A pipe cleaning device for a SiC-CVD apparatus

Abstract

The application discloses a pipeline cleaning device for SiC-CVD equipment, and relates to the technical field of pipeline cleaning, which comprises a lye pool, a liquid level meter, a PH meter, a pump body, a filter, a blowing device and a monitoring device; the inside of the lye pool is provided with a cavity, and an exhaust port is formed in the top of the lye pool; the liquid level meter and the PH meter are arranged on the lye pool; the lye pool outwardly extends a pipeline connected with the pump body, the filter is arranged on the pipeline; the pump body outwardly extends a pipeline for being connected with a vacuum pipeline, and the lye pool is further provided with a pipeline for flowing back of lye; the blowing device comprises an air inlet pipe, and the air inlet pipe is communicated with the inside of the vacuum pipeline; and the monitoring device is used for monitoring the H2 concentration and the HCl concentration of the inside and the surrounding space of the vacuum pipeline. The application can effectively improve the efficiency and effect of vacuum pipeline cleaning, and can effectively guarantee the safety in the vacuum pipeline cleaning process.

Description

Technical Field

[0001] This application relates to the technical field of pipeline cleaning, and in particular to a pipeline cleaning device for SiC-CVD equipment. Background Technology

[0002] CVD (Chemical Vapor Deposition) technology enables gaseous silicon and carbon sources to react chemically on the surface of a substrate, depositing high-purity SiC (silicon carbide). High-purity silicon carbide is a new generation of semiconductor material with excellent overall performance. Silicon carbide prepared by this method has the characteristics of high purity, good density, low residual stress, and good crystallinity, and is therefore widely used in electronics, semiconductors and other fields.

[0003] However, byproducts are generated during the CVD process. Among these, higher-order chlorosilanes are widely present byproducts in CVD processes for preparing SiC coatings, SiC epitaxy, and Si epitaxy. These substances are highly susceptible to hydrolysis and pose a risk of fire or explosion upon contact with metal or in water. Furthermore, their adhesion to vacuum pipes can cause blockages, affecting experimental results and even disrupting the normal operation of the experiment.

[0004] Currently, there is no efficient and safe method for handling byproducts (higher chlorosilanes) in pipelines. They are typically removed by manual alkaline cleaning. However, manual cleaning is inefficient, severely impacting process progress. Furthermore, the flammable and explosive nature of these byproducts poses a significant safety hazard to operators. Summary of the Invention

[0005] This application provides a pipe cleaning device for SiC-CVD equipment, which can effectively improve the efficiency and effect of vacuum pipe cleaning, while also ensuring safety during the vacuum pipe cleaning process.

[0006] This application provides a pipeline cleaning device for SiC-CVD equipment, which adopts the following technical solution: A pipeline cleaning device for SiC-CVD equipment includes an alkaline solution tank, a level gauge, a pH meter, a pump body, a filter, an air blowing device, and a monitoring device. The alkaline solution tank has an internal cavity for storing alkaline solution, and an exhaust port is provided at the top of the alkaline solution tank, and the cavity is connected to the outside through the exhaust port; Both the level gauge and the pH meter are installed on the alkaline solution tank; The alkaline solution tank extends outward through a pipe connected to the pump body, and the filter is installed on the pipe to filter out byproducts in the alkaline solution. The pump body extends outward with a pipe for connecting and communicating with a vacuum pipe, and the alkali tank is also provided with a pipe for the alkali to flow back to the cavity. The blowing device includes an air inlet pipe that communicates with the interior of the vacuum pipe and is used to blow safety inert gas into the interior of the vacuum pipe. The monitoring device is used to monitor the H2 and HCl concentrations inside and around the vacuum pipe.

[0007] By adopting the above technical solution, the air blowing device first blows safe inert gas into the vacuum pipeline to provide a safe environment for subsequent alkaline rinsing. After the vacuum pipeline is cleaned, safe inert gas is blown in again to control the concentration of hazardous substances such as H2 and HCl in the surrounding area, further improving the safety of the cleaning process. At the same time, a dry vacuum pipeline can be obtained, thereby effectively improving the efficiency and effect of vacuum pipeline cleaning and ensuring the safety of the vacuum pipeline cleaning process. In addition, the liquid level, pH value, and H2 and HCl concentrations in the alkaline tank can be seen during the cleaning process, which can facilitate the staff to intuitively observe and prevent the cleaning operation.

[0008] Optionally, it also includes a support frame for supporting the long tube in the vacuum pipe; The end of the long pipe away from the pump body is connected to the alkali solution tank, the air inlet pipe is set on the pipe extending outward from the pump body, and the monitoring device is set on the alkali solution tank.

[0009] By adopting the above technical solution, the pipeline cleaning device can be conveniently used to clean long pipes in vacuum pipelines, thereby effectively improving cleaning efficiency.

