Substrate transfer robot lifting device and method thereof

Abstract

A robotic lifting device is provided. The robotic lift apparatus includes a robotic lift crane configured to lift the substrate transfer robot to a raised position. The robotic lift device also includes a track section that may extend from a chamber on the platform to an outer region. The robotic lift crane may lift the robot from the chamber and transport it along the track to the exterior area for repair / maintenance, or lift the robot from the exterior area and transport it back to the chamber along the track for installation into the chamber.

Description

Technical Field

[0001] This disclosure generally relates to the manufacture of semiconductor devices. More specifically, this disclosure relates to the removal of a substrate handling robot from a substrate handling chamber for maintenance, such as repair or replacement. Background Technology

[0002] Semiconductor processing system platforms typically have a wafer transfer chamber that houses a wafer transfer robot to transfer substrates between processing modules and device front-end modules that are interconnected via wafer transfer modules. In some semiconductor processing systems, it may be necessary to remove the wafer transfer robot for maintenance and replacement, such as in cases where the wafer transfer robot malfunctions or the semiconductor processing system platform is unlikely to be repurposed to interface with a different processing module than originally provided.

[0003] In many conventional systems, the removal and replacement of wafer transfer robots typically requires the installation of overhead platforms. These platforms often span the wafer transfer chamber and need to be assembled onto, disassembled from, and removed from the platform before use. Installation and removal require overhead work. This can reduce the availability of the semiconductor processing system, and currently, systems with more than one wafer transfer chamber often have two separate platforms.

[0004] Furthermore, in some conventional systems, the wafer transfer robot is pulled out using a support column. This removal mechanism can lead to overhead work and complexity.

[0005] Any discussion set forth in this section (including discussions of problems and solutions) is included in this disclosure merely for the purpose of providing background to this disclosure and should not be construed as an admission that any or all of the discussions were known at the time the invention was made or otherwise constituted prior art. Summary of the Invention

[0006] A robotic lifting device is provided. A maintenance platform for supporting the robotic lifting device is also provided. The maintenance platform is mounted above a semiconductor processing system having an Equipment Front End Module (EFEM), a load locking chamber connected to the EFEM, and a substrate transport chamber (SHC) connected to the load locking chamber. The robotic lifting device includes at least one track supported on the maintenance platform. The robotic lifting crane is configured to slide along at least one track. The robotic lifting crane is further configured to lift a substrate transport robot.

[0007] According to some embodiments, a robotic lifting device includes: a maintenance platform configured to support the robotic lifting device, wherein the maintenance platform is mounted above a semiconductor processing system, the semiconductor processing system including an equipment front-end module (EFEM), a load locking chamber connected to the EFEM, and a substrate transport chamber (SHC) connected to the load locking chamber; a first track on the maintenance platform; and a robotic lifting crane configured to slide along the first track, wherein the robotic lifting crane is further configured to lift the substrate transport robot.

[0008] In some embodiments, the robot lifting device further includes: a second rail on the maintenance platform, wherein the second rail is angled relative to the first rail. The robot lifting device also includes: a third rail coupled to the first and second rails; and a turntable coupled to the third rail, wherein the turntable is configured to rotate along a first axis, wherein when the robot lifting crane is on the first rail, the turntable is configured to align with the first rail, and wherein when the robot lifting crane is on the second rail, the turntable is configured to align with the second rail. The turntable includes a bottom safety locking mechanism configured to hold the turntable in place aligned with either the first or second rail.

[0009] In some embodiments, the robotic lifting crane includes: a top section configured to lift a substrate transport robot; a base section configured to slide along a first track, wherein the base section includes a base support section to hold the substrate transport robot; and an intermediate section including a first intermediate end and a second intermediate end, wherein the first intermediate end is coupled to the top section and the second intermediate end is coupled to the base section. The robotic lifting crane further includes: a chain hoist configured to deploy and retract a chain to lift the substrate transport robot; and a hook assembly coupled to the chain to secure the substrate transport robot to the robotic lifting crane. The robotic lifting device also includes: a belt configured to constrain movement of the substrate transport robot after it has been placed on the base support section. The top section includes a horizontal section, and the robotic lifting crane includes a sliding mechanism coupled to the chain hoist, wherein the sliding mechanism is configured to slide along the horizontal section and place the substrate transport robot on the base support section when the robotic lifting crane has lifted the substrate transport robot. The base section also includes: a first leg; and a second leg, wherein the first leg and the second leg are separated by the base support section, and wherein the first leg and the second leg are equipped with interfaces aligned with the first track.

