Automatic liquid supplementing device for photovoltaic silicon wafer cleaning agent
By introducing an agitation mechanism and a filter mechanism into the automatic liquid replenishment device of the photovoltaic silicon wafer cleaning agent, the precipitation problems caused by the standstill of the pure liquid of the cleaning agent and the impact of water source impurities are solved, and the uniform quality and efficient filtration of the cleaning agent are achieved, ensuring photovoltaic silicon The effect of cleaning the tablet.
Patent Information
- Application Number
- CN202420434166.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-07
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-03-07
AI Technical Summary
In the existing automatic liquid replenishment device for photovoltaic silicon wafer cleaning agent, the cleaner pure liquid will stand for a long time and lead to precipitation, which will affect the uneven quality of the later addition to the mixing box.
A cleaner pure liquid tank including a liquid level sensor, a heating tube and an agitating mechanism is designed to avoid precipitation through an electromagnet and an agitating block, and a filter mechanism is provided on the water addition pipe, and the filter mesh and filter frame are used to perform the added water. filter.
The precipitation of the pure liquid of the cleaning agent is effectively avoided, the quality uniformity of the cleaning agent is ensured, and the quality of the cleaning agent after generation is improved through the filtration mechanism.
Smart Images
Figure CN222240067U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of liquid replenishing devices, in particular to an automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent. Background Art
[0002] During the cleaning process of photovoltaic silicon wafers, a detergent solution is required. The detergent solution is usually prepared with pure detergent liquid and water in a detergent mixing box. The detergent is a chemical reagent specifically used to clean photovoltaic silicon wafers. In the photovoltaic manufacturing process, silicon wafers are very critical components, and the cleanliness of their surface is crucial to ensuring the efficiency and performance of photovoltaic cells. The main function of the detergent is to remove impurities and pollutants on the surface of silicon wafers, including particles, metal ions, organic matter, etc., and an automatic liquid replenishment device is required when preparing and synthesizing the detergent. Pure detergent liquid is added to the detergent mixing box at a regular interval to ensure that the concentration of the detergent solution can always maintain a level that can clean the photovoltaic silicon wafers.
[0003] Patent document CN218743454U discloses an automatic detergent replenishing device suitable for cover glass cleaning, which discloses "including a detergent pure liquid tank, in which a liquid level sensor, a temperature sensor and an electric heating tube are installed, and a timer is installed outside the detergent pure liquid tank; the detergent pure liquid tank is connected to the detergent tank through a pipeline, and a solenoid valve is arranged on the pipeline, and the liquid level sensor, the temperature sensor, the electric heating tube, the timer and the solenoid valve are electrically connected to the controller respectively. The utility model is suitable for automatic replenishment of detergent during cover glass cleaning, which effectively solves the problem of forgetting to add or missing pure detergent liquid during the cover glass cleaning process, and can complete the replenishment in a timely and sufficient manner through the timer, liquid level sensor, etc., to ensure that there is sufficient detergent in the detergent tank".
[0004] However, the automatic detergent replenishing device suitable for cover glass cleaning in the above-mentioned public documents mainly considers that the replenishing can be completed in a timely and sufficient manner through a timer, a liquid level sensor, etc. to ensure that there is sufficient detergent in the detergent tank, but it is not convenient to stir the detergent pure liquid that has been standing for a long time. Because the existing detergent pure liquid tank is used to store detergent pure liquid, and the detergent pure liquid is in a static state for a long time, it will cause precipitation, which will lead to uneven quality of the detergent pure liquid added to the detergent mixing tank later.
[0005] In view of this, it is necessary to develop a stirring mechanism to prevent the cleaning agent from settling due to long-term standing. Utility Model Content
[0006] The utility model aims to provide an automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent to solve the technical problem of preventing precipitation of the static pure liquid of cleaning agent in the automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent proposed in the above background technology.
[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an automatic liquid replenishing device for a photovoltaic silicon wafer cleaning agent, comprising: a cleaning agent pure liquid tank and a cleaning agent mixing tank, a liquid level sensor is installed on the inner wall of the cleaning agent pure liquid tank, a heating tube is installed on the inner wall of the cleaning agent pure liquid tank, a sealing cover is installed on the top of the cleaning agent pure liquid tank, and a stirring mechanism is provided on the inner wall of the cleaning agent pure liquid tank, and the stirring mechanism is used to prevent the cleaning agent from settling due to long-term static conditions;
[0008] The stirring mechanism includes a first electric rod, which is arranged at the bottom of the pure liquid tank of the cleaning agent. A stirring block is installed at the output end of the first electric rod. A locking groove is provided at the top of the pure liquid tank of the cleaning agent. An electromagnet is installed on the inner wall of the locking groove. A first magnet is installed at the bottom of the sealing cover. A sealing block is installed at the bottom of the sealing cover. A damper is installed on the outer wall of the sealing block. A damping spring is installed around the output end of the damper, and a damping plate is installed at the output end of the damper.