[0010] Optionally, it also includes an air disc with multiple air holes on its surface and a guide tube for guiding the flow of alkali solution; The gas plate is disposed in the cavity, the alkaline solution is located below the gas plate, and the space above the gas plate in the cavity is connected to the long pipe and the exhaust port; the short pipe in the vacuum pipe is located above the gas plate and is connected to the long pipe. The air inlet pipe is also provided on the alkaline solution tank, and the air inlet pipe communicates with the space above the alkaline solution in the cavity; The guide tube is disposed on the air plate and located below the air plate. The top of the guide tube passes through the air plate and communicates with the end of the short tube away from the long tube. The bottom of the guide tube communicates with the cavity located below the air plate.

[0011] By adopting the above technical solution, both long and short pipes in the vacuum pipeline can be cleaned simultaneously, thereby improving the universality of cleaning various types of pipes in the vacuum pipeline. At the same time, it can effectively improve the efficiency of the blowing device in providing protection and drying effects. Furthermore, the guide tube can make the byproducts in the cleaned vacuum pipeline react more completely in the alkaline solution, thereby shortening the reaction time to a certain extent.

[0012] Optionally, the gas plate is used to support the short pipe, the gas plate is rotatably connected to the alkali tank, and the guide pipe is eccentrically arranged on the gas plate to adapt to the short pipe of different shapes.

[0013] By adopting the above technical solution, the positional stability of the short tube after it is connected to the long tube in the cavity can be effectively improved. At the same time, it can facilitate the connection of short tubes of different shapes with the long tube in the cavity and communicate with the guide tube, thereby further improving the universality of the pipeline cleaning device for different short tubes.

[0014] Optionally, the air inlet pipe disposed on the alkaline solution tank communicates with the space above the gas plate in the cavity; The alkaline solution tank has an arc-shaped cavity around the gas plate. The gas plate has multiple air guide plates above it, and the multiple air guide plates avoid the multiple air holes. An air guide channel is formed between adjacent air guide plates. One end of the air guide channel communicates with the arc-shaped cavity, and the other end of the air guide channel is close to the position where the guide pipe passes through the gas plate.

[0015] By adopting the above technical solution, during the process of blowing inert gas into the air inlet pipe of the alkali tank, the alkali liquid that remains on the surface of the gas plate due to splashing can be driven towards the inlet guide pipe, thereby effectively improving the alkali liquid recovery effect.

[0016] Optionally, the top of the support frame wraps around the long tube to form a detachable connection, and the bottom of the support frame has a structure for adjusting the height of the support frame.

[0017] By adopting the above technical solution, the support and positioning effect of the support frame on long tubes can be effectively improved, and the support frame can be conveniently used to support and position long tubes of different specifications.

[0018] Optional features include a cleaning tank and clamps; The cleaning tank has a cleaning space inside for cleaning the pneumatic valve of the vacuum pipeline. The cleaning space is connected to the alkali tank and the pump body through a pipeline. The air inlet pipe and the monitoring device are both installed on the cleaning tank, and the bottom of the cleaning space has an inclined surface that slopes downward toward the alkali tank. The clamp is disposed in the cleaning space, and the clamp has a slot for the pneumatic valve to be inserted into. After the pneumatic valve is installed on the clamp, the functional part and the connecting part of the pneumatic valve are located above and below the clamp, respectively. The connecting part of the pneumatic valve allows the alkaline solution in the cleaning space to flow, and the alkaline solution in the cleaning space remains below the clamp.

[0019] By adopting the above technical solution, the pipeline cleaning device can easily clean the pneumatic valves in the vacuum pipeline. During the cleaning process, the waterproofing and stability of the electrical components such as the functional parts of the pneumatic valve are also taken into consideration. This can effectively reduce the probability of the functional parts of the pneumatic valve being damaged due to contact with alkaline solution while ensuring the cleaning effect.

[0020] Optionally, the fixture has two slots, and when two pneumatic valves are installed on the fixture at the same time, the connecting parts of the two pneumatic valves are connected.

[0021] By adopting the above technical solution, the pipeline cleaning device can conveniently clean the connecting parts of two pneumatic valves at the same time, thereby further improving the cleaning efficiency of the pneumatic valves.

[0022] Optionally, the clamp is movably connected to the cleaning tank to adjust the height position of the pneumatic valve in the cleaning space.

[0023] By adopting the above technical solution, pneumatic valves of different specifications and sizes can be easily installed on the fixture for cleaning, effectively improving the universality of the cleaning device for different pneumatic valves.

[0024] Optionally, it also includes a chassis located at the bottom, and the chassis has a groove for storing alkali leakage.

[0025] By adopting the above technical solution, it is possible to prevent leaked or splashed alkaline liquid from directly corroding the ground, while also facilitating the collection of leaked liquid and making it easier for staff to handle the situation.

[0026] In summary, this application includes at least one of the following beneficial effects: 1. It can automatically clean the vacuum pipes of different components on SiC-CVD equipment, effectively cleaning the by-products (such as higher chlorosilanes) attached to the different components of the vacuum pipes. 2. Effective risk control ensures high safety during the cleaning process. The concentration of hazardous substances is reduced by using safe inert gas to effectively control the risk of combustion and explosion and create a waterless environment, resulting in a dry vacuum pipeline after cleaning. 3. Facilitates visual and dynamic monitoring of the cleaning equipment by staff, including the level of the alkali tank, pH value, and H2 and HCl concentrations, enabling staff to make judgments based on the situation and further improving the safety of use.

