Capacitive film vacuum gauge and method for measuring gas pressure

Abstract

The embodiment of the invention discloses a capacitive film vacuum gauge and a gas pressure measuring method, the capacitive film vacuum gauge comprises a mobile sealing system, a ceramic electrode, a guide structure, a film electrode and a control system, in the use process, when different process gas pressures are measured, the control system sets a corresponding polar plate distance according to a measuring range, and the distance between the polar plates is adjusted according to the measuring range. A capacitance data processing mode is selected according to the pressure of the process gas, a range selection port is opened, a corresponding range is selected according to the pressure of the process gas, and a power source of a movable sealing system is controlled by a control system to adjust the height of a ceramic electrode, so that the distance between the ceramic electrode and a film electrode is changed; according to the technical scheme, the measuring range of the vacuum gauge can be freely adjusted by moving the sealing system, high-precision measurement of pressure in the measuring range of 0.1-1000 Torr is covered, the flexibility of measurement is improved, and meanwhile, a gasket does not need to be replaced when different measuring ranges are changed.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and in particular to a capacitive thin-film vacuum gauge and a method for measuring gas pressure. Background Technology

[0002] Capacitive thin-film vacuum gauges are instruments for measuring gas pressure. Their principle involves using a strain gauge as one electrode and a conductive film layer on a ceramic substrate as the other. When the strain gauge is subjected to a pressure difference, it displaces, causing a change in capacitance between the diaphragm and the ceramic electrode. Pressure is measured by measuring this change in capacitance. Because the measurement results of capacitive thin-film vacuum gauges are independent of the composition of the gas being measured, they are widely used in vacuum measurement, especially in the semiconductor industry, where they are key components of process equipment.

[0003] From the capacitance formula C = Aεrεo / d (where A is the corresponding area of ​​the electrodes, εr is the relative permittivity of the material, εo is the vacuum permittivity, and d is the distance between the two plates), it can be seen that when the electrode area and permittivity are fixed, the capacitance value mainly depends on the value of d. In existing structures, the value of d is adjusted by installing one or more shims of different shapes and thicknesses, achieving fine-tuning of the electrode spacing within the micrometer range. However, this structure limits the high-precision measurement of pressure in capacitive thin-film vacuum gauges, which are categorized by range: 0.1 Torr, 1 Torr, 10 Torr, 100 Torr, and 1000 Torr. A single specification of capacitive thin-film vacuum gauge cannot cover the high-precision measurement of pressure within the 0.1-1000 Torr range. Furthermore, the measurement accuracy and stability of capacitive thin-film vacuum gauges depend on the micrometer-level machining accuracy of the shims. The machining difficulty and large errors of micrometer-level shims increase the difficulty of zero-point adjustment in high-precision vacuum measurement, leading to nonlinear errors and directly affecting the accuracy and stability of pressure measurement. Especially in the semiconductor industry, where process dimensions have reached the nanometer level, capacitive thin-film vacuum gauges, as key components of process equipment, have higher requirements for measurement accuracy, sensitivity, and stability. The pad structure affects the measurement accuracy and stability of capacitive thin-film vacuum gauges, limiting the improvement of their measurement performance. Summary of the Invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art or related art.

[0005] Therefore, a first aspect of the present invention provides a capacitive thin-film vacuum gauge.

[0006] A second aspect of the present invention provides a method for measuring gas pressure.

[0007] In view of this, a capacitive thin-film vacuum gauge is provided according to a first aspect of the embodiments of this application, comprising:

[0008] A mobile sealing system, comprising a power source, wherein the mobile sealing system uses the power source to raise and lower the output end;

[0009] A ceramic electrode is connected to the output end of the movable sealing system, and the ceramic electrode is driven by the movable sealing system to achieve axial displacement.

[0010] A guide structure is connected to the movable sealing system, and the ceramic electrode is connected to the guide structure, which limits the movement of the ceramic electrode.

[0011] A thin-film electrode, wherein the thin-film electrode is disposed inside the guiding structure;

[0012] A control system is electrically connected to the movable sealing system and is used to control the movable sealing system.

