Electronic-grade polycrystalline silicon rectification decarbonization equipment
By adopting the rotatable rotating half-ring and limit structure design in the polycrystalline silicon distillation and carbon removal equipment, the problem of difficulty in replacing the adsorption medium is solved, convenient replacement of activated carbon adsorbents and cost savings are achieved, and the efficiency of the equipment is improved.
Patent Information
- Application Number
- CN202421033225.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-11
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-05-11
AI Technical Summary
In existing polycrystalline silicon distillation and carbon removal equipment, the adsorption medium loses its function after long-term use and is difficult to replace separately, resulting in waste of economic costs.
An electronic grade polycrystalline silicon carbon distillation equipment is designed, using a rotatable rotary half-ring and fixed half-ring structure. The activated carbon adsorbent is driven away from the adsorption column through the rotating half-ring, which is convenient for replacing the adsorbent, and combined with the limit structure to prevent the activated carbon from moving. , save replacement costs.
It realizes convenient replacement of activated carbon adsorbent, reduces economic costs, avoids uncertainty in the position of the adsorbent during movement, and improves the efficiency of the equipment.
Smart Images
Figure CN222238840U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of polysilicon rectification and carbon removal equipment, in particular to carbon removal equipment used for electronic grade polysilicon rectification. Background Art
[0002] Crude trichlorosilane can be obtained by chlorinating dry silicon powder and dry hydrogen chloride gas under certain conditions, followed by condensation, distillation and reduction. Currently, the methods used to reduce the carbon impurity content in trichlorosilane mainly include conventional distillation, reactive distillation, adsorption, extractive distillation, etc.
[0003] An adsorption column is used in conventional distillation methods. The interior of the adsorption column contains a special adsorbent for removing boron and phosphorus impurities. It is used to adsorb boron and phosphorus impurities generated in the distillation method. However, the adsorption medium inside the existing adsorption column is generally fixedly installed. When the internal adsorption medium loses its adsorption function after long-term use, the adsorption column needs to be completely replaced. It is difficult to replace the adsorption medium alone, which will result in a certain waste of economic costs. Utility Model Content
[0004] The utility model aims to provide an electronic grade polysilicon rectification and carbon removal device to solve the problems raised in the above background technology.
[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an electronic grade polysilicon distillation and carbon removal equipment, comprising a high boiling recovery distillation tower, the high boiling recovery distillation tower is connected to a first adsorption column through a pipeline, the first adsorption column is connected to a fixed bed through a pipeline, the head of the fixed bed is connected to a trichlorosilane separation distillation tower through a pipeline, the trichlorosilane separation distillation tower is connected to a second adsorption column through a pipeline, the structures of the first adsorption column and the second adsorption column are the same, the internal array of the first adsorption column is installed with a plurality of fixed semi-rings, one end of the plurality of fixed semi-rings are rotatably connected with a rotating semi-ring, the other end of the rotating semi-ring and the fixed semi-ring are threadedly connected by a plurality of screws, a mounting ring is installed between the rotating semi-ring and the fixed semi-ring, and an activated carbon adsorbent is arranged inside the mounting ring.
[0006] Preferably, a semicircular bottom plate is fixedly mounted on the lower end of the rotating semi-ring, and the curvature of the bottom plate is consistent with the curvature of the mounting ring.
[0007] Preferably, a limiting structure is installed on the inner wall surface of the fixed half ring and the rotating half ring, and the distance between the limiting structure and the bottom plate is greater than the height of the mounting ring.
[0008] Preferably, the limiting structure includes a groove, a spring and a limiting plate. The inner wall surfaces of the fixed half ring and the rotating half ring are each provided with a groove, a spring is installed inside the groove, a limiting plate is installed at the other end of the spring, and the other end of the limiting plate extends to the outside of the groove.
[0009] Preferably, a temperature sensor is installed at the upper end of any mounting ring inside the first adsorption column or the second adsorption column.
[0010] Preferably, a handle is installed on the outer surface of the rotating half ring.
[0011] Compared with the prior art, the beneficial effects of the utility model are:
[0012] 1. In the electronic-grade polysilicon distillation and carbon removal equipment, the discharged trichlorosilane enters the high-boiling recovery distillation tower for internal distillation, and the discharged impurities containing concentrated carbon, boron and phosphorus enter the first adsorption column for adsorption. After preliminary adsorption, it enters the fixed bed through the pipeline for reaction carbon removal. The material after reaction carbon removal enters the trichlorosilane separation distillation tower for separation and distillation. The material after distillation enters the second adsorption column for impurity adsorption. After adsorption, high-purity trichlorosilane returns to the system for use. When it is necessary to replace the activated carbon adsorbent inside the first adsorption column or the second adsorption column, first remove the screws and rotate the rotating half ring. The rotating half ring drives the mounting ring and the activated carbon adsorbent to separate from the first adsorption column or the second adsorption column. At this time, the activated carbon adsorbent can be replaced. After the replacement is completed, the rotating half ring is reset, and the rotating half ring and the fixed half ring are fixed by multiple screws. The activated carbon adsorbent is driven to separate from the first adsorption column or the second adsorption column by the rotatable rotating half ring, which can be convenient for users to replace and save certain economic costs.