[0027] 4. During the cleaning process, it has high applicability to different components of vacuum pipelines. At the same time, it can protect the functional parts of pneumatic valves from the influence of alkaline solution during the cleaning of the connecting parts of pneumatic valves, thereby effectively reducing the probability of malfunction and damage after cleaning. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the structure of a pipeline cleaning device for SiC-CVD equipment in Embodiment 1; Figure 2 This is a schematic diagram of the internal structure of the alkali tank in Example 1; Figure 3 This is a vertical sectional view of the alkali tank in Example 1; Figure 4 This is a schematic diagram of the structure of a pipeline cleaning device for SiC-CVD equipment in Embodiment 2; Figure 5 This is a cross-sectional view of the alkali tank in Example 2; Figure 6 This is a schematic diagram of the structure of a pipeline cleaning device for SiC-CVD equipment in Example 3; Figure 7 This is a schematic diagram of the internal structure of the cleaning tank in Example 3; Figure 8 This is a partial cross-sectional view of a pipe cleaning device for a SiC-CVD equipment according to Embodiment 3; Figure 9 This is a cross-sectional view of the cleaning tank in Example 4.

[0029] Explanation of reference numerals in the attached drawings: 1. Vacuum pipe; 11. Long pipe; 12. Short pipe; 13. Pneumatic valve; 131. Functional part; 132. Connecting part; 2. Alkali tank; 21. Cavity; 22. Exhaust port; 23. Arc-shaped cavity; 3. Pump body; 4. Air blowing device; 41. Air inlet pipe; 5. Support frame; 6. Air plate; 61. Air hole; 62. Guide pipe; 63. Air guide plate; 64. Air guide channel; 7. Chassis; 71. Groove; 8. Cleaning tank; 81. Cleaning space; 9. Clamp; 91. Slot; 101. Level gauge; 102. pH meter; 103. Filter; 104. Monitoring device. Detailed Implementation

[0030] The following is in conjunction with the appendix Figure 1-9 This application will be described in further detail.

[0031] This application discloses a pipeline cleaning device for SiC-CVD equipment, used to clean the vacuum pipeline of SiC-CVD equipment and remove byproducts (such as higher chlorosilanes) generated during the CVD process inside the vacuum pipeline.

[0032] After the vacuum pipeline is dismantled, it includes a long pipe with a larger length dimension, a short pipe with a smaller length dimension, and a pneumatic valve for controlling the passage of substances. In this embodiment, the long pipe is preferably a straight pipe with a length dimension greater than 45 mm; the short pipe is preferably a straight pipe with a length dimension less than 45 mm or a pipe with other extended trajectories (the attached figure shows a pipe with one end bent at 90° as an example).

[0033] Example 1: Reference Figure 1 and Figure 2 This embodiment is used to clean the long tube 11 and the short tube 12 in the vacuum pipeline 1, and can clean one long tube 11 and one short tube 12 at the same time.

[0034] The pipeline cleaning device includes an alkaline solution tank 2, a level gauge 101, a pH meter 102, a pump body 3, a filter 103, an air blowing device 4, a monitoring device 104, a support frame 5, an air plate 6, and a chassis 7. The system includes: an alkali tank 2 for storing alkali solution used to clean the vacuum pipeline 1; a level gauge 101 and a pH meter 102 for visualizing changes in the liquid level and pH value in the alkali tank 2; a pump 3 for driving the alkali solution in the alkali tank 2 to flow out along the pipeline, and the outflowing alkali solution can return to the alkali tank 2 to form a cycle; a filter 103 for filtering the alkali solution flowing out of the alkali tank 2, filtering out byproducts washed away by the alkali solution; an air blowing device 4 for blowing safe inert gas into the space where the cleaning location is located, creating a safe environment for the cleaning process; a monitoring device 104 for monitoring the concentration of hazardous substances in the space where the cleaning location is located; a support frame 5 and an air plate 6 for providing support for the long pipe 11 and the short pipe 12 during the cleaning process; and a chassis 7 located at the bottom of the other structures of the pipeline cleaning device to prevent leaked or splashed alkali solution from contacting the ground.

[0035] The chassis 7 has a rectangular tray structure. The chassis 7 has a groove 71 for collecting and storing alkaline solution that leaks or splashes during the cleaning process. The other structures of the pipe cleaning device are installed on the top of the chassis 7, and the area occupied by the groove 71 can cover the other structures of the pipe cleaning device vertically upward.

[0036] Reference Figure 2 and Figure 3The alkali solution tank 2 has a cylindrical barrel-shaped structure. Inside, there is a cylindrical cavity 21 for storing alkali solution. The axis of the cavity 21 coincides with the axis of the alkali solution tank 2 and is perpendicular to the plane of the bottom of the chassis 7. An exhaust port 22 is provided at the top of the alkali solution tank 2, allowing the cavity 21 to communicate with the factory's ventilation system, facilitating the timely discharge of waste gas from the cavity 21. In this embodiment, the alkali solution tank 2 is preferably installed on the chassis 7 near one end along the length of the chassis 7. The accompanying drawings only show the exhaust port 22 and omit the related ventilation structure.