[0013] The guide structure includes two support rings. One support ring is disposed between the thin film electrode and the ceramic electrode, and the other support ring is disposed on the side of the ceramic electrode opposite to the thin film electrode. The support rings are made of a compressible material.

[0014] In one feasible implementation, the mobile sealing system includes:

[0015] A connecting rod, wherein the connecting tube is sleeved and connected to the guide structure, and the ceramic electrode is movably connected to one end of the connecting rod sleeved on the guide structure;

[0016] A sealing ring is provided at the connection between the connecting rod and the guide structure, and the sealing ring has an axial movement function;

[0017] The power source is located at the other end of the connecting rod, and the power source drives the connecting rod to rise or fall.

[0018] In one feasible implementation, the ceramic electrode comprises:

[0019] A linkage end, one end of which extends into the movable sealing system, wherein the movable sealing system adjusts the distance between the ceramic electrode and the thin film electrode by driving the linkage end;

[0020] An electrode, wherein the electrode is disc-shaped, and the electrode is connected to the other end of the linkage end;

[0021] In one feasible implementation, the guide structure includes:

[0022] The mounting cavity has a hollow disc-shaped cavity inside, the thin film electrode is disposed on the side of the mounting cavity near the bottom surface, and the top surface of the mounting cavity has a connection hole.

[0023] A connecting pipe, one end of which is connected to the cavity of the mounting cavity through a connecting hole, and the other end of which is sleeved on the movable sealing system;

[0024] The electrode ends of the ceramic electrode are disposed inside the mounting cavity;

[0025] The connecting end of the ceramic electrode extends into the connecting tube and is connected to one end of the mounting cavity;

[0026] In one feasible implementation, the guiding structure further includes:

[0027] The support ring has a Z-shaped cross-section and includes an upper support surface, a lower support surface, and a support inclined surface. The upper edge of the support inclined surface is connected to the inner ring of the upper support surface, and the lower edge of the support inclined surface is connected to the outer ring of the lower support surface.

[0028] The side of the mounting cavity is provided with an annular rectangular mounting step, and the raised surface of the annular rectangular mounting step abuts against the outer ring side of the support ring.

[0029] In one feasible implementation, a first annular protrusion is provided on the peripheral side of the electrode end of the ceramic electrode. The thickness of the first annular protrusion is less than the thickness of the electrode end of the ceramic electrode. The first annular protrusion abuts against the upper / lower part of the support ring, and the peripheral side of the electrode end of the ceramic electrode abuts against the inner ring side of the support ring.

[0030] The sidewall of the mounting cavity is provided with several movable grooves;

[0031] Guide blocks are spaced apart on the periphery of the first annular protrusion of the ceramic electrode, and the guide blocks correspond to and fit with the movable groove.

[0032] In one feasible implementation, the support ring is provided with a plurality of air holes spaced apart;

[0033] The support ring is formed in one process.

[0034] In one feasible implementation, the guiding structure further includes:

[0035] An air intake assembly is disposed in the mounting cavity and is used to exhaust air from the cavity.

[0036] An airflow channel is provided, which is located on the side wall inside the mounting cavity and is connected to the air intake assembly.

[0037] In one feasible implementation, the control system includes:

[0038] The detector is used to monitor the distance between the ceramic electrode and the thin film electrode. There are two detectors, which monitor the distance between the ceramic electrode and the thin film electrode at different positions.

[0039] The detector is used to monitor the distance between the ceramic electrode and the thin film electrode. There are two detectors, which monitor the distance between the ceramic electrode and the thin film electrode at different positions.

[0040] The first signal extractor, there are two signal extractors, which are electrically connected to the two detectors respectively;

[0041] The second signal extractor, there are two of them, which are respectively connected to the ceramic electrode and used to extract the capacitance data of the ceramic electrode;

[0042] A central processing unit, which is electrically connected to a first signal output and a second signal output.

[0043] A second aspect of the embodiments of this application provides a method for measuring gas pressure, applied to any of the capacitive thin-film vacuum gauges described above, comprising:

[0044] The control system sets the corresponding spacing between the ceramic electrode and the thin film electrode and the capacitance data processing method according to the measurement range, and opens the range selection port.