[0010] In some embodiments, the robot lifting device further includes a crane lock safety mechanism, wherein the crane lock safety mechanism is coupled to a first track end of a first track, wherein the crane lock safety mechanism is in a closed position when the robot lifting crane lifts the substrate transport robot, and wherein the crane lock safety mechanism is configured to open to move the robot lifting crane along the first track.

[0011] In some embodiments, the robotic lifting device further includes a raised hoop attached to an actuator of the substrate handling robot, wherein the raised hoop includes a plurality of lifting rods; an attachment section supported by the plurality of lifting rods; and an attachment mechanism coupled to the attachment section, wherein the attachment mechanism is configured to engage with a hook assembly of the robotic lifting crane.

[0012] According to some embodiments, a method for transporting a substrate handling robot from a substrate handling chamber of a semiconductor processing system includes: lifting the substrate handling robot from the substrate handling chamber; and moving the substrate handling robot along a track mounted above a maintenance platform.

[0013] In some embodiments, lifting a substrate transport robot from a substrate transport chamber includes: extending a lifting chain toward the substrate transport robot, wherein the lifting chain is coupled to a hook assembly; attaching the hook assembly to an attachment mechanism of the substrate transport robot; and retracting the lifting chain as the substrate transport robot is attached to the hook assembly after the hook assembly is attached to the attachment mechanism.

[0014] In some embodiments, lifting the substrate transport robot from the substrate transport chamber further includes placing the substrate transport robot onto a base support section, wherein the base support section is configured to move along a track. Placing the substrate transport robot onto the base support section further includes sliding the substrate transport robot from a suspended position to a resting position, such that in the resting position, the bottom surface of the actuator of the substrate transport robot is engaged with the top surface of the base support section.

[0015] In some embodiments, the substrate transport robot that moves along the track further includes: supporting the substrate transport robot on a robotic lifting crane; aligning a first leg of the robotic lifting crane with a first side of the track; aligning a second leg of the robotic lifting crane with a second side of the track; and moving the robotic lifting crane along the track.

[0016] In some embodiments, the track-moving robot lifting crane further includes a first track segment moving robot lifting crane along the track; and a second track segment moving robot lifting crane along the track, wherein the first track segment and the second track segment form an angled path.

[0017] According to some embodiments, a robotic lifting device includes at least one track section; and a robotic lifting crane configured to slide along at least one track section, wherein the robotic lifting crane is further configured to lift a substrate transport robot.

[0018] In some embodiments, at least one track segment includes: a first track segment; a second track segment; and a third track segment movable about a first axis to rotate between a first position and a second position, wherein the third track segment is aligned with the first track segment at the first position, and wherein the third track segment is aligned with the second track segment at the second position.

[0019] In some embodiments, the robot lifting device further includes a turntable configured to rotate about a first axis, wherein a third track segment is connected to the turntable.

[0020] This summary is provided to present the chosen concepts in a simplified form. These concepts are further described in detail in the following exemplary embodiments of this disclosure. This summary is not intended to identify key or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter. Attached Figure Description

[0021] These and other features, aspects, and advantages of the invention disclosed herein are described below with reference to the accompanying drawings of certain embodiments, which are intended to illustrate rather than limit the invention.

[0022] Figure 1 A robotic lifting system for a substrate processing system according to an example embodiment of the present invention is shown.

[0023] Figure 2 An example embodiment of the invention is shown for use in Figure 1 The robotic lifting system of the substrate processing system.

[0024] Figure 3 An example embodiment according to the present invention is shown. Figure 1 Top perspective view of a substrate handling robot for a semiconductor processing system.

[0025] Figure 4 An example embodiment of the invention is shown. Figure 1 A perspective view of a substrate handling robot lifting the substrate handling chamber of a substrate processing system.

[0026] Figure 5A , Figure 5B and Figure 5C An example embodiment of the invention is shown for lifting Figure 1 A robotic lifting crane for substrate handling robots.

[0027] Figure 6A , Figure 6B and Figure 6C An example embodiment of the invention for transportation is shown. Figure 1 A turntable for substrate handling robots.

[0028] Figure 7 An example embodiment of the invention is shown. Figure 1 A flowchart of a method for transporting a substrate handling robot in a substrate handling chamber of a semiconductor processing system.

