A continuous sintering integrated device for processing an aluminum nitride ceramic substrate

By designing an integrated continuous sintering device for aluminum nitride ceramic substrate processing, which combines a limiting plate, auxiliary wheel, and drive wheel, the problem of insufficient positioning accuracy was solved, and stable conveying and uniform sintering of the substrate were achieved, thereby improving the yield rate.

CN121702147BActive Publication Date: 2026-05-05ZHEJIANG CHANGKE CERAMICS NEW MATERIAL CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHEJIANG CHANGKE CERAMICS NEW MATERIAL CO LTD
Filing Date
2026-02-05
Publication Date
2026-05-05

AI Technical Summary

Technical Problem

The existing sintering conveying system for aluminum nitride ceramic substrates has insufficient positioning accuracy, which leads to deviations in the position of the ceramic substrate placement seat, resulting in collisions and stacking, affecting sintering uniformity and yield.

Method used

An integrated continuous sintering device for aluminum nitride ceramic substrate processing was designed. By using a combination of limiting plates, auxiliary wheels and drive wheels, the device achieves precise positioning and stable transport of the ceramic substrate placement seat, avoiding collisions and positional deviations. A stepper motor is used to control the movement of the push plate to ensure accurate pushing and sintering of the substrate.

Benefits of technology

This improved the sintering yield of aluminum nitride ceramic substrates, ensured the uniformity of heating of the substrates, reduced misalignment and positional displacement of multiple substrate placement seats, and improved production efficiency.

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Abstract

This invention discloses an integrated continuous sintering apparatus for aluminum nitride ceramic substrate processing, belonging to the field of ceramic substrate processing and conveying. The integrated continuous sintering apparatus for aluminum nitride ceramic substrate processing includes a base, a conveyor belt, an aluminum nitride ceramic substrate sintering furnace, and a ceramic substrate placement seat. It also includes a ceramic substrate feeding area, a ceramic substrate conveying area, and a ceramic substrate discharging area connected together. A pusher plate is slidably connected within a long groove. An auxiliary wheel and a drive wheel are rotatably connected within a support base. A limiting plate is slidably disposed on the ceramic substrate conveying area. This invention enables the pusher plate to be stably positioned in its initial position, prevents the next set of ceramic substrate placement seats from prematurely sliding into the pusher position, avoids collisions between the ceramic substrate placement seats and the pusher plate, and prevents deviations in the position of the ceramic substrate placement seats entering the sintering station, thereby improving the yield rate.
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Description

Technical Field

[0001] This invention relates to the field of ceramic substrate processing and conveying technology, and in particular to an integrated apparatus for continuous sintering of aluminum nitride ceramic substrates. Background Technology

[0002] Due to their high thermal conductivity and high insulation properties, aluminum nitride ceramic substrates are widely used in the field of electronic device packaging. Their preparation process requires high-temperature sintering through a continuous aluminum nitride ceramic substrate sintering furnace, and the precise delivery of the substrate is one of the core links to ensure sintering consistency and yield.

[0003] Currently, the conveying and positioning accuracy of the sintering conveying system for aluminum nitride ceramic substrates is insufficient. The pusher plate lacks a linkage limiting mechanism, which can easily lead to the pusher plate being in a non-initial position. This causes collisions between the ceramic substrate placement seat and the pusher plate, resulting in deviations in the position of the ceramic substrate placement seat entering the sintering station. Furthermore, it can cause the next set of ceramic substrate placement seats to slip into the pusher position prematurely, leading to the stacking or positional shift of multiple sets of ceramic substrate placement seats. This, in turn, causes problems such as uneven heating of the substrate during sintering, reducing the yield by approximately 8%-12%. In view of this, the present invention is proposed. Summary of the Invention

[0004] The purpose of this invention is to solve the problems existing in the prior art by proposing an integrated continuous sintering device for processing aluminum nitride ceramic substrates.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] An integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates includes a base, a conveyor belt, an aluminum nitride ceramic substrate sintering furnace, and a ceramic substrate placement seat. The conveyor belt and the aluminum nitride ceramic substrate sintering furnace are respectively disposed at both ends of the base. The apparatus also includes:

[0007] The ceramic substrate feeding area, ceramic substrate conveying area, and ceramic substrate discharging area, which are connected to each other, are all set on the base. The ceramic substrate feeding area corresponds to the conveyor belt, and the ceramic substrate discharging area corresponds to the aluminum nitride ceramic substrate sintering furnace.

