Vacuum ion source etching chamber for precious metal recovery and anti-contamination lining structure and etching machine

Abstract

This invention discloses a contamination-resistant liner structure for precious metal recovery in a vacuum ion source etching chamber and an etching machine, belonging to the field of vacuum dry etching. It includes a liner plate and a functional adhesive layer covering the surface of the liner plate. The functional adhesive layer has a room temperature elastic modulus of 0.5 GPa to 2.2 GPa, a volatile organic compound content of ≤45 ppm at room temperature, and a temperature resistance range of room temperature to 150℃. The adhesion strength between the functional adhesive layer and the coating is 5 MPa to 14 MPa. The coating is formed by precious metal particles generated during the etching process adhering to the surface of the functional adhesive layer. This invention's liner structure has a long service life, ensures consistency in the etching process, and improves recovery efficiency by approximately 30% or more.

Description

Technical Field

[0001] This invention relates to the field of vacuum dry etching, and more specifically, to a vacuum ion source etching chamber precious metal recovery and anti-pollution liner structure and etching machine. Background Technology

[0002] In the vacuum Ar ion source dry etching process for thin-film circuits, precious metal particles such as Au and Pt generated during etching are deposited in the reverse direction on the surface of the inner lining baffle on the inner wall of the cavity. Currently, the industry commonly uses a technique of directly sandblasting the stainless steel inner lining baffle. This method has the following shortcomings:

[0003] (1) Low efficiency of precious metal recycling: The uneven surface roughness of the sandblasted inner lining baffle results in inconsistent adhesion of the coating formed by dry-cut metal particles. In some areas, the coating is thin and peels off easily, while in other areas, the coating is tightly adhered and difficult to completely remove. During recycling, the inner lining baffle needs to be disassembled and the coating needs to be sandblasted again. During this process, the metal is easily lost with the sand particles, resulting in low recycling efficiency and difficulty in ensuring purity.

[0004] (2) Severe dust pollution: When the coating is peeled off, it falls off in the form of tiny fragments, which easily form floating dust. This dust is easily adsorbed on the surface of the etched workpiece, which seriously affects the appearance quality of the finished thin film circuit, especially forming etching black spots or contamination areas on the surface of the workpiece that adsorbs dust particles.

[0005] (3) The inner lining baffle has a short service life and high maintenance costs: frequent disassembly and sandblasting will wear down the inner lining surface, requiring additional equipment downtime and increasing labor and material costs, which does not meet the cost reduction requirements.

[0006] Therefore, there is an urgent need for a cavity lining structure that can achieve "self-collapse after thick coating accumulation", "no dust pollution" and "high recycling efficiency" to solve the pain points of existing technologies.

[0007] The above background information is provided to facilitate understanding of the present invention and is not intended to be publicly known technology disclosed to the general public prior to the application of this invention. Summary of the Invention

[0008] To address the aforementioned issues, this invention provides a vacuum ion source etching chamber precious metal recovery anti-contamination liner structure and etching machine. This liner structure has a long service life, ensures the consistency of the etching process, and improves the recovery efficiency by approximately 30% or more.

[0009] This invention is specifically applied to the process of etching thin film circuits using a vacuum Ar ion source. It aims to achieve efficient recovery of precious metals such as Au and Pt during the etching process by optimizing the cavity liner structure. At the same time, it avoids the possibility of floating dust contaminating the cavity and the etched workpiece caused by the collapse of the thin metal plating layer redeposited on the etched material, thus ensuring the appearance quality of the etched surface.

[0010] A vacuum ion source etching chamber precious metal recovery and anti-contamination liner structure includes an inner liner plate and a functional adhesive layer covering the surface of the inner liner plate; the room temperature elastic modulus of the functional adhesive layer is 0.5GPa~2.2GPa, the volatile organic compound content at room temperature is ≤45ppm, the temperature resistance range is room temperature~150℃, the adhesion strength between the functional adhesive layer and the coating is 5MPa~14MPa, and the coating is formed by precious metal particles generated during the etching process adhering to the surface of the functional adhesive layer.

