Wafer impact resistance detection device

Abstract

The utility model provides a wafer impact resistance detection device which comprises a base, a detection table for placing a sapphire wafer is arranged on the top surface of the base, the sapphire wafer is arranged on the top surface of the detection table, an adjusting mechanism is arranged on the edge of the top surface of the base, and a detection mechanism for detecting the sapphire wafer is arranged in the middle of the adjusting mechanism. The bottom end of the detection mechanism is provided with an impact assembly for impacting the sapphire wafer; a supporting seat is arranged on the top face of the base, a first motor is arranged in the supporting seat, and a fixing seat is arranged on the edge of the top face of the base and fixedly connected with the bottom end of the adjusting mechanism. According to the utility model, the detection mechanism is controlled by the adjusting mechanism to rotate by taking the detection table as a point and is matched with the detection table to drive the sapphire wafer to rotate, so that each part of the sapphire wafer can be subjected to impact test in multiple directions in the process of detecting the sapphire wafer by the detection mechanism; and therefore, the impact resistance of the sapphire wafer can be more comprehensively tested by the detection device.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer production, in particular to a device for detecting the impact resistance of a wafer. Background Art

[0002] Sapphire wafer is a material used to manufacture electronic components. It is made of artificially synthesized single crystal sapphire material with high purity. Sapphire wafer has high hardness and wear resistance, so it is widely used in many applications. Sapphire wafer is often used in various applications in the fields of optics and electronics. In optics, sapphire wafer can be used as the output lens, laser frame and optical window of the laser. Due to its high transparency, low refractive index, and good transmittance to most visible light and infrared light, it has become one of the ideal materials for manufacturing high-quality optical instruments and lasers.

[0003] After the sapphire wafers are produced and processed, in order to ensure that the sapphire wafers have good durability and reliability during use, it is necessary to sample the sapphire wafers and use a testing device to test the impact resistance of the sample sapphire wafers;

[0004] In the process of testing the impact resistance of sapphire wafers, impact hammers, impact tables and other equipment are usually used. These testing equipment often use the method of vertically dropping the impact object to impact the sapphire wafer. By recording the condition of the sapphire wafer after the impact, the impact resistance of sapphire is calculated.

[0005] However, since the direction in which a sapphire wafer may be impacted cannot be determined during actual use, it is difficult to obtain more comprehensive data on the impact resistance of the sapphire wafer by impact testing the sapphire wafer in a single direction.

[0006] In summary, there is currently a need for a testing device that is convenient for comprehensively testing the impact resistance of a wafer. Utility Model Content

[0007] In view of the deficiencies in the prior art, the utility model provides a device for detecting the impact resistance of a wafer, which solves the problems mentioned in the background technology.

[0008] In order to achieve the above objectives, the present invention is implemented through the following technical solutions:

[0009] A wafer impact resistance testing device comprises a base, wherein a testing platform for placing a sapphire wafer is provided on the top surface of the base, a sapphire wafer is provided on the top surface of the testing platform, an adjustment mechanism is provided on the edge of the top surface of the base, a testing mechanism for testing the sapphire wafer is provided in the middle of the adjustment mechanism, and an impact component for impacting the sapphire wafer is provided at the bottom end of the testing mechanism;

[0010] The top surface of the base is provided with a support seat, a first motor is provided inside the support seat, and a fixing seat is provided at the edge of the top surface of the base, and the fixing seat is fixedly connected to the bottom end of the adjustment mechanism;

[0011] The adjustment mechanism includes an adjustment frame, an adjustment seat, a second motor and a driving wheel. The adjustment frame is arranged on the top surface of the fixed seat. The top of the adjustment frame is a semicircular structure. The adjustment seat is arranged on the outer side of the adjustment frame. The adjustment seat and the adjustment frame are engaged and slid. The second motor is arranged on the top surface of the adjustment seat. The output end of the second motor is provided with a driving wheel. The driving wheel contacts the side surface of the adjustment frame, and the driving wheel is rotatably connected with the adjustment seat.

[0012] The detection mechanism is arranged below the adjustment seat, and the detection mechanism is slidably connected with the adjustment frame through the adjustment seat.

[0013] Furthermore, the detection platform includes a tray and a placement plate, the bottom surface of the tray is connected to the output end of the first motor, the top surface of the tray is provided with a placement plate for placing the sapphire wafer, and the tray is rotatably connected to the support seat.

