A sputter coating system

Abstract

The application discloses a sputtering film coating system, which is characterized by setting a conveying track and a conveying-out track and cooperating with a transfer module, so that the substrate after film coating can be transferred to the conveying-out track, and the substrate after film coating can be conveyed back to the inlet-outlet cavity through the conveying-out track, thereby reducing the floor area of the overall equipment when continuous film coating of the substrate is required. The technical scheme comprises an equipment main body, a conveying track, a conveying-out track and a substrate holder. The equipment main body has a plurality of cavities which are sequentially communicated along an X-axis direction. The conveying track and the conveying-out track are both provided with a plurality of cavities. The conveying track is used for conveying the substrate holder from the inlet-outlet cavity to the last process cavity along the X-axis direction. The conveying-out track is used for conveying the substrate holder in the last process cavity back to the inlet-outlet cavity. A transfer module is arranged in the last process cavity, and the transfer module is used for transferring the substrate holder on the conveying track to the conveying-out track. The application belongs to the technical field of sputtering film coating.

Description

Technical Field

[0001] This invention belongs to the field of sputtering coating, and more specifically, relates to sputtering coating systems. Background Technology

[0002] Sputtering coating technology uses ions to bombard the surface of a target material, and the phenomenon of the target material's atoms being ejected is called sputtering. The atoms generated by sputtering are deposited on the surface of the substrate to form a film, which is called sputtering coating. Usually, gas discharge is used to generate gas ionization, and the positive ions bombard the cathode target at high speed under the action of an electric field, ejecting the cathode target atoms or molecules, which fly to the surface of the substrate to be coated and deposit into a thin film.

[0003] CN113445018A discloses a shielding conductive film preparation device based on magnetron sputtering. Along the substrate conveying direction, the device includes a feeding lifting device, a feeding chamber, a vacuum coating chamber Y1, a vacuum coating chamber Y2, a discharge chamber, and a unloading lifting device arranged in sequence. Both the feeding chamber and the discharge chamber are equipped with air venting valves. The vacuum coating chambers Y1 and Y2 are connected and maintain the same vacuum state. The device also includes an in-vacuum-chamber conveying mechanism, an out-of-vacuum-chamber conveying mechanism, a process gas system, and a pumping system.

[0004] In the above technical solution, the substrate is fed into the feeding chamber at one end and equipped with multiple vacuum coating chambers to perform multiple coatings on the substrate. After the substrate is coated, it is discharged from the discharge chamber at the other end. However, when multiple coatings are required, the substrate must first be fed into the vacuum coating chamber from the feeding chamber at one end and then discharged from the discharge chamber at the other end after coating. This results in a large overall footprint for the equipment. Summary of the Invention

[0005] The main objective of this invention is to provide a sputtering coating system that, by setting up a conveying track and an output track in conjunction with a transfer module, allows the coated substrate to be transferred to the output track, and the output track can then transport the coated substrate back to the inlet / outlet chamber. This reduces the overall footprint of the equipment when continuous coating of substrates is required.

[0006] According to a first aspect of the present invention, a sputtering coating system is provided, comprising a main body, a conveying track, an output track, and a substrate holder. The main body has a plurality of chambers connected sequentially along the X-axis direction. Along the X-axis direction, the first chamber is a material inlet / outlet chamber, and the remaining chambers are process chambers.

[0007] The main body of the equipment also has a feeding and discharging channel that communicates with the feeding and discharging chambers. The feeding and discharging channel is controlled to open and close by a first sealing mechanism; the connection and disconnection between the various chambers is controlled to open and close by a second sealing mechanism.

[0008] Both the conveying track and the output track are equipped with multiple chambers. The conveying track is used to transport the substrate holder from the inlet / outlet chamber to the last process chamber along the X-axis direction, and the output track is used to transport the substrate holder in the last process chamber back to the inlet / outlet chamber.

[0009] The last process chamber is equipped with a transfer module, which is used to transfer the substrate holder on the transfer track to the output track.

[0010] In the above-mentioned sputtering coating system, the sputtering coating system also includes a first vacuum system, a gas breaker valve assembly, a sputtering cathode assembly and a second vacuum system. The inlet and outlet chambers are connected to the first vacuum system and the gas breaker valve assembly, and each process chamber is connected to the sputtering cathode assembly and the second vacuum system.

[0011] The conveyor track includes multiple conveyor sections, and each chamber is equipped with a conveyor section;

[0012] The transmission track includes multiple transmission sections, and each chamber is equipped with a transmission section;

[0013] In the last process chamber, the transfer module is used to transfer the substrate holder from the transfer section to the output section;

[0014] In the process chamber, the sputtering cathode assembly, the conveying section, and the output section are arranged at intervals along the positive direction of the Y-axis.

[0015] The X-axis and Y-axis are perpendicular.

[0016] In the sputtering coating system described above, the top of the substrate holder is made of a magnetic material;

[0017] The sputtering coating system also includes a support, a first drive mechanism, and a second drive mechanism;

[0018] Each chamber has multiple supports spaced apart along the X-axis on its top wall.

[0019] The conveying section includes multiple conveying wheels and multiple first magnetic strips. The multiple conveying wheels are arranged at intervals along the X-axis on the bottom wall of the chamber. The circumferential surface of the conveying wheels has a first recess that mates with the grinding rod of the substrate holder. Each conveying wheel is connected to a first driving mechanism, which is used to drive the conveying wheel to rotate. The multiple first magnetic strips are connected one by one to the bottom of each support in the corresponding chamber. The length direction of the first magnetic strips extends along the X-axis. The first magnetic strips are used to attract the substrate holder being conveyed by the conveying wheels so that the substrate holder remains upright.

[0020] The output section includes multiple output wheels and multiple second magnetic strips. The multiple output wheels are arranged at intervals along the X-axis on the bottom wall of the chamber. The circumferential surface of the output wheel has a second recess that mates with the grinding rod of the substrate holder. Each output wheel is connected to a second drive mechanism, which is used to drive the output wheel to rotate. The multiple second magnetic strips are connected one by one to the bottom of each support in the corresponding chamber. The length direction of the second magnetic strips extends along the X-axis. The second magnetic strips are used to attract the substrate holder being transported by the output wheel so that the substrate holder remains upright.

[0021] In the above-mentioned sputtering coating system, the sputtering coating system also includes a vertical lifting mechanism and a magnetic suction component, and there are two supports in the process cavity; a magnetic suction component is provided between the two supports in the process cavity.

[0022] The top of the process chamber is equipped with a vertical lifting mechanism, which is connected to the magnetic suction assembly. The vertical lifting mechanism is used to drive the magnetic suction assembly to lift.

[0023] The magnetic suction assembly includes a connecting plate, a first magnetic block, and a second magnetic block. The connecting plate is located between two supports and is connected to the telescopic end of the vertical lifting mechanism. The first magnetic block and the second magnetic block are spaced apart at the bottom of the connecting plate along the positive direction of the Y-axis.

[0024] The length directions of the first and second magnetic blocks are parallel to the X-axis direction. The first magnetic block is located above the conveying section and is used to attract the substrate holder being conveyed by the conveyor wheel so that the substrate holder remains upright.

[0025] The second magnetic block is located above the output section, while the first magnetic block is used to attract the substrate holder being transported by the output wheel so that the substrate holder remains upright.

[0026] In the above-mentioned sputtering coating system, the process cavity has a coating position on the conveying section and a coating avoidance position on the output section. The coating position and the coating avoidance position are directly opposite each other along the Y-axis. The substrate of the substrate holder at the coating avoidance position is shielded by the substrate of the substrate holder at the coating position to avoid re-coating.

[0027] The sputtering coating system also includes a first positioning mechanism, a second positioning mechanism, and a fixing mechanism. The first positioning mechanism and the second positioning mechanism are connected to the main body of the equipment, and each process cavity is provided with a corresponding first positioning mechanism and second positioning mechanism. The first positioning mechanism and the second positioning mechanism are located above the process cavity. The first positioning mechanism is used to detect whether the substrate holder in the conveying section has reached the coating position, and the second positioning mechanism is used to detect whether the substrate holder in the output section has reached the coating avoidance position. Each process cavity is provided with a fixing mechanism, which is used to fix the substrate holder on the conveying section and the output section.