[0037] The level gauge 101 and pH meter 102 are both fixedly installed on the periphery of the alkali tank 2, allowing operators to easily determine the liquid level and pH value of the alkali solution in the cavity 21 using the level gauge 101. This facilitates operators in judging whether to add or replace the alkali solution. In this embodiment, since the level gauge 101 and pH meter 102 are common existing technologies, they will not be described in detail here, and only a brief representation is given in the accompanying drawings.

[0038] Reference Figure 1 The pump body 3 is fixedly mounted on the chassis 7 via a base, and the input end of the pump body 3 is connected to the alkali tank 2 via a pipe. In this embodiment, the pump body 3 is preferably mounted on the chassis 7 near the end of the chassis 7 away from the alkali tank 2; preferably, the end of the pipe near the alkali tank 2 is connected to the bottom of the cavity 21 and is fixedly connected to the alkali tank 2 via a one-way valve, so that the operation of the pump body 3 can drive the alkali in the cavity 21 to flow out unidirectionally through the pipe; since the pump body 3 with the above functions is common prior art, it will not be described in detail here, and it is only briefly shown in the accompanying drawings.

[0039] The output end of the pump body 3 is connected to a pipe that connects one end of the long pipe 11. The side of the alkali tank 2 near the top has a connector that connects one end of the long pipe 11 and the other end of the short pipe 12. The long pipe 11 can be installed between the end of the pipe away from the pump body 3 and the connector, so that the alkali tank 2 can form a passage for the circulation of alkali through the pipe and the long pipe 11.

[0040] The support frame 5 is installed between the pipe connected to the output end of the pump body 3 and the joint installed on the alkali tank 2, and the support frame 5 is installed in a vertical position along its length. When the long pipe 11 is in the position to be cleaned after installation, the support frame 5 is located below the long pipe 11, contacting and abutting against the long pipe 11, and providing support and positioning. In this embodiment, the pipe cleaning device preferably includes one support frame 5.

[0041] Reference Figure 1 and Figure 2The filter 103 is fixedly installed on the pipe connected to the input end of the pump body 3, so that the alkaline solution flowing out along the pipe driven by the operation of the pump body 3 can be filtered when it passes through the location of the filter 103, effectively reducing the by-products mixed in the alkaline solution.

[0042] Reference Figure 2 and Figure 3 The gas plate 6 has a circular disc structure, and multiple air holes 61 are opened through the gas plate 6 along its own axis. The gas plate 6 is fixedly installed on the alkali tank 2 and located in the cavity 21. The axis of the gas plate 6 coincides with the axis of the alkali tank 2, and the peripheral surface of the gas plate 6 is in contact with the peripheral inner wall of the cavity 21.

[0043] At this time, the gas plate 6 divides the cavity 21 into upper and lower spaces. The alkaline solution stored in the cavity 21 is located below the gas plate 6. The connector installed on the alkaline solution tank 2 is connected to the space in the cavity 21 above the gas plate 6, and the two spaces in the cavity 21 located above and below the gas plate 6 are connected through the air hole 61.

[0044] A guide pipe 62 for guiding the flow of alkali solution is fixedly installed on the gas plate 6. One end of the guide pipe 62 is fixedly connected to the gas plate 6 and passes through the space above the gas plate 6 and communicates with the cavity 21. The other end of the guide pipe 62 is close to the bottom of the cavity 21 and communicates with the space below the gas plate 6.

[0045] The short tube 12 to be cleaned is installed in the space above the air plate 6 in the cavity 21. After one end of its straight section is connected to the connector installed on the alkali tank 2, the short tube 12 will come into contact with the air plate 6, so that the air plate 6 provides support for it. At the same time, one end of the bent section of the short tube 12 is close to the top of the guide tube 62, so that the alkali solution entering the short tube 12 can eventually flow into the guide tube 62 and return to the bottom of the alkali solution in the cavity 21.

[0046] Reference Figure 1 and Figure 3 Two air blowing devices 4 are installed. One device is mounted on the alkali tank 2, and the other is mounted on a pipe connected to the output end of the pump body 3. The former is used to blow inert gas into the space above the alkali solution in the cavity 21, and the latter is used to blow inert gas into the corresponding pipes, allowing it to enter the interior of the long pipe 11 and the short pipe 12 sequentially. In this embodiment, nitrogen (N2) is preferably used as the inert gas blown in by the air blowing device 4.

[0047] The air blowing device 4 includes an air inlet pipe 41, which allows operators to control the air supply equipment to be connected to the air inlet pipe 41 via a pipe to blow in safe inert gas. In this embodiment, since the air blowing device 4 with the above-mentioned functions is common prior art, it will not be described in detail here. The air inlet pipe 41 is only briefly shown in the accompanying drawings, and other structures of the air blowing device 4 are omitted.

