Silicon-containing wastewater treatment system in semiconductor industry

Abstract

The utility model discloses a silicon-containing wastewater treatment system in semiconductor industry, which comprises a raw water tank, a security filter, a nanofiltration membrane filter and a flushing device, silicon-containing wastewater is contained in the raw water tank, the security filter is communicated with the raw water tank and used for filtering the silicon-containing wastewater discharged from the raw water tank, and the nanofiltration membrane filter is communicated with the security filter and used for flushing the silicon-containing wastewater discharged from the raw water tank. The nanofiltration membrane filter is communicated with the security filter and is used for filtering the silicon-containing wastewater pre-filtered by the security filter, the membrane aperture of the nanofiltration membrane filter is 0.1-0.6 nm, and the flushing device is communicated with the nanofiltration membrane filter and is used for flushing the nanofiltration membrane filter. The silicon-containing wastewater treatment system in the semiconductor industry disclosed by the embodiment of the utility model has the advantages of good filtering effect and long service life.

Description

Technical Field

[0001] The utility model relates to the technical field of wastewater treatment in the semiconductor industry, and in particular to a system for treating silicon-containing wastewater in the semiconductor industry. Background Art

[0002] The semiconductor industry is a high water-consuming industry. The wastewater discharged contains a large amount of silicon dioxide and other silicon pollutants. In addition, in some cases, the wastewater also contains hydrochloric acid. The pH value of wastewater in the semiconductor industry is usually 1-2. Therefore, it is necessary to treat the wastewater to reduce the pollution of the environment by wastewater.

[0003] In the related art, the pollutants in the wastewater of the semiconductor industry are often removed by chemical mixing precipitation method and ultrafiltration membrane separation technology. However, the inventor of the utility model found that the removal rate of suspended particles by chemical mixing precipitation method is limited, and the pore size of the ultrafiltration membrane in the ultrafiltration membrane separation technology is about 0.03um, which is larger than the particle size of the suspended matter in the wastewater. Therefore, the suspended particles are easily embedded in the ultrafiltration membrane during the process and are difficult to backwash out, resulting in blockage of the ultrafiltration membrane, reduced water flow, poor filtration effect, and greatly reducing the service life of the ultrafiltration membrane. Utility Model Content

[0004] The utility model aims to solve one of the technical problems in the related art at least to a certain extent. To this end, the embodiment of the utility model provides a semiconductor industry silicon-containing wastewater treatment system, which has the advantages of good filtering effect and long service life.

[0005] The semiconductor industry silicon-containing wastewater treatment system of the present utility model embodiment comprises:

[0006] A raw water pool, wherein the raw water pool contains silicon-containing wastewater;

[0007] A security filter, the security filter is connected to the raw water pool and is used for pre-filtering the silicon-containing wastewater discharged from the raw water pool;

[0008] A nanofiltration membrane filter, which is connected to the security filter and is used to filter the silicon-containing wastewater pre-filtered by the security filter, and the membrane pore size of the nanofiltration membrane filter is 0.1nm-0.6nm;

[0009] A flushing device is connected to the nanofiltration membrane filter and is used to flush the nanofiltration membrane filter.

[0010] The semiconductor industry silicon-containing wastewater treatment system of the utility model embodiment first pre-filters larger impurities through a security filter, and then filters fine particle pollutants in the wastewater through a nanofiltration membrane filter with a membrane pore size of 0.1nm-0.6nm, which can effectively improve the removal rate of suspended particulate matter. Moreover, the flushing device can flush the nanofiltration membrane filter, effectively alleviating the clogging of the nanofiltration membrane filter and extending the service life of the nanofiltration membrane filter.

[0011] In some embodiments, there are multiple nanofiltration membrane filters, and the multiple nanofiltration membrane filters are arranged in parallel with each other.