[0028] In the above-mentioned sputtering coating system, the first positioning mechanism includes two first fixing seats that are spaced apart on the main body of the equipment along the X-axis direction, and the first fixing seats are provided with a first viewing window;

[0029] Each first fixed base is detachably connected to a set of first through-beam sensors. The beam of the first through-beam sensor can pass through the first viewing window and enter the corresponding process cavity. The substrate holder is positioned by two sets of first through-beam sensors at both ends along its length to ensure that the substrate holder is in the coating position. Each set of first sensors has three sensors.

[0030] The second positioning mechanism includes two second fixed seats that are spaced apart on the main body of the equipment along the X-axis direction, and the second fixed seats are provided with a second viewing window;

[0031] Each second mounting base is detachably connected to a set of second through-beam sensors. The beams of the second through-beam sensors can pass through the second viewing window and enter the corresponding process cavity. The substrate holder is positioned at both ends along its length by two sets of second through-beam sensors to ensure that the substrate holder is in the coating avoidance position. Each set of second sensors has three sensors.

[0032] Among them, in the first positioning mechanism and the second positioning mechanism that are set up for the same process cavity, the two first fixed seats and the two second fixed seats are arranged one-to-one and spaced apart along the positive direction of the Y-axis.

[0033] In the above-mentioned sputtering coating system, two fixing blocks are provided on one side of the bottom of the substrate holder, and the two fixing blocks are spaced apart along the X-axis.

[0034] The fixing mechanism includes two clamping components symmetrically arranged in the process cavity, with each clamping component corresponding to a fixing block.

[0035] The clamping assembly includes a mounting base, a rotating shaft, and a drive motor;

[0036] The mounting base is located on the bottom wall of the process chamber, and the mounting base is provided with two fixing plates arranged at intervals along the Y-axis.

[0037] The axis of the rotating shaft is parallel to the Y-axis, and the rotating shaft is rotatably inserted through two fixed plates, with the rotating shaft rotatably connected to the two fixed plates;

[0038] A first swing block and a second swing block are fixedly connected to the rotating shaft. The first swing block is provided with a first pulley, and the second swing block is provided with a second pulley.

[0039] The first pulley is located between the sputtering cathode and the conveying section, and the second pulley is located between the conveying section and the output section.

[0040] The drive motor is connected to the main body of the equipment and located outside the process chamber. The output end of the drive motor is connected to the rotating shaft. The drive motor is used to drive the rotation of the rotating shaft to drive the first swing block and the second swing block to swing. Two first pulleys cooperate to clamp two fixed blocks to fix the substrate holder on the coating position. Two second pulleys cooperate to clamp two fixed blocks to fix the substrate holder on the coating avoidance position.

[0041] In the above-mentioned sputtering coating system, positioning blocks are provided on both sides of the substrate holder;

[0042] The transfer module includes two symmetrically arranged lifting units in the process cavity, with each lifting unit corresponding to a positioning block.

[0043] The lifting unit includes a base, a swing frame, a transmission structure, and a rotation drive mechanism;

[0044] The base is fixedly connected to the bottom wall of the process chamber, and the base has a first plate and a second plate spaced apart along the X-axis direction;

[0045] The swing frame is installed between the first plate and the second plate. The top of the swing frame is hinged to a first lifting assembly, and the bottom of the swing frame is provided with a second lifting assembly.

[0046] The transmission structure connects the first plate, the swing frame, and the first lifting assembly;

[0047] The rotary drive mechanism is connected to the main body of the equipment and is connected to the transmission structure. The rotary drive mechanism drives the transmission structure to swing the swing frame and the first lifting assembly.

[0048] When the swing frame swings, the first lifting component lifts the positioning block, while the second lifting component lifts the grinding rod of the substrate holder, and then transfers the substrate holder to the output track.

[0049] In the above-mentioned sputtering coating system, the first lifting assembly includes a hinge plate, which is hinged to the top of the swing frame. The top of the hinge plate is provided with a hook for engaging with the positioning block. The transmission structure connects the first plate, the swing frame, and the hinge plate.

[0050] The second lifting assembly includes a support block connected to the swing frame, and the support block is provided with a V-groove for engaging with the grinding rod of the substrate holder;

[0051] The transmission structure includes a first turntable, a first crankshaft, a mounting plate, a second crankshaft, a swing arm, a rotating shaft, and a linkage rod;

[0052] The first turntable is connected to the bottom of the first plate. The first crankshaft has a first shaft and a second shaft. One end of the first shaft passes through the swing frame and is eccentrically connected to one side of the first turntable. The second shaft is connected to the rotary drive mechanism.

[0053] A mounting plate is installed on the top of the first plate. The second crankshaft is located above the first crankshaft. The second crankshaft has a third shaft and a fourth shaft. One end of the third shaft passes through the mounting plate and is rotatably connected to the mounting plate. One end of the fourth shaft passes through the swing frame. A cam is provided on the end of the fourth shaft.

[0054] The swing arm is arranged vertically, and the upper end of the swing arm is eccentrically connected to the end of the third shaft through the second connector, and the lower end of the swing arm is eccentrically connected to the other side of the first turntable through the first connector.

[0055] The rotating shaft is horizontally mounted on the swing frame and rotatably connected to the swing frame. One end of the rotating shaft is provided with a first swing element, and the other end of the rotating shaft is provided with a second swing element.

[0056] The linkage rod is arranged vertically, with its lower end hinged to the first swing member and its upper end hinged to the hinge plate.

[0057] The second swing member is equipped with a roller, the surface of which contacts the surface of the cam. A fixing member is also provided on the side of the swing frame near the cam. The fixing member and the second swing member are connected by a spring.

[0058] In the above-mentioned sputtering coating system, the rotary drive mechanism includes a reducer, a second turntable, a detection base, and a rotary motor;

[0059] The reducer is located on the side of the second plate away from the swing frame. One end of the second shaft passes through the second plate and the reducer, and the end of the second shaft is connected to one side of the second turntable. The rotary motor is located on the main body of the equipment and is connected to the reducer.

[0060] The second turntable is provided with a first through hole, a second through hole, a third through hole, and a fourth through hole; the distances of the first through hole, the second through hole, the third through hole, and the fourth through hole from the center of the turntable increase sequentially;

[0061] The center of the second turntable, the center of the first through hole, and the center of the fourth through hole are set sequentially from top to bottom along the radial direction of the turntable;

[0062] The second and third through holes are spaced apart along the Y-axis, and the center of the second turntable is located between the second and third through holes;

[0063] The detection base is located inside the process cavity. A third viewing window is provided on the side of the detection base near the second turntable. The detection base is equipped with a first photoelectric sensor, a second photoelectric sensor, a third photoelectric sensor and a fourth photoelectric sensor arranged sequentially from top to bottom.

[0064] In the initial state, the light beams of the first photoelectric sensor and the fourth photoelectric sensor can pass through the first through hole and the fourth through hole respectively, while the light beams of the second photoelectric sensor and the third photoelectric sensor are blocked by the second turntable.

[0065] As the second turntable rotates, the light beam from the third photoelectric sensor first passes through the third through-hole, and then the light beam from the second photoelectric sensor passes through the second through-hole.