[0008] A long groove is provided on the ceramic substrate conveying area, and a pusher plate is slidably connected inside the long groove;

[0009] A support base is fixedly connected to the base, and an auxiliary wheel and a drive wheel are rotatably connected inside the support base;

[0010] A limiting plate is slidably set on the ceramic substrate conveying area.

[0011] Preferably, a first rotating shaft and a second rotating shaft are rotatably connected to the support base, a U-shaped plate is fixedly installed inside the support base, the first rotating shaft and the second rotating shaft are both rotatably connected to the U-shaped plate, a first support rod and a second support rod are fixedly installed on the first rotating shaft and the second rotating shaft respectively, the auxiliary wheel is rotatably connected to the first support rod, and the drive wheel is rotatably connected to the second support rod.

[0012] Furthermore, both the first and second rotating shafts are provided with circular plates, and torsion springs are provided between the two circular plates and the inner wall of the support base. The two torsion springs are respectively sleeved on the outer walls of the first and second rotating shafts.

[0013] Furthermore, buffer plates are provided on the outer walls of both the first and second support rods, and a first elastic element is provided between the buffer plates and the inner wall of the U-shaped plate.

[0014] Preferably, a fixing plate is fixedly installed inside the long groove, a stepper motor is provided on the outer wall of the fixing plate, a lead screw is provided at the output end of the stepper motor, a shaped plate is threadedly connected to the lead screw, an L-plate is slidably installed on the shaped plate, a connecting plate is provided on the L-plate, a pusher plate is installed on the top of the connecting plate, and a rubber pad is provided on the outer wall of the pusher plate.

[0015] Furthermore, both the support base and the base are provided with a first groove. The first rotating shaft is provided with a drive gear at one end placed in the first groove. A locking rod that abuts against the irregular plate is slidably connected to the base. A baffle is provided at one end of the locking rod placed in the first groove. A second elastic element is provided between the baffle and the inner wall of the first groove. A toothed block that meshes with the drive gear is provided on the locking rod.

[0016] Furthermore, a trapezoidal block is fixedly installed on the inner wall of the first groove, and a first pressure switch is provided on the trapezoidal block. A sleeve is provided on one end of the second rotating shaft placed in the first groove, and a pressure plate that cooperates with the first pressure switch is provided on the outer wall of the sleeve. The first pressure switch is electrically connected to the stepper motor through a wire.

[0017] Furthermore, the base is provided with a second groove, and the side wall of the irregular plate is provided with a T-shaped toothed plate that is slidably connected to the second groove. An auxiliary gear is also provided in the second groove. The T-shaped toothed plate meshes with the auxiliary gear. A slider is slidably connected to the base and the ceramic substrate conveying area. The bottom of the slider is provided with a rack plate that meshes with the auxiliary gear. The limiting plate is fixedly installed on the slider, and the end of the limiting plate is provided with an insert plate.

[0018] Furthermore, the locking rod is inclined at one end near the irregular plate, the irregular plate has an inclined surface on the inner side, a guide rod is fixedly installed in the long groove, and the irregular plate is slidably mounted on the guide rod.

[0019] Furthermore, a fixing rod is fixedly installed on the top of the irregular plate, the L-plate is slidably connected to the fixing rod, a spring is sleeved on the fixing rod, the spring is disposed between the top of the irregular plate and the L-plate, a stop is provided on the outer wall of the fixing rod, and a second pressure switch is also provided on the top of the irregular plate.