[0045] The control system selects the appropriate range based on the process gas pressure.

[0046] The mobile sealing system automatically adjusts the distance between the ceramic electrode and the thin-film electrode according to the measurement range;

[0047] The control system collects the capacitance data and processes it using the corresponding capacitance data processing method.

[0048] Compared with the prior art, the present invention has at least the following beneficial effects: The technical solution can freely adjust the range of the vacuum gauge through the movable sealing system, covering the high-precision measurement of pressure in the range of 0.1-1000 Torr, which improves the flexibility of measurement. At the same time, when changing different ranges, there is no need to replace the gasket, only to adjust the position of the ceramic electrode through the control device. This simplifies the action of changing the range and avoids measurement errors caused by gasket manufacturing errors, thus improving the flexibility and accuracy of the vacuum gauge.

[0049] This technical solution achieves micrometer-level adjustment of the electrode spacing through a moving sealing system, enabling precise zero-point adjustment of the capacitive thin-film vacuum gauge and suppressing the generation of nonlinear errors.

[0050] By installing the ceramic electrodes using a movable sealing system, the structure of the vacuum gauge is simplified, resolving the accumulated errors caused by the stacking of multiple components in the core structure of capacitive thin-film vacuum gauges, particularly the distance d between the diaphragm and the ceramic electrode. Even if there is mutual movement, the position of the ceramic electrode can be changed through the movable sealing system, thereby adjusting the electrode spacing. Attached Figure Description

[0051] Various other advantages and benefits will become apparent to those skilled in the art upon reading the following detailed description of preferred embodiments. The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this application. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings:

[0052] Figure 1 A schematic diagram of the structure of a capacitive thin-film vacuum gauge according to an embodiment of this application;

[0053] Figure 2 A partially enlarged structural schematic diagram of a capacitive thin-film vacuum gauge according to an embodiment of this application;

[0054] Figure 3 A schematic diagram of a guide structure according to an embodiment of this application;

[0055] Figure 4 A schematic diagram of the structure of a support ring according to an embodiment of this application;

[0056] Figure 5 This is a cross-sectional structural schematic diagram of a capacitive thin-film vacuum gauge according to an embodiment of this application.

[0057] in, Figure 1-5 The correspondence between the reference numerals and component names in the attached drawings is as follows:

[0058] 100. Moving sealing system; 200. Ceramic electrode; 300. Guiding structure; 400. Thin film electrode; 500. Control system;

[0059] 110. Power source; 120. Connecting rod; 130. Sealing ring;

[0060] 210. Linkage end; 220. Electrical terminal; 230. Guide block; 240. First annular protrusion

[0061] 310. Mounting cavity; 320. Connecting pipe; 330. Moving slide; 340. Support ring; 350. Airflow channel; 360. Annular rectangular mounting step;

[0062] 510. Second signal output device; 520. Central processing unit. Detailed Implementation

[0063] To better understand the above technical solutions, the technical solutions of the embodiments of this application will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the embodiments of this application and the specific features in the embodiments are detailed descriptions of the technical solutions of the embodiments of this application, rather than limitations on the technical solutions of this application. In the absence of conflict, the embodiments of this application and the technical features in the embodiments can be combined with each other.

[0064] like Figure 1-5 As shown, a capacitive thin-film vacuum gauge is provided according to a first aspect of the present application, comprising: a movable sealing system 100, the movable sealing system 100 including a power source 110, the movable sealing system 100 realizing the raising and lowering of the output end through the power source 110; a ceramic electrode 200, the ceramic electrode 200 being connected to the output end of the movable sealing system 100, the ceramic electrode being driven by the movable sealing system 100 to achieve axial displacement; and a guide structure 300, the guide structure 300 being connected to the movable sealing system 100, the ceramic electrode 200 being connected to the guide structure 300, the guide structure 300 being connected to the ceramic electrode. The movement of the ceramic electrode 200 is limited; a thin film electrode 400 is disposed inside the guide structure 300; a control system 500 is electrically connected to the moving sealing system 100 and is used to control the moving sealing system 100; wherein, the guide structure 300 includes two support rings 340, one of which is disposed between the thin film electrode 400 and the ceramic electrode 200, and the other of which is disposed on the side of the ceramic electrode 200 opposite to the thin film electrode 400, and the support rings 340 are made of a compressible material.