[0009] Preferably, a display is installed on the outer wall of the pure cleaning agent liquid tank, a controller is installed on the outer wall of the pure cleaning agent liquid tank, and a timer is installed on the outer wall of the pure cleaning agent liquid tank.
[0010] Preferably, a delivery pump is installed on the outer wall of the cleaning agent mixing box, and the water inlet end of the delivery pump extends to the interior of the cleaning agent pure liquid tank, and the water outlet end of the delivery pump extends to the interior of the cleaning agent mixing box, and a water filling pipe is installed on the top of the cleaning agent mixing box.
[0011] Preferably, a filtering mechanism is provided on the outer wall of the water adding pipe, and the filtering mechanism is used to filter the water added to the cleaning agent mixing box.
[0012] Preferably, the filtering mechanism includes a more disassembly groove, which is arranged at the top of the cleaning agent mixing box, the outer wall of the water filling pipe is installed with a blocking block, the outer wall of the blocking block is installed with a blocking bolt, the top of the cleaning agent mixing box is provided with a blocking screw groove, and one end of the blocking bolt extends to the inside of the blocking screw groove.
[0013] Preferably, a filter frame is installed at the bottom of the water supply pipe.
[0014] Preferably, a screw groove block is installed on the inner wall of the filter frame, a filter screen is installed on the bottom of the screw groove block, and a screw is installed on the outer wall of the filter screen, and one end of the screw extends to the inside of the screw groove block.
[0015] Compared with the prior art, the beneficial effects of the utility model are:
[0016] 1. The utility model is equipped with a stirring mechanism to prevent the cleaning agent from settling for a long time. The existing cleaning agent pure liquid tank is used to store the cleaning agent pure liquid. If the cleaning agent pure liquid is in a static state for a long time, it will cause precipitation, which will lead to uneven quality of the cleaning agent pure liquid added to the cleaning agent mixing box later. Therefore, it is necessary to improve this. First, the sealing cover is covered on the top of the cleaning agent pure liquid tank, and then the electromagnet is energized to adsorb the first magnet, so that the sealing cover is firmly fixed on the top of the cleaning agent pure liquid tank, and the sealing block is used to seal the gap between the top of the cleaning agent pure liquid tank and the sealing cover. Then, the first electric pole drives the stirring block to move, so as to push the liquid inside the cleaning agent pure liquid tank to shake. At the same time, when the liquid is pushed, the damping plate is compressed, and the damper and the damping spring are compressed to work to reduce the impact force generated when the liquid is pushed, thereby further protecting the stability of the sealing cover, and then the movement of the stirring block can prevent the liquid inside the cleaning agent pure liquid tank from settling.
[0017] 2. The utility model is equipped with a filtering mechanism to filter the water added to the cleaning agent mixing box 8. The water added to the cleaning agent mixing box by the existing water adding pipe is often an external water source, and the external water source may contain a large amount of impurities, which may lead to a decrease in the quality of the cleaning agent after being generated. In this case, it is necessary to filter the water added to the cleaning agent mixing box. First, the water adding pipe is added to the cleaning agent mixing box through the replacement groove, and then the blocking bolt is fixed to the blocking screw groove. The replacement groove is sealed with a blocking block. Then, when water flows in the water adding pipe, smaller impurities in the water can be filtered through the filter. At the same time, when the filter needs to be replaced, the blocking block can be removed, and then the filter frame is removed from the cleaning agent mixing box through the replacement groove, and then the screw is removed from the screw groove block. The filter can be disassembled and replaced, and then the water added to the cleaning agent mixing box is filtered to avoid impurities in the water and reduce the quality of the cleaning agent after being generated. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a schematic diagram of the overall structure of the utility model;
[0019] Figure 2 It is a front structural schematic diagram of the utility model;
[0020] Figure 3 This is a partial structural schematic diagram of the cleaning agent pure liquid tank of the utility model;
[0021] Figure 4 This is a schematic diagram of the structure of the sealing cover of the utility model;
[0022] Figure 5 This is a partial structural schematic diagram of the cleaning agent mixing box of the utility model;
[0023] Figure 6 It is a schematic diagram of the structure of the filter frame part of the utility model.