[0066] One of the above-described technical solutions of the present invention has at least one of the following advantages or beneficial effects:

[0067] In this invention, a conveying track and an output track are set up so that the substrates in the substrate holder can complete multiple coatings. By setting a transfer module in the process chamber at the end, the coated substrates can be transferred to the output track, and the output track can transport the coated substrates back to the inlet and outlet chambers. In this way, when the substrates need to be continuously coated, the overall equipment footprint can be reduced. Attached Figure Description

[0068] The present invention will be further described below with reference to the accompanying drawings and embodiments;

[0069] Figure 1 This is a schematic diagram of the sputtering coating system according to the first embodiment of the present invention;

[0070] Figure 2 This is a schematic diagram of the material inlet and outlet chambers of the sputtering coating system according to the first embodiment of the present invention;

[0071] Figure 3 This is one of the structural schematic diagrams of the process cavity of the sputtering coating system according to the first embodiment of the present invention;

[0072] Figure 4 This is a second schematic diagram of the process cavity of the sputtering coating system according to the first embodiment of the present invention;

[0073] Figure 5 This is one of the structural schematic diagrams of the last process cavity of the sputtering coating system according to the first embodiment of the present invention;

[0074] Figure 6 This is a second schematic diagram of the structure of the last process cavity of the sputtering coating system according to the first embodiment of the present invention;

[0075] Figure 7 This is a schematic diagram of the clamping assembly of the sputtering coating system according to the first embodiment of the present invention;

[0076] Figure 8 This is one of the structural schematic diagrams of the transfer film block in the sputtering coating system of the first embodiment of the present invention;

[0077] Figure 9This is a second schematic diagram of the structure of the transfer film block in the sputtering coating system of the first embodiment of the present invention;

[0078] Figure 10 This is a side view of the transfer film block of the sputtering coating system according to the first embodiment of the present invention;

[0079] Figure 11 This is a schematic diagram of the structure of the detection base of the sputtering coating system according to the first embodiment of the present invention;

[0080] The figure labels for each figure are as follows:

[0081] 1. Equipment body; 11. First sealing mechanism; 12. Second sealing mechanism; 2. Inlet / outlet chamber; 21. Air rupture valve assembly; 3. Process chamber; 4. Conveying track; 41. Conveying section; 411. Conveying wheel; 4111. First recess; 412. First magnetic strip; 5. Outlet track; 413. First drive mechanism; 51. Outlet section; 511. Outlet wheel; 5111. Second recess; 512. Second magnetic strip; 513. Second drive mechanism; 6. Substrate holder; 61. Positioning block; 62. Fixing block; 7. Vertical lifting mechanism; 8. Fixing mechanism; 81. Clamping assembly; 811. Mounting base; 8 12. Rotating shaft; 813. First swing block; 814. Second swing block; 815. First pulley; 816. Second pulley; 817. Drive motor; 9. Transfer module; 91. Lifting unit; 911. Base; 9111. First plate; 9112. Second plate; 912. Swing frame; 9121. First lifting assembly; 91211. Hinge plate; 91212. Hook; 9122. Second lifting assembly; 91221. Support block; 91222. V-groove; 913. Transmission structure; 9131. First turntable; 9132. First crankshaft; 91321. First shaft; 91 322. Second shaft; 9133. Mounting plate; 9134. Swing rod; 9135. Rotating shaft; 91351. First swing component; 91352. Second swing component; 91353. Cam; 91354. Roller; 91355. Spring; 91356. Linkage rod; 91357. Fixing component; 9136. Second crankshaft; 91361. Third shaft; 91362. Fourth shaft; 914. Rotary drive mechanism; 9141. Reducer; 91411. Rotary motor; 9142. Second turntable; 91421. First through hole; 91422. Second through hole; 914 23. Third through hole; 91424. Fourth through hole; 9143. Detection base; 9144. Third viewing window; 9145. First photoelectric sensor; 9146. Second photoelectric sensor; 9147. Third photoelectric sensor; 9148. Fourth photoelectric sensor; 101. First positioning mechanism; 1011. First fixed base; 1012. First through-beam sensor; 102. Second positioning mechanism; 1021. Second fixed base; 1022. Second through-beam sensor; 103. Magnetic suction assembly; 1031. Connecting plate; 1032. First magnetic block; 1033. Second magnetic block; 104. Bracket. Detailed Implementation

[0082] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0083] The following disclosure provides many different implementations or examples for different ways of implementing the present invention.

[0084] Reference Figures 1 to 11 As shown, a sputtering coating system includes a main body 1, a conveying track 4, an output track 5, and a substrate holder 6. The main body 1 has multiple chambers connected sequentially along the X-axis. Along the X-axis, the first chamber is the material inlet / outlet chamber 2, and the remaining chambers are all process chambers 3.

[0085] The main body of the equipment 1 also has an inlet and outlet channel (not shown in the figure) that communicates with the inlet and outlet chamber 2. The inlet and outlet channel is controlled to open and close by a first sealing mechanism 11; the connection and disconnection between each chamber is controlled by a second sealing mechanism 12.

[0086] Both the conveying track 4 and the transfer track are equipped with multiple chambers. The conveying track 4 is used to transport the substrate holder 6 from the inlet / outlet chamber 2 to the last process chamber 3 along the X-axis direction. The transfer track 5 is used to transport the substrate holder 6 in the last process chamber 3 back to the inlet / outlet chamber 2.

[0087] The last process chamber 3 is equipped with a transfer module 9, which is used to transfer the substrate holder 6 on the transfer track 4 to the output track 5.

[0088] The substrate holder 6 has been disclosed in Chinese patent CN209669342U, so the structure of the substrate holder 6 will not be described in detail in this embodiment.

[0089] It should be noted that the first closing mechanism 11 and the second closing mechanism 12 are both existing technologies, and can be referenced in CN222908047U, CN113445018A and CN222908047U.

[0090] In this design, the feeding and discharging channels of the feeding and discharging chamber 2 are controlled by the first sealing mechanism 11, while the connections between the various chambers are controlled by the second sealing mechanism 12. The substrate holder 6 enters the feeding and discharging chamber 2 from the feeding channel and is then transported by the conveying track 4. The substrate holder 6 enters the process chamber 3 along the X-axis for coating. After the substrate holder 6 enters the last process chamber 3 and completes the coating of the substrate, the transfer module 9 in the last chamber transfers the substrate holder 6 from the conveying track 4 to the output track 5. Then, the substrate holder 6 is transported back to the feeding and discharging chamber 2 via the output track 5. In this way, when continuous coating of the substrate is required, the overall equipment footprint can be reduced.

[0091] Preferably, the sputtering coating system further includes a first vacuum system (not shown in the figure), a degassing valve assembly 21, a sputtering cathode assembly (not shown in the figure), and a second vacuum system (not shown in the figure). The inlet / outlet chamber 2 is connected to the first vacuum system and the degassing valve assembly 21, and each process chamber 3 is connected to the sputtering cathode assembly and the second vacuum system.

[0092] The conveyor track 4 includes multiple conveyor sections 41, and each chamber is equipped with a conveyor section 41;

[0093] The transmission track 5 includes multiple transmission sections 51, and each chamber is equipped with a transmission section 51;

[0094] In the last process cavity 3, the transfer module 9 is used to transfer the substrate holder 6 from the transfer section 41 to the output section 51;

[0095] In process cavity 3, sputtering cathode assembly, conveying section 41 and output section 51 are arranged at intervals along the positive direction of Y-axis.

[0096] The X-axis and Y-axis are perpendicular.

[0097] The first vacuum system and the second vacuum system have been disclosed in Chinese patent CN220034647U, and the sputtering cathode assembly has been disclosed in Chinese patent CN209669342U. Therefore, the structure of the first vacuum system, the second vacuum system and the sputtering cathode assembly will not be described in detail in this embodiment.

[0098] In this embodiment, there are four chambers, namely one inlet / outlet chamber 2 and three process chambers 3. The substrate holder 6 can be transported one after another through the conveyor section 41 so that the substrates on each substrate holder 6 can enter the three process chambers 3 in sequence to complete the three coating processes in sequence. The maximum capacity of the equipment is six pieces.

[0099] During feeding, the first sealing mechanism 11 opens to allow the substrate holder 6 to enter the infeed / outfeed chamber 2 from the infeed / outfeed channel. Then, the first sealing mechanism 11 closes. Next, the first vacuum system equalizes the air pressure in the infeed / outfeed chamber 2 with the air pressure in the process chamber 3. Then, the second sealing mechanism 12 opens, and the substrate holder 6 is conveyed from the infeed / outfeed chamber 2 to the first process chamber 3 via the conveyor section 41. The second sealing mechanism 12 then closes. After the substrate completes coating in the first process chamber 3, the second sealing mechanism 12 is opened again, and the substrate holder 6 is conveyed through the conveyor section 41. The substrate is conveyed to the next process chamber 3 by the conveyor section 41. After the substrate holder 6 enters, the second sealing mechanism 12 is closed to complete the second coating of the substrate. The above process is repeated. After the substrate completes the last coating, the transfer module 9 transfers the substrate holder 6 from the conveyor section 41 to the output section 51. When the output section 51 conveys the substrate holder 6 to the inlet / outlet chamber 2, the second sealing mechanism 12 is closed. Then, the air pressure in the inlet / outlet chamber 2 is adjusted to the same as atmospheric pressure by the air rupture valve assembly 21, and then the first sealing mechanism 11 is opened.

