High-temperature annealing furnace

Abstract

The embodiment of the invention provides a high-temperature annealing furnace, comprising: a support table which is horizontally arranged in a circular ring shape and is used for bearing materials; the heat preservation and insulation layer is arranged around the edge of the supporting table; the multiple first supporting columns extend in the vertical direction, and the sides, away from the supporting table, of the environment-friendly heat insulation layers are arranged side by side; the first supporting structure is fixedly arranged on the first supporting column, the first supporting structure penetrates through the heat preservation and insulation layer, and the supporting table is borne by the end, facing the supporting table, of the first supporting structure.

Description

Technical Field

[0001] This invention relates to the field of heat treatment equipment technology, and in particular to a high-temperature annealing furnace. Background Technology

[0002] In the fabrication of Organic Light-Emitting Diode (OLED) products, the glass cover is an indispensable part. Before the glass cover material is applied to OLED products, it needs to undergo high-temperature annealing treatment.

[0003] High-temperature annealing is generally performed on glass cover materials using a high-temperature furnace. During the high-temperature annealing process, the furnace temperature is high, and the heating is uneven in different parts of the furnace. Consequently, the stress generated by thermal expansion may damage the furnace structure and affect the lifespan of the high-temperature furnace. In addition, due to the uneven heating in different parts of the furnace, the stress changes generated by thermal expansion may cause changes in the levelness of the glass cover material, thus preventing the glass cover material from being effectively annealed at high temperature. Summary of the Invention

[0004] The purpose of this invention is to provide a high-temperature annealing furnace to solve the problems of short furnace life caused by uneven heating and the inability of the glass cover material to undergo uniform high-temperature annealing.

[0005] The specific technical solution is as follows:

[0006] A high-temperature annealing furnace, comprising:

[0007] The support platform is horizontally arranged in a circular shape and is used to support materials;

[0008] A thermal insulation layer is provided around the edge of the support platform;

[0009] Multiple first support columns extend vertically and are arranged side by side around the side of the thermal insulation layer away from the support platform;

[0010] A first support structure is fixedly mounted on the first support column, and one end of the first support structure away from the first support column passes through the thermal insulation layer to support the support platform.

[0011] In some embodiments, a balancing element is provided between the first support column and the thermal insulation layer, and the balancing element is arranged around the side of the thermal insulation layer away from the support platform.

[0012] The first support structure includes a support step and a support member. The support step is fixedly mounted on the first support column and faces the balance member. The balance member overlaps the upper surface of the support step. One end of the support member is fixedly connected to the balance member, and the other end passes through the thermal insulation layer to support the support platform.

[0013] In some embodiments, the support platform is provided with multiple layers in the vertical direction, and the plurality of first support columns include multiple groups. Each group of first support columns has a layer of first support structure on the side facing the thermal insulation layer. Each group of first support columns corresponds to a layer of the support platform, and each group of first support columns is evenly distributed on the side of the thermal insulation layer away from the support platform.

[0014] In some embodiments, the opposite sides of the balancing member have gaps with the first support column and the thermal insulation layer, respectively.

[0015] In some embodiments, there is a gap between the support platform and the thermal insulation layer.

[0016] In some embodiments, a reflector is provided on the side of the support platform near the thermal insulation layer. The reflector is arranged around the edge of the support platform, and the reflection direction of the reflector is located on the side away from the thermal insulation layer.

[0017] In some embodiments, a second support structure is provided on the side of the first support column away from the support platform. The second support structure includes a second support column, a first fixing ring, and a second fixing ring. The second support column extends in the same direction as the first support column. The first fixing ring is fixedly connected to the bottom end of the second support column, and the second fixing ring is fixedly connected to the top end of the second support column.

[0018] The distance between two adjacent second support columns is greater than the distance between two adjacent first support columns.

[0019] In some embodiments, the top of the first support column is provided with a first vertical strip hole, the second fixing ring is fixedly connected to a connector, and the end of the connector facing the first support column is provided with a second vertical strip hole, the first strip hole and the second strip hole are connected by bolts.

