Laser-assisted MCED electrochemical deposition method and inclined cantilever beam preparation method

Abstract

The invention discloses a laser-assisted MCED electrochemical deposition method and an inclined cantilever beam preparation method, and the method comprises the steps: S1, carrying out laser-assisted experiment simulation on a glass microprobe tip in an MCED system through COMSOL software to obtain correlation characteristics of temperature field change and deposition rate of the glass microprobe tip under different laser parameters; s2, after a stable electrolyte droplet bridge is formed in the MCED system, a laser-assisted assembly is started; s3, the droplet bridge form, the deposition point form and the deposition area temperature are observed in real time based on a temperature-vision system; and S4, the MCED central controller realizes regulation and control on the shape of the liquid drop at the tip of the glass microprobe based on coordination in the step S3, the shape of the liquid drop bridge is kept consistent, and the preparation of the micro-nano structure is rapidly completed on the substrate. According to the MCED electrochemical deposition method based on laser assistance and the inclined cantilever beam preparation method, the deposition rate is increased while the process stability is guaranteed, micro-nano manufacturing is completed, and the MCED technology is promoted to be applied and developed to industrialization.

Description

Laser-Assisted Electrochemical Deposition Method for MCED and Preparation Method for Inclined Cantilever Beams Technical Field

[0001] This invention relates to the field of metal micro / nano structure fabrication, and more specifically, to a laser-assisted MCED electrochemical deposition method and a method for fabricating inclined cantilever beams. Background Technology

[0002] The fabrication of micro / nano metallic structures has important applications in fields such as microelectromechanical systems (MEMS), integrated antennas, and microsensors. Droplet-confined electrochemical deposition (MCED), as an additive manufacturing technology for micro / nano-scale three-dimensional metallic structures, can achieve direct writing of complex three-dimensional metallic structures with high aspect ratios by controlling the electrochemical reduction reaction of metal ions at the droplet bridge at the tip of a microprobe. However, traditional MCED technology suffers from slow deposition rates and low forming efficiency, which limits its industrial application.

[0003] To improve deposition efficiency, existing technologies typically employ methods such as increasing deposition voltage and optimizing electrolyte composition, but these methods often lead to problems such as deterioration of deposition morphology and coarsening of crystals. Lasers offer advantages such as concentrated energy and high controllability; introducing them into the electrochemical deposition process can locally increase the reaction interface temperature through photothermal effects, enhancing ion mass transfer efficiency and thus significantly improving the deposition rate. However, a systematic method for effectively integrating lasers with MCED technology and achieving stable control of the deposition process is currently lacking. Summary of the Invention

[0004] One object of the present invention is to solve at least the above-mentioned problems and / or defects, and to provide at least the advantages described below.

[0005] To achieve these objectives and other advantages of the present invention, a laser-assisted MCED electrochemical deposition method is provided, comprising: S1, performing laser-assisted experimental simulation on the glass microprobe tip in the MCED system using COMSOL software to obtain the correlation characteristics between the temperature field change of the glass microprobe tip and the deposition rate under different laser parameters; S2, mounting the glass microprobe on the moving end of a three-axis stepper motor, and adding a laser-assisted component to the MCED system; after a stable electrolyte droplet bridge is formed in the MCED system, activating the laser-assisted component to focus the laser on the liquid-solid reaction at the glass microprobe tip. The interface improves the deposition rate; S3, the temperature-vision system observes the droplet bridge morphology, deposition point morphology, and deposition zone temperature in real time, and feeds this information back to the central controller of the MCED in real time; S4, the MCED central controller, based on the deposition zone temperature coordinated in S3, coordinates and adjusts the laser parameters and deposition voltage to adjust the deposition rate of the glass microprobe; the MCED controller, based on the droplet morphology and deposition point morphology fed back in S3, adjusts the three-axis stepper motor to control the droplet morphology at the tip of the glass microprobe, maintains a consistent droplet bridge morphology, and rapidly completes the fabrication of micro-nano structures on the substrate.

[0006] Preferably, in S1, the correlation characteristic is: increasing the laser power enhances the local temperature field intensity at the tip of the glass microprobe, thereby increasing the deposition rate; decreasing the laser power weakens the local temperature field intensity at the tip of the glass microprobe, thereby slowing down the deposition rate.

[0007] Preferably, the laser-assisted assembly is configured to include: an adjustable bracket symmetrically mounted on a three-axis stepper motor; a laser holder fixedly mounted on the adjustable bracket; a laser emitter whose output laser wavelength matches the optical properties of the electrolyte, mounted on the laser holder with its output end facing the substrate; an optical path transmission assembly for focusing the laser beam onto the micro-area deposition reaction interface at the tip of a glass microprobe, mounted on the output optical path of the laser emitter; a laser power controller for real-time adjustment of the output power of the laser emitter based on feedback signals, connected to a central controller; and a laser absorber block located in the non-working area of ​​the optical path for absorbing reflected or dissipated laser energy to ensure the optical safety of the system; wherein the laser emitter, optical path transmission assembly, substrate, and laser absorber block together constitute an optically sealed environment.

