Semiconductor industry wastewater treatment device

Abstract

The utility model relates to the technical field of wastewater treatment, and discloses a semiconductor industry wastewater treatment device which comprises a treatment pond, a connecting pipe extends from an upper opening of the treatment pond, a liquid inlet hopper is arranged at an upper pipe opening of the connecting pipe, a dosing component is arranged in the liquid inlet hopper, and an inner support is arranged in the connecting pipe. The medicine adding component comprises a medicine adding pipe which is installed on the inner support and coaxial with the connecting pipe, the medicine adding pipe can rotate around the axis, a pipe cover is installed at an upper pipe opening of the medicine adding pipe, a plurality of medicine adding holes are formed in the outer circle face of the medicine adding pipe in the radial direction, and the medicine adding holes are close to the pipe cover and are formed in the circumferential direction of the medicine adding pipe in an array mode; according to the scheme, when waste water is fed into the treatment pond, a reagent is uniformly mixed and added, the overall purification efficiency of the waste water can be improved, a stirring-blade-free mode is adopted for uniform mixing of the chemical adding component, and the chemical adding component is not corroded and is more durable.

Description

Technical Field

[0001] The utility model relates to the technical field of wastewater treatment, in particular to a wastewater treatment device for the semiconductor industry. Background Art

[0002] A large amount of wastewater is inevitably generated in semiconductor processing and manufacturing. These wastewaters contain tin, nickel and other ions, which need to be purified before they can be discharged. In the prior art, it is common to purify the wastewater by adding chemical reagents such as flocculants into the wastewater. However, the existing chemical reagent delivery method generally only involves dropping the reagents into a precipitation reaction tank from a delivery port. The reagents need to wait for a long time before they can be fully mixed with the wastewater and undergo a chemical reaction, resulting in a slow overall purification efficiency. Therefore, in the prior art, stirring technology is used to accelerate the rapid mixing of the reagents and the wastewater. For example, a Chinese utility model patent with an authorization announcement number of CN218371911U discloses a semiconductor packaging wastewater treatment device, which achieves rapid mixing of the flocculant and the wastewater by rotating a stirring blade. However, this method also has some shortcomings. For example, depending on the composition of the wastewater, the type of reagent added, and the pH, the stirring blade is immersed in the wastewater and the reagent for a long time and is easily corroded. After the reagent and the wastewater undergo a chemical reaction, the precipitate produced easily adheres to the surface of the stirring blade and is difficult to clean.

[0003] Based on the above, the utility model proposes a semiconductor industry wastewater treatment device. Utility Model Content

[0004] In order to solve the problems mentioned in the above background, the utility model provides a wastewater treatment device for the semiconductor industry.

[0005] In order to achieve the above technical purpose, the technical solution adopted by the utility model is as follows.

[0006] A semiconductor industry wastewater treatment device comprises a treatment pool, a connecting pipe extending from an upper opening of the treatment pool, a liquid inlet hopper being arranged at an upper pipe mouth of the connecting pipe, a drug-adding component being arranged in the liquid inlet hopper, an inner bracket being arranged in the connecting pipe, the drug-adding component comprising a drug-adding pipe installed on the inner bracket and coaxial with the connecting pipe, the drug-adding pipe being able to rotate around an axial center line, a pipe cover being installed at an upper pipe mouth of the drug-adding pipe, a drug-adding hole being radially opened on an outer circumferential surface of the drug-adding pipe, a plurality of drug-adding holes being arranged in an array close to the pipe cover and along the circumferential direction of the drug-adding pipe, a piston and a driving component for driving the piston to move being installed in the drug-adding pipe.

[0007] Furthermore, blades are arranged on the outside of the dosing pipe, and the blades are located below the connecting pipe. When wastewater enters the treatment tank through the connecting pipe, the wastewater impacts the blades to cause the blades to rotate.

[0008] Furthermore, the outer cylindrical surface of the piston is provided with a groove, and the tube wall of the dosing tube is provided with a protrusion, and the groove and the protrusion form a sliding fit along the axial center line direction of the dosing tube.

[0009] Furthermore, the upper end of the piston is closed and the lower end is open, and the driving component includes a threaded tube coaxially arranged in the piston and a threaded shaft threadedly arranged in the threaded tube.

[0010] Furthermore, a motor is installed in the dosing tube, and the motor is dynamically connected to the threaded shaft.

[0011] Furthermore, a ring pool in the shape of a circular ring is coaxially mounted on the upper end of the liquid inlet hopper, and the height of the upper end surface of the inner ring plate of the ring pool is lower than the height of the upper end surface of the outer ring plate of the ring pool.

[0012] Furthermore, the outer circumferential surface of the inner ring plate is provided with water outlet holes, and a plurality of water outlet holes are arranged in an array along the circumferential direction of the ring pool. The center line of the water outlet hole and the outer circumferential surface of the inner ring plate are arranged at an angle. The wastewater entering the liquid inlet hopper through the water outlet holes flows in a vortex shape, and the flow direction of the wastewater is opposite to the rotation direction of the dosing pipe.

