Gas flow controllable gas inlet method, gas inlet device and semiconductor process equipment

Abstract

The invention provides a gas flow-controllable gas inlet method, a gas inlet device and semiconductor process equipment. The gas flow-controllable gas inlet method comprises the following steps: S1, carrying out flow calibration on a mass flow controller of a gas main pipeline and a mass flow controller of a gas branch pipeline; s2, distributing the MFC flow of the gas branch pipelines according to the product of the MFC flow of the gas main pipeline, the distribution coefficient ai and the target proportion, wherein the initial value ai0 of the ai is 1; s3, the actual MFC flow on the gas branch pipelines in the step S2 is measured, and the deviation coefficient beta i of each gas branch pipeline is calculated according to the actual MFC flow and the target flow; and S4, according to the deviation coefficient beta i obtained in the step S3, the distribution coefficient ai is adjusted, so that the actual MFC flow of each gas branch pipeline and the target flow are within the error range. The problems of pipeline pressure building, low flow distribution precision and poor repeatability of the mass flow controller can be relieved.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to a gas intake method, gas intake device, and semiconductor process equipment with controllable gas flow. Background Technology

[0002] Currently, most CVD equipment uses mass flow controllers (MFCs) to control the mass flow rate of gases. In complex gas path systems, multiple MFCs are connected in series and parallel to achieve proportional distribution of process gas flow rates. However, this method often leads to MFC pipeline pressure buildup, low flow distribution accuracy, and poor repeatability, thereby affecting the stability of process equipment performance and product yield.

[0003] Specifically, firstly, when multiple MFCs are connected in parallel, pressure buildup in the pipeline is often used to ensure that each MFC has a sufficient pressure differential to achieve the target flow rate. This pressure buildup can cause the pipeline pressure to be much higher than the process chamber pressure. If the pipeline is in a pressure buildup state, gas exceeding the target flow rate will rush into the reaction chamber in the initial stage of MFC startup, affecting process performance.

[0004] Secondly, if the method of not suppressing pressure is adopted, the actual traffic of some MFCs may differ too much from the target traffic due to the influence of their internal algorithms and errors, which will affect the accuracy of traffic allocation.

[0005] Thirdly, the MFC, which differs from the target flow rate, is random, thus making it impossible to guarantee that the flow rate distribution entering the cavity will be the same each time under the same hardware conditions and settings. This results in poor flow rate repeatability, affecting product yield.

[0006] Therefore, there is a need to develop intake structures and methods that can improve flow repeatability and product yield. Summary of the Invention

[0007] In view of the shortcomings of the existing technology, the purpose of this invention is to provide a gas flow controllable gas intake method, gas intake device and semiconductor process equipment, which can alleviate the problems of MFC pipeline pressure buildup, low flow distribution accuracy and poor repeatability, and improve the performance stability of process equipment and product yield.

[0008] To achieve this objective, the present invention adopts the following technical solution:

[0009] In a first aspect, the present invention provides a gas intake method with controllable gas flow rate, the gas intake method comprising:

[0010] S1. Perform flow calibration on the MFC flow rate of the main gas pipeline and the MFC flow rate of the gas branch pipeline.

[0011] S2, MFC flow rate and distribution coefficient a in the main gas pipeline. i The MFC flow rate in the gas branch pipeline is distributed by the product of the target ratio, the distribution factor α, and the distribution coefficient α. i Let a represent the distribution coefficient of the i-th gas branch pipeline. i initial value a i0 =1;

[0012] S3. Measure the actual MFC flow rate on the gas branch pipeline in step S2, and calculate the deviation coefficient β for each gas branch pipeline based on the actual MFC flow rate and the target flow rate. i deviation coefficient β i This represents the deviation coefficient of the i-th gas branch pipeline;

[0013] S4. Obtain the deviation coefficient β according to step S3. i Adjust the allocation coefficient a i This is to ensure that the actual MFC flow rate of each gas branch pipeline is within the error range compared to the target flow rate.

[0014] The gas flow controllable intake method provided by this invention, through MFC flow calibration, flow distribution, flow deviation coefficient determination, and distribution coefficient adjustment, can prevent pressure buildup between the MFC in the main gas pipeline and the MFC in the branch gas pipeline. Furthermore, by adjusting the distribution coefficient, the accuracy and repeatability of flow distribution can be achieved. When used in semiconductor processes, this method can improve the precision of semiconductor processes and product yield.