[0065] The capacitive thin-film vacuum gauge provided in this application includes a movable sealing system 100, a ceramic electrode 200, a guiding structure 300, a thin-film electrode 400, and a control system 500.

[0066] The ceramic electrode 200 and the thin film electrode 400 are disposed inside the guide structure 300. The electrode surfaces of the ceramic electrode 200 and the thin film electrode 400 are parallel. The movable sealing system 100 is connected to the ceramic electrode 200, and the control system 500 is electrically connected to the movable sealing system 100.

[0067] The movable sealing system 100 includes a power source 110, which adjusts the height of the ceramic electrode 200.

[0068] During use, when measuring the pressure of different process gases, the control system 500 sets the corresponding electrode spacing according to the range, selects the capacitance data processing method according to the pressure of the process gas, opens the range selection port, selects the corresponding range according to the pressure of the process gas, and controls the power source 110 of the moving sealing system 100 through the control system 500 to adjust the height of the ceramic electrode 200, thereby changing the spacing between the ceramic electrode 200 and the thin film electrode 400, realizing high-precision measurement of gas pressure in each pressure range.

[0069] This technical solution allows for free adjustment of the vacuum gauge's range via the movable sealing system 100, covering a high-precision pressure measurement range of 0.1-1000 Torr. This improves measurement flexibility. Furthermore, when changing different ranges, there is no need to replace the gasket; only the position of the ceramic electrode 200 needs to be adjusted via the control device. This simplifies the process of changing the range and avoids measurement errors caused by gasket manufacturing defects, thereby enhancing the flexibility and accuracy of the vacuum gauge.

[0070] This technical solution achieves micrometer-level adjustment of the electrode spacing through the moving sealing system 100, enabling precise zero-point adjustment of the capacitive thin-film vacuum gauge and suppressing the generation of nonlinear errors.

[0071] The installation of the ceramic electrode 200 via the movable sealing system 100 simplifies the structure of the vacuum gauge and resolves the accumulated errors caused by the stacking of multiple components within the core structure of the capacitive thin-film vacuum gauge, particularly the distance d between the thin-film electrode 400 and the ceramic electrode 200. Even if mutual movement occurs, the position of the ceramic electrode 200 can be changed via the movable sealing system 100, thereby adjusting the electrode spacing.

[0072] Because the vacuum gauge has extremely high requirements for the spacing between the ceramic electrode 200 and the thin film electrode 400, support rings 340 are further added on the upper and lower sides of the ceramic electrode. The support rings 340 are made of compressible material. When the height of the ceramic electrode 400 is adjusted, the upper and lower support rings 340 are compressed. The support rings 340 apply deformation recovery force to the ceramic electrode 400. During use, the support rings 340 can counteract the slight shaking of the ceramic electrode 400, increase the stability of the ceramic electrode 400, and further increase the accuracy of the vacuum gauge measurement.

[0073] like Figure 1-5As shown, the movable sealing system 100 further includes: a connecting rod 120, which is sleeved and connected to the guide structure 300, and the ceramic electrode 200 is movably connected to one end of the connecting rod 120 sleeved on the guide structure 300; a sealing ring 130, which is disposed at the connection between the connecting rod 120 and the guide structure 300, and the sealing ring 130 has an axial movement function; and a power source 110 disposed at the other end of the connecting rod 120, which drives the connecting rod 120 to rise or fall.

[0074] In this technical solution, the movable sealing system 100 also includes a connecting rod 120 and a sealing ring 130. The connecting rod 120 connects the power source 110 and the ceramic electrode 200. The output end of the power source 110 can be a pneumatic telescopic end or a hydraulic telescopic end. The output end of the power source 110 is connected to the connecting rod 120. The power source 110 drives the connecting rod 120 to rise or fall, thereby enabling the connecting rod 120 to drive the ceramic electrode 200 to rise or fall, and thus adjusting the distance between the ceramic electrode 200 and the thin film electrode 400.