[0024] In the figure: 1. Cleaning agent pure liquid tank; 2. Liquid level sensor; 3. Heating tube; 4. Display; 5. Controller; 6. Timer; 7. Sealing cover; 8. Cleaning agent mixing tank; 9. Delivery pump; 10. Water adding pipe; 11. First electric pole; 12. Stirring block; 13. Locking groove; 14. Electromagnet; 15. Sealing block; 16. Damper; 17. Damping spring; 18. Damping plate; 19. Replacement groove; 20. Blocking block; 21. Blocking screw groove; 22. Blocking bolt; 23. Filter frame; 24. Screw groove block; 25. Filter; 26. Screw; 27. First magnet. DETAILED DESCRIPTION
[0025] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0026] In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front end", "rear end", "two ends", "one end", "the other end" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.
[0027] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "connected", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0028] See also Figure 1 and Figure 2, an automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent, comprising: a cleaning agent pure liquid tank 1 and a cleaning agent mixing tank 8, a liquid level sensor 2 is installed on the inner wall of the cleaning agent pure liquid tank 1, a heating tube 3 is installed on the inner wall of the cleaning agent pure liquid tank 1, a sealing cover 7 is installed on the top of the cleaning agent pure liquid tank 1, a display 4 is installed on the outer wall of the cleaning agent pure liquid tank 1, a controller 5 is installed on the outer wall of the cleaning agent pure liquid tank 1, a timer 6 is installed on the outer wall of the cleaning agent pure liquid tank 1, a delivery pump 9 is installed on the outer wall of the cleaning agent mixing tank 8, and the water inlet end of the delivery pump 9 extends to the interior of the cleaning agent pure liquid tank 1, and the water outlet end of the delivery pump 9 extends to the interior of the cleaning agent mixing tank 8, and a water adding pipe 10 is installed on the top of the cleaning agent mixing tank 8, which supplies water to the cleaning agent mixing tank 8 through the cleaning agent pure liquid tank 1 The delivery pump 9 is controlled by the timer 6 to automatically and regularly replenish the pure cleaning agent. Water is then added to the cleaning agent mixing tank 8 through the water adding pipe 10 to prepare a cleaning agent solution for cleaning photovoltaic silicon wafers. The liquid level sensor 2 can monitor the liquid level of the cleaning agent in real time and transmit the data to the display 4. When the cleaning agent stock in the cleaning agent pure liquid tank 1 is lower than the minimum limit of the liquid level, the controller 5 alarms, and the staff opens the sealing cover 7 to add new cleaning agent to the cleaning agent pure liquid tank 1. The heating tube 3 in the cleaning agent pure liquid tank 1 can heat the cleaning agent, so that the cleaning agent in the cleaning agent pure liquid tank 1 always maintains a suitable temperature, thereby ensuring the temperature and effect of glass cleaning, and then the mixed and neutralized liquid in the cleaning agent mixing tank 8 is used to clean the photovoltaic silicon wafers.
[0029] See also Figure 2 , Figure 3 and Figure 4The inner wall of the cleaning agent pure liquid tank 1 is provided with a stirring mechanism, and the stirring mechanism is used to prevent the cleaning agent from settling for a long time. The stirring mechanism includes a first electric pole 11, and the first electric pole 11 is arranged at the bottom of the cleaning agent pure liquid tank 1. The output end of the first electric pole 11 is equipped with a stirring block 12, and the top of the cleaning agent pure liquid tank 1 is provided with a locking groove 13, and the inner wall of the locking groove 13 is equipped with an electromagnet 14. The bottom of the sealing cover 7 is equipped with a first magnet 27, and the bottom of the sealing cover 7 is equipped with a sealing block 15. The outer wall of the sealing block 15 is equipped with a damper 16, and the output end of the damper 16 is surrounded by a damping spring 17. The output end of the damper 16 is equipped with a damping plate 18. The existing cleaning agent pure liquid tank 1 is used to store cleaning agent pure liquid, and the cleaning agent pure liquid is in a static state for a long time, which will cause precipitation, and the later addition of The quality of the pure cleaning agent liquid in the cleaning agent mixing box 8 is uneven, so it is necessary to improve this. First, the sealing cover 7 is covered on the top of the pure cleaning agent liquid tank 1, and then the electromagnet 14 is energized to adsorb the first magnet 27, so that the sealing cover 7 is firmly fixed on the top of the pure cleaning agent liquid tank 1, and the sealing block 15 is used to seal the gap between the top of the pure cleaning agent liquid tank 1 and the sealing cover 7. Then, the first electric pole 11 works to drive the stirring block 12 to move, which pushes the liquid inside the pure cleaning agent liquid tank 1 to shake. At the same time, when the liquid is pushed, the damping plate 18 is compressed, and the damper 16 and the damping spring 17 are compressed to work to reduce the impact force generated when the liquid is pushed, thereby further protecting the stability of the sealing cover 7. Then, the movement of the stirring block 12 can prevent the liquid inside the pure cleaning agent liquid tank 1 from settling.