[0100] In this embodiment, the top of the substrate holder 6 is made of a magnetic material;

[0101] The sputtering coating system also includes a support 104, a first drive mechanism 413, and a second drive mechanism 513;

[0102] Each chamber has multiple supports 104 arranged at intervals along the X-axis on its top wall.

[0103] The conveying section 41 includes multiple conveying wheels 411 and multiple first magnetic strips 412. The multiple conveying wheels 411 are arranged at intervals along the X-axis on the bottom wall of the chamber. The circumferential surface of the conveying wheel 411 has a first recess 4111 that cooperates with the grinding rod of the substrate holder 6. Each conveying wheel 411 is connected to a first driving mechanism 413. The first driving mechanism 413 is used to drive the conveying wheel 411 to rotate. The multiple first magnetic strips 412 are connected one by one to the bottom of each support 104 in the corresponding chamber. The length direction of the first magnetic strips 412 extends along the X-axis. The first magnetic strips 412 are used to attract the substrate holder 6 conveyed by the conveying wheel 411 so that the substrate holder 6 is kept upright.

[0104] The output section 51 includes multiple output wheels 511 and multiple second magnetic strips 512. The multiple output wheels 511 are arranged at intervals along the X-axis on the bottom wall of the chamber. The circumferential surface of the output wheel 511 has a second recess 5111 that cooperates with the grinding rod of the substrate holder 6. Each output wheel 511 is connected to a second drive mechanism 513. The second drive mechanism 513 is used to drive the output wheel 511 to rotate. The multiple second magnetic strips 512 are connected one by one to the bottom of each support 104 in the corresponding chamber. The length direction of the second magnetic strips 512 extends along the X-axis. The second magnetic strips 512 are used to attract the substrate holder 6 conveyed by the output wheel 511 so that the substrate holder 6 is kept upright.

[0105] Specifically, when the substrate holder 6 is transported in the positive direction of the X-axis, the first magnetic strip 412 keeps the substrate holder 6 upright when it is transported by the conveyor wheel 411. The first recess 4111 of the conveyor wheel 411 is used to limit the transport of the substrate holder 6. The second magnetic strip 512 keeps the substrate holder 6 upright when it is transported by the output wheel 511. The second recess 5111 has the same function as the first recess 4111, which is to limit the transport of the substrate holder 6.

[0106] Since a substrate is mounted on the substrate holder 6, and the substrate is generally made of glass or silicon, it is very heavy. When transporting the substrate holder 6, the pressure on the conveyor wheel 411 and the output wheel 511 is very high, which can easily cause the substrate holder 6 to deform and vibrate.

[0107] Therefore, a first magnetic strip 412 and a second magnetic strip 512 are provided, and the first magnetic strip 412 and the second magnetic strip 512 will have a gap with the top of the substrate frame 6 whether the substrate frame 6 is transported by the conveyor wheel 411 or the output wheel 511. When the conveyor wheel 411 and the output wheel 511 transport the substrate frame 6, the first magnetic strip 412 and the second magnetic strip 512 are used to magnetically attract the substrate frame 6, so as to reduce the pressure on the conveyor wheel 411 and the output wheel 511 respectively, and reduce the shaking of the substrate frame 6 during the transport process.

[0108] Both the first drive mechanism 413 and the second drive mechanism 513 can be motors, which drive the transmission wheel 411 and the output wheel 511 to rotate.

[0109] In this embodiment, the sputtering coating system also includes a vertical lifting mechanism 7 and a magnetic suction assembly 103. The number of supports 104 in the process cavity 3 is two; a magnetic suction assembly 103 is provided between the two supports 104 in the process cavity 3.

[0110] The top of the process cavity 3 is provided with a vertical lifting mechanism 7, which is connected to the magnetic suction assembly 103. The vertical lifting mechanism 7 is used to drive the magnetic suction assembly 103 to lift.

[0111] The magnetic suction assembly 103 includes a connecting plate 1031, a first magnetic block 1032 and a second magnetic block 1033. The connecting plate 1031 is located between two supports 104. The connecting plate 1031 is connected to the telescopic end of the vertical lifting mechanism 7. The first magnetic block 1032 and the second magnetic block 1033 are spaced apart at the bottom of the connecting plate 1031 along the positive direction of the Y-axis.

[0112] The length direction of the first magnetic block 1032 and the second magnetic block 1033 is parallel to the X-axis direction. The first magnetic block 1032 is located above the conveying section 41. The first magnetic block 1032 is used to attract the substrate holder 6 conveyed by the conveying wheel 411 so that the substrate holder 6 is kept upright.

[0113] The second magnetic block 1033 is located above the output section 51. The second magnetic block 1033 is used to attract the substrate holder 6 conveyed by the output wheel 511 so that the substrate holder 6 is kept upright.

[0114] The vertical lifting mechanism 7 is existing technology. For reference, a magnetron sputtering vacuum coating device with adjustable sputtering distance is disclosed in Chinese Patent CN209669342U. Therefore, the structure of the vertical lifting mechanism 7 will not be described in detail in this embodiment.

[0115] Specifically, when the substrate holder 6 is relatively long, two magnetic suction components 103 and two vertical lifting mechanisms 7 can be set up. Each vertical lifting mechanism 7 drives one magnetic suction component 103. The two magnetic suction components 103 are distributed at intervals along the X-axis direction and jointly apply magnetic attraction to the substrate holder 6 to improve the stability of the substrate holder 6 transport process.

[0116] The vertical lifting mechanism 7 is used to drive the lifting of the magnetic suction assembly 103. By changing the distance between the magnetic suction assembly 103 and the top of the substrate holder 6, the magnitude of the suction force is controlled, so as to adjust the contact stress between the substrate holder 6 and the output wheel 511 and the transmission wheel 411, and it is also more conducive to adapting to substrates of different specifications.

[0117] Furthermore, when the transfer module 9 lifts the substrate holder 6, the vertical lifting mechanism 7 drives the magnetic attraction component 103 upward to avoid interference; the first magnetic block 1032 is used to attract the substrate holder 6 conveyed by the transfer wheel 411, and the second magnetic block 1033 is used to attract the substrate holder 6 conveyed by the output wheel 511.

[0118] In practical applications, the first positioning mechanism 101 includes two first fixing seats 1011 that are spaced apart on the main body 1 along the X-axis direction, and the first fixing seats 1011 are provided with a first viewing window (not shown in the figure).

[0119] Each first fixed base 1011 is detachably connected to a set of first through-beam sensors 1012. The beam of the first through-beam sensor 1012 can pass through the first viewing window and enter the corresponding process cavity 3. The substrate holder 6 is positioned by two sets of first through-beam sensors 1012 at both ends along its length direction to ensure that the substrate holder 6 is in the coating position. The number of each set of first sensors 1012 is three.

[0120] The second positioning mechanism 102 includes two second fixing seats 1021 spaced apart on the device body 1 along the X-axis direction, and the second fixing seats 1021 are provided with a second viewing window (not shown in the figure).

[0121] Each second mounting base 1021 is detachably connected to a set of second through-beam sensors 1022. The beam of the second through-beam sensor 1022 can pass through the second viewing window and enter the corresponding process cavity 3. The substrate holder 6 is positioned at both ends along its length by two sets of second through-beam sensors 1022 to ensure that the substrate holder 6 is in the coating avoidance position. Each set of second sensors 1022 has three sensors.

[0122] Among them, in the first positioning mechanism 101 and the second positioning mechanism 102 that are set for the same process cavity 3, the two first fixed seats 1011 and the two second fixed seats 1021 are arranged one-to-one and spaced apart along the positive direction of the Y-axis.