[0075] Meanwhile, the guide structure 300 is sleeved on the outside of the connecting rod 120 to realize the connection between the connecting rod 120 and the guide structure 300.

[0076] The sealing ring 130 is located at the connection between the connecting rod 120 and the guide structure 300 to prevent air from entering from the connection between the connecting rod 120 and the guide structure 300, which would affect the vacuum level inside the guide structure 300 and thus affect the measurement results, thereby further increasing the accuracy of the vacuum gauge measurement.

[0077] Among them, the sealing ring 130 is an axially movable sealing device, which can be a compressible welded bellows or an axial sealing ring structure to achieve sealing during the axial movement of the connecting rod.

[0078] The ceramic electrode can be moved on the order of 200 micrometers through the sealing ring 130. During the movement, the leakage rate requirement is met and the vacuum maintenance of the internal chamber of the guide structure 300 is not affected.

[0079] Meanwhile, the material selection and structural design of the connecting rod 120 and the sealing ring 130 do not affect or interfere with the capacitor signal.

[0080] like Figure 1-5As shown, the ceramic electrode 200 includes: a linkage end 210, one end of which extends into the movable sealing system 100, and the movable sealing system 100 adjusts the distance between the ceramic electrode 200 and the thin film electrode 400 by driving the linkage end 210; and an electrode end 220, which is disc-shaped and connected to the other end of the linkage end 210.

[0081] In this technical solution, the ceramic electrode 200 includes a linkage end 210 and an electrode end 220. In this embodiment, the linkage end 210 is a cylindrical structure and extends into the movable sealing system 100. The movable sealing system 100 drives the ceramic electrode 200 to rise and fall by driving the linkage end 210.

[0082] In this embodiment, the linkage end 210 extends into the connecting rod 120 to achieve lifting and lowering.

[0083] Among them, the electric electrode 220 is disc-shaped, and the electric electrode 220 and the linkage end 210 are coaxially arranged.

[0084] This technical solution improves stability when the spacing between the ceramic electrode 200 and the thin film electrode 400 is changed, and increases the accuracy of the measurement.

[0085] like Figure 1-5 As shown, the guide structure 300 includes: a mounting cavity 310, the mounting cavity 310 having a hollow disc-shaped cavity inside, the thin film electrode 400 being disposed on the side of the mounting cavity 310 near the bottom surface, and the mounting cavity 310 having a connection hole on its top surface; a connecting tube 320, one end of the connecting tube 320 being connected to the cavity of the mounting cavity 310 through the connection hole, and the other end of the connecting tube 320 being sleeved on the movable sealing system 100; the electrode end 220 of the ceramic electrode 200 being disposed inside the mounting cavity 310; and the connecting end 210 of the ceramic electrode 200 extending into the connecting tube 320 and connected to one end of the mounting cavity 310.

[0086] In this technical solution, the guide structure 300 includes a mounting cavity 310 and a connecting pipe 320.

[0087] The connecting tube 320 is sleeved around the connecting rod 120, and the guide structure 300 is fixedly connected to the movable sealing structure via the connecting rod 120. A sealing ring 130 is provided at the junction of the connecting rod 120 and the connecting tube 320 to ensure the stability of the vacuum gauge during operation. The sealing ring 130 is used to maintain the vacuum level during the operation of the vacuum gauge, ensuring the stability of the vacuum level in the mounting cavity 310 during measurement, thereby ensuring the accuracy of the vacuum measurement performance.

[0088] The mounting cavity 310 has a hollow disc-shaped cavity inside, providing space for the installation of components such as the vacuum gauge electrodes. The thin film electrode 400 is disposed on the bottom surface of the mounting cavity 310, and a circular hole is provided on the top surface of the mounting cavity 310. The connecting pipe 320 is connected to the mounting cavity 310 through the circular hole. The ceramic electrode 200 is disposed inside the mounting cavity 310, and the linkage end 210 of the ceramic electrode 200 extends into the movable sealing system 100 through the circular hole on the top surface of the mounting cavity 310.