[0012] In some embodiments, the flushing device includes a water tank, a flushing pump, a cleaning agent storage tank and a feeding pump. The flushing pump is used to pump the flushing water in the water tank into the nanofiltration membrane filter to flush the nanofiltration membrane filter. The feeding pump is connected to the cleaning agent storage tank and the water tank, and is used to pump the cleaning agent in the cleaning agent storage tank into the water tank.

[0013] In some embodiments, the nanofiltration membrane filter has a first inlet, a second inlet, a first outlet and a second outlet. The first inlet is connected to the security filter so that the silicon-containing wastewater in the security filter flows into the nanofiltration membrane filter from the first inlet. The second inlet is connected to the flushing pump so that the flushing water in the water tank enters the nanofiltration membrane filter through the second inlet for cleaning. The first outlet is used to discharge the filtered water, and the second outlet is used to discharge the flushing water after flushing.

[0014] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further comprises:

[0015] a first pressure gauge and a second pressure gauge, wherein the first pressure gauge is disposed between the nanofiltration membrane filter and the flushing pump, and the second pressure gauge is disposed at the second outlet;

[0016] A third pressure gauge and a fourth pressure gauge, wherein the third pressure gauge is arranged between the security filter and the nanofiltration membrane filter, and the fourth pressure gauge is arranged at the first outlet.

[0017] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a turbidity meter, which is disposed at the first outlet and is used to measure the turbidity of the filtered water discharged from the first outlet.

[0018] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a flow meter, and one of the flow meters is provided between the nanofiltration membrane filter and the flushing device, and at the first inlet and the first outlet.

[0019] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a first valve and a second valve, wherein the first valve is disposed between the first inlet and the safety filter, and the second valve is disposed between the second inlet and the flushing pump.

[0020] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a third valve and a fourth valve, wherein the third valve is disposed at the first outlet, and the fourth valve is disposed at the second outlet.

[0021] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system also includes a water pump, which is arranged between the raw water pool and the security filter and is used to pump the silicon-containing wastewater in the raw water pool into the security filter. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of a semiconductor industry silicon-containing wastewater treatment system according to an embodiment of the utility model.

[0023] Figure numerals: 1. Raw water tank; 2. Security filter; 3. Nanofiltration membrane filter; 31. First inlet; 32. Second inlet; 33. First outlet; 34. Second outlet; 4. Flushing device; 41. Water tank; 42. Flushing pump; 43. Cleaning agent storage tank; 44. Feeding pump; 51. First pressure gauge; 52. Second pressure gauge; 53. Third pressure gauge; 54. Fourth pressure gauge; 6. Turbidimeter; 7. Flow meter; 81. First valve; 82. Second valve; 83. Third valve; 84. Fourth valve; 9. Water pump. DETAILED DESCRIPTION

[0024] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to be used to explain the present invention, but cannot be understood as limiting the present invention.

[0025] like Figure 1 As shown, the semiconductor industry silicon-containing wastewater treatment system of the utility model embodiment includes a raw water pool 1, a security filter 2, a nanofiltration membrane filter 3 and a flushing device 4. The raw water pool 1 contains silicon-containing wastewater. The security filter 2 is connected to the raw water pool 1, and is used to pre-filter the silicon-containing wastewater discharged from the raw water pool 1. The nanofiltration membrane filter 3 is connected to the security filter 2, and is used to filter the silicon-containing wastewater pre-filtered by the security filter 2. The membrane pore size of the nanofiltration membrane filter 3 is 0.1nm-0.6nm, which can filter fine particle pollutants in the wastewater, effectively improving the filtration efficiency. The flushing device 4 is connected to the nanofiltration membrane filter 3, and is used to flush the nanofiltration membrane filter 3.

[0026] The semiconductor industry silicon-containing wastewater treatment system of the embodiment of the utility model first pre-filters larger impurities through the security filter 2, and then filters the fine particle pollutants in the wastewater through the membrane pore size, which effectively improves the removal rate of suspended particulate matter. Moreover, the setting of the flushing device 4 effectively alleviates the blockage of the nanofiltration membrane filter 3 and extends the service life of the nanofiltration membrane filter 3.

