Developing device and developing method

Abstract

In a developing apparatus and a developing method for supplying a developing solution to a substrate and performing a developing process, bubbles generated by recovering the developing solution into a tank are effectively eliminated in the tank, thereby improving the operating rate of the developing apparatus. In the present invention, since the developer in the first tank is circularly supplied, bubbles are introduced into the first tank as the developer returns to the first tank. A defoaming liquid having the same composition as the developer is supplied to the bubbles, and as a result, the bubbles are eliminated. Furthermore, since the defoaming liquid has the same composition as the developing liquid, the concentration change or composition change of the developing liquid stored in the first tank is prevented, and the stable developing process can be always performed.

Description

TECHNICAL FIELD

[0001] The present application relates to a developing device and a developing method for supplying a developing solution to a substrate and performing a developing process. BACKGROUND

[0002] One example of a developing device for supplying a developing solution to a substrate and performing a developing process is described in Patent Literature 1. The developing device conveys a substrate using a plurality of conveying rollers in a developing tank partitioned out. A developing solution nozzle is disposed above the conveying rollers, and the developing solution is supplied to the substrate from the developing solution nozzle by a developing solution pump from a tank. The developing solution supplied to the substrate is recovered at the inner bottom of the developing tank and returned to the tank. In this way, the developing solution can be recycled.

[0003] [Patent Literature]

[0004] [Patent Literature]

[0005] [Patent Literature 1] Japanese Patent Laid-Open No. 9-179312 SUMMARY

[0006] [Problems to be Solved by the Invention]

[0007] When the developing solution is returned to the tank from the developing tank, a large amount of bubbles sometimes exist in the tank. When the bubbles in the interior of the tank reach saturation, adverse situations such as breakage of the tank or backflow of the bubbles into the developing tank occur. Each time these adverse situations occur, the operator performs a replacement work of the tank or a work of removing the bubbles from the tank after temporarily stopping the developing device. As a result, there is a problem that the operation rate of the developing device decreases.

[0008] The present application has been made in view of the above-mentioned problems, and its object is to efficiently eliminate bubbles generated by recovering the developing solution into the tank in a developing device and a developing method for supplying a developing solution to a substrate and performing a developing process, thereby improving the operation rate of the developing device.

[0009] [Means of Solving the Problems]

[0010] A first aspect of the present application is a developing device characterized by comprising: a developing tank; a developing solution nozzle that sprays a developing solution to a substrate in the developing tank; a first tank that stores the developing solution; a first circulating supply portion that supplies the developing solution in the first tank to the developing solution nozzle and returns the developing solution recovered into the developing tank to the first tank; and a first defoaming solution supply portion that supplies a defoaming solution of the same composition as the developing solution to bubbles generated in the first tank due to the return of the developing solution to the first tank.

[0011] The second aspect of the present invention is a developing method for developing a substrate in a developing tank using developing solution sprayed from a developing solution nozzle, characterized by the following steps: supplying developing solution from a first tank to a developing solution nozzle and returning developing solution recovered to the developing tank to the first tank; and supplying an antifoaming solution with the same composition as the developing solution to the bubbles generated in the first tank due to the returning developing solution.

[0012] In this invention, since the developer in the first tank is circulated, bubbles may sometimes form in the first tank due to the developer returning to it. Therefore, an antifoaming solution with the same composition as the developer is supplied to the bubbles. As a result, the bubbles are eliminated. Furthermore, since the antifoaming solution has the same composition as the developer, changes in the concentration or composition of the developer stored in the first tank are prevented, thus ensuring a consistently stable development process. Moreover, "same composition as the developer" means that the components constituting the developer and their proportions are the same.

[0013] [The effects of the invention]

[0014] As described above, according to the present invention, bubbles generated by the recovery of developer into the tank can be efficiently eliminated inside the tank, thereby improving the operating rate of the developing apparatus. Attached Figure Description

[0015] Figure 1 This is a schematic diagram illustrating a substrate processing system equipped with the developing apparatus of the present invention according to a first embodiment.

[0016] Figure 2 This is an enlarged view of a portion of the first embodiment of the developing apparatus of the present invention.

[0017] Figure 3A This is a diagram illustrating an example of a defect that occurs during the circulation supply of developer.