[0008] Preferably, the temperature-vision system is configured to include: an AD converter, whose input terminals are respectively connected to a PC host computer and an amplifier signal, and whose output terminal is connected to a central controller signal; a DA converter, whose input terminal is connected to the central controller signal, and whose output terminal is respectively connected to a piezoelectric actuator, a temperature controller, and a stepper motor controller signal, wherein the temperature controller is connected to a laser power controller signal, and the stepper motor controller is connected to a three-axis stepper motor signal; a temperature sensor for real-time feedback of the deposition zone temperature, whose detection end is directly facing the micro-deposition reaction interface, and whose temperature sensor is connected to the amplifier signal; an ion controller for monitoring deposition electrical parameters, which is connected to the amplifier signal; an optical microscope camera for observing droplet morphology, whose observation end is directly facing the micro-deposition reaction interface, and whose optical microscope camera is connected to the PC host computer signal; and a filter is disposed between the optical microscope camera and the micro-deposition reaction interface at the tip of the glass microprobe.

[0009] Preferably, the process of coordinating laser parameters and deposition voltage based on a temperature-vision system includes: B1. Real-time acquisition of temperature data of the deposition reaction zone via a temperature sensor and real-time acquisition of deposition electrical parameter data via an ion controller, comparing them with preset target thickness and target temperature ranges respectively, generating a deviation signal, and feeding the comparison result back to the central controller in real time; B2. Based on the received deviation signal, the central controller uses a PID control algorithm to generate corresponding adjustment commands. If the current temperature exceeds the upper limit of the target range, the signal is sent to the laser power controller, which reduces the laser emitter power to reduce the thermal effect; otherwise, the power is appropriately increased; B3. If the current deposition temperature is within the target range, based on the deviation signal fed back from B2, the PID control algorithm generates corresponding adjustment commands. If the deposition rate is slow, the signal is sent to the piezoelectric actuator to increase the voltage to accelerate the growth rate; otherwise, the deposition voltage is decreased.

[0010] Preferably, a method for fabricating a 45° angled cantilever beam structure, employing the laser-assisted MCED electrochemical deposition method, includes the following steps: C1, a 45° angled path to the vertical direction is preset in the central controller; C2, when deposition begins at the tip of the glass microprobe in the MCED system, the X and Z axes of the three-axis stepper motor drive the probe tip to move relative to the substrate along the inclined path, and the droplet morphology is monitored in real time by an optical microscope camera; C3, the optical microscope camera sends image data to the central controller, which determines whether the deposition point deviates from the preset inclined path. If a deviation occurs, the central controller sends an adjustment command to the three-axis stepper motor to control the angle and morphology, thereby fabricating a metal cantilever beam structure with a 45° angle to the horizontal plane and a length exceeding 50 μm on the substrate; C4, during the fabrication of the metal cantilever beam structure based on C3, a temperature sensor collects the temperature data of the deposition reaction zone in real time, and an ion controller collects the deposition electrical parameter data in real time, and sends the generated deviation signal to the central controller to ensure the constant temperature and deposition rate of the reaction zone throughout the entire inclined deposition process.

[0011] The present invention has at least the following beneficial effects: The present invention proposes a laser-assisted MCED electrochemical deposition method, which improves the deposition rate while ensuring process stability, completes micro-nano manufacturing, and promotes the development of MCED technology towards industrial application.

[0012] This invention proposes a control method. Currently, the deposition rate of MCED is mainly controlled by changing the magnitude of the applied electric field to alter the electromigration rate of deposited ions. This method enhances the ion transport and charge transfer dynamics at the reaction interface through the local photothermal effect of laser. It proposes that, under the condition of consistent deposit surface morphology, the deposition rate can be changed by adjusting the laser power, altering the temperature of the deposition reaction zone, or synergistically controlling the deposition voltage, thereby completing the fabrication of micro- and nano-structures.