[0048] The monitoring device 104 is installed on top of the alkali tank 2 to monitor the concentrations of H2 and HCl in the cavity 21. When the concentration of H2 or HCl exceeds the safe value, different modules of the monitoring device 104 will emit buzzer and light alarms to serve as a warning. In this embodiment, since the monitoring device 104 with the above functions is common prior art, it will not be described in detail here, and it is only briefly shown in the accompanying drawings.

[0049] The implementation principle of a pipeline cleaning device for SiC-CVD equipment according to an embodiment of this application is as follows: When cleaning the long tube 11 and short tube 12 in the vacuum pipeline 1, firstly, two air blowing devices 4 are activated to blow in safe inert gas, so that the environment around the installation positions of the long tube 11 and short tube 12 is filled with safe inert gas, creating a safe cleaning environment; then, the long tube 11 and short tube 12 are installed in their corresponding positions, and after a period of time (e.g., 30 seconds) after installation, the air blowing devices 4 are turned off; then, the pump body 3 is activated to drive the alkali solution in the alkali solution tank 2 to flow through the pipeline sequentially through the long tube 11 and short tube 12 for cleaning, and finally return to the bottom of the alkali solution stored in the cavity 21 through the guide pipe 62; during the flow of the alkali solution, after leaving the alkali solution tank 2, it will be filtered by the filter 103 to remove byproducts mixed in with the alkali solution; After the cleaning process has lasted for a period of time (e.g., 5 minutes), the pump body 3 is turned off, and then the two air blowing devices 4 are restarted to blow inert gas to purge the inside of the long tube 11 and the short tube 12 (for 10 minutes), and the environment around them is refilled with inert gas. The level gauge 101, pH meter 102 and monitoring device 104 allow the staff to visually observe the situation in the alkaline solution tank 2 throughout the process. When the H2 concentration is below 4% and the HCl concentration is below 7.5 mg / m3, it indicates that the long tube 11 and the short tube 12 have been purged and the surrounding environment is safe. The long tube 11 and the short tube 12 are then removed, the air blowing device 4 is turned off, and the cleaning process is complete.

[0050] Example 2: Reference Figure 4 and Figure 5 The difference between this embodiment and embodiment 1 lies in the support frame 5, the air plate 6, and the air blowing device 4 installed on the alkali tank 2.

[0051] The top of the support frame 5 has a structure for encircling the long pipe 11 to improve the positional stability of the long pipe 11 after installation, and this structure is universally applicable to long pipes 11 with different radial dimensions; the bottom of the support frame 5 has a structure that can drive the support frame 5 to extend and retract along its own length direction, so that the support frame 5 can provide support and positioning for long pipes 11 installed at different heights. In this embodiment, the top of the support frame 5 is preferably a pipe clamp structure, and the bottom structure of the support frame 5 adjusts the height position of the top of the support frame 5 by rotating a screw; as shown in the figure, since the structures with the above functions at the top and bottom of the support frame 5 are common prior art, they will not be described in detail here, and only a brief representation is given in the figure.

[0052] At this point, it is convenient for staff to install long pipes 11 with different radial dimensions at different heights, which facilitates subsequent cleaning of the long pipes 11.

[0053] The gas plate 6 is rotatably connected to the alkali tank 2, and the rotation axis of the gas plate 6 coincides with its own axis; the guide pipe 62 on the gas plate 6 is eccentrically positioned at one end of the gas plate 6 relative to the center of the gas plate 6, and the opening formed by the guide pipe 62 passing through the gas plate 6 is located on one side of the radial direction of the center of the gas plate 6 and the radial dimension is close to the radius dimension of the gas plate 6.

[0054] At this time, it is convenient for staff to install short tubes 12 of different lengths and extension trajectories in the space above the gas plate 6 in the cavity 21. By controlling the rotation of the gas plate 6 relative to the alkali tank 2, the position of the opening formed by the guide tube 62 passing through the gas plate 6 can be adjusted, so that the end of the short tube 12 of different lengths and extension trajectories away from the long tube 11 can be smoothly connected to the guide tube 62, which facilitates the return of alkali.

[0055] For the air blowing device 4 installed on the alkali tank 2, the shell of the alkali tank 2 has an arc-shaped cavity 23 on the periphery of the air plate 6. The inner side of the arc-shaped cavity 23 has multiple openings on the inner wall of the periphery of the cavity 21, so that the arc-shaped cavity 23 and the cavity 21 are connected to the space above the air plate 6. The multiple openings are arranged in a circular array on the alkali tank 2 with the axis of the alkali tank 2 as the axis. The corresponding air inlet pipe 41 is connected to the arc-shaped cavity 23. After blowing safety inert gas into the arc-shaped cavity 23, the safety inert gas will be blown into the cavity 21 through the multiple openings in a direction parallel to the top plane of the air plate 6 and towards the center of the air plate 6. It can also have a purging effect on the surface of the top of the air plate 6, reducing the residue of alkali on the top of the air plate 6 due to splashing, and helping the alkali to flow back.