[0020] In some embodiments, the connector includes a horizontal segment and a vertical segment, the horizontal segment is fixedly connected to the vertical segment and the horizontal segment is perpendicular to the vertical segment, one end of the horizontal segment away from the vertical segment is fixedly connected to the upper surface of the second fixing ring, the vertical segment is parallel to the first support column, and the second strip hole is provided at the end of the vertical segment away from the horizontal segment;

[0021] There is a gap between the first support column and the second support column.

[0022] In some embodiments, each layer of the support platform is provided with a material inlet / outlet door on its circumferential side.

[0023] Beneficial effects of the embodiments in this application:

[0024] The high-temperature annealing furnace provided in this application embodiment utilizes a circular support platform, a correspondingly circular thermal insulation layer ring around the support platform, and a circular arrangement of the first support columns. During the high-temperature annealing process of the material supported on the support platform, the circular support platform, the circular thermal insulation layer, and the circularly arranged first support columns are uniformly heated at various positions along the ring. The stress generated by thermal expansion is the same, avoiding the risk of damage caused by uneven heating and uneven stress in different positions, which is beneficial to improving the service life of the high-temperature annealing furnace. In addition, the first support columns arranged in a circular shape experience the same thermal expansion stress in all directions. Consequently, the deformation of the first support structure set on the first support column is the same due to thermal expansion, which helps to ensure the levelness of the support platform supported on the first support structure. This further helps to ensure the levelness of the material supported on the support platform, improving the efficiency and quality of the material completing high-temperature annealing, and effectively avoiding the situation where the material tilts or the temperature difference at different positions of the material leads to poor high-temperature annealing efficiency and quality.

[0025] Of course, implementing any product or method of the present invention does not necessarily require achieving all of the advantages described above at the same time.

[0026] The above description is merely an overview of the technical solution of this application. In order to better understand the technical means of this application and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this application more obvious and understandable, specific embodiments of this application are given below. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other embodiments can be obtained based on these drawings without creative effort.

[0028] Figure 1 Schematic diagram of a high-temperature furnace in some embodiments;

[0029] Figure 2 This is a schematic diagram of a high-temperature annealing furnace according to an embodiment of this application;

[0030] Figure 3This is a bottom sectional view of the high-temperature annealing furnace according to an embodiment of this application;

[0031] Figure 4 This is a bottom cross-sectional view of the high-temperature annealing furnace according to an embodiment of this application;

[0032] Figure 5 Examples of embodiments of this application Figure 2 Enlarged view of a portion;

[0033] Figure 6 This is a schematic diagram of the first support structure from another perspective of an embodiment of this application;

[0034] Figure 7 This is a schematic diagram of the top of the high-temperature annealing furnace according to an embodiment of this application.

[0035] The attached diagram is labeled as follows: support platform 1, thermal insulation layer 2, first support column 3, first support structure 4, support step 41, support component 42, balance component 5, reflector 6, second support column 71, first fixing ring 72, second fixing ring 73, connector 8, horizontal section 81, vertical section 82, and inlet / outlet gate 9. Detailed Implementation

[0036] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art based on this application are within the scope of protection of the present invention.

[0037] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this application should have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms "first," "second," and similar terms used in the embodiments of this application do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0038] As described in the background section above, the glass cover material cannot be directly used in the preparation of OLED products after production. Because the material properties of the glass cover are not stable and there may be some active particles on the surface, direct application to OLED products may affect the display effect of OLED products. Therefore, the glass cover material needs to be subjected to high-temperature annealing treatment. After high-temperature treatment, the properties of the glass cover material are stabilized, and then it can be used in the preparation of OLED products to improve the display effect of OLED products.