[0089] like Figure 1-5 As shown, the cross-section of the support ring 340 is Z-shaped. The support ring 340 includes an upper support surface, a lower support surface, and a support inclined surface. The upper edge of the support inclined surface is connected to the inner ring of the upper support surface, and the lower edge of the support inclined surface is connected to the outer ring of the lower support surface. The side of the mounting cavity 310 is provided with an annular rectangular mounting step 360, and the protruding surface of the annular rectangular mounting step 360 abuts against the outer ring side of the support ring 340.

[0090] In this technical solution, the support ring 340 has a Z-shaped structure. In this embodiment, the support ring 340 is formed by pressing a thin metal sheet. The support ring 340 with this shape and material is compressible and can offset the vibration of the ceramic electrode 400 during the measurement process. The support force 340 meets the usage requirements, does not affect the movement of the ceramic electrode 400, and does not fail to achieve the required support force.

[0091] The inner wall of the mounting cavity 310 of the guide assembly 300 is provided with an annular rectangular mounting step 360. The annular rectangular mounting step 360 abuts against the outer ring side of the support ring 340, which can prevent the support ring 340 from shifting to the outer ring side. This setting can further fix the support ring 340, increase the stability of the vacuum gauge, and ensure the accuracy of the vacuum gauge measurement.

[0092] like Figure 1-5 As shown, the ceramic electrode 200 has a first annular protrusion 240 on its peripheral side at the electrode end 220. The thickness of the first annular protrusion 240 is less than the thickness of the electrode end 220 of the ceramic electrode 200. The first annular protrusion 240 abuts against the upper / lower part of the support ring 340, and the peripheral side of the electrode end 240 of the ceramic electrode 200 abuts against the inner ring side of the support ring 340. The side wall of the mounting cavity 310 is provided with a plurality of movable grooves 330. Guide blocks 230 are spaced apart on the peripheral side of the first annular protrusion 240. The guide blocks 230 correspond to and fit with the movable grooves 330.

[0093] In this technical solution, a first annular protrusion 240 is provided around the electrode end 220 of the ceramic electrode 200. The thickness of the first annular protrusion 240 is less than the thickness of the electrode end 220 of the ceramic electrode 200. During use, the inner ring side of the support ring 340 abuts against the periphery of the electrode end 220, the lower end of the support ring 340 located on the upper side of the electrode end 220 abuts against the upper side of the first annular protrusion 240, and the upper end of the support ring 340 located on the lower side of the electrode end 220 abuts against the lower side of the first annular protrusion 340. This arrangement further fixes the support ring 340 and improves the stability of the support ring 340.

[0094] The mounting cavity 310 has several movable grooves 330 on its side wall and several guide blocks 230 on its periphery of the first annular protrusion 240. The guide blocks 230 fit into the movable grooves 330 one by one. The electrode end 220 is slidably connected to the guide structure 230 through the guide blocks 230, the movable grooves 330 and the guide structure 230. At the same time, the guide structure 300 limits the ceramic electrode 200 through the guide blocks 230, so that the ceramic electrode 200 can only move up and down without shifting or tilting. This keeps the electrode surface of the ceramic electrode 200 parallel to that of the thin film electrode 400, avoiding errors caused by the tilting of the ceramic electrode 200.

[0095] like Figure 1-5 As shown, the support ring 340 has multiple air holes spaced apart; the support ring 340 is formed in one piece.

[0096] In this technical solution, the support ring 340 is provided with several air holes at intervals. When the support ring 340 is squeezed, the gas can be discharged through the air holes on the support ring 340, so as to meet the vacuum requirements between the electrodes during the measurement process and further improve the accuracy of the measurement.

[0097] Among them, the support ring 340 is produced using a one-time molding process, which avoids cumulative errors during the production process and further improves the accuracy of the vacuum gauge.

[0098] like Figure 1-5 As shown, the guide structure 300 further includes: an air intake assembly disposed in the mounting cavity 310 for exhausting the cavity of the mounting cavity 310; and an airflow channel 350 formed in the side wall inside the mounting cavity 310 and connected to the air intake assembly.