[0015] Preferably, the sum of the MFC flow rates of the gas branch pipelines in step S1 is less than the MFC flow rate of the main gas pipeline.

[0016] This invention prevents pressure buildup between the MFCs in the main gas pipeline and the MFCs in the branch gas pipelines by ensuring that the sum of the MFC flow rates in the branch gas pipelines is less than the MFC flow rate in the main gas pipeline. The main reason is that the set value of the MFC flow rate in each branch gas pipeline is equal to the set value of the MFC in the main pipeline multiplied by a fixed ratio (the ratio can be set according to actual needs, but the sum of the distribution ratios of multiple branch pipelines must be equal to 100). In this way, the set value of the branch MFC will be slightly greater than the actual value, and its opening will be slightly larger, thereby releasing the pressure in the pipeline into the semiconductor process cavity, thus alleviating the pressure buildup between the MFCs in the main gas pipeline and the MFCs in the branch gas pipelines.

[0017] Preferably, the sum of the MFC flow rates of the gas branch lines in step S1 is greater than or equal to 0.97 times the MFC flow rate of the main gas line. This setting ensures accuracy.

[0018] Specifically, the sum of the MFC flow rates in the gas branch pipelines is 0.97 times, 0.972 times, 0.973 times, 0.974 times, 0.975 times, 0.976 times, 0.978 times, 0.98 times, 0.982 times, 0.985 times, 0.986 times, 0.988 times, 0.99 times, 0.992 times, 0.993 times, 0.995 times, 0.996 times, or 0.999 times the MFC flow rate in the main gas pipeline, etc.

[0019] Preferably, the deviation coefficient β in step S3 i = Actual MFC flow rate of the i-th gas branch line / Target flow rate of the i-th gas branch line. The reason for the deviation coefficient is that there is a deviation between the sum of the MFC flow rate of the main gas line and the MFC flow rate of the gas branch lines, and this total deviation will randomly accumulate on a certain MFC due to the specific linkage of multiple MFCs.

[0020] Preferably, the error range refers to the deviation coefficient β. i The value range is 0.996 to 0.999, for example, it can be 0.996, 0.9965, 0.9968, 0.997, 0.9975, 0.998, 0.9985 or 0.999, etc.

[0021] Preferably, the adjustment allocation coefficient a i include:

[0022] Judgment bias coefficient β i When the value is greater than 1, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 -A1, where A1 represents the first adjustment precision, a ij This represents the allocation coefficient for the j-th iteration of the i-th gas branch pipeline, where j is an integer greater than 1.

[0023] And / or, the decision bias coefficient β i When <0.996, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 +A2, where A2 represents the second adjustment precision, a ij This represents the allocation coefficient for the j-th iteration of the i-th gas branch pipeline, where j is an integer greater than 1.

[0024] Preferably, A1 and A2 are each independently 0.0005~0.002, for example, they can be 0.0005, 0.0006, 0.0008, 0.0009, 0.001, 0.0015, 0.0018 or 0.002, etc.

[0025] The present invention preferably controls the adjustment accuracy within the above-mentioned range, which can efficiently and stably adjust the flow rate while taking into account the adjustment efficiency.

[0026] Secondly, the present invention provides an air intake device with controllable gas flow rate, which can realize the air intake method with controllable gas flow rate described in the first aspect.

[0027] Preferably, the air intake device includes: a flow calibration unit, a flow distribution adjustment unit, a gas source unit, a main gas pipeline, at least two gas branch pipelines, and a mass flow control component; the gas source unit is connected to one end of the main gas pipeline, and the end of the main gas pipeline away from the gas source unit is connected to each of the gas branch pipelines, with the gas branch pipelines arranged in parallel; the mass flow control component includes mass flow controllers disposed on the main gas pipeline and the gas branch pipelines; the flow calibration unit is used to calibrate the main flow rate of the main gas pipeline and the branch flow rates of the gas branch pipelines; the flow distribution adjustment unit is used to adjust the distribution coefficient of each gas branch pipeline so that the actual MFC flow rate on each gas branch pipeline is within the error range from the target flow rate.

[0028] Preferably, the air intake device further includes control valves disposed on the gas main pipeline and located on both sides of the mass flow controller on the gas main pipeline.