[0029] It should be understood that the elements in the accompanying drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the relative dimensions of some elements in the drawings may be exaggerated relative to other elements to aid in understanding the illustrated embodiments of the invention. Detailed Implementation

[0030] Referring now to the accompanying drawings, wherein like reference numerals identify similar structural features or aspects of the invention. The systems and methods of the invention can be used in semiconductor processing systems for manufacturing semiconductor devices, such as those used to deposit material layers during the manufacture of logic and memory devices using chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques, but the invention is generally not limited to any semiconductor processing operation or the manufacture of any particular semiconductor device.

[0031] As used herein, the term "substrate" can refer to any one or more underlying materials, including any one or more underlying materials that can be modified or on which devices, circuits, or films can be formed. A "substrate" can be continuous or discontinuous; rigid or flexible; solid or porous; and combinations thereof. A substrate can be in any form, such as powder, plate, or workpiece. Plate-type substrates can include wafers of various shapes and sizes. Wafers can have diameters of 200 mm, 300 mm, or even 450 mm. A substrate can be formed from one or more semiconductor materials, including, as non-limiting examples, silicon, silicon germanium, silicon oxide, gallium arsenide, gallium nitride, and silicon carbide.

[0032] refer to Figure 1A robotic lifting system 100 for a substrate processing system is shown. The substrate processing system may include a front-opening wafer transfer cassette (FOUP), an equipment front-end module (EFEM), a load-locking chamber, one or more substrate transport chambers (SHCs) (122, 124), one or more processing modules, and a control processor (which also includes memory). Typically, unprocessed wafers are accessed by the substrate processing system in the FOUP. The EFEM includes a front-end robot (not shown) configured to acquire wafers from the FOUP and prepare them for transport to the load-locking chamber. The transfer of wafers from the load-locking chamber to the processing modules is carried by a substrate transport robot 300 (also referred to as a robot) in the substrate transport chambers 122, 124.

[0033] exist Figure 1 In the example shown, the substrate processing system includes a clustered platform with processing modules configured to deposit material layers on the substrate using various deposition techniques, such as atomic layer deposition (ALD). This is for illustrative and descriptive purposes only and is not limiting. As those skilled in the art will understand from this disclosure, substrate processing systems configured for other material layer deposition operations, as well as semiconductor processing systems configured for processing operations other than material layer deposition, may also benefit from this disclosure.

[0034] like Figure 1 As shown, the robot lifting system 100 includes a maintenance platform 110. The maintenance platform 110 is strategically mounted above the semiconductor processing system and is designed to support and facilitate maintenance operations. In an example embodiment, the maintenance platform 110 includes two sections: a first maintenance platform area 110-2 mounted above the semiconductor processing system (i.e., above one or more load locking chambers, one or more substrate transport chambers, and / or EFEM), and a second maintenance platform area 110-1 connected to the first maintenance platform area and opening to the outside of the semiconductor processing system. In an example embodiment, the second maintenance platform area 110-1 is connected to the first maintenance platform area 110-2 at an angle (i.e., the first and second maintenance platform areas are not aligned with each other in a straight line). In some embodiments, the second maintenance platform area 110-1 is arranged at an angle relative to the first maintenance platform area 110-2.

[0035] like Figure 1 As further shown, the robot lifting system 100 also includes a robot lifting crane 500 (also referred to as a crane) and at least one track 200. The robot lifting crane 500 is configured to vertically lift the substrate handling robot 300 out of the substrate handling chamber 122 and secure it for transport. Once the substrate handling robot 300 is secured, the robot lifting crane 500 can be moved along at least one track 200 to a maintenance area on the maintenance platform 110, or can be completely removed for repair and / or replacement.

[0036] Now for reference Figure 3 The image shows a top perspective view of a substrate handling robot 300. The substrate handling robot 300 includes an actuator 350 having an actuator top 352 (e.g., an actuator top surface). Figure 3 As further shown, the substrate handling robot 300 may include a single arm or two arms 356. The substrate handling robot 300 also includes a raised ring 320, which enables the robot lifting crane 500 to attach to the substrate handling robot 300 and further secure it for transport.

[0037] like Figure 3 As shown, the raised ring 320 includes one or more lifting rods 326 attached to the top section 352 of the actuator. The raised ring 320 also includes attachment sections 322 supported on the lifting rods 326. In the example embodiment, three lifting rods 326 are included in the raised ring 320, and the triangular attachment section 322 is supported. However, any other embodiment functioning in a similar manner can be utilized. Finally, the raised ring 320 includes an attachment mechanism 324. The attachment mechanism 324 is configured to engage with the robotic lifting crane 500.