[0013] 2. The electronic-grade polysilicon distillation and carbon removal equipment can limit the position of the mounting ring and the activated carbon adsorbent through a limiting structure, thereby preventing the activated carbon adsorbent from moving during the movement of the first adsorption column or the second adsorption column. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] Figure 1 This is a schematic diagram of the overall structure of the first adsorption column of the utility model;
[0015] Figure 2 This is a system flow chart for polysilicon distillation and carbon removal according to the utility model;
[0016] Figure 3 It is a schematic diagram of the structure of the activated carbon adsorbent of the utility model;
[0017] Figure 4 It is a schematic diagram of the structure of the fixed half ring and the rotating half ring of the utility model;
[0018] Figure 5It is a structural schematic diagram of the limiting structure of the utility model.
[0019] In the figure: 1. high boiling recovery distillation tower; 2. first adsorption column; 3. fixed bed; 4. trichlorosilane separation distillation tower; 5. second adsorption column; 6. rotating half ring; 7. handle; 8. pipeline; 9. screw; 10. fixed half ring; 11. limiting structure; 1101. groove; 1102. spring; 1103. limiting plate; 12. mounting ring; 13. temperature sensor; 14. activated carbon adsorbent; 15. bottom plate. DETAILED DESCRIPTION
[0020] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0021] In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front end", "rear end", "two ends", "one end", "the other end" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.
[0022] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "connected", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0023] like Figures 1 to 5As shown, the electronic grade polysilicon distillation and carbon removal equipment of this embodiment includes a high boiling recovery distillation tower 1, which is a tower-type vapor-liquid contact device for distillation. For the first distillation, the high boiling recovery distillation tower 1 is connected to a first adsorption column 2 through a pipeline 8. The impurities containing concentrated carbon, boron and phosphorus discharged from the high boiling recovery distillation tower 1 enter the first adsorption column 2 for adsorption. The first adsorption column 2 is connected to a fixed bed 3 through a pipeline 8. The fixed bed 3 is equipped with a special reaction catalyst, the main component of which is amino resin, with an operating pressure of 0.5-0.7Mpa and a temperature of 55°C-75°C, which is mainly used for reaction and carbon removal. The head of the fixed bed 3 is connected to a trichlorosilane separation distillation tower 4 through a pipeline 8. The trichlorosilane separation distillation tower 4 is connected to a second adsorption column 5 through a pipeline 8. The trichlorosilane separation distillation tower 4 has an operating pressure of 0.4-0.7Mpa and a temperature of 40°C-60°C. The top of the tower separates trichlorosilane. The silicon desorption column 5 continues to remove impurities, and the silicon tetrachloride containing concentrated carbon in the bottom of the tower is discharged to the downstream system for hydrolysis. The structures of the first adsorption column 2 and the second adsorption column 5 are the same. The internal array of the first adsorption column 2 is installed with a plurality of fixed semi-rings 10. The position of the fixed semi-rings 10 is fixed and cannot be moved. One end of the plurality of fixed semi-rings 10 is rotatably connected with a rotating semi-ring 6. One end of the rotating semi-ring 6 is rotatably connected to one end of the fixed semi-ring 10, and can rotate around a point and leave the first adsorption column 2. The other ends of the rotating semi-ring 6 and the fixed semi-ring 10 are threadedly connected by a plurality of screws 9. The positions of the rotating semi-ring 6 and the fixed semi-ring 10 are fixed by a plurality of screws 9. A mounting ring 12 is installed between the rotating semi-ring 6 and the fixed semi-ring 10. An activated carbon adsorbent 14 is arranged inside the mounting ring 12. The activated carbon adsorbent 14 is used to adsorb the concentrated carbon and boron and phosphorus impurities that enter the first adsorption column 2 or the second adsorption column 5.
[0024] Specifically, a semicircular bottom plate 15 is fixedly installed at the lower end of the rotating semi-ring 6. The curvature of the bottom plate 15 is consistent with the curvature of the mounting ring 12. The semicircular bottom plate 15 does not completely cover the interior of the first adsorption column 2 or the second adsorption column 5, but only provides a certain support for the mounting ring 12.
[0025] Furthermore, a limiting structure 11 is installed on the inner wall surface of the fixed half ring 10 and the rotating half ring 6. The distance between the limiting structure 11 and the bottom plate 15 is greater than the height of the mounting ring 12. The limiting structure 11 can limit the position of the mounting ring 12 and the activated carbon adsorbent 14 to avoid the movement of the activated carbon adsorbent 14 during the movement of the first adsorption column 2 or the second adsorption column 5.
[0026] Furthermore, the limiting structure 11 includes a groove 1101, a spring 1102 and a limiting plate 1103. The inner wall surfaces of the fixed half ring 10 and the rotating half ring 6 are each provided with a groove 1101, and a spring 1102 is installed inside the groove 1101. The other end of the spring 1102 is installed with a limiting plate 1103, and the other end of the limiting plate 1103 extends to the outside of the groove 1101. In the absence of external interference, the spring 1102 will push the limiting plate 1103 to the outside of the groove 1101. At this time, the mounting ring 12 is located below the limiting plate 1103. The limiting plate 1103 can limit the position of the mounting ring 12 from above, and the bottom plate 15 limits the position of the mounting ring 12 from below.