[0013] Other advantages, objectives and features of the present invention will become apparent in part from the following description, and in part from those skilled in the art through study and practice of the invention. Attached Figure Description

[0014] Figure 1 is a schematic diagram of the MCED technology principle used in this invention; Figure 2 is a schematic diagram of the overall structure of the device in this invention; Figure 3 is a schematic diagram of the overall structure of the device in this invention; Figure 4 is a magnified schematic diagram of section A in Figure 3 in this invention; Figure 5 is a schematic diagram of the droplet bridge morphology in this invention; Figure 6 is a diagram of the copper ion concentration diffusion result at 0.001s under steady-state temperature of 293K in this invention; Figure 7 is a diagram of the copper ion concentration diffusion result at 0.001s under steady-state temperature of 313K in this invention; Figure 8 is a diagram of the laser optical path modulation in this invention; Figure 9 is an optical microscope image of the smallest spot after modulation in this invention; Figure 10 is a modular architecture in this invention; Figure 11 is a diagram of the PC-side host computer interface in this invention; Figure 12 is a control flowchart in this invention; Figure 13 is a simplified diagram of the fabrication process of the 45° angled cantilever beam structure in this invention; Figure 14 is a diagram of the fabrication process of the 45° angled cantilever beam structure in this invention. A schematic diagram of the boom structure; the corresponding labels for each structure are as follows: 1. Glass microprobe, 2. Three-axis stepper motor, 3. Laser auxiliary component, 31. Adjustable bracket, 32. Laser clamp, 33. Laser emitter, 34. Optical path transmission component, 35. Laser power controller, 36. Laser absorber block, 4. Central controller, 5. Substrate, 6. Temperature sensor, 7. Optical microscope camera, 71. Filter; 101. AD converter, 102. PC host computer, 103. Amplifier, 104. DA converter, 105. Piezoelectric actuator, 106. Temperature controller, 107. Stepper motor controller, 108. Ion controller; Detailed Implementation

[0015] The present invention will now be described in further detail with reference to the accompanying drawings, so that those skilled in the art can implement it based on the description.

[0016] It should be understood that terms such as "having," "comprising," and "including" as used herein do not exclude the presence or addition of one or more other elements or combinations thereof. Example 1 This example provides a laser-assisted MCED electrochemical deposition method, as shown in Figures 1-14, including: S1, performing laser-assisted experimental simulation on the tip of the glass microprobe 1 in the MCED system using COMSOL software to obtain the correlation characteristics between the temperature field change at the tip of the glass microprobe and the deposition rate under different laser parameters; S2, mounting the glass microprobe 1 on the moving end of a three-axis stepper motor 2, and adding a laser-assisted component 3 to the MCED system. After a stable electrolyte droplet bridge is formed in the MCED system, the laser-assisted component 3 is activated, focusing the laser onto the liquid-solid reaction interface at the tip of the glass microprobe 1. The deposition rate is increased by adjusting the surface area; S3, the droplet bridge morphology, deposition point morphology and deposition zone temperature are observed in real time based on the temperature-vision system, and this information is fed back to the central controller 4 of the MCED in real time; S4, the central controller 4 of the MCED adjusts the laser parameters and deposition voltage in coordination based on the deposition zone temperature coordinated in S3, so as to adjust the deposition rate of the glass micro probe 1; the MCED controller adjusts the droplet morphology at the tip of the glass micro probe 1 by adjusting the three-axis stepper motor 2 based on the droplet morphology and deposition point morphology fed back in S3, so as to maintain the consistency of the droplet bridge morphology, so as to quickly complete the fabrication of micro-nano structures on the substrate 5.

[0017] Working principle: First, the essence of the MCED deposition process is that the reaction rate mainly depends on the ion migration and electrochemical reduction kinetics of the deposition reaction zone at the tip of the glass microprobe 1. Precise control of the local temperature field in this region can effectively enhance reactant transport efficiency and accelerate the deposition process. Based on this, theoretical analysis and experimental verification have shown that applying laser irradiation with specific parameters to the deposition reaction zone of the glass microprobe 1 can achieve precise control of the local temperature.

[0018] Therefore, this invention provides a laser-assisted MCED electrochemical deposition method. The MCED system includes a DC and an AC power supply, and an adjustable DC power supply, as shown in Figure 1. The DC power supply provides energy for metal deposition, the AC power supply is used to detect the distance between the tip of the glass microprobe 1 and the substrate 5, and the adjustable DC power supply is used to adjust the magnitude of the deposition current to ensure its stability during deposition. Simultaneously, the existing MCED experimental platform is improved by adding a laser-assisted component 3 and a temperature-vision system to actively control the temperature of the local area of ​​the deposition probe. A 1:1 physical simulation model was established using COMSOL software to simulate the relationship between the temperature field distribution and deposition rate at the tip of the glass microprobe 1 under different laser parameters. Based on the simulation experiment, after a stable electrolyte droplet bridge is formed in the MCED system, the laser-assisted component 3 is activated, focusing the laser onto the liquid-solid reaction interface at the tip of the glass microprobe 1 (shown in the gray area of ​​Figure 5), using the local energy input of the laser to activate the reaction process. During the experiment, the droplet bridge morphology, deposition point morphology, and deposition area temperature are observed in real time using the temperature-vision system, and this information is fed back to the central controller 4 of the MCED in real time. If the temperature exceeds a preset threshold, the output power of the laser-assisted component 3 is reduced; if the temperature is below the threshold, the power is increased accordingly to maintain a constant temperature in the deposition area; if the current deposition temperature is constant (within the threshold), and the deposition rate is slow, the central controller 4 increases the deposition voltage output by the DC power supply to accelerate the growth rate, and vice versa; simultaneously, based on the droplet morphology and deposition point morphology fed back by the temperature-visual system, the droplet morphology at the tip of the glass microprobe 1 is controlled by adjusting the three-axis stepper motor 2 to maintain a consistent droplet bridge morphology, so as to quickly complete the fabrication of micro-nano structures on the substrate 5; in summary, this invention proposes a laser-assisted MCED electrochemical deposition method, which improves the deposition rate while ensuring process stability, completes micro-nano manufacturing, and promotes the industrial application of MCED technology.