[0027] Specifically, the nanofiltration membrane filter 3 has a nanofiltration membrane (not shown), and the nanofiltration membrane has membrane pores (not shown). When the membrane pore diameter is 0.1nm, it can effectively intercept suspended particles in the wastewater, making it difficult for the suspended particles to enter the membrane pores. When the membrane pore diameter is 0.6nm, it can also effectively intercept suspended particles in the wastewater, making it difficult for the suspended particles to enter the membrane pores, and it is also convenient for the water in the water tank 41 to flush the membrane pores.

[0028] In some embodiments, the security filter 2 is a self-cleaning filter used to intercept impurities in the water to remove suspended matter and particulate matter in the water, reduce turbidity, purify water quality, and reduce the generation of system dirt, bacteria, algae, rust, etc.

[0029] In other embodiments, the security filter 2 is a bag filter, which has the advantages of novel structure, small size, simple and flexible operation, energy saving, high efficiency, good airtightness and strong applicability.

[0030] In some embodiments, there are multiple nanofiltration membrane filters 3, and the multiple nanofiltration membrane filters 3 are arranged in parallel with each other, which effectively improves the filtration efficiency of the nanofiltration membrane filters 3.

[0031] In some embodiments, the flushing device 4 includes a water tank 41, a flushing pump 42, a cleaning agent storage tank 43 and a feeding pump 44. The flushing pump 42 is used to pump the flushing water in the water tank 41 into the nanofiltration membrane filter 3 to flush the nanofiltration membrane filter 3. The feeding pump 44 is connected to the cleaning agent storage tank 43 and the water tank 41, and is used to pump the chemicals in the cleaning agent storage tank 43 into the water tank 41, so that the flushing water in the water tank 41 can flush the nanofiltration membrane more cleanly. The flushing device 4 has a simple structure and saves costs.

[0032] In some embodiments, the nanofiltration membrane filter 3 has a first inlet 31, a second inlet 32, a first outlet 33, and a second outlet 34. The first inlet 31 is located on the top surface of the nanofiltration membrane filter 3 and is connected to the security filter 2, so that the silicon-containing wastewater in the security filter 2 flows into the nanofiltration membrane filter 3 from the first inlet 31 to be filtered through the nanofiltration membrane. The second inlet 32 ​​is located on the top surface of the nanofiltration membrane filter 3 and is connected to the flushing pump 42, so that the flushing water in the water tank 41 enters the nanofiltration membrane filter 3 through the second inlet 32 ​​to clean the nanofiltration membrane, thereby improving the cleaning efficiency.

[0033] The first outlet 33 is located at the bottom of the nanofiltration membrane filter 3 and is used to discharge the filtered water. The second outlet 34 is located at the bottom of the nanofiltration membrane filter 3 and is used to discharge the flushing water after flushing.

[0034] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system also includes a first pressure gauge 51 and a second pressure gauge 52. The first pressure gauge 51 is arranged between the nanofiltration membrane filter 3 and the flushing pump 42 to measure the pressure of water pumped into the nanofiltration membrane filter 3 by the backwash pump, and the second pressure gauge 52 is arranged at the second outlet 34 to measure the pressure of water discharged from the nanofiltration membrane filter 3.

[0035] Specifically, when the water pressure detected by the first pressure gauge 51 is larger and the water pressure detected by the second pressure gauge 52 is smaller, it indicates that the nanofiltration membrane is blocked to a greater extent. At this time, the flushing time of the flushing device 4 is extended and the flushing frequency is increased to flush the nanofiltration membrane efficiently and quickly.

[0036] When the water pressures detected by the first pressure gauge 51 and the second pressure gauge 52 are both large, it indicates that the blockage degree of the nanofiltration membrane is small. At this time, the flushing time and flushing frequency of the flushing device 4 can be shortened to reduce water waste during flushing of the nanofiltration membrane.