[0011] Optionally, the functional adhesive layer is formed by spraying or coating a slurry composed of a matrix resin, a crosslinking agent, and an inorganic high-temperature resistant filler to form a wet film, which is then cured at 150℃~180℃ for 1.5h~2.5h; wherein the matrix resin is a modified epoxy silicone resin or a high-temperature resistant polyimide resin, the crosslinking agent is an isocyanate compound, and the inorganic high-temperature resistant filler is nano-silicon nitride or aluminum oxide.

[0012] This invention addresses the effect of "thick coating collapse" on the adhesive layer surface to avoid the diffusion and contamination or adsorption of thin coatings on the etched workpiece surface by the thin coating. Simultaneously considering the important requirements of "low organic pollution" and "resistance to high and low temperature aging" of the adhesive layer, the following optimizations are made to the adhesive layer to achieve overall collapse of the thick coating: controlling the elastic modulus of the adhesive layer at room temperature to 0.5GPa ~ 2.2GPa, while adjusting the adhesion strength between the adhesive layer and the metal coating to 5MPa ~ 14MPa.

[0013] The wet film is cured at 150℃~180℃ for 1.5h~2.5h to form a dense cross-linked structure, which extends the temperature resistance range of the adhesive layer to about room temperature~150℃. After 50 high and low temperature cycles (room temperature→180℃, 1h per cycle), the functional adhesive layer shows no cracking or peeling, and the change rate of elastic modulus is ≤9%.

[0014] In order to reduce the precipitation of small molecule organic compounds, this invention selects a low-volatility matrix resin (such as modified epoxy silicone resin or high-temperature resistant polyimide resin) with a volatile organic compound (VOC) content of ≤45ppm at room temperature.

[0015] Optionally, the crosslinking agent is added at 3 wt% to 7 wt% of the matrix resin, and the inorganic high-temperature resistant filler is added at 12 wt% to 24 wt% of the total mass of the functional adhesive layer. Adding 3 wt% to 7% of isocyanate-based crosslinking agent increases the crosslinking density of the adhesive layer and further inhibits the migration and precipitation of small molecules. Incorporating 12 wt% to 24% of inorganic high-temperature resistant filler (such as nano-silicon nitride or alumina) into the functional adhesive layer improves thermal stability and enhances resistance to high and low temperature aging.

[0016] Optionally, the functional adhesive layer undergoes vacuum devolatilization treatment with the following process parameters: temperature 80℃~120℃, vacuum degree ≤1Pa, and time 2h~3.5h. After preparation, the functional adhesive layer undergoes additional vacuum devolatilization treatment (process: temperature 80℃~120℃, vacuum degree ≤1Pa, time 2h~3.5h) to thoroughly remove unreacted monomers and small molecule additives from the resin.

[0017] Optionally, the thickness of the functional adhesive layer is 20μm to 2000μm.

[0018] Optionally, the spalling thickness of the coating is 30μm~150μm, where spalling thickness refers to the thickness of the thickest part of the coating.

[0019] When the coating thickness accumulates to 30~150μm, the internal stress of the coating exceeds the adhesion strength between the adhesive layer and the coating, and the coating collapses off as a whole in a "block" shape to avoid generating fine dust.

[0020] Optionally, the inner lining plate is made of 304 stainless steel or 316L stainless steel, wherein the 304 stainless steel is subjected to sandblasting and pickling passivation treatment; and the 316L stainless steel is subjected to sandblasting and degreasing treatment.

[0021] Optionally, it also includes an adhesive layer located between the inner liner and the functional adhesive layer. The adhesive layer is a transition metal coating or a silane coupling agent layer. The thickness of the transition metal coating is 20 nm to 200 nm, and the thickness of the silane coupling agent layer is 0.2 μm to 3 μm.

[0022] Optionally, the transition metal coating is a Ti layer or a Cr layer; the silane coupling agent layer is a γ-aminopropyltriethoxysilane layer.