[0018] Figure 3B It is a schematic representation used to solve Figure 3A The diagram illustrates an example of an adverse action.

[0019] Figure 4A It is a schematic representation in Figure 2 This is an example of a defect that occurs when only the developer solution is drained from the developing apparatus shown.

[0020] Figure 4B It is a schematic representation used to solve Figure 4A The diagram illustrates an example of an adverse action.

[0021] Figure 5 This is an enlarged view of a portion of the second embodiment of the developing apparatus of the present invention.

[0022] Figure 6A It is a schematic representation Figure 5 A diagram showing the operation of the developing apparatus.

[0023] Figure 6B It is a schematic representation Figure 5 A diagram showing the operation of the developing apparatus.

[0024] Explanation of icon numbers

[0025] 100: Substrate Processing System

[0026] 101: Frame

[0027] 102, 103: Isolation wall

[0028] 104: Conveying roller

[0029] 200: Developing apparatus

[0030] 210: Developing tank

[0031] 220: Developer nozzle

[0032] 230: Can

[0033] 240: Circular Supply Department

[0034] 241, 241a, 241b, 241c: piping

[0035] 242, 252, 266: Valves

[0036] 243: Pump

[0037] 244: Piping Recycling

[0038] 245, 263: Three-way valves

[0039] 250: Drainage Department

[0040] 251: Drainage piping

[0041] 261: Multi-functional nozzle

[0042] 262: Shared piping

[0043] 264: Defoaming Piping

[0044] 265: Remove piping with a foam filter.

[0045] 270: Defoamer Supply Department

[0046] 280: Bubble removal part

[0047] 300: Flushing device

[0048] 310: Flushing nozzle

[0049] 320: Cleaning fluid tank

[0050] 330: First cleaning fluid pump

[0051] 340: High-pressure spray nozzle

[0052] 350: Second cleaning fluid pump

[0053] 360: Circulation pipeline

[0054] 400: Drying device

[0055] 500: Control Department

[0056] 510: Air Knife

[0057] 520: Drying section

[0058] B: Bubble

[0059] FB: Fluid Box

[0060] FB1: First Fluid Chamber

[0061] FB2: Second Fluid Tank

[0062] S: Substrate

[0063] X: Board conveyance direction / direction Detailed Implementation

[0064] Figure 1 This diagram schematically illustrates a substrate processing system equipped with a developing apparatus according to a first embodiment of the present invention. The substrate processing system 100 has a frame 101 extending along the substrate transport direction X. The frame 101 is divided by two partition walls 102 and 103, and a total of three processing tanks are arranged adjacent to each other along the X direction. A developing apparatus 200, a rinsing apparatus 300, and a drying apparatus 400 are sequentially arranged in these processing tanks. Furthermore, the processing tank located closest to the (-X) direction functions as a developing tank.

[0065] The conveying rollers 104 are arranged side by side in a manner that extends through these processing grooves along the X direction. For example, the conveying rollers 104 are arranged along a horizontal direction orthogonal to the X direction (and...). Figure 1 The substrate S extends in the direction perpendicular to the paper surface. The substrate S is placed on the conveyor roller 104. The substrate S is conveyed along the direction X in the order of developing device 200, washing device 300 and drying device 400 by the synchronous rotation of the conveyor roller 104.

[0066] The developing apparatus 200 is a first embodiment of the developing apparatus of the present invention. It supplies developing solution to the upper surface of a substrate S, which is conveyed by a conveying roller 104 in direction X, and performs a developing process. Furthermore, the detailed structure of the developing apparatus 200 will be described in detail later. The substrate S is, for example, a glass substrate used for color filters in liquid crystal display devices. In addition, the substrate S can also be various substrates for flat panel displays (FPDs), semiconductor wafers, glass substrates for photomasks, glass or ceramic substrates for magnetic disks / optical disks, glass substrates for organic electroluminescence (EL), glass substrates or silicon substrates for solar cells, other flexible substrates, and printed substrates—various substrates processed for electronic devices.