[0037] The first pressure gauge 51 and the second pressure gauge 52 are used to detect the water pressure at the second inlet 32 ​​and the second outlet 34 to control the cleaning time and frequency of the nanofiltration membrane by the flushing device 4 to improve work efficiency. In addition, the setting of the pressure gauge is also convenient for direct observation by the staff.

[0038] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system also includes a third pressure gauge 53 and a fourth pressure gauge 54. The third pressure gauge 53 is arranged between the security filter 2 and the nanofiltration membrane filter 3 to measure the pressure of water entering the nanofiltration membrane filter 3 from the security filter 2. The fourth pressure gauge 54 is arranged at the first outlet 33 to measure the pressure of water discharged from the nanofiltration membrane filter 3 through the first outlet 33.

[0039] Specifically, when the water pressure detected by the third pressure gauge 53 is relatively large and the water pressure detected by the fourth pressure gauge 54 is relatively small, it indicates that the nanofiltration membrane is blocked to a large extent and the nanofiltration membrane needs to be flushed.

[0040] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a turbidity meter 6 , which is disposed at the first outlet 33 and is used to measure the turbidity of filtered water discharged from the nanofiltration membrane filter 3 .

[0041] Specifically, the turbidity of the water discharged from the nanofiltration membrane filter 3 is measured by the turbidity meter 6 to determine the cleaning degree of the nanofiltration membrane, thereby adjusting the flushing time and frequency of the nanofiltration membrane by the flushing device 4. The setting of the turbidity meter 6 facilitates direct observation and improves work efficiency.

[0042] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a flow meter 7 , which is disposed between the nanofiltration membrane filter 3 and the flushing device 4 to measure the flow rate of water pumped into the nanofiltration membrane filter 3 by the backwash pump.

[0043] In some embodiments, a flow meter 7 is provided at each of the first inlet 31 and the first outlet 33 to measure the flow rate of silicon-containing wastewater entering the first inlet 31 from the security filter 2 and the flow rate of filtered water discharged from the first outlet 33 .

[0044] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a first valve 81, a second valve 82, a third valve 83, and a fourth valve 84. The first valve 81 is disposed between the first inlet 31 and the safety filter 2, and the second valve 82 is disposed between the second inlet 32 ​​and the flushing pump 42. The third valve 83 is disposed at the first outlet 33, and the fourth valve 84 is disposed at the second outlet 34.

[0045] Specifically, when filtering wastewater, the second valve 82 and the fourth valve 84 are closed, the first valve 81 and the third valve 83 are opened, and the wastewater enters the nanofiltration membrane filter 3 from the first inlet 31 for filtration, and the filtered water flows out from the first outlet 33. When flushing the nanofiltration membrane, the first valve 81 and the third valve 83 are closed, the second valve 82 and the fourth valve 84 are opened, and the water in the water tank 41 flushes the second inlet 32 ​​into the nanofiltration membrane filter 3 for flushing, and the flushing water flows out from the second outlet 34. Thus, it is convenient to control the two working modes of the silicon-containing wastewater treatment system in the semiconductor industry.

[0046] In some embodiments, the semiconductor industry silicon-containing wastewater treatment system further includes a water pump 9. The water pump 9 is disposed between the raw water pool 1 and the security filter 2 to pump the wastewater in the raw water pool 1 into the security filter 2, thereby improving the working efficiency of the semiconductor industry silicon-containing wastewater treatment system.

[0047] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0048] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present utility model, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0049] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection, an electrical connection, or communication with each other; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0050] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0051] In the present utility model, the terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" etc. mean that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the described specific features, structures, materials or characteristics may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0052] Although the above embodiments have been shown and described, it is to be understood that the above embodiments are illustrative and cannot be construed as limitations on the present invention. Changes, modifications, substitutions and variations of the above embodiments by those of ordinary skill in the art are all within the scope of protection of the present invention.