[0013] Compared with the prior art, the utility model has the following beneficial effects:

[0014] In this solution, when wastewater enters the treatment tank through the liquid inlet hopper, chemical reagents are added to the wastewater through the dosing component and the chemical reagents and wastewater are evenly mixed. When the wastewater is put in, the reagents are evenly mixed and added, which can improve the overall purification efficiency of the wastewater. In addition, the dosing component is evenly mixed without stirring blades, which is not corroded and more durable.

[0015] Furthermore, the present solution can improve the mixing uniformity between the reagent and the wastewater by spraying the reagent in a rotary manner, and the wastewater flows downward along the inner wall of the liquid inlet hopper in a vortex shape opposite to the rotation direction of the reagent. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the structure of the utility model;

[0017] Figure 2 It is a cross-sectional view of the utility model;

[0018] Figure 3 This is a partial schematic diagram of the surrounding pool;

[0019] Figure 4 It is a schematic diagram of a dosing component;

[0020] Figure 5 Exploded view of the drive components.

[0021] The reference numerals in the accompanying drawings are:

[0022] 1. Treatment tank; 2. Connecting pipe; 3. Liquid inlet hopper; 301. Ring pool; 302. Inner ring plate; 303. Water outlet hole; 4. Dosing component; 401. Dosing pipe; 402. Dosing hole; 403. Pipe cover; 404. Blade; 405. Piston; 406. Driving component; 4061. Threaded pipe; 4062. Threaded shaft; 4063. Motor. DETAILED DESCRIPTION

[0023] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined purpose of the utility model, the specific implementation method, structure, characteristics and effects of the present invention are described in detail below in combination with the accompanying drawings and preferred embodiments.

[0024] Reference Figure 1-Figure 5 A semiconductor industry wastewater treatment device comprises a treatment pool 1, a connecting pipe 2 is extended from the upper opening of the treatment pool 1, a liquid inlet hopper 3 is arranged at the upper pipe mouth of the connecting pipe 2, and a dosing component 4 is arranged in the liquid inlet hopper 3; wastewater enters the treatment pool 1 through the liquid inlet hopper 3, and during the entering process, chemical reagents are added to the wastewater through the dosing component 4 and the chemical reagents and the wastewater are mixed evenly. When the wastewater is input, the reagents are evenly mixed and added, which can improve the purification efficiency, and the uniform mixing of the dosing component 4 adopts a leafless method, which is not corroded and is more durable.

[0025] Embodiment 1

[0026] Reference Figure 2 , Figure 4 and Figure 5 An inner bracket is provided in the connecting pipe 2, and the dosing component 4 includes a dosing pipe 401 installed on the inner bracket and coaxial with the connecting pipe 2. The dosing pipe 401 can rotate around the axis. Furthermore, a blade 404 is provided on the outside of the dosing pipe 401. The blade 404 is located below the connecting pipe 2. When the wastewater enters the treatment tank 1 through the connecting pipe 2, the wastewater will impact the blade 404, causing the blade 404 to rotate, thereby causing the dosing pipe 401 to rotate. The blade 404 is a propeller blade technology, and will rotate when impacted. It can be achieved with the existing technology and will not be described in detail.

[0027] A tube cover 403 is installed at the upper tube opening of the dosing tube 401 . A dosing hole 402 is radially opened on the outer circumferential surface of the dosing tube 401 . The dosing holes 402 are close to the tube cover 403 and are arranged in an array along the circumferential direction of the dosing tube 401 .

[0028] A piston 405 is sleeved inside the dosing tube 401. Furthermore, a groove is provided on the outer circumferential surface of the piston 405, and a protrusion is provided on the wall of the dosing tube 401. The groove and the protrusion form a sliding fit, thereby forming a sliding connection between the piston 405 and the dosing tube 401.

[0029] The piston 405 is driven by the driving component 406 to move in the dosing tube 401. Furthermore, the upper end of the piston 405 is closed and the lower end is open. The driving component 406 includes a threaded tube 4061 coaxially arranged in the piston 405 and a threaded shaft 4062 threadedly arranged in the threaded tube 4061. The threaded shaft 4062 is driven to rotate by the motor 4063. The motor 4063 is installed in the dosing tube 401 through the motor frame. It should be noted that since the driving component 406 will rotate with the dosing tube 401, a through-hole slip ring is required when connecting the motor 4063.

[0030] Working process of embodiment 1:

[0031] First, the tube cover 403 is opened and chemical reagents are added into the dosing tube 401. In this process, the amount of reagents that can be contained in the dosing tube 401 can be changed by adjusting the position of the piston 405 in the dosing tube 401, that is, the amount of the required reagent is calculated according to the amount of wastewater, and then the position of the piston 405 is adjusted according to the amount of the reagent, so as to achieve the purpose of adding a preset amount of reagent into the dosing tube 401;

[0032] Then, close the tube cover 403;

[0033] Then, wastewater is added into the treatment tank 1 through the liquid inlet hopper 3 and the connecting pipe 2. During this process, the wastewater impacts the blades 404, causing the dosing tube 401 to rotate. At the same time, the driving component 406 operates to drive the piston 405 to move upward at a constant slow speed, so that the reagent in the dosing tube 401 is sprayed outward through the dosing hole 402. At this time, the dosing tube 401 rotates while spraying the reagent outward. In the process of the wastewater entering the treatment tank 1, the reagent and the wastewater are evenly mixed. Finally, the evenly mixed wastewater and reagent are left to stand in the treatment tank 1 and a chemical reaction occurs, which will not be elaborated.