[0020] Compared with the prior art, the present invention provides an integrated apparatus for continuous sintering of aluminum nitride ceramic substrates, which has the following advantages:

[0021] 1. This integrated continuous sintering device for aluminum nitride ceramic substrate processing uses a locking rod to limit the irregularly shaped plate in its initial position, preventing the pusher plate from entering the push position prematurely. This allows the ceramic substrate placement seat to more easily and accurately enter in front of the pusher plate to achieve the pushing effect. When the ceramic substrate placement seat moves in front of the pusher plate, the locking rod simultaneously releases its restriction on the irregularly shaped plate, and the stepper motor is controlled to work, causing the irregularly shaped plate to drive the pusher plate to move, thus moving the ceramic substrate placement seat. This limiting setting ensures that the pusher plate remains stably in its initial position, preventing collisions between the ceramic substrate placement seat and the pusher plate, avoiding deviations in the position of the ceramic substrate placement seat entering the sintering station, and improving the yield rate.

[0022] 2. In this integrated continuous sintering device for aluminum nitride ceramic substrate processing, after the ceramic substrate placement seat moves to the pushing position, the auxiliary wheel and drive wheel can first limit the ceramic substrate placement seat to a certain extent. At the same time, the first rotating shaft and the second rotating shaft will rotate. When the first rotating shaft rotates, the locking rod will no longer abut against the irregular plate. When the second rotating shaft rotates, the first pressure switch will be squeezed, thereby controlling the stepper motor to work, thereby driving the pushing plate to move and realizing the pushing operation.

[0023] 3. This integrated continuous sintering device for aluminum nitride ceramic substrate processing also moves the T-shaped toothed plate when the irregular plate moves. This, in turn, drives the slider to move through the auxiliary gear, causing the limiting plate and the insertion plate to move and insert between the two ceramic substrate placement seats. This blocks the ceramic substrate placement seats and prevents the next set of ceramic substrate placement seats from sliding into the push position in advance. This ensures that multiple sets of ceramic substrate placement seats will not be misaligned or shifted, achieving stable conveying and ensuring uniform heating during the subsequent sintering process. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention.

[0025] Figure 2This is a top view of an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates according to the present invention.

[0026] Figure 3 This is a partial structural schematic diagram of an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention.

[0027] Figure 4 This is a cross-sectional schematic diagram of the support base in an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention. Figure 1 ;

[0028] Figure 5 This invention proposes an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates. Figure 4 Enlarged view of section A;

[0029] Figure 6 This is a cross-sectional schematic diagram of the support base in an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention. Figure 2 ;

[0030] Figure 7 This invention proposes an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates. Figure 6 Enlarged view of section B;

[0031] Figure 8 This is a cross-sectional view of the base in an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention. Figure 1 ;

[0032] Figure 9 This is a cross-sectional view of the base in an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention. Figure 2 ;

[0033] Figure 10 This is a cross-sectional view of the base in an integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates proposed in this invention. Figure 3 ;

[0034] Figure 11 This is a schematic diagram of the connection of the pusher plate in the integrated continuous sintering device for aluminum nitride ceramic substrate processing proposed in this invention.

[0035] In the diagram: 1. Base; 101. Ceramic substrate feeding area; 102. Ceramic substrate conveying area; 103. Ceramic substrate discharging area; 104. Conveyor belt; 105. Aluminum nitride ceramic substrate sintering furnace; 106. Ceramic substrate placement seat; 107. Control box; 2. Long groove; 201. First groove; 202. Second groove; 203. Support base; 204. U-shaped plate; 205. First rotating shaft; 206. Second rotating shaft; 207. Circular plate; 208. Torsion spring; 209. First support rod; 210. Second support rod; 211. Auxiliary wheel; 212. Drive wheel; 213. Fixing plate; 214. Buffer plate; 215. First elastic... Components: 3. Drive gear; 301. Locking rod; 302. Baffle; 303. Second elastic element; 304. Tooth block; 4. Sleeve; 401. Pressure plate; 402. Trapezoidal block; 403. First pressure switch; 404. Stepper motor; 405. Lead screw; 406. Guide rod; 5. Irregular plate; 501. Inclined surface; 502. L-plate; 503. Second pressure switch; 504. Fixing rod; 505. Spring; 506. Stop block; 507. Connecting plate; 508. Push plate; 509. Rubber pad; 6. T-shaped toothed plate; 601. Auxiliary gear; 602. Slider; 603. Rack plate; 604. Limiting plate; 605. Insert plate. Detailed Implementation