[0038] like Figure 3 As shown, this type of raised ring 320 allows the robot to operate without the lifting mechanism interfering with, disrupting, or damaging the structure or operation of the robot's arm. Furthermore, the raised ring 320 is designed and positioned above the actuator 350, where attachment points (such as attachment mechanism 324) are strategically reinforced to handle the lifted weight and stress and minimize tilting or displacement during lifting operations.

[0039] Now for reference Figure 2 , Figure 4 , Figure 5A , Figure 5B and Figure 5C The structure and operation of the robotic lifting crane 500 are shown. Figure 2 , Figure 5A and Figure 5B As shown, the robotic lifting crane 500 includes three sections: a base section 530, a top section 520, and a middle section 510. In an example embodiment, the base section 530, top section 520, and middle section 510 may be separate pieces attached together. In an example embodiment, the base section 530, top section 520, and middle section 510 are single pieces.

[0040] The robotic lifting crane 500 also includes a lifting mechanism 540 configured to lift the substrate handling robot 300 out of the substrate handling chamber. For example... Figure 5CAs shown, the lifting mechanism 540 includes a hook assembly 546 configured to securely engage with the substrate handling robot 300 at the attachment mechanism 324. In an example embodiment, the hook assembly 546 may comprise a mechanical hook, a gripper, or any other clamping mechanism that engages with a designated attachment point of the attachment mechanism 324.

[0041] The lifting mechanism 540 also includes a chain hoist 544 for controlling the deployment and retraction of the durable lifting chain. The lifting chain can be attached to a hook assembly 546. In an example embodiment, the lifting chain may be made of a high-strength material capable of supporting the weight of the substrate handling robot 300.

[0042] During operation, when at least a portion of the robotic lifting crane 500 is positioned above the substrate handling robot 300, the chain hoist 544 is activated to lower the lifting chain and descend toward the robot 300 (see [link]). Figure 4 As the lifting chain descends, the hook assembly 546 aligns with the attachment point of the attachment mechanism 324. When the hook assembly 546 engages with the attachment mechanism 324, a locking mechanism within the hook assembly 546 ensures that the hook assembly 546 remains securely attached to the substrate handling robot 300 during the lifting process. In an example embodiment, the locking mechanism may include a latch, a clamp, or any other known or available locking mechanism to securely attach the hook assembly 546 to the attachment mechanism 324.

[0043] After securing the hook assembly 546 with the attachment mechanism 324, the chain hoist 544 is activated to retract the lifting chain and wind it back to the appropriate position, simultaneously lifting the substrate handling robot 300. In the example embodiment, the substrate handling robot 300 is lifted vertically (see [link to example]). Figure 4 In an example embodiment, chain hoist 544 is configured to lift substrate handling robot 300 to a predetermined height (e.g., a desired height). In an example embodiment, chain hoist 544 allows control over the lifting speed and height.

[0044] like Figure 5A and 5C As shown, the top section 520 includes a first tip 524 and a second tip 526. The top section 520 includes a horizontal section 522 extending from the first tip 524 to the second tip 526. In an example embodiment, the horizontal section 522 is recessed on either side to have an "I"-shaped cross-section, allowing the top section 520 to accommodate sliding along the horizontal section 522. After the substrate handling robot 300 is lifted using the chain hoist 544, the substrate handling robot 300 can slide along the horizontal section 522. In an example embodiment, the second tip 526 is attached to the intermediate section 510.

[0045] like Figure 2As shown, the base section 530 is aligned with at least one track 200 and further configured to slide along the track 200. The base section 530 includes three sections: a first base leg 534, a second base leg 536, and a flat base support section 532 (also referred to as a base support section). The first base leg 534 and the second base leg 536 are opposite each other and parallel. The first base leg 534 and the second base leg 536 are separated from each other by the flat base support section 532. In an example embodiment, the first base leg 534 and the second base leg 536 are "I"-shaped, having a longer top and bottom edge than the middle. Figure 2 As further shown, each of the outriggers 534 and 536 is equipped with an interface aligned with the track 200. The interface may include one or more of wheels, rollers, sliders, or any other interface mechanism (e.g., magnetic or electric) to allow the outriggers 534 and 536 to move smoothly along the track 200.

[0046] In the example embodiment, the flat base support section 532 is designed as a resting surface for the robot 300 during transport. Figure 2 , Figure 5A and Figure 5B As further shown, the intermediate section 510 of the robotic lifting crane 500 is a columnar section extending from the first intermediate end 512 to the second intermediate end 514. The first intermediate end 512 is attached to the second top end 526, and the second intermediate end 514 is attached to the base support section 532. Therefore, the top section 520 and the base section 530 are separated by the intermediate section 510.