[0056] Furthermore, to further reduce the amount of alkaline residue remaining on the top of the gas plate 6, the top of the gas plate 6 preferably has multiple air guide plates 63, and the distribution positions of the multiple air guide plates 63 on the gas plate 6 avoid multiple air holes 61; the two ends of the air guide plates 63 are respectively close to the openings of the guide tube 62 and the arc-shaped cavity 23, and an air guide channel 64 is formed between adjacent air guide plates 63 to guide the safety inert gas to flow towards the direction close to the guide tube 62, so that the safety inert gas entering the cavity 21 through different openings of the arc-shaped cavity 23 can be blown to the top of the guide tube 62 along different air guide channels 64, so that the safety inert gas can drive the alkaline residue remaining on the top of the gas plate 6 to move back towards the direction close to the guide tube 62.

[0057] The implementation principle of a pipeline cleaning device for SiC-CVD equipment according to an embodiment of this application is as follows: After the long pipe 11 and short pipe 12 are cleaned, two air blowing devices 4 are activated to blow inert gas to purge the inside of the long pipe 11 and the short pipe 12. During this process, the inert gas blown in by the air blowing device 4 installed on the alkali tank 2 through the air inlet pipe 41 can first enter the arc-shaped cavity 23, and then enter different air guiding channels 64 through multiple openings of the arc-shaped cavity 23. It flows along the air guiding channel 64 towards the direction close to the guide pipe 62. During this process, the alkali liquid remaining on the top of the gas plate 6 is driven to move and flow back towards the direction close to the guide pipe 62.

[0058] Example 3: Reference Figure 6 and Figure 7 The difference between this embodiment and embodiment 1 is that a cleaning tank 8 and a clamp 9 replace the air plate 6 and support frame 5 for cleaning the pneumatic valves 13 in the vacuum pipeline 1, and two pneumatic valves 13 can be cleaned simultaneously. Furthermore, in this embodiment, the pipeline cleaning device preferably includes a blowing device 4 for blowing safe inert gas into the cleaning tank 8; and preferably, a monitoring device 104 is installed on the cleaning tank 8 for monitoring the concentration of hazardous substances inside the cleaning tank 8. In this embodiment, the pneumatic valve 13 preferably includes a functional part 131 with pneumatic function and a connecting part 132 for material flow, and the connecting part 132 of the pneumatic valve 13 is the part of the pneumatic valve 13 to be cleaned.

[0059] Reference Figure 7 and Figure 8The cleaning tank 8 has a rectangular parallelepiped structure. The bottom of the cleaning tank 8 is fixedly connected to the chassis 7 via support legs. At this point, the length and width directions of the cleaning tank 8 are parallel to the length and width directions of the chassis 7, respectively. The cleaning tank 8 is installed on the chassis 7 between the alkali tank 2 and the pump body 3 along the length of the chassis 7. In this embodiment, the top of the cleaning tank 8 preferably has a detachable cover structure. Removing the cover structure opens the top of the cleaning space 81, facilitating the installation of the pneumatic valve 13 and the clamp 9 within the cleaning space 81. Since the design of the cleaning tank 8 with the above functions is common prior art, it will not be described in detail here, and the accompanying drawings only provide a brief representation.

[0060] The cleaning tank 8 has a cleaning space 81 for the pneumatic valve 13 to clean. The end of the pipe connected to the output end of the pump body 3 is fixedly connected to the end of the cleaning tank 8 away from the alkaline solution tank 2 and communicates with the end of the cleaning space 81 away from the alkaline solution tank 2. The bottom of the cleaning tank 8 near the alkaline solution tank 2 is connected to a pipe that communicates with the cavity 21 through a connector installed on the alkaline solution tank 2.

[0061] Furthermore, to facilitate the return of the alkaline solution entering the cleaning space 81 to the alkaline solution tank 2, it is preferable that the bottom of the cleaning space 81 is an inclined surface that slopes downward toward the alkaline solution tank 2.

[0062] The air inlet pipe 41 is fixedly installed on the pipe that is connected to the output end of the pump body 3, and is located near the cleaning tank 8.

[0063] The fixture 9 has a rectangular plate-like structure. Both ends of the fixture 9 along its length are provided with slots 91 for the pneumatic valve 13 to be engaged and positioned. After the pneumatic valve 13 is engaged and positioned on the fixture 9 through the structure between its functional part 131 and the connecting part 132, the functional part 131 and the connecting part 132 of the pneumatic valve 13 will be located on both sides of the fixture 9, and at this time the connecting direction of the connecting part 132 will be parallel to the length direction of the fixture 9.

[0064] The clamp 9 is fixedly installed in the cleaning space 81. At this time, the length and width directions of the clamp 9 are parallel to the length and width directions of the cleaning tank 8, respectively. Furthermore, the connection point between the pipe connected to the output end of the pump body 3 and the cleaning space 81 is lower than the position of the clamp 9 within the cleaning space 81. In this embodiment, it is preferable that the clamp 9 has different specifications depending on the pneumatic valve 13 it is adapted to. The operator can select the corresponding clamp 9 for installation in the cleaning space 81 according to the specifications of the pneumatic valve 13 to be cleaned. Preferably, the slots 91 on the clamp 9 have different sizes depending on the specifications of the pneumatic valve 13, and two different specifications of pneumatic valve 13 can be clamped and positioned on the same clamp 9.