[0019] This invention proposes a control method. Currently, the deposition rate of MCED is mainly controlled by changing the magnitude of the applied electric field to alter the electromigration rate of deposited ions. This method enhances the ion transport and charge transfer dynamics at the reaction interface through the local photothermal effect of laser. It proposes that, under the condition of consistent deposit surface morphology, the deposition rate can be changed by adjusting the laser power, altering the temperature of the deposition reaction zone, or synergistically controlling the deposition voltage, thereby completing the fabrication of micro- and nano-structures.

[0020] Example 2 This embodiment 2 discloses the following improvements based on embodiment 1. The associated characteristics are: increasing the laser power enhances the local temperature field intensity at the tip of the glass microprobe 1, thereby increasing the deposition rate; decreasing the laser power weakens the local temperature field intensity at the tip of the glass microprobe 1, thereby slowing down the deposition rate.

[0021] Working principle: During MCED deposition, a laser is focused onto the liquid-solid reaction interface at the tip of the glass microprobe 1 (gray area in Figure 5). Laser irradiation with specific parameters is applied to the deposition reaction zone. The introduction of laser energy significantly alters the thermodynamic environment of the reaction zone, and the change in temperature field directly affects the ion migration rate and the activation energy of the electrochemical reaction, thus accelerating deposition. This is achieved through the Stokes-Einstein relationship: in, Where η is the Boltzmann constant, η is the solvent viscosity, and R is the ion hydration radius. This formula clearly shows that D is proportional to (T / η), that is, the solution ion diffusion rate increases with increasing temperature; the Comsol model uses dilute mass transfer and solid-fluid heat transfer interface simulation, with the anode concentration set to 0.3 mol / L and the solution concentration set to 0 mol / L.

[0022] Using a simplified model, the diffusion results of copper ion concentration at 0.001 s at a steady-state temperature of 293 K are shown in Figure 6, and the diffusion results at 0.001 s at a steady-state temperature of 313 K are shown in Figure 7 (the x-axis represents the horizontal distance of each point on the cross-section from the central axis, the y-axis on the left represents the horizontal distance of each point on the cross-section from the central axis, and the color legend on the right represents the ion concentration). Figures 6 and 7 show that the ion diffusion rate increases significantly at a steady-state temperature of 313 K, while the MCED electrodeposition rate is affected by ion transport. Based on the above two comparison results, it can be concluded that laser heating of the glass microprobe 1 tip can promote the MCED electrodeposition rate. In summary, the simulation results show that appropriately increasing the laser power or reducing the spot size can significantly enhance the temperature of the reaction zone, thereby effectively improving the deposition rate; conversely, decreasing the laser power or increasing the spot size will lead to a weakening of the temperature field and a corresponding decrease in the deposition rate.

[0023] As described above, the laser-assisted component 3 is configured to include: an adjustable bracket 31 symmetrically mounted on the three-axis stepper motor 2; a laser mounting bracket 32 ​​fixedly mounted on the adjustable bracket 31; a laser emitter 33 whose output laser wavelength matches the optical characteristics of the electrolyte, mounted on the laser mounting bracket 32, with the output end of the laser emitter 33 facing the substrate 5; an optical path transmission component 34 for focusing the laser beam onto the micro-area deposition reaction interface at the tip of the glass microprobe 1, mounted on the output optical path of the laser emitter 33; a laser power controller 35 for real-time adjustment of the output power of the laser emitter 33 based on feedback signals, connected to the central controller 4; and a laser absorption block 36 located in the non-working area of ​​the optical path for absorbing reflected or dissipated laser energy to ensure the optical safety of the system; wherein the laser emitter 33, the optical path transmission component 34, the substrate 5, and the laser absorption block 36 together constitute an optically sealed environment.