[0047] Briefly return to the reference Figure 5C In an example embodiment, the lifting mechanism 540 includes a sliding feature 542 attached to a chain hoist 544. The sliding feature 542 is coupled to a top section 520 and configured to move back and forth along a horizontal section 522 from a first top end 524 to a second top end 526. In operation, the chain hoist 544 is used to lift the substrate handling robot 300, and the substrate handling robot 300 is positioned as follows: Figure 5A The location shown.

[0048] However, the substrate handling robot 300 in this orientation can be complex due to the resulting overhangs. Therefore, in the example embodiment, the substrate handling robot 300 is moved using the sliding feature 542 as follows: Figure 5B The location is shown. In the example embodiment, the substrate handling robot 300 rests on the flat base support section 532, as shown. Figure 5BAs shown. This orientation can significantly reduce sag. Since the hook assembly 546 remains attached to the raised ring 320, the robot 300 remains securely in place during transport. In the example embodiment, a further substrate-handling robot 300 can be used to further secure the substrate.

[0049] After the robot 300 is moved using the robotic lifting crane 500 to secure the substrate, the robotic lifting crane 500 can move along the track 200. The first base leg 534 and the second base leg 536 are equipped with interfaces aligned along the track 200. This alignment of the first base leg 536 and the second base leg 534 along the track 200 ensures that the crane 500 remains stable and accurately positioned during operation. During the lifting operation as described above, one or both legs 536 and 534 are locked to the track 200. In the example embodiment, one or more locking pins 562 may be used to lock the legs 536 and 534 to the track 200. In the example embodiment, any other suitable locking mechanism may be utilized.

[0050] In an example embodiment, track 200 may include a first track segment 210 and a second track segment 220. In the example embodiment, the first track segment 210 is located on a first maintenance platform area 110-2, and the second track segment 220 is located on a second maintenance platform area 110-1. Figure 2 As shown, the first track segment 210 extends from the first end 212 (i.e., the first end of the first track segment 210) to the second end 214 (i.e., the second end of the first track segment 210). Furthermore, the second track segment 220 extends from the first end 224 (i.e., the first end of the second track segment 220) to the second end 226 (i.e., the second end of the second track segment 220). The first track segment 210 extends longitudinally along the first maintenance platform region 110-2, and the second track segment 220 extends longitudinally along the second maintenance platform region 110-1. Therefore, the first track segment 210 and the second track segment 220 are not parallel to each other. In such an embodiment, a locking pin 562 can be used to align and lock the outriggers 536 and 534 with the first track segment 210 at the first end 212 of the first track segment.

[0051] As per reference Figure 4 , Figures 5A-5C During the lifting operation discussed, locking pin 562 is in the closed position to prevent movement of the robotic lifting crane 500. After the substrate handling robot 300 is secured to the robotic lifting crane 500, locking pin 562 can be set to the open position to allow the robotic lifting crane 500 to move along track 200. Figure 2In the example embodiment shown, crane 500 can move along the first track section 210 from the first end 212 to the second end 214, and crane 500 can then switch to a new position to align with the second track section 220 to move from the first end 224 to the second end 226.

[0052] In an example embodiment, the crane 500 may use a turntable mechanism 600 (also called a turntable) to switch alignment between the first track section 210 and the second track section 220. Figure 2 and Figures 6A-6C It shows Figure 2 The structure and operation of the turntable 600 shown. Figure 6A As shown, the turntable 600 includes a rotation mechanism 624 and a flat section 610. In an example embodiment, the flat section 610 is a rectangular section having a first edge 632, a second edge 634, a third edge 636, and a fourth edge 638. The first edge 632 and the third edge 636 are parallel to each other, as shown... Figure 2 As shown. Similarly, the second edge 634 and the fourth edge 638 are parallel to each other.

[0053] like Figure 2 and Figure 6A As further shown, the first edge 632 and the third edge 636 have the same width as the track 200. Furthermore, as... Figure 6C As shown, track 200 includes a third track segment 670 having a first side 672 and a second side 674. In an example embodiment, the first side 672 is coupled to edge 638, and the second side 674 is coupled to edge 634, respectively. In an example embodiment, the first side 672 may be aligned along at least one of sides 262, 264, 252, or 254. Similarly, in an example embodiment, the second side 674 may be aligned along at least one of sides 262, 264, 252, or 254. In some embodiments, the first side 672 may be parallel to at least one of sides 262, 264, 252, or 254 of track 200, and the second side 674 may be parallel to at least one of sides 262, 264, 252, or 254 of track 200.