[0036] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0037] In the description of this invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0038] Example 1: Refer to Figures 1-11An integrated continuous sintering apparatus for aluminum nitride ceramic substrate processing includes a base 1, a conveyor belt 104, an aluminum nitride ceramic substrate sintering furnace 105, and a ceramic substrate placement seat 106. The conveyor belt 104 and the aluminum nitride ceramic substrate sintering furnace 105 are respectively disposed at both ends of the base 1. The apparatus also includes a ceramic substrate feeding area 101, a ceramic substrate conveying area 102, and a ceramic substrate discharging area 103 connected to each other, all disposed on the base 1. The ceramic substrate feeding area 101 corresponds to the conveyor belt 104, and the ceramic substrate discharging area 103 corresponds to the aluminum nitride ceramic substrate sintering furnace 105. Corresponding to the aluminum ceramic substrate sintering furnace 105; a long groove 2 is provided on the ceramic substrate conveying area 102, and a pusher plate 508 is slidably connected in the long groove 2; a support base 203 is fixedly connected to the base 1, and an auxiliary wheel 211 and a drive wheel 212 are rotatably connected in the support base 203 respectively; a limit plate 604 is slidably provided on the ceramic substrate conveying area 102; wherein, a ceramic substrate for sintering is placed on the ceramic substrate placement seat 106, and the ceramic substrate is fed through the ceramic substrate feeding area 101, the ceramic substrate conveying area 102, and the ceramic substrate... The discharge zone 103 conveys the ceramic substrate placement seat 106 into the aluminum nitride ceramic substrate sintering furnace 105. A structure identical to the base 1 is also provided on the side of the aluminum nitride ceramic substrate sintering furnace 105 and the conveyor belt 104 away from the base 1. This controls the movement of the ceramic substrate placement seat 106 removed from the aluminum nitride ceramic substrate sintering furnace 105, allowing it to be fed onto the conveyor belt 104. When the ceramic substrate placement seat 106 moves to the end of the ceramic substrate feeding zone 101, the ceramic substrate material can be replaced. The operation is similar to that of the conveyor belt 104, and the aluminum nitride ceramic substrate sintering furnace 105 is also provided with a conveying channel. The ceramic substrate placement seat 106 entering the aluminum nitride ceramic substrate sintering furnace 105 can be conveyed. A control box 107 is also provided at the end of the base 1. The control box 107 has a built-in telescopic rod assembly, which can push the ceramic substrate placement seat 106 on the ceramic substrate conveying area 102 to the ceramic substrate discharge area 103, and then let it enter the conveying channel in the aluminum nitride ceramic substrate sintering furnace 105 for conveying and sintering.

[0039] In this embodiment, during use, the aluminum nitride ceramic substrate to be sintered is first placed on the ceramic substrate placement seat 106. As multiple ceramic substrate placement seats 106 move out of the conveyor belt 104, the ceramic substrate placement seat 106 at the front of the ceramic substrate feeding area 101 is pushed to the front of the pusher plate 508. At the same time, the ceramic substrate placement seat 106 contacts the auxiliary wheel 211 and the drive wheel 212 and achieves compression, thereby controlling the movement of the pusher plate 508, which drives the ceramic substrate placement seat 106 in front of it to move on the ceramic substrate conveying area 102. Then, the telescopic rod assembly in the control box 107 drives it through the ceramic substrate discharge area 103 into the aluminum nitride ceramic substrate sintering furnace 105, thereby realizing the sintering operation.