[0029] Thirdly, the present invention provides a semiconductor process apparatus, the semiconductor process apparatus including the gas flow controllable inlet device described in the second aspect.

[0030] Preferably, the gas branch lines are connected to the semiconductor process cavity.

[0031] Compared with the prior art, the present invention has at least the following beneficial effects:

[0032] The gas flow controllable intake device and intake method provided by the present invention can alleviate the problems of MFC pipeline pressure buildup, low flow distribution accuracy, and poor repeatability, and can improve the performance stability of process equipment and product yield. Attached Figure Description

[0033] Figure 1 This is a schematic diagram of the gas flow controllable air intake device provided in Embodiment 1 of the present invention.

[0034] Figure 2 This is a flowchart of the gas flow controllable intake method provided in Embodiment 2 of the present invention.

[0035] Figure 3 This is a flow fluctuation diagram of a gas branch pipeline obtained by the gas flow controllable intake method provided in Embodiment 2 of the present invention.

[0036] In the diagram: 1. Gas source unit; 2. Control valve; 21. First control valve; 22. Second control valve; 3. Mass flow control assembly; 31. Main gas pipeline mass flow controller; 32. Branch gas pipeline mass flow controller; 321. First branch pipeline mass flow controller; 322. Second branch pipeline mass flow controller; 323. Third branch pipeline mass flow controller; 324. Fourth branch pipeline mass flow controller; 325. Fifth branch pipeline mass flow controller; 326. Sixth branch pipeline mass flow controller; 327. Seventh branch pipeline mass flow controller; 4. Inlet structure; 5. Process chamber. Detailed Implementation

[0037] To facilitate understanding of the present invention, the following embodiments are provided. Those skilled in the art should understand that these embodiments are merely illustrative and should not be construed as limiting the scope of the invention.

[0038] It should be understood that the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0039] It should be noted that, in the description of this invention, unless otherwise explicitly specified and limited, the terms "set," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0040] Those skilled in the art should understand that the present invention necessarily includes the necessary pipelines, conventional valves and general pump equipment for achieving complete process, but the above content is not the main inventive point of the present invention. Those skilled in the art can add layouts based on process flow and equipment structure selection, and the present invention does not make any special requirements or specific limitations in this regard.

[0041] Example 1

[0042] This embodiment provides an air intake device with controllable gas flow rate, such as... Figure 1As shown, the air intake device includes: a flow calibration unit, a flow distribution adjustment unit, a gas source unit, a main gas pipeline, at least two gas branch pipelines, and a mass flow control component; the gas source unit is connected to one end of the main gas pipeline, and the end of the main gas pipeline away from the gas source unit is connected to each of the gas branch pipelines, with the gas branch pipelines arranged in parallel; the mass flow control component includes mass flow controllers installed on the main gas pipeline and the gas branch pipelines; the flow calibration unit is used to calibrate the main flow rate of the main gas pipeline and the branch flow rates of the gas branch pipelines; the flow distribution adjustment unit is used to adjust the distribution coefficient of each gas branch pipeline so that the actual MFC flow rate on each gas branch pipeline is within the error range from the target flow rate.

[0043] The air intake device also includes control valves installed on the gas main pipeline and located on both sides of the mass flow controller on the gas main pipeline.

[0044] Example 2

[0045] This embodiment provides a gas flow controllable intake method, such as... Figure 2 As shown, the air intake method uses the gas flow controllable air intake device provided in Example 1, and the air intake method includes:

[0046] S1. Perform flow calibration on the MFC flow rate of the main gas pipeline and the MFC flow rate of the gas branch pipelines to ensure that the sum of the MFC flow rates of the gas branch pipelines is less than the MFC flow rate of the main gas pipeline, and the sum of the MFC flow rates of the gas branch pipelines is greater than or equal to 0.97 times the MFC flow rate of the main gas pipeline.

[0047] S2, MFC flow rate and distribution coefficient a in the main gas pipeline. i The MFC flow rate in the gas branch pipeline is distributed by the product of the target ratio, the distribution factor α, and the distribution coefficient α. i Let a represent the distribution coefficient of the i-th gas branch pipeline. i initial value a i0 The value is 1.

[0048] S3. Measure the actual MFC flow rate on the gas branch pipeline in step S2, and calculate the deviation coefficient β for each gas branch pipeline based on the actual MFC flow rate and the target flow rate. i deviation coefficient β i This represents the deviation coefficient of the i-th gas branch pipeline; the deviation coefficient β i = Actual MFC flow rate of the i-th gas branch line / Target flow rate of the i-th gas branch line.