[0014] Furthermore, a magnetic suction cup is provided between the placement plate and the tray, a magnetic suction block is provided on the top surface of the placement plate, a limiting sleeve is provided on the side of the magnetic suction block, and multiple magnetic suction blocks are provided on the top surface of the placement plate, and the multiple magnetic suction blocks are all slidably connected to the placement plate.

[0015] Furthermore, the detection mechanism includes a detection column, a movable rod, an electric push rod, a movable seat, a control block, a force block and a spring. The detection column is arranged on the bottom surface of the adjustment seat, and an installation cavity for installing the movable rod and the spring is provided in the middle of the detection column. A force block is provided on the side of the movable rod. The force block and the movable rod are both engaged and slid with the detection column. A spring is provided at the top of the movable rod, and the end of the spring facing away from the movable rod is fixedly connected to the top surface of the installation cavity. An electric push rod is provided on the side of the detection column, and a movable seat is provided at the bottom end of the electric push rod. A control block for controlling the lifting of the movable rod is provided at the bottom end of the movable seat.

[0016] Furthermore, the control block is rotatably connected to the movable seat, and the control block is slidably connected to the force-bearing block.

[0017] Furthermore, the impact assembly includes a mounting seat and an impact seat, the mounting seat is arranged at the bottom end of the movable rod, an assembly surface is provided at the bottom of the mounting seat, the assembly surface is inclined, the impact seat is provided on the assembly surface, the impact seat is rotatably connected to the mounting seat, an impact head is provided on the outside of the impact seat, and the impact heads are distributed in a ring on the outside of the impact seat.

[0018] Furthermore, the impact head includes a mounting block, a mounting rod and an impact block. The mounting block is arranged outside the impact seat. The impact block is provided at one end of the mounting block away from the impact seat. The side of the impact block is provided with a mounting rod threadedly connected to the mounting block.

[0019] The utility model provides a device for detecting the impact resistance of a wafer. Compared with the prior art, it has the following beneficial effects:

[0020] The detection mechanism is controlled by an adjusting mechanism to rotate with the detection table as the point, and the detection table cooperates with the detection table to drive the sapphire wafer to rotate, so that during the detection of the sapphire wafer by the detection mechanism, impact tests can be performed on various parts of the sapphire wafer from multiple directions, thereby facilitating the detection device to more comprehensively test the impact resistance of the sapphire wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1 A schematic structural diagram of a wafer impact resistance testing device according to the utility model is shown;

[0023] Figure 2 The schematic diagram of the structure of the adjustment mechanism of the utility model is shown;

[0024] Figure 3 The schematic diagram of the structure of the detection mechanism of the utility model is shown;

[0025] Figure 4 The schematic diagram of the structure of the testing platform of the utility model is shown;

[0026] Figure 5 A schematic structural diagram of the impact assembly of the utility model is shown;

[0027] As shown in the figure: 1. base; 11. support seat; 12. first motor; 13. fixed seat; 2. sapphire wafer; 3. adjustment mechanism; 31. adjustment frame; 32. adjustment seat; 33. second motor; 34. driving wheel; 4. detection mechanism; 41. detection column; 42. movable rod; 43. electric push rod; 44. movable seat; 45. control block; 46. force block; 47. spring; 5. detection table; 51. tray; 52. magnetic suction cup; 53. placement plate; 54. magnetic suction block; 541. limiting sleeve; 6. impact assembly; 61. mounting seat; 62. impact seat; 63. mounting block; 64. mounting rod; 65. impact block. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solution and advantages of the embodiments of the utility model clearer, the technical solution in the embodiments of the utility model is described clearly and completely. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0029] Embodiment 1

[0030] In order to solve the technical problems in the background technology, a wafer impact resistance detection device is provided as follows:

[0031] Combination Figure 1-Figure 5 As shown, the utility model provides a wafer impact resistance testing device, comprising a base 1, a testing table 5 for placing a sapphire wafer 2 is provided on the top surface of the base 1, a sapphire wafer 2 is provided on the top surface of the testing table 5, an adjusting mechanism 3 is provided on the edge of the top surface of the base 1, a testing mechanism 4 for detecting the sapphire wafer 2 is provided in the middle of the adjusting mechanism 3, and an impact assembly 6 for impacting the sapphire wafer 2 is provided at the bottom end of the testing mechanism 4; a supporting seat 11 is provided on the top surface of the base 1, a first motor 12 is provided inside the supporting seat 11, a fixing seat 13 is provided on the edge of the top surface of the base 1, and the fixing seat 13 is fixedly connected to the bottom end of the adjusting mechanism 3; the first motor 12 provided inside the supporting seat 11 can control the testing table 5 and the sapphire to be tested to rotate, so as to change the posture of the sapphire during testing;