[0067] The substrate S, after development, is conveyed by the transfer roller 104 to a position facing the rinsing nozzle 310 provided in the rinsing apparatus 300, and cleaning fluid is supplied by the rinsing nozzle 310. This performs the rinsing process. The cleaning fluid used in this rinsing process is supplied from the cleaning fluid tank 320 to the rinsing nozzle 310 via the first cleaning fluid pump 330. Furthermore, the rinsed substrate S is further conveyed by the transfer roller 104. Then, high-pressure cleaning fluid is sprayed from the high-pressure spray nozzle 340, which is a high-pressure cleaning component, to remove residual film on the substrate surface. Cleaning fluid is supplied from the cleaning fluid tank 320 to the high-pressure spray nozzle 340 via a second cleaning fluid pump 350 with high-pressure ejection pressure. Thus, the rinsing apparatus 300 performs a two-stage rinsing process. Furthermore, the cleaning fluid used during cleaning can be recycled to the bottom of the processing tank surrounded by partition walls 102 and 103, and from there returned to the cleaning fluid tank 320 via the circulation line 360 ​​for reuse.

[0068] After rinsing, the substrate S is further conveyed by the conveying roller 104, and pressurized air is blown from the air knife 510 to remove liquid from the surface of the substrate S. Heated air for drying is then blown from the drying section 520 onto the substrate S after liquid removal, thereby completely drying its surface.

[0069] Next, refer to Figure 1 , Figure 2 , Figure 3A , Figure 3B , Figure 4A and Figure 4B The structure and operation of the developing apparatus 200 are described in detail. Figure 2 This is an enlarged view of a portion of the first embodiment of the developing apparatus of the present invention. Figure 3A This diagram schematically illustrates an example of a problem that can occur during the circulation of developer. Figure 3B It is a schematic representation used to solveFigure 3A The diagram illustrates an example of an adverse action. Figure 4A It is a schematic representation in Figure 2 The figure shows an example of a defect that occurs when only the developer solution is drained from the developing apparatus. Figure 4B It is a schematic representation used to solve Figure 4A A diagram illustrating an example of an adverse action. Furthermore, in Figure 3A , Figure 3B , Figure 4A and Figure 4B (Further details will follow) Figure 6A and Figure 6B In the diagram, the triangle representing a valve is black when the valve is open and white when the valve is closed. Additionally, the flow path of the developer (including the defoamer) is depicted with a thick solid line, and the flow path of the defoamer is depicted with a thick dashed line.

[0070] like Figure 1 and Figure 2 As shown, in the developing apparatus 200, the structure surrounded by the side of the frame 101 in the (-X) direction, the partition wall 102, the top surface of the frame 101, and the bottom surface of the frame 101 functions as the developing tank 210. Inside the developing tank 210, a plurality of transport rollers 104 are arranged at predetermined intervals along the X direction, and a plurality of developer nozzles 220 are provided above the transport rollers 104. Each developer nozzle 220 is mounted on the top surface of the developing tank 210 with its nozzle (not shown) facing the transport roller 104. Moreover, when the developer stored in the tank 230 is supplied to the developer nozzles 220 through the circulation supply unit 240, the developer is sprayed out in a spray form toward the upper surface of the substrate S transported by the transport rollers 104.

[0071] Tank 230 is an example of the "first tank" of the present invention, configured to store developer. The circulation supply unit 240 includes: a pipe 241 connecting the lower end of tank 230 to developer nozzle 220; a valve 242, inserted between pipe 241; and a pump 243, inserted between valve 242 and developer nozzle 220, also inserted between pipe 241. When valve 242 is opened and pump 243 is activated according to a command from control unit 500 controlling the entire substrate processing system 100, developer stored in tank 230 is supplied to developer nozzle 220 via pipe 241. The developer is then sprayed in a mist from the nozzle 220 onto the upper surface of substrate S, and substrate S is developed using the developer. The developed developer is then recycled to the inner bottom surface of the developing tank 210. One end of the recycling pipe 244 of circulation supply unit 240 is connected to this inner bottom surface. Furthermore, the other end of the recovery pipe 244 extends into the interior of the tank 230. Therefore, the developer recovered from the bottom surface of the developing tank 210 is returned to the recovery pipe 244. In this way, the developer circulates between the tank 230, the developer nozzle 220, the substrate S, and the developing tank 210 via the circulation supply unit 240, while the developing process is performed by supplying developer to the substrate S.