[0024] Working principle: The operator clamps the laser emitter 33 in the laser holder 32 on the adjustable bracket 31. Two sets of laser emitters 33 are symmetrically arranged on the left and right sides of the substrate 5, and the optical path transmission component 34 on the output optical path of the laser emitter 33 is aligned with the deposition reaction area, so that the laser beam can be precisely focused on the reaction area at the tip of the glass microprobe 1 from both sides. The three-axis stepper motor 2 is started by an external power supply. The three-axis stepper motor 2 is initially rotated manually, and the temperature-vision system is used for initial positioning. After the probe is close to the substrate 5, the movement parameters are input into the temperature-vision system, and the position is adjusted accordingly. The central controller 4 adjusts the jogging of the three-axis stepper motor 2. Based on the temperature of the deposition area of ​​the glass microprobe 1 fed back by the temperature-vision system, the central controller 4 processes the temperature data and then sends a signal to the laser power controller 35 to adjust the incident laser power of the laser emitter 33, thereby achieving the adjustment of the deposition rate. Specifically, ① in actual use, the laser emitter 33 is an existing device or a commercially available product, with a laser beam wavelength of 532nm and a modulation signal frequency of 0-30kHz. The selected laser parameters are shown in Table 1-1: Table 1-1 Wavelength 532 (±0.5) Spatial Mode Near TEM00 Output Power 800mW, 1000mW, 2000mW, 3000mW Operation Mode CW or Modulation Pointing Stability <0.05 mrad Beam Diameter (1 / e²) <3 mm Beam Divergence (full angle) <2 mrad Beam Height 29 mm Power stability <5% per 2 hrs Temperature Stabilizing (TEC) Warm Up Time <5 minute Beam Quality <2 Lifespan 10,000 hrs Laser Dimensions 155(L) x 77(W) x 60(H) mm3 Power Supply 178(W) x 197(D) x 84(H) mm3 Modulation Frequency 0~30kHz Analog or TTL Operating Temperature 20~30℃ Storage Temperature Temperature 10~50℃ Table ② shows that the optical path transmission component 34 of this device is composed of a right convex lens 341, a middle convex lens 342, and a left concave lens 343.

[0025] The path of the laser through the optical path transmission component 34 is as follows: (1) A large diverging beam with a diameter of about 1~3mm emitted by the laser emitter 33 first enters the right convex lens 341. The right convex lens 341 performs preliminary collimation on the beam, reducing its divergence angle and providing a more regular beam for subsequent processing; (2) The beam after preliminary collimation passes through the middle convex lens 342. The middle convex lens 342 highly converges the beam, forming a very small virtual focus in the space on the left side immediately after it, thereby greatly compressing the beam size and increasing the energy density; (3) The beam that diverges rapidly from the convergence point immediately enters the left concave lens 343. The left concave lens 343 re-collimates the strong diverging light formed in the previous step, realizing the output of a parallel light spot with a diameter of about 50μm; by setting the right convex lens 341, the middle convex lens 342, and the left concave lens 343, staged and high-precision beam shaping is achieved. This cascaded design significantly improves the collimation and focusing accuracy of the beam, effectively controlling deviations, thereby ensuring efficient energy utilization while achieving precise and controllable spot modulation from 1~3mm to 50μm. Specifically, as shown in Figure 8, the original laser spot size after focusing is 1~3mm. After modulation by the right convex lens 341, the middle convex lens 342, and the left concave lens 343 of the lens group, the spot size can be modulated to a minimum of 50μm. The image of the smallest spot after modulation by the optical microscope camera 7 is shown in Figure 9, where the width of the silver deposit is about 20μm. ③ Since there are reflection and refraction problems when the laser shines on the tip of the glass microprobe 1, it will pose risks to the experimental personnel, platform, and environment. Therefore, it is necessary to control the laser energy to avoid unnecessary spillage. Currently, a relatively simple method to terminate laser absorption is to use a metal (such as aluminum alloy) with a laser absorption coating (such as dark black). By setting a laser absorption block 36 with a dark black, rough surface, a high diffuse reflection absorption rate (99%) is achieved, converting light energy into heat energy; ④ In actual use, the three-axis stepper motor 2 is an existing device or a commercially available product with a manual rotating handle. The three-axis stepper motor 2 is preferably an existing MMU-60X linear motor (linear sliding table) of a certain brand, with a drive motor model of PH533-NB. The specific parameters are shown in Table 1-2: Table 1-2 Linear resolution (corresponding to "step distance") 0.001mm Repeat positioning accuracy (corresponding to "step distance angle accuracy") ±0.001mm Motor weight (kg) 0.8kg As shown in the above scheme, the temperature-vision system is configured to include: an AD converter 101, whose input terminals are respectively connected to the PC host computer 102 and the amplifier 103, and whose output terminal is connected to the central controller 4; a DA converter 104, whose input terminal is connected to the central controller 4, and whose output terminal is respectively connected to the piezoelectric actuator 105, the temperature controller 106, and the stepper motor controller 107, wherein the temperature controller 106 is connected to the laser power controller 35, and the stepper motor controller 107 is connected to the piezoelectric actuator 105, the temperature controller 106, and the stepper motor controller 107. 07 is connected to the three-axis stepper motor 2; a temperature sensor 6 is used for real-time feedback of the deposition zone temperature, with its detection end facing the micro-deposition reaction interface, and the temperature sensor 6 is connected to the amplifier 103; an ion controller 108 monitors the deposition electrical parameters, and is connected to the amplifier 103; an optical microscope camera 7 is used to observe the droplet morphology, with its observation end facing the micro-deposition reaction interface, and the optical microscope camera 7 is connected to the PC host computer 102; a filter 71 is provided between the optical microscope camera 7 and the micro-deposition reaction interface at the tip of the glass microprobe 1.