[0049] S4. Obtain the deviation coefficient β according to step S3. iAdjust the allocation coefficient a i This is to ensure that the actual MFC flow rate in each gas branch pipeline is within the error range from the target flow rate, where the error range refers to the deviation coefficient β. i The value range is 0.996 to 0.999.

[0050] Specifically, the adjustment allocation coefficient a i include:

[0051] Judgment bias coefficient β i When the value is greater than 1, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 -A1, where A1 represents the first adjustment precision, a ij A1 represents the allocation coefficient of the i-th gas branch pipeline in the j-th iteration, where j is an integer greater than 1, and A1 is 0.0005~0.002.

[0052] And / or, the decision bias coefficient β i When <0.996, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 +A2, where A2 represents the second adjustment precision, a ij A2 represents the allocation coefficient of the i-th gas branch pipeline in the j-th iteration, where j is an integer greater than 1, and A2 is 0.0005~0.002.

[0053] In Example 2, taking a gas branch pipeline with 7 branches and A1 and A2 both being 0.001 as an example, under different flow conditions from 10 to 60 slm, the ratio of the outlet flow rate to the inlet flow rate of the MFC on the main gas pipeline, the fluctuation value of the ratio of the outlet flow rate to the inlet flow rate, the deviation value of the MFC displayed flow rate / set flow rate of the gas branch pipeline (based on the largest deviation), the pressure of the inlet pipeline and the chamber pressure are shown in Table 1.

[0054] The pressure in the intake line is the pressure measured by the mass flow controllers of both the main gas line and the branch gas lines. Pressure buildup occurs when the pressure in this section of the line is significantly greater than the pressure in the chamber (a difference exceeding 500 Torr). Ignoring minor differences, generally the pressure in the downstream section of the branch gas line mass flow controller equals the pressure at the intake structure, which in turn equals the pressure in the chamber.

[0055] The detection and calculation of the ratio of MFC outlet flow rate to inlet flow rate on the main gas pipeline are as follows:

[0056] The intake flow rate of the main MFC is the set flow rate of the mass flow controller on the main gas pipeline, denoted as F1; the outlet flow rate is the sum of the flow rates displayed by the mass flow controllers of each branch pipeline, denoted as F2 = f1 + f2 + f3 + f4 + f5 + f6 + f7. The ratio of the outlet flow rate to the intake flow rate of the MFC is F2 / F1.

[0057] Deviation value = | Displayed flow rate of each branch pipeline mass flow controller / Set flow rate × 100% - 100% |, and the largest deviation is recorded in Table 1.

[0058] The fluctuation of exhaust / intake is the change of F2 / F1 over time. The software background will read the value every 0.5 seconds. Fluctuation calculation: within 10 minutes, the fluctuation value is calculated as |max(F2 / F1)-min(F2 / F1)|.

[0059] Table 1

[0060]

[0061] In this embodiment, the ratio of MFC flow rate to target flow rate in each gas branch pipeline is as follows: Figure 3 As shown, from Figure 3 It can be seen that the MFC flow rate of each gas branch pipeline fluctuates little around the target flow rate, indicating that the process system is relatively stable.

[0062] Example 3

[0063] This embodiment provides a gas flow controllable intake method. Except that the sum of the MFC flow rates of the gas branch pipelines in step S1 is exactly equal to the MFC flow rate of the gas main pipeline, the intake method is the same as that in embodiment 2, and will not be described again here.

[0064] Example 4

[0065] This embodiment provides a gas flow controllable intake method. Except that the sum of the MFC flow rates of the gas branch pipelines in step S1 is 0.96 times the MFC flow rate of the main gas pipeline, the intake method is the same as that in embodiment 2, and will not be described again here.

[0066] The ratio of the outflow rate to the inflow rate of the MFC on the main gas pipeline in Examples 3 and 4, the fluctuation value of the ratio of the outflow rate to the inflow rate, the deviation value of the MFC displayed flow rate / set flow rate on the gas branch pipeline (based on the largest deviation), the pressure of the inflow pipeline and the chamber pressure are shown in Tables 2 and 3, respectively. The test results of Example 3 are shown in Table 2, and the test results of Example 4 are shown in Table 3.