[0054] During operation, as the robotic lifting crane 500 travels along the first track section 210, the turntable flat section 610 aligns with the first track section 210. Specifically, at least one of the first edge 632 and the third edge 636 is connected to the second end 214 of the first track section 210. Furthermore, the second edge 634 and the fourth edge 638 are aligned with the first side 262 and the second side 264 of the first track section 210, respectively (see...). Figure 6ATherefore, the robotic lifting crane 500 can move along the first track section 210 until it rests on the turntable flat section 610 along the third track section 670.

[0055] The turntable 600 can then be rotated about axis 620 via a rotating mechanism 624. The turntable 600 can rotate until the second edge 634 and the fourth edge 638 are aligned with the first side 252 and the second side 254 of the second track section 220. After rotation, at least one of the first edge 632 and the third edge 634 is coupled to the first end 224 of the second track section 220. The robotic lifting crane 500 can then move along the second track section 220 until it reaches the second end 226 of the second track section 220. Axis 620 is perpendicular to the flat section 610 of the turntable.

[0056] In the example embodiment, locking pin 612 or any other locking mechanism can be used to lock the position of turntable 600. For example, turntable 600 can be locked in a first position using locking pin 612. In the first position, turntable 600 is aligned along a first track segment 210 adjacent to turntable 600. Once aligned, robotic lifting crane 500 can slide from the first track segment 210 to a third track segment 670. Outriggers 534 and 536 can then be locked to sides 672 and 674 via locking mechanism 614. In the example embodiment, locking mechanism 614 can be a locking pin. After robotic lifting crane 500 is locked to turntable 600, locking pin 612 can be released to allow turntable 600 to rotate about axis 620. When turntable 600 rotates to a second position, turntable 600 can be locked in the second position using locking pin 612. In the second position, turntable 600 is aligned along a second track segment 220 adjacent to turntable 600. Once aligned, the robotic lifting crane 500 can slide from the third track section 670 to the second track section 220. Outriggers 534 and 536 can be unlocked to release the locking mechanism 614 and allow the robotic lifting crane 500 to slide along the second track section 220.

[0057] Once the robotic lifting crane 500 reaches the second end 226 of the second track section 220, the substrate handling robot 300 can be detached from the robotic lifting crane 500 for further maintenance. The process of unloading the substrate handling robot 300 is similar to lifting the substrate handling robot 300. That is, the belt securing the substrate handling robot 300 to the robotic lifting crane 500 is unsecured. The substrate handling robot 300 can then slide along the horizontal section 522 from the second top end 526 to the first top end 524. Therefore, the substrate handling robot 300 is removed from its resting position (see...). Figure 5B Slide to the overhang position (see...) Figure 5AThe chain hoist 544 can then be activated to lower the lifting chain and descend. After the lifting chain (and subsequently the substrate handling robot 300) has descended to a predetermined position / height (e.g., desired position / height), the hook assembly 546 disengages from the attachment mechanism 324 to release the robot 300 from the robot lifting crane 500.

[0058] Figures 2 to 6C The robot lifting device is generally described, including lifting a substrate handling robot 300 from SHC122 using a robot lifting crane 500 and transporting the substrate handling robot 300 to an external maintenance area using rails 200 and a turntable mechanism 600. However, the same robot lifting device can also be used to lift the robot 300 from an external maintenance area using the robot lifting crane 500, by placing the robot 300 on the base section 530 of the robot lifting crane 500, sliding / moving the robot lifting crane 500 along one or more rails 200 and the turntable mechanism 600, and mounting the robot 300 into SHC122 using the robot lifting crane 500. Mounting the robot 300 into SHC122 may also include moving it from its resting position (see [reference]). Figure 5B Slide to the overhang position (see) Figure 5A The chain hoist 544 is activated to lower the lifting chain into SHC122, and the hook assembly 546 is disengaged from the attachment mechanism 324 to install the robot 300 into SHC122.