[0072] Additionally, a drain section 250 is connected to the bottom of the developing tank 210. The drain section 250 includes a drain pipe 251 extending from the bottom of the developing tank 210 to a drain facility (not shown); and a valve 252, which is inserted into the drain pipe 251. During the developing process, the valve 252 is closed according to a command from the control unit 500, continuing the storage of the developer in the tank 230. On the other hand, if the developer deteriorates further, the valve 252 is opened according to a command from the control unit 500 while the developing process is stopped, thereby draining the deteriorated developer.

[0073] Here, if the developing process is performed, for example, as... Figure 3A As shown, when the developer returns from the developing tank 210 to the tank 230, a large amount of bubbles B sometimes forms within the tank 230. For example, bubbles B sometimes form during flow in the recovery pipe 244 and flow into the tank 230 along with the developer. Additionally, bubbles B sometimes form when flowing from the recovery pipe 244 into the tank 230. These introduced bubbles B, as described above, are a factor contributing to adverse conditions. Furthermore, if degraded developer, for example... Figure 4A As shown, bubbles B sometimes remain in tank 230 after being discharged from the developing tank 210. Therefore, in order to solve these problems, the developing apparatus 200 of this embodiment is also equipped with multiple multi-functional nozzles 261, common piping 262, three-way valve 263, defoaming piping 264 and bubble removal piping 265.

[0074] Each multi-functional nozzle 261 includes a spray nozzle mounted on the top surface of the tank 230 with its outlet (not shown) facing the inner bottom surface of the tank 230. The multi-functional nozzle 261 is connected to the first port of a three-way valve 263 via a common conduit 262. The second port of the three-way valve 263 is connected to the lower end of the tank 230 via a defoaming conduit 264. A pump 266 is inserted into the defoaming conduit 264. Furthermore, the third port of the three-way valve 263 is connected to a deionized water (DIW) supply source via a bubble removal conduit 265. Moreover, based on a switching command from the control unit 500, the connection of the multi-functional nozzle 261 is switched between the tank 230 and the DIW supply source. For example, when the first, second, and third ports of the three-way valve 263 are respectively "open," "open," and "closed," the tank 230 is connected to the multi-functional nozzle 261. If, in this state, pump 266 operates according to instructions from control unit 500, the developer stored in tank 230 is delivered as defoamer to multi-functional nozzle 261 and sprayed from multi-functional nozzle 261 into tank 230. The sprayed defoamer thus has the same composition as the developer and is in a spray or mist state. Therefore, even if bubbles B exist in tank 230, for example... Figure 3B As shown, bubble B (refer to) Figure 3A The foam will also disappear through the supply of the defoaming solution. Moreover, the defoaming solution is the developer solution that is originally present in tank 230. Therefore, even if the defoaming treatment is performed, the concentration of the developer solution stored in tank 230 will not change, and the developing and defoaming treatments can be performed in parallel without adversely affecting the developing process.

[0075] The effect of bubble B is not limited to the developing process; it also needs to be considered during the so-called maintenance process, where residual developer in tank 230 is drained and replaced with fresh developer. This is because, for example, ... Figure 4A As shown, when the developer is discharged from tank 230, bubble B may sometimes remain inside. If new developer is added to tank 230 while bubble B remains, the concentration of the developer stored in tank 230 may deviate from the desired value. Furthermore, impurities attached to bubble B may also contaminate the developer. Therefore, ideally, the bubble B remaining in tank 230 should be discharged from tank 230 along with the developer repeatedly used in the developing process before adding fresh developer.

[0076] Therefore, in this embodiment, as Figure 4BAs shown, a foam removal process is performed instead of the defoaming process. That is, when the first, second, and third ports of the three-way valve 263 are changed to "open," "closed," and "open" respectively according to the command from the control unit 500, the DIW (pure water) supply source is connected to the multi-functional nozzle 261. The "DIW supply source" is a type of device commonly installed in a factory where the substrate processing system 100 is installed. Moreover, when connected to the multi-functional nozzle 261, DIW is supplied to the multi-functional nozzle 261 as a foam removal liquid, and sprayed from the multi-functional nozzle 261 into the tank 230. The foam removal liquid sprayed in this way causes the foam B remaining in the tank 230 to flow to the drain section 250 and be discharged through the drain section 250 (foam removal process).