[0123] Specifically, both the first through-beam sensor 1012 and the second through-beam sensor 1022 can be fixed by bolts. When the substrate holder 6 conveyed by the conveyor wheel 511 needs to be conveyed back to the inlet / outlet chamber 2, in order not to affect the coating efficiency, the first positioning mechanism 101 will detect that the substrate holder 6 on the conveyor section 41 has reached the coating position. After the second positioning mechanism 102 detects that the substrate holder 6 has reached the coating avoidance position, the substrate of the substrate holder 6 on the conveyor section 41 will block the substrate of the substrate holder 6 on the coating avoidance position, so that the particles generated by the sputtering cathode assembly cannot reach the substrate on the coating avoidance position, thereby avoiding the substrate of the substrate holder 6 on the conveyor section 41 from being coated again, ensuring the single coating of the same material on the substrate.

[0124] Therefore, during the process of conveying the substrate holder 6 back by the conveyor wheel 511, the substrate holder 6 will stop at the coating avoidance position every time it enters a process cavity 3. Thus, in the same process cavity, the substrate holder 6 at the coating avoidance position will coexist with the substrate holder 6 at the coating position on the conveyor section 41 for a period of time. The coexistence time is also the coating time of the substrate of the substrate holder 6 at the coating position. During this time, both substrate holders 6 will be fixed by the fixing mechanism 8. After the substrate of the substrate holder 6 at the coating position has completed the coating, the fixing mechanism 8 will release the fixing of the substrate holder 6 and open the second sealing mechanism 12 between the process cavities 3 so that the substrate holder 6 at the coating avoidance position can enter the next coating avoidance position and finally return to the inlet / outlet cavity 2.

[0125] The three first through-beam sensors 1012 in each group are arranged at intervals along the X-axis, and the three first through-beam sensors 1012 are respectively Figure 3In the process of conveying the substrate holder 6 by the conveyor wheel 411, the substrate holder 6 first passes through the beam of 1012a, and then the top of the substrate holder 6 blocks the beams of 1012b and 1012c, thereby completing the positioning of one end of the substrate holder 6. At the other end of the substrate holder 6 in the length direction, the top of the substrate holder 6 blocks the beams of 1012a and 1012b, while the beam of 1012c cannot reach the top of the substrate holder 6. In this way, the positioning of the substrate holder 6 on the coating position is completed.

[0126] The positioning at the coating avoidance position is performed by the second through-beam sensor 1022. When the substrate holder 6 is transported by the delivery wheel 511, one end of the substrate holder 6 in the length direction will pass through the beam of 1022c. Then the top of the substrate holder 6 blocks 1022b and 1022a, while the other end blocks the beams of 1022b and 1022c. The beam of 1022a cannot reach the top of the substrate holder 6.

[0127] After the substrate holder 6 on the conveyor wheel 411 and the output wheel 511 are positioned, the conveyor wheel 411 and the output wheel 511 stop moving and are fixed by the fixing mechanism 8. After the coating is completed, the fixing mechanism 8 is released, the conveyor wheel 411 moves again to transport the substrate holder 6 to the coating position of the next process chamber 3, and the output wheel 511 then transports the substrate holder 6 to the next coating avoidance position.

[0128] In this embodiment, two fixing blocks 62 are provided on one side of the bottom of the substrate holder 6, and the two fixing blocks 62 are spaced apart along the X-axis.

[0129] The fixing mechanism 8 includes two clamping components 81 symmetrically arranged in the process cavity 3, and the clamping components 81 correspond one-to-one with the fixing blocks 62;

[0130] The clamping assembly 81 includes a mounting base 811, a rotating shaft 812, and a drive motor 817;

[0131] Mounting base 811 is located on the bottom wall of process cavity 3, and two fixing plates are provided on mounting base 811 at intervals along the Y-axis direction;

[0132] The axis of the rotating shaft 812 is parallel to the Y-axis direction. The rotating shaft 812 is rotatably inserted through the two fixed plates and is rotatably connected to the two fixed plates.

[0133] A first swing block 813 and a second swing block 814 are fixedly connected to the rotating shaft 812. The first swing block 813 is provided with a first pulley 815, and the second swing block 814 is provided with a second pulley 816.

[0134] The first pulley 815 is located between the sputtering cathode and the conveying section 41, and the second pulley 816 is located between the conveying section 41 and the output section 51.

[0135] The drive motor 817 is connected to the main body 1 of the equipment and located outside the process chamber 3. The output end of the drive motor 817 is connected to the rotating shaft 812. The drive motor 817 is used to drive the rotation of the rotating shaft 812 to drive the first swing block 813 and the second swing block 814 to swing. Two first pulleys 815 cooperate to clamp two fixed blocks 62 to fix the substrate holder 6 on the coating position. Two second pulleys 816 cooperate to clamp two fixed blocks 62 to fix the substrate holder 6 on the coating avoidance position.

[0136] Specifically, when both the first positioning mechanism 101 and the second positioning mechanism 102 detect that the two substrate holders 6 are in the coating position and the coating avoidance position respectively, the drive motor 817 is activated. The drive motor 817 drives the rotating shaft 812 to rotate, thereby causing the first swing block 813 and the second swing block 814 to swing towards the fixed block 62. In this way, the two first pulleys 815 will contact the sides of the two fixed blocks 62 of the substrate holder 6 on the conveying section 41 respectively and clamp the substrate holder 6 to be fixed in the coating position; while the two second pulleys 816 will contact the sides of the two fixed blocks 62 of the substrate holder 6 on the output section 51 respectively and clamp the substrate holder 6 to be fixed in the coating avoidance position.

[0137] After the substrate in the substrate holder 6 at the coating position is coated, the drive motor 817 drives the rotating shaft 812 to rotate in the opposite direction, causing the first swing block 813 and the second swing block 814 to swing away from the fixed block 62, thereby loosening the fixation on the substrate holder 6. In this way, the wear on the substrate holder 6 can be reduced and the substrate holder 6 can be fixed.

[0138] In this embodiment, positioning blocks 61 are provided on both sides of the substrate holder 6;

[0139] The transfer module 9 includes two symmetrically arranged lifting units 91 in the process cavity 3, and the lifting unit 91 corresponds one-to-one with the positioning block 61;

[0140] The lifting unit 91 includes a base 911, a swing frame 912, a transmission structure 913, and a rotary drive mechanism 914;

[0141] The base 911 is fixedly connected to the bottom wall of the process cavity 3. The base 911 has a first plate 9111 and a second plate 9112 spaced apart along the X-axis direction.

[0142] The swing frame 912 is located between the first plate 9111 and the second plate 9112. The top of the swing frame 912 is hinged to the first lifting assembly 9121, and the bottom of the swing frame 912 is provided with the second lifting assembly 9122.

[0143] The transmission structure 913 connects the first plate 9111, the swing frame 912, and the first lifting assembly 9121;

[0144] The rotary drive mechanism 914 is connected to the main body 1 of the equipment. The rotary drive mechanism 914 is connected to the transmission structure 913. The rotary drive mechanism 914 drives the transmission structure 913 to move, thereby causing the swing frame 912 and the first lifting assembly 9121 to swing.

[0145] When the swing frame 912 swings, the first lifting component 9121 lifts the positioning block 61, and at the same time, the second lifting component 9122 lifts the grinding rod of the substrate holder 6, and then transfers the substrate holder 6 to the output track 5.

[0146] In simple terms, when the substrate holder 6 needs to be transferred, the rotary drive mechanism 914 drives the transmission structure 913 to swing the swing frame 912. While the swing frame 912 is swinging, the first lifting component 9121 lifts the positioning block 61 respectively. The V-groove 91222 of the support block 91221 cooperates with the grinding rod of the substrate holder 6. The two lifting units 91 work together, the two first lifting components 9121 lift the two positioning blocks 61 respectively, and the two support blocks 91221 work together to lift the grinding rod of the substrate holder 6. Then, under the continuous drive of the rotary drive mechanism 914, the substrate holder 6 is transferred to the output track 5. After the output track 5 transmits the substrate holder 6, the transfer module 9 resets. In this way, the substrate holder 6 is lifted and then transferred to the output track 5.

[0147] Preferably, the first lifting assembly 9121 includes a hinge plate 91211, which is hinged to the top of the swing frame 912. The top of the hinge plate 91211 is provided with a hook 91212 for cooperating with the positioning block 61. The transmission structure 913 connects the first plate 9111, the swing frame 912, and the hinge plate 91211.

[0148] The second lifting assembly 9122 includes a support block 91221, which is connected to the swing frame 912. The support block 91221 is provided with a V-groove 91222 for engaging with the grinding rod of the substrate holder 6.