[0026] Working Principle: As shown in Figure 10, the control system adopts a modular architecture, with the central controller 4 as the core, coordinating the management of two main units: temperature control and visual positioning. Temperature sensor 6 provides real-time feedback of the deposition zone temperature data. After signal conditioning by amplifier 103, the analog signal is converted into a digital signal by AD converter 101 and fed back to the central controller 4. If the temperature deviates from the set threshold, the central controller 4 outputs a command through DA converter 104, which is then transmitted to the laser power controller 35 via temperature controller 106. The laser power controller 35 adjusts the output power of the laser emitter 33, thereby completing the process. Temperature regulation in the paired deposition zone; the deposition electrical parameter data monitored by the ion controller 108 is signal-conditioned by the amplifier 103, and then the analog signal is converted into a digital signal by the AD converter 101 and fed back to the central controller 4; when the temperature is maintained within the set threshold, the deposition rate has not reached the set threshold, the central controller 4 outputs a command to the piezoelectric actuator 105 (used to control the output of DC power supply in the MCED system) through the DA converter 104, the piezoelectric actuator 105 adjusts the output frequency, increases the voltage to accelerate the deposition rate, and vice versa, thereby completing the regulation of the deposition rate; The real-time morphology of the droplet bridge, captured by the optical microscope camera 7, is sent to the PC host computer 102. The analog signal is then converted into a digital signal by the AD converter 101 and fed back to the central controller 4. The central controller 4 determines whether the deviation from the preset position is detected. If a deviation is detected, the central controller 4 sends data to the stepper motor controller 107, which controls the three-axis stepper motor 2 to move precisely, achieving accurate displacement of the deposition glass microprobe 1 to control the micro / nano structure. In summary, the entire system achieves temperature stability and rapid deposition through centralized scheduling by the central controller 4 and closed-loop feedback from each module. To complete the fabrication of micro-nano structures; among them, ① in actual use, the specific movement data of the X, Y, and Z axes can be directly input on the PC host computer 102 interface, as shown in Figure 11; and the Z-axis motor is first controlled by the stepper motor controller 107 to establish the meniscus of the initial deposition step; ② in actual use, the optical microscope camera 7 is selected from existing devices or commercially available products, with priority given to models such as the Sanqiang Teda TD-AF200 industrial camera, equipped with a Sony IMX307 sensor, supporting 1920×1080 resolution and 60fps frame rate, and having an autofocus function; the system integrates 0.7-4.A 5x adjustable magnification lens, combined with a 20x objective lens, enables continuous optical zoom observation from approximately 14x to 90x; the optical microscope camera 7 is a monitoring device for observing the microscopic deposition process of MCED. To prevent (diffuse) reflected laser light from escaping through the microscope path from affecting the observation effect or equipment, a filter 71 can be installed on the side of the absorber block near the microscope head to filter out the heating laser light without affecting the observation; ③ In actual use, the temperature sensor 6 can be an existing device or a commercially available product, with the SA10R4C infrared temperature sensor (RS485 signal output, monitoring temperature range 0-100℃, temperature resolution 0.1℃, response time 200ms) being preferred. Specific parameters are shown in Table 1-3: Table 1-3. ④ In practical use, the ion controller 108 works by remotely setting and outputting a set DC voltage through a PC host computer 102 to drive the ion deposition process and simultaneously monitor the nA-level deposited ion current in real time. For more precise measurement and control of the pA-level current, a dedicated ion amplifier 103 can be connected in subsequent stages. The ion controller 108 can use a combination of existing devices or commercially available products, such as the UNI-T UDP3305S programmable DC power supply and the Micsig STO1004 smart oscilloscope. The UDP3305S provides high-precision, programmable DC voltage output; the STO1004 is responsible for real-time acquisition and display of the ion current signal waveform after current-to-voltage conversion. Both devices support USB or LAN communication and can be easily connected to the PC host computer 102 to set output parameters, read and record measurement data, forming a closed-loop host computer system integrating control, monitoring, and acquisition. Some parameters are: voltage output range ±10V, minimum step 1mV.

[0027] ⑤ Data transmission via network or signal connection (such as the output of AD converter 101 being connected to the central controller 4) involved in this device are all well-known technologies in the field and will not be elaborated here.