[0030] See also Figure 2 , Figure 5 and Figure 6, the outer wall of the water adding pipe 10 is provided with a filtering mechanism, and the filtering mechanism is used to filter the water added to the cleaning agent mixing box 8, and the filtering mechanism includes a more disassembly groove 19, and the more disassembly groove 19 is arranged at the top of the cleaning agent mixing box 8, and the outer wall of the water adding pipe 10 is installed with a blocking block 20, and the outer wall of the blocking block 20 is installed with a blocking bolt 22, and the top of the cleaning agent mixing box 8 is provided with a blocking screw groove 21, and one end of the blocking bolt 22 extends to the inside of the blocking screw groove 21, and a filter frame 23 is installed at the bottom of the water adding pipe 10, and a screw groove block 24 is installed on the inner wall of the filter frame 23, and a filter screen 25 is installed at the bottom of the screw groove block 24, and a screw 26 is installed on the outer wall of the filter screen 25, and one end of the screw 26 extends to the inside of the screw groove block 24. The water added to the cleaning agent mixing box 8 by the existing water adding pipe 10 is often an external water source, and the external water source may carry a large amount of In order to prevent the quality of the generated cleaning agent from being reduced due to the presence of impurities, the water added to the cleaning agent mixing box 8 needs to be filtered. First, the water adding pipe 10 is added to the cleaning agent mixing box 8 through the removal groove 19, and then the blocking bolt 22 is fixed to the blocking screw groove 21, and the removal groove 19 is sealed with the blocking block 20. Then, when water flows in the water adding pipe 10, the smaller impurities in the water can be filtered through the filter screen 25. At the same time, when the filter screen 25 needs to be replaced, the blocking block 20 can be removed, and then the filter frame 23 can be removed from the cleaning agent mixing box 8 through the removal groove 19, and then the screw 26 can be removed from the screw groove block 24, and the filter screen 25 can be disassembled and replaced, so as to filter the water added to the cleaning agent mixing box 8 to avoid impurities in the water and reduce the quality of the generated cleaning agent.
[0031] Working principle: the pure cleaning agent is automatically replenished in a fixed time through the cleaning agent pure liquid tank 1 to the cleaning agent mixing tank 8 by controlling the delivery pump 9 through the timer 6, and water is added to the cleaning agent mixing tank 8 through the water adding pipe 10 to prepare a cleaning agent solution for cleaning photovoltaic silicon wafers, and the liquid level sensor 2 can monitor the liquid level of the cleaning agent in real time and transmit the data to the display 4 at the same time. When the cleaning agent stock in the cleaning agent pure liquid tank 1 is lower than the minimum limit of the liquid level, the controller 5 alarms, and the staff opens the sealing cover 7 to add new cleaning agent to the cleaning agent pure liquid tank 1. The heating tube 3 in the cleaning agent pure liquid tank 1 can heat the cleaning agent, so that the cleaning agent in the cleaning agent pure liquid tank 1 always maintains a suitable temperature, ensuring the glass The temperature and effect of glass cleaning are improved, and the mixed and neutralized liquid in the cleaning agent mixing box 8 is used to clean the photovoltaic silicon wafer. The existing cleaning agent pure liquid tank 1 is used to store the cleaning agent pure liquid, and the cleaning agent pure liquid is in a static state for a long time, which will cause precipitation, and cause the quality of the cleaning agent pure liquid added to the cleaning agent mixing box 8 later to be uneven. Therefore, it is necessary to improve this. First, the sealing cover 7 is covered on the top of the cleaning agent pure liquid tank 1, and then the electromagnet 14 is energized to adsorb the first magnet 27, so that the sealing cover 7 is firmly fixed on the top of the cleaning agent pure liquid tank 1, and the sealing block 15 is used to seal the gap between the top of the cleaning agent pure liquid tank 1 and the sealing cover 7. Then, the first electric pole 11 works to drive the stirring block 12 to move, which pushes the liquid inside the cleaning agent pure liquid tank 1 to shake. At the same time, when the liquid is pushed, the damping plate 18 is compressed, and the damper 16 and the damping spring 17 are compressed to work to reduce the impact force generated when the liquid is pushed, thereby further protecting the stability of the sealing cover 7. The movement of the stirring block 12 can prevent the liquid inside the cleaning agent pure liquid tank 1 from settling. The water added to the cleaning agent mixing tank 8 by the existing water adding pipe 10 is often an external water source, and the external water source may contain a large amount of impurities, which may cause the quality of the generated cleaning agent to deteriorate. In this case, the water added to the cleaning agent mixing tank 8 needs to be filtered. First, add the water adding pipe 10 into the cleaning agent mixing box 8 through the replacing groove 19, then fix the blocking bolt 22 into the blocking screw groove 21, and use the blocking block 20 to seal the replacing groove 19. Then, when water flows in the water adding pipe 10, smaller impurities in the water can be filtered through the filter screen 25. At the same time, when the filter screen 25 needs to be replaced, the blocking block 20 can be removed, and then the filter frame 23 can be removed from the cleaning agent mixing box 8 through the replacing groove 19, and then the screw 26 can be removed from the screw groove block 24, and the filter screen 25 can be disassembled and replaced, and then the water added to the cleaning agent mixing box 8 can be filtered to avoid impurities in the water and reduce the quality of the cleaning agent generated.
