Liquid supply system for wafer cleaning equipment

Abstract

The utility model discloses a liquid supply system for wafer cleaning equipment, which belongs to the technical field of wafer cleaning liquid supply, and is characterized by comprising a main shell, an end cover is arranged at the top of the main shell, a multi-stage filter component is arranged in the main shell, a constant temperature component is arranged at the bottom of the main shell, and the constant temperature component is arranged in the main shell. Cleaning liquid in the main shell can sequentially pass through a first-stage filter screen, a second-stage filter screen and a third-stage filter screen under high-speed rotation, so that multiple times of filtering of the cleaning liquid is completed, the cleaning liquid in the main shell can be better recycled, a constant-temperature assembly is arranged, constant-temperature gas is introduced into a constant-temperature bin from a gas inlet pipeline, heat preservation measures are taken on a constant-temperature inner barrel, and the cleaning liquid can be recycled. And a sealing ring and a sealing ring are arranged, so that the constant-temperature inner barrel and the first-stage filter screen are separated during use, the cleaning liquid is prevented from flowing out from the top or the bottom of the constant-temperature inner barrel, the purity of the cleaning liquid is improved, and the stability of the internal temperature is ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer cleaning liquid supply, in particular to a liquid supply system for wafer cleaning equipment. Background Art

[0002] The liquid supply system used in wafer cleaning equipment plays an important role in the semiconductor manufacturing process and its application scope is becoming wider and wider. It was initially used in the semiconductor industry. With the widespread application of semiconductor process technology, modern manufacturing has formed a pan-semiconductor industry, that is, all manufacturing processes are based on semiconductor processes. The processes include doping, photolithography, etching, CVD film formation, etc., which all require the use of liquid delivery functions, thus generating a large demand for central liquid supply systems.

[0003] Conventional cleaning liquids lack auxiliary action devices, and when the cleaning liquid is filtered, it is usually filtered by its own weight, resulting in low cleaning liquid filtration efficiency.

[0004] The Chinese utility model patent with the current announcement number: CN213793214U discloses an auxiliary water circulation action device for wafer cleaning equipment. This utility model achieves the effect of improving the filtration efficiency of the cleaning liquid by setting a filter screen, a rotating shaft and a connecting plate, ensuring the circulation filtration efficiency of the cleaning liquid and improving the practicality of the equipment. By setting a filter screen, a rotating shaft and a connecting plate, the effect of improving the filtration efficiency of the cleaning liquid is achieved. The cleaning liquid flows into the shell through the water inlet pipe. When the motor is working, it drives the rotating shaft and the connecting plate to rotate. The connecting plate drives the cleaning liquid to rotate, causing the cleaning liquid to generate a rotating centrifugal force, forcing the cleaning liquid to contact the inner wall of the filter screen, thereby improving the efficiency of the cleaning liquid filtering through the filter screen and improving the practicality of the equipment.

[0005] In view of the above problems, existing patents have provided solutions, but during use, only one filtration is not enough to improve the purity of the cleaning solution. In addition, during the long-term cleaning process of the wafer, the concentration and temperature of the cleaning solution will continue to change, thus affecting the cleaning effect.

[0006] Therefore, a liquid supply system for wafer cleaning equipment is proposed. Utility Model Content

[0007] 1. Technical issues to be solved

[0008] The utility model provides a liquid supply system for wafer cleaning equipment, aiming to solve the problem that in the use of the existing liquid supply system for wafer cleaning equipment, only one filtration is not enough to improve the purity of the cleaning liquid, and during the long-term wafer cleaning process, the concentration and temperature of the cleaning liquid will continue to change, thereby affecting the cleaning effect.

[0009] Technical Solution

[0010] The utility model is implemented as follows: a liquid supply system for a wafer cleaning device comprises a main shell, the top of the main shell is provided with an end cover, a multi-stage filter assembly is provided inside the main shell, and a constant temperature assembly is provided at the bottom of the main shell;

[0011] The multi-stage filter assembly includes an output motor, a rotating shaft, a rotating disk, a primary filter, a secondary filter and a tertiary filter. The output motor is fixedly arranged on the top of the end cover, one end of the rotating shaft is fixedly arranged on the output end of the output motor, the rotating disk is fixedly arranged on the other end of the rotating shaft, and the primary filter, the secondary filter and the tertiary filter are fixedly arranged on the rotating disk in sequence.