[0040] It should be noted that multiple ceramic substrate placement seats 106 are used simultaneously in this application. When two or more ceramic substrate placement seats 106 enter the ceramic substrate feeding area 101 via the conveyor belt 104, the previous ceramic substrate placement seat 106 will move to the front of the push plate 508 under the pressure of the next ceramic substrate placement seat 106. When the ceramic substrate placement seat 106 presses against the auxiliary wheel 211 and the drive wheel 212, the limiting plate 604 will extend to limit the next ceramic substrate placement seat 106, preventing the next set of ceramic substrate placement seats 106 from sliding into the push position prematurely. When the push plate 508 resets, the limiting plate 604 will also... Automatic reset removes the restriction on subsequent ceramic substrate placement seats 106, allowing subsequent ceramic substrate placement seats 106 to enter the ceramic substrate conveying area 102. Then, the pusher plate 508 continuously drives its movement. When the pusher plate 508 performs the push operation again, the ceramic substrate placement seat 106 it pushes will move with the ceramic substrate placement seat 106 that was previously pushed to the ceramic substrate conveying area 102, so that it enters the intersection with the ceramic substrate discharge area 103. At this time, the telescopic rod assembly in the control box 107 can push the previous ceramic substrate placement seat 106 into the aluminum nitride ceramic substrate sintering furnace 105 to achieve the sintering operation, which facilitates the continuity of the entire process.

[0041] Example 2: Refer to Figures 3-7 An integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates is basically the same as that in Embodiment 1. Further, a first rotating shaft 205 and a second rotating shaft 206 are rotatably connected to the support base 203. A U-shaped plate 204 is fixedly disposed inside the support base 203. Both the first rotating shaft 205 and the second rotating shaft 206 are rotatably connected to the U-shaped plate 204. A first support rod 209 and a second support rod 210 are respectively fixedly disposed on the first rotating shaft 205 and the second rotating shaft 206. An auxiliary wheel 211 is rotatably connected to the first support rod 209, and a drive wheel 212 is rotatably connected to the second support rod 210.

[0042] In this embodiment, when the ceramic substrate placement seat 106 moves to abut against the auxiliary wheel 211 and the drive wheel 212, it will first push the auxiliary wheel 211 to rotate. At the same time, the auxiliary wheel 211 will drive the first support rod 209 to rotate, thereby driving the first rotating shaft 205 connected thereto to rotate. Then, the ceramic substrate placement seat 106 will press the drive wheel 212, and then drive the second rotating shaft 206 to rotate through the second support rod 210.

[0043] Reference Figure 5 Both the first rotating shaft 205 and the second rotating shaft 206 are provided with circular plates 207. Both circular plates 207 are provided with torsion springs 208 between them and the inner wall of the support base 203. The two torsion springs 208 are respectively sleeved on the outer wall of the first rotating shaft 205 and the second rotating shaft 206. When the first rotating shaft 205 and the second rotating shaft 206 rotate, the torsion springs 208 will generate torque, so that after the auxiliary wheel 211 and the drive wheel 212 lose pressure, the first rotating shaft 205 and the second rotating shaft 206 can automatically reset.

[0044] Reference Figure 5 Both the first support rod 209 and the second support rod 210 are provided with buffer plates 214 on their outer walls. A first elastic element 215 is provided between the buffer plate 214 and the inner wall of the U-shaped plate 204. When the auxiliary wheel 211 and the drive wheel 212 are squeezed and drive the first support rod 209 and the second support rod 210 to rotate, the buffer plate 214 will move first, thereby compressing the first elastic element 215. The first elastic element 215 can provide a certain buffering effect on the first support rod 209 and the second support rod 210, and at the same time, it can make the auxiliary wheel 211 and the drive wheel 212 have a limit to their movement position, so that the ceramic substrate placement seat 106 can move better. The first elastic element 215 can be a connecting spring or a spring sheet, etc.

[0045] Reference Figures 6-8 A fixing plate 213 is fixedly installed inside the long groove 2. A stepper motor 404 is installed on the outer wall of the fixing plate 213. A lead screw 405 is installed at the output end of the stepper motor 404. A shaped plate 5 is threadedly connected to the lead screw 405. An L-plate 502 is slidably installed on the shaped plate 5. A connecting plate 507 is installed on the L-plate 502. A pusher plate 508 is installed on the top of the connecting plate 507, and a rubber pad 509 is installed on the outer wall of the pusher plate 508.