[0032] The adjusting mechanism 3 includes an adjusting frame 31, an adjusting seat 32, a second motor 33 and a driving wheel 34. The adjusting frame 31 is arranged on the top surface of the fixing seat 13. The top of the adjusting frame 31 is a semicircular structure. The adjusting seat 32 is arranged on the outer side of the adjusting frame 31. The adjusting seat 32 is engaged and slid with the adjusting frame 31. The top surface of the adjusting seat 32 is provided with a second motor 33. The output end of the second motor 33 is provided with a driving wheel 34. The driving wheel 34 contacts the side of the adjusting frame 31, and the driving wheel 34 is rotatably connected with the adjusting seat 32.

[0033] The detection mechanism 4 is arranged below the adjustment seat 32, and the detection mechanism 4 is slidably connected to the adjustment frame 31 through the adjustment seat 32; the adjustment seat 32 arranged outside the adjustment frame 31 can drive the detection mechanism 4 to slide outside the adjustment frame 31; through the semicircular structure of the adjustment frame 31, when the adjustment seat 32 slides outside the adjustment frame 31, the detection mechanism 4 can rotate with the detection platform 5 as a point, so as to change the detection angle of the detection mechanism 4 to the sapphire wafer 2;

[0034] In this embodiment, the detection table 5 includes a tray 51 and a placement plate 53. The bottom surface of the tray 51 is connected to the output end of the first motor 12. The top surface of the tray 51 is provided with a placement plate 53 for placing the sapphire wafer 2. The tray 51 is rotatably connected to the support seat 11. Through the rotational connection between the tray 51 and the support seat 11, the placement plate 53 and the sapphire to be detected can be driven to rotate together, so that the detection mechanism 4 can perform multi-position detection on the sapphire wafer 2.

[0035] In this embodiment, a magnetic suction cup 52 is provided between the placement plate 53 and the tray 51, a magnetic suction block 54 is provided on the top surface of the placement plate 53, a limiting sleeve 541 is provided on the side of the magnetic suction block 54, and a plurality of magnetic suction blocks 54 are provided on the top surface of the placement plate 53, and the plurality of magnetic suction blocks 54 are all slidably connected with the placement plate 53; the magnetic suction cup 52 provided inside the placement plate 53 can adsorb the magnetic suction blocks 54 on the top surface of the placement plate 53, so that the plurality of magnetic suction blocks 54 are fixed on the placement plate 53, and the position of the sapphire wafer 2 to be tested is fixed, so as to facilitate the detection mechanism 4 to stably test the impact resistance of the sapphire wafer 2;

[0036] When the detection device is used, the sapphire wafer 2 to be detected is first placed on the detection table 5, and then the adjustment mechanism 3 controls the detection mechanism 4 to move so that the detection mechanism 4 can impact the sapphire wafer 2 from multiple directions. At this time, the camera can record the state of the sapphire wafer 2 being impacted at different angles and positions, and calculate the impact resistance of the sapphire wafer 2.

[0037] The detection mechanism 4 is controlled by the adjustment mechanism 3 to rotate with the detection table 5 as the point, and the detection table 5 drives the sapphire wafer 2 to rotate, so that during the detection process of the sapphire wafer 2 by the detection mechanism 4, impact tests can be performed on various parts of the sapphire wafer 2 from multiple directions, thereby facilitating the detection device to more comprehensively test the impact resistance of the sapphire wafer 2.

[0038] Embodiment 2

[0039] like Figure 1-Figure 5 As shown, based on the above embodiment, this embodiment further provides the following contents:

[0040] In order to enable the detection mechanism 4 to perform impact resistance detection on the sapphire wafer 2, this embodiment provides the following design:

[0041] The detection mechanism 4 includes a detection column 41, a movable rod 42, an electric push rod 43, a movable seat 44, a control block 45, a force block 46 and a spring 47. The detection column 41 is arranged on the bottom surface of the adjustment seat 32, and a mounting cavity for mounting the movable rod 42 and the spring 47 is arranged in the middle of the detection column 41. A force block 46 is arranged on the side of the movable rod 42. The force block 46 and the movable rod 42 are both engaged and slid with the detection column 41. A spring 47 is arranged on the top of the movable rod 42. The end of the spring 47 away from the movable rod 42 is fixed to the top surface of the mounting cavity. The detection column 41 is fixedly connected, and an electric push rod 43 is provided on the side of the detection column 41, and a movable seat 44 is provided at the bottom of the electric push rod 43. A control block 45 for controlling the lifting and lowering of the movable rod 42 is provided at the bottom of the movable seat 44; the movable rod 42 that slides in the detection column 41 is engaged, so as to drive the impact assembly 6 to lift and contact and impact the sapphire wafer 2; the spring 47 provided at the top of the movable rod 42 can provide thrust for the movable rod 42 to slide downward; the electric push rod 43 provided on the side of the detection column 41 can provide power for the movable rod 42 to move upward;

[0042] In this embodiment, the control block 45 is rotatably connected to the movable seat 44, and the control block 45 is slidably connected to the force block 46; the rotation of the control block 45 and the movable seat 44 facilitates the contact or separation of the control block 45 and the force block 46. When the control block 45 is below the force block 46, the electric push rod 43 controls the lifting and lowering of the control block 45, and the movable rod 42 follows the lifting and lowering of the control block 45. When the control block 45 is separated from the force block 46, the movable rod 42 can slide downward to cause the impact assembly 6 to collide with the sapphire wafer 2.

[0043] Embodiment 3

[0044] like Figure 1-Figure 5 As shown, based on the above embodiment, this embodiment further provides the following contents:

[0045] In order to enable the device to perform impact resistance test on the sapphire wafer 2, this embodiment provides the following technical solutions:

[0046] The impact assembly 6 includes a mounting seat 61 and an impact seat 62. The mounting seat 61 is arranged at the bottom end of the movable rod 42. The bottom of the mounting seat 61 is provided with an assembly surface, which is inclined. The impact seat 62 is arranged on the assembly surface. The impact seat 62 is rotatably connected to the mounting seat 61. An impact head is arranged on the outer side of the impact seat 62, and the impact heads are distributed in a ring on the outer side of the impact seat 62. Through the inclined arrangement of the assembly surface, the impact seat 62 can control multiple impact heads to rotate on the side of the mounting seat 61, so that the impact assembly 6 can select impact heads of different shapes to impact the sapphire wafer 2, thereby facilitating the improvement of the detection device to simulate more scenes to perform impact resistance detection on the sapphire wafer 2.

[0047] In this embodiment, the impact head includes a mounting block 63, a mounting rod 64 and an impact block 65. The mounting block 63 is arranged on the outside of the impact seat 62. The impact block 65 is provided at the end of the mounting block 63 away from the impact seat 62. The side of the impact block 65 is provided with a mounting rod 64 threadedly connected to the mounting block 63; through the threaded connection between the mounting rod 64 and the mounting block 63, it is convenient for the staff to replace impact heads of different shapes to perform impact detection on the sapphire wafer 2.

[0048] The working principle and use process of this utility model:

[0049] When using:

[0050] First, the sapphire wafer 2 to be tested is placed on the placement plate 53 of the testing table 5, and then a plurality of magnetic blocks 54 are fixed on the placement plate 53 by magnetic attraction and the position of the sapphire wafer 2 is fixed and limited, and then the control block 45 at the bottom of the electric push rod 43 in the testing mechanism 4 is driven by the motor to rotate, and when the control block 45 moves to below the force block 46, the electric push rod 43 drives the control block 45 to rise, and the movable rod 42 moves upward and squeezes the spring 47, and when the control block 45 is separated from the force block 46, the movable rod 42 drives the impact assembly 6 to descend and impact on the sapphire wafer 2 under the push of the spring 47;

[0051] During the test:

[0052] The second motor 33 in the adjustment mechanism 3 controls the driving wheel 34 to rotate. The driving wheel 34 contacts the adjustment frame 31, and the adjustment seat 32 can drive the detection mechanism 4 to rotate. At the same time, the first motor 12 arranged inside the support seat 11 drives the detection platform 5 to rotate. In this way, the posture of the sapphire wafer 2 can be adjusted, and the adjustment seat 32 can control the direction of the detection mechanism 4 to detect the sapphire wafer 2, so that the device can comprehensively perform impact resistance performance detection on the sapphire wafer 2.