[0065] Reference Figure 6 and Figure 8 After the two pneumatic valves 13 are simultaneously snapped into position on the clamp 9, the connecting part 132 of the two pneumatic valves 13 can be used by the operator to connect the two together; at the same time, the connecting part 132 of the pneumatic valve 13 away from the alkali tank 2 can also be connected to the output end of the pump body 3 through a pipe.

[0066] At this time, the fixed alkali solution in the alkali solution tank 2, driven by the pump body 3, can enter the cleaning space 81 through the pipeline, and then flow through the connecting part 132 of the two pneumatic valves 13, and then flow back to the alkali solution tank 2 through the pipeline. At the same time, during the cleaning process, the highest liquid level of the alkali solution in the cleaning space 81 will be kept below the clamp 9 to effectively prevent the alkali solution from contacting the functional part 131 of the pneumatic valve 13.

[0067] The implementation principle of a pipeline cleaning device for SiC-CVD equipment according to an embodiment of this application is as follows: When cleaning the pneumatic valve 13 in the vacuum pipeline 1, firstly, start the air blowing device 4 to blow in safe inert gas, so that the cleaning space 81 is filled with safe inert gas, creating a safe cleaning environment; then, clamp and position one or two pneumatic valves 13 to be cleaned on the clamp 9, so that the connecting part 132 of the pneumatic valve 13 is connected to the pipeline near the pump body 3. After installation, turn off the air blowing device 4 after a period of time (such as 30 seconds); then start the pump body 3 to drive the alkali solution in the alkali solution tank 2 into the cleaning space 81 through the pipeline, and then flow through the connecting part 132 of the two pneumatic valves 13 one after the other to clean them. Finally, it flows back to the alkali solution tank 2 through the inclined surface at the bottom of the cleaning space 81 and the pipeline; during the flow of the alkali solution, after leaving the alkali solution tank 2, it will be filtered by the filter 103 to remove the by-products mixed in with the alkali solution. After cleaning for a period of time (e.g., 5 minutes), turn off pump 3, and then restart the air blowing device 4 to blow in safe inert gas to purge the interior of the connecting part 132 of one or two pneumatic valves 13 (for 10 minutes), and refill the cleaning space 81 with safe inert gas. The level gauge 101 and pH meter 102 provide visual observation of the situation in the alkali tank 2 throughout the process, and the monitoring device 104 provides visual observation of the situation in the cleaning tank 8 throughout the process. When the H2 concentration is below 4% and the HCl concentration is below 7.5mg / m3, it indicates that the pneumatic valve 13 has been purged and the environment in the cleaning space 81 is safe. Remove the pneumatic valve 13, turn off the air blowing device 4, and the cleaning process is complete.

[0068] Example 4: Reference Figure 9 The difference between this embodiment and embodiment 3 is the fixture 9.

[0069] The clamp 9 is movably connected to the cleaning tank 8 and can move relative to the cleaning tank 8 in a direction perpendicular to the bottom surface of the chassis 7 within the cleaning space 81. In this embodiment, the clamp 9 preferably moves relative to the cleaning tank 8 via a screw drive structure; as shown in the figure, since the screw drive structure is a common prior art, it will not be described in detail here, and it is only briefly shown in the figure.

[0070] At this time, by controlling the movement of the clamp 9, the position of the pneumatic valve 13 after being clamped and positioned on the clamp 9 can be adjusted, that is, the position of the pneumatic valve 13 after installation in the cleaning space 81 can be adjusted, so that pneumatic valves 13 of different specifications can be connected to the pipeline near the pump body 3 after installation in the cleaning space 81, thereby further improving the universality of the pipeline cleaning device for different pneumatic valves 13.

[0071] The implementation principle of a pipeline cleaning device for SiC-CVD equipment according to an embodiment of this application is as follows: After the pneumatic valve 13 to be cleaned is snapped into position on the clamp 9, the clamp 9 is moved relative to the cleaning tank 8 so that the communication direction of the connecting part 132 of the pneumatic valve 13 is aligned with the flow direction of the alkaline solution flowing in through the pipe near the pump body 3. Then, the pipe is installed so that the connecting part 132 of the pneumatic valve 13 is connected to the pipe near the pump body 3. The installation of the pneumatic valve 13 is then completed.