[0046] Reference Figures 6-8The support 203 and the base 1 are both provided with a first groove 201. The first rotating shaft 205 is provided with a drive gear 3 at one end placed in the first groove 201. The base 1 is slidably connected with a locking rod 301 that abuts against the irregular plate 5. The locking rod 301 is provided with a baffle 302 at one end placed in the first groove 201. A second elastic element 303 is provided between the baffle 302 and the inner wall of the first groove 201. The locking rod 301 is provided with a tooth block 304 that meshes with the drive gear 3.

[0047] In this embodiment, when the first rotating shaft 205 rotates, it drives the drive gear 3 connected to its outer wall to rotate. The drive gear 3 meshes with the tooth block 304 on the locking rod 301, which can drive the locking rod 301 to move, so that the locking rod 301 no longer abuts against the irregular plate 5, and one end of the upper surface of the locking rod 301 abuts against one end of the upper surface of the irregular plate 5, which can make the limiting effect of the two better. When the locking rod 301 moves, it will lose the abutting effect, so that the irregular plate 5 can start to move. When the irregular plate 5 moves, it can drive the push plate 508 to move, thereby realizing the conveying of the ceramic substrate placement seat 106.

[0048] Reference Figures 6-8 A trapezoidal block 402 is fixedly installed on the inner wall of the first groove 201. A first pressure switch 403 is provided on the trapezoidal block 402. A sleeve 4 is provided on one end of the second rotating shaft 206 placed in the first groove 201. A pressure plate 401 that cooperates with the first pressure switch 403 is provided on the outer wall of the sleeve 4. The first pressure switch 403 is electrically connected to the stepper motor 404 through a wire.

[0049] The locking rod 301 is inclined at one end near the irregular plate 5. The irregular plate 5 has an inclined surface 501 on the inner side. A guide rod 406 is fixedly installed in the long groove 2. The irregular plate 5 is slidably installed on the guide rod 406.

[0050] In this embodiment, when the second rotating shaft 206 rotates, it drives the sleeve 4 and pressure plate 401 connected to its outer wall to rotate, thereby causing the pressure plate 401 to press the first pressure switch 403 on the trapezoidal block 402. When the first pressure switch 403 is squeezed, it sends a signal, causing the stepper motor 404 to receive the signal and start. At this time, the stepper motor 404 drives the lead screw 405 at its output end to rotate, thereby driving the irregular plate 5 threaded to it to start moving, thereby driving the pusher plate 508 to move and start pushing the ceramic substrate placement seat 106 to move. After the ceramic substrate placement seat 106 is pushed into place, the stepper motor 404 reverses, driving the irregular plate 5 to move in the opposite direction and reset. Before this, during the movement of the ceramic substrate placement seat 106, the auxiliary wheel 211 and the drive wheel 212 will cause the auxiliary wheel 211 and the drive wheel 212 to move. As the plate gradually loses its limiting position, the first rotating shaft 205 and the second rotating shaft 206 will automatically reset under the action of the torsion spring 208 and the first elastic element 215, facilitating repeated operation. At the same time, the locking rod 301 will automatically reset under the action of the second elastic element 303. Therefore, when the irregular plate 5 moves in the opposite direction, when it comes into contact with the locking rod 301, the inclined surface 501 on the irregular plate 5 will abut against the inclined section on the locking rod 301, causing the locking rod 301 to slide and move the irregular plate 5 to the other side of the locking rod 301. Then, under the action of the second elastic element 303, the locking rod 301 can automatically reset, forming a limiting operation on the irregular plate 5 again. The guide rod 406 can make the movement of the irregular plate 5 more stable. The second elastic element 303 is specifically a connecting spring or a spring sheet.

[0051] Example 3: Refer to Figures 9-11 An integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates is basically the same as that in Embodiment 2. Further, the base 1 is provided with a second groove 202, and the side wall of the irregular plate 5 is provided with a T-shaped toothed plate 6 slidably connected to the second groove 202. An auxiliary gear 601 is also provided in the second groove 202, and the T-shaped toothed plate 6 meshes with the auxiliary gear 601. A slider 602 is slidably connected to the base 1 and the ceramic substrate conveying area 102. The bottom of the slider 602 is provided with a rack plate 603 meshing with the auxiliary gear 601. A limiting plate 604 is fixedly mounted on the slider 602, and an insert plate 605 is provided at the end of the limiting plate 604.