[0077] As described above, in the first embodiment, the control unit 500 controls each part of the device to selectively perform defoaming and bubble removal processes. Furthermore, when the developing process, defoaming process, and bubble removal process are all stopped, such as... Figure 2 As shown, close all valves 242 and 252, and close all ports of the three-way valve 263.

[0078] When performing development processing, such as Figure 3B As shown, by opening valve 242 and operating pump 243, the developer circulates in the path of tank 230 - piping 241 - developer nozzle 220 - substrate S - recovery piping 244, while simultaneously developing substrate S. Additionally, simultaneously with (or slightly delayed) the start of developer circulation, by switching the first and second ports of three-way valve 263 to "open" and operating pump 266, the developer circulates in the path of tank 230 - defoaming piping 264 - three-way valve 263 - common piping 262 - multi-functional nozzle 261 - bubble B (refer to...). Figure 3A It loops through this path while performing defoaming.

[0079] If the developer deteriorates rapidly during repeated development processes, the control unit 500 controls each part of the device as follows to stop the development and defoaming processes, and then performs a liquid removal process. More specifically, pumps 243 and 266 stop, and valve 242 closes, as well as the first and second ports of the three-way valve 263 (stopping the development and defoaming processes). Immediately thereafter, by opening valve 252, the developer in tank 230 is discharged through drain pipe 251. In addition, by switching the first and third ports of the three-way valve 263 to "open", in parallel with the discharge of the developer, the bubble B (see reference) is discharged from the multi-functional nozzle 261. Figure 4A ) Supply DIW in spray or mist form, so that bubble B, developer and DIW are discharged together through drain pipe 251.

[0080] As described above, according to this embodiment, by supplying a defoaming solution with the same composition as the developing solution to the bubble B, the bubble B introduced into the tank 230 can be effectively eliminated. Furthermore, since the defoaming solution and the developing solution have the same composition, the developing solution stored in the tank 230 will not experience concentration or composition changes, enabling consistently stable developing processes. Therefore, bubbles B generated during the developing process can be efficiently eliminated within the tank 230. As a result, interruptions in the developing process caused by bubbles B can be suppressed, thereby improving the operating rate of the developing apparatus.

[0081] In addition, when the deteriorated developer stored in tank 230 is replaced with fresh developer, DIW is supplied as a bubble removal solution, so bubble B can be efficiently discharged from tank 230.

[0082] Thus, in the first embodiment, the circulating supply unit 240 corresponds to an example of the "first circulating supply unit" of the present invention. Furthermore, the multi-functional nozzle 261, common piping 262, three-way valve 263, defoaming piping 264, and pump 266 function as the defoaming liquid supply unit 270, corresponding to an example of the "first defoaming liquid supply unit" of the present invention. Additionally, the drain unit 250 functions as the "first drain unit" of the present invention. Furthermore, the multi-functional nozzle 261, common piping 262, three-way valve 263, and foam removal piping 265 function as the foam removal unit 280, corresponding to an example of the "first foam removal unit" of the present invention.

[0083] Furthermore, in the first embodiment, such as Figure 2 As shown by the dashed line, a fluid tank FB (comprising tank 230, circulation supply unit 240, drainage unit 250, defoamer supply unit 270, and bubble removal unit 280) is provided for processing the developer in the developing tank 210, which includes the developer nozzle 220. Therefore, it is impossible to perform the developing process and the bubble removal process, which involve defoaming, in parallel. Thus, the developing process needs to be interrupted during the bubble removal process. Here, to avoid interruptions in the developing process, for example, an additional fluid tank (second embodiment) may be added.

[0084] Figure 5 This is an enlarged view of a portion of the second embodiment of the developing apparatus of the present invention. Figure 6A and Figure 6B It is a schematic representation Figure 5 The diagram shows the operation of the developing apparatus. The second embodiment differs significantly from the first embodiment in that a fluid tank is added, piping 241 and pump 243 are shared, and a three-way valve 245 is added for this sharing. Otherwise, it is essentially the same as the first embodiment. Therefore, the following description focuses on the differences, using the same symbols for identical structures, and omitting further explanation.