[0023] The adhesive layer is used to enhance the bonding force between the inner liner and the functional adhesive layer, and to prevent the adhesive layer from peeling off with the coating. The transition metal coating (Ti or Cr, thickness 20nm ~ 200nm) or the silane coupling agent layer (γ-aminopropyltriethoxysilane, thickness 0.2μm ~ 3μm) can further improve the adhesion strength between the inner liner and the adhesive layer, and ensure that the number of times the inner liner structure can be reused can be further increased.

[0024] The present invention also provides an ion source etching machine.

[0025] An ion source etching machine includes etching and an inner liner structure located within the etching process, wherein the inner liner structure is the aforementioned vacuum ion source etching chamber precious metal recovery and anti-contamination inner liner structure.

[0026] Optionally, after the inner lining structure undergoes more than 50 cycles from room temperature to 180°C, the functional adhesive layer shows no cracking or peeling, and the elastic modulus change rate is ≤9%.

[0027] This invention, through the design of an inner liner plate and a functional adhesive layer, is suitable for scenarios with small to medium batch etching and relatively high replacement frequency. Through the design of an inner liner plate, an adhesive layer, and a functional adhesive layer, it is suitable for scenarios with large coating deposition and where the inner liner needs to be reused for a long time.

[0028] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0029] This invention significantly improves the efficiency of precious metal recovery by covering the inner lining plate with a functional adhesive layer and an adhesive layer: the coating breaks off in 30μm~150μm blocks with no obvious dust, and the purity of the recovered material is further improved, mainly containing only the etched material components. The recovery efficiency is improved by about 30% or more compared with the existing sandblasting solution, and the subsequent precious metal purification process can be simplified, significantly reducing the cost of raw materials. It also significantly solves the dust pollution problem: the coating breaks off as a whole without tiny debris, and the amount of dust adsorbed on the surface of the etched workpiece is reduced to a negligible level, with an average particle adsorption reduction of more than 90% compared with the original stainless steel sandblasting lining plate.

[0030] This invention extends the service life of the lining by covering it with a functional adhesive layer and an adhesive layer: the functional adhesive layer is resistant to high and low temperature aging, the lining does not need to be frequently disassembled and sandblasted, and its service life is increased by 2 to 3 times compared with stainless steel sandblasted lining plates, reducing equipment downtime and maintenance costs.

[0031] This invention achieves a more stable cavity environment by covering the inner liner with a functional adhesive layer and an adhesive layer: the amount of small molecules precipitated from the adhesive layer is ≤45ppm, with no additional pollution, and the adhesive layer can isolate the inner liner from oxidation, ensuring the consistency of the etching process. Attached Figure Description

[0032] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0033] Figure 1 This is a schematic diagram of the anti-pollution lining structure for the precious metal recovery in the vacuum ion source etching chamber of the present invention;

[0034] Figure 2 This is a schematic diagram of another vacuum ion source etching chamber precious metal recovery and anti-pollution liner structure according to the present invention;

[0035] Explanation of reference numerals in the attached diagram: 1. Inner lining plate; 2. Functional adhesive layer; 3. Plating layer; 4. Adhesive layer. Detailed Implementation

[0036] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, an indirect connection via an intermediate medium, or the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0037] In the description of this invention, it should be understood that the terms "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention. In the description of this invention, "a plurality of" means two or more, unless otherwise precisely specified.

[0038] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented, for example, in orders other than those illustrated or described herein. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0039] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0040] The technical solution of the present invention will be described in detail below with reference to specific embodiments. These specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments.

[0041] Please refer to Figure 1 , Figure 1This is a schematic diagram of the anti-pollution lining structure for the precious metal recovery in the vacuum ion source etching chamber of this invention.

[0042] A vacuum ion source etching chamber precious metal recovery anti-pollution liner structure includes an inner liner plate 1 and a functional adhesive layer 2 covering the surface of the inner liner plate 1; the functional adhesive layer 2 has a room temperature elastic modulus of 0.5~2.2GPa, a volatile organic compound content of ≤45ppm at room temperature, and a temperature resistance range of room temperature to 150℃.

[0043] In one or more embodiments of the present invention, the inner lining plate 1 is made of stainless steel.