[0059] Figure 7 A method 700 for transporting a substrate handling robot (e.g., robot 300) from a substrate handling chamber (e.g., chamber 122) of a semiconductor processing system is illustrated. Method 700 includes lifting the substrate handling robot from the substrate handling chamber, as shown in block 702. In an example embodiment, method 700 further includes extending a lifting chain into the substrate handling robot. The lifting chain is coupled to a hook assembly, such as hook assembly 546. Method 700 further includes attaching the hook assembly to the substrate handling robot with an attachment mechanism (e.g., attachment mechanism 324). After the hook assembly is securely attached to the attachment mechanism, method 700 further includes retracting the lifting chain as the substrate handling robot is attached to the hook assembly.

[0060] In an example embodiment, method 700 includes supporting a substrate handling robot on a base support section (e.g., base section 530), wherein the base support section is configured to move along a predetermined track. In another example embodiment, method 700 includes moving the substrate handling robot from a suspended position (e.g., Figure 5A (As shown) Slide to the resting position (e.g.) Figure 5B As shown), this allows the bottom surface of the actuator of the substrate handling robot to be connected to the top surface of the base support section in the resting position.

[0061] Method 700 also includes moving a substrate handling robot along a predetermined track (e.g., track 200) mounted above the maintenance platform 110, as shown in box 702. In an example embodiment, method 700 includes supporting the substrate handling robot on a robotic lifting crane, aligning a first leg (e.g., leg 534) of the robotic lifting crane with a first side (e.g., side 262) of the predetermined track, aligning a second leg (e.g., leg 536) of the robotic lifting crane with a second side (e.g., side 262) of the predetermined track, and moving the robotic lifting crane along the predetermined track.

[0062] In an example embodiment, method 700 includes moving a robot lifting crane along a first track segment (e.g., first track segment 210), wherein the predetermined track includes the first track segment, wherein the first track segment has a first end (e.g., first end 212 of the first track segment) and a second end (e.g., second end 214 of the first track segment). Method 700 also includes moving the robot lifting crane along a second track segment (e.g., second track segment 220), wherein the predetermined track includes the second track segment, wherein the second track segment has a first end (e.g., first end 224) and a second end (e.g., second end 226) of the second track segment. The first track segment and the second track segment form an angled path. The angled path forms an angle less than 180 degrees. In some embodiments, the second track segment 220 is positioned at an angle relative to the first track segment 210.

[0063] In an example embodiment, method 700 includes aligning a turntable (e.g., turntable 600 (also referred to as a turntable mechanism)) with a third track segment (e.g., third track segment 670) to a first track segment, wherein the turntable is adjacent to both the first and second track segments. In another example embodiment, method 700 further includes moving a robotic lifting crane to the third track segment, wherein the first track segment is adjacent to the turntable. Method 700 also includes rotating the turntable to align the third track segment with the second track segment, and moving the robotic lifting crane to the second track segment.

[0064] In an example embodiment, method 700 further includes locking the turntable in a first position, moving the robotic lifting crane from a first track section to a third track section, rotating the turntable around a first axis from the first position to a second position, and moving the robotic lifting crane to the second track section.

[0065] Although this disclosure has been provided in the context of certain embodiments and examples, those skilled in the art will understand that this disclosure extends beyond the specifically described embodiments to other alternative embodiments and / or uses of the embodiments and their obvious modifications and equivalents. Furthermore, while several variations of embodiments of the invention have been shown and described in detail, other modifications within the scope of this disclosure will be apparent to those skilled in the art based on this disclosure. Various combinations or sub-combinations of specific features and aspects of the embodiments are also contemplated and still fall within the scope of this disclosure. It should be understood that various features and aspects of the disclosed embodiments can be combined or substituted with each other to form variations of embodiments of the invention. Therefore, it is intended that the scope of this disclosure should not be limited to the specific embodiments described above.

[0066] The headings provided herein (if any) are for convenience only and do not necessarily affect the scope or meaning of the apparatus and methods disclosed herein.

Claims

1. A robot lifting device, comprising: A maintenance platform configured to support a robot lifting device, wherein the maintenance platform is mounted above a semiconductor processing system, the semiconductor processing system including an equipment front-end module (EFEM), a load locking chamber connected to the EFEM, and a substrate transport chamber (SHC) connected to the load locking chamber; The first track on the maintenance platform; and A robotic lifting crane configured to slide along a first track, wherein the robotic lifting crane is further configured to lift a substrate handling robot.

2. The robot lifting device according to claim 1 further includes: The maintenance platform has a second track, which is set at an angle relative to the first track.

3. The robot lifting device according to claim 2 further includes: A third track connects to the first track and the second track; as well as A turntable, connected to a third track, wherein the turntable is configured to rotate along a first axis, wherein when the robotic lifting crane is on the first track, the turntable is configured to align with the first track, and wherein when the robotic lifting crane is on the second track, the turntable is configured to align with the second track.