[0028] Example 3: This embodiment 2 discloses the following improvements based on the above content. As shown in Figure 12, the process of coordinating the adjustment of laser parameters and deposition voltage based on a temperature-vision system includes: Step 1: The temperature data of the deposition reaction zone is collected in real time by the temperature sensor 6, and the deposition electrical parameter data is collected in real time by the ion controller 108. These data are compared with the preset target thickness range and target temperature range, respectively, to generate a deviation signal. The comparison result is then signal-conditioned by the amplifier 103, and the analog signal is converted into a digital signal by the AD converter 101 and fed back to the central controller 4; Step 2: Based on the received deviation signal, the central controller 4 determines whether the temperature adjustment loop is in the correct position. A PID control algorithm is used to generate corresponding adjustment commands. If the current temperature exceeds the upper limit of the target range, the signal is sent to the laser power controller 35. The laser power controller 35 reduces the power of the laser emitter 33 to reduce the thermal effect, and vice versa. In step three, if the current deposition temperature is within the target range, based on the deviation signal fed back from step two, a PID control algorithm is used to generate corresponding adjustment commands in the deposition voltage adjustment loop. If the deposition rate is slow, the central controller 4 outputs commands to the piezoelectric actuator 105 through the DA converter 104. The piezoelectric actuator 105 adjusts the output frequency, increases the voltage, and speeds up the deposition rate. Conversely, it decreases the voltage, thereby completing the adjustment of the deposition rate.

[0029] Example 4: This invention provides a method for fabricating a 45° angled cantilever beam structure, as shown in Figures 13-14. The fabrication process includes: the operator first presets an inclined path at a 45° angle to the vertical direction in the central controller 4, and inputs the motion parameters of the three-axis stepper motor 2 into the PC host computer 102; after a stable electrolyte droplet bridge is formed in the MCED system, the laser-assisted component 3 is activated, and the laser is focused on the liquid-solid reaction interface at the tip of the glass microprobe 1. When deposition begins at the tip of the glass microprobe 1 in the MCED system, the central controller 4 sends data to the stepper motor controller 107, which controls the X and Z axes of the three-axis stepper motor 2, driving the tip of the glass microprobe 1 to move relative to the substrate 5 along the inclined path, and the droplet morphology is monitored in real time by the optical microscope camera 7; during this process, the temperature sensor 6 collects the temperature data of the deposition reaction zone in real time, and the ion controller 108 collects the deposition electrical parameter data in real time, and records the generated deviation. The signal is transmitted to the central controller 4 to ensure that the reaction zone temperature is constant at 25°C, the deposition diameter is 20µm, and the deposition rate is 50±2µm / min throughout the tilted deposition process. The laser spot is fixed on the three-axis displacement platform by the manually adjustable bracket 31. The optical path transmission component 34 is fixed on the adjustable bracket 31 and located at the output end of the laser emitter 33. The 50µm light spot modulated by it is kept relatively fixed with the tip of the glass micro probe 1 to ensure that the light spot always accurately covers the current liquid-solid reaction interface. At the same time, the optical microscope camera 7 sends the graphic data to the central controller 4. The central controller 4 compares the graphic forming path with the set tilt path to determine whether the deposition point deviates from the preset tilt path. If the position deviates, the central controller 4 sends an adjustment command to the stepper motor controller 107. The three-axis stepper motor 2 completes the adjustment of the angle and morphology to realize the fabrication of a metal cantilever beam structure with a length of more than 50µm at a 45-degree angle to the horizontal plane on the substrate 5 (as shown in Figure 14).

[0030] The above solution is merely an illustration of a preferred example and is not limited thereto. When implementing this invention, appropriate substitutions and / or modifications can be made according to the user's needs.

[0031] Although embodiments of the present invention have been disclosed above, they are not limited to the applications listed in the specification and embodiments. It can be applied to various fields suitable for the present invention. Other modifications can be readily made by those skilled in the art. Without departing from the general concept defined by the claims and their equivalents, the present invention is not limited to the specific details and examples shown and described herein.

Claims

1. A laser-assisted MCED electrochemical deposition method, characterized in that, include: S1. Laser-assisted experimental simulation of the glass microprobe tip in the MCED system was conducted using COMSOL software to obtain the correlation characteristics between the temperature field change of the glass microprobe tip and the deposition rate under different laser parameters. S2. The glass microprobe was mounted on the moving end of a three-axis stepper motor, and a laser-assisted component was added to the MCED system. After a stable electrolyte droplet bridge was formed in the MCED system, the laser-assisted component was activated to focus the laser onto the liquid-solid reaction interface at the glass microprobe tip, thereby increasing the deposition rate. S3. The droplet bridge morphology, deposition point morphology, and deposition zone temperature were observed in real time using a temperature-vision system, and this information was fed back to the central controller of the MCED in real time. S4. Based on the deposition zone temperature coordinated in S3, the MCED central controller coordinated the adjustment of laser parameters and deposition voltage to regulate the deposition rate of the glass microprobe. Based on the droplet morphology and deposition point morphology fed back in S3, the MCED controller adjusted the three-axis stepper motor to control the droplet morphology at the glass microprobe tip, maintaining a consistent droplet bridge morphology, thus enabling rapid fabrication of micro / nano structures on the substrate.