[0044] In one or more specific embodiments of the present invention, in order to achieve the effect of recycling precious metals and preventing pollution, the adhesion strength between the functional adhesive layer 2 and the coating layer 3 is 5MPa~14MPa, and the coating layer 3 is formed by precious metal particles generated during the etching process adhering to the surface of the functional adhesive layer 2.

[0045] In one or more specific embodiments of the present invention, the functional adhesive layer 2 is formed by spraying or coating a paste composed of a matrix resin, a crosslinking agent, and an inorganic high-temperature resistant filler; wherein the matrix resin is a modified epoxy silicone resin or a high-temperature resistant polyimide resin, the crosslinking agent is an isocyanate compound, the inorganic high-temperature resistant filler is nano-silicon nitride or alumina, the amount of crosslinking agent added is 3wt% to 7wt% of the mass of the matrix resin, and the amount of inorganic high-temperature resistant filler added is 12wt% to 24wt% of the total mass of the functional adhesive layer.

[0046] In one or more specific embodiments of the present invention, the functional adhesive layer 2 is subjected to vacuum devolatilization treatment, and the devolatilization process parameters are: temperature 80℃~120℃, vacuum degree ≤1Pa, time 2h~3.5h.

[0047] In one or more specific embodiments of the present invention, the thickness of the functional adhesive layer is 20 μm to 2000 μm.

[0048] In one or more specific embodiments of the present invention, the spalling thickness of the coating 3 is 30μm~150μm, where spalling thickness refers to the thickness of the thickest part of the coating.

[0049] Example 1

[0050] A method for preparing a contamination-resistant liner structure for precious metal recovery in a vacuum ion source etching cavity includes the following steps:

[0051] S1, 304 stainless steel plate is selected and cut into a baffle shape with dimensions of 300mm×300mm×3mm. The surface is sandblasted and then pickled and passivated to form the inner lining plate 1.

[0052] S3, a wet film is formed on the surface of the inner lining plate 1 by spraying, scraping or brushing adhesive slurry, with a wet film thickness of 1000μm.

[0053] The adhesive is composed of: high-temperature resistant polyimide resin (82 parts by weight), isocyanate crosslinking agent (4 parts by weight), nano alumina filler (14 parts by weight) and 70 parts by weight of solvent, mixed and stirred for 15 minutes until homogeneous.

[0054] S4, the wet film is volatilized at 100℃ and 0.5Pa for 2.5h, then cured at 190℃ for 1.5h, and cooled to room temperature to form functional adhesive layer 2.

[0055] The performance of the prepared vacuum ion source etching cavity precious metal recovery and anti-contamination liner structure was tested, and the results are as follows:

[0056] The room temperature elastic modulus is 1.8 GPa, the volatile organic compound content at room temperature is ≤45 ppm, and the temperature resistance range is room temperature to 180℃.

[0057] Adhesion strength to Pt coating: 11 MPa.

[0058] VOCs emission at room temperature: 28 ppm.

[0059] Condition after high and low temperature cycling (room temperature → 180℃): The adhesive layer is intact after 50 cycles, and the elastic modulus changes by 8%.

[0060] The prepared precious metal recovery and anti-contamination liner structure of the vacuum ion source etching cavity was placed inside the etching cavity of a vacuum Ar ion source etching machine as a liner plate, and the results are as follows:

[0061] Coating collapse: The Au and Pt mixed deposition layer begins to collapse after reaching a thickness of 30 μm (the thickness of the collapsed coating is known by measuring the thickness of the thickest part of the collapsed coating). The collected metal blocks with the same composition of the etched material have a purity of 93%.

[0062] Please refer to Figure 2 , Figure 2 This is a schematic diagram of another vacuum ion source etching chamber precious metal recovery and anti-pollution lining structure according to the present invention.