[0072] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A pipe cleaning device for SiC-CVD equipment, characterized in that, It includes an alkaline solution tank (2), a level gauge (101), a pH meter (102), a pump body (3), a filter (103), an air blowing device (4), and a monitoring device (104). The alkaline solution tank (2) has a cavity (21) for storing alkaline solution inside. The top of the alkaline solution tank (2) is provided with an exhaust port (22), and the cavity (21) is connected to the outside through the exhaust port (22). The level gauge (101) and the pH meter (102) are both installed on the alkaline solution tank (2); The alkaline solution tank (2) extends outwards and is connected to the pump body (3) via a pipe. The filter (103) is installed on the pipe and is used to filter byproducts in the alkaline solution. The pump body (3) extends outward to have a pipe for connecting and communicating with the vacuum pipe (1), and the alkali tank (2) is also provided with a pipe for the alkali to flow back to the cavity (21); The blowing device (4) includes an air inlet pipe (41), which communicates with the interior of the vacuum pipe (1) and is used to blow safety inert gas into the interior of the vacuum pipe (1). The monitoring device (104) is used to monitor the H2 concentration and HCl concentration inside and around the vacuum pipe (1).

2. The pipe cleaning device for SiC-CVD equipment according to claim 1, characterized in that, It also includes a support frame (5) for supporting the long tube (11) in the vacuum pipe (1); The end of the long pipe (11) away from the pump body (3) is connected to the alkali tank (2), the air inlet pipe (41) is set on the pipe extending outward from the pump body (3), and the monitoring device (104) is set on the alkali tank (2).

3. A pipe cleaning device for SiC-CVD equipment according to claim 2, characterized in that, It also includes an air plate (6) with multiple air holes (61) on its surface and a guide tube (62) for guiding the flow of alkali solution. The gas plate (6) is disposed in the cavity (21), the alkaline solution is located below the gas plate (6), the space above the gas plate (6) in the cavity (21) is connected to the long pipe (11) and the exhaust port (22); the short pipe (12) in the vacuum pipe (1) is located above the gas plate (6) and is connected to the long pipe (11); The alkaline solution tank (2) is also provided with the air inlet pipe (41), and the air inlet pipe (41) is connected to the space above the alkaline solution in the cavity (21); The guide pipe (62) is disposed on the air plate (6) and located below the air plate (6). The top of the guide pipe (62) passes through the air plate (6) and communicates with the end of the short pipe (12) away from the long pipe (11). The bottom of the guide pipe (62) communicates with the cavity (21) located below the air plate (6).

4. A pipe cleaning device for SiC-CVD equipment according to claim 3, characterized in that, The gas plate (6) is used to support the short pipe (12). The gas plate (6) is rotatably connected to the alkaline tank (2), and the guide pipe (62) is eccentrically set on the gas plate (6) to adapt to the short pipe (12) of different shapes.

5. A pipe cleaning device for SiC-CVD equipment according to claim 4, characterized in that, The air inlet pipe (41) installed on the alkaline solution tank (2) is connected to the space above the gas plate (6) of the cavity (21); The alkaline solution tank (2) has an arc-shaped cavity (23) on the periphery of the gas plate (6). The gas plate (6) has multiple air guide plates (63) above it, and the multiple air guide plates (63) avoid the multiple air holes (61). An air guide channel (64) is formed between adjacent air guide plates (63). One end of the air guide channel (64) is connected to the arc-shaped cavity (23), and the other end of the air guide channel (64) is close to the position where the guide pipe (62) passes through the gas plate (6).

6. A pipe cleaning device for SiC-CVD equipment according to claim 3, characterized in that, The top of the support frame (5) wraps around the long tube (11) to form a detachable connection, and the bottom of the support frame (5) has a structure for adjusting the height of the support frame (5).

7. A pipe cleaning device for SiC-CVD equipment according to claim 1, characterized in that, It also includes a cleaning tank (8) and a clamp (9); The cleaning tank (8) has a cleaning space (81) inside for cleaning the pneumatic valve (13) of the vacuum pipe (1). The cleaning space (81) is connected to the alkali tank (2) and the pump body (3) through a pipe. The air inlet pipe (41) and the monitoring device (104) are both installed on the cleaning tank (8). The bottom of the cleaning space (81) has an inclined surface that slopes downward toward the alkali tank (2). The clamp (9) is disposed in the cleaning space (81). The clamp (9) has a slot (91) for the pneumatic valve (13) to be inserted. After the pneumatic valve (13) is installed on the clamp (9), the functional part (131) and the connecting part (132) of the pneumatic valve (13) are located above and below the clamp (9), respectively. The connecting part (132) of the pneumatic valve (13) allows the alkaline solution in the cleaning space (81) to flow, and the alkaline solution in the cleaning space (81) remains below the clamp (9).

8. A pipe cleaning device for SiC-CVD equipment according to claim 7, characterized in that, The clamp (9) has two slots (91). When two pneumatic valves (13) are installed on the clamp (9) at the same time, the connecting parts (132) of the two pneumatic valves (13) are connected.

9. A pipe cleaning device for SiC-CVD equipment according to claim 7, characterized in that, The clamp (9) is movably connected to the cleaning tank (8) and is used to adjust the height position of the pneumatic valve (13) in the cleaning space (81).

10. A pipe cleaning device for SiC-CVD equipment according to claim 1, characterized in that, It also includes a chassis (7) located at the bottom, and the chassis (7) has a groove (71) for storing alkaline solution leakage.

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