Claims

1. A semiconductor industry silicon-containing wastewater treatment system, characterized in that: include: A raw water pool (1), wherein the raw water pool (1) contains silicon-containing wastewater; A security filter (2), the security filter (2) being connected to the raw water pool (1) and used for pre-filtering the silicon-containing wastewater discharged from the raw water pool (1); A nanofiltration membrane filter (3), the nanofiltration membrane filter (3) being connected to the security filter (2) and used for filtering the silicon-containing wastewater pre-filtered by the security filter (2), the membrane pore size of the nanofiltration membrane filter (3) being 0.1 nm-0.6 nm; A flushing device (4), the flushing device (4) is connected to the nanofiltration membrane filter (3) and is used to flush the nanofiltration membrane filter (3).

2. The semiconductor industry silicon-containing wastewater treatment system according to claim 1, characterized in that: There are a plurality of nanofiltration membrane filters (3), and the plurality of nanofiltration membrane filters (3) are arranged in parallel with each other.

3. The semiconductor industry silicon-containing wastewater treatment system according to claim 1, characterized in that: The flushing device (4) comprises a water tank (41), a flushing pump (42), a cleaning agent storage tank (43) and a feeding pump (44); the flushing pump (42) is used to pump the flushing water in the water tank (41) into the nanofiltration membrane filter (3) to flush the nanofiltration membrane filter (3); the feeding pump (44) is connected to the cleaning agent storage tank (43) and the water tank (41) and is used to pump the cleaning agent in the cleaning agent storage tank (43) into the water tank (41).

4. The semiconductor industry silicon-containing wastewater treatment system according to claim 3, characterized in that: The nanofiltration membrane filter (3) has a first inlet (31), a second inlet (32), a first outlet (33) and a second outlet (34). The first inlet (31) is connected to the security filter (2) so that the silicon-containing wastewater in the security filter (2) flows into the nanofiltration membrane filter (3) from the first inlet (31). The second inlet (32) is connected to the flushing pump (42) so that the flushing water in the water tank (41) enters the nanofiltration membrane filter (3) through the second inlet (32) for cleaning. The first outlet (33) is used to discharge the filtered water, and the second outlet (34) is used to discharge the flushing water after flushing.

5. The semiconductor industry silicon-containing wastewater treatment system according to claim 4, characterized in that: Also includes: a first pressure gauge (51) and a second pressure gauge (52), wherein the first pressure gauge (51) is arranged between the nanofiltration membrane filter (3) and the flushing pump (42), and the second pressure gauge (52) is arranged at the second outlet (34); A third pressure gauge (53) and a fourth pressure gauge (54), wherein the third pressure gauge (53) is arranged between the security filter (2) and the nanofiltration membrane filter (3), and the fourth pressure gauge (54) is arranged at the first outlet (33).

6. The semiconductor industry silicon-containing wastewater treatment system according to claim 4, characterized in that: It also comprises a turbidity meter (6), which is arranged at the first outlet (33) and is used to measure the turbidity of the filtered water discharged from the first outlet (33).

7. The semiconductor industry silicon-containing wastewater treatment system according to claim 4, characterized in that: It also comprises a flow meter (7), wherein one of the flow meters (7) is provided between the nanofiltration membrane filter (3) and the flushing device (4), at the first inlet (31) and at the first outlet (33).

8. The semiconductor industry silicon-containing wastewater treatment system according to claim 4, characterized in that: It also includes a first valve (81) and a second valve (82), wherein the first valve (81) is arranged between the first inlet (31) and the safety filter (2), and the second valve (82) is arranged between the second inlet (32) and the flushing pump (42).

9. The semiconductor industry silicon-containing wastewater treatment system according to claim 8, characterized in that: The invention also comprises a third valve (83) and a fourth valve (84), wherein the third valve (83) is arranged at the first outlet (33), and the fourth valve (84) is arranged at the second outlet (34).

10. The semiconductor industry silicon-containing wastewater treatment system according to claim 1, characterized in that: It also includes a water pump (9), which is arranged between the raw water pool (1) and the security filter (2) and is used to pump the silicon-containing wastewater in the raw water pool (1) into the security filter (2).

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