4. The robot lifting device according to claim 3, wherein, The turntable includes: A bottom safety locking mechanism is configured to hold the turntable in place to align with the first or second track.

5. The robot lifting device according to claim 1, wherein, The robotic lifting crane includes: The top section is configured to lift the substrate handling robot; A base section configured to slide along the first track, wherein the base section includes a base support section for supporting the substrate transport robot; and The intermediate section includes a first intermediate end and a second intermediate end, wherein the first intermediate end is connected to the top section and the second intermediate end is connected to the base section.

6. The robot lifting device according to claim 5, wherein, The robotic lifting crane also includes: A chain hoist configured to extend and retract the chain to elevate the substrate handling robot; and Hook assembly, which is connected to a chain, to secure the substrate handling robot to the robot lifting crane.

7. The robot lifting device according to claim 5 further includes: A belt is configured to constrain the movement of the substrate handling robot after it has been placed on the base support section.

8. The robot lifting device according to claim 6, in, The top section includes a horizontal section, and The robotic lifting crane includes a sliding mechanism connected to a chain hoist, and wherein when the robotic lifting crane has lifted the substrate transport robot, the sliding mechanism is configured to slide along a horizontal section and place the substrate transport robot on the base support section.

9. The robot lifting device according to claim 5, wherein, The base section also includes: The first leg; and The second leg, The first leg and the second leg are separated by the base support section, and The first leg and the second leg are equipped with interfaces that align with the first track.

10. The robot lifting device according to claim 9 further includes a crane lock safety mechanism. in, The crane lock safety mechanism is connected to the first rail end of the first rail. Specifically, when the robotic lifting crane lifts the substrate handling robot, the crane lock safety mechanism is in the closed position, and The crane lock safety mechanism is configured to open to move the robot up and down the crane along the first track.

11. The robot lifting device according to claim 6, further comprising: A raised ring is attached to the actuator of the substrate handling robot. The raised ring includes: Multiple lifting rods; The attachment section is supported by multiple lifting rods; and An attachment mechanism is connected to the attachment section, wherein the attachment mechanism is configured to engage with the hook assembly of the robotic lifting crane.

12. A method for transporting a substrate handling robot from a substrate handling chamber of a semiconductor processing system, the method comprising: Elevate the substrate handling robot from the substrate handling chamber; as well as A substrate transport robot moves along a track mounted above a maintenance platform.

13. The method according to claim 12, wherein, Lifting the substrate handling robot from the substrate handling chamber includes: The lifting chain extends toward the substrate handling robot, wherein the lifting chain is connected to a hook assembly; Attaching the hook assembly to the attachment mechanism of the substrate handling robot; and After the hook assembly is attached to the attachment mechanism, the lifting chain retracts as the substrate handling robot is attached to the hook assembly.

14. The method according to claim 13, wherein, Lifting the substrate handling robot from the substrate handling chamber further includes: A substrate handling robot is placed on a base support section, wherein the base support section is configured to move along the track.

15. The method according to claim 14, wherein, Placing the substrate handling robot onto the base support section further includes: The substrate handling robot is slid from the suspended position to the resting position, such that in the resting position, the bottom surface of the actuator of the substrate handling robot is connected to the top surface of the base support section.

16. The method according to claim 12, wherein, The substrate handling robot that moves along the track also includes: The substrate handling robot is supported on a robotic lifting crane; Align the first leg of the robotic lifting crane with the first side of the track; Align the second leg of the robotic lifting crane with the second side of the track; and The robot moves along the track to lift and lower the crane.

17. The method according to claim 16, wherein, The robotic lifting crane, which moves along the track, also includes: The robot lifts the crane along the first track section of the track; and The robot moves and lifts the crane along the second track section of the track. The first track segment and the second track segment form an angled path.

18. A robot lifting device, comprising: At least one track section; as well as A robotic lifting crane configured to slide along at least one track section, wherein the robotic lifting crane is further configured to lift a substrate transport robot.

19. The robot lifting device according to claim 18, wherein, The at least one track segment includes: First track section; Second track section; A third track segment is movable about a first axis to rotate between a first position and a second position, wherein the third track segment is aligned with the first track segment in the first position, and wherein the third track segment is aligned with the second track segment in the second position.

20. The robot lifting device of claim 19, further comprising a turntable configured to rotate about the first axis, wherein, The third track section is connected to the turntable.

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