[0012] In order to ensure that the internal cleaning liquid is at the same temperature, as a preferred liquid supply system for a wafer cleaning equipment of the utility model, the constant temperature component includes a constant temperature inner cylinder, a constant temperature chamber, an air inlet pipe and an air outlet pipe, the constant temperature inner cylinder is arranged inside the main shell, the constant temperature chamber is arranged between the inner wall of the main shell and the constant temperature inner cylinder, the air inlet pipe is arranged on one side of the main shell and communicated with the constant temperature chamber, and the air outlet pipe is arranged on the opposite side of the air inlet pipe and communicated with the constant temperature chamber.

[0013] In order to make the connection between the end cover and the main shell more stable, as a preferred liquid supply system for a wafer cleaning device of the utility model, a card slot is provided on the top of the main shell, and a card block is provided on the bottom of the end cover, and the card block and the card slot are used in conjunction with each other.

[0014] In order to prevent the cleaning liquid from entering the constant temperature chamber when it is passed into the interior, as a preferred liquid supply system for a wafer cleaning equipment of the utility model, a water inlet pipe is provided on one side of the main shell, and a water outlet pipe is provided on the other side of the main shell, and the water inlet pipe and the water outlet pipe are both connected to the constant temperature inner cylinder.

[0015] In order to separate the constant temperature inner cylinder from the primary filter screen and prevent the cleaning liquid from flowing out from the top or bottom of the constant temperature inner cylinder, as a preferred liquid supply system for a wafer cleaning equipment of the utility model, a sealing ring is fixedly provided on the inner bottom of the constant temperature inner cylinder, the rotating disk is tightly fitted with the sealing ring and is rotatably connected with the sealing ring, and a sealing ring is provided on the bottom of the end cover.

[0016] In order to lift up the main shell and facilitate the operation of the staff, as a preferred embodiment of the liquid supply system for a wafer cleaning device of the utility model, support legs are fixedly provided on the bottom of the main shell, and the number of the support legs is three groups.

[0017] In order to reduce the friction force when the rotating shaft rotates and increase the rotation speed, as a preferred liquid supply system for a wafer cleaning equipment of the utility model, a rotating groove is provided inside the end cover, a rotating bearing is provided inside the rotating groove, and the rotating bearing is connected to the rotating shaft.

[0018] In order to record the temperature inside the constant temperature chamber at any time and prevent internal temperature imbalance, as a preferred liquid supply system for a wafer cleaning device of the utility model, a thermometer is provided on the top of the end cover, and one end of the thermometer extends into the interior of the constant temperature chamber. Beneficial Effects

[0019] Compared with the prior art, the beneficial effects of the utility model are:

[0020] The utility model provides a multi-stage filter assembly, and the cleaning liquid inside the main shell will pass through the primary filter screen, the secondary filter screen and the tertiary filter screen in sequence under high-speed rotation, thereby completing multiple filtration of the cleaning liquid, so that the internal cleaning liquid can be better recycled.

[0021] 2. The utility model provides a constant temperature component, introduces constant temperature gas from the air inlet pipe into the constant temperature chamber, and takes insulation measures for the constant temperature inner cylinder to ensure that the internal cleaning liquid is at the same temperature. A sealing ring and a sealing ring are provided to separate the constant temperature inner cylinder from the primary filter screen when in use to prevent the cleaning liquid from flowing out from the top or bottom of the constant temperature inner cylinder. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is the overall structure diagram of the utility model;

[0023] Figure 2 It is a schematic diagram of a cross-section of the thermostatic component of the utility model;

[0024] Figure 3 It is a schematic diagram of a cross-section of a multi-stage filter assembly of the utility model;

[0025] Figure 4 It is a schematic diagram of the sealing ring and the sealing ring of the utility model;

[0026] Figure 5 It is a schematic diagram of the card slot and the card block of the utility model.

[0027] Description of the numbers in the figure:

[0028] 1. Main shell; 2. End cover; 3. Multi-stage filter assembly; 4. Constant temperature assembly; 301. Output motor; 302. Rotating shaft; 303. Rotating disk; 304. Primary filter; 305. Secondary filter; 306. Third-stage filter; 401. Constant temperature inner cylinder; 402. Constant temperature chamber; 403. Air inlet pipe; 404. Air outlet pipe; 5. Card slot; 6. Card block; 7. Water inlet pipe; 8. Water outlet pipe; 9. Sealing ring; 10. Sealing ring; 11. Support leg; 14. Thermometer. DETAILED DESCRIPTION

[0029] In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0030] See also Figure 1-5 The utility model provides a technical solution: a liquid supply system for a wafer cleaning device, comprising a main shell 1, an end cover 2 is arranged on the top of the main shell 1, a multi-stage filter component 3 is arranged inside the main shell 1, and a constant temperature component 4 is arranged at the bottom of the main shell 1;

[0031] The multi-stage filter assembly 3 includes an output motor 301, a rotating shaft 302, a rotating disk 303, a primary filter screen 304, a secondary filter screen 305 and a tertiary filter screen 306. The output motor 301 is fixedly arranged on the top of the end cover 2, one end of the rotating shaft 302 is fixedly arranged on the output end of the output motor 301, the rotating disk 303 is fixedly arranged on the other end of the rotating shaft 302, and the primary filter screen 304, the secondary filter screen 305 and the tertiary filter screen 306 are fixedly arranged on the rotating disk 303 in sequence.