[0039] In some embodiments, reference Figure 1 As shown, since glass cover materials are generally rectangular, the high-temperature furnace is designed with a square structure to accommodate the shape of the material. The main load-bearing of the square structure is concentrated at the corners. During the high-temperature annealing of the glass cover material, the heating at the corners of the square high-temperature furnace is uneven with other parts. The stress generated by the corresponding thermal expansion may cause the corners to break, affecting the service life of the high-temperature furnace. To achieve uniform heating, a lot of heat insulation and cooling design is required, which will lead to a sharp increase in cost.

[0040] Secondly, the uneven heating at different locations within the square structure leads to varying stresses caused by thermal expansion. This stress variation can affect the levelness of the glass cover plate inside the high-temperature furnace, preventing the glass cover plate material from undergoing effective high-temperature annealing. For example, some locations experience greater heating, resulting in concentrated thermal stress and greater thermal expansion. The edges of the glass cover plate material in these locations are lifted a greater distance due to thermal expansion. Conversely, some locations experience less heating, leading to less thermal expansion. The edges of the glass cover plate material in these locations are lifted a smaller distance due to thermal expansion, thus affecting the levelness of the glass cover plate material and further impacting the high-temperature annealing efficiency and quality of the glass cover plate material.

[0041] Based on this, refer to Figure 2 , Figure 3 and Figure 4 As shown in the figure, this application provides a high-temperature annealing furnace, including: a support platform 1, which is arranged horizontally in a circular shape to support materials; a heat insulation layer 2, which is arranged around the edge of the support platform 1; a plurality of first support columns 3, which extend in a vertical direction and are arranged side by side on the side of the heat insulation layer 2 away from the support platform 1; and a first support structure 4, which is fixedly arranged on the first support columns 3, and the end of the first support structure 4 away from the first support columns 3 passes through the heat insulation layer 2 to support the support platform 1.

[0042] In an exemplary embodiment, the thermal insulation layer 2 is arranged in a circular shape.

[0043] In an exemplary embodiment, the plurality of first support columns 3 are arranged in a circular pattern.

[0044] In an exemplary embodiment, both the support platform 1 and the thermal insulation layer 2 can be made of materials with a low coefficient of thermal expansion, such as ceramic fiber materials, or a mixture of ceramic fiber materials and metal.

[0045] In an exemplary embodiment, the support platform 1, the thermal insulation layer 2, and the first support column 3 together form an annular furnace body, and correspondingly, a furnace cavity is formed in the annular furnace body, that is, on the side of the support platform 1 away from the thermal insulation layer 2.

[0046] In an exemplary embodiment, a heat source may also be included, which is located inside the furnace cavity. The heat source may be located at the bottom of the furnace cavity, at the top of the furnace cavity, or at both the bottom and top of the furnace cavity.

[0047] In an exemplary embodiment, a furnace bottom and a furnace top may also be included to reduce the outward diffusion of heat from inside the furnace cavity. For example, both the furnace bottom and the furnace top may be made of hot-cast steel.

[0048] In an exemplary embodiment, the first support column 3 may be made of heat-resistant alloy steel.

[0049] In this embodiment, the support platform 1 is circular, and the corresponding thermal insulation layer 2 is also circular around the support platform 1. The first support column 3 is arranged in a circular pattern. During the high-temperature annealing of the material supported on the support platform 1, the circular support platform 1, the circular thermal insulation layer 2, and the circularly arranged first support column 3 are uniformly heated at various positions along the ring. The stress generated by thermal expansion is the same, avoiding the risk of damage caused by uneven heating and uneven stress in different positions. This helps to improve the service life of the high-temperature annealing furnace. In addition, the first support column 3 is subjected to the same thermal expansion stress in all directions. Correspondingly, the first support structure 4 set on the first support column 3 has the same deformation due to thermal expansion. This helps to ensure the levelness of the support platform 1 supported on the first support structure 4, and further helps to ensure the levelness of the material supported on the support platform 1. This improves the efficiency and quality of the material completing the high-temperature annealing, and effectively avoids the situation where the material tilts or the temperature difference at different positions of the material leads to poor high-temperature annealing efficiency and quality.