[0099] In this technical solution, the guide structure 300 also includes an air intake assembly and an airflow channel 350.

[0100] The airflow channel 350 connects the air intake assembly and the mounting cavity 310, and the air intake assembly is used to provide power for the gas flow.

[0101] During use, the gas inside the mounting cavity 310 is extracted by the air intake component, and the gas is discharged outside the mounting cavity 310 through the airflow channel 350.

[0102] The airflow channel 350 connects the upper and lower layers of the ceramic electrode 200. Together with the small hole on the support ring 340, it facilitates the exhaust of air inside the mounting cavity 310. Since the vacuum gauge has high requirements for the vacuum level of the measurement, this setting further meets the vacuum level requirements inside the vacuum gauge.

[0103] This technical solution achieves the required vacuum level between electrodes during the use of the vacuum gauge through the suction assembly and airflow channel 350, thereby improving the ease of use of the vacuum gauge.

[0104] like Figure 1-5 As shown, the control system 500 includes: a detector for monitoring the distance between the ceramic electrode 200 and the thin film electrode 400, wherein there are two detectors, each monitoring the distance between the ceramic electrode 200 and the thin film electrode 400 at different positions; a first signal extractor, wherein there are two signal extractors, each electrically connected to one of the two detectors; a second signal extractor 510, wherein there are two second signal extractors 510, each connected to the ceramic electrode 200, for extracting the capacitance data of the ceramic electrode 200; and a central processing unit 520, which is electrically connected to the first signal extractor and the second signal extractor 510.

[0105] In this technical solution, the control system 500 includes a detector, a first signal extractor, a second signal extractor 510, and a central processing unit 520.

[0106] The system employs two detectors to detect the electrode spacing at different positions. This setup verifies whether the electrode spacing of the vacuum gauge meets the usage requirements and whether the ceramic electrode 200 and the thin-film electrode 400 maintain a balanced state. This configuration improves the reliability of the vacuum gauge and prevents the ceramic electrode 200 from failing to reach its designated position due to mechanical failure, and / or from becoming skewed during the raising and lowering process.

[0107] The data obtained by the detector is transmitted back to the central processing unit 520 through the first signal extractor.

[0108] According to a second aspect of the embodiments of this application, a method for measuring gas pressure is proposed, applied to the capacitive thin-film vacuum gauge described in any of the above claims, comprising: a control system 500 setting the corresponding distance between the ceramic electrode 200 and the thin-film electrode 400 and the capacitance data processing method according to the range, and opening the range selection port; the control system 500 selecting the corresponding range according to the process gas pressure; the moving sealing system 100 automatically adjusting the distance between the ceramic electrode 200 and the thin-film electrode 400 according to the range; and the control system 500 collecting the capacitance data and processing it using the corresponding capacitance data processing method.

[0109] In this invention, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance; the term "multiple" refers to two or more unless otherwise explicitly defined. The terms "install," "connect," "link," and "fix" should be interpreted broadly. For example, "connect" can be a fixed connection, a detachable connection, or an integral connection; "link" can be a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0110] In the description of this invention, it should be understood that the terms "upper," "lower," "left," "right," "front," "rear," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or unit referred to must have a specific orientation or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0111] In the description of this specification, the terms "one embodiment," "some embodiments," "specific embodiment," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0112] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A capacitive thin-film vacuum gauge, characterized in that, include: A mobile sealing system, comprising a power source, wherein the mobile sealing system uses the power source to raise and lower the output end; A ceramic electrode is connected to the output end of the movable sealing system, and the ceramic electrode is driven by the movable sealing system to achieve axial displacement. A guide structure is connected to the movable sealing system, and the ceramic electrode is connected to the guide structure, which limits the movement of the ceramic electrode. A thin-film electrode, wherein the thin-film electrode is disposed inside the guiding structure; A control system is electrically connected to the movable sealing system and is used to control the movable sealing system. The guide structure includes two support rings. One support ring is disposed between the thin film electrode and the ceramic electrode, and the other support ring is disposed on the side of the ceramic electrode opposite to the thin film electrode. The support rings are made of a compressible material.