[0063] A contamination-resistant liner structure for precious metal recovery in a vacuum ion source etching chamber includes an inner liner plate 1, an adhesive layer 4, and a functional adhesive layer 2. The adhesive layer 4 covers the surface of the inner liner plate 1, and the functional adhesive layer 2 covers the adhesive layer 4. The functional adhesive layer 2 has a room temperature elastic modulus of 0.5 GPa to 2.2 GPa, a volatile organic compound content of ≤45 ppm at room temperature, and a temperature resistance range of room temperature to 150℃. The adhesive layer 4 is a transition metal coating or a silane coupling agent layer. The thickness of the transition metal coating is 20 to 200 nm, and the thickness of the silane coupling agent layer is 0.2 to 3 μm.

[0064] In one or more embodiments of the present invention, the inner lining plate 1 is made of stainless steel.

[0065] In one or more specific embodiments of the present invention, in order to achieve the effect of recycling precious metals and preventing pollution, the adhesion strength between the functional adhesive layer 2 and the coating layer 3 is 4MPa to 14MPa, and the coating layer 3 is formed by precious metal particles generated during the etching process adhering to the surface of the functional adhesive layer 2.

[0066] In one or more specific embodiments of the present invention, the functional adhesive layer 2 is formed by spraying or coating a paste composed of a matrix resin, a crosslinking agent, and an inorganic high-temperature resistant filler; wherein the matrix resin is a modified epoxy silicone resin or a high-temperature resistant polyimide resin, the crosslinking agent is an isocyanate compound, the inorganic high-temperature resistant filler is nano-silicon nitride or alumina, the amount of crosslinking agent added is 3wt% to 7wt% of the mass of the matrix resin, and the amount of inorganic high-temperature resistant filler added is 12wt% to 24wt% of the total mass of the functional adhesive layer.

[0067] In one or more specific embodiments of the present invention, the functional adhesive layer 2 is subjected to vacuum devolatilization treatment, and the devolatilization process parameters are: temperature 80℃~120℃, vacuum degree ≤1Pa, time 2h~3.5h.

[0068] In one or more specific embodiments of the present invention, the thickness of the functional adhesive layer is 20 μm to 2000 μm.

[0069] In one or more specific embodiments of the present invention, the spalling thickness of the coating 3 is 30μm~150μm, where spalling thickness refers to the thickness of the thickest part of the coating.

[0070] In one or more specific embodiments of the present invention, the transition metal coating is a Ti layer or a Cr layer; the silane coupling agent layer is a γ-aminopropyltriethoxysilane layer.

[0071] Example 2

[0072] A method for preparing a contamination-resistant liner structure for precious metal recovery in a vacuum ion source etching cavity includes the following steps:

[0073] S1, 316L stainless steel plate is selected and cut into a baffle shape with dimensions of 300mm×300mm×3mm. The surface is sandblasted and then degreased (wiped with ethanol) to form the inner lining plate 1.

[0074] S2, a 20 nm Cr layer is deposited on the surface of the inner liner plate 1 using magnetron sputtering.

[0075] S3, a wet film is formed on the Cr layer surface by spraying, scraping or brushing adhesive paste, and the wet film thickness is 60μm.

[0076] The adhesive is composed of: high-temperature resistant polyimide resin (78 parts by weight), isocyanate crosslinking agent (5 parts by weight), nano alumina filler (17 parts by weight) and 60 parts by weight of solvent, mixed and stirred for 15 minutes until homogeneous.

[0077] S4, the wet film is volatilized at 100℃ and 0.5Pa for 2.5h, then cured at 190℃ for 1.5h, and cooled to room temperature to form functional adhesive layer 2.

[0078] The performance of the prepared vacuum ion source etching cavity precious metal recovery and anti-contamination liner structure was tested, and the results are as follows:

[0079] The room temperature elastic modulus is 1.4 GPa, the volatile organic compound content at room temperature is ≤45 ppm, and the temperature resistance range is room temperature to 150℃.

[0080] Adhesion strength to Pt coating: 9 MPa.

[0081] VOCs emission at room temperature: 32 ppm;

[0082] Condition after high and low temperature cycling (room temperature → 180℃): The adhesive layer is intact after 50 cycles, and the elastic modulus changes by 7%.