[0085] like Figure 5 As shown, the second embodiment includes a first fluid tank FB1 and a second fluid tank FB2. Furthermore, a three-way valve 245 is added between the first fluid tank FB1 and the second fluid tank FB2. The first port of the three-way valve 245 is connected to the developer nozzle 220 via a common conduit 241a, through which a common pump 243 is inserted. The second port is connected to the tank 230 of the first fluid tank FB1 via a conduit 241b, and the third port is connected to the tank 230 of the second fluid tank FB2 via a conduit 241c.

[0086] like Figure 6A As shown, when the first, second, and third ports of the three-way valve 245 are changed to "open," "open," and "closed" respectively according to the instructions from the control unit 500, the developing process and the defoaming process can be performed in parallel using the first fluid tank FB1, and the bubble removal process can be performed using the second fluid tank FB2. That is, in the first fluid tank FB1, by opening the valve 242 and running the pump 243, the developer circulates in the path of tank 230-pipeline 241b-three-way valve 245-pipeline 241a-developer nozzle 220-substrate S-recovery pipe 244, while developing the substrate S (first developing mode). In addition, at the same time as (or slightly delayed) the start of the developer circulation, by switching the first and second ports of the three-way valve 263 to "open" and running the pump 266, the developer circulates in the path of tank 230-defoaming pipe 264-three-way valve 263-common pipe 262-multifunctional nozzle 261-bubble B (refer to...). Figure 3A It loops through this path while performing defoaming.

[0087] In the second fluid tank FB2, the developer in tank 230 is discharged via drain pipe 251 by opening valve 252. Additionally, by switching the first and third ports of the three-way valve 263 to "open," bubble B (see reference) is discharged from the multi-functional nozzle 261 in parallel with the developer discharge. Figure 4A ) Supply DIW in spray or mist form, so that bubble B, developer and DIW are discharged together through drain pipe 251 (second maintenance mode).

[0088] On the other hand, such as Figure 6BAs shown, when the first, second, and third ports of the three-way valve 245 are changed to "open," "closed," and "open" respectively according to the command from the control unit 500, bubble removal processing can be performed using the first fluid tank FB1, and developing and defoaming processing can be performed in parallel using the second fluid tank FB2. That is, in the second fluid tank FB2, by opening the valve 242 and running the pump 243, the developer circulates in the path of tank 230-pipeline 241b-three-way valve 245-pipeline 241a-developer nozzle 220-substrate S-recovery pipeline 244, while developing substrate S (second developing mode) is performed simultaneously. In addition, at the same time as (or slightly delayed) the start of developer circulation, by switching the first and second ports of the three-way valve 263 to "open" and running the pump 266, the developer circulates in the path of tank 230-defoaming pipeline 264-three-way valve 263-common pipeline 262-multifunctional nozzle 261-bubble B (refer to...). Figure 3A It loops through this path while performing defoaming.

[0089] In the first fluid tank FB1, the developer solution in tank 230 is discharged via drain pipe 251 by opening valve 252. Additionally, by switching the first and third ports of the three-way valve 263 to "open," bubble B (see reference) is discharged from the multi-functional nozzle 261 in parallel with the developer solution discharge. Figure 4A ) Supply DIW in spray or mist form, so that bubble B, developer and DIW are discharged together through drain pipe 251 (first maintenance mode).

[0090] As described above, according to the second embodiment, while achieving the same effect as the first embodiment, the interruption of the developing process can be prevented, and the operating rate of the developing apparatus 200 can be further improved.

[0091] Thus, in the second embodiment, the tank 230, circulation supply unit 240, drainage unit 250, defoaming liquid supply unit 270, and foam removal unit 280 constituting the second fluid tank FB2 are respectively equivalent to an example of the "second tank", "second circulation supply unit", "second drainage unit", "second defoaming liquid supply unit", and "second foam removal unit" of the present invention.

[0092] Furthermore, the present invention is not limited to the described embodiments, and various modifications can be made to the content as long as the spirit of the invention is not departed from. For example, in the described embodiments, DIW is used as the bubble removal solution, but other liquids, such as carbonated water, electrolyzed ionized water, hydrogen-rich water, ozone water, cleaning solutions or developing solutions containing developer components, etc., may also be used.

[0093] Furthermore, in the described embodiment, the defoaming liquid and the foam-removing liquid are selectively sprayed from the multi-functional nozzle 261. However, nozzles dedicated to defoaming liquid and foam-removing liquid may also be provided instead of the multi-functional nozzle 261. Additionally, the shape of these nozzles is not limited to a spray type; for example, a slit nozzle may also be used.