[0050] It is understandable that, for a ring-shaped structure, all positions within the same plane of the ring are equidistant from the center, and consequently, the amount of heat exerted on the ring by the heat source is the same, as is the stress generated by thermal expansion.

[0051] In addition, in this embodiment, the first support column 3 is used as the main body to support the support platform 1 and the material supported on the support platform 1, replacing the entire side wall of the furnace cavity, which is also conducive to ensuring the structural stability of the first support column 3.

[0052] In some embodiments, reference Figure 4 As shown, a balancing element 5 is provided between the first support column 3 and the thermal insulation layer 2. The balancing element 5 is located on the side of the thermal insulation layer 2 away from the support platform 1. The first support structure 4 includes a support step 41 and a support element 42. The support step 41 is fixedly installed on the first support column 3 and faces the balancing element 5. The balancing element 5 overlaps the upper surface of the support step 41. One end of the support element 42 is fixedly connected to the balancing element 5, and the other end passes through the thermal insulation layer 2 to support the support platform 1.

[0053] In an exemplary embodiment, the balancing element 5 is annular.

[0054] In an exemplary embodiment, the balancing component 5 may be made of metal or a material containing metal.

[0055] In this embodiment, during the high-temperature annealing process of the material on the support platform 1, although the edge of the support platform 1 is provided with a heat insulation layer 2, heat will still diffuse outward. Through the design of the balancing component 5, during the outward diffusion of heat, it is transferred to the balancing component 5 through the support component 42. The thermal stress generated by the thermal expansion of the annular balancing component 5 is along the radial direction of the balancing component 5. Since the annular structure is stable, the stress generated by thermal expansion is evenly distributed in the balancing component 5. The annular balancing component 5 releases this stress. At the same time, after the heat is released by the balancing component 5, the heat acting on the support step 41 is effectively reduced. The heat transferred to the first support column 3 through the support step 41 is reduced, which reduces the deformation of the first support column 3 caused by the large amount of heat. This is beneficial to improving the life of the first support column 3 and effectively improving the stability of the high-temperature annealing furnace.

[0056] In some embodiments, reference Figure 3 , Figure 5 and Figure 6 As shown, the support platform 1 has multiple layers along the vertical direction, and the multiple first support columns 3 include multiple groups. Each group of first support columns 3 has a first support structure on the side facing the thermal insulation layer 2. Each group of first support columns 3 corresponds to a support platform 1. Each group of first support columns 3 is evenly distributed on the side of the thermal insulation layer 2 away from the support platform 1.

[0057] In an exemplary embodiment, the number of layers of the support platform 1 is greater than 1, for example, it can be 2 layers, 3 layers, 4 layers, 5 layers, 10 layers, 15 layers, etc., without being specifically limited here.

[0058] In an exemplary embodiment, the first support structure 4 of the adjacent layer can be as follows: Figure 5The arrangement shown is spiral-shaped. For example, there are a total of 100 first support columns 3. The 100 first support columns 3 are arranged and numbered sequentially in a clockwise direction along the ring. The first layer of first support structure 4 is set on the 1st, 25th, 50th, and 75th first support columns 3. Correspondingly, the second layer of first support structure 4 is set on the 2nd, 26th, 51st, and 76th first support columns 3, and so on. Alternatively, the first support structures 4 of adjacent layers may not be spiral-shaped. For example, the first layer of first support structure 4 is set on the 1st, 25th, 50th, and 75th first support columns 3. Correspondingly, the second layer of first support structure 4 is set on the 3rd, 27th, 52nd, and 77th first support columns 3. The third layer of first support structure 4 is set on the 2nd, 26th, 51st, and 76th first support columns 3. No specific limitation is made here.

[0059] It is understandable that the number of layers of the support platform 1 is the same as the number of layers of the balancing component 5 and the number of layers of the first support structure 4.