[0052] In this embodiment, when the stepper motor 404 drives the lead screw 405 to rotate and move the irregular plate 5, it also moves the T-shaped toothed plate 6. During this movement, the T-shaped toothed plate 6 meshes with the auxiliary gear 601, causing the auxiliary gear 601 to rotate. Simultaneously, the auxiliary gear 601 meshes with the rack plate 603 on the slider 602, causing the slider 602 to move. Since the T-shaped toothed plate 6 and the slider 602 are respectively located on both sides of the auxiliary gear 601, when the auxiliary gear 601 rotates, it causes the slider 602 to move in the opposite direction to the T-shaped toothed plate 6, thereby causing the limiting plate 604 to move. When the insert plate 605 is inserted between the two ceramic substrate placement seats 106, it blocks the ceramic substrate placement seats 106 and prevents the next set of ceramic substrate placement seats 106 from sliding into the push position in advance. This ensures that multiple sets of ceramic substrate placement seats 106 will not be misaligned or shifted. When the T-shaped toothed plate 6 resets with the irregular plate 5, it will drive the auxiliary gear 601 that meshes with it to rotate again, thereby causing the slider 602 to move in the opposite direction. At this time, the limiting plate 604 and the insert plate 605 are reset and lose their limiting effect on the ceramic substrate placement seats 106, so that the ceramic substrate placement seats 106 can smoothly enter the push position.

[0053] Reference Figure 11 A fixing rod 504 is fixedly installed on the top of the irregular plate 5. The L plate 502 is slidably connected to the fixing rod 504. A spring 505 is sleeved on the fixing rod 504. The spring 505 is located between the top of the irregular plate 5 and the L plate 502. A stop block 506 is provided on the outer wall of the fixing rod 504. A second pressure switch 503 is also provided on the top of the irregular plate 5.

[0054] In this invention, when the pusher plate 508 pushes the ceramic substrate placement seat 106 to move, the ceramic substrate placement seat 106 has a certain weight, which shortens the distance between the irregular plate 5 and the L plate 502. This allows the L plate 502 to press against the second pressure switch 503. If the second pressure switch 503 is in a pressed state, it indicates a normal state, allowing the pusher plate 508 to move normally. If there is no ceramic substrate placement seat 106 in front of the pusher plate 508, there will be no obstruction in front of the pusher plate 508 as it moves, thus preventing the L plate 502 from pressing against the second pressure switch 503. The second pressure switch 503 sends a signal to the external alarm device to remind the staff to check for any empty pushing phenomenon, thereby avoiding equipment failure. The fixed rod 504 makes the movement of L plate 502 more stable, and a stop block 506 is also provided. When the irregular plate 5 is reset, it will pull L plate 502 to move through the fixed rod 504 and the stop block 506, thereby driving the push plate 508 to reset through the connecting plate 507. The rubber pad 509 provided on the push plate 508 can protect the ceramic substrate placement seat 106 during pushing.