[0053] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0054] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A wafer impact resistance testing device, characterized in that: The invention comprises a base (1), wherein a detection platform (5) for placing a sapphire wafer (2) is provided on the top surface of the base (1), a sapphire wafer (2) is provided on the top surface of the detection platform (5), an adjustment mechanism (3) is provided on the edge of the top surface of the base (1), a detection mechanism (4) for detecting the sapphire wafer (2) is provided in the middle of the adjustment mechanism (3), and an impact component (6) for impacting the sapphire wafer (2) is provided at the bottom end of the detection mechanism (4); The top surface of the base (1) is provided with a support seat (11), a first motor (12) is provided inside the support seat (11), a fixing seat (13) is provided at the edge of the top surface of the base (1), and the fixing seat (13) is fixedly connected to the bottom end of the adjustment mechanism (3); The adjusting mechanism (3) comprises an adjusting frame (31), an adjusting seat (32), a second motor (33) and a driving wheel (34); the adjusting frame (31) is arranged on the top surface of the fixing seat (13); the top of the adjusting frame (31) is in a semicircular structure; the adjusting seat (32) is arranged on the outer side of the adjusting frame (31); the adjusting seat (32) and the adjusting frame (31) are engaged and slidably engaged; the top surface of the adjusting seat (32) is provided with a second motor (33); the output end of the second motor (33) is provided with a driving wheel (34); the driving wheel (34) contacts the side surface of the adjusting frame (31); and the driving wheel (34) is rotatably connected to the adjusting seat (32); The detection mechanism (4) is arranged below the adjustment seat (32), and the detection mechanism (4) and the adjustment frame (31) are slidably connected via the adjustment seat (32).

2. A wafer impact resistance testing device according to claim 1, characterized in that: The detection platform (5) comprises a tray (51) and a placement plate (53); the bottom surface of the tray (51) is connected to the output end of the first motor (12); the top surface of the tray (51) is provided with a placement plate (53) for placing the sapphire wafer (2); and the tray (51) is rotatably connected to the support seat (11).

3. A wafer impact resistance testing device according to claim 2, characterized in that: A magnetic suction cup (52) is provided between the placement plate (53) and the tray (51); a magnetic suction block (54) is provided on the top surface of the placement plate (53); a limiting sleeve (541) is provided on the side surface of the magnetic suction block (54); a plurality of magnetic suction blocks (54) are provided on the top surface of the placement plate (53); and the plurality of magnetic suction blocks (54) are all slidably connected to the placement plate (53).

4. The wafer impact resistance testing device according to claim 1, characterized in that: The detection mechanism (4) comprises a detection column (41), a movable rod (42), an electric push rod (43), a movable seat (44), a control block (45), a force block (46) and a spring (47). The detection column (41) is arranged on the bottom surface of the adjustment seat (32). A mounting cavity for mounting the movable rod (42) and the spring (47) is arranged in the middle of the detection column (41). A force block (46) is arranged on the side of the movable rod (42). The force block (46) and the movable rod (42) are both engaged and slid with the detection column (41). A spring (47) is arranged on the top of the movable rod (42). One end of the spring (47) facing away from the movable rod (42) is fixedly connected to the top surface of the mounting cavity. An electric push rod (43) is arranged on the side of the detection column (41). A movable seat (44) is arranged at the bottom end of the electric push rod (43). A control block (45) for controlling the lifting of the movable rod (42) is arranged at the bottom end of the movable seat (44).

5. A wafer impact resistance testing device according to claim 4, characterized in that: The control block (45) is rotatably connected to the movable seat (44), and the control block (45) is slidably connected to the force bearing block (46).

6. The wafer impact resistance testing device according to claim 1, characterized in that: The impact assembly (6) comprises a mounting seat (61) and an impact seat (62), wherein the mounting seat (61) is arranged at the bottom end of the movable rod (42), a mounting surface is arranged at the bottom of the mounting seat (61), and the mounting surface is arranged in an inclined manner, the impact seat (62) is arranged on the mounting surface, the impact seat (62) is rotatably connected to the mounting seat (61), and an impact head is arranged on the outside of the impact seat (62), and the impact heads are distributed in a ring on the outside of the impact seat (62).

7. A wafer impact resistance testing device according to claim 6, characterized in that: The impact head comprises a mounting block (63), a mounting rod (64) and an impact block (65); the mounting block (63) is arranged outside the impact seat (62); the impact block (65) is arranged at one end of the mounting block (63) away from the impact seat (62); and the side of the impact block (65) is provided with a mounting rod (64) threadedly connected to the mounting block (63).

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