[0032] In this embodiment: by setting a multi-stage filter component 3 including an output motor 301, a rotating shaft 302, a rotating disk 303, a primary filter 304, a secondary filter 305 and a tertiary filter 306, when in use, after the cleaning liquid enters the main shell 1, the output motor 301 will move through the rotating disk 303, and then drive the primary filter 304, the secondary filter 305 and the tertiary filter 306 to rotate rapidly, and the cleaning liquid inside the main shell 1 will pass through the primary filter 304, the secondary filter 305 and the tertiary filter 306 in turn under high-speed rotation, thereby completing multiple filtration of the cleaning liquid, so that the internal cleaning liquid can be better recycled.

[0033] As a technical optimization solution of the utility model, the constant temperature component 4 includes a constant temperature inner cylinder 401, a constant temperature chamber 402, an air inlet pipe 403 and an air outlet pipe 404. The constant temperature inner cylinder 401 is arranged inside the main shell 1, the constant temperature chamber 402 is arranged between the inner wall of the main shell 1 and the constant temperature inner cylinder 401, the air inlet pipe 403 is arranged on one side of the main shell 1 and communicates with the constant temperature chamber 402, and the air outlet pipe 404 is arranged on the opposite side of the air inlet pipe 403 and communicates with the constant temperature chamber 402.

[0034] In this embodiment: by setting up a constant temperature component 4 including a constant temperature inner cylinder 401, a constant temperature chamber 402, an air inlet pipe 403 and an air outlet pipe 404, during use, constant temperature gas is introduced into the constant temperature chamber 402 from the air inlet pipe 403, and the constant temperature inner cylinder 401 is insulated to ensure that the internal cleaning liquid is at the same temperature.

[0035] As a technical optimization solution of the utility model, a card slot 5 is provided on the top of the main shell 1, and a card block 6 is provided on the bottom of the end cover 2, and the card block 6 and the card slot 5 are used in conjunction with each other.

[0036] In this embodiment: a card block 6 is provided at the bottom of the end cover 2, and the card block 6 and the card slot 5 cooperate with each other. When in use, the card block 6 and the card slot 5 cooperate with each other, so that the connection between the end cover 2 and the main shell 1 is more stable.

[0037] As a technical optimization solution of the utility model, a water inlet pipe 7 is provided on one side of the main shell 1, and a water outlet pipe 8 is provided on the other side of the main shell 1. Both the water inlet pipe 7 and the water outlet pipe 8 are connected to the constant temperature inner cylinder 401.

[0038] In this embodiment, the water inlet pipe 7 and the water outlet pipe 8 are both connected to the constant temperature inner cylinder 401, so that when in use, the cleaning liquid is prevented from entering the constant temperature chamber 402 when it is passed into the interior.

[0039] As a technical optimization solution of the utility model, a sealing ring 9 is fixedly provided on the inner bottom of the constant temperature inner cylinder 401 , the rotating disk 303 is tightly fitted with the sealing ring 9 and is rotatably connected with the sealing ring 9 , and a sealing ring 10 is provided on the bottom of the end cover 2 .

[0040] In this embodiment: a rotating disk 303 is provided to fit tightly with the sealing ring 9 and is rotatably connected to the sealing ring 9, and a sealing ring 10 is provided at the bottom of the end cover 2, which separates the constant temperature inner cylinder 401 and the primary filter screen 304 when in use, preventing the cleaning liquid from flowing out from the top or bottom of the constant temperature inner cylinder 401.

[0041] As a technical optimization solution of the present invention, support legs 11 are fixedly provided on the bottom of the main housing 1, and the number of the support legs 11 is three groups.

[0042] In this embodiment, three groups of supporting legs 11 are fixedly provided at the bottom of the main housing 1 , so that the main housing 1 can be lifted up during use, which is convenient for the staff to operate.

[0043] As a technical optimization solution of the present invention, a rotation groove is provided inside the end cover 2 , a rotation bearing is provided inside the rotation groove, and the rotation bearing is connected to the rotating shaft 302 .

