤ U-in ≤ U-high, the outputs of both the first and second operational amplifiers are low, and the output terminal U-out is low-high.
[0062] Alternatively, in some other embodiments, the voltage threshold may include only the upper voltage threshold. In this case, the comparator 1024 may include an operational amplifier whose two inputs (non-inverting and inverting) can receive the signal output by the flow meter and the upper voltage threshold U-high, respectively. The voltage value corresponding to the signal is compared with the upper voltage threshold U-high. When the voltage value is greater than the upper voltage threshold U-high, a high level is output to the relay 1020 through the output.
[0063] In some embodiments, continuing to refer to the figures, when the semiconductor process equipment 10 includes the valve control device 102 mentioned in the above embodiments, the semiconductor process equipment 10 may also include a pressure monitoring device (not shown in the figures) and a controller (not shown in the figures). The pressure monitoring device monitors the pressure within the process chamber 100 and transmits the monitoring data to the controller. The controller compares the monitoring data with a preset response model. If a mismatch is detected between the monitoring data and the preset response model, the controller controls the switching circuit 1023 to conduct (e.g., closes switch 10230) via a software system and sends a second control signal to the electric valve execution module 1022. The electric valve execution module controls the valve 1011 to close according to the second control signal. When there is a slight internal leakage in the flow meter liquid valve or a decrease in vaporizer efficiency, causing the actual gas flow rate entering the process chamber to be inconsistent with the actual flow rate monitored by the flow meter, the hardware circuit (i.e., the hardware control circuit consisting of the flow meter, comparator, relay, electric valve braking circuit, and electric valve execution module) cannot detect such an anomaly.
[0064] By employing this method, the above-mentioned technical defects in the hardware circuit can be compensated by the software system. When the pressure in the process chamber is detected to be inconsistent with the expectation, the control valve 1011 is closed to actively stop the injection of chemical source.
[0065] One feasible method is to determine whether the monitoring data matches the preset response model. This method may include: the preset response model records the correspondence between time t and process chamber pressure. Each monitoring data corresponds to a time t1. The corresponding process chamber pressure at time t1 can be found from the preset response model. If the pressure value corresponding to the monitoring data is not equal to the corresponding process chamber pressure at time t1, it is determined that the monitoring data does not match the preset response model, which means that the current process chamber pressure does not meet the expectation.
[0066] The preceding description is provided to enable any person skilled in the art to practice the various aspects described herein. However, it should be understood that the scope of protection of this application should be determined by the appended claims and should not be limited to the specific structures and components of the embodiments described above. Those skilled in the art can make various changes and modifications to the embodiments within the spirit and scope of this application, and these changes and modifications also fall within the scope of protection of this application.
Claims
1. A valve control device, characterized in that, The valve is connected to a chemical source and a flow meter, the flow meter being used to control and monitor the inflow rate of the chemical source. The control device includes an electrically connected relay, an electric valve braking circuit, and an electric valve actuation module. The electric valve braking circuit includes a first braking circuit and a second braking circuit. One end of the second braking circuit is electrically connected to a switching circuit controlled by the software system, wherein: The relay is used to control the first contact to close according to the signal output by the flow meter, so that the first braking circuit is turned on and the second braking circuit is turned off. The first braking circuit is used to transmit a first control signal to the electric valve actuation module when it is turned on; The electric valve actuator module is used to control the valve to close according to the first control signal.
2. The control device as described in claim 1, characterized in that, The electric valve braking circuit includes a coil, an armature, and multiple contacts. The first braking circuit is a circuit formed by a first target contact among the multiple contacts, and the second braking circuit is a circuit formed by a second target contact among the multiple contacts. When the first contact of the relay is closed, the coil is energized and drives the armature to move, controlling the first target contact to connect to conduct the first braking circuit, and controlling the second target contact to disconnect to disconnect the second braking circuit.
3. The control device as described in claim 2, characterized in that, When the first contact of the relay is disconnected, the coil is de-energized, causing the armature to move, controlling the first target contact to disconnect the first braking circuit, and controlling the second target contact to connect to conduct the second braking circuit.
4. The control device as described in claim 1, characterized in that, The control device further includes a comparator electrically connected between the flow meter and the relay. The comparator is used to receive the signal output by the flow meter, and when it determines that the signal matches a voltage threshold, it outputs a high level to the relay. The method of controlling the closure of the first contact according to the signal output by the flow meter includes: The first contact is closed based on the high level output of the comparator.
5. The control device as described in claim 4, characterized in that, The voltage threshold includes an upper voltage threshold and a lower voltage threshold. When the voltage value corresponding to the signal is greater than the upper voltage threshold, or when the voltage value corresponding to the signal is less than the lower voltage threshold, it is determined that the signal matches the voltage threshold.
6. The control device as described in claim 4, characterized in that, The comparator includes an operational amplifier. The operational amplifier receives the signal output by the flow meter through its input terminal and compares the voltage value corresponding to the signal with a voltage threshold. When the voltage value is greater than the voltage threshold, it outputs a high level to the relay through its output terminal.
7. The control device as described in claim 1, characterized in that, The switching circuit includes a switch that controls the on / off state of the switching circuit, and the switch is controlled by the software system.
8. A semiconductor process apparatus, the semiconductor process apparatus comprising: Process chambers; A first air inlet pipe connected to the process chamber, the first air inlet pipe including a chemical source, a valve and a flow meter; The control device as described in any one of claims 1-7, wherein the control device is connected to the valve and is used to control the opening and closing of the valve.
9. The semiconductor process equipment as described in claim 8, characterized in that, The semiconductor process equipment also includes: A pressure monitoring device is used to monitor the pressure inside the process chamber and transmit the monitoring data to the controller; The controller is used to compare the monitoring data with a preset response model. If the monitoring data does not match the preset response model, the controller controls the switching circuit to turn on through the software system and sends a second control signal to the electric valve execution module. The electric valve actuator module controls the valve to close according to the second control signal.
10. The semiconductor process equipment as described in claim 8, characterized in that, The semiconductor process equipment further includes a vaporizer connected between the flow meter and the process chamber.