[0149] The transmission structure 913 includes a first turntable 9131, a first crankshaft 9132, a second crankshaft 9136, a swing rod 9134, a rotating shaft 9135, and a linkage rod 91356;

[0150] The first turntable 9131 is connected to the bottom of the first plate 9111. The first crankshaft 9132 has a first shaft 91321 and a second shaft 91322. One end of the first shaft 91321 passes through the swing frame 912 and is eccentrically connected to one side of the first turntable 9131. The second shaft 91322 is connected to the rotary drive mechanism 914.

[0151] The top of the first plate 9111 is provided with a mounting plate 9133. The second crankshaft 9136 is located above the first crankshaft 9132. The second crankshaft 9136 has a third shaft 91361 and a fourth shaft 91362. One end of the third shaft 91361 passes through the mounting plate 9133 and is rotatably connected to the mounting plate 9133.

[0152] One end of the fourth shaft 91362 passes through the swing frame 912 and is rotatably connected to the swing frame 912. A cam 91353 is provided on the end of the fourth shaft 91362.

[0153] The swing arm 9134 is arranged vertically, and the lower end of the swing arm 9134 is eccentrically connected to the other side of the first turntable 9131 through the first connector; the upper end of the swing arm 9134 is eccentrically connected to the end of the third shaft 91361 through the second connector.

[0154] The rotating shaft 9135 is horizontally mounted on the swing frame 912 and is rotatably connected to the swing frame 912. One end of the rotating shaft 9135 is provided with a first swing element 91351, and the other end of the rotating shaft 912 is provided with a second swing element 91352.

[0155] The linkage rod 91356 is arranged vertically, with its lower end hinged to the first swing member 91351 and its upper end hinged to the hinge plate 91211.

[0156] The second swing member 91352 is provided with a roller 91354, the wheel surface of the roller 91354 is in contact with the wheel surface of the cam 91353, and the swing frame 912 is also provided with a fixing member 91357 on the side near the cam 91353. The fixing member 91357 and the second swing member 91352 are connected by a spring 91355.

[0157] Specifically, when the substrate holder 6 needs to be lifted, the rotary drive mechanism 914 serves as the power source. The rotary drive mechanism 914 first drives the second shaft 91322 of the first crankshaft 9132 to rotate, thereby causing the first shaft 91321 to swing. The first shaft 91321 drives the swing frame 912 to swing and lift it up. The V-groove 91222 on the support block 91221 cooperates with the grinding rod of the substrate holder 6 to lift it up. At the same time, the first shaft 91321 drives the first turntable 9131 to rotate. As the first turntable 9131 rotates, it pulls the swing rod 9134 down to drive the second crankshaft 9136 to move.

[0158] The upper end of the swing arm 9134 is eccentrically connected to the end of the third shaft 91361 through the second connector. Therefore, when the swing arm 9134 is pulled down, the third shaft 91361 is driven to rotate, thereby driving the fourth shaft 91362 to rotate.

[0159] When the quadcopter rotates, it drives the rotation of cam 91353. Cam 91353 pushes the second swing member 91352 upward. Generally, the spring 91355 is in a stretched state in the initial state. When cam 91353 pushes the second swing member 91352 upward, it compresses the spring 91355. At the same time, the first swing member 91351 swings downward and pulls the linkage rod 91356 downward. Then the linkage rod 91356 drives the hinge plate 91211, thereby causing the hinge plate 91211 to swing upward, so that the hook 91212 of the hinge plate 91211 cooperates with the positioning block 61 and lifts it up.

[0160] In this way, the hook 91212 of the hinge plate 91211 supports the positioning block 61, and the support block 91221 supports the grinding rod of the substrate holder 6. Then the swing frame 912 continues to swing to place the substrate holder 6 on the output track 5. The reset of the swing frame 912 is a reverse process of the above process, so it will not be described in detail in this embodiment. Generally speaking, during the reset process of the swing frame 912, the hook 91212 will gradually separate from the positioning block 61.

[0161] More preferably, the rotary drive mechanism 914 includes a reducer 9141, a second turntable 9142, a detection base 9143, and a rotary motor 91411;

[0162] The reducer 9141 is located on the side of the second plate 9112 away from the swing frame 912. One end of the second shaft 91322 passes through the second plate 9112 and the reducer 9141. The end of the second shaft 91322 is connected to one side of the second turntable 9142. The rotary motor 91411 is located on the main body 1 of the equipment and is connected to the reducer 9141.

[0163] The second turntable 9142 is provided with a first through hole 91421, a second through hole 91422, a third through hole 91423 and a fourth through hole 91424; the distances of the first through hole 91421, the second through hole 91422, the third through hole 91423 and the fourth through hole 91424 from the center of the turntable increase sequentially;

[0164] The center of the second turntable 9142, the center of the first through hole 91421, and the center of the fourth through hole 91424 are arranged sequentially from top to bottom along the radial direction of the turntable;

[0165] The second through hole 91422 and the third through hole 91423 are spaced apart along the Y-axis, and the center of the second turntable 9142 is located between the second through hole 91422 and the third through hole 91423.

[0166] The detection base 9143 is located inside the process cavity 3. The detection base 9143 is provided with a third viewing window 9144 on the side near the second turntable 9142. The detection base 9143 is provided with a first photoelectric sensor 9145, a second photoelectric sensor 9146, a third photoelectric sensor 9147 and a fourth photoelectric sensor 9148 arranged from top to bottom.

[0167] In the initial state, the light beams of the first photoelectric sensor 9145 and the fourth photoelectric sensor 9148 can pass through the first through hole 91421 and the fourth through hole 91424 respectively, while the light beams of the second photoelectric sensor 9146 and the third photoelectric sensor 9147 are blocked by the second turntable 9142.

[0168] When the rotary motor 91411 drives the first crank to rotate the second turntable 9142, the light beam of the third photoelectric sensor 9147 first passes through the third through hole 91423, and then the light beam of the second photoelectric sensor 9146 passes through the second through hole 91422.

[0169] Furthermore, in the initial state, the light beams of the first photoelectric sensor 9145 and the fourth photoelectric sensor 9148 can pass through the first through hole 91421 and the fourth through hole 91424 respectively. At this time, the rotary motor 91411 has not yet driven the second shaft 91322 to rotate. When it is necessary to transfer the substrate holder 6, the rotary motor 91411 will drive the second shaft 91322 to rotate while also driving the second turntable 9142 to rotate.

[0170] When the substrate holder 6 needs to be transferred, the second turntable 9142 will rotate. During the rotation of the second turntable 9142, the third photoelectric sensor 9147 will first pass through the third through hole 91423. At this time, the hook 91212 and the support block 91221 of the hinge plate 91211 will lift the positioning block 61 and the grinding rod of the substrate holder 6 respectively. Then, under the continuous drive of the rotary motor 91411, the beam of the second photoelectric sensor 9146 passes through the second through hole 91422. At this time, the substrate holder 6 has been placed on the transfer track 5. After the substrate holder 6 is transferred to the transfer track 5, the transfer module 9 resets, and the hook 9122 gradually separates from the positioning block 61 of the substrate holder 6.

[0171] In general, the first sealing mechanism 11 is opened first to allow the first substrate holder 6 to enter the conveying section 41 of the inlet / outlet chamber 2. Then the first sealing mechanism 11 is closed, and the air pressure in the inlet / outlet chamber 2 is made the same as the air pressure in the process chamber 3 through the first vacuum system. Then the second sealing mechanism 12 is opened to allow the first substrate holder 6 to be conveyed from the inlet / outlet chamber 2 to the conveying section 41 of the first process chamber 3. Then the second sealing mechanism 12 is closed, and the first positioning mechanism 101 detects whether the substrate holder 6 in the process chamber 3 has reached the coating position. After reaching the coating position, it is fixed by the fixing mechanism 8 to complete the coating.

[0172] Next, the second substrate holder 6 enters the infeed / outfeed chamber 2 in the manner described above and waits. After the substrate of the first substrate holder 6 is coated in the first process chamber 3, the second sealing mechanism 12 is opened, and the substrate holder 6 in the first process chamber 3 enters the second process chamber 3. The substrate holder 6 waiting in the infeed / outfeed chamber 2 enters the first process chamber 3. Then the second sealing mechanism 12 is closed, and the above working process is repeated to allow the substrate to be coated continuously.