[0060] In this embodiment, the multiple first support columns 3 are divided into multiple groups, with each group of first support columns 3 supporting only the weight of one layer of support platform 1 and the material carried on that layer of support platform 1. For example, the 1st, 25th, 50th, and 75th first support columns 3 are grouped together, and the first layer of first support structure 4 is disposed on the 1st, 25th, 50th, and 75th first support columns 3. Correspondingly, the weight of the first layer of support platform 1 and the material carried on the first layer of support platform 1 acts on the 1st, 25th, 50th, and 75th first support columns 3. The 2nd, 26th, 51st, and 76th first support columns 3 are grouped together, and the second layer of first support structure 4 is disposed on the 2nd, 26th, 51st, and 76th first support columns 3. Correspondingly, the weight of the first layer of support platform 1 and the material carried on the first layer of support platform 1 acts on the 1st, 25th, 50th, and 75th first support columns 3. The weight of the materials carried on the second-layer support platform 1 is distributed to the 2nd, 26th, 51st, and 76th first support columns 3, and so on. In other words, each first support column 3 only bears the weight of one layer of support platform 1 and the materials carried on that layer of support platform 1. This effectively avoids the weight of all support platforms 1 and the materials carried on them being directly applied to all first support columns 3 through the accumulation of weight in a single layer. This reduces the load on each first support column 3 and reduces the safety issues of deformation or breakage of the first support column 3 caused by the accumulation of weight in a single layer of support platform 1 and the materials carried on it, thus extending the service life of the high-temperature annealing furnace.

[0061] It should be noted that when the support platform 1 has multiple layers, each first support column 3 extends from the first layer support platform 1 to the top layer support platform 1. Correspondingly, the thermal insulation layer 2 also extends from the first layer support platform 1 in the vertical direction to the top layer support platform 1.

[0062] In some embodiments, reference Figure 4As shown, the two opposite sides of the balancing component 5 have gaps with the first support column 3 and the thermal insulation layer 2, respectively.

[0063] In an exemplary embodiment, the size of the gap is larger than the size of the thermal expansion of the balancing member 5.

[0064] In this embodiment, as can be seen from the above embodiments, the heat emitted by the heat source acts on the material on the support platform 1 for high-temperature annealing, so as to make the material properties more stable. The heat is transferred outward through the support member 42 to the balancing member 5. The thermal stress generated by the thermal expansion of the annular balancing member 5 is along the radial direction of the balancing member 5, that is, the balancing member 5 expands radially. Utilizing the gap between the balancing member 5 and the first support column 3, and the balancing member 5 overlapping the upper surface of the support step 41, that is, the balancing member 5 and the support step 41 are not fixedly connected, and there is a gap between the balancing member 5 and the first support column 3, the setting of the balancing member 5 reduces the direct transfer of heat to the first support column 3, reducing the probability of the first support column 3 being deformed by direct thermal expansion. During the radial expansion of the balancing member 5, the gap is used as a buffer, and the stress generated by the radial thermal expansion of the balancing member 5 will not directly act on the first support column 3, which also effectively avoids the deformation of the first support column 3 caused by the stress of the balancing member 5, and improves the stability of the first support column 3.

[0065] In addition, after the high-temperature annealing of the material on the support platform 1 is completed, the heat of the balancing component 5 decreases. Due to thermal expansion and contraction, the balancing component 5 may retract towards the thermal insulation layer 2. By utilizing the gap between the balancing component 5 and the thermal insulation layer 2, and with the balancing component 5 overlapping the upper surface of the support step 41, the stress generated during the retraction of the balancing component 5 can be effectively prevented from affecting the first support column 3 and the thermal insulation layer 2. Similarly, the deformation of the first support column 3 caused by the stress of the balancing component 5 is effectively prevented, thus improving the stability of the first support column 3. At the same time, the deformation of the thermal insulation layer 2 caused by the stress of the balancing component 5 is also effectively prevented.

[0066] In some embodiments, reference Figure 4 As shown, there is a gap between the support platform 1 and the thermal insulation layer 2.