2. The laser-assisted MCED electrochemical deposition method as described in claim 1, characterized in that, In S1, the correlation characteristics are as follows: increasing the laser power enhances the local temperature field intensity at the tip of the glass microprobe, thereby increasing the deposition rate; decreasing the laser power weakens the local temperature field intensity at the tip of the glass microprobe, thereby slowing down the deposition rate.

3. The laser-assisted MCED electrochemical deposition method as described in claim 1, characterized in that, The laser-assisted assembly is configured to include: an adjustable bracket symmetrically mounted on a three-axis stepper motor; a laser holder fixedly mounted on the adjustable bracket; a laser emitter whose output laser wavelength matches the optical properties of the electrolyte, mounted on the laser holder with its output end facing the substrate; an optical path transmission assembly for focusing the laser beam onto the micro-area deposition reaction interface at the tip of a glass microprobe, mounted on the output optical path of the laser emitter; a laser power controller for real-time adjustment of the output power of the laser emitter based on feedback signals, connected to a central controller; and a laser absorber block located in the non-working area of ​​the optical path for absorbing reflected or dissipated laser energy to ensure the optical safety of the system; wherein the laser emitter, optical path transmission assembly, substrate, and laser absorber block together constitute an optically sealed environment.

4. The laser-assisted MCED electrochemical deposition method as described in claim 3, characterized in that, The temperature-vision system is configured to include: an AD converter, whose input is connected to a PC and an amplifier, and whose output is connected to a central controller; a DA converter, whose input is connected to the central controller and whose output is connected to a piezoelectric actuator, a temperature controller, and a stepper motor controller, wherein the temperature controller is connected to a laser power controller and the stepper motor controller is connected to a three-axis stepper motor; a temperature sensor for real-time feedback of the deposition zone temperature, whose detection end is facing the micro-deposition reaction interface and is connected to the amplifier; an ion controller for monitoring deposition electrical parameters, which is connected to the amplifier; and an optical microscope for observing droplet morphology, whose observation end is facing the micro-deposition reaction interface and is connected to the PC; a filter is provided between the optical microscope and the micro-deposition reaction interface at the tip of the glass microprobe.

5. The laser-assisted MCED electrochemical deposition method as described in claim 4, characterized in that, The process of coordinating laser parameters and deposition voltage based on a temperature-vision system includes: B1. Real-time acquisition of temperature data of the deposition reaction zone via a temperature sensor and real-time acquisition of deposition electrical parameter data via an ion controller, comparing them with preset target thickness and target temperature ranges respectively, generating a deviation signal, and feeding the comparison result back to the central controller in real time; B2. Based on the received deviation signal, the central controller uses a PID control algorithm to generate corresponding adjustment commands. If the current temperature exceeds the upper limit of the target range, the signal is sent to the laser power controller, which reduces the laser emitter power to reduce the thermal effect, and vice versa; B3. If the current deposition temperature is within the target range, based on the deviation signal fed back from B2, the PID control algorithm generates corresponding adjustment commands. If the deposition rate is slow, the signal is sent to the piezoelectric actuator to increase the voltage to accelerate the growth rate, and vice versa.

6. A method for fabricating a 45° angled cantilever beam structure, employing the laser-assisted MCED electrochemical deposition method as described in claim 4, characterized in that, Includes the following steps: C1. A 45-degree inclined path is preset in the central controller; C2. When the glass microprobe tip deposition begins in the MCED system, the X and Z axes of the three-axis stepper motor drive the probe tip to move relative to the substrate along the inclined path, and the droplet morphology is monitored in real time by an optical microscope camera. C3. The optical microscope sends the image data to the central controller. The central controller determines whether the deposition point deviates from the preset tilt path. If the position deviates, the central controller sends an adjustment command to the three-axis stepper motor to complete the control of the angle and morphology, so as to realize the fabrication of a metal cantilever beam structure with a length of more than 50 μm at a 45-degree angle to the horizontal plane on the substrate. C4. During the fabrication process of the metal cantilever beam structure based on C3, the temperature sensor collects the temperature data of the deposition reaction zone in real time, and the ion controller collects the deposition electrical parameter data in real time and sends the generated deviation signal to the central controller to ensure the constant temperature and deposition rate of the reaction zone throughout the tilt deposition process.

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