[0173] In simple terms, the substrate holder 6 waiting in the inlet / outlet chamber 2 can only enter the first process chamber 3 for coating after the substrate in the substrate holder 6 in the first process chamber 3 has completed coating. After the substrate in the first process chamber 3 has completed coating, the second sealing mechanism 12 opens to allow it to enter the second process chamber 3. This process is repeated so that the substrates on the substrate holder 6 waiting in the inlet / outlet chamber 2 can enter the three process chambers 3 in sequence to complete the coating of the three materials.

[0174] After the substrate on the substrate holder 6 is coated in the third process chamber 3, the transfer module 9 will transfer the substrate holder 6 on the transfer section 41 to the output section 51 and then reset it. During the reset process, the hook 9121 will gradually separate from the positioning block 61, the second sealing mechanism 12 will open, the substrate holder 6 in the second process chamber 3 will be transported to the third process chamber 3, the substrate holder 6 in the first process chamber 3 will be transported to the second process chamber 3, and the substrate holder 6 in the inlet / outlet chamber 2 will be transported to the first process chamber 3. The substrate holder 6 in all three process chambers 3 will be detected by the first positioning mechanism 101 to see if it has reached the coating position.

[0175] When the substrate holders 6 in the third process chamber 3 have all reached the coating position, there are two substrate holders 6 in the third process chamber 3. The fixing mechanism 8 is activated, and the fixing mechanism 8 will fix the substrate holders 6 at the coating position and the coating avoidance position. After the substrates of the substrate holders 6 at the coating position have completed the coating, the fixing mechanism 8 will be released. Then the second sealing mechanism 12 will be opened, and the substrate holders in the third process chamber 3 will be output through the output section 51.

[0176] The substrate holder 6 on the output section 51 in the third process cavity 3 will be transported back and then transported to the output section of the second process cavity 3. During the transfer process, the substrate holder 6 on the transfer section 41 will be lifted by the transfer module 9. Therefore, the vertical lifting mechanism 7 in the third process cavity 3 will drive the magnetic suction component 103 to move upward to avoid interference. After being transferred to the output section 51, the vertical lifting mechanism 7 will drive the magnetic suction component 103 to move downward. The other transfer sections 41 will transport the substrate holder 6 to the transfer section 41 of the next process cavity 3 for coating.

[0177] After repeating the above process, two substrate holders 6 will coexist in the three process chambers 3. Therefore, the substrate holder 6 on the output section 51 of the first process chamber 3 needs to be discharged to be transported to the inlet / outlet chamber 2. First, open the second sealing mechanism 12 to allow the substrate holder 6 of the first process chamber 3 to enter the inlet / outlet chamber 2, then close the second sealing mechanism 12. Then, open the first sealing mechanism 11 after the air pressure in the inlet / outlet chamber 2 is the same as the atmospheric pressure through the air rupture valve assembly 21.

[0178] Generally, when the production cycle requirement is not high, the substrate holder 6 on the conveyor track 5 can also be directly conveyed out. That is, after the substrate holder 6 has completed coating in the third process chamber 3, it is transferred to the conveyor track 5 through the transfer module 9. Then, the second sealing mechanism 12 is opened, and the substrate holder 6 in the inlet / outlet chamber enters the first process chamber 3, the substrate holder 6 in the first process chamber 3 enters the second process chamber 3, and the substrate holder 6 in the second process chamber 3 enters the third process chamber 3. However, the fixing mechanism 8 does not fix the substrate holder 6 first. Instead, after the substrate holder 6 that has completed three coatings is conveyed out to the inlet / outlet chamber 2 by the conveyor track 5, the fixing mechanism 8 fixes the substrate holder 6 on the conveyor track 4. Then, the second sealing mechanism 12 is closed.

[0179] This embodiment also includes a controller, which has a PLC system well known to those skilled in the art. The first drive mechanism 413, the second drive mechanism 513, the vertical lifting mechanism 7, the first through-beam sensor 1012, the second through-beam sensor 1022, the drive motor 817, the rotary motor 91411, the first photoelectric sensor 9145, the second photoelectric sensor 9146, the third photoelectric sensor 9147, and the fourth photoelectric sensor 9148 are electrically connected to the controller. The PLC system controls the operations mentioned above. Regarding the electrical connection, an electrical connection well known to those skilled in the art is used, or a wiring harness connection could also be used.

Claims

1. A sputtering coating system, characterized in that, The device includes a main body, a conveying track, an output track, and a substrate holder. The main body has multiple chambers that are connected sequentially along the X-axis. Along the X-axis, the first chamber is the material inlet / outlet chamber, and the remaining chambers are all process chambers. The main body of the equipment also has an inlet / outlet channel communicating with the inlet / outlet chamber, the inlet / outlet channel being controlled to open and close by a first sealing mechanism; the chambers are connected to each other by a second sealing mechanism. Both the conveying track and the output track are provided with multiple chambers. The conveying track is used to transport the substrate holder from the inlet / outlet chamber to the last process chamber along the X-axis direction. The output track is used to transport the substrate holder in the last process chamber back to the inlet / outlet chamber. The last process cavity is equipped with the transfer module, which is used to transfer the substrate holder on the transfer track to the output track.

2. The sputtering coating system according to claim 1, characterized in that, The sputtering coating system further includes a first vacuum system, a gas breaker valve assembly, a sputtering cathode assembly, and a second vacuum system. The inlet and outlet chambers are connected to the first vacuum system and the gas breaker valve assembly, and each process chamber is connected to the sputtering cathode assembly and the second vacuum system. The conveying track includes multiple conveying sections, and each of the chambers is provided with a conveying section; The transmission track includes multiple transmission sections, and each of the chambers is provided with a transmission section; In the last process chamber, the transfer module is used to transfer the substrate holder from the transfer section to the output section; In the process chamber, the sputtering cathode assembly, the conveying section, and the output section are arranged at intervals along the positive direction of the Y-axis. The X-axis direction is perpendicular to the Y-axis direction.

3. The sputtering coating system according to claim 2, characterized in that, The top of the substrate holder is made of magnetic material; The sputtering coating system also includes a support, a first drive mechanism, and a second drive mechanism; Each of the chambers has a plurality of supports arranged at intervals along the X-axis on its top wall; The conveying section includes multiple conveying wheels and multiple first magnetic strips. The multiple conveying wheels are spaced apart on the bottom wall of the chamber along the X-axis. The circumferential surface of each conveying wheel has a first recess that mates with the grinding rod of the substrate holder. Each conveying wheel is connected to a first driving mechanism, which drives the conveying wheel to rotate. The multiple first magnetic strips are connected one by one to the bottom of each support in the corresponding chamber. The length direction of the first magnetic strips extends along the X-axis. The first magnetic strips are used to attract the substrate holder conveyed by the conveying wheels so that the substrate holder remains upright. The output section includes multiple output wheels and multiple second magnetic strips. The multiple output wheels are spaced apart on the bottom wall of the chamber along the X-axis. The circumferential surface of each output wheel has a second recess that mates with the grinding rod of the substrate holder. Each output wheel is connected to a second driving mechanism for driving the output wheel to rotate. The multiple second magnetic strips are connected one by one to the bottom of each bracket in the corresponding chamber. The length direction of the second magnetic strips extends along the X-axis. The second magnetic strips are used to attract the substrate holder being transported by the output wheels so that the substrate holder remains upright.

4. The sputtering coating system according to claim 3, characterized in that, The sputtering coating system also includes a vertical lifting mechanism and a magnetic suction assembly; the number of supports in the process cavity is two; and the magnetic suction assembly is provided between the two supports in the process cavity. The vertical lifting mechanism is provided at the top of the process cavity. The vertical lifting mechanism is connected to the magnetic suction assembly and is used to drive the magnetic suction assembly to rise and fall. The magnetic suction assembly includes a connecting plate, a first magnetic block, and a second magnetic block. The connecting plate is located between the two brackets and is connected to the telescopic end of the vertical lifting mechanism. The first magnetic block and the second magnetic block are spaced apart at the bottom of the connecting plate along the positive direction of the Y-axis. The length directions of the first magnetic block and the second magnetic block are parallel to the X-axis direction. The first magnetic block is located above the conveying section and is used to attract the substrate holder conveyed by the conveying wheel so that the substrate holder is kept upright. The second magnetic block is located above the output section, and the first magnetic block is used to attract the substrate holder conveyed by the output wheel so that the substrate holder remains upright.