[0032] It is obvious to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be regarded as exemplary and non-restrictive from any point of view, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention. Any reference numeral in a claim should not be regarded as limiting the claim to which it relates.
Claims
1. An automatic liquid replenishing device for a photovoltaic silicon wafer cleaning agent, comprising: a cleaning agent pure liquid tank (1) and a cleaning agent mixing tank (8), wherein a liquid level sensor (2) is installed on the inner wall of the cleaning agent pure liquid tank (1), a heating tube (3) is installed on the inner wall of the cleaning agent pure liquid tank (1), and a sealing cover (7) is installed on the top of the cleaning agent pure liquid tank (1), characterized in that: The inner wall of the cleaning agent pure liquid tank (1) is provided with a stirring mechanism, and the stirring mechanism is used to prevent the cleaning agent from settling due to long-term static state; The stirring mechanism comprises a first electric rod (11), the first electric rod (11) is arranged at the bottom of a cleaning agent pure liquid tank (1), a stirring block (12) is installed at the output end of the first electric rod (11), a locking groove (13) is provided at the top of the cleaning agent pure liquid tank (1), an electromagnet (14) is installed on the inner wall of the locking groove (13), a first magnet (27) is installed at the bottom of the sealing cover (7), a sealing block (15) is installed at the bottom of the sealing cover (7), a damper (16) is installed on the outer wall of the sealing block (15), a damping spring (17) is installed around the output end of the damper (16), and a damping plate (18) is installed at the output end of the damper (16).
2. The photovoltaic silicon wafer cleaning agent automatic liquid replenishing device according to claim 1, characterized in that: A display (4) is installed on the outer wall of the cleaning agent pure liquid tank (1), a controller (5) is installed on the outer wall of the cleaning agent pure liquid tank (1), and a timer (6) is installed on the outer wall of the cleaning agent pure liquid tank (1).
3. The automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent according to claim 1, characterized in that: A delivery pump (9) is installed on the outer wall of the cleaning agent mixing box (8), and the water inlet end of the delivery pump (9) extends to the interior of the cleaning agent pure liquid tank (1), and the water outlet end of the delivery pump (9) extends to the interior of the cleaning agent mixing box (8), and a water supply pipe (10) is installed on the top of the cleaning agent mixing box (8).
4. The automatic liquid replenishing device for photovoltaic silicon wafer cleaning agent according to claim 3, characterized in that: The outer wall of the water adding pipe (10) is provided with a filtering mechanism, and the filtering mechanism is used to filter the water added to the cleaning agent mixing box (8).
5. The photovoltaic silicon wafer cleaning agent automatic liquid replenishing device according to claim 4, characterized in that: The filtering mechanism comprises a more disassembly groove (19), the more disassembly groove (19) is arranged at the top of the cleaning agent mixing box (8), the outer wall of the water supply pipe (10) is installed with a blocking block (20), the outer wall of the blocking block (20) is installed with a blocking bolt (22), the top of the cleaning agent mixing box (8) is provided with a blocking screw groove (21), and one end of the blocking bolt (22) extends to the inside of the blocking screw groove (21).
6. The photovoltaic silicon wafer cleaning agent automatic liquid replenishing device according to claim 3, characterized in that: A filter frame (23) is installed at the bottom of the water supply pipe (10).
7. The photovoltaic silicon wafer cleaning agent automatic liquid replenishing device according to claim 6, characterized in that: A screw groove block (24) is installed on the inner wall of the filter frame (23), a filter screen (25) is installed on the bottom of the screw groove block (24), a screw (26) is installed on the outer wall of the filter screen (25), and one end of the screw (26) extends to the inside of the screw groove block (24).