[0067] Table 2

[0068]

[0069] Table 3

[0070]

[0071] As can be seen from Tables 2 and 3, during calibration in Examples 3 and 4, the sum of the MFC flow rates of the gas branch pipelines was 1 or 0.96 times the MFC flow rate of the main gas pipeline. The results indicate that this can easily lead to pressure buildup or excessive flow deviation.

[0072] Comparative Example 1

[0073] This comparative example provides an air intake method, the air intake method comprising:

[0074] S1. Perform flow calibration on the MFC flow rate of the main gas pipeline and the MFC flow rate of the gas branch pipelines to ensure that the sum of the MFC flow rates of the gas branch pipelines is less than the MFC flow rate of the main gas pipeline, and the sum of the MFC flow rates of the gas branch pipelines is greater than or equal to 0.97 times the MFC flow rate of the main gas pipeline.

[0075] S2. Distribute the MFC flow rate of the gas branch pipelines by multiplying the MFC flow rate of the main gas pipeline by the target ratio.

[0076] In Comparative Example 1, taking a case with 7 gas branch lines, under different flow conditions from 10 to 60 slm, the ratio of the outflow rate to the inflow rate of the MFC on the main gas line, the fluctuation value of the ratio of the outflow rate to the inflow rate, the deviation value of the MFC displayed flow rate / set flow rate of the gas branch lines (based on the largest deviation), the pressure of the inflow line and the chamber pressure are shown in Table 4.

[0077] Table 4

[0078]

[0079] As can be seen from Table 4, in Comparative Example 1, the lack of adjustment of the distribution coefficient and deviation coefficient resulted in a large deviation between the MFC displayed flow rate and the set flow rate in the gas branch pipeline, and a significant decrease in the flow control accuracy.

[0080] Comparative Example 2

[0081] This comparative example provides a gas flow controllable intake method, wherein the intake method uses the gas flow controllable intake device provided in Example 1, and the intake method includes:

[0082] S1, MFC flow rate and distribution coefficient a in the main gas pipeline. i The MFC flow rate in the gas branch pipeline is distributed by the product of the target ratio, the distribution factor α, and the distribution coefficient α. iLet a represent the distribution coefficient of the i-th gas branch pipeline. i initial value a i0 The value is 1.

[0083] S2. Measure the actual MFC flow rate on the gas branch pipeline in step S1, and calculate the deviation coefficient β for each gas branch pipeline based on the actual MFC flow rate and the target flow rate. i deviation coefficient β i This represents the deviation coefficient of the i-th gas branch pipeline; the deviation coefficient β i = Actual MFC flow rate of the i-th gas branch line / Target flow rate of the i-th gas branch line.

[0084] S3. Obtain the deviation coefficient β according to step S2. i Adjust the allocation coefficient a i This is to ensure that the actual MFC flow rate in each gas branch pipeline is within the error range from the target flow rate, where the error range refers to the deviation coefficient β. i The value range is 0.996 to 0.999.

[0085] Specifically, the adjustment allocation coefficient a i include:

[0086] Judgment bias coefficient β i When the value is greater than 1, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 -A1, where A1 represents the first adjustment precision, a ij A1 represents the allocation coefficient of the i-th gas branch pipeline in the j-th iteration, where j is an integer greater than 1, and A1 is 0.0005~0.002.

[0087] And / or, the decision bias coefficient β i When <0.996, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 +A2, where A2 represents the second adjustment precision, a ij A2 represents the allocation coefficient of the i-th gas branch pipeline in the j-th iteration, where j is an integer greater than 1, and A2 is 0.0005~0.002.

[0088] In Comparative Example 2, taking a case with 7 gas branch lines and A1 and A2 both being 0.001, under different flow conditions from 10 to 60 slm, the ratio of the outflow rate to the inflow rate of the MFC on the main gas line, the fluctuation value of the ratio of the outflow rate to the inflow rate, the deviation value of the MFC displayed flow rate / set flow rate of the gas branch lines (based on the largest deviation), the pressure of the inflow line and the chamber pressure are shown in Table 5.

[0089] Table 5

[0090]

[0091] As can be seen from Table 5, the lack of calibration in Comparative Example 2 resulted in the pressure in the intake pipe being greater than the pressure in the chamber, leading to a more severe pressure build-up situation.