[0055] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. An integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates, comprising a base (1), a conveyor belt (104), an aluminum nitride ceramic substrate sintering furnace (105), and a ceramic substrate placement seat (106), wherein the conveyor belt (104) and the aluminum nitride ceramic substrate sintering furnace (105) are respectively disposed at both ends of the base (1), characterized in that, Also includes: The ceramic substrate feeding area (101), ceramic substrate conveying area (102) and ceramic substrate discharging area (103) connected to each other are all set on the base (1). The ceramic substrate feeding area (101) corresponds to the conveyor belt (104), and the ceramic substrate discharging area (103) corresponds to the aluminum nitride ceramic substrate sintering furnace (105). A long groove (2) is provided on the ceramic substrate conveying area (102), and a pusher plate (508) is slidably connected in the long groove (2). The support base (203) is fixedly connected to the base (1), and the support base (203) is rotatably connected to the auxiliary wheel (211) and the drive wheel (212). A limiting plate (604) is slidably disposed on the ceramic substrate conveying area (102). The support base (203) is rotatably connected to a first rotating shaft (205) and a second rotating shaft (206). The support base (203) and the base (1) are both provided with a first groove (201). The first rotating shaft (205) is provided with a drive gear (3) at one end placed in the first groove (201). The base (1) is slidably connected with a locking rod (301) that abuts against the irregular plate (5). The locking rod (301) is provided with a baffle (302) at one end placed in the first groove (201). A second elastic element (303) is provided between the baffle (302) and the inner wall of the first groove (201). The locking rod (301) is provided with a tooth block (304) that meshes with the drive gear (3). The locking rod (301) is inclined at one end near the irregular plate (5), and the irregular plate (5) has an inclined surface (501) on the inner side. A guide rod (406) is fixedly installed in the long groove (2), and the irregular plate (5) is slidably installed on the guide rod (406). A U-shaped plate (204) is fixedly installed inside the support base (203). The first rotating shaft (205) and the second rotating shaft (206) are rotatably connected to the U-shaped plate (204). A first support rod (209) and a second support rod (210) are fixedly installed on the first rotating shaft (205) and the second rotating shaft (206), respectively. The auxiliary wheel (211) is rotatably connected to the first support rod (209), and the drive wheel (212) is rotatably connected to the second support rod (210). Both the first rotating shaft (205) and the second rotating shaft (206) are provided with circular plates (207), and torsion springs (208) are provided between the two circular plates (207) and the inner wall of the support base (203). The two torsion springs (208) are respectively sleeved on the outer wall of the first rotating shaft (205) and the second rotating shaft (206). A fixing plate (213) is fixedly installed inside the long groove (2). A stepper motor (404) is installed on the outer wall of the fixing plate (213). A lead screw (405) is installed at the output end of the stepper motor (404). A shaped plate (5) is threaded onto the lead screw (405). An L-plate (502) is slidably installed on the shaped plate (5). A connecting plate (507) is installed on the L-plate (502). A pusher plate (508) is installed on the top of the connecting plate (507). A trapezoidal block (402) is fixedly installed on the inner wall of the first groove (201). A first pressure switch (403) is provided on the trapezoidal block (402). A sleeve (4) is provided on one end of the second rotating shaft (206) placed in the first groove (201). A pressure plate (401) that cooperates with the first pressure switch (403) is provided on the outer wall of the sleeve (4). The first pressure switch (403) is electrically connected to the stepper motor (404) through a wire.

2. The integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates according to claim 1, characterized in that, Both the first support rod (209) and the second support rod (210) are provided with buffer plates (214) on their outer walls, and a first elastic element (215) is provided between the buffer plate (214) and the inner wall of the U-shaped plate (204).

3. The integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates according to claim 1, characterized in that, A rubber pad (509) is provided on the outer wall of the push plate (508).

4. The integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates according to claim 3, characterized in that, The base (1) is provided with a second groove (202), and the side wall of the irregular plate (5) is provided with a T-shaped toothed plate (6) that is slidably connected to the second groove (202). An auxiliary gear (601) is also provided in the second groove (202). The T-shaped toothed plate (6) meshes with the auxiliary gear (601). A slider (602) is slidably connected to the base (1) and the ceramic substrate conveying area (102). The bottom of the slider (602) is provided with a rack plate (603) that meshes with the auxiliary gear (601). The limiting plate (604) is fixedly installed on the slider (602), and the end of the limiting plate (604) is provided with an insert plate (605).

5. The integrated continuous sintering apparatus for processing aluminum nitride ceramic substrates according to claim 3, characterized in that, A fixing rod (504) is fixedly installed on the top of the irregular plate (5). The L plate (502) is slidably connected to the fixing rod (504). A spring (505) is sleeved on the fixing rod (504). The spring (505) is located between the top of the irregular plate (5) and the L plate (502). A stop block (506) is provided on the outer wall of the fixing rod (504). A second pressure switch (503) is also provided on the top of the irregular plate (5).

Citation Information

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