[0067] In this embodiment, the gap between the support platform 1 and the thermal insulation layer 2 is used to effectively prevent the stress generated by the thermal expansion of the support platform 1 from affecting the thermal insulation layer 2. That is, the thermal expansion of the support platform 1 expands towards the gap and does not come into contact with the thermal insulation layer 2.

[0068] It is understandable that during the high-temperature annealing process of the material supported by the support platform 1, the heat will not only act directly on the material, but also on the support platform 1, and the support platform 1 will also expand due to heat.

[0069] In some embodiments, a reflector plate 6 is provided on the side of the support platform 1 near the thermal insulation layer 2. The reflector plate 6 is arranged around the edge of the support platform 1, and the reflection direction of the reflector plate 6 is located on the side away from the thermal insulation layer 2.

[0070] In this embodiment, the support platform 1 is circular and carries the material. The main area of ​​the material is concentrated on the side of the circular ring facing the center. During the high-temperature annealing of the material by the heat source, the reflector plate 6 is set around the edge of the support platform 1, and the reflection direction is located away from the heat insulation layer 2, that is, the reflection direction is towards the furnace cavity. During the heating process, the reflector plate 6 reflects heat towards the center of the support platform 1, so that the heat acting on the material is more concentrated and the heat is higher, thereby improving the high-temperature annealing efficiency of the material. At the same time, the reflection of heat by the reflector plate 6 effectively prevents the heat from spreading outward, that is, the heat spreads through the heat insulation layer 2 to the side of the first support column 3, reducing the deformation of the first support column 3 due to thermal expansion and improving the stability of the first support column 3. The higher the stability of the first support column 3, the higher the stability of the support step 41, and correspondingly, the higher the stability of the balance member 5. The stability of the support platform 1 supported on the balance member 5 is also higher, which improves the levelness of the material and effectively avoids the instability of the support platform 1 from causing changes in the levelness of the material, thus affecting the high-temperature annealing quality of the material.

[0071] In some embodiments, reference Figure 2 , Figure 3 , Figure 4 and Figure 7 As shown, a second support structure is provided on the side of the first support column 3 away from the support platform 1. The second support structure includes a second support column 71, a first fixing ring 72, and a second fixing ring 73. The second support column 71 extends in the same direction as the first support column 3. The first fixing ring 72 is fixedly connected to the bottom end of the second support column 71, and the second fixing ring 73 is fixedly connected to the top end of the second support column 71. The distance between two adjacent second support columns 71 is greater than the distance between two adjacent first support columns 3.

[0072] In an exemplary embodiment, a third fixing ring may also be included, disposed between the first fixing ring 72 and the second fixing ring 73. For example, the number of third fixing rings may be 1, 2, 3, 4, 5, etc.

[0073] In an exemplary embodiment, the size of the second support column 71 is larger than the size of the first support column 3. Here, the size of the first support column 3 and the size of the second support column 71 represent the outer diameter of the first support column 3 and the second support column 71.

[0074] In an exemplary embodiment, the second support column 71, the first fixing ring 72, and the second fixing ring 73 can all be made of square structural steel.

[0075] In this embodiment, the first support column 3 is supported by the second support column 71, the first fixing ring 72, and the second fixing ring 73. When the first support column 3 undergoes slight deformation due to heat, the second support column 71, the first fixing ring 72, and the second fixing ring 73 provide corresponding blocking and protection, effectively preventing the deformation of the first support column 3 from becoming larger, thereby reducing the stability of the support step 41, the balance member 5, the support member 42, and the support platform 1.

[0076] In some embodiments, reference Figure 7 As shown, the top of the first support column 3 is provided with a first vertical strip hole (not shown in the figure), and the second fixing ring 73 is fixedly connected to the connector 8. The end of the connector 8 facing the first support column 3 is provided with a second vertical strip hole (not shown in the figure). The first strip hole and the second strip hole are connected by bolts.

[0077] In an exemplary embodiment, the connector 8 may be made of the same material as the first support column 3.