[0044] In this embodiment, a rotating bearing is provided inside the rotating groove, so that the friction force of the rotating shaft 302 when rotating can be reduced and the rotating speed can be increased.

[0045] As a technical optimization solution of the present invention, a thermometer 14 is provided on the top of the end cover 2 , and one end of the thermometer 14 extends into the interior of the constant temperature chamber 402 .

[0046] In this embodiment, one end of the thermometer 14 is arranged to extend into the interior of the constant temperature chamber 402, so that the temperature inside the constant temperature chamber 402 can be recorded at any time during use to prevent internal temperature imbalance.

[0047] Working principle: First, when using the liquid supply system for the wafer cleaning equipment, after the cleaning liquid enters the main shell 1, the output motor 301 will move through the rotating disk 303, and then drive the primary filter 304, the secondary filter 305 and the tertiary filter 306 to rotate rapidly, and the cleaning liquid inside the main shell 1 will pass through the primary filter 304, the secondary filter 305 and the tertiary filter 306 in turn under high-speed rotation, thereby completing multiple filtration of the cleaning liquid, so that the internal cleaning liquid can be better recycled, and constant temperature gas is introduced from the air inlet pipe 403 into the constant temperature chamber 402, and the constant temperature inner cylinder 401 is insulated to ensure that the internal cleaning liquid is at the same temperature, and the thermometer 14 records the temperature inside the constant temperature chamber 402 at any time to prevent internal temperature imbalance.

[0048] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A liquid supply system for a wafer cleaning device, comprising a main housing (1), characterized in that: An end cover (2) is arranged on the top of the main shell (1), a multi-stage filter assembly (3) is arranged inside the main shell (1), and a constant temperature assembly (4) is arranged on the bottom of the main shell (1); The multi-stage filter assembly (3) comprises an output motor (301), a rotating shaft (302), a rotating disk (303), a primary filter screen (304), a secondary filter screen (305) and a tertiary filter screen (306); the output motor (301) is fixedly arranged on the top of the end cover (2); one end of the rotating shaft (302) is fixedly arranged on the output end of the output motor (301); the rotating disk (303) is fixedly arranged on the other end of the rotating shaft (302); and the primary filter screen (304), the secondary filter screen (305) and the tertiary filter screen (306) are fixedly arranged on the rotating disk (303) in sequence.

2. The liquid supply system for wafer cleaning equipment according to claim 1, characterized in that: The constant temperature component (4) comprises a constant temperature inner cylinder (401), a constant temperature chamber (402), an air inlet pipe (403) and an air outlet pipe (404); the constant temperature inner cylinder (401) is arranged inside the main shell (1); the constant temperature chamber (402) is arranged between the inner wall of the main shell (1) and the constant temperature inner cylinder (401); the air inlet pipe (403) is arranged on one side of the main shell (1) and communicates with the constant temperature chamber (402); and the air outlet pipe (404) is arranged on the opposite side of the air inlet pipe (403) and communicates with the constant temperature chamber (402).

3. The liquid supply system for wafer cleaning equipment according to claim 1, characterized in that: The top of the main housing (1) is provided with a card slot (5), and the bottom of the end cover (2) is provided with a card block (6), and the card block (6) and the card slot (5) are used in cooperation with each other.

4. The liquid supply system for wafer cleaning equipment according to claim 2, characterized in that: A water inlet pipe (7) is provided on one side of the main shell (1), and a water outlet pipe (8) is provided on the other side of the main shell (1); the water inlet pipe (7) and the water outlet pipe (8) are both in communication with the constant temperature inner cylinder (401).

5. The liquid supply system for wafer cleaning equipment according to claim 2, characterized in that: A sealing ring (9) is fixedly arranged at the inner bottom of the constant temperature inner cylinder (401), the rotating disk (303) is tightly fitted with the sealing ring (9) and is rotatably connected to the sealing ring (9), and a sealing ring (10) is arranged at the bottom of the end cover (2).

6. The liquid supply system for wafer cleaning equipment according to claim 1, characterized in that: Support legs (11) are fixedly arranged on the bottom of the main housing (1), and the number of the support legs (11) is three groups.

7. The liquid supply system for wafer cleaning equipment according to claim 1, characterized in that: A rotation groove is provided inside the end cover (2), a rotation bearing is provided inside the rotation groove, and the rotation bearing is connected to the rotating shaft (302).

8. The liquid supply system for wafer cleaning equipment according to claim 2, characterized in that: A thermometer (14) is provided on the top of the end cover (2), and one end of the thermometer (14) extends into the interior of the constant temperature chamber (402).

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