[0027] Furthermore, a temperature sensor 13 is installed at the upper end of any mounting ring 12 inside the first adsorption column 2 or the second adsorption column 5. The temperature sensor 13 is electrically connected to the external control panel and can transmit the temperature inside the first adsorption column 2 or the second adsorption column 5 to the control panel in real time, making it convenient for the user to control the temperature to ensure the activity of the activated carbon adsorbent 14.
[0028] Furthermore, a handle 7 is installed on the outer surface of the rotating half ring 6 , and the handle 7 can facilitate the user to rotate the rotating half ring 6 to the outside of the first adsorption column 2 or the second adsorption column 5 .
[0029] The method of use of this embodiment is as follows: the discharged trichlorosilane enters the high-boiling recovery distillation tower 1 for internal distillation, and the discharged impurities containing concentrated carbon, boron and phosphorus enter the first adsorption column 2 for adsorption. After preliminary adsorption, it enters the fixed bed 3 through the pipeline 8 for reaction decarbonization. The material after reaction decarbonization enters the trichlorosilane separation distillation tower 4 for separation and distillation. The material after distillation enters the second adsorption column 5 for impurity adsorption. After adsorption, high-purity trichlorosilane returns to the system for use. When it is necessary to replace the activated carbon adsorbent 14 inside the first adsorption column 2 or the second adsorption column 5, first remove the screw 9, rotate the rotating semi-ring 6, and the rotating semi-ring 6 drives the mounting ring 12 and the activated carbon adsorbent 14 to separate from the first adsorption column 2 or the second adsorption column 5. At this time, the activated carbon adsorbent 14 can be replaced. After the replacement is completed, the rotating semi-ring 6 is reset, and the rotating semi-ring 6 and the fixed semi-ring 10 are fixed by multiple screws 9. The activated carbon adsorbent 14 is driven to separate from the first adsorption column 2 or the second adsorption column 5 by the rotatable rotating semi-ring 6, which can be convenient for users to replace and save certain economic costs.
[0030] Finally, it should be noted that the above description is only a preferred embodiment of the utility model and is not intended to limit the utility model. Although the utility model is described in detail with reference to the above embodiments, those skilled in the art can still modify the technical solutions recorded in the above embodiments or replace some of the technical features therein with equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.
Claims
1. An electronic grade polysilicon distillation and carbon removal device, comprising a high boiling recovery distillation tower (1), characterized in that: The high-boiling recovery distillation tower (1) is connected to a first adsorption column (2) via a pipeline (8), the first adsorption column (2) is connected to a fixed bed (3) via a pipeline (8), the head of the fixed bed (3) is connected to a trichlorosilane separation distillation tower (4) via a pipeline (8), the trichlorosilane separation distillation tower (4) is connected to a second adsorption column (5) via a pipeline (8), the first adsorption column (2) and the second adsorption column (5) have the same structure, a plurality of fixed semi-rings (10) are installed in an internal array of the first adsorption column (2), one end of each of the plurality of fixed semi-rings (10) is rotatably connected to a rotating semi-ring (6), the other ends of the rotating semi-ring (6) and the fixed semi-ring (10) are threadedly connected via a plurality of screws (9), a mounting ring (12) is installed between the rotating semi-ring (6) and the fixed semi-ring (10), and an activated carbon adsorbent (14) is arranged inside the mounting ring (12).
2. The electronic grade polysilicon rectification and carbon removal equipment according to claim 1, characterized in that: A semicircular bottom plate (15) is fixedly mounted on the lower end of the rotating semi-ring (6), and the curvature of the bottom plate (15) is consistent with the curvature of the mounting ring (12).
3. The electronic grade polysilicon rectification and carbon removal equipment according to claim 2, characterized in that: A limiting structure (11) is installed on the inner wall surface of the fixed half ring (10) and the rotating half ring (6), and the distance between the limiting structure (11) and the bottom plate (15) is greater than the height of the mounting ring (12).
4. The electronic grade polysilicon rectification and carbon removal equipment according to claim 3, characterized in that: The limiting structure (11) comprises a groove (1101), a spring (1102) and a limiting plate (1103); the inner wall surfaces of the fixed half ring (10) and the rotating half ring (6) are each provided with a groove (1101); a spring (1102) is installed inside the groove (1101); the other end of the spring (1102) is installed with a limiting plate (1103); the other end of the limiting plate (1103) extends to the outside of the groove (1101).
5. The electronic grade polysilicon rectification and carbon removal equipment according to claim 1, characterized in that: A temperature sensor (13) is installed at the upper end of any mounting ring (12) inside the first adsorption column (2) or the second adsorption column (5).
6. The electronic grade polysilicon rectification and carbon removal equipment according to claim 1, characterized in that: A handle (7) is installed on the outer surface of the rotating half ring (6).