[0078] In this embodiment, during the high-temperature annealing process of the material, heat is transferred to the first support column 3, causing the first support column 3 to shift vertically. The top of the first support column 3 is bolted to the second slot of the connector 8 through the first slot. The first and second slots release the thermal expansion of the first support column 3 in the vertical direction. That is, when the first support column 3 undergoes thermal expansion in the vertical direction, it moves vertically upward by utilizing the cooperation of the first and second slots. After the high-temperature annealing of the material is completed, the first support column 3 retracts vertically and moves vertically downward by utilizing the cooperation of the first and second slots. This effectively avoids damage to the structural rigidity of the first support column 3. At the same time, the bolt connection between the first and second slots prevents the first support column 3 from shifting in other directions, effectively ensuring the stability of the first support column 3, and further effectively ensuring the stability of the first support structure 4.

[0079] It is understandable that the bolt connection has a certain amount of redundancy in the first and second strip holes, and is not completely fixed to the first and second strip holes.

[0080] In some embodiments, reference Figure 7 As shown, the connector 8 includes a horizontal section 81 and a vertical section 82. The horizontal section 81 and the vertical section 82 are fixedly connected and perpendicular to each other. One end of the horizontal section 81 away from the vertical section 82 is fixedly connected to the upper surface of the second fixing ring 73. The vertical section 82 is parallel to the extension direction of the first support column 3. A second strip hole is provided at the end of the vertical section 82 away from the horizontal section 81. There is a gap between the first support column 3 and the second support column 71.

[0081] In an exemplary embodiment, the end of the horizontal segment 81 of the connector 8 that is away from the vertical segment 82 can be fixed to the upper surface of the second fixing ring 73 by welding or screwing.

[0082] In an exemplary embodiment, the vertical segment 82 can be formed as follows: Figure 7 The groove structure shown has a second strip-shaped hole on its side wall, and the top of the first support column 3 can be formed as shown. Figure 7 The protruding structure shown has a first strip hole on it.

[0083] In this embodiment, by setting the connector 8 in the horizontal section 81 and the vertical section 82, the vertical section 82 is parallel to the extension direction of the first support column 3. This allows the first support column 3 to move vertically upward when it undergoes thermal expansion in the vertical direction, using the cooperation of the first and second slots. When the first support column 3 cools down and retracts vertically, it moves vertically downward using the cooperation of the first and second slots. This ensures the structural stability of the first support column 3 and avoids damage to its structural rigidity. The gap between the first support column 3 and the second support column 71 effectively prevents the stress generated by the thermal expansion of the first support column 3 from directly acting on the second support column 71, thus avoiding any impact on the structural stability of the first support column 3.

[0084] In some embodiments, reference Figure 2 and Figure 3 As shown, each layer of support platform 1 has a material inlet / outlet gate 9 on its circumferential side.

[0085] In an exemplary embodiment, the structure of the inlet / outlet gate 9 can be the same as that of the high-temperature annealing furnace described in any of the above embodiments. For example, it may be provided with a support platform 1, a reflector 6, a heat insulation layer 2, a balance component 5, a first support column 3, and a second support column 71 from the inside to the outside. No specific limitation is made here.

[0086] In an exemplary embodiment, each layer of support platform 1 may have a separate inlet / outlet gate 9, or multiple layers of support platforms 1 may share a single inlet / outlet gate 9.

[0087] In this embodiment, the material is fed and discharged through the side-mounted inlet / outlet gate 9 when the material needs to be annealed at high temperature or when the high temperature annealing of the material is completed.

[0088] In some alternative embodiments, a flexible sealing structure may also be provided on the side of the second support structure away from the first support column 3. No specific limitations are made regarding the flexible sealing structure.

[0089] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of this application is limited to these examples; under the concept of this application, the technical features of the above embodiments or different embodiments can also be combined, and there are many other variations of different aspects of the embodiments of this application as described above, which are not provided in detail for the sake of brevity.