[0094] In addition, in the above embodiment, the developer stored in tank 230 is used as a defoaming agent, but unused developer can also be used as a defoaming agent, thereby replenishing the developer in tank 230 in parallel with the defoaming treatment.

[0095] In addition, in the above embodiment, the control unit 500 of the substrate processing system 100 is used to control each part of the developing apparatus 200. However, it is also possible to configure a dedicated control unit for controlling the developing apparatus 200 in the developing apparatus 200 and use the control unit to control each part of the developing apparatus 200.

[0096] [Industry availability]

[0097] This invention can be applied to all developing techniques that involve supplying developing solution to a substrate and performing developing processes.

Claims

1. A developing device comprising: a developing tank; a developer nozzle that sprays a developer onto a substrate in the developing tank; a first tank that stores the developer; a first circulation supply section that supplies the developer in the first tank to the developer nozzle and returns the developer recovered into the developing tank to the first tank; and a first antifoaming liquid supply section that supplies an antifoaming liquid of the same composition as the developer to bubbles generated in the first tank due to the return of the developer to the first tank.

2. The developing device according to claim 1, comprising a control section, the control section controls the first circulation supply section so that the developer circulates between the first tank, the developer nozzle, the substrate, and the developing tank while the substrate is developed with the developer, and controls the first antifoaming liquid supply section so that the bubbles are eliminated with the antifoaming liquid in parallel with the development of the substrate.

3. The developing device according to claim 2, wherein the control section controls the first antifoaming liquid supply section so that the supply of the antifoaming liquid to the bubbles is started at the same time as the start of the development of the substrate.

4. The developing device according to claim 1, comprising: a first liquid discharge section that discharges the developer from the first tank in a state where the circulation of the developer in the first tank, the developer nozzle, the substrate, and the developing tank is stopped; and a first bubble removal section that flushes the bubbles from the first tank via the first liquid discharge section by supplying a bubble removal liquid to the first tank.

5. The developing device according to claim 4, comprising: a second tank that stores the developer independently of the first tank; a second circulation supply section that supplies the developer in the second tank to the developer nozzle and returns the developer recovered into the developing tank to the second tank; a second antifoaming liquid supply section that supplies the antifoaming liquid to bubbles generated in the second tank due to the return of the developer to the second tank; a second liquid discharge section that discharges the developer from the second tank in a state where the circulation of the developer in the second tank, the developer nozzle, the substrate, and the developing tank is stopped; and a second bubble removal section that flushes the bubbles from the second tank via the second liquid discharge section by supplying the bubble removal liquid to the second tank.

6. The developing device according to claim 5, further comprising a control section, an operation in which the developer is circulated between the first tank, the developer nozzle, the substrate, and the developing tank while the substrate is developed with the developer in a state where the developer is discharged from the first tank and the bubbles are flushed away is defined as a first developing mode, an operation in which the developer is discharged from the first tank and the bubbles are flushed away in a state where the development of the substrate with the developer circulated between the first tank, the developer nozzle, the substrate, and the developing tank is stopped is defined as a first maintenance mode, ​ ​ ​ An action of circulating the developer between the second tank, the developer nozzle, the substrate, and the developing bath while developing the substrate with the developer circulating between the second tank, the developer nozzle, the substrate, and the developing bath in a state where the developer is discharged from the second tank and the bubbles are washed away is defined as a second developing mode, An action of discharging the developer from the second tank and washing away the bubbles in a state where the substrate is not developed with the developer circulating between the second tank, the developer nozzle, the substrate, and the developing bath is defined as a second maintenance mode, and The control section controls the first circulating supply section, the first defoaming liquid supply section, the second circulating supply section, and the second defoaming liquid supply section so that the second maintenance mode is executed during execution of the first developing mode and the first maintenance mode is executed during execution of the second developing mode.

7. A developing method of developing a substrate with a developer sprayed from a developer nozzle in a developing bath, the developing method comprising the steps of: supplying the developer in a first tank to the developer nozzle and returning the developer recovered into the developing bath to the first tank; and supplying a defoaming liquid of the same composition as the developer to bubbles generated in the first tank due to the return of the developer to the first tank.

Images