[0083] The prepared precious metal recovery and anti-contamination liner structure of the vacuum ion source etching cavity was placed inside the etching cavity of a vacuum Ar ion source etching machine as a liner plate, and the results are as follows:

[0084] Coating collapse: The Au and Pt mixed deposition layer began to collapse after reaching a thickness of 80 μm (the thickness of the collapsed coating was measured, and the thickness of the thickest part of the collapsed coating was measured). The purity of the collected metal blocks with the same composition of the etched material reached 96.4%.

[0085] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A contamination-proof liner structure for precious metal recovery in a vacuum ion source etching chamber, comprising an inner liner plate, characterized in that, It also includes a functional adhesive layer covering the surface of the inner lining plate; the room temperature elastic modulus of the functional adhesive layer is 0.5GPa~2.2GPa, the volatile organic compound content at room temperature is ≤45ppm, the temperature resistance range is room temperature~150℃, the adhesion strength between the functional adhesive layer and the coating is 5MPa~14MPa, and the coating is formed by precious metal particles generated during the etching process adhering to the surface of the functional adhesive layer.

2. The anti-contamination liner structure for precious metal recovery in the vacuum ion source etching chamber according to claim 1, characterized in that, The inner lining plate is made of 304 stainless steel or 316L stainless steel, wherein the 304 stainless steel is subjected to sandblasting and pickling passivation treatment; and the 316L stainless steel is subjected to sandblasting and degreasing treatment.

3. The vacuum ion source etching chamber precious metal recovery anti-contamination liner structure according to claim 1, characterized in that, The functional adhesive layer is formed by spraying or coating a slurry composed of a matrix resin, a crosslinking agent, and an inorganic high-temperature resistant filler to form a wet film, which is then cured at 150℃~180℃ for 1.5h~2.5h. The matrix resin is a modified epoxy silicone resin or a high-temperature resistant polyimide resin, the crosslinking agent is an isocyanate compound, and the inorganic high-temperature resistant filler is nano-silicon nitride or aluminum oxide.

4. The vacuum ion source etching chamber precious metal recovery anti-contamination liner structure according to claim 3, characterized in that, The amount of crosslinking agent added is 3wt% to 7wt% of the matrix resin mass, and the amount of inorganic high-temperature resistant filler added is 12wt% to 24wt% of the total mass of the functional adhesive layer.

5. The anti-contamination liner structure for precious metal recovery in the vacuum ion source etching chamber according to claim 1, characterized in that, The functional adhesive layer is subjected to vacuum devolatilization treatment. The devolatilization process parameters are: temperature 80℃~120℃, vacuum degree ≤1Pa, and time 2h~3.5h.

6. The vacuum ion source etching chamber precious metal recovery anti-contamination liner structure according to claim 1, characterized in that, The thickness of the functional adhesive layer is 20μm~2000μm; and / or The spalling thickness of the coating is 30μm~150μm, where spalling thickness refers to the thickness of the thickest part of the coating.

7. The vacuum ion source etching cavity precious metal recovery anti-contamination liner structure according to any one of claims 1-6, characterized in that, It also includes an adhesive layer located between the inner liner and the functional adhesive layer. The adhesive layer is a transition metal coating or a silane coupling agent layer. The thickness of the transition metal coating is 20 nm to 200 nm, and the thickness of the silane coupling agent layer is 0.2 μm to 3 μm.

8. The vacuum ion source etching cavity precious metal recovery anti-contamination liner structure according to claim 7, characterized in that, The transition metal coating is a Ti layer or a Cr layer; the silane coupling agent layer is a γ-aminopropyltriethoxysilane layer.

9. An ion source etching machine, comprising etching and an inner liner structure located within the etching process, characterized in that, The inner lining structure is the vacuum ion source etching cavity precious metal recovery and anti-pollution inner lining structure as described in any one of claims 1-8.

10. The ion source etching machine according to claim 9, characterized in that, After the inner lining structure undergoes more than 50 cycles from room temperature to 180°C, the functional adhesive layer shows no cracking or peeling, and the change rate of elastic modulus is ≤9%.

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