[0090] Additionally, to simplify the description and discussion, and to avoid obscuring the embodiments of this application, the well-known power / ground connections to integrated circuit (IC) chips and other components may or may not be shown in the provided drawings. Furthermore, the apparatus may be shown in block diagram form to avoid obscuring the embodiments of this application, and this also takes into account the fact that the details of the implementation of these block diagram apparatuses are highly dependent on the platform on which the embodiments of this application will be implemented (i.e., these details should be fully understood by those skilled in the art). While specific details (e.g., circuits) have been set forth to describe exemplary embodiments of this application, it will be apparent to those skilled in the art that the embodiments of this application can be implemented without these specific details or with variations thereof. Therefore, these descriptions should be considered illustrative rather than restrictive.

[0091] Although this application has been described in conjunction with specific embodiments thereof, many substitutions, modifications and variations of these embodiments will be apparent to those skilled in the art from the foregoing description.

[0092] The embodiments of this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the embodiments of this application should be included within the protection scope of this application.

Claims

1. A high-temperature annealing furnace, characterized in that, include: The support platform is horizontally arranged in a circular shape and is used to support materials; A thermal insulation layer is provided around the edge of the support platform; Multiple first support columns extend vertically and are arranged side by side around the side of the thermal insulation layer away from the support platform; A first support structure is fixedly mounted on the first support column, and one end of the first support structure away from the first support column passes through the thermal insulation layer to support the support platform.

2. The high-temperature annealing furnace according to claim 1, characterized in that, A balancing element is provided between the first support column and the thermal insulation layer, and the balancing element is arranged around the side of the thermal insulation layer away from the support platform. The first support structure includes a support step and a support member. The support step is fixedly mounted on the first support column and faces the balance member. The balance member overlaps the upper surface of the support step. One end of the support member is fixedly connected to the balance member, and the other end passes through the thermal insulation layer to support the support platform.

3. The high-temperature annealing furnace according to claim 1, characterized in that, The support platform is provided with multiple layers in the vertical direction. The multiple first support columns include multiple groups. Each group of first support columns has a layer of first support structure on the side facing the thermal insulation layer. Each group of first support columns corresponds to a layer of the support platform. Each group of first support columns is evenly distributed on the side of the thermal insulation layer away from the support platform.

4. The high-temperature annealing furnace according to claim 2, characterized in that, The balancing component has gaps between its opposite sides and the first support column and the thermal insulation layer, respectively.

5. The high-temperature annealing furnace according to claim 2, characterized in that, There is a gap between the support platform and the thermal insulation layer.

6. The high-temperature annealing furnace according to claim 1, characterized in that, A reflector is provided on the side of the support platform near the thermal insulation layer. The reflector is arranged around the edge of the support platform, and the reflection direction of the reflector is located on the side away from the thermal insulation layer.

7. The high-temperature annealing furnace according to claim 1, characterized in that, A second support structure is provided on the side of the first support column away from the support platform. The second support structure includes a second support column, a first fixing ring, and a second fixing ring. The second support column extends in the same direction as the first support column. The first fixing ring is fixedly connected to the bottom end of the second support column, and the second fixing ring is fixedly connected to the top end of the second support column. The distance between two adjacent second support columns is greater than the distance between two adjacent first support columns.

8. The high-temperature annealing furnace according to claim 7, characterized in that, The top of the first support column is provided with a first vertical strip hole, and the second fixing ring is fixedly connected to a connector. The end of the connector facing the first support column is provided with a second vertical strip hole, and the first strip hole and the second strip hole are connected by bolts.

9. The high-temperature annealing furnace according to claim 8, characterized in that, The connector includes a horizontal section and a vertical section. The horizontal section is fixedly connected to the vertical section and the horizontal section is perpendicular to the vertical section. One end of the horizontal section away from the vertical section is fixedly connected to the upper surface of the second fixing ring. The vertical section is parallel to the extension direction of the first support column. The second strip hole is provided at the end of the vertical section away from the horizontal section. There is a gap between the first support column and the second support column.

10. The high-temperature annealing furnace according to claim 3, characterized in that, Each of the support platforms has a material inlet / outlet door on its circumferential side.

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