[0092] In summary, the gas flow controllable intake method provided by this invention can alleviate pressure buildup, and the deviation of the MFC displayed flow rate / set flow rate in the gas branch pipeline is <0.5%, and the fluctuation of the ratio of outlet flow rate to inlet flow rate is <0.2%, indicating broad application prospects.

[0093] The present invention has been illustrated with the above embodiments to illustrate its detailed features, but the present invention is not limited to the above detailed features, that is, it does not mean that the present invention must rely on the above detailed features to be implemented. Those skilled in the art should understand that any improvements to the present invention, equivalent substitutions for the selected technical features, additions of auxiliary technical features, and selection of specific methods, etc., all fall within the protection scope and disclosure scope of the present invention.

Claims

1. A gas intake method with controllable gas flow rate, characterized in that, The air intake method includes: S1. Perform flow calibration on the MFC flow rate of the main gas pipeline and the MFC flow rate of the gas branch pipeline. S2, MFC flow rate and distribution coefficient a in the main gas pipeline. i The MFC flow rate in the gas branch pipeline is distributed by the product of the target ratio, the distribution factor α, and the distribution coefficient α. i Let a represent the distribution coefficient of the i-th gas branch pipeline. i initial value a i0 =1; S3. Measure the actual MFC flow rate on the gas branch pipeline in step S2, and calculate the deviation coefficient β for each gas branch pipeline based on the actual MFC flow rate and the target flow rate. i deviation coefficient β i This represents the deviation coefficient of the i-th gas branch pipeline; S4. Obtain the deviation coefficient β according to step S3. i Adjust the allocation coefficient a i This is to ensure that the actual MFC flow rate of each gas branch pipeline is within the error range compared to the target flow rate.

2. The air intake method according to claim 1, characterized in that, The sum of the MFC flow rates of the gas branch pipelines in step S1 is less than the MFC flow rate of the main gas pipeline; And / or, the sum of the MFC flow rates of the gas branch lines in step S1 is greater than or equal to 0.97 times the MFC flow rate of the main gas line.

3. The air intake method according to claim 1 or 2, characterized in that, The deviation coefficient β mentioned in step S3 i = Actual MFC flow rate of the i-th gas branch line / Target flow rate of the i-th gas branch line.

4. The air intake method according to any one of claims 1 to 3, characterized in that, The error range refers to the deviation coefficient β i The value range is 0.996 to 0.

999.

5. The air intake method according to any one of claims 1 to 4, characterized in that, The adjustment allocation coefficient a i include: Judgment bias coefficient β i When the value is greater than 1, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 -A1, where A1 represents the first adjustment precision, a ij This represents the allocation coefficient for the j-th iteration of the i-th gas branch pipeline, where j is an integer greater than 1. And / or, the decision bias coefficient β i When <0.996, adjust the allocation coefficient a. ij = Allocation coefficient a ij-1 +A2, where A2 represents the second adjustment precision, a ij This represents the allocation coefficient for the j-th iteration of the i-th gas branch pipeline, where j is an integer greater than 1.

6. The air intake method according to claim 5, characterized in that, A1 and A2 are each independently 0.0005~0.

002.

7. A gas flow controllable air intake device, characterized in that, The air intake device can realize the air intake method with controllable gas flow as described in any one of claims 1 to 6.

8. The air intake device according to claim 7, characterized in that, The air intake device includes: a flow calibration unit, a flow distribution and adjustment unit, a gas source unit, a main gas pipeline, at least two gas branch pipelines, and a mass flow control component; The gas source unit is connected to one end of the main gas pipeline, and the end of the main gas pipeline away from the gas source unit is connected to each gas branch pipeline, and the gas branch pipelines are arranged in parallel. The mass flow control component includes mass flow controllers installed on the main gas pipeline and the branch gas pipeline; The flow calibration unit is used to calibrate the main flow rate of the gas main pipeline and the branch flow rate of the gas branch pipeline. The flow distribution adjustment unit is used to adjust the distribution coefficient of each gas branch pipeline so that the actual MFC flow rate on each gas branch pipeline is within the error range from the target flow rate.

9. The air intake device according to claim 8, characterized in that, The air intake device also includes control valves installed on the gas main pipeline and located on both sides of the mass flow controller on the gas main pipeline.

10. A semiconductor process apparatus, characterized in that, The semiconductor process equipment includes the gas flow controllable inlet device as described in any one of claims 7 to 9.

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