2. The capacitive thin-film vacuum gauge according to claim 1, characterized in that, The mobile sealing system also includes: A connecting rod is sleeved and connected to the guide structure, and the ceramic electrode is movably connected to one end of the connecting rod sleeved on the guide structure; A sealing ring is provided at the connection between the connecting rod and the guide structure, and the sealing ring has an axial movement function; The power source is located at the other end of the connecting rod, and the power source drives the connecting rod to rise or fall.

3. The capacitive thin-film vacuum gauge according to claim 1, characterized in that, The ceramic electrode includes: A linkage end, one end of which extends into the movable sealing system, wherein the movable sealing system adjusts the distance between the ceramic electrode and the thin film electrode by driving the linkage end; The electrode is disc-shaped and connected to the other end of the linkage.

4. The capacitive thin-film vacuum gauge according to claim 3, characterized in that, The guiding structure includes: The mounting cavity has a hollow disc-shaped cavity inside, the thin film electrode is disposed on the side of the mounting cavity near the bottom surface, and the top surface of the mounting cavity has a connection hole. A connecting pipe, one end of which is connected to the cavity of the mounting cavity through a connecting hole, and the other end of which is sleeved on the movable sealing system; The electrode ends of the ceramic electrode are disposed inside the mounting cavity; The connecting end of the ceramic electrode extends into the connecting tube and is connected to one end of the mounting cavity.

5. The capacitive thin-film vacuum gauge according to claim 4, characterized in that: The support ring has a Z-shaped cross-section and includes an upper support surface, a lower support surface, and a support inclined surface. The upper edge of the support inclined surface is connected to the inner ring of the upper support surface, and the lower edge of the support inclined surface is connected to the outer ring of the lower support surface. The side of the mounting cavity is provided with an annular rectangular mounting step, and the raised surface of the annular rectangular mounting step abuts against the outer ring side of the support ring.

6. The capacitive thin-film vacuum gauge according to claim 5, characterized in that: The ceramic electrode has a first annular protrusion on its peripheral side. The thickness of the first annular protrusion is less than the thickness of the ceramic electrode. The first annular protrusion abuts against the upper / lower part of the support ring, and the peripheral side of the ceramic electrode abuts against the inner ring side of the support ring. The sidewall of the mounting cavity is provided with several movable grooves; Guide blocks are spaced apart on the periphery of the first annular protrusion of the ceramic electrode, and the guide blocks correspond to and fit with the movable groove.

7. The capacitive thin-film vacuum gauge according to claim 5, characterized in that: The support ring is provided with multiple air holes spaced apart; The support ring is formed in one process.

8. The capacitive thin-film vacuum gauge according to claim 4, characterized in that, The guiding structure also includes: An air intake assembly is disposed in the mounting cavity and is used to exhaust air from the cavity. An airflow channel is provided, which is located on the side wall inside the mounting cavity and is connected to the air intake assembly.

9. The capacitive thin-film vacuum gauge according to claim 1, characterized in that, The control system includes: The detector is used to monitor the distance between the ceramic electrode and the thin film electrode. There are two detectors, which monitor the distance between the ceramic electrode and the thin film electrode at different positions. The first signal extractor, there are two signal extractors, which are electrically connected to the two detectors respectively; The second signal extractor, there are two of them, which are respectively connected to the ceramic electrode and used to extract the capacitance data of the ceramic electrode; A central processing unit, which is electrically connected to a first signal output and a second signal output.

10. A method for measuring gas pressure, applied to the capacitive thin-film vacuum gauge according to any one of claims 1-9, characterized in that, include: The control system sets the corresponding spacing between the ceramic electrode and the thin film electrode and the capacitance data processing method according to the measurement range, and opens the range selection port. The control system selects the appropriate range based on the process gas pressure. The mobile sealing system automatically adjusts the distance between the ceramic electrode and the thin-film electrode according to the measurement range; The control system collects the capacitance data and processes it using the corresponding capacitance data processing method.

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