5. The sputtering coating system according to claim 2, characterized in that, In the process chamber, the conveying section is provided with a coating position, and the output section is provided with a coating avoidance position. The coating position and the coating avoidance position are directly opposite each other along the Y-axis direction. The substrate of the substrate holder at the coating avoidance position is shielded by the substrate of the substrate holder at the coating position to avoid re-coating. The sputtering coating system further includes a first positioning mechanism, a second positioning mechanism, and a fixing mechanism. The first positioning mechanism and the second positioning mechanism are connected to the main body of the equipment, and each process cavity is provided with the first positioning mechanism and the second positioning mechanism. The first positioning mechanism and the second positioning mechanism are located above the process cavity. The first positioning mechanism is used to detect whether the substrate holder in the conveying section has reached the coating position, and the second positioning mechanism is used to detect whether the substrate holder in the output section has reached the coating avoidance position. Each process cavity is provided with the fixing mechanism, which is used to fix the substrate holder on the conveying section and the output section.

6. The sputtering coating system according to claim 5, characterized in that, The first positioning mechanism includes two first fixing seats spaced apart on the main body of the device along the X-axis direction, and the first fixing seats are provided with a first viewing window; Each of the first fixed bases is detachably connected to a set of first through-beam sensors, the beams of which can pass through the first viewing window and enter the corresponding process cavity; the substrate holder is positioned at both ends along its length by two sets of first through-beam sensors to ensure that the substrate holder is on the coating position; each set of first sensors has three sensors. The second positioning mechanism includes two second fixing seats spaced apart on the main body of the device along the X-axis direction, and the second fixing seats are provided with a second viewing window; Each of the second fixed bases can be detachably connected to a set of second through-beam sensors, the beams of which can pass through the second viewing window and enter the corresponding process cavity; The substrate holder is positioned at both ends along its length by two sets of the second through-beam sensors to ensure that the substrate holder is in the coating avoidance position; each set of the second sensors consists of three sensors. Among them, in the first positioning mechanism and the second positioning mechanism that are set for the same process cavity, the two first fixed seats and the two second fixed seats are arranged one-to-one and spaced apart along the positive direction of the Y-axis.

7. The sputtering coating system according to claim 5, characterized in that, Two fixing blocks are provided on one side of the bottom of the substrate holder, and the two fixing blocks are spaced apart along the X-axis direction; The fixing mechanism includes two clamping components symmetrically arranged in the process cavity, and the clamping components correspond one-to-one with the fixing blocks; The clamping assembly includes a mounting base, a rotating shaft, and a drive motor; The mounting base is disposed on the bottom wall of the process cavity, and the mounting base is provided with two fixing plates arranged at intervals along the Y-axis direction; The axis of the rotating shaft is parallel to the Y-axis direction, and the rotating shaft is rotatably inserted through the two fixed plates, and the rotating shaft is rotatably connected to the two fixed plates. A first swing block and a second swing block are fixedly connected to the rotating shaft. The first swing block is provided with a first pulley, and the second swing block is provided with a second pulley. The first pulley is located between the sputtering cathode and the conveying section, and the second pulley is located between the conveying section and the output section; The drive motor is connected to the main body of the equipment and located outside the process chamber. The output end of the drive motor is connected to the rotating shaft. The drive motor is used to drive the rotation of the rotating shaft to drive the first swing block and the second swing block to swing. The two first pulleys cooperate to clamp the two fixed blocks to fix the substrate holder on the coating position. The two second pulleys cooperate to clamp the two fixed blocks to fix the substrate holder on the coating avoidance position.

8. The sputtering coating system according to claim 2, characterized in that, Positioning blocks are provided on both sides of the substrate holder; The transfer module includes two lifting units symmetrically arranged in the process cavity, and the lifting unit corresponds one-to-one with the positioning block; The lifting unit includes a base, a swing frame, a transmission structure, and a rotary drive mechanism; The base is fixedly connected to the bottom wall of the process cavity, and the base has a first plate and a second plate spaced apart along the X-axis direction; The swing frame is disposed between the first plate and the second plate. The top of the swing frame is hinged to a first lifting assembly, and the bottom of the swing frame is provided with a second lifting assembly. The transmission structure connects the first plate, the swing frame, and the first lifting assembly; The rotary drive mechanism is connected to the main body of the equipment and is connected to the transmission structure. The rotary drive mechanism drives the transmission structure to swing the swing frame and the first lifting assembly. When the swing frame swings, the first lifting component lifts the positioning block, and at the same time, the second lifting component lifts the grinding rod of the substrate holder, and then transfers the substrate holder to the output track.

9. The sputtering coating system according to claim 2, characterized in that, The first lifting assembly includes a hinge plate hinged to the top of the swing frame. The top of the hinge plate is provided with a hook for engaging with the positioning block. The transmission structure connects the first plate, the swing frame, and the hinge plate. The second lifting assembly includes a support block connected to the swing frame, and the support block is provided with a V-groove for engaging with the grinding rod of the substrate holder; The transmission structure includes a first turntable, a first crankshaft, a mounting plate, a second crankshaft, a swing arm, a rotating shaft, and a linkage rod; The first turntable is connected to the bottom of the first plate body. The first crankshaft has a first shaft and a second shaft. One end of the first shaft passes through the swing frame and is eccentrically connected to one side of the first turntable. The second shaft is connected to the rotary drive mechanism. The mounting plate is installed on the top of the first plate body, the second crankshaft is located above the first crankshaft, the second crankshaft has a third shaft and a fourth shaft, one end of the third shaft passes through the mounting plate and is rotatably connected to the mounting plate, one end of the fourth shaft passes through the swing frame, and a cam is provided on the end of the fourth shaft; The swing rod is arranged vertically, and the upper end of the swing rod is eccentrically connected to the end of the third shaft through the second connector, and the lower end of the swing rod is eccentrically connected to the other side of the first turntable through the first connector. The rotating shaft is horizontally mounted on the swing frame and rotatably connected to the swing frame. One end of the rotating shaft is provided with a first swing element, and the other end of the rotating shaft is provided with a second swing element. The linkage rod is arranged vertically, with its lower end hinged to the first swing member and its upper end hinged to the hinge plate. The second swing member is provided with a roller, the surface of which contacts the surface of the cam. The swing frame is also provided with a fixing member on the side near the cam, and the fixing member and the second swing member are connected by a spring.

10. The sputtering coating system according to claim 9, characterized in that, The rotary drive mechanism includes a reducer, a second turntable, a detection base, and a rotary motor; The reducer is located on the side of the second plate away from the swing frame. One end of the second shaft passes through the second plate and the reducer. The end of the second shaft is connected to one side of the second turntable. The rotary motor is located on the main body of the equipment and is connected to the reducer. The second turntable is provided with a first through hole, a second through hole, a third through hole, and a fourth through hole; the distances of the first through hole, the second through hole, the third through hole, and the fourth through hole from the center of the turntable increase sequentially; The center of the second turntable, the center of the first through hole, and the center of the fourth through hole are arranged sequentially from top to bottom along the radial direction of the turntable; The second through hole and the third through hole are spaced apart along the Y-axis, and the center of the second turntable is located between the second through hole and the third through hole; The detection base is located inside the process cavity. A third viewing window is provided on the side of the detection base near the second turntable. A first photoelectric sensor, a second photoelectric sensor, a third photoelectric sensor, and a fourth photoelectric sensor are arranged sequentially from top to bottom inside the detection base. In the initial state, the light beams of the first photoelectric sensor and the fourth photoelectric sensor can pass through the first through hole and the fourth through hole respectively, while the light beams of the second photoelectric sensor and the third photoelectric sensor are blocked by the second turntable. When the second turntable rotates, the light beam from the third photoelectric sensor first passes through the third through hole, and then the light beam from the second photoelectric sensor passes through the second through hole.

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