[0034] Embodiment 2

[0035] Reference Figure 3 A circular ring pool 301 is coaxially installed at the upper end of the liquid inlet hopper 3. The upper end surface height of the inner ring plate 302 of the ring pool 301 is lower than the upper end surface height of the outer ring plate. The significance of this is that the wastewater is poured into the ring pool 301. As the liquid level gradually rises, the wastewater in the ring pool 301 will eventually pass over the inner ring plate 302 and enter the liquid inlet hopper 3. This method can make the wastewater flow downward along the inner wall of the liquid inlet hopper 3, that is, the wastewater flows downward evenly along the inner wall of the liquid inlet hopper 3, which can increase the mixing uniformity between the reagent and the wastewater.

[0036] In a preferred embodiment, a water outlet hole 303 is provided on the outer circumferential surface of the inner ring plate 302, and a plurality of water outlet holes 303 are arranged in an array along the circumferential direction of the ring pool 301, and the center line of the water outlet hole 303 is arranged at an angle to the outer circumferential surface of the inner ring plate 302. The significance of this is that when the wastewater in the ring pool 301 enters the liquid inlet bucket 3 through the water outlet hole 303 and flows downward along the inner wall of the liquid inlet bucket 3, it is in the shape of a vortex, and the rotation direction of the vortex is opposite to the rotation direction of the dosing tube 401. In this way, relative to the wastewater, the relative rotation speed of the dosing tube 401 is faster, and the mixing uniformity between the reagent and the wastewater is better. In addition, the reagent and wastewater sprayed through the dosing tube 401 will collide due to the opposite rotation directions, and the collision can further enhance the mixing uniformity between the two.

[0037] The above description is only a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technical personnel in this field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any brief modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. A semiconductor industry wastewater treatment device, comprising a treatment tank (1), a connecting pipe (2) extending from the upper opening of the treatment tank (1), a liquid inlet hopper (3) arranged at the upper pipe opening of the connecting pipe (2), characterized in that: A dosing component (4) is arranged in the liquid inlet hopper (3), an inner bracket is arranged in the connecting pipe (2), the dosing component (4) comprises a dosing pipe (401) installed on the inner bracket and coaxial with the connecting pipe (2), the dosing pipe (401) can rotate around the axis, a pipe cover (403) is installed at the upper pipe mouth of the dosing pipe (401), a dosing hole (402) is radially opened on the outer circumferential surface of the dosing pipe (401), a plurality of dosing holes (402) are arranged in an array close to the pipe cover (403) and along the circumferential direction of the dosing pipe (401), and a piston (405) and a driving component (406) for driving the piston (405) to move are installed in the dosing pipe (401).

2. A semiconductor industry wastewater treatment device according to claim 1, characterized in that: The outside of the dosing pipe (401) is provided with blades (404), and the blades (404) are located below the connecting pipe (2). When wastewater enters the treatment tank (1) through the connecting pipe (2), the wastewater impacts the blades (404), causing the blades (404) to rotate.

3. A semiconductor industry wastewater treatment device according to claim 1, characterized in that: The outer circumferential surface of the piston (405) is provided with a groove, and the wall of the dosing tube (401) is provided with a protrusion, and the groove and the protrusion form a sliding fit along the axial center line direction of the dosing tube (401).

4. A semiconductor industry wastewater treatment device according to claim 3, characterized in that: The upper end of the piston (405) is closed and the lower end is open. The driving component (406) includes a threaded tube (4061) coaxially arranged in the piston (405) and a threaded shaft (4062) threadedly arranged in the threaded tube (4061).

5. A semiconductor industry wastewater treatment device according to claim 4, characterized in that: A motor (4063) is installed in the dosing tube (401), and the motor (4063) is connected to the threaded shaft (4062) in a power manner.

6. A semiconductor industry wastewater treatment device according to claim 1, characterized in that: A circular ring pool (301) is coaxially mounted on the upper end of the liquid inlet hopper (3), and the upper end surface height of the inner ring plate (302) of the ring pool (301) is lower than the upper end surface height of the outer ring plate of the ring pool (301).

7. A semiconductor industry wastewater treatment device according to claim 6, characterized in that: The outer circumferential surface of the inner ring plate (302) is provided with a water outlet hole (303), and a plurality of the water outlet holes (303) are arranged in an array along the circumferential direction of the ring pool (301). The center line of the water outlet hole (303) and the outer circumferential surface of the inner ring plate (302) are arranged at an angle, and the wastewater entering the liquid inlet hopper (3) through the water outlet hole (303) flows in a vortex shape, and the flow direction of the wastewater is opposite to the rotation direction of the dosing pipe (401).

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